TWI659084B - Adhesive sheet - Google Patents

Adhesive sheet Download PDF

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Publication number
TWI659084B
TWI659084B TW103109762A TW103109762A TWI659084B TW I659084 B TWI659084 B TW I659084B TW 103109762 A TW103109762 A TW 103109762A TW 103109762 A TW103109762 A TW 103109762A TW I659084 B TWI659084 B TW I659084B
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Prior art keywords
layer
adhesive
adhesive layer
expandable microspheres
thermally expandable
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TW103109762A
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Chinese (zh)
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TW201441333A (en
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平山高正
北山和寬
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日商日東電工股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/10Encapsulated ingredients
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/408Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/412Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of microspheres
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)

Abstract

本發明提供一種於電子零件等微小零件之切斷加工時,可實現優異之切斷精度及切削屑之減少的黏著片材。 The present invention provides an adhesive sheet that can achieve excellent cutting accuracy and reduction of cutting chips during cutting processing of small parts such as electronic parts.

本發明之黏著片材具備含有複數個熱膨脹性微球之黏著劑層、及配置於該黏著劑層之單側之繫留層,且至少1個以上熱膨脹性微球自該黏著劑層突出,突出之該熱膨脹性微球埋入繫留層中。於較佳之實施形態中,上述黏著劑層含有具有大於該黏著劑層之厚度之粒徑的熱膨脹性微球。 The adhesive sheet of the present invention includes an adhesive layer containing a plurality of thermally expandable microspheres, and a captive layer disposed on one side of the adhesive layer, and at least one or more thermally expandable microspheres protrude from the adhesive layer. The prominent thermally expandable microspheres are buried in the captive layer. In a preferred embodiment, the adhesive layer contains thermally expandable microspheres having a particle diameter larger than the thickness of the adhesive layer.

Description

黏著片材 Adhesive sheet

本發明係關於一種黏著片材。 The present invention relates to an adhesive sheet.

於矽晶圓、積層電容器、透明電極等電子零件之製造中,藉由切斷加工而將大面積且一次整合必要功能而獲得之基板微小化為所需大小。切斷加工時,使用用以防止由加工時之應力及振動引起之切斷精度降低的被加工物(基板)固定用之黏著片材。對於該黏著片材,於加工時要求對被加工物之充分之黏著力,於加工後要求可容易地剝離被切斷之被加工物(電子零件)。作為此種黏著片材,已知有於黏著劑中含有熱膨脹性微球之黏著片材(例如,專利文獻1)。含有熱膨脹性微球之黏著片材藉由利用加熱使熱膨脹性微球膨脹、或發泡而使黏著力降低,因此可於上述加工時表現出充分之黏著力,於加工後藉由加熱而容易地使電子零件剝離。 In the manufacture of electronic parts such as silicon wafers, multilayer capacitors, and transparent electrodes, the substrate obtained by cutting a large area and integrating the necessary functions at one time into a required size is cut down. When cutting, use an adhesive sheet for fixing the workpiece (substrate) to prevent the cutting accuracy from being reduced due to stress and vibration during processing. For this adhesive sheet, sufficient adhesion to the workpiece is required during processing, and it is required that the cut workpiece (electronic component) can be easily peeled off after processing. As such an adhesive sheet, an adhesive sheet containing heat-expandable microspheres in an adhesive is known (for example, Patent Document 1). The adhesive sheet containing heat-expandable microspheres reduces the adhesive force by expanding or expanding the heat-expandable microspheres by heating, so it can show sufficient adhesion during the above processing, and it is easy to heat it after processing. Ground the electronic parts.

近年,電子零件之輕量、小型化有所發展,要求可實現更高精度之切斷加工的被加工物固定用之黏著片材。又,亦要求減少切斷加工時產生之加工屑(切削屑)。針對該等要求,認為若使構成黏著片材之黏著劑變薄,則可獲得可實現更高切斷精度及切削屑之減少的黏著片材。然而,於含有熱膨脹性微球之黏著片材中,由於含有熱膨脹性微球,故而存在黏著劑之厚度受到限制之問題。更具體而言,於含有熱膨脹性微球之黏著片材中,若使黏著劑變薄,則熱膨脹性微球自黏著劑突出,存在與基材或加工台之密接性變差等實用性明顯降低之問題。 In recent years, the lightness and miniaturization of electronic parts have been developed, and there is a demand for an adhesive sheet for fixing a workpiece that can be cut with higher accuracy. In addition, it is required to reduce machining chips (chips) generated during cutting. In response to these requirements, it is considered that if the adhesive constituting the adhesive sheet is made thin, an adhesive sheet that can achieve higher cutting accuracy and reduced chipping can be obtained. However, in the adhesive sheet containing thermally expandable microspheres, since the thermally expandable microspheres are contained, there is a problem that the thickness of the adhesive is limited. More specifically, in an adhesive sheet containing heat-expandable microspheres, if the adhesive is made thin, the heat-expandable microspheres protrude from the adhesive, and the practicality such as poor adhesion to a substrate or a processing table is obvious. Reduce the problem.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2002-121510號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2002-121510

本發明係為了解決上述先前之問題而完成者,其目的在於提供一種於電子零件等微小零件之切斷加工時,可實現優異之切斷精度及切削屑之減少的黏著片材。 The present invention has been made in order to solve the foregoing problems, and an object thereof is to provide an adhesive sheet that can achieve excellent cutting accuracy and reduction of cutting chips during cutting processing of small parts such as electronic parts.

本發明之黏著片材具備含有複數個熱膨脹性微球之黏著劑層、及配置於該黏著劑層之單側之繫留層,且至少1個以上熱膨脹性微球自該黏著劑層突出,突出之該熱膨脹性微球埋入繫留層中。 The adhesive sheet of the present invention includes an adhesive layer containing a plurality of thermally expandable microspheres, and a captive layer disposed on one side of the adhesive layer, and at least one or more thermally expandable microspheres protrude from the adhesive layer. The prominent thermally expandable microspheres are buried in the captive layer.

於較佳之實施形態中,上述黏著劑層含有具有大於該黏著劑層之厚度之粒徑的熱膨脹性微球。 In a preferred embodiment, the adhesive layer contains thermally expandable microspheres having a particle diameter larger than the thickness of the adhesive layer.

於較佳之實施形態中,上述熱膨脹性微球之自上述黏著劑層突出之部分之高度為0.4μm以上。 In a preferred embodiment, a height of a portion of the thermally expandable microsphere protruding from the adhesive layer is 0.4 μm or more.

於較佳之實施形態中,於包含上述熱膨脹性微球自上述黏著劑層突出之部分的特定區域之剖面觀察下,該黏著劑層與上述繫留層之界面之長度(l1)與該界面之厚度方向投影線之長度(L)的比(l1/L)為1.02以上。 In a preferred embodiment, the length (l1) of the interface between the adhesive layer and the mooring layer and the length of the interface are observed under a cross-section of a specific area including a portion of the thermally expandable microsphere protruding from the adhesive layer. The ratio (l1 / L) of the length (L) of the projection line in the thickness direction is 1.02 or more.

於較佳之實施形態中,上述熱膨脹性微球之平均粒徑為6μm~45μm。 In a preferred embodiment, the average particle diameter of the thermally expandable microspheres is 6 μm to 45 μm.

於較佳之實施形態中,上述繫留層於25℃下藉由奈米壓痕法所測得之彈性模數為1MPa以上。 In a preferred embodiment, the elastic modulus of the tethered layer measured by the nanoindentation method at 25 ° C is 1 MPa or more.

於較佳之實施形態中,上述黏著劑層之厚度為20μm以下。 In a preferred embodiment, the thickness of the adhesive layer is 20 μm or less.

於較佳之實施形態中,藉由加熱使上述熱膨脹性微球膨脹或發泡 時,上述黏著劑層之與上述繫留層相反之側之面之表面粗糙度Ra為3μm以上。 In a preferred embodiment, the thermally expandable microspheres are expanded or foamed by heating. In this case, the surface roughness Ra of the surface of the adhesive layer on the side opposite to the mooring layer is 3 μm or more.

於較佳之實施形態中,上述黏著劑層於25℃下藉由奈米壓痕法所測得之彈性模數為1MPa以下。 In a preferred embodiment, the elastic modulus of the adhesive layer measured by the nanoindentation method at 25 ° C is 1 MPa or less.

於較佳之實施形態中,於上述繫留層之與上述黏著劑層相反之側進而具備基材。 In a preferred embodiment, a substrate is further provided on the opposite side of the tethered layer from the adhesive layer.

根據本發明之另一態樣,提供一種電子零件之製造方法。該製造方法包括:於上述黏著片材上貼附電子零件材料後,對該電子零件材料進行切斷加工。 According to another aspect of the present invention, a method for manufacturing an electronic component is provided. The manufacturing method includes: after attaching an electronic component material to the adhesive sheet, cutting the electronic component material.

根據本發明,藉由於含有熱膨脹性微球之黏著劑層之單側配置繫留層,將自黏著劑層突出之熱膨脹性微球埋入繫留層中,可於不受熱膨脹性微球引起之凹凸影響之情況下使作為低彈性區域之黏著劑層變薄,其結果為,可獲得可實現優異之切斷精度之黏著片材。又,根據本發明,由於可使黏著劑層變薄,故而若使用本發明之黏著片材進行電子零件等微小零件之切斷加工,則可抑制切削屑之產生。 According to the present invention, since the tether layer is disposed on one side of the adhesive layer containing the heat-expandable microspheres, the heat-expandable microspheres protruding from the adhesive layer are buried in the tether layer, which can be prevented from being caused by the heat-expandable microspheres. When the unevenness influences the thickness of the adhesive layer which is a low-elasticity region, it is possible to obtain an adhesive sheet capable of achieving excellent cutting accuracy. In addition, according to the present invention, since the adhesive layer can be made thin, if the micro-parts such as electronic parts are cut using the adhesive sheet of the present invention, generation of cutting chips can be suppressed.

1‧‧‧界面 1‧‧‧ interface

10‧‧‧黏著劑層 10‧‧‧ Adhesive layer

11‧‧‧熱膨脹性微球 11‧‧‧ heat-expandable microspheres

12‧‧‧黏著劑 12‧‧‧ Adhesive

20‧‧‧繫留層 20‧‧‧ Ties

30‧‧‧基材 30‧‧‧ substrate

100、200‧‧‧黏著片材 100, 200‧‧‧ Adhesive sheet

H‧‧‧高度 H‧‧‧ height

L‧‧‧長度 L‧‧‧ length

l1‧‧‧長度 l1‧‧‧ length

圖1係本發明之較佳之實施形態之黏著片材的概略剖面圖。 FIG. 1 is a schematic cross-sectional view of an adhesive sheet according to a preferred embodiment of the present invention.

圖2係用以說明黏著劑層與繫留層之界面的本發明之較佳之實施形態之黏著片材的概略剖面圖。 FIG. 2 is a schematic cross-sectional view of an adhesive sheet according to a preferred embodiment of the present invention for explaining the interface between the adhesive layer and the tether layer.

圖3係本發明之另一較佳之實施形態之黏著片材的概略剖面圖。 3 is a schematic cross-sectional view of an adhesive sheet according to another preferred embodiment of the present invention.

圖4係表示藉由實施例3中之厚度之測定而獲得之拉曼影像的圖。 FIG. 4 is a diagram showing a Raman image obtained by measuring the thickness in Example 3. FIG.

圖5係表示實施例11中之黏著片材之剖面之SEM(Scanning Electron Microscope,掃描式電子顯微鏡)圖像的圖。 5 is a view showing a SEM (Scanning Electron Microscope) image of a cross section of the adhesive sheet in Example 11. FIG.

A.黏著片材之整體構成 A. The overall composition of the adhesive sheet

圖1係本發明之較佳之實施形態之黏著片材的概略剖面圖。黏著片材100具備黏著劑層10與配置於黏著劑層10之單側之繫留層20。黏著劑層10含有複數個熱膨脹性微球11。於實用上,黏著劑層10進而含有黏著劑12。至少1個以上熱膨脹性微球11自黏著劑層10突出,突出之熱膨脹性微球11以繫留之方式埋入繫留層20中。藉由將突出之熱膨脹性微球11埋入繫留層20中,可消除由熱膨脹性微球11引起之凹凸之影響。熱膨脹性微球11可藉由加熱而膨脹或發泡。雖未圖示,但直至將黏著片材供於實用為止之期間,可於黏著劑層10上配置剝離紙而保護黏著劑層10。又,於圖示例中,雖明確圖示有黏著劑層10與繫留層20之界面1,但界面亦可為藉由目視、顯微鏡等難以辨別之界面。藉由目視、顯微鏡等難以辨別之界面例如可分析各層之組成而辨別(詳細內容見下文)。 FIG. 1 is a schematic cross-sectional view of an adhesive sheet according to a preferred embodiment of the present invention. The adhesive sheet 100 includes an adhesive layer 10 and a tether layer 20 disposed on one side of the adhesive layer 10. The adhesive layer 10 includes a plurality of thermally expandable microspheres 11. Practically, the adhesive layer 10 further includes an adhesive 12. At least one or more thermally expandable microspheres 11 protrude from the adhesive layer 10, and the protruding thermally expandable microspheres 11 are buried in the tethered layer 20 in a tethered manner. By embedding the protruding thermally expandable microspheres 11 in the mooring layer 20, the influence of the unevenness caused by the thermally expandable microspheres 11 can be eliminated. The heat-expandable microspheres 11 can be expanded or foamed by heating. Although not shown, until the adhesive sheet is put into practical use, a release paper may be disposed on the adhesive layer 10 to protect the adhesive layer 10. In the example shown in the figure, although the interface 1 between the adhesive layer 10 and the mooring layer 20 is clearly shown, the interface may be an interface that is difficult to distinguish by visual inspection, a microscope, or the like. Difficult interfaces such as visual observation and microscope can be used to identify the composition of each layer (see below for details).

於本發明中,藉由具備繫留層10,可容許熱膨脹性微球11自黏著劑層10突出,使黏著劑層10變薄。若使作為低彈性區域之黏著劑層10變薄,則作為對電子零件等進行切斷加工時之暫時固定用片材,有助於實現優異之切斷精度。更具體而言,若使用黏著劑層10較薄之黏著片材作為暫時固定用片材對電子零件等進行切斷加工,則由於該黏著片材之變形較少,故而可防止以下情況:切斷後之晶片再附著;切斷面發生傾斜或成為S字狀,變得不穩定;切斷時產生晶片缺損等。又,於將黏著劑層10較薄之黏著片材用作對電子零件等進行切斷加工時之暫時固定用片材之情形時,亦可抑制切削屑之產生。本發明之黏著片材不僅於利用切晶步驟中多採用之旋轉刀所進行之切斷中發揮出上述效果,而且於藉由為了降低切削損耗而採用之利用平刀之壓切所進行之切斷中,亦發揮出上述效果,而尤其有用。又,於加溫下(例如,30℃~150℃)進行切斷之情形時,亦可以上述方式精度良好地切斷。 In the present invention, the provision of the tethering layer 10 allows the thermally expandable microspheres 11 to protrude from the adhesive layer 10 and makes the adhesive layer 10 thin. When the adhesive layer 10 which is a low-elasticity region is thinned, it becomes a sheet | seat for temporary fixing at the time of a cutting process of an electronic component etc., and it contributes to the achievement of excellent cutting precision. More specifically, if an electronic part or the like is cut by using an adhesive sheet having a thin adhesive layer 10 as a temporary fixing sheet, since the adhesive sheet has less deformation, the following can be prevented: After the wafer is broken, the wafer is reattached; the cut surface becomes inclined or becomes S-shaped and becomes unstable; wafer defects occur during cutting. In addition, when an adhesive sheet having a relatively thin adhesive layer 10 is used as a temporary fixing sheet when cutting an electronic component or the like, generation of chips can be suppressed. The adhesive sheet of the present invention not only exerts the above-mentioned effect in the cutting by the rotary knife which is often used in the crystal cutting step, but also the cutting by the cutting by the flat knife to reduce the cutting loss. The above-mentioned effect is also exerted in the interruption, which is particularly useful. When cutting is performed under heating (for example, 30 ° C to 150 ° C), the cutting can be performed with high accuracy as described above.

又,本發明之黏著片材由於黏著劑層10含有熱膨脹性微球11,故 而於將被黏著體(例如,切斷加工後之晶片)自黏著片材剝離時,藉由以熱膨脹性微球11可膨脹或發泡程度之溫度進行加熱,於黏著面產生凹凸,而可使該黏著面之黏著力降低或消失。 Moreover, since the adhesive sheet 10 of this invention contains the thermally expansible microsphere 11, the adhesive sheet 10 contains When the adherend (for example, the wafer after the cutting process) is peeled from the adhered sheet, it is heated at a temperature at which the heat-expandable microspheres 11 can expand or foam to generate unevenness on the adhered surface, so that The adhesive force of the adhesive surface is reduced or disappeared.

上述熱膨脹性微球之自黏著劑層突出之部分之高度H較佳為0.4μm以上,更佳為0.4μm~80μm,進而較佳為0.6μm~80μm。於本發明中,藉由具備繫留層,可容許熱膨脹性微球以如上所述之高度突出,使黏著劑層之厚度變薄。又,若高度H為上述範圍,則可提供防止繫留層之強度及彈性模數降低、作為對電子零件等進行切斷加工時之暫時固定用片材而有助於實現更優異之切斷精度的黏著片材。熱膨脹性微球之自黏著劑層突出之部分之高度較佳為小於上述繫留層之厚度。 The height H of the part of the thermally expandable microsphere protruding from the adhesive layer is preferably 0.4 μm or more, more preferably 0.4 μm to 80 μm, and still more preferably 0.6 μm to 80 μm. In the present invention, by providing a tethering layer, the thermally expandable microspheres can be allowed to protrude as high as described above, and the thickness of the adhesive layer can be made thin. In addition, if the height H is in the above range, it is possible to provide reduction in the strength and elastic modulus of the tether layer, and to provide a more excellent cutting as a temporary fixing sheet when cutting electronic parts and the like. Precision adhesive sheet. The height of the part of the thermally expandable microsphere protruding from the adhesive layer is preferably smaller than the thickness of the mooring layer.

於包含上述熱膨脹性微球自上述黏著劑層突出之部分的特定區域之剖面觀察下,黏著劑層與繫留層之界面之長度(l1)與該界面之厚度方向投影線之長度(L)的比(l1/L)較佳為1.02以上,更佳為1.05~5。於本發明中,藉由具備繫留層,可容許熱膨脹性微球以如上所述之界面形狀突出,使黏著劑層之厚度變薄。又,若(l1/L)為上述範圍,則可提供防止繫留層之強度及彈性模數降低、作為對電子零件等進行切斷加工時之暫時固定用片材而有助於實現更優異之切斷精度的黏著片材。再者,圖2之概略剖面圖所示之粗實線l1為黏著劑層與繫留層之界面。 The length (l1) of the interface between the adhesive layer and the mooring layer and the length (L) of the projection line in the thickness direction of the interface under the cross-sectional observation of a specific area containing the thermally expandable microspheres protruding from the adhesive layer. The ratio (l1 / L) is preferably 1.02 or more, and more preferably 1.05 to 5. In the present invention, by providing a tethering layer, the thermally expandable microspheres can be allowed to protrude in the interface shape as described above, and the thickness of the adhesive layer can be reduced. In addition, if (l1 / L) is within the above range, it can provide reduction in the strength and elastic modulus of the tether layer, and can be used as a temporary fixing sheet when cutting electronic parts and the like, which contributes to more excellent realization. Adhesive sheet with cutting accuracy. The thick solid line l1 shown in the schematic cross-sectional view of FIG. 2 is the interface between the adhesive layer and the mooring layer.

