TWI647343B - Apparatus and method for electroplating or electropolishing bracts - Google Patents

Abstract

The invention discloses a device for improving electroplating rate or electropolishing removal rate, and ensuring uniformity of electroplating or electropolishing, in particular, electroplating or electropolishing cymbal for ensuring uniformity of electroplating or electropolishing of outer edge of cymbal sheet and method. The device includes a cymbal clip, an auxiliary showerhead device and a main showerhead device. The cymbal clip holds the cymbal and moves and rotates horizontally. The cymbal clip is provided with an electrode, a metal ring and an insulating ring between the metal ring and the electrode. The auxiliary nozzle device comprises a liquid supply tube, and the liquid supply tube is provided with a plurality of nozzles, and the nozzle sprays the electrolyte on the outer edge of the cymbal sheet and the cymbal clip, so that the outer edge of the cymbal sheet is always between the electrodes of the cymbal clip. Covered by electrolyte. The main nozzle device includes an electric conductor and an insulating nozzle. The electric conductor has a fixing portion and a receiving portion. The insulating nozzle has a cover and a liquid ejecting tube. The liquid ejecting tube is received in the receiving portion of the electric conductor and passes through the receiving portion of the electric conductor. A first gap is formed between the inner circumferential surface of the receiving portion and the outer circumferential surface of the liquid ejecting tube, and the cover is located above the fixing portion of the electric conductor, and a second gap is formed between the covering portion and the fixing portion of the electric conductor.

Description

Apparatus and method for electroplating or electropolishing bracts

The present invention relates to the field of integrated circuit fabrication, and more particularly to an apparatus and method for electroplating or electropolishing a cymbal.

Nowadays, integrated circuits have become the basis for informationization and intelligence in all walks of life, and the application of integrated circuits is everywhere. In the semiconductor industry, most applications are based on germanium integrated circuits. In order to form the electronic circuit of the integrated circuit, the ruthenium is usually subjected to several processes such as masking, etching, plating, polishing, and the like.

With the rapid development of the electronics industry, higher requirements are placed on the miniaturization, low power consumption and high reliability of electronic products. Accordingly, the function of the integrated circuit, which is a key component of an electronic product, needs to be further improved to meet the requirements of electronic products. The function of the integrated circuit can be improved by reducing the feature size of the integrated circuit. In fact, semiconductor technology has been developed to date, and the feature size of integrated circuits has been reduced to 25 nm or less. However, one potential limiting factor in the development of more powerful integrated circuits is the increasing signal delay in the interconnect. As the feature size of the integrated circuit continues to decrease, the interconnect density on the integrated circuit also increases accordingly. However, the tighter proximity of the individual interconnects increases the inter-line capacitance of the interconnect, resulting in a larger interconnect Signal delay. It has been found that the interconnect delay increases as the square of the feature size decreases. Conversely, the gate delay increases linearly as the feature size decreases.

One conventional method of compensating for this increase in interconnect delay is to add more layers of metal. However, one of the drawbacks of this is that the production cost is increased, and the increased metal layer generates extra heat, which is detrimental to the performance and reliability of the integrated circuit. Therefore, the semiconductor industry has begun to use copper instead of aluminum to make metal interconnects. One advantage of copper is that it has a higher electrical conductivity than aluminum, and copper is less affected by electromigration than aluminum. However, new processes are needed before copper can be widely used for interconnection. More specifically, a copper layer is deposited on the ruthenium using an electroplating process, and an excess copper layer on the ruthenium is removed using an electropolishing process to form a copper interconnect structure. In the electroplating or electropolishing process, the cymbal is fixed on the cymbal clip, and the electrolyte is sprayed on the cymbal through the nozzle. Common electroplating or electropolishing devices use smaller nozzles for the purpose of ensuring plating or electropolishing uniformity. However, small sized showerheads result in lower plating rates or electropolishing removal rates. In order to increase the plating rate or the removal rate of electropolishing, if the size of the head is simply increased without further improvement, the plating or electropolishing uniformity of the outer edge of the sheet is found to be poor in the actual process. How to improve the plating rate or the removal rate of electropolishing, and to ensure the uniformity of electroplating or electropolishing, especially to ensure the uniformity of electroplating or electropolishing of the outer edge of the crotch, is a technical problem to be solved by the present invention.

It is an object of the invention to provide an electroplated or electropolished bract The device and method can not only improve the plating rate or the electropolishing removal rate, but also ensure the uniformity of electroplating or electropolishing, especially to ensure the uniformity of plating or electropolishing of the outer edge of the cymbal.

In accordance with an embodiment of the present invention, the proposed apparatus for electroplating or electropolishing a cymbal includes a cymbal clip, an auxiliary showerhead assembly, and a main showerhead assembly. The cymbal clip holds the cymbal, and the cymbal clip moves horizontally and rotates. The cymbal clip is provided with an electrode, a metal ring adjacent to the outer edge of the cymbal and an insulating ring between the metal ring and the electrode. The auxiliary nozzle device comprises a liquid supply tube, and the liquid supply tube is provided with a plurality of nozzles, and the nozzle sprays the electrolyte on the outer edge of the cymbal sheet and the cymbal clip, so that the outer edge of the cymbal sheet is always between the electrodes of the cymbal clip. Covered by electrolyte. The main nozzle device includes an electric conductor and an insulating nozzle. The electric conductor has a fixing portion and a receiving portion. The insulating nozzle has a cover and a liquid ejecting tube. The liquid ejecting tube is received in the receiving portion of the electric conductor and passes through the receiving portion of the electric conductor. A first gap is formed between the inner circumferential surface of the receiving portion and the outer circumferential surface of the liquid ejecting tube, and the cover is located above the fixing portion of the electric conductor, and a second gap is formed between the covering portion and the fixing portion of the electric conductor.

In accordance with an embodiment of the present invention, the proposed apparatus for electroplating or electropolishing a cymbal includes a cymbal clip, an auxiliary showerhead assembly, and a main showerhead assembly. The cymbal clip holds the cymbal and the cymbal clip moves horizontally and rotates. The auxiliary nozzle device comprises a liquid supply pipe which is made of a conductive metal and is used as an auxiliary electrode. The liquid supply pipe is provided with a plurality of nozzles which spray the electrolyte on the outer edge of the blade. The main nozzle device includes an electric conductor and an insulating nozzle. The electric conductor has a fixing portion and a receiving portion. The insulating nozzle has a cover and a liquid ejecting tube. The liquid ejecting tube is received in the receiving portion of the electric conductor and passes through the receiving portion of the electric conductor. Receiving A first gap is formed between the inner circumferential surface of the portion and the outer circumferential surface of the liquid ejecting tube, and the cover is located above the fixing portion of the electric conductor, and a second gap is formed between the covering portion and the fixing portion of the electric conductor.

