TWI641430B - Edge cleaning machine for panels - Google Patents

Edge cleaning machine for panels Download PDF

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Publication number
TWI641430B
TWI641430B TW106114082A TW106114082A TWI641430B TW I641430 B TWI641430 B TW I641430B TW 106114082 A TW106114082 A TW 106114082A TW 106114082 A TW106114082 A TW 106114082A TW I641430 B TWI641430 B TW I641430B
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Taiwan
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strip
wheel
wiping
clamping
edge
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TW106114082A
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Chinese (zh)
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TW201838727A (en
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莊添財
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旭東機械工業股份有限公司
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Priority to TW106114082A priority Critical patent/TWI641430B/en
Publication of TW201838727A publication Critical patent/TW201838727A/en
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Publication of TWI641430B publication Critical patent/TWI641430B/en

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Abstract

本發明係關於一種板邊清洗設備,其包括一通道及一板邊擦拭機構。該通道係供一基板通過,使得該基板的邊緣可被該板邊擦拭機構擦拭。其中,該板邊擦拭機構被安排能夠帶動一擦拭布條前進,以使該擦拭布條的正面擦拭至少一基板邊緣的頂面,且能翻轉該擦拭布條使其繞經該基板邊緣的底面,以使該擦拭布條的背面擦拭該基板邊緣的底面。如此,該擦拭布條的兩面皆能夠得到充分地善用。The present invention relates to a board edge cleaning apparatus that includes a channel and a board edge wiping mechanism. The channel is passed through a substrate such that the edge of the substrate can be wiped by the edge wiping mechanism. Wherein the edge wiping mechanism is arranged to drive a wiping strip to advance the front surface of the wiping strip to at least one of the top edges of the substrate edge, and the wiping strip can be turned over to pass the bottom surface of the substrate edge So that the back side of the wiping strip wipes the bottom surface of the edge of the substrate. In this way, both sides of the wiping strip can be fully utilized.

Description

板邊清洗設備Board edge cleaning equipment

本發明係關於一種板材之自動清洗技術,尤指一種用來清洗液晶面板之側邊的板邊清洗設備。 The invention relates to an automatic cleaning technology for a plate, in particular to a plate edge cleaning device for cleaning the side of a liquid crystal panel.

一般應用於電子方面之板材,其材質是如聚乙烯(PE)、聚丙烯(PP)及EVA等聚合物,此種聚合物的表面潤濕性不佳,故而這些板材在印刷、塗佈或接著等程序之前如未作適當的清洗,通常會產生印刷不良等效果。 Generally used in electronic panels, such as polyethylene (PE), polypropylene (PP) and EVA polymers, such polymers have poor surface wettability, so these plates are printed, coated or Then, if it is not properly cleaned before the procedure, it usually produces effects such as poor printing.

台灣專利第I286952號揭露一種用來清洗液晶面板的自動清洗機,重新繪製如第八圖所示。如圖所示,該自動清洗機具有一丙酮清洗裝置9,其作用是以丙酮沾濕擦拭布條95、96來擦拭一基板2(即液晶面板)的邊緣之上、下面。具體而言,該丙酮擦拭裝置9於該基板2的上方設有一送料輪91、一收料輪93及繞設於該送料輪91及該收料輪93之間的一第一擦拭布條95,用來擦拭該液晶面板2之邊緣的頂面。當該第一擦拭布條95因擦拭板邊而髒污時,該收料輪93會對應捲收該第一擦拭布條95,使該第一擦拭布條95的下一段乾淨的部位被移至擦拭位置,繼續擦拭板邊。無論如何,該第一擦拭布條95僅用到其中一面(正面或背面)來擦拭板邊。 Taiwan Patent No. I286952 discloses an automatic cleaning machine for cleaning a liquid crystal panel, which is redrawn as shown in the eighth figure. As shown, the automatic cleaning machine has an acetone cleaning device 9 which functions by wiping the wiping strips 95, 96 with acetone to wipe the upper and lower edges of a substrate 2 (i.e., a liquid crystal panel). Specifically, the acetone wiping device 9 is provided with a feeding wheel 91, a receiving wheel 93 and a first wiping strip 95 disposed between the feeding wheel 91 and the receiving wheel 93. Used to wipe the top surface of the edge of the liquid crystal panel 2. When the first wiping strip 95 is dirty due to the wiping edge, the receiving wheel 93 correspondingly winds up the first wiping strip 95, so that the next clean portion of the first wiping strip 95 is removed. To the wiping position, continue to wipe the edge of the board. In any event, the first wiping strip 95 uses only one of the sides (front or back) to wipe the edge of the panel.

依同樣的手法,該丙酮擦拭裝置9於該基板2的下方也設有一送料輪92、一收料輪94及繞設於該送料輪92及該收料輪94之間的一第二擦拭布條96,來擦拭該基板2之邊緣的底面。如 上所述,該丙酮擦拭裝置9共用了四個料輪91~94及兩捆擦拭布條95、96,來完成板邊清洗的作業。 In the same manner, the acetone wiping device 9 is also provided with a feeding wheel 92, a receiving wheel 94 and a second wiping cloth disposed between the feeding wheel 92 and the receiving wheel 94. Strip 96, to wipe the bottom surface of the edge of the substrate 2. Such as As described above, the acetone wiping device 9 shares four rolls 91 to 94 and two sets of wiping strips 95 and 96 to complete the edge cleaning operation.

本發明提供一改良之板邊清洗設備,其僅需要一個料輪及一捲擦拭布條,便能夠有效地清洗板材邊緣之頂面及底面。 The present invention provides an improved edge cleaning apparatus that requires only one feed wheel and one roll of wiping strip to effectively clean the top and bottom surfaces of the edge of the sheet.

本發明之板邊清洗設備係被安排能夠帶動一擦拭布條前進,以使該擦拭布條的正面擦拭一基板的邊緣之頂面,並翻轉該擦拭布條使其繞經該基板邊緣的底面,以使該擦拭布條的背面擦拭該基板邊緣的底面。 The edge cleaning apparatus of the present invention is arranged to drive a wiping strip to advance such that the front side of the wiping strip wipes the top surface of the edge of a substrate and flips the wiping strip around the bottom surface of the substrate edge So that the back side of the wiping strip wipes the bottom surface of the edge of the substrate.

具體而言,本發明之板邊清洗設備包括一通道及一板邊擦拭機構,該通道係供一基板通過,使得該基板的邊緣可被該板邊擦拭機構擦拭,其中該板邊擦拭機構被安排能夠帶動一擦拭布條前進,以使該擦拭布條的正面擦拭該基板邊緣的頂面,且能翻轉該擦拭布條使其繞經該基板邊緣的底面,以使該擦拭布條的背面擦拭該基板邊緣的底面。 Specifically, the edge cleaning apparatus of the present invention includes a channel and a board edge wiping mechanism for passing a substrate such that an edge of the substrate can be wiped by the edge wiping mechanism, wherein the edge wiping mechanism is Arranging to drive a wiping strip forward so that the front side of the wiping strip wipes the top surface of the edge of the substrate, and the wiping strip can be flipped over the bottom surface of the edge of the substrate to make the back of the wiping strip Wipe the bottom surface of the edge of the substrate.

較佳地,該板邊擦拭機構係被配置在翻轉該擦拭布條的過程中使該擦拭布條避開該通道,而不致影響該基板通過該通道。 Preferably, the edge wiping mechanism is configured to circumvent the wiping strip during the flipping of the wiping strip without affecting passage of the substrate through the passage.

