TWI648254B - Method for producing pest control agent and intermediate thereof - Google Patents

Method for producing pest control agent and intermediate thereof Download PDF

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TWI648254B
TWI648254B TW104104495A TW104104495A TWI648254B TW I648254 B TWI648254 B TW I648254B TW 104104495 A TW104104495 A TW 104104495A TW 104104495 A TW104104495 A TW 104104495A TW I648254 B TWI648254 B TW I648254B
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TW201613856A (en
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Shingo Yasumura
安村信吾
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Kumiai Chemical Industry Co., Ltd.
日商組合化學工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/22Preparation of thiols, sulfides, hydropolysulfides or polysulfides of hydropolysulfides or polysulfides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/22Preparation of thiols, sulfides, hydropolysulfides or polysulfides of hydropolysulfides or polysulfides
    • C07C319/24Preparation of thiols, sulfides, hydropolysulfides or polysulfides of hydropolysulfides or polysulfides by reactions involving the formation of sulfur-to-sulfur bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/18Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/20Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton with singly-bound oxygen atoms bound to carbon atoms of the same non-condensed six-membered aromatic ring

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Abstract

本發明之目的在於可提供適合以工業規模製造具有防除有害生物的活性之通式(4)之化合物的製造中間體、及彼等之製造方法。 An object of the present invention is to provide a production intermediate suitable for producing a compound of general formula (4) having pest control activity on an industrial scale, and a method for producing the same.

解決手段為:將巰基酚衍生物氧化,接著於鹼之存在下,使與通式(a)所表示的化合物:R3-X(式中,R3為C1~C4鹵烷基硫基C2~C10烷基;X為鹵素原子等)反應而獲得通式(3)所表示的化合物: The solution is: oxidize the mercaptophenol derivative, and then in the presence of a base, make the compound represented by the general formula (a): R 3 -X (wherein R 3 is C1 to C4 haloalkylthio C2 ~ C10 alkyl; X is a halogen atom, etc.) to obtain a compound represented by the general formula (3):

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基),於鹼之存在下,與通式(b)所表示的化合物:R4-Y(式中,R4為C1~C4鹵烷基;Y為鹵素原子等)反應,而製造通式(4)所表示的化合物: (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group), and in the presence of a base, a compound represented by the general formula (b): R 4 -Y (wherein R 4 is C1 ~ C4 haloalkyl; Y is a halogen atom, etc.) to produce a compound represented by the general formula (4):

(式中,R1~R4係與上述同義)。 (Wherein R 1 to R 4 are synonymous with the above).

Description

有害生物防治劑之製造方法及其中間體 Method for producing pest control agent and intermediate thereof

本發明係關於通式(4)之化合物之製造方法及其中間體, The present invention relates to a method for producing a compound of the general formula (4) and an intermediate thereof,

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基;R4為C1~C4鹵烷基)。 (In the formula, R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group; R 4 is a C1 to C4 haloalkyl group).

尤其,本發明係關於上述通式(4)之化合物之製造中間體:通式(2)之化合物: In particular, the present invention relates to a manufacturing intermediate of the compound of the above general formula (4): a compound of the general formula (2):

(式中,R1及R2係如上述所定義);及通式(3)之化合物: (Wherein R 1 and R 2 are as defined above); and a compound of the general formula (3):

(式中,R1、R2及R3係如上述所定義);及通式(5)之化合物: (Wherein R 1 , R 2 and R 3 are as defined above); and a compound of the general formula (5):

(式中,R1、R2及R3係如上述所定義)。 (Wherein R 1 , R 2 and R 3 are as defined above).

上述通式(4)之化合物係有用於作為農藥等之有害生物防治劑及其製造中間體(參照專利文獻1之實施例12、13、17、18、26及27)。 The compound of the above general formula (4) is used as a pest control agent for pesticides and the like and its manufacturing intermediate (refer to Examples 12, 13, 17, 18, 26, and 27 of Patent Document 1).

專利文獻1已揭示例如,藉由於四正丁基氟化銨之存在下使6-氰硫基己基-[2,4-二甲基-5-(2,2,2-三氟乙基硫基)苯基]醚與三氟甲基三甲基矽烷反應,而獲得實施例26之生成物的方法。 Patent Document 1 has disclosed, for example, that by making 6-cyanothiohexyl- [2,4-dimethyl-5- (2,2,2-trifluoroethylsulfide) in the presence of tetra-n-butylammonium fluoride A method in which the group) phenyl] ether is reacted with trifluoromethyltrimethylsilane to obtain the product of Example 26.

以此方法有為原料之6-氰硫基己基-[2,4-二甲基-5-(2,2,2-三氟乙基硫基)苯基]醚之工業製造的問題點。例如,可列舉成為原料的硼酸衍生物之大量使用上之特殊裝置係有必要的,又有高價試藥之大量使用、特殊試藥之使用、需要過量試藥之使用等的問題點(參照專利文獻1之實施例21、24、及25)。 In this method, there are problems in the industrial production of 6-cyanothiohexyl- [2,4-dimethyl-5- (2,2,2-trifluoroethylthio) phenyl] ether as a raw material. For example, it is possible to cite the need for special devices for the large-scale use of boric acid derivatives as raw materials, and the problems of large-scale use of high-priced reagents, special reagents, and use of excessive reagents (see patents). Examples 21, 24, and 25 of Document 1).

再者,先前技術中雖於通式(4)之化合物之製造上已使用1-碘-2,2,2-三氟乙烷及對甲苯磺酸2,2,2-三氟乙酯等之鹵烷化劑,但此等之鹵烷化劑為高價的,於通式(4) 之化合物之工業製造上,如此大量使用於成本面上亦成為大課題。例如,專利文獻1藉由實施例已具體揭示製造方法6及7。然而,此等製造方法中,於最終目的化合物的有害生物防治劑之製造路徑中的較早階段,因進行使用此等鹵烷化劑的鹵烷基化反應,結果有需要高價鹵烷化劑之大量使用量的問題。 Furthermore, in the prior art, 1-iodo-2,2,2-trifluoroethane and p-toluenesulfonic acid 2,2,2-trifluoroethyl etc. have been used in the production of compounds of general formula (4). Halogenated alkylating agents, but these halogenated alkylating agents are expensive and are based on the general formula (4) In the industrial manufacture of the compounds, such a large amount of use has also become a major issue in terms of cost. For example, Patent Literature 1 has specifically disclosed the manufacturing methods 6 and 7 through examples. However, in these manufacturing methods, at an earlier stage in the production path of the pest control agent of the final target compound, a halogenated alkylation reaction using these halogenated alkylating agents is performed, resulting in the need for a high-valent halogenated alkylating agent. The problem of heavy usage.

此外,一般而言,含硫有機化合物大多具有特徵惡臭的情形,此惡臭之防除於工業製造之際亦有考量的需要。 In addition, in general, sulfur-containing organic compounds mostly have a characteristic odor, and there is a need to consider the prevention of this odor when it is manufactured in industry.

如此,以工業製造規模進行反應時,有各式各樣的問題點。 As described above, there are various problems in performing reactions on an industrial scale.

從此等狀況來看,殷切寄望有不需特殊設備或複雜操作等的簡便方法之工業上便宜地製造通式(4)之化合物的方法之確立。 Under these circumstances, the establishment of a method for industrially and inexpensively producing a compound of the general formula (4) without a simple method such as special equipment or complicated operations is eagerly expected.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

[專利文獻1]國際公開第2013/157229號公報 [Patent Document 1] International Publication No. 2013/157229

[發明概要] [Invention Summary]

本發明之目的係提供工業上較佳的上述通式(4)之製造中間體。換言之,本發明之目的係提供適合工業生產中大規模製造的製造中間體。 An object of the present invention is to provide an industrially preferable manufacturing intermediate of the above-mentioned general formula (4). In other words, the object of the present invention is to provide a manufacturing intermediate suitable for large-scale manufacturing in industrial production.

本發明之其他目的係提供工業上較佳的上述 通式(4)之化合物之製造方法。 Another object of the present invention is to provide the industrially preferred ones described above. A method for producing a compound of the general formula (4).

鑒於如上述的狀況,本發明者專心研究上述通式(4)之化合物之製造方法。其結果,意外地發現,藉由提供上述通式(2)之化合物、通式(3)及/或通式(5)之化合物,以及藉由提供利用彼等之化合物的上述通式(4)之化合物之製造方法,前述課題係可能解決的。本發明者基於此見解,遂而完成本發明。 In view of the circumstances as described above, the present inventors have devotedly studied a method for producing the compound of the general formula (4). As a result, it was unexpectedly found that by providing the compound of the general formula (2), the compound of the general formula (3) and / or the formula (5), and by providing the compound of the above general formula (4) In the method for producing a compound of (2), the aforementioned problems may be solved. Based on this knowledge, the present inventors have completed the present invention.

即,本發明係如以下。 That is, the present invention is as follows.

〔1〕一種通式(2)所表示的化合物: [1] A compound represented by the general formula (2):

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基)。 (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group).

〔2〕如上述〔1〕記載之化合物,其中R1及R2各自獨立為鹵素原子;或R1及R2各自獨立為C1~C4烷基。 [2] The compound according to the above [1], wherein R 1 and R 2 are each independently a halogen atom; or R 1 and R 2 are each independently a C1 to C4 alkyl group.

〔3〕如上述〔1〕記載之化合物,其中R1為氟原子,R2為氯原子;或R1及R2各自為甲基。 [3] The compound according to the above [1], wherein R 1 is a fluorine atom and R 2 is a chlorine atom; or R 1 and R 2 are each a methyl group.

〔4〕如上述〔1〕記載之化合物,其中R1及R2各自獨立為鹵素原子。 [4] The compound according to the above [1], wherein R 1 and R 2 are each independently a halogen atom.

〔5〕如上述〔1〕記載之化合物,其中R1為氟原子;R2為氯原子。 [5] The compound according to the above [1], wherein R 1 is a fluorine atom and R 2 is a chlorine atom.

〔6〕如上述〔1〕記載之化合物,其中R1 及R2各自獨立為C1~C4烷基。 [6] The compound according to the above [1], wherein R 1 and R 2 are each independently a C1 to C4 alkyl group.

〔7〕如上述〔1〕記載之化合物,其中R1及R2各自為甲基。 [7] The compound according to the above [1], wherein each of R 1 and R 2 is a methyl group.

〔8〕一種通式(3)所表示的化合物: [8] A compound represented by the general formula (3):

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基)。 (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group).

〔9〕如上述〔8〕記載之化合物,其中R1及R2各自獨立為鹵素原子,R3為C1~C4鹵烷基硫基C2~C10烷基;或R1及R2各自獨立為C1~C4烷基,R3為C1~C4鹵烷基硫基C2~C10烷基。 [9] The compound according to the above [8], wherein R 1 and R 2 are each independently a halogen atom, and R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl; or R 1 and R 2 are each independently C1 ~ C4 alkyl, R 3 is C1 ~ C4 haloalkylthio, C2 ~ C10 alkyl.

〔10〕如上述〔8〕記載之化合物,其中R1為氟原子;R2為氯原子;R3為5-三氟甲基硫基戊基;或R1及R2各自為甲基;R3為6-三氟甲基硫基己基。 [10] The compound according to the above [8], wherein R 1 is a fluorine atom; R 2 is a chlorine atom; R 3 is a 5-trifluoromethylthiopentyl group; or R 1 and R 2 are each a methyl group; R 3 is 6-trifluoromethylthiohexyl.

〔11〕如上述〔8〕記載之化合物,其中R1及R2各自獨立為鹵素原子;R3為C1~C4鹵烷基硫基C2~C10烷基。 [11] The compound according to the above [8], wherein R 1 and R 2 are each independently a halogen atom; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group.

〔12〕如上述〔8〕記載之化合物,其中R1為氟原子;R2為氯原子;R3為5~三氟甲基硫基戊基。 [12] The compound according to the above [8], wherein R 1 is a fluorine atom; R 2 is a chlorine atom; R 3 is 5 to trifluoromethylthiopentyl.

〔13〕如上述〔8〕記載之化合物,其中R1及R2各自獨立為C1~C4烷基;R3為C1~C4鹵烷基硫基 C2~C10烷基。 [13] The compound according to the above [8], wherein R 1 and R 2 are each independently a C1 to C4 alkyl group; and R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group.

〔14〕如上述〔8〕記載之化合物,其中R1及R2各自為甲基;R3為6-三氟甲基硫基己基。 [14] The compound according to the above [8], wherein R 1 and R 2 are each a methyl group; and R 3 is 6-trifluoromethylthiohexyl.

〔15〕一種通式(5)所表示的化合物: [15] A compound represented by the general formula (5):

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基)。 (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group).

〔16〕如上述〔15〕記載之化合物,其中R1及R2各自獨立為鹵素原子;R3為C1~C4鹵烷基硫基C2~C10烷基;或R1及R2各自獨立為C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基。 [16] The compound according to the above [15], wherein R 1 and R 2 are each independently a halogen atom; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group; or R 1 and R 2 are each independently C1 ~ C4 alkyl group; R 3 is a halo C1 ~ C4 alkylthio C2 ~ C10 alkyl group.

〔17〕如上述〔15〕記載之化合物,其中R1為氟原子;R2為氯原子;R3為5-三氟甲基硫基戊基;或R1及R2各自為甲基;R3為6-三氟甲基硫基己基。 [17] The compound according to the above [15], wherein R 1 is a fluorine atom; R 2 is a chlorine atom; R 3 is 5-trifluoromethylthiopentyl; or R 1 and R 2 are each a methyl group; R 3 is 6-trifluoromethylthiohexyl.

〔18〕如上述〔15〕記載之化合物,其中R1及R2各自獨立為鹵素原子;R3為C1~C4鹵烷基硫基C2~C10烷基。 [18] The compound according to the above [15], wherein R 1 and R 2 are each independently a halogen atom; R 3 is a C1 to C4 haloalkylthio group and a C2 to C10 alkyl group.

〔19〕如上述〔15〕記載之化合物,其中R1為氟原子;R2為氯原子;R3為5-三氟甲基硫基戊基。 [19] The compound according to the above-mentioned [15], wherein R 1 is a fluorine atom; R 2 is a chlorine atom; R 3 is 5-trifluoromethylthiopentyl.

〔20〕如上述〔15〕記載之化合物,其中R1及R2各自獨立為C1~C4烷基;R3為C1~C4鹵烷基硫基 C2~C10烷基。 [20] The compound according to the above [15], wherein R 1 and R 2 are each independently a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group.

〔21〕如上述〔15〕記載之化合物,其中R1及R2各自為甲基;R3為6-三氟甲基硫基己基。 [21] The compound according to [15], wherein R 1 and R 2 are each a methyl group; and R 3 is 6-trifluoromethylthiohexyl.

〔22〕一種方法,其係製造通式(4)所表示的化合物之方法, [22] A method for producing a compound represented by the general formula (4),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基;R4為C1~C4鹵烷基),其包含以下之步驟:(i)自通式(1)所表示的化合物製造通式(2)所表示的化合物的步驟, (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group; R 4 is a C1 to C4 haloalkyl group), which Including the following steps: (i) a step of producing a compound represented by the general formula (2) from a compound represented by the general formula (1),

(式中,R1及R2係如上述所定義), (Wherein R 1 and R 2 are as defined above),

(式中,R1及R2係如上述所定義); (ii)使前述通式(2)之化合物,於鹼之存在下,與通式(a)所表示的化合物反應,而製造通式(3)所表示的化合物的步驟,R3-X (a) (Wherein R 1 and R 2 are as defined above); (ii) the compound of the general formula (2) is reacted with a compound of the general formula (a) in the presence of a base to produce a general compound; Step of the compound represented by formula (3), R 3 -X (a)

(式中,R3係如上述所定義;X為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基), (Wherein R 3 is as defined above; X is a halogen atom, C1-C4 alkylsulfonyloxy, C1-C4 haloalkylsulfonyloxy, or may be substituted by C1-C4 alkyl or halogen atom Phenylsulfonyloxy),

(式中,R1、R2及R3係如上述所定義);及(iii)將前述通式(3)之化合物轉換為前述通式(4)之化合物的步驟。 (Wherein R 1 , R 2 and R 3 are as defined above); and (iii) a step of converting the compound of the aforementioned general formula (3) to the compound of the aforementioned general formula (4).

〔23〕如上述〔22〕記載之方法,其中步驟(iii)係以下之步驟:(iii-a)藉由使通式(3)所表示的化合物,於鹼之存在下,與通式(b)所表示的化合物反應,而將前述通式(3)之化合物轉換為前述通式(4)之化合物的步驟, [23] The method according to the above [22], wherein step (iii) is the following step: (iii-a) the compound represented by the general formula (3) is reacted with the general formula (3) in the presence of a base. a step of reacting a compound represented by b) to convert a compound of the aforementioned general formula (3) into a compound of the aforementioned general formula (4),

(式中, R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基),R4-Y (b) (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group), R 4 -Y (b)

(式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基)。 (Wherein R 4 is a C1 to C4 haloalkyl group; Y is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 to C4 alkyl group or halogen Atom substituted phenylsulfonyloxy).

〔24〕如上述〔22〕記載之方法,其中步驟(iii)係包含以下之步驟:(iii-b)使通式(3)所表示的化合物,轉換為通式(5)所表示的化合物的步驟, [24] The method according to the above [22], wherein step (iii) includes the following steps: (iii-b) converting the compound represented by the general formula (3) into a compound represented by the general formula (5) A step of,

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基), (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group),

(式中,R1、R2及R3係如上述所定義);及(iii~c)藉由使前述通式(5)之化合物,於鹼之存在下,與通式(b)所表示的化合物反應,而將前述通式(5)之化 合物轉換為前述通式(4)之化合物的步驟,R4-Y (b) (Wherein R 1 , R 2 and R 3 are as defined above); and (iii ~ c) by using the compound of the general formula (5) in the presence of a base, A step of reacting a compound represented by the formula (5) to convert the compound of the aforementioned general formula (5) to the compound of the aforementioned general formula (4), R 4 -Y (b)

(式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基)。 (Wherein R 4 is a C1 to C4 haloalkyl group; Y is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 to C4 alkyl group or halogen Atom substituted phenylsulfonyloxy).

〔25〕如上述〔23〕或〔24〕記載之方法,其中R1及R2各自獨立為鹵素原子、或R1及R2各自獨立為C1~C4烷基。 [25] The method according to the above [23] or [24], wherein R 1 and R 2 are each independently a halogen atom, or R 1 and R 2 are each independently a C1 to C4 alkyl group.

〔26〕如上述〔23〕或〔24〕記載之方法,其中R1為氟原子;R2為氯原子;R3為5-三氟甲基硫基戊基;R4為2,2,2-三氟乙基;X為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;Y為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;或R1及R2各自為甲基;R3為6-三氟甲基硫基己基;R4為2,2,2-三氟乙基;X為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基; Y為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基。 [26] The method according to the above [23] or [24], wherein R 1 is a fluorine atom; R 2 is a chlorine atom; R 3 is 5-trifluoromethylthiopentyl; R 4 is 2, 2, 2-trifluoroethyl; X is chlorine atom, bromine atom, iodine atom, methanesulfonyloxy group, benzenesulfonyloxy group, p-toluenesulfonyloxy group or p-chlorobenzenesulfonyloxy group; Y is chlorine atom, Bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy; or R 1 and R 2 are each methyl; R 3 is 6-tri Fluoromethylthiohexyl; R 4 is 2,2,2-trifluoroethyl; X is chlorine, bromine, iodine, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy Or p-chlorobenzenesulfonyloxy; Y is chlorine atom, bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy.

〔27〕如上述〔23〕或〔24〕記載之方法,其中R1及R2各自獨立為鹵素原子。 [27] The method according to the above [23] or [24], wherein R 1 and R 2 are each independently a halogen atom.

〔28〕如上述〔23〕或〔24〕記載之方法,其中R1為氟原子;R2為氯原子;R3為5-三氟甲基硫基戊基;R4為2,2,2-三氟乙基;X為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;Y為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基。 [28] The method according to the above [23] or [24], wherein R 1 is a fluorine atom; R 2 is a chlorine atom; R 3 is 5-trifluoromethylthiopentyl; R 4 is 2, 2, 2-trifluoroethyl; X is chlorine atom, bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy; Y is chlorine atom, Bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy.

〔29〕如上述〔23〕或〔24〕記載之方法,其中R1及R2各自獨立為C1~C4烷基。 [29] The method according to the above [23] or [24], wherein R 1 and R 2 are each independently a C1 to C4 alkyl group.

〔30〕如上述〔23〕或〔24〕記載之方法,其中R1及R2各自為甲基;R3為6-三氟甲基硫基己基;R4為2,2,2-三氟乙基;X為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;Y為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基。 [30] The method according to the above [23] or [24], wherein R 1 and R 2 are each methyl; R 3 is 6-trifluoromethylthiohexyl; R 4 is 2,2,2-tris Fluoroethyl; X is chlorine atom, bromine atom, iodine atom, methanesulfonyloxy group, benzenesulfonyloxy group, p-toluenesulfonyloxy group or p-chlorobenzenesulfonyloxy group; Y is chlorine atom, bromine atom, Iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy.

〔31〕一種製造通式(2)所表示的化合物之方法: [31] A method for producing a compound represented by the general formula (2):

(式中,R1及R2係如下述所定義),其特徵為將通式(1)所表示的化合物氧化, (Wherein R 1 and R 2 are as defined below), which is characterized by oxidizing a compound represented by the general formula (1),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基)。 (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group).

〔32〕一種製造通式(3)所表示的化合物之方法, [32] A method for producing a compound represented by the general formula (3),

(式中,R1、R2及R3係如下述所定義),其特徵為使通式(2)所表示的化合物,於鹼之存在下,與通式(a)所表示的化合物反應, (Wherein R 1 , R 2 and R 3 are as defined below), which is characterized in that a compound represented by the general formula (2) is reacted with a compound represented by the general formula (a) in the presence of a base. ,

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基):R3-X (a) (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group): R 3 -X (a)

(式中,R3為C1~C4鹵烷基硫基C2~C10烷基;X為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基)。 (Wherein R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group; X is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1-C4 alkyl or halogen atom-substituted phenylsulfonyloxy).

〔33〕一種製造通式(4)所表示的化合物之方法, [33] A method for producing a compound represented by the general formula (4),

(式中,R1、R2、R3及R4係如下述所定義),其特徵使通式(3)所表示的化合物,於鹼之存在下,與通式(b)所表示的化合物反應, (Wherein R 1 , R 2 , R 3 and R 4 are as defined below), which is characterized in that the compound represented by the general formula (3) and the compound represented by the general formula (b) in the presence of a base Compound reaction,

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基),R4-Y (b) (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group), R 4 -Y (b)

(式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基 磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基)。 (Wherein R 4 is a C1 to C4 haloalkyl group; Y is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 to C4 alkyl group or halogen Atom substituted phenylsulfonyloxy).

〔34〕一種製造通式(5)所表示的化合物之方法, [34] a method for producing a compound represented by the general formula (5),

(式中,R1、R2及R3係如下述所定義),其特徵為將通式(3)所表示的化合物加以還原, (Wherein R 1 , R 2 and R 3 are as defined below), which is characterized by reducing a compound represented by the general formula (3),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基)。 (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group).

〔35〕一種製造通式(4)所表示的化合物之方法, [35] A method for producing a compound represented by the general formula (4),

(式中,R1、R2、R3及R4係如下述所定義),其特徵為使通式(5)所表示的化合物,於鹼之存在下,與通式(b)所表示的化合物反應, (Wherein R 1 , R 2 , R 3 and R 4 are as defined below), which is characterized in that the compound represented by the general formula (5) is represented by the general formula (b) in the presence of a base. Compound reaction,

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基),R4-Y (b) (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group), R 4 -Y (b)

(式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基)。 (Wherein R 4 is a C1 to C4 haloalkyl group; Y is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 to C4 alkyl group or halogen Atom substituted phenylsulfonyloxy).

依據本發明,可提供有用於作為有害生物防治劑及其製造中間體的通式(4)之化合物之新穎製造中間體。 According to the present invention, there can be provided a novel manufacturing intermediate for a compound of general formula (4) as a pest control agent and a manufacturing intermediate thereof.

再者,依據本發明,可提供有用於作為有害生物防治劑及其製造中間體的通式(4)之化合物之新穎製造方法。 Furthermore, according to the present invention, there can be provided a novel method for producing a compound of general formula (4) as a pest control agent and a production intermediate thereof.

再者,依據本發明,藉由使用本發明之通式(2)、(3)及/或(5)之化合物,於有害生物防治劑製造路徑後面階段中因進行鹵烷基化反應,可大幅減少高價鹵烷化劑之使用量,而且可顯著減少製造成本。據此,本發明係經濟的,且具有高工業利用價值。 Furthermore, according to the present invention, by using the compound of the general formulae (2), (3), and / or (5) of the present invention, the haloalkylation reaction can be performed at a later stage in the production path of the pest control agent, which can Significantly reduce the amount of expensive halogenated alkylating agents, and can significantly reduce manufacturing costs. Accordingly, the present invention is economical and has high industrial use value.

又,本發明之實施例1所製造的雙(2,4-二甲基-5-羥 基苯基)二硫醚係幾乎不具有惡臭。再者,雙(2,4-二甲基-5-羥基苯基)二硫醚為熔點十分高的固體。高熔點係意味著其化合物於保存上為較佳,以及提供作為單離方法及/或純化方法之再結晶的選項。本發明係發現雙(2,4-二甲基-5-羥基苯基)二硫醚係同時具有如此複數個優點。本發明之實施例6所製造的雙(2-氯-4-氟-5-羥基苯基)二硫醚亦具有同樣性質及優點。據此,於雙(2,4-二甲基-5-羥基苯基)二硫醚及雙(2-氯-4-氟-5-羥基苯基)二硫醚所代表的通式(2)之化合物係工業上有用的。 In addition, the bis (2,4-dimethyl-5-hydroxyl) produced in Example 1 of the present invention Phenyl) disulfide has almost no malodor. In addition, bis (2,4-dimethyl-5-hydroxyphenyl) disulfide is a solid having a very high melting point. A high melting point means that the compound is better on storage and offers the option of recrystallization as a method of isolation and / or purification. The present invention has discovered that bis (2,4-dimethyl-5-hydroxyphenyl) disulfide has such a plurality of advantages at the same time. The bis (2-chloro-4-fluoro-5-hydroxyphenyl) disulfide produced in Example 6 of the present invention also has the same properties and advantages. Accordingly, the general formula (2) represented by bis (2,4-dimethyl-5-hydroxyphenyl) disulfide and bis (2-chloro-4-fluoro-5-hydroxyphenyl) disulfide ) Compounds are industrially useful.

