TWI624370B - Method for moving thermoplastic film - Google Patents
Method for moving thermoplastic film Download PDFInfo
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- TWI624370B TWI624370B TW103113507A TW103113507A TWI624370B TW I624370 B TWI624370 B TW I624370B TW 103113507 A TW103113507 A TW 103113507A TW 103113507 A TW103113507 A TW 103113507A TW I624370 B TWI624370 B TW I624370B
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- laminated structure
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- 229920001169 thermoplastic Polymers 0.000 title claims description 41
- 239000004416 thermosoftening plastic Substances 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 32
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 42
- 238000002844 melting Methods 0.000 claims abstract description 22
- 230000008018 melting Effects 0.000 claims abstract description 22
- 230000009477 glass transition Effects 0.000 claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 claims description 40
- -1 polyethylene Polymers 0.000 claims description 19
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 10
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 10
- 239000004743 Polypropylene Substances 0.000 claims description 9
- 229920001155 polypropylene Polymers 0.000 claims description 9
- 239000004698 Polyethylene Substances 0.000 claims description 6
- 229920000573 polyethylene Polymers 0.000 claims description 6
- 239000004417 polycarbonate Substances 0.000 claims description 5
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 239000011148 porous material Substances 0.000 claims description 4
- 238000009826 distribution Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 194
- 229920005989 resin Polymers 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- 239000000463 material Substances 0.000 description 11
- 238000001816 cooling Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 238000000465 moulding Methods 0.000 description 9
- 239000012790 adhesive layer Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 6
- 238000010030 laminating Methods 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 238000004804 winding Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 239000002344 surface layer Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 229920001684 low density polyethylene Polymers 0.000 description 3
- 239000004702 low-density polyethylene Substances 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229920002367 Polyisobutene Polymers 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 238000004113 cell culture Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005323 electroforming Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920001083 polybutene Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920000306 polymethylpentene Polymers 0.000 description 2
- 239000011116 polymethylpentene Substances 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229940044949 eucalyptus oil Drugs 0.000 description 1
- 239000010642 eucalyptus oil Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920002215 polytrimethylene terephthalate Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000646 scanning calorimetry Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000003856 thermoforming Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
- B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
- B01D39/16—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres
- B01D39/1692—Other shaped material, e.g. perforated or porous sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
- B29C67/20—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00 for porous or cellular articles, e.g. of foam plastics, coarse-pored
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/10—Filtering material manufacturing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Laminated Bodies (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Abstract
藉由對於至少形成有以具有熔點Tm1之熱塑性樹脂P1為主體的A層、與以具有玻璃轉移溫度Tg2之熱塑性樹脂P2的B層之積層構造體,將表面具有突起構造之模具於加熱至Tm1以上且Tg2以上的溫度之狀態下並按壓於該積層構造體之A層側,能在A層以所期望的位置與密度分布予以配置而形成具有所期望的形狀之貫穿孔。 The mold having the protrusion structure on the surface is heated to Tm1 by a laminated structure in which at least the layer A mainly composed of the thermoplastic resin P1 having the melting point Tm1 and the layer B having the thermoplastic resin P2 having the glass transition temperature Tg2 are formed. When the temperature is higher than Tg2 and is pressed against the layer A side of the laminated structure, the A layer can be placed at a desired position and density distribution to form a through hole having a desired shape.
Description
本發明係關於一種具有貫穿孔的熱塑性薄膜之製造方法。利用本方法所得之具有貫穿孔的薄膜能作為具有過濾、細胞培養、細胞分離、氣體穿透、透濕等功能之以微米尺寸至奈米尺寸之微細貫穿孔為必要的構件使用。又,於如此之用途中,以謀求高性能化之目的下,特別適合使用於具有孔形狀或配置經高精密度控制之貫穿孔的熱塑性薄膜。 This invention relates to a method of making a thermoplastic film having through-holes. The film having the through-hole obtained by the method can be used as a member having a fine through-hole of a micron size to a nanometer size which has functions of filtration, cell culture, cell separation, gas penetration, and moisture permeability. Moreover, in such an application, in order to achieve high performance, it is particularly suitable for use in a thermoplastic film having a hole shape or a through-hole controlled by high precision.
作為具有孔形狀或配置經高精密度控制之貫穿孔的熱塑性薄膜之製造方法,可舉出射出成形或對薄膜之電子射線加工、蝕刻、熱壓印等。射出成形,能藉由將熔融的樹脂填充於已形成突起的模具中而成形為具有貫穿孔的薄膜。又,電子射線加工,能藉由將電子束照射至薄膜表面,使其從表面向內部熔融而形成貫穿孔。又,蝕刻,能藉由對於薄膜表面已被遮罩所遮蔽的區域以外之開口部,使氣體或液體構成之蝕刻材料接觸,以化學或物理方式逐漸去除樹脂而形成貫穿孔。 Examples of the method for producing a thermoplastic film having a hole shape or a through-hole controlled by high precision include injection molding, electron beam processing on a film, etching, hot stamping, and the like. Injection molding can be formed into a film having a through hole by filling a molten resin in a mold in which protrusions are formed. Further, electron beam processing can form a through hole by irradiating an electron beam onto the surface of the film to melt it from the surface to the inside. Further, etching can be performed by bringing an etching material made of a gas or a liquid into contact with an opening other than the region where the surface of the film is shielded, and gradually removing the resin by chemical or physical means to form a through hole.
又,於專利文獻1、專利文獻2中,有人揭示一種熱壓印技術,其係對熱塑性薄膜按壓經加熱之表面具有突起構造的模具而在薄膜形成貫穿孔。再者,作為 提高貫穿孔成形精密度的手段,於專利文獻3中,有人揭示一種方法,其係藉由將熔融的樹脂塗布於表面形成有突起之模具表面,之後,一面用加壓板加壓一面冷卻模具而製造具有貫穿孔的薄膜。 Further, Patent Document 1 and Patent Document 2 disclose a hot stamping technique in which a thermoplastic film is pressed against a heated surface having a protruding structure to form a through hole in the film. Again, as In the method of improving the precision of the through-hole forming, Patent Document 3 discloses a method of applying a molten resin to a surface of a mold on which a protrusion is formed, and then pressurizing the mold while pressing the pressure plate. A film having a through hole is produced.
[專利文獻1]日本特開2010-154852號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-154852
[專利文獻2]日本特開2013-30605號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2013-30605
[專利文獻3]日本特開2011-230396號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2011-230396
於射出成形中,薄膜之薄型化或貫穿孔之微細化為困難。又,由於必須具有對模具填充與取出樹脂的步驟,對輥對輥(roll-to-roll)狀態之薄膜的處理為不可能,而有生產性低的問題。又,於電子射線加工中,由於需要極多的加工時間而有生產性低、難以適用於量產之問題。又,於蝕刻中,有難以於深度方向形成均一的孔徑之問題。再者,於專利文獻1或專利文獻2所揭示的壓印技術中,在開口部邊緣面形成毛邊少的貫穿孔為困難。其理由可舉出:樹脂變形會受黏彈性特性所支配,不適合開孔之塑性變形。於利用專利文獻3所揭示的熔融轉印技術進行的製造方法中,由於必須具有對模具塗布樹脂、及加熱冷卻模具、取出製品的步驟,對輥對輥狀態之薄膜的處理為不可能,而有生產性低的問題。 In the injection molding, it is difficult to reduce the thickness of the film or to make the through holes fine. Further, since it is necessary to have a step of filling and removing the resin into the mold, it is impossible to handle the film in a roll-to-roll state, and there is a problem that productivity is low. Further, in the electron beam processing, since it requires a large amount of processing time, there is a problem that productivity is low and it is difficult to apply it to mass production. Further, in the etching, there is a problem that it is difficult to form a uniform aperture in the depth direction. Further, in the imprint technique disclosed in Patent Document 1 or Patent Document 2, it is difficult to form a through hole having few burrs on the edge surface of the opening. The reason for this is that the deformation of the resin is governed by the viscoelastic properties and is not suitable for plastic deformation of the opening. In the manufacturing method by the melt transfer technique disclosed in Patent Document 3, since it is necessary to have a step of applying a resin to the mold, and heating and cooling the mold and taking out the product, it is impossible to handle the film in the roll-to-roll state. There is a problem of low productivity.
為了解決上述課題,本發明提供一種熱塑性薄膜之製造方法。 In order to solve the above problems, the present invention provides a method of producing a thermoplastic film.
(1)一種熱塑性薄膜之製造方法,其特徵係藉由對於至少積層含有具有熔點Tm1之熱塑性樹脂P1的A層、與含有具有玻璃轉移溫度Tg2之熱塑性樹脂P2的B層之積層構造體,將表面具有突起構造之模具加熱直到Tm1以上且Tg2以上之溫度並按壓於該積層構造體之A層側,而在A層形成貫穿孔且在B層形成連通至該貫穿孔之凹部。 (1) A method for producing a thermoplastic film characterized by comprising a laminated structure comprising at least an A layer containing a thermoplastic resin P1 having a melting point Tm1 and a B layer containing a thermoplastic resin P2 having a glass transition temperature Tg2 The mold having the protrusion structure on the surface is heated up to a temperature of Tm1 or more and Tg2 or more and pressed against the A layer side of the laminated structure, and a through hole is formed in the A layer, and a concave portion communicating with the through hole is formed in the B layer.
