TWI648167B - Screen plate capable of adjusting ink permeability of mesh cloth and manufacturing method thereof - Google Patents

Abstract

A screen plate capable of adjusting the ink penetration amount of a mesh cloth, comprising: a mesh frame; a mesh cloth, which is stretched and fixed on the mesh frame by a predetermined tension and comprises a plurality of metal warp threads and a plurality of metal staggered up and down Weft threads, a plurality of metal warp threads and a plurality of metal weft threads have a first wire diameter; a polymer material layer covered with a mesh cloth, and the polymer material layer includes a plurality of opening patterns, wherein the plurality of opening patterns includes a plurality of The plurality of mesh openings formed by the metal warp threads and the plurality of metal weft threads, the plurality of metal warp threads and / or the plurality of metal weft threads constituting the plurality of mesh cloth openings have a second thread diameter, and the second thread diameter is smaller than the first Wire diameter. Furthermore, the present invention also provides a screen making method capable of adjusting the ink permeability of the mesh cloth.

Description

Screen plate capable of adjusting ink permeability of mesh cloth and manufacturing method thereof

The invention is a printing screen structure made by a printing mesh fabric and a manufacturing method thereof, in particular to a printing method for controlling the ink penetration amount of the opening pattern by adjusting the warp and weft thread diameter in the opening pattern on the printing mesh cloth Net version and its production method.

With the advancement of technology, the circuit pattern design on the circuit board and the printed circuit specifications required by the circuit board are becoming more and more precise and precise, such as the passive element loop circuit, the finger line circuit on the solar cell Therefore, for the printed screen of the circuit pattern, a mesh specification that can be used for printing fine circuits is also required.

In precision screen printing, fine-line mesh is an important link that affects ink penetration. We know that the screen ink penetration rate is related to the mesh opening rate, and the mesh opening rate is related to the mesh number and wire diameter, as follows The formula shows: mesh opening rate = mesh area (A) / screen area (B), so we know that under the same mesh number, the larger the mesh size, the greater the mesh opening rate, the better the ink permeability, but At the same time, the cost difference will be greater. For example, with 360 mesh (mesh) and wire diameter of 20um, once the wire diameter comes to 16um, 13um ... 11um, the price increases by multiples per meter. In addition to the price, traditional yarn drawing technology should achieve finer yarn The technical threshold is higher, so how to reduce costs and increase ink penetration to achieve precision printing is a problem that needs to be overcome.

In addition, in the prior art, although there is a printing screen structure in which a screen is formed by electroforming or a steel plate is processed by laser to increase the mesh opening ratio and the amount of ink penetration increases, the electroforming plate or steel The plate lacks the characteristics of the warp and weft mesh fabric, the strength of the fine wire screen formed by electroforming is insufficient, and the elasticity of the steel plate to form the screen is insufficient, and the desired printing effect cannot be achieved in the off-print printing. Furthermore, in the screen structure formed by weaving warp and weft, although the warp and weft can be woven with different wire diameters, the thickness of the warp and weft cannot be controlled locally, so that it is impossible to reach the plural of a screen In this opening pattern, the diameter of the warp and weft is reduced to increase the effect of ink penetration. On the other hand, in the actual application of screen printing, after printing, it is often found that only partial ink penetration is poor, such as just at the turn or right angle of the opening pattern, or the opening pattern is just at the junction of the latitude and longitude lines, However, it is not possible to locally adjust the diameter of the warp and weft lines in these places to increase the amount of ink penetration. In addition, in practice, we also encountered lines in the same graphic, and we need two types of online routing paths to achieve different line ink requirements. For example, in the solar printing screen, Finger Line and Bus Bar are two lines with different functional requirements. , And the design is in the same screen.

Based on the above reasons, how to provide a screen that can adjust the ink penetration of the mesh and its manufacturing method to locally adjust the diameter of the warp and weft in the screen to achieve the purpose of increasing the ink penetration and reducing the cost is to be waited solved problem.

