TWI636079B - Optical film and manufacturing method thereof - Google Patents

Optical film and manufacturing method thereof Download PDF

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TWI636079B
TWI636079B TW103121837A TW103121837A TWI636079B TW I636079 B TWI636079 B TW I636079B TW 103121837 A TW103121837 A TW 103121837A TW 103121837 A TW103121837 A TW 103121837A TW I636079 B TWI636079 B TW I636079B
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block copolymer
optical film
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film
extrusion die
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TW103121837A
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TW201512254A (en
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石黑淳
齋藤大輔
小原禎二
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日本瑞翁股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/07Flat, e.g. panels
    • B29C48/08Flat, e.g. panels flexible, e.g. films
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/30Extrusion nozzles or dies
    • B29C48/3001Extrusion nozzles or dies characterised by the material or their manufacturing process
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/88Thermal treatment of the stream of extruded material, e.g. cooling
    • B29C48/911Cooling
    • B29C48/9135Cooling of flat articles, e.g. using specially adapted supporting means
    • B29C48/9145Endless cooling belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/88Thermal treatment of the stream of extruded material, e.g. cooling
    • B29C48/911Cooling
    • B29C48/9135Cooling of flat articles, e.g. using specially adapted supporting means
    • B29C48/915Cooling of flat articles, e.g. using specially adapted supporting means with means for improving the adhesion to the supporting means
    • B29C48/916Cooling of flat articles, e.g. using specially adapted supporting means with means for improving the adhesion to the supporting means using vacuum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/88Thermal treatment of the stream of extruded material, e.g. cooling
    • B29C48/911Cooling
    • B29C48/9135Cooling of flat articles, e.g. using specially adapted supporting means
    • B29C48/915Cooling of flat articles, e.g. using specially adapted supporting means with means for improving the adhesion to the supporting means
    • B29C48/917Cooling of flat articles, e.g. using specially adapted supporting means with means for improving the adhesion to the supporting means by applying pressurised gas to the surface of the flat article
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/04Particle-shaped
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/05Filamentary, e.g. strands
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/88Thermal treatment of the stream of extruded material, e.g. cooling
    • B29C48/911Cooling
    • B29C48/9135Cooling of flat articles, e.g. using specially adapted supporting means
    • B29C48/914Cooling of flat articles, e.g. using specially adapted supporting means cooling drums
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/88Thermal treatment of the stream of extruded material, e.g. cooling
    • B29C48/911Cooling
    • B29C48/9135Cooling of flat articles, e.g. using specially adapted supporting means
    • B29C48/915Cooling of flat articles, e.g. using specially adapted supporting means with means for improving the adhesion to the supporting means
    • B29C48/9165Electrostatic pinning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00Optical elements, e.g. lenses, prisms
    • B29L2011/0066Optical filters

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polarising Elements (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
  • Liquid Crystal (AREA)

Abstract

本發明係提供一種光學用膜片,其係由嵌段共聚物[1]的全部不飽和鍵氫化而成之嵌段共聚物氫化物[2]所構成之光學用膜片,上述嵌段共聚物[1]係以源自芳香族乙烯系化合物的重複單元作為主成分之2種以上的聚合物嵌段[A]、及以源自鏈狀共軛二烯化合物的重複單元作為主成分之1種以上的聚合物嵌段[B]所構成,將全部聚合物嵌段[A]、[B]之在嵌段共聚物全體所佔有的重量分率設為wA、wB時,係由將(wA:wB)為40:60~80:20;從在該膜片的長度方向所形成的模頭線(die line)之鄰接山的頂點起算至谷的底點為止的高度係在膜片全面為100nm以下,而且,膜片表面的模頭線之傾斜係在膜片全面為300nm/mm以下。依照本發明,提供一種表面缺陷少的光學用膜片。 The present invention provides an optical film, which is an optical film composed of a hydrogenated block copolymer [2] obtained by hydrogenating all unsaturated bonds of the block copolymer [1], and the above-mentioned block copolymerization The substance [1] is two or more polymer blocks [A] having a repeating unit derived from an aromatic vinyl compound as a main component, and a repeating unit derived from a chain conjugated diene compound as a main component. When one or more types of polymer blocks [B] are used, and the weight fraction of all the polymer blocks [A] and [B] in the entire block copolymer is set to wA and wB, (wA: wB) is 40: 60 ~ 80: 20; the height from the apex of the adjacent mountain of the die line formed in the length direction of the diaphragm to the bottom of the valley is the diaphragm The whole surface is 100 nm or less, and the inclination of the die line on the surface of the film is 300 nm / mm or less. According to the present invention, an optical film with few surface defects is provided.

Description

光學用膜片及其製造方法 Optical film and manufacturing method thereof

本發明係有關於一種作為偏光板保護膜片等有用之由嵌段共聚物氫化物所構成之光學用膜片,更詳言之,係有關於一種相較於先前,表面缺陷較少、面狀較優異的光學用膜片。 The present invention relates to an optical film composed of a block copolymer hydride, which is useful as a protective film for a polarizing plate, and the like. More specifically, the present invention relates to a film having fewer surface defects and less Excellent optical film.

已知將芳香族乙烯系化合物聚合物的芳香環氫化而成之芳香族乙烯系化合物聚合物氫化物、將含有由源自芳香族乙烯系化合物的重複單元作為主成分之聚合物嵌段和源自鏈狀共軛二烯化合物的重複單元之聚合物嵌段所構成之嵌段共聚物的芳香環及源自二烯的雙鍵氫化而成之嵌段共聚物氫化物等,係能夠使用在偏光膜片、相位差膜片等的光學膜片,藉由擠製成形將膜片延伸而能夠賦予所需要的相位差(專利文獻3~6)。 An aromatic vinyl compound polymer hydrogenated product obtained by hydrogenating an aromatic ring of an aromatic vinyl compound polymer, and a polymer block and a source containing a repeating unit derived from an aromatic vinyl compound as a main component are known. Aromatic rings of block copolymers composed of polymer blocks of repeating units of a chain-like conjugated diene compound, hydrogenated block copolymers derived from hydrogenation of double bonds derived from diene, and the like can be used Optical films such as polarizing films and retardation films can be stretched by extrusion to give a desired retardation (Patent Documents 3 to 6).

在另一方面,在如液晶顯示裝置之操作偏光的裝置所使用之由熱塑性樹脂所構成的膜片,係被要求在光學上透明、相位差在平面方向及厚度方向的面內變動小、不容易因膜片表面凹凸引起的透鏡效果致使影像產生歪斜現象等。 On the other hand, a film made of a thermoplastic resin used in a device that operates polarized light such as a liquid crystal display device is required to be optically transparent, and the phase difference in the plane direction and thickness direction to be small and not change The lens effect caused by the unevenness on the surface of the diaphragm is likely to cause image distortion.

因此,在光學用膜片用途係高度地被要求膜片厚度的均勻性,光學用膜片從能夠得到具有優異的厚度均勻性之 膜片的觀點,先前係使用溶液流延法來製造。 Therefore, the uniformity of the thickness of the film is highly demanded in the application of the optical film, and the optical film can be obtained with excellent thickness uniformity. From the viewpoint of a diaphragm, a solution casting method has previously been used for manufacturing.

近年來,溶液流延法被指出因溶劑引起環境污染、產量低等,使得熔融擠製法係逐漸廣泛地被使用。但是,關於熔融擠製法,除了成膜而成的膜片之厚度容易變動以外,亦有在膜片擠製方向容易產生模頭線之缺點。 In recent years, the solution casting method has been pointed out due to the environmental pollution caused by the solvent, the low yield, etc., and the melt extrusion method is gradually widely used. However, regarding the melt extrusion method, in addition to the thickness of the film formed by the film being easily changed, there is also a disadvantage that a die line is easily generated in the direction of film extrusion.

關於模頭線,係有從擠壓模被擠製的熔融樹脂黏 附在擠壓模的壁面且該黏附痕跡以線狀痕跡顯現之模頭線,及通過在擠壓模的模唇口所黏附的樹脂痕跡而成之模頭線等。該等模頭線係由凹凸為大約0.1~0.5μm左右且其寬度為大約50~500μm左右之山及谷所構成。 The die line is made of a molten resin extruded from an extrusion die. A die line attached to a wall surface of an extrusion die and the adhesion marks appear as linear marks, and a die line formed by a resin mark adhered to a die lip of the extrusion die. These die lines are composed of mountains and valleys having an unevenness of about 0.1 to 0.5 μm and a width of about 50 to 500 μm.

在光學用膜片,該模頭線係成為光信號錯誤的原因、或是造成模頭線花紋映在顯示器等的不良影響。因此,已進行在膜片的擠製成形時,調整熔融樹脂的溫度、選定熔融黏度、冷卻輥與擠壓模的空氣間隙(air gap)、對熔融樹脂膜片接觸冷卻輥後之熔融樹脂膜片賦予電壓等之嘗試。又,對擠壓模的模唇部施行研磨處理、鉻鍍金等的鍍金處理。 In the optical film, the die line is a cause of an optical signal error or an adverse effect of a die line pattern reflected on a display or the like. Therefore, when the film is extruded, the temperature of the molten resin is adjusted, the melting viscosity is selected, the air gap between the cooling roller and the extrusion die, and the molten resin film after the molten resin film contacts the cooling roller. Attempts to apply voltage to the chip. In addition, the die lip portion of the extrusion die is subjected to a gold-plating treatment such as grinding treatment or chrome-plating.

但是,該等方法係未充分地防止模頭線,致使模頭線在繼續生產當中慢慢地増加,且在生產面和製品特性的安定性等產生各種問題。 However, these methods do not sufficiently prevent the die line, which causes the die line to gradually increase during continuous production, and causes various problems such as the production surface and the stability of product characteristics.

因此,已進行各種研討。 Therefore, various studies have been conducted.

例如在專利文獻1,係提案揭示一種透明樹脂薄片,其特徵在於:由環狀烯烴系熱塑性樹脂所構成,而且在至少一面係形成表面粗糙度為0.01μm以下的平滑面,厚度為0.05~3mm且殘留相位差為20nm。又,在該文獻,作為製造該薄片之方 法,係記載從在擠製機所安裝的T型模具將熔融狀態的環狀烯烴系熱塑性樹脂,藉由金屬製的冷卻用輥筒與金屬製的冷卻用帶挾壓,而將該環狀烯烴系熱塑性樹脂壓黏在該冷卻用輥筒或冷卻用帶,隨後,在前述環狀烯烴系熱塑性樹脂的玻璃轉移溫度以下的溫度,將該環狀烯烴系熱塑性樹脂從前述冷卻輥或前述冷卻用帶剝離。 For example, Patent Document 1 proposes a transparent resin sheet characterized by being composed of a cyclic olefin-based thermoplastic resin and forming a smooth surface with a surface roughness of 0.01 μm or less on at least one surface, and a thickness of 0.05 to 3 mm. And the residual phase difference is 20 nm. Also, in this document, it is used as a method for manufacturing the sheet. The method describes that a cyclic olefin-based thermoplastic resin in a molten state is pressed from a T-die installed in an extruder, and the ring is pressed by a metal cooling roller and a metal cooling belt. The olefin-based thermoplastic resin is pressure-bonded to the cooling roller or the cooling belt, and then the cyclic olefin-based thermoplastic resin is cooled from the cooling roller or the cooling at a temperature equal to or lower than the glass transition temperature of the cyclic olefin-based thermoplastic resin. Peel with tape.

又,在專利文獻2,係提案揭示一種環狀烯烴樹脂 型擠製成形物(片或膜片形狀)之製造方法,其特徵在於:將環狀烯烴樹脂熔融且使熔融狀態的環狀烯烴樹脂通過具有剝離強度為75N以下的模唇部之塑模而擠製且將環狀烯烴樹脂成形。又,在該文獻,係記載因為使用該方法時具有非常優異的表面平滑性,所以能夠適合使用在光學用途。 Also, Patent Document 2 proposes a cyclic olefin resin A method for manufacturing an extruded article (sheet or film shape) is characterized in that the cyclic olefin resin is melted and the cyclic olefin resin in a molten state is passed through a mold having a mold lip portion having a peel strength of 75N or less. Extruded and shaped cyclic olefin resin. In addition, this document describes that the method can be suitably used for optical applications because it has very excellent surface smoothness when using this method.

