TWI604073B - Mask structure capable of calibrating an image capturing module and adapted for a evaporation process of an organic light-emitting diode - Google Patents

Mask structure capable of calibrating an image capturing module and adapted for a evaporation process of an organic light-emitting diode Download PDF

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TWI604073B
TWI604073B TW105125224A TW105125224A TWI604073B TW I604073 B TWI604073 B TW I604073B TW 105125224 A TW105125224 A TW 105125224A TW 105125224 A TW105125224 A TW 105125224A TW I604073 B TWI604073 B TW I604073B
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auxiliary
symbol
center
mark
major
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TW105125224A
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TW201805452A (en
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陳文山
張致盛
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盟立自動化股份有限公司
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Priority to CN201610704928.7A priority patent/CN107699850A/en
Priority to CN201620916617.2U priority patent/CN206127396U/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Description

適用於有機發光二極體蒸鍍製程並可用以校正影像擷取 模組之定位精度之光罩結構 Suitable for organic light emitting diode evaporation process and can be used to correct image capture Photomask structure for positioning accuracy of module

本發明關於一種光罩結構,尤指一種適用於有機發光二極體製程並可用以校正影像擷取模組之定位精度之光罩結構。The present invention relates to a reticle structure, and more particularly to a reticle structure suitable for use in an organic light-emitting diode process and for correcting the positioning accuracy of an image capturing module.

於有機發光二極體的蒸鍍製程中,主要係將具有開口的光罩設置於基板前方,以使汽化後的發光分子通過光罩上的開口附著於基板上,為使發光分子能夠準確地附著於基板上,光罩與基板間的對位精度需要達到1微米(μm)。當欲使用影像擷取模組進行光罩與基板間之對位時,由於影像擷取模組與蒸鍍機台間具有組裝誤差(即影像擷取模組之各影像擷取裝置的設置位置以及方位並不對稱),使得光罩與基板間的對位精度無法達到要求,進而造成產品良率降低,製造成本攀升。In the vapor deposition process of the organic light-emitting diode, a mask having an opening is mainly disposed in front of the substrate, so that the vaporized molecules after vaporization are attached to the substrate through the opening in the mask, so that the light-emitting molecules can be accurately Attached to the substrate, the alignment accuracy between the mask and the substrate needs to be 1 micrometer (μm). When the image capturing module is used to perform the alignment between the mask and the substrate, there is an assembly error between the image capturing module and the vapor deposition machine (that is, the setting positions of the image capturing devices of the image capturing module) As well as the azimuth and asymmetry, the alignment accuracy between the reticle and the substrate cannot be achieved, which leads to a decrease in the yield of the product and an increase in the manufacturing cost.

因此,本發明之目的在於提供一種適用於有機發光二極體蒸鍍製程並可用以校正一影像擷取模組之定位精度之光罩結構,以解決上述問題。Accordingly, it is an object of the present invention to provide a reticle structure suitable for use in an organic light emitting diode evaporation process and for correcting the positioning accuracy of an image capture module to solve the above problems.

為達到上述目的,本發明揭露一種光罩結構,包含有一光罩本體、一第一對位記號組、一第二對位記號組、一第三對位記號組以及一第四對位記號組,該第一對位記號組對應一影像擷取模組之一第一影像擷取裝置且包含一第一主要記號以及一第一輔助記號,該第一主要記號設置於該光罩本體上,該第一輔助記號設置於該光罩本體上並鄰近該第一主要記號,該第二對位記號組包含一第二主要記號,該第二主要記號設置於該光罩本體上,該第三對位記號組包含一第三主要記號,該第三主要記號設置於該光罩本體上,該第四對位記號組包含一第四主要記號,該第四主要記號設置於該光罩本體上,該第一主要記號與該第二主要記號間定義一第一側邊,該第二主要記號與該第三主要記號間定義一第二側邊,該第三主要記號與該第四主要記號間定義一第三側邊,該第四主要記號與該第一主要記號間定義一第四側邊,該第一輔助記號與該第一主要記號間定義一第一輔助線,該第一輔助線與該第四側邊間形成一第一角度,該第一輔助線的長度的公差小於一長度精度值,該第一角度的公差小於一角度精度值。 To achieve the above objective, the present invention discloses a reticle structure including a reticle body, a first alignment mark group, a second alignment mark group, a third alignment mark group, and a fourth alignment mark group. The first alignment mark group corresponds to a first image capturing device of an image capturing module and includes a first main symbol and a first auxiliary symbol. The first main symbol is disposed on the mask body. The first auxiliary mark is disposed on the reticle body and adjacent to the first main mark, the second align mark group includes a second main mark, and the second main mark is disposed on the reticle body, the third The align mark group includes a third main mark, the third main mark is disposed on the reticle body, the fourth align mark group includes a fourth main mark, and the fourth main mark is disposed on the reticle body a first side is defined between the first major symbol and the second major token, and a second side is defined between the second major token and the third major token, the third major token and the fourth major token Define a third side A fourth side is defined between the fourth main symbol and the first main symbol, and a first auxiliary line is defined between the first auxiliary symbol and the first main symbol, and the first auxiliary line and the fourth side are Forming a first angle, the tolerance of the length of the first auxiliary line is less than a length precision value, and the tolerance of the first angle is less than an angular precision value.

根據本發明其中之一實施例,該第一主要記號與該第一輔助記號分別為兩圓形記號,該第一主要記號具有一第一主要圓心以及一第一主要直徑,該第一輔助記號具有一第一輔助圓心以及一第一輔助直徑,該第一輔助線係由該第一主要圓心與該第一輔助圓心所定義該第一主要直徑的長度的公差與該第一輔助直徑的長度的公差均小於該長度精度值。 According to one embodiment of the present invention, the first main symbol and the first auxiliary symbol are respectively two circular symbols, the first main symbol has a first main center and a first main diameter, and the first auxiliary mark Having a first auxiliary center and a first auxiliary diameter, the first auxiliary line defining a tolerance of a length of the first main diameter and a length of the first auxiliary diameter defined by the first main center and the first auxiliary center The tolerances are all less than the length accuracy value.

根據本發明其中之一實施例,該第一主要記號為一圓形記號,該第一輔助記號為一正方形記號,該第一主要記號具有一第一主要圓心以及一第一 主要直徑,該第一輔助記號具有一第一輔助中心以及一第一輔助邊長,該第一輔助線係由該第一主要圓心與該第一輔助中心所定義,該第一主要直徑的長度的公差與該第一輔助邊長的長度的公差均小於該長度精度值。 According to one embodiment of the present invention, the first major symbol is a circular symbol, the first auxiliary symbol is a square symbol, and the first major symbol has a first main center and a first a main diameter, the first auxiliary mark has a first auxiliary center and a first auxiliary side length, the first auxiliary line is defined by the first main center and the first auxiliary center, the length of the first main diameter The tolerance of the tolerance of the first auxiliary side length is less than the length precision value.

根據本發明其中之一實施例,該第二對位記號組對應該影像擷取模組之一第二影像擷取模組且另包含有一第二輔助記號,該第二輔助記號設置於該光罩本體上並鄰近該第二主要記號,該第二輔助記號與該第二主要記號間定義一第二輔助線,該第二輔助線與該第二側邊間形成一第二角度,該第二輔助線的長度的公差小於該長度精度值,該第二角度的公差小於該角度精度值。 According to one embodiment of the present invention, the second alignment mark group corresponds to a second image capturing module of the image capturing module and further includes a second auxiliary symbol, wherein the second auxiliary symbol is disposed on the light a second auxiliary line is defined on the cover body and adjacent to the second main mark, and a second auxiliary line is defined between the second auxiliary mark and the second main mark, and the second auxiliary line forms a second angle with the second side. The tolerance of the length of the second auxiliary line is less than the length precision value, and the tolerance of the second angle is smaller than the angle precision value.

