TWI619561B - Rotating target - Google Patents

Rotating target Download PDF

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TWI619561B
TWI619561B TW105123863A TW105123863A TWI619561B TW I619561 B TWI619561 B TW I619561B TW 105123863 A TW105123863 A TW 105123863A TW 105123863 A TW105123863 A TW 105123863A TW I619561 B TWI619561 B TW I619561B
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target
rotating
conductive
target body
backing tube
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TW105123863A
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TW201803657A (en
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Yi-Sheng Wu
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Abstract

本創作關於一種旋轉靶材,其包含一靶材體、一背襯管及一接合件,該接合件係設置於該靶材體與該背襯管之間,且該接合件包含一可壓縮結構與導電導熱膠,該可壓縮結構為可壓縮毯或可壓縮片。利用所述接合件接合靶材體和背襯管不僅能有利於簡化旋轉靶材之製程,更得以在維持靶材體和背襯管之接合強度的同時,提升旋轉靶材之濺鍍功率耐受度,進而提升其濺鍍效率。The present invention relates to a rotating target comprising a target body, a backing tube and a joint member, the joint member being disposed between the target body and the backing tube, and the joint member comprising a compressible member The structure is electrically conductive and thermally conductive, and the compressible structure is a compressible blanket or a compressible sheet. The use of the joint member to join the target body and the backing tube can not only simplify the process of rotating the target, but also improve the sputtering strength of the rotating target while maintaining the bonding strength between the target body and the backing tube. The degree of acceptance increases the sputtering efficiency.

Description

旋轉靶材Rotating target

本創作關於濺鍍技術領域,尤指一種旋轉靶材。This creation relates to the field of sputtering technology, especially a rotating target.

磁控濺鍍法(magnetron sputtering)是藉由在濺鍍系統中加裝磁控裝置,藉由磁場與電場之間的電磁效應改變電漿內電子的移動,達到提高游離率與濺鍍效率之目的。傳統利用磁控濺鍍法濺鍍平面靶材時,其濺鍍行為會集中在切線磁場最強的靶材表面區域,形成跑道式的剝蝕,甚而使平面靶材應用於磁控濺鍍製程的使用率僅有約35%至50%。Magnetron sputtering is to increase the liberation rate and sputtering efficiency by adding a magnetic control device to the sputtering system to change the movement of electrons in the plasma by the electromagnetic effect between the magnetic field and the electric field. purpose. When sputtering a flat target with magnetron sputtering, the sputtering behavior will focus on the surface area of the target with the strongest tangential magnetic field, forming a runway-type ablation, and even applying the planar target to the magnetron sputtering process. The rate is only about 35% to 50%.

為設法解決平面靶材應用於磁控濺鍍製程所存在之問題,現有技術為進行磁控濺鍍製程時,會轉而選用旋轉靶材(rotatable sputtering target)進行。如台灣發明專利第I534283號所述,由於旋轉靶材於磁控濺鍍製程中可得到均勻的剝蝕表面,其不僅能將靶材使用率提升至70%至80%,更能有助於延長靶材的使用壽命、降低製造成本、提高製程產量,甚而改善所濺鍍而成之薄膜的品質。In order to solve the problem of the application of the planar target to the magnetron sputtering process, in the prior art, when the magnetron sputtering process is performed, the rotary sputtering target is used instead. As described in Taiwan Patent No. I534283, since the rotating target can obtain a uniform ablated surface in the magnetron sputtering process, it can not only increase the target utilization rate to 70% to 80%, but also contribute to the extension. The life of the target, reducing manufacturing costs, increasing process throughput, and even improving the quality of the sputtered film.

然而,旋轉靶材的靶材體與背襯管的接合技術遠比平面靶材的靶材體與平面背板的接合技術複雜許多,現有技術多半是利用低熔點金屬作為焊料,將此焊料填入旋轉靶材的靶材體與背襯管之間的間隙,以達到接合的目的。However, the bonding technique of the target body of the rotating target and the backing tube is much more complicated than the bonding technique of the target body of the planar target and the planar back sheet. Most of the prior art uses a low melting point metal as a solder to fill the solder. Enter the gap between the target body of the rotating target and the backing tube to achieve the purpose of joining.

由於中空柱狀的靶材體不易在焊合(bonding)時施加壓力,致使靶材體與背襯管之間的接合力較差,容易在一定溫度的濺鍍製程中發生靶材體與背襯管脫離的風險;且因背襯管、焊料與靶材體三者皆係由具有不同熱膨脹係數的材料所構成,於焊合或濺鍍製程中,在靶材體與焊料之間以及焊料與背襯管之間的界面上會隨著溫度變化而產生熱應力,當靶材體經一段濺鍍時間而變薄時,即可能造成應力大於靶材體強度的情形,而使靶材體產生破裂。Since the hollow columnar target body is not easy to apply pressure during bonding, the bonding force between the target body and the backing tube is poor, and the target body and the backing are easily generated in a sputtering process at a certain temperature. The risk of tube detachment; and because the backing tube, solder and target body are composed of materials with different coefficients of thermal expansion, in the soldering or sputtering process, between the target body and the solder and between the solder and the solder The interface between the backing tubes will generate thermal stress with temperature change. When the target body is thinned by a sputtering time, the stress may be greater than the strength of the target body, and the target body may be generated. rupture.