而且,在專利文獻3,係揭示一種光學用膜片的製 造方法,其具有藉由擠製機使具有脂環式構造之非晶性的熱可塑性樹脂熔融而從擠壓模擠製成為薄片狀,而且使所擠製之薄片狀非晶性熱可塑性樹脂密著在至少一支冷卻轉筒而成形且捲取之步驟,其中藉由使用擠壓模模唇的表面粗糙度Ra之平均值為0.05μm以下,而且在擠壓模模唇全寬之表面粗糙度Ra的分布範圍為前述平均值的±0.025μm以下之擠壓模,能夠得到從模頭線鄰接山的頂點起算至谷的底點為止的高度係在膜片全面為100nm以下,而且膜片表面的模頭線之傾斜係在膜片全面為300nm/mm以下之光學用膜片。 Furthermore, Patent Document 3 discloses a method for manufacturing an optical film. A method for manufacturing an amorphous thermoplastic resin having an alicyclic structure by an extruder, extruding the extruded sheet into a sheet shape, and extruding the extruded sheet-like amorphous thermoplastic resin. The step of forming and winding in close contact with at least one cooling drum, wherein the average value of the surface roughness Ra by using the extrusion die lip is 0.05 μm or less, and on the surface of the entire width of the extrusion die lip The distribution range of the roughness Ra is ± 0.025 μm or less of the aforementioned average value. It can be obtained that the height from the vertex of the die line adjacent to the bottom of the valley to the bottom of the valley is 100 nm or less, and the film The inclination of the die line on the surface of the sheet is an optical film having an entire surface of the film of 300 nm / mm or less.

另一方面,在專利文獻4、6,係揭示一種藉由使 用將源自芳香族乙烯系化合物之聚合物嵌段、及源自共軛二烯 化合物之聚合物嵌段之雙方氫化而成之嵌段共聚物氫化物,能夠得到光學補償膜片及相位差較小的光學用膜片。相較於從環狀烯烴合成之具有脂環式構造之熱可塑性樹脂,因為嵌段共聚物氫化物係容易取得當作原料之芳香族乙烯系化合物及共軛二烯,所以較大規模的供給係比較容易且使用其之光學用膜片的實用化係受到期待。 On the other hand, in Patent Documents 4 and 6, there is disclosed a method by which A polymer block derived from an aromatic vinyl compound and a conjugated diene A block copolymer hydride obtained by hydrogenating both polymer blocks of a compound can obtain an optical compensation film and an optical film with a small phase difference. Compared to thermoplastic resins with alicyclic structures synthesized from cyclic olefins, block copolymer hydrides are easier to obtain as aromatic vinyl compounds and conjugated dienes as raw materials, so they are supplied on a larger scale. It is relatively easy to use, and a practical system using the optical film is expected.

先前技術文獻 Prior art literature 專利文獻 Patent literature

[專利文獻1]日本特開2000-219752號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2000-219752

[專利文獻2]日本特開2000-280315號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2000-280315

[專利文獻3]日本特開2005-128360號公報 [Patent Document 3] Japanese Patent Laid-Open No. 2005-128360

[專利文獻4]日本特開2003-114329號公報 [Patent Document 4] Japanese Patent Laid-Open No. 2003-114329

[專利文獻5]國際公開WO2009/067290號(US2010/290117A1) [Patent Document 5] International Publication No. WO2009 / 067290 (US2010 / 290117A1)

[專利文獻6]國際公開WO2009/137278號(US2011/038045A1) [Patent Document 6] International Publication No. WO2009 / 137278 (US2011 / 038045A1)

近年來,隨著液晶顯示裝置的高精細化、高亮度化,在具備高亮度的光源之顯示裝置,使用依照在該等公報所記載的方法而得到之光學用膜片時,即便目視亦能夠顯著地觀察到源自模頭線的線條係以明亮或暗淡光線的方式顯示在畫面上,或是有產生漏光之問題而被要求進一步的改善。 In recent years, with the high definition and high brightness of liquid crystal display devices, when a display device having a high-brightness light source uses an optical film obtained in accordance with the method described in these publications, it can be visually inspected. Obviously, it is observed that the lines originating from the die line are displayed on the screen as bright or dim light, or there is a problem of light leakage, and further improvement is required.

此種狀況下,相較於在專利文獻2、3等所揭示之具有由環狀烯烴所合成的脂環式構造之熱可塑性樹脂,本案申請人係發現在專利文獻4、6等所揭示之將源自芳香族乙烯系化合物之聚合物嵌段及源自共軛二烯化合物之聚合物嵌段之雙方氫化而成之嵌段共聚物氫化物,在熔融擠製成形時,在擠壓模的模唇口因氧化劣化而產生的黏附物較少。 In this case, compared with the thermoplastic resins having an alicyclic structure synthesized from cyclic olefins disclosed in Patent Documents 2, 3, etc., the applicant of this case found that the resins disclosed in Patent Documents 4, 6, etc. A hydrogenated block copolymer obtained by hydrogenating both polymer blocks derived from an aromatic vinyl compound and polymer blocks derived from a conjugated diene compound. The mold lip has less adhesion due to oxidative degradation.

但是未必能夠減少模頭線。 However, it may not be possible to reduce the die line.

因此,本發明之目的,係提供一種光學用膜片,其係使用在工業上容易大規模供給之嵌段共聚物氫化物,使用在特別是具備高精細且高亮度的光源之顯示裝置時,相較於先前者,表面缺陷較少且無法確認起因於模頭線之明暗的線條,而且無漏光。 Therefore, an object of the present invention is to provide an optical film which uses a block copolymer hydride which is easily supplied on a large scale in industry, and is particularly used in a display device having a high-definition and high-brightness light source. Compared with the former, there are fewer surface defects and it is impossible to confirm the light and dark lines due to the die line, and there is no light leakage.

為了達成上述目的,本發明者等專心研討的結果,發現藉由在將特定的嵌段共聚物氫化物之膜片進行熔融擠製時使用特定的擠壓模,而且使用在熔融擠製前於特定溫度範圍加熱處理特定時間以上之嵌段共聚物氫化物的丸粒,能夠達成上述目的而完成了本發明。 In order to achieve the above-mentioned object, the inventors have intensively studied and found that by using a specific extrusion die when melt-extruding a film of a specific block copolymer hydride, The pellets of the block copolymer hydride are heat-treated in a specific temperature range for a specific time or longer to achieve the above-mentioned object and completed the present invention.

如此,依照本發明,係能夠提供下述(1)的光學用膜片、(2)的偏光板保護膜片、(3)的相位差膜片、及(4)的光學用膜片之製造方法。 Thus, according to the present invention, it is possible to provide the following (1) optical film, (2) polarizing plate protective film, (3) retardation film, and (4) optical film manufacturing method.

(1)一種光學用膜片,其係由嵌段共聚物[1]的全部不飽和鍵氫化而成之嵌段共聚物氫化物[2]所構成之光學用膜片,上述嵌段共聚物[1]係以源自芳香族乙烯系化合物的重複單元作為 主成分之至少二種的聚合物嵌段[A]、及以源自鏈狀共軛二烯化合物的重複單元作為主成分之至少一種的聚合物嵌段[B]所構成,將全部聚合物嵌段[A]在嵌段共聚物全體所佔有的重量分率設為wA且將全部聚合物嵌段[B]在嵌段共聚物全體所佔有的重量分率設為wB時,係由將wA與wB之比(wA:wB)為40:60~80:20,其特徵在於:從在上述膜片的長度方向所形成的模頭線之鄰接山的頂點起算至谷的底點為止的高度係在膜片全面為100nm以下,而且,以式1表示之膜片表面的模頭線之傾斜係在膜片全面為300nm/mm以下。 (1) An optical film, which is an optical film composed of a hydrogenated block copolymer [2] obtained by hydrogenating all unsaturated bonds of the block copolymer [1], and the block copolymer described above [1] Based on repeating units derived from aromatic vinyl compounds A polymer block [A] of at least two kinds of main components and a polymer block [B] of repeating units derived from a chain-like conjugated diene compound as the main component. When the weight fraction of block [A] in the entire block copolymer is set to wA and the weight fraction of all polymer blocks [B] in the entire block copolymer is set to wB, The ratio of wA to wB (wA: wB) is 40:60 to 80:20, and is characterized by counting from the vertex of the adjacent mountain of the die line formed in the length direction of the diaphragm to the bottom of the valley. The height is 100 nm or less across the entire surface of the film, and the inclination of the die line on the surface of the film represented by Formula 1 is 300 nm / mm or less across the entire surface of the film.

[數1]傾斜(nm/mm)=(從鄰接山的頂點起算至谷的底點為止的高度)/(從鄰接山的頂點起算至谷的底點為止的寬度)‧‧‧式1 [Number 1] Slope (nm / mm) = (height from the apex of the adjacent mountain to the bottom of the valley) / (width from the apex of the adjacent mountain to the bottom of the valley) ‧ ‧ formula 1

(2)包含如前述(1)記載的光學用膜片之偏光板保護膜片。 (2) A polarizing plate protective film including the optical film according to (1).

(3)將如前述(1)記載的光學用膜片延伸而成之相位差膜片。 (3) A retardation film obtained by extending the optical film according to the above (1).

(4)一種光學用膜片的製造方法,係具有藉由擠製機使嵌段共聚物氫化物[2]熔融而從在該擠製機所安裝的擠壓模擠製成為薄片狀,而且使被擠製後的薄片狀嵌段共聚物氫化物[2]密著在至少一個冷卻轉筒而成形且捲取之步驟,其特徵在於:使用擠壓模模唇的表面粗糙度Ra之平均值為0.05μm以下且在擠壓模模唇全寬之表面粗糙度Ra的分布範圍為前述平均值的±0.025μm以下之擠壓模,而且使用於50~120℃的溫度保持2小時以上之嵌段共聚物氫化物[2]的丸粒。 (4) A method for producing a film for optics, which comprises melting a block copolymer hydride [2] by an extruder and extruding it into a sheet shape from an extrusion die installed in the extruder; and The step of forming the extruded sheet-like block copolymer hydride [2] in close contact with at least one cooling drum and forming and winding it is characterized by using an average of the surface roughness Ra of the lip of the extrusion die. An extrusion die with a value of 0.05 μm or less and a surface roughness Ra in the entire width of the lip of the extrusion die is ± 0.025 μm or less of the aforementioned average value, and used at a temperature of 50 to 120 ° C. for more than 2 hours Pellets of block copolymer hydride [2].

依照本發明,能夠提供一種相較於先前者,表面缺陷少且使用在特別是具備高亮度的光源之顯示裝置時,無法確認起因於模頭線之明暗的線條,而且無漏光之光學用膜片。 According to the present invention, it is possible to provide an optical film that has fewer surface defects than the former and is used in a display device having a high-brightness light source. The light and dark lines due to the die line cannot be confirmed, and there is no light leakage. sheet.

1‧‧‧基線 1‧‧‧ baseline

2‧‧‧山的頂點 2‧‧‧ Peak of the mountain

3‧‧‧谷的底點 The bottom of the valley

4‧‧‧從山的頂點起算至谷的底點為止之距離 4‧‧‧ Distance from the peak of the mountain to the bottom of the valley

5、6‧‧‧線 5, 6‧‧‧ line

7‧‧‧從山的頂點起算至谷的底點之高度 7‧‧‧ Height from the peak of the mountain to the bottom of the valley

第1圖係本發明的光學用膜片的模頭線之放大部。 FIG. 1 is an enlarged portion of a die line of the optical film of the present invention.

用以實施發明之形態 Forms used to implement the invention

本發明的光學用膜片,係由嵌段共聚物[1]的全部不飽和鍵氫化而成之嵌段共聚物氫化物[2]所構成之光學用膜片,上述嵌段共聚物[1]係以源自芳香族乙烯系化合物的重複單元作為主成分之至少二種的聚合物嵌段[A],及以源自鏈狀共軛二烯化合物的重複單元作為主成分之至少一種的聚合物嵌段[B]所構成,將全部聚合物嵌段[A]在嵌段共聚物全體所佔有的重量分率設為wA且將全部聚合物嵌段[B]在嵌段共聚物全體所佔有的重量分率設為wB時,係由將wA與wB之比(wA:wB)為40:60~80:20。 The optical film of the present invention is an optical film composed of a hydrogenated block copolymer [2] obtained by hydrogenating all unsaturated bonds of the block copolymer [1], and the block copolymer [1] ] Is a polymer block [A] having at least two kinds of repeating units derived from an aromatic vinyl compound as a main component and at least one kind of repeating units derived from a chain conjugated diene compound as a main component The polymer block [B] is composed, and the weight fraction of the entire polymer block [A] in the entire block copolymer is set to wA, and the entire polymer block [B] is included in the entire block copolymer. When the occupied weight fraction is set to wB, the ratio of wA to wB (wA: wB) is 40:60 to 80:20.

1.嵌段共聚物[1] Block copolymer [1]

本發明之嵌段共聚物氫化物[2]的前驅物亦即嵌段共聚物[1],係含有至少二種的聚合物嵌段[A]及至少一種聚合物嵌段[B]。 The precursor of the block copolymer hydride [2] of the present invention, that is, the block copolymer [1], contains at least two polymer blocks [A] and at least one polymer block [B].