依據本發明,成為通式(4)之化合物之製造中間體的通式(2)、(3)及(5)之化合物由於不使用特殊反應條件或特殊高價的試藥,並可產率佳地製造,而適合工業的製造,據此,藉由使用此等之中間體,亦於通式(4)之化合物之工業的製造上於成本面等上成為大優點。 According to the present invention, the compounds of the general formulae (2), (3), and (5), which are intermediates for the production of the compounds of the general formula (4), have good yields because they do not use special reaction conditions or special expensive reagents. It is suitable for industrial production, and therefore, by using these intermediates, it is also a great advantage in terms of cost and the like in the industrial production of the compound of the general formula (4).

於提供本發明時,通式(2)、(3)及(5)之化合物及使用彼等的製造方法係初次成為實現者。再者,藉由本發明,通式(2)、(3)及(5)之化合物及使用彼等的製造方法之工業利用價值係初次被實現化。 In providing the present invention, the compounds of the general formulae (2), (3), and (5) and the production methods using them are the first time to implement them. Furthermore, according to the present invention, the industrial use value of the compounds of the general formulae (2), (3), and (5) and the production method using them is realized for the first time.

[實施發明之形態] [Form of Implementing Invention]

以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.

於本說明書所使用的用語及記號說明如下。 The terms and symbols used in this manual are explained below.

就鹵素原子而言,可列舉例如,氟原子、氯 原子、溴原子及碘原子。由生成物之有用性等之觀點,就鹵素原子之較佳例而言,可列舉氟原子及氯原子。 Examples of the halogen atom include a fluorine atom and a chlorine atom. Atom, bromine atom and iodine atom. From the viewpoint of the usefulness of the product, etc., preferred examples of the halogen atom include a fluorine atom and a chlorine atom.

「Ca~Cb」係意指碳原子數為a~b個。例如,「C1~C4烷基」之「C1~C4」係意指烷基之碳原子數為1~4。 "Ca ~ Cb" means that the number of carbon atoms is a ~ b. For example, "C1 to C4" of "C1 to C4 alkyl" means that the number of carbon atoms in the alkyl group is 1 to 4.

C1~C4烷基係意指具有1~4個碳原子之直鏈或分支鏈的烷基。就C1~C4烷基而言,可列舉例如,甲基、乙基、丙基、異丙基、丁基、第二丁基、異丁基及第三丁基。由生成物之有用性等之觀點,就C1~C4烷基之較佳例而言,可列舉甲基。 The C1-C4 alkyl group means a straight-chain or branched alkyl group having 1 to 4 carbon atoms. Examples of the C1-C4 alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group, an isobutyl group, and a third butyl group. From the viewpoint of the usefulness of the product and the like, a preferred example of the C1 to C4 alkyl group is a methyl group.

C2~C10烷基係意指具有2~10個碳原子之直鏈或分支鏈的烷基。就C2~C10烷基而言,可列舉例如,乙基、丙基、異丙基、丁基、第二丁基、異丁基、第三丁基、戊基、己基、庚基、辛基、壬基、癸基等,但未限定於此等。 The C2 to C10 alkyl group means a straight-chain or branched alkyl group having 2 to 10 carbon atoms. Examples of the C2 to C10 alkyl group include ethyl, propyl, isopropyl, butyl, second butyl, isobutyl, third butyl, pentyl, hexyl, heptyl, and octyl , Nonyl, decyl, and the like, but are not limited thereto.

C1~C4鹵烷基係意指經相同或相異之1~9個鹵素原子取代的碳原子數為1~4之直鏈狀或分支鏈狀之烷基(其中,鹵素原子係具有與上述相同的意義)。就C1~C4鹵烷基而言,可列舉例如,氟甲基、二氟甲基、三氟甲基、氯二氟甲基、2,2,2-三氟乙基、五氟乙基、3-氟丙基、2,2,3,3,3-五氟丙基、七氟丙基、2,2,2-三氟-1-三氟甲基乙基、2,2,3,3,4,4,4-七氟丁基等,但未限定於此等。 C1 ~ C4 haloalkyl means a linear or branched alkyl group having 1 to 4 carbon atoms substituted with the same or different 1 to 9 halogen atoms (wherein the halogen atom has The same meaning). Examples of C1 to C4 haloalkyl include fluoromethyl, difluoromethyl, trifluoromethyl, chlorodifluoromethyl, 2,2,2-trifluoroethyl, pentafluoroethyl, 3-fluoropropyl, 2,2,3,3,3-pentafluoropropyl, heptafluoropropyl, 2,2,2-trifluoro-1-trifluoromethylethyl, 2,2,3, 3,4,4,4-Heptafluorobutyl and the like are not limited thereto.

C1~C4鹵烷基硫基係指(C1~C4鹵烷基)-S-基(其中,C1~C4鹵烷基係具有與上述相同的意義)。就C1~C4 鹵烷基硫基而言,可列舉例如,氟甲基硫基、二氟甲基硫基、三氟甲基硫基、氯二氟甲基硫基、2,2,2-三氟乙基硫基、五氟乙基硫基、3-氟丙基硫基、2,2,3,3,3-五氟丙基硫基、七氟丙基硫基、2,2,2-三氟-1-三氟甲基乙基硫基、2,2,3,3,4,4,4-七氟丁基硫基等,但未限定於此等。 The C1 to C4 haloalkylthio group refers to a (C1 to C4 haloalkyl) -S- group (wherein the C1 to C4 haloalkyl group has the same meaning as described above). Just C1 ~ C4 Examples of the haloalkylthio group include fluoromethylthio, difluoromethylthio, trifluoromethylthio, chlorodifluoromethylthio, and 2,2,2-trifluoroethyl. Thio, pentafluoroethylthio, 3-fluoropropylthio, 2,2,3,3,3-pentafluoropropylthio, heptafluoropropylthio, 2,2,2-trifluoro 1-trifluoromethylethylthio, 2,2,3,3,4,4,4-heptafluorobutylthio, and the like are not limited thereto.

C1~C4鹵烷基硫基C2~C10烷基係意指經C1~C4鹵烷基硫基取代的C2~C10烷基(其中,C1~C4鹵烷基硫基及C2~C10烷基係具有與上述相同的意義)。就C1~C4鹵烷基硫基C2~C10烷基而言,可列舉例如,2-三氟甲基硫基乙基、3-三氟甲基硫基丙基、4-三氟甲基硫基丁基、5-二氟甲基硫基戊基、5-三氟甲基硫基戊基、5-(2,2,2-三氟乙基硫基)戊基、5-五氟乙基硫基戊基、5-(2,2,3,3,3-五氟丙基硫基)戊基、5-(2,2,3,3,4,4,4-七氟丁基硫基)戊基、6-二氟甲基硫基己基、6-三氟甲基硫基己基、6-(2,2,2-三氟乙基硫基)己基、6-五氟乙基硫基己基、6-(2,2,3,3,3-五氟丙基硫基)己基、6-(2,2,3,3,4,4,4-七氟丁基硫基)己基、7-三氟甲基硫基庚基、8-三氟甲基硫基辛基、9-三氟甲基硫基壬基、10-三氟甲基硫基癸基等,但未限定於此等。由生成物之有用性等之觀點,就C1~C4鹵烷基硫基C2~C10烷基之較佳例而言,可列舉5-三氟甲基硫基戊基及6-三氟甲基硫基己基。 C1 ~ C4 haloalkylthio C2 ~ C10 alkyl means C2 ~ C10 alkyl substituted by C1 ~ C4 haloalkylthio (C1 ~ C4 haloalkylthio and C2 ~ C10 alkyl Has the same meaning as above). Examples of the C1-C4 haloalkylthio group and the C2-C10 alkyl group include 2-trifluoromethylthioethyl, 3-trifluoromethylthiopropyl, and 4-trifluoromethylthio. Butylbutyl, 5-difluoromethylthiopentyl, 5-trifluoromethylthiopentyl, 5- (2,2,2-trifluoroethylthio) pentyl, 5-pentafluoroethyl Pentylthiopentyl, 5- (2,2,3,3,3-pentafluoropropylthio) pentyl, 5- (2,2,3,3,4,4,4-heptafluorobutyl Thio) pentyl, 6-difluoromethylthiohexyl, 6-trifluoromethylthiohexyl, 6- (2,2,2-trifluoroethylthio) hexyl, 6-pentafluoroethyl Thiohexyl, 6- (2,2,3,3,3-pentafluoropropylthio) hexyl, 6- (2,2,3,3,4,4,4-heptafluorobutylthio) Hexyl, 7-trifluoromethylthioheptyl, 8-trifluoromethylthiooctyl, 9-trifluoromethylthiononyl, 10-trifluoromethylthiodecyl, and the like, but not limited And so on. From the viewpoint of the usefulness of the product, etc., preferred examples of the C1 to C4 haloalkylthio group and the C2 to C10 alkyl group include 5-trifluoromethylthiopentyl and 6-trifluoromethyl. Thiohexyl.

C1~C4烷基磺醯氧基係意指(C1~C4烷基)-SO2-O-基(其中,C1~C4烷基係具有與上述相同的意義)。就C1~C4烷基磺醯氧基而言,可列舉例如,甲烷磺醯氧基、乙烷磺醯氧基等,但並未限定於此等。 The C1 to C4 alkylsulfonyloxy group means a (C1 to C4 alkyl) -SO 2 -O- group (wherein the C1 to C4 alkyl group has the same meaning as described above). Examples of the C1 to C4 alkylsulfonyloxy group include, but are not limited to, methanesulfonyloxy and ethanesulfonyloxy.

C1~C4鹵烷基磺醯氧基係意指(C1~C鹵烷基)-SO2-O-基(其中,C1~C4鹵烷基係具有與上述相同的意義)。就C1~C4烷基磺醯氧基而言,可列舉例如,三氟甲烷磺醯氧基等,但並未限定於此等。 The C1-C4 haloalkylsulfonyloxy group means a (C1-Chaloalkyl) -SO 2 -O- group (wherein the C1-C4 haloalkyl group has the same meaning as described above). Examples of the C1 to C4 alkylsulfonyloxy group include trifluoromethanesulfonyloxy group and the like, but are not limited thereto.

可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基係意指可經C1~C4烷基或鹵素原子取代的苯基-SO2-O-基(其中,C1~C4烷基及鹵素原子係具有與上述相同的意義)。就可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基而言,可列舉例如,苯磺醯氧基、對甲苯磺醯氧基及對氯苯磺醯氧基等,但並未限定於此等。 The phenylsulfonyloxy group which may be substituted with a C1 to C4 alkyl group or a halogen atom means a phenyl-SO 2 -O- group (wherein the C1 to C4 alkyl group may be substituted with a C1 to C4 alkyl group or a halogen atom) And halogen atom system have the same meaning as above). Examples of the phenylsulfonyloxy group which may be substituted by a C1 to C4 alkyl group or a halogen atom include benzenesulfonyloxy group, p-toluenesulfonyloxy group, p-chlorobenzenesulfonyloxy group, and the like, but It is not limited to these.

就本發明中的R1而言,可列舉例如,鹵素原子及C1~C4烷基。 Examples of R 1 in the present invention include a halogen atom and a C1 to C4 alkyl group.

由生成物之有用性等的觀點,於一個實施態樣,就本發明中的較佳R1而言,可列舉例如,鹵素原子,更佳為氟原子。由與上述相同的觀點,於其他實施態樣,就本發明中的較佳R1而言,可列舉例如,C1~C4烷基,更佳為甲基。 From the viewpoint of the usefulness of the product, etc., in one embodiment, the preferred R 1 in the present invention includes, for example, a halogen atom, and more preferably a fluorine atom. From the same viewpoint as the above, in other embodiments, the preferred R 1 in the present invention includes, for example, a C1 to C4 alkyl group, and more preferably a methyl group.

就本發明中的R2而言,可列舉例如,鹵素原子及C1~C4烷基。 Examples of R 2 in the present invention include a halogen atom and a C1 to C4 alkyl group.

由生成物之有用性等之觀點,於一個實施態樣,就本發明中的較佳R2而言,可列舉例如,鹵素原子,更佳為氯原子。 From the viewpoint of the usefulness of the product, etc., in one embodiment, the preferred R 2 in the present invention includes, for example, a halogen atom, and more preferably a chlorine atom.

由與上述相同之觀點,於其他實施態樣,就本發明中的較佳R2而言,可列舉例如,C1~C4烷基,更佳為甲基。 From the same viewpoints as above, in other embodiments, the preferred R 2 in the present invention includes, for example, a C1 to C4 alkyl group, and more preferably a methyl group.

就本發明中的R3而言,可列舉例如,C1~C4鹵烷基硫基C2~C10烷基。 Examples of R 3 in the present invention include a C1 to C4 haloalkylthio group and a C2 to C10 alkyl group.

由生成物之有用性等之觀點,於一個實施態樣,就本發明中的較佳R3而言,可列舉例如,5-三氟甲基硫基戊基。 From the viewpoint of the usefulness of the product and the like, in one embodiment, as a preferable R 3 in the present invention, for example, 5-trifluoromethylthiopentyl may be mentioned.

由與上述相同之觀點,於其他實施態樣,就本發明中的較佳R3而言,可列舉例如,6-三氟甲基硫基己基。 From the same viewpoint as above, in other embodiments, as a preferred R 3 in the present invention, for example, 6-trifluoromethylthiohexyl may be mentioned.

就本發明中的R4而言,可列舉例如,C1~C4鹵烷基。 Examples of R 4 in the present invention include C1 to C4 haloalkyl.

由生成物之有用性等之觀點,就本發明中的較佳R4而言,可列舉例如,2,2,2-三氟乙基。 From the viewpoint of usefulness of the product, etc., preferred R 4 in the present invention includes, for example, 2,2,2-trifluoroethyl.

就本發明中的X而言,可列舉例如,鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、以及可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基。 As for X in the present invention, for example, a halogen atom, a C1 to C4 alkylsulfonyloxy group, a C1 to C4 haloalkylsulfonyloxy group, and a C1 to C4 alkyl group or a halogen atom that may be substituted Phenylsulfonyloxy.

由反應性、產率及經濟效率等之觀點,就本發明中的較佳X而言,可列舉例如,氯原子、溴原子、碘原子、甲烷磺醯氧基、三氟甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基及對氯苯磺醯氧基,更佳為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基及對氯苯磺醯氧基,再更佳為氯原子、溴原子、碘原子,再更佳為溴原子及碘原子,特佳為溴原子。 From the viewpoints of reactivity, productivity, economic efficiency, etc., preferred X in the present invention includes, for example, a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, and a trifluoromethanesulfonyloxy group. , Benzenesulfonyloxy, p-toluenesulfonyloxy and p-chlorobenzenesulfonyloxy, more preferably chlorine atom, bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyl Oxygen and p-chlorobenzenesulfonyloxy are even more preferably a chlorine atom, a bromine atom, and an iodine atom, still more preferably a bromine atom and an iodine atom, and particularly preferably a bromine atom.

就本發明中的Y而言,可列舉例如,鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、以及 可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基。 Examples of Y in the present invention include a halogen atom, a C1 to C4 alkylsulfonyloxy group, a C1 to C4 haloalkylsulfonyloxy group, and A phenylsulfonyloxy group which may be substituted by a C1-C4 alkyl group or a halogen atom.

由反應性、產率及經濟效率等之觀點,就本發明中的較佳Y而言,可列舉例如,氯原子、溴原子、碘原子、甲烷磺醯氧基、三氟甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基及對氯苯磺醯氧基,更佳為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基及對氯苯磺醯氧基,再更佳為氯原子、溴原子、碘原子、甲烷磺醯氧基、對甲苯磺醯氧基,再更佳為溴原子、碘原子、甲烷磺醯氧基、對甲苯磺醯氧基,再更佳為碘原子、對甲苯磺醯氧基,特佳為對甲苯磺醯氧基。 From the viewpoints of reactivity, productivity, economic efficiency, etc., preferred Y in the present invention includes, for example, a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, and a trifluoromethanesulfonyloxy group. , Benzenesulfonyloxy, p-toluenesulfonyloxy and p-chlorobenzenesulfonyloxy, more preferably chlorine atom, bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyl Oxygen and p-chlorobenzenesulfonyloxy, still more preferably chlorine, bromine, iodine, methanesulfonyloxy, p-toluenesulfonyloxy, even more preferably bromine, iodine, methanesulfonyl Oxygen and p-toluenesulfonyloxy are still more preferably iodine atom, p-toluenesulfonyloxy, and particularly preferably p-toluenesulfonyloxy.

(步驟(i)) (Step (i))

首先,說明步驟(i)。 First, step (i) will be described.

步驟(i)係自通式(1)所表示的化合物製造通式(2)所表示的化合物的步驟, Step (i) is a step of producing a compound represented by General Formula (2) from a compound represented by General Formula (1),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基), (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group),

(式中,R1及R2係如上述所定義)。 (Wherein R 1 and R 2 are as defined above).

其中,步驟(i)係藉由將通式(1)之化合物氧化,而製造通式(2)之化合物的步驟。換言之,步驟(i)係藉由使通式(1)之化合物與氧化劑反應,而製造通式(2)之化合物的步驟。 Among them, step (i) is a step of producing a compound of general formula (2) by oxidizing the compound of general formula (1). In other words, step (i) is a step of producing a compound of general formula (2) by reacting a compound of general formula (1) with an oxidizing agent.

(原料;通式(1)之化合物) (Raw material; compound of general formula (1))

使用通式(1)之化合物作為本發明方法之原料。通式(1)之化合物係公知的化合物、或可自公知的化合物藉由公知的方法而製造的化合物。就通式(1)之化合物而言,具體而言可列舉例如,2,4-二氟-5-巰基酚、2,4-二氯-5-巰基酚、4-氯-2-氟-5-巰基酚、2-氯-5-巰基-4-甲基酚、2-氟-5-巰基-4-甲基酚、5-巰基-2,4-二甲基酚等,但未限定於此等。 A compound of the general formula (1) is used as a raw material for the method of the present invention. The compound of the general formula (1) is a known compound, or a compound that can be produced from a known compound by a known method. Specific examples of the compound of the general formula (1) include 2,4-difluoro-5-mercaptophenol, 2,4-dichloro-5-mercaptophenol, and 4-chloro-2-fluoro- 5-mercaptophenol, 2-chloro-5-mercapto-4-methylphenol, 2-fluoro-5-mercapto-4-methylphenol, 5-mercapto-2,4-dimethylphenol, etc., but not limited And so on.

(步驟(i)之氧化劑) (Step (i) oxidant)

步驟(i)所使用的氧化劑係只要反應可進行即可,可為任一種氧化劑。就步驟(i)中可使用的氧化劑而言,可列舉例如,過氧化氫;過醋酸及間氯過苯甲酸等之有機過酸;氧及空氣;次亞氯酸鈉等之次亞氯酸鹽;氯酸鈉等之氯酸鹽;氯、溴、碘等之鹵素;二氧化錳等之金屬氧化物;過錳酸鉀;鐵氰化鉀(六氰鐵(III)酸鉀);氯化鐵(III);二甲基亞碸等,但未限定於此等。由反應性、選擇性及經濟效率等之觀點,就步驟(i)之氧化劑之較佳例 而言,可列舉過氧化氫及氧。 The oxidizing agent used in the step (i) may be any type as long as the reaction can proceed. Examples of the oxidant usable in step (i) include, for example, hydrogen peroxide; organic peracids such as peracetic acid and m-chloroperbenzoic acid; oxygen and air; hypochlorous acid such as sodium hypochlorite Salts; chlorates such as sodium chlorate; halogens such as chlorine, bromine, and iodine; metal oxides such as manganese dioxide; potassium permanganate; potassium ferricyanide (potassium hexacyanoferrate (III)); Iron (III), dimethylsulfinium and the like, but not limited to these. From the viewpoints of reactivity, selectivity, economic efficiency, etc., preferred examples of the oxidizing agent in step (i) Specific examples include hydrogen peroxide and oxygen.

步驟(i)之氧化劑可單獨使用或以任意比率之2種以上的組合來使用。步驟(i)之氧化劑之形態係只要反應可進行即可,可為任一種形態。步驟(i)之氧化劑之形態係可由本項技術領域中具通常知識者適當地選擇。步驟(i)之氧化劑之使用量係只要反應可進行即可,可為任一種之量。可例示相對於1莫耳的通式(1)之化合物而言,為0.5~5莫耳,較佳為0.5~2莫耳,更佳為0.5~1.5莫耳之範圍,但步驟(i)之氧化劑之使用量可由本項所屬技術領域中具通常知識者適當地調整。 The oxidizing agent in step (i) may be used alone or in a combination of two or more kinds at any ratio. The form of the oxidant in step (i) is not limited as long as the reaction can proceed, and may be in any form. The form of the oxidizing agent in step (i) can be appropriately selected by those having ordinary knowledge in the art. The amount of the oxidant used in step (i) is any amount as long as the reaction can proceed. It can be exemplified by 0.5 to 5 mol, preferably 0.5 to 2 mol, and more preferably 0.5 to 1.5 mol relative to 1 mol of the compound of the general formula (1), but step (i) The amount of the oxidant to be used can be appropriately adjusted by those having ordinary knowledge in the technical field to which this item belongs.

使用過氧化氫作為步驟(i)之氧化劑時,過氧化氫之形態係只要反應可進行即可,可為任一種之形態。考慮危險性及經濟效率,就過氧化氫之形態而言,可列舉例如,5%以上且低於40%之濃度之水溶液,較佳為10%以上35%以下之濃度之水溶液。 When hydrogen peroxide is used as the oxidizing agent in step (i), the form of the hydrogen peroxide may be any form as long as the reaction can proceed. In consideration of the danger and economic efficiency, the form of hydrogen peroxide includes, for example, an aqueous solution having a concentration of 5% or more and less than 40%, and preferably an aqueous solution having a concentration of 10% to 35%.

使用過氧化氫作為步驟(i)之氧化劑時,過氧化氫之使用量係只要反應可進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(1)之化合物而言,為0.5~1.5莫耳,較佳為0.5~1.0莫耳,更佳為0.5~0.6莫耳之範圍。 When hydrogen peroxide is used as the oxidizing agent in step (i), the amount of hydrogen peroxide used may be any amount as long as the reaction can proceed. From the viewpoints of yield, suppression of by-products, and economic efficiency, for example, it is 0.5 to 1.5 mol, preferably 0.5 to 1.0 mol, more preferably 1 to mol of the compound of the general formula (1). It is preferably in the range of 0.5 to 0.6 mol.

使用過氧化氫作為步驟(i)之氧化劑時,反應可於觸媒量之碘化物類存在下進行。可不使用碘化物類。是否使用碘化物類可由本項技術領域中具有通常知識者適當地決定。就碘化物類而言,可列舉例如,碘化鈉及碘化鉀,較佳為碘化鈉。碘化物類之形態係只要反應 有進行即可,可為任一種之形態。碘化物類之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(1)之化合物而言,為0(零)~0.1莫耳,較佳為0~0.05莫耳,更佳為0~0.03莫耳之範圍。使用碘化物類的情形,可例示相對於1莫耳的通式(1)之化合物而言,為0.001~0.1莫耳,較佳為0.001~0.05莫耳,更佳為0.005~0.03莫耳之範圍。 When hydrogen peroxide is used as the oxidant in step (i), the reaction can be performed in the presence of a catalyst amount of iodide. No iodide can be used. Whether or not to use iodide can be appropriately determined by those having ordinary knowledge in the technical field. Examples of the iodide include sodium iodide and potassium iodide, and sodium iodide is preferred. As long as the iodide species react It can be carried out as long as it takes any form. The amount of iodide used may be any amount as long as the reaction proceeds. From the viewpoints of yield, by-product suppression, economic efficiency, etc., it may be exemplified by 0 (zero) to 0.1 mol, preferably 0 to 0.05 mol relative to 1 mol of the compound of the general formula (1). Ear, more preferably in the range of 0 to 0.03 moles. In the case of using iodide compounds, it can be exemplified by 0.001 to 0.1 mol, preferably 0.001 to 0.05 mol, and more preferably 0.005 to 0.03 mol relative to 1 mol of the compound of the general formula (1). range.

使用氧作為步驟(i)之氧化劑時,可使用空氣。即,可使用空氣氧化。 When oxygen is used as the oxidant in step (i), air may be used. That is, air oxidation can be used.

(步驟(i)之溶劑) (Solvent of step (i))

由反應平順進行等之觀點,步驟(i)之反應係於溶劑存在下實施為較佳。步驟(i)之溶劑係只要步驟(i)之反應有進行即可,可為任一種之溶劑。 From the viewpoint of smooth progress of the reaction, etc., it is preferred that the reaction in step (i) is carried out in the presence of a solvent. The solvent in step (i) is only required to be carried out in the reaction in step (i), and may be any solvent.