此外,當焊料凝固時,其體積可能會收縮而產生界面收縮應力。濺鍍時累積的熱和應力常常導致接合層從背襯管或靶材體脫離,若此脫離的面積大到某個程度,則濺鍍時熱從靶材體傳遞到背襯管的量會急遽減少,導致靶材體之局部過熱,從而引起更不均勻的熱應力,終致在濺鍍期間造成靶材體破裂,而中斷薄膜沉積的製程。In addition, when the solder solidifies, its volume may shrink to cause interfacial shrinkage stress. The heat and stress accumulated during sputtering often cause the bonding layer to be detached from the backing tube or the target body. If the area of the detachment is large to some extent, the amount of heat transferred from the target body to the backing tube during sputtering will be The rapid reduction leads to local overheating of the target body, which causes more uneven thermal stress, which eventually causes the target body to rupture during sputtering, interrupting the film deposition process.

有鑑於上述技術問題,現有技術提出二種不同的技術手段,以設法改善靶材體產生破裂之問題。In view of the above technical problems, the prior art proposes two different technical means to try to improve the problem of cracking of the target body.

如日本專利特開平6-301156號公報及日本專利特開平6-300734號公報所揭示之內容,其中一種技術手段是將一熱膨脹係數介於焊料與靶材體的物質塗佈於焊料與靶材體的接合面,於此接合面形成一中間層,以透過該中間層降低因溫度變化所造成的應力。然而,採用此種方式不僅無法具體克服旋轉靶材之靶材體與背襯管脫離的風險,且利用此種方式降低應力更會複雜化接合製程,而徒增旋轉靶材的製造成本。One of the technical means is to apply a substance having a coefficient of thermal expansion between the solder and the target body to the solder and the target, as disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. 6-301156. The joint surface of the body forms an intermediate layer on the joint surface to reduce the stress caused by the temperature change through the intermediate layer. However, in this way, it is not only impossible to specifically overcome the risk of the target body of the rotating target being detached from the backing tube, and the use of such a method to reduce the stress more complicates the joining process, and increases the manufacturing cost of the rotating target.

再如台灣發明專利第555874號所揭示之內容,另一種技術手段是採用具有壓縮性的接合材料取代焊料,利用此種接合材料接合靶材體與背襯管。然而,採用較疏鬆的材料做為接合材料則無法順利將濺鍍時靶材體所累積的熱量帶走,致使旋轉靶材之濺鍍功率耐受度較差,而難以有效地延長旋轉靶材的使用壽命。Further, as disclosed in Taiwan Patent No. 555874, another technical means is to replace the solder with a compressive bonding material, and the bonding material is used to bond the target body and the backing tube. However, the use of a relatively loose material as a bonding material does not smoothly carry away the heat accumulated by the target body during sputtering, so that the sputtering target power tolerance of the rotating target is poor, and it is difficult to effectively extend the rotating target. Service life.

有鑑於上述技術缺陷,本創作之一目的在於簡化旋轉靶材之製程。本創作另一目的在於兼顧旋轉靶材中靶材體與背襯管之間的接合力的同時,提升旋轉靶材於濺鍍時之功率耐受度,進而延長旋轉靶材之使用壽命、提升旋轉靶材之濺鍍效率。In view of the above technical deficiencies, one of the aims of the present invention is to simplify the process of rotating a target. Another purpose of this creation is to balance the joint force between the target body and the backing tube in the rotating target, and improve the power tolerance of the rotating target during sputtering, thereby prolonging the service life and lifting of the rotating target. The sputtering efficiency of the rotating target.

為達成前述目的,本創作提供一種旋轉靶材,該旋轉靶材包含一靶材體、一背襯管及一接合件,該接合件係設置於靶材體和背襯管之間,用以緊密接合靶材體與背襯管。其中,該接合件包含一可壓縮結構與導電導熱膠,該可壓縮結構為可壓縮毯或可壓縮片。In order to achieve the foregoing object, the present invention provides a rotating target comprising a target body, a backing tube and a joint member, the joint member being disposed between the target body and the backing tube for The target body and the backing tube are tightly joined. Wherein, the joint member comprises a compressible structure and a conductive thermally conductive adhesive, and the compressible structure is a compressible blanket or a compressible sheet.

較佳的,所述接合件係由吸附有該導電導熱膠之可壓縮結構所形成。據此,由可壓縮結構和導電導熱膠所構成之複合接合件不僅能提供接合、導電以及導熱等功能外,由於其更具有微幅的形變能力,故可有利於消除接合製程及濺鍍製程中所產生的應力,從而抑制靶材體破裂的起因,增加靶材的濺鍍功率耐受度。Preferably, the joint member is formed by a compressible structure in which the conductive paste is adsorbed. Accordingly, the composite joint member composed of the compressible structure and the conductive heat conductive adhesive can not only provide the functions of bonding, conduction, heat conduction, etc., but also has a slight deformation capability, thereby facilitating the elimination of the bonding process and the sputtering process. The stress generated in the film, thereby suppressing the cause of the fracture of the target body, and increasing the sputtering power tolerance of the target.

較佳的,所述接合件之可壓縮結構可為兼具導電性、導熱性和可壓縮性之結構,該可壓縮結構之材料例如:石墨毯、石墨片、碳毯、碳片、金屬線或其組合。Preferably, the compressible structure of the joint member can be a structure having both electrical conductivity, thermal conductivity and compressibility, such as graphite blanket, graphite sheet, carbon blanket, carbon sheet, metal wire. Or a combination thereof.

