TWI651292B - Phosphor, illuminating device and manufacturing method thereof - Google Patents

Phosphor, illuminating device and manufacturing method thereof Download PDF

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TWI651292B
TWI651292B TW103143820A TW103143820A TWI651292B TW I651292 B TWI651292 B TW I651292B TW 103143820 A TW103143820 A TW 103143820A TW 103143820 A TW103143820 A TW 103143820A TW I651292 B TWI651292 B TW I651292B
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phosphor
wavelength
light
diffuse reflectance
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TW201529527A (en
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竹田豪
野野垣良三
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日商電化股份有限公司
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/77348Silicon Aluminium Nitrides or Silicon Aluminium Oxynitrides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/501Wavelength conversion elements characterised by the materials, e.g. binder
    • H01L33/502Wavelength conversion materials

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Abstract

本發明係有關一種在紫外到近紫外線的波長領域可有效率地激發而進行藍色發光之賽隆(SiAlON)螢光體、該螢光體的製造方法及使用該螢光體之發光裝置。 The present invention relates to a SiAlON phosphor that can efficiently excite in the wavelength range of ultraviolet to near ultraviolet to emit blue light, a method for manufacturing the same, and a light-emitting device using the same.

本發明之螢光體係由通式:MeaEubAlcSidOeNf所表示,組成比a、b、c、d、e及f為a+b=1,0.01<b<0.20,1.65<c<2.50,2.50<d<4.00,3.15<e<4.90,及2.80<f<4.30,Me為Sr與Ba中任一方或雙方,且在藉由近紫外或紫色光激發時,於波長450~485nm的範圍進行具有峰值的藍色發光,其在波長700~800nm的平均擴散反射率是90%以上,在螢光峰值波長的擴散反射率是85%以上。 The fluorescent system of the present invention is represented by the general formula: Me a Eu b Al c Si d O e N f , and the composition ratios a, b, c, d, e, and f are a + b = 1, 0.01 <b <0.20 , 1.65 <c <2.50, 2.50 <d <4.00, 3.15 <e <4.90, and 2.80 <f <4.30, Me is either or both of Sr and Ba, and when excited by near-ultraviolet or purple light, in The wavelength of 450 to 485 nm performs blue light emission with a peak. The average diffuse reflectance at a wavelength of 700 to 800 nm is 90% or more, and the diffuse reflectance at a fluorescent peak wavelength is 85% or more.

Description

螢光體、發光裝置及其製造方法 Phosphor, light emitting device and manufacturing method thereof

本發明係有關一種在紫外到近紫外線的波長領域被有效率地激發而進行藍色發光之賽隆(SiAlON)系螢光體、該螢光體的製造方法及使用該螢光體之發光裝置。 The present invention relates to a SiAlON-based phosphor that is efficiently excited to emit blue light in a wavelength range from ultraviolet to near ultraviolet, a method for manufacturing the same, and a light-emitting device using the same. .

有關化學的穩定性、耐熱性、耐久性優異的螢光體方面,結晶構造穩定的氮化物、氮氧化物的螢光體受到矚目。其中,有關氮化物、氮氧化物的代表方面,廣泛採用賽隆螢光體。 Regarding phosphors having excellent chemical stability, heat resistance, and durability, nitrides and oxynitride phosphors with stable crystal structures have attracted attention. Among them, the representative aspect of nitrides and oxynitrides is the widespread use of Sialon phosphors.

專利文獻1在關於發光效率優異之藉Eu激活的β型賽隆螢光體方面,提案了將與基於電子自旋共振光譜的計測中之在25℃下之g=2.00±0.02的吸收相對應之自旋密度控制在2.0×1017個/g以下。透過控制自旋密度,使未伴隨於來自母體結晶本身的發光之光吸收被降低,得以改善發光效率。特別是實施例中具體揭示之螢光體的發光效率顯示已改善達到39~58%。 Patent Document 1 proposes a β-sialon phosphor activated by Eu with excellent luminous efficiency, which corresponds to an absorption at 25 ° C of g = 2.00 ± 0.02 in measurement based on an electron spin resonance spectrum. The spin density is controlled to be 2.0 × 10 17 spins / g or less. By controlling the spin density, the absorption of light that does not accompany the emission of light from the parent crystal itself is reduced, and the luminous efficiency can be improved. In particular, the luminous efficiency of the phosphors specifically disclosed in the examples has been shown to have improved by 39 to 58%.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

國際公開第2008/062781號公報 International Publication No. 2008/062781

惟,有效率地吸收來自發光光源的激發光並發光係不限於LED用途,而是所有的螢光體用途所要求之特性。因此,被要求更加改善發光效率。 However, the efficient absorption of the excitation light from the light-emitting source and the light-emitting system are not limited to LED applications, but are characteristics required for all phosphor applications. Therefore, it is required to further improve the luminous efficiency.

本發明者們為解決上述課題,就賽隆螢光體的結晶構造及光學特性精心研究檢討的結果,發現透過將構成螢光體的元素的組成比設在特定範圍,並且控制在波長700~800nm的平均擴散反射率及在螢光峰值波長的擴散反射率,則能明顯改善發光效率,乃至完成本發明。 In order to solve the above-mentioned problems, the present inventors carefully studied and reviewed the crystal structure and optical characteristics of Sialon phosphors, and found that by setting the composition ratio of the elements constituting the phosphors in a specific range and controlling the wavelength to 700 ~ The average diffuse reflectance at 800 nm and the diffuse reflectance at the peak wavelength of fluorescence can obviously improve the luminous efficiency, and even complete the present invention.

亦即,本發明之目的在於提供一種螢光體,其由通式:MeaEubAlcSidOeNf所表示,組成比a、b、c、d、e及f為,a+b=1,0.01<b<0.20,1.65<c<2.50,2.50<d<4.00,3.15<e<4.90,及2.80<f<4.30,Me係Sr與Ba的任一方或雙方,在以近紫外或紫色光激發的情況下在波長450~485nm的範圍發出具有峰值的藍色光,該螢光體在波長700~800nm的平均擴散反射率是90%以上,在螢光峰值波長的擴散反射率是85%以上。 That is, an object of the present invention is to provide a phosphor, which is represented by the general formula: Me a Eu b Al c Si d O e N f , and the composition ratios a, b, c, d, e, and f are, a + b = 1, 0.01 <b <0.20, 1.65 <c <2.50, 2.50 <d <4.00, 3.15 <e <4.90, and 2.80 <f <4.30, Me is either or both of Sr and Ba, in near ultraviolet When it is excited by purple or purple light, it emits blue light with a peak in a wavelength range of 450 to 485 nm. The average diffuse reflectance of the phosphor at a wavelength of 700 to 800 nm is more than 90%. The diffuse reflectance at the peak wavelength of the fluorescent light is More than 85%.