聚合物嵌段[A]係以源自芳香族乙烯系化合物的構造單元作為主成分者。聚合物嵌段[A]中之源自芳香族乙烯系 化合物的構造單元之含量,係通常為90重量%以上,以95重量%以上為佳,較佳為99重量%以上。 The polymer block [A] is a component having a structural unit derived from an aromatic vinyl compound as a main component. Aromatic vinyl in polymer block [A] The content of the structural unit of the compound is usually 90% by weight or more, preferably 95% by weight or more, and more preferably 99% by weight or more.

又,聚合物嵌段[A]係能夠含有源自鏈狀共軛二烯的構造單元及/或源自其他的乙烯系化合物的構造單元作為源自芳香族乙烯系化合物的構造單元以外的成分。其含量係通常為10重量%以下,以5重量%以下為佳,較佳為1重量%以下。聚合物嵌段[A]中之源自芳香族乙烯系化合物的構造單元之含量太少時,本發明的光學用膜片之耐熱性有低落的可能性。 The polymer block [A] can contain a structural unit derived from a chain conjugated diene and / or a structural unit derived from another vinyl compound as a component other than a structural unit derived from an aromatic vinyl compound. . Its content is usually 10% by weight or less, preferably 5% by weight or less, and more preferably 1% by weight or less. When the content of the structural unit derived from the aromatic vinyl compound in the polymer block [A] is too small, the heat resistance of the optical film of the present invention may be reduced.

複數種聚合物嵌段[A]係只要滿足上述範圍者,可互相相同亦可不同。 The plural polymer blocks [A] may be the same as or different from each other as long as they satisfy the above range.

聚合物嵌段[B]係以源自鏈狀共軛二烯化合物的構造單元作為主成分者。聚合物嵌段[B]中之源自鏈狀共軛二烯化合物的構造單元之含量,係通常為90重量%以上,以95重量%以上為佳,較佳為99重量%以上。源自鏈狀共軛二烯化合物的構造單元為上述範圍時,將本發明的光學用膜片延伸時之雙折射顯現性良好且亦能夠對膜片賦予柔軟性。 The polymer block [B] has a structural unit derived from a chain conjugated diene compound as a main component. The content of the structural unit derived from the chain conjugated diene compound in the polymer block [B] is usually 90% by weight or more, preferably 95% by weight or more, and more preferably 99% by weight or more. When the structural unit derived from the chain conjugated diene compound is in the above range, the birefringence manifestation when the optical film of the present invention is extended is good, and the film can also be given flexibility.

又,聚合物嵌段[B]係能夠含有源自芳香族乙烯系化合物的構造單元及/或源自其他的乙烯系化合物的構造單元作為源自鏈狀共軛二烯化合物的構造單元以外的成分。其含量係通常為10重量%以下,以5重量%以下為佳,較佳為1重量%以下。聚合物嵌段[B]中之源自芳香族乙烯系化合物的構造單元之含量増加時,膜片的雙折射顯現性有低落之可能性。聚合物嵌段[B]係具有複數種之情況,聚合物嵌段[B]係只要滿足上述範圍,可互相相同亦可不同。 In addition, the polymer block [B] can contain a structural unit derived from an aromatic vinyl compound and / or a structural unit derived from another vinyl compound as a structural unit other than a chain conjugated diene compound. ingredient. Its content is usually 10% by weight or less, preferably 5% by weight or less, and more preferably 1% by weight or less. When the content of the structural unit derived from the aromatic vinyl compound in the polymer block [B] is increased, the birefringence visibility of the film may be reduced. When there are a plurality of types of polymer blocks [B], the polymer blocks [B] may be the same as or different from each other as long as they satisfy the above range.

作為芳香族乙烯系化合物,可舉出苯乙烯;α-甲基苯乙烯、2-甲基苯乙烯、3-甲基苯乙烯、4-甲基苯乙烯、2,4-二異丙基苯乙烯、2,4-二甲基苯乙烯、4-第三丁基苯乙烯、5-第三丁基-2-甲基苯乙烯等的烷基取代苯乙烯;4-氯苯乙烯、2,4-二氯苯乙烯、4-氟苯乙烯等的鹵素取代苯乙烯;4-苯基苯乙烯等的芳基取代苯乙烯;4-甲氧基苯乙烯、3,5-二甲氧基苯乙烯等的烷氧基取代苯乙烯;在吸濕性方面,係以苯乙烯、烷基取代苯乙烯等不含有極性基者為佳,從工業上的取得容易性而言,係以苯乙烯為特佳。 Examples of the aromatic vinyl compound include styrene; α-methylstyrene, 2-methylstyrene, 3-methylstyrene, 4-methylstyrene, and 2,4-diisopropylbenzene Alkyl substituted styrenes such as ethylene, 2,4-dimethylstyrene, 4-tert-butylstyrene, 5-tert-butyl-2-methylstyrene; 4-chlorostyrene, 2, Halogen-substituted styrenes such as 4-dichlorostyrene, 4-fluorostyrene, etc .; Aryl-substituted styrenes such as 4-phenylstyrene; 4-methoxystyrene, 3,5-dimethoxybenzene Alkoxy-substituted styrene such as ethylene; in terms of hygroscopicity, it is better to use styrene, alkyl-substituted styrene, etc. which do not contain polar groups, and from the viewpoint of industrial availability, styrene is used Extraordinary.

作為鏈狀共軛二烯系化合物,具體而言可舉出1,3-丁二烯、異戊二烯、2,3-二甲基-1,3-丁二烯、1,3-戊二烯等,在吸濕性方面,係以不含有極性基者為佳,從工業上的取得容易性而言,係以1,3-丁二烯、異戊二烯為特佳。 Specific examples of the chain conjugated diene-based compound include 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, and 1,3-pentadiene. In terms of hygroscopicity, diene and the like are preferably those which do not contain a polar group, and in terms of industrial availability, 1,3-butadiene and isoprene are particularly preferred.

作為其他的乙烯系化合物,可舉出鏈狀乙烯系化合物、環狀乙烯系化合物等。該等乙烯系化合物亦可含有具有以腈基、烷氧基羰基、羥基羰基或鹵素原子作為取代基之乙烯系化合物、及/或不飽和的環狀酸酐或不飽和醯亞胺化合物。作為其他的乙烯系化合物,從吸濕性方面而言,係以乙烯、丙烯、1-丁烯、1-戊烯、1-己烯、1-庚烯、1-辛烯、1-壬烯、1-癸烯、1-十二烯、1-二十烯、4-甲基-1-戊烯、4,6-二甲基-1-庚烯等的鏈狀烯烴;乙烯基環己烷等的環狀烯烴等不含有極性基者為佳,以鏈狀烯烴為較佳,以乙烯、丙烯為特佳。 Examples of other vinyl compounds include chain vinyl compounds, cyclic vinyl compounds, and the like. These vinyl compounds may contain a vinyl compound having a nitrile group, an alkoxycarbonyl group, a hydroxycarbonyl group, or a halogen atom as a substituent, and / or an unsaturated cyclic acid anhydride or an unsaturated sulfonimine compound. As other vinyl compounds, in terms of hygroscopicity, ethylene, propylene, 1-butene, 1-pentene, 1-hexene, 1-heptene, 1-octene, and 1-nonene are used. Chain olefins such as 1-decene, 1-dodecene, 1-icosene, 4-methyl-1-pentene, 4,6-dimethyl-1-heptene, etc .; vinylcyclohexene Cyclic olefins, such as alkanes, are preferred if they do not contain a polar group, chain olefins are preferred, and ethylene and propylene are particularly preferred.

嵌段共聚物[1]中的聚合物嵌段[A]之數目係通常為5個以下,以4個以下為佳,較佳為3個以下。聚合物嵌段 [A]及/或聚合物嵌段[B]為存在複數個時,將在聚合物嵌段[A]的中之重量平均分子量為最大及最少之聚合物嵌段的重量平均分子量各自設為Mw(A1)及Mw(A2),而且將在聚合物嵌段[B]的中之重量平均分子量為最大及最少之聚合物嵌段的重量平均分子量各自設為Mw(B1)及Mw(B2)時,Mw(A1)與Mw(A2)之比(Mw(A1)/Mw(A2))、及Mw(B1)與Mw(B2)之比(Mw(B1)/Mw(B2))係各自為2.0以下,以1.5以下為佳,較佳為1.2以下。 The number of polymer blocks [A] in the block copolymer [1] is usually 5 or less, preferably 4 or less, and more preferably 3 or less. Polymer block When there are a plurality of [A] and / or polymer blocks [B], the weight average molecular weight of the polymer block having the largest and smallest weight average molecular weight in the polymer block [A] is each set as Mw (A1) and Mw (A2), and the weight average molecular weight of the polymer block [B] having the largest and smallest weight average molecular weights is respectively Mw (B1) and Mw (B2 ), The ratio of Mw (A1) to Mw (A2) (Mw (A1) / Mw (A2)) and the ratio of Mw (B1) to Mw (B2) (Mw (B1) / Mw (B2)) are Each is 2.0 or less, preferably 1.5 or less, and more preferably 1.2 or less.

嵌段共聚物[1]的嵌段形態係可為鏈狀型嵌段,亦 可為放射狀型嵌段,鏈狀型嵌段者係具有優異的機械的強度,乃是較佳。嵌段共聚物[1]的最佳形態係在聚合物嵌段[B]的兩端鍵結有聚合物嵌段[A]之以[A]-[B]-[A]表示之三嵌段共聚物,及在聚合物嵌段[A]的兩端鍵結有聚合物嵌段[B],進而在該兩聚合物嵌段[B]的另外一端各自鍵結有聚合物嵌段[A]之以[A]-[B]-[A]-[B]-[A]表示之五嵌段共聚物。 The block morphology of the block copolymer [1] may be a chain block, and It may be a radial block, and a chain block is preferable because it has excellent mechanical strength. The best morphology of the block copolymer [1] is that the polymer block [A] is bonded to both ends of the polymer block [B], and the third block is represented by [A]-[B]-[A]. A segment copolymer, and a polymer block [B] is bonded to both ends of the polymer block [A], and further, a polymer block [B] is bonded to the other end of the two polymer blocks [B] A] is a pentablock copolymer represented by [A]-[B]-[A]-[B]-[A].

嵌段共聚物中[1]的全部聚合物嵌段[A]在嵌段共 聚物全體所佔有的重量分率設為wA且將全部聚合物嵌段[B]在嵌段共聚物全體所佔有的重量分率設為wB時,wA與wB之比(wA:wB)為40:60~80:20,以50:50~75:25為佳,較佳為60:40~70:30。wA的比例太高時,雖然在本發明所使用的改性嵌段共聚物氫化物[3]之耐熱性係變高,但是柔軟性較低且光學用膜片在切削面變為容易龜裂。另一方面,wA的比例太低時,耐熱性低落且將膜片延伸亦立刻收縮而有無法保持相位差之可能性。 All polymer blocks [A] in block copolymer [A] When the weight fraction occupied by the entire polymer is set to wA and the weight fraction occupied by all the polymer blocks [B] in the entire block copolymer is set to wB, the ratio of wA to wB (wA: wB) is 40: 60 ~ 80: 20, preferably 50: 50 ~ 75: 25, more preferably 60: 40 ~ 70: 30. When the ratio of wA is too high, although the heat resistance of the modified block copolymer hydride [3] used in the present invention becomes high, the flexibility is low and the optical film becomes easily cracked on the cutting surface. . On the other hand, when the ratio of wA is too low, the heat resistance is lowered and the film is stretched and contracted immediately, and the phase difference may not be maintained.

嵌段共聚物[1]的分子量,係在藉由以四氫呋喃 (THF)作為溶劑之凝膠滲透層析法(GPC)所測定之聚苯乙烯換算的重量平均分子量(Mw),通常為30,000~200,000,以40,000~150,000為佳,較佳為50,000~100,000。又,嵌段共聚物[1]的分子量分布(Mw/Mn)係以3以下為佳,較佳為2以下,特佳為1.5以下。 The molecular weight of the block copolymer [1] is based on tetrahydrofuran (THF) The polystyrene-equivalent weight average molecular weight (Mw) measured by gel permeation chromatography (GPC) as a solvent is usually 30,000 to 200,000, preferably 40,000 to 150,000, and more preferably 50,000 to 100,000. The molecular weight distribution (Mw / Mn) of the block copolymer [1] is preferably 3 or less, more preferably 2 or less, and particularly preferably 1.5 or less.

