TWI600970B - Resin composition, color filter, production method of color filter, and image display element - Google Patents

Resin composition, color filter, production method of color filter, and image display element Download PDF

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TWI600970B
TWI600970B TW104136312A TW104136312A TWI600970B TW I600970 B TWI600970 B TW I600970B TW 104136312 A TW104136312 A TW 104136312A TW 104136312 A TW104136312 A TW 104136312A TW I600970 B TWI600970 B TW I600970B
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resin composition
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acrylate
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TW201631396A (en
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柳正義
川口恭章
木下健宏
坂本淳
倉本拓樹
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昭和電工股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/02Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of acids, salts or anhydrides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12Polymers provided for in subclasses C08C or C08F
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements

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  • General Physics & Mathematics (AREA)
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Description

樹脂組成物、彩色濾光器、其製造方法及影像顯示元件 Resin composition, color filter, manufacturing method thereof and image display element

本發明為關於樹脂組成物、彩色濾光器、其製造方法及影像顯示元件。 The present invention relates to a resin composition, a color filter, a method of producing the same, and an image display element.

彩色濾光器一般是由:玻璃基板等的透明基板;形成於透明基板上的紅(R)、綠(G)及藍(B)的畫素;形成於畫素的交界的黑色矩陣(BM);與形成於畫素及黑色矩陣上的保護膜所構成。具有如此般構成的彩色濾光器,通常為藉由在透明基板上依序形成黑色矩陣、畫素及保護膜而製造出來。作為畫素及黑色矩陣(以下將畫素及黑色矩陣稱為「著色圖型」)之形成方法,已有各種的方法被提出,而使用感光性樹脂組成物作為光阻,以重覆進行塗佈、曝光、顯影及烘烤之光微影工法所製成的顏料/染料分散法為目前之主流。 The color filter is generally a transparent substrate such as a glass substrate; red (R), green (G), and blue (B) pixels formed on the transparent substrate; and a black matrix formed at the boundary of the pixels (BM) ); and a protective film formed on the pixels and the black matrix. A color filter having such a configuration is usually manufactured by sequentially forming a black matrix, a pixel, and a protective film on a transparent substrate. As a method of forming a pixel and a black matrix (hereinafter referred to as a "coloring pattern" for a pixel and a black matrix), various methods have been proposed, and a photosensitive resin composition is used as a photoresist to be repeatedly coated. The pigment/dye dispersion method made by the light lithography method of cloth, exposure, development and baking is currently the mainstream.

一般而言,使用於光微影工法的感光性樹脂 組成物為含有鹼可溶性樹脂、反應性稀釋劑、光聚合起始劑、著色劑及溶劑。顏料/染料分散法為具有所謂可形成耐光性或耐熱性等的耐久性為優異、針孔等的缺陷為少的著色圖型之優點,但是相反地,由於重覆形成黑色矩陣、R、G、B之圖型、或保護膜,因此對於硬化塗膜要求為高耐溶劑性。 In general, photosensitive resin used in photolithography The composition contains an alkali-soluble resin, a reactive diluent, a photopolymerization initiator, a colorant, and a solvent. The pigment/dye dispersion method is advantageous in that it has excellent durability such as light resistance and heat resistance, and a coloring pattern having few defects such as pinholes, but conversely, a black matrix, R, and G are repeatedly formed. The pattern of B, or the protective film, therefore requires high solvent resistance for the hard coat film.

在此,已有例如下述般之提案:使用具有環氧基或氧雜環丁烷基、與羧基或酚性羥基的共聚物來提昇耐溶劑性之方法(專利文獻1及2);或作為聚合起始劑,以使用包含分子中為具有含三鹵甲基的噁二唑構造或三嗪構造的聚合起始劑來提昇耐溶劑性之方法(專利文獻3)。 Here, there has been proposed a method of improving solvent resistance by using a copolymer having an epoxy group or an oxetanyl group and a carboxyl group or a phenolic hydroxyl group (Patent Documents 1 and 2); or As a polymerization initiator, a method of improving solvent resistance by using a polymerization initiator having a oxadiazole structure or a triazine structure containing a trihalomethyl group in a molecule is used (Patent Document 3).

又,為了提昇彩色濾光器的色彩再現特性,必須調配含有量為多的著色劑、或使膜厚變厚等,同時該等亦具有產生使感度降低、顯影性降低等問題之傾向,而要求著性能進一步的提昇(專利文獻4)。 Further, in order to enhance the color reproduction characteristics of the color filter, it is necessary to prepare a coloring agent having a large amount of the coloring agent, or to increase the thickness of the film, and the like, and these tend to cause problems such as lowering the sensitivity and lowering the developability. Further improvement in performance is required (Patent Document 4).

〔先前技術文獻〕 [Previous Technical Literature] 〔專利文獻〕 [Patent Document]

〔專利文獻1〕日本特開2012-22048號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2012-22048

〔專利文獻2〕日本特開2013-25203號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2013-25203

〔專利文獻3〕日本特開2003-330184號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2003-330184

〔專利文獻4〕日本特開2014-164021號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2014-164021

然而,以往的感光性樹脂組成物具有感度或顯影性為不足之情形,或無法得到耐溶劑性為優異的硬化塗膜之情形。 However, the conventional photosensitive resin composition has a case where the sensitivity or developability is insufficient, or a cured coating film having excellent solvent resistance cannot be obtained.

