TWI653821B - Circular super low voltage-controlled oscillator for chip circuit - Google Patents

Circular super low voltage-controlled oscillator for chip circuit Download PDF

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TWI653821B
TWI653821B TW106143626A TW106143626A TWI653821B TW I653821 B TWI653821 B TW I653821B TW 106143626 A TW106143626 A TW 106143626A TW 106143626 A TW106143626 A TW 106143626A TW I653821 B TWI653821 B TW I653821B
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nmos transistor
voltage
pmos transistors
drain
controlled oscillator
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TW106143626A
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TW201929415A (en
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蔡水河
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大陸商常州欣盛微結構電子有限公司
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Abstract

本發明涉及一種用於芯片電路的超低壓環形壓控震盪器,其特徵在於,包括兩級延遲單元,所述震盪器包括兩個首尾相接的延遲單元,透過調節延遲單元的延遲時間調整工作頻率。本發明兩級環形壓控震盪器,採用襯底前饋偏置結構,降低電晶體閾值電壓,降低電源電壓,減小功耗,同時具有較大的調諧範圍,特別適合於低電源電壓工作的系統。The invention relates to an ultra-low voltage annular voltage controlled oscillator for a chip circuit, which comprises a two-stage delay unit, wherein the oscillator comprises two delay units connected end to end, and adjusts the delay time of the delay unit by adjusting the delay unit. frequency. The two-stage annular voltage controlled oscillator of the invention adopts a substrate feedforward bias structure to reduce the threshold voltage of the transistor, reduce the power supply voltage, reduce power consumption, and has a large tuning range, and is particularly suitable for low power supply voltage operation. system.

Description

用於芯片電路的超低壓環形壓控震盪器Ultra low voltage ring voltage controlled oscillator for chip circuit

本發明涉及震盪器技術領域,更具體地說,涉及一種超低壓兩級環形壓控震盪器。 The invention relates to the field of oscillators, and more particularly to an ultra-low voltage two-stage annular voltage controlled oscillator.

壓控震盪器是類比電路和數位電路的重要組成模組。壓控震盪器有很多種不同的實現方式,環形震盪器與傳統的LC震盪器相比,佔用更小的晶片面積並且具有更大的調節範圍。如果環形震盪器由兩級延遲構成,那麼它能夠在高頻下工作,並且提供正交輸出。 The voltage controlled oscillator is an important component of the analog circuit and the digital circuit. There are many different implementations of voltage controlled oscillators. The ring oscillator occupies a smaller wafer area and has a larger adjustment range than a conventional LC oscillator. If the ring oscillator consists of two stages of delay, it can operate at high frequencies and provide quadrature output.

現代CMOS工藝中,技術特徵尺寸和電源電壓需要成比例縮小以維持器件的穩定性。對於環形震盪器來說,由於電晶體的高閾值電壓,它很難在0.5V的電源電壓下正常工作。MOS電晶體的襯底連接正向偏置是降低電晶體閾值電壓的有效方法。在設計中,襯底正向偏置技術被應用於帶有局部正回饋的延遲單元中。 In modern CMOS processes, the technical feature size and supply voltage need to be scaled down to maintain device stability. For a ring oscillator, it is difficult to operate normally at a supply voltage of 0.5V due to the high threshold voltage of the transistor. The substrate connection forward biasing of MOS transistors is an effective way to reduce the threshold voltage of the transistor. In design, substrate forward biasing techniques are applied to delay cells with local positive feedback.

因此,現有技術亟待有很大的進步。 Therefore, the prior art needs to be greatly improved.

本發明解決的技術問題在於,針對現有技術的上述的缺陷,提供一種超低壓環形壓控震盪器,包括:包括兩級延遲單元,所述震盪器透過調節 延遲單元的延遲時間調整工作頻率;延遲單元包括PMOS電晶體M1、M2、M3、M4,NMOS管M5、M6、M7、M8,及負載電容CLThe technical problem to be solved by the present invention is to provide an ultra-low voltage toroidal voltage-controlled oscillator for the above-mentioned defects of the prior art, comprising: a two-stage delay unit, wherein the oscillator adjusts the operating frequency by adjusting the delay time of the delay unit; The unit includes PMOS transistors M1, M2, M3, M4, NMOS transistors M5, M6, M7, M8, and a load capacitance C L .