In accordance with an embodiment of the present invention, a proposed apparatus for electroplating or electropolishing a cymbal includes a cymbal clip, a main chamber, an auxiliary chamber, an auxiliary head unit, a main head unit, and a protective cover. The cymbal clip holds the cymbal, and the cymbal clip moves horizontally and rotates. The cymbal clip is provided with an electrode, a metal ring adjacent to the outer edge of the cymbal and an insulating ring between the metal ring and the electrode. The auxiliary chamber is spaced apart from the main chamber. The auxiliary nozzle device is located in the auxiliary chamber, and the auxiliary nozzle device has a liquid supply tube, and the nozzle is provided with a plurality of nozzles. The main nozzle device is located in the main chamber, the main nozzle device comprises a conductor and an insulating nozzle, the conductor has a fixing portion and a receiving portion, the insulating nozzle has a cover and a liquid discharge tube, and the liquid discharge tube is received in the receiving portion of the electric conductor and is electrically connected The receiving portion is pierced, and a first gap is formed between the inner circumferential surface of the receiving portion of the electric conductor and the outer circumferential surface of the liquid ejecting tube, and the cover is located above the fixing portion of the electric conductor to cover the fixing portion with the electric conductor. A second gap is formed. The protective cover includes a circular portion disposed in the main chamber and surrounding the main shower head device, the rectangular portion is disposed in the auxiliary chamber and covers the auxiliary nozzle device, and the rectangular portion is provided with an injection window, and the electrolyte is The spray window is sprayed onto the outer edge of the cymbal and the cymbal clip such that the area between the outer edge of the cymbal and the electrode of the cymbal clip is always covered by the electrolyte.

In accordance with an embodiment of the present invention, a proposed apparatus for electroplating or electropolishing a cymbal includes a cymbal clip, a main chamber, an auxiliary chamber, an auxiliary head unit, a main head unit, and a protective cover. The cymbal clip holds the cymbal, and the cymbal clips the water. Move and rotate flat. The auxiliary chamber is spaced apart from the main chamber. The auxiliary nozzle device is located in the auxiliary chamber, and the auxiliary nozzle device has a liquid supply tube, and the nozzle is provided with a plurality of nozzles. The main nozzle device is located in the main chamber, the main nozzle device comprises a conductor and an insulating nozzle, the conductor has a fixing portion and a receiving portion, the insulating nozzle has a cover and a liquid discharge tube, and the liquid discharge tube is received in the receiving portion of the electric conductor and is electrically connected The receiving portion is pierced, and a first gap is formed between the inner circumferential surface of the receiving portion of the electric conductor and the outer circumferential surface of the liquid ejecting tube, and the cover is located above the fixing portion of the electric conductor to cover the fixing portion with the electric conductor. A second gap is formed. The protective cover includes a circular portion disposed in the main chamber and surrounding the main shower head device, the rectangular portion is disposed in the auxiliary chamber and covers the auxiliary nozzle device, and the rectangular portion is provided with an injection window, and the electrolyte is The spray window is sprayed to the outer edge of the cymbal, the protective cover further comprises a conductive metal, the conductive metal is provided with a window corresponding to the spray window, the conductive metal is fixed on the rectangular portion at the spray window, and the conductive metal is used as the auxiliary electrode. When the electrolyte is ejected from the ejection window, the conductive metal charges the electrolyte.

According to one embodiment of the invention, a method of electroplating or electropolishing a cymbal includes: securing a cymbal to a cymbal clip; horizontally moving and rotating the cymbal clip; supplying a charged electrolyte to the surface of the cymbal, and At the same time, an uncharged or charged electrolyte is supplied to cover the outer edge of the cymbal and the cymbal clip to form electrical conduction between the outer edge of the cymbal and the power source.

In summary, the present invention ensures that the outer edge of the cymbal sheet and the power source are always kept conductive during the electroplating or electropolishing process by supplying an uncharged or charged electrolyte to the outer edge of the cymbal. A stable electrical connection is formed between the outer edge and the power source, thereby increasing the outer edge of the cymbal Edge plating or electropolishing uniformity and reducing the electrical resistance of the device. In addition, the inner diameter of the spray pipe of the main showerhead device is large, which improves the efficiency of electroplating or electropolishing.

110‧‧‧矽 clip

111‧‧‧Electrode

112‧‧‧Metal ring

113‧‧‧Insulation ring

114‧‧‧Rotary axis

120‧‧‧ Picture

130‧‧‧ beams

140‧‧‧Auxiliary nozzle device

141‧‧‧liquid supply pipe

142‧‧‧ nozzle

150‧‧‧Main nozzle device

151‧‧‧ base

152‧‧‧Connecting Department

153‧‧‧ Keeping Department

154‧‧‧Electrical conductor

155‧‧‧Insulated nozzle

156‧‧‧First gap

157‧‧‧Second gap

210‧‧‧矽 clip

211‧‧‧electrode

212‧‧‧Metal ring

213‧‧‧Insulation ring

214‧‧‧Rotary axis

220‧‧‧ Picture

240‧‧‧Auxiliary nozzle device

241‧‧‧ Liquid supply tube

242‧‧‧Nozzles

250‧‧‧Main nozzle device

260‧‧‧ protective cover

261‧‧‧Circular

262‧‧‧Rectangle

263‧‧‧Spray window

264‧‧‧slit

265‧‧‧ side wall

266‧‧‧first groove

267‧‧‧second groove

270‧‧ ‧ wall

280‧‧‧main chamber

290‧‧‧Auxiliary chamber

310‧‧‧矽 clip

311‧‧‧electrode

312‧‧‧Metal ring

313‧‧‧Insulation ring

314‧‧‧Rotary axis

320‧‧‧ Picture

340‧‧‧Auxiliary nozzle device

350‧‧‧Main nozzle device

360‧‧‧ protective cover

361‧‧‧Circular

362‧‧‧Rectangle

363‧‧‧Spray window

364‧‧‧Slit

341‧‧‧liquid supply tube

342‧‧‧Nozzle

370‧‧‧The wall

380‧‧‧ main chamber

390‧‧‧Auxiliary chamber

460‧‧‧ protective cover

461‧‧‧round

462‧‧‧Rectangle

463‧‧‧Spray window

464‧‧‧slit

468‧‧‧Conductive metal

560‧‧‧ protective cover

561‧‧‧Circular

562‧‧‧Rectangle

563‧‧‧Spray window

564‧‧‧Slit

568‧‧‧Conductive metal

1541‧‧‧Fixed Department

1542‧‧‧ Receiving Department

1551‧‧‧ Cover

1552‧‧‧Dip tube

1553‧‧‧ channel

1554‧‧‧Flow adjustment ring

Fig. 1 is a schematic view showing the structure of an apparatus for electroplating or electropolishing a ruthenium according to a first embodiment of the present invention.