因此,本發明為解決如上述般課題之發明,本發明之目的為提供一種可賦予感度或顯影性為良好之同時耐溶劑性亦為優異的硬化塗膜的樹脂組成物。又,本發明以提供具有由耐溶劑性為優異的硬化塗膜所成的著色圖型的彩色濾光器為目的。 In view of the above, it is an object of the present invention to provide a resin composition which can provide a cured coating film which is excellent in sensitivity and developability and which is excellent in solvent resistance. Moreover, the present invention has an object of providing a color filter having a color pattern formed of a cured coating film excellent in solvent resistance.

即,本發明如下述〔1〕~〔14〕所示內容。 That is, the present invention is as shown in the following [1] to [14].

〔1〕.一種樹脂組成物,其係含有:含有環氧基及酸基的樹脂(A);含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B);與溶劑(C),其特徵為,相對於前述含有環氧基及酸基的樹脂(A)中的酸基1莫耳,環氧基為0.5~3.0莫耳。 [1] A resin composition comprising: an epoxy group and an acid group-containing resin (A); a hydroxyl group-containing polyfunctional (meth) acrylate polybasic acid monoester (B); and a solvent (C) It is characterized in that the epoxy group is 0.5 to 3.0 mole with respect to the acid group 1 mol in the epoxy group- and acid group-containing resin (A).

〔2〕.如前述〔1〕之樹脂組成物,其中,作為前述含有環氧基及酸基的樹脂(A)之構成單體單位係含有來自於一分子中具有乙烯性碳-碳雙鍵與環氧基的單體(a-1)的單體單位。 [2] The resin composition of the above-mentioned [1], wherein the constituent monomer unit of the epoxy group and the acid group-containing resin (A) contains an ethylenic carbon-carbon double bond derived from one molecule. A monomer unit of the monomer (a-1) with an epoxy group.

〔3〕.如前述〔1〕或〔2〕之樹脂組成物,其中,作為前述含有環氧基及酸基的樹脂(A)之構成單體單位係含有 來自於不飽和羧酸(a-2)的單體單位。 [3] The resin composition according to the above [1] or [2], wherein the constituent monomer unit containing the epoxy group and the acid group-containing resin (A) is contained A monomer unit derived from an unsaturated carboxylic acid (a-2).

〔4〕.如前述〔3〕之樹脂組成物,其中,前述含有環氧基及酸基的樹脂(A)係含有使來自於前述不飽和羧酸(a-2)的羧基的一部份、與單體(a-3)加成而得的具有乙烯性碳-碳雙鍵的構成單體單位,該單體(a-3)係一分子中具有能與羧基反應的官能基與乙烯性碳-碳雙鍵。 [4] The resin composition according to the above [3], wherein the epoxy group-containing acid group-containing resin (A) contains a part of a carboxyl group derived from the unsaturated carboxylic acid (a-2). a constituent monomer unit having an ethylenic carbon-carbon double bond which is added to the monomer (a-3), and the monomer (a-3) has a functional group capable of reacting with a carboxyl group and ethylene in one molecule. Carbon-carbon double bond.

〔5〕.如前述〔2〕之樹脂組成物,其中,前述一分子中具有乙烯性碳-碳雙鍵與環氧基的單體(a-1)係含有環氧基的(甲基)丙烯酸酯。 [5] The resin composition according to the above [2], wherein the monomer (a-1) having an ethylenic carbon-carbon double bond and an epoxy group in the above molecule contains an epoxy group (meth) Acrylate.

〔6〕.如前述〔4〕之樹脂組成物,其中,前述一分子中具有能與羧基反應的官能基與乙烯性碳-碳雙鍵的單體(a-3)係選自含有環氧基的(甲基)丙烯酸酯及含有異氰酸酯基的(甲基)丙烯酸酯之1種或2種以上。 [6] The resin composition according to the above [4], wherein the monomer (a-3) having a functional group capable of reacting with a carboxyl group and an ethylenic carbon-carbon double bond in the above molecule is selected from the group consisting of an epoxy group. One or two or more kinds of the (meth) acrylate and the (meth) acrylate containing an isocyanate group.

〔7〕.如前述〔1〕~〔6〕中任一之樹脂組成物,其中,前述含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)係選自由季戊四醇的二或三(甲基)丙烯酸酯的多元酸單酯、二季戊四醇的二、三、四或五(甲基)丙烯酸酯的多元酸單酯所成之群之1種或2種以上。 The resin composition of any one of the above-mentioned [1] to [6], wherein the polyfunctional (meth) acrylate polybasic acid monoester (B) containing a hydroxyl group is selected from dipentaerythritol or One or more selected from the group consisting of polybasic monoesters of tris(meth)acrylate and polybasic monoesters of di, tri, tetra or penta(meth)acrylate of dipentaerythritol.