In order to achieve the foregoing objective, the present invention provides a screen for adjusting the ink penetration of a mesh fabric, including: a mesh frame; a mesh fabric, which is stretched and fixed on the mesh frame by a predetermined tension and includes an up and down arrangement A plurality of metal warp threads and a plurality of metal weft threads, the plurality of metal warp threads and the plurality of metal weft threads have a first wire diameter; a polymer material layer, covering the mesh cloth, and the polymer material layer includes a plurality of opening patterns, wherein , The plurality of opening patterns includes a plurality of mesh openings composed of a plurality of metal warp threads and a plurality of metal weft threads, the plurality of metal warp threads and / or a plurality of metal weft threads constituting the plurality of mesh openings have a second wire diameter , And the second wire diameter is smaller than the first wire diameter.

Preferably, the plurality of metal warp threads and / or the plurality of metal weft threads that form the plurality of mesh openings further have a third wire diameter, and the third wire diameter is smaller than the second wire diameter and the first wire diameter.

Preferably, the predetermined tension is 10-20 Newtons.

Preferably, the material of the plurality of metal warp threads is one of stainless steel or tungsten, the material of the plurality of metal weft threads is one of stainless steel or tungsten, and the plurality of warp threads or weft threads may be the same or different materials.

Furthermore, the present invention also provides a screen making method capable of adjusting the ink permeability of the mesh cloth, which includes the following steps: weaving a plurality of metal warp threads and a plurality of metal weft threads in a staggered manner to form a mesh cloth, Wherein, the plurality of metal warp threads and the plurality of metal weft threads have a first wire diameter; the plurality of metal warp threads and the plurality of metal weft threads are stretched and fixed on a screen frame with a predetermined tension; by a polymer material Covering the mesh fabric to form a polymer material layer on the mesh fabric; etching the polymer material layer by a first etching method to form a plurality of first opening patterns, wherein the plurality of first opening patterns includes a plurality of A plurality of mesh openings formed by a plurality of metal warp threads and a plurality of metal weft threads; a plurality of metal warp threads and / or a plurality of metal weft threads forming a plurality of mesh cloth openings are etched by a second etching method to form a plurality of meshes The plurality of metal warp threads and / or the plurality of metal weft threads of the cloth opening have a second wire diameter, wherein the second wire diameter is smaller than the first wire diameter; and the polymer material layer is etched by the first etching method to form a plurality of The second opening pattern, wherein the plurality of first opening patterns and the plurality of second opening patterns constitute a plurality of third opening patterns.

Furthermore, in the step of etching the plurality of metal warp threads and / or the plurality of metal weft threads that constitute the plurality of mesh openings by the second etching method, the plurality of the plurality of mesh openings constituting the plurality of mesh openings are further etched by the second etching method A plurality of metal warp threads and / or a plurality of metal weft threads, so that the plurality of metal warp threads and / or a plurality of metal weft threads constituting the plurality of mesh openings have a third wire diameter, the third wire diameter is smaller than the second wire diameter and the The first wire diameter.

Furthermore, in the step of etching the plurality of metal warp threads and / or the plurality of metal weft threads that constitute the plurality of mesh openings by the second etching method, the plurality of the plurality of mesh openings constituting the plurality of mesh openings are further etched by the second etching method One of the metal warp threads and the plurality of metal weft threads is etched to remove one of the plurality of metal warp threads and the plurality of metal weft threads that form the plurality of mesh openings.

Preferably, the predetermined tension is 10-20 Newtons.

Preferably, the material of the plurality of metal warp threads is one of stainless steel or tungsten, and the material of the plurality of metal weft threads is one of stainless steel or tungsten.

Preferably, the first etching method is laser etching, and the second etching method is chemical etching.

The embodiments of the present invention will be described in more detail below with reference to drawings and component symbols, so that those skilled in the art can implement them after studying this specification.