(2)一種熱塑性薄膜之製造方法,其特徵係藉由對於至少積層含有具有熔點Tm1之熱塑性樹脂P1的A層、與含有具有玻璃轉移溫度Tg2之熱塑性樹脂P2的B層之積層構造體,將表面具有突起構造之模具加熱直到Tm1以上且Tg2以上之溫度並按壓於該積層構造體之A層側,而在A層形成貫穿孔且在B層形成連通至該貫穿孔的凹部,更進一步於其後,將該A層與該B層剝離,獲得含有該A層之具有貫穿孔的熱塑性薄膜。 (2) A method for producing a thermoplastic film characterized by comprising a laminated structure comprising at least an A layer containing a thermoplastic resin P1 having a melting point Tm1 and a B layer containing a thermoplastic resin P2 having a glass transition temperature Tg2 The mold having the protrusion structure on the surface is heated up to a temperature of Tm1 or more and Tg2 or higher and pressed against the layer A side of the layered structure, and a through hole is formed in the layer A, and a concave portion communicating with the through hole is formed in the layer B, and further Thereafter, the layer A and the layer B were peeled off to obtain a thermoplastic film having a through hole including the layer A.
(3)如(1)或(2)記載之熱塑性薄膜之製造方法,其中該熔點Tm1與該玻璃轉移溫度Tg2之差(Tm1-Tg2)為-30至60℃。 (3) The method for producing a thermoplastic film according to (1) or (2), wherein a difference (Tm1 - Tg2) between the melting point Tm1 and the glass transition temperature Tg2 is -30 to 60 °C.
(4)如(3)記載之熱塑性薄膜之製造方法,其中該熔點Tm1與該玻璃轉移溫度Tg2之差(Tm1-Tg2)為-10至0℃。 (4) The method for producing a thermoplastic film according to (3), wherein a difference (Tm1 - Tg2) between the melting point Tm1 and the glass transition temperature Tg2 is -10 to 0 °C.
(5)如(1)至(4)中任一項記載之熱塑性薄膜之製造方法,其中該熱塑性樹脂P1為聚乙烯或聚丙烯。 (5) The method for producing a thermoplastic film according to any one of (1) to (4) wherein the thermoplastic resin P1 is polyethylene or polypropylene.
(6)如(1)至(5)中任一項記載之熱塑性薄膜之製造方 法,其中該熱塑性樹脂P2為聚甲基丙烯酸甲酯或聚碳酸酯。 (6) The manufacturer of the thermoplastic film according to any one of (1) to (5) The method wherein the thermoplastic resin P2 is polymethyl methacrylate or polycarbonate.
(7)如(1)至(6)中任一項記載之熱塑性薄膜之製造方法,其中該貫穿孔之孔徑為1至100μm。 (7) The method for producing a thermoplastic film according to any one of (1) to (6) wherein the through hole has a pore diameter of from 1 to 100 μm.
(8)如(1)至(7)中任一項記載之熱塑性薄膜之製造方法,其中該A層之厚度為5至50μm。 (8) The method for producing a thermoplastic film according to any one of (1) to (7) wherein the layer A has a thickness of 5 to 50 μm.
(9)如(1)至(8)中任一項記載之熱塑性薄膜之製造方法,其中該突起構造為連結錐狀與圓柱狀而成之構造。 (9) The method for producing a thermoplastic film according to any one of (1) to (8), wherein the protrusion structure is a structure in which a tapered shape and a columnar shape are connected.
若根據本發明,則藉由對於至少積層含有具有熔點Tm1之熱塑性樹脂P1的A層、與含有具有玻璃轉移溫度Tg2之熱塑性樹脂P2的B層之積層構造體,將表面具有突起構造之模具加熱至Tm1以上且Tg2以上之溫度並按壓於該積層構造體之A層側,能在A層以所期望的位置與密度分布予以配置而形成具有所期望的形狀之貫穿孔。 According to the present invention, the mold having the protrusion structure on the surface is heated by the laminated structure of the layer A containing at least the thermoplastic resin P1 having the melting point Tm1 and the layer B containing the thermoplastic resin P2 having the glass transition temperature Tg2. The temperature of Tm1 or more and Tg2 or more is pressed against the layer A side of the laminated structure, and the A layer can be disposed at a desired position and density distribution to form a through hole having a desired shape.
10‧‧‧積層構造體 10‧‧‧Laminated structure
11‧‧‧A層 11‧‧‧A floor
12‧‧‧B層 12‧‧‧B layer
20‧‧‧模具 20‧‧‧Mold
21‧‧‧突起構造 21‧‧‧Protruding structures
50‧‧‧積層構造體 50‧‧‧Multilayer structure
50a‧‧‧A層 50a‧‧‧A floor
50b‧‧‧B層 50b‧‧‧B layer
51‧‧‧捲出輥 51‧‧‧Rolling roll
52‧‧‧捲出單元 52‧‧‧Withdraw unit
53‧‧‧模具 53‧‧‧Mold
54‧‧‧加壓單元 54‧‧‧ Pressurizing unit
55‧‧‧剝離手段 55‧‧‧Dissipation means
56‧‧‧薄膜剝離裝置 56‧‧‧film stripping device
57、58‧‧‧捲取輥 57, 58‧‧‧Winding rolls
59‧‧‧加壓板 59‧‧‧ Pressurized plate
60、61‧‧‧緩衝手段 60, 61‧‧‧ buffer means
62‧‧‧捲取單元 62‧‧‧Winding unit
70‧‧‧積層構造體 70‧‧‧Laminated structure
71‧‧‧A層 71‧‧‧A floor
72‧‧‧B層 72‧‧‧B layer
73、74‧‧‧捲出輥 73, 74‧‧‧ Roll out rolls
75‧‧‧積層裝置 75‧‧‧Laminated device
76‧‧‧加熱輥 76‧‧‧heating roller
77‧‧‧模具 77‧‧‧Mold
78‧‧‧夾持輥 78‧‧‧Clamping roller
79‧‧‧冷卻輥 79‧‧‧Cooling roller
80‧‧‧剝離輥 80‧‧‧ peeling roller
81‧‧‧薄膜剝離裝置 81‧‧‧film stripping device
82、83‧‧‧捲取輥 82, 83‧‧‧Winding rolls
第1圖(a)~(d)係顯示本發明之具有貫穿孔的熱塑性薄膜之製造方法之實施形態一例的流程圖。 Fig. 1 (a) to (d) are flowcharts showing an example of an embodiment of a method for producing a thermoplastic film having a through hole according to the present invention.
第2圖(a)~(e)係顯示本發明之具有貫穿孔的熱塑性薄膜之製造方法之實施形態一例的流程圖。 Fig. 2 (a) to (e) are flowcharts showing an example of an embodiment of a method for producing a thermoplastic film having a through hole according to the present invention.
第3圖係顯示適用於本發明之製造方法之模具一例的斜視圖。 Fig. 3 is a perspective view showing an example of a mold suitable for the production method of the present invention.
第4圖(a)、(b)係顯示適用於本發明之模具一例的剖面圖。 Fig. 4 (a) and (b) are cross-sectional views showing an example of a mold which is applied to the present invention.
第5圖係顯示實現本發明之具有貫穿孔的薄膜之製造方法之裝置一例的剖面概念圖。 Fig. 5 is a cross-sectional conceptual view showing an example of an apparatus for realizing a method for producing a film having a through hole of the present invention.
第6圖係顯示實現本發明之具有貫穿孔的薄膜之製造方法之裝置一例的剖面概念圖。 Fig. 6 is a cross-sectional conceptual view showing an example of an apparatus for realizing a method for producing a film having a through hole of the present invention.
第7圖係由實施例1記載之本發明之製造方法所製造的薄膜之利用掃描型電子顯微鏡所得之表面照片。 Fig. 7 is a surface photograph obtained by a scanning electron microscope of a film produced by the production method of the present invention described in Example 1.
第8圖係由實施例1記載之本發明之製造方法所製造的薄膜之利用掃描型電子顯微鏡所得之剖面照片。 Fig. 8 is a cross-sectional photograph obtained by a scanning electron microscope of a film produced by the production method of the present invention described in Example 1.
第9圖係由實施例2記載之本發明之製造方法所製造的薄膜之利用掃描型電子顯微鏡所得之表面照片。 Fig. 9 is a surface photograph obtained by a scanning electron microscope of a film produced by the production method of the present invention described in Example 2.
第10圖係由實施例2記載之本發明之製造方法所製造的薄膜之利用掃描型電子顯微鏡所得之剖面照片。 Fig. 10 is a cross-sectional photograph obtained by a scanning electron microscope of a film produced by the production method of the present invention described in Example 2.
第11圖係由比較例1記載之本發明之製造方法所製造的薄膜之利用掃描型電子顯微鏡所得之表面照片。 Fig. 11 is a surface photograph obtained by a scanning electron microscope of a film produced by the production method of the present invention described in Comparative Example 1.
第12圖係由比較例1記載之本發明之製造方法所製造的薄膜之利用掃描型電子顯微鏡所得之剖面照片。 Fig. 12 is a cross-sectional photograph obtained by a scanning electron microscope of a film produced by the production method of the present invention described in Comparative Example 1.