嵌段共聚物[1]係例如能夠使用活性陰離子聚合等 習知的製造方法來製造。更具體地,可舉出使含有以芳香族乙烯系化合物作為主成分之單體混合物(a)、及含有以鏈狀共軛二烯系化合物作為主成分之單體混合物(b)交替地聚合之方法;使含有以芳香族乙烯系化合物主成分之單體混合物(a)、及含有以鏈狀共軛二烯系化合物作為主成分之單體混合物(b)依照順序聚合之後,藉由偶合劑使聚合物嵌段[B]的末端之間偶合之方法等。 For the block copolymer [1], for example, living anionic polymerization can be used. It is manufactured by a conventional manufacturing method. More specifically, the monomer mixture (a) containing an aromatic vinyl compound as a main component and the monomer mixture (b) containing a chain conjugated diene compound as a main component may be alternately polymerized. Method: A monomer mixture (a) containing a main component of an aromatic vinyl compound and a monomer mixture (b) containing a chain conjugated diene compound as a main component are polymerized in order. A method for coupling the ends of the polymer block [B] with the mixture, and the like.

2.嵌段共聚物氫化物[2] 2. Block copolymer hydride [2]

本發明之嵌段共聚物氫化物[2]係將上述嵌段共聚物[1]的主鏈及側鏈的碳-碳不飽和鍵、及芳香環的碳-碳不飽和鍵氫化而得到者。其氫化率係通常為90%以上,以97%以上為佳,較佳為99%以上。氫化率越高,成形體的耐候性、耐熱性良好。嵌段共聚物氫化物[2]的氫化率係能夠藉由1H-NMR測定而求取。 The hydrogenated block copolymer [2] of the present invention is obtained by hydrogenating carbon-carbon unsaturated bonds in the main chain and side chains of the block copolymer [1] and carbon-carbon unsaturated bonds in the aromatic ring. . The hydrogenation rate is usually 90% or more, preferably 97% or more, and more preferably 99% or more. The higher the hydrogenation rate, the better the weatherability and heat resistance of the formed body. The hydrogenation rate of the block copolymer hydride [2] can be determined by 1 H-NMR measurement.

不飽和鍵的氫化方法和氫化反應的形態等係沒有特別限定,依照習知的方法而進行即可,就能夠提高氫化率而言,係以聚合物鏈切斷反應少的氫化方法為佳。作為此種氫化 方法,能夠舉出在國際公開WO2011/096389號、國際公開WO2012/043708號等所記載的方法。 The hydrogenation method of the unsaturated bond, the form of the hydrogenation reaction, and the like are not particularly limited, and they may be performed according to a conventional method. In terms of improving the hydrogenation rate, a hydrogenation method with less polymer chain cleavage reaction is preferred. As this hydrogenation Examples of the method include methods described in International Publication No. WO2011 / 096389, International Publication No. WO2012 / 043708, and the like.

使用上述的方法而得到的嵌段共聚物氫化物[2], 係將氫化觸媒及/或聚合觸媒從含有嵌段共聚物氫化物[2]的反應溶液除去之後,能夠從反應溶液回收。所回收之嵌段共聚物氫化物[2]的形態係不被限定,通常係能夠製成丸粒形狀而提供隨後的膜片成形加工。 The block copolymer hydride [2] obtained by the above method, After removing the hydrogenation catalyst and / or the polymerization catalyst from the reaction solution containing the block copolymer hydride [2], it can be recovered from the reaction solution. The morphology of the recovered block copolymer hydride [2] is not limited, and usually it can be formed into a pellet shape to provide subsequent film forming processing.

嵌段共聚物氫化物[2]的分子量,係藉由以四氫呋 喃(THF)作為溶劑之GPC所測定之聚苯乙烯換算的重量平均分子量(Mw),通常為35,000-200,000,以40,000~150,000為佳,較佳為45,000~100,000。又,以將嵌段共聚物氫化物[2]的分子量分布(Mw/Mn)設為3以下為佳,較佳為2以下,特佳為1.5以下。Mw及Mw/Mn係設為上述範圍時,所成形的膜片之機械強度和耐熱性提升。 The molecular weight of the block copolymer hydride [2] is based on tetrahydrofuran The polystyrene-equivalent weight average molecular weight (Mw) measured by GPC using THF as a solvent is usually 35,000 to 200,000, preferably 40,000 to 150,000, and more preferably 45,000 to 100,000. The molecular weight distribution (Mw / Mn) of the hydrogenated block copolymer [2] is preferably 3 or less, more preferably 2 or less, and particularly preferably 1.5 or less. When Mw and Mw / Mn are set to the above ranges, the mechanical strength and heat resistance of the formed film are improved.

在本發明所使用的嵌段共聚物氫化物[2],亦可含有其他的調配劑。作為調配劑,係沒有特別限定,可舉出層狀結晶化合物;無機微粒子;抗氧化劑、熱安定劑、光安定劑、耐候安定劑、紫外線吸收劑、近紅外線吸收劑等的安定劑;滑劑、可塑劑等的樹脂改質劑;染料、顏料等的著色劑;抗靜電劑等。該等調配劑係能夠單獨1種、或組合2種以上而使用。其調配量係能夠在不損害本發明的目的之範圍而適當地選擇。 The hydrogenated block copolymer [2] used in the present invention may contain other formulation agents. The formulation is not particularly limited, and examples include layered crystalline compounds; inorganic fine particles; antioxidants, heat stabilizers, light stabilizers, weather-resistant stabilizers, ultraviolet absorbers, near-infrared absorbers, and stabilizers; slip agents , Plasticizers and other resin modifiers; dyes, pigments and other coloring agents; antistatic agents. These formulations can be used alone or in combination of two or more. The blending amount can be appropriately selected within a range that does not impair the object of the present invention.

在將嵌段共聚物氫化物[2]熔融擠製而成形為膜片時,為了抑制樹脂氧化劣化物黏附在擠壓模的模唇部,添加抗氧化劑係有效的。作為抗氧化劑,可舉出酚系抗氧化劑、磷系 抗氧化劑、硫系抗氧化劑等,該等之中,以酚系抗氧化劑、特別是烷基取代酚系抗氧化劑為佳。抗氧化劑的調配量係能夠在不損害本發明的目的之範圍而適當地選擇,相對於嵌段共聚物氫化物[2]100重量份,通常為0.005~1重量份、較佳為0.01~0.5重量份。 When the block copolymer hydride [2] is melt-extruded and formed into a film, it is effective to add an antioxidant in order to prevent the resin oxidative degradation substance from adhering to the die lip of the extrusion die. Examples of the antioxidant include phenol-based antioxidants and phosphorus-based antioxidants. Antioxidants, sulfur-based antioxidants, and the like are preferably phenol-based antioxidants, especially alkyl-substituted phenol-based antioxidants. The blending amount of the antioxidant can be appropriately selected within a range that does not impair the object of the present invention, and is generally 0.005 to 1 part by weight, preferably 0.01 to 0.5 with respect to 100 parts by weight of the block copolymer hydride [2]. Parts by weight.

3.光學用膜片 3. Optical film

本發明的光學用膜片係在該膜片的長度方向所形成的模頭線之從鄰接山的頂點起算至谷的底點為止的高度係在膜片全面為100nm以下,而且,以式1表示之膜片表面的模頭線之傾斜係在膜片全面為300nm/mm以下。 The optical film of the present invention has a die line formed in the longitudinal direction of the film, the height from the apex of the adjacent mountain to the bottom of the valley is 100 nm or less across the entire surface of the film. The inclination of the die line on the surface of the diaphragm shown is that the entire surface of the diaphragm is 300 nm / mm or less.

[數2]傾斜(nm/mm)=(從鄰接山的頂點起算至谷的底點為止的高度)/(從鄰接山的頂點起算至谷的底點為止的寬度)...式1 [Number 2] Slope (nm / mm) = (height from the apex of the adjacent mountain to the bottom of the valley) / (width from the apex of the adjacent mountain to the bottom of the valley). . . Formula 1

在此所謂長度方向,係指擠製膜片之流動方向。所謂「在該膜片的長度方向所形成的模頭線之從鄰接山的頂點起算至谷的底點為止的高度係在膜片全面為100nm以下」,係意味著模頭線的高度係全部為100nm以下。又,所謂「膜片表面的模頭線之傾斜係在膜片全面為300nm/mm以下」,係意味著模頭線的傾斜係全部為300nm/mm以下。 The so-called length direction refers to the flow direction of the extruded film. The so-called "height of the die line formed in the longitudinal direction of the diaphragm from the apex of the adjacent mountain to the bottom of the valley is 100nm or less across the whole of the diaphragm" means that the height of the die line is all It is 100 nm or less. In addition, "the inclination of the die line on the surface of the diaphragm is 300 nm / mm or less across the entire surface of the diaphragm" means that the inclination of the die line is all 300 nm / mm or less.

在本發明的光學用膜片,前述高度係較佳為50nm以下,更佳為30nm以下,前述傾斜係較佳為100nm/mm以下,更佳為50nm/mm以下。藉由前述模頭線之從鄰接山的頂點起算至谷的底點為止的高度、及傾斜為上述範圍,即便納入在具有高亮度的背光模組之液晶顯示單元時,亦能夠成為沒有亮點 且具有良好的顯示狀態。 In the optical film of the present invention, the height is preferably 50 nm or less, more preferably 30 nm or less, and the tilt system is preferably 100 nm / mm or less, and more preferably 50 nm / mm or less. The height and inclination of the die line from the apex of the adjacent mountain to the bottom of the valley are within the above range, and even when incorporated in a liquid crystal display unit with a high-brightness backlight module, it can become a no-light spot. And has a good display state.

上述模頭線之從鄰接山的頂點起算至谷的底點為止的高度、及傾斜,係能夠使用三維表面構造解析顯微鏡,使其以一定速度掃描膜片表面之具有凹凸的面而產生干涉條紋來測定。 The height and inclination of the die line from the apex of the adjacent mountain to the bottom of the valley can be analyzed by using a three-dimensional surface structure analysis microscope to scan the uneven surface of the diaphragm surface at a constant speed to generate interference fringes. To measure.

在測定模頭線之從鄰接山的頂點起算至谷的底點為止的高度及傾斜時,在相鄰之谷的底點與山的頂點之基底為不同之情況,係如第1圖所顯示地描繪基線1,將描繪從山的頂點2或是從谷的底點3垂直於該基線1的線與基線1之交點之間的距離,設為從山的頂點起算至谷的底點為止之距離4。又,高度係緢繪通過山的頂點2或谷的底點3且與基線平行線5、6,將從線5起算至線6的最短距離設為高度7。 When measuring the height and inclination of the die line from the apex of the adjacent mountain to the bottom of the valley, the bottom point of the adjacent valley and the base of the peak of the mountain are different, as shown in Figure 1. Draw base line 1 from the top of the mountain or from the intersection of the bottom point 3 of the valley and the line perpendicular to the base line 1 and the intersection point of the base line 1 from the top of the mountain to the bottom of the valley Distance 4. In addition, the height is drawn through the apex 2 of the mountain or the bottom point 3 of the valley and parallel to the baseline, lines 5 and 6, and the shortest distance from line 5 to line 6 is set to height 7.

在本發明的光學用膜片,在該膜片的長度方向所形成的模頭線之從鄰接山的頂點起算至谷的底點為止的寬度4係較佳為500μm以上,更佳為1000μm以上。 In the optical film of the present invention, the width 4 of the die line formed in the longitudinal direction of the film from the apex of the adjacent mountain to the bottom of the valley is preferably 500 μm or more, and more preferably 1000 μm or more. .

本發明的光學用膜片之厚度係通常為20~300μm、較佳為30~200μm。膜片的厚度變動係以上述厚度的3%以內為佳,以2.5%以內為更佳。藉由將膜片的厚度變動設為上述範圍,能夠減少在將本發明的光學用膜片納入在液晶顯示裝置時之顏色不均。 The thickness of the optical film of the present invention is usually 20 to 300 μm, and preferably 30 to 200 μm. The thickness variation of the diaphragm is preferably within 3% of the above thickness, and more preferably within 2.5%. By making the thickness variation of the film into the above range, it is possible to reduce color unevenness when the optical film of the present invention is incorporated in a liquid crystal display device.

4.光學用膜片的製造方法 4. Manufacturing method of optical film

本發明的光學用膜片之製造方法係具有藉由擠製機使嵌段共聚物氫化物[2]熔融而從在該擠製機所安裝的擠壓模擠製成為薄片狀,而且使被擠製後的薄片狀嵌段共聚物氫化物[2] 密著在至少一個冷卻轉筒而成形且捲取之步驟。 The method for producing an optical film of the present invention comprises melting a block copolymer hydride [2] by an extruder, extruding the extruder from the extrusion die installed in the extruder into a sheet shape, and Extruded flaky block copolymer hydride [2] Forming and winding in close contact with at least one cooling drum.

