TWI646570B - 將電漿系統內之模型加以分段 - Google Patents

將電漿系統內之模型加以分段 Download PDF

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Publication number
TWI646570B
TWI646570B TW103116271A TW103116271A TWI646570B TW I646570 B TWI646570 B TW I646570B TW 103116271 A TW103116271 A TW 103116271A TW 103116271 A TW103116271 A TW 103116271A TW I646570 B TWI646570 B TW I646570B
Authority
TW
Taiwan
Prior art keywords
impedance matching
circuit
modules
model
module
Prior art date
Application number
TW103116271A
Other languages
English (en)
Chinese (zh)
Other versions
TW201511075A (zh
Inventor
小約翰Ｃ 微寇爾
亞瑟Ｍ 豪瓦德
Original Assignee
美商蘭姆研究公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/245,803 external-priority patent/US9779196B2/en
Application filed by 美商蘭姆研究公司 filed Critical 美商蘭姆研究公司
Publication of TW201511075A publication Critical patent/TW201511075A/zh
Application granted granted Critical
Publication of TWI646570B publication Critical patent/TWI646570B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32926—Software, data control or modelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
TW103116271A 2013-05-09 2014-05-07 將電漿系統內之模型加以分段 TWI646570B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201361821523P 2013-05-09 2013-05-09
US61/821,523 2013-05-09
US14/245,803 2014-04-04
US14/245,803 US9779196B2 (en) 2013-01-31 2014-04-04 Segmenting a model within a plasma system

Publications (2)

Publication Number Publication Date
TW201511075A TW201511075A (zh) 2015-03-16
TWI646570B true TWI646570B (zh) 2019-01-01

Family

ID=52454099

Family Applications (2)

Application Number Title Priority Date Filing Date
TW103116271A TWI646570B (zh) 2013-05-09 2014-05-07 將電漿系統內之模型加以分段
TW107134914A TWI692798B (zh) 2013-05-09 2014-05-07 將電漿系統內之模型加以分段

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW107134914A TWI692798B (zh) 2013-05-09 2014-05-07 將電漿系統內之模型加以分段

Country Status (2)

Country Link
KR (1) KR102236641B1 (ko)
TW (2) TWI646570B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180175819A1 (en) * 2016-12-16 2018-06-21 Lam Research Corporation Systems and methods for providing shunt cancellation of parasitic components in a plasma reactor
KR102192299B1 (ko) * 2019-08-28 2020-12-17 세메스 주식회사 기판 처리 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001127045A (ja) * 1999-10-29 2001-05-11 Tokyo Electron Ltd プラズマ処理装置およびプラズマ処理方法
US20030094239A1 (en) * 2000-06-02 2003-05-22 Quon Bill H. Apparatus and method for improving electron ecceleration
CN101110347A (zh) * 2006-07-17 2008-01-23 应用材料公司 具有静电卡盘电压反馈控制的双偏置频率等离子体反应器
US20120282869A1 (en) * 2010-04-20 2012-11-08 Rf Micro Devices, Inc. Rf pa linearity requirements based converter operating mode selection

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005284046A (ja) * 2004-03-30 2005-10-13 Kumamoto Univ パターンずれ量検出方法及び露光装置
US7276135B2 (en) * 2004-05-28 2007-10-02 Lam Research Corporation Vacuum plasma processor including control in response to DC bias voltage
KR101144018B1 (ko) * 2004-05-28 2012-05-09 램 리써치 코포레이션 복수 ｒｆ 주파수에 반응하는 전극을 갖는 플라즈마 처리기
US8779662B2 (en) * 2010-10-20 2014-07-15 Comet Technologies Usa, Inc Pulse mode capability for operation of an RF/VHF impedance matching network with 4 quadrant, VRMS/IRMS responding detector circuitry
US8416008B2 (en) * 2011-01-20 2013-04-09 Advanced Energy Industries, Inc. Impedance-matching network using BJT switches in variable-reactance circuits

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001127045A (ja) * 1999-10-29 2001-05-11 Tokyo Electron Ltd プラズマ処理装置およびプラズマ処理方法
US20030094239A1 (en) * 2000-06-02 2003-05-22 Quon Bill H. Apparatus and method for improving electron ecceleration
CN101110347A (zh) * 2006-07-17 2008-01-23 应用材料公司 具有静电卡盘电压反馈控制的双偏置频率等离子体反应器
US20120282869A1 (en) * 2010-04-20 2012-11-08 Rf Micro Devices, Inc. Rf pa linearity requirements based converter operating mode selection

Also Published As

Publication number Publication date
KR20140133475A (ko) 2014-11-19
KR102236641B1 (ko) 2021-04-06
TW201511075A (zh) 2015-03-16
TW201901735A (zh) 2019-01-01
TWI692798B (zh) 2020-05-01

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