根據本發明其中之一實施例,該第二主要記號與該第二輔助記號分別為兩圓形記號,該第二主要記號具有一第二主要圓心以及一第二主要直徑,該第二輔助記號具有一第二輔助圓心以及一第二輔助直徑,該第二輔助線係由該第二主要圓心與該第二輔助圓心所定義,該第二主要直徑的長度的公差與該第二輔助直徑的長度的公差均小於該長度精度值。 According to one embodiment of the present invention, the second main symbol and the second auxiliary symbol are respectively two circular symbols, the second main symbol has a second main center and a second main diameter, and the second auxiliary mark Having a second auxiliary center defined by the second major center and the second auxiliary center, the tolerance of the length of the second major diameter and the second auxiliary diameter The tolerance of the length is less than the length accuracy value.

根據本發明其中之一實施例,該第二主要記號為一圓形記號,該第二輔助記號為一正方形記號,該第二主要記號具有一第二主要圓心以及一第二主要直徑,該第二輔助記號具有一第二輔助中心以及一第二輔助邊長,該第二輔助線係由該第二主要圓心與該第二輔助中心所定義,該第二主要直徑的長度的公差與該第二輔助邊長的長度的公差均小於該長度精度值。 According to one embodiment of the present invention, the second major symbol is a circular symbol, the second auxiliary symbol is a square symbol, and the second major symbol has a second major center and a second major diameter. The second auxiliary mark has a second auxiliary center defined by the second main center and the second auxiliary center, and the second auxiliary center is defined by the second main center and the second auxiliary center. The tolerance of the length of the two auxiliary side lengths is less than the length precision value.

根據本發明其中之一實施例,該第三對位記號組對應該影像擷取模組之一第三影像擷取模組且另包含有一第三輔助記號,該第二輔助記號設置於 該光罩本體上並鄰近該第三主要記號,該第三輔助記號與該第三主要記號間定義一第三輔助線,該第三輔助線與該第二側邊間形成一第三角度,該第三輔助線的長度的公差小於該長度精度值,該第三角度的公差小於該角度精度值。 According to one embodiment of the present invention, the third alignment mark group corresponds to one of the third image capturing modules of the image capturing module and further includes a third auxiliary symbol, and the second auxiliary symbol is set to A third auxiliary line is defined on the reticle body and adjacent to the third main mark, and a third auxiliary line is defined between the third auxiliary mark and the third main mark, and the third auxiliary line forms a third angle with the second side. The tolerance of the length of the third auxiliary line is less than the length accuracy value, and the tolerance of the third angle is less than the angular precision value.

根據本發明其中之一實施例,該第三主要記號與該第三輔助記號分別為兩圓形記號,該第三主要記號具有一第三主要圓心以及一第三主要直徑,該第三輔助記號具有一第三輔助圓心以及一第三輔助直徑,該第三輔助線係由該第三主要圓心與該第三輔助圓心所定義,該第三主要直徑的長度的公差與該第三輔助直徑的長度的公差均小於該長度精度值。 According to one embodiment of the present invention, the third main symbol and the third auxiliary symbol are respectively two circular marks, the third main mark has a third main center and a third main diameter, and the third auxiliary mark Having a third auxiliary center defined by the third main center and the third auxiliary center, the third main center and the third auxiliary center are defined by a tolerance of a length of the third main diameter and the third auxiliary diameter The tolerance of the length is less than the length accuracy value.

根據本發明其中之一實施例,該第三主要記號為一圓形記號,該第三輔助記號為一正方形記號,該第三主要記號具有一第三主要圓心以及一第三主要直徑,該第三輔助記號具有一第三輔助中心以及一第三輔助邊長,該第三輔助線係由該第三主要圓心與該第三輔助中心所定義,該第三主要直徑的長度的公差與該第三輔助邊長的長度的公差均小於該長度精度值。 According to one embodiment of the present invention, the third main symbol is a circular mark, the third auxiliary mark is a square mark, the third main mark has a third main center and a third main diameter, the first The third auxiliary mark has a third auxiliary center defined by the third main center and the third auxiliary center, and a third auxiliary line defined by the third main center and the third auxiliary diameter The tolerance of the length of the three auxiliary side lengths is less than the length precision value.

根據本發明其中之一實施例,該第四對位記號組對應該影像擷取模組之一第四影像擷取模組且另包含有一第四輔助記號,該第四輔助記號設置於該光罩本體上並鄰近該第四主要記號,該第四輔助記號與該第四主要記號間定義一第四輔助線,該第四輔助線與該第四側邊間形成一第四角度,該第四輔助線的長度的公差小於該長度精度值,該第四角度的公差小於該角度精度值。 According to one embodiment of the present invention, the fourth alignment mark group corresponds to a fourth image capturing module of the image capturing module and further includes a fourth auxiliary symbol, wherein the fourth auxiliary symbol is disposed on the light. a fourth auxiliary line is defined on the cover body and adjacent to the fourth main mark, and a fourth auxiliary line is defined between the fourth auxiliary mark and the fourth main mark, and the fourth auxiliary line forms a fourth angle with the fourth side. The tolerance of the length of the four auxiliary lines is less than the length precision value, and the tolerance of the fourth angle is smaller than the angle precision value.

根據本發明其中之一實施例,該第四主要記號與該第四輔助記號分別為兩圓形記號,該第四主要記號具有一第四主要圓心以及一第四主要直徑, 該第四輔助記號具有一第四輔助圓心以及一第四輔助直徑,該第四輔助線係由該第四主要圓心與該第四輔助圓心所定義,該第四主要直徑的長度的公差與該第四輔助直徑的長度的公差均小於該長度精度值。 According to one embodiment of the present invention, the fourth main symbol and the fourth auxiliary symbol are respectively two circular symbols, and the fourth main symbol has a fourth main center and a fourth main diameter. The fourth auxiliary mark has a fourth auxiliary center defined by the fourth main center and the fourth auxiliary center, and a fourth auxiliary center defined by a length of the fourth main diameter and the fourth auxiliary diameter The tolerance of the length of the fourth auxiliary diameter is less than the length accuracy value.

根據本發明其中之一實施例,該第四主要記號為一圓形記號,該第四輔助記號為一正方形記號,該第四主要記號具有一第四主要圓心以及一第四主要直徑,該第四輔助記號具有一第四輔助中心以及一第四輔助邊長,該第四輔助線係由該第四主要圓心與該第四輔助中心所定義,該第四主要直徑的長度的公差與該第四輔助邊長的長度的公差均小於該長度精度值。 According to one embodiment of the present invention, the fourth major symbol is a circular symbol, the fourth auxiliary symbol is a square symbol, the fourth major symbol has a fourth major center and a fourth major diameter, the first The fourth auxiliary mark has a fourth auxiliary center defined by the fourth main center and the fourth auxiliary center, and a fourth auxiliary center defined by the fourth main center and the fourth auxiliary diameter The tolerance of the length of the four auxiliary side lengths is less than the length precision value.

根據本發明其中之一實施例,該第一主要記號、該第二主要記號、該第三主要記號、該第四主要記號、第一輔助記號、該第二輔助記號、該第三輔助記號與該第四輔助記號分別以蝕刻之方式形成於該光罩本體上。 According to one embodiment of the present invention, the first major token, the second major token, the third major token, the fourth major token, the first auxiliary token, the second auxiliary token, the third auxiliary token and The fourth auxiliary mark is formed on the reticle body by etching.