Figure 2 shows a schematic view of the structure of the cymbal clip and the auxiliary head device in the working state.

Figure 3 is a block diagram showing the structure of the cymbal clip and the auxiliary head device in an idle state.

Figure 4 illustrates a bottom view of the cymbal clip and auxiliary nozzle assembly in an operational state.

Figure 5 illustrates a bottom view of the cymbal clip and the auxiliary showerhead assembly in an idle state.

Figure 6 shows a schematic view of the structure of the main showerhead device.

Figure 7 illustrates a top view of the main showerhead assembly.

Fig. 8 is a view showing the structure of the nozzle of the main head unit.

Figure 9 shows a schematic cross-sectional view of the nozzle.

Fig. 10 discloses a partial enlarged view of a portion A in Fig. 9.

Figure 11 is a view showing the structure of an apparatus for electroplating or electropolishing a ruthenium according to a second embodiment of the present invention.

Figure 12 illustrates a top view of the apparatus for electroplating or electropolishing the cymbal of Figure 11 after concealing the cymbal clip.

Figure 13 discloses a top view of the protective cover of Figure 11.

Figure 14 is a cross-sectional view along line A-A of Figure 12.

Figure 15 illustrates a top view of the apparatus for electroplating or electropolishing the cymbal of Figure 11 after concealing the cymbal clip and the protective cover.

Figure 16 is a view showing the structure of an apparatus for electroplating or electropolishing a ruthenium according to a third embodiment of the present invention.

Figure 17 illustrates a top view of the apparatus for electroplating or electropolishing the cymbal of Figure 16 after concealing the cymbal clip.

Figure 18 illustrates a top view of the protective cover of Figure 16.

Figure 19 illustrates a top view of the apparatus for electroplating or electropolishing the cymbal of Figure 16 after concealing the cymbal clip and the protective cover.

Figure 20 illustrates a top view of another embodiment of a protective cover.

Figure 21 illustrates a top view of yet another embodiment of a protective cover.

The details of the technical contents, structural features, objects and effects of the present invention will be described in detail below with reference to the embodiments.

Referring to Figures 1 to 5, the structure of the apparatus for electroplating or electropolishing the cymbal of the first embodiment of the present invention is disclosed. The device performs electroplating or electropolishing on the cymbal based on electrochemical principles. The device includes a cymbal clip 110 that holds the cymbal 120. In one embodiment, the cymbal clip 110 is a vacuum clamp. An electrode 111 is disposed on the cymbal clip 110. Preferably, the electrode 111 is annular and surrounds the periphery of the outer edge of the cymbal 120. When electroplating, electrode 111 and The cathode of the power source is electrically connected; when electropolishing, the electrode 111 is electrically connected to the anode of the power source. The electrode 111 and the cymbal 120 are electrically connected to each other through the electrolyte. The electrical connection between the cymbal 120 and the power source is achieved by means of the electrode 111 and the electrolyte, as will be explained in more detail below.

During the electroplating or electropolishing process, metal, in particular copper, tends to accumulate on the outer edge of the cymbal 120, resulting in reduced plating or electropolishing uniformity, particularly plating or electropolishing uniformity of the outer edge of the cymbal 120. Poor. In order to solve the technical problem, the cymbal clip 110 is provided with a metal ring 112 which is adjacent to the outer edge of the cymbal 120. Between the metal ring 112 and the electrode 111, the cymbal holder 110 is further provided with an insulating ring 113. The insulating ring 113 separates the metal ring 112 from the electrode 111, and is intended to prevent the metal ring 112 from being electrically connected to the electrode 111. The diameter of the electrode 111 is larger than the diameter of the metal ring 112, and therefore, the electrode 111 surrounds the insulating ring 113 and the metal ring 112.

The cymbal clip 110 has a rotating shaft 114. The rotating shaft 114 is rotatable about its own central axis, thereby causing the cymbal clip 110 to rotate about the central axis of the cymbal clip 110 itself. The top end of the rotating shaft 114 is mounted on a beam 130 above the cymbal clip 110, as shown in FIG. The beam 130 moves horizontally, thereby causing the cymbal clip 110 to move horizontally.

During the electroplating or electropolishing process, the cymbal clip 110 is horizontally moved with the beam 130, and at the same time, the cymbal clip 110 is also rotated about its own central axis. Therefore, the electrolyte sprayed on the cymbal 120 acts as a centrifugal force. The lower surface of the cymbal sheet 120 and the cymbal clip 110 is covered to form an electrolyte film on the surfaces of the cymbal 120 and the cymbal clip 110. The electrode 111 on the cymbal clip 110 and the cymbal piece 120 are electrically connected by the electrolyte film, and the current is mainly Flowing from the surface of the cymbal 120 achieves plating or electropolishing of the cymbal 120. However, in the actual process, when the outer edge of the cymbal sheet 120 is plated or electropolished, it is possible that the electrolyte is directly detached from the surface of the cymbal sheet 120 and the electrolyte cannot be formed on the surfaces of the cymbal sheet 120 and the cymbal sheet holder 110. The film, the electrical connection between the electrode 111 on the cymbal clip 110 and the cymbal 120 is occasionally broken, resulting in poor outer plating or electropolishing uniformity of the cymbal 120. In order to improve the outer edge plating or electropolishing uniformity of the cymbal 120, the present invention provides an auxiliary showerhead assembly 140. In one embodiment, the auxiliary showerhead assembly 140 is mounted on a beam 130 that is horizontally movable with the beam 130, maintaining a constant spacing between the auxiliary showerhead assembly 140 and the outer edge of the jaw clamp 110 to prevent obstruction. The clip 110 rotates. The auxiliary nozzle device 140 has a liquid supply tube 141. The liquid supply tube 141 is provided with a plurality of small nozzles 142 arranged in a row. The nozzle 142 sprays an electrolyte onto the outer edge of the cymbal 120 and the cymbal holder 110. Or during electropolishing, the area between the outer edge of the cymbal 120 and the electrode 111 can always be covered by the electrolyte. In one embodiment, the supply tube 141 is coupled to a separate liquid supply system so that the flow rate of electrolyte within the supply tube 141 can be independently controlled. The auxiliary showerhead device 140 is rotated in a horizontal plane under the driving of a driving device such as a motor or a cylinder. Specifically, when the cymbal 120 is electroplated or electropolished, the auxiliary showerhead device 140 is rotated by 90 degrees, and the liquid supply tube 141 is parallel to the cymbal 120. In the direction of horizontal movement, the liquid supply tube 141 is located below the crotch clamp 110, and the nozzle 142 is opposed to the outer edge of the crotch panel 120 and the crotch clamp 110, as shown in Figs. 1, 2 and 4. When the electroplating or electropolishing process is finished, the auxiliary head device 140 is inverted by 90 degrees, the liquid supply tube 141 is perpendicular to the horizontal movement direction of the crotch panel 120, and stops toward the crotch panel 120. The outer edge and the cymbal clip 110 supply electrolyte, as shown in Figures 3 and 5.

