TWI606880B - Optical modulation control method, control program, control device, and laser light irradiation device - Google Patents

Optical modulation control method, control program, control device, and laser light irradiation device Download PDF

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TWI606880B
TWI606880B TW101133602A TW101133602A TWI606880B TW I606880 B TWI606880 B TW I606880B TW 101133602 A TW101133602 A TW 101133602A TW 101133602 A TW101133602 A TW 101133602A TW I606880 B TWI606880 B TW I606880B
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light
aforementioned
propagation
spatial light
modulation pattern
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TW201410370A (en
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Naoya Matsumoto
Takashi Inoue
Yuu Takiguchi
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Hamamatsu Photonics Kk
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光調變控制方法、控制程式、控制裝置、及雷射光照射裝置 Light modulation control method, control program, control device, and laser light irradiation device

本發明,係有關於根據在空間光調變器之複數的像素中所呈現的調變圖案來控制對於集光點之雷射光的集光照射之光調變控制方法、控制程式、控制裝置、以及使用有此之雷射光照射裝置。 The present invention relates to a light modulation control method, a control program, a control device, and a control method for controlling light collection illumination of laser light for a light collection point according to a modulation pattern presented in a plurality of pixels of a spatial light modulator. And using the laser light irradiation device therewith.

近年來,於玻璃內部而將導波路徑、光分歧器、方向性耦合器等之光積體電路作3維性製作的研究係為盛行。作為此種光積體電路之其中一個製作方法,係存在有使用毫微微秒雷射光之方法。在此方法中,例如,係在毫微微秒雷射光之集光點處,藉由雙光子吸收等來誘發衝擊,藉由此,而能夠實行局部性地使玻璃之折射率改變的加工。又,此種對於照射對象物之雷射光的集光照射,除了光積體電路之製作以外,亦在各種之雷射加工裝置,或者對於雷射光之散射、反射作觀察的雷射顯微鏡等中而被廣泛使用(例如,參考專利文獻1~3、非專利文獻1~6)。 In recent years, research on the three-dimensional production of an optical system such as a waveguide, a light splitter, or a directional coupler inside the glass has been popular. As one of the manufacturing methods of such an optical unit circuit, there is a method of using femtosecond laser light. In this method, for example, at the spot of the femtosecond laser light, the impact is induced by two-photon absorption or the like, whereby the processing for locally changing the refractive index of the glass can be performed. Further, in addition to the production of the optical integrated circuit, the collected light of the laser light of the object to be irradiated is also used in various laser processing apparatuses or laser microscopes for observing scattering and reflection of laser light. However, it is widely used (for example, refer to Patent Documents 1 to 3 and Non-Patent Documents 1 to 6).

於此,當使用從雷射光源所射出之1根的雷射光束,來進行複雜之3維構造的加工等之雷射光照射的情況時,係有著在該加工工程中會耗費極長的時間之問題。作為此情況下之加工時間的縮短方法,係考慮有由複數之集光點所進行的多點同時加工之方法。用以實現此種方法之最為簡單的構成,係為使用從複數之雷射光源所供給而來之複 數根的雷射光束之構成。然而,此種構成,若是考慮到準備複數之雷射光源所需的成本以及設置空間等,則可以得知係並不實際。 In this case, when a laser beam emitted from a laser light source is used to perform laser irradiation such as processing of a complicated three-dimensional structure, it takes a very long time in the processing. The problem. As a method of shortening the processing time in this case, a method of simultaneous multi-point processing by a plurality of light collecting points is considered. The simplest configuration for implementing this method is the use of multiple laser sources. The composition of a number of laser beams. However, such a configuration can be known to be impractical in view of the cost and space required for preparing a plurality of laser light sources.

相對於此,係對於使用相位調變型之空間光調變器(SLM:Spatial Light Modulator)以及藉由數值計算所求取出之全像圖(CGH:Computer Generated Hologram),來實現多點同時加工之方法有所檢討。若是將雷射光輸入至呈現有CGH之空間光調變器中,則因應於CGH之調變圖案,輸入光之相位係被調變。而後,若是將從光調變器所輸出之調變雷射光的波面,藉由傅立葉變換透鏡來集光,則係能夠從1根的雷射光束來作出複數之集光點,而使由多點同時照射所致之同時加工、同時觀察等成為可能。 On the other hand, the multi-point simultaneous processing is realized by using a phase modulation type spatial light modulator (SLM: Spatial Light Modulator) and a numerically calculated total image (CGH: Computer Generated Hologram). The method has been reviewed. If the laser light is input to the spatial light modulator exhibiting CGH, the phase of the input light is modulated in response to the CGH modulation pattern. Then, if the wavefront of the modulated laser light output from the optical modulator is collected by the Fourier transform lens, the plurality of light collecting points can be made from one laser beam, and It is possible to simultaneously process, simultaneously observe, etc. due to simultaneous irradiation.

在使用有空間光調變器之在照射對象物(加工對象物)的內部之多點同時加工中,係能夠在相對於光軸而為垂直之1個面內,而將雷射光集光於任意之位置處。又,在此種多點同時加工中,藉由使用在空間光調變器中呈現具有透鏡效果之夫瑞乃透鏡圖案等的方法,也能夠將雷射光集光於亦包含有光軸方向之3維的任意之位置處。 In the simultaneous processing of multiple points inside the object to be irradiated (object to be processed) using the spatial light modulator, it is possible to collect the laser light in one plane perpendicular to the optical axis. Any position. Further, in such multi-point simultaneous processing, it is also possible to collect the laser light in the direction including the optical axis by using a method of exhibiting a lens pattern having a lens effect in a spatial light modulator. Any position in 3D.

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本特開2010-058128號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-058128

[專利文獻2]日本特開2010-075997號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2010-075997

[專利文獻3]日本專利第4300101號公報 [Patent Document 3] Japanese Patent No. 4300101

[非專利文獻] [Non-patent literature]

[非專利文獻1] J. Bengtsson, “Kinoform design with an optimal-rotation-angle method”, Appl. Opt. Vol. 33 No. 29 (1994) pp. 6879-6884 [Non-Patent Document 1] J. Bengtsson, "Kinoform design with an optimal-rotation-angle method", Appl. Opt. Vol. 33 No. 29 (1994) pp. 6879-6884

[非專利文獻2] J. Bengtsson, “Design of fan-out kinoforms in the entire scalar diffraction regime with an optimal-rotation-angle method”, Appl. Opt. Vol. 36 No. 32 (1997) pp. 8435-8444 [Non-Patent Document 2] J. Bengtsson, "Design of fan-out kinoforms in the entire scalar diffraction regime with an optimal-rotation-angle method", Appl. Opt. Vol. 36 No. 32 (1997) pp. 8435- 8444

[非專利文獻3] N. Yoshikawa et al., “Phase optimization of a kinoform by simulated annealing”, Appl. Opt. Vol. 33 No. 5 (1994) pp. 863-868 [Non-Patent Document 3] N. Yoshikawa et al., "Phase optimization of a kinoform by simulated annealing", Appl. Opt. Vol. 33 No. 5 (1994) pp. 863-868

[非專利文獻4] N. Yoshikawa et al., “Quantized phase optimization of two-dimensional Fourier kinoforms by a genetic algorithm”, Opt. Lett. Vol. 20 No. 7 (1995) pp. 752-754 [Non-Patent Document 4] N. Yoshikawa et al., "Quantized phase optimization of two-dimensional Fourier kinoforms by a genetic algorithm", Opt. Lett. Vol. 20 No. 7 (1995) pp. 752-754

[非專利文獻5] C. Mauclair et al., “Ultrafast laser writing of homogeneous longitudinal waveguides in glasses using dynamic wavefront correction”, Opt. Exp. Vol. 16 No. 8 (2008) pp. 5481-5492 [Non-Patent Document 5] C. Mauclair et al., "Ultrafast laser writing of homogeneous longitudinal waveguides in glasses using dynamic wave front correction", Opt. Exp. Vol. 16 No. 8 (2008) pp. 5481-5492

[非專利文獻6] A. Jesacher et al., “Parallel direct laser writing in three dimensions with spatially dependent aberration correction”, Opt. Exp. Vol. 18 No. 20 (2010) pp. 21090-21099 [Non-Patent Document 6] A. Jesacher et al., "Parallel direct laser writing in three dimensions with spatially dependent aberration correction", Opt. Exp. Vol. 18 No. 20 (2010) pp. 21090-21099

[非專利文獻7]久保田廣、「光學」、岩波書店、1967年、pp. 128~131、pp. 300~301 [Non-Patent Document 7] Kubota Hiroshi, "Optical", Iwanami Bookstore, 1967, pp. 128~131, pp. 300~301

[非專利文獻8] Y. Ogura et al., “Wavelength-multiplexing diffractive phase elements: design, fabrication, and performance evaluation”, J. Opt. Soc. Am. A Vol. 18 No. 5 (2001) pp. 1082-1092 [Non-Patent Document 8] Y. Ogura et al., "Wavelength-multiplexing diffractive phase elements: design, fabrication, and performance evaluation", J. Opt. Soc. Am. A Vol. 18 No. 5 (2001) pp. 1082-1092

在上述之對於照射對象物的雷射光之集光照射中,當在從空間光調變器起所對於照射對象物之雷射光的傳播路徑上存在有像差物體的情況時,進行傳播之雷射光係成為會受到像差的影響。例如,當藉由雷射光照射來進行玻璃內部之加工的情況時,在從對物透鏡所射出的收斂光中,會起因於身為氛圍媒質之空氣和身為加工對象物之玻璃媒體之間的折射率之差,而產生焦點位置之偏移(像差)。 In the case of the collected light irradiation of the laser light to the object to be irradiated, when there is an aberration object on the propagation path of the laser beam to the object to be irradiated from the spatial light modulator, the thunder is propagated. The light system is affected by aberrations. For example, when the inside of the glass is processed by laser irradiation, the convergence light emitted from the objective lens is caused by the air which is the atmosphere medium and the glass medium which is the object to be processed. The difference in refractive index produces an offset (aberration) of the focus position.

若是發生有此種像差,則雷射光之集光點的形狀會在光軸方向上而伸長,在集光點處之集光密度係降低。於此情況,當對於對象物進行加工時,會產生下述等之問題:亦即是,為了使集光點處之雷射光強度到達加工臨限值,係必須要將射入雷射光強度提高,或者是,會由於集光形狀之伸長,而導致成為無法進行細微加工。此種像差之影響的問題,係並不僅侷限於多點同時照射的情況,在將雷射光集光照射於單一之集光點處的情況時,亦同樣會發生。 If such an aberration occurs, the shape of the light collecting spot of the laser light is elongated in the optical axis direction, and the collected optical density at the light collecting point is lowered. In this case, when the object is processed, the following problems occur: that is, in order to make the intensity of the laser light at the light collecting point reach the processing threshold, it is necessary to increase the intensity of the incident laser light. Or, it is impossible to perform fine processing due to the elongation of the collected shape. The problem of the influence of such aberrations is not limited to the case of simultaneous multi-point illumination, and it also occurs when the laser light is collected by a single collection spot.

本發明,是為了解決上述之問題點所進行者,並以提供一種能夠將在集光點處之雷射光的集光狀態作適當的控制之光調變控制方法、光調變控制程式、光調變控制裝置以及使用有此之雷射光照射裝置一事,作為目的。 The present invention has been made to solve the above-mentioned problems, and provides an optical modulation control method, a light modulation control program, and a light that can appropriately control the light collecting state of the laser light at the light collecting point. The modulation control device and the use of the laser light irradiation device therefor are for the purpose.

為了達成此種目的,由本發明所致之光調變控制方法,(1)係為使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的雷射光之集光照射之光調變控制方法,其特徵為,具備有:(2)照射條件取得步驟,係作為雷射光之照射條件,而取得對於空間光調變器之雷射光的射入圖案、和位在從空間光調變器所對於集光點之雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於第1傳播媒質而更靠集光點側處之第2傳播媒質的與第1折射率相異之第2折射率n2;和(3)集光條件設定步驟,係作為雷射光之集光條件,而對於將從空間光調變器而來之雷射光作集光照射的集光點之個數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和(4)像差條件導出步驟,係將在從空間光調變器所對於集光點s之雷射光的傳播中,由折射率互為相異之第1傳播媒質以及第2傳播媒質所產生的像差條件作導出;和(5)調變圖案設計步驟,係對於藉由像差條件導出步驟所導出之像差條件作考慮,而對於在空間光調變器中所呈現之調變圖案作設計,(6)調變圖案設計步驟,係想定為在空間光調變器中而被作了2維配列之複數的像素,並對於在複數之像素中所呈現的調變圖案之於1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀 態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於相位值作變更,再將此種相位值之變更操作,針對調變圖案之全部的像素而進行之,藉由此來設計調變圖案,並且,在對於集光點處之集光狀態進行評價時,係針對從空間光調變器之調變圖案中的像素j起所對於集光點s之光的傳播,而使用在傳播媒質為均質的狀態下之自由傳播的波動傳播函數中加上了像差條件所變換的傳播函數In order to achieve such a purpose, the optical modulation control method according to the present invention, (1) is a phase modulation type of laser light output using input laser light and modulating the phase of the laser light and then modulating the phase. a spatial light modulator for controlling a light modulation control of the collected light of the laser light for the set light collection point according to the modulation pattern presented in the spatial light modulator, wherein The method includes: (2) an irradiation condition obtaining step of obtaining an incident pattern of the laser light for the spatial light modulator and a position of the light collecting point from the spatial light modulator as the irradiation condition of the laser light. The first refractive index n 1 of the first propagation medium on the propagation path of the laser light is different from the first refractive index of the second propagation medium located closer to the light collecting point than the first propagation medium The second refractive index n 2 ; and (3) the concentrating condition setting step is used as a light collecting condition of the laser light, and the collecting point of the laser light from the spatial light modulator is collected. Number s t , and individual collection positions and sets of s t collection points s The light intensity is set, wherein s t is an integer of 1 or more; and (4) the aberration condition deriving step is to be refracted by the propagation of the laser light from the spatial light modulator to the light collecting point s The aberration conditions generated by the first propagation medium and the second propagation medium are mutually derived; and (5) the modulation pattern design step is performed on the aberration condition derived by the aberration condition derivation step Considering, for the design of the modulation pattern presented in the spatial light modulator, (6) the modulation pattern design step, which is intended to be a multi-dimensional array of pixels in the spatial light modulator. And paying attention to the influence of the change of the phase value at one pixel of the modulation pattern presented in the plurality of pixels for the light collection state of the laser light at the collection point, so that the The state in which the light collecting state is close to the desired state, and the phase value is changed, and the phase value changing operation is performed on all the pixels of the modulation pattern, thereby designing the modulation pattern. And, in the light collecting state at the light collecting point When the price of the system for the wave propagation function of the propagation state free from the spatial light modulator of the modulator propagation pattern of variations in pixel j is the starting point s to the collector of the light, and the use in the propagation medium is homogeneous Add the propagation function transformed by the aberration condition .

又,由本發明所致之光調變控制程式,(1)係為用以使電腦,實行使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的雷射光之集光照射之光調變控制程式,其特徵為,係使電腦實行:(2)照射條件取得處理,係作為雷射光之照射條件,而取得對於空間光調變器之雷射光的射入圖案、和位在從空間光調變器所對於集光點之雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於第1傳播媒質而更靠集光點側處之第2傳播媒質的與第1折射率相異之第2折射率n2;和(3)集光條件設定處理,係作為雷射光之集光條件,而對於將從空間光調變器而來之雷射光作集光照射的集光點之個數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和(4)像差條件導出處理,係將在從空間光調變器所對於集光點s之雷射光的傳播中 ,由折射率互為相異之第1傳播媒質以及第2傳播媒質所產生的像差條件作導出;和(5)調變圖案設計處理,係對於藉由像差條件導出處理所導出之像差條件作考慮,而對於在空間光調變器中所呈現之調變圖案作設計,(6)調變圖案設計處理,係想定為在空間光調變器中而被作了2維配列之複數的像素,並對於在複數之像素中所呈現的調變圖案之於1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於相位值作變更,再將此種相位值之變更操作,針對調變圖案之全部的像素而進行之,藉由此來設計調變圖案,並且,在對於集光點處之集光狀態進行評價時,係針對從空間光調變器之調變圖案中的像素j起所對於集光點s之光的傳播,而使用在傳播媒質為均質的狀態下之自由傳播的波動傳播函數中加上了像差條件所變換的傳播函數Further, the optical modulation control program according to the present invention (1) is for causing a computer to perform a phase of the laser light output using the input laser light and modulating the phase of the laser light and then modulating the phase. A modulated spatial light modulator for controlling the light modulation control program for the collected light of the set light spot according to the modulation pattern presented in the spatial light modulator In order to perform the computer: (2) the irradiation condition acquisition processing is performed as the irradiation condition of the laser light, and the incident pattern of the laser light for the spatial light modulator is obtained, and the position is obtained from the spatial light modulator. The first refractive index n 1 of the first propagation medium on the propagation path of the laser light of the light collecting point, and the first propagation medium of the first propagation medium located closer to the light collecting point side than the first propagation medium The second refractive index n 2 having a different refractive index; and (3) the concentrating condition setting process is used as a light collecting condition of the laser light, and is used for collecting light from the laser light from the spatial light modulator. The number of collection points s t and the individual collections of the s t collection points s The position and the collected light intensity are set, wherein s t is an integer of 1 or more; and (4) the aberration condition derivation processing is performed in the propagation of the laser light from the spatial light modulator to the light collecting point s And the aberration conditions generated by the first propagation medium and the second propagation medium having mutually different refractive indices are derived; and (5) the modulation pattern design processing is performed on the image derived by the aberration condition derivation processing The difference condition is considered, and for the modulation pattern presented in the spatial light modulator, (6) the modulation pattern design processing is determined to be 2D-arranged in the spatial light modulator. a plurality of pixels, and pay attention to the influence of the change of the phase value at one pixel of the modulation pattern presented in the plurality of pixels for the light collection state of the laser light at the light collection point, The phase value is changed so that the light collecting state is close to the desired state, and the phase value changing operation is performed on all the pixels of the modulation pattern, thereby designing the adjustment Varying pattern, and, at the spotlighting point When the state is evaluated, based wave propagation function of the propagation for free under the state from the spatial light modulator propagation modulator pattern change device of the pixel j from the respect to the optical light collection point s of, and in the medium of propagation is homogeneous Add the propagation function transformed by the aberration condition .

又,由本發明所致之光調變控制裝置,(1)係為使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的雷射光之集光照射之光調變控制裝置,其特徵為,具備有:(2)照射條件取得手段,係作為雷射光之照射條件,而取得對於空間光調變器之雷射光的射入圖案、和位在從空間光調變器所對於集光點之雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於第1傳播媒質 而更靠集光點側處之第2傳播媒質的與第1折射率相異之第2折射率n2;和(3)集光條件設定手段,係作為雷射光之集光條件,而對於將從空間光調變器而來之雷射光作集光照射的集光點之個數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和(4)像差條件導出手段,係將在從空間光調變器所對於集光點s之雷射光的傳播中,由折射率互為相異之第1傳播媒質以及第2傳播媒質所產生的像差條件作導出;和(5)調變圖案設計手段,係對於藉由像差條件導出手段所導出之像差條件作考慮,而對於在空間光調變器中所呈現之調變圖案作設計,(6)調變圖案設計手段,係想定為在空間光調變器中而被作了2維配列之複數的像素,並對於在複數之像素中所呈現的調變圖案之於1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於相位值作變更,再將此種相位值之變更操作,針對調變圖案之全部的像素而進行之,藉由此來設計調變圖案,並且,在對於集光點處之集光狀態進行評價時,係針對從空間光調變器之調變圖案中的像素j起所對於集光點s之光的傳播,而使用在傳播媒質為均質的狀態下之自由傳播的波動傳播函數中加上了像差條件所變換的傳播函數Further, according to the optical modulation control device of the present invention, (1) is a phase modulation type spatial light modulation using a laser light that converts the phase of the laser light by inputting the laser light and modulating the phase of the laser light. The optical modulation control device for controlling the illumination of the collected light of the set light spot according to the modulation pattern presented in the spatial light modulator, characterized in that: 2) The irradiation condition obtaining means obtains the incident pattern of the laser light for the spatial light modulator and the propagation of the laser light at the light collecting point from the spatial light modulator as the irradiation condition of the laser light. The first refractive index n 1 of the first propagation medium on the path and the second refractive index different from the first refractive index of the second propagation medium located closer to the light collecting point side than the first propagation medium of n 2; and the number of light (3) the condition setting means sets, as the light-collecting condition of the laser line of light, and for the spatial light modulator is changed from the laser light from the irradiation light collection for collecting light spot s t And setting the individual collection position and collection intensity of the s t collection points s, Wherein, s t is an integer of 1 or more; and (4) a method for deriving aberration conditions, wherein the refractive indices are different from each other in the propagation of the laser light from the condensing point s of the spatial light modulator The aberration conditions generated by the first propagation medium and the second propagation medium are derived; and (5) the modulation pattern design means considers the aberration condition derived by the aberration condition derivation means, and The modulation pattern presented in the spatial light modulator is designed. (6) The modulation pattern design method is intended to be a multi-dimensional array of pixels in the spatial light modulator, and for the complex number The change of the phase value at one pixel of the modulation pattern presented in the pixel pays attention to the influence of the light collection state of the laser light at the light collection point, so that the light collection state is brought close to The phase value is changed in a desired state, and the phase value change operation is performed on all the pixels of the modulation pattern, thereby designing the modulation pattern, and in the set When the light collection state at the light spot is evaluated, it is directed to Spatial light modulator modulator propagation pattern of variations in pixel j is the starting point s to the collector of the light, and under the free state is used in a homogeneous propagation medium propagating wave propagation function Add the propagation function transformed by the aberration condition .

在上述之光調變控制方法、控制程式以及控制裝置中,針對使用有空間光調變器之對於集光點的雷射光之集光 照射,係取得雷射光之射入圖案、以及相關於傳播路徑上之第1、第2傳播媒質的資訊,並且,對於包含有雷射光之集光點的個數以及在各集光點處之集光位置、集光強度的集光條件作設定。而後,將由於在傳播路徑上存在有折射率相異之第1、第2傳播媒質一事所產生的像差條件導出,並對於該像差條件作考慮,而對於在空間光調變器中所呈現之調變圖案作設計。藉由此,係能夠對於所設定之單一或複數的集光點,而在各集光點處之雷射光的集光狀態中,將由第1、第2傳播媒質所導致的像差之影響降低。 In the above-described optical modulation control method, control program, and control device, for collecting light of a laser beam using a spatial light modulator for a light collecting point Irradiation, obtaining the incident pattern of the laser light and the information on the first and second propagation mediums on the propagation path, and the number of the collection points including the laser light and the points at the respective collection points The light collecting conditions of the light collecting position and the collected light intensity are set. Then, the aberration conditions caused by the presence of the first and second propagation media having different refractive indices on the propagation path are derived and considered for the aberration condition, and for the spatial light modulator. The tone pattern presented is designed. Thereby, it is possible to reduce the influence of the aberration caused by the first and second propagation media in the concentrating state of the laser light at each of the concentrating spots for the set single or plural concentrating points. .

