TWI612449B - Touch sensing electrode - Google Patents

Abstract

A touch sensitive electrode is disclosed, comprising: a sensing electrode comprising a first pattern formed in a first direction and a second pattern formed in a second direction; a metal bridge electrode configured to Electrically connecting the separation unit pattern of the second pattern; and a light shielding insulator interposed between the sensing pattern and the metal bridge electrode, and formed on a visible side based on the metal bridge electrode, and thus Due to the difference in reflectivity at each location, the visibility of the pattern can be minimized.

Description

Touch electrode

The invention relates to a touch sensitive electrode.

The transparent tactile electrode is essentially used to identify the portion of the touch while preventing the visibility of the image on the display portion from deteriorating and the sensing pattern formed in a predetermined pattern is typically used.

The sensing pattern may generally include a first pattern and a second pattern, the first pattern and the second pattern being disposed in different directions from each other, and thereby providing coordinate information of X and Y of the touch point. In detail, when a user's finger or object, such as a touch display pen, touches a specific position displayed on the cover window substrate, the capacitance change according to the contact position is detected via the first pattern, the second pattern, and the position. The line is transmitted to the drive circuit. In addition, changes in capacitance are converted to electronic signals by X and Y input processing circuits or similar devices such that contact locations can be detected.

In this regard, the first pattern and the second pattern are formed on the same substrate and the respective patterns are electrically connected to each other to sense a point of touch. Incidentally, since the second patterns are configured to be connected to each other, but the first patterns are configured to be separated from each other in the form of islands, the separated metal bridge electrodes must be electrically connected between the first sensing patterns.

In this regard, there is a problem that the pattern can be seen from the outside due to the difference in reflectance between the metal bridge electrode and the sensing pattern.

At the same time, when the metal bridge electrode is formed of metal and has a very narrow width, visibility may be obtained. To improve, and when the metal bridge electrode is formed together with the metal wiring and the position detecting line, the manufacturing process can be simplified, but there is a need for such a high-precision processing facility to form a narrow-width metal bridge electrode and consume a lot of time to form The problem of fine graphics.

Japanese Patent Publication No. 2008-98169 discloses a transparent conductive film in which an undercoat layer is formed between a transparent substrate and a transparent conductive layer, the undercoat having two layers having different refractive indices.

It is therefore an object of the present invention to provide a touch sensitive electrode that has less visibility despite differences in reflectance at various locations.

Another object of the present invention is to provide a touch sensitive electrode which can be manufactured with high productivity even when using a low-precision facility.

Another object of the present invention is to provide a method of manufacturing a touch sensitive electrode.

Another object of the present invention is to provide a touch screen panel comprising the above described touch electrodes.

Another object of the present invention is to provide an image display device including the above touch screen panel.

The above object of the present invention will be achieved by the following features:

(1) A haptic electrode comprising: a sensing electrode comprising a first pattern formed in a first direction, a second pattern formed in a second direction; and a separation unit diagram electrically connected to the second pattern a metal bridge electrode of the type; and a light shielding insulator interposed between the sensing pattern and the metal bridge electrode and formed on the visible side based on the metal bridge electrode.

(2) The touch electrode according to the above (1), wherein the sensing pattern is selected from the group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin Oxide (IZTO), cadmium tin oxide (CTO), poly(3,4-ethylenedioxythiophene) (PEDOT), carbon nanotubes (CNT) Formed by at least one of the group consisting of graphene and wire.

(3) The touch electrode according to the above (1), wherein the metal bridge electrode is made of molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium or an alloy of at least two of them. form.

(4) The touch electrode according to the above (1), wherein the unit metal bridge electrode has a width of 2 to 30 μm.

(5) The touch electrode according to the above (1), wherein the light shielding insulator is formed of a color ink.

(6) The touch electrode according to the above (5), wherein the color ink comprises a colorant, an alkali-soluble resin binder, a multifunctional monomer, a photopolymerization initiator, and a surface active layer And a solvent.

(7) The touch electrode according to the above (1), wherein the light shielding insulator has a transmittance of 70% or less.

(8) The touch sensor according to the above (1), wherein an area of the unit light shielding insulator is equal to or smaller than 55% of an area of the unit metal bridge electrode.

(9) The haptic electrode according to the above (1), wherein the unit light shielding insulator has a width at least 5 μm larger than the unit metal bridge electrode and at least 10 μm shorter than the unit metal bridge electrode.

(10) The touch sensitive electrode according to the above (1), wherein the unit light-shielding insulator has a long side of 70 μm or less and a short side of 20 μm or less.

(11) The touch sensor according to the above (1), wherein the metal bridge electrode and the light shielding insulator have a long axis having a predetermined angle with respect to the second direction.