就步驟(i)之溶劑而言,可列舉例如:水、醇類(例如,甲醇、乙醇、2-丙醇、丁醇等)、醚類(例如,四氫呋喃(THF)、1,4-二烷、二異丙基醚、二丁基醚、二-第三丁基醚、環戊基甲基醚(CPME)、甲基-第三丁基醚、1,2-二甲氧基乙烷(DME)、二甘醇二甲醚(diglyme)、三甘醇二甲醚(triglyme)等)、腈類(例如,乙腈等)、醯胺類(例如,N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、N-甲基吡咯啶酮(NMP)等)、烷基尿素類(例如,N,N’-二甲基咪唑啶酮(DMI)等)、 亞碸類(例如,二甲基亞碸(DMSO)等)、碸類(例如,環丁碸等)、酮類(例如,丙酮、異丁基甲基酮(MIBK)、環己酮等)、羧酸酯類(例如,醋酸乙酯、醋酸丁酯等)、羧酸類(例如,醋酸等)、碳酸酯類(例如,碳酸伸乙酯、碳酸伸丙酯等)、芳香族烴衍生物類(例如,苯、甲苯、二甲苯、氯苯、二氯苯、三氯苯、硝基苯等)、鹵素化脂肪族烴類(例如,二氯甲烷等)、及任意比率之彼等任意之組合,但未限定於此等。 Examples of the solvent in step (i) include water, alcohols (for example, methanol, ethanol, 2-propanol, butanol, etc.), and ethers (for example, tetrahydrofuran (THF), 1,4-dihydrofuran). Alkane, diisopropyl ether, dibutyl ether, di-third butyl ether, cyclopentyl methyl ether (CPME), methyl-third butyl ether, 1,2-dimethoxyethane (DME), diglyme, triglyme, etc.), nitriles (e.g., acetonitrile, etc.), amidines (e.g., N, N-dimethylformamidine) Amine (DMF), N, N-dimethylacetamide (DMAC), N-methylpyrrolidone (NMP), etc.), alkyl ureas (for example, N, N'-dimethylimidazolidone (DMI), etc., fluorenes (e.g., dimethyl sulfene (DMSO), etc.), fluorenes (e.g., cyclobutane, etc.), ketones (e.g., acetone, isobutyl methyl ketone (MIBK), cyclic Hexanone, etc.), carboxylic acid esters (e.g., ethyl acetate, butyl acetate, etc.), carboxylic acids (e.g., acetic acid, etc.), carbonates (e.g., ethyl carbonate, propyl carbonate, etc.), aromatic Hydrocarbon derivatives (for example, benzene, toluene, xylene, chlorobenzene, dichlorobenzene, trichlorobenzene, nitrobenzene, etc.), halogenated aliphatic hydrocarbons (for example, methylene chloride, etc.), and any ratio Any arbitrary combination of them is not limited to these.

由反應性及經濟效率等之觀點,就步驟(i)之溶劑之較佳例而言,可列舉水、醇類、腈類、醯胺類、亞碸類、酮類、羧酸酯類、羧酸類、芳香族烴衍生物類、鹵素化脂肪族烴類、及任意比率之彼等之任意組合。就步驟(i)之溶劑之較佳具體例而言,可列舉水、甲醇、乙醇、2-丙醇、乙腈、N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、二甲基亞碸、丙酮、異丁基甲基酮(MIBK)、環己酮、醋酸乙酯、醋酸丁酯、醋酸、甲苯、二甲苯、氯苯、二氯苯、二氯甲烷、及任意比率之彼等之任意組合。 From the viewpoints of reactivity, economic efficiency, etc., as preferred examples of the solvent in step (i), water, alcohols, nitriles, amidines, fluorenes, ketones, carboxylic acid esters, Any combination of carboxylic acids, aromatic hydrocarbon derivatives, halogenated aliphatic hydrocarbons, and any ratio thereof. As specific examples of the solvent in step (i), water, methanol, ethanol, 2-propanol, acetonitrile, N, N-dimethylformamide (DMF), N, N-dimethyl Acetylacetamide (DMAC), dimethylmethylene sulfoxide, acetone, isobutyl methyl ketone (MIBK), cyclohexanone, ethyl acetate, butyl acetate, acetic acid, toluene, xylene, chlorobenzene, dichlorobenzene, Dichloromethane, and any combination thereof in any ratio.

步驟(i)之溶劑之使用量係只要可充分攪拌反應系統即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(1)之化合物而言,為0.01~10.0L(公升),較佳為0.1~5.0L之範 圍。使用2種以上之溶劑之組合時,2種以上之溶劑的比率係只要反應有進行即可,可為任一種之比率。 The amount of the solvent used in step (i) may be any amount as long as the reaction system can be sufficiently stirred. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., it may be exemplified by 0.01 to 10.0 L (liters), preferably 0.1 to 5.0 L relative to 1 mole of the compound of the general formula (1) Fan Around. When a combination of two or more solvents is used, the ratio of the two or more solvents may be any ratio as long as the reaction proceeds.

使用過氧化氫或氧等作為步驟(i)之氧化劑時,例如,於氫氧化鈉、氫氧化鉀等之氫氧化鹼金屬之水溶液中,將通式(1)之化合物作成鈉鹽、鉀鹽等之鹼金屬鹽,於此水溶液中可進行反應。 When hydrogen peroxide or oxygen is used as the oxidizing agent in step (i), for example, the compound of the general formula (1) is used as a sodium salt or potassium salt in an aqueous solution of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide. Alkali metal salts can be reacted in this aqueous solution.

(步驟(i)之反應溫度) (Reaction temperature of step (i))

步驟(i)之反應溫度並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示-30℃(負30℃)~160℃,較佳為-10℃~80℃之範圍。 The reaction temperature of step (i) is not particularly limited. From the viewpoints of yield, suppression of by-products, economic efficiency, and the like, a range of -30 ° C (minus 30 ° C) to 160 ° C, and preferably -10 ° C to 80 ° C is exemplified.

(步驟(i)之反應時間) (Reaction time of step (i))

步驟(i)之反應時間並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示0.5小時~48小時,較佳為0.5小時~24小時,更佳為1小時~12小時之範圍。 The reaction time of step (i) is not particularly limited. From the viewpoints of productivity, by-product suppression, and economic efficiency, for example, 0.5 hours to 48 hours, preferably 0.5 hours to 24 hours, and more preferably 1 hour to 12 hours.

關於步驟(i),因應需要,可參照以下之文獻。 Regarding step (i), if necessary, refer to the following documents.

(社)日本化學會編、「新實驗化學講座14有機化合物之合成與反應III」、第1736~1738頁(1978年)、發行者飯泉新吾、丸善股份有限公司 (Compiled by the Japan Chemical Society, "New Experimental Chemistry Lecture 14 Synthesis and Reaction of Organic Compounds III", pages 1736 ~ 1738 (1978), issued by Iizumi Shingo, Maruzen Co., Ltd.

(社)日本化學會編、「實驗化學講座24有機合成VI」第4版、第330~331頁(1992年)、發行者 村田誠四郎、丸善股份有限公司 (Compiled by) The Chemical Society of Japan, "Experimental Chemistry Lecture 24 Organic Synthesis VI", 4th edition, pages 330-331 (1992), publisher Murata Seishiro, Maruzen Co., Ltd.

(步驟(i)之生成物;通式(2)之化合物) (Product of step (i); compound of general formula (2))

就步驟(i)所獲得的通式(2)之化合物而言,具體而言,可列舉例如:雙(2,4-二氟-5-羥基苯基)二硫醚、 雙(2,4-二氯-5-羥基苯基)二硫醚、雙(2-氯-4-氟-5-羥基苯基)二硫醚、雙(4-氟-2-甲基-5-羥基苯基)二硫醚、雙(4-氯-2-甲基-5-羥基苯基)二硫醚、雙(2,4-二甲基-5-羥基苯基)二硫醚等,但並未限定於此等。 Specific examples of the compound of the general formula (2) obtained in step (i) include bis (2,4-difluoro-5-hydroxyphenyl) disulfide, Bis (2,4-dichloro-5-hydroxyphenyl) disulfide, bis (2-chloro-4-fluoro-5-hydroxyphenyl) disulfide, bis (4-fluoro-2-methyl- 5-hydroxyphenyl) disulfide, bis (4-chloro-2-methyl-5-hydroxyphenyl) disulfide, bis (2,4-dimethyl-5-hydroxyphenyl) disulfide Etc., but it is not limited to these.

又,雙(2,4-二氟-5-羥基苯基)二硫醚亦稱為5,5’-二硫雙(2,4-二氟酚)。 The bis (2,4-difluoro-5-hydroxyphenyl) disulfide is also referred to as 5,5'-dithiobis (2,4-difluorophenol).

雙(2,4-二氯-5-羥基苯基)二硫醚亦稱為5,5’-二硫雙(2,4-二氯酚)。 Bis (2,4-dichloro-5-hydroxyphenyl) disulfide is also called 5,5'-dithiobis (2,4-dichlorophenol).

雙(2-氯-4-氟-5-羥基苯基)二硫醚亦稱為5,5’-二硫雙(4-氯-2-氟酚)。 Bis (2-chloro-4-fluoro-5-hydroxyphenyl) disulfide is also called 5,5'-dithiobis (4-chloro-2-fluorophenol).

雙(4-氟-2-甲基-5-羥基苯基)二硫醚亦稱為5,5’-二硫雙(2-氟-4-甲基酚)。 Bis (4-fluoro-2-methyl-5-hydroxyphenyl) disulfide is also referred to as 5,5'-dithiobis (2-fluoro-4-methylphenol).

雙(4-氯-2-甲基-5-羥基苯基)二硫醚亦稱為5,5’-二硫雙(2-氯-4-甲基酚)。 Bis (4-chloro-2-methyl-5-hydroxyphenyl) disulfide is also referred to as 5,5'-dithiobis (2-chloro-4-methylphenol).

雙(2,4-二甲基-5-羥基苯基)二硫醚亦稱為5,5’-二硫雙(2,4-二甲基酚)。 Bis (2,4-dimethyl-5-hydroxyphenyl) disulfide is also known as 5,5'-dithiobis (2,4-dimethylphenol).

為步驟(i)之生成物的通式(2)之化合物係可使用作為步驟(ii)之原料。步驟(i)所獲得的通式(2)之化合物係可單離而用於下一步驟,亦可純化而用於下一步驟,亦可不單離而用於下一步驟。 The compound of general formula (2), which is the product of step (i), can be used as a raw material of step (ii). The compound of the general formula (2) obtained in step (i) can be isolated and used in the next step, or can be purified and used in the next step, or can be used in the next step without being isolated.

(步驟(ii)) (Step (ii))

其次,說明關於步驟(ii)。 Next, step (ii) will be described.

步驟(ii)係將通式(2)所表示的化合物,於鹼 之存在下,使與通式(a)所表示的化合物反應,而製造通式(3)所表示的化合物的步驟, Step (ii) is a step of producing a compound represented by General Formula (3) by reacting a compound represented by General Formula (2) with a compound represented by General Formula (a) in the presence of a base,

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基),R3-X (a) (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group), and R 3 -X (a)

(式中,R3為C1~C4鹵烷基硫基C2~C10烷基;X為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基), (Wherein R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group; X is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 ~ C4 alkyl or halogen atom substituted phenylsulfonyloxy),

(式中,R1、R2及R3係如上述所定義)。 (Wherein R 1 , R 2 and R 3 are as defined above).

(通式(a)之化合物) (Compound of general formula (a))

通式(a)之化合物係公知的化合物、或可由公知的化合物依據公知的方法而可加以製造的化合物。就通式(a)之化合物而言,具體而言,可列舉例如:1-氯-5-三氟甲基硫基戊烷、1-溴-5-三氟甲基硫基戊烷、1-碘-5-三氟甲基硫基戊烷、1-甲烷磺醯氧基-5-三氟甲基硫基戊烷、1-三氟甲烷磺醯氧基-5-三氟甲基硫基戊烷、 1-(對甲苯磺醯氧基)-5-三氟甲基硫基戊烷、1-氯-6-三氟甲基硫基己烷、1-溴-6-三氟甲基硫基己烷、1-碘-6-三氟甲基硫基己烷、1-甲烷磺醯氧基-6-三氟甲基硫基己烷、1-三氟甲烷磺醯氧基-6-三氟甲基硫基己烷、1-(對甲苯磺醯氧基)-6-三氟甲基硫基己烷等,但未限定於此等。 The compound of the general formula (a) is a known compound, or a compound that can be produced from a known compound by a known method. Specific examples of the compound of the general formula (a) include 1-chloro-5-trifluoromethylthiopentane, 1-bromo-5-trifluoromethylthiopentane, 1 -Iodine-5-trifluoromethylsulfanylpentane, 1-methanesulfonyloxy-5-trifluoromethylsulfanylpentane, 1-trifluoromethanesulfonyloxy-5-trifluoromethylsulfan Pentyl, 1- (p-toluenesulfonyloxy) -5-trifluoromethylthiopentane, 1-chloro-6-trifluoromethylthiohexane, 1-bromo-6-trifluoromethylthiohexyl Alkanes, 1-iodo-6-trifluoromethylsulfanyl hexane, 1-methanesulfonyloxy-6-trifluoromethylsulfanyl hexane, 1-trifluoromethanesulfanyloxy-6-trifluoro Methylthiohexane, 1- (p-toluenesulfonyloxy) -6-trifluoromethylthiohexane, and the like are not limited thereto.

通式(a)之化合物之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(2)之化合物而言,為2.0~3.0莫耳,較佳為2.0~2.4莫耳之範圍。 The amount of the compound of the general formula (a) may be any amount as long as the reaction proceeds. From the viewpoints of yield, by-product suppression, economic efficiency, etc., it may be exemplified by a range of 2.0 to 3.0 mol, and preferably a range of 2.0 to 2.4 mol relative to 1 mol of the compound of the general formula (2). .

(步驟(ii)之鹼) (Base of step (ii))

於步驟(ii)所使用的鹼,只要反應有進行即可,可為任一種之鹼。就步驟(ii)所使用的鹼而言,可列舉例如:鹼金屬氫氧化物(例如,氫氧化鋰、氫氧化鈉、氫氧化鉀等)、鹼土類金屬氫氧化物(例如,氫氧化鎂、氫氧化鈣、氫氧化鋇等)、鹼金屬碳酸鹽(例如,碳酸鋰、碳酸鈉、碳酸鉀等)、鹼土類金屬碳酸鹽(例如,碳酸鎂、碳酸鈣、碳酸鋇等)、鹼金屬碳酸氫鹽(例如,碳酸氫鋰、碳酸氫鈉、碳酸氫鉀等)、鹼土類金屬碳酸氫鹽(例如,碳酸氫鎂、碳酸氫鈣等)、 磷酸鹽(例如,磷酸鈉、磷酸鉀、磷酸鈣等)、磷酸氫鹽(例如,磷酸氫鈉、磷酸氫鉀、磷酸氫鈣等)、金屬氫化物(例如,氫化鈉、氫化鈣等)、金屬烷氧化物(例如,甲醇鈉、乙醇鈉、第三丁醇鉀等)及胺類(例如,三乙基胺、三丁基胺、二異丙基乙基胺、1,8-二吖雙環〔5.4.0〕-7-十一-7-烯(DBU)、1,4-二吖雙環〔2.2.2〕辛烷(DABCO)、N,N-二甲基苯胺、N,N-二乙基苯胺、吡啶、4-(二甲基胺基)-吡啶、2,6-二甲吡啶等),但並未限定於此等。 The base used in step (ii) may be any base as long as the reaction proceeds. Examples of the base used in step (ii) include alkali metal hydroxides (for example, lithium hydroxide, sodium hydroxide, and potassium hydroxide), and alkaline earth metal hydroxides (for example, magnesium hydroxide). , Calcium hydroxide, barium hydroxide, etc.), alkali metal carbonates (e.g., lithium carbonate, sodium carbonate, potassium carbonate, etc.), alkaline earth metal carbonates (e.g., magnesium carbonate, calcium carbonate, barium carbonate, etc.), alkali metals Bicarbonate (for example, lithium bicarbonate, sodium bicarbonate, potassium bicarbonate, etc.), alkaline earth metal bicarbonate (for example, magnesium bicarbonate, calcium bicarbonate, etc.), Phosphate (e.g., sodium phosphate, potassium phosphate, calcium phosphate, etc.), hydrogen phosphate (e.g., sodium hydrogen phosphate, potassium hydrogen phosphate, calcium hydrogen phosphate, etc.), metal hydride (e.g., sodium hydride, calcium hydride, etc.), Metal alkoxides (e.g., sodium methoxide, sodium ethoxide, potassium tert-butoxide, etc.) and amines (e.g., triethylamine, tributylamine, diisopropylethylamine, 1,8-diazine Bicyclic [5.4.0] -7-undec-7-ene (DBU), 1,4-diazine bicyclic [2.2.2] octane (DABCO), N, N-dimethylaniline, N, N- Diethylaniline, pyridine, 4- (dimethylamino) -pyridine, 2,6-dimethylpyridine, etc.) are not limited thereto.

由反應性、產率及經濟效率等之觀點,就步驟(ii)之鹼的較佳例而言,可列舉鹼金屬氫氧化物、鹼金屬碳酸鹽及鹼金屬碳酸氫鹽,更佳為鹼金屬氫氧化物及鹼金屬碳酸鹽。就步驟(ii)之鹼之較佳具體例而言,可列舉氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸鉀、碳酸氫鈉及碳酸氫鉀,更佳為氫氧化鈉、氫氧化鉀、碳酸鈉及碳酸鉀。 From the viewpoints of reactivity, productivity, economic efficiency, etc., preferred examples of the base in step (ii) include alkali metal hydroxides, alkali metal carbonates, and alkali metal bicarbonates, and more preferred are alkalis. Metal hydroxides and alkali metal carbonates. Specific preferred examples of the base in step (ii) include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, and potassium bicarbonate, and more preferably sodium hydroxide, potassium hydroxide, Sodium carbonate and potassium carbonate.

步驟(ii)之鹼可單獨使用或以任意比率之2種以上之組合使用。步驟(ii)之鹼之形態係只要反應有進行即可,可為任一種之形態。步驟(ii)之鹼之形態可由本項技術領域中具通常知識者適當地選擇。 The base of step (ii) can be used alone or in a combination of two or more at any ratio. The form of the base in step (ii) may be any form as long as the reaction proceeds. The form of the base in step (ii) can be appropriately selected by those having ordinary knowledge in the technical field.

步驟(ii)之鹼之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(2)之化合物而言,為0.5~3.0莫耳,較佳為0.5~2.4莫耳之範圍。 The amount of the base used in step (ii) is any amount as long as the reaction proceeds. From the viewpoints of yield, by-product suppression, economic efficiency, etc., it may be exemplified by 0.5 to 3.0 mol, preferably 0.5 to 2.4 mol relative to 1 mol of the compound of the general formula (2). .

(步驟(ii)之相轉移觸媒) (Phase transfer catalyst in step (ii))

步驟(ii)之反應可於相轉移觸媒之存在下進行。亦可不使用相轉移觸媒。是否使用相轉移觸媒,可由本項技術領域中具通常知識者適當地決定。就相轉移觸媒而言,可列舉例如,四級銨鹽、四級鏻鹽、冠醚類等,但未限定於此等。 The reaction of step (ii) can be performed in the presence of a phase transfer catalyst. It is not necessary to use a phase transfer catalyst. Whether or not to use a phase transfer catalyst can be appropriately determined by those having ordinary knowledge in this technical field. Examples of the phase transfer catalyst include, but are not limited to, quaternary ammonium salts, quaternary phosphonium salts, and crown ethers.

就四級銨鹽而言,可列舉例如,四丁基氯化銨、四丁基溴化銨、四丁基碘化銨、硫酸氫四丁基銨、苄基三甲基氯化銨、苄基三甲基溴化銨、辛基三甲基氯化銨、辛基三甲基溴化銨、三辛基甲基氯化銨、三辛基甲基溴化銨、苄基月桂基二甲基氯化銨(苄基十二基二甲基氯化銨)、苄基月桂基二甲基溴化銨(苄基十二基二甲基溴化銨)、肉豆蔻基三甲基氯化銨(十四基三甲基氯化銨)、肉豆蔻基三甲基溴化銨(十四基三甲基溴化銨)、苄基二甲基硬脂基氯化銨(苄基十八基二甲基氯化銨)、苄基二甲基硬脂基溴化銨(苄基十八基二甲基溴化銨)等。 Examples of the quaternary ammonium salt include tetrabutylammonium chloride, tetrabutylammonium bromide, tetrabutylammonium iodide, tetrabutylammonium hydrogen sulfate, benzyltrimethylammonium chloride, and benzyl Trimethylammonium bromide, octyltrimethylammonium chloride, octyltrimethylammonium bromide, trioctylmethylammonium chloride, trioctylmethylammonium bromide, benzyllauryldimethyl Ammonium chloride (benzyldodecyldimethylammonium chloride), benzyllauryldimethylammonium bromide (benzyldodecyldimethylammonium bromide), myristyltrimethyl chloride Ammonium (tetradecyltrimethylammonium chloride), myristyltrimethylammonium bromide (tetradecyltrimethylammonium bromide), benzyldimethylstearylammonium chloride (benzylstearyl) Dimethyl ammonium chloride), benzyl dimethyl stearyl ammonium bromide (benzyl octadecyl dimethyl ammonium bromide), and the like.

就四級鏻鹽而言,可列舉例如,四丁基溴化鏻、四辛基溴化鏻、四苯基溴化鏻等。 Examples of the quaternary phosphonium salt include tetrabutylphosphonium bromide, tetraoctylphosphonium bromide, and tetraphenylphosphonium bromide.

就冠醚類而言,可列舉例如,12-冠-4、15-冠-5、18-冠-6等。 Examples of the crown ethers include 12-crown-4, 15-crown-5, 18-crown-6, and the like.

由反應性、產率及經濟效率等之觀點,相轉移觸媒係較佳為四級銨鹽,更佳為四丁基溴化銨或四丁基碘化銨。 From the viewpoints of reactivity, productivity, economic efficiency, etc., the phase transfer catalyst is preferably a quaternary ammonium salt, and more preferably tetrabutylammonium bromide or tetrabutylammonium iodide.

相轉移觸媒可單獨使用或以任意比率之2種以上之組合來使用。相轉移觸媒之形態係只要反應有進 行即可,可為任一種之形態。相轉移觸媒之形態可由本項技術領域中具通常知識者適當地選擇。 The phase transfer catalyst may be used alone or in a combination of two or more at any ratio. As long as the reaction of the phase transfer catalyst You can do it, and it can take any form. The form of the phase transfer catalyst can be appropriately selected by those having ordinary knowledge in the technical field.

步驟(ii)之相轉移觸媒之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(2)之化合物而言,為0(零)~0.3莫耳之範圍,但步驟(ii)之相轉移觸媒之使用量可由本項技術領域中具通常知識者適當地調整。 The amount of the phase transfer catalyst used in step (ii) may be any amount as long as the reaction proceeds. From the viewpoints of yield, by-product suppression, economic efficiency, etc., the range of 0 (zero) to 0.3 mol relative to 1 mol of the compound of the general formula (2) can be exemplified, but step (ii) The amount of the phase transfer catalyst used can be appropriately adjusted by those having ordinary knowledge in the technical field.

(步驟(ii)之溶劑) (Solvent in step (ii))

由反應平順地進行等之觀點,步驟(ii)之反應係於溶劑存在下實施為較佳。步驟(ii)之溶劑係只要步驟(ii)之反應有進行即可,可為任一種之溶劑。就步驟(ii)之溶劑而言,可列舉例如,醯胺類(例如,N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、N-甲基吡咯啶酮(NMP)等)、烷基尿素類(例如,N,N’-二甲基咪唑啶酮(DMI)等)、亞碸類(例如,二甲基亞碸(DMSO)等)、碸類(例如,環丁碸等)、醚類(例如,四氫呋喃(THF)、1,4-二烷、二異丙基醚、二丁基醚、二-第三丁基醚、環戊基甲基醚(CPME)、甲基-第三丁基醚、1,2-二甲氧基乙烷(DME)、二甘醇二甲醚(diglyme)、三甘醇二甲醚(triglyme)等)、酮類(例如,丙酮、異丁基甲基酮(MIBK)、環己酮等)、羧酸酯類(例如,醋酸乙酯、醋酸丁酯等)、腈類(例如,乙腈等)、 醇類(例如,甲醇、乙醇、2-丙醇、丁醇等)、芳香族烴衍生物類(例如,苯、甲苯、二甲苯、氯苯、二氯苯、三氯苯、硝基苯等)、鹵素化脂肪族烴類(例如,二氯甲烷等)、水、及任意比率之彼等之任意組合,但未限定於此等。 From the viewpoint that the reaction proceeds smoothly, etc., the reaction in step (ii) is preferably carried out in the presence of a solvent. The solvent in step (ii) may be any solvent as long as the reaction in step (ii) proceeds. As the solvent of step (ii), for example, amidines (e.g., N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAC), N- Methylpyrrolidone (NMP), etc.), alkyl ureas (e.g., N, N'-dimethylimidazolidone (DMI), etc.), fluorenes (e.g., dimethylsulfine (DMSO), etc. ), Amidines (e.g., cyclobutane, etc.), ethers (e.g., tetrahydrofuran (THF), 1,4-bis Alkane, diisopropyl ether, dibutyl ether, di-third butyl ether, cyclopentyl methyl ether (CPME), methyl-third butyl ether, 1,2-dimethoxyethane (DME), diglyme, triglyme, etc.), ketones (e.g., acetone, isobutyl methyl ketone (MIBK), cyclohexanone, etc.), carboxylic acid esters (E.g., ethyl acetate, butyl acetate, etc.), nitriles (e.g., acetonitrile, etc.), alcohols (e.g., methanol, ethanol, 2-propanol, butanol, etc.), aromatic hydrocarbon derivatives (e.g., , Benzene, toluene, xylene, chlorobenzene, dichlorobenzene, trichlorobenzene, nitrobenzene, etc.), halogenated aliphatic hydrocarbons (e.g., methylene chloride, etc.), water, and any ratio of any of them Combinations are not limited to these.

由反應性及經濟效率等之觀點,就步驟(ii)之溶劑之較佳例而言,可列舉醯胺類、亞碸類、醚類、酮類、腈類、醇類、芳香族烴衍生物類、水、及任意比率之彼等之任意組合。就步驟(ii)之溶劑之較佳具體例而言,可列舉N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、N-甲基吡咯啶酮(NMP)、二甲基亞碸(DMSO)、四氫呋喃(THF)、丙酮、異丁基甲基酮(MIBK)、乙腈、甲醇、乙醇、2-丙醇、甲苯、二甲苯、氯苯、二氯苯、水、及任意比率之彼等之任意組合。 From the viewpoints of reactivity, economic efficiency, etc., as examples of the solvent of step (ii), amines, fluorenes, ethers, ketones, nitriles, alcohols, and aromatic hydrocarbon derivatives may be mentioned. Any combination of species, water, and any ratio. As specific examples of the solvent in step (ii), N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAC), and N-methylpyrrole are mentioned. Pyridone (NMP), dimethyl sulfoxide (DMSO), tetrahydrofuran (THF), acetone, isobutyl methyl ketone (MIBK), acetonitrile, methanol, ethanol, 2-propanol, toluene, xylene, chlorobenzene, dioxin Any combination of chlorobenzene, water, and any ratio thereof.

