TWI608323B - Laser processing method, device and program - Google Patents

Laser processing method, device and program Download PDF

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TWI608323B
TWI608323B TW102118870A TW102118870A TWI608323B TW I608323 B TWI608323 B TW I608323B TW 102118870 A TW102118870 A TW 102118870A TW 102118870 A TW102118870 A TW 102118870A TW I608323 B TWI608323 B TW I608323B
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hole
processing
laser
scanning
laser processing
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TW201444636A (en
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Hidekatsu Ozawa
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Via Mechanics Ltd
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雷射加工方法、裝置及程式 Laser processing method, device and program

本發明係關於一種雷射加工方法、裝置及程式,更詳細而言,係關於照射雷射光而對基板進行開複數個孔之加工之情形時,在雷射光之照射時設定最佳之路徑而進行加工之雷射加工方法、裝置、及該雷射加工裝置中執行之雷射加工程式。 The present invention relates to a laser processing method, apparatus and program, and more particularly to the case of processing a plurality of holes in a substrate by irradiating laser light, and setting an optimum path during irradiation of laser light. A laser processing method and apparatus for processing, and a laser processing program executed in the laser processing apparatus.

作為此種技術,例如專利文獻1及2所記載之發明係為眾知。其中,在專利文獻1中提出有:作為可縮短路徑決定所需要之計算時間之雷射鑽鑿路徑決定方法,係根據預先設定之開複數個孔之位置資訊,以應用巡迴推銷員問題(traveling salesman problem,TSP)之方式而決定規定雷射光之照射位置之順序之路徑。該發明係具有如下特徵者:藉由巡迴推銷員問題之路徑決定,包含:將包含雷射光之照射位置之加工區域分割成複數個區(bucket)之步驟、決定規定按照何種順序巡迴已分割之複數個區之巡迴路之步驟、決定已分割之各區中成為雷射光照射之始點之始端點與成為雷射光照射之終點之終端點之步驟、以及對已分割之各區中該始端點與該終端點之間之雷射光照射位置決定最佳路徑之步驟,且在某區之終端點,與接著應巡迴之區之始端點連結。 As such a technique, for example, the inventions described in Patent Documents 1 and 2 are known. Among them, Patent Document 1 proposes a laser drilling path determination method that can shorten the calculation time required for the path determination, and applies a tour salesman problem based on the position information of a plurality of predetermined opening holes (traveling). The way of the salesman problem (TSP) determines the path that specifies the order in which the laser light is irradiated. The invention has the following features: the path determination by the tour salesman problem includes the steps of dividing the processing area including the irradiation position of the laser light into a plurality of buckets, and determining in which order the tour is divided. a step of the circuit of the plurality of zones, a step of determining a starting point of the start point of the laser light irradiation and a terminal point of the end of the laser light irradiation, and a starting point of each of the divided zones The step of the laser light irradiation position between the point and the terminal point determines the optimal path, and is connected to the beginning end of the area to be patrolled at the terminal point of the area.

另一方面,在專利文獻2中,提出有如下之雷射開孔方法:即使在對耐熱性較低之片狀構件以狹窄間距進行開孔之情形,亦可抑制波 紋變形等之產生。該發明,係藉由對片狀構件之複數個開孔預定部位依序照射雷射光而進行開孔加工之方法,並具有如下特徵者:對於複數個開孔預定部位之至少一部分,對該一個開孔預定部位照射雷射光後,從該一個開孔預定部位跳過(skip)位於既定範圍內之開孔預定部位,對位於既定範圍外之開孔預定部位照射雷射光。 On the other hand, Patent Document 2 proposes a laser aperture method in which a wave can be suppressed even when a sheet member having low heat resistance is opened at a narrow pitch. The generation of grain deformation and the like. The invention is a method for performing hole drilling by sequentially irradiating a plurality of predetermined portions of the opening of the sheet member with laser light, and has the following feature: for at least a part of the plurality of predetermined portions of the opening, the one After the predetermined portion of the opening is irradiated with the laser light, a predetermined portion of the opening in a predetermined range is skipped from the predetermined portion of the opening, and the predetermined portion of the opening outside the predetermined range is irradiated with the laser light.