進而,針對此種構成下之調變圖案的設計,具體而言,係在空間光調變器中,對於由被作了2維配列之複數的像素所致的像素構造作想定。之後,使用對於由在調變圖案之1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態所賦予的影響作注目之設計方法,並且在對於集光點處之集光狀態的評價中,並非使用假定為自由傳播的情況時之波動傳播函數,而是先變換為對於像差條件作了考慮的傳播函數,再對於集光狀態作評價。若依據此種構成,則係成為能夠對於在集光點處之雷射光的集光狀態適當且確實地進行評價、控制。另外,作為空間光調變器,當使用具備有被作了2維配列之複數的像素之空間光調變器的情況時,係可將其之像素構造直接適用於調變圖案之設計中。 Further, in the design of the modulation pattern under such a configuration, specifically, in the spatial light modulator, a pixel structure by a plurality of pixels which are arranged in two dimensions is conceivable. Thereafter, a design method that pays attention to the influence imparted by the light collecting state of the laser light at the light collecting point by the change of the phase value at one pixel of the modulation pattern is used, and at the light collecting point In the evaluation of the collected state, the wave propagation function when the case of assuming free propagation is not used , but first transformed into a propagation function that takes into account the aberration conditions. And then evaluate the state of light collection. According to such a configuration, it is possible to appropriately and reliably evaluate and control the light collection state of the laser light at the light collecting point. Further, as a spatial light modulator, when a spatial light modulator having a plurality of pixels arranged in two dimensions is used, the pixel structure can be directly applied to the design of the modulation pattern.

由本發明所致之雷射光照射裝置,其特徵為,具備有 :(a)雷射光源,係供給雷射光;和(b)相位調變型之空間光調變器,係輸入雷射光,並將雷射光之相位作調變,再將相位調變後之雷射光作輸出;和(c)上述構成之光調變控制裝置,係根據在空間光調變器中所呈現之調變圖案,來控制對於所設定的集光點之調變雷射光的集光照射。 A laser light irradiation device caused by the present invention is characterized in that it has (a) a laser source for supplying laser light; and (b) a phase modulation type spatial light modulator for inputting laser light and modulating the phase of the laser light, and then adjusting the phase after the thunder And (c) the optical modulation control device configured as described above controls the concentrating of the modulated laser light for the set concentrating point according to the modulation pattern presented in the spatial light modulator Irradiation.

若依據此種構成,則藉由光調變控制裝置,係成為能夠適當且確實地對於在集光點處之雷射光的集光狀態作控制,並適當地實現對於在照射對象物處所設定的單一或複數之集光點的雷射光之集光照射,以及由此所致之對象物的加工、觀察等的操作。此種雷射光照射裝置,例如係可作為雷射加工裝置、雷射顯微鏡等來使用。另外,作為空間光調變器,較理想,係使用具備有被作了2維配列之複數的像素,並且在複數的像素之各個處而分別將雷射光之相位作調變的構成之空間光調變器。 According to such a configuration, the optical modulation control device can appropriately and surely control the light collecting state of the laser light at the light collecting point, and appropriately set the position of the object to be irradiated. The illumination of the single or multiple collection points of the laser light, and the operation of the object, such as processing, observation, and the like. Such a laser light irradiation device can be used, for example, as a laser processing device, a laser microscope, or the like. Further, as the spatial light modulator, it is preferable to use a spatial light having a plurality of pixels which are arranged in two dimensions, and to adjust the phase of the laser light at each of the plurality of pixels. Modulator.

若依據本發明之光調變控制方法、控制程式、控制裝置、以及使用有此之雷射光照射裝置,則針對使用有空間光調變器之對於集光點的雷射光之集光照射,係取得雷射光之射入圖案、以及在傳播路徑上之第1、第2傳播媒質的折射率,並對於雷射光之集光點的個數以及在各集光點處之集光位置、集光強度作設定,再導出由於第1、第2傳播媒質所產生的像差條件,而對於該像差條件作考慮地來設計在空間光調變器中所呈現的調變圖案,並且,在調 變圖案之設計中,係使用對於由在調變圖案之1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態所賦予的影響作注目之設計方法,並且在對於集光點處之集光狀態的評價中,係使用對於像差條件作了考慮的傳播函數,藉由此,係成為能夠適當且確實地對於在集光點處之雷射光的集光狀態作控制。 According to the optical modulation control method, the control program, the control device, and the laser light irradiation device using the same according to the present invention, the illumination of the laser light using the spatial light modulator for the light collection point is Obtaining the incident pattern of the laser light and the refractive index of the first and second propagation mediums on the propagation path, and the number of the light collecting points of the laser light and the light collecting position and the light collecting at each of the collecting points The intensity is set, and the aberration conditions generated by the first and second propagation media are derived, and the modulation pattern presented in the spatial light modulator is designed in consideration of the aberration condition, and In the design of the variable pattern, a design method for paying attention to the influence imparted by the light collection state of the laser light at the light collecting point by the change of the phase value at one pixel of the modulation pattern is used, and In the evaluation of the concentrating state at the concentrating point, a propagation function that takes into consideration the aberration conditions is used, whereby the concentrating state of the laser light at the concentrating point can be appropriately and surely determined. Control.

以下,針對由本發明所致之光調變控制方法、控制程式、控制裝置以及雷射光照射裝置的實施形態,參考圖面來作詳細說明。另外,在圖面之說明中,對於相同之要素,係附加相同之符號,並省略重複之說明。又,圖面之尺寸比例,係並非一定會與所說明者相一致。 Hereinafter, embodiments of the optical modulation control method, control program, control device, and laser light irradiation device according to the present invention will be described in detail with reference to the drawings. In the description of the drawings, the same reference numerals are given to the same elements, and the description thereof will not be repeated. Moreover, the dimensional ratio of the drawings is not necessarily consistent with those described.

首先,針對成為由本發明所致之光調變控制的對象之包含有空間光調變器的雷射光照射裝置之基本性構成,與其之構成例一同作說明。圖1,係為對於包含有由本發明所致之光調變控制裝置的雷射光照射裝置之其中一種實施形態之構成作展示的圖。由本實施形態所致之雷射光照射裝置1A,係為對於照射對象物15而將雷射光作集光照射之裝置,並具備有雷射光源10、和空間光調變器20、以及可動平台18。 First, a basic configuration of a laser light irradiation device including a spatial light modulator which is an object of optical modulation control by the present invention will be described together with a configuration example thereof. Fig. 1 is a view showing a configuration of one embodiment of a laser beam irradiation device including a light modulation control device according to the present invention. The laser beam irradiation apparatus 1A according to the present embodiment is a device that collects laser light by irradiating the object 15 and includes a laser light source 10, a spatial light modulator 20, and a movable stage 18. .

在圖1所示之構成中,照射對象物15,係被載置於可動平台18上,該可動平台18,係被構成為可在X方向、Y方向(水平方向)以及Z方向(垂直方向)上移動。又,在 本裝置1A中,係對於此照射對象物15,而於其之內部設定有用以進行對於對象物15之加工、觀察等的集光點,並對於該集光點而進行雷射光之集光照射。 In the configuration shown in Fig. 1, the object 15 to be irradiated is placed on the movable stage 18, and the movable stage 18 is configured to be in the X direction, the Y direction (horizontal direction), and the Z direction (vertical direction). ) Move on. again In the apparatus 1A, a light collecting point for performing processing, observation, or the like on the object 15 is set in the inside of the object 15 to be irradiated, and the collected light of the laser light is irradiated to the light collecting point. .

雷射光源10,係供給用以對於平台18上之照射對象物15而進行集光照射之脈衝雷射光等的雷射光。從雷射光源10所輸出之雷射光,係在經由光束擴展器11而被作擴展後,經由反射鏡12、13而被輸入至空間光調變器(SLM)20處。 The laser light source 10 supplies laser light such as pulsed laser light for collecting light to the object 15 to be irradiated on the stage 18. The laser light output from the laser light source 10 is expanded by the beam expander 11, and then input to the spatial light modulator (SLM) 20 via the mirrors 12 and 13.

空間光調變器20,係為相位調變型之空間光調變器,例如係在其之2維的調變面之各部處而將雷射光之相位作調變,並輸出相位調變後之雷射光。作為此空間光調變器20,較理想,係使用具備有被作了2維配列之複數的像素,並且在複數的像素之各個處而分別將雷射光之相位作調變之空間光調變器。在此種構成中,於空間光調變器20中,例如係呈現有CGH等之調變圖案,藉由此調變圖案,對於所設定的集光點之雷射光的集光照射係被作控制。又,空間光調變器20,係透過光調變器驅動裝置28,來藉由光調變控制裝置30而被作驅動控制。關於光調變控制裝置30之具體性構成等,係於後再述。又,作為空間光調變器20,係亦可使用並不具備有上述之像素構造者。 The spatial light modulator 20 is a phase-modulated spatial light modulator, for example, the phase of the laser light is modulated at each of the two-dimensional modulation planes thereof, and the phase modulation is output. laser. As the spatial light modulator 20, it is preferable to use a spatial light modulation in which a pixel having a complex two-dimensional array is provided, and the phase of the laser light is modulated at each of the plurality of pixels. Device. In such a configuration, in the spatial light modulator 20, for example, a modulation pattern of CGH or the like is present, by which the pattern is modulated, and the collected light of the laser light for the set concentrating point is made. control. Further, the spatial light modulator 20 is driven and controlled by the optical modulation control unit 30 through the optical modulator driving unit 28. The specific configuration and the like of the optical modulation control device 30 will be described later. Further, as the spatial light modulator 20, a pixel structure that does not include the above-described pixel structure may be used.

此空間光調變器20,係可為反射型者,亦可為透過型者。在圖1中,作為空間光調變器20,係展示有反射型者。又,作為空間光調變器20,係可列舉出折射率變化材料型SLM(例如,在使用有液晶者之中,係為LCOS(Liquid Crystal on Silicon)型、LCD(Liquid Crystal Display)),Segment Mirror型SLM、Continuous Deformable Mirror型SLM、DOE(Diffractive Optical Element)等。另外,在DOE中,係包含有離散性地將相位作表現者、或者是使用後述之方法來對於圖案作設計,並藉由平滑化等來變換為連續性之圖案者。 The spatial light modulator 20 can be either a reflective type or a transmissive type. In Fig. 1, as the spatial light modulator 20, a reflective type is shown. Further, as the spatial light modulator 20, a refractive index change material type SLM (for example, among those using liquid crystals, LCOS (Liquid) is used. Crystal on Silicon), LCD (Liquid Crystal Display), Segment Mirror SLM, Continuous Deformable Mirror SLM, DOE (Diffractive Optical Element), and the like. Further, in the DOE, a pattern in which a phase is discretely expressed or a pattern is designed by using a method described later, and is converted into a continuous pattern by smoothing or the like.

藉由空間光調變器20而被相位調變為特定之圖案並輸出的雷射光,係藉由以透鏡21、22所構成之4f光學系,來傳播至對物透鏡25處。之後,藉由此對物透鏡25,來將雷射光集光照射至被設定於照射對象物15之表面或者是內部的單一或複數之集光點處。 The laser light whose phase is modulated into a specific pattern by the spatial light modulator 20 is transmitted to the objective lens 25 by the 4f optical system constituted by the lenses 21 and 22. Thereafter, the object lens 25 is used to illuminate the laser light to a single or a plurality of light collecting points set on the surface or inside of the object 15 to be irradiated.

另外,關於在雷射光照射裝置1A中之光學系的構成,具體而言,係並不被限定於圖1中所示之構成,而可使用各種之構成。例如,在圖1中,雖係採用藉由光束擴展器11來將雷射光擴展之構成,但是,係亦可設為使用有空間濾波器和準直透鏡之組合的構成。又,關於驅動裝置28,係亦可設為被與空間光調變器20作一體性設置之構成。又,關於由透鏡21、22所成之4f光學系,一般而言,係以使用藉由複數之透鏡所構成的兩側望遠光學系為理想。 In addition, the configuration of the optical system in the laser beam irradiation device 1A is not specifically limited to the configuration shown in FIG. 1, and various configurations can be used. For example, in FIG. 1, although the configuration in which the laser beam is expanded by the beam expander 11 is used, a configuration in which a combination of a spatial filter and a collimator lens is used may be employed. Further, the drive device 28 may be configured to be integrally provided with the spatial light modulator 20. Further, as for the 4f optical system formed by the lenses 21 and 22, it is generally preferable to use a two-side telephoto optical system composed of a plurality of lenses.

又,關於使照射對象物15之可動平台18,例如係亦可採用將此平台作固定並且在光學系側處設置可動機構、電流鏡(galvanometer mirror)等之構成。又,作為雷射光源10,例如係以使用Nd:YAG雷射光源、毫微微秒雷射 光源等之供給脈衝雷射光的脈衝雷射光源為理想。 Further, for the movable stage 18 to be irradiated with the object 15, for example, a fixed mechanism and a movable mechanism, a galvanometer mirror, or the like may be provided on the optical system side. Further, as the laser light source 10, for example, a Nd:YAG laser light source or a femtosecond laser is used. A pulsed laser light source that supplies pulsed laser light, such as a light source, is ideal.

在圖1所示之雷射光照射裝置1A中,當在從空間光調變器20所朝向照射對象物15內之集光點的雷射光之傳播路徑上存在有像差物體的情況時,雷射光係會在傳播過程中而受到像差的影響。於此,圖2,係為對於在雷射光之傳播過程中的像差之發生作展示的圖。例如,當如同上述一般而在照射對象物15之內部設定有集光點的情況時,從對物透鏡25所輸出之收斂雷射光,係會起因於在從對物透鏡25起直到集光點為止的傳播路徑上所存在之身為氛圍媒質(第1傳播媒質)的空氣之折射率n1和玻璃媒體等之照射對象物(第2傳播媒質)15之折射率n2間的差異,而在近軸光線和最外緣之光線中,於氛圍媒質和玻璃媒體等之照射對象物15之間的邊界面處而使折射角產生差異,起因於此,會發生焦點偏移(球面像差)。 In the laser light irradiation device 1A shown in FIG. 1, when there is an aberration object on the propagation path of the laser light from the spatial light modulator 20 toward the light collecting point in the object 15 to be irradiated, The light system is affected by aberrations during the propagation process. Here, FIG. 2 is a diagram showing the occurrence of aberrations during the propagation of laser light. For example, when a light collecting point is set inside the irradiation target 15 as described above, the convergent laser light output from the objective lens 25 is caused by the object lens 25 up to the light collecting point. as the atmosphere medium (first propagation medium) refractive index of air n 1 and the illumination of the object glass media (second propagation medium) 15 of a refractive index difference n 2 between the present until the propagation path, and In the paraxial ray and the outermost ray, a difference in refraction angle occurs at the boundary surface between the illuminating object 15 such as the ambience medium and the glass medium, and as a result, a focus shift (spherical aberration) occurs. ).

例如,如圖2中所示一般,對於由對物透鏡25所致之焦點O為存在於照射對象物15之內部的深度d之位置處的情況作考慮。於此情況,此焦點O,係會由於在折射率n1之空氣和折射率n2之對象物15之間的邊界面處之折射角,而成為朝向焦點O’作了焦點偏移量δ之偏移。又,此焦點偏移量δ,係會依存於射入至對物透鏡25中之光的射入高度h而改變。起因於由此種依存於射入高度h之焦點偏移δ所導致的球面像差,在對象物15處,雷射光之集光點的形狀係會在光軸方向上而伸長,集光密度係降低。 For example, as shown in FIG. 2, generally, the case where the focus O caused by the objective lens 25 is at the position of the depth d existing inside the illumination target 15 is considered. In this case, the focus O becomes a focus shift amount δ toward the focus O' due to the angle of refraction at the boundary surface between the air of the refractive index n 1 and the object 15 of the refractive index n 2 . Offset. Further, the focus shift amount δ changes depending on the incident height h of the light incident on the objective lens 25. Due to the spherical aberration caused by the focus shift δ depending on the incident height h, at the object 15, the shape of the collected spot of the laser light is elongated in the optical axis direction, and the optical density is set. The system is lowered.

又,此種由於傳播媒質所導致的像差之發生,當在照 射對象物15之內部設定有複數之集光點,並對於對象物15而進行多點同時照射(例如,多點同時加工)的情況時,亦會造成問題。亦即是,上述之球面像差,係會依存於雷射光之在光軸方向上的集光位置(光軸深度)而使像差量有所不同,並有著若是光軸深度變得越深則球面像差量會變得越大之傾向。於此情況,當對於對象物15而進行3維多點同時照射時,係有必要在每一個集光點處,而因應於各個集光位置之光軸深度來對於互為相異之球面像差量作修正。 Moreover, this kind of aberration caused by the propagation medium occurs when When a plurality of light collecting points are set inside the object 15 and a plurality of simultaneous irradiations (for example, simultaneous multi-point processing) are performed on the object 15, a problem also occurs. In other words, the spherical aberration described above differs depending on the light collecting position (optical axis depth) of the laser light in the optical axis direction, and the depth of the optical axis becomes deeper. Then the amount of spherical aberration tends to become larger. In this case, when three-dimensional multi-point simultaneous illumination is performed on the object 15, it is necessary to make a spherical image that is different from each other at each of the collection points, depending on the optical axis depth of each collection position. The difference is corrected.

又,在進行多點同時照射的情況時,在對於各集光點之雷射光的集光強度之調整上,係亦存在有問題。例如,在使用有毫微微秒雷射光之玻璃內部加工中,依存於在集光點處之雷射光的集光強度,在對象部位處之經由加工所產生的折射率之變化量係會有所相異,此事係為周知。故而,在藉由雷射光之多點同時照射來一次性製作出折射率分布為相等的複數之導波路的情況時,較理想,係藉由在空間光調變器中所呈現之調變圖案,來將在複數之集光點處的集光強度以高均一性作再生。又,相反的,藉由將在複數之集光點處的集光強度設定為互為相異之強度,亦能夠製作出折射率分布為相異之複數的導波路。不論在此些之任一者的情況中,均同樣的,當設定有複數之集光點的情況時,係以能夠對於在各集光點處之雷射光的集光強度任意作控制為理想。 Further, in the case of performing simultaneous multi-point illumination, there is a problem in adjusting the intensity of the collected light of the laser light for each of the concentrating spots. For example, in the internal processing of a glass using femtosecond laser light, depending on the intensity of the collected light of the laser light at the light collecting point, the amount of change in the refractive index generated at the object portion by processing may be Different, this matter is well known. Therefore, when a plurality of guided waveguides having equal refractive index distributions are simultaneously produced by simultaneous irradiation of multiple points of laser light, it is preferable to use a modulation pattern presented in a spatial light modulator. In order to reproduce the collected light intensity at the complex collection point with high uniformity. On the contrary, by setting the intensity of the collected light at the plurality of collection points to be mutually different, it is also possible to produce a waveguide having a plurality of different refractive index distributions. In the case of any of the above, when a plurality of light collecting points are set, it is desirable to be able to arbitrarily control the light collecting intensity of the laser light at each of the collecting points. .

相對於此,圖1之雷射光照射裝置1A,係將透過驅 動裝置28而呈現在空間光調變器20中之調變圖案的CGH,在光調變控制裝置30中作適當的設計,藉由此,來降低起因於傳播路徑上之折射率為相異的傳播媒質所導致之像差的影響,並對於在集光點處之雷射光的集光狀態作適當的控制。又,若依據由本實施形態所致之雷射光照射裝置1A以及光調變控制裝置30,則係亦能夠適當的實現在設定有複數之集光點的情況時之3維多點雷射光照射以及集光點之間的集光強度之調整。 In contrast, the laser light irradiation device 1A of FIG. 1 is driven by the drive. The CGH of the modulation pattern presented by the moving device 28 in the spatial light modulator 20 is appropriately designed in the optical modulation control device 30, thereby reducing the refractive index caused by the propagation path to be different. The influence of the aberration caused by the propagation medium and the appropriate control of the light collection state of the laser light at the collection point. Further, according to the laser light irradiation device 1A and the optical modulation control device 30 according to the present embodiment, it is possible to appropriately realize three-dimensional multi-point laser light irradiation when a plurality of light collecting points are set and The adjustment of the intensity of the collected light between the collection points.

圖3,係為對於被適用在圖1中所示之雷射光照射裝置1A中的光調變控制裝置30之構成的其中一例作展示之區塊圖。由本構成例所致之光調變控制裝置30,係具備有照射條件取得部31、和集光條件設定部32、和像差條件導出部33、和調變圖案設計部34、以及光調變器驅動控制部35,而構成之。另外,此種光調變控制裝置30,例如係可藉由電腦來構成。又,在此控制裝置30處,係被連接有用來進行關於光調變控制所必要之資訊、指示等的輸入之輸入裝置37、以及用來對於操作者而進行資訊之顯示的顯示裝置38。 Fig. 3 is a block diagram showing an example of the configuration of the optical modulation control device 30 applied to the laser light irradiation device 1A shown in Fig. 1. The optical modulation control device 30 according to the present configuration example includes an irradiation condition acquisition unit 31, a concentrating condition setting unit 32, an aberration condition deriving unit 33, a modulation pattern design unit 34, and a light modulation. The device drives the control unit 35 and is configured. Further, such a light modulation control device 30 can be constituted by, for example, a computer. Further, at the control device 30, an input device 37 for inputting information, instructions, and the like necessary for optical modulation control, and a display device 38 for displaying information to the operator are connected.

照射條件取得部31,係為取得與對於照射對象物15之雷射光的照射條件相關連之資訊的照射條件取得手段。具體而言,照射條件取得部31,係作為雷射光之照射條件,而取得對於空間光調變器20之雷射光的射入圖案(例如強度分布、相位分布資訊),和在從光調變器20起而朝向集光點之雷射光的傳播路徑上所存在之第1傳播媒質(例 如氛圍媒質)的第1折射率n1、以及相較於第1傳播媒質而更靠集光點側處之第2傳播媒質的與第1折射率相異之第2折射率n2(照射條件取得步驟)。 The irradiation condition acquisition unit 31 is an irradiation condition acquisition means that acquires information related to the irradiation conditions of the laser light of the irradiation target 15 . Specifically, the irradiation condition acquisition unit 31 acquires an incident pattern (for example, an intensity distribution and a phase distribution information) of the laser light to the spatial light modulator 20 as an irradiation condition of the laser light, and adjusts the light from the light. The first refractive index n 1 of the first propagation medium (for example, an atmosphere medium) existing on the propagation path of the laser light toward the light collecting point, and the light collecting point side of the first propagation medium compared to the first propagation medium The second refractive index n 2 of the second propagation medium that is different from the first refractive index (irradiation condition acquisition step).

集光條件設定部32,係為設定對於照射對象物15之雷射光的集光條件之集光條件設定手段。具體而言,集光條件設定部32,係作為雷射光之集光條件,而設定將從空間光調變器20而來之調變雷射光作集光照射的集光點之個數st、以及針對st個的集光點s(s=1~st)之各別的集光位置、集光強度(集光條件設定步驟)。集光點之個數st,係設定為1以上之整數,又,當多點同時照射的情況時,係設定為2以上之整數。另外,由取得部31所進行之照射條件的取得、以及由設定部32所進行之集光條件的設定,係根據在控制裝置30中所預先準備的資訊、從輸入裝置37所輸入之資訊、或者是從外部裝置所供給而來之資訊等,而自動進行或是由操作者來手動進行。 The concentrating condition setting unit 32 is a concentrating condition setting means for setting a concentrating condition of the laser light to be irradiated on the object 15 . Specifically, the light condition setting section 32 sets, as the current laser-based optical light conditions, set the number of sets from the spatial light modulator 20 from the light spot of the laser beam for irradiating modulating light collection device becomes s t And the respective collection positions and collection intensities (light collection condition setting steps) for the s t collection points s (s=1 to s t ). The number of collection points s t is set to an integer of 1 or more, and when multiple points are simultaneously irradiated, it is set to an integer of 2 or more. In addition, the acquisition of the irradiation conditions by the acquisition unit 31 and the setting of the light collection conditions by the setting unit 32 are based on the information prepared in advance by the control device 30, the information input from the input device 37, Alternatively, the information supplied from the external device or the like is automatically performed or manually performed by the operator.