Referring to FIGS. 6-10, the main showerhead device 150 is disposed below the cymbal clamp 110 to eject the charged electrolyte to the surface of the cymbal 120. The main showerhead assembly 150 has a base 151 through which the main showerhead assembly 150 is secured within an electroplating or electropolishing chamber. The connecting portion 152 is located on the upper surface of the base 151. A cylindrical, hollow retaining portion 153 is located on the upper surface of the connecting portion 152. The base portion 151, the connecting portion 152, and the holding portion 153 are all made of an insulating material and are not corroded by the electrolyte or chemically reacted with the electrolyte. The holding portion 153 receives the conductor 154 which is made of a material having good conductivity and is not corroded by the electrolyte and does not chemically react with the electrolyte. The material may be, for example, stainless steel or aluminum alloy. . The conductor 154 includes a fixing portion 1541 fixed to the upper surface of the holding portion 153 and a cylindrical, hollow receiving portion 1542 that is connected to the fixing portion 1541 and housed in the holding portion 153. During electroplating, the electrical conductor 154 is electrically connected to the anode of the power source; during electropolishing, the electrical conductor 154 is electrically connected to the cathode of the power source.

The main head unit 150 has an insulating nozzle 155 having a disc-shaped cover 1551 and a liquid discharge tube 1552 which passes through the center of the cover 1551. The upper jaw of the liquid ejecting tube 1552 is defined as an ejection port from which the electrolyte is ejected to the surface of the crotch panel 120. In one embodiment, the shape of the injection port is circular. The shape of the ejection opening may vary depending on the needs of the electroplating or electropolishing process, and is not limited to a circular shape, and may be, for example, a triangle, a square, a hexagon, an octagon, or the like. The liquid ejecting tube 1552 is housed in the receiving portion 1542 of the electric conductor 154 and receives the receiving portion from the electric conductor 154. Wear out in 1542. A first gap 156 is formed between the inner circumferential surface of the receiving portion 1542 of the electrical conductor 154 and the outer circumferential surface of the liquid discharge tube 1552. The cover 1551 is located above the fixing portion 1541 of the conductor 154, and a second gap 157 is formed between the cover 1551 and the fixing portion 1541 of the conductor 154. The side wall of the spray pipe 1552 is provided with a plurality of passages 1553, each of which is inclined. Specifically, the highest point of the inner port of each passage 1553 is lower than the lowest point of the outer port of the passage 1553. Based on the particular design of channel 1553 and adjusting the pressure of the electrolyte within the spray tube 1552 and the first gap 156, the electrolyte within the spray tube 1552 can enter the first gap 156 from the channel 1553, while the first gap 156 is within the first gap 156. The electrolyte cannot enter the liquid pipe 1552 from the passage 1553, thereby reducing the electrical resistance of the device and preventing microbubbles from entering the liquid pipe 1552 from the first gap 156. The flow rate of the electrolyte in the first gap 156 can be adjusted through the flow regulating ring 1554 which is sleeved on the outer circumferential surface of the bottom end of the liquid pipe 1552. Different sizes of flow regulating rings 1554 may be sleeved on the outer circumferential surface of the bottom end of the liquid ejecting tube 1552 according to the process requirements. Adjustment of the size of the second gap 157 can be achieved by raising or lowering the insulating nozzle 155.

The surface of the cymbal 120 to be electroplated or electropolished faces the main showerhead assembly 150. The auxiliary nozzle device 140 is rotated 90 degrees, the liquid supply tube 141 is parallel to the horizontal movement direction of the crotch panel 120, and the liquid supply tube 141 is located below the crotch clamp 110. The nozzle 142 is opposite to the outer edge of the crotch panel 120 and the crotch clamp 110 . The beam 130 drives the cymbal clamp 110 and the auxiliary showerhead assembly 140 to move horizontally while the cymbal clamp 110 rotates about its own central axis. The auxiliary showerhead device 140 and the main showerhead device 150 respectively eject electrolysis to the surface of the cymbal 120 The liquid, wherein the auxiliary head device 140 sprays the uncharged electrolyte to the outer edge of the cymbal 120 and the cymbal clip 110 through the nozzle 142, and the area between the outer edge of the cymbal 120 and the electrode 111 of the cymbal clip 110 is throughout The plating or electropolishing process can always be covered by the electrolyte, so that the electrical connection between the cymbal 120 and the power source is stable. The main head unit 150 sprays a charged electrolyte onto the surface of the cymbal 120 through the liquid discharge tube 1552. The bubble generated on the inner circumferential surface of the receiving portion 1542 of the electric conductor 154 is discharged to the main head device 150 along with the electrolyte in the first gap 156. The electrolyte flowing through the first gap 156 is blocked by the cover 1551 of the insulating head 155, and thus does not reach the surface of the cymbal 120. Since the side wall of the liquid ejecting tube 1552 is provided with a plurality of passages 1553, the air bubbles in the first gap 156 do not enter the liquid ejecting tube 1552, thereby improving the quality of electroplating or electropolishing. Through the electrolyte, the conductor 154, the cymbal 120, the electrode 111, and the power source constitute an electroplating or electropolishing current loop, and current flows mainly from the surface of the cymbal 120, thereby achieving plating or electropolishing of the cymbal 120. In order to improve the electroplating or electropolishing efficiency, the inner diameter of the liquid ejecting tube 1552 is large and proportional to the width of the insulating ring 113 or the metal ring 112, thereby preventing the main shower head device 150 from ejecting the electrolyte onto the electrode 111, thereby lowering the device. The resistors ensure that current flows primarily from the surface of the cymbal 120. Preferably, the inner diameter of the liquid discharge tube 1552 is 0.5 to 1.5 times the width of the insulating ring 113 or the metal ring 112. The flow rate of the electrolyte sprayed through the nozzle 142 to the outer edge of the cymbal 120 and the cymbal clip 110 should not be too large to prevent the electrolyte from dripping from the outer edge of the cymbal 120 and the cymbal clip 110 and ejecting with the main showerhead device 150. The electrolyte constitutes a circuit.