在本發明所述的超低壓環形壓控震盪器中,PMOS電晶體M2、M4的襯底接地,PMOS電晶體M1、M3的襯底連接控制電壓Vc,PMOS電晶體M1、M3的柵極接地,PMOS電晶體M1、M3源極接VDD,PMOS電晶體M1、M3漏極連接PMOS電晶體M2、M4的柵極和漏極;NMOS電晶體M5和NMOS電晶體M6分別作為延遲單元的正相和反相差分輸入端,NMOS電晶體M7和NMOS電晶體M8的源漏極分別與NMOS電晶體M5和NMOS電晶體M6的源漏極相連,NMOS電晶體M7柵極接NMOS電晶體M6的漏極,NMOS電晶體M8的柵極接NMOS電晶體M5的漏極;NMOS電晶體M5的漏極作為反相輸出端,NMOS電晶體M6的漏極作為正相輸出端,輸出端接負載電容CL;NMOS電晶體的襯底端連接偏置電壓VBIn the ultra-low voltage toroidal voltage controlled oscillator according to the present invention, the substrates of the PMOS transistors M2 and M4 are grounded, the substrates of the PMOS transistors M1 and M3 are connected to the control voltage Vc, and the gates of the PMOS transistors M1 and M3 are grounded. The PMOS transistors M1 and M3 are connected to the VDD, the PMOS transistors M1 and M3 are connected to the gates and drains of the PMOS transistors M2 and M4, and the NMOS transistor M5 and the NMOS transistor M6 are used as the positive phases of the delay unit, respectively. And the inverting differential input terminal, the source and the drain of the NMOS transistor M7 and the NMOS transistor M8 are respectively connected to the source and the drain of the NMOS transistor M5 and the NMOS transistor M6, and the gate of the NMOS transistor M7 is connected to the drain of the NMOS transistor M6. The gate of the NMOS transistor M8 is connected to the drain of the NMOS transistor M5; the drain of the NMOS transistor M5 is used as an inverting output terminal, the drain of the NMOS transistor M6 is used as a positive phase output terminal, and the output terminal is connected to the load capacitor C. L ; the substrate end of the NMOS transistor is connected to the bias voltage V B .

實施本發明的超低壓環形壓控震盪器,具有以下有益效果:採用襯底正向偏置結構,降低電晶體閾值電壓,降低電源電壓,減小功耗;兩級結構,電路結構簡單,面積較小,易於實現與集成;與LC震盪器結構相比,兩級環形震盪器電路具有大的調諧範圍。 The ultra low voltage annular voltage controlled oscillator embodying the invention has the following beneficial effects: adopting a substrate forward bias structure, reducing the threshold voltage of the transistor, reducing the power supply voltage, and reducing power consumption; the two-stage structure, the circuit structure is simple, and the area Smaller, easier to implement and integrate; the two-stage ring oscillator circuit has a large tuning range compared to the LC oscillator structure.

圖1MOS電晶體閾值電壓隨襯底電壓Vc的示意圖;圖2A為超低壓環形壓控震盪器結構的示意圖;圖2B為超低壓環形壓控震盪器延遲單元結構的示意圖;以及圖3為壓控震盪器頻率變化的示意圖。 FIG schematic 1MOS transistor threshold voltage with the substrate supply voltage V c; Figure 2A is a schematic extra low voltage VCO ring structure; FIG. 2B is a schematic configuration of a unit delay ultra-low pressure loop voltage controlled oscillator; FIG. 3 is a pressure and Schematic diagram of controlling the frequency change of the oscillator.

茲為便於更進一步對本發明之構造、使用及其特徵有更深一層明確、詳實的認識與瞭解,爰舉出較佳實施例,配合圖式詳細說明如下: In order to further clarify and understand the structure, the use and the features of the present invention, the preferred embodiment is described in detail with reference to the following drawings:

請參閱圖1,為MOS電晶體閾值電壓隨襯底電壓Vc變化圖。襯底正向偏置技術可以有效降低了MOS電晶體的閾值電壓。 Please refer to FIG. 1 , which is a graph of the threshold voltage of the MOS transistor as a function of the substrate voltage V c . The substrate forward bias technique can effectively reduce the threshold voltage of the MOS transistor.

以0.18um RF CMOS工藝為例,NMOS和PMOS電晶體的閾值電壓約+/-0.5V,當電源電壓為0.5V時,這個閾值電壓會大大限制電路的性能。透過正向偏置MOS電晶體的襯底能夠降低閾值電壓。在0.18um RF CMOS工藝下,透過使用深N阱來將敏感的類比電路與襯底雜訊隔離,所以不管是襯底連接的NMOS電晶體還是PMOS電晶體都可以透過襯底正向偏置降低閾值電壓。 Taking the 0.18um RF CMOS process as an example, the threshold voltages of NMOS and PMOS transistors are about +/- 0.5V. When the supply voltage is 0.5V, this threshold voltage will greatly limit the performance of the circuit. The threshold voltage can be lowered by the substrate of the forward bias MOS transistor. In the 0.18um RF CMOS process, the sensitive analog circuit is isolated from the substrate noise by using a deep N-well, so both the NMOS transistor and the PMOS transistor connected to the substrate can be forward biased through the substrate. Threshold voltage.

