TWI623874B - Substrate having transparent electrode, evaluation method of substrate having transparent electrode, method of substrate substrate, transparent panel, method of manufacturing substrate having transparent electrode, touch panel, and manufacturing method of touch panel - Google Patents

Abstract

The method for evaluating a substrate having a transparent electrode according to the present invention is a method for measuring a spectral reflectance R _A (λ) of a substrate (A) having a transparent electrode by sequentially laminating a transparent dielectric layer and a transparent conductive film layer on a transparent substrate. And the spectral reflectance R _B (λ) of the substrate (B) in which the transparent conductive film layer of the substrate (A) having the transparent electrode is not present, and the spectral reflectance R _A (λ) and the spectral reflectance are calculated. The absolute value of the spectrum of the difference in the wavelength of R _B (λ) is ΔR(λ). In one embodiment, the sum of ΔR(λ) and the isochromatic function C ₁ (λ) is multiplied at each wavelength, and the value of ΔV ₁ is obtained by integrating the wavelength range of 380 to 780 nm. Or the above ΔR (λ) and the above C ₁ (λ) and the source spectrum L (λ) are multiplied at each wavelength, and the value of ΔS ₁ is obtained by integrating the wavelength range of 380 to 780 nm, and is used as The non-visuality of the transparent electrode is patterned.

Description

Substrate having transparent electrode, evaluation method of substrate having transparent electrode, method of manufacturing substrate having transparent electrode, touch panel, and manufacturing method of touch panel

The present invention relates to a substrate having a transparent electrode, a method of evaluating a substrate having a transparent electrode, a method of manufacturing a substrate having a transparent electrode, a touch panel, and a method of manufacturing a touch panel.

A substrate for a touch panel having a transparent electrode is formed on a transparent insulating substrate to form a transparent electrode, and is used as a position detector as a touch panel. There are various detection patterns on the touch panel, and one of them is used to capture the change position of the capacitance and the electrode pattern for capacitance detection. The electrode pattern is generally formed by etching, an etched portion (transparent electrode non-formed portion) in which the electrode is removed by etching, and a non-etched portion (transparent electrode forming portion) in which the electrode is not etched and remains.

Since the touch panel is usually disposed on the display, the pattern of the transparent electrode is visually recognized, and the quality of the final product is lowered. Therefore, in the case of a substrate having a transparent electrode in which a transparent electrode is patterned, a non-visibility of a so-called transparent electrode pattern (hereinafter, simply referred to as a pattern) in which a trace of patterning cannot be seen is required.

The main reason why the transparent electrode pattern is visually recognized is the etched portion and the non-etched portion. Between the parts, optical differences such as reflectance or color values occur. Therefore, most of the substrates having transparent electrodes for touch panels are designed to have a laminated structure by designing a film thickness or a refractive index of a transparent dielectric layer, thereby improving non-visibility.

[Previous Technical Literature]

[Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-182528

[Patent Document 2] International Publication No. 2010/114056

[Patent Document 3] Japanese Patent Laid-Open Publication No. 2013-84376

[Patent Document 4] Japanese Patent Laid-Open Publication No. 2010-76232

As described above, even if the non-visibility of the transparent electrode pattern is an important characteristic of the substrate having the transparent electrode for the touch panel, quantitative numerical management with a visual optical index is not realized.

For example, Patent Document 1 describes a technique in which a color difference ΔE calculated by a reflection spectrum in accordance with JIS Z8701 is used as an index of non-visibility. Patent Document 2 describes a technique in which an integrated value of a difference between reflectance spectra of an etched portion and a non-etched portion is used as an index of non-visibility. Patent Document 3 describes a technique of using the absolute value of the difference between the average values of the reflection spectra. Patent Document 4 describes a value obtained by multiplying the absolute value of the difference between the reflection spectra and the standard specific visual sensitivity.

However, it is based on the evaluation of ΔE in the above Patent Document 1, or the evaluation of the absolute value of the difference based on the reflection spectrum of the above Patent Documents 2 to 4, or the evaluation of the integrated value, which is not necessarily consistent with the evaluation of the human function, and the present situation is Quality tube Rational, it needs to be evaluated by human vision. Therefore, there is a problem that a judgment error occurs depending on the evaluator's proficiency, physical condition, and the like.

The present inventors have intensively studied, and found that as shown in the following formula of △ ₁ V 1, as shown in formula 2 of △ S _1, △ V shown in FIG. ₂ of formula 3 or 4 of the formula shown △ S _2, than the previous learning Knowing the indicators, the results of human assessment are well displayed.

That is, the present invention relates to an evaluation method of a substrate having a transparent electrode. The evaluation method of the present invention is to measure the spectral reflectance R _A (λ) of the substrate (A) having a transparent electrode in which a transparent dielectric layer and a transparent conductive film layer are sequentially laminated on a transparent substrate, and the absence of the above-mentioned Calculating the spectral reflectance R _B (λ) of the substrate (B) of the transparent conductive film layer of the transparent electrode substrate (A), and calculating the wavelength of the spectral reflectance R _A (λ) and the spectral reflectance R _B (λ) The absolute value of the difference spectrum is ΔR(λ).

In one embodiment, as shown in the following formula 1, the sum of the above ΔR(λ) and the isochromatic functions x(λ), y(λ), and z(λ), C ₁ (λ), at each wavelength Multiplying the value of ΔV ₁ obtained by integrating the wavelength range of 380 to 780 nm or as shown in the following formula 2, and the above ΔR(λ) and the above C ₁ (λ) and the light source spectrum L(λ) are each The value of ΔS ₁ obtained by multiplying at a wavelength and integrating the wavelength range of 380 to 780 nm, for a transparent electrode forming portion of a substrate having a transparent electrode patterned as a transparent electrode, and a non-forming portion of the transparent electrode The difference in visibility of reflected light, that is, the index of non-visibility of the transparent electrode pattern.

Further, in another embodiment, as shown in the following Expression 3, the above-described ΔR(λ) and the use of the chromaticity functions x(λ), y(λ), and z(λ) are expressed by the formula "C ₂ (λ) ) = 1 × x (λ) + m × y (λ) + n × z (λ)" C ₂ (λ) (where l = 0 to 1.25, m = 0 to 2, n = 0.4 ~) 3, l+m+n=3), multiplying at each wavelength, and integrating the wavelength range of the lower limit wavelength λ ₁ (nm) to the upper limit wavelength λ ₂ (nm) of the visible light region to obtain the value of ΔV ₂ Or, as shown in the following Equation 4, the above ΔR(λ) and the above C ₂ (λ) (where l=0 to 1.6, m=0 to 1.6, n=0.4 to 3, l+m+n= 3) The value of ΔS ₂ obtained by multiplying the light source spectrum L(λ) at each wavelength and integrating the wavelength range of λ ₁ (nm) to λ ₂ (nm) is used as the non-transparent electrode pattern. Indicator of visibility.