In one embodiment, the supply tube of the auxiliary showerhead assembly 140 141 is made of an acid-resistant conductive metal and used as an auxiliary electrode. In the electroplating process, the liquid supply tube 141 is electrically connected to the cathode of the power source; in the electropolishing process, the liquid supply tube 141 is electrically connected to the anode of the power source. The charged electrolyte is sprayed through the nozzle 142 to the outer edge of the cymbal 120 and the cymbal clip 110.

In one embodiment, the cymbal clip 110 is provided with a metal ring 112 proximate the outer edge of the cymbal 120, and the cymbal clip 110 can omit the electrode 111 and the insulating ring 113. The liquid supply tube 141 of the auxiliary head device 140 is made of an acid-resistant conductive metal and serves as an auxiliary electrode. In the electroplating process, the liquid supply tube 141 is electrically connected to the cathode of the power source; in the electropolishing process, the liquid supply tube 141 is electrically connected to the anode of the power source. The charged electrolyte is sprayed through the nozzle 142 to the region between the outer edge of the cymbal 120 and the metal ring 112 of the cymbal holder 110. Through the electrolyte, the outer edge of the cymbal 120 is electrically connected to the liquid supply tube 141. Since the liquid supply tube 141 is electrically connected to the power source, the cymbal 120 is electrically connected to the power source.

Referring to Figures 11 to 15, the structure of the apparatus for electroplating or electropolishing the cymbal of the second embodiment of the present invention is disclosed. The device includes a cymbal clip 210 that secures a cymbal plate 220 having an electrode 211, a metal ring 212, and an insulating ring 213 disposed between the electrode 211 and the metal ring 212. In the electroplating process, the electrode 211 is electrically connected to the cathode of the power source; in the electropolishing process, the electrode 211 is electrically connected to the anode of the power source. The electrode 211 and the cymbal 220 are electrically connected to each other through an electrolyte. The cymbal clip 210 has a rotating shaft 214. The rotating shaft 214 is rotatable about its own central axis, thereby causing the cymbal clip 210 to rotate about the central axis of the cymbal clip 210 itself. The top end of the rotating shaft 214 is mounted on a beam above the cymbal clip 210, and the beam is horizontally moved, thereby The cymbal clip 210 is moved horizontally.

The apparatus also includes a main chamber 280, an auxiliary chamber 290, a main showerhead assembly 250, an auxiliary showerhead assembly 240, and a protective cover 260. The main head unit 250 is located in the main chamber 280. The structure and function of the main head unit 250 and the main head unit 150 are identical. Therefore, the main head unit 250 will not be repeatedly described herein. The auxiliary showerhead assembly 240 is located within the auxiliary chamber 290, which has an elongated, tubular supply tube 241. The liquid supply pipe 241 is provided with a plurality of nozzles 242 arranged in a plurality of rows to supply electrolyte to the outer edge of the cymbal plate 220 and the cymbal clamp 210. When plating or electropolishing, the outer edge of the cymbal plate 220 is The area between the electrodes 211 of the cymbal clip 210 can always be covered by the electrolyte, so that a stable electrical connection can be formed between the outer edge of the cymbal sheet 220 and the electrode 211 of the cymbal clip 210. In one embodiment, the supply tube 241 is coupled to a separate liquid supply system such that the flow of electrolyte within the supply tube 241 can be independently controlled. A partition wall 270 is disposed between the main chamber 280 and the auxiliary chamber 290, and the partition wall 270 divides the main chamber 280 and the auxiliary chamber 290 into two separate chambers. The electrolyte in the main chamber 280 cannot enter the auxiliary chamber 290, and the electrolyte in the auxiliary chamber 290 cannot enter the main chamber 280.

The protective cover 260 includes a circular portion 261 and a rectangular portion 262. The circular portion 261 is disposed within the main chamber 280 and surrounds the main showerhead device 250. The rectangular portion 262 is disposed within the auxiliary chamber 290 and shields the auxiliary showerhead assembly 240. An injection window 263 is opened in the middle of the rectangular portion 262, and the electrolyte is ejected from the ejection window 263 to the outer edge of the cymbal sheet 220 and the cymbal holder 210. The rectangular portion 262 is also provided with an elongated slit 264 which is adjacent to the jet Window 263. The rectangular portion 262 has a side wall 265 that extends upward to form a first recess 266 that is located on an upper surface of the rectangular portion 262. The first recess 266 is for recovering the electrolyte sprayed from the auxiliary head unit 240 to the outer edge of the cymbal 220 and the cymbal clip 210. The electrolyte recovered by the first recess 266 flows from the slit 264 back to the auxiliary chamber 290 for recycling. The side wall 265 extends downward to form a second groove 267, and the second groove 267 is located on the lower surface of the rectangular portion 262. The second groove 267 receives the partition wall 270 and the auxiliary head device 240.

When an electroplating or electropolishing process is performed, the cymbal sheet 220 is attached to the cymbal holder 210, and the surface of the cymbal sheet 220 to be plated or electropolished faces the main showerhead device 250. The cymbal clip 210 moves over the main showerhead assembly 250, and through the use of, for example, two magnetic attachment means disposed on the cymbal clamp 210, the protective cover 260 can be moved with the cymbal clip 210 during electroplating or electropolishing. When the electroplating or electropolishing process is completed, the protective cover 260 is separated from the crotch clamp 210, and the crotch clamp 210 is removed from above the main showerhead assembly 250. The cymbal clip 210 is rotated about its own central axis while moving horizontally, and the auxiliary head unit 240 and the main head unit 250 respectively eject the electrolyte onto the surface of the cymbal 220. The auxiliary nozzle device 240 sprays the electrolyte to the outer edge of the cymbal plate 220 and the cymbal clip 210 through the nozzle 242 and the ejection window 263. The area between the outer edge of the cymbal plate 220 and the electrode 211 of the cymbal holder 210 is electroplated or electrically. The polishing process can always be covered by the electrolyte, so that the electrical connection between the cymbal sheet 220 and the electrode 211 is stable, thereby improving the uniformity of plating or electropolishing of the outer edge of the cymbal sheet 220, and reducing the device's resistance. The electrolyte ejected from the other nozzles 242 hidden under the rectangular portion 262 is rectangular 262 blocks back so that it cannot reach the outer edge of the cymbal 220. Due to the limitation of the ejection window 263, the size of the area in which the auxiliary head device 240 sprays the electrolyte on the outer edge of the cymbal sheet 220 and the cymbal holder 210 is constant, and the purpose is to ensure that the electrolyte is evenly distributed on the outer edge of the cymbal plate 220 to The area between the electrodes 211 of the cymbal clip 210. The outer edge of the crotch panel 220 and the electrolyte on the crotch clamp 210 are dropped into the first recess 266, and the electrolyte recovered by the first recess 266 flows from the slit 264 back to the auxiliary chamber 290 for recycling. The circular portion 261 of the boot 260 prevents the electrolyte sprayed onto the cymbal 220 and the cymbal clip 210 from splashing out of the main chamber 280 and the auxiliary chamber 290.