根據本發明其中之一實施例,該第一角度、該第二角度、該第三角度與該第四角度均實質上呈90度。 According to an embodiment of the invention, the first angle, the second angle, the third angle and the fourth angle are both substantially 90 degrees.

綜上所述,本發明之光罩結構利用該第一輔助記號、該第二輔助記號、該第三輔助記號與該第四輔助記號來判斷該第一影像擷取裝置、該第二影像擷取裝置、該第三影像擷取裝置與該第四影像擷取裝置相對於該光罩結構之位置以及角度,以快速地且精準地校正該第一影像擷取裝置、該第二影像擷取裝置、該第三影像擷取裝置與該第四影像擷取裝置,進而提升利用該第一影像擷取裝置、該第二影像擷取裝置、該第三影像擷取裝置與該第四影像擷取裝置來對位光罩結構與基板的精度。有關本發明之前述及其他技術內容、特點與功 效,在以下配合參考圖式之實施例的詳細說明中,將可清楚的呈現。 In summary, the reticle structure of the present invention determines the first image capturing device and the second image by using the first auxiliary symbol, the second auxiliary symbol, the third auxiliary symbol, and the fourth auxiliary symbol. Positioning and angle of the device, the third image capturing device and the fourth image capturing device relative to the reticle structure to quickly and accurately correct the first image capturing device and the second image capturing device The device, the third image capturing device, and the fourth image capturing device further enhance the use of the first image capturing device, the second image capturing device, the third image capturing device, and the fourth image file Take the device to align the accuracy of the reticle structure with the substrate. The foregoing and other technical contents, features and work related to the present invention The effects will be apparent from the following detailed description of embodiments with reference to the drawings.

1‧‧‧機台 1‧‧‧ machine

11‧‧‧殼體 11‧‧‧Shell

12‧‧‧腔室 12‧‧‧ chamber

13‧‧‧影像擷取模組 13‧‧‧Image capture module

14‧‧‧控制模組 14‧‧‧Control Module

2、2’‧‧‧光罩結構 2, 2'‧‧‧ reticle structure

20‧‧‧光罩本體 20‧‧‧mask body

200‧‧‧開口 200‧‧‧ openings

21‧‧‧第一對位記號組 21‧‧‧First Registration Mark

211‧‧‧第一主要記號 211‧‧‧ first major mark

212、212’‧‧‧第一輔助記號 212, 212'‧‧‧ first auxiliary mark

22‧‧‧第二對位記號組 22‧‧‧Second Match Mark Group

221‧‧‧第二主要記號 221‧‧‧ second major mark

222、222’‧‧‧第二輔助記號 222, 222’ ‧ ‧ second auxiliary mark

23‧‧‧第三對位記號組 23‧‧‧ third alignment mark group

231‧‧‧第三主要記號 231‧‧‧ Third major mark

232、232’‧‧‧第三輔助記號 232, 232’‧‧‧ third auxiliary mark

24‧‧‧第四對位記號組 24‧‧‧ fourth alignment mark group

241‧‧‧第四主要記號 241‧‧‧ fourth major mark

242、242’‧‧‧第四輔助記號 242, 242’ ‧ ‧ fourth auxiliary mark

3‧‧‧基板 3‧‧‧Substrate

4‧‧‧發光分子 4‧‧‧Lighting molecules

L1‧‧‧第一側邊 L1‧‧‧ first side

L2‧‧‧第二側邊 L2‧‧‧ second side

L3‧‧‧第三側邊 L3‧‧‧ third side

L4‧‧‧第四側邊 L4‧‧‧ fourth side

M1‧‧‧第一輔助線 M1‧‧‧first auxiliary line

M2‧‧‧第二輔助線 M2‧‧‧second auxiliary line

M3‧‧‧第三輔助線 M3‧‧‧ third auxiliary line

M4‧‧‧第四輔助線 M4‧‧‧ fourth auxiliary line

OM1‧‧‧第一主要圓心 OM1‧‧‧ first major center

OM2‧‧‧第二主要圓心 OM2‧‧‧ second major center

OM3‧‧‧第三主要圓心 OM3‧‧‧ third major center

OM4‧‧‧第四主要圓心 OM4‧‧‧ fourth major center

DM1‧‧‧第一主要直徑 DM1‧‧‧first main diameter

DM2‧‧‧第二主要直徑 DM2‧‧‧second main diameter

DM3‧‧‧第三主要直徑 DM3‧‧‧ third major diameter

DM4‧‧‧第四主要直徑 DM4‧‧‧ fourth main diameter

OA1‧‧‧第一輔助圓心 OA1‧‧‧First Auxiliary Center

OA2‧‧‧第二輔助圓心 OA2‧‧‧Second auxiliary center

OA3‧‧‧第三輔助圓心 OA3‧‧‧ third auxiliary center

OA4‧‧‧第四輔助圓心 OA4‧‧‧fourth auxiliary center

OA1’‧‧‧第一輔助中心 OA1’‧‧‧First Auxiliary Center

OA2’‧‧‧第二輔助中心 OA2’‧‧‧Second Auxiliary Center

OA3’‧‧‧第三輔助中心 OA3’‧‧‧ Third Auxiliary Center

OA4’‧‧‧第四輔助中心 OA4’‧‧‧4th Auxiliary Center

DA1‧‧‧第一輔助直徑 DA1‧‧‧First Auxiliary Diameter

DA2‧‧‧第二輔助直徑 DA2‧‧‧second auxiliary diameter

DA3‧‧‧第三輔助直徑 DA3‧‧‧ third auxiliary diameter

DA4‧‧‧第四輔助直徑 DA4‧‧‧4th auxiliary diameter

DA1’‧‧‧第一輔助邊長 DA1’‧‧‧First auxiliary side length

DA2’‧‧‧第二輔助邊長 DA2’‧‧‧Second auxiliary side length

DA3’‧‧‧第三輔助邊長 DA3’‧‧‧ third auxiliary side length

DA4’‧‧‧第四輔助邊長 DA4’‧‧‧fourth auxiliary side length

θ1‧‧‧第一角度 Θ1‧‧‧ first angle

θ2‧‧‧第二角度 Θ2‧‧‧second angle

θ3‧‧‧第三角度 Θ3‧‧‧ third angle

θ4‧‧‧第四角度 Θ4‧‧‧fourth angle

(M1x,M1y)、(M2x,M2y)、(M3x,M3y)、(M4x,M4y)、(A1x,A1y)、(A2x,A2y)、(A3x,A3y)、(A4x,A4y)‧‧‧座標 (M1x, M1y), (M2x, M2y), (M3x, M3y), (M4x, M4y), (A1x, A1y), (A2x, A2y), (A3x, A3y), (A4x, A4y) ‧‧ coordinate

第1圖為本發明第一實施例機台之示意圖。 Figure 1 is a schematic view of a machine table according to a first embodiment of the present invention.

第2圖為本發明第一實施例光罩結構之示意圖。 Fig. 2 is a schematic view showing the structure of a photomask according to a first embodiment of the present invention.

第3圖為本發明第一實施例機台於校正影像擷取模組時之示意圖。 FIG. 3 is a schematic diagram of the machine for correcting the image capturing module according to the first embodiment of the present invention.

第4圖為本發明第一實施例第一影像擷取裝置所擷取的影像之示意圖。 FIG. 4 is a schematic diagram of an image captured by a first image capturing device according to a first embodiment of the present invention.

第5圖為本發明第一實施例第二影像擷取裝置所擷取的影像之示意圖。 FIG. 5 is a schematic diagram of an image captured by a second image capturing device according to the first embodiment of the present invention.