〔8〕.如前述〔1〕~〔7〕中任一之樹脂組成物,其中,前述含有環氧基及酸基的樹脂(A)之酸價為10~350mgKOH/g。 [8] The resin composition according to any one of the above [1] to [7] wherein the epoxy group and the acid group-containing resin (A) have an acid value of 10 to 350 mgKOH/g.

〔9〕.如前述〔1〕~〔8〕中任一之樹脂組成物,其中,進而含有光聚合起始劑(D)。 [9] The resin composition according to any one of the above [1] to [8], further comprising a photopolymerization initiator (D).

〔10〕.如前述〔1〕~〔9〕中任一之樹脂組成物,其中, 進而含有著色劑(E)。 [10] The resin composition according to any one of the above [1] to [9] wherein Further, a coloring agent (E) is contained.

〔11〕.如前述〔10〕之樹脂組成物,其中,前述著色劑(E)係選自由染料及顏料所成之群之至少1種。 [11] The resin composition according to the above [10], wherein the coloring agent (E) is at least one selected from the group consisting of a dye and a pigment.

〔12〕.一種彩色濾光器,其係具有由前述〔10〕或〔11〕之樹脂組成物之硬化塗膜所成之著色圖型。 [12] A color filter comprising a coloring pattern formed of a cured coating film of the resin composition of the above [10] or [11].

〔13〕.一種影像顯示元件,其係具備如前述〔12〕之彩色濾光器。 [13] An image display element comprising the color filter of the above [12].

〔14〕.一種彩色濾光器之製造方法,其係包含:於基板上將前述〔10〕或〔11〕之樹脂組成物進行塗佈、曝光及藉由鹼水溶液的顯影之步驟;與以215℃以下之溫度條件烘烤,來形成著色圖型之步驟。 [14] A method of producing a color filter, comprising: coating, exposing, and developing a resin composition of the above [10] or [11] on a substrate; Baking at a temperature of 215 ° C or less to form a color pattern.

依據本發明可提供能形成感度或顯影性為良好,同時耐溶劑性為優異的硬化塗膜之樹脂組成物。又,由本發明之樹脂組成物所形成於曝光後、烘烤前之狀態之硬化塗膜係因為具有顯影性,故在各種光阻領域之利用價值極高,且特別是於烘烤後之狀態之硬化塗膜係因為耐溶劑性為優異,故有利於形成彩色濾光器之著色圖型。 According to the present invention, it is possible to provide a resin composition capable of forming a cured coating film which is excellent in sensitivity or developability and excellent in solvent resistance. Further, since the cured coating film formed in the state after exposure and before baking by the resin composition of the present invention has developability, it is highly valuable in various photoresist fields, and particularly in a state after baking. Since the hardened coating film is excellent in solvent resistance, it is advantageous in forming a color pattern of a color filter.

〔圖式簡單說明〕 [Simple description of the diagram]

〔圖1〕本發明之一實施形態的彩色濾光器之剖面圖。 Fig. 1 is a cross-sectional view showing a color filter according to an embodiment of the present invention.

〔實施發明之的最佳形態〕 [Best Practice for Carrying Out the Invention]

本發明之樹脂組成物係含有:含有環氧基及酸基的樹脂(A);含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B);與溶劑(C),其特徵為,相對於含有環氧基及酸基的樹脂(A)中的酸基1莫耳,環氧基為0.5~3.0莫耳。 The resin composition of the present invention contains: an epoxy group and an acid group-containing resin (A); a hydroxyl group-containing polyfunctional (meth) acrylate polybasic acid monoester (B); and a solvent (C), which are characterized The epoxy group is 0.5 to 3.0 mols with respect to the acid group 1 mol in the epoxy group- and acid group-containing resin (A).

本發明中,「(甲基)丙烯酸酯」係意味著選自甲基丙烯酸酯及丙烯酸酯之至少1種。關於「(甲基)丙烯酸」亦為相同。 In the present invention, "(meth) acrylate" means at least one selected from the group consisting of methacrylate and acrylate. The same is true for "(meth)acrylic acid".