FIG. 1 is a schematic diagram illustrating the structure of a composite material net according to an embodiment of the invention. Please refer to FIG. 1. In an embodiment of the present invention, a screen 1 with an adjustable ink penetration amount of a mesh fabric includes a mesh frame 10, a mesh fabric 12 and a polymer material layer 14. Wherein, the mesh cloth 12 is stretched and fixed on the mesh frame 10 by a predetermined tension, and the mesh cloth 12 includes a plurality of metal warp threads 121 and a plurality of metal weft threads 123, metal warp threads 121 and metal weft threads alternately arranged up and down 123 has a first wire diameter. The polymer material layer 14 covers the mesh cloth 12, and the polymer material layer 14 includes an opening pattern 16 and an opening pattern 18. The metal warp 121 and / or metal weft 123 in the opening pattern 16 and the opening pattern 18 have a second wire diameter, and the second wire diameter is smaller than the first wire diameter, so as to increase the ink penetration of the mesh 12 Technical effect.

FIG. 2 is a schematic diagram illustrating an enlarged schematic diagram of the area A in FIG. 1. Please refer to FIGS. 1 and 2. As can be seen from FIG. 2, the opening pattern 16 includes a plurality of mesh openings 141 composed of a plurality of metal warp threads 1211 and a plurality of metal weft threads 1231, a metal warp thread 1211 and a metal weft thread 1231 It has the second wire diameter, and the second wire diameter is smaller than the first wire diameter. For example, the second wire diameter is 60% -90% of the first wire diameter. In detail, in order to achieve the technical effect of increasing the ink penetration of the mesh 12 and reducing the cost, the present invention can use the cheaper thick wire diameter metal warp 121 and metal weft 123 to weave and form the mesh 12, After that, as long as the metal warp 121 and / or metal weft 123 in the opening pattern 16 and / or the opening pattern 18 are etched using a chemical solvent such as an acid solution or an alkali solution, the metal warp 121 and / or metal weft 123 The diameter of the wire is reduced. For example, the diameter of the metal warp 121 and / or the metal weft 123 can be reduced by 60% -90% to achieve the effect of locally controlling the thickness of the wire and increasing the amount of ink penetration.

It should be understood that the numbers of metal warp 121 and metal weft 123 in FIG. 1 are only for illustrative purposes, and the larger number of metal warp 121 and metal weft 123 are shown in the enlarged schematic diagram in FIG. 2 to show more clearly Features of the invention.

It is worth mentioning that the polymer material layer 14 has resistance to acid and alkali and high tensile strength. When a chemical solvent is used to etch the metal warp 121 and / or metal weft 123 in the opening pattern 16 and / or opening pattern 18, It can protect the screen pattern 1 except for the opening pattern 16 and the opening pattern 18. Furthermore, in order to prevent the support force of the entire mesh 12 from becoming weaker when the diameters of the metal warp 1211 and the metal weft 1231 become smaller, the present invention first stretches the mesh with a predetermined tension of, for example, 10-20 Newtons The cloth 12 is fixed on the net frame 10, and this specific value of tension allows the metal warp 1211 and the metal weft 1231 to have a certain supporting force after the wire diameter becomes smaller.

On the other hand, the material of the metal warp 121 may be one of stainless steel or tungsten, and the material of the metal weft 123 may also be one of stainless steel or tungsten. When the materials of the metal warp 121 and the metal weft 123 are the same, when the chemical solvent is used for etching, the metal warp 121 and the metal weft 123 can be etched simultaneously to reduce the diameters of the metal warp 121 and the metal weft 123 at the same time. If the materials of the metal warp 121 and the metal weft 123 are different, for example, if the material of the metal warp 121 is stainless steel and the material of the metal weft 123 is tungsten, only the metal warp 121 can be etched using an acid solution, and the alkaline solution can be used Only the metal weft 123 is etched to partially reduce the wire diameter of a specific material. Furthermore, the metal warp 1211 or the metal weft 1231 can be further etched and removed by an acid solution or an alkaline solution, so that the opening pattern 16 or the opening pattern 18 includes only the metal warp 1211 or only the metal weft 1231.