本發明的光學用膜片之製造方法,其特徵在於: 使用擠壓模模唇的表面粗糙度Ra之平均值為0.05μm以下且在擠壓模模唇全寬之表面粗糙度Ra的分布範圍為前述平均值的±0.025μm以下之擠壓模。 The manufacturing method of the optical film of the present invention is characterized by: An extrusion die having an average value of the surface roughness Ra of the extrusion die lip of 0.05 μm or less and a distribution range of the surface roughness Ra across the entire width of the extrusion die lip is ± 0.025 μm or less of the aforementioned average value.

又,在本發明的光學用膜片之製造方法所使用的擠壓模,較佳是其擠壓模模唇的表面粗糙度Ra之平均值為0.01μm以下且在擠壓模模唇全寬之表面粗糙度Ra的分布範圍為前述平均值的±0.005μm以下。表面粗糙度Ra及其分布係能夠使用非接觸三維表面形狀.粗糙度測定機來測定。擠壓模模唇的表面粗糙度Ra的平均值大於0.05μm時,係容易產生起因於擠壓模之無法容許的模頭線。 In the extrusion die used in the method for producing an optical film of the present invention, it is preferable that the average value of the surface roughness Ra of the extrusion die lip is 0.01 μm or less and the entire width of the extrusion die lip The distribution range of the surface roughness Ra is ± 0.005 μm or less of the aforementioned average value. The surface roughness Ra and its distribution system can use a non-contact three-dimensional surface shape. Roughness measuring machine. When the average value of the surface roughness Ra of the extrusion die lip is more than 0.05 μm, it is easy to generate an unacceptable die line due to the extrusion die.

在本發明的光學用膜片之製造方法,作為嵌段共 聚物氫化物[2]的丸粒,係使用在該物藉由擠製機熔融擠製成形之前,於通常為50~120℃,以60~115℃為佳,較佳為70~110℃的溫度下保持2小時以上且以保持48小時以下者為佳。藉由將嵌段共聚物氫化物[2]的丸粒在上述條件下加熱處理,能夠減低丸粒中的溶解空氣量且藉此能夠抑制產生模頭線。加熱處理的溫度及時間低於上述範圍時,溶解空氣的除去量少且無法充分地抑制產生模頭線,又,加熱處理的溫度大於上述範圍時,嵌段共聚物氫化物[2]的丸粒容易產生黏結且有無法提供擠製成形之可能性,加熱處理的時間大於上述範圍時,色調有變差之可能性。 In the method for producing an optical film of the present invention, The pellets of the polymer hydride [2] are used before the material is melt-extruded by an extruder, usually at 50 to 120 ° C, preferably 60 to 115 ° C, and preferably 70 to 110 ° C. It is preferably kept at a temperature of 2 hours or more and 48 hours or less. By heating the pellets of the block copolymer hydride [2] under the above conditions, it is possible to reduce the amount of dissolved air in the pellets and thereby suppress the occurrence of die lines. When the temperature and time of the heat treatment are lower than the above range, the amount of dissolved air is small and die line formation cannot be sufficiently suppressed, and when the temperature of the heat treatment is greater than the above range, the pellet of the block copolymer hydride [2] The granules are liable to stick together and may not provide extrusion molding. When the heat treatment time is longer than the above range, the color tone may be deteriorated.

藉由加熱處理而被除去的溶解空氣量係通常為 100ppm以上,較佳為150ppm以上。將丸粒加熱而被排放的溶解空氣量,係能夠藉由從在加熱處理前後之丸粒的重量減少量來測定。又,從丸粒被排放的溶解空氣量亦能夠使用托普勒幫浦(Toepler pump)而測定。 The amount of dissolved air removed by heat treatment is usually 100 ppm or more, preferably 150 ppm or more. The amount of dissolved air discharged by heating the pellets can be measured from the weight reduction of the pellets before and after the heat treatment. The amount of dissolved air discharged from the pellets can also be measured using a Toepler pump.

藉由加熱處理而減低溶解空氣量之後,在室溫冷 卻時,因為即便是在隔離水分的環境下,亦再次吸收空氣而恢復原來狀態,所以加熱處理後的丸粒,必須在維持加熱狀態的狀態下供給至熔融擠製步驟,或是在冷卻後且再次吸收空氣而恢復原來狀態之前供給至熔融擠製步驟。冷卻後,通常係以1小時以內、較佳為0.5小時以內供給至熔融擠製步驟為佳。 After reducing the amount of dissolved air by heat treatment, cool at room temperature However, since the air is reabsorbed and restored to its original state even in an environment where moisture is isolated, the pellets after the heat treatment must be supplied to the melt extrusion step while maintaining the heated state, or after cooling Then, the air is supplied to the melt extrusion step before absorbing air again and returning to the original state. After cooling, it is usually preferably supplied to the melt extrusion step within 1 hour, preferably within 0.5 hour.

在本發明的製造方法,在具有T型模具的擠製機 之嵌段共聚物氫化物[2]的熔融溫度,通常為比嵌段共聚物氫化物[2]的玻璃轉移溫度更高70~160℃的溫度,以設為比玻璃轉移溫度更高90~140℃的溫度為較佳。嵌段共聚物氫化物[2]的玻璃轉移溫度係能夠以在黏彈性光譜之tan δ的峰頂值之方式求取。在擠製機的熔融溫度太低時,樹脂有流動性不足之可能性,相反地熔融溫度太高時,樹脂產生分解而有分子量低落之可能性。 In the manufacturing method of the present invention, in an extruder having a T-die The melting temperature of the block copolymer hydride [2] is generally 70 to 160 ° C higher than the glass transition temperature of the block copolymer hydride [2], and is set to be 90 to higher than the glass transition temperature. A temperature of 140 ° C is preferred. The glass transition temperature of the block copolymer hydride [2] can be determined as a peak top value of tan δ in the viscoelastic spectrum. When the melting temperature of the extruder is too low, the resin may have insufficient fluidity. Conversely, when the melting temperature is too high, the resin may be decomposed and the molecular weight may be lowered.

作為使從擠壓模的開口部被擠製之薄片狀嵌段共 聚物氫化物[2]密著於冷卻轉筒之方法,係沒有特別限制,例如,可舉出氣動刮刀方式、真空箱方式、靜電密著方式等。冷卻轉筒的數目係沒有特別限制,通常為2支以上。又,作為冷卻轉筒的配置方法,例如可舉出直線型、Z型、L型等,但是沒有特別限制。又,使從擠壓模的開口部被擠製的薄片狀嵌段 共聚物氫化物[2]通達至冷卻轉筒的方式係沒有特別限制。 As a sheet-like block extruded from the opening of an extrusion die The method for adhering the polymer hydride [2] to the cooling drum is not particularly limited, and examples thereof include a pneumatic doctor method, a vacuum box method, and an electrostatic adhesion method. The number of cooling drums is not particularly limited, but is usually two or more. In addition, examples of the arrangement method of the cooling drum include a linear type, a Z type, and an L type, but they are not particularly limited. In addition, a sheet-like block extruded from an opening of an extrusion die The manner in which the copolymer hydride [2] reaches the cooling drum is not particularly limited.

在本發明,被擠製的薄片狀嵌段共聚物氫化物[2] 在冷卻轉筒的密著情況係依照冷卻轉筒的溫度而變化。提高冷卻轉筒的溫度時,雖然密著變佳,但是提高溫度太多時,薄片狀嵌段共聚物氫化物[2]有無法從冷卻轉筒剝落而產生纏繞在轉筒的不良之可能性。因此,通常將嵌段共聚物氫化物[2]設為Tg(℃)時,冷卻轉筒溫度係通常係設為(Tg+10)℃以下,以(Tg-80)℃~(Tg-5)℃的範圍為佳,較佳是設為(Tg-60)℃~(Tg-10)℃的範圍。藉由將冷卻轉筒的溫度設為此種溫度範圍,能夠防止滑動、傷痕等的不良。 In the present invention, the extruded flaky block copolymer hydride [2] The tightness of the cooling drum changes according to the temperature of the cooling drum. When the temperature of the cooling drum is increased, although the adhesion is improved, if the temperature is increased too much, the sheet-like block copolymer hydride [2] may not be peeled off from the cooling drum and may cause a defect of being wound around the drum. . Therefore, when the block copolymer hydride [2] is usually set to Tg (° C), the temperature of the cooling drum is usually set to (Tg + 10) ° C or lower, and (Tg-80) ° C to (Tg-5) The range of) ° C is preferable, and the range of (Tg-60) ° C to (Tg-10) ° C is more preferable. By setting the temperature of the cooling drum to such a temperature range, defects such as sliding and scratches can be prevented.

在本發明係在擠製機內將嵌段共聚物氫化物[2]熔 融,在從該擠製機所安裝的擠壓模擠製之前,係以使熔融狀態的嵌段共聚物氫化物[2]通過齒輪幫浦和過濾器為佳。藉由使用齒輪幫浦,能夠使樹脂的擠製量之均勻性提升且使厚度不均減低。又,藉由使用過濾器,能夠將樹脂中的異物除去而得到無缺陷且具有優異的外觀之光學用膜片。 In the present invention, the block copolymer hydride [2] is melted in an extruder. It is preferable that the molten block copolymer hydride [2] be passed through a gear pump and a filter before being extruded from an extrusion die installed in the extruder. By using a gear pump, it is possible to improve the uniformity of the extrusion amount of the resin and reduce the thickness unevenness. In addition, by using a filter, foreign matter in the resin can be removed to obtain a defect-free optical film having excellent appearance.

本發明的光學用膜片係能夠使用在液晶顯示裝置 等的顯示裝置所使用之構件,例如偏光板保護膜片、相位差膜片、亮度提升膜片、透明導電膜片、觸控面板用基板、液晶基板、光拡散薄片、稜鏡薄片等。尤其是適合於偏光板保護膜片和相位差膜片。 The optical film of the present invention can be used in a liquid crystal display device. Examples of components used in display devices such as polarizing plate protective films, retardation films, brightness enhancement films, transparent conductive films, substrates for touch panels, liquid crystal substrates, light scattering sheets, and thin sheets. Especially suitable for polarizing plate protective film and retardation film.

5.偏光板保護膜片 5. Polarizer protective film

本發明的光學用膜片係能夠使用作為偏光板保護膜片。使用作為偏光板保護膜片時,膜片面內的相位差Re係以10nm 以下為佳,以3nm以下為較佳。藉由相位差為10nm以下,能夠抑制在液晶顯示單元納入時之顏色不均。在大畫面的液晶顯示裝置,顏色不均有格外顯眼之傾向,但是本發明的偏光板保護膜片係即便此種大畫面的顯示裝置亦適合。膜片面內的相位差Re係將膜片面內的主折射率設為Nx、Ny且將膜片的厚度設為d時,能夠藉由Re=(Nx-Ny)×d來求取。膜片面內的相位差Re亦能夠使用市售的自動雙折射計來測定。 The optical film of the present invention can be used as a polarizing plate protective film. When used as a polarizing plate protective film, the retardation Re in the film surface is 10 nm. The following is preferred, and 3 nm or less is preferred. When the phase difference is 10 nm or less, color unevenness when the liquid crystal display unit is incorporated can be suppressed. In a large-screen liquid crystal display device, the color does not tend to be particularly conspicuous, but the polarizing plate protective film of the present invention is suitable even for such a large-screen display device. The retardation Re in the diaphragm surface can be determined by using Re = (Nx-Ny) × d when the main refractive index in the diaphragm surface is Nx and Ny and the thickness of the diaphragm is d. The retardation Re in the diaphragm surface can also be measured using a commercially available automatic birefringence meter.

將本發明的光學用膜片使用作為偏光板保護膜片時,係在偏光板的一面或兩面透過適當的接著劑而將其層積。偏光板係能夠藉由在聚乙烯醇系膜片摻雜碘等之後,進行延伸加工來得到。作為接著層,係能夠使用將在丙烯酸系聚合物、聚矽氧系聚合物、聚酯、聚胺酯、聚醚、合成橡膠、在本發明所使用的嵌段共聚物氫化物[2],導入烷氧基矽烷基而成之改性嵌段共聚物氫化物等適當的聚合物作為基質聚合物之黏著劑或接著劑。 When the optical film of the present invention is used as a protective film for a polarizing plate, it is laminated on one or both sides of the polarizing plate through an appropriate adhesive. The polarizing plate system can be obtained by subjecting a polyvinyl alcohol-based film to doping with iodine or the like, followed by stretching. As the adhesive layer, an acrylic polymer, a silicone polymer, a polyester, a polyurethane, a polyether, a synthetic rubber, or a block copolymer hydride [2] used in the present invention can be used to introduce an alkane. An appropriate polymer such as a modified block copolymer made of an oxysilyl group is used as an adhesive or an adhesive for the matrix polymer.