步驟(ii)之溶劑之使用量係只要反應系統之攪拌可充分即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(2)之化合物而言,為0.01~10.0L(公升),較佳為0.1~5.0L之範圍。使用2種以上之溶劑之組合時,2種以上之溶劑之比率係只要反應有進行即可,可為任一種之比率。 The amount of the solvent used in step (ii) is sufficient as long as the stirring of the reaction system is sufficient, and may be any amount. From the viewpoints of yield, by-product suppression, economic efficiency, etc., it may be exemplified by 0.01 to 10.0 L (liters), preferably 0.1 to 5.0 L relative to 1 mol of the compound of the general formula (2). range. When a combination of two or more solvents is used, the ratio of the two or more solvents may be any ratio as long as the reaction proceeds.

(步驟(ii)之反應溫度) (Reaction temperature of step (ii))

步驟(ii)之反應溫度並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示-10℃(負10℃)~160℃、較佳為10℃~120℃之範圍。 The reaction temperature of step (ii) is not particularly limited. From the viewpoints of yield, suppression of by-products, and economic efficiency, a range of -10 ° C (negative 10 ° C) to 160 ° C, preferably 10 ° C to 120 ° C is exemplified.

(步驟(ii)之反應時間) (Reaction time of step (ii))

步驟(ii)之反應時間並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示0.5小時~48小時,較佳為1小時~24小時之範圍。 The reaction time of step (ii) is not particularly limited. From the viewpoints of yield, suppression of by-products, and economic efficiency, the range of 0.5 to 48 hours is preferable, and the range of 1 to 24 hours is preferable.

(步驟(ii)之生成物;通式(3)之化合物) (Product of step (ii); compound of general formula (3))

作為步驟(ii)所獲得的通式(3)之化合物,具體而言,可列舉例如,雙〔2,4-二氟-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚、雙〔2,4-二氟-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚、雙〔2,4-二氯-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚、雙〔2,4-二氯-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚、雙〔2-氯-4-氟-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚、雙〔2-氯-4-氟-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚、雙〔4-氟-2-甲基-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚、雙〔4-氟-2-甲基-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚、雙〔4-氯-2-甲基-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚、 雙〔4-氯-2-甲基-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚、雙〔2,4-二甲基-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚、雙〔2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚等,但未限定於此等。 Specific examples of the compound of the general formula (3) obtained in step (ii) include bis [2,4-difluoro-5- (5-trifluoromethylthiopentyloxy) benzene Yl] disulfide, bis [2,4-difluoro-5- (6-trifluoromethylthiohexyloxy) phenyl] disulfide, bis [2,4-dichloro-5- (5 -Trifluoromethylthiopentyloxy) phenyl] disulfide, bis [2,4-dichloro-5- (6-trifluoromethylthiohexyloxy) phenyl] disulfide, Bis [2-chloro-4-fluoro-5- (5-trifluoromethylthiopentyloxy) phenyl] disulfide, bis [2-chloro-4-fluoro-5- (6-trifluoro Methylthiohexyloxy) phenyl] disulfide, bis [4-fluoro-2-methyl-5- (5-trifluoromethylthiopentyloxy) phenyl] disulfide, bis [4-fluoro-2-methyl-5- (6-trifluoromethylthiohexyloxy) phenyl] disulfide, bis [4-chloro-2-methyl-5- (5-trifluoro Methylthiopentyloxy) phenyl] disulfide, Bis [4-chloro-2-methyl-5- (6-trifluoromethylthiohexyloxy) phenyl] disulfide, bis [2,4-dimethyl-5- (5-trifluoro Methylthiopentyloxy) phenyl] disulfide, bis [2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) phenyl] disulfide, etc., but It is not limited to these.

為步驟(ii)之生成物的通式(3)之化合物係可使用作為步驟(iii)之原料。即,為步驟(ii)之生成物的通式(3)之化合物係可使用作為步驟(iii-a)及步驟(iii-b)之原料。步驟(ii)所獲得的通式(3)之化合物係可單離而使用於下一步驟,亦可進一步純化而用於下一步驟,或可不單離而用於下一步驟。 The compound of general formula (3) which is the product of step (ii) can be used as a raw material of step (iii). That is, the compound of the general formula (3) which is a product of step (ii) can be used as a raw material of step (iii-a) and step (iii-b). The compound of the general formula (3) obtained in step (ii) may be isolated and used in the next step, or may be further purified and used in the next step, or may be used in the next step without being isolated.

(步驟(iii)) (Step (iii))

其次,說明步驟(iii)。 Next, step (iii) will be described.

步驟(iii)係將通式(3)所表示的化合物轉換為通式(4)所表示的化合物的步驟, Step (iii) is a step of converting a compound represented by the general formula (3) into a compound represented by the general formula (4),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基), (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group),

(式中,R1、R2及R3係如上述所定義;R4為C1~C4鹵烷基)。 (Wherein R 1 , R 2 and R 3 are as defined above; R 4 is a C1 to C4 haloalkyl group).

其中,步驟(iii)係包含步驟(iii-a)、或包含步驟(iii-b)及步驟(iii-c)。 Among them, step (iii) includes step (iii-a), or includes step (iii-b) and step (iii-c).

於一個實施態樣,步驟(iii)係以下之步驟:(iii-a)藉由使通式(3)所表示的化合物,於鹼之存在下,與通式(b)所表示的化合物反應,而將前述通式(3)之化合物轉換為前述通式(4)之化合物的步驟, In one embodiment, step (iii) is the following step: (iii-a) by reacting a compound represented by general formula (3) with a compound represented by general formula (b) in the presence of a base And the step of converting the compound of the aforementioned general formula (3) into the compound of the aforementioned general formula (4),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基),R4-Y (b) (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group), R 4 -Y (b)

(式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基)。 (Wherein R 4 is a C1 to C4 haloalkyl group; Y is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 to C4 alkyl group or halogen Atom substituted phenylsulfonyloxy).

於其他實施態樣,步驟(iii)係包含以下之步 驟:(iii-b)使通式(3)所表示的化合物轉換為通式(5)所表示的化合物的步驟, In other embodiments, step (iii) includes the following steps: (iii-b) a step of converting a compound represented by general formula (3) into a compound represented by general formula (5),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基), (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group),

(式中,R1、R2及R3係如上述所定義);及(iii-c)藉由使前述通式(5)之化合物,於鹼之存在下,與通式(b)所表示的化合物反應,而將前述通式(5)之化合物轉換為前述通式(4)之化合物的步驟,R4-Y (b) (Wherein R 1 , R 2, and R 3 are as defined above); and (iii-c) by allowing the compound of the aforementioned general formula (5) in the presence of a base to react with the general formula (b) A step of reacting a compound represented by the formula (5) to convert the compound of the aforementioned general formula (5) to the compound of the aforementioned general formula (4), R 4 -Y (b)

(式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基)。 (Wherein R 4 is a C1 to C4 haloalkyl group; Y is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 to C4 alkyl group or halogen Atom substituted phenylsulfonyloxy).

具體而言,例如,於步驟(iii),步驟(iii-b)進行後,進行步驟(iii-c)。 Specifically, for example, after step (iii) and step (iii-b) are performed, step (iii-c) is performed.

(步驟(iii-a)) (Step (iii-a))

其次,說明步驟(iii-a)。 Next, step (iii-a) will be described.

步驟(iii-a)係藉由使通式(3)所表示的化合物,於鹼之存在下,與通式(b)所表示的化合物反應,而將前述通式(3)之化合物轉換為通式(4)所表示的化合物的步驟, Step (iii-a) is to convert a compound represented by the general formula (3) into a compound represented by the general formula (3) by reacting the compound represented by the general formula (3) with a compound represented by the general formula (b) in the presence of a base. A step of a compound represented by the general formula (4),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基),R4-Y (b) (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group), R 4 -Y (b)

(式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基), (Wherein R 4 is a C1 to C4 haloalkyl group; Y is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 to C4 alkyl group or halogen Atom substituted phenylsulfonyloxy),

(式中,R1、R2、R3及R4係如上述所定義)。 (Wherein R 1 , R 2 , R 3 and R 4 are as defined above).

(步驟(iii-a)之通式(b)之化合物) (Compound of general formula (b) in step (iii-a))

步驟(iii-a)之通式(b)之化合物係公知的化合物、或 可由公知的化合物而依據公知的方法所製造的化合物。就步驟(iii-a)之通式(b)化合物而言,具體而言,可列舉例如:1-氯-2,2,2-三氟乙烷、1-溴-2,2,2-三氟乙烷、1-碘-2,2,2-三氟乙烷、甲烷磺酸2,2,2-三氟乙基、三氟甲烷磺酸2,2,2-三氟乙基、對甲苯磺酸2,2,2-三氟乙基等,但未限定於此等。 The compound of formula (b) in step (iii-a) is a known compound, or A compound produced by a known method from a known compound. As for the compound of the general formula (b) in step (iii-a), specifically, for example, 1-chloro-2,2,2-trifluoroethane, 1-bromo-2,2,2- Trifluoroethane, 1-iodo-2,2,2-trifluoroethane, methanesulfonic acid 2,2,2-trifluoroethyl, trifluoromethanesulfonic acid 2,2,2-trifluoroethyl, Para-toluenesulfonic acid 2,2,2-trifluoroethyl and the like are not limited thereto.

步驟(iii-a)之通式(b)之化合物之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(3)之化合物而言,為2.0~3.0莫耳,較佳為2.0~2.4莫耳之範圍。 The amount of the compound of the general formula (b) in step (iii-a) may be any amount as long as the reaction proceeds. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., it may be exemplified by the range of 2.0 to 3.0 moles, and preferably the range of 2.0 to 2.4 moles relative to the compound of the general formula (3) of 1 mole .

(步驟(iii-a)之鹼) (Base of step (iii-a))

於步驟(iii-a)所使用的鹼,只要反應有進行即可,可為任一種之鹼。就步驟(iii-a)可使用的鹼而言,可列舉例如,鹼金屬氫氧化物(例如,氫氧化鋰、氫氧化鈉、氫氧化鉀等)、鹼土類金屬氫氧化物(例如,氫氧化鎂、氫氧化鈣、氫氧化鋇等)、鹼金屬碳酸鹽(例如,碳酸鋰、碳酸鈉、碳酸鉀等)、鹼土類金屬碳酸鹽(例如,碳酸鎂、碳酸鈣、碳酸鋇等)、 鹼金屬碳酸氫鹽(例如,碳酸氫鋰、碳酸氫鈉、碳酸氫鉀等)、鹼土類金屬碳酸氫鹽(例如,碳酸氫鎂、碳酸氫鈣等)、磷酸鹽(例如,磷酸鈉、磷酸鉀、磷酸鈣等)、磷酸氫鹽(例如,磷酸氫鈉、磷酸氫鉀、磷酸氫鈣等)、金屬氫化物(例如,氫化鈉、氫化鈣等)、金屬烷氧化物(例如,甲醇鈉、乙醇鈉、第三丁醇鉀等)、胺類(例如,三乙基胺、三丁基胺、二異丙基乙基胺、1,8-二吖雙環〔5.4.0〕-7-十一-7-烯(DBU)、1,4-二吖雙環〔2.2.2〕辛烷(DABCO)、N,N-二甲基苯胺、N,N-二乙基苯胺、吡啶、4-(二甲基胺基)-吡啶、2,6-二甲吡啶等)及後述的自由基起始劑中亦適合作為鹼的自由基起始劑(例如,亞硫酸氫鈉、亞硫酸氫鉀、吊白塊(商品名Ron galite)(甲醛次硫酸氫鈉2水合物(sodium formaldehyde sulfoxylate 2H2O)等),但未限定於此等。 The base used in step (iii-a) may be any base as long as the reaction proceeds. Examples of the base usable in step (iii-a) include alkali metal hydroxides (for example, lithium hydroxide, sodium hydroxide, potassium hydroxide, etc.), and alkaline earth metal hydroxides (for example, hydrogen Magnesium oxide, calcium hydroxide, barium hydroxide, etc.), alkali metal carbonates (e.g., lithium carbonate, sodium carbonate, potassium carbonate, etc.), alkaline earth metal carbonates (e.g., magnesium carbonate, calcium carbonate, barium carbonate, etc.), Alkali metal bicarbonates (for example, lithium bicarbonate, sodium bicarbonate, potassium bicarbonate, etc.), alkaline earth metal bicarbonates (for example, magnesium bicarbonate, calcium bicarbonate, etc.), phosphates (for example, sodium phosphate, phosphoric acid Potassium, calcium phosphate, etc.), hydrogen phosphate (e.g., sodium hydrogen phosphate, potassium hydrogen phosphate, calcium hydrogen phosphate, etc.), metal hydrides (e.g., sodium hydride, calcium hydride, etc.), metal alkoxides (e.g., sodium methoxide , Sodium ethoxide, potassium tert-butoxide, etc.), amines (for example, triethylamine, tributylamine, diisopropylethylamine, 1,8-diazinebicyclo [5.4.0] -7- Undec-7-ene (DBU), 1,4-diazinebicyclo [2.2.2] octane (DABCO), N, N-dimethylaniline, N, N-diethylaniline, pyridine, 4- (Secondary Aminoamino) -pyridine, 2,6-dimethylpyridine, etc.) and the radical initiators described below are also suitable as base radical initiators (e.g., sodium bisulfite, potassium bisulfite, hanging white Block (trade name Ron galite) (sodium formaldehyde sulfoxylate 2H 2 O, etc.), but is not limited to these.

由反應性、產率及經濟效率等之觀點,就步驟(iii-a)之鹼之較佳例而言,可列舉鹼金屬氫氧化物、鹼金屬碳酸鹽及鹼金屬碳酸氫鹽。就步驟(iii-a)之鹼之較佳具體例而言,可列舉氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸鉀、碳酸氫鈉及碳酸氫鉀。 From the viewpoints of reactivity, productivity, economic efficiency, etc., preferred examples of the base in step (iii-a) include alkali metal hydroxides, alkali metal carbonates, and alkali metal bicarbonates. Specific preferred examples of the base in step (iii-a) include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, and potassium bicarbonate.

步驟(iii-a)之鹼可單獨使用或以任意比率之2種以上之組合來使用。步驟(iii-a)之鹼之形態係只要反應 有進行即可,可為任一種形態。步驟(iii-a)之鹼之形態係可藉由本項技術領域中具通常知識者適當地選擇。 The base of step (iii-a) can be used alone or in a combination of two or more at any ratio. As long as the base morphology of step (iii-a) is reacted It can be performed as long as it takes, and it can take any form. The form of the base in step (iii-a) can be appropriately selected by those having ordinary knowledge in the technical field.

步驟(iii-a)之鹼之使用量係反應可進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(3)之化合物而言,為0.5~3.0莫耳,較佳為0.5~2.4莫耳,更佳為1.0~2.4莫耳之範圍。 The amount of the base to be used in step (iii-a) is sufficient for the reaction to proceed, and may be any amount. From the viewpoints of yield, by-product suppression, and economic efficiency, for example, it is 0.5 to 3.0 moles, preferably 0.5 to 2.4 moles, more preferably 1 to 2.5 moles of the compound of the general formula (3). It is preferably in the range of 1.0 to 2.4 moles.

(步驟(iii-a)之自由基起始劑) (Free radical initiator of step (iii-a))

步驟(iii-a)之反應係於自由基起始劑之存在下或非存在下,較佳為自由基起始劑之存在下進行。然而,是否於步驟(iii-a)使用自由基起始劑,可由本項技術領域中具通常知識者適當地決定。步驟(iii-a)所使用的自由基起始劑係只要反應有進行即可,可為任一種之自由基起始劑。就步驟(iii-a)可使用的自由基起始劑而言,可列舉例如,亞硫酸、亞硫酸氫鈉、亞硫酸氫鉀、亞硫酸鈉、亞硫酸鉀、吊白塊(商品名)(甲醛次硫酸氫鈉2水合物)等,但未限定於此等。本文中,該自由基起始劑可理解為還原劑。甲醛次硫酸氫鈉2水合物係具有與羥基甲基亞磺酸鈉2水合物相同意義。由產率、反應性、入手性、價格及處理容易度等之觀點,就步驟(iii-a)所使用的自由基起始劑之較佳例而言,可列舉吊白塊。 The reaction of step (iii-a) is performed in the presence or absence of a radical initiator, preferably in the presence of a radical initiator. However, whether to use a radical initiator in step (iii-a) can be appropriately determined by a person having ordinary knowledge in the art. The radical initiator used in step (iii-a) may be any radical initiator as long as the reaction proceeds. Examples of the radical initiator that can be used in step (iii-a) include, for example, sulfurous acid, sodium bisulfite, potassium bisulfite, sodium sulfite, potassium sulfite, hanging white block (trade name) (formaldehyde) Sodium bisulfite dihydrate) and the like are not limited thereto. Herein, the radical initiator is understood as a reducing agent. Sodium formaldehyde sulfoxylate dihydrate has the same meaning as sodium hydroxymethylsulfinate dihydrate. From the viewpoints of yield, reactivity, availability, price, and ease of handling, as a preferred example of the radical initiator used in step (iii-a), a white block can be cited.

步驟(iii-a)之自由基起始劑可單獨使用或以任意比率之2種以上之組合來使用。步驟(iii-a)之自由基起始劑之形態係只要可進行反應即可,可為任一種之形態。步驟(iii-a)之自由基起始劑之形態係可由本項技術領 域中具通常知識者適當地選擇。步驟(iii-a)之自由基起始劑之使用量係只要可進行反應即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(3)之化合物,為0(零)~6.0莫耳,較佳為0.01~6.0莫耳,更佳為0.1~4.0莫耳,更佳為1.0~4.0莫耳之範圍,但步驟(iii-a)之自由基起始劑之使用量係可由本項技術領域中具通常知識者適當地調整。步驟(iii-a)之如上述的適當自由基起始劑亦可兼作上述之步驟(iii-a)之鹼而使用。步驟(iii-a)之自由基起始劑與上述之步驟(iii-a)之鹼亦可併用。 The radical initiator in step (iii-a) can be used alone or in a combination of two or more at any ratio. The form of the radical initiator in step (iii-a) is any form as long as it can react. The morphology of the radical initiator in step (iii-a) can be obtained by this technology. Those with ordinary knowledge in the domain choose appropriately. The amount of the radical initiator used in step (iii-a) is any amount as long as the reaction can be performed. From the viewpoints of yield, by-product suppression, economic efficiency, etc., it may be exemplified by 0 (zero) to 6.0 mol, preferably 0.01 to 6.0 mol relative to 1 mol of the compound of the general formula (3). More preferably, it is in the range of 0.1 to 4.0 moles, and more preferably in the range of 1.0 to 4.0 moles, but the amount of the radical initiator used in step (iii-a) can be appropriately adjusted by those having ordinary knowledge in the technical field. . The appropriate radical initiator as described above in step (iii-a) can also be used as the base in step (iii-a) described above. The radical initiator of step (iii-a) and the base of step (iii-a) described above may also be used in combination.

(步驟(iii-a)之溶劑) (Solvent of step (iii-a))

由反應平順進行等之觀點,步驟(iii-a)之反應係於溶劑存在下實施為較佳。步驟(iii-a)之溶劑係只要步驟(iii-a)之反應有進行即可,可為任一種之溶劑。就步驟(iii-a)之溶劑而言,可列舉例如,醯胺類(例如,N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、N-甲基吡咯啶酮(NMP)等)、烷基尿素類(例如,N,N’-二甲基咪唑啶酮(DMI)等)、亞碸類(例如,二甲基亞碸(DMSO)等)、碸類(例如,環丁碸等)、醚類(例如,四氫呋喃(THF)、1,4-二烷、二異丙基醚、二丁基醚、二-第三丁基醚、環戊基甲基醚(CPME)、甲基-第三丁基醚、1,2-二甲氧基乙烷(DME)、二甘醇二甲醚(diglyme)、三甘醇二甲醚(triglyme)等)、酮類(例如,丙酮、異丁基甲基酮(MIBK)、環己酮等)、 羧酸酯類(例如,醋酸乙酯、醋酸丁酯等)、腈類(例如,乙腈等)、醇類(例如,甲醇、乙醇、2-丙醇、丁醇等)、芳香族烴衍生物類(例如,苯、甲苯、二甲苯、氯苯、二氯苯、三氯苯、硝基苯等)、鹵素化脂肪族烴類(例如,二氯甲烷等)、水、及任意之比率之彼等任意之組合,但未限定於此等。 From the viewpoint of smooth progress of the reaction, etc., it is preferred that the reaction in step (iii-a) is carried out in the presence of a solvent. The solvent in step (iii-a) is any solvent as long as the reaction in step (iii-a) proceeds. As the solvent of step (iii-a), for example, amidines (for example, N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAC), N-methylpyrrolidone (NMP), etc.), alkyl ureas (e.g., N, N'-dimethylimidazolidone (DMI), etc.), fluorenes (e.g., dimethylsulfinium (DMSO) ), Etc.), amidines (for example, cyclobutane, etc.), ethers (for example, tetrahydrofuran (THF), 1,4-bis Alkane, diisopropyl ether, dibutyl ether, di-third butyl ether, cyclopentyl methyl ether (CPME), methyl-third butyl ether, 1,2-dimethoxyethane (DME), diglyme, triglyme, etc.), ketones (e.g., acetone, isobutyl methyl ketone (MIBK), cyclohexanone, etc.), carboxylic acid esters (E.g., ethyl acetate, butyl acetate, etc.), nitriles (e.g., acetonitrile, etc.), alcohols (e.g., methanol, ethanol, 2-propanol, butanol, etc.), aromatic hydrocarbon derivatives (e.g., , Benzene, toluene, xylene, chlorobenzene, dichlorobenzene, trichlorobenzene, nitrobenzene, etc.), halogenated aliphatic hydrocarbons (for example, dichloromethane, etc.), water, and any ratio of any of them The combination is not limited to these.

由反應性及經濟效率等之觀點,就步驟(iii-a)之溶劑之較佳例而言,可列舉醯胺類、亞碸類、醚類、酮類、腈類、醇類、芳香族烴衍生物類、水、及任意之比率之彼等任意之組合。就步驟(iii-a)之溶劑之較佳具體例而言,可列舉N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、N-甲基吡咯啶酮(NMP)、二甲基亞碸(DMSO)、四氫呋喃(THF)、丙酮、異丁基甲基酮(MIBK)、乙腈、甲醇、乙醇、2-丙醇、甲苯、二甲苯、氯苯、二氯苯、水、及任意比率之彼等任意之組合。 From the viewpoints of reactivity, economic efficiency, etc., preferred examples of the solvent in step (iii-a) include amidoamines, fluorenes, ethers, ketones, nitriles, alcohols, aromatic Any combination of hydrocarbon derivatives, water, and any ratio. As specific examples of the solvent of step (iii-a), N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAC), N-formaldehyde N-pyrrolidone (NMP), dimethylsulfine (DMSO), tetrahydrofuran (THF), acetone, isobutyl methyl ketone (MIBK), acetonitrile, methanol, ethanol, 2-propanol, toluene, xylene, chlorobenzene , Dichlorobenzene, water, and any combination thereof at any ratio.

步驟(iii-a)之溶劑之使用量係只要反應系統之攪拌可充分進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(3)之化合物而言,為0.01~10.0L(公升),較佳為0.1~5.0L之範圍。使用2種以上之溶劑之組合時,2種以上之溶劑之比率係只要反應有進行即可,可為任一種之比率。 The amount of the solvent used in step (iii-a) may be any amount as long as the stirring of the reaction system can be sufficiently performed. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., it may be exemplified by 0.01 to 10.0 L (liters), preferably 0.1 to 5.0 L relative to 1 mol of the compound of the general formula (3). range. When a combination of two or more solvents is used, the ratio of the two or more solvents may be any ratio as long as the reaction proceeds.

(步驟(iii-a)之反應溫度) (Reaction temperature of step (iii-a))

步驟(iii-a)之反應溫度並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示-10℃(負10℃)~160℃,較佳為10℃~120℃之範圍。 The reaction temperature of step (iii-a) is not particularly limited. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., a range of -10 ° C (negative 10 ° C) to 160 ° C, and preferably 10 ° C to 120 ° C is exemplified.

(步驟(iii-a)之反應時間) (Reaction time of step (iii-a))

步驟(iii-a)之反應時間並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示0.5小時~48小時,較佳為1小時~24小時之範圍。 The reaction time of step (iii-a) is not particularly limited. From the viewpoints of yield, suppression of by-products, and economic efficiency, the range of 0.5 to 48 hours is preferable, and the range of 1 to 24 hours is preferable.

(步驟(iii-a)之生成物;通式(4)之化合物) (Product of step (iii-a); compound of general formula (4))

作為步驟(iii-a)所獲得的通式(4)之化合物,具體而言,可列舉例如,5-三氟甲基硫基戊基-〔2,4-二氟-5-(2,2,2-三氟乙基硫基)苯基〕醚、6-三氟甲基硫基己基-〔2,4-二氟-5-(2,2,2-三氟乙基硫基)苯基〕醚、5-三氟甲基硫基戊基-〔2,4-二氯-5-(2,2,2-三氟乙基硫基)苯基〕醚、6-三氟甲基硫基己基-〔2,4-二氯-5-(2,2,2-三氟乙基硫基)苯基〕醚、5-三氟甲基硫基戊基-〔4-氯-2-氟-5-(2,2,2-三氟乙基硫基)苯基〕醚、6-三氟甲基硫基己基-〔4-氯-2-氟-5-(2,2,2-三氟乙基硫基)苯基〕醚、5-三氟甲基硫基戊基-〔2-氟-4-甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚、6-三氟甲基硫基己基-〔2-氟-4-甲基-5-(2,2,2-三氟乙 基硫基)苯基〕醚、5-三氟甲基硫基戊基-〔2-氯-4-甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚、6-三氟甲基硫基己基-〔2-氯-4-甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚、5-三氟甲基硫基戊基-〔2,4-二甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚、6-三氟甲基硫基己基-〔2,4-二甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚等,但未限定於此等。 Specific examples of the compound of the general formula (4) obtained in step (iii-a) include 5-trifluoromethylthiopentyl- [2,4-difluoro-5- (2, 2,2-trifluoroethylthio) phenyl] ether, 6-trifluoromethylthiohexyl- [2,4-difluoro-5- (2,2,2-trifluoroethylthio) Phenyl] ether, 5-trifluoromethylthiopentyl- [2,4-dichloro-5- (2,2,2-trifluoroethylthio) phenyl] ether, 6-trifluoromethyl Methylthiohexyl- [2,4-dichloro-5- (2,2,2-trifluoroethylthio) phenyl] ether, 5-trifluoromethylthiopentyl- [4-chloro- 2-fluoro-5- (2,2,2-trifluoroethylthio) phenyl] ether, 6-trifluoromethylthiohexyl- [4-chloro-2-fluoro-5- (2,2 , 2-trifluoroethylthio) phenyl] ether, 5-trifluoromethylthiopentyl- [2-fluoro-4-methyl-5- (2,2,2-trifluoroethylthio) (Phenyl) phenyl] ether, 6-trifluoromethylthiohexyl- [2-fluoro-4-methyl-5- (2,2,2-trifluoroethyl Methylthio) phenyl] ether, 5-trifluoromethylthiopentyl- [2-chloro-4-methyl-5- (2,2,2-trifluoroethylthio) phenyl] ether 6-trifluoromethylthiohexyl- [2-chloro-4-methyl-5- (2,2,2-trifluoroethylthio) phenyl] ether, 5-trifluoromethylthio Amyl- [2,4-dimethyl-5- (2,2,2-trifluoroethylthio) phenyl] ether, 6-trifluoromethylthiohexyl- [2,4-dimethyl Butyl-5- (2,2,2-trifluoroethylthio) phenyl] ether and the like are not limited thereto.