In addition, in other embodiments of the present invention, the opening pattern 18 may include a plurality of metal warp threads and / or a plurality of metal weft threads (not shown in the figure) having a third wire diameter, and the third wire diameter is less than The first wire diameter and the second wire diameter. In detail, as long as a chemical solvent such as an acid solution or an alkaline solution is used to etch the metal warp 121 and / or metal weft 123 in the opening pattern 18, and the etching time is longer than that of etching the metal warp 121 and the metal warp 121 in the opening pattern 16 / Or the metal weft 123 is long, for example, the etching time of the metal warp 121 and / or the metal weft 123 in the opening pattern 16 is 5 minutes, and the etching of the metal warp 121 and / or the metal weft 123 in the opening pattern 18 is In 10 minutes, a third wire diameter smaller than the first wire diameter and the second wire diameter can be formed. In other words, in the screen structure of the present invention, the opening pattern has metal warp threads and metal weft threads of various wire diameters, so that various values of mesh opening ink permeability can be obtained. Furthermore, in other embodiments of the present invention, the single opening pattern structure of the opening pattern 16 may include metal warp threads and metal weft threads of various wire diameters. For example, the metal warp of the first part of the opening pattern 16 may be The wire and the metal weft are set to have a second wire diameter, and the metal warp and metal weft of the second portion of the opening pattern 16 are set to have a third wire diameter.

FIG. 3 is a flowchart for explaining a method for manufacturing a screen plate capable of adjusting the ink penetration amount of a mesh cloth according to an embodiment of the invention. Please refer to FIG. 3, the screen manufacturing method for adjusting the mesh ink penetration of the present invention includes steps S10-S60. Step S10 is: weaving a plurality of metal warp threads and a plurality of metal weft threads in a staggered manner to form a Mesh cloth, wherein the metal warp threads and the metal weft threads have a first wire diameter; step S20 is: stretching the metal warp threads and the metal weft threads at a predetermined tension and fixing them on a screen frame ; Step S30 is: covering the mesh with a polymer material to form a polymer material layer on the mesh; Step S40: etching the polymer material layer by a first etching method to form a plurality First opening patterns, wherein the first opening patterns include a plurality of mesh openings composed of the metal warp threads and the metal weft threads; step S50 is as follows: the second etching method is used to form the openings The metal warp threads and / or the metal weft threads of the mesh opening make the metal warp threads and / or the metal weft threads constituting the mesh opening have a second wire diameter, wherein the second thread The diameter is smaller than the first wire diameter; and step S60 is: etching the polymer material layer by the first etching method to form a plurality of second opening patterns, wherein the first opening patterns and the second opening patterns Form a plurality of third opening patterns.

Now, each step will be described in detail with the screen schematic. FIG. 4 is a schematic diagram illustrating a screen structure with an adjustable mesh penetration that does not include an opening pattern according to an embodiment of the invention. Please refer to FIG. 3 and FIG. 4, after completing steps S10-S30, the structure of the screen 2 shown in FIG. 4 can be obtained. The screen 2 includes a plurality of metal warp threads 221 and a plurality of metal weft threads 223 interlaced up and down A mesh 22 formed by weaving, and the metal warp 221 and the metal weft 223 of the mesh 22 are stretched and fixed on a mesh frame 20 with a predetermined tension, and at the same time, can be covered with a polymer material The mesh fabric 22 to form a polymer material layer 24 on the mesh fabric 22.