像差條件導出部33,係為在從空間光調變器20起而朝向對於照射對象物15所設定之集光點s的雷射光之傳播中,將相關於在其之傳播路徑上所產生的像差之像差條件作導出的像差條件導出手段。於此,像差條件導出部33,係如同針對圖2而於上所述一般,針對存在於雷射光之傳播路徑上且折射率互為相異之光學系側的第1傳播媒質以及集光點側的第2傳播媒質,而導出由於該些之傳播媒質所產生的像差條件(像差條件導出步驟)。又,當在傳播路徑上存在有3個以上之傳播媒質的情況時,像差條件導 出部33,係針對該些之全部的傳播媒質而導出像差條件。 The aberration condition deriving unit 33 is generated in the propagation of the laser light from the spatial light modulator 20 toward the light collecting point s set for the object 15 to be irradiated. The aberration condition of the aberration is derived by deriving the aberration condition. Here, the aberration condition deriving unit 33 is the first propagation medium and the light collection on the optical system side which are different in refractive index from each other and which are present on the propagation path of the laser light as described above with respect to FIG. 2 . The second propagation medium on the point side derives the aberration condition (aberration condition derivation step) due to the propagation medium. Moreover, when there are three or more propagation media on the propagation path, the aberration condition guide The output unit 33 derives aberration conditions for all of the propagation media.

調變圖案設計部34,係為對於藉由像差條件導出部33所導出之傳播路徑上的像差條件作考慮,而對於成為在空間光調變器20中所呈現之調變圖案的CGH進行設計之調變圖案設計手段。具體而言,調變圖案設計部34,係參考藉由取得部31所取得之照射條件、藉由設定部32所設定之集光條件、以及藉由導出部33所導出之像差條件,而根據該些之條件來設計將雷射光集光照射至所期望之單一或複數的集光點處之調變圖案(調變圖案設計步驟)。 The modulation pattern design unit 34 is a CGH that becomes a modulation pattern presented in the spatial light modulator 20 in consideration of aberration conditions on the propagation path derived by the aberration condition deriving unit 33. Design the modulation pattern design method. Specifically, the modulation pattern design unit 34 refers to the irradiation conditions acquired by the acquisition unit 31, the concentrating conditions set by the setting unit 32, and the aberration conditions derived by the deriving unit 33. According to these conditions, a modulation pattern (modulation pattern design step) for irradiating the laser light to the desired single or multiple collection points is designed.

特別是,在本實施形態之調變圖案設計部34中,於在空間光調變器20中所呈現的調變圖案之設計中,針對空間光調變器20,係想定為被作了2維配列之複數的像素,並且,係使用對於在複數之像素中所呈現的調變圖案之於1個像素(在空間光調變器20中所想定的1個像素,當空間光調變器20為具備有由2維配列之複數的像素所成之像素構造的情況時,係對應於其之1個像素)處的相位值之變更的對於在集光點處之雷射光的集光狀態所賦予之影響作了注目的設計方法。而後,以使其之集光狀態更接近所期望之狀態的方式,來對於1個像素的相位值作變更,並且,將此種相位值之變更操作,針對調變圖案之全部的像素(至少為光會作射入之全部的像素)來進行,藉由此,而設計最適當之調變圖案。 In particular, in the modulation pattern design unit 34 of the present embodiment, in the design of the modulation pattern presented in the spatial light modulator 20, the spatial light modulator 20 is intended to be made 2 Dimensions of the complex number of pixels, and the use of the modulation pattern presented in the complex pixels for 1 pixel (1 pixel in the spatial light modulator 20, when the spatial light modulator 20 is a case where a pixel structure having a plurality of pixels arranged in two dimensions is provided, and the light collection state of the laser light at the light collecting point is changed corresponding to the phase value at one pixel) The impact of the design is an eye-catching design method. Then, the phase value of one pixel is changed so that the light collecting state is closer to the desired state, and the phase value is changed for all the pixels of the modulation pattern (at least This is done for all the pixels that the light is incident on, whereby the most appropriate modulation pattern is designed.

又,在此調變圖案設計部34中,於上述之各像素處的相位值之變更操作中,當對於在集光點處之雷射光的集 光狀態作評價時,針對從在空間光調變器20之調變圖案中的像素j起所朝向集光點s之光的傳播,係並非直接使用當假定為傳播媒質為均質之狀態下之自由傳播的情況時之波動傳播函數,而是使用對於波動傳播函數而加上了藉由像差條件導出部33所求取出之像差條件所變換的傳播函數。藉由此,雷射光之集光狀態,係對於在傳播路徑上之像差條件有所考慮地而被作控制。 Further, in the modulation pattern designing unit 34, in the operation of changing the phase value at each of the above-described pixels, when the light collecting state of the laser light at the light collecting point is evaluated, the light is adjusted for the light in the space. The propagation of the light from the pixel j in the modulation pattern of the transformer 20 toward the light collecting point s is not directly using the wave propagation function when it is assumed to be a free propagation in a state where the propagation medium is homogeneous. Instead of using a wave propagation function The propagation function transformed by the aberration condition obtained by the aberration condition deriving unit 33 is added. . Thereby, the state of light collection of the laser light is controlled in consideration of the aberration conditions on the propagation path.

光調變器驅動控制部35,係為透過驅動裝置28來驅動控制空間光調變器20,並將藉由調變圖案設計部34所設計出的調變圖案呈現於空間光調變器20之複數的像素處的驅動控制手段。此種驅動控制部35,當光調變控制裝置30為被包含於雷射光照射裝置1A中的情況時,係因應於必要而被設置。 The optical modulator drive control unit 35 drives the control spatial light modulator 20 through the drive device 28, and presents the modulation pattern designed by the modulation pattern design unit 34 to the spatial light modulator 20. The drive control means at the plural pixels. When the optical modulation control device 30 is included in the laser light irradiation device 1A, the drive control unit 35 is provided as necessary.

與在圖3中所示之光調變控制裝置30中所實行的控制方法相對應之處理,係可經由用以使電腦實行光調變控制之光調變控制程式,來實現之。例如,光調變控制裝置30,係可藉由用以使在光調變控制之處理中所需要的各軟體程式動作之CPU、和記憶有上述之軟體程式等的ROM、以及在程式實行中而暫時性地記憶資料之RAM,來構成之。在此種構成中,藉由以CPU來實行特定之控制程式,係能夠實現上述之光調變控制裝置30。 The processing corresponding to the control method implemented in the optical modulation control device 30 shown in Fig. 3 can be realized by a light modulation control program for causing the computer to perform optical modulation control. For example, the optical modulation control device 30 can be operated by a CPU for operating various software programs required for processing in the optical modulation control, and a ROM in which the above-described software program is stored, and in the program execution. And temporarily store the RAM of the data to form it. In such a configuration, the above-described optical modulation control device 30 can be realized by executing a specific control program by the CPU.

又,用以藉由CPU來實行使用有空間光調變器20之光調變控制、特別是實行用以進行在空間光調變器20中所呈現之調變圖案的設計之各處理的上述程式,係可記錄 在電腦可讀取之記錄媒體中並作發佈。在此種記錄媒體中,例如,係包含有:硬碟以及軟碟等之磁性媒體、CD-ROM以及DVD-ROM等之光學媒體、光軟碟(floptical disk)等之磁性光學媒體、或者是以實行或儲存程式命令的方式而特別作了配置之例如RAM、ROM以及半導體非揮發性記憶體等的硬體裝置等。 Further, the above-described processing for performing the optical modulation control using the spatial light modulator 20 by the CPU, in particular, the processing for performing the design of the modulation pattern presented in the spatial light modulator 20 is performed. Program, recordable Released on a computer-readable recording medium. Such a recording medium includes, for example, a magnetic medium such as a hard disk or a floppy disk, an optical medium such as a CD-ROM or a DVD-ROM, a magnetic optical medium such as a floptical disk, or the like. A hardware device such as a RAM, a ROM, and a semiconductor non-volatile memory, which are specially configured to execute or store program commands.

針對由本實施形態所致之光調變控制方法、光調變控制程式、光調變控制裝置30以及雷射光照射裝置1A的效果作說明。 The effects of the optical modulation control method, the optical modulation control program, the optical modulation control device 30, and the laser light irradiation device 1A according to the present embodiment will be described.

在圖1~圖3中所示之光調變控制方法、控制程式以及控制裝置30中,針對使用有空間光調變器20之對於集光點的雷射光之集光照射,係取得雷射光之射入圖案、以及相關於傳播路徑上之第1、第2傳播媒質的包含有折射率之資訊,並且,對於包含有雷射光之集光點的個數st以及在各集光點處之集光位置、集光強度的集光條件作設定。而後,在像差條件導出部33中,係將由於在雷射光之傳播路徑上存在有折射率相異之第1、2傳播媒質一事所產生的像差條件導出,並在調變圖案設計部34中,對於該像差條件作考慮,而對於在空間光調變器20中所呈現之調變圖案作設計。藉由此,係能夠對於在集光條件設定部32中所設定之單一或複數的集光點,而在各集光點處之雷射光的集光狀態中,將由第1、第2傳播媒質所導致的像差之影響降低。 In the optical modulation control method, the control program, and the control device 30 shown in FIGS. 1 to 3, laser light is obtained by using the collected light of the laser light with the spatial light modulator 20 for the light collecting point. the incident pattern related to the first channel on the first and second propagation medium with a refractive index of the information, and, at the collector with respect to the light spot of the laser beam and the number of s t at each of the focus point The light collecting conditions of the collected light position and the collected light intensity are set. Then, in the aberration condition deriving unit 33, the aberration condition generated by the first and second propagation media having different refractive indices on the propagation path of the laser light is derived, and the modulation pattern design unit is used in the modulation pattern design unit. In 34, the aberration condition is considered, and the modulation pattern presented in the spatial light modulator 20 is designed. In this way, it is possible to use the first or second plurality of light collecting points set in the light collecting condition setting unit 32, and the first and second propagation mediums in the light collecting state of the laser light at each of the light collecting points. The effect of the resulting aberration is reduced.

進而,針對此種構成下之調變圖案的設計,具體而言 ,係在空間光調變器20中,對於由被作了2維配列之複數的像素所致的像素構造作想定。之後,使用對於由在調變圖案之1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態所賦予的影響作注目之設計方法,並且在對於集光點處之集光狀態的評價中,並非使用假定為傳播媒質為均質之狀態下之自由傳播的情況時之波動傳播函數,而是先變換為對於像差條件作了考慮的傳播函數,再對於集光狀態作評價。若依據此種構成,則係成為能夠對於在集光點處之雷射光的集光狀態適當且確實地進行評價、控制。 Further, in the design of the modulation pattern under such a configuration, specifically, in the spatial light modulator 20, a pixel structure by a plurality of pixels which are arranged in two dimensions is conceivable. Thereafter, a design method that pays attention to the influence imparted by the light collecting state of the laser light at the light collecting point by the change of the phase value at one pixel of the modulation pattern is used, and at the light collecting point In the evaluation of the state of the collected light, the wave propagation function in the case where the propagation medium is assumed to be free in the state of homogeneity is not used. , but first transformed into a propagation function that takes into account the aberration conditions. And then evaluate the state of light collection. According to such a configuration, it is possible to appropriately and reliably evaluate and control the light collection state of the laser light at the light collecting point.

另外,作為在空間光調變器20中所想定之像素構造,當作為空間光調變器20,而使用具備有被作了2維配列之複數的像素之空間光調變器的情況時,係可將其之像素構造直接適用於調變圖案之設計中。又,針對自由傳播,於此,係設為並非僅有在真空或者是大氣中之傳播,而是亦包含有如同上述一般之一般性的在傳播媒質為均質之狀態下的傳播,例如於並不存在有第2傳播媒質而僅有第1傳播媒質以均質而存在的情況下之傳播。 Further, as a pixel structure which is assumed in the spatial light modulator 20, when the spatial light modulator 20 is used, a spatial light modulator including a plurality of pixels arranged in two dimensions is used. The pixel structure can be directly applied to the design of the modulation pattern. Further, in the case of free propagation, it is assumed that the propagation is not only in a vacuum or in the atmosphere, but also includes propagation in a state in which the propagation medium is homogeneous as in the general above, for example, There is no second propagation medium, and only the first propagation medium propagates in a homogeneous state.

又,在圖1所示之雷射光照射裝置1A中,係使用雷射光源10、和相位調變型之空間光調變器20、以及上述構成之光調變控制裝置30,來構成雷射光照射裝置1A。若依據此種構成,則藉由控制裝置30,係成為能夠適當且確實地對於在集光點處之雷射光的集光狀態作控制,並適當地實現對於在照射對象物15處所設定的單一或複數之 集光點的雷射光之集光照射,以及由此所致之對象物的加工、觀察等的操作。又,此種雷射光照射裝置,例如係可作為雷射加工裝置、雷射顯微鏡等來使用。 Further, in the laser beam irradiation apparatus 1A shown in Fig. 1, a laser light source 10, a phase modulation type spatial light modulator 20, and the above-described light modulation control device 30 are used to constitute laser light irradiation. Device 1A. According to this configuration, the control device 30 can appropriately and surely control the light collecting state of the laser light at the light collecting point, and appropriately realize the single set for the object 15 to be irradiated. Or plural The illumination of the collected light of the spot light, and the processing of the object, such as processing, observation, and the like. Moreover, such a laser beam irradiation apparatus can be used, for example, as a laser processing apparatus, a laser microscope, or the like.

於此,針對在導出部33處之像差條件的導出,較理想,在對於從空間光調變器20之複數的像素中之像素j起而朝向所設定之集光點s處的光之傳播作考慮時,作為相關於光之傳播的像差條件,係求取出對於在該傳播中的光路長度差OPD所賦予的相位Φj-OPD。又,於此情況,針對在設計部34處之調變圖案的設計,較理想,係使用如同上述一般所導出之像差條件的相位Φj-OPD,並藉由變換式 ,來求取出對於像差條件作了考慮的傳播函數。若依據此種構成,則係能夠適當地將自由傳播之傳播函數,變換為對於像差條件作了考慮的傳播函數Here, for the derivation of the aberration condition at the deriving unit 33, it is preferable that the light is directed toward the set concentrating point s from the pixel j of the plurality of pixels from the spatial light modulator 20. When the propagation is considered, as the aberration condition related to the propagation of light, the phase Φ j-OPD given to the optical path length difference OPD in the propagation is extracted. Further, in this case, it is preferable for the design of the modulation pattern at the design portion 34 to use the phase Φ j-OPD of the aberration condition as generally derived above, and by using the conversion To find out the propagation function that takes into account the aberration conditions. . According to this configuration, it is possible to appropriately propagate the propagation function of free propagation. , transformed into a propagation function that takes into account the aberration conditions .

又,針對在設計部34處之調變圖案的設計,較理想,係將對於空間光調變器20之像素j的雷射光之射入振幅設為Aj-in,並將在像素j處之相位值設為,而藉由下式 ,來求取出代表在集光點s處之集光狀態的複變振幅Us。或者是,亦可進而將對於空間光調變器20之像素j的雷射光之射入振幅設為Aj-in,並將射入相位設為,且將在像素j處之相位值設為,而藉由下式 ,來求取出代表在集光點s處之集光狀態的複變振幅Us。藉由此,係能夠對於集光點處之雷射光的集光狀態作適當的評價。 Further, for the design of the modulation pattern at the design portion 34, it is preferable that the incident amplitude of the laser light for the pixel j of the spatial light modulator 20 is set to A j-in and will be at the pixel j. Phase value is set to By the following For the purpose of extracting the complex amplitude U s representing the state of light collection at the light collecting point s . Alternatively, the incident amplitude of the laser light for the pixel j of the spatial light modulator 20 may be further set to A j-in and the incident phase may be set to And set the phase value at pixel j to By the following For the purpose of extracting the complex amplitude U s representing the state of light collection at the light collecting point s . Thereby, it is possible to appropriately evaluate the light collecting state of the laser light at the light collecting point.

於此,對於像素j之雷射光的射入振幅Aj-in,係相對於射入強度Ij-in,而存在有Ij-in=|Aj-in|2之關係。又,在複變振幅Us中,As係為振幅,係為相位。又,當射入雷射光係為平面波的情況時,係能夠忽略其之射入相位Here, the incident amplitude A j-in of the laser light of the pixel j is related to the incident intensity I j-in , and there is a relationship of I j-in =|A j-in | 2 . Also, in the complex amplitude U s , A s is the amplitude, Is the phase. Moreover, when the incident laser light is a plane wave, the incident phase can be ignored. .

針對調變圖案之設計的具體性構成,在調變圖案之像素j處的相位值之變更中,係可採用下述之構成:亦即是,根據基於代表在集光點s處之集光狀態的複變振幅之相位、和對於像差條件作了考慮之傳播函數、以及 在像素j處之變更前的相位值,所解析性求取出之值,來對於相位值作變更。作為此種解析性地更新相位值的方法,例如係存在有ORA(Optimal Rotation Angle)法。 For the specific configuration of the design of the modulation pattern, in the change of the phase value at the pixel j of the modulation pattern, the following configuration may be adopted: that is, according to the light collection based on the representative point s Phase of the complex amplitude of the state And propagation functions that are considered for aberration conditions And the phase value before the change at pixel j The value obtained by the resolution is used to change the phase value. As such a method of resolving the phase value analytically, for example, there is an ORA (Optimal Rotation Angle) method.

或者是,亦可在調變圖案之像素j處的相位值之變更中,根據使用登山演算法、模擬降溫演算法或者是基因演算法中的其中一種方法所探索求取出之值,來對於相位值作變更。於此,在基因演算法中,係進行有選擇某一像素並對於該像素之值作變更的突然變異,或者是選擇2個像素並將其之像素值作交換的交叉等之操作,但是,上述之對於在調變圖案之1個像素處的相位值之變更所對於雷射光之集光狀態造成的影響作了注目之設計方法,係設為包含有進行此種操作之方法者。另外,針對調變圖案之設計手法,具體內容係於後再述。 Alternatively, in the change of the phase value at the pixel j of the modulation pattern, the phase value may be extracted according to one of the methods using a mountaineering algorithm, a simulated cooling algorithm, or a genetic algorithm. The value is changed. Here, in the genetic algorithm, an operation of selecting a certain pixel and changing the value of the pixel is performed, or an operation of selecting two pixels and exchanging the pixel values thereof is performed, but The above-mentioned design method for the influence of the change of the phase value at one pixel of the modulation pattern on the light collecting state of the laser light is intended to include a method of performing such an operation. In addition, the specific design of the modulation pattern will be described later.

關於存在於雷射光之傳播路徑上的折射率相異之第1、第2傳播媒質,於圖2中,係例示有下述之構成:亦即是,集光點側之第2傳播媒質,係為在內部被設定有集光點之照射對象物15,光學系側之第1傳播媒質,係為存在於空間光調變器20和照射對象物15之間(對物透鏡25和對象物15之間)的氛圍媒質。於此情況,關於氛圍媒質,除了空氣等之外,亦可為水、油等之氛圍媒質。 The first and second propagation media having different refractive indices existing on the propagation path of the laser light are exemplified by the following configuration: that is, the second propagation medium on the light collecting point side. The object to be irradiated 15 in which the light collecting point is set inside, and the first propagation medium on the optical system side exists between the spatial light modulator 20 and the object 15 to be irradiated (object lens 25 and object) Between 15) the atmosphere of the medium. In this case, the atmosphere medium may be an atmosphere medium such as water or oil in addition to air or the like.

又,在空間光調變器和集光點之間的傳播路徑上,係亦可存在有3個以上之媒質。作為此種構成,例如係可考慮有:使雷射光通過折射率為與氛圍媒質相異之媒體,並在其之通過後再將雷射光作集光之構成。又,例如,亦可 考慮有像是將折射率相異之複數種類的玻璃彼此作貼合之構成、在矽上貼合玻璃之構成、或者是在藉由顯微鏡所進行之對生體試料或細胞內部的觀察中而於傳播路徑上存在有蓋玻璃之構成等,關於雷射光之傳播路徑上的媒質,係可考慮有各種之構成。另外,亦可考慮有對於複數之媒體而同時進行雷射光之集光照射的構成。在此種情況中,亦與上述相同的,係能夠實行像差條件之導出以及調變圖案之設計。 Further, in the propagation path between the spatial light modulator and the light collecting point, there may be three or more mediums. As such a configuration, for example, it is conceivable that the laser light passes through a medium having a refractive index different from that of the atmosphere medium, and the laser light is collected after passing therethrough. Also, for example, Consider a configuration in which a plurality of types of glass having different refractive indices are bonded to each other, a structure in which glass is bonded to a crucible, or an observation of a living body sample or a cell inside by a microscope. There is a configuration of a cover glass on the propagation path, and various configurations are possible regarding the medium on the propagation path of the laser light. Further, it is also conceivable to have a configuration in which the collected light of the laser light is simultaneously applied to a plurality of media. In this case as well, the same as described above, the derivation of the aberration conditions and the design of the modulation pattern can be performed.

又,在圖3所示之光調變控制裝置30中,除了用以設計調變圖案之構成以外,係亦設置有對於空間光調變器20作驅動控制並使藉由設計部34所設計出的調變圖案呈現於空間光調變器20中之光調變器驅動控制部35。此種構成,在如圖1中所示一般之將控制裝置30以組入至雷射光照射裝置1A中的形態來使用的情況中,係為有效。又,關於此種驅動控制部35,係亦可採用作為與光調變控制裝置30相異之其他裝置來作設置之構成。 Further, in the optical modulation control device 30 shown in FIG. 3, in addition to the configuration for designing the modulation pattern, the spatial light modulator 20 is also provided with drive control and designed by the design portion 34. The resulting modulation pattern is presented to the optical modulator drive control unit 35 in the spatial light modulator 20. Such a configuration is effective in the case where the control device 30 is generally used in a form incorporated in the laser light irradiation device 1A as shown in FIG. Further, the drive control unit 35 may be configured to be provided as another device different from the optical modulation control device 30.

又,例如在藉由雷射光照射來對於玻璃媒體進行加工並製作光積體電路一般的情況時,係亦可設為:在進行1次或複數次之雷射光照射後,進行新的1枚或複數枚之CGH的設計,並對於在空間光調變器20中所呈現的調變圖案作切換。或者是,當欲製作之光積體電路的形狀已決定的情況時,係亦可預先設計在雷射加工中所需要之複數的調變圖案。 Further, for example, when the glass medium is processed by laser light irradiation to produce a photo-integrated circuit, it is also possible to perform a new one after performing one or more laser irradiations. Or a plurality of CGH designs, and switching the modulation patterns presented in the spatial light modulator 20. Alternatively, when the shape of the optical unit circuit to be fabricated is determined, it is also possible to pre-design a plurality of modulation patterns required for laser processing.

又,當將DOE單獨作使用的情況時,由於DOE係為 靜性之圖案,因此,係亦可並不具備驅動裝置。又,當使用複數個的DOE來動性地進行圖案之切換的情況時,代替驅動裝置,係使用切換裝置。 Also, when the DOE is used alone, since the DOE system is The static pattern, therefore, does not have a drive. Further, when a plurality of DOEs are used to dynamically switch the pattern, a switching device is used instead of the driving device.

針對在圖1、圖3所示之雷射光照射裝置1A以及光調變控制裝置30中所實行的光調變控制方法以及調變圖案之設計方法,與其之具體例一同地來作更進一步之說明。圖4,係為對於在圖3所示之光調變控制裝置30中所實行的光調變控制方法之其中一例作展示的流程圖。 The optical modulation control method and the modulation pattern design method implemented in the laser light irradiation device 1A and the optical modulation control device 30 shown in FIGS. 1 and 3 are further developed in conjunction with the specific examples. Description. Fig. 4 is a flow chart showing an example of the optical modulation control method carried out in the optical modulation control device 30 shown in Fig. 3.