專利文獻1:日本特開2001-195112 Patent Document 1: Japanese Special Open 2001-195112

專利文獻2:日本特開2008-049398 Patent Document 2: JP-A-2008-049398

上述專利文獻1所記載之發明,係將1個加工區域分割成複數個區,且應用最近相鄰(nearest neighbor)法及2-opt法,決定最短路徑,藉此提高加工速度。然而,在專利文獻1記載之發明中,為了對最短路徑進行雷射加工,而對鄰接之開孔部位進行雷射照射之情形,恐有因蓄積之熱之影響而鄰接之孔徑較所設定之孔徑變大,而加工品質降低之問題。 According to the invention described in Patent Document 1, a single processing region is divided into a plurality of regions, and a nearest neighbor method and a 2-opt method are applied to determine a shortest path, thereby increasing the processing speed. However, in the invention described in Patent Document 1, in order to perform laser processing on the shortest path and to perform laser irradiation on the adjacent opening portion, there is a fear that the adjacent aperture is set by the influence of the accumulated heat. The problem that the pore diameter becomes large and the processing quality is lowered.

因此,在專利文獻2記載之發明中,為了排除蓄積之熱之影響,而不對鄰接之開孔預定部位進行雷射照射而進行孔加工。 Therefore, in the invention described in Patent Document 2, in order to eliminate the influence of the accumulated heat, the hole processing is performed without performing laser irradiation on a predetermined portion of the adjacent opening.

然而,在專利文獻2記載之發明中,由於對每隔1個開孔預定部位進行加工,因此無法以最短路徑進行雷射照射,相應地,加工路徑變長,加工效率降低。 However, in the invention described in Patent Document 2, since the predetermined portion of each of the openings is processed, it is impossible to perform the laser irradiation with the shortest path, and accordingly, the processing path becomes long, and the processing efficiency is lowered.

因此,本發明所欲解決之課題在於,即使在使加工路徑為最短之情形,亦可將因熱引起之孔徑之不均量抑制為最小限度,提高加工品質。 Therefore, the problem to be solved by the present invention is to reduce the unevenness of the pore diameter due to heat to a minimum and to improve the processing quality even when the processing path is the shortest.

為了解決上述問題,本發明係一種雷射加工方法,具有使從雷射光源射出之雷射光在印刷基板表面於X方向及Y方向掃描之掃描手段、以及使該印刷基板往X方向及Y方向移動之XY平台,且係對該印刷基板藉由該雷射光而進行開複數個孔之加工之雷射加工方法,其特徵在於:將使該雷射光掃描之該印刷基板分割成複數個掃描區域;將該掃描區域內之開孔之順序以掃描路徑成為最短之方式排序;於判斷藉由該排序手段而排序之孔中第N個孔與第N+1個孔(其中,N為「1≦N≦開孔之最大數-1」之整數)之距離為未滿預先設定之閾值,且判斷第N+1個孔非為該開孔之最大數之情形,進行調換該第N+1個孔與第N+2個孔之順序之調換;於判斷該第N個孔與藉由該調換手段而調換之該第N+1個孔之距離為未滿該閾值之情形,在對該第N個孔進行加工之後,以預先設定之散熱時間停止加工。 In order to solve the above problems, the present invention is a laser processing method, which has a scanning means for scanning laser light emitted from a laser light source in the X direction and the Y direction on a surface of a printed substrate, and moving the printed substrate in the X direction and the Y direction. a moving laser processing method, wherein the printed substrate is processed by the laser beam by the laser light, and the printed circuit board for scanning the laser light is divided into a plurality of scanning regions The order of the openings in the scanning area is sorted in such a manner that the scanning path is the shortest; the Nth hole and the N+1th hole in the hole sorted by the sorting means are judged (where N is "1" The distance between the maximum number of ≦N≦ openings and the integer of −1′′ is less than the preset threshold value, and it is determined that the N+1th hole is not the maximum number of the openings, and the N+1th is exchanged. Replacing the order of the holes and the N+2 holes; determining that the distance between the Nth hole and the N+1th hole exchanged by the switching means is less than the threshold value, After the Nth hole is processed, stop it with a preset heat dissipation time. work.

藉此,即使於使加工路徑為最短之情形,亦可將因熱引起之孔徑之不均量抑制為最小限度。 Thereby, even if the processing path is minimized, the unevenness of the pore diameter due to heat can be suppressed to a minimum.