又,本發明之目的在於提供一種螢光體的製造方法,其係具有混合原料之混合步驟、燒成混合步驟後的原料之燒成步驟、及對燒成步驟後的燒成物退火處理之退火步驟,且於混合步驟中之供給Sr及/或Ba的原料是此等的鋁酸鹽之螢光體的製造方法。 Another object of the present invention is to provide a method for producing a phosphor, which comprises a mixing step of mixing raw materials, a baking step of raw materials after the baking mixing step, and an annealing treatment of the fired product after the baking step. The annealing step and the raw materials for supplying Sr and / or Ba in the mixing step are methods for producing such aluminate phosphors.

再者,本發明之目的在於提供一種具備上述的螢光體與發光光源之發光裝置。 Another object of the present invention is to provide a light-emitting device including the above-mentioned phosphor and a light-emitting light source.

本發明的螢光體係透過控制螢光體的組成比及擴散反射率,而可實現比以往的賽隆螢光體還高的發光效率。又,依據本發明的螢光體的製造方法,能再現性佳地製造上述那樣的發光特性優異的螢光體。再者,本發明的發光裝置透過使用上述那樣的高發光效率的螢光體而可實現亮度優異的發光裝置。 By controlling the composition ratio and diffuse reflectance of the phosphor, the fluorescent system of the present invention can achieve higher luminous efficiency than the conventional Sialon phosphor. In addition, according to the method for producing a phosphor of the present invention, it is possible to produce a phosphor having excellent light emission characteristics as described above with good reproducibility. In addition, the light-emitting device of the present invention can realize a light-emitting device having excellent brightness by using a phosphor having a high light-emitting efficiency as described above.

【圖1】係顯示在實施例1~2及比較例1~2所記載的螢光體的激發波長450nm~800nm中之擴散反射率(%)的圖表。 FIG. 1 is a graph showing diffuse reflectance (%) at excitation wavelengths of 450 nm to 800 nm of the phosphors described in Examples 1 to 2 and Comparative Examples 1 to 2. FIG.

[實施發明之形態] [Form of Implementing Invention] <螢光體> <Fluorescent body> 1.組成 Composition

本發明所涉及之螢光體係由通式:MeaEubAlcSidOeNf所表示。該通式係表示螢光體之組成式,a~f係元素的 比。本說明書中,只要沒特別記載,組成比a、b、c、d、e及f係表示以成為a+b=1之方式算出之情況的數值。 不用說,於a~f乘上正的任意數之元素比亦可視為相同組成式。 The fluorescent system involved in the present invention is represented by the general formula: Me a Eu b Al c Si d O e N f . This general formula represents the composition formula of a phosphor, and the ratio of a to f elements. In this specification, unless otherwise stated, the composition ratios a, b, c, d, e, and f are numerical values calculated when a + b = 1. Needless to say, the element ratio of an arbitrary number multiplied by a to f can also be regarded as the same composition formula.

以成為a+b=1之方式算出之情況的組成比 a、b、c、d、e及f為,a+b=1,0.01<b<0.20,1.65<c<2.50,2.50<d<4.00,3.15<e<4.90,及2.80<f<4.30。 The composition ratio in the case calculated as a + b = 1 a, b, c, d, e, and f are: a + b = 1, 0.01 <b <0.20, 1.65 <c <2.50, 2.50 <d <4.00, 3.15 <e <4.90, and 2.80 <f <4.30.

當組成比a~f偏離該範圍時,會引起螢光體的結晶構造呈不穩定化,助長第二相的形成等而使擴散反射率降低。其結果,母體結晶的非發光吸收增大,導致發光效率降低。 When the composition ratios a to f deviate from this range, the crystal structure of the phosphor becomes unstable, the formation of the second phase is promoted, and the diffuse reflectance is decreased. As a result, the non-luminous absorption of the parent crystal is increased, and the luminous efficiency is reduced.

其中,表示發光元素Eu的離子濃度之b,在 0.01以下時發光元素離子的原子數少,故無法獲得足夠的發光效率,在0.20以上時助長第二相之形成,發光元素離子的原子數變過多,會衍生所謂的因鄰接的發光離子彼此之激發能量的再吸收效應之濃度消光的現象之結果,而有發光強度降低的情況。表示Eu的離子濃度之b,更佳為0.015<b<0.15,更佳為0.020<b<0.100的範圍。 Where b represents the ion concentration of the light-emitting element Eu, in When 0.01 or less, the number of light-emitting element ions is small, so sufficient luminous efficiency cannot be obtained. When it is 0.20 or more, the formation of the second phase is promoted. When the number of light-emitting element ions becomes too large, the so-called As a result of the phenomenon of extinction of the concentration of the reabsorption effect of the excitation energy, the luminous intensity may be reduced. The b representing the ion concentration of Eu is more preferably in the range of 0.015 <b <0.15, and more preferably 0.020 <b <0.100.

又,上述通式中之Me係Sr與Ba的任一方或 雙方。將Me設為Sr與Ba的任一方或雙方之原因為,作為Me元素,能以Ba係維持著結晶構造之狀態對Sr以全部的比率在結晶構造中固溶取代之緣故。 In addition, Me in the general formula is either one of Sr and Ba or both sides. The reason why Me is set to either or both of Sr and Ba is that, as the element Me, the crystalline structure can be maintained in the Ba system, and Sr is solid-solution substituted in the crystalline structure at all ratios.