襯底正向偏置的PMOS電晶體閾值電壓(Vthp)可以表示為: The substrate forward biased PMOS transistor threshold voltage (V thp ) can be expressed as:

|Vthp0|是源襯電壓(Vsb)為0時的|Vthp|,γ是體效應係數,|φ f|是費米勢。因此,閾值電壓|Vth|隨著Vsb的增加而減小,PMOS電晶體閾值電壓隨襯底偏置電壓變化如圖1所示。由圖1可知,當PMOS電晶體的襯底偏置電壓從500mV到0V變化時,PMOS電晶體的閾值電壓從-500mV到-366mV變化。當NMOS電晶體的襯底偏置電壓Vc從0V到0.5V變化時,NMOS電晶體的閾值電壓(Vthn)從531mV到423mV變化。這對MOS電晶體工作在超低電源電壓下十分有效。 |V thp0 | is |V thp | when the source lining voltage (V sb ) is 0, γ is the body effect coefficient, and | φ f | is the Fermi potential. Therefore, the threshold voltage |Vt h | decreases as V sb increases, and the PMOS transistor threshold voltage varies with the substrate bias voltage as shown in FIG. 1 . As can be seen from FIG. 1, when the substrate bias voltage of the PMOS transistor changes from 500 mV to 0 V, the threshold voltage of the PMOS transistor changes from -500 mV to -366 mV. When the NMOS transistor substrate bias supply voltage V c changes from 0V to 0.5V, the threshold voltage of the NMOS transistor (V thn) changes from 531mV to 423mV. This is very effective for MOS transistors operating at ultra-low supply voltages.

請參閱圖2A,為超低壓環形壓控震盪器結構,由兩個相同的延遲單元組成。延遲單元如圖2B所示。PMOS電晶體M2、M4的襯底接地,PMOS電晶體M1、M3的襯底連接控制電壓Vc,PMOS電晶體M1、M3的柵極接地,PMOS電晶體M1、M3源極接VDD,PMOS電晶體M1、M3漏極連接PMOS電晶體M2、 M4的柵極和漏極;NMOS電晶體M5和NMOS電晶體M6分別作為延遲單元的正相和反相差分輸入端,NMOS電晶體M7和NMOS電晶體M8的源漏極分別與NMOS電晶體M5和NMOS電晶體M6的源漏極相連,NMOS電晶體M7柵極接NMOS電晶體M6的漏極,NMOS電晶體M8的柵極接NMOS電晶體M5的漏極;NMOS電晶體M5的漏極作為反相輸出端,NMOS電晶體M6的漏極作為正相輸出端,輸出端接負載電容CL;而每一個NMOS電晶體M5、M6、M7、M8的襯底端連接偏置電壓VBReferring to Figure 2A, the ultra-low voltage toroidal voltage controlled oscillator structure consists of two identical delay units. The delay unit is shown in Figure 2B. The substrates of the PMOS transistors M2 and M4 are grounded, the substrates of the PMOS transistors M1 and M3 are connected to the control voltage Vc, the gates of the PMOS transistors M1 and M3 are grounded, and the sources of the PMOS transistors M1 and M3 are connected to the VDD. The drains of M1 and M3 are connected to the gates and drains of PMOS transistors M2 and M4; the NMOS transistors M5 and NMOS transistors M6 are used as the positive and negative differential inputs of the delay unit, respectively, NMOS transistor M7 and NMOS transistor. The source and drain of M8 are respectively connected to the source and drain of NMOS transistor M5 and NMOS transistor M6, the gate of NMOS transistor M7 is connected to the drain of NMOS transistor M6, and the gate of NMOS transistor M8 is connected to NMOS transistor M5. The drain of the NMOS transistor M5 serves as an inverting output terminal, the drain of the NMOS transistor M6 serves as a positive phase output terminal, and the output terminal is connected to the load capacitor C L ; and each NMOS transistor M5, M6, M7, M8 The substrate terminal is connected to the bias voltage V B .

請參閱圖2B,為超低壓環形壓控震盪器延遲單元結構。本發明提出設計的環形震盪器,具體實施時基於0.18um RF工藝進行設計。圖3給出了控制電壓變化時,壓控震盪器的頻率變化範圍。從圖3可以看出,當控制電壓Vc從0V到0.5V變化時,該VCO的工作頻率調節範圍是從392MHz到88MHz,VCO增益為-608MHz/V。 Please refer to FIG. 2B, which is an ultra-low voltage toroidal voltage controlled oscillator delay unit structure. The invention proposes a ring oscillator designed in a specific implementation based on a 0.18 um RF process. Figure 3 shows the frequency variation range of the voltage controlled oscillator when the control voltage changes. As it can be seen from Figure 3, when the control supply voltage V c changes from 0V to 0.5V, the operating frequency of the VCO is adjusted range from 88MHz to 392MHz, VCO gain -608MHz / V.