On the other hand, in step S30, the polymer material used in the polymer material layer 24 is PET, PE, PI, PU, PVC, PP, PTFE, PMMA, PS or other high One of the molecular synthetic materials. In addition, in an embodiment of the present invention, a polymer material in the form of a film can be combined with the mesh fabric 22 by thermocompression bonding, so that the polymer material coats the mesh fabric 22 and forms a polymer material layer 24; or, By using the polymer material as a film, a layer of glue is applied on the polymer material or on the mesh fabric 22, and then the mesh fabric 22 and the polymer material are adhered and combined through the glue to make the high The molecular material coats the mesh fabric 22 to form the polymer material layer 24. In other embodiments of the present invention, the polymer material and the mesh fabric 22 in liquid form may be wet coated, slot coated, dipped coating, spin coating, spray coating or slit In one of the two methods, the polymer material is covered with the mesh fabric 22, and the polymer material layer 24 is formed.

FIG. 5 is a schematic diagram illustrating a screen structure with an adjustable mesh ink penetration amount including a first opening pattern according to an embodiment of the invention. 3 and 5, in step S40, the polymer material layer 24 may be etched by a first etching method to form a plurality of first opening patterns 26, wherein the first opening patterns 26 include metal warp A plurality of mesh openings 241 formed by 221 and metal wefts 223. Next, in step S50, the metal warp 221 and / or metal weft 223 constituting the mesh opening 241 can be etched by a second etching method, so that the metal warp 221 and / or metal weft 223 constituting the mesh opening 241 has A second wire diameter, wherein the second wire diameter is smaller than the first wire diameter. In addition, the related descriptions of the etching of the metal warp 221 and the metal weft 223 have been described above, and will not be repeated here.

FIG. 6a is a schematic diagram illustrating a screen structure with an adjustable mesh ink penetration amount including a first opening pattern and a second opening pattern according to an embodiment of the invention. 3 and 6a, in step S60, the polymer material layer 24 may be etched by the first etching method to form a plurality of second opening patterns 28, wherein the first opening pattern 26 and the second opening pattern 28 A third opening pattern may be further formed, that is, the third opening pattern representing the overall opening pattern includes a first opening pattern 26 etched to have a finer warp and weft thread diameter and a second opening pattern not etched to have a general warp and weft thread diameter Open pattern 28.

FIG. 6b is a schematic diagram illustrating the enlarged structure of area B in FIG. 6a. Please refer to FIG. 6b. As can be clearly seen from FIG. 6b, in the first opening pattern 26, the metal warp 2211 and / or the metal weft 2231 constituting the mesh opening 241 have a second wire diameter, and the second opening pattern 28 In this case, the metal warp 221 and / or the metal weft 223 constituting the mesh opening 241 have a first wire diameter, and the second wire diameter is thinner than the first wire diameter. In this way, the first opening pattern 26 will have a larger amount of ink penetration than the second opening pattern 28 to achieve the purpose of locally controlling the amount of ink penetration. The user can adjust the thickness of the wire diameter in the first opening pattern 26 and the second opening pattern 28 according to requirements, that is, the wire diameter in the second opening pattern 28 can be thin.

It should be understood that the numbers of the metal warp threads 221 and the metal weft threads 223 in FIG. 6a are only schematic, and the larger number of metal warp threads 221 and the metal weft threads 223 are shown in the enlarged schematic diagram in FIG. 6b to show more clearly Features of the invention.

On the other hand, in the manufacturing method of the present invention, the first etching method is an etching method that only etches the polymer material layer 24, such as laser etching or other etching methods having the same effect, by laser or other etching The method first cuts out the graphics of different wire diameters required, and in the subsequent steps cuts out the graphics of another part of the overall pattern. The second etching method is an etching method that only etches the metal warp 221 and / or the metal weft 223, such as chemical etching or other etching methods having the same effect, to etch the metal by a chemical solvent such as acid or alkali Warp and / or metal weft to reduce the diameter of metal warp and / or metal weft.