將本發明之黏著片材之黏著面(即,黏著劑層之與繫留層相反之側之面)貼附於聚對苯二甲酸乙二酯膜(例如,厚度25μm)上時之黏著力較佳為0.2N/20mm以上,更佳為0.2N/20mm~20N/20mm,進而較佳為2N/20mm~10N/20mm。若為此種範圍,則可獲得作為對電子零件等進行切斷加工時之暫時固定用片材有用之黏著片材。於本說明書中,所謂黏著力係指藉由依據JIS Z 0237:2000之方法(測定溫度:23℃,貼合條件:2kg輥往返1次,剝離速度:300mm/min,剝離角度180°)所測得之黏著力。 Adhesive force when the adhesive surface of the adhesive sheet of the present invention (that is, the surface of the adhesive layer on the side opposite to the mooring layer) is attached to a polyethylene terephthalate film (for example, a thickness of 25 μm) It is preferably 0.2N / 20mm or more, more preferably 0.2N / 20mm to 20N / 20mm, and still more preferably 2N / 20mm to 10N / 20mm. Within this range, an adhesive sheet useful as a sheet for temporary fixation when cutting an electronic component or the like can be obtained. In the present specification, the adhesive force refers to a method according to JIS Z 0237: 2000 (measurement temperature: 23 ° C, bonding conditions: 2 kg roller reciprocating once, peeling speed: 300mm / min, peeling angle 180 °). Measured adhesion.

將本發明之黏著片材之黏著面貼附於聚對苯二甲酸乙二酯膜(例如,厚度25μm)並加熱後之黏著力較佳為0.2N/20mm以下,更佳為0.1N/20mm以下。於本說明書中,所謂對黏著片材之加熱係指以熱膨脹性微球膨脹或發泡而使黏著力降低之溫度、時間所進行之加熱。該加熱例如係於70℃~270℃下進行1分鐘~10分鐘之加熱。 The adhesive force of the adhesive surface of the adhesive sheet of the present invention after being adhered to a polyethylene terephthalate film (for example, 25 μm in thickness) is preferably 0.2N / 20mm or less, more preferably 0.1N / 20mm the following. In the present specification, the heating of the adhesive sheet refers to heating at a temperature and time for which the adhesive force is reduced by the expansion or foaming of the thermally expandable microspheres. This heating is performed, for example, at 70 ° C to 270 ° C for 1 minute to 10 minutes.

將本發明之黏著片材之黏著面貼附於聚對苯二甲酸乙二酯膜(例如,厚度25μm)上時之黏著力(即加熱前之黏著力(a1))與加熱後之黏著力(a2)之比(a2/a1)較佳為0.5以下,更佳為0.1以下。(a2/a1)之下限較佳為0.0001,更佳為0.0005。 Adhesive force when the adhesive surface of the adhesive sheet of the present invention is attached to a polyethylene terephthalate film (e.g., 25 μm thick) (i.e., adhesive force before heating (a1)) and adhesive force after heating The ratio (a2 / a1) of (a2) is preferably 0.5 or less, and more preferably 0.1 or less. The lower limit of (a2 / a1) is preferably 0.0001, more preferably 0.0005.

如上所述,本發明之黏著片材藉由以特定之溫度進行加熱,黏著劑層之與繫留層相反之側之面(即,黏著面)產生凹凸。將本發明之黏著片材加熱後之黏著面之表面粗糙度Ra較佳為3μm以上,更佳為5μm以上。若為此種範圍,則加熱後黏著力降低或消失,可獲得可容易地剝離被黏著體之黏著片材。再者,所謂黏著面之表面粗糙度Ra係指於不存在被黏著體之狀態下加熱後之黏著片材之黏著面之表面粗糙度Ra。表面粗糙度Ra可依據JIS B 0601:1994進行測定。 As described above, by heating the adhesive sheet of the present invention at a specific temperature, the surface of the adhesive layer opposite to the mooring layer (that is, the adhesive surface) is uneven. The surface roughness Ra of the adhesive surface after heating the adhesive sheet of the present invention is preferably 3 μm or more, and more preferably 5 μm or more. If it is such a range, the adhesive force will reduce or disappear after heating, and the adhesive sheet which can peel an adherend easily can be obtained. In addition, the surface roughness Ra of the adhesive surface refers to the surface roughness Ra of the adhesive surface of the adhesive sheet after being heated in the state where there is no adherend. The surface roughness Ra can be measured in accordance with JIS B 0601: 1994.

圖2係本發明之另一較佳之實施形態之黏著片材的概略剖面圖。黏著片材200於繫留層20之與黏著劑層10相反之側進而具備基材30。再者,雖未圖示,亦可於基材30之與繫留層20相反之側設置任意合適之別的黏著劑層或接著劑層。又,本發明之黏著片材直至供於實用為止之期間,亦可於基材30之外側配置剝離紙。於在基材30之外側配置剝離紙之情形時,該剝離紙可經由任意合適之黏著劑而貼附於基材上。於圖2中,係表示於基材30之單側形成黏著劑層10及繫留層20之形態,亦可採用於基材30之兩側形成黏著劑層10及繫留層20、例如黏著劑層/繫留層/基材/繫留層/黏著劑層之構成。 FIG. 2 is a schematic cross-sectional view of an adhesive sheet according to another preferred embodiment of the present invention. The adhesive sheet 200 further includes a base material 30 on the opposite side of the tether layer 20 from the adhesive layer 10. In addition, although not shown, any appropriate other adhesive layer or adhesive layer may be provided on the side of the substrate 30 opposite to the mooring layer 20. Moreover, a release paper may be arrange | positioned on the outer side of the base material 30 until the adhesive sheet of this invention is put into practical use. When a release paper is arranged on the outer side of the base material 30, the release paper can be attached to the base material through any suitable adhesive. In FIG. 2, the form in which the adhesive layer 10 and the mooring layer 20 are formed on one side of the substrate 30 is shown. The adhesive layer 10 and the mooring layer 20 may also be formed on both sides of the substrate 30, such as adhesion. Composition of agent layer / tethering layer / base material / tethering layer / adhesive layer.

B.繫留層 B. Tethered layer

上述繫留層於25℃下藉由奈米壓痕法所測得之彈性模數較佳為1MPa以上,更佳為1MPa~5000MPa,進而較佳為1MPa~3500MPa,尤佳為1MPa~1000MPa,最佳為10MPa~600MPa。具有顯示出此種彈性模數之層之黏著片材例如可藉由形成以與黏著劑層不同之材料形成之繫留層而獲得。所謂藉由奈米壓痕法所測得之彈性模數係指將壓頭壓入試樣(例如,黏著面)中時於負載時、卸載時連續測定施加於壓頭上之負載重量與壓入深度,根據所獲得之負載重量-壓入深度曲線而求出之彈性模數。於本說明書中,所謂藉由奈米壓痕法所測得之彈性模數係指將測定條件設為荷重:1mN、負載、卸載速度:0.1mN/s、保持時間:1s,而以上述方式測得之彈性模數。 The elastic modulus of the tethered layer measured by the nanoindentation method at 25 ° C is preferably 1 MPa or more, more preferably 1 MPa to 5000 MPa, still more preferably 1 MPa to 3500 MPa, and even more preferably 1 MPa to 1000 MPa. It is preferably 10 MPa to 600 MPa. An adhesive sheet having a layer exhibiting such an elastic modulus can be obtained, for example, by forming a captive layer formed of a material different from the adhesive layer. The so-called elastic modulus measured by the nano-indentation method refers to the continuous measurement of the load weight and indentation depth applied to the indenter when the indenter is pressed into the sample (for example, the adhesive surface) at the time of loading and unloading. The modulus of elasticity obtained from the obtained load weight-pressing depth curve. In this specification, the so-called elastic modulus measured by the nanoindentation method means that the measurement conditions are set to load: 1mN, load, unloading speed: 0.1mN / s, and retention time: 1s. The resulting modulus of elasticity.

如上所述,藉由具備藉由奈米壓痕法所測得之彈性模數為1MPa以上之繫留層,可提供作為對電子零件等進行切斷加工時之暫時固定用片材而有助於實現更優異之切斷精度的黏著片材。進而,藉由將繫留層之藉由奈米壓痕法所測得之彈性模數設為5000MPa以下,該繫留層可與自黏著劑層突出之熱膨脹性微球之凹凸吻合,可以如埋入該熱膨脹性微球之形態,被覆該熱膨脹性微球。又,可於無損作為黏著片材整體所需之柔軟性(例如,可與被黏著體吻合之程度之柔軟性)之情況下,提供有助於實現優異之切斷精度之黏著片材。 As described above, by providing a captive layer having an elastic modulus of 1 MPa or more as measured by the nano-indentation method, it is possible to provide a sheet for temporary fixation at the time of cutting and processing of electronic parts and the like, and contribute to this. Adhesive sheet for better cutting accuracy. Furthermore, by setting the elastic modulus of the tethered layer measured by the nanoindentation method to 5000 MPa or less, the tethered layer can conform to the unevenness of the thermally expandable microspheres protruding from the adhesive layer, and can be buried. Into the form of the thermally expandable microspheres, the thermally expandable microspheres are covered. In addition, it is possible to provide an adhesive sheet that contributes to achieving excellent cutting accuracy without impairing the flexibility required for the entire adhesive sheet (for example, a degree of flexibility capable of matching the adherend).

上述繫留層於25℃下之拉伸彈性模數較佳為1MPa以上,更佳為1MPa~5000MPa,進而較佳為1MPa~1000MPa。若為此種範圍,則關於藉由奈米壓痕法所測得之彈性模數,可獲得與上述所說明之效果相同之效果。再者,拉伸彈性模數可依據JIS K 7161:2008進行測定。 The tensile elastic modulus of the tethered layer at 25 ° C is preferably 1 MPa or more, more preferably 1 MPa to 5000 MPa, and even more preferably 1 MPa to 1000 MPa. Within this range, the same effects as described above can be obtained with respect to the elastic modulus measured by the nanoindentation method. The tensile elastic modulus can be measured in accordance with JIS K 7161: 2008.

上述繫留層於25℃下之彎曲彈性模數較佳為1MPa以上,更佳為1MPa~5000MPa,進而較佳為1MPa~1000MPa。若為此種範圍,則關於藉由奈米壓痕法所測得之彈性模數,可獲得與上述所說明之效果相同之效果。再者,彎曲彈性模數可依據JIS K 7171:2008進行測定。 The flexural modulus of the tethered layer at 25 ° C is preferably 1 MPa or more, more preferably 1 MPa to 5000 MPa, and even more preferably 1 MPa to 1000 MPa. Within this range, the same effects as described above can be obtained with respect to the elastic modulus measured by the nanoindentation method. The bending elastic modulus can be measured in accordance with JIS K 7171: 2008.

上述繫留層之厚度可根據自黏著劑層突出之熱膨脹性微球之凹凸量(突出部分之高度)而設定為任意合適之值。繫留層之厚度較佳為可完全被覆自黏著劑層突出之熱膨脹性微球之厚度,例如為厚於0.4μm且200μm以下,較佳為0.6μm~100μm,更佳為0.6μm~45μm。再者,於本說明書中,所謂繫留層之厚度,如圖1所示係指自構成繫留層20之材料與構成黏著劑層10之黏著劑12之界面至繫留層之與該界面相反之側之面為止之距離。即,熱膨脹性微球11自黏著劑層10突出之部分並非繫留層之厚度之評估對象。於截斷黏著片材並目視截斷面時,在構成繫留層20之材料與構成黏著劑層10之黏著劑12之界面明確之情形時,繫留層之厚度可使用尺、游標卡尺、測微計進行測定。又,亦可使用電子顯微鏡、光學顯微鏡、原子力顯微鏡等顯微鏡測定繫留層之厚度。進而,亦可根據繫留層與黏著劑層之組成之差異而辨別界面並測定繫留層之厚度。例如,可藉由拉曼光譜分析、紅外線光譜分析、X射線電子光譜分析等光譜分析;基質輔助雷射脫附游離飛行時間質譜儀(MALDI-TOFMS,Matrix-Assisted Laser Desorption Ionization-time of Flight Mass Spectrometer)或飛行時間二次離子質譜儀(TOF-SIMS,Time-of-Flight Secondary Ion Mass Spectrometer)等之質量分析等,對構成繫留層之材料及構成黏著劑層之黏著劑之組成進行分析,根據該組成之差異而辨別界面並測定繫留層之厚度。如上所述,藉由光譜分析或質量分析辨別界面之方法對於使用目視或顯微鏡進行觀察時難以辨別界面之情形有用。 The thickness of the mooring layer can be set to any appropriate value according to the unevenness (the height of the protruding portion) of the thermally expandable microspheres protruding from the adhesive layer. The thickness of the tethering layer is preferably the thickness of the thermally expandable microspheres that can completely cover the protruding from the adhesive layer, for example, it is thicker than 0.4 μm and less than 200 μm, preferably 0.6 μm to 100 μm, more preferably 0.6 μm to 45 μm. Furthermore, in this specification, the thickness of the tethered layer, as shown in FIG. 1, refers to the interface between the material constituting the tethered layer 20 and the adhesive 12 constituting the adhesive layer 10 and the interface between the tethered layer and the interface. The distance to the opposite side. That is, a part of the thermally expandable microspheres 11 protruding from the adhesive layer 10 is not an evaluation target for the thickness of the tethered layer. When the adhesive sheet is cut and the cut surface is visually observed, when the interface between the material constituting the tether layer 20 and the adhesive 12 constituting the adhesive layer 10 is clear, the thickness of the tether layer may be a ruler, a vernier caliper, or a micrometer. Perform the measurement. The thickness of the tethered layer can also be measured using a microscope such as an electron microscope, an optical microscope, or an atomic force microscope. Furthermore, the interface can be discriminated and the thickness of the tethered layer can be measured based on the difference in the composition of the tethered layer and the adhesive layer. For example, spectral analysis such as Raman spectroscopy, infrared spectroscopy, and X-ray electron spectroscopy can be used; MALDI-TOFMS (Matrix-Assisted Laser Desorption Ionization-time of Flight Mass) Spectrometer) or TOF-SIMS (Time-of-Flight Secondary Ion Mass Spectrometer), etc., to analyze the composition of the materials constituting the tether layer and the adhesive constituting the adhesive layer. Based on the difference in the composition, the interface is discriminated and the thickness of the tethered layer is measured. As described above, the method of distinguishing the interface by spectral analysis or mass analysis is useful in the case where it is difficult to distinguish the interface when observing with visual observation or a microscope.

作為構成上述繫留層之材料,例如可列舉:聚矽氧系聚合物、環氧系聚合物、聚碳酸酯系聚合物、乙烯系聚合物、丙烯酸系聚合物、胺基甲酸酯系聚合物、聚酯系聚合物(例如,聚對苯二甲酸乙二酯)、聚烯烴系聚合物、聚醯胺系聚合物、聚醯亞胺系聚合物、不飽和烴系聚合物等聚合物材料。若使用該等聚合物材料,則可適當選擇單體種 類、交聯劑、聚合度等,而容易地形成具有上述彈性模數之繫留層。又,上述聚合物材料於與熱膨脹性微球、構成黏著劑層之黏著劑及基材之親和性方面優異。上述聚合物材料可單獨使用,或可組合使用2種以上。 Examples of the material constituting the mooring layer include a silicone polymer, an epoxy polymer, a polycarbonate polymer, an ethylene polymer, an acrylic polymer, and a urethane polymer. Polymers, polymers such as polyesters (e.g., polyethylene terephthalate), polyolefin polymers, polyamide polymers, polyimide polymers, unsaturated hydrocarbon polymers, etc. material. If these polymer materials are used, monomer species can be appropriately selected Type, crosslinking agent, degree of polymerization, etc., to easily form a tethered layer having the above-mentioned elastic modulus. The polymer material is excellent in affinity with the heat-expandable microspheres, the adhesive constituting the adhesive layer, and the substrate. These polymer materials may be used alone or in combination of two or more.

作為構成上述繫留層之材料,可使用可藉由活性能量線之照射而硬化(高彈性模數化)之樹脂材料。若藉由此種材料形成繫留層,則可獲得如下黏著片材:於貼附黏著片材時為低彈性,柔軟性較高,操作性優異,於貼附後可藉由照射活性能量線而調整為上述範圍之彈性模數。作為活性能量線,例如可列舉:γ射線、紫外線、可見光、紅外線(熱線)、射頻波、α射線、β射線、電子束、電漿流、游離射線、粒子束等。包含可藉由活性能量線之照射而硬化之樹脂材料的繫留層較佳為照射活性能量線後之上述藉由奈米壓痕法所測得之彈性模數成為上述範圍。又,包含可藉由活性能量線之照射而硬化之樹脂材料的繫留層較佳為照射活性能量線後之上述拉伸彈性模數及/或彎曲彈性模數成為上述範圍。 As the material constituting the mooring layer, a resin material that can be hardened (high elastic modulus) by irradiation with active energy rays can be used. If a tethered layer is formed from such a material, the following adhesive sheet can be obtained: low elasticity, high flexibility, and excellent operability when attaching an adhesive sheet, and can be irradiated with active energy rays after attaching And adjusted to the elastic modulus of the above range. Examples of the active energy rays include gamma rays, ultraviolet rays, visible light, infrared rays (hot rays), radio frequency waves, alpha rays, beta rays, electron beams, plasma flow, free rays, and particle beams. The tethered layer containing a resin material that can be hardened by irradiation with active energy rays is preferably the above-mentioned elastic modulus measured by the nanoindentation method after irradiation with active energy rays. The tethered layer containing a resin material that can be hardened by irradiation with active energy rays is preferably such that the above-mentioned tensile elastic modulus and / or flexural elastic modulus after irradiation with active energy rays fall within the above range.

作為可藉由照射活性能量線而硬化(高彈性模數化)之樹脂材料,例如可列舉:紫外線硬化系統(加藤清視著,綜合技術中心發行,(1989))、光硬化技術(技術資訊協會編(2000))、日本專利特開2003-292916號公報、日本專利4151850號等所記載之樹脂材料。更具體而言,可列舉含有成為母劑之聚合物與活性能量線反應性化合物(單體或低聚物)之樹脂材料(R1)、含有活性能量線反應性聚合物之樹脂材料(R2)等。 Examples of resin materials that can be cured (highly elastic modulus) by irradiating active energy rays include, for example, ultraviolet curing systems (Kato Kiyo, issued by the Comprehensive Technology Center, (1989)), and light curing technology (Technical Information) Association (2000)), Japanese Patent Laid-Open No. 2003-292916, Japanese Patent No. 4151850, and other resin materials. More specifically, a resin material (R1) containing a polymer serving as a mother agent and an active energy ray reactive compound (monomer or oligomer), and a resin material (R2) containing an active energy ray reactive polymer may be mentioned. Wait.