The present invention relates to a method of manufacturing a substrate having a transparent electrode in which a transparent dielectric layer and a transparent conductive film layer are sequentially laminated on a transparent substrate. The method for producing a substrate having a transparent electrode according to the present invention is characterized in that the evaluation of the substrate having the transparent electrode is performed, and whether the value of any of the ΔV ₁ , ΔS ₁ , ΔV ₂ and ΔS ₂ is determined It is within the established scope.

One aspect of the present invention relates to a manufacturing method manufactured by the above manufacturing method A substrate having a transparent electrode.

The present invention relates to a substrate (A) having a transparent electrode comprising a transparent dielectric layer and a transparent conductive film layer sequentially laminated on a transparent substrate, and the above transparent conductive film without the substrate (A) having the transparent electrode A substrate having a transparent electrode of the substrate (B) of the layer. The present invention has the transparent electrode substrate 1 of the formula V is shown in the △ ₁ 240% nm or less, or the formula of the value of △ S 2 ₁ of 7.0% nm or less.

The present invention relates to a touch panel characterized by comprising the above substrate having a transparent electrode.

The present invention relates to a method of manufacturing a touch panel, characterized in that the method for evaluating a substrate having a transparent electrode or the method for manufacturing a substrate having the transparent electrode is performed. Furthermore, the present invention relates to a touch panel characterized by being manufactured by the above manufacturing method.

According to the present invention, in a substrate or a touch panel having a transparent electrode in which a transparent electrode is patterned, the non-visibility of the transparent electrode pattern can be accurately and quantitatively determined, and the pattern does not occur due to the evaluator's proficiency or the like. A prior art problem of poor judgment of non-visibility. By using the evaluation method according to the present invention for the production of a substrate having a transparent electrode, it is possible to provide a substrate having a transparent electrode and having a non-visually good transparent electrode.

1‧‧‧Transparent board

2‧‧‧Transparent dielectric layer

3‧‧‧Transparent conductive film layer

Fig. 1 is a schematic view showing a cross section of a layer structure of a substrate (A) having a transparent electrode according to an embodiment of the present invention.

Fig. 2 is a schematic view showing a cross section of a layer structure of a substrate (B) according to an embodiment of the present invention.

Figure 3 is a graph showing the wavelength dependence of C ₁ (λ).

Fig. 4 is a graph showing the wavelength dependence of the intensity of the neon light source.

Figure 5 is a graph showing the wavelength dependence of the intensity of the D65 source.

FIG 6 based on the correlation graph that represents the visibility of _a visual and non-visual evaluation of Example 1 △ V of the embodiment.

Fig. 7 is a graph showing the correlation between the ΔS ₁ of the second embodiment and the non-visibility of the visual evaluation.

Figure 8 represents a system wherein the correlation graph of the non-visibility of a visual △ S ₁ and the Reference Example was visually assessed.

Fig. 9 is a graph showing the correlation between the ΔE of Comparative Example 1 and the non-visibility of the visual evaluation.

Fig. 10 is a graph showing the correlation between the integrated value of the difference in the reflectance spectra of Comparative Example 2 and the non-visibility of the visual evaluation.

Fig. 11 is a graph showing the correlation between the absolute value of the average difference of the reflectance spectra of Comparative Example 3 and the non-visibility of the visual evaluation.

Fig. 12 is a graph showing the correlation between the integral value of the absolute value of the difference in the visual reflectance of Comparative Example 4 and the non-visibility of the visual evaluation.

Figure 13 is a diagram showing the plane trigonometry of the relationship between the values of the coefficients φV ₂ , the chrominance functions C ₂ (λ), and the values of n and the visual evaluation.

Figure 14 is a diagram showing the plane trigonometry of the relationship between the values of the coefficients 1, m, and n of ΔS ₂ , the chrominance function C ₂ (λ), and the visual evaluation.

Hereinafter, preferred embodiments of the present invention will be described. First, a substrate having a transparent electrode used in the evaluation method (hereinafter, simply referred to as "the evaluation method of the present invention") of the substrate having a transparent electrode of the present invention will be described.

Fig. 1 is a cross-sectional view showing a substrate (A) having a transparent electrode on which a transparent dielectric layer 2 is formed on a transparent substrate 1 and a transparent conductive film layer 3 is formed thereon. Fig. 2 is a cross-sectional view of the substrate (B) in which the transparent conductive film layer 3 is removed from the substrate (A) having a transparent electrode. In addition, the dimensional relationship between the thicknesses of the first drawing and the second drawing is changed in accordance with the simplification and simplification of the drawing, and is not represented by the actual dimensional relationship. In addition, in the drawings, the same reference numerals denote the same technical matters.

The base material of the transparent substrate is not particularly limited as long as it is colorless and transparent at least in the visible light region, and a transparent electrode may be formed thereon. For example, a polyester resin or a ring of glass, polyethylene terephthalate (PET) or polybutylene terephthalate (PBT) or polybutylene naphthalate (PEN) may be mentioned. An olefin resin, a polycarbonate resin, a polyimide resin, a cellulose resin, or the like. Among them, a polyester resin or a cycloolefin resin can be preferably used, and polyethylene terephthalate can be used particularly preferably. The thickness of the substrate is not particularly limited, and is preferably 0.01 to 0.4 mm. When it is in the above range, the durability of the transparent substrate can be sufficiently improved, and since it has moderate flexibility, it can be formed into a roll-to-roll mode with good productivity.

As the material of the transparent dielectric layer, for example, an acrylic resin, an anthrone resin; a material mainly composed of an oxide of cerium oxide, titanium oxide, cerium oxide, zirconium oxide, or aluminum oxide; or calcium fluoride; And magnesium fluoride as a main component material. An oxide constituting the transparent dielectric layer to be colorless at least in the visible region It is transparent, and the resistivity is preferably 10 Ω ‧ cm or more. Further, the thickness of the transparent dielectric layer may be any thickness as long as the above specific resistance is satisfied. The transparent dielectric layer may be composed of only one layer or two or more layers.

On one or both sides of the transparent substrate, the durability of the transparent electrode for a touch panel can be improved, and a hard coat layer of a transparent dielectric layer is laminated in advance. As the material of the hard coat layer, an acrylic resin, an anthrone resin or the like can be used. The film thickness of the hard coat layer is preferably 1 to 10 μm because of moderate durability and flexibility.