本發明係關於一種具有貫穿孔之熱塑性薄膜之製造方法。 The present invention relates to a method of making a thermoplastic film having a through-hole.
本發明之製造方法之一係一種熱塑性薄膜之製造方法,其特徵係藉由對於至少積層含有具有熔點Tm1之熱塑性樹脂P1的A層、與含有具有玻璃轉移溫度Tg2之熱塑性樹脂P2的B層之積層構造體,將表面具有突起構造之模具加熱直到Tm1以上且Tg2以上之溫度並按 壓於該積層構造體之A層側,而在A層形成貫穿孔且在B層形成連通至該貫穿孔之凹部。 One of the production methods of the present invention is a method for producing a thermoplastic film characterized by comprising an A layer containing at least a thermoplastic resin P1 having a melting point Tm1 and a B layer containing a thermoplastic resin P2 having a glass transition temperature Tg2. a laminated structure, which heats a mold having a protruding structure on the surface until a temperature of Tm1 or more and Tg2 or more and presses The layer is formed on the side of the layer A of the laminated structure, and a through hole is formed in the layer A, and a recess that communicates with the through hole is formed in the layer B.
又,本發明之另一製造方法係一種熱塑性薄膜之製造方法,其特徵係藉由對於至少積層含有具有熔點Tm1之熱塑性樹脂P1的A層、與含有具有玻璃轉移溫度Tg2之熱塑性樹脂P2的B層之積層構造體,將表面具有突起構造之模具加熱直到Tm1以上且Tg2以上之溫度並按壓於該積層構造體之A層側,而在A層形成貫穿孔且在B層形成連通至該貫穿孔的凹部,更進一步於其後,將該A層與該B層剝離,獲得含有該A層之具有貫穿孔的熱塑性薄膜。 Further, another manufacturing method of the present invention is a method for producing a thermoplastic film characterized by comprising an A layer containing at least a thermoplastic resin P1 having a melting point Tm1 and a B containing a thermoplastic resin P2 having a glass transition temperature Tg2. The laminated structure of the layer is heated to a temperature of Tm1 or more and a temperature of Tg2 or more and pressed against the layer A side of the laminated structure, and a through hole is formed in the layer A and is connected to the through layer in the layer B. Further, the concave portion of the hole is further peeled off from the layer A and the layer B, and a thermoplastic film having a through hole having the layer A is obtained.
以下,針對本發明之實施形態,參照圖示加以說明。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
第1圖、第2圖係顯示本發明之具有貫穿孔的熱塑性薄膜之製造方法之實施形態一例的流程圖。第3圖係顯示適用於本發明之製造方法之模具一例的斜視圖。 Fig. 1 and Fig. 2 are flowcharts showing an example of an embodiment of a method for producing a thermoplastic film having a through hole according to the present invention. Fig. 3 is a perspective view showing an example of a mold suitable for the production method of the present invention.
最初,如第1圖(a)所示,準備已積層A層11與B層12之積層構造體10、與在表面已配置獨立的突起構造於既定位置之模具20。A層11係含有熔點Tm1之熱塑性樹脂P1,B層係含有玻璃轉移溫度Tg2之熱塑性樹脂P2。 First, as shown in Fig. 1(a), the laminated structure 10 in which the A layer 11 and the B layer 12 have been laminated is prepared, and the mold 20 in which the projections are provided at the predetermined positions on the surface is prepared. The A layer 11 is a thermoplastic resin P1 having a melting point Tm1, and the B layer is a thermoplastic resin P2 containing a glass transition temperature Tg2.
於此,作為各層中所含之各熱塑性樹脂的比例,較佳為將層全體設為100質量%時,含有60質量%以上之該熱塑性樹脂。進一步而言,較佳為含有80質量%以上。又,於各層中,除了熱塑性樹脂P1或熱塑性樹脂 P2之外,亦可含有用以賦予成形性或脫模性之添加物或塗布成分。還有,雖然上限值並未被特別限制,但100質量%為實質之上限。 Here, the ratio of each of the thermoplastic resins contained in each layer is preferably 60% by mass or more of the thermoplastic resin when the entire layer is 100% by mass. Further, it is preferably contained in an amount of 80% by mass or more. Also, in each layer, except for the thermoplastic resin P1 or thermoplastic resin In addition to P2, an additive or a coating component for imparting formability or mold release property may be contained. Further, although the upper limit is not particularly limited, 100% by mass is a substantial upper limit.
又,A層與B層之界面較佳為可剝離,A層與B層之界面,較佳為利用由塗布等所形成的黏著劑之作用而予以積層。又,本實施形態雖係說明A層與B層之2層積層構造,惟亦可在包夾B層而與A層為相反側上設置另一層。A層表面之塗布,若採用與A層相同構成之材料,由於成形後之平面性會變高,故較佳。 Further, the interface between the layer A and the layer B is preferably peelable, and the interface between the layer A and the layer B is preferably laminated by the action of an adhesive formed by coating or the like. Further, in the present embodiment, a two-layer laminated structure of the A layer and the B layer is described. However, another layer may be provided on the side opposite to the A layer in the B layer. When the surface of the layer A is coated with the same material as the layer A, it is preferable because the planarity after molding becomes high.
所謂積層構造體係指已積層2層以上之含有不同成分之層的構造體。還有,積層構造體可為利用輥對輥所搬送的連續體薄膜,亦可為單片體薄片。 The laminated structure system refers to a structure in which two or more layers containing different compositions are laminated. Further, the laminated structure may be a continuous film which is conveyed by a roll to a roll, or may be a single piece.
所謂玻璃轉移溫度,係指利用依照JIS K 7244-4(1999)記載之方法,於測定試料動態振幅速度(驅動頻率)為1Hz、拉伸模式、夾頭間距離5mm、升溫速度2℃/分鐘下之溫度依存性(溫度分散)時,tanδ為極大時之溫度。 The glass transition temperature means that the sample has a dynamic amplitude velocity (driving frequency) of 1 Hz, a tensile mode, a cross-clamp distance of 5 mm, and a temperature increase rate of 2 ° C/min according to the method described in JIS K 7244-4 (1999). In the case of temperature dependence (temperature dispersion), tan δ is the temperature at which the temperature is extremely large.
又,於此所謂熔點,係指利用DSC(微差掃描熱量分析)所得之升溫過程(升溫速度:20℃/分鐘)下之熔點Tm,其係與上述同樣地利用根據JIS K 7121(1999)之方法,以升溫速度:20℃/分鐘從25℃加熱直至300℃(1st RUN),在該狀態下保持5分鐘,接著以使其成為25℃以下的方式急冷,再以20℃/分鐘之升溫速度進行從室溫升溫直至300℃,而將所得之2nd RUN的結晶溶解波峰之波峰頂端溫度設為該樹脂之熔點。 In addition, the melting point is a melting point Tm in a temperature rising process (temperature rising rate: 20 ° C /min) obtained by DSC (fine scanning calorimetry), and is used in the same manner as described above in accordance with JIS K 7121 (1999). The method is heated from 25 ° C to 300 ° C (1 s RUN) at a temperature increase rate of 20 ° C / min, kept in this state for 5 minutes, and then quenched so as to be 25 ° C or less, and then at 20 ° C / min. The temperature increase rate was raised from room temperature to 300 ° C, and the peak temperature of the peak of the crystal dissolution peak of the obtained 2nd RUN was set as the melting point of the resin.
本發明,係預先加熱表面具有突起構造21之模具20。加熱係以使模具成為Tm1以上且Tg2以上之溫度範圍的方式進行。亦可於使模具與積層構造體接觸之狀態下加熱。藉由預先接觸,能使積層構造體之平面性預先保持於良好之狀態。 The present invention preliminarily heats the mold 20 having the protrusion structure 21 on its surface. The heating is performed such that the mold has a temperature range of Tm1 or more and Tg2 or more. It is also possible to heat the mold in contact with the laminated structure. By the prior contact, the planarity of the laminated structure can be maintained in a good state in advance.
還有,雖然模具加熱溫度之上限值並未被限定,但較佳為熱塑性樹脂P1之熱分解溫度以下且熱塑性樹脂P2之熱分解溫度以下。 Further, although the upper limit of the mold heating temperature is not limited, it is preferably not more than the thermal decomposition temperature of the thermoplastic resin P1 and not more than the thermal decomposition temperature of the thermoplastic resin P2.
接著,如第1圖(b)所示,以使突起構造面接觸於加熱狀態下之積層構造體10之A層11的表面的方式,加壓並按壓模具20。若突起構造21具有適當之高度,則藉由加壓,突起構造21將穿透A層11而穿刺達到B層12。然後,如第1圖(c)所示,將使模具20與積層構造體10成為無間隙地連接之狀態。 Next, as shown in FIG. 1(b), the mold 20 is pressed and pressed so that the projection structure surface comes into contact with the surface of the A layer 11 of the laminated structure 10 in a heated state. If the protrusion structure 21 has an appropriate height, the protrusion structure 21 will penetrate the A layer 11 and penetrate into the B layer 12 by pressurization. Then, as shown in FIG. 1(c), the mold 20 and the laminated structure 10 are connected to each other without a gap.