(步驟(iii-b)) (Step (iii-b))

其次,說明步驟(iii-b)。 Next, step (iii-b) will be described.

步驟(iii-b)係使通式(3)所表示的化合物轉換為通式(5)所表示的化合物的步驟, Step (iii-b) is a step of converting a compound represented by the general formula (3) into a compound represented by the general formula (5),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基), (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group),

(式中,R1、R2及R3係如上述所定義)。 (Wherein R 1 , R 2 and R 3 are as defined above).

本文中,步驟(iii-b)係藉由將通式(3)之化合 物還原而製造通式(5)之化合物的步驟。換言之,步驟(iii-b)係藉由使通式(3)之化合物與還原劑反應,而製造通式(5)之化合物的步驟。 Herein, step (iii-b) is performed by combining the general formula (3) A step of reducing a substance to produce a compound of the general formula (5). In other words, step (iii-b) is a step of producing a compound of general formula (5) by reacting a compound of general formula (3) with a reducing agent.

(步驟(iii-b)之還原劑) (Reducing agent of step (iii-b))

步驟(iii-b)所使用的還原劑係只要可進行反應即可,可為任一種之還原劑。就步驟(iii-b)可使用的還原劑而言,可列舉例如,金屬(例如,鋅、鐵、錫等);氫化硼化合物(例如,氫化硼鈉、氫化硼鉀、氰氫化硼鈉、硼烷‧四氫呋喃錯合物等);氫化鋁化合物(例如,氫化鋰鋁、氫化二異丁基鋁等);三苯基膦-含水醇;3級亞磷酸酯(例如,亞磷酸三苯酯、亞磷酸三甲酯、亞磷酸三乙酯等);肼水合物等,但未限定於此等。由產率、反應性、入手性、價格及處理容易度等之觀點,就步驟(iii-b)之還原劑之較佳例而言,可列舉金屬及氫化硼化合物,更佳為金屬。就步驟(iii-b)之還原劑之較佳具體例而言,可列舉鋅、鐵、錫、氫化硼鈉,更佳為鋅、鐵、錫。 The reducing agent used in step (iii-b) may be any reducing agent as long as it can react. Examples of the reducing agent that can be used in step (iii-b) include, for example, metals (for example, zinc, iron, tin, etc.); boron hydride compounds (for example, sodium borohydride, potassium borohydride, sodium borohydride, Borane‧tetrahydrofuran complex, etc.); aluminum hydride compounds (e.g., lithium aluminum hydride, diisobutyl aluminum hydride, etc.); triphenylphosphine-hydroalcohol; tertiary phosphites (e.g., triphenyl phosphite) , Trimethyl phosphite, triethyl phosphite, etc.); hydrazine hydrate and the like, but are not limited thereto. From the viewpoints of yield, reactivity, availability, price, ease of handling, etc., preferred examples of the reducing agent in step (iii-b) include metals and boron hydride compounds, and more preferably metals. Specific examples of the reducing agent in step (iii-b) include zinc, iron, tin, and sodium borohydride, and more preferably zinc, iron, and tin.

步驟(iii-b)之還原劑可單獨使用或以任意比率之2種以上之組合來使用。步驟(iii-b)之還原劑之形態係只要反應有進行即可,可為任一種之形態。步驟(iii-b)之還原劑之形態係可由本項技術領域中具通常知識者適當地選擇。步驟(iii-b)之還原劑之使用量係只要反應有進行即可,可為任一種之量。可例示相對於1莫耳的通式(3)之化合物而言,為0.25~10莫耳,較佳為0.25~2莫耳,較佳為0.5~1.5莫耳之範圍,但步驟(iii-b)之還原劑之使用量,可由本項技術領域中具通常知識者適當地調整。 The reducing agents in step (iii-b) can be used alone or in a combination of two or more at any ratio. The form of the reducing agent in step (iii-b) may be any form as long as the reaction proceeds. The form of the reducing agent in step (iii-b) can be appropriately selected by those having ordinary knowledge in the technical field. The amount of the reducing agent used in step (iii-b) may be any amount as long as the reaction proceeds. For example, it is 0.25 to 10 mol, preferably 0.25 to 2 mol, and preferably 0.5 to 1.5 mol relative to 1 mol of the compound of the general formula (3), but step (iii- The amount of the reducing agent used in b) can be appropriately adjusted by those having ordinary knowledge in the technical field.

使用金屬(例如,鋅、鐵、錫等)作為步驟(iii-b)之還原劑時,金屬之形態係只要反應有進行即可,可為任一種之形態。然而,由反應性、入手性及處理容易度等之觀點,粉狀之金屬為較佳。因此,就作為步驟(iii-b)之還原劑之金屬的較佳具體例而言,可列舉鋅粉末、鐵粉、錫粉末等。使用金屬(例如,鋅、鐵、錫等)作為步驟(iii-b)之還原劑時,金屬之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(3)之化合物而言,為1.0~10莫耳,較佳為1.0~3.0莫耳,更佳為1.0~2.0莫耳之範圍。 When a metal (for example, zinc, iron, tin, etc.) is used as the reducing agent in step (iii-b), the form of the metal may be any form as long as the reaction proceeds. However, from the viewpoints of reactivity, availability, and ease of handling, powdered metals are preferred. Therefore, as a preferable specific example of the metal as the reducing agent in step (iii-b), zinc powder, iron powder, tin powder, and the like can be mentioned. When a metal (for example, zinc, iron, tin, etc.) is used as the reducing agent in step (iii-b), the amount of metal used may be any amount as long as the reaction proceeds. From the viewpoints of yield, by-product suppression, economic efficiency, etc., it may be exemplified by 1.0 to 10 mol, more preferably 1.0 to 3.0 mol, and more preferably 1 to 3.0 mol relative to 1 mol of the compound of the general formula (3). It is preferably in the range of 1.0 to 2.0 mol.

使用金屬(例如,鋅、鐵、錫等)作為步驟(iii-b)之還原劑時,較佳為於酸存在下進行反應。就酸而言,可列舉例如,鹽酸、硫酸、醋酸等,但未限定於此等。由產率、反應性、入手性、價格及處理容易度等之觀點,就較佳酸之例而言,可列舉鹽酸及硫酸,更佳為鹽酸。酸之形態係只要反應有進行即可,可為任一種之形態。就酸之形態而言,可列舉例如,僅酸之液體或固體、或水溶液或水以外之後述步驟(iii-b)之溶劑的溶液等。由入手性、價格及處理之容易度等之觀點,就酸之形態之較佳例而言,可列舉僅酸之液體(例如,濃硫酸等)或5~50%的水溶液(例如,濃鹽酸(即35%鹽酸)等),但酸之形態係可由本項技術領域中具通常知識者適當地選擇。酸之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相 對於1莫耳的通式(3)之化合物而言,為1~100莫耳,較佳為1~30莫耳之範圍,但酸之使用量係可由本項技術領域中具通常知識者適當地調整。 When a metal (for example, zinc, iron, tin, etc.) is used as the reducing agent in step (iii-b), the reaction is preferably performed in the presence of an acid. Examples of the acid include, but are not limited to, hydrochloric acid, sulfuric acid, and acetic acid. From the viewpoints of yield, reactivity, availability, price, and ease of handling, examples of preferred acids include hydrochloric acid and sulfuric acid, and more preferred is hydrochloric acid. The form of the acid may be any form as long as the reaction proceeds. Examples of the form of the acid include, for example, only a liquid or solid of the acid, or a solution of a solvent other than the step (iii-b) described later, other than an aqueous solution or water. From the viewpoints of availability, price, ease of handling, etc., as a preferred example of the form of the acid, an acid-only liquid (for example, concentrated sulfuric acid, etc.) or a 5 to 50% aqueous solution (for example, concentrated hydrochloric acid) (Ie, 35% hydrochloric acid), etc.), but the form of the acid can be appropriately selected by those having ordinary knowledge in the technical field. The amount of the acid used may be any amount as long as the reaction proceeds. Examples from the viewpoints of productivity, by-product suppression, and economic efficiency For the compound of the formula (3) of 1 mole, it is in the range of 1 to 100 moles, preferably 1 to 30 moles, but the amount of acid used can be appropriately determined by those having ordinary knowledge in the technical field. To adjust.

使用金屬(例如,鋅、鐵、錫等)作為步驟(iii-b)之還原劑時,使用水及/或醇為較佳。就醇而言,可列舉例如,甲醇、乙醇、2-丙醇等,但未限定於此等。水及/或醇可單獨使用或以任意比率之2種以上之組合來使用。水及/或醇之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(3)之化合物而言,為1~50莫耳之範圍,但水及/或醇之使用量係可由本項技術領域中具通常知識者適當地調整。此外,兼作後述溶劑而使用水及/或醇時,與本文例示之範圍無關係,可使用大過量之水及/或醇。 When a metal (for example, zinc, iron, tin, etc.) is used as the reducing agent in step (iii-b), water and / or alcohol is preferably used. Examples of the alcohol include, but are not limited to, methanol, ethanol, and 2-propanol. Water and / or alcohol can be used individually or in combination of 2 or more types by arbitrary ratios. The amount of water and / or alcohol used may be any amount as long as the reaction proceeds. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., the range of 1 to 50 mol is exemplified with respect to 1 mol of the compound of the general formula (3), but the use of water and / or alcohol The amount system can be appropriately adjusted by those having ordinary knowledge in the technical field. In addition, when water and / or alcohol is used as a solvent to be described later, there is no relation with the range exemplified herein, and a large excess of water and / or alcohol can be used.

使用氫化硼鈉等作為步驟(iii-b)之還原劑時,使用醇等為較佳。就醇而言,可列舉例如,甲醇、乙醇、2-丙醇等,但未限定於此等。醇可單獨使用或以任意比率之2種以上之組合來使用。醇之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(3)之化合物而言,為1~10莫耳之範圍,但醇之使用量係可由本項技術領域中具通常知識者適當地調整。此外,兼作後述溶劑而使用醇時,與本文例示之範圍無關係,可使用大過量之醇。 When sodium borohydride or the like is used as the reducing agent in step (iii-b), an alcohol or the like is preferably used. Examples of the alcohol include, but are not limited to, methanol, ethanol, and 2-propanol. The alcohol may be used alone or in a combination of two or more at any ratio. The amount of the alcohol used may be any amount as long as the reaction proceeds. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., it can be exemplified by the range of 1 to 10 moles relative to 1 mole of the compound of the general formula (3). Those with ordinary knowledge in the technical field adjust appropriately. In addition, when an alcohol is used as a solvent to be described later, it does not matter the range exemplified herein, and a large excess of alcohol can be used.

(步驟(iii-b)之溶劑) (Solvent of step (iii-b))

由反應之平順進行等之觀點,步驟(iii-b)之反應係於溶劑存在下實施為較佳。步驟(iii-b)之溶劑係只要步驟(iii-b)之反應有進行即可,可為任一種之溶劑。就步驟(iii-b)之溶劑而言,可列舉例如,水、醇類(例如,甲醇、乙醇、2-丙醇、丁醇等)、醚類(例如,四氫呋喃(THF)、1,4-二烷、二異丙基醚、二丁基醚、二-第三丁基醚、環戊基甲基醚(CPME)、甲基-第三丁基醚、1,2-二甲氧基乙烷(DME)、二甘醇二甲醚(diglyme)、三甘醇二甲醚(triglyme)等)、腈類(例如,乙腈等)、醯胺類(例如,N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、N-甲基吡咯啶酮(NMP)等)、烷基尿素類(例如,N,N’-二甲基咪唑啶酮(DMI)等)、亞碸類(例如,二甲基亞碸(DMSO)等)、碸類(例如,環丁碸等)、酮類(例如,丙酮、異丁基甲基酮(MIBK)、環己酮等)、羧酸酯類(例如,醋酸乙酯、醋酸丁酯等)、羧酸類(例如,醋酸等)、碳酸酯類(例如,碳酸伸乙酯、碳酸伸丙酯等)、芳香族烴類(例如,苯、甲苯、二甲苯等)、鹵素化芳香族烴類(例如,氯苯、二氯苯、三氯苯等)、鹵素化脂肪族烴類(例如,二氯甲烷等)、及任意比率之彼等之任意組合,但未限定於此等。 From the viewpoint of smooth progress of the reaction, etc., it is preferable that the reaction in step (iii-b) is carried out in the presence of a solvent. The solvent of step (iii-b) may be any solvent as long as the reaction of step (iii-b) proceeds. Examples of the solvent in step (iii-b) include water, alcohols (for example, methanol, ethanol, 2-propanol, butanol, etc.), and ethers (for example, tetrahydrofuran (THF), 1,4 -two Alkane, diisopropyl ether, dibutyl ether, di-third butyl ether, cyclopentyl methyl ether (CPME), methyl-third butyl ether, 1,2-dimethoxyethane (DME), diglyme, triglyme, etc.), nitriles (e.g., acetonitrile, etc.), amidines (e.g., N, N-dimethylformamidine) Amine (DMF), N, N-dimethylacetamide (DMAC), N-methylpyrrolidone (NMP), etc.), alkyl ureas (for example, N, N'-dimethylimidazolidone (DMI), etc.), fluorenes (e.g., dimethyl sulfene (DMSO), etc.), fluorenes (e.g., cyclobutane, etc.), ketones (e.g., acetone, isobutyl methyl ketone (MIBK), cyclic Hexanone, etc.), carboxylic acid esters (e.g., ethyl acetate, butyl acetate, etc.), carboxylic acids (e.g., acetic acid, etc.), carbonates (e.g., ethyl carbonate, propyl carbonate, etc.), aromatic Hydrocarbons (e.g., benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (e.g., chlorobenzene, dichlorobenzene, trichlorobenzene, etc.), halogenated aliphatic hydrocarbons (e.g., methylene chloride, etc.) ), And any combination of them at any ratio, but is not limited to these.

由反應性及經濟效率等之觀點,就步驟(iii-b) 之溶劑之較佳例而言,可列舉水、醇類、醚類、腈類、醯胺類、羧酸酯類、羧酸類、芳香族烴類、鹵素化芳香族烴類、鹵素化脂肪族烴類、及任意比率之彼等之任意組合。就步驟(iii-b)之溶劑之較佳具體例而言,可列舉水、甲醇、乙醇、2-丙醇、四氫呋喃、乙腈、N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、醋酸乙酯、醋酸丁酯、醋酸、甲苯、二甲苯、氯苯、二氯苯、二氯甲烷、及任意比率之彼等之任意組合。 From the viewpoints of reactivity and economic efficiency, etc., regarding step (iii-b) Preferred examples of the solvent include water, alcohols, ethers, nitriles, amidines, carboxylic acid esters, carboxylic acids, aromatic hydrocarbons, halogenated aromatic hydrocarbons, and halogenated aliphatics. Any combination of hydrocarbons and any ratio thereof. As specific examples of the solvent in step (iii-b), water, methanol, ethanol, 2-propanol, tetrahydrofuran, acetonitrile, N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAC), ethyl acetate, butyl acetate, acetic acid, toluene, xylene, chlorobenzene, dichlorobenzene, dichloromethane, and any combination thereof in any ratio.

步驟(iii-b)之溶劑之使用量係反應系統之攪拌有充分進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(3)之化合物而言,為0.01~10.0L(公升),較佳為0.1~5.0L之範圍。使用2種以上之溶劑之組合時,2種以上之溶劑之比率係只要反應有進行即可,可為任一種之比率。 The amount of the solvent used in step (iii-b) may be sufficient for the stirring of the reaction system, and may be any amount. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., it may be exemplified by 0.01 to 10.0 L (liters), preferably 0.1 to 5.0 L relative to 1 mol of the compound of the general formula (3). range. When a combination of two or more solvents is used, the ratio of the two or more solvents may be any ratio as long as the reaction proceeds.

(步驟(iii-b)之反應溫度) (Reaction temperature of step (iii-b))

步驟(iii-b)之反應溫度並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示-10℃(負10℃)~160℃,較佳為10℃~120℃之範圍。 The reaction temperature of step (iii-b) is not particularly limited. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., a range of -10 ° C (negative 10 ° C) to 160 ° C, and preferably 10 ° C to 120 ° C is exemplified.

(步驟(iii-b)之反應時間) (Reaction time of step (iii-b))

步驟(iii-b)之反應時間並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示0.5小時~48小時,較佳為0.5小時~24小時,更佳為1小時~12小時之範圍。 The reaction time of step (iii-b) is not particularly limited. From the viewpoints of productivity, by-product suppression, and economic efficiency, for example, 0.5 hours to 48 hours, preferably 0.5 hours to 24 hours, and more preferably 1 hour to 12 hours.

關於步驟(iii-b),因應需要,可參照以下之文獻。 Regarding step (iii-b), if necessary, refer to the following documents.

(社)日本化學會編、「新實驗化學講座14有機化合 物之合成與反應III」、第1699~1700頁(1978年)、發行者飯泉新吾、丸善股份有限公司 (Company) The Japanese Chemical Society, "New Experimental Chemistry Lecture 14 Organic Chemicals Synthesis and Reactions of Matter III ", pages 1699 ~ 1700 (1978), issued by Shingo Iizumi, Maruzen Co., Ltd.

(社)日本化學會編、「實驗化學講座24有機合成VI」第4版、第325頁(1992年)、發行者村田誠四郎、丸善股份有限公司 (Compiled by) The Japan Chemical Society, "Experimental Chemistry Lecture 24 Organic Synthesis VI", 4th edition, page 325 (1992), issued by Masaru Murata, Maruzen Corporation

(步驟(iii-b)之生成物;通式(5)之化合物) (Product of step (iii-b); compound of general formula (5))

作為步驟(iii-b)所獲得的通式(5)之化合物,具體而言,可列舉例如,2,4-二氟-5-(5-三氟甲基硫基戊基氧基)苯硫酚、2,4-二氟-5-(6-三氟甲基硫基己基氧基)苯硫酚、2,4-二氯-5-(5-三氟甲基硫基戊基氧基)苯硫酚、2,4-二氯-5-(6-三氟甲基硫基己基氧基)苯硫酚、2-氯-4-氟-5-(5-三氟甲基硫基戊基氧基)苯硫酚、2-氯-4-氟-5-(6-三氟甲基硫基己基氧基)苯硫酚、4-氟-2-甲基-5-(5-三氟甲基硫基戊基氧基)苯硫酚、4-氟-2-甲基-5-(6-三氟甲基硫基己基氧基)苯硫酚、4-氯-2-甲基-5-(5-三氟甲基硫基戊基氧基)苯硫酚、4-氯-2-甲基-5-(6-三氟甲基硫基己基氧基)苯硫酚、2,4-二甲基-5-(5-三氟甲基硫基戊基氧基)苯硫酚、2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯硫酚等,但未限定於此等。 Specific examples of the compound of the general formula (5) obtained in step (iii-b) include 2,4-difluoro-5- (5-trifluoromethylthiopentyloxy) benzene. Thiol, 2,4-difluoro-5- (6-trifluoromethylthiohexyloxy) benzenethiol, 2,4-dichloro-5- (5-trifluoromethylthiopentyloxy) ) Thiophenol, 2,4-dichloro-5- (6-trifluoromethylthiohexyloxy) thiophenol, 2-chloro-4-fluoro-5- (5-trifluoromethylsulfide Pentyloxy) thiophenol, 2-chloro-4-fluoro-5- (6-trifluoromethylthiohexyloxy) thiophenol, 4-fluoro-2-methyl-5- (5 -Trifluoromethylthiopentyloxy) thiophenol, 4-fluoro-2-methyl-5- (6-trifluoromethylthiohexyloxy) thiophenol, 4-chloro-2- Methyl-5- (5-trifluoromethylthiopentyloxy) thiophenol, 4-chloro-2-methyl-5- (6-trifluoromethylthiohexyloxy) thiophenol , 2,4-dimethyl-5- (5-trifluoromethylthiopentyloxy) thiophenol, 2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) Phenylthiophenol and the like, but are not limited thereto.

為步驟(iii-b)之生成物的通式(5)之化合物,可使用作為步驟(iii-c)之原料。步驟(iii-b)所獲得的通式(5)之化合物係可單離而用於下一步驟,亦可進一步純化而用於下一步驟,或可不單離而用於下一步驟。 The compound of general formula (5), which is the product of step (iii-b), can be used as a raw material of step (iii-c). The compound of the general formula (5) obtained in step (iii-b) may be isolated and used in the next step, may be further purified and used in the next step, or may be used in the next step without being isolated.

(步驟(iii-c)) (Step (iii-c))

其次,說明步驟(iii-c)。 Next, step (iii-c) will be described.

步驟(iii-c)係藉由使通式(5)所表示的化合物,於鹼之存在下,與通式(b)所表示的化合物反應,而將前述通式(5)之化合物轉換為通式(4)所表示的化合物的步驟, Step (iii-c) is to convert a compound represented by the general formula (5) into a compound represented by the general formula (5) by reacting the compound represented by the general formula (5) with a compound represented by the general formula (b) in the presence of a base. A step of a compound represented by the general formula (4),

(式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基),R4-Y (b) (Wherein R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group), R 4 -Y (b)

(式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基), (Wherein R 4 is a C1 to C4 haloalkyl group; Y is a halogen atom, C1 to C4 alkylsulfonyloxy group, C1 to C4 haloalkylsulfonyloxy group, or C1 to C4 alkyl group or halogen Atom substituted phenylsulfonyloxy),

(式中,R1、R2、R3及R4係如上述所定義)。 (Wherein R 1 , R 2 , R 3 and R 4 are as defined above).

(步驟(iii-c)之通式(b)之化合物) (Compound of general formula (b) in step (iii-c))

步驟(iii-c)之通式(b)之化合物係公知的化合物,或 由公知的化合物依據公知的方法而可加以製造的化合物。就步驟(iii-c)之通式(b)之化合物而言,具體而言,如於步驟(iii-a)之上述者。 The compound of formula (b) in step (iii-c) is a well-known compound, or A compound that can be produced from a known compound by a known method. As for the compound of the general formula (b) in step (iii-c), specifically, as described in step (iii-a).

步驟(iii-c)之通式(b)之化合物之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(5)之化合物而言,為1.0~1.5莫耳,較佳為1.0~1.2莫耳之範圍。 The amount of the compound of the general formula (b) in step (iii-c) may be any amount as long as the reaction proceeds. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., it is exemplified that it is in the range of 1.0 to 1.5 mol, preferably 1.0 to 1.2 mol relative to 1 mol of the compound of general formula (5) .

(步驟(iii-c)之鹼) (Base of step (iii-c))

步驟(iii-c)所使用的鹼係只要反應有進行即可,可為任一種之鹼。就可於步驟(iii-c)使用的鹼而言,可列舉例如:鹼金屬氫氧化物(例如,氫氧化鋰、氫氧化鈉、氫氧化鉀等)、鹼土類金屬氫氧化物(例如,氫氧化鎂、氫氧化鈣、氫氧化鋇等)、鹼金屬碳酸鹽(例如,碳酸鋰、碳酸鈉、碳酸鉀等)、鹼土類金屬碳酸鹽(例如,碳酸鎂、碳酸鈣、碳酸鋇等)、鹼金屬碳酸氫鹽(例如,碳酸氫鋰、碳酸氫鈉、碳酸氫鉀等)、鹼土類金屬碳酸氫鹽(例如,碳酸氫鎂、碳酸氫鈣等)、磷酸鹽(例如,磷酸鈉、磷酸鉀、磷酸鈣等)、磷酸氫鹽(例如,磷酸氫鈉、磷酸氫鉀、磷酸氫鈣等)、金屬氫化物(例如,氫化鈉、氫化鈣等)、 金屬烷氧化物(例如,甲醇鈉、乙醇鈉、第三丁醇鉀等)、胺類(例如,三乙基胺、三丁基胺、二異丙基乙基胺、1,8-二吖雙環〔5.4.0〕-7-十一-7-烯(DBU)、1,4-二吖雙環〔2.2.2〕辛烷(DABCO)、N,N-二甲基苯胺、N,N-二乙基苯胺、吡啶、4-(二甲基胺基)-吡啶、2,6-二甲吡啶等)及後述的自由基起始劑中亦適合作為鹼的自由基起始劑(例如,亞硫酸氫鈉、亞硫酸氫鉀、吊白塊(商品名)(甲醛次硫酸氫鈉2水合物)等)等。 The base used in step (iii-c) may be any base as long as the reaction proceeds. Examples of the base usable in step (iii-c) include alkali metal hydroxides (for example, lithium hydroxide, sodium hydroxide, potassium hydroxide, etc.) and alkaline earth metal hydroxides (for example, Magnesium hydroxide, calcium hydroxide, barium hydroxide, etc.), alkali metal carbonates (for example, lithium carbonate, sodium carbonate, potassium carbonate, etc.), alkaline earth metal carbonates (for example, magnesium carbonate, calcium carbonate, barium carbonate, etc.) , Alkali metal bicarbonate (for example, lithium bicarbonate, sodium bicarbonate, potassium bicarbonate, etc.), alkaline earth metal bicarbonate (for example, magnesium bicarbonate, calcium bicarbonate, etc.), phosphate (for example, sodium phosphate, Potassium phosphate, calcium phosphate, etc.), hydrogen phosphate salts (e.g., sodium hydrogen phosphate, potassium hydrogen phosphate, calcium hydrogen phosphate, etc.), metal hydrides (e.g., sodium hydride, calcium hydride, etc.), Metal alkoxides (e.g., sodium methoxide, sodium ethoxide, potassium tert-butoxide, etc.), amines (e.g., triethylamine, tributylamine, diisopropylethylamine, 1,8-diazine Bicyclic [5.4.0] -7-undec-7-ene (DBU), 1,4-diazine bicyclic [2.2.2] octane (DABCO), N, N-dimethylaniline, N, N- Diethylaniline, pyridine, 4- (dimethylamino) -pyridine, 2,6-dimethylpyridine, etc.) and radical initiators described below are also suitable as base radical initiators (for example, Sodium bisulfite, potassium bisulfite, hanging white block (trade name) (sodium formaldehyde sulfoxylate dihydrate), etc.).

