TWI636278B - Brightening film structure with quantum dots and manufacturing method thereof - Google Patents

Brightening film structure with quantum dots and manufacturing method thereof Download PDF

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TWI636278B
TWI636278B TW106139044A TW106139044A TWI636278B TW I636278 B TWI636278 B TW I636278B TW 106139044 A TW106139044 A TW 106139044A TW 106139044 A TW106139044 A TW 106139044A TW I636278 B TWI636278 B TW I636278B
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brightness enhancement
enhancement film
quantum
photocurable coating
substrate
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TW201918730A (en
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呂耀暉
蔡秉諭
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瑩耀科技股份有限公司
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Abstract

一種具量子點之增亮膜結構及其製作方法,包括:一光固化塗料均勻塗佈於一基片上;光固化塗料由光敏樹脂與量子點或量子棒充分混合成,光固化塗料及基片加壓光照固化成型稜鏡微結構於基片上,前述稜鏡微結構為連續稜鏡峰與稜鏡谷的形狀;以之光固化塗料及基片加壓光照固化結合成具量子點稜鏡微結構之增亮膜,達到本發明背光模組不需使用習知量子點膜,即具有高飽和光源及高演色性與省電,且本發明之增亮膜可降低藍光的產生或消弭藍光對人眼的傷害者。 A brightness enhancement film structure with quantum dots and a manufacturing method thereof, comprising: uniformly coating a photocurable coating on a substrate; the photocurable coating is fully mixed with a photosensitive resin and a quantum dot or a quantum rod, and the photocurable coating and the substrate are The light-cured light-cured microstructure is formed on the substrate, and the 稜鏡 microstructure is a continuous peak and a valley shape; the photo-curable coating and the substrate are pressed and cured by light to form a quantum dot structure. The brightness enhancement film can achieve the backlight module of the invention without using a conventional quantum dot film, that is, has a high saturation light source and high color rendering and power saving, and the brightness enhancement film of the invention can reduce the generation of blue light or eliminate blue light. Eye hurter.

Description

具量子點之增亮膜結構及其製作方法 Brightening film structure with quantum dots and manufacturing method thereof

本發明提供一種背光模組之技術領域,尤指其技術上提供一種具量子點之增亮膜結構及其製作方法,其以內含量子點或量子棒的光固化塗料及基片加壓光照固化,得其具量子點稜鏡微結構之增亮膜。 The invention provides a technical field of a backlight module, in particular to a technology for providing a brightness-enhancing film structure with quantum dots and a manufacturing method thereof, wherein the photo-curing coating with internal content points or quantum rods and the substrate are pressed and illuminated. Curing, it has a brightness enhancement film with a quantum dot structure.

按,傳統習知具有量子點結構之背光面板,如第一圖所示,大多是光源11上層具反射板12,反射板12上層設有第一及第二下擴散片13、14,第一及第二下擴散片13、14上方再鋪設一層量子點膜15,之後在鋪上集光膜16(或稱增亮膜),最上一層則為上擴散片17,以之構成習知具量子點背光模組10。 According to the conventional conventional backlight panel having a quantum dot structure, as shown in the first figure, most of the light source 11 has a reflector 12 on the upper layer, and the first and second lower diffusion sheets 13 and 14 are disposed on the upper layer of the reflector 12, first. And a layer of quantum dot film 15 is laid over the second lower diffusion sheets 13 and 14, and then the light collecting film 16 (or brightness enhancement film) is laid on the upper layer, and the upper layer is the upper diffusion sheet 17 to form a conventional quantum. Point backlight module 10.

又或如第二圖所示,為習知另一具量子點背光模組,與前述習知具量子點背光模組10相同的部分為具有光源11、反射板12、第一及第二下擴散片13、14、集光膜16(或稱增亮膜)及上擴散片17,其中,集光膜16(或稱增亮膜)設成基片161A加稜鏡微結構16A,並在稜鏡與稜鏡之間所形成的容置空間19A上填入量子點151A,並在稜鏡微結 構16A上方設一阻水性封膜18A。 Or as shown in the second figure, another conventional quantum dot backlight module is the same as the conventional quantum dot backlight module 10 having the light source 11, the reflector 12, the first and the second a diffusion sheet 13, 14 , a light-concentrating film 16 (or brightness-increasing film) and an upper diffusion sheet 17, wherein the light-concentrating film 16 (or brightness-increasing film) is provided as a substrate 161A twisted microstructure 16A, and The accommodation space 19A formed between the crucible and the crucible is filled with the quantum dot 151A, and is in the micro-junction A water blocking film 18A is disposed above the structure 16A.