第6圖為本發明第一實施例第三影像擷取裝置所擷取的影像之示意圖。 FIG. 6 is a schematic diagram of an image captured by a third image capturing device according to the first embodiment of the present invention.

第7圖為本發明第一實施例第四影像擷取裝置所擷取的影像之示意圖。 FIG. 7 is a schematic diagram of an image captured by a fourth image capturing device according to the first embodiment of the present invention.

第8圖為本發明第二實施例光罩結構之示意圖。 Figure 8 is a schematic view showing the structure of a photomask according to a second embodiment of the present invention.

以下實施例中所提到的方向用語,例如:上、下、左、右、前或後等,僅是參考附加圖式的方向。因此,使用的方向用語是用來說明並非用來限制本發明。請參閱第1圖,第1圖為本發明第一實施例一機台1之示意圖。機台1係利用一光罩結構2將一發光分子4蒸鍍於一基板3,機台1包含有一殼體11、一腔室12、一影像擷取模組13以及一控制模組14,腔室12形成於殼體11內,用以容置光罩結構2與基板3,影像擷取模組13包含有一第一影像擷取裝置131、一第二影像擷取裝置132、一第三影像擷取裝置133以及一第四影像擷取裝置134。第一影像擷取裝置131、第二影像擷取裝置132、第三影像擷取裝置133以及第四影像擷取裝置134分別安裝於殼體11上,用以進行光罩結構2與基板3的對位,控制模組14耦接於第一影像擷取裝置131、第二影像擷取裝置132、第三影像擷取裝 置133與第四影像擷取裝置134,且用以校正第一影像擷取裝置131、第二影像擷取裝置132、第三影像擷取裝置133與第四影像擷取裝置134。於此實施例中,機台l係用於蒸鍍有機發光二極體(Organic Light-Emitting Diode,OLED),且第一影像擷取裝置131、第二影像擷取裝置132、第三影像擷取裝置133以及第四影像擷取裝置134分別設置於殼體11之四個角落,而本發明不侷限於此。 The directional terms mentioned in the following embodiments, such as up, down, left, right, front or back, etc., are only directions referring to the additional drawings. Therefore, the directional terminology used is for the purpose of illustration and not limitation. Please refer to FIG. 1. FIG. 1 is a schematic view of a machine 1 according to a first embodiment of the present invention. The machine 1 uses a reticle structure 2 to evaporate a luminescent molecule 4 on a substrate 3. The machine 1 includes a housing 11, a chamber 12, an image capturing module 13 and a control module 14. The chamber 12 is formed in the housing 11 for receiving the reticle structure 2 and the substrate 3. The image capturing module 13 includes a first image capturing device 131, a second image capturing device 132, and a third The image capturing device 133 and a fourth image capturing device 134. The first image capturing device 131, the second image capturing device 132, the third image capturing device 133, and the fourth image capturing device 134 are respectively mounted on the housing 11 for performing the mask structure 2 and the substrate 3. The control module 14 is coupled to the first image capturing device 131, the second image capturing device 132, and the third image capturing device. The first image capturing device 131, the second image capturing device 132, the third image capturing device 133, and the fourth image capturing device 134 are corrected. In this embodiment, the machine 1 is used for vapor deposition of an Organic Light-Emitting Diode (OLED), and the first image capturing device 131, the second image capturing device 132, and the third image are configured. The taking device 133 and the fourth image capturing device 134 are respectively disposed at four corners of the casing 11, and the present invention is not limited thereto.

請參閱第2圖,第2圖為本發明第一實施例光罩結構2之示意圖。光罩結構2包含有一光罩本體20、一第一對位記號組21、一第二對位記號組22、一第三對位記號組23以及一第四對位記號組24,光罩本體20上形成有至少一開口200,以使發光分子4穿過開口200附著於基板3上,第一對位記號組21包含一第一主要記號211以及一第一輔助記號212,第一主要記號211設置於光罩本體20上,第一輔助記號212設置於光罩本體20上並鄰近第一主要記號211,第二對位記號組22包含一第二主要記號221以及一第二輔助記號222,第二主要記號221設置於光罩本體20上,第二輔助記號222設置於光罩本體20上並鄰近第二主要記號221,第三對位記號組23包含一第三主要記號231以及一第三輔助記號232,第三主要記號231設置於光罩本體20上,第三輔助記號232設置於光罩本體20上並鄰近第三主要記號231,第四對位記號組24包含一第四主要記號241以及一第四輔助記號242,第四主要記號241設置於光罩本體20上,第四輔助記號242設置於光罩本體20上並鄰近第四主要記號241。於此實施例中,第一主要記號211、第二主要記號221、第三主要記號231、第四主要記號241、第一輔助記號212、第二輔助記號222、第三輔助記號232與第四輔助記號242分別以蝕刻之方式形成於光罩本體20上。 Please refer to FIG. 2, which is a schematic view of the reticle structure 2 of the first embodiment of the present invention. The reticle structure 2 includes a reticle body 20, a first alignment mark group 21, a second alignment mark group 22, a third alignment mark group 23, and a fourth alignment mark group 24, and the reticle body At least one opening 200 is formed on the second surface, so that the illuminating molecules 4 are attached to the substrate 3 through the opening 200. The first alignment mark group 21 includes a first main mark 211 and a first auxiliary mark 212, and the first main mark The second auxiliary mark 212 is disposed on the reticle body 20 and adjacent to the first main mark 211 . The second align mark set 22 includes a second main mark 221 and a second auxiliary mark 222 . The second main symbol 221 is disposed on the reticle body 20, the second auxiliary mark 222 is disposed on the reticle body 20 and adjacent to the second main mark 221, and the third align mark group 23 includes a third main mark 231 and a The third auxiliary mark 232 is disposed on the reticle body 20, the third auxiliary mark 232 is disposed on the reticle body 20 adjacent to the third main mark 231, and the fourth align mark set 24 includes a fourth Main symbol 241 and a fourth auxiliary symbol 242, Four primary marker 241 disposed on the mask body 20, the fourth auxiliary marker 242 is provided on the mask body 20 and adjacent to the fourth primary token 241. In this embodiment, the first major symbol 211, the second major symbol 221, the third major symbol 231, the fourth major symbol 241, the first auxiliary symbol 212, the second auxiliary symbol 222, the third auxiliary symbol 232, and the fourth The auxiliary marks 242 are respectively formed on the mask body 20 by etching.

第一主要記號211與第二主要記號221間定義一第一側邊L1,第二主 要記號221與第三主要記號231間定義一第二側邊L2,第三主要記號231與第四主要記號241間定義一第三側邊L3,第四主要記號241與第一主要記號211間定義一第四側邊L4,第一輔助記號212與第一主要記號211間定義一第一輔助線M1,第二輔助記號222與第二主要記號221間定義一第二輔助線M2,第三輔助記號232與第三主要記號231間定義一第三輔助線M3,第四輔助記號242與第四主要記號241間定義一第四輔助線M4。 A first side L1 is defined between the first main symbol 211 and the second main symbol 221, and the second main A second side L2 is defined between the mark 221 and the third main mark 231, and a third side L3 is defined between the third main mark 231 and the fourth main mark 241, and the fourth main mark 241 and the first main mark 211 are defined. A fourth side line L4 is defined. A first auxiliary line M1 is defined between the first auxiliary mark 212 and the first main mark 211, and a second auxiliary line M2 is defined between the second auxiliary mark 222 and the second main mark 221. A third auxiliary line M3 is defined between the auxiliary mark 232 and the third main mark 231, and a fourth auxiliary line M4 is defined between the fourth auxiliary mark 242 and the fourth main mark 241.