由反應性、產率及經濟效率等之觀點,就步驟(iii-c)之鹼之較佳例而言,可列舉鹼金屬氫氧化物、鹼金屬碳酸鹽、鹼金屬碳酸氫鹽。就步驟(iii-c)之鹼之較佳具體例而言,可列舉氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸鉀、碳酸氫鈉及碳酸氫鉀。 From the viewpoints of reactivity, yield, economic efficiency, etc., preferred examples of the base in step (iii-c) include alkali metal hydroxides, alkali metal carbonates, and alkali metal bicarbonates. Specific preferred examples of the base in step (iii-c) include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, and potassium bicarbonate.

步驟(iii-c)之鹼可單獨使用或以任意比率之2種以上之組合來使用。步驟(iii-c)之鹼之形態係只要反應有進行即可,可為任一種之形態。步驟(iii-c)之鹼之形態係可由本項技術領域中具通常知識者適當地選擇。 The base of step (iii-c) can be used alone or in a combination of two or more at any ratio. The form of the base in step (iii-c) may be any form as long as the reaction proceeds. The form of the base in step (iii-c) can be appropriately selected by those having ordinary knowledge in the technical field.

步驟(iii-c)之鹼之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(5)之化合物而言,為0.5~1.5莫耳,較佳為0.5~1.2莫耳之範圍。 The amount of the base used in step (iii-c) is any amount as long as the reaction proceeds. From the viewpoints of yield, by-product suppression, and economic efficiency, for example, it is 0.5 to 1.5 mol, preferably 0.5 to 1.2 mol relative to 1 mol of the compound of the general formula (5). .

(步驟(iii-c)之自由基起始劑) (Free radical initiator of step (iii-c))

步驟(iii-c)之反應係於自由基起始劑之存在下或非 存在下,較佳為於自由基起始劑之存在下進行。然而,是否於步驟(iii-c)使用自由基起始劑,可由本項技術領域中具通常知識者適當地決定。於步驟(iii-c)使用的自由基起始劑係只要反應有進行即可,可為任一種之自由基起始劑。就步驟(iii-c)可使用的自由基起始劑而言可列舉,例如,亞硫酸、亞硫酸氫鈉、亞硫酸氫鉀、亞硫酸鈉、亞硫酸鉀、吊白塊(商品名)(甲醛次硫酸氫鈉2水合物)等,但未限定於此等。本文中,該自由基起始劑可理解為還原劑。甲醛次硫酸氫鈉2水合物係具有與羥基甲基亞磺酸鈉2水合物相同的意義。由產率、反應性、入手性、價格及處理之容易度等之觀點,就步驟(iii-c)所使用的自由基起始劑之較佳例而言,可列舉吊白塊。 The reaction of step (iii-c) is in the presence or absence of a free radical initiator It is preferably carried out in the presence of a radical initiator. However, whether to use a radical initiator in step (iii-c) can be appropriately determined by a person having ordinary skill in the art. The radical initiator used in step (iii-c) may be any radical initiator as long as the reaction proceeds. Examples of the free radical initiator that can be used in step (iii-c) include, for example, sulfurous acid, sodium hydrogen sulfite, potassium hydrogen sulfite, sodium sulfite, potassium sulfite, hanging white block (trade name) (formaldehyde) Sodium bisulfite dihydrate) and the like are not limited thereto. Herein, the radical initiator is understood as a reducing agent. Sodium formaldehyde sulfoxylate dihydrate has the same meaning as sodium hydroxymethylsulfinate dihydrate. From the viewpoints of yield, reactivity, availability, price, ease of handling, etc., as a preferred example of the radical initiator used in step (iii-c), a white block can be cited.

步驟(iii-c)之自由基起始劑可單獨使用或以任意比率之2種以上之組合來使用。步驟(iii-c)之自由基起始劑之形態係只要反應有進行即可,可為任一種之形態。步驟(iii-c)之自由基起始劑之形態係可由本項技術領域中具通常知識者適當地選擇。步驟(iii-c)之自由基起始劑之使用量係只要反應有進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(5)之化合物而言,為0(零)~2.0莫耳,較佳為0.01~2.0莫耳,更佳為0.1~1.5莫耳之範圍,但步驟(iii-c)之自由基起始劑之使用量係可由本項技術領域中具通常知識者適當地調整。步驟(iii-c)之如上述適當自由基起始劑係亦可兼作上述之步驟(iii-c)之鹼而使用。步驟(iii-c)之自由基起始劑與上述之步驟(iii-c)之鹼係可 併用。 The radical initiators in step (iii-c) can be used alone or in a combination of two or more at any ratio. The form of the radical initiator in step (iii-c) may be any form as long as the reaction proceeds. The form of the radical initiator in step (iii-c) can be appropriately selected by those having ordinary knowledge in the art. The amount of the radical initiator used in step (iii-c) is any amount as long as the reaction proceeds. From the viewpoints of yield, by-product suppression, economic efficiency, etc., it may be exemplified by 0 (zero) to 2.0 mol, preferably 0.01 to 2.0 mol, relative to 1 mol of the compound of the general formula (5). Ears, more preferably in the range of 0.1 to 1.5 moles, but the amount of the radical initiator used in step (iii-c) can be appropriately adjusted by those having ordinary knowledge in the technical field. The appropriate radical initiator as described in step (iii-c) can also be used as the base of step (iii-c). The radical initiator of step (iii-c) and the base of step (iii-c) described above may be And use.

(步驟(iii-c)之溶劑) (Solvent of step (iii-c))

由反應之平滑進行等之觀點,步驟(iii-c)之反應係於溶劑之存在下實施為較佳。步驟(iii-c)之溶劑係只要步驟(iii-c)之反應有進行即可,可為任一種之溶劑。就步驟(iii-c)之溶劑而言,可例舉例如:醯胺類(例如,N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、N-甲基吡咯啶酮(NMP)等)、烷基尿素類(例如,N,N’-二甲基咪唑啶酮(DMI)等)、亞碸類(例如,二甲基亞碸(DMSO)等)、碸類(例如,環丁碸等)、醚類(例如,四氫呋喃(THF)、1,4-二烷、二異丙基醚、二丁基醚、二-第三丁基醚、環戊基甲基醚(CPME)、甲基-第三丁基醚、1,2-二甲氧基乙烷(DME)、二甘醇二甲醚(diglyme)、三甘醇二甲醚(triglyme)等)、酮類(例如,丙酮、異丁基甲基酮(MIBK)、環己酮等)、羧酸酯類(例如,醋酸乙酯、醋酸丁酯等)、腈類(例如,乙腈等)、醇類(例如,甲醇、乙醇、2-丙醇、丁醇等)、芳香族烴衍生物類(例如,苯、甲苯、二甲苯、氯苯、二氯苯、三氯苯、硝基苯等)、鹵素化脂肪族烴類(例如,二氯甲烷等)、水、及任意比率之彼等之任意組合,但未限定於此等。 From the viewpoint of smooth progress of the reaction, etc., it is preferable that the reaction in step (iii-c) is carried out in the presence of a solvent. The solvent in step (iii-c) is any solvent as long as the reaction in step (iii-c) proceeds. As the solvent of step (iii-c), for example, amidoamines (for example, N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAC) , N-methylpyrrolidone (NMP), etc.), alkyl ureas (e.g., N, N'-dimethylimidazolidone (DMI), etc.), fluorenes (e.g., dimethylsulfine ( DMSO), etc.), amidines (e.g., cyclobutane, etc.), ethers (e.g., tetrahydrofuran (THF), 1,4-bis Alkane, diisopropyl ether, dibutyl ether, di-third butyl ether, cyclopentyl methyl ether (CPME), methyl-third butyl ether, 1,2-dimethoxyethane (DME), diglyme, triglyme, etc.), ketones (e.g., acetone, isobutyl methyl ketone (MIBK), cyclohexanone, etc.), carboxylic acid esters (E.g., ethyl acetate, butyl acetate, etc.), nitriles (e.g., acetonitrile, etc.), alcohols (e.g., methanol, ethanol, 2-propanol, butanol, etc.), aromatic hydrocarbon derivatives (e.g., , Benzene, toluene, xylene, chlorobenzene, dichlorobenzene, trichlorobenzene, nitrobenzene, etc.), halogenated aliphatic hydrocarbons (e.g., methylene chloride, etc.), water, and any ratio of any of them Combinations are not limited to these.

由反應性及經濟效率等之觀點,就步驟(iii-c) 之溶劑之較佳例而言,可列舉醯胺類、亞碸類、醚類、酮類、腈類、醇類、芳香族烴衍生物類、水、及任意比率之彼等任意之組合。就步驟(iii-c)之溶劑之較佳具體例而言,可列舉N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAC)、N-甲基吡咯啶酮(NMP)、二甲基亞碸(DMSO)、四氫呋喃(THF)、丙酮、異丁基甲基酮(MIBK)、乙腈、甲醇、乙醇、2-丙醇、甲苯、二甲苯、氯苯、二氯苯、水、及任意比率之彼等任意之組合。 From the viewpoints of reactivity and economic efficiency, etc., regarding step (iii-c) Preferable examples of the solvent include amines, fluorenes, ethers, ketones, nitriles, alcohols, aromatic hydrocarbon derivatives, water, and any combination thereof at any ratio. As specific examples of the solvent of step (iii-c), N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAC), N-formaldehyde N-pyrrolidone (NMP), dimethylsulfine (DMSO), tetrahydrofuran (THF), acetone, isobutyl methyl ketone (MIBK), acetonitrile, methanol, ethanol, 2-propanol, toluene, xylene, chlorobenzene , Dichlorobenzene, water, and any combination thereof at any ratio.

步驟(iii-c)之溶劑之使用量係反應系統之攪拌有充分進行即可,可為任一種之量。由產率、副生成物抑制及經濟效率等之觀點,可例示相對於1莫耳的通式(5)之化合物而言,為0.01~10.0L(公升),較佳為0.1~5.0L之範圍。使用2種以上之溶劑之組合時,2種以上之溶劑之比率係只要反應有進行即可,可為任一種之比率。 The amount of the solvent used in step (iii-c) is sufficient that the stirring of the reaction system is sufficiently performed, and may be any amount. From the viewpoints of yield, by-product suppression, economic efficiency, etc., it may be exemplified by 0.01 to 10.0 L (liters), preferably 0.1 to 5.0 L relative to 1 mol of the compound of the general formula (5). range. When a combination of two or more solvents is used, the ratio of the two or more solvents may be any ratio as long as the reaction proceeds.

(步驟(iii-c)之反應溫度) (Reaction temperature of step (iii-c))

步驟(iii-c)之反應溫度並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示-10℃(負10℃)~160℃,較佳為10℃~120℃之範圍。 The reaction temperature of step (iii-c) is not particularly limited. From the viewpoints of yield, suppression of by-products, economic efficiency, etc., a range of -10 ° C (negative 10 ° C) to 160 ° C, and preferably 10 ° C to 120 ° C is exemplified.

(步驟(iii-c)之反應時間) (Reaction time of step (iii-c))

步驟(iii-c)之反應時間並未特別限制。由產率、副生成物抑制及經濟效率等之觀點,可例示0.5小時~48小時,較佳為1小時~24小時之範圍。 The reaction time of step (iii-c) is not particularly limited. From the viewpoints of yield, suppression of by-products, and economic efficiency, the range of 0.5 to 48 hours is preferable, and the range of 1 to 24 hours is preferable.

(步驟(iii-c)之生成物;通式(4)之化合物) (Product of step (iii-c); compound of general formula (4))

作為步驟(iii-c)所獲得的通式(4)之化合物,具體而言,可列舉例如,上述之步驟(iii-a)所獲得的通式(4)之 化合物之具體例,但並未限定於此等。 As the compound of the general formula (4) obtained in the step (iii-c), specifically, for example, the compound of the general formula (4) obtained in the above step (iii-a) can be cited. Specific examples of the compound are not limited thereto.

[實施例] [Example]

其次,列舉實施例而具體說明本發明,但本發明並未受此等實施例任何限定。 Next, the present invention will be specifically described by citing examples, but the present invention is not limited to these examples.

實施例1 Example 1

雙(2,4-二甲基-5-羥基苯基)二硫醚之製造 Production of bis (2,4-dimethyl-5-hydroxyphenyl) disulfide

於反應燒瓶中添加5-巰基-2,4-二甲基酚4.32g(28.0mmol)、碘化鈉42mg(0.28mmol)及醋酸乙酯80mL。將混合物於室溫下一邊攪拌一邊於其中緩緩滴加30%過氧化氫水1.59g(14mmol)。混合物於室溫下攪拌1小時。於反應混合物中添加飽和亞硫酸鈉水溶液5mL,並將混合物於室溫下攪拌10分鐘後,藉由於其中添加濃鹽酸,將水層之pH調整為pH1~2左右。將獲得的混合物分配成有機層及水層,將有機層分離。將有機層以無水硫酸鎂乾燥,過濾後,減壓下餾除溶劑。將獲得的殘渣藉由矽膠管柱層析純化,獲得3.03g之雙(2,4-二甲基-5-羥基苯基)二硫醚,產率71%。 In a reaction flask, 4.32 g (28.0 mmol) of 5-mercapto-2,4-dimethylphenol, 42 mg (0.28 mmol) of sodium iodide, and 80 mL of ethyl acetate were added. While the mixture was stirred at room temperature, 1.59 g (14 mmol) of 30% hydrogen peroxide water was slowly added dropwise thereto. The mixture was stirred at room temperature for 1 hour. 5 mL of a saturated aqueous sodium sulfite solution was added to the reaction mixture, and the mixture was stirred at room temperature for 10 minutes. The pH of the aqueous layer was adjusted to about 1 to 2 by adding concentrated hydrochloric acid thereto. The obtained mixture was partitioned into an organic layer and an aqueous layer, and the organic layer was separated. The organic layer was dried over anhydrous magnesium sulfate, and after filtration, the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 3.03 g of bis (2,4-dimethyl-5-hydroxyphenyl) disulfide in a yield of 71%.

1H-NMR(300MHz,CDCl3)δ(ppm):6.94(s,2H),6.90(s,2H),4.87(s,2H),2.30(s,6H),2.17(s,6H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 6.94 (s, 2H), 6.90 (s, 2H), 4.87 (s, 2H), 2.30 (s, 6H), 2.17 (s, 6H).

熔點:125-127℃ Melting point: 125-127 ° C

實施例2 Example 2

雙〔2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯基〕 二硫醚之製造 Bis [2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) phenyl] Manufacture of disulfide

於反應燒瓶中,添加雙(2,4-二甲基-5-羥基苯基)二硫醚2.60g(8.5mmol)、1-溴-6-三氟甲基硫基己烷4.73g(17.9mmol)、碳酸鉀2.58g(18.7mmol)、四丁基碘化銨0.63g(1.7mmol)及N,N-二甲基甲醯胺17mL。將混合物於氮氣環境下,於80℃攪拌20小時。於反應混合物中添加稀鹽酸、水及二乙基醚,並將混合物分配成有機層及水層,將有機層分離。將有機層以無水硫酸鎂乾燥,過濾後,減壓下餾除溶劑。將獲得的殘渣藉由矽膠管柱層析純化,獲得4.95g之雙〔2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚,產率86%。 In a reaction flask, 2.60 g (8.5 mmol) of bis (2,4-dimethyl-5-hydroxyphenyl) disulfide and 1.73 g of 1-bromo-6-trifluoromethylthiohexane (17.9) were added. mmol), potassium carbonate 2.58 g (18.7 mmol), tetrabutylammonium iodide 0.63 g (1.7 mmol), and 17 mL of N, N-dimethylformamide. The mixture was stirred under a nitrogen atmosphere at 80 ° C for 20 hours. Dilute hydrochloric acid, water, and diethyl ether were added to the reaction mixture, and the mixture was partitioned into an organic layer and an aqueous layer, and the organic layer was separated. The organic layer was dried over anhydrous magnesium sulfate, and after filtration, the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 4.95 g of bis [2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) phenyl] disulfide. The rate is 86%.

1H-NMR(300MHz,CDCl3)δ(ppm):6.92(s,2H),6.90(s,2H),3.78(t,4H),2.88(t,4H),2.30(s,6H),2.14(s,6H),1.72(m,8H),1.45(m,8H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 6.92 (s, 2H), 6.90 (s, 2H), 3.78 (t, 4H), 2.88 (t, 4H), 2.30 (s, 6H), 2.14 (s, 6H), 1.72 (m, 8H), 1.45 (m, 8H).

實施例3 Example 3

6-三氟甲基硫基己基-〔2,4-二甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚之製造 Production of 6-trifluoromethylthiohexyl- [2,4-dimethyl-5- (2,2,2-trifluoroethylthio) phenyl] ether

於反應燒瓶中添加雙〔2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚337.4mg(0.50mmol)、對甲苯磺酸2,2,2-三氟乙基266.9mg(1.05mmol)、碳酸鉀152.0mg(1.10mmol)、吊白塊(商品名)(甲醛次硫酸氫鈉2水合物)231.2mg(1.50mmol)及N,N-二甲基甲醯胺2mL。將混合物於氮氣環境下,50℃攪拌16小時。於反應混合物中添加稀鹽酸、水及二乙基醚,並將混合物分配成有機層及水層,將有機層分離。將有機層以無水硫酸鎂乾燥,過濾後,減壓下餾除溶劑。將獲得的殘渣藉由矽膠管柱層析純化,獲得242.0mg之6-三氟甲基硫基己基-〔2,4-二甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚,產率58%。 In a reaction flask, 337.4 mg (0.50 mmol) of bis [2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) phenyl] disulfide and p-toluenesulfonic acid 2,2 were added. 266.9 mg (1.05 mmol) of 2-trifluoroethyl, 152.0 mg (1.10 mmol) of potassium carbonate, white block (trade name) (sodium formaldehyde sulfoxylate dihydrate) 231.2 mg (1.50 mmol) and N, N -2 mL of dimethylformamide. The mixture was stirred under a nitrogen atmosphere at 50 ° C for 16 hours. Dilute hydrochloric acid, water, and diethyl ether were added to the reaction mixture, and the mixture was partitioned into an organic layer and an aqueous layer, and the organic layer was separated. The organic layer was dried over anhydrous magnesium sulfate, and after filtration, the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 242.0 mg of 6-trifluoromethylthiohexyl- [2,4-dimethyl-5- (2,2,2-trifluoroethylsulfide). (Yl) phenyl] ether, yield 58%.

1H-NMR(300MHz,CDCl3)δ(ppm):6.96(s,1H),6.70(s,1H),3.94(t,2H),3.30(q,2H),2.90(t,2H),2.38(s,3H),2.17(s,3H),1.71-1.82(m,4H),1.49-1.53(m,4H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 6.96 (s, 1H), 6.70 (s, 1H), 3.94 (t, 2H), 3.30 (q, 2H), 2.90 (t, 2H), 2.38 (s, 3H), 2.17 (s, 3H), 1.71-1.82 (m, 4H), 1.49-1.53 (m, 4H).

實施例4 Example 4

2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯硫酚之製造 Production of 2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) thiophenol

於反應燒瓶中添加雙〔2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯基〕二硫醚337.4mg(0.50mmol)、濃鹽酸1mL及甲醇2mL。將混合物於室溫下一邊攪拌一邊於其中添加鋅粉末32.7mg(0.50mmol)。將混合物於80℃攪拌2小時。於反應混合物中添加水及二乙基醚,將混合物分配成有機層及水層,將有機層分離。將有機層以無水硫酸鎂乾燥,過濾後,減壓下餾除溶劑。將獲得的殘渣藉由矽膠管柱層析純化,獲得176.0mg之2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯硫酚,產率52%。 In a reaction flask, 337.4 mg (0.50 mmol) of bis [2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) phenyl] disulfide, 1 mL of concentrated hydrochloric acid and 2 mL of methanol were added. While stirring the mixture at room temperature, 32.7 mg (0.50 mmol) of zinc powder was added thereto. The mixture was stirred at 80 ° C for 2 hours. Water and diethyl ether were added to the reaction mixture, the mixture was partitioned into an organic layer and an aqueous layer, and the organic layer was separated. The organic layer was dried over anhydrous magnesium sulfate, and after filtration, the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 176.0 mg of 2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) benzenethiol in a yield of 52%.

1H-NMR(300MHz,CDCl3)δ(ppm):6.92(s,1H),6.74(s,1H),3.90(t,2H),3.22(s,1H),2.89(t,2H),2.24(s,3H),2.13(s,3H),1.76(m,4H),1.49(m,4H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 6.92 (s, 1H), 6.74 (s, 1H), 3.90 (t, 2H), 3.22 (s, 1H), 2.89 (t, 2H), 2.24 (s, 3H), 2.13 (s, 3H), 1.76 (m, 4H), 1.49 (m, 4H).

實施例5 Example 5

6-三氟甲基硫基己基-〔2,4-二甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚之製造 Production of 6-trifluoromethylthiohexyl- [2,4-dimethyl-5- (2,2,2-trifluoroethylthio) phenyl] ether

於反應燒瓶中添加2,4-二甲基-5-(6-三氟甲基硫基己基氧基)苯硫酚176.0mg(0.52mmol)、對甲苯磺酸2,2,2-三氟乙基138.8mg(0.55mmol)、碳酸鉀79.1mg(0.57mmol)、吊白塊(商品名)(甲醛次硫酸氫鈉2水合物)40.1mg(0.26mmol)及N,N-二甲基甲醯胺2mL。將混合物於氮氣環境下,於50℃攪拌15小時。於反應混合物中添加稀鹽酸、水及二乙基醚,將混合物分配成有機層及水層,並將有機層分離。將有機層以無水硫酸鎂乾燥,過濾後,減壓下餾除溶劑。將獲得的殘渣藉由矽膠管柱層析純化,獲得188.0mg之6-三氟甲基硫基己基-〔2,4-二甲基-5-(2,2,2-三氟乙基硫基)苯基〕醚,產率86%。 176.0 mg (0.52 mmol) of 2,4-dimethyl-5- (6-trifluoromethylthiohexyloxy) thiophenol and 2,2,2-trifluoro p-toluenesulfonic acid were added to the reaction flask. 138.8 mg (0.55 mmol) of ethyl, 79.1 mg (0.57 mmol) of potassium carbonate, white block (trade name) (sodium formaldehyde sulfoxylate dihydrate) 40.1 mg (0.26 mmol), and N, N-dimethylformamide Amidine 2mL. The mixture was stirred under a nitrogen atmosphere at 50 ° C for 15 hours. Dilute hydrochloric acid, water, and diethyl ether were added to the reaction mixture, the mixture was partitioned into an organic layer and an aqueous layer, and the organic layer was separated. The organic layer was dried over anhydrous magnesium sulfate, and after filtration, the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 188.0 mg of 6-trifluoromethylthiohexyl- [2,4-dimethyl-5- (2,2,2-trifluoroethylsulfide). (Yl) phenyl] ether, 86% yield.

1H-NMR(300MHz,CDCl3)δ(ppm):6.96(s,1H),6.70(s,1H),3.94(t,2H),3.30(q,2H),2.90(t,2H),2.38(s,3H),2.17(s,3H),1.71-1.82(m,4H),1.49-1.53(m,4H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 6.96 (s, 1H), 6.70 (s, 1H), 3.94 (t, 2H), 3.30 (q, 2H), 2.90 (t, 2H), 2.38 (s, 3H), 2.17 (s, 3H), 1.71-1.82 (m, 4H), 1.49-1.53 (m, 4H).

實施例6 Example 6

雙(2-氯-4-氟-5-羥基苯基)二硫醚之製造 Manufacture of bis (2-chloro-4-fluoro-5-hydroxyphenyl) disulfide

於反應燒瓶中添加4-氯-2-氟-5-巰基酚44.7mg(0.25mmol)及水1mL。將混合物於室溫下一邊攪拌一邊於其中緩緩滴加35%過氧化氫水26.7mg(0.28mmol)。將混合物於室溫下攪拌1小時。將反應混合物過濾後,將濾物水洗、乾燥,獲得39.9mg之雙(2-氯-4-氟-5-羥基苯基)二硫醚,產率90%。 44.7 mg (0.25 mmol) of 4-chloro-2-fluoro-5-mercaptophenol and 1 mL of water were added to the reaction flask. While stirring the mixture at room temperature, 26.7 mg (0.28 mmol) of 35% hydrogen peroxide water was slowly added dropwise thereto. The mixture was stirred at room temperature for 1 hour. After the reaction mixture was filtered, the filtrate was washed with water and dried to obtain 39.9 mg of bis (2-chloro-4-fluoro-5-hydroxyphenyl) disulfide in a yield of 90%.

1H-NMR(300MHz,CDCl3)δ(ppm):7.22(d,J=8.7Hz,2H),7.16(d,J=9.6Hz,2H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 7.22 (d, J = 8.7 Hz, 2H), 7.16 (d, J = 9.6 Hz, 2H).