The transparent substrate may also be subjected to a surface treatment for the purpose of improving the adhesion between the transparent substrate and the transparent conductive film layer. The means for the surface treatment is, for example, a method of improving the adhesion by charging the surface of the substrate, and specifically, a corona discharge, a plasma method, or the like. The transparent dielectric layer between the transparent conductive film layer of the present invention and the transparent substrate can also have the effect of improving the adhesion, especially if it is SiOx (x=1.8~2.0), it will not be damaged. The point of optical properties is also good.

The material of the transparent conductive film layer is not particularly limited as long as it can coexist with transparency and conductivity. Such a material may, for example, be a material containing indium oxide, zinc oxide or tin oxide as a main component. Among them, from the viewpoint of low electric resistance, a material containing indium oxide as a main component can be favorably used.

In the present specification, the "main component" of a substance means that the content of the substance is 51% by weight or more, preferably 70% by weight or more, more preferably 90% by weight or more. The components other than the main component may be contained in each layer as long as the function of the present invention is not impaired.

The method for forming the transparent conductive film layer is not particularly limited and may be A dry process such as sputtering or ion plating, a wet process such as a sol-gel coating, or the like is suitably selected according to the required characteristics.

A substrate having a transparent electrode for a touch panel such as a capacitive touch panel is patterned by etching or the like in a portion of the surface of the transparent conductive film layer. The pattern (transparent electrode pattern) of the transparent conductive film layer is, for example, a method of removing a part of the transparent conductive film layer of the substrate having the transparent electrode by etching, or a transparent conductive film when forming a film of the transparent conductive film layer. The layer is formed in a part that does not form a film. A method of removing a transparent conductive film layer by etching, and a method of forming a resist by photolithography or the like after applying a photosensitive resist, and removing the exposed transparent conductive film layer by an etching liquid is known. Even in other methods, as long as the transparent conductive film layer for forming a predetermined pattern can be removed, it can be used arbitrarily. A method of forming a transparent conductive film layer and a part of which does not form a film may be a method of forming a transparent conductive film layer after forming a mask pattern on a substrate, and removing a mask portion.

Next, an evaluation method of the substrate having a transparent electrode of the present invention will be described. In the evaluation method of the substrate having the transparent electrode of the present invention, first, the spectral reflectance R _A (λ) of the substrate (A) having the transparent electrode sequentially laminated on the transparent substrate on the transparent dielectric layer and the transparent conductive film layer is measured. And the spectral reflectance R _B (λ) of the substrate (B) having the transparent electrode layer (A) without the transparent conductive film layer, calculated by the spectral reflectance R _A (λ) and the spectral reflectance The absolute value ΔR(λ) of the spectrum of the difference between the wavelengths of R _B (λ).

[Substrate (A) with transparent electrode]

The substrate (A) having a transparent electrode can be used for forming a transparent conductive film layer on the dielectric layer, forming a pattern, or forming a non-etched portion of the substrate having the transparent electrode after the pattern is formed. Transparent when evaluating with the touch panel After the patterning of the conductive film layer, the pattern is too thin to measure the reflectance. In such a case, as a sample for reflectance measurement, the pattern shape can be changed by measurement, or patterning or etching is not performed, and a transparent electrode is present on the entire substrate (A) having a transparent electrode to form an evaluation substrate. .

After the transparent conductive film layer is formed by a touch panel using a substrate having a transparent electrode, crystallization of the transparent conductive film layer is performed by annealing. The material (ITO or the like) constituting the transparent conductive film layer changes its refractive index before and after crystallization, so that the non-visibility of the transparent electrode pattern also changes before and after crystallization. Therefore, in general, optical design is performed in accordance with the optical characteristics of the crystallized transparent conductive film layer. Further, in the transparent conductive film layer before crystallization, ITO or the like easily absorbs light, and thus the transparent electrode pattern is easily recognized. For the reason described above, when the transparent conductive film layer is crystallized, the substrate (A) having a transparent electrode can be crystallized, and the evaluation can be performed with high precision.

[Substrate (B)]

The substrate (B) is in a state in which the transparent conductive film layer of the substrate (A) having the transparent electrode is not present. A substrate on which a transparent conductive film layer of a substrate (A) having a transparent electrode is etched, or a substrate at a stage before film formation of a transparent conductive film layer can be used as the substrate (B). An etched portion of the patterned substrate having a transparent electrode may be used as the substrate (B). In the patterning process, the transparent dielectric layer is etched or deteriorated. By using the etching process as the substrate (B) for measuring the reflectance, it is possible to perform a highly accurate evaluation close to the real state.

The etching method can be selected according to the process of the touch panel, and the wet process or the dry process using the plasma can be appropriately selected.

When evaluating with a touch panel, a substrate having a transparent electrode In the case of (A), the pattern is too thin to measure the reflectance. In this case, the sample sample for reflectance measurement is changed in pattern shape by measurement, or is not patterned or etched, and a transparent electrode is present on the entire substrate (B) having a transparent electrode to form an evaluation substrate.

[Refracting Spectral Measurement]

The measurement of the reflectance spectrum can be carried out in accordance with the method of JIS Z8722. The method for measuring the reflectance spectrum is an on-line measurement method using an on-line spectroscopic reflectance meter, and a method of measuring on a line after the film formation is completed, and an offline spectrophotometer is used for the inspection to form a simple touch panel. The measurement method, the method of measuring the completed touch panel product, and the like. Further, the spectral reflectance R _A (λ) and the spectral reflectance R _B (λ) are preferably measured in the same step as "measured by an off-line spectrophotometer after completion of film formation". In addition, when the absolute value ΔR(λ) of the difference of the spectral reflectance is used in the index of the manufacturing step, the method of measuring the reflection spectrum is considered when the measurement of R _B (λ) is important in the film forming stage. In the film forming step or after the film formation is completed, it is preferably measured using a spectroscopic reflectometer or a spectrophotometer, and in particular, it is preferably measured after the film formation is completed.

After calculating ΔR(λ), in one embodiment, as shown in the above formula 1, the ΔR(λ) and the equal chromaticity functions x(λ), y(λ), and z(λ) are summed. C ₁ (λ) is multiplied at each wavelength and integrated over a wavelength range of 380 to 780 nm to obtain a value of ΔV ₁ . Or, as shown in the above formula 2, the above ΔR(λ) and the above C ₁ (λ) and the light source spectrum L(λ) are multiplied at respective wavelengths, and ΔS is obtained by integrating the wavelength range of 380 to 780 nm. ₁ value. Here, C ₁ (λ) and the like using the chromaticity-based functions x (λ), y (λ ) and z (λ), to the formula _{"C 1 (λ) = x (} λ) + y (λ) + z ( Function represented by λ)". As will be described later, the light source spectrum L(λ) is the spectrum of the light source used for the measurement of the spectral reflectance R _A (λ) and the spectral reflectance R _B (λ) in the light source spectrum of the use environment of the final product. It does not necessarily need to be the same as L(λ).