此實施例中,第一主要記號211、第二主要記號221、第三主要記號231、第四主要記號241、第一輔助記號212、第二輔助記號222、第三輔助記號232與第四輔助記號242為圓形記號。因此,第一主要記號211具有一第一主要圓心OM1以及一第一主要直徑DM1,第一輔助記號212具有一第一輔助圓心OA1以及一第一輔助直徑DA1,第二主要記號221具有一第二主要圓心OM2以及一第二主要直徑DM2,第二輔助記號222具有一第二輔助圓心OA2以及一第二輔助直徑DA2,第三主要記號231具有一第三主要圓心OM3以及一第三主要直徑DM3,第三輔助記號232具有一第三輔助圓心OA3以及一第三輔助直徑DA3,第四主要記號241具有一第四主要圓心OM4以及一第四主要直徑DM4,第四輔助記號242具有一第四輔助圓心OA4以及一第四輔助直徑DA4。第一主要圓心OM1與第一輔助圓心OA1間定義第一輔助線M1,第一輔助線M1與第四側邊L4間形成一第一角度θ1,第一角度θ1實質上呈90度,第二主要圓心OM2與第二輔助圓心OA2間定義第二輔助線M2,第二輔助線M2與第二側邊L2間形成一第二角度θ2,第二角度θ2實質上呈90度,第三主要圓心OM3與第三輔助圓心OA3間定義第三輔助線M3,第三輔助線M3與第二側邊L2間形成一第三角度θ3,第三角度θ3實質上呈90度,第四主要圓心OM4與第四輔助圓心OA4間定義第四輔助線M4,第四輔助線M4與第四側邊L4間形成一第四角度θ4,第四角度θ4實質上呈90度,而本 發明不侷限於此實施例。 In this embodiment, the first major symbol 211, the second major symbol 221, the third major symbol 231, the fourth major symbol 241, the first auxiliary symbol 212, the second auxiliary symbol 222, the third auxiliary symbol 232, and the fourth auxiliary The symbol 242 is a circular mark. Therefore, the first main mark 211 has a first main center OM1 and a first main diameter DM1, the first auxiliary mark 212 has a first auxiliary center OA1 and a first auxiliary diameter DA1, and the second main mark 221 has a first The second main center OM2 and the second main diameter DM2, the second auxiliary mark 222 has a second auxiliary center OA2 and a second auxiliary diameter DA2, the third main mark 231 has a third main center OM3 and a third main diameter DM3, the third auxiliary mark 232 has a third auxiliary center OA3 and a third auxiliary diameter DA3, the fourth main symbol 241 has a fourth main center OM4 and a fourth main diameter DM4, and the fourth auxiliary mark 242 has a first Four auxiliary center OA4 and a fourth auxiliary diameter DA4. A first auxiliary line M1 is defined between the first main center OM1 and the first auxiliary center OA1, and a first angle θ1 is formed between the first auxiliary line M1 and the fourth side L4. The first angle θ1 is substantially 90 degrees, and the second A second auxiliary line M2 is defined between the main center OM2 and the second auxiliary center OA2, and a second angle θ2 is formed between the second auxiliary line M2 and the second side L2. The second angle θ2 is substantially 90 degrees, and the third main center A third auxiliary line M3 is defined between the OM3 and the third auxiliary center OA3, and a third angle θ3 is formed between the third auxiliary line M3 and the second side edge L2. The third angle θ3 is substantially 90 degrees, and the fourth main center OM4 is A fourth auxiliary line M4 is defined between the fourth auxiliary center OA4, and a fourth angle θ4 is formed between the fourth auxiliary line M4 and the fourth side line L4, and the fourth angle θ4 is substantially 90 degrees. The invention is not limited to this embodiment.

值得注意的是,第一輔助線M1、第二輔助線M2、第三輔助線M3、第四輔助線M4、第一主要直徑DM1、第二主要直徑DM2、第三主要直徑DM3、第四主要直徑DM4、第一輔助直徑DA1、第二輔助直徑DA2、第三輔助直徑DA3與第四輔助直徑DA4的長度的公差小於一長度精度值,第一輔助線M1與第四側邊L4間所夾的角度的公差小於一角度精度值,而於此實施例中,為達到有機發光二極體的蒸鍍製程所要求的精度(例如為1微米),該長度精度值為±0.0005公釐,且該角度精度值±0.00015度。 It is worth noting that the first auxiliary line M1, the second auxiliary line M2, the third auxiliary line M3, the fourth auxiliary line M4, the first main diameter DM1, the second main diameter DM2, the third main diameter DM3, and the fourth main The tolerance of the lengths of the diameter DM4, the first auxiliary diameter DA1, the second auxiliary diameter DA2, the third auxiliary diameter DA3, and the fourth auxiliary diameter DA4 is less than a length precision value, and is sandwiched between the first auxiliary line M1 and the fourth side edge L4. The tolerance of the angle is less than an angular precision value, and in this embodiment, the precision of the length required to achieve the vapor deposition process of the organic light-emitting diode (for example, 1 micrometer) is ±0.0005 mm, and The angular accuracy value is ±0.00015 degrees.

請參閱第3圖,第3圖為本發明第一實施例機台100於校正影像擷取模組13時之示意圖。如第3圖所示,當欲校正影像擷取模組13時,首先將光罩結構2先放置於腔室12內,讓第一對位記號組21、第二對位記號組22、第三對位記號組23與第四對位記號組24分別對應第一影像擷取裝置131、第二影像擷取裝置132、第三影像擷取裝置133與第四影像擷取裝置134,接著,控制模組14控制第一影像擷取裝置131、第二影像擷取裝置132、第三影像擷取裝置133與第四影像擷取裝置134分別擷取相對應之影像。於此實施例中,第一對位記號組21之第一主要記號211與第一輔助記號212間的距離(即第一輔助線M1的線長)可較佳地位於第一影像擷取裝置131之視野範圍的四分之一內,第二對位記號組22之第二主要記號221與第二輔助記號222間的距離(即第二輔助線M2的線長)可較佳地位於第二影像擷取裝置132之視野範圍的四分之一內,第三對位記號組23之第三主要記號231與第三輔助記號232間的距離(即第三輔助線M3的線長)可較佳地位於第三影像擷取裝置133之視野範圍的四分之一內,第四對位記號組24之第四主要記號241與第四輔助記號242間的距離(即第四輔助線M4的線長)可較佳地位於第四 影像擷取裝置134之視野範圍的四分之一內,而本發明不侷限於此。 Please refer to FIG. 3 , which is a schematic diagram of the machine 100 of the first embodiment of the present invention when the image capturing module 13 is corrected. As shown in FIG. 3, when the image capturing module 13 is to be corrected, the reticle structure 2 is first placed in the chamber 12, and the first aligning mark group 21, the second aligning mark group 22, and the first The third alignment mark group 23 and the fourth alignment mark group 24 respectively correspond to the first image capturing device 131, the second image capturing device 132, the third image capturing device 133, and the fourth image capturing device 134, and then, The control module 14 controls the first image capturing device 131, the second image capturing device 132, the third image capturing device 133, and the fourth image capturing device 134 to respectively capture corresponding images. In this embodiment, the distance between the first main symbol 211 of the first alignment mark group 21 and the first auxiliary symbol 212 (ie, the line length of the first auxiliary line M1) may preferably be located in the first image capturing device. Within a quarter of the field of view of 131, the distance between the second major symbol 221 of the second alignment mark group 22 and the second auxiliary symbol 222 (ie, the line length of the second auxiliary line M2) may preferably be located at The distance between the third main symbol 231 of the third alignment mark group 23 and the third auxiliary mark 232 (ie, the line length of the third auxiliary line M3) may be within one quarter of the field of view of the second image capturing device 132. Preferably, it is located within a quarter of the field of view of the third image capturing device 133, and the distance between the fourth major symbol 241 of the fourth alignment marker group 24 and the fourth auxiliary symbol 242 (ie, the fourth auxiliary line M4) Line length) is preferably located at the fourth The image capturing device 134 is within one quarter of the field of view, and the present invention is not limited thereto.