作為上述成為母劑之聚合物,例如可列舉:天然橡膠、聚異丁烯橡膠、苯乙烯-丁二烯橡膠、苯乙烯-異戊二烯-苯乙烯嵌段共聚物橡膠、再生橡膠、丁基橡膠、聚異丁烯橡膠、腈橡膠(NBR)等橡膠系聚合物;聚矽氧系聚合物;丙烯酸系聚合物等。該等聚合物可單獨使用,或組 合使用2種以上。 Examples of the polymer used as the mother agent include natural rubber, polyisobutylene rubber, styrene-butadiene rubber, styrene-isoprene-styrene block copolymer rubber, recycled rubber, and butyl rubber. , Polyisobutylene rubber, nitrile rubber (NBR) and other rubber-based polymers; silicone polymers; acrylic polymers. These polymers can be used alone or in groups Use 2 or more types together.

作為上述活性能量線反應性化合物,例如可列舉:具有丙烯醯基、甲基丙烯醯基、乙烯基、烯丙基、乙炔基等具有碳-碳多重鍵之官能基的光反應性之單體或低聚物。作為該光反應性之單體或低聚物之具體例,可列舉:三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇單羥基五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯等含(甲基)丙烯醯基之化合物;該含(甲基)丙烯醯基之化合物之二聚物~五聚物等。 Examples of the active energy ray-reactive compound include photoreactive monomers having a functional group having a carbon-carbon multiple bond, such as acrylfluorenyl, methacrylfluorenyl, vinyl, allyl, and ethynyl. Or oligomers. Specific examples of the photoreactive monomer or oligomer include trimethylolpropane tri (meth) acrylate, tetramethylolmethane tetra (meth) acrylate, and pentaerythritol tri (methyl) ) Acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol monohydroxypenta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, polyethylene glycol di (meth) acrylate, etc. (meth) acrylfluorenyl-containing compounds; the (meth) acrylfluorenyl-containing compounds Dimer to pentamer.

又,作為上述活性能量線反應性化合物,亦可使用環氧化丁二烯、甲基丙烯酸縮水甘油酯、丙烯醯胺、乙烯基矽氧烷等單體;或包含該單體之低聚物。含有該等化合物之樹脂材料(R1)可藉由紫外線、電子束等高能量線而硬化。 In addition, as the active energy ray reactive compound, monomers such as epoxidized butadiene, glycidyl methacrylate, acrylamide, and vinylsiloxane; or oligomers containing the monomers can also be used. The resin material (R1) containing these compounds can be hardened by high energy rays such as ultraviolet rays and electron beams.

進而,作為上述活性能量線反應性化合物,亦可使用鎓鹽等有機鹽類與分子內具有複數個雜環之化合物之混合物。該混合物藉由活性能量線(例如,紫外線、電子束)之照射,有機鹽裂解而生成離子,其成為起始種而引起雜環之開環反應,可形成立體網狀結構。作為上述有機鹽類,例如可列舉:錪鹽、鏻鹽、銨鹽、鋶鹽、硼酸鹽等。作為上述分子內具有複數個雜環之化合物中之雜環,可列舉氧雜環丙烷、氧雜環丁烷、氧雜環戊烷、硫雜環丙烷、氮丙啶等。 Further, as the active energy ray-reactive compound, a mixture of an organic salt such as an onium salt and a compound having a plurality of heterocycles in the molecule may be used. The mixture is irradiated with active energy rays (eg, ultraviolet rays, electron beams), and the organic salt is cleaved to generate ions, which become the starting species and cause a ring-opening reaction of the heterocyclic ring to form a three-dimensional network structure. Examples of the organic salts include phosphonium salts, phosphonium salts, ammonium salts, phosphonium salts, and borate salts. Examples of the heterocyclic ring in the compound having a plurality of heterocyclic rings in the molecule include oxepane, oxetane, oxetane, thiocyclopropane, and aziridine.

於上述含有成為母劑之聚合物與活性能量線反應性化合物之樹脂材料(R1)中,活性能量線反應性化合物之含有比率相對於成為母劑之聚合物100重量份,較佳為0.1重量份~500重量份,更佳為1重量份~300重量份,進而較佳為10重量份~200重量份。 In the resin material (R1) containing the polymer serving as the mother agent and the active energy ray reactive compound, the content ratio of the active energy ray reactive compound is preferably 0.1 part by weight relative to 100 parts by weight of the polymer serving as the mother agent. Parts to 500 parts by weight, more preferably 1 part to 300 parts by weight, and still more preferably 10 parts to 200 parts by weight.

上述含有成為母劑之聚合物與活性能量線反應性化合物之樹脂 材料(R1)可視需要而含有任意合適之添加劑。作為添加劑,例如可列舉:活性能量線聚合起始劑、活性能量線聚合促進劑、交聯劑、塑化劑、硫化劑等。作為活性能量線聚合起始劑,可根據所使用之活性能量線之種類而使用任意合適之起始劑。活性能量線聚合起始劑可單獨使用,或組合使用2種以上。於含有成為母劑之聚合物與活性能量線反應性化合物之樹脂材料(R1)中,活性能量線聚合起始劑之含有比率相對於成為母劑之聚合物100重量份,較佳為0.1重量份~10重量份,更佳為1重量份~5重量份。 Resin containing polymer as active ingredient and active energy ray reactive compound The material (R1) may contain any suitable additives as required. Examples of the additives include an active energy ray polymerization initiator, an active energy ray polymerization accelerator, a crosslinking agent, a plasticizer, and a vulcanizing agent. As the active energy ray polymerization initiator, any appropriate initiator can be used according to the kind of active energy ray used. The active energy ray polymerization initiator may be used alone or in combination of two or more. In the resin material (R1) containing the polymer serving as the mother agent and the active energy ray reactive compound, the content ratio of the active energy ray polymerization initiator relative to 100 parts by weight of the polymer serving as the mother agent, preferably 0.1 weight Parts to 10 parts by weight, more preferably 1 to 5 parts by weight.

作為上述活性能量線反應性聚合物,例如可列舉:具有丙烯醯基、甲基丙烯醯基、乙烯基、烯丙基、乙炔基等具有碳-碳多重鍵之官能基的聚合物。作為含有活性能量線反應性官能基之聚合物之具體例,可列舉:含有多官能(甲基)丙烯酸酯之聚合物;光致陽離子聚合型聚合物;聚乙烯肉桂酸酯等含肉桂醯基之聚合物;經重氮化之胺基酚醛樹脂;聚丙烯醯胺等。又,作為含有活性能量線反應性聚合物之樹脂材料(R2),亦可使用含有烯丙基之活性能量線反應性聚合物與含有硫醇基之化合物之混合物。再者,只要於利用活性能量線照射所進行之硬化前(例如,貼附黏著片材時),可形成具有可實用之硬度(黏度)之繫留層前驅物,則除含有活性能量線反應性官能基之聚合物以外,亦可使用含有活性能量線反應性官能基之低聚物。 Examples of the active energy ray-reactive polymer include polymers having a functional group having a carbon-carbon multiple bond, such as acrylfluorenyl, methacrylfluorenyl, vinyl, allyl, and ethynyl. Specific examples of the polymer containing an active energy ray-reactive functional group include a polymer containing a polyfunctional (meth) acrylate, a photocationic polymer, and a cinnamyl group containing a polyvinyl cinnamate. Polymers; diazotized amine phenolic resins; polypropylene amines, etc. As the resin material (R2) containing an active energy ray reactive polymer, a mixture of an allyl-containing active energy ray reactive polymer and a thiol group-containing compound may be used. In addition, as long as a precursor of a tether layer having a practical hardness (viscosity) can be formed before hardening by active energy ray irradiation (for example, when attaching an adhesive sheet), the active energy ray reaction is included in addition In addition to the polymer having a functional group, an oligomer containing an active energy ray-reactive functional group may be used.

上述含有活性能量線反應性聚合物之樹脂材料(R2)可進而含有上述活性能量線反應性化合物(單體或低聚物)。又,上述含有活性能量線反應性聚合物之樹脂材料(R2)可視需要而含有任意合適之添加劑。添加劑之具體例與含有成為母劑之聚合物與活性能量線反應性化合物之樹脂材料(R1)可含有之添加劑相同。於含有活性能量線反應性聚合物之樹脂材料(R2)中,活性能量線聚合起始劑之含有比率相對於活性能量線反應性聚合物100重量份,較佳為0.1重量份~10重量份,更佳 為1重量份~5重量份。 The resin material (R2) containing the active energy ray reactive polymer may further contain the active energy ray reactive compound (monomer or oligomer). The resin material (R2) containing the active energy ray-reactive polymer described above may contain any appropriate additives as necessary. Specific examples of the additives are the same as the additives that can be contained in the resin material (R1) containing the polymer serving as the mother agent and the active energy ray-reactive compound. In the resin material (R2) containing the active energy ray reactive polymer, the content ratio of the active energy ray polymerization initiator is 100 parts by weight with respect to the active energy ray reactive polymer, and preferably 0.1 to 10 parts by weight , Better It is 1 to 5 parts by weight.

上述繫留層可進而含有珠粒。作為該珠粒,例如可列舉:玻璃珠、樹脂珠等。若於繫留層添加此種珠粒,則可獲得可提高繫留層之彈性模數、可精度更良好地加工被加工物之黏著片材。珠粒之平均粒徑例如為0.01μm~50μm。珠粒之添加量相對於繫留層整體100重量份,例如為10重量份~200重量份,較佳為20重量份~100重量份。 The mooring layer may further contain beads. Examples of the beads include glass beads and resin beads. If such beads are added to the mooring layer, an adhesive sheet can be obtained which can improve the elastic modulus of the mooring layer and can process the object more accurately. The average particle diameter of the beads is, for example, 0.01 μm to 50 μm. The added amount of the beads is, for example, 10 to 200 parts by weight, and preferably 20 to 100 parts by weight with respect to 100 parts by weight of the entire tethered layer.

C.黏著劑層 C. Adhesive layer

上述黏著劑層較佳為含有黏著劑與熱膨脹性微球。 The adhesive layer preferably contains an adhesive and thermally expandable microspheres.

上述黏著劑層之厚度較佳為20μm以下,更佳為0.1μm~20μm,進而較佳為1μm~15μm,尤佳為1μm~10μm。於黏著劑層之厚度厚於20μm之情形時,在用作對電子零件等進行切斷加工時之暫時固定用片材之情形時,有產生如下異常情況之虞:切斷後之晶片再附著;切斷面變得不穩定;切斷時產生晶片缺損;產生切削屑等。於本發明中,藉由具備繫留層,而容許熱膨脹性微球自黏著劑層突出,可使黏著劑層變薄。另一方面,於黏著劑層之厚度未達0.1μm之情形時,有無法獲得充分之黏著力之虞。再者,於本說明書中,所謂黏著劑層之厚度,如圖1所示係指自構成繫留層20之材料與構成黏著劑層10之黏著劑12之界面至黏著劑層之與該界面相反之側之面為止之距離。即,熱膨脹性微球11自黏著劑層10突出之部分並非黏著劑層之厚度之評估對象。再者,作為構成繫留層20之材料與構成黏著劑層10之黏著劑12之界面之辨別方法,如上述B項所述。 The thickness of the adhesive layer is preferably 20 μm or less, more preferably 0.1 μm to 20 μm, still more preferably 1 μm to 15 μm, and even more preferably 1 μm to 10 μm. When the thickness of the adhesive layer is more than 20 μm, when it is used as a temporary fixing sheet when cutting electronic parts, the following abnormalities may occur: the wafer after cutting is reattached; cutting The cross section becomes unstable; wafer defects occur during cutting; chippings, etc. occur. In the present invention, by providing a tethering layer, the thermally expandable microspheres are allowed to protrude from the adhesive layer, and the adhesive layer can be made thin. On the other hand, when the thickness of the adhesive layer is less than 0.1 μm, sufficient adhesive force may not be obtained. Furthermore, in this specification, the thickness of the adhesive layer refers to the interface between the material constituting the tether layer 20 and the adhesive 12 constituting the adhesive layer 10 to the interface between the adhesive layer and the interface as shown in FIG. 1. The distance to the opposite side. That is, a part of the thermally expandable microspheres 11 protruding from the adhesive layer 10 is not an evaluation target of the thickness of the adhesive layer. Furthermore, the method of distinguishing the interface between the material constituting the tethered layer 20 and the adhesive 12 constituting the adhesive layer 10 is as described in the above item B.

上述黏著劑層較佳為含有具有大於該黏著劑層之厚度之粒徑的熱膨脹性微球。換言之,上述黏著劑層之厚度可小於上述熱膨脹性微球之粒徑。於本發明中,由於可使黏著劑層變薄,因此可獲得作為對電子零件等進行切斷加工時之暫時固定用片材而有助於實現優異之切斷精度之黏著片材。 The adhesive layer preferably contains thermally expandable microspheres having a particle diameter larger than the thickness of the adhesive layer. In other words, the thickness of the adhesive layer may be smaller than the particle diameter of the thermally expandable microspheres. In the present invention, since the adhesive layer can be made thin, it is possible to obtain an adhesive sheet that is useful as a temporary fixing sheet when cutting an electronic component or the like and contributes to excellent cutting accuracy.

貼附本發明之黏著片材時之溫度下的上述黏著劑層之藉由奈米壓痕法所測得之彈性模數較佳為未達100MPa,更佳為0.1MPa~50MPa,進而較佳為0.1MPa~10MPa。黏著劑層之所謂藉由奈米壓痕法所測得之彈性模數係指選擇不存在熱膨脹性微球之部分,藉由上述B項所說明之測定方法測得之彈性模數、即黏著劑之彈性模數。所謂貼附上述黏著片材時之溫度,例如於使用丙烯酸系黏著劑作為黏著劑之情形時為10℃~80℃,於使用苯乙烯-二烯嵌段共聚物系黏著劑作為黏著劑之情形時為40℃~120℃。 The elastic modulus of the above-mentioned adhesive layer at the temperature when the adhesive sheet of the present invention is measured by the nanoindentation method is preferably less than 100 MPa, more preferably 0.1 MPa to 50 MPa, and even more preferably 0.1MPa ~ 10MPa. The so-called elastic modulus of the adhesive layer measured by the nano-indentation method refers to the elastic modulus measured by the measurement method described in item B above, which is the portion where no thermally expandable microspheres are selected, that is, the adhesive Modulus of elasticity. The temperature when the above-mentioned adhesive sheet is attached is, for example, 10 ° C. to 80 ° C. when an acrylic adhesive is used as the adhesive, and when a styrene-diene block copolymer-based adhesive is used as the adhesive. At 40 ℃ ~ 120 ℃.

(黏著劑) (Adhesive)

作為上述黏著劑,較佳為加熱時不限制熱膨脹性微球之膨脹或發泡者。作為該黏著劑,例如可列舉:丙烯酸系黏著劑、橡膠系黏著劑、乙烯基烷基醚系黏著劑、聚矽氧系黏著劑、聚酯系黏著劑、聚醯胺系黏著劑、胺基甲酸酯系黏著劑、苯乙烯-二烯嵌段共聚物系黏著劑、放射線硬化型黏著劑、於該等黏著劑中調配有熔點約為200℃以下之熱熔融性樹脂的蠕變特性改良型黏著劑等(例如,參照日本專利特開昭56-61468號公報、日本專利特開昭63-17981號公報等)。其中較佳為丙烯酸系黏著劑或橡膠系黏著劑。再者,上述黏著劑可單獨使用,或組合使用2種以上。 The adhesive is preferably one that does not restrict the expansion or foaming of the thermally expandable microspheres during heating. Examples of the adhesive include an acrylic adhesive, a rubber adhesive, a vinyl alkyl ether adhesive, a silicone adhesive, a polyester adhesive, a polyamide adhesive, and an amine group. Improved creep properties of formate-based adhesives, styrene-diene block copolymer-based adhesives, radiation-hardening adhesives, and hot-melt resins with a melting point of about 200 ° C or less in these adhesives Type adhesive and the like (for example, refer to Japanese Patent Laid-Open No. 56-61468, Japanese Patent Laid-Open No. 63-17981, and the like). Among these, an acrylic adhesive or a rubber adhesive is preferable. In addition, the said adhesive can be used individually or in combination of 2 or more types.

作為上述丙烯酸系黏著劑,例如可列舉:以將(甲基)丙烯酸烷基酯之1種或2種以上用作單體成分之丙烯酸系聚合物(均聚物或共聚物)作為基礎聚合物之丙烯酸系黏著劑等。作為(甲基)丙烯酸烷基酯之具體例,可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙 烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯等(甲基)丙烯酸C1-20烷基酯。其中,可較佳地使用具有碳數為4~18之直鏈狀或支鏈狀之烷基的(甲基)丙烯酸烷基酯。 Examples of the acrylic adhesive include an acrylic polymer (homopolymer or copolymer) using one or more alkyl (meth) acrylates as a monomer component as a base polymer. Acrylic adhesives. Specific examples of the alkyl (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, and (methyl) Base) butyl acrylate, isobutyl (meth) acrylate, second butyl (meth) acrylate, third butyl (meth) acrylate, amyl (meth) acrylate, hexyl (meth) acrylate , Heptyl (meth) acrylate, octyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isooctyl (meth) acrylate, nonyl (meth) acrylate, (meth) C Isononyl enoate, decyl (meth) acrylate, isodecyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate, (meth) acrylic acid Tridecyl ester, tetradecyl (meth) acrylate, pentadecyl (meth) acrylate, cetyl (meth) acrylate, heptadecyl (meth) acrylate, C1-20 alkyl (meth) acrylates, such as octadecyl (meth) acrylate, undecyl (meth) acrylate, and eicosyl (meth) acrylate. Among them, an alkyl (meth) acrylate having a linear or branched alkyl group having 4 to 18 carbon atoms can be preferably used.