Referring to Figures 16 through 19, the structure of the apparatus for electroplating or electropolishing the cymbal of the third embodiment of the present invention is disclosed. The device includes a cymbal clip 310 that secures a cymbal 320 having an electrode 311, a metal ring 312, an insulating ring 313, and a rotating shaft 314.

The apparatus of the present embodiment includes two auxiliary chambers 390 and two auxiliary head units 340 as compared to the apparatus disclosed in the second embodiment. Two auxiliary chambers 390 are distributed on opposite sides of the main chamber 380. Each auxiliary chamber 390 is separated from the main chamber 380 by a partition wall 370. Each of the auxiliary head devices 340 has an elongated, tubular liquid supply tube 341. The liquid supply tube 341 is provided with a plurality of nozzles 342 arranged in a plurality of rows to the outer edge of the cymbal 320 and the cymbal holder 310. When the electrolyte is supplied, electroplated or electropolished, the area between the outer edge of the cymbal sheet 320 and the electrode 311 of the cymbal clip 310 can always be covered by the electrolyte, and therefore, the outer edge of the cymbal 320 and the electrode of the cymbal clip 310 A stable electrical connection can be formed between 311. The main showerhead assembly 350 is located within the main chamber 380.

The device also includes a protective cover 360 that includes a circular portion 361 and two rectangular portions 362 that are symmetrically distributed on either side of the circular portion 361. Each rectangular portion 362 is provided with an injection window 363 and a slit 364.

In this embodiment, the efficiency and quality of electroplating or electropolishing are improved by providing two auxiliary nozzle devices 340 and corresponding two auxiliary chambers 390 and two rectangular portions 362.

Referring to Figure 20, a top view of another embodiment of a protective cover is disclosed. The protective cover 460 includes a circular portion 461 and a rectangular portion 462. The middle portion of the rectangular portion 462 is provided with an ejection window 463 from which the electrolyte is ejected to the outer edge of the cymbal sheet and the cymbal clip. The rectangular portion 462 is also provided with an elongated slit 464 that is adjacent to the spray window 463. Compared with the protective cover 260 shown in FIG. 13, the protective cover 460 further includes an acid-resistant conductive metal 468 having a window corresponding to the ejection window 463, and a conductive metal 468 fixed to the rectangular shape at the ejection window 463. Part 462. The conductive metal 468 can be used as an auxiliary electrode that charges the electrolyte when the electrolyte is ejected from the ejection window 463. In an electroplating or electropolishing process, the charged electrolyte can cover the outer edge of the lamella to the area between the electrodes of the cymbal clip. During electroplating, the conductive metal 468 is electrically connected to the cathode of the power source; during electropolishing, the conductive metal 468 is electrically connected to the anode of the power source.

Referring to Figure 21, a top view of yet another embodiment of a protective cover is disclosed. The protective cover 560 includes a circular portion 561 and two rectangular portions 562. A spray window 563 is formed in the middle of each rectangular portion 562, from which the electrolyte is sprayed onto the outer edge of the cymbal and the cymbal clip. Each The rectangular portion 562 is also provided with an elongated slit 564 that is adjacent to the ejection window 563. Compared with the protective cover 360 shown in FIG. 18, the protective cover 560 further includes two acid-resistant conductive metals 568, each of which has a window corresponding to the ejection window 563, and the conductive metal 568 is fixed to the ejection window. On the rectangular portion 562 at 563. Conductive metal 568 can be used as an auxiliary electrode that conducts the electrolyte when the electrolyte is ejected from the ejection window 563. In an electroplating or electropolishing process, the charged electrolyte can cover the outer edge of the lamella to the area between the electrodes of the cymbal clip. During electroplating, the conductive metal 568 is electrically connected to the cathode of the power source; during electropolishing, the conductive metal 568 is electrically connected to the anode of the power source.

In one embodiment of the invention, if the protective cover includes a conductive metal as an auxiliary electrode, the cymbal clip can omit the electrode and the insulating ring. The outer edge of the cymbal is electrically connected to the conductive metal through the electrolyte to achieve electrical connection with the power source.

Correspondingly, the present invention also discloses a method for electroplating or electropolishing a cymbal, the method comprising the following steps: Step 1: Fixing the cymbal on the cymbal clip; Step 2: horizontally moving and rotating the cymbal clip; Step 3 : supplying a charged electrolyte to the surface of the cymbal sheet, while supplying an uncharged electrolyte covering the outer edge of the cymbal and the cymbal clip to form electrical conduction between the outer edge of the cymbal and the power source.

Correspondingly, the present invention also discloses another method for electroplating or electropolishing a cymbal sheet, the method comprising the following steps: Step 1: fixing the cymbal sheet on the cymbal clip; Step 2: Horizontally move and rotate the cymbal clip; Step 3: Supply a charged electrolyte to the surface of the cymbal, and at the same time, supply the charged electrolyte to cover the outer edge of the cymbal and the cymbal clip for the cymbal Electrical conduction is formed between the outer edge and the power source.

As can be seen from the above, the present invention ensures that an uncharged or charged electrolyte is supplied to the outer edge of the cymbal sheet to ensure that the outer edge of the cymbal sheet and the power source are always kept conductive during the electroplating or electropolishing process. A stable electrical connection is formed between the edge and the power source, thereby increasing the outer edge plating or electropolishing uniformity of the cymbal and reducing the electrical resistance of the device. In addition, the inner diameter of the spray pipe of the main showerhead device is large, which improves the efficiency of electroplating or electropolishing.