根據本發明,即使於使加工路徑為最短之情形,亦可將因熱引起之孔徑之不均量抑制為最小限度,且使加工品質提高。 According to the present invention, even when the processing path is minimized, the unevenness of the pore diameter due to heat can be suppressed to a minimum, and the processing quality can be improved.

1‧‧‧雷射光源 1‧‧‧Laser light source

2‧‧‧雷射光 2‧‧‧Laser light

3a、3b‧‧‧檢流計鏡 3a, 3b‧‧‧ galvanometer mirror

4‧‧‧f θ透鏡 4‧‧‧f θ lens

5‧‧‧印刷基板 5‧‧‧Printing substrate

6‧‧‧XY平台 6‧‧‧XY platform

7‧‧‧掃描區域 7‧‧‧Scanning area

8‧‧‧控制裝置 8‧‧‧Control device

100‧‧‧雷射加工裝置 100‧‧‧ Laser processing equipment

A‧‧‧排序處理 A‧‧‧ sorting

B‧‧‧再排序處理 B‧‧‧Reordering

C‧‧‧加工處理 C‧‧‧Processing

H‧‧‧孔 H‧‧‧ hole

L‧‧‧距離 L‧‧‧ distance

LM‧‧‧閾值 LM‧‧‧ threshold

T‧‧‧停止時間 T‧‧‧ stop time

圖1係表示本發明之實施形態之雷射加工裝置之概略構成之圖式。 Fig. 1 is a view showing a schematic configuration of a laser processing apparatus according to an embodiment of the present invention.

圖2係表示本發明之實施形態中之雷射加工裝置之雷射加工路徑之一例之圖式。 Fig. 2 is a view showing an example of a laser processing path of the laser processing apparatus in the embodiment of the present invention.

圖3係藉由CPU(Central Processing Unit,中央處理單元)而執行之本 實施形態中之孔加工處理之主常式(main routine)的流程圖。 Figure 3 is a version executed by a CPU (Central Processing Unit) A flow chart of the main routine of the hole processing in the embodiment.

圖4係表示排序處理之次常式之處理順序之流程圖。 Fig. 4 is a flow chart showing the processing sequence of the subroutine of the sorting process.

圖5係表示再排序處理之次常式之處理順序之流程圖(其1)。 Fig. 5 is a flow chart (1) showing the processing sequence of the subroutine of the reordering process.

圖6係表示再排序處理之次常式之處理順序之流程圖(其2)。 Fig. 6 is a flow chart (2) showing the processing sequence of the subroutine of the reordering process.

圖7係表示再排序處理之次常式之處理順序之流程圖(其3)。 Fig. 7 is a flow chart (3) showing the processing sequence of the subroutine of the reordering process.

圖8係表示加工處理之次常式之處理順序之流程圖(其1)。 Fig. 8 is a flow chart (1) showing the processing sequence of the subroutine of the processing.

圖9係表示加工處理之次常式之處理順序之流程圖(其2)。 Fig. 9 is a flow chart (2) showing the processing sequence of the subroutine of the processing.

圖10係表示測定使距離變化時之孔徑之不均量之結果的圖式。 Fig. 10 is a view showing the result of measuring the unevenness of the pore diameter when the distance is changed.

以下,一邊參照圖式,一邊對本發明之實施形態進行說明。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

圖1係表示本發明之實施形態之雷射加工裝置之概略構成之圖式。於該圖中,雷射加工裝置100,基本上由雷射光源1、第1及第2檢流計鏡(galvanometer mirror)3a,3b、f θ透鏡4、XY平台6、及控制裝置8而構成。 Fig. 1 is a view showing a schematic configuration of a laser processing apparatus according to an embodiment of the present invention. In the figure, the laser processing apparatus 100 basically consists of a laser light source 1, a first and a second galvanometer mirror 3a, 3b, an f θ lens 4, an XY stage 6, and a control device 8. Composition.