具體而言,該板邊擦拭機構更包括一機架、一送料模組、一第一夾輪組、一送料偵測暨緩衝模組、一布條翻轉機構、一收料偵測暨緩衝模組及一布條驅動裝置。其中,該送料模組係設於該機架,且包括一送料輪及一送料驅動裝置。該送料輪係供裝載綑成一捲的該擦拭布條,而該送料驅動裝置係用以驅動該送料輪送出該擦拭布條。該第一夾輪組,具有相對的一上夾輪及一下夾輪,該上、下夾輪係可昇降地設於該機架。該送料偵測暨緩衝模組設於該機架,且包括一布條轉向機構,該布條轉向機構係用以引導該擦拭布條以其背面朝上的方式繞經該上夾輪的下側並朝一正X軸方向 前進,使得該上夾輪在下降後,該擦拭布條之正面可接觸到該基板邊緣的一頂面。該布條翻轉機構設於該機架,供從該送料偵測暨緩衝模組而來的該擦拭布條繞設,以對該擦拭布條翻轉,使得該擦拭布條在被翻轉後能仍以背面朝上的姿態沿著該基板的下方朝一負X軸方向前進。該收料偵測暨緩衝模組設於該機架,且包括一布條轉向機構,該布條轉向機構係供引導從該布條翻轉機構而來且背面朝上的該擦拭布條繞經該下夾輪的上側,使得該下夾輪在上升後,該擦拭布條之背面可接觸到該基板邊緣的一底面。此外,該布條驅動裝置係用以牽動該擦拭布條前進,使其行經該送料偵測暨緩衝模組、布條翻轉機構及該收料偵測暨緩衝模組。 Specifically, the edge wiping mechanism further comprises a frame, a feeding module, a first clamping wheel set, a feeding detection and buffering module, a cloth turning mechanism, a receiving detection and buffering mode. Group and a strip drive. The feeding module is disposed in the frame and includes a feeding wheel and a feeding driving device. The feed wheel is configured to load the wiper strip bundled into a roll, and the feed drive device is configured to drive the feed wheel to feed the wiper strip. The first pinch wheel set has an upper upper clamping wheel and a lower clamping wheel, and the upper and lower clamping wheels are arranged to be lifted and lowered on the frame. The feed detection and buffer module is disposed in the frame and includes a strip steering mechanism for guiding the wiping strip to pass under the upper clamping wheel with its back side facing upward Side and facing a positive X-axis Advancing, such that after the upper clamping wheel is lowered, the front surface of the wiping strip can contact a top surface of the edge of the substrate. The strip flipping mechanism is disposed in the frame, and the wiping strip from the feeding detection and buffer module is wound to flip the wiping strip so that the wiping strip can still be turned over after being turned over Advancing in a negative X-axis direction along the lower side of the substrate in a back-up posture. The receiving detection and buffering module is disposed in the frame, and includes a strip steering mechanism for guiding the wiping strip from the strip reversing mechanism and having the back side upward The upper side of the lower clamping wheel is such that after the lower clamping wheel is raised, the back surface of the wiping strip can contact a bottom surface of the edge of the substrate. In addition, the strip driving device is configured to move the wiping strip to advance through the feeding detection and buffering module, the strip flipping mechanism, and the receiving detection and buffering module.

較佳地,該送料偵測暨緩衝模組更包括一布條調節機構,該布條調節機構係用以偵測該送料輪與該上夾輪之間的擦拭布條之長度變化,並在該擦拭布條變長到達一預設的上限時,令該送料模組停止輸送該擦拭布條,及在該擦拭布條變短到到達一預設的下限時,令該送料模組恢復輸送該擦拭布條;而該收料偵測暨緩衝模組亦包括一布條調節機構,該布條調節機構係用以偵測該下夾輪與該布料驅動裝置之間的擦拭布條之長度變化,並在該擦拭布條變長到達一預設的上限時,令該送料模組停止輸送該擦拭布條,及在該擦拭布條變短到到達一預設的下限時,令該送料模組恢復輸送該擦拭布條。 Preferably, the feeding detection and buffering module further comprises a strip adjusting mechanism for detecting a change in the length of the wiping strip between the feeding wheel and the upper clamping wheel, and When the wiping strip lengthens to a predetermined upper limit, the feeding module stops conveying the wiping strip, and when the wiping strip is shortened to reach a predetermined lower limit, the feeding module is resumed and transported. The wiping strip and the receiving detection and buffering module further comprise a strip adjusting mechanism for detecting the length of the wiping strip between the lower pinch wheel and the cloth driving device Changing, and when the wiping strip lengthens to a predetermined upper limit, causing the feeding module to stop conveying the wiping strip, and when the wiping strip is shortened to reach a predetermined lower limit, the feeding is made The module resumes transporting the wiper strip.

較佳地,該送料偵測暨緩衝模組之布條調節機構包括一滑軌、一滑座、一惰輪、一下偵測器及一上偵測器。該滑座係滑套於該滑軌。該惰輪係樞設於該滑座且藉本身重量而抵貼在位於該送料輪與該上夾輪之間的擦拭布條上。該下偵測器係用於偵測該滑座是否已到達該滑軌的底部,而該上偵測器係用於偵測該滑座是否已到達該滑軌的頂部。 Preferably, the strip adjustment mechanism of the feed detection and buffer module comprises a slide rail, a slide seat, an idler wheel, a lower detector and an upper detector. The sliding seat is sleeved on the sliding rail. The idler wheel is pivotally disposed on the sliding seat and is attached to the wiping strip between the feeding wheel and the upper clamping wheel by its own weight. The lower detector is used to detect whether the slider has reached the bottom of the slide rail, and the upper detector is used to detect whether the slider has reached the top of the slide rail.

較佳地,該板邊擦拭機構更包括一第一夾止裝置及一第二夾止裝置。其中,該第一夾止裝置設於該擦拭布條於該第一夾輪組之上夾輪及該布條翻轉機構之間的移動路徑上,而該第二夾 止裝置設於該擦拭布條於該第一夾輪組之下夾輪及該布條驅動裝置之間的移動路徑上。該第一及第二夾止裝置皆用以在該第一夾輪組之上、下夾輪進行夾壓動作前,先夾住該擦拭布條。 Preferably, the edge wiping mechanism further comprises a first clamping device and a second clamping device. The first clamping device is disposed on a moving path of the wiping strip between the clamping wheel and the strip turning mechanism of the first clamping wheel set, and the second clamping The stopping device is disposed on the moving path of the wiping strip between the clamping wheel below the first clamping wheel set and the strip driving device. The first and second clamping devices are configured to clamp the wiping strip before the clamping movement of the first clamping wheel set and the lower clamping wheel.

較佳地,該布條翻轉機構包括一第一Y向導輪、至少一X向導輪及一第二Y向導輪。其中,該第一Y向導輪之輪軸方向朝著Y方向。該至少一X向導輪之輪軸方向朝著X方向,且位於該第一Y向導輪的下方。該第二Y向導輪之輪軸方向朝著Y方向,且位於該X向導輪的下方。 Preferably, the strip turning mechanism comprises a first Y guide wheel, at least one X guide wheel and a second Y guide wheel. Wherein, the direction of the axle of the first Y guide wheel is toward the Y direction. The axle direction of the at least one X guide wheel is toward the X direction and is located below the first Y guide wheel. The wheel direction of the second Y guide wheel is oriented in the Y direction and is located below the X guide wheel.

較佳地,前述之至少一X向導輪包括平行的第一、第二及第三X向導輪,其中該第一X向導輪位於該第一Y向導輪的正下方,該第三X向導輪位於該第一X向導輪之正下方,而該第二X向導輪與該第一及第三X向導輪錯位,藉此該第一、第二及第三X向導輪共同界定一側向空間,以避開該通道。 Preferably, the at least one X guide wheel comprises parallel first, second and third X guide wheels, wherein the first X guide wheel is located directly below the first Y guide wheel, the third X guide wheel Located directly below the first X-guide wheel, the second X-guide wheel is misaligned with the first and third X-guide wheels, whereby the first, second, and third X-guide wheels collectively define a lateral space To avoid the channel.

較佳地,該布條翻轉機構更包括一第一斜向導輪及一第二斜向導輪。其中,該第一斜向導輪係位於該第一Y向導輪與該第一X向導輪之間,且其輪軸方向與X方向之間具有約30~60度的一夾角。該第二斜向導輪係位於該第三X向導輪與該第二Y導輪之間,且其輪軸方向與該第一斜向導輪之輪軸方向垂直。 Preferably, the strip turning mechanism further comprises a first inclined guide wheel and a second inclined guide wheel. The first oblique guide wheel is located between the first Y guide wheel and the first X guide wheel, and has an angle of about 30-60 degrees between the axle direction and the X direction. The second inclined guide wheel is located between the third X guide wheel and the second Y guide wheel, and the direction of the axle is perpendicular to the direction of the axle of the first inclined guide wheel.