此時之必要的壓力與加壓時間係視薄膜之材質、轉印形狀、尤其是凹凸之縱橫比而定,大致上加壓壓力之較佳的範圍為1至100MPa,成形時間之較佳的範圍為0.01至60秒鐘。 The necessary pressure and pressurization time at this time depends on the material of the film, the transfer shape, and particularly the aspect ratio of the unevenness, and the preferred range of the pressurization pressure is preferably from 1 to 100 MPa, and the molding time is preferred. The range is from 0.01 to 60 seconds.
加壓壓力之更佳的範圍為10至80MPa,進一步更佳的範圍為30至60MPa。又,成形時間之更佳的範圍為1至50秒鐘,進一步更佳的範圍為3至30秒鐘。 A more preferable range of the pressurizing pressure is 10 to 80 MPa, and a still more preferable range is 30 to 60 MPa. Further, the forming time is more preferably in the range of 1 to 50 seconds, and still more preferably in the range of 3 to 30 seconds.
又,亦可藉位置控制而將模具20按壓於積層構造體10。亦即,亦可使模具20移動至預先所設定的位置而按壓於積層構造體10。所謂預先所設定的位置,係指含有模具之突起構造的平面能無間隙地合接至A層之 表面的位置。 Further, the mold 20 can be pressed against the laminated structure 10 by position control. In other words, the mold 20 can be moved to the position set in advance and pressed against the laminated structure 10. The position set in advance means that the plane containing the protrusion structure of the mold can be joined to the A layer without any gap. The position of the surface.
還有,亦可於升壓後,在保持著模具位置的原樣下除壓,而保持模具20與積層構造體10之接觸狀態。 Further, after the pressure is raised, the pressure is removed as it is while maintaining the position of the mold, and the contact state between the mold 20 and the laminated structure 10 is maintained.
接著,如第1圖(c)所示,在保持著加壓之狀態或接觸之狀態的原樣下冷卻模具。冷卻較佳為進行至直到構成B層之熱塑性樹脂P2的玻璃轉移溫度Tg2以下。由於藉由冷卻直到Tg2以下,能抑制從積層構造體10剝離模具20後之樹脂變形,且能形成精確度高的貫穿孔,故較佳。 Next, as shown in Fig. 1(c), the mold is cooled as it is in a state of being pressurized or in contact with it. The cooling is preferably carried out up to the glass transition temperature Tg2 of the thermoplastic resin P2 constituting the layer B. By cooling until Tg2 or less, it is possible to suppress deformation of the resin after the mold 20 is peeled off from the laminated structure 10, and it is possible to form a through hole having high precision.
接著,如第1圖(d)所示,從模具20剝離積層構造體10。剝離係在相對於積層構造體表面的垂直方向,以使模具或積層構造體分開的方式使其移動。於積層構造體為連續體薄膜之情形下,較佳為設定成:朝相對於積層構造體表面的垂直方向連續施予張力,而以使線狀之剝離位置連續移動的方式予以剝離。亦可設定成:保持於該狀態,在即將使用具有貫穿孔的薄膜之前剝離B層。B層係具有作為覆膜之功能,若於即將使用之前剝離,則表面不易刮傷,又由於可於直到即將使用之前作為厚且剛性高的薄膜而操作,因而作業性良好,故較佳。 Next, as shown in FIG. 1(d), the laminated structure 10 is peeled off from the mold 20. The peeling is moved in a direction perpendicular to the surface of the laminated structure so that the mold or the laminated structure is separated. In the case where the laminated structure is a continuous film, it is preferable to continuously apply tension to the vertical direction of the surface of the laminated structure, and to peel off the linear peeling position. It may also be set such that it remains in this state, and the B layer is peeled off immediately before the film having the through holes is used. The B layer has a function as a film, and if it is peeled off immediately before use, the surface is less likely to be scratched, and since it can be handled as a film having a high thickness and rigidity until it is used immediately, workability is good, which is preferable.
又,第2圖係追加上述剝離步驟者。因第2圖(a)至(d)係同於第1圖(a)至(d),故省略說明。第2圖(e),係從B層12剝離A層11。從抑制剝離痕跡之觀點,剝離較佳為設定成:朝相對於A層或B層之表面的垂直方向對A層或B層施予張力,而以使線狀之剝離位置連續移動的方 式予以剝離。 Moreover, the figure 2 adds the said peeling process. Since FIGS. 2(a) to (d) are the same as FIGS. 1(a) to (d), description thereof will be omitted. In Fig. 2(e), the A layer 11 is peeled off from the B layer 12. From the viewpoint of suppressing the peeling marks, it is preferable to set the peeling to the A layer or the B layer in the vertical direction with respect to the surface of the A layer or the B layer, and to continuously move the linear peeling position. Stripped.
藉由實施利用第1圖或第2圖所說明的上述步驟,使A層11成為具有經高精密度控制形狀之貫穿孔的薄膜。因為依照上述之製造方法,A層於成型時為熔融狀態,故壓合突起構造時之A層會以接近黏性材料之行徑引起塑性變形,在開口部邊緣面形成毛邊少的貫穿孔。另外,更進一步壓入突起圖案(突起構造)時,因為B層會引起黏彈性變形,突起構造能平順地進入B層內部,故即使在A層與B層之界面也能形成毛邊少的乾淨邊緣面。 By performing the above-described steps described in FIG. 1 or FIG. 2, the A layer 11 is formed into a film having a through hole having a high-precision controlled shape. According to the manufacturing method described above, the layer A is in a molten state at the time of molding, so that the layer A in the structure of the pressed protrusion is plastically deformed in a manner close to the path of the viscous material, and a through hole having few burrs is formed on the edge surface of the opening. Further, when the projection pattern (protrusion structure) is further pressed, since the B layer causes viscoelastic deformation, the projection structure can smoothly enter the inside of the B layer, so that even at the interface between the A layer and the B layer, a small amount of clean edges can be formed. Edge face.
又,於本發明中,A層11中所含之熱塑性樹脂P1的熔點Tm1與B層中所含之熱塑性樹脂P2的玻璃轉移溫度Tg2之差Tm1-Tg2較佳為-30至60℃。低於-30℃時,由於B層之變形需要大的力量,故於貫穿孔形成時,有妨礙突起構造平順地進入B層之情形。若變得較60℃高,則有B層之彈性降低之情形,而有A層與B層之界面的平面性降低之情形。 Further, in the present invention, the difference Tm1 - Tg2 between the melting point Tm1 of the thermoplastic resin P1 contained in the A layer 11 and the glass transition temperature Tg2 of the thermoplastic resin P2 contained in the layer B is preferably -30 to 60 °C. When the temperature is lower than -30 ° C, since the deformation of the layer B requires a large force, when the through hole is formed, there is a case where the protrusion structure is prevented from smoothly entering the layer B. If it is higher than 60 ° C, the elasticity of the B layer is lowered, and the flatness of the interface between the A layer and the B layer is lowered.
於本發明中,Tm1-Tg2為5至60℃也為較佳的形態之一。亦即,作為A層11中所含之熱塑性樹脂P1的材質,其熔點Tm較佳為較B層中所含之熱塑性樹脂P2的玻璃轉移溫度Tg2更高5至60℃。更佳為20至50℃,進一步更佳為30至40℃。低於5℃時,由於B層之變形需要大的力量,故於貫穿孔形成時,有妨礙突起構造平順地進入B層之情形。若變得較60℃高,則有B層之彈性降低之情形,而有A層及B層之平面性降低之情形。 In the present invention, Tm1-Tg2 of 5 to 60 ° C is also one of preferable forms. In other words, as the material of the thermoplastic resin P1 contained in the A layer 11, the melting point Tm is preferably 5 to 60 ° C higher than the glass transition temperature Tg2 of the thermoplastic resin P2 contained in the layer B. More preferably, it is 20 to 50 ° C, and still more preferably 30 to 40 ° C. When the thickness is lower than 5 ° C, since the deformation of the layer B requires a large force, when the through hole is formed, there is a case where the protrusion structure is prevented from smoothly entering the layer B. If it is higher than 60 ° C, the elasticity of the B layer is lowered, and the planarity of the A layer and the B layer is lowered.
又,從在A層與B層之邊界面的A層開口部最 大限度地抑制毛邊且高精確度地成形之觀點,熔點Tm1與玻璃轉移溫度Tg2之差(Tm1-Tg2)較佳為-10至0℃。低於-10℃時,有開口之尺寸精確度降低之情形。若變得較0℃高,有在邊緣面之毛邊產生之情形。 Moreover, the opening of the A layer from the boundary surface between the A layer and the B layer is the most From the viewpoint of suppressing burrs to a large extent and forming with high precision, the difference (Tm1 - Tg2) between the melting point Tm1 and the glass transition temperature Tg2 is preferably -10 to 0 °C. Below -10 ° C, there is a case where the dimensional accuracy of the opening is lowered. If it becomes higher than 0 ° C, there is a case where the burrs on the edge faces are generated.