熔點:160℃ Melting point: 160 ° C

實施例7 Example 7

雙〔2-氯-4-氟-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚之製造 Production of bis [2-chloro-4-fluoro-5- (5-trifluoromethylthiopentyloxy) phenyl] disulfide

於反應燒瓶中添加雙(2-氯-4-氟-5-羥基苯基)二硫醚177.6mg(0.50mmol)、1-溴-5-三氟甲基硫基戊烷 263.7mg(1.05mmol)、碳酸鉀152.0mg(1.10mmol)、及N,N-二甲基甲醯胺1mL。將混合物於氮氣環境下,於50℃攪拌15小時。於反應混合物中添加稀鹽酸、水及二乙基醚,並將混合物分配成有機層及水層,並將有機層分離。將有機層以無水硫酸鎂乾燥,過濾後,減壓下餾除溶劑。將獲得的殘渣藉由矽膠管柱層析純化,獲得277.0mg之雙〔2-氯-4-氟-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚,產率80%。 177.6 mg (0.50 mmol) of bis (2-chloro-4-fluoro-5-hydroxyphenyl) disulfide and 1-bromo-5-trifluoromethylthiopentane were added to the reaction flask. 263.7 mg (1.05 mmol), potassium carbonate 152.0 mg (1.10 mmol), and 1 mL of N, N-dimethylformamide. The mixture was stirred under a nitrogen atmosphere at 50 ° C for 15 hours. Dilute hydrochloric acid, water, and diethyl ether were added to the reaction mixture, and the mixture was partitioned into an organic layer and an aqueous layer, and the organic layer was separated. The organic layer was dried over anhydrous magnesium sulfate, and after filtration, the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 277.0 mg of bis [2-chloro-4-fluoro-5- (5-trifluoromethylthiopentyloxy) phenyl] disulfide, Yield 80%.

1H-NMR(300MHz,CDCl3)δ(ppm):7.21(d,J=8.4Hz,2H),7.12(d,J=10.2Hz,2H),3.97(t,J=6.3Hz,4H),2.90(t,J=7.2Hz,4H),1.78(m,8H),1.56(m,4H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 7.21 (d, J = 8.4Hz, 2H), 7.12 (d, J = 10.2Hz, 2H), 3.97 (t, J = 6.3Hz, 4H) , 2.90 (t, J = 7.2 Hz, 4H), 1.78 (m, 8H), 1.56 (m, 4H).

實施例8 Example 8

5-三氟甲基硫基戊基-〔4-氯-2-氟-5-(2,2,2-三氟乙基硫基)苯基〕醚之製造 Production of 5-trifluoromethylthiopentyl- [4-chloro-2-fluoro-5- (2,2,2-trifluoroethylthio) phenyl] ether

於反應燒瓶中添加雙〔2-氯-4-氟-5-(5-三氟甲基硫基戊基氧基)苯基〕二硫醚277.0mg(0.40mmol)、對甲苯磺 酸2,2,2-三氟乙基213.5mg(0.84mmol)、碳酸鉀121.6mg(0.88mmol)、吊白塊(商品名)(甲醛次硫酸氫鈉2水合物)184.9mg(1.20mmol)、水72.0mg(4.0mmol)及N,N-二甲基甲醯胺1mL。將混合物於氮氣環境下,於50℃攪拌12小時。於反應混合物中添加稀鹽酸、水及二乙基醚,將混合物分配成有機層及水層,將有機層分離。將有機層以無水硫酸鎂乾燥,過濾後,減壓下餾除溶劑。將獲得的殘渣藉由矽膠管柱層析純化,獲得306.0mg之5-三氟甲基硫基戊基-〔4-氯-2-氟-5-(2,2,2-三氟乙基硫基)苯基〕醚,產率89%。 In a reaction flask, bis [2-chloro-4-fluoro-5- (5-trifluoromethylthiopentyloxy) phenyl] disulfide 277.0 mg (0.40 mmol) and p-toluenesulfonic acid were added. 213.5 mg (0.84 mmol) of 2,2,2-trifluoroethyl acid, 121.6 mg (0.88 mmol) of potassium carbonate, white block (brand name) (sodium formaldehyde sulfoxylate dihydrate) 184.9 mg (1.20 mmol) , 72.0 mg (4.0 mmol) of water and 1 mL of N, N-dimethylformamide. The mixture was stirred under a nitrogen atmosphere at 50 ° C for 12 hours. Dilute hydrochloric acid, water, and diethyl ether were added to the reaction mixture, and the mixture was partitioned into an organic layer and an aqueous layer, and the organic layer was separated. The organic layer was dried over anhydrous magnesium sulfate, and after filtration, the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 306.0 mg of 5-trifluoromethylthiopentyl- [4-chloro-2-fluoro-5- (2,2,2-trifluoroethyl) Thio) phenyl] ether, yield 89%.

1H-NMR(300MHz,CDCl3)δ(ppm):7.23(d,J=8.4Hz,1H),7.21(d,J=10.8Hz,1H),4.03(t,J=6.3Hz,2H),3.41(d,J=9.6Hz,2H),2.92(t,J=7.5Hz,2H),1.82(m,4H),1.61(m,2H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 7.23 (d, J = 8.4Hz, 1H), 7.21 (d, J = 10.8Hz, 1H), 4.03 (t, J = 6.3Hz, 2H) , 3.41 (d, J = 9.6Hz, 2H), 2.92 (t, J = 7.5Hz, 2H), 1.82 (m, 4H), 1.61 (m, 2H).

參考例1 Reference example 1

1-溴-6-三氟甲基硫基己烷之製造 Manufacture of 1-bromo-6-trifluoromethylthiohexane

(1)醋酸6-溴己酯之製造 (1) Manufacture of 6-bromohexyl acetate

於反應燒瓶中添加6-溴-1-己醇16.27g(89.9mmol)、醋酸酐9.63g(94.3mmol)及甲苯180mL。於反應混合物中,冰冷下一邊攪拌一邊添加無水碳酸鈉10.48g(98.9mmol)及N,N-二甲基-4-胺基吡啶0.55g(4.5mmol)。之後,將混合物於冰冷下攪拌3小時。於獲得的反應混合物中添加稀鹽酸及水,並分配成甲苯及水,獲得含有醋酸6-溴己酯 的甲苯層。獲得的含有醋酸6-溴己酯的甲苯層係用於下一反應。 In a reaction flask, 16.27 g (89.9 mmol) of 6-bromo-1-hexanol, 9.63 g (94.3 mmol) of acetic anhydride, and 180 mL of toluene were added. To the reaction mixture, 10.48 g (98.9 mmol) of anhydrous sodium carbonate and 0.55 g (4.5 mmol) of N, N-dimethyl-4-aminopyridine were added while stirring under ice-cooling. After that, the mixture was stirred under ice-cooling for 3 hours. Dilute hydrochloric acid and water were added to the obtained reaction mixture, and the mixture was partitioned into toluene and water to obtain 6-bromohexyl acetate. Toluene layer. The obtained toluene layer containing 6-bromohexyl acetate was used for the next reaction.

(2)醋酸6-氰硫基己酯之製造 (2) Manufacture of 6-cyanothiohexyl acetate

於反應燒瓶中添加含有(1)所獲得的醋酸6-溴己酯的甲苯層之全量、硫氰酸鈉8.75g(107.9mmol)、四丁基溴化銨2.90g(9.0mmol)及水100mL。之後,將混合物於80℃攪拌5小時。將獲得的反應混合物分配成甲苯及水,並將甲苯層分離。接著,將甲苯層於無水硫酸鎂乾燥,過濾後,減壓下餾除甲苯,獲得醋酸6-氰硫基己酯。獲得的醋酸6-氰硫基己酯係不純化而用於下一反應。 In the reaction flask, the entire amount of the toluene layer containing 6-bromohexyl acetate obtained in (1), 8.75 g (107.9 mmol) of sodium thiocyanate, 2.90 g (9.0 mmol) of tetrabutylammonium bromide, and 100 mL of water were added. . After that, the mixture was stirred at 80 ° C for 5 hours. The obtained reaction mixture was partitioned into toluene and water, and the toluene layer was separated. Next, the toluene layer was dried over anhydrous magnesium sulfate, and after filtration, toluene was distilled off under reduced pressure to obtain 6-cyanothiohexyl acetate. The obtained 6-cyanothiohexyl acetate was used in the next reaction without purification.

1H-NMR(300MHz,CDCl3)δ(ppm):4.07(t,J=6.6Hz,2H),2.96(t,J=6.9Hz,2H),2.06(s,3H),1.85(quin,J=6.6Hz,2H),1.66(quin,J=6.9Hz,2H),1.43(m,4H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 4.07 (t, J = 6.6 Hz, 2H), 2.96 (t, J = 6.9 Hz, 2H), 2.06 (s, 3H), 1.85 (quin, J = 6.6Hz, 2H), 1.66 (quin, J = 6.9Hz, 2H), 1.43 (m, 4H).

(3)醋酸6-三氟甲基硫基己酯之製造 (3) Manufacture of 6-trifluoromethylthiohexyl acetate

於反應燒瓶中添加(2)所獲得的醋酸6-氰硫基己酯之全量、三氟甲基三甲基矽烷25.60g(180mmol)及四氫呋喃90mL。接著,將混合物於冰冷下一邊攪拌一邊滴加四丁基氟化銨(1mol/L四氫呋喃溶液)9mL。之後,將混合物於冰冷下攪拌1小時。自獲得的反應混合物,減壓下餾除四氫呋喃。於獲得的殘渣中添加二乙基醚及水,並分配成二乙基醚及水,將二乙基醚層分離。接著,將二乙基醚 層以無水硫酸鎂乾燥,過濾後,減壓下餾除二乙基醚,獲得醋酸6-三氟甲基硫基己酯。獲得的醋酸6-三氟甲基硫基己酯,並未純化而用於下一反應。 In the reaction flask, the entire amount of 6-cyanothiohexyl acetate obtained in (2), 25.60 g (180 mmol) of trifluoromethyltrimethylsilane, and 90 mL of tetrahydrofuran were added. Next, 9 mL of tetrabutylammonium fluoride (1 mol / L tetrahydrofuran solution) was added dropwise to the mixture while stirring under ice-cooling. After that, the mixture was stirred under ice-cooling for 1 hour. From the obtained reaction mixture, tetrahydrofuran was distilled off under reduced pressure. Diethyl ether and water were added to the obtained residue, and the mixture was partitioned into diethyl ether and water, and the diethyl ether layer was separated. Next, diethyl ether The layer was dried over anhydrous magnesium sulfate, and after filtration, diethyl ether was distilled off under reduced pressure to obtain 6-trifluoromethylthiohexyl acetate. The obtained 6-trifluoromethylthiohexyl acetate was used in the next reaction without purification.

1H-NMR(300MHz,CDCl3)δ(ppm):4.06(t,J=6.6Hz,2H),2.88(t,J=7.2Hz,2H),2.05(s,3H),1.67(m,4H),1.41(m,4H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 4.06 (t, J = 6.6 Hz, 2H), 2.88 (t, J = 7.2 Hz, 2H), 2.05 (s, 3H), 1.67 (m, 4H), 1.41 (m, 4H).

(4)6-三氟甲基硫基己烷-1-醇之製造 (4) Manufacture of 6-trifluoromethylsulfanyl-1-ol

於反應燒瓶中添加(3)獲得的醋酸6-三氟甲基硫基己酯之全量、碳酸鉀13.68g(99mmol)及甲醇90mL。之後,將混合物於室溫下攪拌14小時。自獲得的反應混合物,減壓下餾除甲醇。於獲得的殘渣中添加二乙基醚及水,分配成二乙基醚及水,將二乙基醚層分離。接著,二乙基醚層以無水硫酸鎂乾燥,過濾後,減壓下餾除二乙基醚,獲得6-三氟甲基硫基己烷-1-醇。獲得的6-三氟甲基硫基己烷-1-醇係不純化而用於下一反應。 In the reaction flask, the entire amount of 6-trifluoromethylthiohexyl acetate obtained in (3), 13.68 g (99 mmol) of potassium carbonate, and 90 mL of methanol were added. After that, the mixture was stirred at room temperature for 14 hours. From the obtained reaction mixture, methanol was distilled off under reduced pressure. Diethyl ether and water were added to the obtained residue, and the mixture was partitioned into diethyl ether and water, and the diethyl ether layer was separated. Next, the diethyl ether layer was dried over anhydrous magnesium sulfate, and after filtration, diethyl ether was distilled off under reduced pressure to obtain 6-trifluoromethylthiohexane-1-ol. The obtained 6-trifluoromethylthiohexane-1-ol system was used in the next reaction without purification.

1H-NMR(300MHz,CDCl3)δ(ppm):3.66(t,J=6.6Hz,2H),2.89(t,J=7.5Hz,2H),1.72(quin,J=7.5Hz,2H),1.59(quin,J=6.6Hz,2H),1.43(m,4H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 3.66 (t, J = 6.6Hz, 2H), 2.89 (t, J = 7.5Hz, 2H), 1.72 (quin, J = 7.5Hz, 2H) , 1.59 (quin, J = 6.6Hz, 2H), 1.43 (m, 4H).

(5)1-溴-6-三氟甲基硫基己烷之製造 (5) Manufacture of 1-bromo-6-trifluoromethylthiohexane

於反應燒瓶中添加(4)所獲得的6-三氟甲基硫基己烷-1-醇之全量、48%溴化氫酸45.51g(270mmol)及四丁基溴化銨2.90g(9.0mmol)。之後,將混合物於130℃攪拌4小時 。於獲得的反應混合物中添加二氯甲烷及水,分配成二氯甲烷及水,分離二氯甲烷層。接著,將二氯甲烷層以無水硫酸鎂乾燥,過濾後,減壓下餾除二氯甲烷。將獲得的殘渣藉由減壓蒸餾而純化,獲得20.51g之1-溴-6-三氟甲基硫基己烷。5步驟之產率係86%。 In the reaction flask, the entire amount of 6-trifluoromethylthiohexane-1-ol obtained in (4), 45.51 g (270 mmol) of 48% hydrogen bromide, and 2.90 g of tetrabutylammonium bromide (9.0 mmol). After that, the mixture was stirred at 130 ° C for 4 hours. . Dichloromethane and water were added to the obtained reaction mixture, and the mixture was partitioned into dichloromethane and water, and the dichloromethane layer was separated. Next, the dichloromethane layer was dried over anhydrous magnesium sulfate, and after filtration, the dichloromethane was distilled off under reduced pressure. The obtained residue was purified by distillation under reduced pressure to obtain 20.51 g of 1-bromo-6-trifluoromethylsulfanylhexane. The yield in 5 steps was 86%.

1H-NMR(300MHz,CDCl3)δ(ppm):3.41(t,J=6.9Hz,2H),2.89(t,J=7.2Hz,2H),1.87(quin,J=7.2Hz,2H),1.72(quin,J=6.9Hz,2H),1.47(m,4H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 3.41 (t, J = 6.9Hz, 2H), 2.89 (t, J = 7.2Hz, 2H), 1.87 (quin, J = 7.2Hz, 2H) , 1.72 (quin, J = 6.9Hz, 2H), 1.47 (m, 4H).

參考例2 Reference example 2

5-巰基-2,4-二甲基酚之製造 Production of 5-mercapto-2,4-dimethylphenol

(1)2,4-二甲基苯基甲烷磺酸酯之製造 (1) Manufacturing of 2,4-dimethylphenylmethane sulfonate

於反應燒瓶中添加2,4-二甲基酚12.22g(100.0mmol)、甲磺醯氯11.68g(102.0mmol)及二氯甲烷100mL。接著,將混合物於冰冷下一邊攪拌,一邊緩緩滴加三乙基胺11.13g(110.0mmol)之二氯甲烷50mL溶液。滴加結束後,將混合物於室溫攪拌1小時。於獲得的反應混合物中添加水,分配成二氯甲烷及水,將二氯甲烷層分離。接著,將二氯甲烷層以無水硫酸鎂乾燥,過濾後,減壓下藉由餾除二氯甲烷,獲得19.78g之2,4-二甲基苯基甲烷磺酸酯,產率99%。 In a reaction flask, 12.22 g (100.0 mmol) of 2,4-dimethylphenol, 11.68 g (102.0 mmol) of methanesulfonyl chloride and 100 mL of dichloromethane were added. Next, while stirring the mixture under ice-cooling, a solution of 11.13 g (110.0 mmol) of triethylamine in 50 mL of dichloromethane was slowly added dropwise. After the dropwise addition was completed, the mixture was stirred at room temperature for 1 hour. Water was added to the obtained reaction mixture, and the mixture was partitioned into dichloromethane and water, and the dichloromethane layer was separated. Next, the dichloromethane layer was dried over anhydrous magnesium sulfate, and after filtration, the dichloromethane was distilled off under reduced pressure to obtain 19.78 g of 2,4-dimethylphenylmethanesulfonate in a 99% yield.

1H-NMR(300MHz,CDCl3)δ(ppm):7.16(d,J=8.1Hz,1H),7.07(d,J=0.6Hz,1H),7.01(dd,J=8.1,0.6Hz,1H),3.17( s,3H),2.32(s,3H),2.31(s,3H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 7.16 (d, J = 8.1 Hz, 1 H), 7.07 (d, J = 0.6 Hz, 1 H), 7.01 (dd, J = 8.1, 0.6 Hz, 1H), 3.17 (s, 3H), 2.32 (s, 3H), 2.31 (s, 3H).

(2)5-氯磺醯基-2,4-二甲基苯基甲烷磺酸酯之製造 (2) Manufacture of 5-chlorosulfonyl-2,4-dimethylphenylmethanesulfonate

於反應燒瓶中添加30%發煙硫酸5.91g(22.2mmol)及二氯甲烷10mL。接著,將混合物於冰冷下一邊攪拌一邊滴加以二氯甲烷12mL溶解2,4-二甲基苯基甲烷磺酸酯4.35g(21.7mmol)的溶液。滴加結束後,將混合物於冰冷下攪拌1小時。之後,於混合物中添加亞硫醯氯6.45g(54.3mmol)。接著,將混合物於50℃攪拌3小時。將獲得的反應混合物滴加於冰水後,分配成二氯甲烷及水,分離二氯甲烷層。接著,將二氯甲烷層以無水硫酸鎂乾燥,過濾後,減壓下餾除二氯甲烷。將獲得的殘渣藉由矽膠管柱層析純化,獲得5.65g之5-氯磺醯基-2,4-二甲基苯基甲烷磺酸酯,產率87%。 In a reaction flask, 5.91 g (22.2 mmol) of 30% oleum and 10 mL of dichloromethane were added. Next, a solution of 4.35 g (21.7 mmol) of 2,4-dimethylphenylmethanesulfonate in 12 mL of dichloromethane was added dropwise to the mixture while stirring under ice-cooling. After completion of the dropwise addition, the mixture was stirred under ice-cooling for 1 hour. Then, 6.45 g (54.3 mmol) of thionyl chloride was added to the mixture. Then, the mixture was stirred at 50 ° C for 3 hours. The obtained reaction mixture was dropped into ice water, and then partitioned into dichloromethane and water, and the dichloromethane layer was separated. Next, the dichloromethane layer was dried over anhydrous magnesium sulfate, and after filtration, the dichloromethane was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 5.65 g of 5-chlorosulfonyl-2,4-dimethylphenylmethanesulfonate in a yield of 87%.

1H-NMR(300MHz,CDCl3)δ(ppm):7.93(s,1H),7.35(s,1H),3.30(s,3H),2.75(s,3H),2.45(s,3H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 7.93 (s, 1H), 7.35 (s, 1H), 3.30 (s, 3H), 2.75 (s, 3H), 2.45 (s, 3H).

(3)5-巰基-2,4-二甲基苯基甲烷磺酸酯之製造 (3) Manufacturing of 5-mercapto-2,4-dimethylphenylmethanesulfonate

於反應燒瓶中添加5-氯磺醯基-2,4-二甲基苯基甲烷磺酸酯610.0mg(2.0mmol)、18%鹽酸2mL及甲醇2mL。接著,將混合物於室溫下一邊攪拌一邊添加錫粉末484.8mg(4.1mmol)。之後,將混合物於80℃攪拌1小時。 自獲得的反應混合物,減壓下餾除甲醇。於獲得的殘渣中添加二氯甲烷及水,分配成二氯甲烷及水,將二氯甲烷層分離。接著,將二氯甲烷層以無水硫酸鎂乾燥,過濾後,減壓下餾除二氯甲烷。將獲得的殘渣藉由矽膠管柱層析純化,獲得400.0mg之5-巰基-2,4-二甲基苯基甲烷磺酸酯,產率84%。 610.0 mg (2.0 mmol) of 5-chlorosulfonyl-2,4-dimethylphenylmethanesulfonate, 2 mL of 18% hydrochloric acid, and 2 mL of methanol were added to a reaction flask. Next, 484.8 mg (4.1 mmol) of tin powder was added to the mixture while stirring at room temperature. After that, the mixture was stirred at 80 ° C for 1 hour. From the obtained reaction mixture, methanol was distilled off under reduced pressure. Dichloromethane and water were added to the obtained residue, and the mixture was partitioned into dichloromethane and water, and the dichloromethane layer was separated. Next, the dichloromethane layer was dried over anhydrous magnesium sulfate, and after filtration, the dichloromethane was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 400.0 mg of 5-mercapto-2,4-dimethylphenylmethanesulfonate in a yield of 84%.

1H-NMR(300MHz,CDCl3)δ(ppm):7.22(s,1H),7.06(s,1H),3.18(s,3H),2.28(s,3H),2.27(s,3H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 7.22 (s, 1H), 7.06 (s, 1H), 3.18 (s, 3H), 2.28 (s, 3H), 2.27 (s, 3H).

(4)5-巰基-2,4-二甲基酚之製造 (4) Manufacture of 5-mercapto-2,4-dimethylphenol

於反應燒瓶中添加5-巰基-2,4-二甲基苯基甲烷磺酸酯2.32g(10.0mmol)、氫氧化鈉4.00g(100.0mmol)及水15mL。之後,將混合物於80℃攪拌1小時。於獲得的反應混合物中添加鹽酸,調整為pH1左右。接著,於其中添加二氯甲烷,分配成二氯甲烷及水,並分離二氯甲烷層。接著,將二氯甲烷層以無水硫酸鎂乾燥,過濾後,減壓下餾除二氯甲烷。將獲得的殘渣藉由矽膠管柱層析純化,獲得1.48g之5-巰基-2,4-二甲基酚,產率96%。 In a reaction flask, 2.32 g (10.0 mmol) of 5-mercapto-2,4-dimethylphenylmethanesulfonate, 4.00 g (100.0 mmol) of sodium hydroxide, and 15 mL of water were added. After that, the mixture was stirred at 80 ° C for 1 hour. Hydrochloric acid was added to the obtained reaction mixture to adjust the pH to about 1. Next, methylene chloride was added thereto, and the mixture was partitioned into methylene chloride and water, and the methylene chloride layer was separated. Next, the dichloromethane layer was dried over anhydrous magnesium sulfate, and after filtration, the dichloromethane was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 1.48 g of 5-mercapto-2,4-dimethylphenol in a yield of 96%.

1H-NMR(300MHz,CDCl3)δ(ppm):6.90(s,1H),6.74(s,1H),3.19(s,1H),2.22(s,1H),2.17(s,1H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 6.90 (s, 1H), 6.74 (s, 1H), 3.19 (s, 1H), 2.22 (s, 1H), 2.17 (s, 1H).

參考例3 Reference example 3

1-溴-5-三氟甲基硫基戊烷之製造 Manufacture of 1-bromo-5-trifluoromethylthiopentane

(1)醋酸5-溴戊酯之製造 (1) Manufacturing of 5-bromopentyl acetate

於反應燒瓶中添加5-溴-1-戊醇20.30g(121.5mmol)、醋酸酐13.03g(127.6mmol)及甲苯120mL。於反應混合物中,冰冷下一邊攪拌一邊添加無水碳酸鈉14.17g(133.7mmol)及N,N-二甲基-4-胺基吡啶0.74g(6.1mmol)。之後,將混合物於冰冷下攪拌2小時。於獲得的反應混合物中添加稀鹽酸及水,分配成甲苯及水,獲得含有醋酸5-溴戊酯的甲苯層。含有獲得的醋酸5-溴戊酯的甲苯層係用於下一反應。 In a reaction flask, 20.30 g (121.5 mmol) of 5-bromo-1-pentanol, 13.03 g (127.6 mmol) of acetic anhydride, and 120 mL of toluene were added. In the reaction mixture, 14.17 g (133.7 mmol) of anhydrous sodium carbonate and 0.74 g (6.1 mmol) of N, N-dimethyl-4-aminopyridine were added while stirring under ice-cooling. After that, the mixture was stirred under ice-cooling for 2 hours. Dilute hydrochloric acid and water were added to the obtained reaction mixture, and the mixture was partitioned into toluene and water to obtain a toluene layer containing 5-bromopentyl acetate. The toluene layer containing the 5-bromopentyl acetate obtained was used in the next reaction.

(2)醋酸5-氰硫基戊酯之製造 (2) Manufacturing of 5-cyanothiopentyl acetate

於反應燒瓶中添加含有(1)獲得的醋酸5-溴戊酯的甲苯層之全量、硫氰酸鈉14.78g(182.3mmol)、四丁基溴化銨3.92g(12.2mmol)及水120mL。之後,將混合物於80℃攪拌3小時。將獲得的反應混合物分配成甲苯及水,並將甲苯層分離。接著,將甲苯層以無水硫酸鎂乾燥,過濾後,減壓下餾除甲苯,獲得醋酸5-氰硫基戊酯。獲得的醋酸5-氰硫基戊酯係未純化而用於下一反應。 In the reaction flask, the total amount of a toluene layer containing 5-bromopentyl acetate obtained in (1), 14.78 g (182.3 mmol) of sodium thiocyanate, 3.92 g (12.2 mmol) of tetrabutylammonium bromide, and 120 mL of water were added. After that, the mixture was stirred at 80 ° C for 3 hours. The obtained reaction mixture was partitioned into toluene and water, and the toluene layer was separated. Next, the toluene layer was dried over anhydrous magnesium sulfate, and after filtration, toluene was distilled off under reduced pressure to obtain 5-cyanothiopentyl acetate. The obtained 5-cyanothiopentyl acetate was used in the next reaction without purification.