(12) The touch electrode according to the above (11), wherein the long axis has a predetermined angle of -45 to 45.

(13) The touch sensor according to the above (1), wherein the touch electrode is formed on a cover window substrate of a touch screen panel or a surface of a display panel.

(14) A touch screen panel comprising the one of the touch electrodes according to the above (1) to (13).

(15) An image display apparatus comprising the touch screen panel according to the above (14).

(16) A method for manufacturing a touch sensitive electrode, comprising: forming a sensing pattern formed on a cover window substrate, comprising: connecting a unit pattern to each other through a connecting portion in a first direction a first pattern and a second pattern formed by separating the unit patterns from each other based on the connecting portion in a second direction; forming a light shielding insulator on the connecting portion of the unit pattern of the first pattern Forming a light shielding layer on a non-display portion of a substrate; forming a metal bridge electrode to connect the separate unit patterns of the second pattern to the light shielding insulator; and forming a position detecting line, the position A test line extends to contact the sensing pattern on the light shielding layer.

(17) The method according to the above (16), wherein the light-shielding insulator and the light-shielding layer are simultaneously formed in one process.

(18) The method according to the above (16), wherein the metal bridge electrode and the position detecting line are simultaneously formed in one process.

(19) A method for manufacturing a touch sensitive electrode, comprising: forming a metal bridge electrode on a surface of a display panel; forming a position detecting line in a non-display portion of the display panel; forming a light shielding insulator Forming a light shielding layer over the position detecting line; and forming a first pattern and a second pattern formed to extend along a first direction to connect the plurality of electrodes A connecting portion of the unit pattern is disposed on the light shielding insulator, and the first pattern has an end portion contacting the position detecting line, and the second pattern is formed along a second direction to pass The unit patterns are separated from each other to contact a metal bridge electrode based on the connection portion, and the second pattern has an end portion contacting the position detecting line.

(20) The method according to the above (19), wherein the metal bridge electrode and the position detecting line are simultaneously formed in the same process.

(21) The method according to the above (19), wherein the light shielding layer is formed without extending to the sensing pattern.

(22) The method according to (19) above, wherein the light shielding insulator and the light shielding layer are simultaneously formed in one process.

According to the present invention, the visibility of the pattern can be minimized due to the difference in reflectance at each position.

According to an embodiment of the present invention, the haptic electrode can be manufactured at a high productivity even with a low-precision device.

According to the method of manufacturing a touch electrode of the present invention, the light shielding insulator and the light shielding layer of the non-display portion are made of the same material, and thus the light shielding insulator and the light shielding layer can be formed by a one-time process without using an additional device. And the process, so that productivity can be significantly improved.

1‧‧‧Substrate

10‧‧‧ First pattern

20‧‧‧Second pattern

30‧‧‧Metal bridge electrode

40‧‧‧Light Shielding Insulators

50‧‧‧Light shield

60‧‧‧ position detection line

A-A'‧‧‧ line

The above and other objects, features and other advantages of the present invention will be more clearly understood from the accompanying drawings in the <RTIgt 2 is a perspective view of a tactile electrode according to an embodiment of the present invention; FIG. 3 is a schematic perspective view of a tactile electrode according to another embodiment of the present invention; and FIG. 4 is a view according to FIG. The longitudinal direction of a touch sensor of an embodiment of the invention obtained by the A-A' line Fig. 5 is a longitudinal sectional view of the touch sensor of the embodiment of the present invention obtained according to the line A-A' in Fig. 2; Fig. 6 is a line according to line A-A' in Fig. 3 A longitudinal cross-sectional view of a touch sensitive electrode of another embodiment of the present invention is obtained; and FIG. 7 is a plan view showing a position at which the reflectance is measured on the plane of the touch sensitive electrode according to an embodiment of the present invention.

The present invention discloses a touch sensitive electrode comprising: a sensing electrode comprising a first pattern formed in a first direction and a second pattern formed in a second direction; a second configured to be electrically connected separately a metal bridge electrode of the unit pattern of the pattern; and a light shielding insulator interposed between the sensing pattern and the metal bridge electrode and formed on one visible side based on the metal bridge electrode, and thus due to the reflectance at each position The difference in pattern visibility can be minimized.

Hereinafter, the invention will be described by way of exemplary embodiments.

Touch electrode

A touch sensitive electrode according to an embodiment of the present invention includes: a sensing pattern including a first pattern formed in a first direction and a second pattern formed in a second direction; a metal bridge electrode is formed thereon The separation unit patterns of the second pattern are electrically connected therebetween; and the light shielding insulator is formed on the visible side based on the metal bridge electrodes in a manner interposed between the sensing pattern and the metal bridge electrodes.

Figures 2 through 5 schematically illustrate the front or a portion of a touch sensitive electrode in accordance with one embodiment of the present invention. Hereinafter, embodiments of the invention will be described in detail with reference to the drawings.