以上兩種作法,不僅在量子點建構上成本非常高之外,需要的結構多,製作工時也較長,材料上也不具環保效益,在材料成本、工時成本、環境負擔上都需付出相當的代價。且其習知之量子點膜價格非常昂貴。 The above two methods not only have a very high cost in the construction of quantum dots, but also require more structures, longer manufacturing time, and no environmental benefits in materials, and need to pay for material costs, working hours, and environmental burdens. Quite a price. And its conventional quantum dot film is very expensive.

是以,針對上述習知結構所存在之問題點,如何開發一種更具理想實用性之創新結構,實消費者所殷切企盼,亦係相關業者須努力研發突破之目標及方向。 Therefore, in view of the problems existing in the above-mentioned conventional structure, how to develop an innovative structure that is more ideal and practical, the consumers are eagerly awaiting, and the relevant industry must strive to develop the goal and direction of breakthrough.

有鑑於此,發明人本於多年從事相關產品之製造開發與設計經驗,針對上述之目標,詳加設計與審慎評估後,終得一確具實用性之本發明。 In view of this, the inventor has been engaged in the manufacturing development and design experience of related products for many years. After detailed design and careful evaluation, the inventor has finally obtained the practical invention.

本發明之主要目的在於提供一種具量子點之增亮膜結構及其製作方法,其將內含量子點或量子棒的光固化塗料及基片加壓光照固化,得其具量子點稜鏡微結構之增亮膜;實為在材料的應用上帶來了創新手法,更是可以節省工時、節省材料、同時減少材料的使用,帶來更大的環保效益。 The main object of the present invention is to provide a brightness-enhancing film structure with quantum dots and a manufacturing method thereof, which can cure a photocurable coating material and a substrate with a content of a sub-dots or a quantum rod, and obtain a quantum dot micro-defect. The structure of the brightness enhancement film; it brings innovative methods to the application of materials, but also saves man-hours, saves materials, and at the same time reduces the use of materials and brings greater environmental benefits.

本發明之主要目的在於提供一種具量子點之增亮膜結構及其製作方法,其包括一光固化塗料均勻塗佈於一基片上;光固化塗料由光敏樹脂與量子點或量子棒充分混合成,光固化塗料及基片加壓光照固化成型稜鏡微結構 於前述基片上,前述稜鏡微結構為連續稜鏡峰與稜鏡谷的形狀;以之基片與光固化塗料經加壓光照固化結合成具量子點稜鏡微結構之增亮膜,達到本發明背光模組不需使用習知量子點膜,即具有高飽和光源及高演色性與省電,且本發明之增亮膜可降低藍光的產生或消弭藍光對人眼的傷害者。 The main object of the present invention is to provide a brightness enhancement film structure with quantum dots and a manufacturing method thereof, which comprises uniformly coating a photocurable coating on a substrate; the photocurable coating is fully mixed with a photosensitive resin and quantum dots or quantum rods. , light-curing coating and substrate pressure-light curing molding 稜鏡 microstructure In the foregoing substrate, the 稜鏡 microstructure is a shape of a continuous peak and a valley; and the substrate and the photocurable coating are combined by a pressure light to form a brightness enhancement film having a quantum dot structure and a microstructure. The invention of the backlight module does not need to use a conventional quantum dot film, that is, has a high saturation light source and high color rendering and power saving, and the brightness enhancement film of the invention can reduce the generation of blue light or eliminate the damage of blue light to the human eye.

本發明之主要目的在於提供一種具量子點之增亮膜結構及其製作方法,其在增亮膜的光固化塗料內導入了量子點材料,使得增亮膜同時具有增亮與量子點高演色性之光優化的效果;達到背光模組不需使用習知量子點膜就能有的高飽和光源,及高演色性的背光模組,更使背光模組達到省電的效果。 The main object of the present invention is to provide a brightness enhancement film structure with quantum dots and a manufacturing method thereof, which introduces a quantum dot material into a photocurable coating of a brightness enhancement film, so that the brightness enhancement film has both brightness enhancement and quantum dot high color rendering. The effect of the optimization of the light of the light; the high-saturation light source that can be obtained by the backlight module without using the conventional quantum dot film, and the backlight module with high color rendering, the backlight module can achieve the effect of power saving.