2.擴散反射率 2. Diffusion reflectance

本發明的螢光體除滿足上述組成的特徵外,亦將特定波長領域中之擴散反射率是在指定數值範圍設為特徵之一。亦即,在波長700~800nm的平均擴散反射率為90%以上,更佳為94%以上,且在螢光峰值波長的擴散反射率為85%以上,更佳為87%以上。 In addition to satisfying the characteristics of the composition described above, the phosphor of the present invention sets the diffuse reflectance in a specific wavelength range as one of the characteristics in a specified numerical range. That is, the average diffuse reflectance at a wavelength of 700 to 800 nm is 90% or more, more preferably 94% or more, and the diffuse reflectance at a fluorescent peak wavelength is 85% or more, and more preferably 87% or more.

藉由擴散反射率控制在上述範圍而使發光效率明顯提升的理由方面,主要可考量如下。 The reason why the luminous efficiency is significantly improved by controlling the diffuse reflectance to the above range can be considered mainly as follows.

亦即,由於螢光體的發光係依成為發光中心之Eu2+離子的電子遷移而產生,所以通常,未伴隨於來自母體結晶的發光之吸收少,光的透射性越高而發光效率越提升。擴散反射率係在螢光體粉末內的光擴散過程因光的吸收而降低,故擴散反射率越高係意味著光的透射性高。如由於本發明的由通式:MeaEubAlcSidOeNf所表示的螢光體係由300~500nm的範圍之光所激發,故在比波長700nm還大的發光領域之擴散反射率係呈現螢光體中的Eu2+以外的吸收,即未伴隨於來自母體結晶的發光之吸收。因此,可認為是在波長700~800nm的平均擴散反射率越高,未伴隨於來自母體結晶的發光之吸收越少,而使光取出效率越優異。 That is, since the light emission of the phosphor is generated by the electron migration of Eu 2+ ions that become the light emission center, generally, the absorption of light that does not accompany the parent crystal is less, and the higher the light transmission, the more efficient the light emission. Promotion. The diffuse reflectance is a process in which the light diffusion in the phosphor powder is reduced due to the absorption of light. Therefore, the higher the diffuse reflectance is, the higher the light transmittance is. For example, since the fluorescent system represented by the general formula: Me a Eu b Al c Si d O e N f of the present invention is excited by light in a range of 300 to 500 nm, it diffuses in a light emitting field larger than a wavelength of 700 nm. The reflectance shows absorption other than Eu 2+ in the phosphor, that is, absorption that is not accompanied by light emission from the parent crystal. Therefore, it is considered that the higher the average diffuse reflectance at a wavelength of 700 to 800 nm, the less the absorption of luminescence that is not accompanied by the parent crystal, and the better the light extraction efficiency.

另一方面,有別於在波長700~800nm的擴 散反射率,在螢光峰值波長的擴散反射率亦呈現與螢光特性密切的關係。在螢光峰值波長的擴散反射率係因結晶內的Eu2+附近存在結晶缺陷而降低。並且,當在Eu2+周圍存在結晶缺陷時,Eu2+的激發電子被捕捉使得發光受抑制。因此,可認為是在螢光峰值波長的擴散反射率 越高,發光越不受抑制,而發光效率越優異。 On the other hand, unlike the diffuse reflectance at a wavelength of 700 to 800 nm, the diffuse reflectance at the peak fluorescence wavelength also shows a close relationship with the fluorescence characteristics. The diffuse reflectance at the fluorescence peak wavelength is reduced due to crystal defects near Eu 2+ in the crystal. And, when there is a defect in the crystal around Eu 2+, Eu 2+ excited electrons are captured so that the emission is suppressed. Therefore, it is considered that the higher the diffuse reflectance at the peak wavelength of fluorescence, the less the emission is suppressed, and the more excellent the light emission efficiency.

本發明的螢光體係藉由將在波長700~ 800nm的平均擴散反射率及在螢光峰值波長的擴散反射率雙方控制在上述指定範圍,使得發光效率比以往的螢光體還要優異。 The fluorescent system of the present invention Both the average diffuse reflectance at 800 nm and the diffuse reflectance at the peak wavelength of the fluorescence are controlled within the above-mentioned specified range, so that the luminous efficiency is better than that of conventional phosphors.

擴散反射率係與螢光體中的結晶缺陷、第 二相、吸收可見光的雜質之存在有密切關係,藉由將此等降低而能控制在上述範圍。 Diffusion reflectance is related to crystal defects in phosphors, The existence of two-phase, visible-light-absorbing impurities is closely related, and it can be controlled in the above range by reducing these.

其中,螢光體所含之雜質-碳的含量控制在0.06wt%以下,更佳為0.04wt%以下。當碳含量超過0.06wt%時,會有在波長700~800nm的平均擴散反射率明顯降低,來自母體結晶的非發光吸收增大,發光效率降低之傾向。 於本發明的螢光體能以雜質形態存在之碳,可認為是螢光體的原料所含者或在燒成之際從所使用的容器等混入者。 The content of the impurity-carbon contained in the phosphor is controlled to be 0.06 wt% or less, and more preferably 0.04 wt% or less. When the carbon content exceeds 0.06 wt%, the average diffuse reflectance at a wavelength of 700 to 800 nm will be significantly reduced, the non-luminous absorption from the parent crystal will increase, and the luminous efficiency tends to decrease. The carbon that can be present as an impurity in the phosphor of the present invention can be considered to be contained in the raw material of the phosphor or mixed in from a container used during firing.

又,在製造螢光體之際,亦因透過進行退火處理、酸處理而降低結晶缺陷,故可提升擴散反射率。 In addition, when a phosphor is manufactured, crystal defects are reduced by performing an annealing treatment and an acid treatment, so that the diffuse reflectance can be improved.

透過按以上那樣控制組成比及擴散反射率 ,本發明的螢光體係由波長300nm以上420nm以下的從紫外到近紫外線的光所激發,在波長450nm以上485nm以下的藍色具有發光峰值波長,可實現高的發光效率,具體言之,58%以上的發光效率。 By controlling the composition ratio and diffuse reflectance as described above The fluorescent system of the present invention is excited by light from ultraviolet to near ultraviolet with a wavelength of 300nm to 420nm, and blue having a wavelength of 450nm to 485nm has a peak light emission wavelength, and in particular, 58 Luminous efficiency above%.