In summary, the apparatus and method for electroplating or electropolishing the cymbal of the present invention have been specifically and specifically disclosed by the above-described embodiments and related drawings, so that those skilled in the art can implement it. The above-mentioned embodiments are only intended to illustrate the invention, and are not intended to limit the invention. The scope of the invention should be defined by the scope of the invention. Changes in the number of elements described herein or substitution of equivalent elements are still within the scope of the invention.

Claims (33)

An apparatus for electroplating or electropolishing a cymbal sheet, comprising: a cymbal clip, the cymbal clip holding a cymbal, the cymbal clip horizontally moving and rotating, the cymbal clip being provided with an electrode, a metal ring adjacent to an outer edge of the crotch and an insulating ring between the metal ring and the electrode; an auxiliary nozzle device, the auxiliary nozzle device includes a liquid supply pipe, and the liquid supply pipe is provided with a plurality of nozzles Spraying an electrolyte onto the outer edge of the cymbal and the cymbal clip so that the area between the outer edge of the cymbal sheet and the electrode of the cymbal clip is always covered by the electrolyte; and the main showerhead device, The main nozzle device includes an electric conductor and an insulating nozzle. The electric conductor has a fixing portion and a receiving portion. The insulating nozzle has a cover and a liquid ejecting tube. The liquid ejecting tube is received in the receiving portion of the electric conductor and is electrically connected to the electric conductor. a receiving portion is formed, a first gap is formed between an inner circumferential surface of the receiving portion of the electric conductor and an outer circumferential surface of the liquid discharge tube, and the covering is located above the fixing portion of the electric conductor Covering and solidification of the electrical conductor A gap is formed between the second portion. The apparatus for electroplating or electropolishing a cymbal according to claim 1, wherein the side wall of the liquid ejecting tube is provided with a plurality of channels, and the highest point of the inner port of each channel is lower than the lowest of the outer port of the channel. point. The apparatus for electroplating or electropolishing a cymbal according to claim 1, further comprising a flow regulating ring that is sleeved on an outer circumferential surface of the bottom end of the liquid discharge tube. The apparatus for electroplating or electropolishing a cymbal according to claim 1, wherein the supply pipe of the auxiliary showerhead device is connected to a separate liquid supply system. The apparatus for electroplating or electropolishing a cymbal according to claim 1, wherein the auxiliary head device rotates in a horizontal plane, and when the cymbal is electroplated or electropolished, the auxiliary head device is rotated by 90 degrees, the liquid supply The tube is parallel to the direction in which the flap moves horizontally, the liquid supply tube being located below the cymbal clip, the nozzle being opposite the outer edge of the cymbal and the cymbal clip. The apparatus for electroplating or electropolishing a cymbal according to claim 5, characterized in that, after the plating or electropolishing process is finished, the auxiliary head device is inverted by 90 degrees, and the liquid supply tube is horizontally moved perpendicular to the cymbal direction. The apparatus for electroplating or electropolishing a cymbal according to claim 1, further comprising a beam, the beam being located above the cymbal clip, the beam moving horizontally, the cymbal holder having a rotation a shaft that rotates about its own central axis to cause the cymbal to rotate about a central axis of the cymbal clip itself, the top end of which is mounted on the beam. The apparatus for electroplating or electropolishing a cymbal according to claim 7, wherein the auxiliary head unit is mounted on the beam, and the auxiliary head unit moves horizontally with the beam. The apparatus for electroplating or electropolishing a cymbal according to claim 1, wherein the main head device has a hollow holding portion, and a fixing portion of the electric conductor is fixed to an upper surface of the holding portion, The receiving portion of the electric conductor is housed in the holding portion. The apparatus for electroplating or electropolishing a cymbal according to claim 1, wherein the upper cymbal of the liquid discharge tube is defined as an ejection port from which an electrolyte is ejected to a surface of the cymbal sheet, The shape of the ejection opening is a circle, a triangle, a square, a hexagon, or an octagon. An apparatus for electroplating or electropolishing a cymbal according to claim 1 It is characterized in that the inner diameter of the liquid discharge tube is proportional to the width of the insulating ring of the cymbal clip. The apparatus for electroplating or electropolishing a cymbal according to claim 1, wherein the inner diameter of the liquid discharge tube is proportional to the width of the metal ring of the cymbal holder. The apparatus for electroplating or electropolishing a cymbal according to claim 11 or 12, wherein the ratio is 0.5 to 1.5 times. A device for electroplating or electropolishing a cymbal according to claim 1, wherein the cymbal holder is a vacuum clamp. The apparatus for electroplating or electropolishing a cymbal according to claim 1, wherein the supply pipe of the auxiliary head device is made of a conductive metal and serves as an auxiliary electrode. An apparatus for electroplating or electropolishing a cymbal sheet, comprising: a cymbal clip, the cymbal clip holding a cymbal, the cymbal clip horizontally moving and rotating; an auxiliary nozzle device, the auxiliary nozzle device comprising a liquid supply pipe made of a conductive metal and used as an auxiliary electrode, wherein the liquid supply pipe is provided with a plurality of nozzles, the nozzle spraying an electrolyte to an outer edge of the cymbal; and a main nozzle device, The main nozzle device includes an electric conductor and an insulating nozzle. The electric conductor has a fixing portion and a receiving portion. The insulating nozzle has a cover and a liquid ejecting tube. The liquid ejecting tube is received in the receiving portion of the electric conductor and is electrically connected to the electric conductor. a receiving portion is formed, a first gap is formed between an inner circumferential surface of the receiving portion of the electric conductor and an outer circumferential surface of the liquid discharge tube, and the covering is located above the fixing portion of the electric conductor A second gap is formed between the cover and the fixing portion of the electric conductor. The apparatus for electroplating or electropolishing a cymbal according to claim 16, wherein the cymbal clip is provided with a metal ring adjacent to an outer edge of the cymbal, and the auxiliary head device supplies electrolyte to cover the outer edge of the cymbal To the area between the metal rings of the cymbal clip. An apparatus for electroplating or electropolishing a cymbal sheet, comprising: a cymbal clip, the cymbal clip holding a cymbal, the cymbal clip horizontally moving and rotating, the cymbal clip being provided with an electrode, a metal ring adjacent to an outer edge of the cymbal and an insulating ring between the metal ring and the electrode; a main chamber; an auxiliary chamber, the auxiliary chamber being separated from the main chamber; and an auxiliary nozzle device The auxiliary nozzle device is located in the auxiliary chamber, the auxiliary nozzle device has a liquid supply tube, the liquid supply tube is provided with a plurality of nozzles, and the main nozzle device is located in the main chamber. The main nozzle device includes a conductor and an insulating nozzle, the conductor has a fixing portion and a receiving portion, the insulating nozzle has a cover and a liquid discharge