有關本發明所採用之技術、手段及其功效,茲舉一較佳實施例並配合圖式詳細說明於後,相信本發明上述之目的、構造及特徵,當可由之得一深入而具體的瞭解。 The above-mentioned objects, structures and features of the present invention will be described in detail with reference to the preferred embodiments of the present invention. .

〔習知〕 [study]

10‧‧‧習知具量子點背光模組 10‧‧‧Knowledge with quantum dot backlight module

11‧‧‧光源 11‧‧‧Light source

12‧‧‧反射板 12‧‧‧reflector

13‧‧‧第一下擴散片 13‧‧‧First diffuser

14‧‧‧第二下擴散片 14‧‧‧Second lower diffuser

15‧‧‧量子點膜 15‧‧‧Quantum dot film

151A‧‧‧量子點 151A‧‧·Quantum points

16‧‧‧集光膜 16‧‧‧Photo film

16A‧‧‧稜鏡微結構 16A‧‧‧稜鏡Microstructure

161A‧‧‧基片 161A‧‧‧ substrates

17‧‧‧上擴散片 17‧‧‧Upper diffuser

18A‧‧‧阻水性封膜 18A‧‧‧Water-resistance sealing film

19A‧‧‧容置空間 19A‧‧‧ accommodating space

〔本發明〕 〔this invention〕

21‧‧‧基片 21‧‧‧ substrates

22‧‧‧稜鏡微結構 22‧‧‧稜鏡Microstructure

221‧‧‧光敏樹脂 221‧‧‧Photosensitive resin

222‧‧‧量子點或量子棒 222‧‧‧Quantum dots or quantum rods

223‧‧‧稜鏡峰 223‧‧‧稜鏡峰

224‧‧‧稜鏡谷 224‧‧‧稜鏡谷

30‧‧‧具量子點稜鏡微結構之增亮膜 30‧‧‧Brightness film with quantum dots and microstructures

40‧‧‧阻水層 40‧‧‧Water barrier

51‧‧‧滾壓連續模 51‧‧‧Rolling continuous mode

52‧‧‧加壓輪 52‧‧‧Pressure wheel

60‧‧‧UV光照式加熱器 60‧‧‧UV illumination heater

70‧‧‧具量子點背光模組 70‧‧‧with quantum dot backlight module

71‧‧‧光源 71‧‧‧Light source

72‧‧‧反射板 72‧‧‧reflector

73‧‧‧第一下擴散片 73‧‧‧First diffuser

74‧‧‧第二下擴散片 74‧‧‧Second lower diffuser

77‧‧‧上擴散片 77‧‧‧Upper diffusion film

A‧‧‧光固化塗料 A‧‧‧Light curing coating

P‧‧‧加壓 P‧‧‧ Pressurization

H‧‧‧稜鏡峰與稜鏡谷之距離 H‧‧‧The distance between the peak and the valley

L‧‧‧兩稜鏡峰之距離 L‧‧‧The distance between the two peaks

第一圖係習知具量子點背光模組之示意圖。 The first figure is a schematic diagram of a conventional quantum dot backlight module.

第二圖係習知另一具量子點背光模組之局部示意圖。 The second figure is a partial schematic view of another quantum dot backlight module.

第三圖係本發明其一製作流程動作示意圖。 The third figure is a schematic diagram of a production process of the present invention.

第四A圖係本發明增亮模之其一實施例示意圖。 The fourth A diagram is a schematic diagram of an embodiment of the brightening mode of the present invention.

第四B圖係本發明增亮模之另一實施例示意圖 Figure 4B is a schematic view of another embodiment of the brightening mode of the present invention

第五圖係本發明具量子點背光模組之實施例示意圖。 The fifth figure is a schematic diagram of an embodiment of the present invention having a quantum dot backlight module.

本發明係提供一種具量子點之增亮膜結構及其製作方法之設計者。 The invention provides a designer of a brightness enhancement film structure with quantum dots and a manufacturing method thereof.