較佳地,該布條驅動裝置包括一馬達、一傳動輪、一快拆桿、一連動座及一壓輪。其中,該傳動輪設於該馬達之一輸出軸。該快拆桿鄰設於該馬達。該連動座係連接該快拆桿,並受該快拆桿之連動而前進或後退。該壓輪係設於該連動座的一端,用以隨著該連動座之前進或後退,而壓抵或鬆開穿經該壓輪與該傳動輪之間的該擦拭布條。 Preferably, the strip driving device comprises a motor, a driving wheel, a quick release lever, a linkage seat and a pressure roller. Wherein, the transmission wheel is disposed on one of the output shafts of the motor. The quick release lever is adjacent to the motor. The linkage seat is connected to the quick release lever and is advanced or retracted by the linkage of the quick release lever. The pressure roller is disposed at one end of the linkage to press or release the wiping strip passing between the pressure roller and the transmission wheel as the linkage advances or retreats.

如上所述,本發明板之邊清洗設備確實能夠帶動一擦拭布條1前進,使其正面擦拭基板邊緣的頂面,再利用其背面再去擦拭該基板邊緣的底面,藉以有效率達成板邊清洗的作業。再者,本發明板邊清洗設備僅需要一送料輪,便能使擦拭布料之兩面皆充分利用到,無須再捲收廢料,故更可省捲收之麻煩。 As described above, the cleaning device of the board of the present invention can surely drive a wiping strip 1 to advance the top surface of the edge of the substrate, and then wipe the bottom surface of the edge of the substrate by using the back surface, thereby effectively achieving the edge of the board. Cleaning work. Furthermore, the edge cleaning device of the present invention only needs one feeding wheel, so that both sides of the wiping cloth can be fully utilized, and it is no longer necessary to rewind the waste, so that the trouble of saving the volume can be saved.

本發明: this invention:

100‧‧‧板邊清洗設備 100‧‧‧Plate cleaning equipment

101‧‧‧通道 101‧‧‧ channel

101a‧‧‧通道入口 101a‧‧‧channel entrance

101b‧‧‧通道出口 101b‧‧‧ channel exit

102‧‧‧板邊擦拭機構 102‧‧‧Blank wiping mechanism

1(1a~1d)‧‧‧擦拭布條 1(1a~1d)‧‧‧ Wipe strips

2‧‧‧基板 2‧‧‧Substrate

3‧‧‧機架 3‧‧‧Rack

4‧‧‧送料模組 4‧‧‧Feeding module

41‧‧‧送料輪 41‧‧‧ Feeding wheel

42‧‧‧送料驅動裝置 42‧‧‧Feed drive

51、52‧‧‧夾輪組 51, 52‧‧‧ Clip wheel set

511、512、521、522‧‧‧夾輪 511, 512, 521, 522‧ ‧ clip wheel

513、514、523、524‧‧‧汽壓缸 513, 514, 523, 524‧‧ ‧ steam cylinder

53、54‧‧‧夾止裝置 53, 54‧‧‧Clamping device

61‧‧‧送料偵測暨緩衝模組 61‧‧‧Feed detection and buffer module

611‧‧‧布條轉向機構 611‧‧‧ slat steering mechanism

612‧‧‧布條調節機構 612‧‧‧cloth adjustment mechanism

613‧‧‧滑軌 613‧‧‧rails

614‧‧‧滑座 614‧‧‧Slide

615‧‧‧惰輪 615‧‧‧ idler

616‧‧‧下偵測器 616‧‧‧Detector

617‧‧‧上偵測器 617‧‧‧Upstream detector

618‧‧‧凸片 618‧‧‧ 片片

62‧‧‧收料偵測暨緩衝模組 62‧‧‧Receipt detection and buffer module

621‧‧‧布條轉向機構 621‧‧‧ slat steering mechanism

622‧‧‧布條調節機構 622‧‧‧ slat adjustment mechanism

625‧‧‧惰輪 625‧‧‧ idler

7‧‧‧布條翻轉機構 7‧‧‧ slat turning mechanism

71、77‧‧‧第一、二Y向導輪 71, 77‧‧‧ first and second Y guide wheels

72、76‧‧‧第一、二斜向導輪 72, 76‧‧‧First and second inclined guide wheels

73~75‧‧‧第一、二、三X向導輪 73~75‧‧‧First, second and third X guide wheels

8‧‧‧布條驅動裝置 8‧‧‧Wire drive

81‧‧‧馬達 81‧‧‧Motor

82‧‧‧傳動輪 82‧‧‧Drive wheel

83‧‧‧快拆桿 83‧‧‧ quick release lever

84‧‧‧連動座 84‧‧‧ linkage

85‧‧‧壓輪 85‧‧‧pressure wheel

86‧‧‧太陽輪 86‧‧‧Sun wheel

習知: Convention:

2‧‧‧基板 2‧‧‧Substrate

9‧‧‧丙酮清洗裝置 9‧‧‧Acetone cleaning device

91、92‧‧‧送料輪 91, 92‧‧‧ Feeding wheel

93、94‧‧‧收料輪 93, 94‧‧‧ receiving wheels

95、96‧‧‧擦拭布條 95, 96‧‧‧ Wipe strips

第一圖係本發明板邊清洗設備的前視示意圖。 The first figure is a front view of the edge cleaning apparatus of the present invention.

第二及三圖係第一圖之板邊清洗設備的運作情形。 The second and third figures are the operation of the edge cleaning equipment of the first figure.

第四圖係第一圖之板邊清洗設備的布條調節機構之立體結構示意圖。 The fourth figure is a three-dimensional structure diagram of the cloth strip adjusting mechanism of the board edge cleaning device of the first figure.

第五圖係第一圖之板邊清洗設備的布條翻轉機構之立體結構示意圖。 The fifth figure is a three-dimensional structure diagram of the cloth strip turning mechanism of the board edge cleaning device of the first figure.

第六圖係第一圖之板邊清洗設備的布條驅動裝置之立體結構示意圖。 The sixth figure is a three-dimensional structure diagram of the cloth strip driving device of the board edge cleaning device of the first figure.

第七圖係第六圖之布條驅動裝置另一角度之立體結構示意圖。 The seventh figure is a three-dimensional structure diagram of the cloth driving device of the sixth figure.

第八圖係習知的板邊清洗設備。 The eighth figure is a conventional edge cleaning device.

第一至六圖係顯示本發明之板邊清洗設備100的一個較佳實施例,其包括一通道101、一超音波清洗機(圖未顯示)、一板邊擦拭機構102及一電漿清洗機(圖未顯示)。該通道101係供一基板2通過,使得該基板2的邊緣可依序進行超音波清洗、被擦拭及烘乾,以及最後進行電漿清洗,完成整套之板邊清洗作業。其中,該板邊擦拭機構102係由一控制系統(例如PLC控制系統)控制其運作,使得該板邊擦拭機構102能夠帶動一擦拭布條1(例如:不織布條)前進,以使該擦拭布條1的正面擦拭該基板2(例如:液晶面板)之邊緣的頂面,且翻轉該擦拭布條1使其繞經該基板2邊緣的底面,以使該擦拭布條1的背面擦拭該基板2邊緣的底面。 1 to 6 show a preferred embodiment of the edge cleaning apparatus 100 of the present invention, which includes a channel 101, an ultrasonic cleaning machine (not shown), a plate edge wiping mechanism 102, and a plasma cleaning. Machine (not shown). The channel 101 is for a substrate 2 to pass through, so that the edge of the substrate 2 can be ultrasonically cleaned, wiped and dried in sequence, and finally plasma-cleaned to complete the entire board edge cleaning operation. Wherein, the edge wiping mechanism 102 is controlled by a control system (for example, a PLC control system), so that the edge wiping mechanism 102 can drive a wiping strip 1 (for example, a non-woven strip) to advance the wiping cloth. The front surface of the strip 1 wipes the top surface of the edge of the substrate 2 (for example, a liquid crystal panel), and the wiping strip 1 is turned over to pass the bottom surface of the edge of the substrate 2 so that the back surface of the wiping strip 1 wipes the substrate 2 the bottom of the edge.