tube, and the liquid discharge tube is received in the receiving portion of the electric conductor and a receiving portion of the electric conductor is formed, and a first gap is formed between an inner circumferential surface of the receiving portion of the electric conductor and an outer circumferential surface of the liquid ejecting pipe, and the covering is located above the fixing portion of the electric conductor , the cover and the guide Forming a second gap between the fixed portions of the body; and a protective cover, the protective cover including a circular portion and a rectangular portion, the circular portion being disposed in the main chamber and surrounding the main showerhead device, The rectangular portion is disposed in the auxiliary chamber and covers the auxiliary shower head device, and the rectangular portion is provided with an injection window from which the electrolyte is sprayed to the crotch The outer edge and the cymbal clip are such that the area between the outer edge of the cymbal to the electrode of the cymbal clip is always covered by the electrolyte. The apparatus for electroplating or electropolishing a cymbal according to claim 18, wherein a partition wall is disposed between the main chamber and the auxiliary chamber, and the partition wall connects the main chamber and the auxiliary chamber Divided into two separate chambers. The apparatus for electroplating or electropolishing a cymbal according to claim 18, wherein the rectangular portion of the protective cover is provided with a slit. The apparatus for electroplating or electropolishing a cymbal according to claim 18, wherein the rectangular portion of the protective cover has a side wall extending upwardly to form a first recess, the first recess being located on the rectangular portion The surface, the first recess recovers the electrolyte ejected from the auxiliary showerhead device to the outer edge of the cymbal and the cymbal clip. The apparatus for electroplating or electropolishing a cymbal according to claim 21, wherein the side wall of the rectangular portion extends downward to form a second groove, the second groove is located at a lower surface of the rectangular portion, and the second The groove receives the auxiliary nozzle device. The apparatus for electroplating or electropolishing a cymbal according to claim 18, wherein the protective cover further comprises a conductive metal, the conductive metal having a window corresponding to the ejection window, the conductive metal Fixed on the rectangular portion at the ejection window, the conductive metal serves as an auxiliary electrode that charges the electrolyte when the electrolyte is ejected from the ejection window. The apparatus for electroplating or electropolishing a cymbal according to claim 18, further comprising another auxiliary chamber and another auxiliary showerhead device, the protective cover further comprising another rectangular portion, the other rectangular shape Open There is a jet window. Apparatus for electroplating or electropolishing a cymbal according to claim 24, wherein said two auxiliary chambers are distributed on opposite sides of said main chamber, each auxiliary chamber and said main chamber The rooms are separated by a dividing wall. The apparatus for electroplating or electropolishing a cymbal according to claim 24, characterized in that the other rectangular portion of the protective cover is provided with a slit. The apparatus for electroplating or electropolishing a cymbal according to claim 24, wherein the other rectangular portion of the protective cover has a side wall extending upwardly to form a first groove, the first groove being located at the The upper surface of the other rectangular portion. The apparatus for electroplating or electropolishing a cymbal according to claim 27, wherein a side wall of the other rectangular portion of the protective cover extends downward to form a second recess, and the second recess is located at the other The lower surface of the rectangular portion. The apparatus for electroplating or electropolishing a cymbal according to claim 24, wherein the protective cover further comprises another conductive metal, the other conductive metal being open corresponding to the ejection window of the other rectangular portion a window, the other conductive metal is fixed on the other rectangular portion at the ejection window, and the other conductive metal is used as an auxiliary electrode, the other conductive metal when the electrolyte is ejected from the ejection window The electrolyte is charged. An apparatus for electroplating or electropolishing a cymbal sheet, comprising: a cymbal clip, the cymbal clip holding a cymbal, the cymbal clip horizontally moving and rotating; a main chamber; an auxiliary chamber, An auxiliary chamber is spaced apart from the main chamber; an auxiliary showerhead device is located in the auxiliary chamber The auxiliary nozzle device has a liquid supply pipe, and the liquid supply pipe is provided with a plurality of nozzles; the main nozzle device is located in the main chamber, and the main nozzle device includes an electric conductor and an insulating nozzle The electric conductor has a fixing portion and a receiving portion, and the insulating nozzle has a cover and a liquid discharge tube. The liquid ejecting tube is received in a receiving portion of the electric conductor and passes through a receiving portion of the electric conductor. a first gap is formed between an inner circumferential surface of the receiving portion of the body and an outer circumferential surface of the liquid discharge tube, the covering is located above the fixing portion of the electric conductor, and the covering is fixed to the electric conductor a second gap is formed between the portions; and a protective cover, the protective cover includes a circular portion and a rectangular portion, the circular portion is disposed in the main chamber and surrounds the main shower head device, the rectangle a portion disposed in the auxiliary chamber and covering the auxiliary head device, the rectangular portion is provided with an injection window from which an electrolyte is sprayed to an outer edge of the blade, the protective cover further comprising a conductive metal , the conductive a window corresponding to the ejection window, the conductive metal being fixed on a rectangular portion at the ejection window, the conductive metal serving as an auxiliary electrode, and conducting electricity when the electrolyte is ejected from the ejection window The metal charges the electrolyte. The apparatus for electroplating or electropolishing a cymbal according to claim 30, wherein the cymbal clip has a metal ring adjacent to an outer edge of the cymbal, and the electrolyte ejected from the ejection window covers the outer edge of the cymbal to The area between the metal rings of the cymbal clip. The apparatus for electroplating or electropolishing a cymbal according to claim 30, further comprising another auxiliary chamber and another auxiliary head device, the protective cover further comprising another rectangular portion, the other rectangular shape Open Providing a spray window, the protective cover further comprising another conductive metal, the other conductive metal being provided with a window corresponding to the injection window of the other rectangular portion, the other conductive metal being fixed at the injection window The other conductive metal serves as an auxiliary electrode on the other rectangular portion, and the other conductive metal charges the electrolyte when the electrolyte is ejected from the ejection window. A method of electroplating or electrically polishing a cymbal, comprising: fixing a cymbal to a cymbal clip; horizontally moving and rotating the cymbal clip; and supplying a charged electrolysis to the surface of the cymbal through the main showerhead device The liquid, at the same time, supplies an uncharged or charged electrolyte through the auxiliary showerhead device to cover the outer edge of the cymbal and the cymbal clip to form electrical conduction between the outer edge of the cymbal and the power source.