在如此之基本構成之雷射加工裝置100中,從雷射光源1射出雷射光2,雷射光2經由第1及第2之檢流計鏡3a,3b及f θ透鏡4而在固定於XY平台6上之印刷基板5上於X方向及Y方向掃描。亦即,雷射光2通過f θ透鏡4而往印刷基板5表面照射,此時,藉由第1檢流計鏡3a而於X方向掃描,且藉由第2檢流計鏡3b而於Y方向掃描。XY平台使印刷基板5往X方向及Y方向移動。第1及第2檢流計鏡3a及3b藉由未圖示之檢流計式掃描器(galvanometer scanner)而驅動,且鏡之角度產生變化(搖動)。控制裝置8具備作為控制手段之未圖示之CPU及記憶體,對雷射 光源1、檢流計式掃描器、及XY平台6進行控制。 In the laser processing apparatus 100 having such a basic configuration, the laser light 2 is emitted from the laser light source 1, and the laser light 2 is fixed to the XY via the first and second galvanometer mirrors 3a, 3b and the f θ lens 4. The printed substrate 5 on the stage 6 is scanned in the X direction and the Y direction. That is, the laser light 2 is irradiated onto the surface of the printed circuit board 5 through the f θ lens 4, and at this time, it is scanned in the X direction by the first galvanometer mirror 3a, and is Y in the second galvanometer mirror 3b. Directional scanning. The XY stage moves the printed substrate 5 in the X direction and the Y direction. The first and second galvanometer mirrors 3a and 3b are driven by a galvanometer scanner (not shown), and the angle of the mirror changes (shakes). The control device 8 includes a CPU and a memory (not shown) as control means for the laser The light source 1, the galvanometer scanner, and the XY stage 6 are controlled.

另外,CPU包含控制部與運算部,控制部控制命令之解釋與程式之控制之流程,運算部執行運算。此外,程式儲存於未圖示之記憶體中,且將應執行之命令(某數值或數值之排列)從放置有該程式之記憶體中取出,執行該程式。 Further, the CPU includes a control unit and a calculation unit, and the control unit controls the flow of the interpretation of the command and the control of the program, and the calculation unit performs the calculation. Further, the program is stored in a memory not shown, and the command to be executed (arrangement of a numerical value or value) is taken out from the memory in which the program is placed, and the program is executed.

圖2係表示本實施形態中之雷射加工裝置之雷射加工路徑之一例的圖式。該圖係表示將固定在XY平台6上之印刷基板5放置於XY平面上之狀態之俯視圖,且表示印刷基板5上之掃描區域7內之第1至第6孔H(1)~H(6)之位置與加工路徑之狀態。 Fig. 2 is a view showing an example of a laser processing path of the laser processing apparatus in the embodiment. This figure is a plan view showing a state in which the printed substrate 5 fixed on the XY stage 6 is placed on the XY plane, and shows the first to sixth holes H(1) to H in the scanning area 7 on the printed substrate 5. 6) The position and the state of the machining path.

在圖2所示之例中,第1至第6之6個孔H(1)1~H(6)配置於印刷基板5表面之區域經分割之掃描區域7內。掃描區域7之尺寸由f θ透鏡4之尺寸而決定。以使掃描區域7內之孔位置成為最短之方式而排序之路徑(以實線表示),係將第1孔H(1)至第6孔H(6)按照數字變大之順序連接之路徑L1、L2、L3、L4、L5。為了防止第1孔H(1)至第2孔H(2)之距離較短而加工第1孔H(1)之熱影響到第2孔(2)而改變連接之路徑係L1'、L2'、L3'、L4、L5。該L1'為從第1孔H(1)朝向第3孔H(3)之路徑,該L2'為從第3孔H(3)朝向第2孔H(2)之路徑,該L3'為從第2孔H(2)朝向第4孔H(4)之路徑。另外,在CPU執行程式時所參照之記憶體中,為了加工而輸入有該等之孔H(1)~H(6)之座標值。 In the example shown in FIG. 2, the first to sixth six holes H(1)1 to H(6) are disposed in the divided scanning region 7 in the region on the surface of the printed substrate 5. The size of the scanning area 7 is determined by the size of the f θ lens 4. A path (indicated by a solid line) in which the positions of the holes in the scanning area 7 are minimized is a path in which the first holes H(1) to the sixth holes H(6) are connected in order of increasing numbers. L1, L2, L3, L4, L5. In order to prevent the distance between the first hole H(1) and the second hole H(2) from being short, the heat of processing the first hole H(1) affects the second hole (2) and changes the path of the connection L1', L2 ', L3', L4, L5. The L1' is a path from the first hole H(1) toward the third hole H(3), and the L2' is a path from the third hole H(3) toward the second hole H(2), and the L3' is The path from the second hole H(2) toward the fourth hole H(4). Further, in the memory referred to by the CPU when the program is executed, the coordinate values of the holes H(1) to H(6) are input for processing.