使用於本發明的含有環氧基及酸基的樹脂(A),只要是在樹脂中具有環氧基及酸基、且相對於樹脂中的酸基1莫耳存在有環氧基為0.5~3.0莫耳者即可,並未特別限定。酸基並未特別限定,一般可舉例羧基(-COOH)、磷酸基(-PO(OH)2)、磺酸基(-SO3H)等。就本發明之樹脂組成物之硬化性之觀點而言以羧基為較佳。就原料取得容易性、含有環氧基及酸基的樹脂(A)之製造容易性、以及使本發明之樹脂組成物硬化時的耐溶劑性提昇之觀點而言,作為構成單體單位以含有來自於一分子中具有乙烯性碳-碳雙鍵與環氧基的單體(a-1)的單體單位之樹脂為較佳;就顯影性之觀點而言,作為構成單體單位以進而含有來自於不飽和羧酸(a-2)的單體單位之樹脂為又較佳。尚,相對於含有環氧基及酸基的樹脂(A)的酸基 1莫耳之環氧基的莫耳數,若可知構成單體的種類與莫耳比時,可由構成單體之投入比來算出。若由合成後的含有環氧基及酸基的樹脂(A),來算出相對於酸基1莫耳之環氧基的莫耳數時,將由根據JIS K 7236所測定的環氧基當量與根據JIS K 0070所測定的酸價之值來算出。 The epoxy group-containing acid group-containing resin (A) used in the present invention has an epoxy group and an acid group in the resin, and has an epoxy group of 0.5 to the acid group 1 in the resin. 3.0 Moore can be, not particularly limited. The acid group is not particularly limited, and a carboxyl group (-COOH), a phosphate group (-PO(OH) 2 ), a sulfonic acid group (-SO 3 H) or the like can be generally exemplified. From the viewpoint of the curability of the resin composition of the present invention, a carboxyl group is preferred. The ease of obtaining the raw material, the ease of production of the epoxy group-containing and acid group-containing resin (A), and the improvement of the solvent resistance when the resin composition of the present invention is cured are contained as a constituent monomer unit. A resin derived from a monomer unit of a monomer (a-1) having an ethylenic carbon-carbon double bond and an epoxy group in one molecule is preferable; as a constituent monomer unit, from the viewpoint of developability A resin containing a monomer unit derived from the unsaturated carboxylic acid (a-2) is further preferred. Further, when the number of constituent monomers of the epoxy group and the acid group-containing resin (A) is 1 mole of the epoxy group, it can be known that the type of the monomer is a molar ratio. More than to calculate. When the number of moles of the epoxy group based on the acid group 1 mol is calculated from the synthesized epoxy group- and acid group-containing resin (A), the epoxy equivalent weight measured according to JIS K 7236 and Calculated based on the value of the acid value measured by JIS K 0070.

作為單體(a-1),就含有環氧基及酸基的樹脂(A)之製造容易性之觀點而言,以含有環氧基的(甲基)丙烯酸酯為較佳。作為單體(a-1)之具體例,可舉例(甲基)丙烯酸縮水甘油酯、具有脂環式環氧基之(甲基)丙烯酸3,4-環氧環己基甲酯及其內酯加成物(例如(股)DAICEL製Cyclomer(註冊商標)A200、M100)、3,4-環氧環己基甲基-3’,4'-環氧環己烷羧酸酯之單(甲基)丙烯酸酯、(甲基)丙烯酸二環戊烯酯之環氧化物、(甲基)丙烯酸二環戊烯氧基乙酯之環氧化物等。該等中特別就以取得的容易性、反應性之觀點而言,以(甲基)丙烯酸縮水甘油酯為較佳。 The monomer (a-1) is preferably an epoxy group-containing (meth) acrylate from the viewpoint of easiness of production of the epoxy group and the acid group-containing resin (A). Specific examples of the monomer (a-1) include glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate having an alicyclic epoxy group, and a lactone thereof. Adducts (for example, Cyclomer (registered trademark) A200, M100 manufactured by DAICEL, 3,4-epoxycyclohexylmethyl-3', 4'-epoxycyclohexanecarboxylate (methyl) An epoxide such as an acrylate, a dicyclopentenyl (meth)acrylate, or an epoxide of dicyclopentenyloxyethyl (meth)acrylate. Among these, in particular, glycidyl (meth)acrylate is preferred from the viewpoint of ease of availability and reactivity.

作為不飽和羧酸(a-2)之具體例,可舉例(甲基)丙烯酸、丁烯酸、桂皮酸、伊康酸、馬來酸、福馬酸、乙烯基磺酸、2-(甲基)丙烯醯氧基乙基丁二酸、2-丙烯醯氧基乙基鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基六氫鄰苯二甲酸等。就原料取得之觀點而言,以(甲基)丙烯酸及丁烯酸為較佳,(甲基)丙烯酸為又較佳。 Specific examples of the unsaturated carboxylic acid (a-2) include (meth)acrylic acid, crotonic acid, cinnamic acid, itaconic acid, maleic acid, fumaric acid, vinylsulfonic acid, and 2-(methyl group). Propylene methoxyethyl succinic acid, 2-propenyl methoxyethyl phthalic acid, 2-(methyl) propylene methoxyethyl hexahydrophthalic acid, and the like. From the viewpoint of obtaining raw materials, (meth)acrylic acid and crotonic acid are preferred, and (meth)acrylic acid is further preferred.