以凝集力、耐熱性、交聯性等之改質為目的,上述丙烯酸系聚合物可視需要而含有可與上述(甲基)丙烯酸烷基酯共聚合之其他單體成分所對應之單元。作為此種單體成分,例如可列舉:丙烯酸、甲基丙烯酸、丙烯酸羧基乙酯、丙烯酸羧基戊酯、伊康酸、順丁烯二酸、反丁烯二酸、丁烯酸等含羧基之單體;順丁烯二酸酐、伊康酸酐等酸酐單體;(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸羥基丙酯、(甲基)丙烯酸羥基丁酯、(甲基)丙烯酸羥基己酯、(甲基)丙烯酸羥基辛酯、(甲基)丙烯酸羥基癸酯、(甲基)丙烯酸羥基月桂酯、甲基丙烯酸(4-羥基甲基環己基)甲酯等含羥基之單體;苯乙烯磺酸、烯丙基磺酸、2-(甲基)丙烯醯胺-2-甲基丙磺酸、(甲基)丙烯醯胺丙磺酸、(甲基)丙烯酸磺丙酯、(甲基)丙烯醯氧基萘磺酸等含磺酸基之單體;(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥甲基丙烷(甲基)丙烯醯胺等(N-取代)醯胺系單體;(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸N,N-二甲胺基乙酯、(甲基)丙烯酸第三丁基胺基乙酯等(甲基)丙烯酸胺基烷基酯系單體;(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯等(甲基)丙烯酸烷氧基烷基酯系單體;N-環己基順丁烯二醯亞胺、N-異丙基順丁烯二醯亞胺、N-月桂基順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺等順丁烯二醯亞胺系單體;N-甲基伊康醯亞胺、N-乙基伊康醯亞胺、N-丁基伊康醯亞胺、N-辛基伊康醯 亞胺、N-2-乙基己基伊康醯亞胺、N-環己基伊康醯亞胺、N-月桂基伊康醯亞胺等伊康醯亞胺系單體;N-(甲基)丙烯醯氧基亞甲基琥珀醯亞胺、N-(甲基)丙烯醯基-6-氧基六亞甲基琥珀醯亞胺、N-(甲基)丙烯醯基-8-氧基八亞甲基琥珀醯亞胺等琥珀醯亞胺系單體;乙酸乙烯酯、丙酸乙烯酯、N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌、乙烯基吡、乙烯基吡咯、乙烯基咪唑、乙烯基唑、乙烯基嗎啉、N-乙烯基羧醯胺類、苯乙烯、α-甲基苯乙烯、N-乙烯基己內醯胺等乙烯系單體;丙烯腈、甲基丙烯腈等氰基丙烯酸酯單體;(甲基)丙烯酸縮水甘油酯等含環氧基之丙烯酸系單體;聚乙二醇(甲基)丙烯酸酯、聚丙二醇(甲基)丙烯酸酯、甲氧基乙二醇(甲基)丙烯酸酯、甲氧基聚丙二醇(甲基)丙烯酸酯等二醇系丙烯酸酯單體;(甲基)丙烯酸四氫糠酯、含氟(甲基)丙烯酸酯、聚矽氧(甲基)丙烯酸酯等具有雜環、鹵素原子、矽原子等之丙烯酸酯系單體;己二醇二(甲基)丙烯酸酯、(聚)乙二醇二(甲基)丙烯酸酯、(聚)丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、環氧丙烯酸酯、聚酯丙烯酸酯、丙烯酸胺基甲酸酯等多官能單體;異戊二烯、丁二烯、異丁烯等烯烴系單體;乙烯醚等乙烯醚系單體等。該等單體成分可單獨使用,或組合使用2種以上。 For the purpose of improving the cohesive force, heat resistance, and cross-linking properties, the acrylic polymer may contain units corresponding to other monomer components that can be copolymerized with the alkyl (meth) acrylate, as necessary. Examples of such monomer components include carboxyl-containing compounds such as acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, and butenoic acid. Monomers; anhydride monomers such as maleic anhydride, itaconic anhydride; hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, hydroxy (meth) acrylate Hexyl ester, hydroxyoctyl (meth) acrylate, hydroxydecyl (meth) acrylate, hydroxylauryl (meth) acrylate, (4-hydroxymethylcyclohexyl) methyl methacrylate and other monomers containing hydroxyl groups ; Styrene sulfonic acid, allyl sulfonic acid, 2- (meth) acrylamido-2-methylpropanesulfonic acid, (meth) acrylamidopropanesulfonic acid, sulfopropyl (meth) acrylate, (Meth) acrylic acid oxynaphthalenesulfonic acid and other monomers containing sulfonic acid groups; (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N-butyl (methyl) ) (N-substituted) fluorenamine monomers such as acrylamide, N-methylol (meth) acrylamide, N-methylolpropane (meth) acrylamide; (meth) acrylamine Ethyl ester, (meth) acrylic N, N-di (Aminoalkyl (meth) acrylate-based monomers such as aminoethyl ester and third butylaminoethyl (meth) acrylate; methoxyethyl (meth) acrylate, ethyl (meth) acrylate) (Meth) acrylic alkoxyalkyl ester-based monomers; N-cyclohexylcis-butenedifluoreneimide, N-isopropylcisbutenedifluoreneimine, N-laurylcis Butene difluorene imide monomers such as butene difluorene imine, N-phenylcis butylene diimide; N-methyl Ikonimine, N-ethyl Ikonimine, N-butyl Ikonimide, N-octyl Ikonimide, N-2-Ethylhexyl Ikonimide, N-Cyclohexyl Ikonimide, N-Lauryl Ikonimide Ikon 醯 imine-based monomers such as imine; N- (meth) acryloxymethylene succinimide, N- (meth) acryl 醯 -6-oxyhexamethylene succinimide Succinimide-based monomers such as imine, N- (meth) acrylfluorenyl-8-oxyoctamethylene succinimide; vinyl acetate, vinyl propionate, N-vinylpyrrolidone , Methyl vinyl pyrrolidone, vinyl pyridine, vinyl piperidone, vinyl pyrimidine, vinyl piperidine Vinylpyridine , Vinylpyrrole, vinylimidazole, vinyl Vinyl monomers such as azole, vinylmorpholine, N-vinylcarboxamides, styrene, α-methylstyrene, N-vinyl caprolactam; cyano groups such as acrylonitrile, methacrylonitrile Acrylate monomer; epoxy-containing acrylic monomers such as glycidyl (meth) acrylate; polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate, methoxyethylene glycol (Meth) acrylates, diol acrylic acrylate monomers such as methoxy polypropylene glycol (meth) acrylate; tetrahydrofurfuryl (meth) acrylate, fluorine-containing (meth) acrylate, polysiloxane ( Acrylic monomers having heterocyclic rings, halogen atoms, silicon atoms, etc. such as meth) acrylates; hexanediol di (meth) acrylate, (poly) ethylene glycol di (meth) acrylate, (poly ) Propylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) Multifunctional monomers such as acrylate, dipentaerythritol hexa (meth) acrylate, epoxy acrylate, polyester acrylate, and urethane acrylate ; Olefin monomers, such as isoprene, butadiene, isobutylene; vinyl ether monomers, such as vinyl ether. These monomer components can be used alone or in combination of two or more.

作為上述橡膠系黏著劑,例如可列舉以如下者作為基礎聚合物之橡膠系黏著劑:天然橡膠;聚異戊二烯橡膠、苯乙烯-丁二烯(SB)橡膠、苯乙烯-異戊二烯(SI)橡膠、苯乙烯-異戊二烯-苯乙烯嵌段共聚物(SIS)橡膠、苯乙烯-丁二烯-苯乙烯嵌段共聚物(SBS)橡膠、苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS)橡膠、苯乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEPS)橡膠、苯乙烯-乙烯-丙烯嵌段共聚物(SEP)橡膠、再生橡膠、 丁基橡膠、聚異丁烯、該等之改性體等合成橡膠等。 Examples of the rubber-based adhesive include rubber-based adhesives based on the following polymers: natural rubber; polyisoprene rubber, styrene-butadiene (SB) rubber, and styrene-isoprene (SI) rubber, styrene-isoprene-styrene block copolymer (SIS) rubber, styrene-butadiene-styrene block copolymer (SBS) rubber, styrene-ethylene-butene -Styrene block copolymer (SEBS) rubber, styrene-ethylene-propylene-styrene block copolymer (SEPS) rubber, styrene-ethylene-propylene block copolymer (SEP) rubber, recycled rubber, Synthetic rubbers such as butyl rubber, polyisobutylene, and modified products thereof.

上述黏著劑可視需要而含有任意合適之添加劑。作為該添加劑,例如可列舉:交聯劑、黏著賦予劑、塑化劑(例如,偏苯三甲酸酯系塑化劑、均苯四甲酸酯系塑化劑)、顏料、染料、填充劑、抗老化劑、導電材料、抗靜電劑、紫外線吸收劑、光穩定劑、剝離調整劑、軟化劑、界面活性劑、阻燃劑、抗氧化劑等。 The above-mentioned adhesive may contain any appropriate additives as needed. Examples of the additive include a crosslinking agent, an adhesion-imparting agent, a plasticizer (for example, a trimellitate-based plasticizer, a pyromellitic-based plasticizer), a pigment, a dye, and a filler. , Anti-aging agent, conductive material, antistatic agent, ultraviolet absorber, light stabilizer, peeling adjuster, softener, surfactant, flame retardant, antioxidant, etc.

作為上述黏著賦予劑,可使用任意合適之黏著賦予劑。作為黏著賦予劑,例如可使用黏著賦予樹脂。作為黏著賦予樹脂之具體例,可列舉:松香系黏著賦予樹脂(例如,未改性松香、改性松香、松香酚系樹脂、松香酯系樹脂等)、萜烯系黏著賦予樹脂(例如,萜烯系樹脂、萜烯-酚系樹脂、苯乙烯改性萜烯系樹脂、芳香族改性萜烯系樹脂、氫化萜烯系樹脂)、烴系黏著賦予樹脂(例如,脂肪族系烴樹脂、脂肪族系環狀烴樹脂、芳香族系烴樹脂(例如,苯乙烯系樹脂、二甲苯系樹脂等)、脂肪族-芳香族系石油樹脂、脂肪族-脂環族系石油樹脂、氫化烴樹脂、薰草咔系樹脂、薰草咔茚系樹脂等)、酚系黏著賦予樹脂(例如,烷酚系樹脂、二甲苯甲醛系樹脂、可溶酚醛樹脂、酚醛樹脂等)、酮系黏著賦予樹脂、聚醯胺系黏著賦予樹脂、環氧系黏著賦予樹脂、彈性體系黏著賦予樹脂等。其中較佳為松香系黏著賦予樹脂、萜烯系黏著賦予樹脂或烴系黏著賦予樹脂(苯乙烯系樹脂等)。黏著賦予劑可單獨使用,或組合使用2種以上。 As the adhesion-imparting agent, any appropriate adhesion-imparting agent can be used. As the adhesion-imparting agent, for example, an adhesion-imparting resin can be used. Specific examples of the adhesion-imparting resin include rosin-based adhesion-imparting resin (for example, unmodified rosin, modified rosin, rosin phenol-based resin, rosin ester-based resin, etc.), and terpene-based adhesion-imparting resin (for example, terpene Ethylene resins, terpene-phenol resins, styrene-modified terpene resins, aromatic modified terpene resins, hydrogenated terpene resins, hydrocarbon-based adhesion-imparting resins (for example, aliphatic hydrocarbon resins, Aliphatic cyclic hydrocarbon resin, aromatic hydrocarbon resin (for example, styrene resin, xylene resin, etc.), aliphatic-aromatic petroleum resin, aliphatic-alicyclic petroleum resin, hydrogenated hydrocarbon resin , Lavender resin, lavender resin, etc.), phenol-based adhesion-imparting resin (for example, alkanol-based resin, xylene formaldehyde-based resin, soluble phenolic resin, phenolic resin, etc.) Polyamine-based adhesion-imparting resin, epoxy-based adhesion-imparting resin, elastic system adhesion-imparting resin, and the like. Among them, a rosin-based adhesion-imparting resin, a terpene-based adhesion-imparting resin, or a hydrocarbon-based adhesion-imparting resin (such as a styrene-based resin) is preferred. The adhesion-imparting agent can be used alone or in combination of two or more.

上述黏著賦予劑亦可使用市售品。作為市售品之黏著賦予劑之具體例,可列舉:Yasuhara Chemical公司製造之商品名「YS Polystar S145」、「Mighty Ace K140」、荒川化學公司製造之商品名「Tamanol 901」等萜烯-酚系樹脂;Sumitomo Bakelite公司製造之商品名「Sumilite Resin PR-12603」、荒川化學公司製造之商品名「Tamanol 361」等松香酚系樹脂;荒川化學公司製造之商品名「Tamanol 1010R」、「Tamanol 200N」等烷酚系樹脂;荒川化學公司製造之商品名「Arkon P-140」等脂環族系飽和烴樹脂等。 A commercial item can also be used for the said adhesion-imparting agent. Specific examples of the adhesion-imparting agent commercially available include terpene-phenols such as trade names "YS Polystar S145", "Mighty Ace K140" manufactured by Yasuhara Chemical, and "Tamanol 901" manufactured by Arakawa Chemical. Resins; rosin phenol resins such as "Sumilite Resin PR-12603" manufactured by Sumitomo Bakelite; "Tamanol 361" manufactured by Arakawa Chemical; and "Tamanol 1010R" and "Tamanol" manufactured by Arakawa Chemical "200N" and other alkanol-based resins; alicyclic saturated hydrocarbon resins such as "Arkon P-140" manufactured by Arakawa Chemical Company.

上述黏著賦予劑之添加量相對於基礎聚合物100重量份,較佳為5重量份~100重量份,更佳為10重量份~50重量份。 The added amount of the adhesion-imparting agent is preferably 5 to 100 parts by weight, and more preferably 10 to 50 parts by weight, based on 100 parts by weight of the base polymer.

作為上述交聯劑,例如,除異氰酸酯系交聯劑、環氧系交聯劑、三聚氰胺系交聯劑、過氧化物系交聯劑以外,可列舉脲系交聯劑、金屬烷氧化物系交聯劑、金屬螯合物系交聯劑、金屬鹽系交聯劑、碳二醯亞胺系交聯劑、唑啉系交聯劑、氮丙啶系交聯劑、胺系交聯劑等。其中較佳為異氰酸酯系交聯劑或環氧系交聯劑。 Examples of the crosslinking agent include, in addition to isocyanate-based crosslinking agents, epoxy-based crosslinking agents, melamine-based crosslinking agents, and peroxide-based crosslinking agents, urea-based crosslinking agents and metal alkoxide-based crosslinking agents. Crosslinking agent, metal chelate crosslinking agent, metal salt crosslinking agent, carbodiimide crosslinking agent, An oxazoline-based crosslinking agent, an aziridine-based crosslinking agent, an amine-based crosslinking agent, and the like. Among these, an isocyanate-based crosslinking agent or an epoxy-based crosslinking agent is preferred.

作為上述異氰酸酯系交聯劑之具體例,可列舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族聚異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物(日本聚氨酯工業公司製造、商品名「Coronate L」)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(日本聚氨酯工業公司製造、商品名「Coronate HL」)、六亞甲基二異氰酸酯之異氰尿酸酯體(日本聚氨酯工業公司製造、商品名「Coronate HX」)等異氰酸酯加成物等。異氰酸酯系交聯劑之含量可根據所需之黏著力而設定為任意合適之量,相對於基礎聚合物100重量份,具代表性之量為0.1重量份~20重量份,更佳為0.5重量份~10重量份。 Specific examples of the isocyanate-based crosslinking agent include lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; cyclopentyl diisocyanate, cyclohexyl diisocyanate, and isophorone. Cycloaliphatic isocyanates such as diisocyanate; aromatic isocyanates such as 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate; trimethylolpropane / toluene diisocyanate Terpolymer adduct (manufactured by Japan Polyurethane Industry Corporation, trade name "Coronate L"), trimethylolpropane / hexamethylene diisocyanate terpolymer adduct (manufactured by Japan Polyurethane Industry Corporation, trade name "Coronate L" HL "), isocyanurate bodies of hexamethylene diisocyanate (manufactured by Japan Polyurethane Industry Co., Ltd., trade name" Coronate HX "), and the like. The content of the isocyanate-based cross-linking agent can be set to any suitable amount according to the required adhesive force. The representative amount is 0.1 to 20 parts by weight, and more preferably 0.5 to 100 parts by weight of the base polymer. Parts ~ 10 parts by weight.

作為上述環氧系交聯劑,例如可列舉:N,N,N',N'-四縮水甘油基-間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-縮水甘油基胺基甲基)環己烷(Mitsubishi Gas Chemical公司製造、商品名「Tetrad C」)、1,6-己二醇二縮水甘油醚(共榮社化學公司製造、商品名「Epolight 1600」)、新戊二醇二縮水甘油醚(共榮社化學公司製造、商品名「Epolight 1500 NP」)、乙二醇二縮水甘油醚(共榮社化學公司製造、商品名「Epolight 40E」)、丙二醇二縮水甘油醚(共榮社化學公司製造、商品名「Epolight 70P」)、聚乙二醇二縮水甘油醚(日本油脂公司製造、商品名「Epiol E-400」)、聚丙二醇二縮水甘油醚(日本油脂公司製造、商品名「Epiol P-200」)、山梨糖醇聚縮水甘油醚(Nagase chemteX公司製造、商品名「Denacol EX-611」)、甘油聚縮水甘油醚(Nagase chemteX公司製造、商品名「Denacol EX-314」)、季戊四醇聚縮水甘油醚、聚甘油聚縮水甘油醚(Nagase chemteX公司製造、商品名「Denacol EX-512」)、山梨糖醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、三縮水甘油基-三(2-羥基乙基)異氰尿酸酯、間苯二酚二縮水甘油醚、雙酚S-二縮水甘油醚、分子內具有2個以上環氧基之環氧系樹脂等。環氧系交聯劑之含量可根據所需之黏著力而設定為任意合適之量,相對於基礎聚合物100重量份,具代表性之量為0.01重量份~10重量份,更佳為0.03重量份~5重量份。 Examples of the epoxy-based crosslinking agent include N, N, N ', N'-tetraglycidyl-m-xylylenediamine, diglycidylaniline, and 1,3-bis (N, N- Glycidylaminomethyl) cyclohexane (manufactured by Mitsubishi Gas Chemical Company, trade name "Tetrad C"), 1,6-hexanediol diglycidyl ether (manufactured by Kyoeisha Chemical Company, trade name "Epolight 1600" "), Neopentyl glycol diglycidyl ether (manufactured by Kyoeisha Chemical Co., Ltd., trade name" Epolight 1500 " NP "), ethylene glycol diglycidyl ether (manufactured by Kyoeisha Chemical Co., Ltd., trade name" Epolight 40E "), propylene glycol diglycidyl ether (manufactured by Kyoeisha Chemical Co., Ltd., trade name" Epolight 70P "), polyethylene Glycol diglycidyl ether (manufactured by Nippon Oil & Fats Co., Ltd. under the trade name "Epiol E-400"), polypropylene glycol diglycidyl ether (manufactured by Nippon Oil & Fats Co., Ltd. under the trade name "Epiol P-200"), sorbitol polyglycidyl ether Ether (manufactured by Nagase chemteX, trade name "Denacol EX-611"), glycerol polyglycidyl ether (manufactured by Nagase chemteX, trade name "Denacol EX-314"), pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether (Manufactured by Nagase chemteX, trade name "Denacol EX-512"), sorbitan polyglycidyl ether, trimethylolpropane polyglycidyl ether, adipic acid diglycidyl ester, diglycidyl phthalate Ester, triglycidyl-tris (2-hydroxyethyl) isocyanurate, resorcinol diglycidyl ether, bisphenol S-diglycidyl ether, a ring with two or more epoxy groups in the molecule Oxygen-based resins. The content of the epoxy-based cross-linking agent can be set to any suitable amount according to the required adhesive force. The representative amount is 0.01 to 10 parts by weight, and more preferably 0.03 to 100 parts by weight of the base polymer. Part by weight to 5 parts by weight.

(熱膨脹性微球) (Thermally expandable microspheres)

作為上述熱膨脹性微球,只要為可藉由加熱而膨脹或發泡之微球,則可使用任意合適之熱膨脹性微球。作為上述熱膨脹性微球,例如可使用使藉由加熱容易膨脹之物質內包於具有彈性之殼內而成之微球。此種熱膨脹性微球可藉由任意合適之方法製造,例如凝聚法、界面聚合法等。 As the thermally expandable microspheres, any suitable thermally expandable microspheres can be used as long as they are microspheres that can be expanded or expanded by heating. As the thermally expandable microspheres, for example, microspheres formed by encapsulating a substance that is easily expanded by heating in a shell having elasticity can be used. Such thermally expandable microspheres can be produced by any suitable method, such as a coacervation method and an interfacial polymerization method.