請參閱第4圖至第7圖,第4圖為本發明第一實施例第一影像擷取裝置131所擷取的影像之示意圖,第5圖為本發明第一實施例第二影像擷取裝置132所擷取的影像之示意圖,第6圖為本發明第一實施例第三影像擷取裝置133所擷取的影像之示意圖,第7圖為本發明第一實施例第四影像擷取裝置134所擷取的影像之示意圖。如第4圖至第7圖所示,第一主要記號211之第一主要圓心OM1與第一輔助記號212之第一輔助圓心OA1相對於第一影像擷取裝置131所擷取之影像的座標分別為(M1x,M1y)與(A1x,A1y),第二主要記號221之第二主要圓心OM2與第二輔助記號222之第二輔助圓心OA2相對於第二影像擷取裝置132所擷取之影像的座標分別為(M2x,M2y)與(A2x,A2y),第三主要記號231之第三主要圓心OM3與第三輔助記號232之第三輔助圓心OA3相對於第三影像擷取裝置133所擷取之影像的座標分別為(M3x,M3y)與(A3x,A3y),第四主要記號241之第四主要圓心OM4與第四輔助記號242之第四輔助圓心OA4相對於第四影像擷取裝置134所擷取之影像的座標分別為(M4x,M4y)與(A4x,A4y),控制模組14依據上述座標分別調整第一影像擷取裝置131、第二影像擷取裝置132、第三影像擷取裝置133、第四影像擷取裝置134的位置以及角度,以完成影像擷取裝置相對於光罩結構2之校正。 Please refer to FIG. 4 to FIG. 7 , FIG. 4 is a schematic diagram of an image captured by the first image capturing device 131 according to the first embodiment of the present invention, and FIG. 5 is a second image capturing method according to the first embodiment of the present invention. FIG. 6 is a schematic diagram of an image captured by a third image capturing device 133 according to the first embodiment of the present invention, and FIG. 7 is a fourth image capturing method according to the first embodiment of the present invention. A schematic representation of the image captured by device 134. As shown in FIG. 4 to FIG. 7 , the coordinates of the first main center OM1 of the first main symbol 211 and the first auxiliary center OA1 of the first auxiliary symbol 212 relative to the image captured by the first image capturing device 131 (M1x, M1y) and (A1x, A1y), the second main center OM2 of the second main symbol 221 and the second auxiliary center OA2 of the second auxiliary mark 222 are extracted with respect to the second image capturing device 132. The coordinates of the image are (M2x, M2y) and (A2x, A2y), and the third main center OM3 of the third main symbol 231 and the third auxiliary center OA3 of the third auxiliary symbol 232 are opposite to the third image capturing device 133. The coordinates of the captured image are (M3x, M3y) and (A3x, A3y), and the fourth main center OM4 of the fourth main symbol 241 and the fourth auxiliary center OA4 of the fourth auxiliary symbol 242 are captured relative to the fourth image. The coordinates of the image captured by the device 134 are respectively (M4x, M4y) and (A4x, A4y), and the control module 14 respectively adjusts the first image capturing device 131, the second image capturing device 132, and the third according to the coordinates. Position and angle of the image capturing device 133 and the fourth image capturing device 134 to complete the image capturing device phase Correction for the reticle structure 2.

請參閱第8圖,第8圖為本發明第二實施例一光罩結構2’之示意圖。與前述實施例光罩結構2不同的是,光罩結構2’之一第一輔助記號212’、一第二輔助記號222’、一第三輔助記號232’與一第四輔助記號242’為正方形記號,而非圓形記號。第一輔助記號212’具有一第一輔助中心OA1’以及一第一輔助邊長DA1’,第二輔助記號222’具有一第二輔助中心OA2’以及一第二輔助邊長DA2’, 第三輔助記號232’具有一第三輔助中心OA3’以及一第三輔助邊長DA3’,第四輔助記號242’具有一第四輔助中心OA4’以及一第四輔助邊長DA4’,第一主要圓心OM1與第一輔助中心OA1’間定義第一輔助線M1,第二主要圓心OM2與第二輔助中心OA2’間定義第二輔助線M2,第三主要圓心OM3與第三輔助中心OA3’間定義第三輔助線M3,第四主要圓心OM4與第四輔助中心OA4’間定義第四輔助線M4,第一輔助邊長DA1’、第二輔助邊長DA2’、第三輔助邊長DA3’與第四輔助邊長DA4’的長度的公差為±0.0005公釐。而於本實施例與前述實施例中具有相同標號之元件具有相同結構與功能,於此不再贅述。 Referring to Figure 8, Figure 8 is a schematic view of a photomask structure 2' according to a second embodiment of the present invention. Different from the reticle structure 2 of the foregoing embodiment, one of the reticle structure 2', the first auxiliary mark 212', the second auxiliary mark 222', the third auxiliary mark 232' and the fourth auxiliary mark 242' are Square notation, not a circular mark. The first auxiliary mark 212' has a first auxiliary center OA1' and a first auxiliary side length DA1', and the second auxiliary mark 222' has a second auxiliary center OA2' and a second auxiliary side length DA2'. The third auxiliary mark 232' has a third auxiliary center OA3' and a third auxiliary side length DA3'. The fourth auxiliary mark 242' has a fourth auxiliary center OA4' and a fourth auxiliary side length DA4'. A first auxiliary line M1 is defined between the main center OM1 and the first auxiliary center OA1', and a second auxiliary line M2 is defined between the second main center OM2 and the second auxiliary center OA2'. The third main center OM3 and the third auxiliary center OA3' A third auxiliary line M3 is defined, and a fourth auxiliary line M4, a first auxiliary side length DA1', a second auxiliary side length DA2', and a third auxiliary side length DA3 are defined between the fourth main center OM4 and the fourth auxiliary center OA4'. The tolerance of the length of the fourth auxiliary side length DA4' is ±0.0005 mm. The components having the same reference numerals in the embodiment and the foregoing embodiments have the same structures and functions, and are not described herein again.

相較於先前技術,本發明之光罩結構利用該第一輔助記號、該第二輔助記號、該第三輔助記號與該第四輔助記號來判斷該第一影像擷取裝置、該第二影像擷取裝置、該第三影像擷取裝置與該第四影像擷取裝置相對於該光罩結構之位置以及角度,以快速地且精準地校正該第一影像擷取裝置、該第二影像擷取裝置、該第三影像擷取裝置與該第四影像擷取裝置,進而提升利用該第一影像擷取裝置、該第二影像擷取裝置、該第三影像擷取裝置與該第四影像擷取裝置來對位光罩結構與基板的精度。以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 Compared with the prior art, the reticle structure of the present invention uses the first auxiliary symbol, the second auxiliary symbol, the third auxiliary symbol and the fourth auxiliary symbol to determine the first image capturing device and the second image. The first image capturing device and the second image are quickly and accurately corrected by the capturing device, the third image capturing device, and the position and angle of the fourth image capturing device relative to the reticle structure The first image capturing device, the second image capturing device, the third image capturing device, and the fourth image are further improved by the device, the third image capturing device, and the fourth image capturing device. The pick-up device is used to align the accuracy of the reticle structure with the substrate. The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.