亦即,在兼具A層與B層之界面的良好平面性、與開口部之毛邊經抑制的高精密度貫穿孔成形上,於成形時B層係一定範圍之硬度較佳。又,藉由成形時之模具溫度的B層中所含之樹脂的儲存彈性係數為0.005至0.5GPa,進一步更佳為0.01至0.1GPa之範圍,能更提高A層與B層之界面的平面性、與在貫穿孔成形時之開口部的毛邊的抑制。低於0.005GPa時,有A層與B層之界面的平面性降低且A層中未形成貫穿孔,或毛邊變得容易發生於貫穿孔的開口部之情形。另一方面,若超過0.5GPa,則有在B層變得難以變形,模具之突起構造無法插入直到深部,既定的形狀精確度的貫穿孔成形變得困難之情形。 In other words, in the high-precision through-hole forming in which the interface between the A layer and the B layer is good, and the high-precision through-hole forming in which the burrs of the opening are suppressed, the hardness of the B layer in a certain range is preferable at the time of molding. Further, the storage elastic modulus of the resin contained in the layer B by the mold temperature at the time of molding is 0.005 to 0.5 GPa, and more preferably in the range of 0.01 to 0.1 GPa, and the plane of the interface between the layer A and the layer B can be further improved. Sexuality and suppression of the burrs of the openings at the time of forming the through holes. When the thickness is less than 0.005 GPa, the planarity of the interface between the layer A and the layer B is lowered, and the through hole is not formed in the layer A, or the burr is likely to occur in the opening of the through hole. On the other hand, when it exceeds 0.5 GPa, the B layer becomes difficult to be deformed, and the protruding structure of the mold cannot be inserted into the deep portion, and the formation of the through hole having a predetermined shape accuracy becomes difficult.
作為構成A層11之熱塑性樹脂的主要成分,具體而言較佳為聚乙烯、聚苯乙烯、聚丙烯、聚異丁烯、聚丁烯、聚甲基戊烯等之聚烯烴系樹脂,因為為模具脫模性良好而被較佳使用。還有,所謂主要成分係指將構成A層之樹脂全體設為100質量%時,佔有50質量%以上之成分。還有,主要成分較佳為50質量%以上,更佳為80質量%以上。還有,雖然上限值並未被特別限定,但100質量%為實質之上限。 The main component of the thermoplastic resin constituting the A layer 11 is specifically a polyolefin resin such as polyethylene, polystyrene, polypropylene, polyisobutylene, polybutene or polymethylpentene because it is a mold. It has a good mold release property and is preferably used. In addition, the main component is a component which occupies 50% by mass or more when the entire resin constituting the layer A is 100% by mass. Further, the main component is preferably 50% by mass or more, and more preferably 80% by mass or more. Further, although the upper limit is not particularly limited, 100% by mass is a substantial upper limit.
於本發明中,熱塑性樹脂P1較佳為聚乙烯或聚丙烯。由於藉由使用聚乙烯或聚丙烯,能在相較低的 溫度下形成貫穿孔,故容易提高生產性。 In the present invention, the thermoplastic resin P1 is preferably polyethylene or polypropylene. Because it can be in the lower phase by using polyethylene or polypropylene The through hole is formed at a temperature, so that productivity is easily improved.
作為構成B層12之熱塑性樹脂的主要成分,具體而言較佳為,聚對苯二甲酸乙二酯、聚-2,6-萘二甲酸乙二酯、聚對苯二甲酸丙二酯、聚對苯二甲酸丁二酯等之聚酯系樹脂;聚乙烯、聚苯乙烯、聚丙烯、聚異丁烯、聚丁烯、聚甲基戊烯等之聚烯烴系樹脂;聚醯胺系樹脂、聚醯亞胺系樹脂、聚醚系樹脂、聚酯醯胺系樹脂、聚醚酯系樹脂、丙烯酸系樹脂、聚胺甲酸酯系樹脂、聚碳酸酯系樹脂、或聚氯乙烯系樹脂等係被較佳使用。特佳為聚甲基丙烯酸甲酯。還有,所謂主要成分係指將構成B層之樹脂全體設為100質量%時,佔有50質量%以上之成分。還有,主要成分較佳為50質量%以上,更佳為80質量%以上。 As a main component of the thermoplastic resin constituting the B layer 12, specifically, polyethylene terephthalate, polyethylene-2,6-naphthalate, polytrimethylene terephthalate, a polyester resin such as polybutylene terephthalate; a polyolefin resin such as polyethylene, polystyrene, polypropylene, polyisobutylene, polybutene or polymethylpentene; a polyamide resin; Polyimide resin, polyether resin, polyester amide resin, polyether ester resin, acrylic resin, polyurethane resin, polycarbonate resin, or polyvinyl chloride resin It is preferably used. Particularly preferred is polymethyl methacrylate. In addition, the main component is a component which occupies 50% by mass or more when the entire resin constituting the B layer is 100% by mass. Further, the main component is preferably 50% by mass or more, and more preferably 80% by mass or more.
於本發明中,熱塑性樹脂P2較佳為聚甲基丙烯酸甲酯或聚碳酸酯。特佳為聚甲基丙烯酸甲酯。藉由使用聚甲基丙烯酸甲酯或聚碳酸酯,能精確度佳地成形連通至貫穿孔之凹部。 In the present invention, the thermoplastic resin P2 is preferably polymethyl methacrylate or polycarbonate. Particularly preferred is polymethyl methacrylate. By using polymethyl methacrylate or polycarbonate, the concave portion communicating with the through hole can be formed accurately.
A層或B層可為上述樹脂單質構成之層,亦可為複數樹脂層構成之積層體。此情形,與單質之層比較起來,更能夠賦予脫模性或耐摩擦性等之表面特性等。如此,即使在作成複數樹脂層構成之積層體之情形,於A層及B層之各層中,亦只要主要的熱塑性樹脂成分符合上述要件即可。 The layer A or the layer B may be a layer composed of the above-mentioned resin simple substance, or may be a laminate body composed of a plurality of resin layers. In this case, it is possible to impart surface properties such as mold release property and abrasion resistance, etc., in comparison with the elemental layer. In this case, even in the case of forming a laminated body composed of a plurality of resin layers, the main thermoplastic resin components in the respective layers of the A layer and the B layer may satisfy the above requirements.
又,作為A層及B層之製造方法,適合為藉由熔融擠出熱塑性樹脂而製膜。將脫膜層或黏著層等設置 於表層之情形,只要是利用共擠出而加工成薄膜狀之方法即可,惟亦可於製膜後藉由塗布而設置。又,亦可採用將表層原料擠出並積層於製膜成單膜的薄膜之方法。又,A層與B層之積層,除了利用輥夾壓而積層的方法之外,也能採用藉由加熱的輥等而熱積層的方法等。 Moreover, as a manufacturing method of the A layer and the B layer, it is suitable to form a film by melt-extruding a thermoplastic resin. Set the release layer or adhesive layer In the case of the surface layer, it may be a method of processing into a film shape by co-extrusion, but it may be provided by coating after film formation. Further, a method of extruding a surface layer raw material and laminating a film formed into a single film may also be employed. Further, the laminate of the A layer and the B layer may be a method of laminating by a roll or the like, or a method of thermally laminating by a heated roller or the like.
還有,在適用於本發明之薄膜之中,能於聚合時或聚合後,添加各種添加劑。作為能添加摻合的添加劑之例子,例如,可舉出有機微粒、無機微粒、分散劑、染料、螢光增白劑、抗氧化劑、耐候劑、抗靜電劑、脫膜劑、增黏劑、塑化劑、pH調整劑及鹽等。尤其,較佳進行於聚合時少量添加長鏈羧酸、或長鏈羧酸鹽等之低表面張力的羧酸或其衍生物、及長鏈醇或其衍生物、修飾矽油等之低表面張力的醇化合物等作為脫膜劑。 Further, among the films which are suitable for use in the present invention, various additives can be added during or after the polymerization. Examples of the additive to which the blending can be added include, for example, organic fine particles, inorganic fine particles, a dispersing agent, a dye, a fluorescent whitening agent, an antioxidant, a weathering agent, an antistatic agent, a release agent, a tackifier, Plasticizers, pH adjusters and salts. In particular, it is preferred to carry out a low surface tension of a carboxylic acid or a derivative thereof having a low surface tension such as a long-chain carboxylic acid or a long-chain carboxylate, a long-chain alcohol or a derivative thereof, and a modified eucalyptus oil in a small amount during polymerization. An alcohol compound or the like is used as a release agent.
又,作為於本發明所適用的A層之較佳的厚度(膜厚)較佳為5至50μm之範圍內,更佳為10至40μm,進一步更佳為10至30μm。低於5μm時,有操作困難之情形。又,在較50μm大之情形,有於貫穿孔形成時,模具之尖端溫度變得容易改變,且於貫穿時在邊緣面變得容易產生毛邊之情形。 Further, a preferred thickness (film thickness) of the layer A to which the present invention is applied is preferably in the range of 5 to 50 μm, more preferably 10 to 40 μm, still more preferably 10 to 30 μm. When it is less than 5 μm, there is a case where it is difficult to operate. Moreover, in the case where it is larger than 50 μm, the tip temperature of the mold is easily changed when the through hole is formed, and the burr is likely to be generated on the edge surface at the time of penetration.