Sensing pattern

A sensing pattern may include a first pattern 10 formed in a first direction and a second pattern 20 formed in a second direction.

The first pattern 10 and the second pattern 20 are disposed in directions different from each other. For example, the first direction may be the X-axis direction and the second direction may be the Y-axis direction (orthogonal to the first direction), but it is not limited thereto.

The first pattern 10 and the second pattern 20 provide information on the X and Y coordinates of the touch contact. In detail, when a user's finger or object touches a specific position displayed on the cover window substrate, the capacitance change according to the contact position is transmitted to the drive circuit via the first and second patterns 10 and 20 and the position detection line. . In addition, the change in capacitance is converted into an electronic signal by X and Y input processing circuits (not shown) and the like, so that the contact position can be detected.

In this regard, the first and second patterns 10 and 20 are formed on the same layer, and the respective patterns need to be electrically connected to each other to sense the point of touch. Thereby, the first pattern 10 is configured such that the pattern units are connected to each other through a connecting portion, but the second pattern 20 is configured in such a manner that the unit patterns are separated from each other in the form of islands. Therefore, separate metal bridge electrodes 30 are required to electrically connect the second pattern 20. The metal bridge electrode 30 will be described below.

The thickness of the sensing pattern is not particularly limited, and may be, for example, 20 to 200 nm. When the thickness of the sensing pattern is less than 20 nm, the electric resistance is increased, and thus the sensitivity may be lowered, and when the thickness of the sensing pattern exceeds 200 nm, the reflectance may increase, thus causing problems such as deterioration in visibility.

The sensing pattern may be composed of a transparent electrode material known in the art, and they are not particularly limited. For example, the transparent electrode material may include indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc zinc oxide (IZTO), cadmium tin oxide (CTO), poly (3,4- Vinyl dioxythiophene) (PEDOT), carbon nanotubes (CNT), graphene, wire or the like, They may be used singly or in combination of two or more kinds thereof. Preferably, indium tin oxide (ITO) can be used. The metal used in the wire is not particularly limited, but may include, for example, silver, gold, aluminum, copper, iron, nickel, titanium, ruthenium, chromium or the like. These materials may be used singly or in combination of two or more kinds thereof.

Metal bridge electrode

The metal bridge electrode 30 is configured to electrically connect the separate unit patterns of the second pattern 20.

In this case, the metal bridge electrode 30 is electrically shielded from the first pattern 10 of the sensing pattern. Therefore, it is necessary to form an insulator to electrically shield the same, which will be described below.

According to the present invention, the metal bridging electrode 30 is formed of a metal material, and is preferably the same material as the position detecting line 60 described below. In this case, the metal bridge electrode 30 can be formed simultaneously with the formation of the position detecting line 60, and thus a process can be simplified.

The metal is not particularly limited as long as it has excellent electrical conductivity and low electrical resistance, and may include, for example, molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium, or an alloy of at least two combinations thereof. . Among these metals, an alloy of silver, palladium and copper is preferably used.

The size of the metal bridge electrode 30 is not particularly limited. For example, the metal bridge electrode 30 may have a long side of 2 to 30 μm, and preferably 2 to 20 μm, but is not limited thereto. When the metal bridge electrode 30 has a long side of 2 to 30 μm, the visibility of the pattern can be reduced while providing an optimum resistance.

The metal bridging electrode 30 may be formed in the second direction to connect the separated unit patterns of the second pattern 20, but is not limited thereto. Further, the metal bridge electrode 30 may have a long axis having a predetermined angle with respect to the second direction in one plane. For example, the metal bridge electrode 30 can be formed to have a long axis having an angle of -45 to 45 based on the second direction.

When the haptic electrode according to the present invention is implemented in an image display device, the pixel portion is disposed at an upper portion or a lower portion of the haptic electrode. Herein, the metal bridge electrode 30 is made of a metal material. Sexually, there is a reduced transmittance, and thus when the unit pixel of the pixel portion and the bridge electrode 30 are located at the same position, the cell bridge electrode can cover all of the pixel units. However, in the present invention, since the metal bridging electrode 30 is formed to have a long axis ranging from -45 to 45 with respect to the second direction, the problem that the unit bridging electrode covers the unit pixel can be minimized.

Light shielding insulator

In order to prevent electrical connection between the sensing pattern and the metal bridge electrode 30, the light shielding insulator 40 is formed between the sensing pattern and the metal bridge electrode. The light-shielding insulator 40 is formed substantially in a layered structure and is formed of a transparent insulating material to obtain excellent transmittance of the touch screen panel when it is applied to the touch panel.

However, in accordance with the present invention, the light-shielding insulator 40 is made of a light-shielding material.