在圖4所示之控制方法中,首先,係取得相關於從雷射光源10所供給而來之雷射光的對於照射對象物15之照射條件的資訊(步驟S101)。具體而言,係針對從空間光調變器20起所朝向集光點s之雷射光的傳播路徑,而取得存在於傳播路徑上之第1傳播媒質(例如氛圍媒質)的第1折射率n1和第2傳播媒質(例如照射對象物)之第2折射率n2(S102)。又,於此,若為必要,則係亦取得第1、第2傳播媒質之折射率以外的資訊,例如取得關於媒質之厚度、形狀、位置等的資訊。又,除了傳播媒質以外,例如若是存在有對物透鏡25之NA、焦距f等的在像差條件之導出中所必要之資訊,則亦係與傳播媒質之資訊一同作取得。 In the control method shown in FIG. 4, first, information on the irradiation conditions of the irradiation target 15 with respect to the laser light supplied from the laser light source 10 is acquired (step S101). Specifically, the first refractive index n of the first propagation medium (for example, an atmosphere medium) existing on the propagation path is obtained for the propagation path of the laser light from the spatial light modulator 20 toward the light collection point s. 1 and a second refractive index n 2 of the second propagation medium (for example, an object to be irradiated) (S102). Moreover, if necessary, information other than the refractive indices of the first and second propagation media is obtained, and for example, information on the thickness, shape, position, and the like of the medium is obtained. Further, in addition to the propagation medium, for example, information necessary for the derivation of the aberration condition such as the NA of the objective lens 25 and the focal length f is obtained together with the information of the propagation medium.

又,係取得從雷射光源10所供給而來之雷射光的對於空間光調變器20之射入圖案(S103)。此雷射光之射入圖案,係作為由相對於空間光調變器20之被作了2維配列的複數之像素中的位置(xj,yj)之像素j的射入雷射光強度 Iin(xj,yj)=Ij-in所得到的射入光強度分布,而被賦予。或者是,亦可作為由振幅Aj-in所致之射入光振幅分布,而取得雷射光之射入圖案。又,在必要的情況時,也可採用亦針對雷射光之射入相位而作取得的構成。 Moreover, the incident pattern for the spatial light modulator 20 from the laser light supplied from the laser light source 10 is obtained (S103). The incident pattern of the laser light is incident laser light intensity I as a pixel j of a position (x j , y j ) in a plurality of pixels which are two-dimensionally arranged with respect to the spatial light modulator 20 In (x j , y j )=I j-in The resulting incident light intensity distribution is given. Alternatively, the incident light amplitude distribution due to the amplitude A j-in may be obtained to obtain the incident pattern of the laser light. Also, when necessary, the phase of the incident light for the laser light can also be used. And the composition of the acquisition.

接著,設定對於照射對象物15之雷射光的集光條件(S104)。首先,設定將藉由空間光調變器20而作了相位調變之雷射光對照射對象物15進行集光照射的單一或複數之集光點的個數st(S105)。於此,在由上述構成所致之雷射光照射裝置1A中,係能夠藉由在空間光調變器20中所呈現的調變圖案,來因應於必要而得到複數之集光點。 Next, the light collecting conditions for the laser light of the object 15 to be irradiated are set (S104). First, the number s t of single or plural light collecting points that illuminate the object 15 to be irradiated by the laser light whose phase is modulated by the spatial light modulator 20 is set (S105). Here, in the laser light irradiation device 1A resulting from the above configuration, a plurality of light collecting points can be obtained in response to the necessary modulation pattern presented in the spatial light modulator 20.

又,係針對相對於對象物15之st個的集光點s=1~st之各個,而設定雷射光之集光位置γs=(us,vs,zs),以及所期望之集光強度Is-des(S106)。另外,關於對於各集光點之雷射光的集光強度,係並不被限定於由強度之絕對值所致的設定,例如亦可藉由強度之相對性的比例來作設定。 Further, the collection position γ s = (u s , v s , z s ) of the laser light is set for each of the s t collection points s=1 to s t with respect to the object 15 The desired collected light intensity I s-des (S106). Further, the intensity of the collected light of the laser light for each of the light collecting points is not limited to the setting due to the absolute value of the intensity, and may be set, for example, by the ratio of the relative strength.

接著,在從空間光調變器20起而朝向集光點s之雷射光的傳播中,將由於折射率互為相異之第1、第2傳播媒質所產生的像差條件導出(S107)。之後,對於在步驟S107中所導出的像差條件作考慮,並參考在步驟S101、S104中所取得並設定了的雷射光之照射條件、集光條件,而對於成為在空間光調變器20之複數的像素中所呈現 的調變圖案之CGH作設計(S108)。 Next, in the propagation of the laser light from the spatial light modulator 20 toward the light collecting point s, the aberration conditions due to the first and second propagation medium whose refractive indices are different from each other are derived (S107). . Thereafter, considering the aberration conditions derived in step S107, referring to the irradiation conditions of the laser light acquired and set in steps S101 and S104, and the light collecting conditions, the spatial light modulator 20 is obtained. Presented in the plural pixels The CGH of the modulation pattern is designed (S108).

針對在圖4之流程圖的步驟S107中所實行的像差條件之導出方法作具體性說明。若是將圖1所示之構成中的空間光調變器20置換為反射鏡,則由於係並未對於從雷射光源10所供給而來之雷射光施加相位調變,因此,理想上,係成為使平行光射入對物透鏡25中,並經由對物透鏡25而被變換為球面波。當在雷射光之傳播路徑(集光路徑)中並不存在有像差物體的情況時,從對物透鏡25而來之光,係以與焦距f相等之集光深度而被集光於1點處。 The method of deriving the aberration condition executed in step S107 of the flowchart of FIG. 4 will be specifically described. If the spatial light modulator 20 in the configuration shown in FIG. 1 is replaced with a mirror, since phase modulation is not applied to the laser light supplied from the laser light source 10, ideally, The parallel light is incident on the objective lens 25, and is converted into a spherical wave via the objective lens 25. When there is no aberration object in the propagation path (light collecting path) of the laser light, the light from the object lens 25 is collected by the collecting depth equal to the focal length f. Point.

另一方面,若是在傳播路徑中存在有折射率相異之第1、第2傳播媒質,則會由於折射較之改變而產生像差,從對物透鏡25而來之光係並不會集光於1點處。相對於此,藉由對於在空間光調變器20中所呈現之調變圖案作適當的設計,而使被傳播至對物透鏡25處之光的波面變形,係能夠消除相對於所設定的集光點s之像差的影響,而能夠將雷射光作集光。 On the other hand, if there are first and second propagation media having different refractive indices in the propagation path, aberrations will occur due to changes in refraction, and the light system from the objective lens 25 will not be collected. Light at 1 o'clock. On the other hand, by appropriately designing the modulation pattern presented in the spatial light modulator 20, the wavefront deformation of the light propagating to the object lens 25 can be eliminated with respect to the set The effect of the aberration of the light collecting point s can be used to collect the laser light.

在用以將雷射光集光至所期望之集光點處的波面之導出中,例如,係可使用由對於從所期望之集光位置起的逆光線追蹤所致之導出方法。以下,係以為了將像差之影響消除地來集光於平行平面基板之內部的位於光軸上之集光點處所進行的波面之導出方法為例,來進行說明(參考專利文獻2)。另外,關於波面之導出以及由其所致之像差條件(例如,後述之代表像差條件的Φj-OPD)之導出,除了由 逆光線追蹤所進行之方法以外,例如亦可使用最適化修正方法(非專利文獻5)、在近軸光線中之像差的解析法(非專利文獻7)等,具體而言,係可使用各種之方法。 In the derivation of the wavefront used to concentrate the laser light to the desired spotlight point, for example, a derivation method resulting from inverse ray tracing from the desired spotlight position may be used. In the following, a method of deriving the wavefront performed at the light collecting point on the optical axis in which the light is collected in the parallel plane substrate in order to eliminate the influence of the aberration is described as an example (refer to Patent Document 2). Further, regarding the derivation of the wavefront and the derivation of the aberration condition (for example, Φ j-OPD representing the aberration condition to be described later), in addition to the method performed by the inverse ray tracing, for example, the optimization correction may be used. The method (Non-Patent Document 5), the analysis method of the aberration in the paraxial ray (Non-Patent Document 7), and the like, specifically, various methods can be used.

圖5,係為針對在雷射光之傳播中所產生的像差條件之導出作展示的圖。首先,對於氛圍媒質之折射率n1和照射對象物15之折射率n2為相等的情況作考慮。若是以將光集光於對象物15之端面P上的位置處時之對物透鏡25的位置作為基準,而使對物透鏡朝向對象物15側作距離d之移動,則光係被集光於從端面P而離開了距離d之位置的點O處。作為理想之平面波而進行射入的光,在藉由對物透鏡25而作了變換之後,係成為球面波,在從該球面波中之點R而來的光線,係藉由在圖5中以實線所示之光路而到達點O處。此時,從點R起直到點O為止的光路長度,係為f,不論是何種光軸高度,均會成為相同之光路長度。 Figure 5 is a diagram showing the derivation of aberration conditions generated in the propagation of laser light. First, the medium of refractive index n 1 and the atmosphere of the irradiation of the object 15 are equal to n 2 for consideration. When the position of the objective lens 25 is set at the position where the light is collected on the end surface P of the object 15 and the object lens is moved toward the object 15 by the distance d, the light system is collected. At a point O from the end face P away from the position of the distance d. The light incident as an ideal plane wave is converted into a spherical wave by the objective lens 25, and the light rays from the point R in the spherical wave are in FIG. Arrive at point O with the light path indicated by the solid line. At this time, the length of the optical path from the point R up to the point O is f, and the same optical path length is obtained regardless of the optical axis height.

另一方面,當折射率n1、n2為相異的情況時,從對物透鏡25而來之光係並不會被集光於點O處。因此,雖然對物透鏡25之移動量係為相同之距離d,但是,係藉由以空間光調變器20來將雷射光之波面作調變,而設為集光於從端面P而離開了zs的位置之點O’處。於此情況,從點O’而來之光線,係成為經過對象物15和氛圍媒質之間的邊界面上之點Q而到達點R處,O’、Q和QR的合計係成為光路長度。在每一個光軸高度h處,將此種光路長度(OPL:Optical Path Length)導出。 On the other hand, when the refractive indices n 1 and n 2 are different, the light system from the objective lens 25 is not collected at the point O. Therefore, although the amount of movement of the objective lens 25 is the same distance d, the wavefront of the laser light is modulated by the spatial light modulator 20, and the light is collected from the end surface P. At the point O' of the position of z s . In this case, the light rays from the point O' reach the point R through the point Q on the boundary surface between the object 15 and the atmosphere medium, and the total of O', Q, and QR becomes the optical path length. This optical path length (OPL: Optical Path Length) is derived at each optical axis height h.

首先,如圖5中所示一般,若是將波面修正前之光線的對於對象物15之射入角設為θ,並將波面修正後之光線的對於對象物15之射入角設為θ1,且將折射角設為θ2,則光軸高度h1、h2、h,係分別藉由下述之式(1)、(2)、(3)而表示。 First, as shown in FIG. 5, generally, the incident angle of the light beam before the wavefront correction is set to θ, and the incident angle of the light corrected by the wavefront to the object 15 is set to θ 1 . When the angle of refraction is θ 2 , the optical axis heights h 1 , h 2 , and h are represented by the following equations (1), (2), and (3), respectively.

[式1] h 1 =(f cosθ-d)tanθ 1 …(1) [Formula 1] h 1 = ( f cos θ - d ) tan θ 1 (1)

[式2] h 2 =z s tanθ 2 …(2) [Equation 2] h 2 = z s tan θ 2 (2)

[式3] h=n 1 f sinθ…(3) [Equation 3] h = n 1 f sin θ (3)

於此,射入角θ1和折射角θ2,係依據司乃耳定律而一義性地被附加有關係。又,藉由關係式h=h1+h2,和上述之式(1)~(3),角度θ、θ1、θ2係被一義性地附加有關係。例如,當被賦予有某一特定之θ1或θ2的情況時,係可藉由將上述式(1)、(2)代入至關係式h=h1+h2中,並求解式(3),而容易地決定出θ。 Here, the incident angle θ 1 and the refraction angle θ 2 are affixed to each other in accordance with the Snell's law. Further, by the relation h = h 1 + h 2 , and the above equations (1) to (3), the angles θ, θ 1 , and θ 2 are implicitly added. For example, when given a certain θ 1 or θ 2 , the above equations (1) and (2) can be substituted into the relation h=h 1 +h 2 and solved. 3), and easily determine θ.

但是,相反的,當被賦予有特定之θ的情況時,想要解析性地求取出θ1以及θ2一事,係為困難。當針對特定之角度θ而求取出相對應之θ1、θ2時,係進行探索。例如,係使θ1或θ2之值逐漸的改變,並於每一次之改變中而求取出θ之值。之後,藉由不斷使θ1、θ2改變,直到得到 會使θ成為所期望之值的θ1、θ2為止,來進行其之探索以及角度之導出。 However, conversely, when a specific θ is given, it is difficult to analytically extract θ 1 and θ 2 . When the corresponding θ 1 and θ 2 are extracted for a specific angle θ, the search is performed. For example, the value of θ 1 or θ 2 is gradually changed, and the value of θ is taken out in each change. After that, by continuously so that θ 1, θ 2 changes, [theta] will be [theta] until the desired value of 1, up to θ 2, to explore the export and the angle of the.

如同上述一般,係藉由式(1)~(3),來求取出與所期望之θ相對應的θ1、θ2。之後,對於每一入射角θ,而藉由下述之式(4)來求取出由於照射對象物15所產生的光之傳播的光路長度OPL。 As described above, by the equations (1) to (3), θ 1 and θ 2 corresponding to the desired θ are extracted. Then, for each incident angle θ, the optical path length OPL of the propagation of the light generated by the irradiation target 15 is obtained by the following equation (4).

另外,此式(4)中之「-f-(n2-n1)×d」係為常數項,而為用以防止OPL之值變得過大所附加之項。 Further, "-f-(n 2 - n 1 ) × d" in the equation (4) is a constant term, and is an item added to prevent the value of the OPL from becoming excessive.

此式(4),係代表每一射入角θ之光路長度,但是,係亦可藉由式(3)以及式(4),來作為每一光軸高度h之光路長度,而如同下述之式(5)一般地作表現。 This equation (4) represents the length of the optical path of each incident angle θ, but it can also be used as the optical path length of each optical axis height h by the equations (3) and (4), as in the lower The formula (5) is generally expressed.

藉由此,係能夠求取出與光軸高度h相對應之OPL。 Thereby, it is possible to extract the OPL corresponding to the optical axis height h.

將賦予此OPL之差(亦即是光路長度差(OPD:Optical Path Difference))的相位ΦOPD,藉由空間光調變器(SLM)20來作賦予,係能夠將雷射光集光於對象物15之 內部中的所期望之位置處。此相位ΦOPD,係根據式(5),而可藉由[式6]Φ OPD (h,d,z s )={OPL(h,d,z s )-OPL(0,d,z s )}×2π/λ…(6)來求出。將此相位ΦOPD,在為了進行3維多點照射而將距離d作了固定的狀態下,而針對每一zs來作導出。另外,光軸高度h之範圍,係為0~hmax。又,hmax,係成為0~NA×f之範圍、亦即是,對物透鏡25之開口,係為光軸高度之hmax的最大值。 The phase Φ OPD which gives the difference of the OPL (that is, the optical path difference (OPD)) is given by the spatial light modulator (SLM) 20, and the laser light can be collected on the object. At the desired location in the interior of the object 15. The phase Φ OPD is according to the formula (5), and can be obtained by [Equation 6] Φ OPD ( h , d , z s )={ OPL ( h , d , z s )- OPL (0, d , z s )}×2 π / λ (6) to find. This phase Φ OPD is derived for each z s in a state where the distance d is fixed for three-dimensional multi-point illumination. In addition, the range of the optical axis height h is 0 to h max . Further, h max is in the range of 0 to NA × f, that is, the opening of the objective lens 25 is the maximum value of h max of the optical axis height.

又,上述之光軸高度h和SLM20之像素j的位置(xj,yj)之間,係存在有下述一般之關係。當SLM20和對物透鏡25係如同圖1中所示之光學系一般而藉由4f光學系來作結像的情況時,對物透鏡之瞳的波面係被傳播至SLM處。此時,若是將4f光學系之透鏡21的焦距設為f1,並將透鏡22的焦距設為f2,則橫倍率M,係成為M=f2/f1。故而,從對物透鏡之射出瞳而來的光,在SLM上,光軸高度係成為h=0~hmax/M。 Further, the above-described general relationship between the optical axis height h and the position (x j , y j ) of the pixel j of the SLM 20 exists. When the SLM 20 and the objective lens 25 are connected to each other by the 4f optical system as in the optical system shown in Fig. 1, the wavefront of the object lens is propagated to the SLM. At this time, if the focal length of the lens 21 of the 4f optical system is f1 and the focal length of the lens 22 is f2, the horizontal magnification M is M=f2/f1. Therefore, from the light emitted from the object lens, the optical axis height is h=0~h max /M on the SLM.

又,從對物透鏡25之射出瞳而來的光之中心位置,若是得知在SLM上而位於座標(xc,yc)處,則藉由下述之式(7) ,可以變換光軸高度h和SLM之像素座標(xj,yj)。藉由此,係能夠求取出成為座標(xj,yj)之每一像素j的像差條件之相位Φj-OPDFurther, if the center position of the light emitted from the object lens 25 is located at the coordinates (x c , y c ) on the SLM, the following equation (7) is obtained. , the optical axis height h and the pixel coordinates (x j , y j ) of the SLM can be transformed. Thereby, it is possible to extract the phase Φ j-OPD of the aberration condition of each pixel j which becomes the coordinate (x j , y j ).

接著,針對在圖4之流程圖的步驟S108中所實行的調變型態之設計方法作具體性說明。以下,係作為對於在SLM20中所呈現之調變圖案的1個像素處之相位值的影響作了注目之設計方法的例子,而針對使用有ORA法之設計方法作說明(參考專利文獻3、非專利文獻1、2)。 Next, a specific description will be given of a design method of the modulation type which is executed in step S108 of the flowchart of FIG. In the following, an example of a design method that pays attention to the influence of the phase value at one pixel of the modulation pattern presented in the SLM 20 is described, and a design method using the ORA method is described (refer to Patent Document 3, Non-patent documents 1, 2).

於此,一般而言,作為在SLM中之調變圖案所使用的CGH之設計方法,係存在有複數種,例如,係可列舉出反覆傅立葉法等。首先,反覆傅立葉變換法,係準備SLM面和折射面之2個面,並在各面之間藉由傅立葉變換以及逆傅立葉變換來作傳播。之後,在每一傳播中,對於各面之振幅資訊作置換,並取得最終之相位分布。 Here, in general, there are a plurality of methods for designing the CGH used as the modulation pattern in the SLM, and examples thereof include a repeated Fourier method and the like. First, the inverse Fourier transform method prepares two faces of the SLM face and the refracting face, and propagates between the faces by Fourier transform and inverse Fourier transform. Then, in each propagation, the amplitude information of each face is replaced, and the final phase distribution is obtained.

另一方面,作為其他的CGH設計法,係可列舉出光線追蹤法以及對於1個像素的影響作了注目之設計方法的2種。作為光線追蹤法,係存在有透鏡重合法(S法:Superposition of Lens)。此方法,在從集光點而來之波面之重疊為少的情況時,係為有效,但是,若是波面之重疊增加,則在射入至SLM處之雷射光強度中,係會有傳播至集光點處之光的強度顯著的降低或者是變得無法作控制的情況。因此,係存在有對於S法作了改良之反覆S法。 On the other hand, as another CGH design method, there are two types of design methods that pay attention to the ray tracing method and the influence of one pixel. As a ray tracing method, there is a lens re-method (S method: Superposition of Lens). This method is effective when the overlap of the wavefronts from the light collecting point is small. However, if the overlapping of the wavefronts increases, the intensity of the laser light incident on the SLM will propagate to The intensity of the light at the spot is significantly reduced or becomes impossible to control. Therefore, there is a repeated S method for improving the S method.

另一方面,對於CGH之1個像素的影響作注目之設 計法,係為適宜選擇CGH之1個像素,並在每1像素處對於相位值作變更以進行CGH之設計的方法,並依存於1個像素之相位的決定方法,而存在有探索型之方法和解析型之方法。 On the other hand, attention is paid to the influence of 1 pixel of CGH. The calculation method is a method in which one pixel of CGH is appropriately selected, and a phase value is changed every one pixel to design a CGH, and a method of determining the phase of one pixel is used, and there is an exploration type. Methods and analytical methods.

在此設計法中,係將CGH之某一像素的相位值作為參數來進行變更,並使用由夫瑞乃繞射等所致之波動傳播函數,來使調變雷射光作傳播,而對於在所期望之集光點處的代表集光狀態之值(例如振幅、強度、複變振幅之值)產生何種變化一事進行調查。而後,採用會使在集光點處之集光狀態接近於所期望之結果的相位值。將此種操作一次對於1個像素地來進行,並至少對於光會射入之全部的像素來進行。 In this design method, the phase value of a certain pixel of CGH is changed as a parameter, and the wave propagation function caused by Frei's diffraction or the like is used to propagate the modulated laser light, and The change in the value of the representative light collection state (for example, the value of amplitude, intensity, and complex amplitude) at the desired collection point is investigated. Then, a phase value is obtained which brings the light collecting state at the light collecting point close to the desired result. This operation is performed once for one pixel and at least for all pixels into which light is incident.

當在全部的像素處而結束了操作後,在解析型之方法中,係對於在將全部的像素作了相位調變後之結果中,所期望之位置的相位係作了何種變化一事作確認,之後,回到最初的第1個像素,並使用所期望之位置的相位,而進行每一像素個別之相位的變更。又,在探索型之方法中,係並不進行確認地而回到最初的第1個像素處。作為探索型之方法,例如,係存在有登山演算法、模擬降溫演算法(SA:Simulated Annealing)、基因演算法(GA:Genetic Algorithm)等(參考非專利文獻3、4)。 When the operation is completed at all the pixels, in the analytic method, what is the change of the phase of the desired position in the result of phase modulation of all the pixels? After confirming, the first pixel is returned to the first pixel, and the phase of the desired position is used to change the phase of each pixel individually. Further, in the search type method, the first pixel is returned to the first pixel without confirmation. As a method of the exploration type, for example, there are a mountaineering algorithm, a simulated cooling algorithm (SA: Simulated Annealing), a genetic algorithm (GA: Genetic Algorithm), and the like (refer to Non-Patent Documents 3 and 4).

以下所說明之ORA(Optimal Rotation Angle)法,係為使用有解析型之方法的最適化演算法。在此方法中,於調變圖案之各像素處的相位值之變更、調整,係藉由根據代 表在集光點s處之集光狀態的複變振幅之相位、傳播函數之相位以及在像素j處之變更前的相位值所解析性地求取出之值,來進行之。特別是,在本實施形態之設計方法中,作為傳播函數,係代替,而使用對於由第1、第2傳播媒質所導致的像差條件作了考慮之傳播函數The ORA (Optimal Rotation Angle) method described below is an optimization algorithm using an analytical method. In this method, the phase value at each pixel of the modulation pattern is changed and adjusted by the phase of the complex amplitude according to the concentrating state representative of the concentrating point s. Phase of the propagation function And the phase value before the change at pixel j The extracted value is obtained analytically. In particular, in the design method of the present embodiment, as a propagation function, it is replaced And use a propagation function that takes into account the aberration conditions caused by the first and second propagation media. .

圖6,係為對於在圖3所示之光調變控制裝置30中所實行的調變圖案之設計方法的其中一例作展示之流程圖。首先,針對透過空間光調變器20所進行的對於照射對象物15之雷射光的集光照射,而取得所設定了的集光條件之資訊(步驟S201)。作為於此所取得之集光條件,係存在有集光點之個數st、各集光點s之集光位置γs=(us,vs,zs)、以及所期望之集光強度Is-desFig. 6 is a flow chart showing an example of a method of designing a modulation pattern implemented in the optical modulation control device 30 shown in Fig. 3. First, the collected light conditions of the laser light to be irradiated by the spatial light modulator 20 are acquired, and the information of the set light collection conditions is acquired (step S201). As the concentrating conditions obtained here, there are the number of collection points s t , the collection positions γ s = (u s , v s , z s ) of the respective collection points s, and the desired set. Light intensity I s-des .