較佳的,於其中一實施態樣中,該接合件之導電導熱膠係由熱固性樹脂所組成。Preferably, in one embodiment, the conductive and thermally conductive adhesive of the bonding member is composed of a thermosetting resin.

較佳的,於另一實施態樣中,所述接合件之導電導熱膠包含導電粒子和熱固性樹脂,該導電粒子可為鋁粒子、金粒子、銀粒子、銅粒子、鋅粒子、鐵粒子、鎳粒子或其組合,但並非僅限於此;而熱固性樹脂可為一黏合樹脂,其材料可為環氧樹脂,但並非僅限於此。據此,當吸附有導電導熱膠之可壓縮結構裝入背襯管與靶材體之間的間隙後,可利用簡單的加熱步驟完成整個旋轉靶材的接合製程,實現簡化旋轉靶材的製程之目的。Preferably, in another embodiment, the conductive conductive paste of the bonding member comprises conductive particles and a thermosetting resin, and the conductive particles may be aluminum particles, gold particles, silver particles, copper particles, zinc particles, iron particles, The nickel particles or a combination thereof is not limited thereto; and the thermosetting resin may be a binder resin, and the material may be an epoxy resin, but is not limited thereto. Accordingly, after the compressible structure adsorbing the conductive paste is loaded into the gap between the backing tube and the target body, a simple heating step can be used to complete the bonding process of the entire rotating target, thereby simplifying the process of rotating the target. The purpose.

較佳的,該導電導熱膠中導電粒子的含量為10體積百分比至60體積百分比。Preferably, the conductive particles in the conductive paste have a content of 10 to 60% by volume.

舉例而言,其導電導熱膠可為如各種市售兼具導電性和導熱性的產品,例如:3M公司販售的AF30產品或EC1660產品或其他東芝(GE)或陶氏化學公司販售的產品。For example, the conductive paste can be, for example, a variety of commercially available products that are both electrically conductive and thermally conductive, such as AF30 or EC1660 sold by 3M or other Toshiba (GE) or Dow Chemical Company. product.

較佳的,該接合件之導熱係數大於20 W/m,該接合件之電阻係數小於5 x10 -3Ω˙cm。 Preferably, the bonding member has a thermal conductivity greater than 20 W/m, and the bonding member has a resistivity of less than 5 x 10 -3 Ω ̇cm.

較佳的,所述靶材體可為中空狀靶材體,該靶材體可由陶瓷材料、金屬材料或複合材料所製得,例如:鋁鋅氧化物、銦鎵氧化物、硼鋅氧化物、鉬、鈮或其組合,但並非僅限於此。Preferably, the target body may be a hollow target body, and the target body may be made of a ceramic material, a metal material or a composite material, for example: aluminum zinc oxide, indium gallium oxide, boron zinc oxide , molybdenum, niobium or a combination thereof, but not limited to this.

較佳的,所述背襯管可為具高強度、高導熱性之金屬所製得,例如:銅、含銅合金、含鋁合金、鈦或不銹鋼,但並非僅限於此。Preferably, the backing tube can be made of a metal having high strength and high thermal conductivity, such as copper, a copper-containing alloy, an aluminum alloy-containing, titanium or stainless steel, but is not limited thereto.

依據本創作,利用兼具導電性、導熱性及壓縮性的接合件接合靶材體與背襯管不僅能有利於簡化旋轉靶材之製程,更能在確保旋轉靶材之靶材體與背襯管能夠緊密接合(即維持靶材體與背襯管之間具有一定接合強度)的同時,提升旋轉靶材之濺鍍功率耐受度,進而縮短濺鍍製程所需之時間、提升旋轉靶材之濺鍍效率。According to the present invention, the use of a joint member having electrical conductivity, thermal conductivity and compressibility to join the target body and the backing tube can not only simplify the process of rotating the target but also ensure the target body and the back of the rotating target. The liner can be tightly joined (ie, maintain a certain bonding strength between the target body and the backing tube), while improving the sputtering power tolerance of the rotating target, thereby shortening the time required for the sputtering process and improving the rotating target Sputtering efficiency of the material.

以下列舉數種旋轉靶材作為例示,說明本創作之實施方式;熟習此技藝者可經由本說明書之內容輕易地了解本創作所能達成之優點與功效,並且於不悖離本創作之精神下進行各種修飾與變更,以施行或應用本創作之內容。The following is a description of several rotating targets as an example to illustrate the implementation of the present invention; those skilled in the art can easily understand the advantages and effects of the present invention through the contents of the present specification, and do not deviate from the spirit of the present creation. Various modifications and changes are made to implement or apply the content of this creation.

本實驗係選用各種不同材料的接合件將不同的材料的靶材體與背襯管接合,製得實施例1及2與比較例1至6之旋轉靶材。各實施例與比較例之旋轉靶材的具體製備方法係如下所述。In this experiment, the target bodies of different materials were joined to the backing tube by using joint members of various materials, and the rotating targets of Examples 1 and 2 and Comparative Examples 1 to 6 were obtained. The specific preparation method of the rotating target of each of the examples and the comparative examples is as follows.

實施例Example 11 and 22

首先,準備一背襯管,其內徑為125 mm、外徑為133 mm,長度為1500 mm。各實施例與比較例之背襯管的材料係如下表1所示。First, prepare a backing tube with an inner diameter of 125 mm, an outer diameter of 133 mm and a length of 1500 mm. The materials of the backing tubes of the respective examples and comparative examples are shown in Table 1 below.