又,貫穿孔之孔徑較佳為1至100μm。更佳為20至80μm,特佳為30至50μm。於此,所謂孔徑係在A層之B層側表面所形成的開口部之孔徑。若為圓則為直徑,非為圓之情形,則為在將開口部替換成等面積之圓時的直徑。孔徑低於1μm時,有精密度上為困難之情形;又,在較100μm大之情形,形成貫穿孔時需要大的加壓力 ,而有使裝置大型化之情形。還有,在較100μm大之情形,大多係適用打穿等之機械性加工。 Further, the diameter of the through hole is preferably from 1 to 100 μm. More preferably, it is 20 to 80 μm, and particularly preferably 30 to 50 μm. Here, the aperture is a hole diameter of an opening formed on the side surface of the layer B of the layer A. If it is a circle, it is a diameter, and if it is a circle, it is a diameter when the opening is replaced with a circle of an equal area. When the pore diameter is less than 1 μm, there is a case where the precision is difficult; and in the case of being larger than 100 μm, a large pressing force is required to form the through hole. There is a situation in which the device is enlarged. Further, in the case of being larger than 100 μm, mechanical processing such as punching is often applied.
接著,針對模具形狀,利用第3圖、第4圖加以說明。第3圖係適用於本發明之模具一例的斜視圖,第4圖(a)、(b)係適用於本發明之模具一例的剖面圖。 Next, the shape of the mold will be described with reference to FIGS. 3 and 4 . Fig. 3 is a perspective view showing an example of a mold to which the present invention is applied, and Fig. 4 (a) and (b) are cross-sectional views showing an example of a mold to which the present invention is applied.
在模具20之外表面,已配置突起構造21於既定位置。所謂突起構造係指在模具上所設置的凸部構造,突起構造亦可於模具上僅設置同一形狀,亦可設置複數之不同形狀。 At the outer surface of the mold 20, the projection structure 21 is disposed at a predetermined position. The term "protrusion structure" refers to a structure of a protrusion provided on a mold, and the protrusion structure may be provided with only the same shape on the mold, or a plurality of different shapes may be provided.
突起構造之配置或密度較佳設為相同於作成製品規格所要求的貫穿孔之配置或密度。一般而言,為100nm至1mm之間距。還有,所謂間距係指突起構造之重複間隔。 The arrangement or density of the projection structures is preferably set to be the same as the arrangement or density of the through holes required to make the article specifications. In general, it is between 100 nm and 1 mm. Also, the term "pitch" refers to the repeating interval of the protrusion structure.
模具之材質較佳為強度與導熱係數高的金屬,例如,較佳為鎳或鋼、不鏽鋼、銅等。又,為了使外表面之加工性提高,亦可使用已實施鍍敷者。 The material of the mold is preferably a metal having a high strength and thermal conductivity. For example, nickel or steel, stainless steel, copper or the like is preferable. Further, in order to improve the workability of the outer surface, it is also possible to use a plated person.
突起構造之高度或剖面形狀係根據所要求的貫穿孔之形狀或薄膜之厚度所決定。突起構造之高度,較佳為可穿出A層11厚度之長度。亦即,於成形時,在模具20緊貼於積層構造體10時,可穿出A層11之高度。 The height or profile of the raised structure is determined by the shape of the desired through hole or the thickness of the film. The height of the projection structure is preferably a length that can penetrate the thickness of the A layer 11. That is, at the time of molding, when the mold 20 is in close contact with the laminated structure 10, the height of the A layer 11 can be penetrated.
利用第4圖(a)、(b)說明具體之形狀例。於第4圖(a)中所示之突起構造係使圓錐與圓柱連結而成之突起構造。在第4圖(b)所示之突起構造僅為圓錐之突起構造。不論為其中任一種形狀,較佳為尖端係較平坦更尖。突起構造特佳為錐狀與圓柱狀之連結構造。其原因為 ,藉由尖端為錐狀,可於成形開始時提高對積層構造體所施加的壓力以使變得容易變形。又,藉由從中途起變成圓柱狀,能形成尺寸精密度高、孔徑一定之貫穿孔。還有,除了上述所舉出的形狀之外,亦可為組合角錐型與四角柱而成之構成等。 A specific shape example will be described using Figs. 4(a) and 4(b). The protruding structure shown in Fig. 4(a) is a protruding structure in which a cone and a cylinder are joined together. The projection structure shown in Fig. 4(b) is only a conical projection structure. Regardless of any of the shapes, it is preferred that the tip end be flatter and sharper. The protruding structure is particularly preferably a tapered and cylindrical connecting structure. The reason is By the taper shape of the tip, the pressure applied to the laminated structure can be increased at the start of forming to make it easy to deform. Further, by forming a column shape from the middle, it is possible to form a through hole having a high dimensional precision and a constant hole diameter. Further, in addition to the above-described shapes, a configuration in which a pyramid shape and a quadrangular prism are combined may be employed.
表面具有突起構造的各模具之作成方法,可舉出在金屬表面實施直接切削或雷射加工或電子射線加工之方法、對金屬表面所形成的鍍敷皮膜實施直接切削或雷射加工或電子射線加工之方法、實施電鑄造於該等之方法等。又,可舉出將電阻塗布於基板上後,藉由光刻手法而以既定之圖案而形成光阻後,蝕刻處理基板而形成凹部,於光阻去除後,利用電鑄造而獲得其反轉圖案之方法等。藉由採用各向異性蝕刻,能獲得錐狀之圖案。除了金屬板之外,也能採用矽基板等作為基板。 A method for forming each mold having a protruding structure on the surface may be a method of performing direct cutting or laser processing or electron beam processing on a metal surface, or performing direct cutting or laser processing or electron beam on a plating film formed on a metal surface. A method of processing, a method of performing electroforming, and the like. Further, after applying a resistor to a substrate, a photoresist is formed in a predetermined pattern by a photolithography method, and then the substrate is etched to form a concave portion, and after the photoresist is removed, the reverse is obtained by electroforming. The method of the pattern, etc. By using anisotropic etching, a tapered pattern can be obtained. In addition to the metal plate, a tantalum substrate or the like can be used as the substrate.
所謂貫穿孔,係指從層之一側面穿出至另一側的空間。又,所謂連通至貫穿孔之凹部,係指藉由突起構造而連結於A層中所形成的貫穿孔之B層的凹部。 The through hole refers to a space that passes from one side of the layer to the other side. Further, the recessed portion that communicates with the through hole refers to a recessed portion that is connected to the B layer of the through hole formed in the A layer by the protruding structure.
本發明之具有貫穿孔的薄膜係藉由透過第5圖、第6圖所示之裝置的製程而能製造。第5圖、第6圖係顯示製造裝置的剖面概略圖,其係用以藉由在A層與B層之積層所構成之薄膜狀積層構造體之A層形成貫穿孔,再進一步將A層與B層剝離而製造A層所構成之具有貫穿孔的薄膜。 The film having the through holes of the present invention can be produced by the process of passing through the apparatus shown in Figs. 5 and 6. Fig. 5 and Fig. 6 are schematic cross-sectional views showing a manufacturing apparatus for forming a through hole by a layer A of a film-like laminated structure composed of a laminate of an A layer and a B layer, and further a layer A. A film having a through hole formed of the layer A was produced by peeling off from the layer B.
顯示於第5圖之例子,係將從捲出輥51抽出已預先積層A層構成之薄膜與B層構成之薄膜而成的積層 構造體50之捲出單元52、與表面形成有突起構造且被加熱的模具53,按壓在間斷傳送來的積層構造體50而加壓,之後,藉由在保持著接觸狀態的原樣下冷卻,而在積層構造體50之A層50a形成既定之貫穿孔。同時,也在B層形成藉由突起構造而連通至貫穿孔之凹部。 In the example shown in Fig. 5, a laminate of a film composed of a layer A and a film formed of a layer B is taken out from the take-up roll 51. The unwinding unit 52 of the structure 50 and the mold 53 having a projection structure and having a surface formed thereon are pressed by the intermittently transported laminated structure 50, and then cooled by being held in contact with each other. On the other hand, the A layer 50a of the laminated structure 50 forms a predetermined through hole. At the same time, a recess that communicates to the through hole by the protrusion structure is also formed in the B layer.
經由:形成既定貫穿孔的加壓轉印步驟用之加壓單元54、從模具53剝離在加壓轉印步驟已貼附於模具53的積層構造體50之剝離手段55、與將A層50a構成之薄膜與B層50b構成之薄膜剝離之薄膜剝離裝置56,而使各薄膜被捲取至各捲取輥57、58。剝離手段55係由將積層構造體50以呈S字狀環抱的方式把持的一對平行配置輥所構成。在加壓單元54內藉由模具53使間斷所傳送來的積層構造體50之一面進行熱成形,於熱成形後,藉由使上述剝離手段55向上游側移動,使貼附於模具53之積層構造體50從模具53依序被剝離。 The peeling means 55 for the pressure transfer step for forming a predetermined through hole, the peeling means 55 for peeling the laminated structure 50 attached to the mold 53 in the press transfer step from the mold 53, and the A layer 50a The film and the film peeling device 56 which are formed by the film of the B layer 50b are formed, and the respective films are taken up to the respective take-up rolls 57 and 58. The peeling means 55 is constituted by a pair of parallel arrangement rolls that are sandwiched by the laminated structure 50 in an S-shape. In the pressurizing unit 54, one surface of the laminated structure 50 conveyed intermittently by the mold 53 is thermoformed, and after the hot forming, the peeling means 55 is moved to the upstream side to be attached to the mold 53. The laminated structure 50 is sequentially peeled off from the mold 53.