6.相位差膜片 6. Phase difference diaphragm

本發明的光學用膜片係能夠使用作為相位差膜片。使用作為相位差膜片時,係能夠將本發明的光學用膜片進行延伸處理且賦予理想的相位差而使用。作為延伸處理之方法,可舉出在熔融擠製成形利用輥側的周速之差異而在縱向單軸延伸之方法;使用擴幅延伸機而在橫向單軸延伸之方法等的單軸延伸法;在將固定夾子的間隔擴大而進行縱向延伸同時,藉由擴大導軌的角度而進行橫向延伸之同時雙軸延伸法;及利用輥之間的周速之差異而進行縱向延伸之後,夾子把持其兩端部且使用 擴幅延伸機進行橫向延伸之依次雙軸延伸法等的雙軸延伸法等。 The optical film system of the present invention can be used as a retardation film. When used as a retardation film, the optical film of the present invention can be stretched and used to provide a desired retardation. Examples of the stretching method include a method of uniaxial stretching in the longitudinal direction by utilizing the difference in the peripheral speed on the roll side during melt extrusion, and a method of uniaxial stretching in the transverse direction by using a wide stretcher. ; While expanding the interval of the fixed clips for longitudinal extension, and simultaneous biaxial extension by extending the angle of the guide rails; and the longitudinal extension by utilizing the difference in the peripheral speed between the rollers, the clamps hold it Both ends and use The widening stretcher performs a biaxial stretching method such as a sequential biaxial stretching method such as a lateral stretching.

延伸處理時的溫度,係通常將嵌段共聚合休氫化 物[2]的玻璃轉移溫度設為Tg時,以(Tg-40℃)至(Tg+30℃)之間為佳,較佳為(Tg-30℃)至(Tg+10℃)的溫度範圍。又,延伸倍率係通常為1.01~30倍,以1.05~10倍為佳,較佳為1.1~5倍。 The temperature at the time of the stretching treatment is usually a block copolymerization. When the glass transition temperature of the object [2] is set to Tg, it is preferably between (Tg-40 ° C) and (Tg + 30 ° C), and more preferably (Tg-30 ° C) to (Tg + 10 ° C). range. The stretching ratio is usually 1.01 to 30 times, preferably 1.05 to 10 times, and more preferably 1.1 to 5 times.

作為本發明的相位差膜片,可舉出相對於預定波 長,供給1/2波長的相位差之1/2波長板;相對於預定波長,供給1/4波長的相位差之1/4波長板;將前述1/2波長板與1/4波長板以特定角度貼合而成之廣區域1/4波長板;正延遲片(在垂直於元件面的方向具有正相位差之相位差元件)、負延遲片(在垂直於元件面的方向具有負相位差之相位差元件)等。本發明的相位差膜片的厚度係通常為30~200μm。 Examples of the retardation film of the present invention include a predetermined wave Long, supplying a 1/2 wavelength plate with a phase difference of 1/2 wavelength; supplying a 1/4 wavelength plate with a phase difference of 1/4 wavelength relative to a predetermined wavelength; combining the aforementioned 1/2 wavelength plate and 1/4 wavelength plate Wide-area quarter-wave plate bonded at a specific angle; positive retarder (a retardation element with a positive phase difference in the direction perpendicular to the element surface), negative retarder (having a negative in the direction perpendicular to the element surface) Phase difference element). The thickness of the retardation film of the present invention is usually 30 to 200 μm.

在本發明的相位差膜片,亦可將複數片相位差膜 片層積而使各自的遲相軸以預定角度交叉。使其層積時,係使用習知的層積方法即可。又,在層積時亦可使用黏著劑等。 In the retardation film of the present invention, a plurality of retardation films may be used. The sheets are laminated so that the respective late phase axes intersect at a predetermined angle. For lamination, a conventional lamination method may be used. An adhesive or the like can also be used during lamination.

實施例 Examples

以下,邊顯示實施例邊更詳細地說明本發明,但是本發明係不只有限定於以下的實施例。又,份及%係只要未特別預先告知,就是重量基準。 Hereinafter, the present invention will be described in more detail while showing examples. However, the present invention is not limited to the following examples. In addition, parts and% are weight basis as long as it is not specifically notified in advance.

在本實施例之評價係使用以下的方法來進行。 The evaluation in this example was performed using the following method.

(1)重量平均分子量(Mw)及分子量分布(Mw/Mn) (1) Weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn)

嵌段共聚物及嵌段共聚物氫化物的分子量,係藉由以四氫 呋喃作為洗提液之GPC,以標準聚苯乙烯換算值的方式於38℃測定而求取。作為測定裝置,係使用TOSOH公司製「HLC8020 GPC」。 The molecular weight of block copolymers and block copolymer hydrides The GPC of furan as an eluent was measured at 38 ° C. as a standard polystyrene conversion value and determined. As a measuring device, "HLC8020 GPC" manufactured by TOSOH Corporation was used.

(2)氫化率 (2) hydrogenation rate

嵌段共聚物氫化物[2]的主鏈、側鏈及芳香環的氫化率,係測定1H-NMR光譜而算出。 The hydrogenation rates of the main chain, side chain, and aromatic ring of the block copolymer hydride [2] are calculated by measuring a 1 H-NMR spectrum.

(3)玻璃轉移溫度 (3) Glass transition temperature

將嵌段共聚物氫化物壓製成形而製成長度20mm、寬度4mm、厚度1mm的試片,基於JIS-K7244-4法且使用損失彈性模數測定裝置(Seiko Instruments公司製、製品名「DMS6100J),在-100℃至150℃的範圍,以振動頻率10Hz、升溫速度5℃/分鐘測定黏彈性光譜且從損失係數tan δ的高溫側之峰頂溫度,求取玻璃轉移溫度。 The block copolymer hydride was press-molded to prepare a test piece having a length of 20 mm, a width of 4 mm, and a thickness of 1 mm. Based on the JIS-K7244-4 method, a loss elastic modulus measuring device (manufactured by Seiko Instruments, product name "DMS6100J) In the range of -100 ° C to 150 ° C, the viscoelastic spectrum was measured at a vibration frequency of 10 Hz and a heating rate of 5 ° C / min, and the glass transition temperature was determined from the peak top temperature of the high temperature side of the loss coefficient tan δ.

(4)擠壓模模唇的表面粗糙度Ra及其分布 (4) Surface roughness Ra of the lip of the extrusion die and its distribution

使用非接觸三維表面形狀.粗糙度測定機(Zygo公司製、製品名「New View5000」)而測定。測定係在擠壓模模唇全寬以50mm間隔進行。而且將Ra的測定值之算術平均值設作代表值且將各測定值與算術平均值之差設作Ra的分布。 Use non-contact 3D surface shapes. Roughness measuring machine (manufactured by Zygo, product name "New View5000") and measured. The measurement was performed at 50 mm intervals across the full width of the extrusion die lip. The arithmetic mean of the measured values of Ra is set as a representative value, and the difference between each measured value and the arithmetic mean is set as a distribution of Ra.

(5)膜片的膜厚(基準膜厚、膜厚不均) (5) Film thickness (standard film thickness, uneven film thickness)

將膜片在長度方向每100mm進行切取,針對該切取的膜片10片,使用接觸式膜片厚度計(明產公司製、製品名「RC-101」)在膜片的寬度方向毎0.48mm進行測定,且將其測定值的算術平均值設作基準膜厚T(μm)。 The diaphragm was cut every 100 mm in the length direction, and 10 pieces of the cut diaphragm were cut with a contact-type diaphragm thickness meter (manufactured by Meissan Corporation, product name "RC-101") in the width direction of the diaphragm 毎 0.48 mm The measurement was performed, and the arithmetic mean value of the measured values was set as the reference film thickness T (μm).

膜厚不均係將前述所測定的膜厚之中的最大值設作 TMAX(μm),將最小值設作TMIN(μm),而從以下的式算出。 The film thickness unevenness refers to the maximum value among the film thicknesses measured above. TMAX (μm) is calculated from the following formula by setting the minimum value to TMIN (μm).

[數3]膜厚不均(%)=(TMAX-TMIN)/T×100 [Number 3] Uneven film thickness (%) = (TMAX-TMIN) / T × 100

(6)膜片的模頭線之從鄰接山的頂點起算至谷的底點為止的高度及傾斜 (6) The height and inclination of the die line of the diaphragm from the apex of the adjacent mountain to the bottom of the valley

在對膜片照射光線且將透射光映在銀幕時,在全寬範圍觀察在銀幕上能夠看到明亮或暗淡光線的條紋部分之位置(模頭線)。將該模頭線部分的膜片切取3cm四方左右的大小,使用三維表面構造解析顯微鏡(Zygo公司製)而觀察膜片兩面的表面。使膜片上產生凹凸的干渉條紋而測定。 When the film is irradiated with light and the transmitted light is reflected on the screen, the position (die line) where the streaks of bright or dim light can be seen on the screen over the full width is observed. The film of the die line portion was cut to a size of about 3 cm square, and the surfaces of both sides of the film were observed using a three-dimensional surface structure analysis microscope (manufactured by Zygo). The film was measured by generating uneven dry streaks on the film.

(7)漏光 (7) Light leakage

將坯膜(未延伸)膜片2片各自進行縱向延伸(延伸溫度為132℃且延伸倍率為2倍)而得到延伸膜片,將該等以互相的延伸軸為正交之方式貼合而製造積層體。在偏光板將該積層體以各自延伸膜片的延伸軸係對偏光板的透射軸成為45度之方式夾住。其次,從背光板使光線透射該夾住偏光板之積層體,在從偏光板起算法線方向的距離為30mm之位置,配置照度計(橫河METER & INSTRUMENTS公司製、製品名「51001」)且測定照度。將照度為300勒克司(lux)以上時設作「有漏光」,將照度為小於300勒克司時設作「無漏光」。又,背光板係使用照度為5,000勒克司者及10,000勒克司者。 Each of the two blank (non-stretched) film sheets was stretched in the longitudinal direction (the stretching temperature was 132 ° C. and the stretching ratio was 2 times) to obtain a stretched film sheet. Laminates are manufactured. The laminated body was sandwiched between the polarizing plates such that the extension axis of each of the extending films was 45 degrees to the transmission axis of the polarizing plate. Next, light is transmitted from the backlight through the laminated body sandwiching the polarizing plate, and an illuminance meter (produced by Yokogawa METER & INSTRUMENTS, product name "51001") is disposed at a distance of 30 mm from the polarizing plate in the line direction. And the illuminance was measured. Set "light leakage" when the illuminance is 300 lux or more, and "light leakage" when the illuminance is less than 300 lux. In addition, the backlight panel is a person using 5,000 lux and 10,000 lux.

[參考例1] [Reference Example 1] 嵌段共聚物氫化物[2]-1 Block copolymer hydride [2] -1 (嵌段共聚物[1]-1的合成) (Synthesis of block copolymer [1] -1)

在內部充分地被氮取代之具備有攪拌裝置之反應器,添加脫水環己烷550份、脫水苯乙烯30.0份、及正二丁基醚0.475份,邊於60℃攪拌邊添加正丁基鋰(15%環己烷溶液)0.61份而開始聚合。邊攪拌邊於60℃使其反應60分鐘。在使用氣相層析儀測定之該時點,聚合轉化率為99.5%。 In a reactor equipped with a stirring device sufficiently substituted with nitrogen inside, 550 parts of dehydrated cyclohexane, 30.0 parts of dehydrated styrene, and 0.475 parts of n-dibutyl ether were added, and n-butyllithium was added while stirring at 60 ° C ( 15% cyclohexane solution) 0.61 parts to start polymerization. It was made to react at 60 degreeC for 60 minutes, stirring. At this point measured using a gas chromatograph, the polymerization conversion rate was 99.5%.

其次,添加脫水異戊二烯40.0份且在同溫度繼續攪拌30分攪拌。該時點之聚合轉化率為99.5%。 Next, 40.0 parts of dehydrated isoprene was added, and stirring was continued at the same temperature for 30 minutes. The polymerization conversion rate at this point was 99.5%.

隨後,進一步添加30.0份的脫水苯乙烯且於60℃攪拌60分鐘。在該時點之聚合轉化率為大約100%。 Subsequently, 30.0 parts of dehydrated styrene was further added and stirred at 60 ° C for 60 minutes. The polymerization conversion at this point was about 100%.