<螢光體的製造方法> <Method for Manufacturing Phosphor>

本發明的螢光體的製造方法係包含:混合含有鋁酸鹽的原料之混合步驟;燒成混合步驟後的原料之燒成步 驟;及在燒成步驟後進行退火處理之退火步驟。又,在退火步驟後,進一步含有酸處理步驟較佳。 The method for producing a phosphor of the present invention includes a mixing step of mixing a raw material containing aluminate, and a baking step of the raw material after the baking mixing step. Step; and an annealing step of performing an annealing treatment after the firing step. It is also preferable to further include an acid treatment step after the annealing step.

1.混合步驟 Mixing step

當在混合步驟所用的原料是使用碳酸鍶等之含碳原料時,因源自於原料粉的碳一部份以碳或碳化物形態被螢光體所包含,有導致波長700~800nm中之平均擴散反射率降低之傾向。因此,特別將供給Sr及/或Ba的原料限定為此等的鋁酸鹽,藉此,可大幅降低螢光體所含之雜質-碳的含量,可實現高發光效率。 When the raw material used in the mixing step is a carbonaceous raw material such as strontium carbonate, the carbon derived from the raw material powder is contained by the phosphor in the form of carbon or carbide, which results in a wavelength of 700 to 800 nm. The average diffuse reflectance tends to decrease. Therefore, in particular, the raw materials to be supplied to Sr and / or Ba are limited to such aluminates, whereby the content of impurities-carbon contained in the phosphor can be significantly reduced, and high luminous efficiency can be achieved.

較佳的原料之組合方面,可使用鋁酸鍶粉 末及/或鋁酸鋇粉末、氮化矽粉末及/或氧化矽粉末、氧化鋁粉末及/或氮化鋁粉末、氧化銪粉末。此等原料的摻合比例可基於組成比a~f作適宜設計。 For the combination of better raw materials, strontium aluminate powder can be used. Powder and / or barium aluminate powder, silicon nitride powder and / or silicon oxide powder, aluminum oxide powder and / or aluminum nitride powder, hafnium oxide powder. The blending ratio of these raw materials can be appropriately designed based on the composition ratios a to f.

混合原料,有乾式混合的方法、在與原料各成分實質上不反應的非活性溶媒中濕式混合後除去溶媒的方法。混合裝置方面,例如,可使用V型混合機、搖擺式混合機、球磨機、振動研磨機。又,亦可視需要添加助熔劑。助熔劑方面,可使用鹼金屬的鹵化物、鹼土類金屬的鹵化物、Al的鹵化物等。 The raw materials are mixed by a dry mixing method and a method of removing the solvent by wet mixing in an inactive solvent that does not substantially react with each component of the raw material. As the mixing device, for example, a V-type mixer, a swing mixer, a ball mill, and a vibration mill can be used. Moreover, you may add a flux as needed. As the flux, a halide of an alkali metal, a halide of an alkaline earth metal, a halide of Al, or the like can be used.

2.燒成步驟 2.Baking step

於混合粉末乾燥後,至少混合粉末充填於接觸的面是氮化硼構成的坩堝等的容器內,在設為1氣壓以上的燒成爐內,於空氣、氬、或氮氣環境中以1450~1750℃燒成。當燒成溫度低於1450℃時,化合物彼此未充分反應 ,發生第二相生成或結晶性降低,而有波長700~800nm的平均擴散反射率降低的傾向。另一方面,當焙燒溫度高於1750℃時,藉由隔著液相的反應使燒成物完全成為燒結體,會有因在將此粉末化之際進行機械性粉碎等而結晶性降低的傾向。 After the mixed powder is dried, at least the mixed powder is filled in a container such as a crucible made of boron nitride on a contact surface, in a firing furnace set at a pressure of 1 atmosphere or more, and in an air, argon, or nitrogen environment at a temperature of 1450 ~ Sintered at 1750 ° C. When the firing temperature is lower than 1450 ° C, the compounds do not fully react with each other The second phase is formed or crystallinity is reduced, and the average diffuse reflectance at a wavelength of 700 to 800 nm tends to decrease. On the other hand, when the firing temperature is higher than 1750 ° C, the sintered body is completely made of a sintered body by a reaction through a liquid phase, and crystallinity may be reduced by mechanically pulverizing or the like when the powder is powdered. tendency.

在燒成步驟中的最高溫度之保持時間亦會依燒成溫度而改變,通常為1~20小時。 The holding time of the highest temperature in the firing step will also vary depending on the firing temperature, usually 1 to 20 hours.

3.退火步驟 3. Annealing step

退火步驟係以使用燒成爐、燒成爐內為1氣壓以上且在1300℃以上1650℃以下進行較佳。在退火步驟的環境可使用氮、氬及氫當中的一種或二種以上的混合環境。 The annealing step is preferably performed using a firing furnace, and the inside of the firing furnace is at least 1 atmosphere and at least 1300 ° C and 1650 ° C. The environment of the annealing step may use one or a mixture of two or more of nitrogen, argon, and hydrogen.

4.酸處理步驟 4. Acid treatment steps

在進行酸處理步驟的情況,可使用鹽酸、硫酸、硝酸當中的一種或二種以上的混合溶液或其混合溶液以離子交換水稀釋後的酸性溶液。透過施行酸處理步驟,可將殘存在螢光體的表面之雜質氣化除去,能使發光效率更提升。 In the case of performing the acid treatment step, one or two or more mixed solutions of hydrochloric acid, sulfuric acid, and nitric acid or an acid solution in which the mixed solution is diluted with ion-exchanged water may be used. By performing the acid treatment step, impurities remaining on the surface of the phosphor can be vaporized and removed, and the luminous efficiency can be further improved.

<發光裝置> <Light-emitting device>

本發明的發光裝置係包含發光元件與本發明的螢光體。此種發光裝置除了本發明的螢光體以外,亦可組合使用1種以上的比本發明的螢光體在長波長具有發光峰值波長的螢光體。 The light-emitting device of the present invention includes a light-emitting element and the phosphor of the present invention. In addition to the phosphor of the present invention, such a light-emitting device may be used in combination with one or more phosphors having a light emission peak wavelength at a longer wavelength than the phosphor of the present invention.