Further, in another embodiment, as shown in the above formula 3, the above-mentioned ΔR(λ) and C ₂ (λ) are multiplied at respective wavelengths, and the lower limit wavelength λ ₁ (nm) to the upper limit of the visible light region is used. The wavelength range of the wavelength λ ₂ (nm) is integrated to obtain the value of ΔV ₂ . Or, as shown in the above formula 4, the above ΔR(λ) and the above C ₂ (λ) and the source spectrum L(λ) are multiplied at each wavelength, and are λ ₁ (nm) λ ₂ (nm) The wavelength range is integrated to find the value of ΔS ₂ . Here, C ₂ (λ) uses the isochromatic functions x(λ), y(λ), and z(λ) with the formula "C ₂ (λ) = l × x (λ) + m × y (λ) ) +n × z(λ)" is a function.

[isochromatic function]

The above-described chromaticity function indicates the wavelength dependence of the human light sensitivity and is normalized according to the International Commission on Illumination (CIE). Among the specifications of CIE, the isochromatic function reflects that humans have 3-dimensional chromaticity coordinates, which are defined by three functions: x(λ), y(λ), and z(λ). The above C ₁ (λ) is a function of the total x (λ), y (λ), and z (λ), which indicates which wavelength the person feels more. A function indicating how many people feel light at which wavelength, in addition to the above C ₁ (λ), there is also a visual standard than the visual sensitivity or the dark standard standard visual sensitivity. The focus is on the brightness as a function of the visual sensibility or the darkness of the standard than the visual sensibility, and the C ₁ (λ) system focuses on the color function. Therefore, by using C ₁ (λ), the difference in color can be correctly reflected, and as a result, the accuracy of evaluation of non-visibility can be improved.

In the present invention, the values of x(λ), y(λ), and z(λ) are preferably CIE (1964) 10-deg color matching functions using a 10-degree field of view. Fig. 3 shows C ₁ (λ) obtained from the chromaticity function of a 10-degree field of view. Furthermore, the values of x(λ), y(λ), and z(λ) may also reflect the environment in which the final product is used, and the value of the 2 degree field of view is used.

The above C ₂ (λ) is a function of expanding C ₁ (λ) by the formula "C ₂ (λ) = l × x (λ) + m × y (λ) + n × z (λ)" , l+m+n=3) indicates. In the present invention, the use of C ₂ (λ) can also improve the accuracy of evaluation of non-visibility.

When the value of ΔV ₂ is obtained, from the viewpoint of accurately displaying the evaluation result of non-visibility, in the above formula, l=0 to 1.25, m=0 to 2, n=0.4 to 3, and l=0.05. ~1.2, m=0~2, n=0.6~3 is better, and l=0.5~1, m=0.6~1.6, n=0.7~1.9 is better. Further, when l = m = n = 1, (i.e., C ₂ (λ) = C ₁ (λ) is optimum (refer to Examples 3 to 24 and Fig. 13 which will be described later).

When the value of ΔS ₂ is obtained, from the viewpoint of accurately displaying the evaluation result of non-visibility, in the above formula, l=0 to 1.6, m=0 to 1.6, n=0.4 to 3, and l=0.05. 1.6, m=0~1.4, n=0.6~3 is better, l=0.2~1.6, m=0.2~1.25, n=0.6~2.6 is better, l=0.6~1.3, m=0.6~1.1, n=0.8~1.9 is the best. In addition, when l=m=n=1 (that is, when C ₂ (λ)=C ₁ (λ) is optimal (refer to Examples 25 to 47 and FIG. 14 described later).

[Light source spectrum]

The spectrum of the light source used for calculating ΔS ₁ or ΔS ₂ can be set in accordance with the use environment of the final product or the like. For example, sunlight, a D65 light source, a fluorescent lamp, etc., and various light sources are mentioned. It is preferred to use a measured value of the solar spectrum or a spectrum obtained by referring to the literature value of the D65 source, assuming that the final product is used outdoors. In addition, it is preferable to use the spectrum of the illumination as the spectrum of the light source, and the spectrum of the fluorescent light source or the D65 source is preferably used when the final product is used indoors. Figure 4 shows the spectrum of the phosphorescent light, and Figure 5 shows the spectrum of the D65 source.

[calculation of △V ₁ and △S ₁ ]

ΔV ₁ is obtained by multiplying ΔR(λ) and C ₁ (λ) at each wavelength and integrating the wavelength range of 380 to 780 nm as expressed by the above formula 1. ΔS ₁ is obtained by multiplying ΔR(λ) and C ₁ (λ) and L(λ) at each wavelength and integrating the wavelength range of 380 to 780 nm as shown in the above formula 2. Further, as in the embodiment described later, the values of a certain wavelength interval (for example, every 10 nm) may be used to calculate the ΔV ₁ and ΔS ₁ by dividing the product. The calculations for ΔV ₂ and ΔS ₂ are also the same.

[calculation of △V ₂ and △S ₂ ]

ΔV ₂ is a multiplication of ΔR(λ) and C ₂ (λ) at each wavelength as shown in the above formula 3, and is a lower limit wavelength λ ₁ (nm) to an upper limit wavelength λ ₂ (nm) of the visible light region. The wavelength range is integrated. ΔS ₂ is a multiplication of ΔR(λ) and C ₂ (λ) and L(λ) at each wavelength as shown in the above formula 4, and has a wavelength of λ ₁ (nm) to λ ₂ (nm) Scope is derived. The value of the lower limit wavelength λ ₁ and the upper limit wavelength λ _{2 in} the visible light region is not particularly limited, and λ ₁ = 380 nm and λ ₂ = 780 nm are preferable.

The calculated light source spectrum L(λ) used for ΔS ₁ or ΔS ₂ can be arbitrarily set, but the calculation result is changed if light sources having different intensities are used. Therefore, it is necessary to normalize the intensity of the light source spectrum. In the present invention, when C ₁ (λ) and L (λ) are multiplied at respective wavelengths and integrated in a wavelength range of 380 to 780 nm, and C ₂ (λ) and L (λ) are at respective wavelengths. The result is normalized to 10 when multiplied by a wavelength range of λ ₁ (nm) to λ ₂ (nm). In general, the normalization of the intensity of the light source is performed by integrating only the spectrum of the light source. However, in the present invention, it is necessary to consider the normalization of the sensitivity of the human being, since it spans 380 to 780 nm (or λ ₁ (nm) to λ ₂ (nm)), so the above integral value is used. In this system, the k value described in JIS Z8701 is the same as the reason for normalizing the integral value of the chromaticity function of the light source spectrum ×.