作為藉由加熱而容易膨脹之物質,例如可列舉:丙烷、丙烯、丁烯、正丁烷、異丁烷、異戊烷、新戊烷、正戊烷、正己烷、異己烷、庚烷、辛烷、石油醚、甲烷之鹵化物、四烷基矽烷等低沸點液體;藉由熱分解而氣化之偶氮二甲醯胺等。 Examples of substances that can be easily expanded by heating include propane, propylene, butene, n-butane, isobutane, isopentane, neopentane, n-pentane, n-hexane, isohexane, heptane, Low boiling point liquids such as octane, petroleum ether, halides of methane, and tetraalkylsilane; azodimethoxamine gasified by thermal decomposition.

作為構成上述殼之物質,例如可列舉包含如下者之聚合物:丙烯腈、甲基丙烯腈、α-氯丙烯腈、α-乙氧基丙烯腈、反丁烯二腈等腈單 體;丙烯酸、甲基丙烯酸、伊康酸、順丁烯二酸、反丁烯二酸、檸康酸等羧酸單體;偏二氯乙烯;乙酸乙烯酯;(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸異酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苄酯、丙烯酸β-羧基乙酯等(甲基)丙烯酸酯;苯乙烯、α-甲基苯乙烯、氯苯乙烯等苯乙烯單體;丙烯醯胺、取代丙烯醯胺、甲基丙烯醯胺、取代甲基丙烯醯胺等醯胺單體等。包含該等單體之聚合物可為均聚物,亦可為共聚物。作為該共聚物,例如可列舉:偏二氯乙烯-甲基丙烯酸甲酯-丙烯腈共聚物、甲基丙烯酸甲酯-丙烯腈-甲基丙烯腈共聚物、甲基丙烯酸甲酯-丙烯腈共聚物、丙烯腈-甲基丙烯腈-伊康酸共聚物等。 Examples of the substance constituting the shell include polymers including acrylonitrile, methacrylonitrile, α-chloroacrylonitrile, α-ethoxyacrylonitrile, and butadienenitrile; acrylic acid; , Methacrylic acid, itaconic acid, maleic acid, fumaric acid, citraconic acid and other carboxylic acid monomers; vinylidene chloride; vinyl acetate; methyl (meth) acrylate, (meth) ) Ethyl acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, tertiary butyl (meth) acrylate, isopropyl (meth) acrylate (Meth) acrylates such as esters, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, and β-carboxyethyl acrylate; styrene monomers such as styrene, α-methylstyrene, and chlorostyrene Body; acrylamide monomers such as acrylamide, substituted acrylamide, methacrylamide, and substituted methacrylamide. The polymer containing these monomers may be a homopolymer or a copolymer. Examples of the copolymer include vinylidene chloride-methyl methacrylate-acrylonitrile copolymer, methyl methacrylate-acrylonitrile-methacrylonitrile copolymer, and methyl methacrylate-acrylonitrile copolymer Compounds, acrylonitrile-methacrylonitrile-Iconic acid copolymers, and the like.

作為上述熱膨脹性微球,亦可使用無機系發泡劑或有機系發泡劑。作為無機系發泡劑,例如可列舉:碳酸銨、碳酸氫銨、碳酸氫鈉、亞硝酸銨、硼氫化鈉、各種疊氮類等。又,作為有機系發泡劑,例如可列舉:三氯單氟甲烷、二氯單氟甲烷等氯氟烷烴系化合物;偶氮二異丁腈、偶氮二甲醯胺、偶氮二羧酸鋇等偶氮系化合物;對甲苯磺醯肼、二苯碸-3,3'-二磺醯肼、4,4'-氧雙(苯磺醯肼)、烯丙基雙(磺醯肼)等肼系化合物;對甲苯磺醯胺脲、4,4'-氧雙(苯磺醯胺脲)等胺脲系化合物;5-嗎啉基-1,2,3,4-噻三唑等三唑系化合物;N,N'-二亞硝基五亞甲基四胺、N,N'-二甲基-N,N'-二亞硝基對苯二甲醯胺等N-亞硝基系化合物等。 As the thermally expandable microspheres, an inorganic foaming agent or an organic foaming agent may be used. Examples of the inorganic foaming agent include ammonium carbonate, ammonium bicarbonate, sodium bicarbonate, ammonium nitrite, sodium borohydride, and various azides. Examples of the organic foaming agent include chlorofluoroalkane compounds such as trichloromonofluoromethane and dichloromonofluoromethane; azobisisobutyronitrile, azodimethylformamide, and azodicarboxylic acid. Azo compounds such as barium; p-toluenesulfonylhydrazine, diphenylhydrazone-3,3'-disulfazinium, 4,4'-oxobis (benzenesulfonylhydrazine), allylbis (sulfonylhydrazine) Isohydrazine-based compounds; p-toluenesulfonamide urea, 4,4'-oxybis (benzenesulfonamide) and other amine urea-based compounds; 5-morpholinyl-1,2,3,4-thiatriazole, etc. Triazole compounds; N, N'-dinitrosopentamethylenetetramine, N, N'-dimethyl-N, N'-dinitroso-p-xylylenediamine and other N-nitroso Base compounds.

上述熱膨脹性微球亦可使用市售品。作為市售品之熱膨脹性微球之具體例,可列舉:松本油脂製藥公司製造之商品名「Matsumoto Microsphere」(等級:F-30、F-30D、F-36D、F-36LV、F-50、F-50D、F-65、F-65D、FN-100SS、FN-100SSD、FN-180SS、FN-180SSD、F-190D、F-260D、F-2800D)、Nippon Fillite公司製造之商品名「Expancel」(等級:053-40、031-40、920-40、909-80、930-120)、吳羽化學工業公司 製造「Daifoam」(等級:H750、H850、H1100、S2320D、S2640D、M330、M430、M520)、積水化學工業公司製造「Advancell」(等級:EML101、EMH204、EHM301、EHM302、EHM303、EM304、EHM401、EM403、EM501)等。 As the thermally expandable microspheres, a commercially available product may be used. Specific examples of commercially available thermally expandable microspheres include the product name "Matsumoto Microsphere" (grades: F-30, F-30D, F-36D, F-36LV, F-50) manufactured by Matsumoto Oil & Fats Pharmaceutical Co., Ltd. , F-50D, F-65, F-65D, FN-100SS, FN-100SSD, FN-180SS, FN-180SSD, F-190D, F-260D, F-2800D), trade names made by Nippon Fillite Expancel "(grades: 053-40, 031-40, 920-40, 909-80, 930-120), Wu Yu Chemical Industry Company Manufacturing of "Daifoam" (grades: H750, H850, H1100, S2320D, S2640D, M330, M430, M520), Sekisui Chemical Industry Co., Ltd. manufacturing of "Advancell" (grade: EML101, EMH204, EHM301, EHM302, EHM303, EM304, EHM401, EM403 , EM501), etc.

上述熱膨脹性微球於加熱前之粒徑較佳為0.5μm~80μm,更佳為5μm~45μm,進而較佳為10μm~20μm,尤佳為10μm~15μm。因此,上述熱膨脹性微球於加熱前之粒子尺寸以平均粒徑計較佳為6μm~45μm,更佳為15μm~35μm。上述粒徑與平均粒徑係藉由雷射散射法中之粒度分佈測定法所求出之值。 The particle diameter of the thermally expandable microspheres before heating is preferably 0.5 μm to 80 μm, more preferably 5 μm to 45 μm, still more preferably 10 μm to 20 μm, and even more preferably 10 μm to 15 μm. Therefore, the particle size of the thermally expandable microspheres before heating is preferably 6 μm to 45 μm, and more preferably 15 μm to 35 μm. The particle diameter and the average particle diameter are values obtained by a particle size distribution measurement method in a laser scattering method.

上述熱膨脹性微球較佳為具有體積膨脹率達到較佳為5倍以上、更佳為7倍以上、進而較佳為10倍以上而不破裂之適度之強度。於使用此種熱膨脹性微球之情形時,可藉由加熱處理而高效率地降低黏著力。 The thermally expandable microspheres preferably have a moderate strength with a volume expansion ratio of preferably 5 times or more, more preferably 7 times or more, and even more preferably 10 times or more without breaking. When such a thermally expandable microsphere is used, the adhesive force can be efficiently reduced by heat treatment.

上述黏著劑層中之熱膨脹性微球之含有比率可根據所需之黏著力之降低性等而適當設定。熱膨脹性微球之含有比率相對於形成黏著劑層之基礎聚合物100重量份,例如為1重量份~150重量份,較佳為10重量份~130重量份,進而較佳為25重量份~100重量份。 The content ratio of the thermally expandable microspheres in the above-mentioned adhesive layer can be appropriately set according to the required reduction of the adhesive force and the like. The content ratio of the thermally expandable microspheres is 100 parts by weight with respect to the base polymer forming the adhesive layer, for example, 1 to 150 parts by weight, preferably 10 to 130 parts by weight, and more preferably 25 parts by weight to 100 parts by weight.

D.基材 D. Substrate

作為上述基材,例如可列舉:樹脂片材、不織布、紙、金屬箔、織布、橡膠片材、發泡片材、該等之積層體(尤其是含有樹脂片材之積層體)等。作為構成樹脂片材之樹脂,例如可列舉:聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯(PBT)、聚乙烯(PE)、聚丙烯(PP)、乙烯-丙烯共聚物、乙烯-乙酸乙烯酯共聚物(EVA)、聚醯胺(尼龍)、全芳香族聚醯胺(芳族聚醯胺)、聚醯亞胺(PI)、聚氯乙烯(PVC)、聚苯硫醚(PPS)、氟系樹脂、聚醚醚酮(PEEK)等。作為不織布,可列舉:含有馬尼拉麻之不織布等具有耐熱性之由天然纖維製成之不織布;聚丙烯樹脂不織布、聚乙烯樹脂不織布、酯系樹脂 不織布等合成樹脂不織布等。 Examples of the substrate include a resin sheet, a non-woven fabric, paper, a metal foil, a woven fabric, a rubber sheet, a foamed sheet, a laminated body (particularly a laminated body containing a resin sheet), and the like. Examples of the resin constituting the resin sheet include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), and polyethylene ( PE), polypropylene (PP), ethylene-propylene copolymer, ethylene-vinyl acetate copolymer (EVA), polyamide (nylon), fully aromatic polyamide (aromatic polyamide), polyamide Amine (PI), polyvinyl chloride (PVC), polyphenylene sulfide (PPS), fluorine resin, polyetheretherketone (PEEK), etc. Examples of non-woven fabrics include non-woven fabrics made of natural fibers having heat resistance such as non-woven fabrics containing manila hemp; non-woven fabrics made of polypropylene resin, non-woven fabrics made of polyethylene resin, and ester-based resins. Non-woven fabrics such as synthetic resin.

上述基材之厚度可根據所需之強度或柔軟性、及使用目的等而設定為任意合適之厚度。基材之厚度較佳為1000μm以下,更佳為1μm~1000μm,進而較佳為1μm~500μm,尤佳為3μm~300μm,最佳為5μm~250μm。 The thickness of the substrate can be set to any appropriate thickness according to the required strength or flexibility, the purpose of use, and the like. The thickness of the substrate is preferably 1000 μm or less, more preferably 1 μm to 1000 μm, still more preferably 1 μm to 500 μm, even more preferably 3 μm to 300 μm, and most preferably 5 μm to 250 μm.

亦可對上述基材實施表面處理。作為表面處理,例如可列舉:電暈處理、鉻酸處理、臭氧曝露、火焰曝露、高壓電擊曝露、離子化放射線處理、利用底塗劑所進行之塗佈處理等。若進行此種表面處理,則可提高繫留層與基材之密接性。尤其是利用有機塗佈材料所進行之塗佈處理由於可提高密接性,且於加熱剝離時繫留層不易發生抓固破壞,故而較佳。 The substrate may be subjected to a surface treatment. Examples of the surface treatment include corona treatment, chromic acid treatment, ozone exposure, flame exposure, high-voltage electric shock exposure, ionizing radiation treatment, and coating treatment using a primer. Such surface treatment can improve the adhesion between the mooring layer and the substrate. In particular, a coating treatment using an organic coating material is preferred because it can improve the adhesion and prevent the tethered layer from being easily damaged during heat peeling.

作為上述有機塗佈材料,例如可列舉塑膠硬塗材料II(CMC出版、(2004))所記載之材料。較佳為使用胺基甲酸酯系聚合物,更佳為使用聚丙烯酸胺基甲酸酯、聚酯胺基甲酸酯或該等之前驅物。其原因在於,於基材上之塗敷、塗佈較為簡便,且工業上可選擇多種物質,可廉價地獲得。該胺基甲酸酯系聚合物例如為包含異氰酸酯單體與含醇性羥基之單體(例如,含羥基之丙烯酸化合物或含羥基之酯化合物)之反應混合物的聚合物。有機塗佈材料可含有聚胺等鏈延長劑、抗老化劑、氧化穩定劑等作為任意添加劑。有機塗佈層之厚度並無特別限定,例如適宜為0.1μm~10μm左右,較佳為0.1μm~5μm左右,更佳為0.5μm~5μm左右。 Examples of the organic coating material include those described in Plastic Hard Coating Material II (CMC Publication, (2004)). It is preferable to use a urethane-based polymer, and it is more preferable to use a polyacrylate urethane, a polyester urethane, or a precursor thereof. The reason for this is that the application and coating on the substrate are relatively simple, and a variety of substances can be industrially selected and can be obtained inexpensively. The urethane-based polymer is, for example, a polymer containing a reaction mixture of an isocyanate monomer and an alcoholic hydroxyl-containing monomer (for example, a hydroxyl-containing acrylic compound or a hydroxyl-containing ester compound). The organic coating material may contain a chain extender such as polyamine, an anti-aging agent, an oxidation stabilizer, and the like as any additives. The thickness of the organic coating layer is not particularly limited. For example, the thickness is preferably about 0.1 μm to 10 μm, preferably about 0.1 μm to 5 μm, and more preferably about 0.5 μm to 5 μm.

E.黏著片材之製造方法 E. Manufacturing method of adhesive sheet

作為本發明之黏著片材之製造方法,例如可列舉如下方法:(1)於脫模膜(剝離紙)上塗佈上述黏著劑而形成黏著劑塗佈層後,藉由加壓等將上述熱膨脹性微球埋入該黏著劑塗佈層中而形成黏著劑層,於該黏著劑層上形成(積層)繫留層;(2)於脫模膜上塗佈包含上述黏著劑 與熱膨脹性微球之黏著劑層形成用組合物而形成黏著劑塗佈層,於該黏著劑塗佈層上形成(積層)繫留層;(3)於脫模膜上塗佈上述黏著劑而形成黏著劑塗佈層後,於該黏著劑塗佈層上形成(積層)繫留層,繼而將脫模膜剝離,自黏著劑塗佈層之與繫留層相反之側之面(黏著面)側藉由加壓等將上述熱膨脹性微球埋入;(4)於脫模膜上形成繫留層,於其一面設置熱膨脹性微球,進而於該設置面上塗佈黏著劑等。於上述(1)~(4)之方法中,藉由乾燥黏著劑塗佈層,可形成黏著劑層,該乾燥可於任意合適之時機進行。該乾燥可於將熱膨脹性微球埋入之前進行,亦可於埋入之後進行。又,可於形成繫留層之前進行,亦可於形成之後進行。於在將熱膨脹性微球埋入後進行乾燥之情形時,較佳為於熱膨脹性微球不易膨脹或發泡之溫度下進行乾燥。可於上述(1)及(2)所示之操作之後將脫模膜剝離,亦可於直至將黏著片材供於實用為止之期間,保留脫模膜而保護黏著面。 Examples of the method for producing the adhesive sheet of the present invention include the following methods: (1) The above-mentioned adhesive is applied to a release film (release paper) to form an adhesive coating layer, and the above is applied by pressure or the like. The thermally expandable microspheres are embedded in the adhesive coating layer to form an adhesive layer, and a (laminated) retention layer is formed on the adhesive layer; (2) the release film is coated with the above-mentioned adhesive A composition for forming an adhesive layer with heat-expandable microspheres to form an adhesive coating layer, and form a (laminated) retention layer on the adhesive coating layer; (3) apply the above-mentioned adhesive on a release film After forming the adhesive coating layer, a (laminated) tether layer is formed on the adhesive coating layer, and then the release film is peeled off from the side of the adhesive coating layer opposite to the tether layer (adhesion). The surface) side is embedded with the thermally expandable microspheres by pressure or the like; (4) A retention layer is formed on the release film, the thermally expandable microspheres are provided on one side, and an adhesive agent is applied to the installation surface. . In the methods (1) to (4) above, an adhesive layer can be formed by drying the adhesive coating layer, and the drying can be performed at any appropriate timing. This drying may be performed before embedding the thermally expandable microspheres, or may be performed after embedding. In addition, it may be performed before the captive layer is formed, or it may be performed after the formation. When the heat-expandable microspheres are buried and dried, the heat-expandable microspheres are preferably dried at a temperature at which they are not easily expanded or foamed. The release film may be peeled after the operations shown in (1) and (2) above, or the release film may be retained to protect the adhesive surface until the adhesive sheet is put to practical use.

於本發明之黏著片材具備基材之情形時,該黏著片材於上述(1)~(4)之操作後,可介隔任意合適之接著劑或黏著劑,於繫留層之與黏著劑層相反之側之面上貼附基材。又,亦可分別製作基材與繫留層之積層體,及脫模膜與黏著劑層(或黏著劑塗佈層)之積層體,再將該等積層體貼合。 In the case where the adhesive sheet of the present invention has a substrate, the adhesive sheet can be interposed with any suitable adhesive or adhesive after the operations of (1) to (4) above to adhere to the captive layer. The substrate is attached to the opposite side of the agent layer. Alternatively, a laminated body of the base material and the mooring layer, and a laminated body of the release film and the adhesive layer (or an adhesive coating layer) may be separately prepared, and then these laminated bodies may be bonded together.

作為形成上述繫留層之方法,可列舉如下方法:(i)使上述B項所說明之聚合物材料或樹脂材料熱熔融,藉由擠出成形而獲得膜狀之成形體,將該成形體積層於上述黏著劑層(或黏著劑塗佈層)或基材上;(ii)將含有上述聚合物材料或樹脂材料之樹脂溶液塗佈於上述黏著劑層(或黏著劑塗佈層)或基材上,其後使之乾燥;(iii)將含有可形成上述聚合物材料或樹脂材料之單體、低聚物或大分子單體之繫留層形成用組合物塗佈於上述黏著劑層(或黏著劑塗佈層)或基材上,使繫留層形成用組合物聚合(例如,藉由加熱、活性能量線照射等進行聚合)等。藉 由該(iii)之方法,可減少溶劑、及/或熱能之使用量。再者,於(ii)之方法中,亦可將樹脂溶液塗佈於別的脫模膜上,其後使之乾燥而獲得膜狀之成形體後,將該成形體積層於上述黏著劑層(或黏著劑塗佈層)或基材上。又,於(iii)之方法中,亦可將繫留層形成用組合物塗佈於別的脫模膜上,其後使之乾燥而形成繫留層前驅物,將該前驅物積層於上述黏著劑層(或黏著劑塗佈層)或基材上,其後使之聚合。 Examples of the method for forming the mooring layer include the following: (i) The polymer material or the resin material described in the above item B is thermally melted, and a film-shaped molded body is obtained by extrusion molding, and the molded body is formed. Laminated on the above-mentioned adhesive layer (or adhesive coating layer) or substrate; (ii) applying a resin solution containing the above polymer material or resin material to the above-mentioned adhesive layer (or adhesive coating layer) or The substrate is then dried; (iii) a captive layer-forming composition containing a monomer, oligomer, or macromonomer capable of forming the polymer material or resin material is applied to the adhesive Layer (or an adhesive coating layer) or a substrate, polymerizing the composition for forming a mooring layer (for example, polymerizing by heating, active energy ray irradiation, etc.) and the like. borrow According to the method (iii), the amount of solvent and / or heat energy used can be reduced. Furthermore, in the method (ii), the resin solution may be applied to another release film, and then dried to obtain a film-shaped molded body, and the formed volume layer is then deposited on the adhesive layer. (Or adhesive coating) or on a substrate. In the method (iii), the composition for forming a captive layer may be coated on another release film, and then dried to form a captive layer precursor, and the precursor may be laminated on the aforementioned layer. An adhesive layer (or an adhesive coating layer) or a substrate is then polymerized.