使用於本發明的含有環氧基及酸基的樹脂(A),作為構成單體單位亦可含有除了單體(a-1)及不 飽和羧酸(a-2)以外的來自於可自由基聚合的單體的單體單位。作為單體(a-1)及不飽和羧酸(a-2)以外的可自由基聚合的單體之具體例,可舉例2-(甲基)丙烯醯氧基乙基酸磷酸酯、丁二烯等的二烯類;(甲基)丙烯酸甲酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸環己酯、1,4-環己烷二甲醇單(甲基)丙烯酸酯、(甲基)丙烯酸松香酯、(甲基)丙烯酸降莰酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸1,1,1-三氟乙酯、(甲基)丙烯酸全氟乙酯、(甲基)丙烯酸三苯基甲酯、(甲基)丙烯酸異苯丙基酯、3-(N,N-二甲基胺基)(甲基)丙烯酸丙酯、甘油單(甲基)丙烯酸酯、戊三醇單(甲基)丙烯酸酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸異莰基酯、(甲基)丙烯酸金剛烷基酯、萘(甲基)丙烯酸酯、等的(甲基)丙烯酸酯類;降莰烯(雙環〔2.2.1〕庚-2-烯)、5-甲基雙環〔2.2.1〕庚-2-烯、5-乙基雙環〔2.2.1〕庚-2-烯、四環〔4.4.0.12,5.17,10〕十二-3-烯、二環戊二烯、三環〔5.2.1.02,6〕癸-8-烯、四環〔4.4.0.12,5.17,10.01,6〕十二-3-烯、五環〔6.5.1.13,6.02,7.09,13〕十五-4-烯、5-降莰烯-2-羧酸、5-降莰烯-2,3-二羧酸酐、(甲基)丙烯酸醯胺、(甲基)丙烯酸N,N-二乙基醯胺、(甲基)丙烯酸蒽基醯胺、(甲基)丙烯醯嗎啉、二丙酮(甲基)丙烯醯胺等的 (甲基)丙烯酸醯胺、(甲基)丙烯醯胺苯、(甲基)丙烯醯基腈、丙烯醛、氯乙烯、偏二氯乙烯、氟乙烯、偏氟乙烯、N-乙烯基吡咯啶酮、乙烯基吡啶、乙酸乙烯酯、乙烯基甲苯等的乙烯基化合物;苯乙烯、苯乙烯的α-、o-、m-、p-烷基、硝基、氰基、醯胺衍生物;檸康酸二乙酯、馬來酸二乙酯等的不飽和二羧酸二酯;N-苯基馬來醯亞胺、N-環己基馬來醯亞胺等的單馬來醯亞胺類;馬來酸酐、伊康酸酐等的不飽和多元酸酐。該等係可單獨或組合2種以上來使用。又,該等中就耐熱性或透明性之觀點而言,以(甲基)丙烯酸苄酯、(甲基)丙烯酸二環戊酯、苯乙烯、乙烯基甲苯、(甲基)丙烯酸異莰基酯、(甲基)丙烯酸金剛烷基酯、降莰烯、N-異丙基(甲基)丙烯醯胺、(甲基)丙烯醯嗎啉、及二丙酮(甲基)丙烯醯胺為較佳,以(甲基)丙烯酸苄酯、(甲基)丙烯酸二環戊酯、苯乙烯、乙烯基甲苯、(甲基)丙烯酸異莰基酯、(甲基)丙烯酸金剛烷基酯、及降莰烯為又較佳。 The epoxy group-containing acid group-containing resin (A) used in the present invention may contain, as a constituent monomer unit, free of monomers other than the monomer (a-1) and the unsaturated carboxylic acid (a-2). The monomer unit of the monomer polymerized. Specific examples of the radically polymerizable monomer other than the monomer (a-1) and the unsaturated carboxylic acid (a-2) include 2-(meth)acryloxyethyl acid phosphate and butyl. a diene such as a diene; methyl (meth)acrylate, isopropyl (meth)acrylate, amyl (meth)acrylate, benzyl (meth)acrylate, isoamyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, dodecyl (meth)acrylate, cyclohexyl (meth)acrylate, 1,4-cyclohexanedimethanol mono(meth)acrylate, ( Methyl) rosin ester, decyl (meth) acrylate, allyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, 1,1,1-trifluoroethyl (meth) acrylate , (fluoro)ethyl (meth)acrylate, triphenylmethyl (meth)acrylate, isophenylpropyl (meth)acrylate, 3-(N,N-dimethylamino)(methyl) Propyl acrylate, glycerol mono(meth) acrylate, glutol mono(meth) acrylate, dicyclopentanyl (meth) acrylate, isodecyl (meth) acrylate, gold (meth) acrylate Alkyl ester, naphthalene (meth) acrylate, etc. (meth) acrylates; decene (double Ring [2.2.1]hept-2-ene), 5-methylbicyclo[2.2.1]hept-2-ene, 5-ethylbicyclo[2.2.1]hept-2-ene, tetracyclo[4.4. 0.1 2,5 .1 7,10 】dodec-3-ene, dicyclopentadiene, tricyclo[5.2.1.0 2,6 ]癸-8-ene, tetracyclo[4.4.0.1 2,5 .1 7,10 .0 1,6 ]dodec-3-ene, pentacyclic [6.5.1.1 3,6 .0 2,7 .0 9,13 ] fifteen-4-ene, 5-northene-2 -carboxylic acid, 5-northene-2,3-dicarboxylic anhydride, decyl (meth) acrylate, N,N-diethyl decyl (meth) acrylate, decyl decyl (meth) acrylate And (meth)acrylic acid morpholine, diacetone (meth) acrylamide, etc. (meth)acrylic acid decylamine, (meth) acrylamide benzene, (meth) acrylonitrile, acrolein, Vinyl compounds such as vinyl chloride, vinylidene chloride, vinyl fluoride, vinylidene fluoride, N-vinyl pyrrolidone, vinyl pyridine, vinyl acetate, vinyl toluene, etc. α-, o of styrene and styrene -, m-, p-alkyl, nitro, cyano, decylamine derivatives; unsaturated dicarboxylic acid diesters such as diethyl citrate, diethyl maleate; N-phenyl Malay Single horse, such as quinone imine, N-cyclohexylmaleimide, etc. Imines; maleic anhydride, itaconic anhydride and the like unsaturated polybasic acid anhydride. These may be used alone or in combination of two or more. Further, in the viewpoints of heat resistance or transparency, benzyl (meth)acrylate, dicyclopentanyl (meth)acrylate, styrene, vinyltoluene, isodecyl (meth)acrylate Ester, adamantyl (meth) acrylate, norbornene, N-isopropyl (meth) acrylamide, (meth) propylene morpholine, and diacetone (meth) acrylamide Preferably, benzyl (meth) acrylate, dicyclopentanyl (meth) acrylate, styrene, vinyl toluene, isodecyl (meth) acrylate, adamantyl (meth) acrylate, and Terpenes are also preferred.