In the evaluation method of the substrate having the transparent electrode of the present invention, the values of ΔV ₁ , ΔS ₁ , ΔV ₂ and ΔS ₂ obtained as described above can be used for the index of non-visibility of the transparent electrode pattern, respectively. In order to form a substrate having a transparent electrode having a non-high visibility which is a transparent electrode pattern, the values of ΔV ₁ , ΔS ₁ , ΔV ₂ and ΔS _{2 are} preferably low. Specifically, the value of ΔV ₁ is preferably 240% nm or less, more preferably 220% nm or less, and further preferably 200% nm or less. The value of ΔS ₁ is preferably 7.0% or less, more preferably 6.3% nm or less, and 5.6% nm or less. The value of ΔV ₂ is preferably 280% or less, more preferably 260% or less, and further preferably 190% or less. The value of ΔS ₂ is preferably 9.0% nm or less, more preferably 7.5% nm or less, and further preferably 5.7% nm or less.

The evaluation method of the substrate having the transparent electrode of the present invention can be incorporated into the manufacturing process of the substrate having the transparent electrode. For example, the above evaluation is performed when the manufacturing conditions of the substrate having the transparent electrode are set, and the manufacturing conditions (film forming conditions of the transparent dielectric layer or the transparent conductive film layer, etc.) are adjusted based on the evaluation results, and various manufacturing conditions are determined. Further, quality management of the substrate having the transparent electrode can also be performed by performing the above evaluation on the production line.

Thus, the method for producing a substrate having a transparent electrode comprising the evaluation method of the present invention is also one of the present inventions. The method for producing a substrate having a transparent electrode of the present invention is the same as the method for producing a substrate having a transparent electrode, except for the above-described evaluation method.

In the method for producing a substrate having a transparent electrode of the present invention, it is determined whether or not the value of any of ΔV ₁ , ΔS ₁ , ΔV ₂ and ΔS ₂ is within a predetermined range. For example, the evaluation method of the present invention is performed on a substrate having a transparent electrode after the transparent conductive film layer is formed. As long as the value of ΔV ₁ or the like exceeds a predetermined value, the non-authenticity of the transparent electrode pattern is not within the tolerance range. the meaning of.

The result of the determination of the value of ΔV ₁ or ΔV ₂ is fed back, and by adjusting the manufacturing conditions so that the value is within a predetermined range, the non-visibility of the pattern of the substrate having the transparent electrode after the transparent electrode is patterned can be improved. . As long as the above-mentioned ΔS ₁ or ΔS ₂ value determination result is fed back to the manufacturing conditions, the non-visibility of the final product in the use environment can be improved. That is, the final product can be correctly evaluated by using the light source spectrum L(λ) used in the calculation of ΔS ₁ or ΔS ₂ , using the light source spectrum of the use environment of the final product, or the light source spectrum close to the use environment. The non-visuality of the pattern in the environment of use. For example, in a mobile machine that is used outside the house, the pattern has a tendency to be visually recognized under the sunlight outside the house, and the measured value of the solar spectrum or the simulated solar spectrum is used as L(λ). S ₁ or ΔS _{2 is} preferred.

The manufacturing conditions to be adjusted include, for example, film forming conditions (material, thickness, gas flow rate, etc.) of the transparent dielectric layer, film forming conditions (material, thickness, gas flow rate, etc.) of the transparent conductive film layer. Furthermore, it is also possible to simultaneously adjust two or more manufacturing conditions. For example, when the value of ΔV ₁ , ΔS ₁ or the like is higher than the target value, the thickness of at least one of the transparent dielectric layer and the transparent conductive film layer is made small, or the transparent dielectric layer and the transparent conductive film are added. The amount of oxygen or the like at the time of film formation of at least one of the layers can lower the value.

Further, by adding the above-described determination result to the substrate having the transparent electrode, quality management of the substrate having the transparent electrode can be performed. For example, in the manufacturing steps of the touch panel, the values of ΔV ₁ , ΔS _{1 ,} etc. are below the target value, and by selecting a substrate having a transparent electrode, the yield of the final product can be improved. The method of adding the determination result to the substrate having the transparent electrode, and attaching the label of the print determination result or the medium such as the IC wafer recording the determination result to the substrate having the transparent electrode or the method of packaging the substrate having the transparent electrode, The determination result is directly printed or printed on a substrate having a transparent electrode or the like. The result of the determination may be expressed by a character, a number, a symbol, a bar code, a two-dimensional bar code, or the like, or may be combined and displayed.

The method for measuring the reflection spectrum is as described above. Wherein, the method of measuring the reflection spectrum on the line in the film forming step is preferred, and the spectral reflectance of the substrate before the film formation of the transparent conductive film layer after the film formation of the transparent dielectric layer is used as the spectral reflectance R _B (λ) is preferably a method of measuring the spectral reflectance of the substrate having a transparent electrode after the formation of the transparent conductive film layer as the spectral reflectance R _A (λ), respectively.

ΔV _{1 is} preferably 240% nm or less, more preferably 220% nm or less, further preferably 200% nm or less, and ΔS _{1 is} preferably 7.0% or less, more preferably 6.3% nm or less. Further, it is preferably 5.6% or less, and ΔV _{2 is} preferably 280% or less, more preferably 260% or less, further preferably 190% or less, and ΔS ₂ is 9.0% or less. Preferably, it is more preferably 7.5% nm or less, further preferably 5.7% nm or less, and each of the substrates having a transparent electrode having a non-high visibility and a transparent electrode can be formed. By managing the manufacturing conditions to such a numerical range, it is possible to manufacture a substrate having a transparent electrode which is not visually identifiable.

According to the present invention, the determination result of the transparency of the transparent electrode pattern such as the proficiency of the assessor is not affected, and the determination result can be fed back to the film forming step of the transparent conductive film layer, so that the defect can be detected early. Can contribute to improve productivity.

[Use of substrate with transparent electrode]

The substrate having the transparent electrode of the present invention can be used as a transparent electrode for a display, a light-emitting element, a photoelectric conversion element, or the like, and can be suitably used as a transparent electrode for a touch panel. Among them, since the transparent conductive film layer has low electrical resistance, it can be favorably used for a capacitive touch panel.