本發明透過以上實施例的設計,可以做到採用襯底正向偏置結構,降低電晶體閾值電壓,降低電源電壓,減小功耗;兩級結構,電路結構簡單,面積較小,易於實現與集成。 Through the design of the above embodiment, the present invention can adopt the substrate forward bias structure, reduce the threshold voltage of the transistor, reduce the power supply voltage, and reduce the power consumption; the two-stage structure, the circuit structure is simple, the area is small, and the implementation is easy. With integration.

上述所舉實施例,僅用為方便說明本發明並非加以限制,在不離本發明精神範疇,熟悉此一行業技藝人士依本發明申請專利範圍及創作說明所作之各種簡易變形與修飾,均仍應含括於以下申請專利範圍中。 The above-mentioned embodiments are not intended to limit the scope of the present invention, and various simple modifications and modifications made by those skilled in the art in accordance with the scope of the invention and the description of the invention should still be made without departing from the spirit of the invention. It is included in the scope of the following patent application.

Claims (1)

一種用於芯片電路的超低壓環形壓控震盪器,包含:兩級延遲單元,所述震盪器透過調節延遲單元的延遲時間調整工作頻率,延遲單元包括PMOS電晶體M1、M2、M3、M4,NMOS管M5、M6、M7、M8,及負載電容CL;其中,PMOS電晶體M2、M4的襯底接地,PMOS電晶體M1、M3的襯底連接控制電壓Vc,PMOS電晶體M1、M3的柵極接地,PMOS電晶體M1、M3源極接VDD,PMOS電晶體M1、M3漏極連接PMOS電晶體M2、M4的柵極和漏極,NMOS電晶體M5和NMOS電晶體M6分別作為延遲單元的正相和反相差分輸入端,NMOS電晶體M7和NMOS電晶體M8的源漏極分別與NMOS電晶體M5和NMOS電晶體M6的源漏極相連,NMOS電晶體M7柵極接NMOS電晶體M6的漏極,NMOS電晶體M8的柵極接NMOS電晶體M5的漏極,NMOS電晶體M5的漏極作為反相輸出端,NMOS電晶體M6的漏極作為正相輸出端,輸出端接負載電容CL,而每一個NMOS電晶體M5、M6、M7、M8的襯底端連接偏置電壓VBAn ultra-low voltage toroidal voltage controlled oscillator for a chip circuit, comprising: a two-stage delay unit, wherein the oscillator adjusts an operating frequency by adjusting a delay time of the delay unit, and the delay unit comprises PMOS transistors M1, M2, M3, M4, NMOS transistors M5, M6, M7, M8, and load capacitance C L ; wherein the substrates of the PMOS transistors M2, M4 are grounded, the substrates of the PMOS transistors M1, M3 are connected to the control voltage Vc, and the PMOS transistors M1, M3 The gate is grounded, the PMOS transistors M1 and M3 are connected to VDD, the PMOS transistors M1 and M3 are connected to the gates and drains of the PMOS transistors M2 and M4, and the NMOS transistor M5 and the NMOS transistor M6 are used as delay units, respectively. The positive and negative differential input terminals, the source and drain of the NMOS transistor M7 and the NMOS transistor M8 are respectively connected to the source and drain of the NMOS transistor M5 and the NMOS transistor M6, and the NMOS transistor M7 is connected to the NMOS transistor. The drain of M6, the gate of NMOS transistor M8 is connected to the drain of NMOS transistor M5, the drain of NMOS transistor M5 is used as the inverting output terminal, and the drain of NMOS transistor M6 is used as the positive phase output terminal, and the output terminal is connected. Load capacitance C L , and substrate termination of each NMOS transistor M5, M6, M7, M8 Connected to the bias voltage V B .
TW106143626A 2017-12-12 2017-12-12 Circular super low voltage-controlled oscillator for chip circuit TWI653821B (en)

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Citations (2)

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Publication number Priority date Publication date Assignee Title
US6218892B1 (en) 1997-06-20 2001-04-17 Intel Corporation Differential circuits employing forward body bias
US20060114044A1 (en) 2004-11-30 2006-06-01 Svilen Mintchev Differential delay cell having controllable amplitude output

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6218892B1 (en) 1997-06-20 2001-04-17 Intel Corporation Differential circuits employing forward body bias
US20060114044A1 (en) 2004-11-30 2006-06-01 Svilen Mintchev Differential delay cell having controllable amplitude output

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
L. S. de Paula, S. Bampi, E. Fabris and A. A. Susin, "A High Swing Low Power CMOS Differential Voltage-Controlled Ring Oscillator," 2007 14th IEEE International Conference on Electronics, Circuits and Systems, Marrakech, 2007, pp. 498-501.

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