When the metal bridge electrode 30 is formed of metal, since the metal has a higher reflectance than the conventional sensing electrode, it can be seen from the outside. Therefore, in order to reduce the visibility in the related art, the metal bridge electrode 30 must form a narrow width, and thus it is possible to require a high-precision production facility and consume more time to form a fine pattern.

However, since the haptic electrode according to the present invention includes the light-shielding insulator 40 formed on the visible side of the metal bridge electrode 30, even if the metal bridge electrode 30 forms a larger width than the conventional metal bridge electrode, the metal may be reduced. The visibility of the bridge electrode 30 and the metal bridge electrode 30 are prevented from being seen from the outside.

Since the light-shielding insulator 40 according to the present invention shields light from a conventional insulator, it is formed only in a partial portion between the sensing pattern and the metal bridge electrode 30 without being formed in the laminated structure.

Fig. 2 is a perspective view showing a touch sensitive electrode according to an embodiment of the present invention, the lower surface of which is a visible side, and Figs. 4 and 5 are longitudinal cross-sectional views taken along line A-A' of Fig. 2. As shown in Figure 2, 4 As shown in FIG. 5 and FIG. 5, when the touch electrode is disposed such that its lower surface is the visible side, the light shielding insulator 40 is formed under the metal bridge electrode 30.

Figure 3 is a perspective view of a touch sensitive electrode according to another embodiment of the present invention, the upper surface of which is the visible side. Fig. 6 is a longitudinal sectional view taken along line A-A' of Fig. 3. As shown in FIGS. 3 and 6, when the touch sensitive electrode is disposed such that its upper surface is the visible side, the light shielding insulator 40 is formed over the metal bridge electrode 30.

The material of the light-shielding insulator 40 is not particularly limited as long as it has excellent insulating properties while shielding light. For example, the light shielding insulator 40 is made of colored ink.

The color ink may contain a colorant, an alkali-soluble resin binder, a multifunctional monomer, a photopolymerization initiator, a surfactant, a solvent, other additives, or the like which is generally used in the related art.

The area ratio of the light shielding insulator 40 to the metal bridge electrode 30 is not particularly limited as long as it is within a limited range in which the visibility of the metal bridge electrode 30 can be reduced by light shielding, and thus when it is subsequently applied to the touch The reduced transmittance at the time of the screen panel can be minimized. For example, the area of the light shielding insulator 40 may be equal to or less than 55% with respect to the area of the metal bridge electrode 30. Further, when the unit light shielding insulator is applied to the touch panel, the area of the unit light shielding insulator is preferably made smaller than the unit sub-pixel of the lower display in terms of suppressing a decrease in light transmittance. For example, the area of the unit light shielding insulator may be 10 to 50% compared to the area of the unit sub-pixel. When the area ratio of the unit light-shielding insulator to the sub-pixel of the cell is less than 10%, it is necessary to use a high-precision device to form a fine pattern, and thus the processing efficiency may be lowered, and when the area ratio exceeds 50%, the insulator may be externally The transmittance of the visible or tactile electrodes may be reduced.

The size of the light-shielding insulator 40 is not particularly limited to satisfy the above-described area ratio, and for example, the unit light-shielding insulator may have a long side of 70 μm or less and a short side of 20 μm or less. when When the unit light-shielding insulator has a long side of more than 70 μm or a short side of more than 20 μm, the light transmittance may be lowered and the light-shielding insulator may be seen from the outside. Preferably, the light-shielding insulator 40 has a long side of 20 to 50 μm and a short side of 10 to 16 μm in terms of minimizing a decrease in light transmittance while suppressing visibility of the metal bridge electrode 30.

The size of the light-shielding insulator 40 is not particularly limited to satisfy the above-described area ratio, but preferably, the light-shielding insulator 40 has a larger width than the metal bridge electrode 30 in suppressing the visibility of the metal bridge electrode 30. For example, the light shielding insulator 40 can have a width that is at least greater than 5 [mu]m than the metal bridge electrode 30. The light-shielding insulator 40 may have a width at least 10 μm to 20 μm greater than the metal bridge electrode 30 in reducing reduced visibility when it is subsequently applied to the touch screen panel. Further, the light-shielding insulator 40 may have a length which is at least 10 μm shorter than the metal bridge electrode 30, and is preferably 20 to 40 μm shorter.

The transmittance of the light-shielding insulator 40 is not particularly limited, and may be appropriately selected to reduce the visibility of the metal bridge electrode 30, and thus minimize the decrease in transmittance when it is applied to the touch panel. For example, the light shielding insulator 40 may have a transmittance of 70% or less, and preferably 20 to 60%.

As described above, when the metal bridging electrode 30 is formed to have a long axis having an angle of -45 to 45, the light shielding insulator 40 may also be formed as a long axis having the same angle.