接著,製作出成為作為在SLM20中所呈現之調變圖案所使用的CGH之設計的初期條件之相位圖案(S202)。此相位圖案,例如,係藉由將在CGH之像素j處的相位值設為隨機相位圖案的方法而製作出來。此方法,由於以ORA所進行之CGH設計,係為最適化手法,因此,係為了藉由隨機相位來防止陷入特定之極小解一事的目的而被使用。另外,例如當在就算是忽略陷入至特定之極小解的可能性也無妨的情況時,例如亦可設定均一之相位圖案等。 Next, a phase pattern which is an initial condition of the design of the CGH used as the modulation pattern presented in the SLM 20 is created (S202). This phase pattern, for example, is by the phase value at pixel j of CGH It is created by a method of setting a random phase pattern. This method is based on the CGH design performed by the ORA, and is used for the purpose of preventing a certain extremely small solution by random phase. Further, for example, when it is possible to ignore the possibility of sinking into a specific minimum solution, for example, a uniform phase pattern or the like can be set.

接著,當集光點之個數為被設定有複數(st≧2)的情況時,係將身為用以對於該些之集光點s=1~st之間的集光 強度比作調整之參數的權重ws,作為其之初期條件而設定為ws=1(S203)。另外,此權重ws,係成為1×st之配列。又,當集光點為單一(st=1)的情況時,係並不需要進行權重之設定。 Then, when the number of light collecting points is set to a complex number (s t ≧ 2), the light intensity ratio between the light collecting points s=1 and s t is used. The weight w s of the parameter to be adjusted is set to w s =1 as the initial condition (S203). In addition, this weight w s is a list of 1 × s t . Moreover, when the collection point is single (s t =1), it is not necessary to set the weight.

若是結束了CGH之相位圖案以及權重ws之設定,則係計算出代表在集光點s處之雷射光的集光狀態之複變振幅Us(S204)。具體而言,係藉由代表光波傳播之下述式(8) ,來求取出複變振幅Us=Asexp(i)。於此,Aj-in係為對於SLM20之像素j的雷射光之射入振幅,係為在像素j處之相位值。又,係為射入至像素j處之雷射光的相位。 If the end of the CGH phase pattern And the setting of the weight w s is to calculate the complex amplitude U s representing the light collecting state of the laser light at the light collecting point s (S204). Specifically, it is represented by the following formula (8) which represents light wave propagation. To find the complex amplitude U s =A s exp(i ). Here, A j-in is the incident amplitude of the laser light for the pixel j of the SLM 20, Is the phase value at pixel j. also, It is the phase of the laser light incident on the pixel j.

又,在式(8)中,,係為對由於第1、第2傳播媒質(在圖5所示之例中,係為氛圍媒質、照射對象物15)所導致的像差條件作了考慮之傳播函數,並藉由 來求出。在此式(9)中,Φj-OPD,係為式(6)中所示之相對於 像素j的像差條件之相位。 Also, in the formula (8), Is a propagation function that takes into account the aberration conditions caused by the first and second propagation media (in the example shown in FIG. 5, the atmosphere medium and the object 15 to be irradiated), and To find out. In the formula (9), Φ j-OPD is the phase of the aberration condition with respect to the pixel j shown in the formula (6).

如此這般,藉由使用對於像差條件作了考慮的傳播函數,就算是在zs為相異之任一者的集光點處,均能夠得到可賦予所期望之結果的CGH。又,,係為當假定為自由傳播的情況時之有限遠方區域中的傳播函數。作為此傳播函數,例如係可使用藉由下述之式(10) 所賦予的身為波動傳播函數的近似式之夫瑞乃繞射。於此,在上述之式(10)中,k係為波數。 In this way, by using propagation functions that are considered for aberration conditions Even at the collection point where any of z s is different, it is possible to obtain CGH which can give a desired result. also, Is a propagation function in a finite distance region when assumed to be freely propagating. As this propagation function For example, it can be used by the following formula (10) The approximation of the approximation of the wave propagation function is given by the diffraction. Here, in the above formula (10), k is a wave number.

另外,作為自由傳播之傳播函數,例如,係可使用上述之夫瑞乃繞射的近似式或夫朗和斐繞射之近似式,或者是使用亥姆霍茲方程式之解等,而可使用各種之衍生式。又,在上述之式(8)、(9)中,若是將像差條件之相位,設為Φj-OPD=0,則傳播函數,係成為=,並得到在先前技術之ORA法中所使用的並未對於像差作考慮之複變振幅的算出式。 In addition, as a propagation function of free propagation For example, an approximation of the above-described Fresnel diffraction or an approximation of the Fraunhofer diffraction may be used, or a solution of the Helmholtz equation or the like may be used, and various derivatives may be used. Further, in the above equations (8) and (9), if the phase of the aberration condition is Φ j - OPD =0, the propagation function becomes = And the calculation formula of the complex amplitude which is not used for the aberration used in the prior art ORA method is obtained.

又,若是使用式(10)之傳播函數來進行由ORA法所致之CGH設計,則係設計出亦附加有對物透鏡之焦距f的透鏡效果之CGH。但是,通常,由於在SLM中之像素尺寸係為大,因此,係並無法表現其之對物透鏡的透鏡效果。故而,實際上,係並非使用焦距f,而係使用焦距L(例 如,若是Hamamatsu Photonics製之LCOS-SLM X10468,則係為L=1m程度)之值。 Further, if the CGH design by the ORA method is performed using the propagation function of the equation (10), the CGH to which the lens effect of the focal length f of the objective lens is added is designed. However, in general, since the pixel size in the SLM is large, the lens effect of the object lens cannot be expressed. Therefore, in fact, instead of using the focal length f, the focal length L is used (for example) For example, if it is LCOS-SLM X10468 manufactured by Hamamatsu Photonics, it is a value of L = 1 m).

接著,判定在由上述方法所進行之CGH的設計中是否得到有所期望之結果(S205)。作為此情況之判定方法,例如係可使用下述之方法:亦即是,係將在各集光點s處所得到之集光強度Is=|As|2、和所期望之強度Is-des,藉由下述之式(11) 來作比較,並在全部之集光點s處,根據強度比是否成為特定之值ε以下一事來進行判定的方法。又,亦可並非使用集光強度Is,而是藉由振幅As、複變振幅Us等來進行判定。 Next, it is determined whether or not a desired result is obtained in the design of the CGH performed by the above method (S205). As a method of determining the case, for example, a method of using the collected light intensity I s =|A s | 2 obtained at each of the light collecting points s and the desired intensity I s can be used. -des , by the following formula (11) For comparison, a method of determining whether or not the intensity ratio is equal to or less than a specific value ε is performed at all the collected light spots s. Further, instead of using the collected light intensity I s , the determination may be performed by the amplitude A s , the complex amplitude U s , or the like.

或者是,亦可使用藉由像是在圖6之流程圖中的相位值之變更以及複變振幅之算出等的迴圈是否進行了所規定之次數等的條件來進行判定之方法。當對於所設定之集光條件,而判定所設計出之CGH為滿足必要之條件的情況時,係結束由ORA所進行之CGH的設計演算法。又,當並未滿足條件的情況時,係前進至下一步驟S206。 Alternatively, a method of determining whether or not the loop such as the change of the phase value and the calculation of the complex amplitude in the flowchart of FIG. 6 has been performed for a predetermined number of times or the like may be used. When it is determined that the designed CGH satisfies the necessary condition for the set concentrating condition, the design algorithm of the CGH by the ORA is ended. Moreover, when the condition is not satisfied, the process proceeds to the next step S206.

當判定為並未滿足為了結束設計所必要之條件的情況時,首先,係將用以調整集光點s間之集光強度比的權重ws之值,根據下述之式(12) 來作變更(S206)。於此,在式(12)中之被使用於權重ws之更新中的參數η,為了防止ORA演算法變得不安定,通常,係習慣性地使用η=0.25~0.35程度之值。 When it is determined that the condition necessary for ending the design is not satisfied, first, the value of the weight w s for adjusting the intensity ratio of the collected light between the light collecting points s is used, according to the following formula (12) Make a change (S206). Here, in the equation (12), the parameter η used in the update of the weight w s is used, in order to prevent the ORA algorithm from becoming unstable, it is customary to use a value of η = 0.25 to 0.35.

接著,以使在集光點s處之雷射光的集光狀態接近所期望之狀態的方式,來在CGH之每一像素處進行相位值之變更操作(S207)。在解析型之ORA法中,針對為了使集光狀態接近所期望之狀態而施加在像素j之相位值處的相位之變化量△,係使用藉由式(8)所得到之複變振幅的相位、對於像差條件Φj-OPD作了考慮之傳播函數的相位、以及更新前之相位值,而藉由下述之式(13) 以及判定,而解析性地求取出來。於此,係為 Next, the phase value changing operation is performed at each pixel of the CGH so that the light collecting state of the laser light at the light collecting point s is close to the desired state (S207). In the analytical ORA method, the phase value applied to the pixel j in order to bring the light collecting state close to the desired state The amount of change in phase △ Using the phase of the complex amplitude obtained by equation (8) Phase of the propagation function considered for the aberration condition Φ j-OPD And the phase value before the update With the following formula (13) And the judgment is obtained analytically. Here, it is

[式15] [Equation 15]

。在此種解析性地求取出相位值的方法中,相較於藉由探索來求取出相位值的登山演算法等之方法,係有著能夠使在演算中所需要之時間縮短的優點。 . Analytically fetching phase values In the method, a method such as a mountaineering algorithm for extracting a phase value by searching has an advantage that the time required for calculation can be shortened.

另外,針對在相位之變化量△的決定中所使用之Φjs,在通常之ORA法中,係使用下述之式(17) ,但是,在於此所說明之改良ORA法中,係除了上述之傳播函數的變更以外,在相位值之更新中的此一Φjs之算出中,亦係使用對於像差條件之相位Φj-OPD作了考慮的式(16)。 In addition, for the amount of change in phase △ Φ js used in the decision, in the usual ORA method, the following formula (17) is used. However, in the improved ORA method described herein, in addition to the above-described change of the propagation function, in the calculation of the Φ js in the update of the phase value, the phase Φ j - for the aberration condition is also used. OPD considered the formula (16).

如同上述一般,若是求取出了相位之變化量△,則係藉由下述之式(18) ,來對於在CGH之第j個的像素中之相位值作變更、 更新。而後,對於是否針對全部的像素而進行了相位值之變更操作一事作確認(S208),若是變更操作並未結束,則係作為j=j+1,而針對下一個像素實行相位值之變更操作。另一方面,若是針對全部的像素而結束了變更操作,則係回到步驟S204,並進行複變振幅Us之算出以及由其所致之集光狀態的評價。藉由反覆實行此種操作,而作成與所設定的集光條件相對應之調變圖案的CGH。 As in the above, if the amount of change in phase is taken out, , by the following formula (18) , for the phase value in the jth pixel of CGH Make changes and updates. Then, it is checked whether or not the phase value is changed for all the pixels (S208), and if the change operation is not completed, the phase value is changed for the next pixel as j=j+1. . On the other hand, if all the pixels for the change operation is ended, the system returned to step S204, and the calculated complex variable amplitude U s and the evaluation of light therefrom due to the state of the current collector. By performing such an operation in reverse, a CGH of a modulation pattern corresponding to the set concentrating condition is created.

在藉由以上之方法所設計的CGH中,如同上述一般,係被賦與有對物透鏡之焦距f的透鏡效果。故而,當使用焦距f之對物透鏡的情況時,只要相對於作為由ORA法所進行之設計結果而得到的CGH之相位值,而進行 即可。但是,於此,係為 。另外,當代替fobj而使用上述之焦距L的情況時,針對式(20),亦係將fobj變更為L。 In the CGH designed by the above method, as described above, the lens effect with the focal length f of the objective lens is imparted. Therefore, when the objective lens of the focal length f is used, the phase value of CGH obtained as a result of the design by the ORA method is used. And proceed Just fine. However, here, . In addition, when used in place of L f obj is the focal length of the above, for formula (20), the system is also changed to L. f obj

於此,當在傳播路徑上存在有折射率相異之媒質的情 況時所進行之像差的修正中,於先前技術中,係使用有下述之方法:亦即是,求取出像差修正用之圖案,並在所設計出之CGH的調變圖案上,再加上修正圖案之方法(例如,參考非專利文獻5)。作為此情況下之修正圖案的導出方法,例如係存在有最適化修正法、使用有近軸近似之解析法、使用有逆光線追蹤之解析法。根據此些之手法所導出的像差條件之逆的相位,係成為像差修正用之圖案。然而,在此種由圖案之疊加所致的方法中,係如同下述一般,會有無法適當地發揮作用之情況。 Here, when there is a medium having a refractive index different in the propagation path In the correction of the aberration performed in the case, in the prior art, the following method is used: that is, the pattern for aberration correction is extracted, and on the modulation pattern of the designed CGH, A method of correcting the pattern is added (for example, refer to Non-Patent Document 5). As a method of deriving the correction pattern in this case, for example, there is an optimization correction method, an analysis method using a paraxial approximation, and an analysis method using reverse ray tracing. The phase of the inverse of the aberration condition derived by the above methods is a pattern for aberration correction. However, in such a method resulting from the superposition of the patterns, as described below, there is a case where the function cannot be properly performed.

亦即是,在上述之ORA法等的對於CGH之1個像素的影響作注目之設計法中,係能夠藉由1枚的CGH,來進行由複數之集光點所致之雷射光的3維多點照射。在對於此種CGH而如同先前技術一般地將修正圖案作了疊加的情況時,在藉由CGH所再生之全部的集光點處,係被賦予有同一之像差修正圖案的效果。然而,實際上,所設定之複數的集光點,係會有光軸方向之位置(光軸深度)為相異的情況。於此情況,由於像差之影響係依存於光軸深度而互為相異,因此,係有必要對於每一集光點而分別賦予相異之像差修正圖案的效果。亦即是,在將修正圖案疊加於CGH上的方法中,係僅能夠施加在單一之光軸深度下的像差修正,而有著使光軸深度為相異之像差的修正變得不充分之虞。 In other words, in the design method of focusing on the influence of one pixel of CGH, such as the ORA method described above, it is possible to perform laser light caused by a plurality of light collecting points by one CGH. Vido point illumination. In the case where the correction pattern is superimposed as in the prior art for such CGH, the same aberration correction pattern is imparted to all the collection points reproduced by CGH. However, in actuality, the set number of collection points may be different in the position of the optical axis direction (optical axis depth). In this case, since the influence of the aberration depends on the optical axis depth and is different from each other, it is necessary to impart the effect of the different aberration correction pattern to each of the collected spots. In other words, in the method of superimposing the correction pattern on the CGH, only the aberration correction at a single optical axis depth can be applied, and the correction for making the aberration of the optical axis depth different is insufficient. After that.

另一方面,在非專利文獻6中,係對於使用有反覆傅立葉法之設計法有所揭示。在此種方法中,為了進行3維 多點照射,係有必要在CGH之設計中進行追加處理。為了將藉由通常之反覆傅立葉法所設計的CGH作再生,在SLM之後段係成為需要透鏡。此係因為,在設計之階段中,傳播距離係為無限遠,而無法進行對於每一光軸深度(光軸方向之集光位置)的控制之故。 On the other hand, Non-Patent Document 6 discloses a design method using a reverse Fourier method. In this method, in order to carry out 3D Multi-point irradiation is necessary for additional processing in the design of CGH. In order to regenerate the CGH designed by the conventional inverse Fourier method, a lens is required after the SLM. This is because, in the design stage, the propagation distance is infinity, and control for each optical axis depth (light collecting position in the optical axis direction) cannot be performed.

在此方法中,為了改變光軸深度,係有必要在藉由反覆傅立葉法所設計之CGH中另外追加夫瑞乃透鏡圖案。進而,為了實現3維多點照射,首先,係對於被設定有集光點之每一集光面(繞射面),藉由反覆傅立葉法來求取出CGH,並在各個CGH處,追加對於深度方向作控制之夫瑞乃透鏡圖案的相位。之後,將複數之集光面的CGH,以複變振幅之形式來作疊加,而僅將相位取出,藉由此操作,而設計用以進行3維多點照射之CGH。 In this method, in order to change the optical axis depth, it is necessary to additionally add a Fresnel lens pattern to the CGH designed by the inverse Fourier method. Further, in order to realize three-dimensional multi-point irradiation, first, for each of the light collecting surfaces (diffraction surfaces) on which the light collecting points are set, CGH is extracted by the inverse Fourier method, and each CGH is added to each CGH. The depth direction is the phase of the control lens pattern. Thereafter, the CGH of the plurality of collecting surfaces is superimposed in the form of complex amplitude, and only the phase is taken out, thereby operating the CGH for performing three-dimensional multi-point irradiation.

又,當在各集光面用之CGH處追加夫瑞乃透鏡圖案時,藉由亦追加對由於傳播路徑上之媒體所導致的影響進行修正之像差修正圖案,係成為能夠進行每一集光面之球面像差修正。然而,在此種方法中,由於係在進行了複變振幅演算之後,而僅將相位取出,因此,係欠缺振幅分布資訊,而有著極為難以進行對於各集光點之振幅的分配之問題。 In addition, when a Freyn lens pattern is added to the CGH for each concentrating surface, an aberration correction pattern for correcting the influence due to the medium on the propagation path is added, so that each episode can be performed. Spherical aberration correction of the smooth surface. However, in this method, since the phase is taken out after the complex amplitude calculation is performed, the amplitude distribution information is lacking, and there is a problem that it is extremely difficult to perform the distribution of the amplitudes of the respective collection points.

相對於此,若是依據上述之CGH的設計方法,則係能夠適當的實現此種像差修正以及對於各集光點之振幅的分配。又,在此種設計方法中,例如,係成為能夠設計出同時實現有「由於在傳播路徑上存在有身為氛圍媒質之空 氣(或者是水、油等)和折射率為相異之媒體所導致的影響之修正」和「3維多點照射」以及「複數之集光點間的強度調整」之3者的CGH。 On the other hand, according to the above-described CGH design method, such aberration correction and distribution of amplitudes of the respective collection points can be appropriately realized. Moreover, in such a design method, for example, it is possible to design and realize at the same time that "the air is present as an atmosphere medium on the propagation path. The CGH of the gas (or water, oil, etc.) and the correction of the influence of the medium with different refractive index and the "three-dimensional multi-point illumination" and the "strength adjustment between the complex light collection points".

針對由上述實施形態之光調變控制裝置30以及雷射光照射裝置1A所得到的像差修正等之效果,與其具體例一同作說明。圖7~圖9,係分別為對於由雷射光照射裝置1A所致的雷射光之照射圖案之例(CGH的再生像之例)作展示的圖。於此,係將雷射光藉由空間濾波器來擴廣,並將藉由身為空間光調變器20之LCOS-SLM而進行了相位調變之光,藉由f=800mm之透鏡來作集光。此時,在距離集光透鏡700mm之位置處,係配置有f=200mm之柱狀透鏡。於此例中,柱狀透鏡係為被插入至集光光學系中之像差物體。 The effects of the aberration correction and the like obtained by the optical modulation control device 30 and the laser beam irradiation device 1A of the above-described embodiment will be described together with specific examples. FIG. 7 to FIG. 9 are diagrams each showing an example of an irradiation pattern of laser light by the laser light irradiation device 1A (an example of a reconstructed image of CGH). Here, the laser light is expanded by a spatial filter, and the phase-modulated light is made by the LCOS-SLM which is the spatial light modulator 20, and is made by a lens of f=800 mm. Collecting light. At this time, a lenticular lens of f = 200 mm was disposed at a position of 700 mm from the collecting lens. In this example, the lenticular lens is an aberration object that is inserted into the collecting optical system.

當使用並不進行針對像差物體之修正的調變圖案之情況時,如圖7中所示一般,由於柱狀透鏡之像差的影響,CGH係並不會被正確顯示。另一方面,若是藉由上述之CGH的設計方法來進行針對像差物體之修正,則如圖8中所示一般,在距離集光透鏡zs=850mm之位置處,係觀察到有像差被作了修正之像。 When a modulation pattern that does not perform correction for an aberration object is used, as shown in Fig. 7, generally, the CGH system is not correctly displayed due to the influence of the aberration of the lenticular lens. On the other hand, if the correction for the aberration object is performed by the above-described CGH design method, as shown in Fig. 8, generally, at the position of the distance collecting lens z s = 850 mm, aberration is observed. It was corrected.

另外,針對柱狀透鏡之像差修正,相較於上述之平行平面基板的情況,OPD之導出方法等係有些許差異。亦即是,在平行平面基板的情況時,由於係為軸對稱,因此,係可使用2維之計算。另一方面,在柱狀透鏡的情況時,或者是當在對象物處存在有傾斜的情況等時,係成為有必 要進行與此相對應之適當的OPD之導出方法。 Further, for the aberration correction of the lenticular lens, the method of deriving the OPD is slightly different from the case of the parallel plane substrate described above. That is, in the case of a parallel planar substrate, since it is axisymmetric, a two-dimensional calculation can be used. On the other hand, in the case of a lenticular lens, or when there is a tilt at the object, etc., it becomes necessary The appropriate OPD derivation method corresponding to this is to be performed.

又,在上述之CGH的設計方法中,由於係正確地持有包含光軸深度之集光位置、折射率、在空間光調變器處之像素節距等的資訊,因此,係能夠對於所期望之位置而進行雷射光之集光照射、雷射加工等。於此,圖9,係為對於將藉由通常之反覆傅立葉法所設計出的「HPK」圖案作再生之CGH,於在傳播路徑上並不存在有對象物時而作了再生的結果作展示。另一方面,圖8,係為將以集光於光軸上之(0,0,zs)之位置處的方式而藉由ORA法所設計出的CGH、和「HPK」圖案之CGH,此兩者作了疊加,並將此疊加所得之物作了再生、顯示的結果。 Further, in the above-described CGH design method, since the information including the light collecting position including the optical axis depth, the refractive index, and the pixel pitch at the spatial light modulator is accurately held, it is possible to The collected light of the laser light, the laser processing, and the like are performed at a desired position. Here, FIG. 9 is a CGH which reproduces the "HPK" pattern designed by the usual reverse Fourier method, and shows the result of regeneration when there is no object on the propagation path. . On the other hand, Fig. 8 is a CGH designed by the ORA method and a CGH of the "HPK" pattern in such a manner as to collect the position of (0, 0, z s ) on the optical axis. The two are superimposed, and the superimposed objects are reproduced and displayed.

若是對圖8、圖9作比較,則可以得知,在紙面橫方向上之再生位置,係為相異。集光點之形狀,雖係成為良好,但是,在圖8中之作為調變圖案所使用的CGH,係並未進行有針對由於柱狀透鏡所折射了的橫方向之繞射的修正。相對於此,為了亦將橫方向之繞射作改善,係存在有下述之2個方法。 Comparing Fig. 8 and Fig. 9, it can be seen that the reproduction positions in the horizontal direction of the paper are different. Although the shape of the light collecting point is good, the CGH used as the modulation pattern in FIG. 8 is not corrected for the diffraction in the lateral direction refracted by the lenticular lens. On the other hand, in order to improve the diffraction in the lateral direction, there are two methods described below.

亦即是,第1方法,係為針對再生點之各點,而亦包含有相對於光軸方向而垂直之面的位置地來1點1點的分別導出OPD之方法。於此情況,由於在Φj-OPD中係包含有點s之位置資訊,因此,係針對全部之點而為共通,而Φj-OPD係針對各點之位置而互為相異。 In other words, the first method is a method of deriving the OPD at a point of 1 o'clock at a point corresponding to the position of the plane perpendicular to the optical axis direction for each point of the reproduction point. In this case, since Φ j-OPD contains position information of a bit s, therefore, It is common to all points, and Φ j-OPD is different for each point.