圖3係表示藉由CPU而執行之本實施形態中之孔加工處理之主常式之流程圖。 Fig. 3 is a flow chart showing the main routine of the hole processing in the present embodiment executed by the CPU.

在圖3中之主常式中,首先,將印刷基板5整體分割成由f θ透鏡4之大小決定之掃描區域7(總數ME個)(步驟S1),且移行至排序處理A之次常式。在排序處理A中,以使加工路徑成為最短之方式,將對掃描區域7內之孔進行加工之順序進行排序(步驟S2)。接著,執行再排序處理B之次常式(步驟S3),再排序處理B完成後,執行加工處理C之次常式(步驟S4)。然後,將步驟S1至步驟S4之處理重複進行直至XY平台6上所設定之所有印刷基板5之加工完成為止(步驟S5),於完成所有印刷基板5之加工之時點,結束主常式之處理。 In the main routine of FIG. 3, first, the entire printed circuit board 5 is divided into scan areas 7 (the total number of ME) determined by the size of the f θ lens 4 (step S1), and the shift to the sort processing A is often performed. formula. In the sorting process A, the order of processing the holes in the scanning area 7 is sorted so that the machining path is the shortest (step S2). Next, the subroutine of the reordering process B is executed (step S3), and after the reordering process B is completed, the subroutine of the process C is executed (step S4). Then, the processing of steps S1 to S4 is repeated until the processing of all the printed substrates 5 set on the XY stage 6 is completed (step S5), and the processing of the main routine is ended when the processing of all the printed substrates 5 is completed. .

圖4係表示排序處理A之次常式之處理順序之流程圖。在排序處理A中,首先,將表示已分割之掃描區域7之編號之變數M設為1(步驟S201),使用2-opt法等之局部探索法並以加工路徑成為最短之方式排序掃描區域7內之孔之順序(步驟S202),使經排序之孔為第1個孔H(1)至最後(第NE個,其中,NE為2以上之整數)的孔H(NE)(步驟S203),將第1~第NE個孔H(1)~H(NE)之座標記憶於控制裝置(之記憶體)8(步驟S204)。之後,判斷是否為最後之掃描區域ME(步驟S205)。藉由該判斷,若變數M小於ME則將變數M加上1(步驟S206),往步驟S202移行,並重複之後之處理。然後,於步驟S205中,變數M成為ME之時點(成為最後之掃描區域ME之時點)結束排序處理。 4 is a flow chart showing the processing sequence of the subroutine of the sorting process A. In the sorting process A, first, the variable M indicating the number of the divided scanning areas 7 is set to 1 (step S201), and the scanning area is sorted by using the local search method such as the 2-opt method and the processing path becomes the shortest. The order of the holes in 7 (step S202), the sorted holes are the holes H (NE) from the first hole H (1) to the last (the NE, wherein NE is an integer of 2 or more) (step S203) The coordinates of the first to NEth holes H(1) to H(NE) are stored in the control device (memory) 8 (step S204). Thereafter, it is judged whether or not it is the last scan area ME (step S205). With this judgment, if the variable M is smaller than the ME, the variable M is incremented by 1 (step S206), the process proceeds to step S202, and the subsequent processes are repeated. Then, in step S205, the sorting process is ended when the variable M becomes the ME point (the time point when the last scan area ME is reached).

圖5、圖6及圖7,係表示再排序處理B之次常式之處理順序之流程圖。在再排序處理中,於排序處理A完成之後(步驟S205:Y),將變數M設為1(步驟S301),將孔之編號N設為1(步驟S302),求出第N個孔H(N)與第N+1個孔H(N+1)之距離L(步驟S303)。若距離L 為預先設定之閾值LM以上(步驟S304:Y),則判斷N+1是否為最後之孔編號(步驟S305),於非為最後的孔之情形時(步驟S305:N),將孔之編號加算1而設為N=N+1(步驟S306)後,返回至步驟S303之處理,重複進行之後的處理。另外,一旦下一個孔於加工前一個孔之後一刻連續地進行加工,則閾值LM係孔徑因熱之影響而變大之距離。 5, 6, and 7 are flowcharts showing the processing procedure of the subroutine of the reordering process B. In the reordering process, after the sorting process A is completed (step S205: Y), the variable M is set to 1 (step S301), and the hole number N is set to 1 (step S302), and the Nth hole H is obtained. (N) The distance L from the (N+1)th hole H(N+1) (step S303). If distance L If it is equal to or greater than the preset threshold LM (step S304: Y), it is determined whether N+1 is the last hole number (step S305), and when it is not the last hole (step S305: N), the hole number is When 1 is added and N=N+1 is set (step S306), the process returns to step S303, and the subsequent processes are repeated. Further, once the next hole is continuously processed one time after the one hole before the processing, the threshold LM system aperture becomes a large distance due to the influence of heat.