2‧‧‧光罩結構 2‧‧‧Photomask structure

20‧‧‧光罩本體 20‧‧‧mask body

200‧‧‧開口 200‧‧‧ openings

21‧‧‧第一對位記號組 21‧‧‧First Registration Mark

211‧‧‧第一主要記號 211‧‧‧ first major mark

212‧‧‧第一輔助記號 212‧‧‧First auxiliary mark

22‧‧‧第二對位記號組 22‧‧‧Second Match Mark Group

221‧‧‧第二主要記號 221‧‧‧ second major mark

222‧‧‧第二輔助記號 222‧‧‧second auxiliary mark

23‧‧‧第三對位記號組 23‧‧‧ third alignment mark group

231‧‧‧第三主要記號 231‧‧‧ Third major mark

232‧‧‧第三輔助記號 232‧‧‧ third auxiliary mark

24‧‧‧第四對位記號組 24‧‧‧ fourth alignment mark group

241‧‧‧第四主要記號 241‧‧‧ fourth major mark

242‧‧‧第四輔助記號 242‧‧‧ Fourth auxiliary mark

OM1‧‧‧第一主要圓心 OM1‧‧‧ first major center

OM2‧‧‧第二主要圓心 OM2‧‧‧ second major center

OM3‧‧‧第三主要圓心 OM3‧‧‧ third major center

OM4‧‧‧第四主要圓心 OM4‧‧‧ fourth major center

DM1‧‧‧第一主要直徑 DM1‧‧‧first main diameter

DM2‧‧‧第二主要直徑 DM2‧‧‧second main diameter

DM3‧‧‧第三主要直徑 DM3‧‧‧ third major diameter

DM4‧‧‧第四主要直徑 DM4‧‧‧ fourth main diameter

OA1‧‧‧第一輔助圓心 OA1‧‧‧First Auxiliary Center

OA2‧‧‧第二輔助圓心 OA2‧‧‧Second auxiliary center

OA3‧‧‧第三輔助圓心 OA3‧‧‧ third auxiliary center

OA4‧‧‧第四輔助圓心 OA4‧‧‧fourth auxiliary center

DA1‧‧‧第一輔助直徑 DA1‧‧‧First Auxiliary Diameter

DA2‧‧‧第二輔助直徑 DA2‧‧‧second auxiliary diameter

DA3‧‧‧第三輔助直徑 DA3‧‧‧ third auxiliary diameter

DA4‧‧‧第四輔助直徑 DA4‧‧‧4th auxiliary diameter

θ 1‧‧‧第一角度 θ 1‧‧‧ first angle

θ 2‧‧‧第二角度 θ 2‧‧‧second angle

θ 3‧‧‧第三角度 θ 3‧‧‧ third angle

θ 4‧‧‧第四角度 θ 4‧‧‧fourth angle

Claims (14)