第2方法,係為並不包含有相對於光軸方向而為垂直之面的位置,而導出依存於光軸深度而相異之OPD的方 法。於此情況,由於在Φj-OPD中係並不包含有點s之位置資訊,因此,係進行相對於光軸方向而為垂直之面的位置之調整,亦即是,係在各點之位置而互為相異。 The second method is a method of deriving an OPD that differs depending on the depth of the optical axis, without including a position perpendicular to the optical axis direction. In this case, since the position information of the point s is not included in the Φ j-OPD , Adjusting the position of the plane perpendicular to the optical axis direction, that is, It is at the position of each point and is different from each other.

另外,當適用後者之方法,並且如同上述一般並非使用實際之焦距f而是使用焦距L的情況時,係有必要對於(us,vs)作變更。另外,不論是在使用f的情況或者是使用L的情況時,最終而言均係將透鏡效果除去,因此,只要正確地進行(us,vs)之設計,則並不會造成問題。因此,當使用焦距L的情況時,變更後之(us’,vs’),係設為(us’,vs’)=(βus,βvs)。另外,β係為對於將透鏡之焦距作了變更一事進行修正的參數,當光軸和(us,vs)之間之距離為短的情況時,係成為β=L/f。 Further, when the latter method is applied, and as in the case where the focal length f is not actually used as described above, it is necessary to change (u s , v s ). Further, in the case where f is used or when L is used, the lens effect is finally removed. Therefore, if the design of (u s , v s ) is correctly performed, there is no problem. Therefore, when the focal length L is used, the changed (u s ', v s ') is set to (u s ', v s ') = (βu s , βv s ). Further, the β system is a parameter for correcting the change in the focal length of the lens, and when the distance between the optical axis and (u s , v s ) is short, it is β=L/f.

使用此些之方法,來進行CGH之設計。藉由此,係能夠將各集光點分別在特定之位置處作再生。 Use these methods to design the CGH. By this, it is possible to reproduce the respective collection points at specific positions.

如此這般,將像差量正確地導出並設計CGH一事,係會對於雷射光之照射位置精確度產生大幅的影響。另外,在並不知道媒體之折射率的情況下之雷射光照射等之中,可以考慮先進行雷射光照射並對於其之集光位置(例如加工位置)作確認,之後再使折射率改變並進行反饋(feedback)之方法。 In this way, the correct derivation and design of CGH for the amount of aberration will have a significant impact on the accuracy of the position of the laser beam. Further, in the case of laser light irradiation or the like without knowing the refractive index of the medium, it is conceivable to perform the laser light irradiation first and confirm the light collecting position (for example, the processing position), and then change the refractive index and The method of feedback.

針對在圖4之流程圖的步驟S108中所實行的調變圖案之設計方法作更進一步之說明。在圖6之流程圖中,係以對於CGH之1個像素的影響作了注目之設計法作為例子,而對於使用有解析型之ORA法的設計方法作了展示 。相對於此,作為調變圖案之設計方法,係如同上述一般,亦可使用登山演算法、模擬降溫演算法、基因演算法等之探索型的設計方法。 The design method of the modulation pattern implemented in step S108 of the flowchart of FIG. 4 will be further described. In the flowchart of FIG. 6, a design method that pays attention to the influence of one pixel of CGH is taken as an example, and a design method using an analytical ORA method is shown. . On the other hand, as a design method of a modulation pattern, as in the above-mentioned general, an exploration type design method such as a mountaineering algorithm, a simulated cooling algorithm, or a gene algorithm can be used.

圖10,係為對於在圖3所示之光調變控制裝置30中所實行的調變圖案之設計方法的其他例子作展示之流程圖。在此流程圖中,作為探索型之設計方法的例子,係對於使用有登山演算法的情況之設計方法作展示。在此方法中,首先,係與ORA法相同的,針對透過SLM20所進行的對於照射對象物15之雷射光的集光照射,而取得所設定了的集光條件之資訊(步驟S301)。接著,將在SLM20中所呈現之CGH設計的初期條件之相位圖案,例如作為隨機相位圖案來作成之(S302)。 Fig. 10 is a flow chart showing another example of the design method of the modulation pattern implemented in the optical modulation control device 30 shown in Fig. 3. In this flowchart, an example of a design method of an exploration type is shown for a design method using a case where a mountaineering algorithm is used. In this method, first, in the same manner as the ORA method, information on the set concentrating conditions is acquired for the illuminating of the laser light to be irradiated on the object 15 by the SLM 20 (step S301). Next, the phase pattern of the initial conditions of the CGH design presented in the SLM20 For example, it is created as a random phase pattern (S302).

接著,進行CGH之1個像素的相位值之變更操作(S303)。進而,使用包含有對於像差條件作了考慮之傳播函數的式(8),來計算出代表在集光點s處之雷射光的集光狀態之複變振幅Us=Asexp(i)(S304)。若是算出了複變振幅,則係針對所得到的集光狀態而進行判定(S305)。 Next, the phase value of one pixel of CGH is performed. Change operation (S303). Furthermore, the use of a propagation function containing considerations for aberration conditions is used. Equation (8), to calculate the complex amplitude U s =A s exp(i) representing the collected state of the laser light at the collection point s ) (S304). When the complex amplitude is calculated, the determination is made for the obtained light collecting state (S305).

於此,若是藉由1個像素的相位值之的切換,而使振幅As、強度Is=|As|2、或者是複變振幅Us,成為接近所期望之值,則係採用此時之相位值。在登山演算法中,例如,係對於CGH之每一像素的個別之相位值,而從0π(rad)起,來一次0.1π(rad)地進行切換,直到成為特定之相位值,例如成為2π(rad)為止,並在每一次之切換中,使用式(8)來進行傳播。之後,藉由探索來求取出使集光 點s之強度最為增加的相位值。 Here, if the phase value is 1 pixel The switching is performed such that the amplitude A s , the intensity I s =|A s | 2 , or the complex amplitude U s becomes close to the desired value, and the phase value at this time is used. In the mountaineering algorithm, for example, for individual phase values of each pixel of CGH, switching from 0π(rad) is performed once at 0.1π(rad) until it becomes a specific phase value, for example, becomes 2π. (rad), and in each switching, the equation (8) is used for propagation. Thereafter, the phase value which maximizes the intensity of the light collecting spot s is extracted by searching.

接著,判定是否在全部之條件下而對於1個像素的相位值之切換作了確認(S306),若是尚未完全進行,則回到步驟S303。進而,判定是否針對全部的像素而進行了1個像素之相位值之變更以及集光狀態之判定等的操作(S307),若是尚未完全進行,則係將像素號碼設為j=j+1,並回到步驟S303,而針對下一個像素進行必要之操作。 Next, it is determined whether the phase value for one pixel is under all conditions. The switching is confirmed (S306), and if it has not been completely completed, the process returns to step S303. Further, it is determined whether or not an operation such as changing the phase value of one pixel and the determination of the condensed state is performed for all the pixels (S307), and if it is not completely performed, the pixel number is set to j=j+1. And returning to step S303, the necessary operations are performed for the next pixel.

若是針對全部的像素而結束了必要之操作,則判定在CGH的設計中是否得到有所期望之結果(S308)。作為此情況下之判定方法,係與ORA法之情況相同的,例如可使用根據在各集光點處所得到之集光強度、振幅、複變振幅等之值是否落在容許範圍內一事來作判定的方法。或者是,亦可使用藉由像是在圖10之流程圖中的相位值之變更以及集光狀態之判定等的迴圈是否進行了所規定之次數等的條件來進行判定之方法。當滿足了必要之條件的情況時,係結束CGH之設計演算法。當並未滿足條件的情況時,係回到步驟S303,並從第1個像素起而反覆進行探索。 If the necessary operation is completed for all the pixels, it is determined whether or not a desired result is obtained in the design of the CGH (S308). The determination method in this case is the same as the case of the ORA method. For example, it is possible to use whether or not the values of the collected light intensity, the amplitude, the complex amplitude obtained at each of the light collecting points fall within the allowable range. The method of judgment. Alternatively, a method of determining whether or not the loop such as the change of the phase value and the determination of the condensed state in the flowchart of FIG. 10 has been performed for a predetermined number of times or the like may be used. When the necessary conditions are met, the design algorithm of CGH is terminated. When the condition is not satisfied, the process returns to step S303, and the search is repeated from the first pixel.

於此,在上述之調變圖案之設計方法的例子中,均係針對將照射對象物15設為平行平面基板的情況來作了說明,但是,實際上,亦可考慮有像是對象物15等之存在於光之傳播路徑上的媒體為相對於光軸而具備角度α之傾斜的情況。當此傾斜α為大的情況時,除了球面像差以外,還會發生非點像差。在此種情況時,係除了對物透鏡之NA、焦距f、氛圍媒質之折射率n1、照射對象物15之折射 率n2、以及相對於SLM之雷射光的射入光強度分布Ij-in以外,亦求取出對象物15之傾斜α。 Here, in the example of the above-described design method of the modulation pattern, the case where the object 15 to be irradiated is a parallel plane substrate has been described. However, in actuality, the object 15 may be considered. The medium existing on the light propagation path is a case where the angle α is inclined with respect to the optical axis. When the inclination α is large, astigmatism occurs in addition to the spherical aberration. When such a case, in addition to NA objective lens system, the focal length f, the refractive index of the medium atmosphere n 1, the refractive index of the irradiated object 15 n 2, and with respect to the incident laser beam SLM of the light intensity distribution I j In addition to -in , the inclination α of the object 15 is also taken out.

在上述之設計例中,雖係藉由使用有逆光線追蹤之解析手法,來進行了2維下之像差條件的導出,但是,此係因為球面像差乃身為軸對稱性之像差之故。相對於此,當由於媒體之傾斜α等而發生非點像差並導致像差成為並非為軸對稱等的情況時,係只要以對於此事作了對應的適當之方法來進行像差條件之導出,並使用所得到的像差條件來進行CGH之設計即可。 In the above-described design example, the aberration condition of the two-dimensional is derived by using an analytical method with inverse ray tracing, but this is because the spherical aberration is an aberration of the axis symmetry. Therefore. On the other hand, when astigmatism occurs due to the inclination α of the medium or the like and the aberration is not axisymmetric or the like, the aberration condition is performed by an appropriate method corresponding to the matter. Export and use the resulting aberration conditions Let's design the CGH.

又,為了作為集光點而在任意之位置處將雷射光作集光,亦可想見會有將雷射光束集光於與光軸相異之位置處的情況。當光束之繞射角為小的情況時,雖然不會產生問題,但是,當繞射角為大的情況時,除了球面像差以外,還會發生非點像差。於此種情況時,係只要求取出光束之傾斜β,並與上述相同的而藉由對於此事作了對應的適當之方法來進行像差條件的導出,再使用所得到的像差條件來進行CGH之設計即可。 Further, in order to collect the laser light at an arbitrary position as a light collecting point, it is also conceivable that the laser beam is collected at a position different from the optical axis. When the diffraction angle of the light beam is small, although no problem occurs, when the diffraction angle is large, astigmatism occurs in addition to the spherical aberration. In this case, it is only required to take out the inclination β of the beam, and the same as the above, the appropriate method for the matter is used to derive the aberration condition, and the obtained aberration condition is used. Let's design the CGH.

關於在各集光點s處之雷射光的所期望之集光強度Is-des,係亦可對於照射對象物15等之材質的光之透過率作考慮,並因應於照射深度來對於強度Is-des作調整,亦即是因應於照射深度zs來對於強度Is-des作改變,而進行CGH之設計。 Regarding the desired collected light intensity I s-des of the laser light at each of the light collecting points s, it is also possible to consider the light transmittance of the material of the object 15 to be irradiated, and the intensity according to the irradiation depth. I s-des is adjusted, that is, the CGH is designed to change the intensity I s-des in response to the illumination depth z s .

又,由於SLM係具備有週期性之像素構造,因此,在該複數之像素中所顯示的CGH,係會依存於空間頻率而 使作了繞射之光的強度相異。故而,亦可對於此種繞射強度作考慮,並因應於照射位置(us,vs)、照射深度zs來對於強度Is-des作改變,而進行CGH之設計。 Further, since the SLM system has a periodic pixel structure, the CGH displayed in the plurality of pixels differs in the intensity of the diffracted light depending on the spatial frequency. Therefore, it is also possible to consider the diffraction intensity and design the CGH in response to the irradiation position (u s , v s ) and the irradiation depth z s to change the intensity I s-des .

又,也可以想見到,會有就算是如同上述一般而進行了強度Is-des之調整,也仍會在強度中產生參差的情況。在此種情況中,係亦可對於雷射光之照射結果、例如對於在照射部位處所發生之折射率變化量等之加工結果作觀察,並藉由參考該觀察結果所進行之反饋,來改變強度Is-des,而進行CGH之設計。 Further, it is also conceivable that even if the adjustment of the intensity I s-des is performed as described above, the unevenness may occur in the intensity. In this case, it is also possible to observe the processing result of the laser light irradiation, for example, the amount of refractive index change occurring at the irradiation site, and change the intensity by referring to the feedback of the observation result. I s-des , and the design of CGH.

又,當藉由雷射光之集光照射而在其之集光點處進行照射對象物15之加工的情況時,於上述說明中,雖係對於由玻璃之內部加工所致的光積體電路之製作作了例示,但是,關於進行雷射加工的情況時之加工對象物15的材質,係並不被限定於玻璃媒體,例如亦可將矽之內部或者是SiC等之各種材質作為加工對象。 Further, when the processing of the object 15 to be irradiated is performed at the light collecting point by the irradiation of the collected light of the laser light, in the above description, the optical integrated circuit is formed by the internal processing of the glass. The production of the object 15 is not limited to the glass medium, and the material of the inside of the crucible or various materials such as SiC may be processed. .

又,在上述實施形態中,主要係想定為由對於照射對象物15之雷射光的集光照射所進行的對象物15內部之雷射加工而作了說明,但是,使用上述之光調變控制裝置以及調變圖案之設計方法的雷射光照射裝置,係除了雷射加工裝置以外,亦可適用在例如細胞觀察用之雷射掃描顯微鏡等的雷射顯微鏡等之各種裝置中。 In addition, in the above-described embodiment, the laser processing inside the object 15 by the illuminating of the laser light of the object 15 is mainly described. However, the above-described optical modulation control is used. The laser light irradiation device of the device and the method for designing the modulation pattern can be applied to various devices such as a laser microscope such as a laser scanning microscope for cell observation, in addition to the laser processing device.

圖11,係為對於包含有由本發明所致之光調變控制裝置的雷射光照射裝置之其他實施形態之構成作展示的圖。由本實施形態所致之雷射光照射裝置1R,係具備有與圖1 中所示之構成相同的包含雷射光源10和可動平台18和空間光調變器20和驅動裝置28以及光調變控制裝置30之構成,但是,除此之外,亦更進而具備有檢測部40和透鏡41以及雙色鏡42。 Fig. 11 is a view showing the configuration of another embodiment of a laser beam irradiation apparatus including the optical modulation control apparatus according to the present invention. The laser light irradiation device 1R according to the present embodiment is provided with FIG. 1 The configuration shown in the above includes the laser light source 10 and the movable stage 18, the spatial light modulator 20, the driving device 28, and the optical modulation control device 30. However, in addition to this, it is further provided with detection. The portion 40 and the lens 41 and the dichroic mirror 42.

雙色鏡42,係在雷射光照射光學系中,被設置於構成4f光學系之透鏡22和對物透鏡25之間。又,被雙色鏡42所反射的從照射對象物15而來之光,係成為透過透鏡41而射入至檢測部40處的構成。 The dichroic mirror 42 is disposed between the lens 22 constituting the 4f optical system and the objective lens 25 in the laser beam irradiation optical system. In addition, the light from the object 15 to be irradiated, which is reflected by the dichroic mirror 42, is transmitted through the lens 41 and is incident on the detecting unit 40.

藉由此,圖11之雷射光照射裝置1B,係作為對於身為照射對象物之觀察試料15照射雷射光,並藉由檢測部40來對於從試料15而來之反射光、散射光或者是螢光等的觀察之雷射掃描顯微鏡,而被構成。另外,關於針對試料15之雷射掃描,在圖11中,係設為藉由可動平台18來使試料15移動之構成,但是,亦可設為在光學系側處設置可動機構、電流鏡等之構成。 In this way, the laser light irradiation device 1B of FIG. 11 irradiates the observation sample 15 as an object to be irradiated with the laser light, and the reflected light or the scattered light from the sample 15 is detected by the detecting unit 40. A laser scanning microscope for observation such as fluorescence is constructed. In addition, in the laser scanning for the sample 15, in FIG. 11, the sample 15 is moved by the movable platform 18, but a movable mechanism, a current mirror, etc. may be provided in the optical system side. The composition.

圖12,係為對於在圖11所示之雷射光照射裝置1B中的對於照射對象物(觀察試料)15之雷射光的集光照射之其中一例作展示的圖。例如,在將細胞作為試料15之細胞觀察等之中,係如圖12中所示一般,亦可以想見到會有依存於觀察位置而細胞之形狀成為相異的情況。在此種情況中,係有必要求取出與各個形狀相對應了的像差條件之相位FIG. 12 is a view showing an example of the collected light irradiation of the laser light to the object to be irradiated (observation sample) 15 in the laser light irradiation device 1B shown in FIG. For example, in the case of observing cells as the sample 15 or the like, as shown in Fig. 12, it is also conceivable that the shape of the cells may be different depending on the observation position. In this case, it is necessary to take out the phase of the aberration condition corresponding to each shape. .

又,在雷射掃描顯微鏡中,不僅是在雷射光之收斂過程中會產生折射率失配(mismatching),於觀察時,在發散 過程中也會發生折射率失配。於此情況,亦可以考慮有:對於發散過程作考慮並導出像差條件而進行CGH之設計,並且進而使用其他的SLM來進行反射光、散射光、螢光等之修正。藉由此,例如在共焦顯微鏡等中,係能夠對於試料觀察之精確度的提升有所期待。 Moreover, in the laser scanning microscope, not only the refractive index mismatching occurs during the convergence of the laser light, but also the refractive index mismatch occurs during the diverging process during the observation. In this case, it is also possible to consider: considering the divergence process and deriving the aberration condition The design of the CGH is performed, and other SLMs are used to correct the reflected light, the scattered light, the fluorescent light, and the like. Thereby, for example, in a confocal microscope or the like, it is possible to improve the accuracy of observation of the sample.

又,在上述實施形態中,雖係針對關於單一波長之雷射光的相位調變之實施形態作了說明,但是,亦可使從波長相異之複數的光源而來之複數的雷射光成分射入SLM中,並在SLM處顯示使波長相異之複數的光成分作調變之調變圖案,而將各個相位作調變。關於使波長相異之複數的光成分同時作調變之調變圖案的設計方法,例如係在非專利文獻8中有所記載。 Further, in the above-described embodiment, the embodiment has been described with respect to the phase modulation of the laser light of a single wavelength. However, a plurality of laser light beams may be emitted from a plurality of light sources having different wavelengths. Into the SLM, and at the SLM, a modulation pattern in which a plurality of light components having different wavelengths are modulated is displayed, and each phase is modulated. A method of designing a modulation pattern in which a plurality of light components having different wavelengths are modulated at the same time is described, for example, in Non-Patent Document 8.

針對使用上述實施形態之構成而進行複數波長之控制的情況,作具體性說明。在取得集光條件資訊時,係取得點s之集光位置和作集光之波長的資訊。之後,只要在每一點s處求取出像差條件,並將依存於波長和位置而互為相異之傳播函數,變換為並使用即可。 The case where the control of the complex wavelength is performed using the configuration of the above embodiment will be specifically described. When the concentrating condition information is obtained, the collected light position of the point s and the information of the wavelength of the collected light are obtained. After that, just take the aberration condition at every point s And will depend on the wavelength and position and the propagation function is different from each other. , converted to And use it.

由本發明所致之光調變控制方法、控制程式、控制裝置以及雷射光照射裝置,係並不被限定於上述之實施形態以及構成例,而可作各種之變形。例如,關於包含有雷射光源以及空間光調變器之光學系的構成,係並不被限定於圖1、圖11中所示之構成,具體而言,係可使用各種之構成。 The optical modulation control method, the control program, the control device, and the laser light irradiation device according to the present invention are not limited to the above-described embodiments and configuration examples, and various modifications are possible. For example, the configuration of the optical system including the laser light source and the spatial light modulator is not limited to the configuration shown in FIGS. 1 and 11, and specifically, various configurations can be used.

又,針對在空間光調變器中所呈現之調變圖案(CGH) 的設計,亦同樣的,具體而言,除了上述之例以外,亦可使用各種之方法。一般而言,在調變圖案之設計中,只要採用下述之構成即可:亦即是,係對於在調變圖案之1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態造成之影響作注目,並以使該集光狀態成為所期望之狀態的方式來變更相位值,再藉由對於調變圖案之全部的像素進行此種相位值之變更操作,來設計調變圖案,並且,在對於集光點處之集光狀態作評價時,針對從空間光調變器之調變圖案中的像素j起所朝向集光點s之光的傳播,係使用在自由傳播之波動傳播函數中加上像差條件所變換後的傳播函數Further, similarly, in addition to the above examples, various methods can be used for the design of the modulation pattern (CGH) presented in the spatial light modulator. In general, in the design of the modulation pattern, it is only necessary to adopt the following configuration: that is, for the change of the phase value at one pixel of the modulation pattern for the lightning at the light collecting point The influence of the light collecting state of the light is focused, and the phase value is changed so that the light collecting state is in a desired state, and the phase value is changed by all the pixels of the modulation pattern. To design a modulation pattern, and to evaluate the light toward the light collection point s from the pixel j in the modulation pattern of the spatial light modulator when evaluating the light collection state at the light collection point Wave propagation function used in free propagation Add the propagation function transformed by the aberration condition .

在由上述實施形態所致之光調變控制方法中,係設為下述之構成,亦即是:(1)係為使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的雷射光之集光照射之光調變控制方法,其特徵為,具備有:(2)照射條件取得步驟,係作為雷射光之照射條件,而取得對於空間光調變器之雷射光的射入圖案、和位在從空間光調變器所對於集光點之雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於第1傳播媒質而更靠集光點側處之第2傳播媒質的與第1折射率相異之第2折射率n2;和(3)集光條件設定步驟,係作為雷射光之集光條件,而對於將從空間光調變器而來之雷射光作集光照射的集光點之個 數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和(4)像差條件導出步驟,係將在從空間光調變器所對於集光點s之雷射光的傳播中,由折射率互為相異之第1傳播媒質以及第2傳播媒質所產生的像差條件作導出;和(5)調變圖案設計步驟,係對於藉由像差條件導出步驟所導出之像差條件作考慮,而對於在空間光調變器中所呈現之調變圖案作設計,(6)調變圖案設計步驟,係想定為在空間光調變器中而被作了2維配列之複數的像素,並對於在複數之像素中所呈現的調變圖案之於1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於相位值作變更,再將此種相位值之變更操作,針對調變圖案之全部的像素而進行之,藉由此來設計調變圖案,並且,在對於集光點處之集光狀態進行評價時,係針對從空間光調變器之調變圖案中的像素j起所對於集光點s之光的傳播,而使用在傳播媒質為均質的狀態下之自由傳播的波動傳播函數中加上了像差條件所變換的傳播函數In the optical modulation control method according to the above embodiment, the configuration is such that: (1) the input laser light is used and the phase of the laser light is modulated, and the phase is adjusted. a spatially modulated spatial light modulator of the converted laser light output to control the illumination of the laser light for the set concentrating spot according to the modulation pattern presented in the spatial light modulator The optical modulation control method is characterized in that: (2) an irradiation condition acquisition step is performed, and an irradiation pattern of the laser light for the spatial light modulator is obtained as an irradiation condition of the laser light, and the position is in the space. The first refractive index n 1 of the first propagation medium on the propagation path of the laser light at the light collecting point of the light modulator, and the second position at the side of the light collecting point on the side closer to the light collecting point than the first propagation medium The second refractive index n 2 which is different from the first refractive index of the propagation medium; and (3) the concentrating condition setting step is used as a light collecting condition of the laser light, and the lightning is obtained from the spatial light modulator The number s t of the light collecting points illuminated by the collecting light, and the collecting point s of the s t The individual light collecting position and the light collecting intensity are set, wherein s t is an integer of 1 or more; and (4) the aberration condition deriving step is to be a lightning ray for the light collecting point s from the spatial light modulator In the propagation of the light, the aberration conditions generated by the first propagation medium and the second propagation medium having mutually different refractive indices are derived; and (5) the modulation pattern design step is performed by the aberration condition extraction step The derived aberration conditions are considered, and for the modulation pattern presented in the spatial light modulator, (6) the modulation pattern design step is intended to be made in the spatial light modulator. The effect of the two-dimensional arrangement of the plural pixels on the concentrating state of the laser light at the concentrating point for the change of the phase value at one pixel of the modulation pattern presented in the complex pixel Incidentally, the phase value is changed so that the light collecting state is close to the desired state, and the phase value changing operation is performed on all the pixels of the modulation pattern. This is to design a modulation pattern, and, in the case of collecting light When the light collecting state is evaluated, the light is transmitted to the light collecting point s from the pixel j in the modulation pattern of the spatial light modulator, and the free propagation is performed in a state where the propagation medium is homogeneous. Wave propagation function Add the propagation function transformed by the aberration condition .