在步驟S304中,若距離L未達閾值LM(步驟S304:N),則移行至圖6之流程圖,判斷編號N+1是否為最後的孔(步驟S307)。藉由該判斷,於非為最後的孔之情形時(步驟S307:N),將第N+1個孔H(N+1)與第N+2個孔H(N+2)調換(步驟S308)後,再次求出第N個孔H(N)與第N+1個孔H(N+1)之距離L(步驟S309)。然後,將距離L與閾值LM進行比較(步驟S310),若距離L為閾值LM以上,則返回至步驟S306之處理並重複進行之後的處理。另一方面,若距離L未達閾值LM(步驟S310:N),則於加工程式上追加第N個孔H(N)之加工後用以散熱之停止時間(散熱時間)T(步驟S311),返回至步驟S306之處理並重複進行之後之處理。 In step S304, if the distance L does not reach the threshold value LM (step S304: N), the flow proceeds to the flowchart of Fig. 6, and it is determined whether or not the number N+1 is the last hole (step S307). By this judgment, when the case is not the last hole (step S307: N), the N+1th hole H(N+1) and the N+2th hole H(N+2) are exchanged (step) After S308), the distance L between the Nth hole H(N) and the N+1th hole H(N+1) is obtained again (step S309). Then, the distance L is compared with the threshold LM (step S310), and if the distance L is equal to or greater than the threshold LM, the process returns to the process of step S306 and the subsequent processes are repeated. On the other hand, if the distance L does not reach the threshold value LM (step S310: N), the stop time (heat dissipation time) T for heat dissipation after the processing of the Nth hole H(N) is added to the machining program (step S311). The process returns to the process of step S306 and the subsequent processes are repeated.

於步驟S307中判斷N+1為最後的孔之編號NE之情形時,於加工程式上追加第N個孔H(N)之加工後用以散熱之停止時間T(步驟S312),移行至圖7之流程圖之步驟S313,於步驟S313中判斷是否有接下來將進行加工之掃描區域7,亦即,判斷是否為M=ME,若有接下來將進行加工之掃描區域7(步驟S313:N),則將變數M加上1而設為M=M+1(步驟S314)並移行至步驟S302之處理,重複進行之後的處理。於步驟S313中若無接下來將進行加工之掃描區域7(步驟S313:Y),則結束再排序處 理。 When it is determined in step S307 that N+1 is the last hole number NE, the stop time T for heat dissipation after the processing of the Nth hole H(N) is added to the processing program (step S312), and the flow is shifted to the map. In step S313 of step 7, it is determined in step S313 whether there is a scanning area 7 to be processed next, that is, whether or not M=ME is determined, and if there is a scanning area 7 to be processed next (step S313: In the case of N), the variable M is incremented by 1 and M=M+1 is set (step S314), and the process proceeds to step S302, and the subsequent processes are repeated. If there is no scan area 7 to be processed next in step S313 (step S313: Y), the reordering is ended. Reason.

圖8及圖9,係表示加工處理C之次常式之處理順序之流程圖。在加工處理C中,首先,將表示掃描區域7之變數M設為1(步驟S401),將孔編號N設為1(步驟S402),而加工第N個孔H(N)(步驟S403)。之後,若於加工程式上設定有第N個孔H(N)之加工後用以散熱之停止時間T(步驟S404:Y),則以時間T停止加工(步驟S405),若未設定停止時間T(步驟S404:N),則不停止,並判斷N是否為最後之孔編號NE(步驟S406)。 8 and 9 are flowcharts showing the processing procedure of the subroutine of the processing process C. In the processing C, first, the variable M indicating the scanning area 7 is set to 1 (step S401), the hole number N is set to 1 (step S402), and the Nth hole H(N) is processed (step S403). . After that, if the stop time T for heat dissipation after the processing of the Nth hole H(N) is set in the processing program (step S404: Y), the processing is stopped at time T (step S405), and if the stop time is not set. T (step S404: N), it is not stopped, and it is judged whether N is the last hole number NE (step S406).