在此,添加異丙醇0.5份而使反應停止。所得到的嵌段共聚物[1]-1之重量平均分子量(Mw)為80,400,分子量分布(Mw/Mn)為1.03,wA:wB=60:40。 Here, 0.5 part of isopropyl alcohol was added to stop the reaction. The weight average molecular weight (Mw) of the obtained block copolymer [1] -1 was 80,400, the molecular weight distribution (Mw / Mn) was 1.03, and wA: wB = 60: 40.

(嵌段共聚物氫化物[2]-1的合成) (Synthesis of block copolymer hydride [2] -1)

其次,將上述聚合物溶液移送到具備攪拌裝置之耐壓反應器,添加矽藻土負載型鎳觸媒(SUD Chemie觸媒公司製、製品名「T-8400RL」)3.0份作為氫化觸媒、及脫水環己烷100份且混合。使用氫氣取代反應器內部,進而邊攪拌溶液邊供給氫氣且於溫度190℃、壓力4.5MPa進行氫化反應6小時。氫化反應後的嵌段共聚物氫化物[2]-1之重量平均分子量(Mw)為81,200,分子量分布(Mw/Mn)為1.04。 Next, the polymer solution was transferred to a pressure-resistant reactor equipped with a stirring device, and 3.0 parts of diatomite-supported nickel catalyst (manufactured by SUD Chemie Catalyst Co., Ltd., product name "T-8400RL") was added as a hydrogenation catalyst. And 100 parts of dehydrated cyclohexane and mixed. The inside of the reactor was replaced with hydrogen, and hydrogen was supplied while stirring the solution, and a hydrogenation reaction was performed at a temperature of 190 ° C and a pressure of 4.5 MPa for 6 hours. The weight average molecular weight (Mw) of the hydrogenated block copolymer [2] -1 after the hydrogenation reaction was 81,200, and the molecular weight distribution (Mw / Mn) was 1.04.

氫化反應結束後,將反應溶液過濾而除去氫化觸媒之後,添加將酚系抗氧化劑亦即新戊四醇.肆[3,(3,5-二-第三丁基-4-羥苯基)丙酸酯](KOYO化學研究所公司製、製品名「Songnox1010」)0.1份溶解而成之二甲苯溶液1.0份且使其 溶解。 After the completion of the hydrogenation reaction, the reaction solution was filtered to remove the hydrogenation catalyst, and then a phenolic antioxidant, namely neopentyl tetraol was added. 1.0 part of xylene solution obtained by dissolving 0.1 part of [3, (3,5-di-third-butyl-4-hydroxyphenyl) propionate] (manufactured by KOYO Chemical Research Institute, product name "Songnox1010") Share and make Dissolve.

隨後,將上述溶液使用金屬纖維製過濾器(NICHIDAI公司製、孔徑0.4μm)過濾而將微小的固體成分除去之後,使用圓筒型濃縮乾燥器(日立製作所公司製、製品名「KONTRO」)且在溫度260℃、壓力0.001MPa以下,將溶劑之環己烷、二甲苯及其他的揮發成分從溶液除去。連續地將熔融聚合物,使用連結至濃縮乾燥器之具備孔徑5μm的不鏽鋼製燒結過濾器之聚合物過濾器(富士過濾器公司製),於溫度260℃過濾之後,將熔融聚合物從塑模擠製股線狀且冷卻後,使用製粒機製成嵌段共聚物氫化物[2]-1的丸粒95份。所得到的丸粒狀嵌段共聚物氫化物[2]-1之重量平均分子量(Mw)為80,200,分子量分布(Mw/Mn)為1.04。氫化率為大約100%,玻璃轉移溫度(Tg)為143℃。 Subsequently, the above solution was filtered using a metal fiber filter (manufactured by NICHIDAI, pore diameter of 0.4 μm) to remove minute solid components, and then a cylindrical concentrator dryer (manufactured by Hitachi, Ltd., product name "KONTRO") was used and At a temperature of 260 ° C and a pressure of 0.001 MPa or less, cyclohexane, xylene and other volatile components of the solvent were removed from the solution. The molten polymer was continuously filtered using a polymer filter (manufactured by Fuji Filter Co., Ltd.) having a sintered filter made of stainless steel having a pore size of 5 μm connected to a concentrating dryer, and the molten polymer was filtered from a mold at a temperature of 260 ° C. After the strand was extruded and cooled, 95 parts of pellets of the block copolymer hydride [2] -1 were prepared using a granulator. The weight average molecular weight (Mw) of the obtained pelletized block copolymer hydride [2] -1 was 80,200, and the molecular weight distribution (Mw / Mn) was 1.04. The hydrogenation rate was approximately 100%, and the glass transition temperature (Tg) was 143 ° C.

[參考例2] [Reference Example 2]

除了將嵌段共聚物氫化物[2]-2(嵌段共聚物[1]-2的合成)苯乙烯20.0份、異戊二烯20.0份、苯乙烯20.0份、異戊二烯20.0份及苯乙烯20.0份,各自分成5次且依照該順序添加以外,係與參考例1同樣地進行聚合及停止反應。所得到的嵌段共聚物[1]-2之重量平均分子量(Mw)為79,100,分子量分布(Mw/Mn)為1.04,wA:wB=60:40。 Except the block copolymer hydride [2] -2 (synthesis of block copolymer [1] -2) 20.0 parts of styrene, 20.0 parts of isoprene, 20.0 parts of styrene, 20.0 parts of isoprene and Except for 20.0 parts of styrene, each of which was divided into 5 times and added in this order, polymerization and reaction were stopped in the same manner as in Reference Example 1. The weight average molecular weight (Mw) of the obtained block copolymer [1] -2 was 79,100, the molecular weight distribution (Mw / Mn) was 1.04, and wA: wB = 60: 40.

(嵌段共聚物氫化物[2]-2的合成) (Synthesis of block copolymer hydride [2] -2)

其次,將上述聚合物溶液與參考例1同樣地進行氫化反應。氫化反應後的嵌段共聚物氫化物[2]-2之重量平均分子量(Mw)為79,900,分子量分布(Mw/Mn)為1.06。 Next, the above polymer solution was subjected to a hydrogenation reaction in the same manner as in Reference Example 1. The weight average molecular weight (Mw) of the hydrogenated block copolymer [2] -2 after the hydrogenation reaction was 79,900, and the molecular weight distribution (Mw / Mn) was 1.06.

氫化反應結束後,與參考例1同樣地添加抗氧化劑之後,濃縮乾燥而製成嵌段共聚物氫化物[2]-2的丸粒91份。所得到的丸粒狀嵌段共聚物氫化物[2]-2之重量平均分子量(Mw)為78,900,分子量分布(Mw/Mn)為1.06。氫化率為大約100%,玻璃轉移溫度為135℃。 After the hydrogenation reaction was completed, an antioxidant was added in the same manner as in Reference Example 1, and then concentrated and dried to obtain 91 parts of pellets of a block copolymer hydride [2] -2. The weight average molecular weight (Mw) of the obtained pellet-like block copolymer hydride [2] -2 was 78,900, and the molecular weight distribution (Mw / Mn) was 1.06. The hydrogenation rate was approximately 100%, and the glass transition temperature was 135 ° C.

(實施例1) (Example 1)

使用使空氣流通之熱風乾燥機,將在參考例1所得到的嵌段共聚物氫化物[2]-1之丸粒,於80℃進行加熱處理4小時。將該加熱處理後的丸粒,在1小時以內使用設置有葉盤(leaf disc)形狀聚合物過濾器(濾過精度10μm)之50mm的單軸擠製機、及具有在表1所表示的擠壓模模唇A之T型擠壓模1且於260℃進行熔融擠製,使所擠製的薄片狀嵌段共聚物氫化物[2]-1通過3支冷卻轉筒(直徑250mm、轉筒溫度105、捲取速度0.35m/s)而冷卻,來得到600mm寬度的光學用膜片1。將所得到的光學用膜片1的評價結果顯示在表2。 The pellets of the block copolymer hydride [2] -1 obtained in Reference Example 1 were subjected to heat treatment at 80 ° C. for 4 hours using a hot-air dryer that circulated air. The heat-treated pellets were used within 1 hour using a 50 mm uniaxial extruder equipped with a leaf disc-shaped polymer filter (filtration accuracy of 10 μm), and the extruder having the extruder shown in Table 1 The T-shaped extrusion die 1 of the compression die lip A is melt-extruded at 260 ° C, so that the extruded sheet-like block copolymer hydride [2] -1 is passed through 3 cooling drums (250 mm in diameter, The tube temperature was 105 and the take-up speed was 0.35 m / s) and cooled to obtain an optical film 1 having a width of 600 mm. The evaluation results of the obtained optical film 1 are shown in Table 2.

(藉由加熱處理而被除去之嵌段共聚物氫化物[2]-1丸粒中的溶解空氣量) (Amount of dissolved air in the block copolymer hydride [2] -1 pellet removed by heat treatment)

精秤與在實施例1所使用相同的嵌段共聚物氫化物[2]-1之丸粒5.0126g且添加至附有磨口活栓及磨口接頭的玻璃製試管。透過磨口接頭而連接至托普勒幫浦,於25℃將試管內的空氣進行脫氣25秒鐘。將試管的活栓關閉,藉由油浴且使用與實施例1的加熱處理相同條件將試管於80℃加熱4小時,來使在嵌段共聚物氫化物[2]-1的丸粒所溶解的空氣排放。在將試管保存於80℃的狀態下,使用托普勒幫浦在25℃、常壓下測 定在試管內被排放的空氣之量。所測得的空氣量為0.787ml。又,在相同脫氣條件下將空的試管進行脫氣時之試管內的殘留空氣量為0.01ml以下,為能夠忽視之量。將空氣的平均分子量設為28.8而算出被排放的空氣量之結果,為10.12×10-4g,相對於嵌段共聚物氫化物[2]-1丸粒的重量,為202ppm。 5.0126 g of pellets of the same block copolymer hydride [2] -1 as used in Example 1 were added to a fine scale and added to a glass test tube with a ground stopcock and a ground end joint. Connected to the Toppler pump through the ground joint, and degas the air in the test tube at 25 ° C for 25 seconds. The stopcock of the test tube was closed, and the test tube was heated at 80 ° C. for 4 hours in an oil bath under the same conditions as the heat treatment in Example 1 to dissolve the pellets in the block copolymer hydride [2] -1. Air emissions. The test tube was stored at 80 ° C, and the amount of air exhausted in the test tube was measured using a Toppler pump at 25 ° C and normal pressure. The measured air volume was 0.787 ml. The amount of residual air in the test tube when the empty test tube was degassed under the same degassing conditions was 0.01 ml or less, which was an amount that could be ignored. When the average molecular weight of the air was 28.8 and the amount of discharged air was calculated, it was 10.12 × 10 -4 g, which was 202 ppm based on the weight of the block copolymer hydride [2] -1 pellets.

(實施例2) (Example 2)

除了使用在表1所表示之具有擠壓模模唇B之T型擠壓模2作為壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片2。將所得到的光學用膜片2之評價結果顯示在表2。 An optical film 2 was obtained in the same manner as in Example 1 except that a T-shaped extrusion die 2 having an extrusion die lip B shown in Table 1 was used as the extrusion die lip. The evaluation results of the obtained optical film 2 are shown in Table 2.

(實施例3) (Example 3)

除了使用在參考例2所得到的嵌段共聚物氫化物[2]-2之丸粒且於80℃進行加熱處理5小時,而且使用表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片3。將所得到的光學用膜片3之評價結果顯示在表2。 In addition to using the pellets of the block copolymer hydride [2] -2 obtained in Reference Example 2 and heat-treating at 80 ° C. for 5 hours, a T-shape having an extrusion die lip B shown in Table 1 was used. Except that the extrusion die 2 was used as the extrusion die lip, it was carried out in the same manner as in Example 1 to obtain an optical film 3. The evaluation results of the obtained optical film 3 are shown in Table 2.

(實施例4) (Example 4)

除了使用在參考例2所得到的嵌段共聚物氫化物[2]-2之丸粒且於60℃進行加熱處理5小時,而且使用表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片4。將所得到的光學用膜片4之評價結果顯示在表2 In addition to using the pellets of the block copolymer hydride [2] -2 obtained in Reference Example 2 and heat-treating at 60 ° C. for 5 hours, a T-shape having an extrusion die lip B shown in Table 1 was used. Except that the extrusion die 2 was used as the extrusion die lip, it was carried out in the same manner as in Example 1 to obtain an optical film 4. The evaluation results of the obtained optical film 4 are shown in Table 2.