參閱第一至三圖,該基板2係由圖中右側之通道入口101a進入該板邊擦拭機構102,續經該板邊擦拭機構102的擦拭 後,再由圖中左側之通道出口101b離開。該基板2的移動行程主要係搭配該板邊擦拭機構102之運作而預先設定好的。更特別的是,該板邊擦拭機構102係刻意地被配置在翻轉該擦拭布條1的過程中,使該擦拭布條1避開該通道101,而不致影響該基板2通過該通道101,如第五圖所示。 Referring to the first to third figures, the substrate 2 enters the edge wiping mechanism 102 from the channel inlet 101a on the right side of the drawing, and continues to be wiped by the edge wiping mechanism 102. After that, it is separated by the channel exit 101b on the left side of the figure. The movement stroke of the substrate 2 is mainly set in advance in conjunction with the operation of the edge wiping mechanism 102. More specifically, the edge wiping mechanism 102 is deliberately disposed in the process of flipping the wiping strip 1 so that the wiping strip 1 avoids the passage 101 without affecting the passage of the substrate 2 through the passage 101. As shown in the fifth figure.

具體而言,參閱第一圖,該板邊擦拭機構102包括一機架3及設於該機架3上之一送料模組4、一第一夾輪組51及一第二夾輪組52、一送料偵測暨緩衝模組61、一收料偵測暨緩衝模組62、一布條翻轉機構7以及一布條驅動裝置8。 Specifically, referring to the first figure, the edge wiping mechanism 102 includes a frame 3 and a feeding module 4 disposed on the frame 3, a first clamping wheel set 51 and a second clamping wheel set 52. A feed detection and buffer module 61, a receiving detection and buffer module 62, a strip turning mechanism 7 and a strip driving device 8.

該送料模組4包括一送料輪41及一送料驅動裝置42(例如:馬達),其中該送料輪41係供裝載綑成一捲的該擦拭布條1,而該送料驅動裝置42係用以驅動該送料輪41送出該擦拭布條1,並送往該送料偵測暨緩衝模組61。 The feeding module 4 includes a feeding wheel 41 and a feeding driving device 42 (for example, a motor), wherein the feeding wheel 41 is for loading the wiping strip 1 bundled into a roll, and the feeding driving device 42 is for driving The feeding wheel 41 sends the wiping strip 1 and sends it to the feeding detection and buffer module 61.

大體而言,該擦拭布條1從該送料輪41送出之後,即依序繞經該送料偵測暨緩衝模組61、該第二夾輪組52、該第一夾輪組51、該布條翻轉機構7、及該收料偵測暨緩衝模組62,最後穿過該布條驅動裝置8,由該布條驅動裝置8牽動而離開該板邊擦拭機構102。另一方面,該基板2在經過CCD影像對位後,由圖中右側的通道入口101a進入,再依序穿過該布條翻轉機構7、該第一夾輪組51及該第二夾輪組52、最後由左側之該通道出口101b離開。 Generally, after the wiping strip 1 is sent out from the feeding wheel 41, the feeding detection and buffering module 61, the second clamping wheel set 52, the first clamping wheel set 51, and the cloth are sequentially passed. The strip reversing mechanism 7 and the receipt detecting and buffering module 62 finally pass through the strip driving device 8, and are pulled by the strip driving device 8 to leave the edge wiping mechanism 102. On the other hand, after the CCD image is aligned, the substrate 2 enters through the channel inlet 101a on the right side of the figure, and then sequentially passes through the cloth bar turning mechanism 7, the first pin wheel set 51 and the second pin wheel. Group 52 is finally separated by the channel exit 101b on the left side.

詳言之,該第一夾輪組51具有相對的一上夾輪511及一下夾輪512。其中,該上夾輪511受其上方的一汽壓缸513之驅動而可在一原始位置(第一圖)及一夾壓位置(第二圖)之間昇降位移。該下夾輪512受其下方的一汽壓缸514之驅動而可在一原始位置(第一圖)及一夾壓位置(第二圖)之間昇降位移。該上、下夾輪511、512所使用的滾輪均為惰輪,且該氣壓缸513(514)可藉由一氣壓比例閥來控制該上、下夾輪511、512(521、522)的夾壓力道。 In detail, the first pinch wheel set 51 has an upper upper clamping wheel 511 and a lower clamping wheel 512. The upper clamping wheel 511 is driven by a steam pressure cylinder 513 above it to be vertically displaced between a home position (first figure) and a clamping position (second figure). The lower pinch wheel 512 is driven by a lower steam pressure cylinder 514 to be vertically displaced between a home position (first figure) and a pinch position (second figure). The rollers used by the upper and lower clamping wheels 511, 512 are all idlers, and the pneumatic cylinder 513 (514) can control the upper and lower clamping wheels 511, 512 (521, 522) by a pneumatic proportional valve. Clamp pressure channel.

同樣地,該第二夾輪組52具有相對的一上夾輪521 及一下夾輪522。其中,該上夾輪521受其上方的一汽壓缸523之驅動而可在一原始位置(第一圖)及一夾壓位置(第三圖)之間昇降位移。該下夾輪522受其下方的一汽壓缸524之驅動而可在一原始位置(第一圖)及一夾壓位置(第三圖)之間昇降位移。該上、下夾輪521、522所使用的滾輪均為惰輪。 Similarly, the second pinch wheel set 52 has an opposite upper pinch wheel 521. And the pinch wheel 522. The upper clamping wheel 521 is driven by a steam pressure cylinder 523 above it to be vertically displaced between a home position (first figure) and a clamping position (third figure). The lower pinch wheel 522 is driven by a lower steam pressure cylinder 524 to be vertically displaced between a home position (first figure) and a pinch position (third figure). The rollers used by the upper and lower pinch rollers 521, 522 are all idlers.

另一方面,該基板2受一移載裝置(圖未顯示)之運送而前進至該第一夾輪組51及該第二夾輪組52之間的一擦拭區域,以接受該擦拭布條1之擦拭。如第二圖所示,該基板2之前緣正位於該第一夾輪組51的上、下夾輪511、512之間的夾壓位置。此時,行經該上、下夾輪511、512之該擦拭布條1的一在前片段(圖未標號,此指貼靠該上夾輪511的一小片段)及一在後片段(圖未標號,此指貼靠該下夾輪512的一小片段)正好分別受該上、下夾輪511、512的壓制而分別抵靠到該基板2之邊緣的頂面及底面。換言之,該基板2於前進的過程中恰可同時地被該擦拭布條1的兩片段擦拭到。不僅如此,該在前片段是以其正面來擦拭該基板邊緣的頂面,而該在後片段由於經歷過該布條翻轉機構7之翻轉故而是以其背面來擦拭該基板邊緣的底面。因此,該擦拭布條1之正、背兩面皆先後被使用以擦拭該基板2。 On the other hand, the substrate 2 is transported by a transfer device (not shown) to a wiping area between the first pinch set 51 and the second pinch set 52 to receive the wiper strip. 1 wipe. As shown in the second figure, the front edge of the substrate 2 is located at the nip position between the upper and lower pinch rollers 511, 512 of the first idle wheel set 51. At this time, a preceding segment of the wiping strip 1 passing through the upper and lower pinch rollers 511, 512 (not labeled, this refers to a small segment of the upper clamping wheel 511) and a posterior segment (Fig. Unreferenced, this means that a small segment of the lower clamping wheel 512 is pressed against the top and bottom surfaces of the edge of the substrate 2 by the pressing of the upper and lower clamping wheels 511, 512, respectively. In other words, the substrate 2 can be simultaneously wiped by the two segments of the wiping strip 1 during the advancement. Moreover, the preceding segment wipes the top surface of the edge of the substrate with its front side, and the rear segment wipes the bottom surface of the edge of the substrate with its back side due to the inversion of the strip turning mechanism 7. Therefore, both the front and back sides of the wiping strip 1 are used to wipe the substrate 2.