藉由該判斷而N為最後之孔編號NE(步驟S406:Y),而無接下來將進行加工之掃描區域7之情形時(步驟S408:Y),結束加工處理C,移行至步驟S5。於有接下來將進行加工之掃描區域7之情形時(步驟S408:N),設為M=M+1(步驟S409)並返回至步驟S402,重複進行其之後的處理。若步驟S406中N非為最後之孔編號NE(步驟S406:N),則將N加上1(步驟S407),返回至步驟S403,並重複進行步驟S403之後之處理。 By this determination, N is the last hole number NE (step S406: Y), and when there is no scan region 7 to be processed next (step S408: Y), the processing C is ended, and the process proceeds to step S5. When there is a scan area 7 to be processed next (step S408: N), M=M+1 is set (step S409), and the process returns to step S402, and the subsequent processes are repeated. If N is not the last hole number NE in step S406 (step S406: N), N is added to 1 (step S407), the process returns to step S403, and the process after step S403 is repeated.

圖10係表示測定使距離L變化時之孔徑之不均量之結果的圖式。縱軸之孔徑之不均量,係進行孔徑65 μm之雷射加工,從已加工之孔徑之測定值減去孔徑65 μm後之值。 Fig. 10 is a view showing the result of measuring the unevenness of the pore diameter when the distance L is changed. The unevenness of the aperture of the vertical axis is laser processing with a hole diameter of 65 μm, and the value after the aperture is 65 μm is subtracted from the measured value of the processed aperture.

品質上無問題之孔徑之不均量係0.4 μm以下,為了使孔徑之不均量為0.4 μm以下,距離L之閾值LM從圖10可知若設為約800 μm以上為較佳。此外,由實驗上可知,即使於距離L未滿800 μm之情形,若將停止時間T設定為10 msec以上,則孔徑不均量將成為0.4 μm以下。 The unevenness of the aperture of the quality is 0.4 μm or less. In order to make the aperture unevenness 0.4 μm or less, the threshold LM of the distance L is preferably about 800 μm or more from FIG. Further, it is experimentally known that even when the distance L is less than 800 μm, if the stop time T is set to 10 msec or more, the aperture unevenness is 0.4 μm or less.

另外,該閾值LM及該停止時間T,係預先以實機針對每一 成為加工對象之印刷基板測量孔徑、閾值LM、及停止時間T,並將其結果儲存於輸入該座標值之記憶體中。在記憶體中將該測量結果例如以作為表格之方式保持,根據需要並參照CPU,使表格之值反映於控制。 In addition, the threshold LM and the stop time T are preset for each machine in real time. The printed substrate measurement aperture, the threshold value LM, and the stop time T to be processed are stored, and the result is stored in the memory in which the coordinate value is input. The measurement result is held in the memory as a table, for example, and the CPU is used as needed to reflect the value of the table in the control.

如以上般,根據本實施形態,以使加工路徑成為最短之方式而排序掃描區域7內之孔H之順序,於2個連續之成為開孔之對象之孔之距離L短於閾值LM之情形時,於移至下一個孔之加工之前以預先設定之時間T用以散熱而停止加工,因此即使於使加工路徑為最短之情形,亦可使因熱引起之孔徑之不均量為最小,且可使加工品質提高。 As described above, according to the present embodiment, the order of the holes H in the scanning region 7 is sorted so that the processing path is the shortest, and the distance L of the holes which are the targets of the two consecutive openings is shorter than the threshold LM. At the time of moving to the next hole, the processing is stopped by heat dissipation for a predetermined time T. Therefore, even if the processing path is minimized, the unevenness of the aperture due to heat can be minimized. And the processing quality can be improved.