Position detection line and light shielding layer

As shown in FIG. 1, the touch screen panel has a non-display portion which is an edge portion where no image is displayed, wherein the non-display portion is provided with a position detecting line, and the contact signal sensed by the sensing pattern is provided. It is transmitted to the drive circuit and these lines are provided with a light shielding layer that is not visible to the user.

Therefore, in the touch sensitive electrode according to the present invention, the non-display unit may further include the position detecting line 60 and the light shielding layer 50.

When the touch sensitive electrode is disposed with the lower surface of the touch surface disposed, the light shielding layer 50 may be disposed on the second pattern 20 as shown in FIG. 4, and may also be disposed as shown in FIG. On the substrate 1, or it may be provided on the position detecting line 60. The light shielding layer 50 is preferably disposed on the second pattern 20 or the substrate 1 in terms of being formed simultaneously with the light shielding insulator 40.

When the touch sensitive electrode is disposed such that its upper surface becomes the visible side, preferably, the light shielding layer 50 is disposed as shown in FIG. 6 in that the metal bridge electrode 30 and the position detecting line 60 are simultaneously formed. The position detecting line 60 is, but is not limited to.

The light shielding layer 50 may be formed of a composition known in the related art to form the light shielding layer 50, or may be formed of, for example, a material of the formed light shielding insulator 40. Preferably, the light shielding layer 50 is formed of the same material as the light shielding insulator 40.

The position detecting line 60 is formed to contact the first pattern 10 or the second pattern 20 of the same row. For example, when the haptic electrode is disposed as the visible side of the lower surface thereof as shown in FIG. 4, the position detecting line 60 passes through the contact hole formed in some areas of the light shielding layer 50 with the first pattern 10 or the second figure. The type 20 is in contact, and as shown in FIG. 5, the position detecting line 60 may contact the first pattern 10 or the second pattern 20 by extending one end thereof to one end of the first pattern 10 or the second pattern 20. However, in order to suppress the visibility of the position detecting line 60, it is preferable that the position detecting line 60 passes through the contact hole formed in the light shielding layer 50 to contact the first pattern 10 or the second pattern 20.

The position detecting line 60 may be formed of a metal in the range of the material exemplified as the above-described metal bridging electrode 30, and is preferably formed of the same material as the metal bridging electrode 30.

Substrate

According to the invention, the haptic electrode is formed on the substrate 1.

The substrate 1 can be made of any material commonly used in the related art, and is not particularly limited, but, for example, glass, polyether oxime (PES), polyacrylate (PAR), polyetherimide (PEI) ), polynaphthalene dicarboxylic acid (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyarylate, polyimide, polycarbonate (PC), cellulose triacetate Ester (TAC), cellulose acetate propionate (CAP), or the like can be used.

The substrate 1 may be a cover window substrate forming an outermost surface of the touch screen panel or the display panel.

The haptic electrode according to the present invention may further comprise a transparent dielectric layer as desired.

When the substrate 1 is a cover window, the transparent dielectric layer can be formed between the substrate 1 and the sensing pattern, and when the substrate 1 is a display panel, the transparent dielectric layer can cover the window substrate and the sensing pattern. Formed between the types.

Since the structural difference of each position depends on the structure of the sensing pattern, the transparent dielectric layer reduces the difference in optical characteristics, thereby improving the optical uniformity of the touch screen panel.

The transparent dielectric layer may be formed of hafnium oxide (an organic insulating layer), or the like. The transparent dielectric layer can be formed by, for example, a vacuum evaporation method, a sputtering method, a coating method, or the like, and can be easily fabricated in a film shape by the above method.

According to the present invention, a plurality of transparent dielectric layers can also be formed if desired. In this case, each layer may be made of a different material and may have different refractive indices and thicknesses from each other.

Passivation layer

In accordance with the present invention, to prevent contamination of the sensing pattern and metal bridge electrode 30 from external environments (eg, humidity, air, etc.), the haptic electrode may further include a passivation layer to cover the sensing pattern, as desired.

The passivation layer can be formed in a desired pattern using a metal oxide such as ruthenium oxide, a transparent photosensitive resin composition (including an acrylic resin), a thermosetting resin composition or the like.

The passivation layer according to the present invention may have a suitable thickness, for example, 2000 nm or less. Thus, for example, the passivation layer can have a thickness ranging from 0 to 2000 nm. When the passivation layer has When the thickness is within the range, the effect of reducing the reflectance of the touch sensitive electrode according to the present invention may be improved. The passivation layer may include a contact hole for sensing a connection between the pattern and the driving circuit.

Adhesive layer

When the substrate 1 disposed under the touch sensitive electrode according to the present invention is a window substrate, the touch sensitive electrode is bonded to a portion of the display panel by an adhesive layer.