參閱第二圖,該送料偵測暨緩衝模組61位於該機架3的上半部且包括一布條轉向機構611及一布條調節機構612。該布條轉向機構611是由多個惰輪或轉向輪(圖未標號)所組成,用以引導該擦拭布條1a在從該送料輪41離開後,以其「背面朝上」的方式繞經該兩上夾輪511、521的下側,並朝一正X軸方向前進,也就是移往位於該機架3一側的該布條翻轉機構7。如此,該兩上夾輪511、521在下降後,該擦拭布條1a之正面便可接觸到該基板2之邊緣的頂面。該布條調節機構612係安插於該布條轉向機構611之中,藉以使該擦拭布條1a在受到該兩上夾輪511、521之上、下推動時維持適當張力。更確切地說,該布條調節機構612係用以偵測該送料輪4與該兩上夾輪511、521之間的擦拭布條1a之長度變 化,並在該擦拭布條1a變長到達一預設的上限時,令該送料模組4停止輸送該擦拭布條1a,及在該擦拭布條1a變短到到達一預設的下限時,令該送料模組4恢復輸送該擦拭布條1a。 Referring to the second figure, the feed detection and buffer module 61 is located in the upper half of the frame 3 and includes a strip steering mechanism 611 and a strip adjusting mechanism 612. The strip steering mechanism 611 is composed of a plurality of idler pulleys or steering wheels (not shown) for guiding the wiping strip 1a to wrap around the feed wheel 41 with its "back side up" The lower side of the upper clamping wheels 511, 521 is advanced in a positive X-axis direction, that is, to the strip turning mechanism 7 on the side of the frame 3. Thus, after the two upper clamping wheels 511, 521 are lowered, the front surface of the wiping strip 1a can contact the top surface of the edge of the substrate 2. The strip adjusting mechanism 612 is inserted into the strip steering mechanism 611 so that the wiping strip 1a maintains an appropriate tension when pushed up and down by the upper gripping wheels 511, 521. More specifically, the strip adjusting mechanism 612 is configured to detect the length of the wiping strip 1a between the feeding wheel 4 and the two upper clamping wheels 511, 521. And when the wiping strip 1a is lengthened to reach a predetermined upper limit, the feeding module 4 stops the feeding of the wiping strip 1a, and when the wiping strip 1a becomes short to reach a predetermined lower limit The feeding module 4 is restored to convey the wiping strip 1a.

該擦拭布條1b在離開該些上夾輪511、521後緊接前往該布條翻轉機構7,進行翻轉過程。如第三圖所示,該擦拭布條1b在繞經該布條翻轉機構7後會被翻轉,使得翻轉後之該擦拭布條1c能仍以「背面朝上」的姿態沿著該基板2的下方朝一負X軸方向前進,猶如在X-Z平面上進行迴轉(詳如後述),接著前進到該收料偵測暨緩衝模組62。 After the wiping strip 1b leaves the upper clamping wheels 511, 521, it goes to the strip turning mechanism 7 to perform the turning process. As shown in the third figure, the wiping strip 1b is turned over after being passed around the strip reversing mechanism 7, so that the wiping strip 1c after being turned over can still follow the substrate 2 in a "back facing up" posture. The lower portion advances in a negative X-axis direction as if it is rotated on the XZ plane (described later), and then proceeds to the receiving detection and buffer module 62.

參閱第二圖,該收料偵測暨緩衝模組62位於該機架3的下半部且包括一布條轉向機構621及一布條調節機構622。該布條轉向機構621是由多個惰輪或轉向輪(圖未標號)所組成,用以引導該擦拭布條1c繞經該兩下夾輪512、522的上側並朝該負X軸方向前進,並接著轉向前往下方之該布條驅動裝置8。如此,該兩下夾輪512、522在上昇後,該擦拭布條1c之背面便可接觸到該基板2之邊緣的底面。該布條調節機構622係安插於該布條轉向機構621之中,藉以使該擦拭布條1c在受到該兩下夾輪512、522之上、下推動時維持適當張力。更確切地說,該布條調節機構622係用以偵測該兩下夾輪512、522與該布料驅動裝置8之間的擦拭布條1d之長度變化,並在該擦拭布條1d變長到達一預設的上限時,令該送料模組4停止輸送該擦拭布條1a,及在該擦拭布條1d變短到到達一預設的下限時,令該送料模組4恢復輸送該擦拭布條1a。由此可知,該送料模組4之送料與否受制於該送料偵測暨緩衝模組61之布條調節機構612以及該收料偵測暨緩衝模組62之布條調節機構622。 Referring to the second figure, the receiving detection and buffer module 62 is located in the lower half of the frame 3 and includes a strip steering mechanism 621 and a strip adjusting mechanism 622. The strip steering mechanism 621 is composed of a plurality of idlers or steering wheels (not labeled) for guiding the wiping strip 1c around the upper sides of the lower jaws 512, 522 and toward the negative X-axis. Advancing, and then turning to the strip drive unit 8 below. Thus, after the two lower clamping wheels 512, 522 are raised, the back surface of the wiping strip 1c can contact the bottom surface of the edge of the substrate 2. The strip adjusting mechanism 622 is inserted into the strip steering mechanism 621 so that the wiping strip 1c maintains an appropriate tension when pushed up and down by the lower gripping wheels 512, 522. More specifically, the strip adjusting mechanism 622 is configured to detect a change in the length of the wiping strip 1d between the lower clamping wheels 512, 522 and the cloth driving device 8, and the length of the wiping strip 1d is long. When the preset upper limit is reached, the feeding module 4 stops the feeding of the wiping strip 1a, and when the wiping strip 1d becomes shorter to reach a predetermined lower limit, the feeding module 4 resumes the feeding of the wiping Cloth 1a. It can be seen that the feeding of the feeding module 4 is subject to the strip adjusting mechanism 612 of the feeding detection and buffer module 61 and the strip adjusting mechanism 622 of the receiving detection and buffer module 62.

在本實施例中,該送料偵測暨緩衝模組61之布條調節機構612以及該收料偵測暨緩衝模組62之布條調節機構622之機構及作動原理相同,今僅簡述其一。請參閱第四圖並配合第二圖所示,以該送料偵測暨緩衝模組61之布條調節機構612為例,該布條 調節機構612為了確保該擦拭布條1a被順暢地輸送,其包括一滑軌613、一滑座614、一惰輪615、一下偵測器616及一上偵測器617。如圖所示,該滑座614係滑套於該滑軌613上,該惰輪615係樞設於該滑座614且藉本身重量而抵貼於在位於該送料輪4與該上夾輪521之間的擦拭布條1a上,該下偵測器616係用於偵測該滑座614是否已到達該滑軌613的底部,而該上偵測器617係用於偵測該滑座614是否已到達該滑軌613的頂部。在本實施例中,該下偵測器616與該上偵測器617均選用光遮斷器,故該滑座614具有一凸片618用於切斷光遮斷器內的偵測光束,詳細內容可參考台灣專利申請案公開號第201522181號,題為「捲帶輸送機構」。然而,前述構造僅是該布條調節機構612的一個例子,不以此為限,例如也可以使用光學尺來取代。 In this embodiment, the mechanism and the operating principle of the strip adjusting mechanism 612 of the feeding detection and buffer module 61 and the strip adjusting mechanism 622 of the receiving detection and buffer module 62 are the same. One. Referring to the fourth figure and the second figure, the strip adjusting mechanism 612 of the feeding detection and buffer module 61 is taken as an example. In order to ensure that the wiping strip 1a is smoothly conveyed, the adjusting mechanism 612 includes a sliding rail 613, a sliding seat 614, an idler pulley 615, a lower detector 616 and an upper detector 617. As shown in the figure, the slider 614 is sleeved on the slide rail 613. The idler pulley 615 is pivotally disposed on the slide base 614 and is attached to the feed wheel 4 and the upper clamp wheel by its own weight. The lower detector 616 is used to detect whether the slider 614 has reached the bottom of the slide rail 613, and the upper detector 617 is used to detect the slider. Whether 614 has reached the top of the slide rail 613. In this embodiment, the lower detector 616 and the upper detector 617 both use a photo interrupter, so the slider 614 has a tab 618 for cutting the detection beam in the photointerrupter. For details, refer to Taiwan Patent Application Publication No. 201522181, entitled "Rolling and Transporting Mechanism". However, the foregoing configuration is only an example of the strip adjusting mechanism 612, and is not limited thereto. For example, an optical scale may be used instead.