In the formation of the touch panel, a conductive ink or a paste is applied onto a substrate having a transparent electrode, and a collector which is a wiring for guiding the circuit is formed by heat treatment. The method of the heat treatment is not particularly limited, and examples thereof include a heating method such as an oven or an IR heater. The temperature of the heat treatment is set at a temperature of ‧ time in consideration of the temperature at which the conductive paste adheres to the transparent electrode. For example, in the case of heating in an oven, the heating is performed at 120 to 150 ° C for 30 to 60 minutes, and the heating by the IR heater is 150 ° C for 5 minutes. Further, the method of forming the wiring for the guiding circuit is limited to the above, and may be formed by a dry coating method. Further, the wiring for the guiding circuit is formed by lithography, and the wiring can be thinned.

[Examples]

Hereinafter, the present invention will be specifically described by way of Examples, but the present invention is not limited to the Examples.

[Manufacture of substrate]

[Substrate 1]

As the substrate (A) ₁ having a transparent electrode, a transparent dielectric layer (a high refractive index layer, a low refractive index layer) and a transparent conductive film layer are sequentially laminated on a substrate (transparent substrate). Nb ₂ O _{5 was} used as the high refractive index layer, SiO _{2 was} used as the low refractive index layer, and ITO in which tin oxide was doped with indium oxide was used as the transparent conductive film layer.

The substrate was formed into a film of a hard coat layer (urethane resin) on both surfaces of a PET film (thickness: 125 μm), and a film of Nb ₂ O ₅ , SiO ₂ or ITO was sequentially formed by sputtering. The thickness of the hard coat layer was 5 μm, the thickness of Nb ₂ O ₅ was 8 nm, the thickness of SiO ₂ was 50 nm, and the thickness of ITO was 28 nm.

Since the ITO after sputtering was amorphous, it was annealed in an oven at 150 ° C for 30 minutes to crystallize ITO. The substrate having the transparent electrode thus obtained was used as the substrate (A) ₁ .

The substrate (B) ₁ was produced by wet etching using an etching liquid (ITO-02 manufactured by Kanto Chemical Co., Ltd.) using a transparent conductive film layer of a substrate (A) ₁ having a transparent electrode.

[Visual assessment by visual inspection]

The patterned sample 1 was produced by patterning the substrate (A) ₁ having the transparent electrode described above by lithography. Using the patterned sample 1, the non-visibility of the transparent electrode pattern was evaluated in five stages of grades 1 to 5 under a fluorescent light of a neon color. A larger number indicates a better non-visibility. The patterned sample 1 was visually invisible to a grade of 1.

[Substrate 2]

A substrate (A) ₂ having a transparent electrode was produced in the same manner as in Example 1 except that the thickness of the SiO ₂ was 40 nm and the thickness of the ITO was 25 nm. The substrate was formed by wet etching the transparent conductive film layer (B). ₂ ) and patterned sample 2. Sample 2 was patterned to a visually non-visible level of 2.

[Substrate 3]

A substrate (A) ₃ having a transparent electrode was produced in the same manner as in Example 1 except that the thickness of the Nb ₂ O ₅ was 7 nm and the thickness of the ITO was 26 nm. The substrate was formed by wet etching the transparent conductive film layer ( B) ₃ and patterned sample 3. Sample 3 was patterned to a visually non-visible level of 3.

[Substrate 4]

A substrate (A) ₄ having a transparent electrode was produced in the same manner as in Example 1 except that the thickness of the ITO was 26 nm, and the substrate (B) ₄ and the patterned sample 4 were produced by wet etching the transparent conductive film layer. Sample 4 was patterned to a visually non-visual level of 4.

[Substrate 5]

A substrate (A) _{5 of a} transparent electrode was produced in the same manner as in Example 1 except that the thickness of Nb ₂ O ₅ was 6 nm, the thickness of SiO ₂ was 34 nm, and the thickness of ITO was 10 nm. The transparent conductive film layer was wet. Etching, substrate (B) ₅ and patterned sample 5 were fabricated. Sample 5 was patterned to a visually non-visible level of 5.

[Substrate 6]

A substrate (A) _{6 of a} transparent electrode was produced in the same manner as in Example 1 except that the thickness of Nb ₂ O ₅ was 6 nm, the thickness of SiO ₂ was 30 nm, and the thickness of ITO was 10 nm. The transparent conductive film layer was wet. Etching, substrate (B) ₆ and patterned sample 6 were fabricated. The sample 6 was patterned to have a visual non-visibility rating of 5.

[Example 1]

The reflection spectra of the substrates (A) ₁ to (A) ₅ and the substrates (B) ₁ to (B) ₅ having the transparent electrodes prepared above were measured, and ΔV 1 was calculated according to Formula ₁ .

[Refracting Spectral Measurement]

The reflectance spectrum was measured by a spectrophotometer including an integrating sphere, LAMBDA 750 manufactured by PERKIN ELMER Co., Ltd., and a wavelength range of 380 nm to 780 nm, which was measured at a wavelength of 10 nm per interval. The measurement was carried out at room temperature in a temperature of 25 ° C and a humidity of 40%. In the measurement of the reflection spectrum, the sample is set to a monochromatic light of the component light incident on the film formation surface, and the total light that is transmitted is measured by an integrating sphere. Determination of reflectance spectra At the time of measurement, no special treatment such as back blackening was performed, and the reflectance was measured by including back surface reflection. The fixation of the sample was measured by pressing the outside of the portion connected to the opening portion of the integrating sphere and the back surface was connected to the air.

[calculation of △V ₁ ]

ΔV ₁ is expressed by the formula 1, and ΔR(λ) and C ₁ (λ) are multiplied at respective wavelengths, and are obtained by integrating the wavelength range of 380 to 780 nm. ΔR(λ) is an absolute value of a difference between reflection spectra of the substrate (A) and the substrate (B) having a transparent electrode as measured by the above-described reflection spectrum. The isochromatic function is a reflection spectrum, which is used in conjunction with the measurement wavelength, and a wavelength range of 380 nm to 780 nm is used, and a wavelength of 10 nm per interval is used. The calculations for ΔS ₁ , ΔV ₁ and ΔS ₂ are the same.

The result of this calculation is shown in Fig. 6. ΔV ₁ showed a good correlation with the visual evaluation result of non-visibility, and it was found that ΔV1 is an excellent non-visual evaluation method.

[Embodiment 2]

Example 1 in that, instead of using the evaluation function △ V ₁ △ S _1, to evaluate the non-visual recognition. For the calculation of ΔS ₁ , the spectrum of the neon light source of the same color as that used for visual evaluation was used.

[calculation of △S ₁ ]

ΔS ₁ , as shown in the formula 2, ΔR(λ) and C ₁ (λ) are multiplied by the light source spectrum L(λ) at each wavelength, and are obtained by integrating the wavelength range of 380 to 780 nm. In the present embodiment, the result of integrating C ₁ (λ) and L (λ) at a wavelength range of 380 to 780 nm at each wavelength is normalized to 10.