比起本發明的螢光體在長波長具有發光峰 值波長的螢光體,係指在485nm以上的波長域具有發光峰值之螢光體,例如,有β-SiAlON:Eu,(Ba,Sr)2SiO4 :Eu,Sr-SiAlON:Eu,α-SiAlON:Eu,(Li,Ca)(Al,Si)2(N,O)3:Ce,(Ca,Sr,Ba)2Si5N8:Eu,SrAlSi4N7:Eu,(Ca,Sr)AlSiN3:Eu,La2O2S:Eu。可與本發明的螢光體併用的螢光體未特別限定,可因應發光裝置所要求之亮度、演色性等作適宜選擇。 Compared with the phosphor of the present invention, a phosphor having an emission peak wavelength at a long wavelength means a phosphor having an emission peak in a wavelength range of 485 nm or more. For example, β-SiAlON: Eu, (Ba, Sr) 2 SiO 4 : Eu, Sr-SiAlON: Eu, α-SiAlON: Eu, (Li, Ca) (Al, Si) 2 (N, O) 3 : Ce, (Ca, Sr, Ba) 2 Si 5 N 8 : Eu, SrAlSi 4 N 7 : Eu, (Ca, Sr) AlSiN 3 : Eu, La 2 O 2 S: Eu. The phosphor that can be used in combination with the phosphor of the present invention is not particularly limited, and can be appropriately selected depending on the brightness, color rendering, and the like required by the light-emitting device.

發光元件較佳為具有340nm以上450nm以下的發光的無機發光元件或有機發光元件。發光元件以雷射二極體元件、LED元件較佳。 The light emitting element is preferably an inorganic light emitting element or an organic light emitting element having a light emission of 340 nm to 450 nm. The light emitting element is preferably a laser diode element or an LED element.

發光裝置可作為液晶TV用背光、投影機的光源裝置、照明裝置、交通信號機或道路標識等。 The light-emitting device can be used as a backlight for a liquid crystal TV, a light source device for a projector, a lighting device, a traffic light, a road sign, and the like.

[實施例] [Example]

藉由以下所示的實施例來更詳細說明本發明。表1係顯示各實施例及比較例的螢光體的組成比、擴散反射率、碳含量、發光效率。 The present invention will be described in more detail by the following examples. Table 1 shows the composition ratio, diffuse reflectance, carbon content, and luminous efficiency of the phosphors of the respective examples and comparative examples.

<實施例1> <Example 1> 1.螢光體的製造 1. Manufacture of phosphor

經以下的混合步驟、燒成步驟、退火步驟製造實施例1的螢光體。 The phosphor of Example 1 was produced through the following mixing steps, firing steps, and annealing steps.

<混合步驟> <Mixing step>

螢光體的原料方面,使用SrAl2O4(鋁酸鍶)、Si3N4(氮化矽)、Al2O3(氧化鋁)、及Eu2O3(氧化銪)的粉末。將此等以成為表1記載之組成比之方式秤量,使用V型混合機(筒井理化學器械公司製S-3)混合,作成混合粉末。 As a raw material of the phosphor, powders of SrAl 2 O 4 (strontium aluminate), Si 3 N 4 (silicon nitride), Al 2 O 3 (alumina), and Eu 2 O 3 (hafnium oxide) were used. These were weighed so as to have the composition ratios described in Table 1, and mixed using a V-type mixer (S-3 manufactured by Tsutsui Rika Chemical Co., Ltd.) to prepare a mixed powder.

<燒成步驟> <Baking step>

將所獲得之混合粉末充填於帶有蓋子的圓筒型氮化硼製容器(電氣化學工業公司製N-1等級)。將充填著混合粉末的氮化硼製坩堝放置於使用以碳纖維形成體作為隔熱材的石墨加熱器加熱方式的電爐,將混合粉末燒成。燒成係為藉由旋轉泵及擴散泵使電爐的加熱框體內成為真空,從室溫充填氮氣達1氣壓為止,從室溫到1650℃以每小時500℃的速度昇溫,在1650℃保持4小時。將燒成物粉碎,使螢光體成為粉末狀。 The obtained mixed powder was filled into a cylindrical boron nitride container with a lid (N-1 grade manufactured by Denka Kogyo Co., Ltd.). The boron nitride crucible filled with the mixed powder was placed in an electric furnace of a graphite heater heating method using a carbon fiber formed body as a heat insulating material, and the mixed powder was fired. The firing system is to use a rotary pump and a diffusion pump to make the heating frame of the electric furnace vacuum. From room temperature to nitrogen pressure of 1 atmosphere, the temperature is raised from room temperature to 1650 ° C at a rate of 500 ° C per hour and maintained at 1650 ° C for 4 hours. hour. The fired material is pulverized to make the phosphor powdery.

<退火步驟> <Annealing step>

對所獲得之燒成物在氮氣環境中(大氣壓)、1500℃、進行8小時的退火處理而獲得實施例1的螢光體。 The obtained fired product was annealed in a nitrogen atmosphere (atmospheric pressure) at 1500 ° C. for 8 hours to obtain the phosphor of Example 1.

2.組成比的分析 2. Analysis of composition ratio

組成比a~f係透過將所獲得之螢光體用以下方法分析而求得。亦即,針對Me元素、Eu元素、Al及Si的陽離子元素,藉由ICP發光分光分析法,針對O及N的陰離子 ,使用氮氧分析計,關於碳含量,則使用C/S同時分析計(CS-444LS型)求得。 The composition ratios a to f are obtained by analyzing the obtained phosphor by the following method. That is, cationic elements of Me element, Eu element, Al, and Si, and anions of O and N by ICP emission spectrometry. For the carbon content, use a C / S simultaneous analyzer (CS-444LS) to determine the carbon content.

3.擴散反射率之測定 3. Measurement of diffuse reflectance

在700~800nm的平均擴散反射率及在螢光峰值波長的擴散反射率,係以於日本分光公司製紫外可見分光光度計(V-550)安裝著積分球裝置(ISV-469)的裝置作測定。以標準反射板[波長校準標品(Spectralon)(註冊商標)]進行基線修正,放置充填著螢光體粉末試料的固體試料保持器,在450~800nm的波長範圍進行擴散反射率之測定。 The average diffuse reflectance at 700 to 800 nm and the diffuse reflectance at the peak wavelength of fluorescence are based on a device equipped with an integrating sphere device (ISV-469) installed in an ultraviolet-visible spectrophotometer (V-550) manufactured by Japan Spectroscopy Corporation. Determination. Baseline correction was performed with a standard reflection plate [Wavelength Calibration Standard (Spectralon) (registered trademark)], a solid sample holder filled with a phosphor powder sample was placed, and the diffusion reflectance was measured in a wavelength range of 450 to 800 nm.