此外,該板邊擦拭機構102更包括一第一夾止裝置53及一第二夾止裝置54。該第一夾止裝置53係設於該擦拭布條1b於該第一夾輪組51之上夾輪511及該布條翻轉機構7之間的移動路徑上;而該第二夾止裝置54係設於該擦拭布條1d於該第二夾輪組52之下夾輪522及該布條驅動裝置8之間的移動路徑上。其中,該第一及第二夾止裝置53、54皆用以在該第一夾輪組51之上、下夾輪511、512進行夾壓動作前,先夾住該擦拭布條1。 In addition, the edge wiping mechanism 102 further includes a first clamping device 53 and a second clamping device 54. The first clamping device 53 is disposed on a moving path between the wiping strip 1b on the first clamping wheel set 51 and the strip turning mechanism 7; and the second clamping device 54 The wiping strip 1d is disposed on a moving path between the pinch wheel 522 and the strip driving device 8 below the second pinch wheel set 52. The first and second clamping devices 53 and 54 are used to clamp the wiping strip 1 before the clamping operation of the upper and lower clamping wheels 511 and 512.

請參閱第五圖,該布條翻轉機構7由上而下依序包括一第一Y向導輪71、一第一斜向導輪72、三個X向導輪73~75、一第二斜向導輪76及一第二Y向導輪77,藉以順暢地翻轉前述背面朝上的擦拭布條1b,使翻轉後之擦拭布條1c仍以背面朝上的姿態由下方迴轉。顧名思義,該第一及第二Y向導輪71、77之輪軸方向皆係朝著Y方向,而該些X向導輪73~75之輪軸方向皆朝著X方向。較特別的是,該第一斜向導輪72之輪軸方向與X方向之間具有約30~60度的一夾角,且與該第二斜向導輪76之輪軸方向垂直。 Referring to the fifth figure, the strip turning mechanism 7 includes a first Y guide wheel 71, a first inclined guide wheel 72, three X guide wheels 73-75, and a second inclined guide wheel from top to bottom. 76 and a second Y guide wheel 77, whereby the back-facing wiping strip 1b is smoothly turned over, so that the inverted wiping strip 1c is rotated from below by the back-up posture. As the name suggests, the first and second Y guide wheels 71, 77 are oriented in the Y direction, and the X-axis wheels 73-75 are oriented in the X direction. More specifically, the first oblique guide wheel 72 has an angle of about 30 to 60 degrees between the axle direction and the X direction, and is perpendicular to the axle direction of the second inclined guide wheel 76.

事實上,擦拭過該基板2後之該擦拭布條1b經過該第一Y向導輪71及該第一X向導輪73後便能夠被旋轉90度,故 而位於該第一Y向導輪71與該第一X向導輪73之間的該第一斜向導輪72主要是輔助該擦拭布條1b之順暢旋轉。較佳地,該第一斜向導輪72之輪軸方向與X方向之間的夾角為45度。同樣地,該擦拭布條1b從該第三X向導輪75至該第二Y向導輪77後便能夠再被旋轉90度,故而位於該第三X向導輪75與該第二Y向導輪77之間的該第二斜向導輪76主要是輔助該擦拭布條1b之順暢旋轉。較佳地,該第二斜向導輪76之輪軸方向與X方向之間的夾角為45度。總而言之,該擦拭布條1b從該第一Y向導輪71至該第二Y向導輪77共被旋轉180度。值得注意的是,該些X向導輪73~75中的該第一X向導輪73位於該第一Y向導輪72的正下方,該第三X向導輪75位於該第一X向導輪73之正下方,而該第二X向導輪74係與該第一及第三X向導輪73、75錯位,藉此該些X向導輪73~75共同界定一側向空間,以避開該基板2行經的該通道101。 In fact, the wiping strip 1b after wiping the substrate 2 can be rotated by 90 degrees after passing through the first Y-guide wheel 71 and the first X-guide wheel 73. The first inclined guide wheel 72 located between the first Y guide wheel 71 and the first X guide wheel 73 mainly assists the smooth rotation of the wiping strip 1b. Preferably, the angle between the axle direction of the first inclined guide wheel 72 and the X direction is 45 degrees. Similarly, the wiping strip 1b can be rotated 90 degrees after the third X-guide wheel 75 to the second Y-guide wheel 77, so that the third X-guide wheel 75 and the second Y-guide wheel 77 are located. The second inclined guide wheel 76 is mainly for assisting the smooth rotation of the wiping strip 1b. Preferably, the angle between the axle direction of the second inclined guide wheel 76 and the X direction is 45 degrees. In summary, the wiping strip 1b is rotated a total of 180 degrees from the first Y guide wheel 71 to the second Y guide wheel 77. It should be noted that the first X-guide wheel 73 of the X-guide wheels 73-75 is located directly below the first Y-guide wheel 72, and the third X-guide wheel 75 is located at the first X-guide wheel 73. Directly below, the second X-guide wheel 74 is misaligned with the first and third X-guide wheels 73, 75, whereby the X-guide wheels 73-75 jointly define a lateral space to avoid the substrate 2 The channel 101 that passes through.

參閱第六及七圖,該布條驅動裝置8主要包括一馬達81、設於該馬達81之輸出軸(圖未顯示)上的一傳動輪82、鄰設於該馬達81的一快拆桿83、連接該快拆桿83的一連動座84以及設於該連動座84一端的一壓輪85。其中,該連動座84受該快拆桿83之連動而前進或後退,進而能帶動該壓輪85壓抵或鬆開穿經該壓輪85與該傳動輪82之間的該擦拭布條1d。如此,使用者可快速地藉由切換該快拆桿83之位置而使該擦拭布條1d被該壓輪85與該傳動輪82夾緊或鬆開。當該擦拭布條1d被夾緊時,該馬達82可不斷地帶動該擦拭布條1d前進,使該擦拭布條1d離開該板邊擦拭機構102,反之則否。此外,該布條驅動裝置8更包括一太陽輪86,用以計算該擦拭布條1d的前進距離。 Referring to the sixth and seventh figures, the strip driving device 8 mainly includes a motor 81, a transmission wheel 82 disposed on an output shaft (not shown) of the motor 81, and a quick release lever adjacent to the motor 81. 83. A linkage 84 connecting the quick release lever 83 and a pressure roller 85 disposed at one end of the linkage 84. Wherein, the connecting seat 84 is advanced or retracted by the interlocking lever 83, so that the pressing wheel 85 can be driven to press or release the wiping strip 1d passing between the pressing wheel 85 and the driving wheel 82. . Thus, the user can quickly clamp or loosen the wiping strip 1d by the pressing wheel 85 and the driving wheel 82 by switching the position of the quick release lever 83. When the wiping strip 1d is clamped, the motor 82 can continuously drive the wiping strip 1d to advance, so that the wiping strip 1d leaves the edge wiping mechanism 102, and vice versa. In addition, the strip driving device 8 further includes a sun gear 86 for calculating the advancement distance of the wiping strip 1d.

底下將敘述該基板2行經本發明板邊清洗設備之通道101時,該板邊擦拭機構102對該基板進行擦拭之運作過程:起初,如第一圖所示,該板邊擦拭機構102之第一夾止裝置53及第二夾止裝置54皆係呈鬆開狀態,亦即尚未夾住該擦拭布條1b、1d,而在另一方面,該基板2經過CCD影像對位後已 進入該通道101內。 The operation of wiping the substrate by the edge wiping mechanism 102 when the substrate 2 passes through the channel 101 of the edge cleaning apparatus of the present invention will be described below: initially, as shown in the first figure, the edge wiping mechanism 102 is A clamping device 53 and a second clamping device 54 are in a loosened state, that is, the wiping strips 1b, 1d have not been clamped, and on the other hand, the substrate 2 has been aligned by the CCD image. Enter the channel 101.