於第5圖中,59係表示加壓板、60、61係表示用以使在積層構造體50之模具53部分之間斷搬送得以順利進行所設置的緩衝手段。經過如此之程序,能以高生產性間斷式地進行對A層的貫穿孔形成與對B層的凹部形成(熱成形)。 In Fig. 5, reference numeral 59 denotes a pressure plate, and 60 and 61 denote buffer means for smoothly conveying the mold 53 portion of the laminated structure 50. Through such a procedure, the formation of the through hole of the A layer and the formation of the concave portion of the B layer (thermoforming) can be performed intermittently with high productivity.
顯示於第6圖之例子,係從各捲出輥73、74抽出構成A層71與B層72之薄膜,並藉由積層裝置75而形成積層構造體70。之後,積層構造體70係藉由加熱輥76而被供給至已加熱的表面形成有突起構造之環狀皮帶的模具77上。 In the example shown in Fig. 6, the film constituting the A layer 71 and the B layer 72 is taken out from the respective take-up rolls 73 and 74, and the laminated structure 70 is formed by the layering device 75. Thereafter, the laminated structure 70 is supplied to the mold 77 of the endless belt in which the heated surface is formed by the heating roller 76.
模具77之外表面形成有突起構造,於即將與積層構造體70接觸之前,藉由加熱輥76而予以加熱。被連續供給的積層構造體70係藉由夾持輥78而被按壓在模具77之加工有突起構造之表面,使貫穿孔形成於積層構造體之A層71中。同時,B層72中形成有連通至貫穿孔之凹部。 The outer surface of the mold 77 is formed with a protruding structure, and is heated by the heating roller 76 immediately before coming into contact with the laminated structure 70. The laminated structure 70 that is continuously supplied is pressed against the surface of the mold 77 on which the projection structure is formed by the nip roller 78, and the through hole is formed in the A layer 71 of the laminated structure. At the same time, a recess that communicates with the through hole is formed in the B layer 72.
之後,積層構造體70係在與模具77之表面緊貼的狀態下被搬送至冷卻輥79之外表面位置。積層構造體70係藉由冷卻輥79而利用隔著模具77熱傳導而予以冷卻後,藉由剝離輥80而從模具77予以剝離,並經由剝離成A層構成之薄膜與B層構成之薄膜的薄膜剝離裝置81,使各薄膜被捲取輥82、83捲取。經過如此之程序,能以高生產性使形成有貫穿孔之A層構成的薄膜連續式地進行熱成形。 After that, the laminated structure 70 is conveyed to the outer surface position of the cooling roll 79 in a state in which it is in close contact with the surface of the mold 77. The laminated structure 70 is cooled by heat conduction through the mold 77 by the cooling roll 79, and then peeled off from the mold 77 by the peeling roller 80, and is formed into a film composed of a film of the A layer and a film of the B layer. The film peeling device 81 winds each film by the take-up rolls 82 and 83. Through such a procedure, the film formed of the A layer having the through holes can be continuously thermoformed with high productivity.
以上之熱塑性樹脂薄膜之製造方法,能自由設計微米尺寸至奈米尺寸之微細孔徑的形狀,更進一步能廉價且生產性佳地製造熱塑性樹脂薄膜。由於藉由本發明之製造方法所得之熱塑性樹脂薄膜係均一地形成微米尺寸至奈米尺寸之微細孔徑,因此適用於需要通孔的過濾、細胞培養、細胞分離、透氣、透濕等。 In the above method for producing a thermoplastic resin film, a micron-sized to nano-sized pore diameter can be freely designed, and a thermoplastic resin film can be produced at a low cost and with good productivity. Since the thermoplastic resin film obtained by the production method of the present invention uniformly forms micropores having a micron size to a nanometer size, it is suitable for filtration, cell culture, cell separation, gas permeability, moisture permeability, and the like which require through holes.
(1)積層構造 (1) Laminated structure
使用A層中含有以聚丙烯作為主體之聚合物(熔點為 144℃)的厚度30μm之薄膜、B層中含有以聚甲基丙烯酸甲酯(PMMA)作為主體之聚合物(玻璃轉移溫度為105℃)的厚度175μm之薄膜。還有,於A層之一側表層係具有以低密度聚乙烯作為主體的厚度6μm之黏著層。以使A層之黏著層貼合於B層表面的方式積層而構成積層構造體。 Use a layer A containing a polymer based on polypropylene (melting point is A film having a thickness of 30 μm at 144 ° C) and a film having a thickness of 175 μm containing a polymer of polymethyl methacrylate (PMMA) as a main component (glass transition temperature: 105 ° C) were contained in the layer B. Further, the side surface layer of one of the A layers has an adhesive layer having a thickness of 6 μm mainly composed of low-density polyethylene. The laminated structure is formed by laminating the adhesive layer of the A layer so as to adhere to the surface of the B layer.
(2)模具 (2) mold
使用整面配置有三角錐突起構造之模具。三角錐係底面之一邊為230μm的正三角形、高度為70μm,整面無間隙地被配置。經突起構造所加工的區域為200mm(薄膜寬度方向)×400mm(薄膜搬送方向)的區域。模具之材質係對於以厚度20mm之銅作為母材而在表面實施鍍鎳膜者,藉機械加工而在鍍敷膜形成三角錐圖案。 A mold having a triangular pyramidal projection configuration on the entire surface is used. One side of the bottom surface of the triangular pyramid system was an equilateral triangle of 230 μm, and the height was 70 μm, and the entire surface was arranged without a gap. The area processed by the protrusion structure is a region of 200 mm (film width direction) × 400 mm (film conveyance direction). The material of the mold is a method in which a nickel-plated film is formed on the surface of copper having a thickness of 20 mm as a base material, and a triangular pyramid pattern is formed on the plating film by mechanical processing.
(3)成形裝置及條件 (3) Forming equipment and conditions
裝置係採用如第5圖所示之裝置。加壓單元係利用油壓泵加壓的機構,於內部裝設有上下2片之加壓板,分別連結至加熱裝置、冷卻裝置。模具係設置於下側之加壓板的上面上。又,用以剝離已貼附於模具之薄膜的剝離手段係設置於加壓單元內。 The apparatus is a device as shown in Fig. 5. The pressurizing unit is provided with a pressurizing plate that is pressurized by a hydraulic pump, and is internally provided with two upper and lower pressure plates, and is connected to a heating device and a cooling device, respectively. The mold is placed on the upper surface of the lower pressure plate. Further, a peeling means for peeling off the film attached to the mold is provided in the pressurizing unit.
成形時之模具溫度係設為150℃,加壓力係以在整面施加5MPa之壓力的方式進行。加壓時間係30秒鐘。又,剝離時之模具溫度為80℃。藉由從模具剝離薄膜,獲得具有A層與B層之熱塑性薄膜,其係在A層具有貫穿孔、在B層具有連通至該貫穿孔之凹部的熱塑性薄膜。 The mold temperature at the time of molding was 150 ° C, and the pressure was applied so as to apply a pressure of 5 MPa over the entire surface. The pressurization time is 30 seconds. Further, the mold temperature at the time of peeling was 80 °C. By peeling the film from the mold, a thermoplastic film having a layer A and a layer B having a through-hole and a thermoplastic film having a concave portion communicating with the through-hole in the layer B is obtained.
將如此之熱塑性薄膜(從模具剝離的薄膜)接著連續送出至下游側之捲取裝置側,將A層與B層剝離, 並各自捲取。藉此,獲得含有具有貫穿孔之A層的熱塑性薄膜。 The thermoplastic film (the film peeled from the mold) is continuously fed to the side of the winding device on the downstream side, and the layer A and the layer B are peeled off. And each is taken. Thereby, a thermoplastic film containing the A layer having the through holes was obtained.
(4)成形結果 (4) Forming results
將成形的薄膜(A層)利用掃描型電子顯微鏡(Keyence(股)VE-7800)所拍攝之照片顯示於第7圖、第8圖。第7圖係從模具接觸面觀察A層之照片,第8圖係觀察A層剖面之照片。按照設計,均一地形成具有一邊為45μm之三角形開口部的貫穿孔。若將開口部之三角形形狀替換成等面積之圓,則孔徑相當於形成33μm。又,在B層構成之薄膜係均一地形成有連通至對應於三角錐突起形狀之貫穿孔的凹部。 A photograph of the formed film (layer A) taken by a scanning electron microscope (Keyence VE-7800) is shown in Figs. 7 and 8. Fig. 7 is a photograph of the A layer viewed from the contact surface of the mold, and Fig. 8 is a photograph of the cross section of the A layer. According to the design, a through hole having a triangular opening portion having a side of 45 μm was uniformly formed. When the triangular shape of the opening is replaced by a circle of equal area, the aperture corresponds to formation of 33 μm. Further, the film formed in the B layer is uniformly formed with a concave portion that communicates with a through hole corresponding to the shape of the triangular pyramid protrusion.