為使 貴審查委員對本發明之目的、特徵及功效能夠有更進一步之瞭解與認識,茲配合實施方式及圖式詳述如後:參閱第三圖所示,本發明提供一種具量子點之增亮膜製作方法,係包含有:步驟一:製作光固化塗料(A),以光敏樹脂221與量子點或量子棒222充分混合,形成光固化塗料(A);步驟二:為塗佈步驟,即將光固化塗料(A)均勻塗佈於一基片21上;步驟三:為加壓步驟,即通過滾壓連續模51配合加壓輪52的加壓(P),及其光照固化,乃得其具量子點稜鏡微結構之增亮膜30。更詳而言之,係於光固化塗料(A)之一側置放一滾壓連續模51接觸光固化塗料(A),另於基片21之一側置放一加壓輪52接觸基片21,並令滾壓連續模51及加壓輪52由光固化塗料(A)之不同二側同時加壓光固化塗料(A)。 In order to enable the reviewing committee to have a better understanding and understanding of the purpose, features and effects of the present invention, the embodiments and the drawings are described in detail as follows: Referring to the third figure, the present invention provides an increase in quantum dots. The method for producing a bright film comprises the steps of: preparing a photocurable coating (A), mixing the photosensitive resin 221 with a quantum dot or a quantum rod 222 to form a photocurable coating (A); and step 2: a coating step, That is, the photocurable coating (A) is uniformly coated on a substrate 21; Step 3: is a pressing step, that is, pressing (P) of the pressing roller 52 by rolling the continuous mold 51, and curing by light, A brightness enhancement film 30 having a quantum dot structure and a microstructure is obtained. More specifically, a rolling continuous mold 51 is placed on one side of the photocurable coating material (A) to contact the photocurable coating material (A), and a pressure roller 52 is placed on one side of the substrate 21 to contact the substrate. The sheet 21, and the rolling continuous mold 51 and the pressure roller 52 are simultaneously pressurized with the photocurable coating (A) from the opposite sides of the photocurable coating material (A).

參閱第四A圖所示,本發明提供一種具量子點 之增亮膜結構,包括:一基片21;以及一光固化塗料(A),前述光固化塗料(A)由光敏樹脂221與量子點或量子棒222充分混合而成,前述光固化塗料(A)均勻塗佈於前述基片21上,再經加壓(P)光照固化成型具量子點稜鏡微結構之增亮膜30,其中前述具量子點稜鏡微結構之增亮膜30的稜鏡微結構22成型於前述基片21上,前述稜鏡微結構22包含多個連續排列之稜鏡峰223與稜鏡谷224。 Referring to FIG. 4A, the present invention provides a quantum dot The brightness enhancing film structure comprises: a substrate 21; and a photocurable coating (A), wherein the photocurable coating (A) is sufficiently mixed with the photosensitive resin 221 and the quantum dots or quantum rods 222, and the photocurable coating ( A) uniformly coated on the substrate 21, and then cured by pressure (P) to form a brightness enhancement film 30 having a quantum dot structure, wherein the brightness enhancement film 30 having the quantum dot structure The ruthenium microstructures 22 are formed on the substrate 21, and the ruthenium microstructures 22 include a plurality of consecutively arranged peaks 223 and valleys 224.

所述之具量子點之增亮膜結構,其中前述光敏樹脂221可為一具高透光之可塑光固化樹脂。 The brightness enhancing film structure of the quantum dot, wherein the photosensitive resin 221 is a high light transmissive plastic photocurable resin.

所述之具量子點之增亮膜結構,其中前述光敏樹脂221可為一具阻水性氣樹脂。 The brightness enhancement film structure of the quantum dot, wherein the photosensitive resin 221 can be a water-blocking gas resin.

所述之具量子點之增亮膜結構,其中前述稜鏡微結構22之前述稜鏡峰223與前述稜鏡谷224之垂直距離(H)為1~40μm。 The brightness enhancement film structure of the quantum dot, wherein a vertical distance (H) between the peak 223 of the germanium microstructure 22 and the valley 224 is 1 to 40 μm.

所述之具量子點之增亮膜結構,其中前述稜鏡微結構22之相鄰兩前述稜鏡峰223之水平距離(L)為2~80μm。 The brightness enhancement film structure of the quantum dots, wherein the horizontal distance (L) of the two adjacent peaks 223 of the germanium microstructure 22 is 2 to 80 μm.

參閱第四B圖所示,所述之具量子點之增亮膜結構,其中前述稜鏡微結構22之表面更可增設一阻水層40。 Referring to FIG. 4B, the brightness enhancement film structure of the quantum dots is further provided, wherein a surface of the germanium microstructure 22 is further provided with a water blocking layer 40.