例如,於上述(iii)之方法中,於形成包含環氧系聚合物之繫留層之情形時,可採用塗佈含有2,2-(4-羥基苯基)丙烷二縮水甘油醚、雙(4-羥基苯基)甲烷等環氧化合物與任意合適之硬化劑之繫留層形成用組合物後進行加熱(例如,60℃~120℃)之方法。 For example, in the method (iii) above, when a captive layer containing an epoxy-based polymer is formed, coating with 2,2- (4-hydroxyphenyl) propane diglycidyl ether, bis A method for heating (for example, 60 ° C. to 120 ° C.) a composition for forming a captive layer of an epoxy compound such as (4-hydroxyphenyl) methane and any suitable curing agent.

例如,於上述(iii)之方法中,於形成包含胺基甲酸酯系聚合物之繫留層之情形時,可採用塗佈含有甲苯二異氰酸酯、六亞甲基二異氰酸酯等異氰酸酯化合物與聚醚多元醇、聚酯多元醇等多元醇化合物之繫留層形成用組合物後進行加熱(例如,60℃~120℃)之方法。 For example, in the method (iii) above, when forming a retention layer containing a urethane-based polymer, coating with an isocyanate compound such as toluene diisocyanate, hexamethylene diisocyanate, and poly A method for heating (for example, 60 ° C. to 120 ° C.) a composition for forming a captive layer of a polyol compound such as an ether polyol and a polyester polyol.

例如,於上述(iii)之方法中,於形成包含乙烯系聚合物之繫留層之情形時,可使用含有氯乙烯、苯乙烯等乙烯化合物與任意合適之起始劑之繫留層形成用組合物。 For example, in the method (iii) above, when forming a captive layer containing an ethylene-based polymer, a captive layer for forming a captive layer containing an ethylene compound such as vinyl chloride, styrene, and any appropriate initiator may be used. combination.

上述繫留層形成用組合物可視需要而含有起始劑、觸媒、紫外線吸收劑、抗氧化劑等添加劑。又,亦可含有上述珠粒。 The said composition for forming a mooring layer may contain additives, such as a starter, a catalyst, a ultraviolet absorber, and an antioxidant, as needed. The beads may also be contained.

於上述繫留層包含可藉由活性能量線之照射而硬化之樹脂材料之情形時,可於任意合適之時機照射活性能量線而獲得黏著片材。活性能量線之照射例如可於貼附被黏著體(被加工物)後進行。活性能量線之照射亦可分階段進行。例如,亦可於貼附被黏著體前使之半硬化,於貼附後使之正式硬化。活性能量線之種類及照射量可根據構成繫留層之樹脂材料之種類而設定為任意合適之種類及量。 In the case where the captive layer includes a resin material that can be hardened by irradiation with active energy rays, the active sheet may be irradiated at any appropriate timing to obtain an adhesive sheet. Irradiation of the active energy ray can be performed, for example, after the adherend (processed object) is attached. Irradiation of active energy rays can also be performed in stages. For example, the adherend may be semi-hardened before being attached, and may be formally hardened after being attached. The type and amount of the active energy ray can be set to any appropriate type and amount according to the type of the resin material constituting the tethered layer.

根據上述之製造方法,黏著劑層之脫模膜側(與繫留層相反之側) 之面成為黏著面。由於黏著面係以與脫模膜相接之狀態形成,故而不存在熱膨脹性微球之突出,而較平坦。另一方面,於黏著劑層之與黏著面相反之側之面,熱膨脹性微球突出。於本發明中,由於藉由上述繫留層而被覆該突出之熱膨脹性微球,故而黏著片材兩面較平坦,因此,可使黏著劑層之厚度較薄。此種本發明之黏著片材作為對電子零件等進行切斷加工時之暫時固定用片材而有助於實現優異之切斷精度、及切削屑之減少。 According to the above manufacturing method, the release film side of the adhesive layer (the side opposite to the mooring layer) The face becomes the sticky face. Since the adhesive surface is formed in a state in contact with the release film, there is no protrusion of the thermally expandable microspheres, and it is flat. On the other hand, on the side of the adhesive layer opposite to the adhesive surface, the thermally expandable microspheres protrude. In the present invention, since the protruding thermally expandable microspheres are covered by the captive layer, both sides of the adhesive sheet are flat, and therefore, the thickness of the adhesive layer can be made thin. Such an adhesive sheet of the present invention is useful as a temporary fixing sheet when cutting electronic parts and the like, and contributes to achieving excellent cutting accuracy and reduction of cutting chips.

F.黏著片材之使用方法(電子零件之製造方法) F. How to use the adhesive sheet (manufacturing method of electronic parts)

根據本發明之另一態樣,提供一種電子零件之製造方法。本發明之電子零件之製造方法包括於上述黏著片材上貼附以大面積獲得之電子零件材料(基板),並對該電子零件材料進行切斷加工。 According to another aspect of the present invention, a method for manufacturing an electronic component is provided. The method for manufacturing an electronic component of the present invention includes attaching an electronic component material (substrate) obtained in a large area on the above-mentioned adhesive sheet, and cutting the electronic component material.

作為上述電子零件,例如可列舉:矽晶圓等半導體裝置用零件;積層電容器;透明電極等。 Examples of the electronic component include a component for a semiconductor device such as a silicon wafer, a multilayer capacitor, and a transparent electrode.

於上述製造方法中,首先,於加工台上載置上述黏著片材,於該黏著片材上貼附以大面積獲得之電子零件材料。 In the above manufacturing method, first, the above-mentioned adhesive sheet is placed on a processing table, and an electronic component material obtained in a large area is attached to the adhesive sheet.

其後,藉由任意合適之方法切斷上述電子零件材料,可獲得電子零件。作為上述切斷加工之方法,例如可列舉使用旋轉刀、平刀等刀具之方法,使用雷射光之方法等。於藉由使用平刀之壓切而切斷電子零件材料之情形時,切削屑之產生得以抑制,良率提高。於本發明中,由於可使黏著劑層變薄,因此即便藉由利用平刀之壓切而切斷電子零件材料,亦可防止以下情況:切斷後之晶片再附著;切斷面發生傾斜或成為S字狀,變得不穩定;切斷時產生晶片缺損等。又,於本發明中,即便於使用較薄之刀切斷之情形時,亦可獲得上述效果,且可降低因刀之厚度產生之製造損耗(由切斷後之晶片間產生之間隙引起之損耗)。於更小型化之電子零件之製造中,由於切斷面數量較多,故而如上所述之可降低製造損耗之本發明變得尤其有用。 Thereafter, the electronic component material can be cut by any appropriate method to obtain an electronic component. Examples of the cutting method include a method using a rotary knife and a flat knife, and a method using laser light. In the case where the electronic component material is cut by press cutting using a flat blade, the generation of cutting chips is suppressed, and the yield is improved. In the present invention, since the adhesive layer can be made thin, even if the electronic component material is cut by using a flat knife to cut the material, the following situations can be prevented: the wafer after the cutting is reattached; the cut surface is inclined or It is S-shaped and unstable; wafer defects occur during cutting. Moreover, in the present invention, the above-mentioned effect can be obtained even when cutting with a thin blade, and the manufacturing loss due to the thickness of the blade (loss due to the gap generated between the wafers after cutting) can be reduced. ). In the manufacture of more miniaturized electronic parts, since the number of cut surfaces is large, the present invention, which can reduce manufacturing losses as described above, becomes particularly useful.

於上述切斷加工中,亦可於加溫下進行切斷。例如,亦可將上述加工台加溫至30℃~150℃而進行切斷加工。 In the cutting process described above, cutting may be performed under heating. For example, the processing table may be heated to 30 ° C to 150 ° C to perform cutting processing.

[實施例] [Example]

以下,藉由實施例對本發明進行具體說明,但本發明並不受該等實施例所限定。實施例中之評估方法如以下所述。又,於實施例中,只要未特別說明,則「份」及「%」為重量基準。 Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited by these examples. The evaluation methods in the examples are as follows. In the examples, unless otherwise specified, "parts" and "%" are based on weight.

(1)藉由拉曼影像之黏著劑層及繫留層之厚度之測定 (1) Determination of the thickness of the adhesive layer and the tethered layer by Raman images

利用切片機將實施例1~3、5、6及12~15所獲得之黏著片材切片化而準備測定試樣。針對該測定試樣之剖面,使用WITec公司製造之alpha300RSA進行藉由拉曼光譜之光譜分析,基於源自僅添加至繫留層中之成分之波峰(例如,於實施例3中為活性能量線反應性低聚物(UV1700B)之1640cm-1之波峰)之波峰強度,測定繫留層及黏著劑層之厚度。以實施例3作為代表例,將該測定中之拉曼影像示於圖4。以僅添加至繫留層中之成分之存在量明確不同之面作為界面1,以自界面1至黏著劑層之與該界面1相反之側之面之距離作為黏著劑層之厚度,以自該界面1至繫留層之與該界面相反之側之面之距離作為繫留層之厚度。 The adhesive sheets obtained in Examples 1 to 3, 5, 6, and 12 to 15 were sliced with a microtome to prepare measurement samples. For the cross section of the measurement sample, spectroscopic analysis by Raman spectroscopy using alpha300RSA manufactured by WITec, based on the peaks derived from the components added only to the tethered layer (for example, active energy rays in Example 3) The peak intensity of the reactive oligomer (UV1700B) (peak of 1640 cm -1 ) was used to measure the thickness of the mooring layer and the adhesive layer. Taking Example 3 as a representative example, the Raman image in this measurement is shown in FIG. 4. The interface 1 is defined as only the surface where the amount of components added to the tethering layer is clearly different. The distance from the interface 1 to the surface of the adhesive layer on the side opposite to the interface 1 is defined as the thickness of the adhesive layer. The distance between the interface 1 and the surface of the tethered layer opposite to the interface is taken as the thickness of the tethered layer.

再者,拉曼影像測定之測定條件如下所述。 The measurement conditions for Raman image measurement are as follows.

.激發波長:532nm . Excitation wavelength: 532nm

.測定波數範圍:300~3600cm-1 . Measuring wave number range: 300 ~ 3600cm -1

.光柵(Grating):600gr/mm . Grating: 600gr / mm

.物鏡:×100 . Objective lens: × 100

.測定時間:0.2sec/1光譜 . Measurement time: 0.2sec / 1 spectrum

.測定範圍:20×40μm . Measurement range: 20 × 40μm

.測定數:100×200點 . Number of measurements: 100 × 200 points

.檢測器:EMCCD(Electron Multiplying Charge Coupled Device, 電子倍增電荷耦合元件) . Detector: EMCCD (Electron Multiplying Charge Coupled Device, (Electron multiplying charge-coupled element)

(2)藉由SEM之黏著劑層及繫留層之厚度之測定 (2) Measurement of thickness of adhesive layer and mooring layer by SEM

利用修邊刀沿厚度方向切斷實施例4、7~11、16、17及比較例1所獲得之黏著片材,實施Pt-Pd濺鍍處理後,使用Hitachi High-Technologies公司製造之S3400N低真空掃描電子顯微鏡(SEM)觀察切斷面而辨別界面1,以自界面1至黏著劑層之與該界面1相反之側之面之距離作為黏著劑層之厚度,以自該界面1至繫留層之與該界面相反之側之面之距離作為繫留層之厚度。以實施例11作為代表例,將黏著片材之剖面之SEM圖像示於圖5。 The adhesive sheet obtained in Examples 4, 7 to 11, 16, 17 and Comparative Example 1 was cut in the thickness direction with a trimming knife, and after performing Pt-Pd sputtering treatment, S3400N made by Hitachi High-Technologies was used. Vacuum scanning electron microscope (SEM) observes the cut surface to identify interface 1. The distance from interface 1 to the side of the adhesive layer opposite to the interface 1 is taken as the thickness of the adhesive layer. The distance of the surface of the retention layer opposite to the interface is taken as the thickness of the captive layer. Taking Example 11 as a representative example, a SEM image of a cross section of the adhesive sheet is shown in FIG. 5.

再者,SEM觀察之測定條件如下所述。 The measurement conditions for SEM observation are as follows.

.觀察影像:ESED(Environmental Secondary Electron Detector,環境二次電子檢測器)影像 . Observation image: ESED (Environmental Secondary Electron Detector) image

.加速電壓:10kV . Accelerating voltage: 10kV

.倍率:600倍 . Magnification: 600 times

(3)熱膨脹性微球之突出高度(H)之測定 (3) Measurement of protruding height (H) of thermally expandable microspheres

於實施例1~3、5、6及12~15中藉由與上述(1)相同之方法,於實施例4、7~11、16、17及比較例1中藉由與上述(2)相同之方法,辨別黏著劑層與繫留層之界面(即包含突出之熱膨脹性微球之突出面之界面),測定熱膨脹性微球之自黏著劑層突出之部分之高度。 In Examples 1 to 3, 5, 6, and 12 to 15, the same method as in the above (1) was used, and in Examples 4, 7 to 11, 16, 17, and Comparative Example 1 to the above (2) In the same method, the interface between the adhesive layer and the mooring layer (that is, the interface including the protruding surface of the protruding thermally expandable microspheres) is identified, and the height of the protruding portion of the thermally expandable microspheres from the adhesive layer is measured.

(4)黏著劑層與繫留層之界面之長度(11)、及該界面之厚度方向投影線之長度(L)之測定 (4) Measurement of the length of the interface between the adhesive layer and the mooring layer (11) and the length (L) of the projection line in the thickness direction of the interface

於實施例1~3、5、6及12~15中藉由與上述(1)相同之方法,於實施例4、7~11、16、17及比較例1中藉由與上述(2)相同之方法,辨別黏著劑層與繫留層之界面(即包含突出之熱膨脹性微球之突出面之界面),測定黏著劑層與繫留層之界面之長度(l1)、及該界面之厚度方向投影線之長度(L)。於表1中,表示l1與L之比(l1/L)。 In Examples 1 to 3, 5, 6, and 12 to 15, the same method as in the above (1) was used, and in Examples 4, 7 to 11, 16, 17, and Comparative Example 1 to the above (2) In the same way, the interface between the adhesive layer and the captive layer (that is, the interface containing the protruding surface of the protruding thermally expandable microspheres) is identified, and the length of the interface between the adhesive layer and the captive layer (l1) and the interface Length (L) of the projection line in the thickness direction. Table 1 shows the ratio (l1 / L) of l1 to L.

(5)彈性模數測定 (5) Determination of elastic modulus

利用切片機將實施例及比較例所獲得之黏著片材沿厚度方向切斷,針對該切斷面,利用奈米壓痕儀測定彈性模數。 The adhesive sheets obtained in the examples and comparative examples were cut in the thickness direction with a microtome, and the elastic modulus was measured with a nano indenter for the cut surface.

更詳細而言,關於繫留層,以與切斷面大致垂直之繫留層之表面(與黏著面相反之側之面)、及距該表面3μm左右之切斷面表面作為測定對象。藉由測定裝置附帶之軟體(triboscan)對藉由將探針(壓頭)壓抵於測定對象而獲得之移位-荷重遲滯曲線進行數值處理,藉此獲得彈性模數。再者,於表1中表示於距表面3μm左右之切斷面表面所測得之彈性模數(3次測定之平均值)。 More specifically, as the mooring layer, the surface of the mooring layer (the surface opposite to the adhesive surface) that is substantially perpendicular to the cut surface, and the surface of the cut surface about 3 μm from the surface are taken as the measurement targets. The software (triboscan) attached to the measurement device is used to numerically process the displacement-load hysteresis curve obtained by pressing the probe (indenter) against the measurement object, thereby obtaining the elastic modulus. In addition, Table 1 shows the modulus of elasticity (average of three measurements) measured on the surface of the cut surface about 3 μm from the surface.

奈米壓痕裝置及測定條件如下所述。 The nanoindentation device and measurement conditions are as follows.

裝置及測定條件 Device and measurement conditions

.裝置:奈米壓痕儀;Hysitron Inc公司製造之Triboindenter . Device: Nano indenter; Triboindenter manufactured by Hysitron Inc

.測定方法:單一壓入法 . Measurement method: single indentation method

.測定溫度:25℃ . Measurement temperature: 25 ° C

.壓入速度:約1000nm/sec . Pressing speed: about 1000nm / sec

.壓入深度:約800nm . Pressing depth: about 800nm

.探針:金剛石製、Berkovich型(三角錐型) . Probe: Diamond, Berkovich (triangular cone)

(6)黏著力測定 (6) Determination of adhesion

(加熱前(使熱膨脹性微球膨脹前)之黏著力) (Adhesion before heating (before expanding thermally expandable microspheres))

將實施例及比較例所獲得之黏著片材切斷為寬:20mm、長:140mm之尺寸,依據JIS Z 0237:2009,於將作為被黏著體之聚對苯二甲酸乙二酯膜(商品名「Lumirror S-10」Toray股份有限公司製造;厚:25μm、寬:30mm)沿寬度方向左右各伸出5mm之狀態下,使2kg之輥往返1次而將其貼合於黏著面上,從而準備測定試樣。將該測定試樣設置於附帶恆溫槽之拉力試驗機(商品名「島津Autograph AG-120kN」島津製作所公司製造)上,放置30分鐘。其後,於剝離角度:180°、剝離速 度(拉伸速度):300mm/min之條件下,測定將被黏著體沿長度方向自黏著片材剝離時之荷重,求出此時之最大荷重(除測定初期之峰頂以外之荷重之最大值),將以該最大荷重除以膠帶寬度而獲得之值作為黏著力(N/20mm寬)。再者,上述操作係於溫度:23±3℃及濕度:65±5%RH之環境下進行。 The adhesive sheets obtained in the examples and comparative examples were cut into a size of width: 20 mm and length: 140 mm. According to JIS Z 0237: 2009, a polyethylene terephthalate film (commercial product) was used as an adherend. Named "Lumirror S-10", manufactured by Toray Co., Ltd .; thickness: 25 μm, width: 30 mm) With a length of 5 mm left and right in the width direction, a 2 kg roller is reciprocated once to attach it to the adhesive surface. Thus, a measurement sample is prepared. This measurement sample was set on a tensile tester (trade name "Shimadzu Autograph AG-120kN" manufactured by Shimadzu Corporation) with a constant temperature bath, and left for 30 minutes. Thereafter, at the peeling angle: 180 °, the peeling speed Degree (tensile speed): Under the condition of 300 mm / min, measure the load when the adherend is peeled from the adhesive sheet in the longitudinal direction, and find the maximum load at this time (the maximum load other than the peak of the initial measurement) Value), and the value obtained by dividing the maximum load by the width of the adhesive tape was taken as the adhesive force (N / 20mm width). In addition, the above operation was performed under the environment of temperature: 23 ± 3 ° C and humidity: 65 ± 5% RH.