接著,將靶材體之原料藉由燒結或熔鑄、加工等製程後形成、內徑為142 mm、外徑為154 mm、長度為700 mm的中空狀靶材體。各實施例與比較例之靶材體的材料係如下表1所示。於此,當製作實施例1之旋轉靶材之中空狀靶材體時,係將銦錫氧化物(ITO)藉由燒結及加工等製程形成前述之中空狀靶材體;當製作實施例2之旋轉靶材之中空狀靶材體時,係將鉬(Mo)藉由熔鑄及加工等製程形成前述之中空狀靶材體。Next, a hollow target body having an inner diameter of 142 mm, an outer diameter of 154 mm, and a length of 700 mm is formed by a process of sintering, casting, or the like. The materials of the target bodies of the respective examples and comparative examples are shown in Table 1 below. Here, when the hollow target body of the rotating target of the first embodiment is produced, the indium tin oxide (ITO) is formed into a hollow target body by a process such as sintering and processing; When the hollow target body of the target is rotated, the hollow target body is formed by a process such as casting and processing of molybdenum (Mo).

然後,如圖1所示,選用組裝輔助工具A,先將背襯管10裝載於組裝輔助工具A上,再將背襯管10與浸含有導電導熱膠的石墨毯組裝至中空狀靶材體20中,再將此含有中空狀靶材體20、含有石墨毯與導電導熱膠之接合件30以及背襯管10的組件加熱至250°C至450°C中持溫5分鐘,而後置於室溫中逐漸冷卻,即製得該旋轉靶材。各實施例之接合件的材料係如下表1所示。Then, as shown in FIG. 1, the assembly aid A is selected, the backing tube 10 is first loaded on the assembly aid A, and the backing tube 10 and the graphite blanket impregnated with the conductive thermal adhesive are assembled to the hollow target body. In 20, the assembly containing the hollow target body 20, the joint member 30 containing the graphite blanket and the conductive paste, and the backing tube 10 is heated to 250 ° C to 450 ° C for 5 minutes, and then placed. The rotating target is obtained by gradually cooling at room temperature. The materials of the joint members of the respective examples are shown in Table 1 below.

更具體而言,於實施例1中,該導電導熱膠係由熱固性樹脂所組成,而不含有金屬粉末;而於實施例2中,該導電導熱膠包含金屬粉末和熱固性樹脂,且該導電導熱膠中含有10 vol%至60 vol%的鋁或銅金屬粉末。More specifically, in Embodiment 1, the conductive thermally conductive adhesive is composed of a thermosetting resin and does not contain a metal powder; and in Embodiment 2, the conductive thermally conductive adhesive comprises a metal powder and a thermosetting resin, and the conductive heat conduction The glue contains 10 vol% to 60 vol% of aluminum or copper metal powder.

比較例Comparative example 11 and 22

首先,準備一背襯管,其內徑為125 mm、外徑為133 mm,長度為1500 mm。各比較例之背襯管的材料係如下表1所示。First, prepare a backing tube with an inner diameter of 125 mm, an outer diameter of 133 mm and a length of 1500 mm. The materials of the backing tube of each comparative example are shown in Table 1 below.

接著,將靶材體之原料藉由燒結或熔鑄、加工等製程後形成、內徑為142 mm、外徑為154 mm、長度為700 mm的中空狀靶材體。各比較例之靶材體的材料係如下表1所示。當製作比較例1之旋轉靶材之中空狀靶材體時,係將鋁鋅氧化物(AZO)藉由燒結及加工等製程形成前述之中空狀靶材體;當製作比較例2之旋轉靶材之中空狀靶材體時,則係將鈮(Nb)藉由熔鑄及加工等製程形成前述之中空狀靶材體。Next, a hollow target body having an inner diameter of 142 mm, an outer diameter of 154 mm, and a length of 700 mm is formed by a process of sintering, casting, or the like. The materials of the target bodies of the respective comparative examples are shown in Table 1 below. When the hollow target body of the rotating target of Comparative Example 1 was produced, the aluminum zinc oxide (AZO) was formed into a hollow target body by a process such as sintering and processing; when the rotary target of Comparative Example 2 was produced In the case of a hollow target body, the hollow target body is formed by a process such as casting and processing of niobium (Nb).

最後,將上述中空狀靶材體插入背襯管中,並置於170°C的環境中,再將熔融的銦焊料導入中空狀靶材體與背襯管之間的間隙,將此含有中空狀靶材體、銦接合材料及背襯管的組件置於室溫中逐漸冷卻,即製得比較例1及2之旋轉靶材。Finally, the hollow target body is inserted into the backing tube and placed in an environment of 170 ° C, and the molten indium solder is introduced into the gap between the hollow target body and the backing tube to contain the hollow shape. The components of the target body, the indium bonding material, and the backing tube were gradually cooled at room temperature, and the rotating targets of Comparative Examples 1 and 2 were obtained.

比較例Comparative example 33 and 44

首先,準備一背襯管,其內徑為125 mm、外徑為133 mm,長度為1500 mm。各比較例之背襯管的材料係如下表1所示。First, prepare a backing tube with an inner diameter of 125 mm, an outer diameter of 133 mm and a length of 1500 mm. The materials of the backing tube of each comparative example are shown in Table 1 below.