(1)積層構造 (1) Laminated structure
使用A層中含有以聚丙烯作為主體之聚合物(熔點為144℃)的厚度30μm之薄膜、B層中含有以聚碳酸酯(PC)作為主體之聚合物(玻璃轉移溫度為146℃)的厚度180μm之薄膜。還有,於A層之一側表層係具有以低密度聚乙烯作為主體的厚度6μm之黏著層。以使A層之黏著層貼合於B層表面的方式積層而構成積層構造體。 A film having a thickness of 30 μm containing a polymer mainly composed of polypropylene (melting point: 144 ° C) in the layer A, and a polymer having a polycarbonate (PC) as a main component (glass transition temperature: 146 ° C) was used in the layer B. A film having a thickness of 180 μm. Further, the side surface layer of one of the A layers has an adhesive layer having a thickness of 6 μm mainly composed of low-density polyethylene. The laminated structure is formed by laminating the adhesive layer of the A layer so as to adhere to the surface of the B layer.
(2)模具 (2) mold
使用整面配置有三角錐突起構造之模具。三角錐係底面之一邊為230μm的正三角形、高度為70μm,整面無間隙地被配置。經突起構造所加工的區域為200mm(薄膜寬度方向)×400mm(薄膜搬送方向)的區域。模具之材質係對於以厚度20mm之銅作為母材而在表面實施鍍鎳膜者 ,藉機械加工而在鍍敷膜形成三角錐圖案。 A mold having a triangular pyramidal projection configuration on the entire surface is used. One side of the bottom surface of the triangular pyramid system was an equilateral triangle of 230 μm, and the height was 70 μm, and the entire surface was arranged without a gap. The area processed by the protrusion structure is a region of 200 mm (film width direction) × 400 mm (film conveyance direction). The material of the mold is a nickel-plated film on the surface of copper having a thickness of 20 mm as a base material. A triangular pyramid pattern is formed on the plated film by mechanical processing.
(3)成形裝置及條件 (3) Forming equipment and conditions
裝置係採用如第5圖所示之裝置。加壓單元係利用油壓泵加壓的機構,於內部裝設有上下2片之加壓板,分別連結至加熱裝置、冷卻裝置。模具係設置於下側之加壓板的上面上。又,用以剝離已貼附於模具之薄膜的剝離手段係設置於加壓單元內。 The apparatus is a device as shown in Fig. 5. The pressurizing unit is provided with a pressurizing plate that is pressurized by a hydraulic pump, and is internally provided with two upper and lower pressure plates, and is connected to a heating device and a cooling device, respectively. The mold is placed on the upper surface of the lower pressure plate. Further, a peeling means for peeling off the film attached to the mold is provided in the pressurizing unit.
成形時之模具溫度係設為160℃,加壓力係以在整面施加5MPa之壓力的方式進行。加壓時間係30秒鐘。又,剝離時之模具溫度為80℃。藉由從模具剝離薄膜,獲得具有A層與B層之熱塑性薄膜,其係在A層具有貫穿孔、在B層具有連通至該貫穿孔之凹部的熱塑性薄膜。 The mold temperature at the time of molding was set to 160 ° C, and the pressure was applied so as to apply a pressure of 5 MPa over the entire surface. The pressurization time is 30 seconds. Further, the mold temperature at the time of peeling was 80 °C. By peeling the film from the mold, a thermoplastic film having a layer A and a layer B having a through-hole and a thermoplastic film having a concave portion communicating with the through-hole in the layer B is obtained.
將如此之熱塑性薄膜(從模具剝離的薄膜)接著連續送出至下游側之捲取裝置側,將A層與B層剝離,並各自捲取。藉此,獲得含有具有貫穿孔之A層的熱塑性薄膜。 The thermoplastic film (film peeled off from the mold) was continuously fed to the side of the winding device on the downstream side, and the layers A and B were peeled off and wound up. Thereby, a thermoplastic film containing the A layer having the through holes was obtained.
(4)成形結果 (4) Forming results
將成形的薄膜(A層)利用掃描型電子顯微鏡(Keyence(股)VE-7800)所拍攝之照片顯示於第9圖、第10圖。第9圖係從模具接觸面觀察A層之照片,第10圖係觀察A層剖面之照片。按照設計,均一地形成具有一邊為45μm之三角形開口部的貫穿孔。若將開口部之三角形形狀替換成等面積之圓,則孔徑相當於形成33μm。又,由第10圖可得知,在第10圖之A層的下側表面(於剝離前與B層接觸之面)之平面性高,可獲得毛邊少的貫穿孔薄膜。 A photograph of the formed film (layer A) taken by a scanning electron microscope (Keyence VE-7800) is shown in Fig. 9 and Fig. 10. Fig. 9 is a photograph of the A layer viewed from the contact surface of the mold, and Fig. 10 is a photograph of the cross section of the A layer. According to the design, a through hole having a triangular opening portion having a side of 45 μm was uniformly formed. When the triangular shape of the opening is replaced by a circle of equal area, the aperture corresponds to formation of 33 μm. Further, as can be seen from Fig. 10, the lower surface of the layer A of Fig. 10 (the surface in contact with the layer B before peeling) has high planarity, and a through-hole film having few burrs can be obtained.
又,在B層構成之薄膜係均一地形成有連通至對應於三角錐突起形狀之貫穿孔的凹部。 Further, the film formed in the B layer is uniformly formed with a concave portion that communicates with a through hole corresponding to the shape of the triangular pyramid protrusion.
(1)積層構造 (1) Laminated structure
使用A層中含有以聚丙烯作為主體之聚合物(熔點為144℃)的厚度30μm之薄膜、B層中含有以聚甲基丙烯酸甲酯(PMMA)作為主體之聚合物(玻璃轉移溫度為105℃)的厚度175μm之薄膜。還有,於A層之一側表層係具有以低密度聚乙烯作為主體的厚度6μm之黏著層。以使A層之黏著層貼合於B層表面的方式來積層而構成積層構造體。 A film having a thickness of 30 μm containing a polymer mainly composed of polypropylene (melting point: 144 ° C) in the layer A, and a polymer having a polymethyl methacrylate (PMMA) as a main component in the layer B (glass transition temperature of 105) was used. °C) film having a thickness of 175 μm. Further, the side surface layer of one of the A layers has an adhesive layer having a thickness of 6 μm mainly composed of low-density polyethylene. The laminated structure is formed by laminating the adhesive layer of the A layer so as to adhere to the surface of the B layer.
(2)模具 (2) mold
使用整面配置有三角錐突起構造之模具。三角錐係底面之一邊為230μm的正三角形、高度為70μm,整面無間隙地被配置。經突起構造所加工的區域為200mm(薄膜寬度方向)×400mm(薄膜搬送方向)的區域。模具之材質係對於以厚度20mm之銅作為母材而在表面實施鍍鎳膜者,藉機械加工而在鍍敷膜形成三角錐圖案。 A mold having a triangular pyramidal projection configuration on the entire surface is used. One side of the bottom surface of the triangular pyramid system was an equilateral triangle of 230 μm, and the height was 70 μm, and the entire surface was arranged without a gap. The area processed by the protrusion structure is a region of 200 mm (film width direction) × 400 mm (film conveyance direction). The material of the mold is a method in which a nickel-plated film is formed on the surface of copper having a thickness of 20 mm as a base material, and a triangular pyramid pattern is formed on the plating film by mechanical processing.
(3)成形裝置及條件 (3) Forming equipment and conditions
裝置係採用如第5圖所示之裝置。加壓單元係利用油壓泵加壓的機構,於內部裝設有上下2片之加壓板,分別連結至加熱裝置、冷卻裝置。模具係設置於下側之加壓板的上面上。又,用以剝離已貼附於模具之薄膜的剝離手段係設置於加壓單元內。 The apparatus is a device as shown in Fig. 5. The pressurizing unit is provided with a pressurizing plate that is pressurized by a hydraulic pump, and is internally provided with two upper and lower pressure plates, and is connected to a heating device and a cooling device, respectively. The mold is placed on the upper surface of the lower pressure plate. Further, a peeling means for peeling off the film attached to the mold is provided in the pressurizing unit.
成形時之模具溫度係設為130℃,加壓力係以在整面施加5MPa之壓力的方式進行。加壓時間係30秒鐘 。又,剝離時之模具溫度為80℃。將剝離後之薄膜送出至下游側之捲取裝置側,將A層與B層剝離,並各自捲取。 The mold temperature at the time of molding was set to 130 ° C, and the pressure was applied so as to apply a pressure of 5 MPa over the entire surface. Pressurization time is 30 seconds . Further, the mold temperature at the time of peeling was 80 °C. The peeled film was sent out to the winding device side on the downstream side, and the A layer and the B layer were peeled off and each was taken up.
(4)成形結果 (4) Forming results
將成形的薄膜(A層)利用掃描型電子顯微鏡(Keyence(股)VE-7800)所拍攝之照片顯示於第11圖、第12圖。第11圖係從模具接觸面觀察A層之照片、第12圖係觀察A層剖面之照片。A層中未獲得貫穿孔。又,由第12圖可得知,在第12圖之A層的下側表面(於剝離前與B層接觸之面)之平面性不良。 A photograph taken of a formed film (layer A) by a scanning electron microscope (Keyence VE-7800) is shown in Figs. 11 and 12 . Fig. 11 is a photograph of the A layer viewed from the mold contact surface, and Fig. 12 is a photograph of the A layer cross section. No through holes were obtained in the A layer. Further, as can be seen from Fig. 12, the lower surface of the layer A of Fig. 12 (the surface in contact with the layer B before peeling) has poor planarity.
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