In addition, in another embodiment of the present invention, in step S50, the following step may be further included: etching the metal warp threads and / or the metal weft threads constituting the mesh openings by the second etching method, The metal warp threads and / or the metal weft threads constituting the openings of the mesh cloth have a third thread diameter, which is smaller than the second thread diameter and the first thread diameter. For example, in step S50, the metal warp 221 and / or the metal weft 223 in the plurality of first opening patterns 26 may be etched first, and the etching time may be 5 minutes to form a second wire diameter. Metal warp 2211 and / or metal weft 2231. After that, the metal warp threads 221 and / or metal weft threads 223 in the plurality of first opening patterns 26 are etched again, and the etching time is, for example, 10 minutes to form metal warp threads and / or metal weft threads with a third wire diameter (Not shown in the figure). By analogy, as long as the etching time is further extended, metal warp and / or metal weft wires having other wire diameters smaller than the first wire diameter, the second wire diameter, and the third wire diameter can be formed.

One method of etching the plurality of first opening patterns 26 to form the third wire diameter is to first etch the first set of first opening patterns 26 by a first etching method such as laser etching, and then use a chemical etching method, for example. The second etching method etches the metal warp 221 and / or the metal weft 223 in the first opening pattern 26 of the first group. The etching time is, for example, 5 minutes. After that, the second group of first opening patterns 26 is etched by the first etching method, and the metal groups in the first group of first opening patterns 26 and the second group of first opening patterns 26 are simultaneously etched by the second etching method. For the wire 221 and / or the metal weft 223, the etching time is, for example, 5 minutes. In this way, the etching time of the metal warp 221 and / or metal weft 223 in the first set of first opening patterns 26 is 10 minutes in total, and a metal warp and / or metal weft with a third wire diameter can be obtained, and The etching time of the metal warp threads 221 and / or metal weft threads 223 in the second set of first opening patterns 26 is 5 minutes in total, and the metal warp threads 2211 and / or metal weft threads 2231 that obtain the second wire diameter can be obtained, and the The third wire diameter is smaller than the second wire diameter.

Another method of etching a plurality of opening patterns 26 to form a third wire diameter is to first etch the first set of first opening patterns 26 by a first etching method such as laser etching, and then use a second method such as chemical etching The metal warp 221 and / or metal weft 223 in the first opening pattern 26 of the first group is etched by etching, the etching time is, for example, 5 minutes, to form the metal warp 2211 and / or metal weft 2231 having a second wire diameter, Then, a first set of first opening patterns 26 can be filled with an acid and alkali resistant emulsion. After that, the second set of first opening patterns 26 can be etched by the first etching method, and then the metal warp 221 and / or metal weft lines 223 in the second set of first opening patterns 26 can be etched by the second etching method. The etching time is, for example, 10 minutes to form a metal warp and / or metal weft with a third wire diameter, and the third wire diameter is smaller than the second wire diameter. At this time, since the first group of first opening patterns 26 is filled with the acid-resistant alkali emulsion, the metal in the first group of first opening patterns 26 is not etched when the second group of first opening patterns 26 is etched Warp 2211 and / or metal weft 2231.

It can be seen from the above method that the present invention can form metal warp threads and metal weft threads with various wire diameters in the opening pattern of the screen through a special manufacturing method, so that various values of mesh opening ink permeability can be obtained.

In addition, in yet another embodiment of the present invention, in step S50, the following step may be further included: etching one of the metal warp threads and the metal weft threads constituting the mesh openings by the second etching method First, one of the metal warp threads and the metal weft threads constituting the openings of the mesh cloth is removed by etching. For example, the material of the metal warp 221 may be one of stainless steel or tungsten, and the material of the metal weft 223 may also be one of stainless steel or tungsten. If the materials of the metal warp 221 and the metal weft 223 are different, for example, if the material of the metal warp 221 is stainless steel and the material of the metal weft 223 is tungsten, only the diameter of the metal warp 221 can be reduced by using an acid solution, or Further removing the metal warp threads 221, and using an alkaline solution, it is only possible to etch and reduce the wire diameter of the metal weft thread 223, or to further remove the metal weft thread 223, to locally reduce or remove the wire diameter of a specific material, and increase the amount of ink penetration.