接著,將靶材體之原料藉由燒結或熔鑄、加工等製程後形成、內徑為142 mm、外徑為154 mm、長度為700 mm的中空狀靶材體。各比較例之靶材體的材料係如下表1所示。當製作比較例3之旋轉靶材之中空狀靶材體時,則係將鈮藉由熔鑄及加工等製程形成前述之中空狀靶材體;當製作比較例4之旋轉靶材之中空狀靶材體時,係將鋁鋅氧化物藉由燒結及加工等製程形成前述之中空狀靶材體。Next, a hollow target body having an inner diameter of 142 mm, an outer diameter of 154 mm, and a length of 700 mm is formed by a process of sintering, casting, or the like. The materials of the target bodies of the respective comparative examples are shown in Table 1 below. When the hollow target body of the rotating target of Comparative Example 3 was produced, the hollow target body was formed by a process such as casting and processing, and a hollow target of the rotating target of Comparative Example 4 was produced. In the case of the material, the aluminum-zinc oxide is formed into a hollow target body by a process such as sintering and processing.

最後,將上述中空狀靶材體插入背襯管中,並將含有10 vol%至60 vol%鋁金屬粉末的導電導熱之熱固性樹脂(於下表1中簡稱導電導熱膠)導入中空狀靶材體與背襯管之間的間隙,再將此含有中空狀靶材體、導電導熱膠及背襯管的組件加熱至250°C至450°C中持溫5分鐘,而後置於室溫中逐漸冷卻,即製得比較例3及4之旋轉靶材。Finally, the hollow target body is inserted into the backing tube, and an electrically and thermally conductive thermosetting resin (referred to as conductive heat conductive glue in Table 1 below) containing 10 vol% to 60 vol% of aluminum metal powder is introduced into the hollow target. The gap between the body and the backing tube is heated to 250 ° C to 450 ° C for 5 minutes, and then placed at room temperature, and the assembly containing the hollow target body, the conductive paste and the backing tube is heated. The rotating target of Comparative Examples 3 and 4 was obtained by gradually cooling.

於比較例3及4中,用於形成接合件的導電導熱膠係由含有10 vol%至60 vol%鋁金屬粉末的導電導熱熱固性樹脂所組成。In Comparative Examples 3 and 4, the electroconductive thermally conductive adhesive for forming the joint member was composed of an electrically and thermally conductive thermosetting resin containing 10 vol% to 60 vol% of the aluminum metal powder.

比較例Comparative example 55 and 66

首先,準備一背襯管,其內徑為125 mm、外徑為133 mm,長度為1500 mm。各實施例與比較例之背襯管的材料係如下表1所示。First, prepare a backing tube with an inner diameter of 125 mm, an outer diameter of 133 mm and a length of 1500 mm. The materials of the backing tubes of the respective examples and comparative examples are shown in Table 1 below.

接著,將靶材體之原料藉由燒結或熔鑄、加工等製程後形成、內徑為142 mm、外徑為154 mm、長度為700 mm的中空狀靶材體。各實施例與比較例之靶材體的材料係如下表1所示。於此,當製作比較例5之旋轉靶材之中空狀靶材體時,係將銦錫氧化物藉由燒結及加工等製程形成前述之中空狀靶材體;當製作比較例6之旋轉靶材之中空狀靶材體時,係將鉬藉由熔鑄及加工等製程形成前述之中空狀靶材體。Next, a hollow target body having an inner diameter of 142 mm, an outer diameter of 154 mm, and a length of 700 mm is formed by a process of sintering, casting, or the like. The materials of the target bodies of the respective examples and comparative examples are shown in Table 1 below. Here, when the hollow target body of the rotating target of Comparative Example 5 is produced, the in-line hollow target body is formed by sintering, processing, or the like; and the rotating target of Comparative Example 6 is produced. In the case of a hollow target body, the above-described hollow target body is formed by a process such as casting and processing of molybdenum.