所述之具量子點之增亮膜結構,其中前述量子點或量子棒222所佔體積含量為前述稜鏡微結構22體積之0.0001~10%。 The brightness enhancement film structure of the quantum dot, wherein the quantum dot or the quantum rod 222 occupies 0.0001~10% of the volume of the 稜鏡 microstructure.

參閱第五圖所示,是本發明具量子點背光模組70包括光源71上層具反射板72,反射板72上層設有第一及第二下擴散片73、74,第一及第二下擴散片73、74上方再鋪設一層具量子點稜鏡微結構之增亮膜30,最上一層則為上擴散片77,以之構成本發明具量子點背光模組70。本發明將內含量子點或量子棒222的光固化塗料(A)及基片21加壓(P)光照固化,得其具量子點稜鏡微結構之增亮膜30;實為在材料的應用上帶來了創新手法,更是可以節省工時、節省材料、同時減少材料的使用,帶來更大的環保效益;本發明在具量子點稜鏡微結構之增亮膜30的光固化塗料(A)內導入了量子點材料,使得具量子點稜鏡微結構之增亮膜30同時具有增亮與量子點高演色性之光優化的效果;達到背光模組不需使用習知量子點膜就能有的高飽和光源,及高演色性的具量子點背光模組70,更使具量子點背光模組70達到省電的效果。 As shown in the fifth figure, the quantum dot backlight module 70 of the present invention comprises a light source 71 having a reflector 72 on the upper layer, and the reflector 72 is provided with first and second lower diffusion sheets 73, 74 on the upper layer, first and second lower A brightness enhancement film 30 having a quantum dot structure and a microstructure is disposed on the diffusion sheets 73 and 74, and the upper layer is an upper diffusion film 77 to constitute the quantum dot backlight module 70 of the present invention. In the present invention, the photo-curing coating (A) and the substrate 21 of the inner content sub-point or the quantum rod 222 are pressed and cured (P) to obtain a brightness-enhancing film 30 having a quantum dot structure and a microstructure; The application brings innovative methods, which can save man-hours, save materials, and reduce the use of materials, and bring greater environmental benefits. The present invention is photocuring of the brightness enhancement film 30 with quantum dots and microstructures. The quantum dot material is introduced into the coating (A), so that the brightness enhancement film 30 with the quantum dot 稜鏡 microstructure has the effect of light optimization of brightening and high color rendering of the quantum dots; the backlight module does not need to use the conventional quantum The high saturation light source which can be obtained by the dot film and the quantum dot backlight module 70 with high color rendering property further enable the quantum dot backlight module 70 to achieve power saving effect.

由其上述可知,本發明之具量子點之增亮膜結構及其製作方法,確為業界首見而符合發明專利之新穎性要件者,而其全面性之創新設計,符合發明專利之進步性要件,而其以內含量子點或量子棒的光固化塗料及基片加 壓光照固化,得其具量子點稜鏡微結構之增亮膜,符合較佳之產業利用性者。 It can be seen from the above that the brightness-increasing film structure with quantum dots of the present invention and the manufacturing method thereof are indeed the first in the industry and meet the novel requirements of the invention patent, and the comprehensive and innovative design conforms to the progressiveness of the invention patent. Essentially, and the photocurable coating and substrate plus the content of the sub-dots or quantum rods It is cured by pressure light and has a brightness enhancement film with a quantum dot structure and a micro structure, which is in line with better industrial utilization.

前文係針對本發明之較佳實施例為本發明之技術特徵進行具體之說明;惟,熟悉此項技術之人士當可在不脫離本發明之精神與原則下對本發明進行變更與修改,而該等變更與修改,皆應涵蓋於如下申請專利範圍所界定之範疇中。 The present invention has been described with reference to the preferred embodiments of the present invention. However, those skilled in the art can change and modify the present invention without departing from the spirit and scope of the invention. Such changes and modifications shall be covered in the scope defined by the following patent application.

綜上所述,本發明係提供一種具量子點之增亮膜結構及其製作方法,其確已達到本發明之所有目的,另其組合結構之空間型態未見於同類產品,亦未曾公開於申請前,已符合專利法之規定,爰依法提出申請。 In summary, the present invention provides a brightness enhancement film structure with quantum dots and a method for fabricating the same, which have indeed achieved all the objects of the present invention, and the spatial pattern of the combined structure is not found in the same product, nor has it been disclosed in Before the application, it has complied with the provisions of the Patent Law and submitted an application in accordance with the law.