單體(a-1)之調配比例,只要是相對於含有環氧基及酸基的樹脂(A)中的酸基1莫耳存在環氧基為0.5~3.0莫耳即可並未特別限制,相對於含有環氧基及酸基的樹脂(A)的構成單體之合計,較佳為40~90莫耳%,又較佳為50~90莫耳%,更佳為60~80莫耳%。若單體(a-1)之調配比例為40~90莫耳%時,顯影性為良好,同時可得到充分的耐溶劑性。 The proportion of the monomer (a-1) is not particularly limited as long as it is 0.5 to 3.0 moles per 1 mole of the acid group in the resin (A) containing the epoxy group and the acid group. The total of the constituent monomers of the resin (A) containing an epoxy group and an acid group is preferably 40 to 90 mol%, more preferably 50 to 90 mol%, still more preferably 60 to 80 mol. ear%. When the compounding ratio of the monomer (a-1) is 40 to 90 mol%, the developability is good, and sufficient solvent resistance can be obtained.

不飽和羧酸(a-2)之調配比例,只要是相對 於含有環氧基及酸基的樹脂(A)中的酸基1莫耳存在環氧基為0.5~3.0莫耳即可並未特別限制,相對於含有環氧基及酸基的樹脂(A)的構成單體之合計,較佳為10~60莫耳%,又較佳為10~50莫耳%,更佳為20~40莫耳%。藉由不飽和羧酸(a-2)之調配比例為10~60莫耳%,顯影性為良好,同時可得到充分的耐溶劑性。 The proportion of the unsaturated carboxylic acid (a-2), as long as it is relative The acid group 1 mole in the epoxy group- and acid group-containing resin (A) is not particularly limited as long as it has an epoxy group of 0.5 to 3.0 mol, and is equivalent to a resin containing an epoxy group and an acid group (A). The total of the constituent monomers is preferably from 10 to 60 mol%, more preferably from 10 to 50 mol%, still more preferably from 20 to 40 mol%. The blending ratio of the unsaturated carboxylic acid (a-2) is from 10 to 60 mol%, and the developability is good, and sufficient solvent resistance can be obtained.

若使用除了單體(a-1)及不飽和羧酸(a-2)以外的可自由基聚合的單體時,該調配比例並未特別限制,相對於含有環氧基及酸基的樹脂(A)的構成單體之合計,較佳為0莫耳%超過50莫耳%以下,又較佳為0莫耳%超過40莫耳%以下。 When a radically polymerizable monomer other than the monomer (a-1) and the unsaturated carboxylic acid (a-2) is used, the ratio of the compounding is not particularly limited with respect to the resin containing an epoxy group and an acid group. The total of the constituent monomers of (A) is preferably 0 mol% or more and 50 mol% or less, and more preferably 0 mol% or more and more than 40 mol%.

相對於含有環氧基及酸基的樹脂(A)的構成單體單位之合計,以來自於單體(a-1)的單體單位含有40~90莫耳%、及來自於不飽和羧酸(a-2)的單體單位含有10~60莫耳%為又較佳;以來自於單體(a-1)的單體單位含有60~80莫耳%、及來自於不飽和羧酸(a-2)的單體單位含有20~40莫耳%為更佳。 The total of the constituent monomer units of the epoxy (A) group containing the epoxy group and the acid group is 40 to 90 mol%, and the unsaturated carboxyl group is derived from the monomer unit derived from the monomer (a-1). The monomer unit of the acid (a-2) preferably contains 10 to 60 mol%; the monomer unit derived from the monomer (a-1) contains 60 to 80 mol%, and is derived from the unsaturated carboxyl group. The monomer unit of the acid (a-2) is preferably 20 to 40 mol%.