Further, when the substrate 1 is one surface of the display panel, the touch sensitive electrode is bonded to the cover window substrate by the adhesive layer.

The adhesive layer can be applied to the transparent laminate by applying a transparent curable resin composition and curing the same (optical transparent resin, OCR), or pressing an adhesive (optically transparent adhesive, OCA) previously formed into a film. Prepare the electrode.

Method of manufacturing a touch electrode

Additionally, the present invention provides a method of making a touch sensitive electrode.

Hereinafter, a method of manufacturing a touch sensitive electrode will be described according to an embodiment of the present invention.

First, the first pattern 10 formed by connecting the unit pattern by using the connection portion in the first direction, and the second pattern formed by separating the unit patterns from each other based on the connection portion in the second direction The pattern is formed on the cover window substrate.

The first pattern 10 and the second pattern 20 are formed on the same layer, and the first pattern 10 is configured in such a manner that the unit patterns are connected to each other by the connection portions, and the second pattern 20 is in a unit pattern. They are arranged in such a way that they are separated from each other in the form of islands.

The sensing pattern can be formed by appropriate selection within the above materials and thickness ranges.

The sensing pattern can be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, the sensing pattern can be formed by reactive sputtering of one example of physical vapor deposition.

The sensing pattern can be formed by a printing process. In order to print transparent electrodes, various printing methods such as gravure offset printing, reverse offset printing, ink jet printing, screen printing, gravure printing, and the like can be used in the printing process. In particular, when the sensing pattern is formed by a printing process, the transparent electrode can be made of a printable paste material. For example, the transparent electrode can be made of a carbon nanotube (CNT), a conductive polymer, and a silver nanowire ink.

In addition to the above methods, the sensing pattern can be formed by photo-sensitive printing.

Next, a light-shielding insulator 40 is formed on the connection portion of the unit pattern of the first pattern 10.

The light shielding insulator 40 can be formed by being appropriately selected from the above materials, sizes, area ratios, and transmittance ranges.

In addition, the light shielding layer 50 is formed on a non-display portion of the substrate. In the manufacturing method of the present invention, the light shielding insulator 40 and the light shielding layer 50 are made of the same material. Thus, the light-shielding insulator 40 and the light-shielding layer 50 can be formed simultaneously in one process using the same equipment without the need for additional separate equipment and processes for forming the same. Therefore, the productivity is remarkably improved.

A light shielding layer 50 including a contact hole may be formed to connect the position detecting line 60, which will be formed in a subsequent process (through which the first pattern 10 or the second pattern 20 passes).

The contact hole may be formed in such a manner as to form the light shielding layer 50 (hole type), or the light shielding layer 50 is except that the position detecting line 60 is connected to the portion of the first pattern 10 or the second pattern 20. It is formed integrally (island type).

Next, a metal bridge electrode 30 of a separate unit pattern connecting the second pattern 20 is formed on the light shielding insulator 40.

The metal bridging electrode 30 can be formed by suitably selecting within the above materials and size ranges.

Further, a position detecting line 60 (extendingly in contact with the sensing pattern) is formed on the light shielding layer 50.

The position detecting line 60 is formed to be in contact with the first pattern 10 or the second pattern 20 on the same line. E.g The position detecting line 60 may be in contact with the first pattern 10 or the second pattern 20 through contact holes formed in some areas of the light shielding layer 50, or may be extended to one end of the first pattern 10 or the second pattern One end of 20 contacts the first pattern 10 or the second pattern 20.

Preferably, the position detecting line 60 is formed using the same material as the metal bridging electrode 30 (when the same device is used to simultaneously form the same in one process).

The method for forming the light shielding insulator 40, the light shielding layer 50, the metal bridging electrode 30, and the position detecting line 60 is not particularly limited, but they may be formed by a method selected from, for example, a method of forming an inductive pattern.

Next, a method of manufacturing a touch sensitive electrode according to another embodiment of the present invention will be explained. In the method of manufacturing the touch electrode according to another embodiment of the present invention, first, the metal bridge electrode 30 is formed on one surface of the display panel.

Then, the position detecting line 60 is formed on the non-display portion of the display panel.

The metal bridge electrode 30 can be formed by being suitably selected within the above-described materials and size ranges, and preferably, the position detecting line 60 is formed of the same material as the metal bridge electrode 30 (using the same device in one In the case of simultaneous formation in the process).

Next, a light-shielding insulator 40 is formed on the metal bridge electrode 30.

Then, a light shielding layer 50 is formed on the position detecting line 60.