另外,申請專利範圍中之雷射光源於本實施形態中對應符號1,雷射光對應符號2,掃描手段對應第1及第2檢流計鏡3a,3b以及f θ透鏡4,XY平台對應符號6,印刷基板對應符號5,雷射加工裝置對應符號100,距離對應符號L,閾值對應符號LM,散熱時間對應停止時間T,分割步驟對應步驟S1,排序步驟對應包含步驟S201~S206之排序處理A(步驟S2),調換步驟對應步驟S303~S308(再排序處理B:步驟S3),加工停止步驟對應步驟S404及步驟S405(加工處理C)。此外,分割步驟、排序步驟、調換步驟及加工停止步驟,作為控制裝置8之CPU之程式而設定,且藉由CPU而執行。 In addition, the laser light source in the patent application scope corresponds to the symbol 1 in the present embodiment, the laser light corresponds to the symbol 2, and the scanning means corresponds to the first and second galvanometer mirrors 3a, 3b and the f θ lens 4, and the XY platform corresponding symbol. 6. The printed substrate corresponds to the symbol 5, the laser processing device corresponds to the symbol 100, the distance corresponding symbol L, the threshold corresponding symbol LM, the heat dissipation time corresponds to the stop time T, the dividing step corresponds to the step S1, and the sorting step corresponds to the sorting process of the steps S201 to S206. A (step S2), the switching step corresponds to steps S303 to S308 (reordering process B: step S3), and the machining stop step corresponds to step S404 and step S405 (processing process C). Further, the dividing step, the sorting step, the changing step, and the processing stopping step are set as the program of the CPU of the control device 8, and are executed by the CPU.

進一步地,本發明並不限定於上述實施形態,於不脫離本發明之要旨之範圍內可進行各種之變形,且申請專利範圍所記載之技術思想中所包含之技術性事項之全部成為本發明之對象。上述實施形態,係表示較佳之例者,但對本領域技術人員而言,可根據本說明書所揭示之內容,實現各種之代替例、修正例、變形例或改良例,且該等包含於隨附之申請 專利範圍中所記載之技術性範圍。 Further, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit and scope of the invention, and all of the technical matters included in the technical idea described in the claims are the invention. Object. The above embodiments are preferred, but those skilled in the art can implement various alternatives, modifications, modifications, or improvements in accordance with the disclosure of the present disclosure, and Application The technical scope described in the patent scope.

S1~S5‧‧‧步驟S1~步驟S5 S1~S5‧‧‧Step S1~Step S5

Y‧‧‧是 Y‧‧‧Yes

N‧‧‧否 N‧‧‧No

Claims (3)

一種雷射加工方法,係具有使從雷射光源射出之雷射光在印刷基板表面於X方向及Y方向掃描之掃描手段、及使該印刷基板往X方向及Y方向移動之XY平台,且對該印刷基板藉由該雷射光進行開複數個孔之加工,其特徵在於:將使該雷射光掃描之該印刷基板分割成複數個掃描區域;將該掃描區域內之開孔之順序以掃描路徑之距離成為最短之方式排序;於判斷該已排序之孔中第N個孔與第N+1個孔(其中,N為「1≦N≦開孔之最大數-1」之整數)之距離為未滿預先設定之閾值,且判斷第N+1個孔非為該開孔之最大數之情形,調換該第N+1個孔與第N+2個孔之順序;以及於判斷該第N個孔與該已調換之第N+1個孔之距離為未滿該閾值之情形,在對該第N個孔進行加工之後,以預先設定之散熱時間停止加工。 A laser processing method includes a scanning means for scanning a laser beam emitted from a laser light source in a X direction and a Y direction on a surface of a printed substrate, and an XY stage for moving the printed substrate in the X direction and the Y direction, and The printed substrate is processed by the plurality of holes by the laser light, wherein the printed circuit board for scanning the laser light is divided into a plurality of scanning regions; and the order of the openings in the scanning region is in a scanning path The distance is the shortest way to sort; to determine the distance between the Nth hole and the N+1th hole in the sorted hole (where N is an integer of "1≦N≦ the largest number of openings-1") If the threshold value is less than the preset threshold, and it is determined that the N+1th hole is not the maximum number of the openings, the order of the N+1th hole and the N+2 hole is reversed; The distance between the N holes and the replaced N+1th hole is less than the threshold value, and after processing the Nth hole, the processing is stopped with a preset heat dissipation time. 一種雷射加工裝置,其特徵在於,具備執行申請專利範圍第1項之雷射加工方法之控制部。 A laser processing apparatus comprising: a control unit that executes the laser processing method of the first application of the patent scope. 一種雷射加工程式,其特徵在於,使雷射加工裝置之控制部執行申請專利範圍第1項之雷射加工方法。 A laser processing program is characterized in that a control unit of a laser processing apparatus executes a laser processing method of the first application of the patent scope.
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