(加熱後(使熱膨脹性微球膨脹或發泡後)之黏著力) (Adhesion after heating (after expanding or expanding the thermally expandable microspheres))

以與上述相同之方式準備測定試樣,將該測定試樣投入熱風乾燥器中。於熱風乾燥器中,在熱膨脹性微球之最大膨脹溫度(下述)下靜置1分鐘後,以與上述相同之方式剝離被黏著體,測定黏著力。再者,投入熱風乾燥器前後之操作係於溫度:23±3℃及濕度:65±5%RH之環境下進行。 A measurement sample is prepared in the same manner as described above, and the measurement sample is put into a hot air dryer. After being allowed to stand for 1 minute at the maximum expansion temperature (described below) of the thermally expandable microspheres in a hot-air dryer, the adherend was peeled in the same manner as described above, and the adhesive force was measured. In addition, the operation before and after the hot air dryer was put in was performed under the environment of temperature: 23 ± 3 ° C and humidity: 65 ± 5% RH.

(7)表面粗糙度測定 (7) Surface roughness measurement

針對實施例及比較例所獲得之黏著片材,使熱膨脹性微球膨脹或發泡後,測定黏著面之表面粗糙度Ra。熱膨脹性微球之膨脹或發泡係於熱風乾燥器中,在熱膨脹性微球之最大膨脹溫度(下述)下靜置1分鐘而進行。再者,表面粗糙度之測定係利用Olympus公司製造之雷射顯微鏡「OLS4000」進行。 Regarding the adhesive sheets obtained in the examples and comparative examples, the thermally expandable microspheres were expanded or foamed, and then the surface roughness Ra of the adhesive surface was measured. The expansion or foaming of the heat-expandable microspheres is performed in a hot-air dryer, and allowed to stand at the maximum expansion temperature (described below) of the heat-expandable microspheres for 1 minute. The surface roughness was measured using a laser microscope "OLS4000" manufactured by Olympus.

(8)切斷後小片分離性評估 (8) Separation evaluation of small pieces after cutting

於實施例及比較例所獲得之黏著片材上貼合40mm×50mm(厚度500μm)之積層陶瓷片材。利用UHT公司製造之切斷裝置「G-CUT8AA」將黏著片材上之積層陶瓷片材以成為1mm×0.5mm之小片之方式切斷為小塊狀。將黏著片材上之積層陶瓷片材沿直徑30mm之圓柱之側面設置。於設置於圓柱上之狀態下,以特定之溫度(熱膨脹性微球之最大膨脹溫度(下述))進行加熱處理,使熱膨脹性微球膨脹,藉此將小片自黏著片材剝離,對切斷位置之晶片間未分離之晶片個數進行計數。將以未分離之晶片個數除以100%完全分離時之晶片個數而獲得之數作 為分離性之指標。指標未達2%之情況設為◎,指標為2%以上且未達5%之情況設為○,指標為5%以上且未達15%之情況設為△,指標為15%以上之情況設為×。 A laminated ceramic sheet of 40 mm × 50 mm (thickness: 500 μm) was bonded to the adhesive sheets obtained in the examples and comparative examples. A cutting device "G-CUT8AA" manufactured by UHT Corporation was used to cut the laminated ceramic sheet on the adhesive sheet into small pieces of 1 mm x 0.5 mm. The laminated ceramic sheet on the adhesive sheet was set along the side of a cylinder having a diameter of 30 mm. In a state of being installed on a cylinder, heat treatment is performed at a specific temperature (the maximum expansion temperature of the thermally expandable microspheres (described below)) to expand the thermally expandable microspheres, thereby peeling the small piece from the adhesive sheet and cutting it in half. The number of unseparated wafers between wafers at the break position is counted. Divide the number of unseparated wafers by the number of 100% fully separated wafers as It is an indicator of separation. When the index is less than 2%, it is set to ◎, when the index is more than 2% and less than 5%, it is set to ○, when the index is more than 5% and less than 15%, it is set to △, when the index is more than 15% Set to ×.

積層陶瓷片材之組成及切斷裝置之切斷條件之詳細內容如下所述。 The details of the composition of the laminated ceramic sheet and the cutting conditions of the cutting device are as follows.

(積層陶瓷片材) (Laminated ceramic sheet)

於甲苯溶劑中加入鈦酸鋇粉末100份、聚乙烯丁醛樹脂15份、鄰苯二甲酸雙(2-乙基己基)酯6份及雙甘油硬脂酸酯2份,利用球磨分散機進行混合及分散,藉此獲得介電體之甲苯溶液。使用敷料器以溶劑揮發後之厚度達到50μm之方式將該溶液塗佈於附帶聚矽氧脫模劑處理面之聚對苯二甲酸乙二酯膜(Mitsubishi Polyester Film公司製造、商品名「MRF38」、厚度:38μm)之聚矽氧脫模劑處理面上,加以乾燥而獲得陶瓷片材。以厚度達到500μm之方式將陶瓷片材積層複數片,而獲得積層陶瓷片材。 100 parts of barium titanate powder, 15 parts of polyvinyl butyral resin, 6 parts of bis (2-ethylhexyl) phthalate, and 2 parts of diglyceryl stearate were added to the toluene solvent, and the mixture was carried out using a ball mill disperser. Mixing and dispersing to obtain a toluene solution of the dielectric. This solution was applied to a polyethylene terephthalate film (manufactured by Mitsubishi Polyester Film Co., Ltd., under the trade name "MRF38") with a silicone applicator so that the thickness of the solvent was 50 μm using an applicator. (Thickness: 38 μm) The treated surface of the polysiloxane release agent is dried to obtain a ceramic sheet. A plurality of ceramic sheets were laminated so that the thickness reached 500 μm to obtain a laminated ceramic sheet.

(切斷條件) (Cutting conditions)

.切斷溫度:60℃、切斷深度(自台面起之剩餘量):約20μm . Cutting temperature: 60 ° C, cutting depth (residual amount from the table): about 20 μm

.切斷刀:UHT公司製造「U-BLADE2」、刀厚:50μm、刀尖角度:15° . Cutting blade: "U-BLADE2" manufactured by UHT, blade thickness: 50 μm, blade angle: 15 °

(9)切斷面切割性評估 (9) Evaluation of cutability of cut surface

以與上述(8)相同之方式,將積層陶瓷片材以成為1mm×0.5mm之小片之方式切斷為小塊狀。自經切斷之小片中任意選出10個,利用50倍率之放大鏡觀察切斷面,確認有無碎片(因切斷加工而產生之積層陶瓷片材之碎片),將10個小片所產生之碎片總數之平均值作為指標。將指標0~未達10處之情況設為◎,為10以上且未達20處之情況設為○,為20以上且未達40處之情況設為△,為40處以上之情況設為×。 In the same manner as in the above (8), the laminated ceramic sheet was cut into small pieces so as to be small pieces of 1 mm × 0.5 mm. 10 pieces were randomly selected from the cut pieces, and the cut surface was observed with a 50-fold magnifying glass to confirm the presence or absence of fragments (fragments of the laminated ceramic sheet produced by the cutting process), and the total number of fragments generated from the 10 pieces The average value is used as an indicator. The case where the index is 0 to 10 places is ◎, the case where it is 10 or more and less than 20 places is ○, the case is 20 or more and less than 40 places is △, and the case is 40 or more is set to ◎. ×.

以下記載聚合物製備方法。再者,此處只要未特別說明,則份為 重量份。 The polymer production method is described below. In addition, as long as there is no special explanation here, the portion is Parts by weight.

[製造例1]聚合物1之製備 [Production Example 1] Preparation of Polymer 1

於甲苯中加入丙烯酸丁酯100份、丙烯酸5份及作為聚合起始劑之過氧化苯甲醯0.2份後,進行加熱而獲得丙烯酸系共聚物(聚合物1)之甲苯溶液。 100 parts of butyl acrylate, 5 parts of acrylic acid, and 0.2 part of benzoyl peroxide as a polymerization initiator were added to toluene, and then heated to obtain a toluene solution of an acrylic copolymer (polymer 1).

[製造例2]聚合物2之製備 [Production Example 2] Preparation of Polymer 2

於甲苯中加入丙烯酸2-乙基己酯30份、丙烯酸乙酯70份、丙烯酸2-羥基乙酯4份、N-苯基順丁烯二醯亞胺5份及作為聚合起始劑之過氧化苯甲醯0.2份後,進行加熱而獲得丙烯酸系共聚物(聚合物2)之甲苯溶液。 To toluene, add 30 parts of 2-ethylhexyl acrylate, 70 parts of ethyl acrylate, 4 parts of 2-hydroxyethyl acrylate, 5 parts of N-phenylcis butylene diimide, and use it as a polymerization initiator. After 0.2 parts of benzamidine oxide, heating was performed to obtain a toluene solution of an acrylic copolymer (polymer 2).

[製造例3]聚合物3之製備 [Production Example 3] Preparation of Polymer 3

於甲苯中加入丙烯酸2-乙基己酯30份、丙烯酸乙酯70份、丙烯酸2-羥基乙酯4份、甲基丙烯酸甲酯5份及作為聚合起始劑之過氧化苯甲醯0.2份後,進行加熱而獲得丙烯酸系共聚物(聚合物3)之甲苯溶液。 To toluene were added 30 parts of 2-ethylhexyl acrylate, 70 parts of ethyl acrylate, 4 parts of 2-hydroxyethyl acrylate, 5 parts of methyl methacrylate, and 0.2 parts of benzamidine peroxide as a polymerization initiator. Thereafter, heating was performed to obtain a toluene solution of an acrylic copolymer (polymer 3).

[製造例4]聚合物4之製備 [Production Example 4] Preparation of Polymer 4

於甲苯中加入丙烯酸丁酯50份、丙烯酸乙酯50份、丙烯酸5份、丙烯酸2-羥基乙酯0.1份及作為聚合起始劑之過氧化苯甲醯0.2份後,進行加熱而獲得丙烯酸系共聚物(聚合物4)之甲苯溶液。 50 parts of butyl acrylate, 50 parts of ethyl acrylate, 5 parts of acrylic acid, 0.1 part of 2-hydroxyethyl acrylate, and 0.2 part of benzoamidine peroxide as a polymerization initiator were added to toluene, and then heated to obtain an acrylic system. Copolymer (Polymer 4) in toluene.

[製造例5]聚合物5之製備 [Production Example 5] Preparation of Polymer 5

於乙酸乙酯中加入丙烯酸甲酯70份、丙烯酸2-乙基己酯30份、丙烯酸10份及作為聚合起始劑之過氧化苯甲醯0.2份後,進行加熱而獲得丙烯酸系共聚物(聚合物5)之乙酸乙酯溶液。 70 parts of methyl acrylate, 30 parts of 2-ethylhexyl acrylate, 10 parts of acrylic acid, and 0.2 parts of benzamidine peroxide as a polymerization initiator were added to ethyl acetate, and then heated to obtain an acrylic copolymer ( Polymer 5) in ethyl acetate.

[製造例6]聚合物6之製備 [Production Example 6] Preparation of Polymer 6

於甲苯中加入丙烯酸丁酯50莫耳、丙烯酸乙酯50莫耳、丙烯酸2-羥基乙酯22莫耳及作為聚合起始劑之過氧化苯甲醯(相對於丙烯酸丁酯、丙烯酸乙酯及丙烯酸2-羥基乙酯之合計100份為0.2份)後,進行加 熱而獲得共聚物溶液。於該共聚物溶液中加入相當於該溶液中之源自丙烯酸2-羥基乙酯之羥基之80莫耳%的量之丙烯酸2-異氰酸基乙酯後,進行加熱而對該源自丙烯酸2-羥基乙酯之羥基加成甲基丙烯酸2-異氰酸基乙酯,藉此獲得側鏈具有甲基丙烯酸酯基的丙烯酸系共聚物(聚合物6)之甲苯溶液。 Toluene was added with 50 mol of butyl acrylate, 50 mol of ethyl acrylate, 22 mol of 2-hydroxyethyl acrylate, and benzamidine peroxide as a polymerization initiator (vs. butyl acrylate, ethyl acrylate, and (Total 100 parts of 2-hydroxyethyl acrylate is 0.2 parts), then add Heat to obtain a copolymer solution. To this copolymer solution was added 2-isocyanatoethyl acrylate in an amount equivalent to 80 mol% of the hydroxyl group derived from 2-hydroxyethyl acrylate in the solution, and then heating was performed to the acrylic acid-derived The hydroxy group of 2-hydroxyethyl group is added to 2-isocyanatoethyl methacrylate to obtain a toluene solution of an acrylic copolymer (polymer 6) having a methacrylate group in a side chain.

[製造例7]聚合物7之製備 [Production Example 7] Preparation of Polymer 7

於甲苯中加入丙烯酸丁酯80莫耳、丙烯醯基嗎啉30莫耳、丙烯酸2-羥基乙酯20莫耳及作為聚合起始劑之過氧化苯甲醯(相對於丙烯酸丁酯、丙烯醯基嗎啉及丙烯酸2-羥基乙酯之合計100份為0.2份)後,進行加熱而獲得共聚物溶液。於該共聚物溶液中加入相當於該溶液中之源自丙烯酸2-羥基乙酯之羥基之50莫耳%的量之丙烯酸2-異氰酸基乙酯後,進行加熱而對該源自丙烯酸2-羥基乙酯之羥基加成甲基丙烯酸2-異氰酸基乙酯,藉此獲得側鏈具有甲基丙烯酸酯基的丙烯酸系共聚物(聚合物7)之甲苯溶液。 Toluene was added 80 mol of butyl acrylate, 30 mol of acrylofluorenylmorpholine, 20 mol of 2-hydroxyethyl acrylate, and benzamidine peroxide as a polymerization initiator (vs. butyl acrylate, propylene fluorene). A total of 100 parts of morpholine and 2-hydroxyethyl acrylate was 0.2 parts), and then heated to obtain a copolymer solution. To this copolymer solution was added 2-isocyanatoethyl acrylate in an amount corresponding to 50 mol% of the hydroxyl groups derived from 2-hydroxyethyl acrylate in the solution, and then heating was performed to the acrylate-derived acrylic acid. The hydroxy group of 2-hydroxyethyl group is added to 2-isocyanatoethyl methacrylate to obtain a toluene solution of an acrylic copolymer (polymer 7) having a methacrylate group in a side chain.

[實施例1] [Example 1]

(黏著劑層前驅層之形成) (Formation of Adhesive Layer Precursor Layer)

將製造例2所製備之聚合物2之甲苯溶液(聚合物2:100份)、異氰酸酯系交聯劑(日本聚氨酯公司製造、商品名「Coronate L」)1份、作為黏著賦予劑之萜烯-酚系樹脂(Sumitomo Bakelite公司製造、商品名「Sumilite Resin PR12603」)5份及熱膨脹性微球(松本油脂製藥公司製造、商品名「Matsumoto Microsphere F-50D」、發泡(膨脹)起始溫度:95℃~105℃、最大膨脹溫度:125℃~135℃、平均粒徑10μm~18μm)40份混合而製備混合液。於該混合液中進而加入與該混合液中之溶劑相同之溶劑(甲苯),將黏度調整為容易塗佈之黏度。使用敷料器,以溶劑揮發(乾燥)後之厚度達到10μm之方式,將該混合液塗佈於附帶聚矽氧脫模劑處理面之聚對苯二甲酸乙二酯膜(Mitsubishi Chemical Polyester Film公司製造、商品名「MRF38」、厚度:38μm)上,其後加以乾燥而於該聚對苯二甲酸乙二酯膜上形成黏著劑層前驅層。 A toluene solution (Polymer 2: 100 parts) of Polymer 2 prepared in Production Example 2; 1 part of an isocyanate-based crosslinking agent (manufactured by Japan Polyurethane Co., Ltd., trade name "Coronate L"); and a terpene as an adhesion-imparting agent -5 parts of phenol resin (manufactured by Sumitomo Bakelite, trade name "Sumilite Resin PR12603") and heat-expandable microspheres (manufactured by Matsumoto Oil & Gas Pharmaceutical Co., Ltd., trade name "Matsumoto Microsphere F-50D", foaming (expansion) onset temperature : 95 ° C. to 105 ° C., maximum expansion temperature: 125 ° C. to 135 ° C., average particle diameter: 10 μm to 18 μm) 40 parts were mixed to prepare a mixed solution. The same solvent (toluene) as the solvent in the mixed solution was further added to the mixed solution, and the viscosity was adjusted to a viscosity for easy application. Using an applicator, the mixed solution was coated on a polyethylene terephthalate film (Mitsubishi Chemical) with a silicone release agent-treated surface so that the thickness of the solvent was 10 μm after the solvent was evaporated (dried). Polyester Film Co., Ltd., trade name "MRF38", thickness: 38 μm), and then dried to form an adhesive layer precursor layer on the polyethylene terephthalate film.

(繫留層前驅層之形成) (Formation of the captive layer of the captive layer)

將製造例1所製備之上述聚合物1之甲苯溶液(聚合物1:100份)、作為活性能量線反應性低聚物之二季戊四醇五丙烯酸酯與二季戊四醇六丙烯酸酯之混合物(東亞合成公司製造、商品名「Aronix M404」)20份、異氰酸酯系交聯劑(日本聚氨酯公司製造、商品名「Coronate L」)2份及能量線聚合起始劑(BASF Japan公司製造、商品名「Irgacure 651」)3份混合而製備混合液。於該混合液中進而加入與該混合液中之溶劑相同之溶劑(甲苯),將黏度調整為容易塗佈之黏度。使用敷料器,以溶劑揮發(乾燥)後之厚度達到20μm之方式塗佈於附帶聚矽氧脫模劑處理面之聚對苯二甲酸乙二酯膜(Mitsubishi Chemical Polyester Film公司製造、商品名「MRF38」、厚度:38μm)上,其後加以乾燥而於該聚對苯二甲酸乙二酯膜上形成繫留層前驅層。 A toluene solution (polymer 1: 100 parts) of the above-mentioned polymer 1 prepared in Production Example 1 and a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate as an active energy ray reactive oligomer (Toa Synthetic Corporation Manufacturing, trade name "Aronix M404") 20 parts, isocyanate-based crosslinking agent (manufactured by Japan Polyurethane Co., trade name "Coronate L") 2 parts, and energy ray polymerization initiator (manufactured by BASF Japan, trade name "Irgacure 651" ") 3 parts were mixed to prepare a mixed solution. The same solvent (toluene) as the solvent in the mixed solution was further added to the mixed solution, and the viscosity was adjusted to a viscosity for easy application. Using an applicator, apply a polyethylene terephthalate film (manufactured by Mitsubishi Chemical Polyester Film, trade name " MRF38 ″, thickness: 38 μm), and then dried to form a captive layer precursor layer on the polyethylene terephthalate film.