7a is a schematic diagram for explaining another embodiment of the present invention including a first opening pattern and a second opening pattern adjustable mesh ink screen structure; FIG. 7b is a schematic diagram for explaining FIG. 7a The enlarged structure of the middle area C. Please refer to FIGS. 7 a and 7 b. In another embodiment of the present invention, the screen 3 with adjustable ink penetration amount of the mesh includes a mesh frame 30, a mesh 32 and a polymer material layer 34. Among them, the mesh cloth 32 is stretched and fixed on the mesh frame 30 by a predetermined tension, and the mesh cloth 32 includes a plurality of metal warp threads 321 and a plurality of metal weft threads 323 which are alternately arranged up and down and are perpendicular to each other, and the metal warp threads 321 and metal weft 323 have a first wire diameter. The polymer material layer 34 covers the mesh cloth 32, and the polymer material layer 34 includes a plurality of first opening patterns 36 and a plurality of second opening patterns 38. It is worth mentioning that in this embodiment, the metal warp threads 321 in the first opening pattern 36 are etched and removed by a chemical solvent such as acid or alkaline solution, and the diameter of the metal weft 323 is etched to become A two-wire diameter metal weft 3231, and the second wire diameter is smaller than the first wire diameter, so as to increase the amount of ink penetration of the mesh cloth 32.

As can be clearly seen from the enlarged structure of FIG. 7b, the wire diameter of the metal weft 3231 in the first opening pattern 36 is obviously thinner than that of the metal weft 323, and the metal warp 321 is not included in the first opening pattern 36, so that it can be controlled The amount of ink penetration of the first opening pattern 36 is maximized.

It should be understood that the numbers of the metal warp threads 321 and the metal weft threads 323 in FIG. 7a are only schematic, and the larger number of metal warp threads 321 and the metal weft threads 323 will be shown in the enlarged schematic diagram of FIG. Features of the invention.

In summary, the present invention successfully provides a screen that can adjust the ink penetration of the mesh and its manufacturing method. In the screen structure of the present invention, the lines of the metal warp and weft lines in the opening pattern on the screen can be locally controlled The thickness of the diameter is such that the metal warp and weft in the opening pattern has a thinner wire diameter to further increase the amount of ink penetration in the opening pattern.

The above are only for explaining the preferred embodiments of the present invention, and are not intended to limit the present invention in any form, so that any modifications or changes made to the present invention under the same spirit of the invention , Should still be included in the scope of protection of the present invention.

1, 2, 3 ‧‧‧ online version

10, 20, 30 ‧‧‧ frame

12, 22, 32 ‧‧‧ mesh

14, 24, 34‧‧‧‧ Polymer material layer

16, 18‧‧‧ opening pattern

26、36‧‧‧First opening pattern

28、38‧‧‧Second opening pattern

121, 1211, 221, 2211, 321, 3211‧‧‧‧Metal warp

123, 1231, 223, 2231, 323, 3231‧‧‧Metal weft

141, 241‧‧‧ Mesh opening

S10-S60‧‧‧Step

A, B, C

After reading the detailed description below with reference to the accompanying drawings, those with ordinary knowledge in the art can have a better understanding of the various aspects of the present invention, as well as their specific features and advantages. Among them, the drawings include: FIG. 1 is an illustration FIG. 2 is a schematic diagram illustrating an enlarged structure of an area A in FIG. 1; FIG. 3 is a schematic diagram illustrating an adjustable mesh ink penetration of an embodiment of the present invention; FIG. Figure 4 is a schematic diagram of a screen structure illustrating an embodiment of the present invention that does not include the opening pattern of the adjustable mesh ink penetration amount; Figure 5 is an embodiment of the present invention including the first Schematic diagram of a screen structure with adjustable mesh ink penetration of an opening pattern; FIG. 6a is a schematic diagram of a screen structure with adjustable mesh ink penetration including a first opening pattern and a second opening pattern according to an embodiment of the invention; 6b is a schematic diagram illustrating an enlarged structure of area B in FIG. 6a; FIG. 7a is a schematic diagram illustrating a screen structure of an adjustable mesh that includes a first opening pattern and a second opening pattern according to another embodiment of the present invention; and 7b is an enlarged schematic diagram illustrating the area C in FIG. 7a.