然後,如圖1所示,選用組裝輔助工具A,先將背襯管10裝載於組裝輔助工具A上,再將背襯管10與接合件30組裝至中空狀靶材體20中,即製得比較例5及6之旋轉靶材。各實施例與比較例之接合件的材料係如下表1所示。 表1:實施例1及2、比較例1至6之旋轉靶材中靶材體、背襯管及接合件之材料以及實施例1及2、比較例1至6之旋轉靶材之剪力拉伸強度及其所適用之最大耐受功率。 <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> 樣品編號 </td><td> 靶材體 </td><td> 背襯管 </td><td> 接合件 </td><td> 剪力拉伸強度(kg/cm<sup>2</sup>) </td><td> 最大耐受功率(kW/m<sup>2</sup>) </td></tr><tr><td> 實施例1 </td><td> ITO </td><td> Ti </td><td> 石墨毯及 導電導熱膠 </td><td> 21 </td><td> 20.2 </td></tr><tr><td> 實施例2 </td><td> Mo </td><td> 304不銹鋼 </td><td> 石墨毯及 導電導熱膠 </td><td> 21 </td><td> 21.7 </td></tr><tr><td> 比較例1 </td><td> AZO </td><td> 304不銹鋼 </td><td> 銦焊料 </td><td> -- </td><td> 12.2 </td></tr><tr><td> 比較例2 </td><td> Nb </td><td> Ti </td><td> 銦焊料 </td><td> -- </td><td> 13.6 </td></tr><tr><td> 比較例3 </td><td> Nb </td><td> 304不銹鋼 </td><td> 導電導熱膠 </td><td> 26 </td><td> 10.9 </td></tr><tr><td> 比較例4 </td><td> AZO </td><td> Ti </td><td> 導電導熱膠 </td><td> 25 </td><td> 9.1 </td></tr><tr><td> 比較例5 </td><td> ITO </td><td> 304不銹鋼 </td><td> 石墨毯 </td><td> -- </td><td> 9.7 </td></tr><tr><td> 比較例6 </td><td> Mo </td><td> Ti </td><td> 石墨毯 </td><td> -- </td><td> 11.0 </td></tr></TBODY></TABLE>Then, as shown in FIG. 1, the assembly aid A is selected, the backing tube 10 is first loaded on the assembly aid A, and the backing tube 10 and the joint 30 are assembled into the hollow target body 20, that is, The rotating targets of Comparative Examples 5 and 6 were obtained. The materials of the joint members of the respective examples and comparative examples are shown in Table 1 below. Table 1: Materials of the target body, the backing tube and the joint in the rotating target of Examples 1 and 2, and the shearing force of the rotating targets of Examples 1 and 2 and Comparative Examples 1 to 6 Tensile strength and its maximum withstand power.  <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> sample number</td><td> target body</td><td> backing Tube </td><td> joint piece </td><td> shear tensile strength (kg/cm<sup>2</sup>) </td><td> maximum withstand power (kW/m <sup>2</sup>) </td></tr><tr><td> Example 1 </td><td> ITO </td><td> Ti </td><td> Graphite Blanket and conductive thermal paste</td><td> 21 </td><td> 20.2 </td></tr><tr><td> Example 2 </td><td> Mo </td> <td> 304 stainless steel</td><td> graphite blanket and conductive thermal paste</td><td> 21 </td><td> 21.7 </td></tr><tr><td> Comparative example 1 </td><td> AZO </td><td> 304 stainless steel</td><td> Indium solder</td><td> -- </td><td> 12.2 </td></ Tr><tr><td> Comparative Example 2 </td><td> Nb </td><td> Ti </td><td> Indium Solder</td><td> -- </td>< Td> 13.6 </td></tr><tr><td> Comparative Example 3 </td><td> Nb </td><td> 304 Stainless Steel </td><td> Conductive Thermal Conductive Adhesive</td ><td> 26 </td><td> 10.9 </td></tr><tr><td> Comparative Example 4 </td><td> AZO </td><td> Ti </td> <td> Conductive and Thermally Conductive Adhesive</td><td> 25 </td><td> 9.1 </td></tr><tr><td> Comparative Example 5 </td><td> ITO </td ><td> 304 Rust steel</td><td> graphite blanket</td><td> -- </td><td> 9.7 </td></tr><tr><td> Comparative Example 6 </td>< Td> Mo </td><td> Ti </td><td> graphite blanket</td><td> -- </td><td> 11.0 </td></tr></TBODY>< /TABLE>

經由前述製備方法,各實施例與比較例所製得之旋轉靶材係具有如圖2所示之結構。該旋轉靶材具有一背襯管10、一中空狀靶材體20及一接合件30,該接合件30設置於該背襯管10和該中空狀靶材體20之間,以接合該背襯管10和該中空狀靶材體20。其中,該中空狀靶材體20之內徑D2大於該背襯管10之內徑D1大約9 mm,且該中空狀靶材體20與背襯管10之間的間隙係供容置前述接合件30。Through the above preparation methods, the rotary target obtained by each of the examples and the comparative examples has a structure as shown in FIG. The rotating target has a backing tube 10, a hollow target body 20 and a joint member 30. The joint member 30 is disposed between the backing tube 10 and the hollow target body 20 to engage the back. The liner 10 and the hollow target body 20. The inner diameter D2 of the hollow target body 20 is greater than the inner diameter D1 of the backing tube 10 by about 9 mm, and the gap between the hollow target body 20 and the backing tube 10 is for accommodating the joint. Item 30.

試驗例Test case 11 :接合強度: joint strength

本試驗例係選用前述實施例1及2和比較例3及4之旋轉靶材為試驗對象,將各旋轉靶材切下一試片進行剪力拉伸測試(shear test),以評估各旋轉靶材之接合強度。各試片之幾何外形剖面係如圖3所示。In this test example, the rotating targets of the foregoing Examples 1 and 2 and Comparative Examples 3 and 4 were selected as test objects, and each rotating target was cut into test pieces for shear test to evaluate each rotation. The joint strength of the target. The geometric profile of each test piece is shown in Figure 3.

各試片全長166 mm,寬10 mm。其中,中空狀靶材體與背襯管各長度為83 mm、厚度為3 mm,接合件之長度為20 mm、厚度為4.5 mm。Each test piece has a total length of 166 mm and a width of 10 mm. Among them, the hollow target body and the backing tube have a length of 83 mm and a thickness of 3 mm, and the length of the joint member is 20 mm and the thickness is 4.5 mm.

接著,如圖3所示,以萬能試驗機執行試驗時,利用夾具夾住試片兩端(即,位於接合件30上的背襯管10之末端為試片其中一端,位於接合件30上另一側的靶材體20之末端為試片另一端),其中一端固定、另一端以50 mm/min之速率施予一拉力F拉伸試片,並記錄試片破壞時的平均剪應力,其結果如上表1所示。Next, as shown in FIG. 3, when the test is performed by the universal testing machine, the end of the test piece is clamped by the jig (that is, the end of the backing tube 10 on the engaging member 30 is one end of the test piece, and is located on the engaging piece 30. The other end of the target body 20 is the other end of the test piece), one end of which is fixed, and the other end is applied with a tensile force F tensile test piece at a rate of 50 mm/min, and the average shear stress at the time of failure of the test piece is recorded. The results are shown in Table 1 above.