用於製造含有環氧基及酸基的樹脂(A)之共聚合反應係可依據於該技術領域中周知的自由基聚合方法來進行。例如將單體(a-1)、不飽和羧酸(a-2)、以及除了單體(a-1)及不飽和羧酸(a-2)以外的可自由基聚合的單體(任意成分)溶解於溶劑中後,於該溶液中添加聚合起始劑,並以50~130℃下使其反應1~20小時即可。藉由此共聚合反應,可得到具有與單體之調配比例略 同等的單體單位比例之無規則共聚物。 The copolymerization reaction for producing the epoxy group- and acid group-containing resin (A) can be carried out in accordance with a radical polymerization method well known in the art. For example, a monomer (a-1), an unsaturated carboxylic acid (a-2), and a radically polymerizable monomer other than the monomer (a-1) and the unsaturated carboxylic acid (a-2) (optional) After the component is dissolved in a solvent, a polymerization initiator is added to the solution, and the reaction is carried out at 50 to 130 ° C for 1 to 20 hours. By this copolymerization reaction, a ratio of the blending ratio with the monomer can be obtained. A random copolymer of equivalent monomer unit ratio.

作為可使用於此共聚合反應的溶劑,可舉例如乙二醇單甲基醚、三乙二醇單甲基醚、聚乙二醇單甲基醚、乙二醇單乙基醚、二乙二醇單異丙基醚、乙二醇單丁基醚、二乙二醇單己基醚、乙二醇單2-乙基己基醚、乙二醇單烯丙基醚、乙二醇單苯基醚、二乙二醇單苄基醚、乙二醇單乙基醚乙酸酯、丙二醇單甲基醚、丙二醇單丙基醚、丙二醇單甲基醚乙酸酯、乙二醇二甲基醚、二乙二醇甲基乙基醚、及二丙二醇二甲基醚等。該等係可單獨或組合2種以上來使用。 Examples of the solvent which can be used in the copolymerization reaction include ethylene glycol monomethyl ether, triethylene glycol monomethyl ether, polyethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and diethyl ether. Glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monohexyl ether, ethylene glycol mono 2-ethylhexyl ether, ethylene glycol monoallyl ether, ethylene glycol monophenyl Ether, diethylene glycol monobenzyl ether, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monopropyl ether, propylene glycol monomethyl ether acetate, ethylene glycol dimethyl ether , diethylene glycol methyl ethyl ether, and dipropylene glycol dimethyl ether. These may be used alone or in combination of two or more.

溶劑之含水率並未特別限定,以1質量%以下為較佳。若含水率為1質量%以下時,可得到具有更良好的耐溶劑性之含有環氧基及酸基的樹脂(A)。尚,溶劑之含水率係藉由卡爾-費休(Karl-Fisher)法,可依以下條件來進行測定。 The water content of the solvent is not particularly limited, and is preferably 1% by mass or less. When the water content is 1% by mass or less, an epoxy group-containing acid group-containing resin (A) having more excellent solvent resistance can be obtained. Further, the moisture content of the solvent is measured by the Karl-Fisher method under the following conditions.

裝置:京都電子工業(股)製、KF水分計MKA-520 Device: Kyoto Electronics Industry Co., Ltd., KF moisture meter MKA-520

注入量:1mL Injection amount: 1mL

滴定液:AQUAMICRON(註冊商標)滴定劑SS3mg((股)API Corporation製) Titration solution: AQUAMICRON (registered trademark) titrant SS3mg (manufactured by API Corporation)

電極液:AQUAMICRON(註冊商標)脫水溶劑PP((股)API Corporation製) Electrode solution: AQUAMICRON (registered trademark) dehydration solvent PP (manufactured by API Corporation)

製造含有環氧基及酸基的樹脂(A)時之溶劑之調配量並未特別限定,若將含有環氧基及酸基的樹脂(A)的構成單體之合計設為100質量份時,較佳為 30~1000質量份,又較佳為50~800質量份。特別是藉由將溶劑之調配量設為1000質量份以下,不但可抑制因鏈轉移作用而造成的含有環氧基及酸基的樹脂(A)之分子量降低、且可將含有環氧基及酸基的樹脂(A)的黏度控制在適當的範圍內。又,藉由將溶劑之調配量設為30質量份以上,不但防止異常的聚合反應而可將聚合反應穩定來進行,同時亦可防止含有環氧基及酸基的樹脂(A)的著色或凝膠化。 The amount of the solvent to be used in the production of the epoxy group and the acid group-containing resin (A) is not particularly limited, and when the total of the constituent monomers of the epoxy group and the acid group-containing resin (A) is 100 parts by mass. , preferably 30 to 1000 parts by mass, preferably 50 to 800 parts by mass. In particular, by setting the amount of the solvent to be 1000 parts by mass or less, it is possible to suppress not only the molecular weight of the epoxy group-containing acid group-containing resin (A) due to chain transfer but also the epoxy group and The viscosity of the acid-based resin (A) is controlled within an appropriate range. In addition, by setting the amount of the solvent to 30 parts by mass or more, the polymerization reaction can be stabilized without preventing an abnormal polymerization reaction, and the coloring of the epoxy group- or acid group-containing resin (A) can be prevented or Gelatinized.