Claims (10)

A screen plate capable of adjusting the ink permeability of a mesh cloth, comprising: a mesh frame; a mesh cloth, which is stretched and fixed on the mesh frame by a predetermined tension and comprises a plurality of metal warp threads and a plurality of strips arranged alternately up and down Metal weft threads, the metal warp threads and the metal weft threads have a first wire diameter; a polymer material layer covering the mesh, and the polymer material layer includes a plurality of opening patterns, wherein, in the opening patterns Including a plurality of mesh openings composed of the metal warp threads and the metal weft threads, the metal warp threads and / or the metal weft threads constituting the mesh openings have a second wire diameter, and the second The wire diameter is smaller than the first wire diameter. The screen according to item 1 of the patent application scope, wherein the metal warp threads and / or the metal weft threads that form the mesh openings further have a third thread diameter, and the third thread diameter is smaller than the second Wire diameter and the first wire diameter. The screen according to item 1 of the patent application scope, wherein the predetermined tension is 10-20 Newtons. The screen according to item 1 of the patent application scope, wherein the material of the metal warp threads is one of stainless steel or tungsten, and the material of the metal weft threads is one of stainless steel or tungsten. A screen manufacturing method capable of adjusting the ink penetration of a mesh cloth includes the following steps: weaving a plurality of metal warp threads and a plurality of metal weft threads in a staggered manner to form a mesh cloth, wherein the metal warp threads And the metal weft threads have a first wire diameter; the metal warp threads and the metal weft threads are stretched at a predetermined tension and fixed on a mesh frame; the mesh cloth is covered with a polymer material, Forming a polymer material layer on the mesh cloth; etching the polymer material layer by a first etching method to form a plurality of first opening patterns, wherein the first opening patterns include the metal warp And a plurality of mesh openings formed by the metal wefts; by etching the metal warp threads and / or the metal wefts forming the mesh openings by a second etching method, the The metal warp wires and / or the metal weft wires have a second wire diameter, wherein the second wire diameter is smaller than the first wire diameter; and the polymer material layer is etched by the first etching method to form a plurality of The second opening pattern, wherein the first opening pattern and the second opening pattern constitute a plurality of third opening patterns. According to the screen-making method described in item 5 of the patent application scope, in the step of etching the metal warps and / or the metal wefts forming the mesh openings by the second etching method, further by The second etching method etches the metal warp threads and / or metal weft threads that constitute the mesh openings so that the metal warp threads and / or metal weft threads that constitute the mesh openings have a third thread Diameter, the third wire diameter is smaller than the second wire diameter and the first wire diameter. According to the screen-making method described in item 5 of the patent application scope, in the step of etching the metal warps and / or the metal wefts forming the mesh openings by the second etching method, further by The second etching method etches one of the metal warp threads and the metal weft threads that constitute the mesh openings to etch and remove one of the metal warp threads and the metal weft threads that constitute the mesh openings one. The screen production method according to item 5 of the patent application scope, wherein the predetermined tension is 10-20 Newtons. According to the screen production method described in item 5 of the patent application scope, the material of the metal warp threads is one of stainless steel or tungsten, and the material of the metal weft threads is one of stainless steel or tungsten. According to the screen-making method described in item 5 of the patent application scope, the first etching method is laser etching, and the second etching method is chemical etching.