在700~800nm的平均擴散反射率係此測定結果中的在700nm到800nm的平均值。在螢光峰值波長的擴散反射率係此測定結果中的在螢光峰值波長(469nm附近)之測定結果。 The average diffuse reflectance at 700 ~ 800nm is the average value of 700nm to 800nm in this measurement result. The diffuse reflectance at the fluorescence peak wavelength is a measurement result at the fluorescence peak wavelength (near 469 nm) among the measurement results.

4.發光效率之測定 4. Measurement of Luminous Efficiency

螢光體的發光效率係用以下方法測定。使用大塚電子股份有限公司製MCPD-7000,於其試料部設置反射率99%的標準反射板(藍菲(Labsphere)公司製,Spectralon),測定波長405nm的激發光之光譜。在那時,從400~415nm的波長範圍的光譜算出激發光光子數(Qex)。接著,於試料部設置螢光體,從所獲得之光譜資料算出螢光光子數(Qem)。螢光光子數係在415~800nm的範圍算出。從所獲得之光子數求得發光效率(=Qem/Qex×100)。 The luminous efficiency of the phosphor was measured by the following method. Using MCPD-7000, manufactured by Otsuka Electronics Co., Ltd., a standard reflection plate (Spectralon, manufactured by Labsphere, Inc.) with a reflectance of 99% was installed in the sample section, and the spectrum of excitation light having a wavelength of 405 nm was measured. At that time, the number of excited photons (Qex) was calculated from the spectrum in the wavelength range of 400 to 415 nm. Next, a phosphor is set in the sample part, and the number of fluorescent photons (Qem) is calculated from the obtained spectral data. The number of fluorescent photons is calculated in the range of 415 to 800 nm. The luminous efficiency (= Qem / Qex × 100) was obtained from the number of obtained photons.

實施例1的螢光體之組成係Ba0.93Eu0.07Al1.83Si2.75O3.28N3.12。實施例1的螢光體為, 發光效率是60%,在波長700~800nm的平均擴散反射率是95%,在螢光峰值波長的擴散反射率是87%,碳含量是0.04wt%。表1雖無記載,惟其發光峰值波長係在469nm±8nm的範圍內。 The composition of the phosphor of Example 1 is Ba 0.93 Eu 0.07 Al 1.83 Si 2.75 O 3.28 N 3.12 . The phosphor of Example 1 has a luminous efficiency of 60%, an average diffuse reflectance at a wavelength of 700 to 800 nm of 95%, a diffuse reflectance at a peak fluorescent wavelength of 87%, and a carbon content of 0.04 wt%. Although there is no record in Table 1, the emission peak wavelength is in the range of 469nm ± 8nm.

<實施例2> <Example 2>

實施例2除了在退火步驟後將所獲得之螢光體投入經以離子交換水稀釋硝酸後的酸性溶液中30~60分鐘而進行酸處理步驟以外,其餘同實施例1地進行製造。硝酸的稀釋率設為容量比12%。 Example 2 was manufactured in the same manner as in Example 1 except that the phosphor obtained after the annealing step was put into an acidic solution in which nitric acid was diluted with ion-exchanged water for 30 to 60 minutes. The dilution rate of nitric acid was set to 12% by volume.

實施例2的螢光體之組成係Ba0.93Eu0.07Al1.89Si2.84O3.45N3.13。實施例2的螢光體係發光效率是67%,在波長700~800nm的平均擴散反射率是96%,在螢光峰值波長的擴散反射率是93%,碳含量係0.04wt%。表1雖無記載,惟發光峰值波長係在469nm±8nm的範圍內。 The composition of the phosphor of Example 2 was Ba 0.93 Eu 0.07 Al 1.89 Si 2.84 O 3.45 N 3.13 . The luminous efficiency of the fluorescent system of Example 2 was 67%, the average diffuse reflectance at a wavelength of 700 to 800 nm was 96%, the diffuse reflectance at a peak fluorescent wavelength was 93%, and the carbon content was 0.04 wt%. Although there is no record in Table 1, the emission peak wavelength is in the range of 469nm ± 8nm.

<實施例3> <Example 3>

實施例3除了進一步將BaAl2O4(鋁酸鋇)作為原料進行摻合以外,其餘同實施例2地進行製造。實施例3的螢光體之組成係(Sr,Ba)0.93Eu0.07Al1.83Si2.68O3.38N3.12,Sr、Ba的組成比是Sr:Ba=1.00:1.24。 Example 3 was manufactured in the same manner as in Example 2 except that BaAl 2 O 4 (barium aluminate) was further blended as a raw material. The composition of the phosphor of Example 3 was (Sr, Ba) 0.93 Eu 0.07 Al 1.83 Si 2.68 O 3.38 N 3.12 , and the composition ratio of Sr and Ba was Sr: Ba = 1.00: 1.24.

實施例3的螢光體係發光效率是62%,在波長700~800nm的平均擴散反射率是94%,在螢光峰值波長的擴散反射率是87%,碳含量是0.02wt%。表1雖無記載,惟其發光峰值波長係在469nm±8nm的範圍內。 The luminous efficiency of the fluorescent system of Example 3 was 62%, the average diffuse reflectance at a wavelength of 700 to 800 nm was 94%, the diffuse reflectance at a peak fluorescent wavelength was 87%, and the carbon content was 0.02 wt%. Although there is no record in Table 1, the emission peak wavelength is in the range of 469nm ± 8nm.