(比較例1) (Comparative example 1)

除了使用在表1所表示之具有擠壓模模唇C之T型擠壓模3作為擠壓模模唇以外,係與實施例1同樣地進行而得到 光學用膜片5。將所得到的光學用膜片5之評價結果顯示在表2。 Except that the T-shaped extrusion die 3 having the extrusion die lip C shown in Table 1 was used as the extrusion die lip, it was obtained in the same manner as in Example 1. Optical film 5. The evaluation results of the obtained optical film 5 are shown in Table 2.

(比較例2) (Comparative example 2)

除了使用在表1所表示之具有擠壓模模唇D之T型擠壓模4作為擠壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片6。將所得到的光學用膜片6之評價結果顯示在表2。 An optical film 6 was obtained in the same manner as in Example 1 except that a T-shaped extrusion die 4 having an extrusion die lip D shown in Table 1 was used as the extrusion die lip. The evaluation results of the obtained optical film 6 are shown in Table 2.

(比較例3) (Comparative example 3)

除了不進行加熱處理而使用嵌段共聚物氫化物[2]-1的丸粒,及用在表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片7。將所得到的光學用膜片7之評價結果顯示在表2。 Except that the pellets of the block copolymer hydride [2] -1 were used without heat treatment, and the T-shaped extrusion die 2 having the extrusion die lip B shown in Table 1 was used as the extrusion die lip Except this, it carried out similarly to Example 1, and obtained the optical film 7. The evaluation results of the obtained optical film 7 are shown in Table 2.

(比較例4) (Comparative Example 4)

除了將嵌段共聚物氫化物[2]-1之丸粒的加熱處理條件設為40℃且4小時,而且使用在表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片8。將所得到的光學用膜片8之評價結果顯示在表2。 In addition to setting the heat treatment conditions of the pellets of the block copolymer hydride [2] -1 to 40 ° C. for 4 hours, a T-shaped extrusion die 2 having an extrusion die lip B shown in Table 1 was used. Except for the die lip, the same procedure as in Example 1 was performed to obtain an optical film 8. The evaluation results of the obtained optical film 8 are shown in Table 2.

(比較例5) (Comparative example 5)

除了將嵌段共聚物氫化物[2]-1之丸粒的加熱處理條件設為85℃且1小時,而且使用在表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片9。將所得到的光學用膜片9之評價結果顯示在表2。 In addition to setting the heat treatment conditions of the pellets of the block copolymer hydride [2] -1 to 85 ° C. for 1 hour, a T-shaped extrusion die 2 having an extrusion die lip B shown in Table 1 was used. Except for the die lip, the same procedure as in Example 1 was performed to obtain an optical film 9. The evaluation results of the obtained optical film 9 are shown in Table 2.

(實施例5) (Example 5)

除了使用在表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇,而且提高擠製速度且將冷卻轉筒的溫度變更為95℃,將捲取速度變更為0.41m/s以外,係與實施例1同樣地進行而得到光學用膜片10。將所得到的光學用膜片10之評價結果顯示在表2。 In addition to using the T-shaped extrusion die 2 with the extrusion die lip B shown in Table 1 as the extrusion die lip, the extrusion speed is increased, and the temperature of the cooling drum is changed to 95 ° C, and the winding speed is increased. Except changing to 0.41 m / s, it carried out similarly to Example 1, and obtained the optical film 10. The evaluation results of the obtained optical film 10 are shown in Table 2.

(實施例6) (Example 6)

除了使用在表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇,而且提高擠製速度且將冷卻轉筒的溫度變更為85℃,將捲取速度變更為0.48m/s以外,係與實施例1同樣地進行而得到光學用膜片11。將所得到的光學用膜片11之評價結果顯示在表2。 In addition to using the T-shaped extrusion die 2 with the extrusion die lip B shown in Table 1 as the extrusion die lip, the extrusion speed was increased, and the temperature of the cooling drum was changed to 85 ° C., and the winding speed Except changing to 0.48 m / s, it carried out similarly to Example 1, and the optical film 11 was obtained. The evaluation results of the obtained optical film 11 are shown in Table 2.

(實施例7) (Example 7)

除了將嵌段共聚物氫化物[2]-1之丸粒於100℃進行加熱處理2.5小時,而且使用在表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片12。將所得到的光學用膜片12之評價結果顯示在表2。 In addition to heating the pellets of the block copolymer hydride [2] -1 at 100 ° C. for 2.5 hours, and using a T-shaped extrusion die 2 having an extrusion die lip B as shown in Table 1 as the extrusion Except for the die lip, the same procedure as in Example 1 was performed to obtain an optical film 12. The evaluation results of the obtained optical film 12 are shown in Table 2.

(實施例8) (Example 8)

除了將嵌段共聚物氫化物[2]-1之丸粒於55℃進行加熱處理2.5小時,而且使用在表1所表示之具有擠壓模模唇B之T型擠壓模2作為擠壓模模唇以外,係與實施例1同樣地進行而得到光學用膜片13。將所得到的光學用膜片13之評價結果顯示在表2。 In addition to heating the pellets of the block copolymer hydride [2] -1 at 55 ° C for 2.5 hours, and using a T-shaped extrusion die 2 having an extrusion die lip B shown in Table 1 as the extrusion Except for the die lip, the same procedure as in Example 1 was performed to obtain an optical film 13. The evaluation results of the obtained optical film 13 are shown in Table 2.

[表1] [Table 1]

從本實施例及比較例的結果,得知以下事項。本發明的光學用膜片係如實施例所表示,模頭線之從鄰接山的頂點起算至谷的底點為止的高度為100nm以下且傾斜為300nm/mm以下。因此,將該膜片延伸且夾住偏光板而測定漏光時,即便使用照度5,000勒克司及10,000勒克司的背光板亦不漏光(實施例1~實施例8)。 From the results of this example and comparative example, the following matters are known. The optical film of the present invention is as shown in the examples, and the height of the die line from the apex of the adjacent mountain to the bottom of the valley is 100 nm or less and the slope is 300 nm / mm or less. Therefore, when this film is extended and a polarizing plate is sandwiched to measure light leakage, even if a backlight plate with illuminance of 5,000 lux and 10,000 lux is used, no light leakage occurs (Examples 1 to 8).

另一方面,比較例的光學用膜片,其模頭線之從鄰接山的頂點起算至谷的底點為止的高度為比100nm大,及/或傾斜為比30.0nm/mm大。因此,將該膜片延伸且偏光而測定漏光時,使用照度5,000勒克司及10,000勒克司的背光板均 有漏光(比較例3、4),雖然使用照度5,000勒克司的背光板時不漏光,但是使用10,000勒克司的背光板時有漏光(比較例1、2、5)。 On the other hand, in the optical film of the comparative example, the height of the die line from the apex of the adjacent mountain to the bottom of the valley was greater than 100 nm, and / or the tilt was greater than 30.0 nm / mm. Therefore, when this film is extended and polarized to measure light leakage, both 5,000 lux and 10,000 lux backlight panels are used. There was light leakage (Comparative Examples 3 and 4), and although there was no light leakage when using a backlight of 5,000 lux, there was light leakage when using a backlight of 10,000 lux (Comparative Examples 1, 2, 5).

擠壓模模唇的表面粗糙度Ra之平均值、在擠壓模模唇全寬之表面粗糙度Ra的分布範圍係大於本發明的範圍時(比較例1、比較例2),模頭線的高度及模頭線的傾斜係比本發明的範圍大。 When the average value of the surface roughness Ra of the extrusion die lip and the distribution range of the surface roughness Ra of the entire width of the extrusion die lip are larger than the range of the present invention (Comparative Example 1, Comparative Example 2), the die line The height and the inclination of the die line are larger than the scope of the present invention.

嵌段共聚物氫化物[2]的丸粒之熔融擠製成形前的加熱處理條件係低於本發明的範圍時(比較例3~比較例5),模頭線的高度係比本發明的範圍大,使用照度5,000勒克司和10,000勒克司的背光板時,係產生漏光。 When the heat treatment conditions before melt extrusion of the pellets of the block copolymer hydride [2] are below the range of the present invention (Comparative Examples 3 to 5), the height of the die line is higher than that of the present invention. Large range, when using 5,000 lux and 10,000 lux backlight panels, light leakage occurs.

產業上之可利用性 Industrial availability

由本發明的嵌段共聚物氫化物所構成之光學膜片係表面缺陷少且具有優異的面狀之膜片,使用作為偏光板保護膜片、相位差膜片等的光學用膜片係有用的。 The optical film system composed of the block copolymer hydride of the present invention has a small surface defect and has an excellent planar shape, and is useful as an optical film system such as a polarizer protective film, a retardation film, and the like. .

Claims (4)

一種光學用膜片,其係由嵌段共聚物[1]的全部不飽和鍵的90%以上氫化而成之嵌段共聚物氫化物[2]所構成之光學用膜片,該嵌段共聚物[1]係以源自芳香族乙烯系化合物的重複單元作為主成分之至少二種的聚合物嵌段[A]、及以源自鏈狀共軛二烯化合物的重複單元作為主成分之至少一種的聚合物嵌段[B]所構成,將全部聚合物嵌段[A]在嵌段共聚物全體所佔有的重量分率設為wA且將全部聚合物嵌段[B]在嵌段共聚物全體所佔有的重量分率設為wB時,係由將wA與wB之比(wA:wB)為40:60~80:20,其特徵在於:使用擠壓模模唇的表面粗糙度Ra之平均值為0.05μm以下且在擠壓模模唇全寬之表面粗糙度Ra的分布範圍為前述平均值的±0.025μm以下之擠壓模得到,從在該膜片的長度方向所形成的模頭線之鄰接山的頂點起算至谷的底點為止的高度係在膜片全面為100nm以下,而且,以式1表示之膜片表面的模頭線之傾斜係在膜片全面為300nm/mm以下。[數1]傾斜(nm/mm)=(從鄰接山的頂點起算至谷的底點為止的高度)/(從鄰接山的頂點起算至谷的底點為止的寬度)...式1An optical film comprising an optical film composed of a hydrogenated block copolymer [2] obtained by hydrogenating more than 90% of all unsaturated bonds of the block copolymer [1], and the block copolymerization The substance [1] is a polymer block [A] having at least two kinds of repeating units derived from an aromatic vinyl compound as a main component and a repeating unit derived from a chain conjugated diene compound as a main component. It is composed of at least one kind of polymer block [B], and the weight fraction of all polymer blocks [A] in the entire block copolymer is set to wA, and all polymer blocks [B] are in the block. When the weight fraction occupied by the entire copolymer is set to wB, the ratio of wA to wB (wA: wB) is 40:60 to 80:20, which is characterized in that the surface roughness of the lip of the extrusion die is used The average value of Ra is 0.05 μm or less, and the surface roughness Ra in the entire width of the lip of the extrusion die is distributed in an extrusion die of ± 0.025 μm or less of the aforementioned average value. The height from the apex of the adjacent mountain of the die line to the bottom of the valley is 100nm or less across the entire surface of the diaphragm. The inclination of the line system of the die surface of the diaphragm in the diaphragm full of 300nm / mm or less. [Number 1] Slope (nm / mm) = (height from the apex of the adjacent mountain to the bottom of the valley) / (width from the apex of the adjacent mountain to the bottom of the valley). . . Formula 1 一種偏光板保護膜片,其包含如申請專利範圍第1項所述之光學用膜片。A polarizing plate protective film includes the optical film described in item 1 of the scope of patent application. 一種相位差膜片,係將如申請專利範圍第1項所述之光學用膜片延伸而成。A retardation film is formed by extending an optical film as described in item 1 of the scope of patent application. 一種光學用膜片的製造方法,係具有藉由擠製機使嵌段共聚物氫化物[2]熔融而從在該擠製機所安裝的擠壓模擠製成為薄片狀,而且使被擠製後的薄片狀嵌段共聚物氫化物[2]密著在至少一個冷卻轉筒而成形且捲取之步驟,其特徵在於:使用擠壓模模唇的表面粗糙度Ra之平均值為0.05μm以下且在擠壓模模唇全寬之表面粗糙度Ra的分布範圍為前述平均值的±0.025μm以下之擠壓模,而且使用於50~120℃的溫度保持2小時以上之嵌段共聚物氫化物[2]的丸粒。An optical film manufacturing method comprising extruding a block copolymer hydride [2] by an extruder, extruding the extruding die attached to the extruder into a sheet shape, and extruding the extruder. The manufactured sheet-like block copolymer hydride [2] is formed by being closely adhered to at least one cooling drum, and the step of winding is characterized in that the average value of the surface roughness Ra of the lips of the extrusion die is 0.05. Extrusion molds with a surface roughness Ra of less than μm and the full width of the lip of the extrusion die are within ± 0.025 μm of the aforementioned average value, and are used for block copolymerization at a temperature of 50 to 120 ° C for more than 2 hours Pellets of hydride [2].
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