The result of this calculation is shown in Fig. 7. ΔS ₁ showed a good correlation with the visual evaluation result of non-visibility, and it was found that ΔS ₁ is an excellent method for evaluating non-visibility.

[Reference Example 1]

In Example 2, instead of the spectrum of the source of the neon light fluorescent lamp, ΔS _{1 was} calculated using the spectrum of the D65 source as the source spectrum L(λ).

The results obtained by this calculation are shown in Fig. 8. Figure 8 is for reference and is compared to the non-visibility ratings evaluated under fluorescent light. It is recognized that ΔS ₁ can be calculated even when the light source is changed.

[Comparative Example 1]

The reflection spectrum obtained in Example 1 was calculated using CIE (1964) 10-deg color matching functions as an isochromatic function, and the D65 source spectrum was used as a source spectrum, and the L*a*b* color system described in JIS Z8701 was calculated. Color difference △E. The results obtained are shown in Fig. 9. ΔE is inferior to the evaluation result of visual non-visibility, and ΔE cannot express non-visibility with sufficient accuracy.

[Comparative Example 2]

From the reflection spectrum obtained in Example 1, the following formula 5 was calculated, and the integrated value of the difference of the reflection spectra described in International Publication No. 2010/114056 (Patent Document 2) was calculated. The results obtained are shown in Fig. 10. The integrated value of the difference between the reflection spectra is inferior to the evaluation result of the visual non-visibility, and the integrated value of the difference of the reflection spectra cannot express the non-visibility with sufficient accuracy.

[Comparative Example 3]

From the reflection spectrum obtained in Example 1, calculation of Japanese special open 2013-84376 The absolute value of the average difference of the reflection spectra described in the above-mentioned publication (Patent Document 3). The results obtained are shown in Fig. 11. The absolute value of the average difference of the reflection spectrum is inferior to the evaluation result of the visual non-visibility, and the absolute value of the average difference of the reflection spectrum cannot express the non-visibility with sufficient accuracy.

[Comparative Example 4]

From the reflection spectrum obtained in the first embodiment, the integral value of the absolute value of the difference in the visual reflectance described in JP-A-2010-76232 (Patent Document 4) is calculated. The results obtained are shown in Fig. 12. The integral value of the absolute value of the difference in the visual reflectance is inferior to the evaluation result of the visual non-visibility, and the integral value of the absolute value of the difference in the visual reflectance cannot express the non-visibility with sufficient accuracy.

The results of the respective examples, reference examples, and comparative examples are shown in the first table. The result of patterning sample 6 (substrate (A) ₆ and substrate (B) ₆ having transparent electrodes) is also shown in the first table. As is clear from the first table, the ΔV ₁ and ΔS ₁ (Examples 1 and 2) corresponded completely to the order of visual evaluation, and the previous indexes (Comparative Examples 1 to 4) differed from the order of visual evaluation. As such, the non-visuality cannot be quantified with sufficient accuracy with the previous index.

Further, from the results of patterning the samples 5 and 6, it was found that by using ΔV ₁ and ΔS ₁ , the difference in non-visibility which cannot be visually evaluated can be quantified. From this result, it is expected that the non-visibility of the transparent electrode pattern can be quantitatively evaluated by using ΔV ₁ and ΔS ₁ even with a substrate having a transparent electrode which is excellent in non-visibility.

[Examples 3 to 24]

In Example 1, the evaluation of non-visibility was performed using ΔV ₂ instead of the evaluation function ΔV ₁ . In Examples 3 to 24, the reflection spectra of the substrates (A) ₁ to (A) ₄ and the substrates (B) ₁ to (B) ₄ having transparent electrodes were measured.

[calculation of △V ₂ ]

ΔV ₂ is obtained by multiplying ΔR(λ) and C ₂ (λ) at each wavelength and integrating at a wavelength range of 380 to 780 nm as shown in Formula 3. In the second table, the values of l, m, and n are shown. Further, in Embodiment 1, l = m = n = 1, that is, C ₂ (λ) = C ₁ (λ).

The result of this calculation is shown in the second table. Similarly to ΔV ₁ , it is also known that ΔV ₂ corresponds to the order of visual evaluation.

[Examples 25 to 47]

In Example 2, instead of the evaluation function ΔS _{1 ,} ΔS _{2 was} used for evaluation of non-visibility. For the calculation of ΔS ₂ , the spectrum of the phosphorescent light source source of the same source as that used for visual evaluation was used. In Examples 25 to 47, the reflection spectra of the substrates (A) ₁ to (A) ₄ and the substrates (B) ₁ to (B) ₄ having transparent electrodes were measured.

[calculation of △S ₂ ]

ΔS ₂ is obtained by multiplying ΔR(λ) and C ₂ (λ) by the light source spectrum L(λ) at each wavelength and integrating the wavelength range of 380 to 780 nm as shown in Formula 4. In the present embodiment, the result of integrating C ₂ (λ) and L (λ) at a wavelength range of 380 to 780 nm at each wavelength is normalized to 10. In the third table, the values of l, m, and n are indicated. Furthermore, in Embodiment 2, l = m = n = 1, that is, C ₂ (λ) = C ₁ (λ).

The result of this calculation is shown in the third table. Similarly to ΔS ₁ , it is also known that ΔS ₂ corresponds to the order of visual evaluation.

In the second table, the correlation coefficient between ΔV ₂ (Examples 3 to 24) and the visual results (levels 1 to 4) is shown, and in the third table, ΔS ₂ (Examples 25 to 47) and visual results (levels) are shown. Correlation coefficient of 1~4). The correlation coefficient is a statistical index indicating the correlation between two variables, and the covariance of two variables (the second table is ΔV ₂ -grade, the third ΔS ₂ -grade), and the standard deviation is quotient. In addition to seeking. The closer the correlation coefficient is to -1, the more the ΔV ₂ or ΔS ₂ agrees with the visual evaluation.

Fig. 13 is a plan showing a triangular coordinate of the relationship between the values of the respective coefficients l, m, and n of the chrominance function C ₂ (λ) of ΔV ₂ (Examples 3 to 24) and the visual evaluation. Fig. 14 is a plan showing the triangular coordinates of the relationship between the values of the respective coefficients l, m and n of the chrominance function C ₂ (λ) of ΔS ₂ (Examples 25 to 47) and the visual evaluation. Fig. 13 and Fig. 14 show the triangular coordinates of 0≦1≦3 with vertex l being 3, 0≦m≦3 with vertex m being 3, and 0≦n≦3 with vertex n being 3, the coordinates Any point within, satisfies the relationship of l+m+n=3.