一種適用於有機發光二極體蒸鍍製程並可用以校正一影像擷取模組之定位精度之光罩結構,包含有:一光罩本體;一第一對位記號組,對應該影像擷取模組之一第一影像擷取裝置且包含:一第一主要記號,設置於該光罩本體上;以及一第一輔助記號,設置於該光罩本體上並鄰近該第一主要記號;一第二對位記號組,包含一第二主要記號,該第二主要記號設置於該光罩本體上;一第三對位記號組,包含一第三主要記號,該第三主要記號設置於該光罩本體上;以及一第四對位記號組,包含一第四主要記號,該第四主要記號設置於該光罩本體上;其中,該第一主要記號與該第二主要記號間定義一第一側邊,該第二主要記號與該第三主要記號間定義一第二側邊,該第三主要記號與該第四主要記號間定義一第三側邊,該第四主要記號與該第一主要記號間定義一第四側邊,該第一輔助記號與該第一主要記號間定義一第一輔助線,該第一輔助線與該第四側邊間形成一第一角度,該第一輔助線的長度的公差小於一長度精度值,該第一角度的公差小於一角度精度值。 A photomask structure suitable for an organic light emitting diode evaporation process and capable of correcting the positioning accuracy of an image capturing module comprises: a mask body; a first alignment mark group corresponding to the image capturing The first image capturing device of the module includes: a first main symbol disposed on the reticle body; and a first auxiliary symbol disposed on the reticle body adjacent to the first main symbol; The second alignment mark group includes a second main mark, the second main mark is disposed on the mask body; a third alignment mark group includes a third main mark, and the third main mark is disposed on the a fourth alignment mark group, and a fourth main mark, wherein the fourth main mark is disposed on the reticle body; wherein the first main mark and the second main mark define a a first side, a second side is defined between the second major symbol and the third major symbol, and a third side is defined between the third major symbol and the fourth major symbol, the fourth major symbol and the Definition of the first major token a fourth auxiliary line defines a first auxiliary line between the first auxiliary mark and the first main mark, and the first auxiliary line forms a first angle with the fourth side, the length of the first auxiliary line The tolerance is less than a length accuracy value, and the tolerance of the first angle is less than an angular precision value. 如請求項1所述之光罩結構,其中該第一主要記號與該第一輔助記號分別為兩圓形記號,該第一主要記號具有一第一主要圓心以及一第一主要直徑,該第一輔助記號具有一第一輔助圓心以及一第一輔助直徑,該第一輔助線係由該第一主要圓心與該第一輔助圓心所定義,該第一主要直徑的 長度的公差與該第一輔助直徑的長度的公差均小於該長度精度值。 The reticle structure of claim 1, wherein the first major symbol and the first auxiliary symbol are respectively two circular symbols, the first major symbol having a first major center and a first major diameter, the first An auxiliary mark has a first auxiliary center defined by the first main center and the first auxiliary center, and a first auxiliary line defined by the first auxiliary center The tolerance of the length tolerance and the length of the first auxiliary diameter are both less than the length accuracy value. 如請求項1所述之光罩結構,其中該第一主要記號為一圓形記號,該第一輔助記號為一正方形記號,該第一主要記號具有一第一主要圓心以及一第一主要直徑,該第一輔助記號具有一第一輔助中心以及一第一輔助邊長,該第一輔助線係由該第一主要圓心與該第一輔助中心所定義,該第一主要直徑的長度的公差與該第一輔助邊長的長度的公差均小於該長度精度值。 The reticle structure of claim 1, wherein the first major symbol is a circular symbol, the first auxiliary symbol is a square symbol, the first major symbol has a first major center and a first major diameter The first auxiliary symbol has a first auxiliary center defined by the first main center and the first auxiliary center, and the first auxiliary line is defined by the first main center and the first auxiliary center. The tolerance of the length of the first auxiliary side length is less than the length accuracy value. 如請求項1所述之光罩結構,其中該第二對位記號組對應該影像擷取模組之一第二影像擷取模組且另包含有一第二輔助記號,該第二輔助記號設置於該光罩本體上並鄰近該第二主要記號,該第二輔助記號與該第二主要記號間定義一第二輔助線,該第二輔助線與該第二側邊間形成一第二角度,該第二輔助線的長度的公差小於該長度精度值,該第二角度的公差小於該角度精度值。 The reticle structure of claim 1, wherein the second alignment mark group corresponds to a second image capturing module of the image capturing module and further includes a second auxiliary symbol, the second auxiliary mark setting A second auxiliary line is defined between the second auxiliary mark and the second main mark, and a second angle is formed between the second auxiliary line and the second side mark on the reticle body and adjacent to the second main mark The tolerance of the length of the second auxiliary line is less than the length precision value, and the tolerance of the second angle is smaller than the angle precision value. 如請求項4所述之光罩結構,其中該第二主要記號與該第二輔助記號分別為兩圓形記號,該第二主要記號具有一第二主要圓心以及一第二主要直徑,該第二輔助記號具有一第二輔助圓心以及一第二輔助直徑,該第二輔助線係由該第二主要圓心與該第二輔助圓心所定義,該第二主要直徑的長度的公差與該第二輔助直徑的長度的公差均小於該長度精度值。 The reticle structure of claim 4, wherein the second major symbol and the second auxiliary symbol are respectively two circular symbols, the second major symbol having a second major center and a second major diameter, the first The second auxiliary mark has a second auxiliary center defined by the second main center and the second auxiliary center, the second main center is defined by the second auxiliary center, and the second main diameter has a tolerance of the length and the second The tolerance of the length of the auxiliary diameter is less than the length accuracy value. 如請求項4所述之光罩結構,其中該第二主要記號為一圓形記號,該第二輔助記號為一正方形記號,該第二主要記號具有一第二主要圓心以及 一第二主要直徑,該第二輔助記號具有一第二輔助中心以及一第二輔助邊長,該第二輔助線係由該第二主要圓心與該第二輔助中心所定義,該第二主要直徑的長度的公差與該第二輔助邊長的長度的公差均小於該長度精度值。 The reticle structure of claim 4, wherein the second major symbol is a circular symbol, the second auxiliary symbol is a square symbol, and the second major symbol has a second major center and a second main diameter, the second auxiliary mark has a second auxiliary center and a second auxiliary side length, the second auxiliary line is defined by the second main center and the second auxiliary center, the second main The tolerance of the length of the diameter and the length of the length of the second auxiliary side are both smaller than the length accuracy value. 如請求項4所述之光罩結構,其中該第三對位記號組對應該影像擷取模組之一第三影像擷取模組且另包含有一第三輔助記號,該第三輔助記號設置於該光罩本體上並鄰近該第三主要記號,該第三輔助記號與該第三主要記號間定義一第三輔助線,該第三輔助線與該第二側邊間形成一第三角度,該第三輔助線的長度的公差小於該長度精度值,該第三角度的公差小於該角度精度值。 The reticle structure of claim 4, wherein the third alignment mark group corresponds to one of the image capturing modules, the third image capturing module, and further includes a third auxiliary mark, the third auxiliary mark setting A third auxiliary line is defined between the third auxiliary mark and the third main mark, and a third angle is formed between the third auxiliary line and the second side mark. The tolerance of the length of the third auxiliary line is less than the length precision value, and the tolerance of the third angle is smaller than the angle precision value. 如請求項7所述之光罩結構,其中該第三主要記號與該第三輔助記號分別為兩圓形記號,該第三主要記號具有一第三主要圓心以及一第三主要直徑,該第三輔助記號具有一第三輔助圓心以及一第三輔助直徑,該第三輔助線係由該第三主要圓心與該第三輔助圓心所定義,該第三主要直徑的長度的公差與該第三輔助直徑的長度的公差均小於該長度精度值。 The reticle structure of claim 7, wherein the third major symbol and the third auxiliary symbol are respectively two circular symbols, the third major symbol having a third major center and a third major diameter, the first The third auxiliary mark has a third auxiliary center defined by the third main center and the third auxiliary center, and the third auxiliary line has a tolerance of a length of the third main diameter and the third The tolerance of the length of the auxiliary diameter is less than the length accuracy value. 如請求項7所述之光罩結構,其中該第三主要記號為一圓形記號,該第三輔助記號為一正方形記號,該第三主要記號具有一第三主要圓心以及一第三主要直徑,該第三輔助記號具有一第三輔助中心以及一第三輔助邊長,該第三輔助線係由該第三主要圓心與該第三輔助中心所定義,該第三主要直徑的長度的公差與該第三輔助邊長的長度的公差均小於該長度精度值。 The reticle structure of claim 7, wherein the third major symbol is a circular symbol, the third auxiliary symbol is a square symbol, the third major symbol has a third major center and a third major diameter The third auxiliary mark has a third auxiliary center defined by the third main center and the third auxiliary center, and a tolerance of the length of the third main diameter The tolerance of the length of the third auxiliary side length is less than the length accuracy value. 如請求項7所述之光罩結構,其中該第四對位記號組對應該影像擷取模組之一第四影像擷取模組且另包含有一第四輔助記號,該第四輔助記號設置於該光罩本體上並鄰近該第四主要記號,該第四輔助記號與該第四主要記號間定義一第四輔助線,該第四輔助線與該第四側邊間形成一第四角度,該第四輔助線的長度的公差小於該長度精度值,該第四角度的公差小於該角度精度值。 The reticle structure of claim 7, wherein the fourth alignment mark group corresponds to a fourth image capturing module of the image capturing module and further includes a fourth auxiliary symbol, the fourth auxiliary symbol setting A fourth auxiliary line is defined between the fourth auxiliary mark and the fourth main mark, and a fourth angle is formed between the fourth auxiliary line and the fourth side mark. The tolerance of the length of the fourth auxiliary line is less than the length precision value, and the tolerance of the fourth angle is smaller than the angle precision value. 如請求項10所述之光罩結構,其中該第四主要記號與該第四輔助記號分別為兩圓形記號,該第四主要記號具有一第四主要圓心以及一第四主要直徑,該第四輔助記號具有一第四輔助圓心以及一第四輔助直徑,該第四輔助線係由該第四主要圓心與該第四輔助圓心所定義,該第四主要直徑的長度的公差與該第四輔助直徑的長度的公差均小於該長度精度值。 The reticle structure of claim 10, wherein the fourth major symbol and the fourth auxiliary symbol are respectively two circular symbols, the fourth major symbol having a fourth major center and a fourth major diameter, the first The fourth auxiliary mark has a fourth auxiliary center defined by the fourth main center and the fourth auxiliary center, and the fourth auxiliary center defines a length tolerance of the fourth main diameter and the fourth auxiliary line The tolerance of the length of the auxiliary diameter is less than the length accuracy value. 如請求項10所述之光罩結構,其中該第四主要記號為一圓形記號,該第四輔助記號為一正方形記號,該第四主要記號具有一第四主要圓心以及一第四主要直徑,該第四輔助記號具有一第四輔助中心以及一第四輔助邊長,該第四輔助線係由該第四主要圓心與該第四輔助中心所定義,該第四主要直徑的長度的公差與該第四輔助邊長的長度的公差均小於該長度精度值。 The reticle structure of claim 10, wherein the fourth major symbol is a circular symbol, the fourth auxiliary symbol is a square symbol, the fourth major symbol has a fourth major center and a fourth major diameter The fourth auxiliary mark has a fourth auxiliary center defined by the fourth main center and the fourth auxiliary center, and a tolerance of the length of the fourth main diameter The tolerance of the length of the fourth auxiliary side length is less than the length precision value. 如請求項10所述之光罩結構,其中該第一主要記號、該第二主要記號、該第三主要記號、該第四主要記號、第一輔助記號、該第二輔助記號、該第三輔助記號與該第四輔助記號分別以蝕刻之方式形成於該光罩本體 上。 The reticle structure of claim 10, wherein the first major token, the second major token, the third major token, the fourth major token, the first auxiliary token, the second auxiliary token, the third The auxiliary mark and the fourth auxiliary mark are respectively formed on the mask body by etching on. 如請求項10所述之光罩結構,其中該第一角度、該第二角度、該第三角度與該第四角度均實質上呈90度。 The reticle structure of claim 10, wherein the first angle, the second angle, the third angle, and the fourth angle are each substantially 90 degrees.
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