<實施例4> <Example 4>

實施例4除了進一步將BaAl2O4(鋁酸鋇)作為原料進行摻合以外,其餘同實施例2地進行製造。實施例4的螢光體之組成係(Sr,Ba)0.93Eu0.07Al2.10Si3.84O3.95N4.22,Sr、Ba的組成比是Sr:Ba=1.00:1.19。 Example 4 was produced in the same manner as in Example 2 except that BaAl 2 O 4 (barium aluminate) was further blended as a raw material. The composition of the phosphor of Example 4 was (Sr, Ba) 0.93 Eu 0.07 Al 2.10 Si 3.84 O 3.95 N 4.22 , and the composition ratio of Sr and Ba was Sr: Ba = 1.00: 1.19.

實施例4的螢光體係發光效率是62%,在波長700~800nm的平均擴散反射率是94%,在螢光峰值波長的擴散反射率是88%,碳含量是0.02wt%。表1雖無記載,惟其發光峰值波長係在469nm±8nm的範圍內。 The luminous efficiency of the fluorescent system of Example 4 was 62%, the average diffuse reflectance at a wavelength of 700 to 800 nm was 94%, the diffuse reflectance at a peak fluorescent wavelength was 88%, and the carbon content was 0.02 wt%. Although there is no record in Table 1, the emission peak wavelength is in the range of 469nm ± 8nm.

<實施例5> <Example 5>

實施例5除了使用BaAl2O4(鋁酸鋇)來取代SrAl2O4(鋁酸鍶)以外,其餘同實施例2地進行製造。實施例5的螢光體之組成係Ba0.96Eu0.04Al1.93Si2.99O3.55N3.09Example 5 was produced in the same manner as in Example 2 except that BaAl 2 O 4 (barium aluminate) was used instead of SrAl 2 O 4 (strontium aluminate). The composition of the phosphor of Example 5 is Ba 0.96 Eu 0.04 Al 1.93 Si 2.99 O 3.55 N 3.09 .

實施例5的螢光體係發光效率是59%,在波長700~800nm的平均擴散反射率是95%,在螢光峰值波長的擴散反射率是93%,碳含量是0.03wt%。表1雖無記載,惟其發光峰值波長係在469nm±8nm的範圍內。 The luminous efficiency of the fluorescent system of Example 5 is 59%, the average diffuse reflectance at a wavelength of 700 to 800 nm is 95%, the diffuse reflectance at a peak fluorescent wavelength is 93%, and the carbon content is 0.03 wt%. Although there is no record in Table 1, the emission peak wavelength is in the range of 469nm ± 8nm.

<比較例1> <Comparative example 1>

比較例1除了沒進行退火處理以外,其餘同實施例1地進行製造。比較例1的螢光體之組成係Ba0.93Eu0.07Al1.85Si2.74O3.50N3.18。比較例1的螢光體係發光效率是49%,在波長700~800nm的平均擴散反射率是94%,在螢光峰值波長的擴散反射率是79%。表1雖無記載,惟比較例1的螢光體的發光峰值波長係在469nm±8nm的範圍內。 Comparative Example 1 was manufactured in the same manner as in Example 1 except that the annealing treatment was not performed. The composition of the phosphor of Comparative Example 1 was Ba 0.93 Eu 0.07 Al 1.85 Si 2.74 O 3.50 N 3.18 . The luminous efficiency of the fluorescent system of Comparative Example 1 was 49%, the average diffuse reflectance at a wavelength of 700 to 800 nm was 94%, and the diffuse reflectance at a peak fluorescence wavelength was 79%. Although there is no description in Table 1, the emission peak wavelength of the phosphor of Comparative Example 1 is in a range of 469 nm ± 8 nm.

<比較例2> <Comparative example 2>

比較例2除了使用碳酸鋇來取代SrAl2O4(鋁酸鍶)以外,其餘同實施例2地進行製造。比較例2的螢光體之組成係Ba0.93Eu0.07Al1.90Si3.05O3.75N3.23。比較例2的螢光體係發光效率是55%,在波長700~800nm的平均擴散反射率是87%,在螢光峰值波長的擴散反射率是84%,碳含量是0.08wt%。 Comparative Example 2 was produced in the same manner as in Example 2 except that barium carbonate was used instead of SrAl 2 O 4 (strontium aluminate). The composition of the phosphor of Comparative Example 2 was Ba 0.93 Eu 0.07 Al 1.90 Si 3.05 O 3.75 N 3.23 . The luminous efficiency of the fluorescent system of Comparative Example 2 was 55%, the average diffuse reflectance at a wavelength of 700 to 800 nm was 87%, the diffuse reflectance at a fluorescent peak wavelength was 84%, and the carbon content was 0.08 wt%.

<比較例3> <Comparative example 3>

比較例3除了使用碳酸鋇及碳酸鍶來取代SrAl2O4(鋁酸鍶)以外,其餘同實施例2地進行製造。比較例3的螢光體之組成係(Sr,Ba)0.93Eu0.07Al1.91Si2.89O3.59N3.20,Sr、Ba的組成比是Sr:Ba=1.00:1.22。比較例3的螢光體係發光效率是54%,在波長700~800nm的平均擴散反射率是86%,在螢光峰值波長的擴散反射率是84%,碳含量是0.10wt%。 Comparative Example 3 was produced in the same manner as in Example 2 except that barium carbonate and strontium carbonate were used instead of SrAl 2 O 4 (strontium aluminate). The composition system of the phosphor of Comparative Example 3 was (Sr, Ba) 0.93 Eu 0.07 Al 1.91 Si 2.89 O 3.59 N 3.20 , and the composition ratio of Sr and Ba was Sr: Ba = 1.00: 1.22. The luminous efficiency of the fluorescent system of Comparative Example 3 was 54%, the average diffuse reflectance at a wavelength of 700 to 800 nm was 86%, the diffuse reflectance at a fluorescent peak wavelength was 84%, and the carbon content was 0.10 wt%.