Claims (9)

一種具量子點之增亮膜結構之製作方法,包括:步驟一:製作光固化塗料(A),以光敏樹脂與量子點或量子棒充分混合,形成光固化塗料(A);步驟二:為塗佈步驟,即將光固化塗料均勻塗佈於一基片上;步驟三:為加壓步驟,其係於前述光固化塗料之一側置放一滾壓連續模接觸前述光固化塗料,另於前述基片之一側置放一加壓輪接觸前述基片,並令前述滾壓連續模及前述加壓輪由前述光固化塗料之不同二側同時加壓前述光固化塗料,及其光照固化,乃得其具量子點稜鏡微結構之增亮膜。 A method for fabricating a brightness enhancement film structure with quantum dots, comprising: Step 1: preparing a photocurable coating (A), fully mixing the photosensitive resin with a quantum dot or a quantum rod to form a photocurable coating (A); Step 2: a coating step of uniformly coating the photocurable coating on a substrate; Step 3: a pressing step of placing a rolling continuous mold on one side of the photocurable coating to contact the photocurable coating, One of the substrates is placed on the side of the substrate to contact the substrate, and the rolling continuous mold and the pressing wheel are simultaneously pressurized by the two sides of the photocurable coating to the photocurable coating, and the light curing is performed. It is a brightness enhancement film with a quantum dot structure and a microstructure. 如申請專利範圍第1項所述之具量子點之增亮膜結構之製作方法,其中前述光照固化得為一UV光照式加熱器光照固化。 The method for fabricating a brightness enhancement film structure with quantum dots according to claim 1, wherein the light curing is performed by a UV illumination heater. 一種以申請專利範圍第1項之方法製成的具量子點之增亮膜結構,包括:一基片;以及一光固化塗料(A),前述光固化塗料(A)由光敏樹脂與量子點或量子棒充分混合而成,前述光固化塗料(A)均勻塗佈於前述基片上,再經加壓(P)光照固化成型具量子點稜鏡微 結構之增亮膜,其中前述稜鏡微結構成型於前述基片上,且包含多個連續排列之稜鏡峰與稜鏡谷。 A brightness enhancement film structure with quantum dots prepared by the method of claim 1 of the patent, comprising: a substrate; and a photocurable coating (A), the photocurable coating (A) consisting of a photosensitive resin and a quantum dot Or the quantum rod is fully mixed, and the photocurable coating (A) is uniformly coated on the substrate, and then cured by pressing (P) light to form a quantum dot micro A brightness enhancing film of the structure, wherein the ruthenium microstructure is formed on the substrate and comprises a plurality of consecutively arranged peaks and valleys. 如申請專利範圍第3項所述之具量子點之增亮膜結構,其中前述光敏樹脂可為一具高透光之可固化樹脂。 The brightness enhancement film structure with quantum dots according to claim 3, wherein the photosensitive resin is a high light transmittance curable resin. 如申請專利範圍第3項所述之具量子點之增亮膜結構,其中前述光敏樹脂可為一具阻水氣性樹脂。 The brightness enhancement film structure with quantum dots according to claim 3, wherein the photosensitive resin is a water-blocking resin. 如申請專利範圍第3項所述之具量子點之增亮膜結構,其中前述稜鏡微結構之前述稜鏡峰與前述稜鏡谷之垂直距離(H)為1~40μm。 The brightness enhancement film structure with quantum dots according to claim 3, wherein a vertical distance (H) between the peak of the 稜鏡 microstructure and the 稜鏡 valley is 1 to 40 μm. 如申請專利範圍第3項所述之具量子點之增亮膜結構,其中前述稜鏡微結構之相鄰兩前述稜鏡峰之水平距離(L)為2~80μm。 The brightness enhancement film structure with quantum dots according to claim 3, wherein the horizontal distance (L) of the two adjacent peaks of the 稜鏡 microstructure is 2 to 80 μm. 如申請專利範圍第3項所述之具量子點之增亮膜結構,其中前述稜鏡微結構之表面更可增設一阻水層。 The brightness enhancement film structure with quantum dots according to claim 3, wherein a surface of the germanium microstructure is further provided with a water blocking layer. 如申請專利範圍第3項所述之具量子點之增亮膜結構,其中前述量子點或量子棒所佔體積含量為前述稜鏡微結構體積之0.0001~10%。 The brightness enhancement film structure with quantum dots according to claim 3, wherein the quantum dot or the quantum rod occupies 0.0001 to 10% of the volume of the 稜鏡 microstructure.
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