The light shielding insulator 40 can be formed by being suitably selected within the above-described materials, dimensions, area ratios, and transmittance ranges, and the light shielding layer 50 can also be made of the same material as the light shielding insulator 40. Thus, the light-shielding insulator 40 and the light-shielding layer 50 can be formed simultaneously in one process using the same equipment, without the need for additional separate equipment and processes to form the same. Therefore, the productivity is remarkably improved.

Forming a first pattern and a second pattern, the first pattern is formed and extended in the first direction to make a single The connecting portion between the meta-patterns is disposed on the light-shielding insulator 40 and has one end contact position detecting line 60, and the second pattern 20 is formed in the second direction by separating the unit patterns from each other based on the connecting portion. The metal bridge electrode 30 is contacted and has one end contact position detecting line 60.

The first pattern 10 extends in a first direction such that a connection portion for connecting its unit pattern is disposed on the light shielding insulator 40 and electrically shielded from the metal bridge electrode 30 so as to be formed without contacting the metal bridge electrode 30 .

The position detecting line 60 transmits the touch signals sensed by the first pattern 10 and the second pattern 20, and therefore, the first pattern 10 and the second pattern 20 have ends formed to contact the position detecting line 60.

The first and second patterns 10 and 20, the light-shielding insulator 40, the light-shielding layer 50, the metal bridge electrode 30, and the position detecting line 60 can also be manufactured by a method selected within the scope of the above method.

Touch screen panel and image display panel

In addition, the present invention also provides a touch screen panel including the above-described touch electrodes.

The touch screen panel according to the present invention may include elements commonly used in the related art in addition to the touch electrodes.

example

Examples 1~6 and Comparative Examples 1~4

The touch electrodes having the structures shown in Figs. 3 and 6 were each fabricated using materials as in the following Examples 1 to 6 and Comparative Examples 1 to 4. Then, the reflectance at each position shown in Fig. 7 was measured for each of the touch electrodes, and the results are shown in Table 1 below.

Herein, the average reflectance is an average value of the reflectance in the range of 400 nm to 700 nm.

For the substrate, glass (refractive index: 1.51, extinction coefficient: 0) was used in Examples 1 to 4 and Comparative Examples 1 and 2, and polycarbonate films were used in Examples 5 and 6 and Comparative Examples 3 and 4 as substrates, respectively. . The ITO film (refractive index: 1.8, extinction coefficient: 0) was used in the examples and comparative examples as the first And the second pattern.

Molybdenum was used in Examples 1 to 3 and Comparative Example 1, and an alloy of 98 wt% of silver, 1 wt% of palladium, and 1 wt% of copper was used as the metal bridge electrode in Examples 4 and 5 and Comparative Examples 2 and 3. Copper was used as the metal bridge electrode in Example 6 and Comparative Example 4.

In order to prepare a light-shielding insulator, the following mixture was used in Example 1: 110 parts by weight of carbon black as a colorant; and 29 parts by weight of a copolymer of benzyl (meth) acrylate / (meth) acrylate (acid The price is 110 KOH mg/g, the molar ratio is 70/30, Mw=30,000) and 70 parts by weight of the polymer (acid value is 80 KOH mg/g, Mw=22,000), wherein allyl glycidyl ether is added to a copolymer of benzyl (meth) acrylate / (meth) acrylate as an alkali soluble resin binder; 50 parts by weight of dipentaerythritol hexaacrylate as a multifunctional monomer; 20 parts by weight of 2-benzyl Base-(dimethylamino)-1-(4-morpholinylphenylamine)butyl-1-one, 10 parts by weight of 2,2'-bis(o-chlorophenyl)-4,5,5, 5'-tetraphenyl-1,2'-biimidazole, 5 parts by weight of 4,4-bis(diethylamino)benzophenone, and 5 parts by weight of hydrothiobenzothiazole as photopolymerization initiator 9 parts by weight of a polyester dispersant, which is a dispersant as an additive; 0.53 parts by weight of 3-methacryloxypropyltrimethoxydecane, which is an adhesion promoter as an additive; 1 part by weight Bismuth or fluorosurfactant as leveling To impart ink repellency; and 440 parts by weight of propylene glycol monomethyl ether acetate and 290 parts by weight of ethyl ethoxypropionate (solvent as used in Example 1). Next, the mixture was stirred for 5 hours to prepare a colored ink and a light-shielding insulator was formed from the prepared color ink. Meanwhile, the light-shielding insulators were respectively formed of color inks including 80 parts by weight in Example 2 and 60 parts by weight of carbon black in Examples 3 to 6.

In Comparative Examples 1 to 4, the insulator was formed of an acrylic insulating material (refractive index: 1.51, extinction coefficient: 0).

Referring to Table 1 above, for the reflectances at positions 1 and 3, 2 and 4, and 3 and 5, it can be seen that the haptic electrodes in Examples 1 to 6 have a comparison with the comparative examples, respectively, due to the light-shielding insulator. A considerable effect of reduced reflectivity. Therefore, the metal bridge electrodes in Examples 1 to 6 have a very excellent visibility reduction effect.