又,在由上述實施形態所致之光調變控制程式中,係設為下述之構成,亦即是:(1)係為用以使電腦,實行使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的雷射光之集光照射之光調變控制程式,其特徵為, 係使電腦實行:(2)照射條件取得處理,係作為雷射光之照射條件,而取得對於空間光調變器之雷射光的射入圖案、和位在從空間光調變器所對於集光點之雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於第1傳播媒質而更靠集光點側處之第2傳播媒質的與第1折射率相異之第2折射率n2;和(3)集光條件設定處理,係作為雷射光之集光條件,而對於將從空間光調變器而來之雷射光作集光照射的集光點之個數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和(4)像差條件導出處理,係將在從空間光調變器所對於集光點s之雷射光的傳播中,由折射率互為相異之第1傳播媒質以及第2傳播媒質所產生的像差條件作導出;和(5)調變圖案設計處理,係對於藉由像差條件導出處理所導出之像差條件作考慮,而對於在空間光調變器中所呈現之調變圖案作設計,(6)調變圖案設計處理,係想定為在空間光調變器中而被作了2維配列之複數的像素,並對於在複數之像素中所呈現的調變圖案之於1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於相位值作變更,再將此種相位值之變更操作,針對調變圖案之全部的像素而進行之,藉由此來設計調變圖案,並且,在對於集光點處之集光狀態進行評價時,係針對從空間光調變器之調變圖案中的像素j起所對於集光點s之光的傳播,而使用在傳播媒質為均質的狀 態下之自由傳播的波動傳播函數中加上了像差條件所變換的傳播函數Further, in the optical modulation control program according to the above embodiment, the configuration is such that: (1) is for causing a computer to use input laser light and to perform the laser light. a phase-modulated spatial light modulator that adjusts the phase of the laser light after the phase modulation, to control the set light spot according to the modulation pattern presented in the spatial light modulator The light modulation control program for the illumination of the laser light is characterized in that the computer is implemented: (2) the irradiation condition acquisition processing is performed as the irradiation condition of the laser light, and the laser light for the spatial light modulator is obtained. The incident pattern and the first refractive index n 1 of the first propagation medium on the propagation path of the laser light from the concentrating point of the spatial light modulator, and the position of the first propagation medium compared to the first propagation medium Further, the second refractive index n 2 which is different from the first refractive index of the second propagation medium at the light collecting point side; and (3) the concentrating condition setting process is used as the light collecting condition of the laser light, and The number of light collecting points from the laser light from the spatial light modulator t and the set light position and the light collection intensity of the s t collection points s, wherein s t is an integer of 1 or more; and (4) the aberration condition derivation processing is performed in the slave In the propagation of the laser light of the light collecting point s by the spatial light modulator, the aberration conditions generated by the first propagation medium and the second propagation medium having mutually different refractive indices are derived; and (5) modulation The pattern design process is for the aberration condition derived by the aberration condition derivation process, and is designed for the modulation pattern presented in the spatial light modulator, (6) modulation pattern design processing, I want to be a pixel that is multi-dimensionally arranged in a spatial light modulator, and for the change of the phase value at one pixel of the modulation pattern presented in the complex pixel. Attention is made to the influence of the light collecting state of the laser light at the point, and the phase value is changed so that the light collecting state is close to the desired state, and the phase value is changed. Designing all the pixels of the pattern to design Modulating the pattern, and, when evaluating the state of light collection at the light collecting point, for the propagation of light from the light collecting point s from the pixel j in the modulation pattern of the spatial light modulator, Free-propagating wave propagation function in a state where the propagation medium is homogeneous Add the propagation function transformed by the aberration condition .

又,在由上述實施形態所致之光調變控制裝置中,係設為下述之構成,亦即是:(1)係為使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的雷射光之集光照射之光調變控制裝置,其特徵為,具備有:(2)照射條件取得手段,係作為雷射光之照射條件,而取得對於空間光調變器之雷射光的射入圖案、和位在從空間光調變器所對於集光點之雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於第1傳播媒質而更靠集光點側處之第2傳播媒質的與第1折射率相異之第2折射率n2;和(3)集光條件設定手段,係作為雷射光之集光條件,而對於將從空間光調變器而來之雷射光作集光照射的集光點之個數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和(4)像差條件導出手段,係將在從空間光調變器所對於集光點s之雷射光的傳播中,由折射率互為相異之第1傳播媒質以及第2傳播媒質所產生的像差條件作導出;和(5)調變圖案設計手段,係對於藉由像差條件導出手段所導出之像差條件作考慮,而對於在空間光調變器中所呈現之調變圖案作設計,(6)調變圖案設計手段,係想定為在空間光調變器中而被作了2維配列之複數的像素,並對於在複數之像素中所呈 現的調變圖案之於1個像素處的相位值之變更所對於在集光點處之雷射光的集光狀態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於相位值作變更,再將此種相位值之變更操作,針對調變圖案之全部的像素而進行之,藉由此來設計調變圖案,並且,在對於集光點處之集光狀態進行評價時,係針對從空間光調變器之調變圖案中的像素j起所對於集光點s之光的傳播,而使用在傳播媒質為均質的狀態下之自由傳播的波動傳播函數中加上了像差條件所變換的傳播函數Further, in the optical modulation control device according to the above embodiment, the configuration is such that: (1) the input laser light is used and the phase of the laser light is modulated. A phase-modulated spatial light modulator for phase-modulated laser light output to control the collection of laser light for the set concentrating spot based on the modulation pattern presented in the spatial light modulator The illumination modulation control device is characterized in that: (2) an irradiation condition acquisition means is provided, and an irradiation pattern of the laser light for the spatial light modulator is obtained as an irradiation condition of the laser light, and The first refractive index n 1 of the first propagation medium on the propagation path of the laser light from the light collecting point of the spatial light modulator and the position of the first propagation medium on the side of the light collecting point compared with the first propagation medium The second refractive index n 2 which is different from the first refractive index of the second propagation medium; and (3) the concentrating condition setting means is used as the light collecting condition of the laser light, and is obtained from the spatial light modulator. the laser beam for irradiating light collecting point of the number of light collecting s t, s t, and the light collecting on th individual light collecting position s, the light intensity set for the set, wherein, T s is an integer of 1 line; and (4) means for deriving an aberration condition, the line from the spatial light modulator to the light collecting point s In the propagation of the laser light, the aberration conditions caused by the first propagation medium and the second propagation medium having mutually different refractive indices are derived; and (5) the modulation pattern design means is based on the aberration condition The aberration conditions derived from the derivation means are considered, and for the modulation pattern presented in the spatial light modulator, (6) the modulation pattern design means is determined to be in the spatial light modulator. Making a complex number of pixels in a two-dimensional arrangement, and causing a change in the phase value at one pixel of the modulation pattern presented in the complex pixel for the light collection state of the laser light at the collection point The influence of the influence is such that the phase value is changed so that the light collecting state is close to the desired state, and the phase value changing operation is performed on all the pixels of the modulation pattern. By designing the modulation pattern, and When the light collecting state at the light spot is evaluated, the light for the light collecting point s is transmitted from the pixel j in the modulation pattern of the spatial light modulator, and the medium is used in a state where the propagation medium is homogeneous. Free-propagating wave propagation function Add the propagation function transformed by the aberration condition .

於此,上述之光調變控制方法、控制程式以及控制裝置,較理想,係在像差條件之導出中,作為相關於從像素j起所朝向集光點s之光的傳播之像差條件,而求取出賦予在該傳播中之光路長度差的相位Φj-OPD,並在調變圖案之設計中,藉由變換式 ,來求取出對於像差條件作了考慮的傳播函數。若依據此種構成,則係能夠適當地將自由傳播之傳播函數,變換為對於像差條件作了考慮的傳播函數Here, the above-described optical modulation control method, control program, and control device are preferably used as aberration conditions for the propagation of light toward the light collecting point s from the pixel j in the derivation of the aberration condition. And extracting the phase Φ j-OPD which gives the difference in optical path length in the propagation, and in the design of the modulation pattern, by transforming To find out the propagation function that takes into account the aberration conditions. . According to this configuration, it is possible to appropriately propagate the propagation function of free propagation. , transformed into a propagation function that takes into account the aberration conditions .

又,光調變控制方法、控制程式以及控制裝置,較理想,係在調變圖案之設計中,將對於空間光調變器20之像素j的雷射光之射入振幅設為Aj-in,並將相位設為,且將在像素j處之相位值設為,而藉由下式 ,來求取出代表在集光點s處之集光狀態的複變振幅Us。藉由此,係能夠對於集光點處之雷射光的集光狀態作適當的評價。 Further, the optical modulation control method, the control program, and the control device are preferably configured to set the amplitude of the incident light of the laser light to the pixel j of the spatial light modulator 20 to A j-in in the design of the modulation pattern. And set the phase And set the phase value at pixel j to By the following For the purpose of extracting the complex amplitude U s representing the state of light collection at the light collecting point s . Thereby, it is possible to appropriately evaluate the light collecting state of the laser light at the light collecting point.

針對調變圖案之設計的具體性構成,在調變圖案之像素j處的相位值之變更中,係可採用下述之構成:亦即是,根據基於代表在集光點s處之集光狀態的複變振幅之相位、和對於像差條件作了考慮之傳播函數、以及在像素j處之變更前的相位值,所解析性求取出之值,來對於相位值作變更。作為此種解析性地更新相位值的方法,例如係存在有ORA(Optimal Rotation Angle)法。或者是,亦可使用在調變圖案之像素j處的相位值之變更中,根據使用登山演算法、模擬降溫演算法或者是基因演算法中的其中一種方法所探索求取出之值,來對於相位值作變更之構成。 For the specific configuration of the design of the modulation pattern, in the change of the phase value at the pixel j of the modulation pattern, the following configuration may be adopted: that is, according to the light collection based on the representative point s Phase of the complex amplitude of the state And propagation functions that are considered for aberration conditions And the phase value before the change at pixel j The value obtained by the resolution is used to change the phase value. As such a method of resolving the phase value analytically, for example, there is an ORA (Optimal Rotation Angle) method. Alternatively, the value of the phase value at the pixel j of the modulation pattern may be used to search for the value obtained by using one of a mountaineering algorithm, a simulated cooling algorithm, or a genetic algorithm. The phase value is changed.

又,關於存在於雷射光之傳播路徑上的第1、第2傳播媒質,例如,係可採用下述之構成:亦即是,第2傳播媒質,係為於內部被設定有集光點之照射對象物,第1傳播媒質,係為存在於空間光調變器和照射對象物之間的氛圍媒質。另外,關於氛圍媒質,除了空氣等之外,亦可為水、油等。又,在空間光調變器和集光點之間,係亦可存 在有3個以上之媒質。 Further, regarding the first and second propagation media existing on the propagation path of the laser light, for example, a configuration may be adopted in which the second propagation medium is internally set with a light collecting point. The object to be irradiated, the first propagation medium, is an atmosphere medium existing between the spatial light modulator and the object to be irradiated. Further, the atmosphere medium may be water, oil, or the like in addition to air or the like. Also, between the spatial light modulator and the light collecting point, the system can also be saved. There are more than 3 media.

又,光調變控制裝置,係亦可具備有:對於空間光調變器進行驅動控制,並使經由調變圖案設計手段所設計出之調變圖案呈現在空間光調變器的光調變器驅動控制手段。又,關於此種光調變器驅動控制手段,係亦可採用作為與進行調變圖案之設計的光調變控制裝置相異之其他裝置來作設置之構成。 Further, the optical modulation control device may be configured to: drive and control the spatial light modulator, and display the modulation pattern designed by the modulation pattern design means in the light modulation of the spatial light modulator Drive control means. Further, such an optical modulator driving control means may be configured as another device that is different from the optical modulation control device that performs the design of the modulation pattern.

在由上述實施形態所致之雷射光照射裝置中,係設為下述之構成:亦即是,係具備有:(a)雷射光源,係供給雷射光;和(b)相位調變型之空間光調變器,係輸入雷射光,並將雷射光之相位作調變,再將相位調變後之雷射光作輸出;和(c)上述構成之光調變控制裝置,係根據在空間光調變器中所呈現之調變圖案,來控制對於所設定的集光點之調變雷射光的集光照射。 In the laser light irradiation device according to the above embodiment, the laser light source is provided with: (a) a laser light source for supplying laser light; and (b) a phase modulation type. a spatial light modulator that inputs laser light and modulates the phase of the laser light, and then outputs the laser light after the phase modulation; and (c) the above-mentioned optical modulation control device is based on space The modulation pattern presented in the light modulator controls the illumination of the modulated laser light for the set concentrating spot.

若依據此種構成,則藉由光調變控制裝置,係成為能夠適當且確實地對於在集光點處之雷射光的集光狀態作控制,並適當地實現對於在照射對象物處所設定的單一或複數之集光點的雷射光之集光照射,以及由此所致之對象物的加工、觀察等的操作。此種雷射光照射裝置,例如係可作為雷射加工裝置、雷射顯微鏡等來使用。另外,作為空間光調變器,較理想,係使用具備有被作了2維配列之複數的像素,並且在複數的像素之各個處而分別將雷射光之相位作調變的構成之空間光調變器。 According to such a configuration, the optical modulation control device can appropriately and surely control the light collecting state of the laser light at the light collecting point, and appropriately set the position of the object to be irradiated. The illumination of the single or multiple collection points of the laser light, and the operation of the object, such as processing, observation, and the like. Such a laser light irradiation device can be used, for example, as a laser processing device, a laser microscope, or the like. Further, as the spatial light modulator, it is preferable to use a spatial light having a plurality of pixels which are arranged in two dimensions, and to adjust the phase of the laser light at each of the plurality of pixels. Modulator.

[產業上之利用可能性] [Industry use possibility]

本發明,係可作為能夠對於在集光點處之雷射光之集光狀態作適當之控制的光調變控制方法、控制程式、控制裝置、以及雷射光照射裝置來利用。 The present invention can be utilized as an optical modulation control method, a control program, a control device, and a laser beam irradiation device that can appropriately control the light collecting state of the laser light at the light collecting point.

1A、1B‧‧‧雷射光照射裝置 1A, 1B‧‧‧Laser light irradiation device

10‧‧‧雷射光源 10‧‧‧Laser light source

11‧‧‧光束擴展器 11‧‧‧beam expander

12‧‧‧反射鏡 12‧‧‧Mirror

13‧‧‧反射鏡 13‧‧‧Mirror

15‧‧‧照射對象物 15‧‧‧Immediate objects

18‧‧‧可動平台 18‧‧‧ movable platform

20‧‧‧空間光調變器 20‧‧‧Space light modulator

21‧‧‧4f光學系透鏡 21‧‧‧4f optical lens

22‧‧‧4f光學系透鏡 22‧‧‧4f optical lens

25‧‧‧對物透鏡 25‧‧‧object lens

28‧‧‧光調變器驅動裝置 28‧‧‧Light modulator drive

40‧‧‧檢測部 40‧‧‧Detection Department

41‧‧‧透鏡 41‧‧‧ lens

42‧‧‧雙色鏡 42‧‧‧Dual color mirror

30‧‧‧光調變控制裝置 30‧‧‧Light modulation control device

31‧‧‧照射條件取得部 31‧‧‧Enhanced Conditions Acquisition Department

32‧‧‧集光條件設定部 32‧‧‧Lighting Condition Setting Department

33‧‧‧像差條件導出部 33‧‧‧ aberration condition derivation unit

34‧‧‧調變圖案設計部 34‧‧‧Transformation Design Department

35‧‧‧光調變器驅動控制部 35‧‧‧Light Modulator Drive Control Department

37‧‧‧輸入裝置 37‧‧‧ Input device

38‧‧‧顯示裝置 38‧‧‧Display device

[圖1]圖1,係為對於雷射光照射裝置的其中一種實施形態之構成作展示的圖。 Fig. 1 is a view showing a configuration of one embodiment of a laser beam irradiation device.

[圖2]圖2,係為針對在雷射光之傳播過程中的像差之發生作展示的圖。 FIG. 2 is a diagram showing the occurrence of aberrations during the propagation of laser light. FIG.

[圖3]圖3,係為對於光調變控制裝置之構成的其中一例作展示之區塊圖。 Fig. 3 is a block diagram showing an example of the configuration of the optical modulation control device.

[圖4]圖4,係為對於光調變控制方法之其中一例作展示的流程圖。 FIG. 4 is a flow chart showing an example of a light modulation control method.

[圖5]圖5,係為針對在雷射光之傳播中所產生的像差條件之導出作展示的圖。 Fig. 5 is a diagram showing the derivation of aberration conditions generated in the propagation of laser light.

[圖6]圖6,係為對於調變圖案之設計方法的其中一例作展示之流程圖。 Fig. 6 is a flow chart showing an example of a design method of a modulation pattern.

[圖7]圖7,係為對於由雷射光照射裝置所致的雷射光之照射圖案之例作展示的圖。 Fig. 7 is a view showing an example of an irradiation pattern of laser light by a laser light irradiation device.

[圖8]圖8,係為對於由雷射光照射裝置所致的雷射光之照射圖案之例作展示的圖。 Fig. 8 is a view showing an example of an irradiation pattern of laser light by a laser light irradiation device.

[圖9]圖9,係為對於由雷射光照射裝置所致的雷射光之照射圖案之例作展示的圖。 Fig. 9 is a view showing an example of an irradiation pattern of laser light by a laser light irradiation device.

[圖10]圖10,係為對於調變圖案之設計方法的其他例作展示之流程圖。 FIG. 10 is a flow chart showing another example of a design method of a modulation pattern.

[圖11]圖11,係為對於雷射光照射裝置的其他實施形態之構成作展示的圖。 Fig. 11 is a view showing the configuration of another embodiment of the laser beam irradiation apparatus.

[圖12]圖12,係為對於在對於照射對象物之雷射光的集光照射之其中一例作展示的圖。 FIG. 12 is a view showing an example of light-collecting illumination of laser light to an object to be irradiated. FIG.

Claims (52)