Fig. 13 and Fig. 14 show correlation coefficients between ΔV ₂ or ΔS ₂ and visual results (levels 1 to 4), and the correlation coefficient is -1 or more and 0.99 or less, and "○" is larger than -0.99. The following are indicated by "◇", those with a value greater than -0.97 -0.95, and "□" for those with a maximum of -0.95.

From Fig. 13 and Fig. 14, it is confirmed that ΔV ₂ and ΔS _{2 are different} , and the ratios of l, m, and n are close to 1 (x(λ), y(λ), and z(λ) When the ratio is approximately the same, the correlation with the visual evaluation is good, and the ratios of x(λ), y(λ), and z(λ) are at least one, and the correlation with the visual evaluation tends to be worse.

Further, it was confirmed that when ΔV ₂ , when the value of ΔV ₂ , l is large (when the ratio of x (λ) is high), the correlation with the visual evaluation is deteriorated, and when the values of m and n are large (y When the ratio of (λ) and z(λ) is high, there is a tendency to improve the correlation with the visual evaluation.

Claims (8)

A method for evaluating a substrate having a transparent electrode, characterized in that a spectral reflectance R _A (λ) of a substrate (A) having a transparent electrode in which a transparent dielectric layer and a transparent conductive film layer are sequentially laminated on a transparent substrate is measured And the spectral reflectance R _B (λ) of the substrate (B) in which the transparent conductive film layer of the substrate (A) having the transparent electrode is not present, and the spectral reflectance R _A (λ) and the spectral reflectance are calculated. R _B (λ) in the spectrum of the absolute value of the difference of △ R of each of the wavelength ([lambda]), obtained from the formula ₁ △ V 1 of values, or the following formula 2 obtained from the value △ S _1, is used as a transparent Evaluation index of the difference in visibility between the transparent electrode forming portion and the transparent electrode non-forming portion in the substrate having the transparent electrode and the transparent electrode; (where C ₁ (λ) is the sum of chrominance functions x(λ), y(λ), and z(λ), L(λ) is the source spectrum, the wavelength of λ-ray (nm), R _A ( λ), R _B (λ), ΔR (λ), x (λ), y (λ), z (λ), C ₁ (λ), and L (λ) are functions of λ, respectively. A method for evaluating a substrate having a transparent electrode, characterized in that a spectral reflectance R _A (λ) of a substrate (A) having a transparent electrode in which a transparent dielectric layer and a transparent conductive film layer are sequentially laminated on a transparent substrate is measured And the spectral reflectance R _B (λ) of the substrate (B) in which the transparent conductive film layer of the substrate (A) having the transparent electrode is not present, and the spectral reflectance R _A (λ) and the spectral reflectance are calculated. R _B (λ) in the spectrum of the absolute value of the difference of △ R of each of the wavelength ([lambda]), obtained from the formula 3 △ V ₂ of the value, or the following formula obtained from 4 △ S ₂ of the values used as a transparent The evaluation index of the difference between the visibility of the transparent electrode forming portion of the transparent electrode and the reflected light of the transparent electrode non-forming portion in which the electrode is patterned: (where C ₂ (λ) of the above Equation 3 uses the isochromatic functions x(λ), y(λ), and z(λ), and has the formula "C ₂ (λ) = l × x (λ) + m ×y(λ)+n×z(λ)” (wherein, l=0 to 1.25, m=0 to 2, n=0.4 to 3, and l+m+n=3), C _{2 of the} above formula 4 (λ) using the isochromatic functions x(λ), y(λ), and z(λ), and using the formula "C ₂ (λ) = l × x (λ) + m × y (λ) + n × z (λ)" (where l = 0 to 1.6, m = 0 to 1.6, n = 0.4 to 3, l + m + n = 3), L (λ) source spectrum, wavelength of λ-ray (nm λ ₁ is the lower limit wavelength (nm) of the visible light region, λ ₂ is the upper limit wavelength (nm) of the visible light region, and R _A (λ), R _B (λ), ΔR (λ), x (λ), y (λ), z(λ), C ₂ (λ) of the above formula 3, C ₂ (λ) and L (λ) of the above formula 4 are functions of λ, respectively. A method for manufacturing a substrate having a transparent electrode, wherein a transparent dielectric layer and a transparent conductive film layer are sequentially laminated on a transparent substrate, wherein the transparent electrode is formed by the method of claim 1 or 2 The evaluation of the substrate is based on the values of any of ΔV ₁ , ΔS ₁ , ΔV _{2 ,} and ΔS ₂ to determine the non-visibility. The method for producing a substrate having a transparent electrode according to the third aspect of the invention, wherein the determination result of the value of any one of ΔV ₁ , ΔS ₁ , ΔV ₂ and ΔS ₂ is fed back to adjust the transparent dielectric The film formation conditions of the layer and/or the transparent conductive film layer lower the value. A method of manufacturing a substrate having a transparent electrode according to claim 3 or 4, further comprising: ???the value of any of ΔV ₁ , ΔS ₁ , ΔV ₂ and ΔS ₂ after the evaluation The result of the determination is added to the step of the substrate having the transparent electrode. A method for producing a substrate having a transparent electrode according to claim 3 or 4, wherein the spectral reflectance R _B (λ) is measured as a spectral reflectance R _B (λ) after the film is formed on the transparent dielectric layer and The spectral reflectance of the substrate before the film formation of the transparent conductive film layer; and the spectral reflectance of the substrate having the transparent electrode after the film is formed on the transparent conductive film layer as the spectral reflectance R _A (λ). The method for producing a substrate having a transparent electrode according to claim 3 or 4, wherein the determination is based on the value of ΔV ₁ being 240% nm or less, or the value of ΔS ₁ being 7.0% nm or less. get on. A substrate having a transparent electrode, comprising: a substrate (A) having a transparent electrode in which a transparent dielectric layer and a transparent conductive film layer are sequentially laminated on a transparent substrate; and the substrate (A) having the transparent electrode not described above the transparent conductive film substrate (B), wherein: the spectral reflectance measurement of the spectral reflectance of the substrate having a transparent electrode (A) of R _A (λ), and said substrate (B) of R _B (λ), calculating the spectral reflectance R _A (λ) and the spectral reflectance R _B (λ) in the spectrum of the absolute value of the difference △ R of each of the wavelength (λ), the formula obtained from the value ₁ △ V 1 240% The value of ΔS ₁ obtained below nm or the following formula 2 is 7.0% nm or less: (where C ₁ (λ) is the sum of chrominance functions x(λ), y(λ), and z(λ), L(λ) is the source spectrum, the wavelength of λ-ray (nm), R _A ( λ), R _B (λ), ΔR (λ), x (λ), y (λ), z (λ), C ₁ (λ), and L (λ) are functions of λ, respectively.