However, it can be seen that the haptic electrodes of Comparative Examples 1 to 4 have significant reflectance differences at positions 1 and 3, 2 and 4, and 3 and 5, and thus their metal bridge electrodes are seen from the outside.

1‧‧‧Substrate

10‧‧‧ First pattern

20‧‧‧Second pattern

30‧‧‧Metal bridge electrode

40‧‧‧Light Shielding Insulators

A-A'‧‧‧ line

Claims (22)

A haptic electrode comprising: a sensing pattern comprising a first pattern formed in a first direction and a second pattern formed in a second direction; a metal bridge electrode configured to electrically connect the a separate unit pattern of the second pattern; and a light shielding insulator interposed between the sensing pattern and a metal bridge electrode to insulate the metal bridge electrode from the first pattern and form The metal bridges a visible side of the electrode. The haptic electrode according to claim 1, wherein the sensing pattern is selected from the group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), and indium zinc tin oxide ( IZTO), formed by at least one of the group consisting of cadmium tin oxide (CTO), poly(3,4-ethylenedioxythiophene) (PEDOT), carbon nanotubes (CNT), graphene, and wire. The haptic electrode according to claim 1, wherein the metal bridging electrode is formed of molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium or an alloy of at least two thereof. The haptic electrode of claim 1, wherein the metal bridge electrode has a width of 2 to 30 μm. The haptic electrode of claim 1, wherein the light shielding insulator is formed of a color ink. The touch sensor of claim 5, wherein the color ink comprises a colorant, an alkali soluble resin binder, a multifunctional monomer, a photopolymerization initiator, a surfactant, and a Solvent. The haptic electrode of claim 1, wherein the light-shielding insulator has a transmittance of 70% or less. The touch sensor of claim 1, wherein one side of the light shielding insulator The area of the product is equal to or less than 55% compared to the area of the metal bridge electrode. The haptic electrode according to claim 1, wherein the light shielding insulator has a width of at least 5 μm more than the metal bridge electrode and a length at least 10 μm shorter than the metal bridge electrode. The haptic electrode according to claim 1, wherein the light shielding insulator has a long side of 70 μm or less and a short side of 20 μm or less. The haptic electrode of claim 1, wherein the metal bridge electrode and the light shielding insulator have a long axis having a predetermined angle with respect to the second direction. The haptic electrode of claim 11, wherein the major axis has a predetermined angle of -45° to 45°. The touch sensor electrode of claim 1, wherein the touch sensor electrode is formed on a touch screen panel or a cover window substrate of a display panel. A touch screen panel comprising the touch sensitive electrode according to any one of claim 1 to claim 13 of the patent application. An image display device comprising the touch screen panel of claim 14 of the patent application. A method for manufacturing a touch sensitive electrode, comprising: forming a sensing pattern on a cover window substrate, the sensing pattern comprising forming a unit pattern connected to each other through a connecting portion in a first direction Forming a first pattern and a second pattern separating the unit patterns from each other based on the connecting portion in a second direction; forming a light shielding insulator on the connecting portion of the unit pattern of the first pattern Forming a light shielding layer on a non-display portion of a substrate; forming a metal bridge electrode connecting the separate unit patterns of the second pattern on the light shielding insulator such that the metal bridge electrode The light shielding insulator is insulated from the first pattern; A position detecting line is formed that extends to contact the sensing pattern on the light shielding layer. The method of claim 16, wherein the light shielding insulator and the light shielding layer are simultaneously formed in one process. The method of claim 16, wherein the metal bridge electrode and the position detecting line are simultaneously formed in one process. A method for manufacturing a touch sensitive electrode, comprising: forming a metal bridge electrode on a surface of a display panel; forming a position detecting line in a non-display portion of the display panel; forming a light shielding insulator a metal bridge electrode; forming a light shielding layer on the position detecting line; and forming a sensing pattern, the sensing pattern including a first pattern and a second pattern, such that the metal bridge electrode is The light shielding insulator is insulated from the first pattern, wherein the first pattern is formed along a first direction such that a connecting portion connecting the unit patterns is disposed on the light shielding insulator, and the first a pattern having an end portion contacting the position detecting line; and a second pattern formed along a second direction to contact a metal bridge electrode by separating the unit patterns from each other based on the connecting portion, and the second pattern The pattern has an end contacting the position detecting line. The method of claim 19, wherein the metal bridging electrode and the position detecting line are simultaneously formed in one process. The method of claim 19, wherein the light shielding layer is formed without extending to the sensing pattern. The method of claim 19, wherein the light shielding insulator and the light shielding layer are simultaneously formed in one process.