接著,如第二圖所示,該基板2之前緣已經抵達該第一夾輪組51的上、下夾輪511、512之間,該第一及第二夾止裝置53、54隨即分別夾住該擦拭布條1b、1d,使其無法前進或後退。在該擦拭布條1b、1d被夾定後,該第一夾輪組51的上、下夾輪511、512隨即開始相對移動到夾壓該基板2之位置。該第一及第二夾止裝置53、54之夾定動作可避免該擦拭布條1b、1d在後來之夾壓過程中被回拉,確保該擦拭布條1b、1d之預定部位確實能分別抵貼至該基板2邊緣之頂面及底面。值得關注的是,在該上、下夾輪511、512夾壓的過程中,該送料偵測暨緩衝模組61之布條調節機構612的惰輪615也逐漸因釋放該擦拭布條1b而略微上升,但尚未達到該布條調節機構612之頂部。同理,該收料偵測暨緩衝模組62之布條調節機構622的惰輪625在該上、下夾輪511、512夾壓的過程中,也逐漸因釋放該擦拭布條1d而略微上升,但同樣尚未達到該布條調節機構622之頂部。 Next, as shown in the second figure, the leading edge of the substrate 2 has reached between the upper and lower pinch rollers 511, 512 of the first pinch wheel set 51, and the first and second clamping devices 53, 54 are respectively clamped. The wiping strips 1b, 1d are held so that they cannot advance or retreat. After the wiping strips 1b, 1d are clamped, the upper and lower pinch rollers 511, 512 of the first pinch wheel set 51 are then relatively moved to a position where the substrate 2 is clamped. The clamping action of the first and second clamping devices 53, 54 prevents the wiping strips 1b, 1d from being pulled back during the subsequent clamping process, ensuring that the predetermined portions of the wiping strips 1b, 1d can be respectively separated. Adhered to the top and bottom surfaces of the edge of the substrate 2. It is to be noted that during the clamping of the upper and lower pincers 511, 512, the idler 615 of the strip adjusting mechanism 612 of the feeding detection and buffer module 61 is gradually released by releasing the wiping strip 1b. It rises slightly but has not yet reached the top of the strip adjustment mechanism 612. Similarly, the idler 625 of the strip adjusting mechanism 622 of the receiving detection and buffer module 62 is gradually released by the release of the wiping strip 1d during the clamping of the upper and lower clamping wheels 511 and 512. Rising, but also not reaching the top of the strip adjustment mechanism 622.

待被該第一夾輪組51之上、下夾輪511、512夾壓之後,該基板2續沿著該通道101前進,且在前進的過程中,該上、下夾輪511、512之該擦拭布條1b、1c並不移動,藉此其上沾滿之丙酮或酒精來用來對該基板2之邊緣進行清潔。 After being clamped by the upper and lower clamping wheels 511, 512 of the first pinch wheel set 51, the substrate 2 continues to advance along the channel 101, and during the advancement process, the upper and lower pinch wheels 511, 512 The wiping strips 1b, 1c are not moved, whereby the edges of the substrate 2 are cleaned by the saturated acetone or alcohol.

如第三圖所示,當該基板2之前緣前進到該第二夾輪組52之上、下夾輪521、522之間時,該上、下夾輪521、522開始相對移動到夾壓該基板2之位置。此時,該送料偵測暨緩衝模組61之布條調節機構612的惰輪615也會再上升一些,但尚未達到該布條調節機構612之頂部,且該收料偵測暨緩衝模組62之布條調節機構622的惰輪625亦同。隨後,該基板2在受到該上、下夾輪521、522之夾壓後繼續朝著該通道出口101b前進,且在前進的過程中,該基板2之邊緣會受到該上、下夾輪521、522上之該擦拭布條1a、1d擦拭。 As shown in the third figure, when the leading edge of the substrate 2 advances between the second pinch wheel set 52 and the lower pinch wheel 521, 522, the upper and lower pinch wheels 521, 522 start to move relative to the pinch. The position of the substrate 2. At this time, the idler 615 of the strip adjusting mechanism 612 of the feeding detection and buffer module 61 is further raised, but has not yet reached the top of the strip adjusting mechanism 612, and the receiving detection and buffer module The idler 625 of the cloth regulating mechanism 622 of 62 is also the same. Subsequently, the substrate 2 continues to advance toward the channel outlet 101b after being sandwiched by the upper and lower pinch rollers 521, 522, and the edge of the substrate 2 is subjected to the upper and lower pincers 521 during the advancement process. The wiper strips 1a, 1d on 522 are wiped.

直到該基板2之行程終了,也就是脫離該上、下夾 輪521、522後,該第一及第二夾輪組51、52之上夾輪511、521及下夾輪512、522便都相繼退回原位,如第一圖所示。隨後該第一及第二夾止裝置53、54也跟著鬆開,釋放該擦拭布條1b、1d,以允許該布條驅動裝置8隨後將該擦拭布條1d往前拉動一小段的預定距離(例如:5~6mm),使該擦拭布條1整個前進該預定距離,而該布條驅動裝置8之太陽輪86便是用以計算該預定距離。藉此,該擦拭布條1的擦拭部位可以被更新,供下一基板擦拭。 Until the end of the journey of the substrate 2, that is, the upper and lower clips are separated After the wheels 521, 522, the upper and second pinch wheels 511, 521 and the lower pinch wheels 512, 522 of the first and second pinch wheel sets 51, 52 are successively retracted, as shown in the first figure. The first and second clamping devices 53, 54 are then subsequently released, releasing the wiping strips 1b, 1d to allow the strip driving device 8 to subsequently pull the wiping strip 1d forward by a predetermined distance. (For example, 5 to 6 mm), the wiping strip 1 is advanced all the predetermined distance, and the sun gear 86 of the strip driving device 8 is used to calculate the predetermined distance. Thereby, the wiping portion of the wiping strip 1 can be renewed for wiping the next substrate.

隨著該擦拭布條1逐步地被使用後,該送料偵測暨緩衝模組61之布條調節機構612的惰輪615也將逐步上升到該布條調節機構612之頂部。此時,該送料偵測暨緩衝模組61便會立即通知該送料模組4補料,且補料過程將持續直到該惰輪615下降到該布條調節機構612的底部為止,才會要求該送料模組4暫停補料。同樣地,若是下方之惰輪625上升到該布條調節機構622之頂部時,該收料偵測暨緩衝模組62也會通知該送料模組4補料,直到該惰輪625下降到該布條調節機構622的底部為止,才會要求該送料模組4暫停補料。值得注意的是,欲進行補料時,該些夾輪511、521、512、522皆須先退回原位,且該些夾止裝置53、54也須呈鬆開狀態。 As the wiping strip 1 is used step by step, the idler 615 of the strip adjusting mechanism 612 of the feed detecting and buffering module 61 will also gradually rise to the top of the strip adjusting mechanism 612. At this time, the feeding detection and buffer module 61 will immediately notify the feeding module 4 to feed, and the feeding process will continue until the idler 615 descends to the bottom of the strip adjusting mechanism 612. The feeding module 4 suspends feeding. Similarly, if the lower idler 625 is raised to the top of the strip adjusting mechanism 622, the receiving detection and buffer module 62 also notifies the feeding module 4 to feed until the idler 625 descends to the The feeding module 4 is required to suspend feeding until the bottom of the strip adjusting mechanism 622. It should be noted that when the feeding is to be performed, the pincers 511, 521, 512, and 522 must first be returned to the original position, and the clamping devices 53, 54 must also be in a released state.

藉由上述設置,本發明板邊清洗設備之板邊擦拭機構確實能夠帶動一擦拭布條前進,使其正面擦拭基板邊緣的頂面,再利用其背面再去擦拭該基板邊緣的底面,藉以有效率達成板邊清洗的作業。再者,本發明板邊清洗設備之板邊擦拭機構僅需要一送料輪,便能使擦拭布料之兩面皆充分利用到,無須再捲收廢料,故更可省捲收之麻煩。 With the above arrangement, the edge wiping mechanism of the edge cleaning device of the present invention can surely drive a wiping strip to advance the top surface of the edge of the substrate, and then use the back surface to wipe the bottom surface of the substrate edge, thereby Efficiency achieves board-side cleaning. Furthermore, the edge wiping mechanism of the edge cleaning device of the present invention only needs one feeding wheel, so that both sides of the wiping cloth can be fully utilized, and the scrap is not required to be retracted, so that the trouble of saving the volume can be saved.

無論如何,任何人都可以從上述例子的說明獲得足夠教導,並據而了解本發明內容確實不同於先前技術,且具有產業上之利用性,及足具進步性。是本發明確已符合專利要件,爰依法提出申請。 In any event, anyone can obtain sufficient teaching from the description of the above examples, and it is understood that the present invention is indeed different from the prior art, and is industrially usable and progressive. It is the invention that has indeed met the patent requirements and has filed an application in accordance with the law.