如表1所示,不論是實施例1之陶瓷旋轉靶材或實施例2之金屬旋轉靶材,利用石墨毯及導電導熱膠作為接合件之材料,所製得之旋轉靶材的接合強度皆可達到如同比較例3及4之旋轉靶材的接合強度。實驗結果顯示,選用石墨毯及導電導熱膠作為接合件之材料,仍可有效接合靶材體與背襯管之目的,獲得具有良好接合性的旋轉靶材。As shown in Table 1, whether it is the ceramic rotating target of the first embodiment or the metal rotating target of the second embodiment, the bonding strength of the rotating target is obtained by using the graphite blanket and the conductive thermal conductive adhesive as the material of the joint member. The joint strengths of the rotating targets as in Comparative Examples 3 and 4 were attained. The experimental results show that the graphite blanket and the conductive thermal adhesive can be used as the material of the joint, and the target body and the backing tube can be effectively joined to obtain a rotating target with good jointability.

試驗例Test case 22 :最大耐受功率: Maximum withstand power

本試驗例選用前述實施例1及2和比較例1至6之旋轉靶材為試驗對象,將各旋轉靶材置入一濺鍍室中,該濺鍍室包含一直流電源供應器、一接地遮蔽物、一氣體入口、一真空泵以及一可供置放基板的基座。於進行濺鍍時,將旋轉靶材與電源陰極相連,並置入一基板於該濺鍍室中,再通入流量20 sccm之氬氣,以100 W至1500 W的直流電功率、濺鍍室維持5 mtorr真空度下進行濺鍍製程。In this test example, the rotating targets of the foregoing Examples 1 and 2 and Comparative Examples 1 to 6 were selected as test objects, and each of the rotating targets was placed in a sputtering chamber, which included a DC power supply and a grounding. A shield, a gas inlet, a vacuum pump, and a base for the substrate to be placed. In the sputtering process, the rotating target is connected to the power cathode, and a substrate is placed in the sputtering chamber, and then argon gas with a flow rate of 20 sccm is applied to the DC power of 100 W to 1500 W, and the sputtering chamber is used. The sputtering process is maintained at a vacuum of 5 mtorr.

接著,於前述直流電功率之範圍內逐步提高濺鍍功率,並觀察旋轉靶材於特定濺鍍功率下是否發生靶材體與背襯管之焊合失效而導致靶材體無法隨著背襯管一起轉動或發生靶材體破裂等狀況,當觀察到前述狀況時記錄下當時施加之直流電功率,以直流電功率相對於靶材體之面積,即為該旋轉靶材所能承受之最大耐受功率。其結果如上表1所示。Then, gradually increase the sputtering power within the range of the DC power, and observe whether the rotating target has a welding failure of the target body and the backing tube at a specific sputtering power, so that the target body cannot follow the backing tube. Rotating together or causing the target body to rupture, etc., when the foregoing conditions are observed, the DC power applied at that time is recorded, and the DC power is relative to the area of the target body, which is the maximum withstand power that the rotating target can withstand. . The results are shown in Table 1 above.

如上表1所示,不論是實施例1之陶瓷旋轉靶材或實施例2之金屬旋轉靶材,利用石墨毯及導電導熱膠作為接合件之材料,實施例1及2之旋轉靶材於濺鍍時之最大耐受功率皆大於比較例1至6之旋轉靶材於濺鍍時之最大耐受功率,顯示實施例1及2之旋轉靶材的濺鍍功率耐受度明顯優於比較例1至6之旋轉靶材的濺鍍功率耐受度;尤其,實施例1及2之旋轉靶材於濺鍍時之最大耐受功率更顯著大於比較例1及2之旋轉靶材於濺鍍時之最大耐受功率。As shown in Table 1 above, whether the ceramic rotating target of the first embodiment or the metal rotating target of the second embodiment uses a graphite blanket and a conductive thermal conductive adhesive as the material of the bonding member, the rotating targets of the embodiments 1 and 2 are splashed. The maximum withstand power at the time of plating was greater than the maximum withstand power of the rotating targets of Comparative Examples 1 to 6 at the time of sputtering, and the sputtering power tolerance of the rotating targets of Examples 1 and 2 was significantly better than that of the comparative example. Sputter power tolerance of the rotating target of 1 to 6; in particular, the maximum withstand power of the rotating target of Examples 1 and 2 during sputtering is significantly greater than that of the rotating target of Comparative Examples 1 and 2 The maximum withstand power at the time.

綜上所述,本創作選用石墨毯及導電導熱膠作為接合件之材料,利用此種接合件接合中空狀靶材體和背襯管不僅能兼顧前述二者之接合強度外,更能大幅地提升旋轉靶材的濺鍍功率耐受度,同時有助於提升旋轉靶材之濺鍍效率、延長旋轉靶材之使用壽命,甚而令本創作之旋轉靶材具有優越的發展潛力。In summary, the present invention uses a graphite blanket and a conductive thermal conductive adhesive as the material of the joint member. The joint of the hollow target body and the backing tube can not only take into account the joint strength of the two, but also greatly Improve the sputtering power tolerance of the rotating target, and at the same time help to improve the sputtering efficiency of the rotating target and extend the service life of the rotating target, which even makes the rotating target of the creation have superior development potential.