(黏著片材1之形成) (Formation of Adhesive Sheet 1)

將上述黏著劑層前驅層與繫留層前驅層貼合。繼而,使用紫外線照射機「UM810(高壓水銀燈光源)」(日東精機公司製造),自繫留層之前驅層側照射累積光量300mJ/cm2之紫外線。其後,將附帶聚矽氧脫模劑處理面之聚對苯二甲酸乙二酯膜剝離,獲得黏著片材1(黏著劑層之厚度:10μm、繫留層之厚度:25μm)。 The adhesive layer precursor layer and the captive layer precursor layer are bonded together. Next, an ultraviolet irradiation machine "UM810 (high pressure mercury lamp light source)" (manufactured by Nitto Seiki Co., Ltd.) was used to irradiate ultraviolet rays with a cumulative light amount of 300 mJ / cm 2 from the drive layer side before the retention layer. After that, the polyethylene terephthalate film with a polysiloxane release agent-treated surface was peeled off to obtain an adhesive sheet 1 (thickness of the adhesive layer: 10 μm, thickness of the tether layer: 25 μm).

[實施例2~15、比較例1] [Examples 2 to 15, Comparative Example 1]

如表1所示設定形成黏著劑層前驅層時之聚合物、交聯劑、黏著賦予劑及熱膨脹性微球之種類及調配量,並且如表1所示設定形成繫留層前驅層時之聚合物、活性能量線反應性低聚物、交聯劑及能量線聚合起始劑之種類及調配量,除此以外,以與實施例1相同之方式獲得黏著片材。 The types and blending amounts of polymers, crosslinkers, adhesion-imparting agents, and heat-expandable microspheres when forming the precursor layer of the adhesive layer are set as shown in Table 1. Except for the types and blending amounts of the polymer, the active energy ray reactive oligomer, the crosslinking agent, and the energy ray polymerization initiator, an adhesive sheet was obtained in the same manner as in Example 1.

再者,於實施例2~5、8、10、13~15及比較例1中,在形成繫留層前驅層時,將混合液塗佈於PET膜(厚度:100μm)上而非附帶聚矽氧脫模劑處理面之聚對苯二甲酸乙二酯膜上,不剝離該PET膜而獲得具有PET膜(基材)之黏著片材。又,於實施例4及比較例1中,不照射紫外線而獲得黏著片材。 Furthermore, in Examples 2 to 5, 8, 10, 13 to 15, and Comparative Example 1, when forming a captive layer precursor layer, the mixed solution was applied to a PET film (thickness: 100 μm) instead of being incidentally polymerized. On the polyethylene terephthalate film on the surface of the silicone release agent, the PET film was not peeled off to obtain an adhesive sheet having a PET film (base material). In addition, in Example 4 and Comparative Example 1, an adhesive sheet was obtained without irradiating ultraviolet rays.

表1中所記載之交聯劑、黏著賦予劑、熱膨脹性微球、活性能量線反應性低聚物、能量線聚合起始劑之詳細內容如以下所述。 The details of the crosslinking agent, adhesion-imparting agent, heat-expandable microspheres, active energy ray reactive oligomer, and energy ray polymerization initiator described in Table 1 are as follows.

<交聯劑> <Crosslinking agent>

Tetrad C:Mitsubishi Gas Chemical公司製造、商品名「Tetrad C」、環氧系交聯劑 Tetrad C: manufactured by Mitsubishi Gas Chemical, trade name "Tetrad C", epoxy-based crosslinking agent

<黏著賦予劑> <Adhesion imparting agent>

PR51732:Sumitomo Bakelite公司製造、商品名「Sumilite Resin PR51732」 PR51732: "Sumilite Resin PR51732" by Sumitomo Bakelite

S145:Yasuhara Chemical公司製造、商品名「YS Polystar S145」 S145: "YS Polystar S145" manufactured by Yasuhara Chemical Co., Ltd.

U130:Yasuhara Chemical公司製造、商品名「YS Polystar U130」 U130: "YS Polystar U130" manufactured by Yasuhara Chemical Co., Ltd.

T160:Yasuhara Chemical公司製造、商品名「YS Polystar T160」 T160: "YS Polystar T160" manufactured by Yasuhara Chemical Co., Ltd.

<熱膨脹性微球> <Thermally expandable microspheres>

F-30D:松本油脂製藥公司製造、商品名「Matsumoto Microsphere F-30D」、發泡(膨脹)起始溫度:70℃~80℃、最大膨脹溫度:110℃~120℃、平均粒徑10μm~18μm F-30D: Manufactured by Matsumoto Grease Pharmaceutical Co., Ltd., trade name "Matsumoto Microsphere F-30D", foaming (expansion) starting temperature: 70 ° C to 80 ° C, maximum expansion temperature: 110 ° C to 120 ° C, average particle size 10μm ~ 18μm

F-65D:松本油脂製藥公司製造、商品名「Matsumoto Microsphere F-65D」、發泡(膨脹)起始溫度:105℃~115℃、最大膨脹溫度:145℃~155℃、平均粒徑12μm~18μm F-65D: Manufactured by Matsumoto Oil Pharmaceutical Co., Ltd., trade name "Matsumoto Microsphere F-65D", foaming (expansion) starting temperature: 105 ° C to 115 ° C, maximum expansion temperature: 145 ° C to 155 ° C, average particle size 12µm ~ 18μm

FN-180SSD:松本油脂製藥公司製造、商品名「Matsumoto Microsphere FN-180SSD」、發泡(膨脹)起始溫度:135℃~150℃、最大膨脹溫度:165℃~180℃、平均粒徑15μm~25μm FN-180SSD: "Matsumoto Microsphere FN-180SSD" manufactured by Matsumoto Oil & Fat Pharmaceutical Co., Ltd., foaming (expansion) starting temperature: 135 ° C ~ 150 ° C, maximum expansion temperature: 165 ° C ~ 180 ° C, average particle size 15μm ~ 25μm

F-260D:松本油脂製藥公司製造、商品名「Matsumoto Microsphere F-260D」、發泡(膨脹)起始溫度:190℃~200℃、最大膨脹溫度:250℃~260℃、平均粒徑20μm~35μm F-260D: Manufactured by Matsumoto Oil Pharmaceutical Co., Ltd., trade name "Matsumoto Microsphere F-260D", foaming (expansion) starting temperature: 190 ° C to 200 ° C, maximum expansion temperature: 250 ° C to 260 ° C, average particle size 20μm ~ 35μm

<活性能量線反應性低聚物> <Active energy ray reactive oligomer>

UV1700B:日本合成化學公司製造、商品名「紫光UV-1700B」、紫外線硬化型丙烯酸胺基甲酸酯 UV1700B: Made by Nippon Synthetic Chemical Co., Ltd., trade name "Purple UV-1700B", UV-curable acrylic urethane

UV7620EA:日本合成化學公司製造、商品名「紫光UV-7620EA」、紫外線硬化型丙烯酸胺基甲酸酯 UV7620EA: Made by Nippon Synthetic Chemical Co., Ltd., trade name "Purple UV-7620EA", UV-curable acrylic urethane

UV3000B:日本合成化學公司製造、商品名「紫光UV-3000B」、紫外線硬化型丙烯酸胺基甲酸酯 UV3000B: manufactured by Nippon Synthetic Chemical Co., Ltd., trade name "Purple UV-3000B", UV-curable acrylic urethane

M321:東亞合成公司製造、商品名「Aronix M321」、三羥甲基丙烷PO改性三丙烯酸酯(環氧丙烷(PO)之平均加成莫耳數:2莫耳) M321: manufactured by Toa Synthesis, trade name "Aronix M321", trimethylolpropane PO modified triacrylate (average addition mole number of propylene oxide (PO): 2 mole)

UV7630B:日本合成化學公司製造、商品名「紫光UV-7630B」、紫外線硬化型丙烯酸胺基甲酸酯 UV7630B: Made by Nippon Synthetic Chemical Co., Ltd., trade name "Purple UV-7630B", UV-curable acrylic urethane

<能量線聚合起始劑> <Energy ray polymerization initiator>

I184:BASF公司製造、商品名「Irgacure 184」 I184: manufactured by BASF under the trade name "Irgacure 184"

I2959:BASF公司製造、商品名「Irgacure 2959」 I2959: "Irgacure 2959" manufactured by BASF

I651:BASF公司製造、商品名「Irgacure 651」 I651: manufactured by BASF under the trade name "Irgacure 651"

[實施例16] [Example 16]

將製造例1所製備之聚合物1之甲苯溶液(聚合物1:100份)、環氧系交聯劑(Mitsubishi Gas Chemical公司製造、商品名「Tetrad C」)0.8份、作為黏著賦予劑之萜烯-酚系樹脂(Yasuhara Chemical公司製造、商品名「YS Polystar S145」)30份及熱膨脹性微球(松本油脂製藥公司製造、商品名「Matsumoto Microsphere F-50D」、發泡(膨脹)起始溫度:95℃~105℃、最大膨脹溫度:125℃~135℃、平均粒徑10μm~18μm)30份混合而製備混合液。於該混合液中進而加入與該混合液中之 溶劑相同之溶劑(甲苯),將黏度調整為容易塗佈之黏度。使用敷料器,以溶劑揮發(乾燥)後之厚度達到30μm之方式將該混合液塗佈於附帶聚矽氧脫模劑處理面之聚對苯二甲酸乙二酯膜(Mitsubishi Chemical Polyester Film公司製造、商品名「MRF38」、厚度:38μm)上,其後加以乾燥而於該聚對苯二甲酸乙二酯膜上形成黏著劑層前驅層。 A toluene solution (Polymer 1: 100 parts) of Polymer 1 prepared in Production Example 1 and 0.8 parts of an epoxy-based cross-linking agent (manufactured by Mitsubishi Gas Chemical Co., Ltd. under the trade name "Tetrad C") were used as a tackifier. 30 parts of terpene-phenol resin (manufactured by Yasuhara Chemical Co., trade name "YS Polystar S145") and thermally expandable microspheres (manufactured by Matsumoto Oil & Gas Pharmaceutical Co., Ltd., trade name "Matsumoto Microsphere F-50D", foaming (expansion)) (Starting temperature: 95 ° C. to 105 ° C., maximum expansion temperature: 125 ° C. to 135 ° C., average particle diameter 10 μm to 18 μm) 30 parts were mixed to prepare a mixed solution. To the mixed solution is further added to the mixed solution. Solvent (toluene) with the same solvent, adjust the viscosity to a viscosity that is easy to apply. Using an applicator, the mixed solution was coated on a polyethylene terephthalate film (manufactured by Mitsubishi Chemical Polyester Film Co., Ltd.) with a silicone release agent-treated surface so that the thickness of the solvent after evaporation (drying) reached 30 μm. (Trade name: "MRF38", thickness: 38 µm), and then dried to form an adhesive layer precursor layer on the polyethylene terephthalate film.

利用手壓輥使上述黏著劑層前驅層之黏著面貼合於作為繫留層之聚對苯二甲酸乙二酯膜(Toray公司製造、商品名「Lumirror Type X42」、厚度:50μm)之消光處理面上。進行高壓釜處理(40℃、5Kgf/cm2、10分鐘)而獲得黏著片材(黏著劑層(厚度:30μm)/繫留層(聚對苯二甲酸乙二酯、厚度:50μm))。 Using the hand pressure roller, the adhesive surface of the above-mentioned adhesive layer precursor layer was adhered to the matte polyethylene terephthalate film (manufactured by Toray Corporation, trade name "Lumirror Type X42", thickness: 50 μm). Treatment surface. An autoclave process (40 ° C, 5 Kgf / cm 2 , 10 minutes) was performed to obtain an adhesive sheet (adhesive layer (thickness: 30 μm) / tethering layer (polyethylene terephthalate, thickness: 50 μm)).

[實施例17] [Example 17]

將製造例4所製備之聚合物4之甲苯溶液(聚合物4:100份)、環氧系交聯劑(Mitsubishi Gas Chemical公司製造、商品名「Tetrad C」)0.8份、作為黏著賦予劑之萜烯-酚系樹脂(Yasuhara Chemical公司製造、商品名「YS Polystar S145」)5份及熱膨脹性微球(松本油脂製藥公司製造、商品名「Matsumoto Microsphere F-50D」、發泡(膨脹)起始溫度:95℃~105℃、最大膨脹溫度:125℃~135℃、平均粒徑10μm~18μm)30份混合而製備混合液。於該混合液中進而加入與該混合液中之溶劑相同之溶劑(甲苯),將黏度調整為容易塗佈之黏度。使用敷料器,以溶劑揮發(乾燥)後之厚度達到40μm之方式,將該混合液塗佈於附帶聚矽氧脫模劑處理面之聚對苯二甲酸乙二酯膜(Mitsubishi Chemical Polyester Film公司製造、商品名「MRF38」、厚度:38μm)上,其後加以乾燥而於該聚對苯二甲酸乙二酯膜上形成黏著劑層前驅層。 A toluene solution (Polymer 4: 100 parts) of Polymer 4 prepared in Production Example 4 and 0.8 parts of an epoxy-based cross-linking agent (manufactured by Mitsubishi Gas Chemical Co., trade name "Tetrad C") were used as a tackifier. 5 parts of terpene-phenol resin (manufactured by Yasuhara Chemical Co., trade name "YS Polystar S145") and thermally expandable microspheres (manufactured by Matsumoto Oil & Gas Pharmaceutical Co., Ltd., trade name "Matsumoto Microsphere F-50D", foaming (expansion)) (Starting temperature: 95 ° C. to 105 ° C., maximum expansion temperature: 125 ° C. to 135 ° C., average particle diameter 10 μm to 18 μm) 30 parts were mixed to prepare a mixed solution. The same solvent (toluene) as the solvent in the mixed solution was further added to the mixed solution, and the viscosity was adjusted to a viscosity for easy application. Using an applicator, the mixed solution was coated on a polyethylene terephthalate film (Mitsubishi Chemical Polyester Film Co., Ltd.) with a silicone release agent-treated surface so that the thickness of the solvent was 40 μm after the solvent was evaporated (dried). (Manufactured, trade name "MRF38", thickness: 38 μm), and then dried to form an adhesive layer precursor layer on the polyethylene terephthalate film.

利用線棒塗佈器(10支)將乙酸乙酯與二甲基甲醯胺之混合溶劑(乙酸乙酯:二甲基甲醯胺=1:10(體積%))塗佈於作為繫留層之聚對苯二甲酸乙二酯膜(三菱樹脂公司製造之Diafix(PG-CHI(FG、厚度200 μm)))之一個面上,利用手壓輥使上述黏著劑層前驅層之黏著面貼合於該塗佈面上。於80℃下藉由熱風乾燥機乾燥3分鐘,而獲得黏著片材(黏著劑層(厚度:40μm)/繫留層(聚對苯二甲酸乙二酯、厚度:200μm))。 Using a wire rod applicator (10), a mixed solvent of ethyl acetate and dimethylformamide (ethyl acetate: dimethylformamide = 1: 10 (vol%)) was applied as a mooring Layer of polyethylene terephthalate film (Diafix (PG-CHI (FG, thickness 200 μm))) On one surface, a hand pressure roller is used to adhere the adhesive surface of the foregoing adhesive layer precursor layer to the coated surface. It dried at 80 degreeC for 3 minutes with the hot air dryer, and obtained the adhesive sheet (adhesive layer (thickness: 40 micrometers) / tethering layer (polyethylene terephthalate, thickness: 200 micrometers)).

根據表1可明瞭,本發明之黏著片材可藉由加熱而降低黏著力,且於對被黏著體進行切斷加工時,可實現優異之切斷精度。 It is clear from Table 1 that the adhesive sheet of the present invention can reduce the adhesive force by heating, and can achieve excellent cutting accuracy when cutting the adherend.

[產業上之可利用性] [Industrial availability]

本發明之製造方法及黏著片材可適宜地用於半導體晶片等晶片狀電子零件之製造。 The manufacturing method and the adhesive sheet of the present invention can be suitably used for manufacturing wafer-shaped electronic parts such as semiconductor wafers.

Claims (10)

一種黏著片材,其具備含有複數個熱膨脹性微球之黏著劑層、及配置於該黏著劑層之單側之繫留層,至少1個以上熱膨脹性微球自該黏著劑層突出,突出之該熱膨脹性微球埋入繫留層中,繫留層於25℃下藉由奈米壓痕法所測得之彈性模數為1MPa~5000MPa。An adhesive sheet is provided with an adhesive layer containing a plurality of thermally expandable microspheres, and a mooring layer disposed on one side of the adhesive layer. At least one or more thermally expandable microspheres protrude from the adhesive layer. The thermally expandable microspheres are embedded in a captive layer, and the elastic modulus of the captive layer measured by the nanoindentation method at 25 ° C is 1 MPa to 5000 MPa. 如請求項1之黏著片材,其中上述黏著劑層含有具有大於該黏著劑層之厚度之粒徑的熱膨脹性微球。The adhesive sheet according to claim 1, wherein the adhesive layer contains thermally expandable microspheres having a particle diameter larger than a thickness of the adhesive layer. 如請求項1之黏著片材,其中上述熱膨脹性微球之自上述黏著劑層突出之部分之高度為0.4μm以上。For example, the adhesive sheet of claim 1, wherein the height of the part of the thermally expandable microspheres protruding from the adhesive layer is 0.4 μm or more. 如請求項1之黏著片材,其中於包含上述熱膨脹性微球自上述黏著劑層突出之部分的特定區域之剖面觀察下,該黏著劑層與上述繫留層之界面之長度(11)與該界面之厚度方向投影線之長度(L)的比(11/L)為1.02以上。For example, the adhesive sheet of claim 1, wherein the length (11) of the interface between the adhesive layer and the mooring layer is observed under a cross-section of a specific area including the part where the thermally expandable microspheres protrude from the adhesive layer. The ratio (11 / L) of the length (L) of the projection line in the thickness direction of this interface is 1.02 or more. 如請求項1之黏著片材,其中上述熱膨脹性微球之平均粒徑為6μm~45μm。For example, the adhesive sheet of claim 1, wherein the average particle diameter of the thermally expandable microspheres is 6 μm to 45 μm. 如請求項1之黏著片材,其中上述黏著劑層之厚度為20μm以下。The adhesive sheet according to claim 1, wherein the thickness of the above-mentioned adhesive layer is 20 μm or less. 如請求項1之黏著片材,其中藉由加熱使上述熱膨脹性微球膨脹或發泡時,上述黏著劑層之與上述繫留層相反之側之面之表面粗糙度Ra為3μm以上。For example, in the adhesive sheet of claim 1, when the thermally expandable microspheres are expanded or foamed by heating, the surface roughness Ra of the surface of the adhesive layer on the side opposite to the mooring layer is 3 μm or more. 如請求項1之黏著片材,其中上述黏著劑層於25℃下藉由奈米壓痕法所測得之彈性模數未達100MPa。For example, the adhesive sheet of claim 1, wherein the elastic modulus of the above-mentioned adhesive layer measured by the nanoindentation method at 25 ° C does not reach 100 MPa. 如請求項1之黏著片材,其於上述繫留層之與上述黏著劑層相反之側進而具備基材。For example, the adhesive sheet of claim 1 further includes a base material on the side of the mooring layer opposite to the adhesive layer. 一種電子零件之製造方法,其包括:於如請求項1至9中任一項之黏著片材上貼附電子零件材料後,對該電子零件材料進行切斷加工。An electronic component manufacturing method includes: after attaching an electronic component material to an adhesive sheet according to any one of claims 1 to 9, cutting the electronic component material.
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