一種光調變控制方法,係為使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在前述空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的前述雷射光之集光照射之光調變控制方法,其特徵為,具備有:照射條件取得步驟,係作為前述雷射光之照射條件,而取得對於前述空間光調變器之前述雷射光的射入圖案、和位在從前述空間光調變器所對於前述集光點之前述雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於前述第1傳播媒質而更靠前述集光點側處之第2傳播媒質的與前述第1折射率相異之第2折射率n2;和集光條件設定步驟,係作為前述雷射光之集光條件,而對於將從前述空間光調變器而來之前述雷射光作集光照射的前述集光點之個數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和像差條件導出步驟,係將在從前述空間光調變器所對於前述集光點s之前述雷射光的傳播中,由折射率互為相異之前述第1傳播媒質以及前述第2傳播媒質所產生的像差條件作導出;和調變圖案設計步驟,係對於藉由前述像差條件導出步驟所導出之前述像差條件作考慮,而對於在前述空間光調變器中所呈現之前述調變圖案作設計, 前述調變圖案設計步驟,係想定為在前述空間光調變器中而被作了2維配列之複數的像素,並對於在前述複數之像素中所呈現的前述調變圖案之於1個像素處的相位值之變更所對於在前述集光點處之前述雷射光的集光狀態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於前述相位值作變更,再將此種相位值之變更操作,針對前述調變圖案之全部的像素而進行之,藉由此來設計前述調變圖案,並且,在對於前述集光點處之前述集光狀態進行評價時,係針對從前述空間光調變器之前述調變圖案中的像素j起所對於前述集光點s之光的傳播,而使用在傳播媒質為均質的狀態下之自由傳播的波動傳播函數中加上了前述像差條件所變換的傳播函數A light modulation control method is a phase modulation type spatial light modulator that uses input laser light and modulates the phase of the laser light and then modulates the phase of the laser light, according to the spatial light in the foregoing The optical modulation control method for controlling the collected light of the laser light at the set concentrating point, and the irradiation condition obtaining step is provided as the aforementioned An irradiation pattern of the laser light, and an incident pattern of the laser light for the spatial light modulator and a propagation path of the laser light from the spatial light modulator to the light collecting point a first refractive index n 1 of the propagation medium and a second refractive index different from the first refractive index of the second propagation medium on the side of the collection spot side than the first propagation medium n 2; the number of the light spot and the current collector condition setting step, an optical system as the set conditions of the laser beam, and for the spatial light modulator from the laser light for varying an irradiated from the light collection s t , and on th s t Individual light collection position of the light spot s, the light intensity set for the set, wherein, T s is an integer of 1 line; and the aberration condition deriving step, the lines from the spatial light modulator is set for the light spot In the propagation of the aforementioned laser light, the aberration conditions generated by the first propagation medium and the second propagation medium having mutually different refractive indices are derived; and the modulation pattern design step is performed by the image Considering the aforementioned aberration conditions derived from the difference condition deriving step, and designing the modulation pattern presented in the spatial light modulator, the modulation pattern design step is determined to be in the aforementioned spatial light modulation. a plurality of pixels arranged in a two-dimensional arrangement, and a change in a phase value at the one pixel of the modulation pattern presented in the plurality of pixels for the aforementioned light collecting point The influence of the light collecting state of the laser light is focused on, and the phase value is changed so that the light collecting state is close to the desired state, and the phase value is changed. The modulation pattern is designed by using all the pixels of the modulation pattern, and the evaluation of the light collection state at the light collection point is performed for the spatial light modulator from the space light modulator. The pixel j in the aforementioned modulation pattern functions as a propagation of light for the aforementioned light collecting point s, and uses a wave propagation function of free propagation in a state in which the propagation medium is homogeneous. The propagation function transformed by the aforementioned aberration condition is added . 如申請專利範圍第1項所記載之光調變控制方法,其中,前述像差條件導出步驟,係作為關於從前述像素j所對於前述集光點s之光的傳播之前述像差條件,而求取出賦予在該傳播中之光路長度差的相位Φj-OPD,前述調變圖案設計步驟,係根據變換式 來求取出對於前述像差條件作了考慮的前述傳播函數The optical modulation control method according to claim 1, wherein the aberration condition deriving step is the aberration condition regarding the propagation of light from the pixel j to the light collection point s. Finding a phase Φ j-OPD that gives a difference in optical path length during the propagation, and the step of designing the modulation pattern is based on a transformation To extract the aforementioned propagation function that takes into account the aforementioned aberration conditions. . 如申請專利範圍第1項或第2項所記載之光調變控 制方法,其中,前述調變圖案設計步驟,係將對於前述空間光調變器之前述像素j的前述雷射光之射入振幅設為Aj-in,並將相位設為,且將前述像素j處之相位值設為,而藉由下述數式 來求取出代表在前述集光點s處之前述集光狀態的複變振幅UsThe optical modulation control method according to the first or second aspect of the invention, wherein the modulation pattern designing step is an input amplitude of the laser light to the pixel j of the spatial light modulator. Set to A j-in and set the phase to And setting the phase value at the aforementioned pixel j to With the following formula The complex amplitude U s representing the aforementioned light collecting state at the aforementioned light collecting point s is extracted. 如申請專利範圍第1項或第2項所記載之光調變控制方法,其中,前述調變圖案設計步驟,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據基於代表在前述集光點s處之前述集光狀態的複變振幅之相位、和對於前述像差條件作了考慮之前述傳播函數、以及在前述像素j處之變更前的相位值,所解析性求取出之值,來對於前述相位值作變更。 The optical modulation control method according to the first or second aspect of the invention, wherein the modulation pattern designing step is based on the change of the phase value at the pixel j of the modulation pattern, based on Representing the phase of the complex amplitude of the aforementioned concentrating state at the aforementioned concentrating point s And the aforementioned propagation function that takes into account the aforementioned aberration conditions And the phase value before the change at the aforementioned pixel j The value obtained by the resolution is obtained, and the phase value is changed. 如申請專利範圍第3項所記載之光調變控制方法,其中,前述調變圖案設計步驟,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據基於代表在前述集光點s處之前述集光狀態的複變振幅之相位、和對於前述像差條件作了考慮之前述傳播函數、以及在前述像素j處之變更前的相位值,所解析性求取出之值,來對 於前述相位值作變更。 The optical modulation control method according to the third aspect of the invention, wherein the modulation pattern designing step is based on the representative of the change in the phase value at the pixel j of the modulation pattern The phase of the complex amplitude of the aforementioned concentrating state at the spot s And the aforementioned propagation function that takes into account the aforementioned aberration conditions And the phase value before the change at the aforementioned pixel j The value obtained by the resolution is obtained, and the phase value is changed. 如申請專利範圍第1項或第2項所記載之光調變控制方法,其中,前述調變圖案設計步驟,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據使用登山演算法、模擬降溫演算法或者是基因演算法中的其中一種方法所探索求取出之值,來對於前述相位值作變更。 The optical modulation control method according to the first or second aspect of the invention, wherein the modulation pattern designing step is based on the change of the phase value in the pixel j of the modulation pattern. The value of the mountaineering algorithm, the simulated cooling algorithm, or the gene algorithm is sought to be changed, and the phase value is changed. 如申請專利範圍第3項所記載之光調變控制方法,其中,前述調變圖案設計步驟,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據使用登山演算法、模擬降溫演算法或者是基因演算法中的其中一種方法所探索求取出之值,來對於前述相位值作變更。 The optical modulation control method according to the third aspect of the invention, wherein the modulation pattern designing step is based on using a mountaineering algorithm in the change of the phase value in the pixel j of the modulation pattern. The value of the phase value is changed by the value of the simulated cooling algorithm or one of the gene algorithms. 如申請專利範圍第1項或第2項所記載之光調變控制方法,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control method according to the first or second aspect of the invention, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is It is an atmosphere medium existing between the spatial light modulator and the object to be irradiated. 如申請專利範圍第3項所記載之光調變控制方法,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control method according to the third aspect of the invention, wherein the second propagation medium is an irradiation target in which the collection point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第4項所記載之光調變控制方法,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control method according to the fourth aspect of the invention, wherein the second propagation medium is an irradiation target in which the collection point is set, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第5項所記載之光調變控制方 法,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control party as described in item 5 of the patent application scope In the above method, the second propagation medium is an irradiation target in which the light collecting point is set inside, and the first propagation medium is present between the spatial light modulator and the irradiation target. Ambient media. 如申請專利範圍第6項所記載之光調變控制方法,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control method according to claim 6, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第7項所記載之光調變控制方法,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control method according to the seventh aspect of the invention, wherein the second propagation medium is an irradiation target in which the collection point is set, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 一種光調變控制程式,係為使電腦實行光調變控制之程式,該光調變控制,係使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在前述空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的前述雷射光之集光照射,該光調變控制程式,其特徵為,係使電腦實行:照射條件取得處理,係作為前述雷射光之照射條件,而取得對於前述空間光調變器之前述雷射光的射入圖案、和位在從前述空間光調變器所對於前述集光點之前述雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於前述第1傳播媒質而更靠前述集光點側處之第2傳播媒質的與前述第1折射率相異之第2折射率n2;和 集光條件設定處理,係作為前述雷射光之集光條件,而對於將從前述空間光調變器而來之前述雷射光作集光照射的前述集光點之個數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和像差條件導出處理,係將在從前述空間光調變器所對於前述集光點s之前述雷射光的傳播中,由折射率互為相異之前述第1傳播媒質以及前述第2傳播媒質所產生的像差條件作導出;和調變圖案設計處理,係對於藉由前述像差條件導出處理所導出之前述像差條件作考慮,而對於在前述空間光調變器中所呈現之前述調變圖案作設計,前述調變圖案設計處理,係想定為在前述空間光調變器中而被作了2維配列之複數的像素,並對於在前述複數之像素中所呈現的前述調變圖案之於1個像素處的相位值之變更所對於在前述集光點處之前述雷射光的集光狀態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於前述相位值作變更,再將此種相位值之變更操作,針對前述調變圖案之全部的像素而進行之,藉由此來設計前述調變圖案,並且,在對於前述集光點處之前述集光狀態進行評價時,係針對從前述空間光調變器之前述調變圖案中的像素j起所對於前述集光點s之光的傳播,而使用在傳播媒質為均質的狀態下之自由傳播的波動傳播函數中加上了 前述像差條件所變換的傳播函數A light modulation control program is a program for causing a computer to perform a light modulation control, which is a laser light output that uses input laser light and modulates the phase of the laser light and then modulates the phase. a phase modulation type spatial light modulator for controlling the collected light of the aforementioned laser light for the set concentrating spot according to the modulation pattern presented in the spatial light modulator, the light modulation The control program is characterized in that the computer performs an irradiation condition acquisition process, and obtains an incident pattern of the laser light for the spatial light modulator and a position from the space as the irradiation condition of the laser light. The first refractive index n 1 of the first propagation medium on the propagation path of the laser light at the light collecting point, and the position of the light modulation device on the light collecting point side of the first propagation medium a second refractive index n 2 different from the first refractive index of the second propagation medium; and a concentrating condition setting process as a light collecting condition of the laser light, and a spatial light modulator from the space And the aforementioned Emitting light for irradiating light collecting the number of the light collecting point of s T, and individual light collecting position with respect to s T a light collection point s, the set light intensity as a set, wherein, s T based is an integer of 1; And the aberration condition derivation processing is performed by the first propagation medium having the refractive indices different from each other and the second propagation from the propagation of the laser light to the light collection point s by the spatial light modulator The aberration condition generated by the medium is derived; and the modulation pattern design process is considered for the aberration condition derived by the aberration condition derivation processing described above, and is presented in the spatial light modulator described above. The modulation pattern design is as described above, and the modulation pattern design process is determined to be a plurality of pixels that are two-dimensionally arranged in the spatial light modulator, and the aforementioned modulation is presented in the plurality of pixels. The change of the phase value at the one pixel of the variable pattern pays attention to the influence of the light collecting state of the laser light at the light collecting point, so that the light collecting state becomes close to the desired state. Way and right The phase value is changed, and the phase value change operation is performed on all the pixels of the modulation pattern, thereby designing the modulation pattern, and at the aforementioned light collecting point In the evaluation of the light collecting state, the propagation of light to the light collecting point s from the pixel j in the modulation pattern of the spatial light modulator is used, and the use of the medium in a state in which the propagation medium is homogeneous is used. Propagating wave propagation function The propagation function transformed by the aforementioned aberration condition is added . 如申請專利範圍第14項所記載之光調變控制程式,其中,前述像差條件導出處理,係作為關於從前述像素j所對於前述集光點s之光的傳播之前述像差條件,而求取出賦予在該傳播中之光路長度差的相位Φj-OPD,前述調變圖案設計處理,係根據變換式 來求取出對於前述像差條件作了考慮的前述傳播函數The optical modulation control program according to claim 14, wherein the aberration condition deriving process is the aberration condition regarding the propagation of light from the pixel j to the concentrating point s. Obtaining a phase Φ j-OPD that gives a difference in optical path length during the propagation, and the modulation pattern design process is based on the transformation To extract the aforementioned propagation function that takes into account the aforementioned aberration conditions. . 如申請專利範圍第14項或第15項所記載之光調變控制程式,其中,前述調變圖案設計處理,係將對於前述空間光調變器之前述像素j的前述雷射光之射入振幅設為Aj-in,並將相位設為,且將前述像素j處之相位值設為,而藉由下述數式 來求取出代表在前述集光點s處之前述集光狀態的複變振幅UsThe optical modulation control program according to claim 14 or 15, wherein the modulation pattern design process is an input amplitude of the laser light to the pixel j of the spatial light modulator. Set to A j-in and set the phase to And setting the phase value at the aforementioned pixel j to With the following formula The complex amplitude U s representing the aforementioned light collecting state at the aforementioned light collecting point s is extracted. 如申請專利範圍第14項或第15項所記載之光調 變控制程式,其中,前述調變圖案設計處理,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據基於代表在前述集光點s處之前述集光狀態的複變振幅之相位、和對於前述像差條件作了考慮之前述傳播函數、以及在前述像素j處之變更前的相位值,所解析性求取出之值,來對於前述相位值作變更。 The optical modulation control program according to claim 14 or 15, wherein the modulation pattern designing process is based on the change of the phase value at the pixel j of the modulation pattern, based on Representing the phase of the complex amplitude of the aforementioned concentrating state at the aforementioned concentrating point s And the aforementioned propagation function that takes into account the aforementioned aberration conditions And the phase value before the change at the aforementioned pixel j The value obtained by the resolution is obtained, and the phase value is changed. 如申請專利範圍第16項所記載之光調變控制程式,其中,前述調變圖案設計處理,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據基於代表在前述集光點s處之前述集光狀態的複變振幅之相位、和對於前述像差條件作了考慮之前述傳播函數、以及在前述像素j處之變更前的相位值,所解析性求取出之值,來對於前述相位值作變更。 The optical modulation control program according to claim 16, wherein the modulation pattern designing process is based on the representation of the phase value in the pixel j of the modulation pattern. The phase of the complex amplitude of the aforementioned concentrating state at the spot s And the aforementioned propagation function that takes into account the aforementioned aberration conditions And the phase value before the change at the aforementioned pixel j The value obtained by the resolution is obtained, and the phase value is changed. 如申請專利範圍第14項或第15項所記載之光調變控制程式,其中,前述調變圖案設計處理,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據使用登山演算法、模擬降溫演算法或者是基因演算法中的其中一種方法所探索求取出之值,來對於前述相位值作變更。 The optical modulation control program according to claim 14 or 15, wherein the modulation pattern design process is based on the change of the phase value at the pixel j of the modulation pattern. The value of the mountaineering algorithm, the simulated cooling algorithm, or the gene algorithm is sought to be changed, and the phase value is changed. 如申請專利範圍第16項所記載之光調變控制程式,其中,前述調變圖案設計處理,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據使用登山演算法、模擬降溫演算法或者是基因演算法中的其中一種方法所探索求取出之值,來對於前述相位值作變更。 The optical modulation control program according to claim 16, wherein the modulation pattern designing process is based on using a mountaineering algorithm in the change of the phase value in the pixel j of the modulation pattern. The value of the phase value is changed by the value of the simulated cooling algorithm or one of the gene algorithms. 如申請專利範圍第14項或第15項所記載之光調變控制程式,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control program according to claim 14 or 15, wherein the second propagation medium is an irradiation target in which the light collecting point is set inside, and the first propagation medium is It is an atmosphere medium existing between the spatial light modulator and the object to be irradiated. 如申請專利範圍第16項所記載之光調變控制程式,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control program according to claim 16, wherein the second propagation medium is an irradiation target in which the light collecting point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第17項所記載之光調變控制程式,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control program according to claim 17, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第18項所記載之光調變控制程式,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control program according to claim 18, wherein the second propagation medium is an irradiation target in which the light collecting point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第19項所記載之光調變控制程式,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control program according to claim 19, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第20項所記載之光調變控制程式,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前 述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control program according to claim 20, wherein the second propagation medium is an irradiation target in which the collection point is set inside, and the first propagation medium is present in the first propagation medium. before An ambient medium between the spatial light modulator and the object to be irradiated is described. 一種光調變控制裝置,係為使用輸入雷射光並將前述雷射光之相位作調變再將相位調變後之雷射光輸出的相位調變型之空間光調變器,來根據在前述空間光調變器中所呈現之調變圖案,而控制對於所設定之集光點的前述雷射光之集光照射之光調變控制裝置,其特徵為,具備有:照射條件取得手段,係作為前述雷射光之照射條件,而取得對於前述空間光調變器之前述雷射光的射入圖案、和位在從前述空間光調變器所對於前述集光點之前述雷射光的傳播路徑上之第1傳播媒質的第1折射率n1、以及位在相較於前述第1傳播媒體質而更靠前述集光點側處之第2傳播媒質的與前述第1折射率相異之第2折射率n2;和集光條件設定手段,係作為前述雷射光之集光條件,而對於將從前述空間光調變器而來之前述雷射光作集光照射的前述集光點之個數st、以及關於st個的集光點s之個別的集光位置、集光強度作設定,其中,st係為1以上之整數;和像差條件導出手段,係將在從前述空間光調變器所對於前述集光點s之前述雷射光的傳播中,由折射率互為相異之前述第1傳播媒質以及前述第2傳播媒質所產生的像差條件作導出;和調變圖案設計手段,係對於藉由前述像差條件導出手段所導出之前述像差條件作考慮,而對於在前述空間光調 變器中所呈現之前述調變圖案作設計,前述調變圖案設計手段,係想定為在前述空間光調變器中而被作了2維配列之複數的像素,並對於在前述複數之像素中所呈現的前述調變圖案之於1個像素處的相位值之變更所對於在前述集光點處之前述雷射光的集光狀態所造成之影響作注目,來以使該集光狀態成為接近於所期望之狀態的方式而對於前述相位值作變更,再將此種相位值之變更操作,針對前述調變圖案之全部的像素而進行之,藉由此來設計前述調變圖案,並且,在對於前述集光點處之前述集光狀態進行評價時,係針對從前述空間光調變器之前述調變圖案中的像素j起所對於前述集光點s之光的傳播,而使用在傳播媒質為均質的狀態下之自由傳播的波動傳播函數中加上了前述像差條件所變換的傳播函數A light modulation control device is a phase modulation type spatial light modulator that uses input laser light and modulates the phase of the laser light and then modulates the phase of the laser light, according to the spatial light in the foregoing The optical modulation control device for controlling the collected light of the laser light at the set concentrating point, and the irradiation condition obtaining means is provided as the aforementioned An irradiation pattern of the laser light, and an incident pattern of the laser light for the spatial light modulator and a propagation path of the laser light from the spatial light modulator to the light collecting point a first refractive index n 1 of the propagation medium and a second refractive index different from the first refractive index of the second propagation medium at the side of the light collecting point compared to the first propagation medium a rate n 2 ; and a concentrating condition setting means for the number of the above-mentioned light collecting points for concentrating the laser light from the spatial light modulator as the light collecting condition of the laser light t, and on a s t Individual light collecting position of the light collecting point s, as the light-intensity setting, wherein, T s is an integer of 1 line; and the aberration condition derivation means, from the Department of the spatial light modulator is set for the light In the propagation of the laser light of the point s, the aberration conditions generated by the first propagation medium and the second propagation medium having mutually different refractive indices are derived; and the modulation pattern design means is Considering the aforementioned aberration conditions derived by the aberration condition deriving means, and designing the modulation pattern presented in the spatial light modulator, the modulation pattern design means is determined to be in the aforementioned spatial light tone. a plurality of pixels arranged in two dimensions in the transformer, and a change in the phase value at the one pixel of the modulation pattern presented in the plurality of pixels is for the aforementioned light collecting point The influence of the light collecting state of the laser light is focused on, and the phase value is changed so that the light collecting state is close to the desired state, and the phase value is changed. The modulation pattern is designed by using all the pixels of the modulation pattern, and the evaluation of the light collection state at the light collection point is performed for the spatial light modulator from the space light modulator. The pixel j in the aforementioned modulation pattern functions as a propagation of light for the aforementioned light collecting point s, and uses a wave propagation function of free propagation in a state in which the propagation medium is homogeneous. The propagation function transformed by the aforementioned aberration condition is added . 如申請專利範圍第27項所記載之光調變控制裝置,其中,前述像差條件導出手段,係作為關於從前述像素j所對於前述集光點s之光的傳播之前述像差條件,而求取出賦予在該傳播中之光路長度差的相位Φj-OPD,前述調變圖案設計手段,係根據變換式 來求取出對於前述像差條件作了考慮的前述傳播函數The optical modulation control device according to claim 27, wherein the aberration condition deriving means is the aberration condition regarding the propagation of light from the pixel j to the light collecting point s. Obtaining a phase Φ j-OPD that gives a difference in optical path length during the propagation, and the modulation pattern design means is based on a transformation To extract the aforementioned propagation function that takes into account the aforementioned aberration conditions. . 如申請專利範圍第27項或第28項所記載之光調變控制裝置,其中,前述調變圖案設計手段,係將對於前述空間光調變器之前述像素j的前述雷射光之射入振幅設為Aj-in,並將相位設為,且將前述像素j處之相位值設為,而藉由下述數式 來求取出代表在前述集光點s處之前述集光狀態的複變振幅UsThe optical modulation control device according to claim 27, wherein the modulation pattern designing means is an input amplitude of the laser light to the pixel j of the spatial light modulator. Set to A j-in and set the phase to And setting the phase value at the aforementioned pixel j to With the following formula The complex amplitude U s representing the aforementioned light collecting state at the aforementioned light collecting point s is extracted. 如申請專利範圍第27項或第28項所記載之光調變控制裝置,其中,前述調變圖案設計手段,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據基於代表在前述集光點s處之前述集光狀態的複變振幅之相位、和對於前述像差條件作了考慮之前述傳播函數、以及在前述像素j處之變更前的相位值,所解析性求取出之值,來對於前述相位值作變更。 The optical modulation control device according to claim 27, wherein the modulation pattern design means is based on the change of the phase value at the pixel j of the modulation pattern, based on Representing the phase of the complex amplitude of the aforementioned concentrating state at the aforementioned concentrating point s And the aforementioned propagation function that takes into account the aforementioned aberration conditions And the phase value before the change at the aforementioned pixel j The value obtained by the resolution is obtained, and the phase value is changed. 如申請專利範圍第29項所記載之光調變控制裝置,其中,前述調變圖案設計手段,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據基於代表在前述集光點s處之前述集光狀態的複變振幅之相位、和對於前述像差條件作了考慮之前述傳播函數、以及在前 述像素j處之變更前的相位值,所解析性求取出之值,來對於前述相位值作變更。 The optical modulation control device according to claim 29, wherein the modulation pattern designing means is based on the representative of the change in the phase value of the pixel j of the modulation pattern The phase of the complex amplitude of the aforementioned concentrating state at the spot s And the aforementioned propagation function that takes into account the aforementioned aberration conditions And the phase value before the change at the aforementioned pixel j The value obtained by the resolution is obtained, and the phase value is changed. 如申請專利範圍第27項或第28項所記載之光調變控制裝置,其中,前述調變圖案設計手段,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據使用登山演算法、模擬降溫演算法或者是基因演算法中的其中一種方法所探索求取出之值,來對於前述相位值作變更。 The optical modulation control device according to claim 27, wherein the modulation pattern designing means is based on the change of the phase value in the pixel j of the modulation pattern. The value of the mountaineering algorithm, the simulated cooling algorithm, or the gene algorithm is sought to be changed, and the phase value is changed. 如申請專利範圍第29項所記載之光調變控制裝置,其中,前述調變圖案設計手段,係在前述調變圖案之前述像素j處的前述相位值之變更中,根據使用登山演算法、模擬降溫演算法或者是基因演算法中的其中一種方法所探索求取出之值,來對於前述相位值作變更。 The optical modulation control device according to claim 29, wherein the modulation pattern designing means is based on using a mountaineering algorithm in the change of the phase value in the pixel j of the modulation pattern. The value of the phase value is changed by the value of the simulated cooling algorithm or one of the gene algorithms. 如申請專利範圍第27項或第28項所記載之光調變控制裝置,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control device according to claim 27, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is It is an atmosphere medium existing between the spatial light modulator and the object to be irradiated. 如申請專利範圍第29項所記載之光調變控制裝置,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control device according to claim 29, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第30項所記載之光調變控制裝置,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前 述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control device according to claim 30, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is present in the first propagation medium. before An ambient medium between the spatial light modulator and the object to be irradiated is described. 如申請專利範圍第31項所記載之光調變控制裝置,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control device according to claim 31, wherein the second propagation medium is an irradiation target in which the light collecting point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第32項所記載之光調變控制裝置,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control device according to claim 32, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第33項所記載之光調變控制裝置,其中,前述第2傳播媒質,係為於內部被設定有前述集光點之照射對象物,前述第1傳播媒質,係為存在於前述空間光調變器和前述照射對象物之間的氛圍媒質。 The optical modulation control device according to claim 33, wherein the second propagation medium is an irradiation target in which the light collection point is set inside, and the first propagation medium is present in the first propagation medium. An atmosphere medium between the spatial light modulator and the object to be irradiated. 如申請專利範圍第27項或第28項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 27, wherein the optical modulation control device is provided with driving control means for the spatial light modulator, and The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the spatial light modulator. 如申請專利範圍第29項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 29, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 如申請專利範圍第30項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於 前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 30, wherein the optical modulator control means is provided The spatial light modulator is driven and controlled, and the aforementioned modulation pattern designed by the modulation pattern design means is presented in the spatial light modulator. 如申請專利範圍第31項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 31, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 如申請專利範圍第32項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 32, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 如申請專利範圍第33項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 33, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 如申請專利範圍第34項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 34, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 如申請專利範圍第35項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 35, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 如申請專利範圍第36項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於 前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 36, wherein the optical modulator control means is provided The spatial light modulator is driven and controlled, and the aforementioned modulation pattern designed by the modulation pattern design means is presented in the spatial light modulator. 如申請專利範圍第37項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 37, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 如申請專利範圍第38項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 38, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 如申請專利範圍第39項所記載之光調變控制裝置,其中,係具備有:光調變器驅動控制手段,其係對於前述空間光調變器作驅動控制,並在前述空間光調變器中呈現藉由前述調變圖案設計手段所設計之前述調變圖案。 The optical modulation control device according to claim 39, further comprising: an optical modulator driving control means for driving control of the spatial light modulator and modulating the spatial light in the space The aforementioned modulation pattern designed by the aforementioned modulation pattern design means is presented in the device. 一種雷射光照射裝置,其特徵為,具備有:雷射光源,係供給雷射光;和相位調變型之空間光調變器,係輸入前述雷射光,並將前述雷射光之相位作調變,再將相位調變後之雷射光作輸出;和如申請專利範圍第27~51項中之任一項所記載之光調變控制裝置,係根據在前述空間光調變器中所呈現之調變圖案,來控制對於所設定的集光點之前述雷射光的集光照射。 A laser light irradiation device comprising: a laser light source for supplying laser light; and a phase modulation type spatial light modulator for inputting the laser light and modulating a phase of the laser light, And the optical modulation control device according to any one of claims 27 to 51, which is based on the tone presented in the spatial light modulator described above. The pattern is changed to control the collected illumination of the aforementioned laser light for the set concentrating spot.
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