<比較例4> <Comparative Example 4>

比較例4除了進一步將BaAl2O4(鋁酸鋇)作為原料進行摻合及Si的組成比d不被本發明所規定之範圍所包含以外,其餘同實施例2地進行製造。比較例4的螢光體之組成係(Sr,Ba)0.93Eu0.07Al1.68Si2.49O3.60N2.77,Sr、Ba的組成比是Sr:Ba=1.00:2.55。比較例4的螢光體係發光效率是48%,在波長700~800nm的平均擴散反射率是83%,在螢光峰值波長的擴散反射率是79%。 Comparative Example 4 was manufactured in the same manner as in Example 2 except that BaAl 2 O 4 (barium aluminate) was further blended as a raw material and the composition ratio d of Si was not included in the range defined by the present invention. The composition system of the phosphor of Comparative Example 4 was (Sr, Ba) 0.93 Eu 0.07 Al 1.68 Si 2.49 O 3.60 N 2.77 , and the composition ratio of Sr and Ba was Sr: Ba = 1.00: 2.55. The luminous efficiency of the fluorescent system of Comparative Example 4 was 48%, the average diffuse reflectance at a wavelength of 700 to 800 nm was 83%, and the diffuse reflectance at a peak fluorescent wavelength was 79%.

<比較例5> <Comparative example 5>

比較例5除了進一步將BaAl2O4(鋁酸鋇)作為原料進行摻合及Eu、Al、O的組成比b、c、e不被本發明所規定 之範圍所包含以外,其餘同實施例2地進行製造。比較例5的螢光體之組成係(Sr,Ba)0.78Eu0.22Al2.52Si2.99O4.91N3.10,Sr、Ba的組成比是Sr:Ba=1.00:2.45。比較例5的螢光體係發光效率是43%,在波長700~800nm的平均擴散反射率是80%,在螢光峰值波長的擴散反射率是77%。 Comparative Example 5 was the same as in Example except that BaAl 2 O 4 (barium aluminate) was further blended as a raw material and the composition ratios b, c, and e of Eu, Al, and O were not included in the range specified by the present invention. Manufacturing at 2 locations. The composition system of the phosphor of Comparative Example 5 was (Sr, Ba) 0.78 Eu 0.22 Al 2.52 Si 2.99 O 4.91 N 3.10 , and the composition ratio of Sr and Ba was Sr: Ba = 1.00: 2.45. The luminous efficiency of the fluorescent system of Comparative Example 5 was 43%, the average diffuse reflectance at a wavelength of 700 to 800 nm was 80%, and the diffuse reflectance at a peak fluorescence wavelength was 77%.

圖1係顯示實施例1、2及比較例1、2的螢光 體的擴散反射光譜。可確認實施例2係透過進行酸處理,而擴散反射率係比實施例1還高。比較例1可理解是因為沒進行退火處理,使得擴散反射率變得比實施例1還低,特別是在峰值波長附近的擴散反射率明顯降低。又,比較例2可理解是因為原料使用碳酸鹽使碳含量高,特別是在波長700~800nm的平均擴散反射率明顯降低。 Fig. 1 shows the fluorescence of Examples 1 and 2 and Comparative Examples 1 and 2. Volume diffuse reflectance spectrum. It was confirmed that Example 2 was subjected to acid treatment through transmission, and the diffuse reflectance was higher than that of Example 1. In Comparative Example 1, it is understood that the diffuse reflectance is lower than that in Example 1 because the annealing treatment is not performed, and the diffuse reflectance in the vicinity of the peak wavelength is significantly reduced. In Comparative Example 2, it is understood that the use of carbonate as a raw material increases the carbon content, and in particular, the average diffuse reflectance at a wavelength of 700 to 800 nm is significantly reduced.

<實施例6> <Example 6>

使用混合於密封材之實施例1的螢光體與作為發光元件的發光二極體來製造發光構件。相較於使用比較例1或2的螢光體進行同樣製造的發光構件,此發光構件係呈現高的亮度。 A light-emitting member was produced using the phosphor of Example 1 mixed with a sealing material and a light-emitting diode as a light-emitting element. This light-emitting member exhibits higher brightness than a light-emitting member manufactured in the same manner using the phosphor of Comparative Example 1 or 2.

又,使用此發光構件製造發光裝置的結果,可實現比以往還高亮度。 Moreover, as a result of manufacturing a light-emitting device using this light-emitting member, it is possible to achieve higher brightness than in the past.

Claims (5)

一種螢光體,係由通式:MeaEubAlcSidOeNf所表示,組成比a、b、c、d、e及f為,a+b=1,0.01<b<0.20,1.65<c<2.50,2.50<d<4.00,3.15<e<4.90,及2.80<f<4.30,Me為Sr與Ba中任一方或雙方,且在藉由近紫外或紫色光激發時,於波長450~485nm的範圍進行具有峰值的藍色發光,其在波長700~800nm的平均擴散反射率是90%以上,在螢光峰值波長的擴散反射率是85%以上。A phosphor is represented by the general formula: Me a Eu b Al c Si d O e N f , and the composition ratios a, b, c, d, e, and f are, a + b = 1, 0.01 <b < 0.20, 1.65 <c <2.50, 2.50 <d <4.00, 3.15 <e <4.90, and 2.80 <f <4.30, Me is either or both of Sr and Ba, and when excited by near-ultraviolet or purple light, The peak blue light emission is performed in a wavelength range of 450 to 485 nm. The average diffuse reflectance at a wavelength of 700 to 800 nm is 90% or more, and the diffuse reflectance at a fluorescent peak wavelength is 85% or more. 如請求項1之螢光體,其中碳含量是0.06wt%以下。For example, the phosphor of claim 1, wherein the carbon content is 0.06 wt% or less. 一種發光裝置,係具有如請求項1或2之螢光體、發光光源。A light-emitting device includes a phosphor and a light-emitting light source as claimed in claim 1 or 2. 一種螢光體的製造方法,係製造如請求項1或2的螢光體之螢光體的製造方法,其具有混合原料之混合步驟、燒成混合步驟後的原料之燒成步驟、及對燒成步驟後的燒成物進行退火處理之退火步驟,其中,混合步驟中之供給Sr及/或Ba的原料是此等的鋁酸鹽。A method for manufacturing a phosphor, which is a method for manufacturing a phosphor as claimed in claim 1 or 2, comprising a mixing step of mixing raw materials, a baking step of raw materials after the baking mixing step, and The fired product after the firing step is an annealing step of annealing treatment, wherein the raw material for supplying Sr and / or Ba in the mixing step is such an aluminate. 如請求項4之螢光體的製造方法,其中在退火步驟後更具有酸處理步驟。The method for manufacturing a phosphor as claimed in claim 4, further comprising an acid treatment step after the annealing step.
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