1H-NMR(300MHz,CDCl3)δ(ppm):4.09(t,J=6.3Hz,2H),2.96(t,J=7.2Hz,2H),2.06(s,3H),1.88(m,2H),1.71(m,2H),1.53(m,2H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 4.09 (t, J = 6.3 Hz, 2H), 2.96 (t, J = 7.2 Hz, 2H), 2.06 (s, 3H), 1.88 (m, 2H), 1.71 (m, 2H), 1.53 (m, 2H).

(3)醋酸5-氰硫基戊酯之製造 (3) Manufacturing of 5-cyanothiopentyl acetate

於反應燒瓶中添加(2)所獲得的醋酸5-氰硫基戊酯之 全量、三氟甲基三甲基矽烷25.81g(181.5mmol)及四氫呋喃100mL。接著,將混合物於冰冷下一邊攪拌一邊滴加四丁基氟化銨(1mol/L四氫呋喃溶液)12mL。之後,將混合物於冰冷下攪拌2小時。自獲得的反應混合物,減壓下餾除四氫呋喃。於獲得的殘渣中添加二乙基醚及水,分配成二乙基醚及水,並分離二乙基醚層。接著,將二乙基醚層以無水硫酸鎂乾燥,過濾後,減壓下餾除二乙基醚,獲得醋酸5-氰硫基戊酯。獲得的醋酸5-氰硫基戊酯並未純化而用於下一反應。 Add 5-cyanothiopentyl acetate obtained in (2) to the reaction flask. Full amount, 25.81 g (181.5 mmol) of trifluoromethyltrimethylsilane and 100 mL of tetrahydrofuran. Next, 12 mL of tetrabutylammonium fluoride (1 mol / L tetrahydrofuran solution) was added dropwise while stirring the mixture under ice-cooling. After that, the mixture was stirred under ice-cooling for 2 hours. From the obtained reaction mixture, tetrahydrofuran was distilled off under reduced pressure. Diethyl ether and water were added to the obtained residue, and the mixture was partitioned into diethyl ether and water, and the diethyl ether layer was separated. Next, the diethyl ether layer was dried over anhydrous magnesium sulfate, and after filtration, diethyl ether was distilled off under reduced pressure to obtain 5-cyanothiopentyl acetate. The obtained 5-cyanothiopentyl acetate was used in the next reaction without purification.

1H-NMR(300MHz,CDCl3)δ(ppm):4.07(t,J=6.3Hz,2H),2.89(t,J=7.5Hz,2H),2.05(s,3H),1.70(m,4H),1.48(m,2H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 4.07 (t, J = 6.3Hz, 2H), 2.89 (t, J = 7.5Hz, 2H), 2.05 (s, 3H), 1.70 (m, 4H), 1.48 (m, 2H).

(4)5-三氟甲基硫基戊烷-1-醇之製造 (4) Manufacturing of 5-trifluoromethylthiopentane-1-ol

於反應燒瓶中,添加(3)所獲得的醋酸5-氰硫基戊酯之全量、碳酸鉀15.93g(115.3mmol)及甲醇100mL。之後,將混合物於室溫下攪拌5小時。自獲得的反應混合物,減壓下餾除甲醇。於獲得的殘渣中添加二乙基醚及水,分配成二乙基醚及水,並將二乙基醚層分離。接著,將二乙基醚層以無水硫酸鎂乾燥,過濾後,減壓下餾除二乙基醚,獲得5-三氟甲基硫基戊烷-1-醇。獲得的5-三氟甲基硫基戊烷-1-醇並未純化而用於下一反應。 In the reaction flask, the entire amount of 5-cyanothiopentyl acetate obtained in (3), 15.93 g (115.3 mmol) of potassium carbonate, and 100 mL of methanol were added. After that, the mixture was stirred at room temperature for 5 hours. From the obtained reaction mixture, methanol was distilled off under reduced pressure. Diethyl ether and water were added to the obtained residue, and the mixture was partitioned into diethyl ether and water, and the diethyl ether layer was separated. Next, the diethyl ether layer was dried over anhydrous magnesium sulfate, and after filtration, diethyl ether was distilled off under reduced pressure to obtain 5-trifluoromethylthiopentane-1-ol. The obtained 5-trifluoromethylthiopentane-1-ol was used in the next reaction without purification.

1H-NMR(300MHz,CDCl3)δ(ppm):3.67(t,J=6.0Hz,2 H),2.90(t,J=7.2Hz,2H),1.74(m,2H),1.54(m,4H). 1 H-NMR (300 MHz, CDCl 3 ) δ (ppm): 3.67 (t, J = 6.0 Hz, 2 H), 2.90 (t, J = 7.2 Hz, 2H), 1.74 (m, 2H), 1.54 (m , 4H).

(5)1-溴-5-三氟甲基硫基戊烷之製造 (5) Manufacture of 1-bromo-5-trifluoromethylthiopentane

於反應燒瓶中添加(4)所獲得的5-三氟甲基硫基戊烷-1-醇之全量及48%溴化氫酸53.12g(315mmol)。之後,將混合物於140℃攪拌6小時。於獲得的反應混合物中添加二氯甲烷及水,分配成二氯甲烷及水,並將二氯甲烷層分離。接著,將二氯甲烷層以無水硫酸鎂乾燥,過濾後,減壓下餾除二氯甲烷。將獲得的殘渣藉由減壓蒸餾而純化,獲得14.11g之1-溴-5-三氟甲基硫基戊烷。5步驟之產率為46%。 In the reaction flask, the entire amount of 5-trifluoromethylthiopentane-1-ol obtained in (4) and 53.12 g (315 mmol) of 48% hydrogen bromide were added. After that, the mixture was stirred at 140 ° C for 6 hours. Dichloromethane and water were added to the obtained reaction mixture, and the mixture was partitioned into dichloromethane and water, and the dichloromethane layer was separated. Next, the dichloromethane layer was dried over anhydrous magnesium sulfate, and after filtration, the dichloromethane was distilled off under reduced pressure. The obtained residue was purified by distillation under reduced pressure to obtain 14.11 g of 1-bromo-5-trifluoromethylthiopentane. The yield in 5 steps was 46%.

1H-NMR(300MHz,CDCl3)δ(ppm):3.42(t,J=6.9Hz,2H),2.90(t,J=7.2Hz,2H),1.90(m,2H),1.74(m,2H),1.57(m,2H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 3.42 (t, J = 6.9 Hz, 2H), 2.90 (t, J = 7.2 Hz, 2H), 1.90 (m, 2H), 1.74 (m, 2H), 1.57 (m, 2H).

參考例4 Reference example 4

4-氯-2-氟-5-巰基酚之製造 Production of 4-chloro-2-fluoro-5-mercaptophenol

(1)4-氯-5-氯磺醯基-2-氟酚之製造 (1) Manufacture of 4-chloro-5-chlorosulfonyl-2-fluorophenol

於反應燒瓶中添加30%發煙硫酸6.67g(25.0mmol)及二氯甲烷2.5mL。接著,將混合物於室溫一邊攪拌一邊滴加以二氯甲烷2.5mL溶解4-氯-2-氟酚732.8mg(5.0mmol)的溶液。滴加結束後,將混合物於室溫攪拌1小時。之後 ,於混合物中添加亞硫醯氯5.95g(50.0mmol)。接著,將混合物於50℃攪拌1小時。將獲得的反應混合物滴入於冰水後,分配成二氯甲烷及水,將二氯甲烷層分離。接著,將二氯甲烷層以無水硫酸鎂乾燥,過濾後,減壓下餾除二氯甲烷。將獲得的殘渣藉由矽膠管柱層析純化,獲得941.0mg之4-氯-5-氯磺醯基-2-氟酚,產率77%。 In a reaction flask, 6.67 g (25.0 mmol) of 30% oleum and 2.5 mL of dichloromethane were added. Then, 2.5 mL of dichloromethane was dissolved in 732.8 mg (5.0 mmol) of 4-chloro-2-fluorophenol while the mixture was dropped at room temperature while stirring. After the dropwise addition was completed, the mixture was stirred at room temperature for 1 hour. after that 5.95 g (50.0 mmol) of thionyl chloride was added to the mixture. Then, the mixture was stirred at 50 ° C for 1 hour. The obtained reaction mixture was dropped into ice water, and then partitioned into dichloromethane and water, and the dichloromethane layer was separated. Next, the dichloromethane layer was dried over anhydrous magnesium sulfate, and after filtration, the dichloromethane was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 941.0 mg of 4-chloro-5-chlorosulfonyl-2-fluorophenol with a yield of 77%.

1H-NMR(300MHz,CDCl3)δ(ppm):7.83(d,J=8.4Hz,1H),7.38(d,J=9.9Hz,1H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 7.83 (d, J = 8.4Hz, 1H), 7.38 (d, J = 9.9Hz, 1H).

(2)4-氯-2-氟-5-巰基酚之製造 (2) Manufacture of 4-chloro-2-fluoro-5-mercaptophenol

於反應燒瓶中添加4-氯-5-氯磺醯基-2-氟酚245.1mg(1.0mmol)、18%鹽酸1mL及甲醇1mL。接著,將混合物於室溫下一邊攪拌一邊添加錫粉末237.4mg(2.0mmol)。之後,將混合物於80℃攪拌1小時。自獲得的反應混合物,減壓下餾除甲醇。於獲得的殘渣中添加二氯甲烷及水,分配成二氯甲烷及水,將二氯甲烷層分離。接著,將二氯甲烷層以無水硫酸鎂乾燥,過濾後,減壓下餾除二氯甲烷。將獲得的殘渣藉由矽膠管柱層析純化,獲得152.0mg之4-氯-2-氟-5-巰基酚,產率85%。 In a reaction flask, 245.1 mg (1.0 mmol) of 4-chloro-5-chlorosulfonyl-2-fluorophenol, 1 mL of 18% hydrochloric acid, and 1 mL of methanol were added. Next, 237.4 mg (2.0 mmol) of tin powder was added to the mixture while stirring at room temperature. After that, the mixture was stirred at 80 ° C for 1 hour. From the obtained reaction mixture, methanol was distilled off under reduced pressure. Dichloromethane and water were added to the obtained residue, and the mixture was partitioned into dichloromethane and water, and the dichloromethane layer was separated. Next, the dichloromethane layer was dried over anhydrous magnesium sulfate, and after filtration, the dichloromethane was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 152.0 mg of 4-chloro-2-fluoro-5-mercaptophenol in a yield of 85%.

1H-NMR(300MHz,CDCl3)δ(ppm):7.14(d,J=10.2Hz,1H),7.01(d,J=8.7Hz,1H),3.82(s,1H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 7.14 (d, J = 10.2Hz, 1H), 7.01 (d, J = 8.7Hz, 1H), 3.82 (s, 1H).

參考例5 Reference example 5

5-三氟甲基硫基戊基-〔4-氯-2-氟-5-(2,2,2-三氟乙基亞磺醯基)苯基〕醚之製造 Production of 5-trifluoromethylthiopentyl- [4-chloro-2-fluoro-5- (2,2,2-trifluoroethylsulfinamido) phenyl] ether

於反應燒瓶中添加5-三氟甲基硫基戊基-〔4-氯-2-氟-5-(2,2,2-三氟乙基硫基)苯基〕醚86.2mg(0.20mmol)及二氯甲烷2mL。將混合物於室溫下一邊攪拌一邊於其中添加間氯過苯甲酸50.6mg(0.22mmol)。將混合物於室溫下攪拌2小時。於反應混合物中添加亞硫酸鈉水溶液、水及二氯甲烷,將混合物分配成有機層及水層,並將有機層分離。將有機層以無水硫酸鎂乾燥,過濾後,減壓下餾除溶劑。將獲得的殘渣藉由矽膠管柱層析純化,獲得68.0mg之5-三氟甲基硫基戊基-〔4-氯-2-氟-5-(2,2,2-三氟乙基亞磺醯基)苯基〕醚,產率76%。 To a reaction flask was added 5-trifluoromethylthiopentyl- [4-chloro-2-fluoro-5- (2,2,2-trifluoroethylthio) phenyl] ether 86.2 mg (0.20 mmol ) And 2 mL of dichloromethane. While stirring the mixture at room temperature, 50.6 mg (0.22 mmol) of m-chloroperbenzoic acid was added thereto. The mixture was stirred at room temperature for 2 hours. An aqueous sodium sulfite solution, water and dichloromethane were added to the reaction mixture, the mixture was partitioned into an organic layer and an aqueous layer, and the organic layer was separated. The organic layer was dried over anhydrous magnesium sulfate, and after filtration, the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 68.0 mg of 5-trifluoromethylthiopentyl- [4-chloro-2-fluoro-5- (2,2,2-trifluoroethyl). Sulfinylene) phenyl] ether, 76% yield.

1H-NMR(300MHz,CDCl3)δ(ppm):7.54(d,J=8.1Hz,1H),7.21(d,J=9.9Hz,1H),4.13(t,J=6.3Hz,2H),3.72(m,1H),3.37(m,1H),2.92(t,J=7.2Hz,2H),1.84(m,4H),1.62(m,2H). 1 H-NMR (300MHz, CDCl 3 ) δ (ppm): 7.54 (d, J = 8.1Hz, 1H), 7.21 (d, J = 9.9Hz, 1H), 4.13 (t, J = 6.3Hz, 2H) , 3.72 (m, 1H), 3.37 (m, 1H), 2.92 (t, J = 7.2Hz, 2H), 1.84 (m, 4H), 1.62 (m, 2H).

本說明書中、實施例及參考例之各物性之測定係使用下列機器。 In this specification, the measurement of each physical property of an Example and a reference example uses the following equipment.

1H核磁共振光譜(1H-NMR);JEOL JMN-Lambda 300或JEOL JMN-Lambda-400(日本電子股份有限公司製),內部基準物質:四甲基矽烷 1 H nuclear magnetic resonance spectrum ( 1 H-NMR); JEOL JMN-Lambda 300 or JEOL JMN-Lambda-400 (manufactured by Japan Electronics Co., Ltd.), internal reference substance: tetramethylsilane

熔點;MP-500V(Anatec Yanaco股份有限公司製)。 Melting point; MP-500V (manufactured by Anatec Yanaco Co., Ltd.).

(高速液體層析(HPLC)分析方法) (High-speed liquid chromatography (HPLC) analysis method)

關於HPLC分析方法,因應需要,可參照以下文獻。 Regarding the HPLC analysis method, if necessary, reference can be made to the following documents.

(社)日本化學會編,「新實驗化學講座9分析化學II」、第86~112頁(1977年)、發行者飯泉新吾、丸善股份有限公司(例如,關於可用於管柱的填充劑-移動相之組合,可參照第93~96頁)。 (Institute of Chemical Engineering of Japan, "New Experimental Chemistry Lecture 9 Analytical Chemistry II", pages 86 to 112 (1977), publisher Iizumi Shingo, Maruzen Co., Ltd. (for example, about fillers that can be used in column- (For combinations of mobile phases, see pages 93-96).

(社)日本化學會編、「實驗化學講座20-1分析化學」第5版、第130~151頁(2007年)、發行者村田誠四郎、丸善股份有限公司(例如,關於逆相層析分析之具體使用方法及條件,可參照第135~137頁)。 (Company) The Japanese Chemical Society, "Experimental Chemistry Lecture 20-1 Analytical Chemistry", 5th edition, pages 130 to 151 (2007), publishers Masaru Murata, Maruzen Co., Ltd. (for example, about reversed phase chromatography (For specific methods and conditions of analysis, please refer to pages 135 ~ 137).

(氣體層析(GC)分析方法) (Gas Chromatography (GC) Analysis Method)

關於GC分析方法,因應需要,可參照以下之文獻。 Regarding the GC analysis method, if necessary, refer to the following documents.

(社)日本化學會編、「新實驗化學講座9分析化學II」、第60~86頁(1977年)、發行者飯泉新吾、丸善股份有限公司(例如,關於可用於管柱的固定相液體,可參照第66頁)。 (Institute of Chemical Engineering of Japan, "New Experimental Chemistry Lecture 9 Analytical Chemistry II", pages 60 to 86 (1977), publisher Iizumi Shingo, Maruzen Co., Ltd. (for example, stationary phase liquids that can be used in column , See page 66).

(社)日本化學會編,「實驗化學講座20-1分析化學」第5版、第121~129頁(2007年)、發行者村田誠四郎、丸善股份有限公司(例如,關於中空毛細管分離管柱之具體 使用方法,可參照第124~125頁)。 (Company) The Japanese Chemical Society, "Experimental Chemistry Lecture 20-1 Analytical Chemistry", 5th edition, pages 121 to 129 (2007), publishers Masaru Murata, Maruzen Co., Ltd. Column specific (Please refer to pages 124 ~ 125).

(pH之測定方法) (Method for measuring pH)

pH係藉由玻璃電極式氫離子濃度指示計而測定。就玻璃電極式氫離子濃度指示計而言,例如,可使用DKK-TOA股份有限公司製,形式:HM-20P。 The pH is measured by a glass electrode type hydrogen ion concentration indicator. For the glass electrode type hydrogen ion concentration indicator, for example, DKK-TOA Co., Ltd. can be used in the form of HM-20P.

[產業上之可利用性] [Industrial availability]

依據本發明,可提供有用於作為農藥等之有害生物防治劑及其製造中間體之通式(4)之新穎的製造方法及新穎的其之製造中間體。 According to the present invention, there can be provided a novel manufacturing method of the general formula (4) used as a pest control agent for pesticides and the like and a manufacturing intermediate thereof, and a novel manufacturing intermediate thereof.

據此,本發明係經濟的,對環境亦為友善,具有高工業利用價值。 Accordingly, the present invention is economical, environmentally friendly, and has high industrial use value.

Claims (16)

一種通式(2)所表示的化合物,式中,R1及R2各自獨立為鹵素原子或C1~C4烷基。A compound represented by the general formula (2), In the formula, R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group. 如請求項1之化合物,其中R1及R2各自獨立為鹵素原子;或R1及R2各自獨立為C1~C4烷基。For example, the compound of claim 1, wherein R 1 and R 2 are each independently a halogen atom; or R 1 and R 2 are each independently a C1-C4 alkyl group. 如請求項1之化合物,其中R1為氟原子;R2為氯原子;或R1及R2各自為甲基。The compound of claim 1, wherein R 1 is a fluorine atom; R 2 is a chlorine atom; or R 1 and R 2 are each a methyl group. 如請求項1之化合物,其中R1及R2各自獨立為鹵素原子。The compound as claimed in claim 1, wherein R 1 and R 2 are each independently a halogen atom. 如請求項1之化合物,其中R1為氟原子;R2為氯原子。A compound as claimed in claim 1, wherein R 1 is a fluorine atom; R 2 is a chlorine atom. 如請求項1之化合物,其中R1及R2各自獨立為C1~C4烷基。For example, the compound of claim 1, wherein R 1 and R 2 are each independently a C1-C4 alkyl group. 如請求項1之化合物,其中R1及R2各自為甲基。A compound as claimed in claim 1, wherein R 1 and R 2 are each methyl. 一種方法,其係製造通式(4)所表示的化合物的方法:式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基;R4為C1~C4鹵烷基;其包含以下之步驟:(i)自通式(1)所表示的化合物製造通式(2)所表示的化合物的步驟,式中,R1及R2係如上述所定義,式中,R1及R2係如上述所定義;(ii)使該通式(2)之化合物,於鹼之存在下,與通式(a)所表示的化合物反應,而製造通式(3)所表示的化合物的步驟,R3-X (a)式中,R3係如上述所定義;X為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基,式中,R1、R2及R3係如上述所定義;及(iii)將該通式(3)之化合物轉換為前述通式(4)之化合物的步驟。A method for producing a compound represented by the general formula (4): In the formula, R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group; R 4 is a C1 to C4 haloalkyl group; it includes the following Step: (i) a step of producing a compound represented by the general formula (2) from a compound represented by the general formula (1), In the formula, R 1 and R 2 are as defined above, In the formula, R 1 and R 2 are as defined above; (ii) the compound of the general formula (2) is reacted with a compound represented by the general formula (a) in the presence of a base to produce the general formula ( 3) A step of the compound represented by R 3 -X (a) wherein R 3 is as defined above; X is a halogen atom, C1 to C4 alkylsulfonyloxy, C1 to C4 haloalkylsulfonyl Oxygen, or phenylsulfonyloxy which may be substituted by C1 ~ C4 alkyl or halogen atom, In the formula, R 1 , R 2 and R 3 are as defined above; and (iii) a step of converting the compound of the general formula (3) into the compound of the aforementioned general formula (4). 如請求項8之方法,其中步驟(iii)係以下之步驟:(iii-a)藉由使通式(3)所表示的化合物,於鹼之存在下,與通式(b)所表示的化合物反應,而將該通式(3)之化合物轉換為該通式(4)之化合物的步驟,式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基,R4-Y (b)式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基、或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基。The method as claimed in claim 8, wherein step (iii) is the following step: (iii-a) by making the compound represented by the general formula (3) in the presence of a base and the compound represented by the general formula (b) A step of reacting a compound to convert the compound of the general formula (3) into the compound of the general formula (4), In the formula, R 1 and R 2 are each independently a halogen atom or a C1-C4 alkyl group; R 3 is a C1-C4 haloalkylthio group C2-C10 alkyl group, and R 4 -Y (b) In the formula, R 4 is C1 ~ C4 haloalkyl; Y is a halogen atom, C1 ~ C4 alkylsulfonyloxy, C1 ~ C4 haloalkylsulfonyloxy, or phenylsulfonium which may be substituted by C1 ~ C4 alkyl or halogen atom Oxygen. 如請求項8之方法,其中步驟(iii)係包含以下之步驟:(iii-b)使通式(3)所表示的化合物轉換為通式(5)所表示的化合物的步驟,式中,R1及R2各自獨立為鹵素原子或C1~C4烷基;R3為C1~C4鹵烷基硫基C2~C10烷基,式中,R1、R2及R3係如上述所定義;及(iii-c)藉由使該通式(5)之化合物,於鹼之存在下,與通式(b)所表示的化合物反應,而將該通式(5)之化合物轉換為前述通式(4)之化合物的步驟,R4-Y (b)式中,R4為C1~C4鹵烷基;Y為鹵素原子、C1~C4烷基磺醯氧基、C1~C4鹵烷基磺醯氧基,或可經C1~C4烷基或鹵素原子取代的苯基磺醯氧基。The method of claim 8, wherein step (iii) includes the following steps: (iii-b) a step of converting a compound represented by the general formula (3) into a compound represented by the general formula (5), In the formula, R 1 and R 2 are each independently a halogen atom or a C1 to C4 alkyl group; R 3 is a C1 to C4 haloalkylthio group C2 to C10 alkyl group, In the formula, R 1 , R 2 and R 3 are as defined above; and (iii-c) the compound represented by the general formula (5) is represented by the general formula (b) in the presence of a base. A step of converting a compound of the general formula (5) to a compound of the aforementioned general formula (4) by reacting a compound, wherein R 4 -Y (b) wherein R 4 is a C1-C4 haloalkyl group; Y is a halogen atom , C1 ~ C4 alkylsulfonyloxy, C1 ~ C4 haloalkylsulfonyloxy, or phenylsulfonyloxy which may be substituted by C1 ~ C4 alkyl or halogen atom. 如請求項9或10之方法,其中R1及R2各自獨立為鹵素原子,或R1及R2各自獨立為C1~C4烷基。The method of claim 9 or 10, wherein R 1 and R 2 are each independently a halogen atom, or R 1 and R 2 are each independently a C1 to C4 alkyl group. 如請求項9或10之方法,其中R1為氟原子;R2為氯原子;R3為5-三氟甲基硫基戊基;R4為2,2,2-三氟乙基;X為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;Y為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;或R1及R2各自為甲基;R3為6-三氟甲基硫基己基;R4為2,2,2-三氟乙基;X為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;Y為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基。The method of claim 9 or 10, wherein R 1 is a fluorine atom; R 2 is a chlorine atom; R 3 is 5-trifluoromethylthiopentyl; R 4 is 2,2,2-trifluoroethyl; X is chlorine atom, bromine atom, iodine atom, methanesulfonyloxy group, benzenesulfonyloxy group, p-toluenesulfonyloxy group or p-chlorobenzenesulfonyloxy group; Y is chlorine atom, bromine atom, iodine atom, methane sulfonic group, acyl group benzenesulfonamide, toluenesulfonamide acyl group or p-chlorophenyl sulfonylurea group; or R 1 and R 2 are each methyl; R 3 is 6-trifluoromethylthio-hexyl; R 4 is 2,2,2-trifluoroethyl; X is chlorine atom, bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy Y is a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a benzenesulfonyloxy group, a p-toluenesulfonyloxy group, or a p-chlorobenzenesulfonyloxy group. 如請求項9或10之方法,其中R1及R2各自獨立為鹵素原子。The method of claim 9 or 10, wherein R 1 and R 2 are each independently a halogen atom. 如請求項9或10之方法,其中R1為氟原子;R2為氯原子;R3為5-三氟甲基硫基戊基;R4為2,2,2-三氟乙基;X為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;Y為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基。The method of claim 9 or 10, wherein R 1 is a fluorine atom; R 2 is a chlorine atom; R 3 is 5-trifluoromethylthiopentyl; R 4 is 2,2,2-trifluoroethyl; X is chlorine atom, bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy; Y is chlorine atom, bromine atom, iodine atom, methane Sulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy. 如請求項9或10之方法,其中R1及R2各自獨立為C1~C4烷基。The method of claim 9 or 10, wherein R 1 and R 2 are each independently a C1 to C4 alkyl group. 如請求項9或10之方法,其中R1及R2各自為甲基;R3為6-三氟甲基硫基己基;R4為2,2,2-三氟乙基;X為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基;Y為氯原子、溴原子、碘原子、甲烷磺醯氧基、苯磺醯氧基、對甲苯磺醯氧基或對氯苯磺醯氧基。The method of claim 9 or 10, wherein R 1 and R 2 are each methyl; R 3 is 6-trifluoromethylthiohexyl; R 4 is 2,2,2-trifluoroethyl; X is chlorine Atom, bromine atom, iodine atom, methanesulfonyloxy, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy; Y is chlorine atom, bromine atom, iodine atom, methanesulfonyloxy Group, benzenesulfonyloxy, p-toluenesulfonyloxy or p-chlorobenzenesulfonyloxy.
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