Claims (6)

一種板邊清洗設備,包括:一機架;一送料模組,設於該機架的一上方位置,用以裝載一捲擦拭布條及送出該擦拭布條;一布條驅動裝置,設於該機架的一下方位置,用以牽動該擦拭布條從該送料模組出發並往該機架的底部前進;一第一夾輪組,設於該機架上,且位於該送料模組與該布條驅動裝置之間,並包括上、下相對且可相對移動到一原始位置或一夾壓位置的一上夾輪與一下夾輪,該上、下夾輪之間形成一通道供一基板的一邊緣通過,並在該夾壓位置分別抵靠到該基板之該邊緣的頂面及底面,及在該原始位置分別遠離該頂面及底面;及一布條翻轉機構,設於該機架上,且位於該送料模組與該布條驅動裝置之間,及位於該上、下夾輪的一側,並能讓行經該第一夾輪組的該基板繼續通過;其中,該布條翻轉機構包括由上而下排列之一第一Y向導輪、一第一斜向導輪、三個X向導輪、一第二斜向導輪及一第二Y向導輪,該第一及第二Y向導輪之輪軸方向皆係朝著Y方向,該些X向導輪之輪軸方向皆朝著X方向,該第一斜向導輪之輪軸方向與X方向之間具有約30~60度的一夾角,且與該第二斜向導輪之輪軸方向垂直。 A board edge cleaning device includes: a rack; a feeding module disposed at an upper position of the rack for loading a roll of wiping cloth strips and sending the wiping cloth strips; and a strip driving device disposed at a lower position of the rack for pulling the wiping strip from the feeding module and advancing to the bottom of the rack; a first clamping wheel set is disposed on the rack and located at the feeding module And an upper clamping wheel and a lower clamping wheel, which are opposite to the upper and lower sides and are relatively movable to an original position or a clamping position, and a passage is formed between the upper and lower clamping wheels. An edge of a substrate passes through, and abuts against a top surface and a bottom surface of the edge of the substrate at the clamping position, and away from the top surface and the bottom surface respectively at the original position; and a strip flipping mechanism is disposed at The rack is located between the feeding module and the strip driving device, and on one side of the upper and lower clamping wheels, and can pass the substrate passing through the first clamping wheel set; wherein The strip turning mechanism includes one of the first Y guide wheels arranged from top to bottom, a first oblique guide wheel, three X-guide wheels, a second inclined guide wheel and a second Y-guide wheel, the first and second Y-guide wheels are oriented in the Y direction, and the X guides The wheel axis direction of the wheel is all toward the X direction, and the first oblique guide wheel has an angle of about 30 to 60 degrees between the axle direction and the X direction, and is perpendicular to the axle direction of the second inclined guide wheel. 如申請專利範圍第1項所述之板邊清洗設備,更包括設於該機架上的兩布條調節機構,其中一布條調節機構係用以偵測該送料輪與該上夾輪之間的擦拭布條之長度變化,並在該擦拭布條變長到達一預設的上限時,令該送料模組停止輸送該擦拭布條,及在該擦拭布條變短到到達一預設的下限時,令該送料模組恢復輸送該擦拭布條;另一布條調節機構係用以偵測該下夾輪與該布料驅動裝置之間的擦拭布條之長度變化,並在該擦拭布條變長到達一預設的上限時,令該送料模組停止輸送該擦拭布條,及在該擦拭布條變短到到達一預設的下限時,令該送料模組恢復輸送該擦拭布條。 The board edge cleaning device of claim 1, further comprising two strip adjusting mechanisms disposed on the frame, wherein a strip adjusting mechanism is configured to detect the feeding wheel and the upper clamping wheel The length of the wiping strip varies, and when the wiping strip lengthens to a predetermined upper limit, the feeding module stops conveying the wiping strip, and the wiping strip becomes shorter until a preset is reached When the lower limit is lower, the feeding module is resumed to transport the wiping strip; the other strip adjusting mechanism is configured to detect a change in the length of the wiping strip between the lower clamping wheel and the cloth driving device, and in the wiping When the strip length reaches a preset upper limit, the feeding module stops conveying the wiping strip, and when the wiping strip becomes shorter to reach a predetermined lower limit, the feeding module resumes conveying the wiping Cloth. 如申請專利範圍第2項所述之板邊清洗設備,其中該布條調節機構包括:一滑軌;一滑座,係滑套於該滑軌;一惰輪,係樞設於該滑座且藉本身重量而抵貼在位於該送料模組的一送料輪與該上夾輪之間的擦拭布條上;一下偵測器,係用於偵測該滑座是否已到達該滑軌的底部;以及一上偵測器,係用於偵測該滑座是否已到達該滑軌的頂部。 The board edge cleaning device of claim 2, wherein the strip adjusting mechanism comprises: a sliding rail; a sliding seat, the sliding sleeve is disposed on the sliding rail; and an idler pulley is pivotally disposed on the sliding seat And by its own weight, it is attached to the wiping strip between a feeding wheel of the feeding module and the upper clamping wheel; the lower detector is used to detect whether the sliding seat has reached the sliding rail. a bottom; and an upper detector for detecting whether the slider has reached the top of the slide. 如申請專利範圍第1項所述之板邊清洗設備,更包括: 一第一夾止裝置,設於該擦拭布條於該第一夾輪組之上夾輪及該布條翻轉機構之間的移動路徑上;及一第二夾止裝置,設於該擦拭布條於該第一夾輪組之下夾輪及該布條驅動裝置之間的移動路徑上;其中,該第一及第二夾止裝置皆用以在該第一夾輪組之上、下夾輪進行夾壓動作前,先夾住該擦拭布條。 For example, the edge cleaning equipment described in claim 1 of the patent scope further includes: a first clamping device is disposed on the moving path of the wiping strip between the clamping wheel and the strip turning mechanism of the first clamping wheel set; and a second clamping device disposed on the wiping cloth a moving path between the pinch wheel and the strip driving device under the first pinch wheel set; wherein the first and second pinching devices are used to be above and below the first pinch wheel set Before the pinch wheel performs the clamping operation, the wiping strip is clamped first. 如申請專利範圍第1項所述之板邊清洗設備,其中前述之至少一X向導輪包括平行的第一、第二及第三X向導輪,其中該第一X向導輪位於該第一Y向導輪的正下方,該第三X向導輪位於該第一X向導輪之正下方,而該第二X向導輪與該第一及第三X向導輪錯位,藉此該第一、第二及第三X向導輪共同界定一側向空間,以避開該通道。 The board edge cleaning apparatus of claim 1, wherein the at least one X guide wheel comprises parallel first, second and third X guide wheels, wherein the first X guide wheel is located at the first Y Directly below the guide wheel, the third X-guide wheel is located directly below the first X-guide wheel, and the second X-guide wheel is misaligned with the first and third X-guide wheels, thereby the first and second And the third X-guide wheel collectively defines a lateral space to avoid the passage. 如申請專利範圍第1項所述之板邊清洗設備,其中該布條驅動裝置包括:一馬達,具有一輸出軸;一傳動輪,設於該馬達之輸出軸;一快拆桿,鄰設於該馬達;一連動座,連接該快拆桿,並受該快拆桿之連動而前進或後退;及一壓輪,設於該連動座的一端,用以隨著該連動座之前進或後退,而壓抵或鬆開穿經該壓輪與該傳動輪之間的該擦拭布條。 The board edge cleaning device of claim 1, wherein the cloth strip driving device comprises: a motor having an output shaft; a transmission wheel disposed on the output shaft of the motor; and a quick release lever, adjacent The motor; a linkage, connecting the quick release lever and being advanced or retracted by the quick release lever; and a pressure roller disposed at one end of the linkage for advancing with the linkage Retreating and pressing or loosening the wiping strip passing between the pressure roller and the transmission wheel.
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CN116274053A (en) * 2023-05-19 2023-06-23 深圳市易天自动化设备股份有限公司 Polaroid edge cleaning equipment

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CN111940374A (en) * 2020-05-25 2020-11-17 南京冠石科技股份有限公司 Automatic cleaning system for liquid crystal display terminal

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CN202823937U (en) * 2012-07-16 2013-03-27 厦门宏焌电子科技有限公司 Cleaning device of display panel

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Publication number Priority date Publication date Assignee Title
CN202823937U (en) * 2012-07-16 2013-03-27 厦门宏焌电子科技有限公司 Cleaning device of display panel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116274053A (en) * 2023-05-19 2023-06-23 深圳市易天自动化设备股份有限公司 Polaroid edge cleaning equipment

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