上述實施例僅係為說明本創作之例示,並非於任何方面限制本創作所主張之權利範圍。本創作所主張之權利範圍自應以申請專利範圍所述為準,而非僅限於上述具體實施例。The above-described embodiments are merely illustrative of the present invention and are not intended to limit the scope of the claims claimed herein. The scope of the claims claimed herein is based on the scope of the patent application, and is not limited to the specific embodiments described above.

10 背襯管 20 中空狀靶材體 30 接合件 A 組裝輔助工具 D1 外徑 D2 內徑 F 拉力10 Backing tube 20 Hollow target body 30 Engagement A Assembly aid D1 Outer diameter D2 Inside diameter F Tension

圖1為製作實施例1及2與比較例5及6之旋轉靶材時,利用組裝輔助工具將背襯管與接合件組裝至靶材體上之接合示意圖; 圖2為旋轉靶材的剖面結構示意圖;以及 圖3為用於進行剪力拉伸測試的試片之剖面示意圖。1 is a schematic view showing the joining of a backing tube and a joint member to a target body by using an assembly aid when manufacturing the rotating targets of Examples 1 and 2 and Comparative Examples 5 and 6; FIG. 2 is a cross section of the rotating target. Schematic diagram of the structure; and Figure 3 is a schematic cross-sectional view of a test piece for performing a shear tensile test.

Claims (9)

一種旋轉靶材,其包含一靶材體、一背襯管及一接合件,該接合件係設置於該靶材體與該背襯管之間,且該接合件包含一可壓縮結構與導電導熱膠,該可壓縮結構為石墨毯、石墨片、碳毯、碳片或其組合。 A rotating target comprising a target body, a backing tube and a joint member disposed between the target body and the backing tube, and the joint member comprises a compressible structure and a conductive A thermally conductive adhesive, the compressible structure being a graphite blanket, a graphite sheet, a carbon blanket, a carbon sheet, or a combination thereof. 如請求項1所述之旋轉靶材,其中該接合件係由吸附有該導電導熱膠之可壓縮結構所形成。 A rotating target according to claim 1, wherein the engaging member is formed of a compressible structure to which the conductive thermally conductive adhesive is adsorbed. 如請求項1所述之旋轉靶材,其中該接合件之導熱係數大於20W/m。 The rotating target of claim 1, wherein the bonding member has a thermal conductivity greater than 20 W/m. 如請求項1所述之旋轉靶材,其中該接合件之電阻係數小於5 x10-3Ω˙cm。 The rotating target of claim 1, wherein the joint has a resistivity of less than 5 x 10 -3 Ω ̇cm. 如請求項1所述之旋轉靶材,其中該接合件之導電導熱膠係由熱固性樹脂所組成。 The rotating target according to claim 1, wherein the conductive thermally conductive adhesive of the joining member is composed of a thermosetting resin. 如請求項1所述之旋轉靶材,其中該接合件之導電導熱膠包含複數導電粒子和一熱固性樹脂,該等導電粒子的含量為10體積百分比至60體積百分比。 The rotating target according to claim 1, wherein the conductive conductive paste of the bonding member comprises a plurality of conductive particles and a thermosetting resin, and the conductive particles are contained in an amount of from 10% by volume to 60% by volume. 如請求項6所述之旋轉靶材,其中該等導電粒子為鋁粒子、金粒子、銀粒子、銅粒子、鋅粒子、鐵粒子、鎳粒子或其組合。 The rotating target of claim 6, wherein the conductive particles are aluminum particles, gold particles, silver particles, copper particles, zinc particles, iron particles, nickel particles, or a combination thereof. 如請求項1至7中任一項所述之旋轉靶材,其中該靶材體係由陶瓷材料、金屬材料或複合材料所製得。 A rotating target according to any one of claims 1 to 7, wherein the target system is made of a ceramic material, a metal material or a composite material. 如請求項1至7中任一項所述之旋轉靶材,其中該背襯管之材料為銅、含銅合金、含鋁合金、鈦或不銹鋼。 The rotating target of any one of claims 1 to 7, wherein the material of the backing tube is copper, a copper-containing alloy, an aluminum alloy-containing, titanium or stainless steel.
TW105123863A 2016-07-28 2016-07-28 Rotating target TWI619561B (en)

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US20040074770A1 (en) * 2002-07-02 2004-04-22 George Wityak Rotary target
US20070074969A1 (en) * 2005-10-03 2007-04-05 Simpson Wayne R Very long cylindrical sputtering target and method for manufacturing
TW201114935A (en) * 2009-07-13 2011-05-01 Applied Materials Inc Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield
TW201228589A (en) * 2010-10-26 2012-07-01 Henkel Corp Composite film for board level EMI shielding
TW201229278A (en) * 2010-11-24 2012-07-16 Plansee Se Method for separating target of rotary target

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Publication number Priority date Publication date Assignee Title
US20040074770A1 (en) * 2002-07-02 2004-04-22 George Wityak Rotary target
US20070074969A1 (en) * 2005-10-03 2007-04-05 Simpson Wayne R Very long cylindrical sputtering target and method for manufacturing
TW201114935A (en) * 2009-07-13 2011-05-01 Applied Materials Inc Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield
TW201228589A (en) * 2010-10-26 2012-07-01 Henkel Corp Composite film for board level EMI shielding
TW201229278A (en) * 2010-11-24 2012-07-16 Plansee Se Method for separating target of rotary target

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