作為可使用於含有環氧基及酸基的樹脂(A)之製造的聚合起始劑並未特別限定,可舉例如偶氮二異丁腈、偶氮二異戊腈、過氧化苯甲醯、t-丁基過氧基-2-乙基己酸酯等。該等係可單獨或組合2種以上來使用。 The polymerization initiator which can be used for the production of the epoxy group and the acid group-containing resin (A) is not particularly limited, and examples thereof include azobisisobutyronitrile, azobisisovaleronitrile, and benzoyl peroxide. , t-butylperoxy-2-ethylhexanoate, and the like. These may be used alone or in combination of two or more.

聚合起始劑之調配量,若將含有環氧基及酸基的樹脂(A)的構成單體之合計設為100質量份時,較佳為0.5~20質量份,又較佳為1.0~10質量份。 When the total amount of the constituent monomers of the epoxy group and the acid group-containing resin (A) is 100 parts by mass, it is preferably 0.5 to 20 parts by mass, and more preferably 1.0%. 10 parts by mass.

尚,不使用有機溶劑,使用單體(a-1)、不飽和羧酸(a-2)、作為任意成分之除了單體(a-1)及不飽和羧酸(a-2)以外的可自由基聚合的單體、以及聚合起始劑來進行塊狀聚合亦可。 In addition, a monomer (a-1), an unsaturated carboxylic acid (a-2), and an optional component other than the monomer (a-1) and the unsaturated carboxylic acid (a-2) are used without using an organic solvent. The radical polymerization monomer and the polymerization initiator may be used for the bulk polymerization.

可對於藉由上述共聚合反應所得到的含有環氧基及酸基的樹脂(A)進而導入乙烯性碳-碳雙鍵。藉此,樹脂組成物之感度或顯影性將為提昇。 An epoxy carbon-carbon double bond can be further introduced to the epoxy group-containing acid group-containing resin (A) obtained by the above copolymerization reaction. Thereby, the sensitivity or developability of the resin composition will be improved.

例如使構成含有環氧基及酸基的樹脂(A)之來自於不飽和羧酸(a-2)的羧基的一部份、與單體(a-3)加成 來導入乙烯性碳-碳雙鍵亦可,而該單體(a-3)係一分子中具有:與羧基為具有反應性的官能基;與乙烯性碳-碳雙鍵。藉此,含有環氧基及酸基的樹脂(A)係含有使來自於不飽和羧酸(a-2)的羧基的一部份、與單體(a-3)加成而得的具有乙烯性碳-碳雙鍵的構成單體單位,該單體(a-3)係一分子中具有能與羧基反應的官能基與乙烯性碳-碳雙鍵。作為能與羧基反應的官能基,可舉例異氰酸酯基、環氧基、乙烯基醚基等。其中,就加成反應時之反應性之觀點而言以異氰酸酯基為較佳。作為具有環氧基之單體(a-3)係可使用與單體(a-1)所示例為相同者。又,作為具有異氰酸酯基之單體(a-3)並未特別限定,以含有異氰酸酯基的(甲基)丙烯酸酯為較佳,具體而言,可舉例2-(甲基)丙烯醯氧基乙基異氰酸酯、1,1-(雙(甲基)丙烯醯氧基甲基)乙基異氰酸酯、2-(異氰酸酯乙基氧基)乙基(甲基)丙烯酸酯等。該等之中,以一分子中具有異氰酸酯與乙烯性碳-碳雙鍵的單體為較佳,以2-(甲基)丙烯醯氧基乙基異氰酸酯為又較佳。作為具有乙烯基醚基的單體(a-3)並未特別限定,以乙烯基醚(甲基)丙烯酸酯為較佳,具體而言,可舉例(甲基)丙烯酸2-(2-乙烯基氧基乙氧基)乙酯等。 For example, a part of the carboxyl group derived from the unsaturated carboxylic acid (a-2) constituting the epoxy group and the acid group-containing resin (A) and the monomer (a-3) are added. The ethylene carbon-carbon double bond may be introduced, and the monomer (a-3) has a functional group reactive with a carboxyl group in one molecule, and an ethylenic carbon-carbon double bond. Thus, the epoxy group and the acid group-containing resin (A) have a portion obtained by adding a part of a carboxyl group derived from the unsaturated carboxylic acid (a-2) to the monomer (a-3). The monomer unit of the ethylenic carbon-carbon double bond, which has a functional group capable of reacting with a carboxyl group and an ethylenic carbon-carbon double bond in one molecule. Examples of the functional group reactive with a carboxyl group include an isocyanate group, an epoxy group, a vinyl ether group and the like. Among them, an isocyanate group is preferred from the viewpoint of reactivity in the addition reaction. The monomer (a-3) having an epoxy group can be used in the same manner as the monomer (a-1). Further, the monomer (a-3) having an isocyanate group is not particularly limited, and a (meth) acrylate having an isocyanate group is preferable. Specifically, 2-(meth)acryloxyloxy group is exemplified. Ethyl isocyanate, 1,1-(bis(meth)acryloxymethyl)ethyl isocyanate, 2-(isocyanateethyloxy)ethyl (meth)acrylate, and the like. Among these, a monomer having an isocyanate and an ethylenic carbon-carbon double bond in one molecule is preferred, and 2-(meth)acryloxyethyl isocyanate is more preferred. The monomer (a-3) having a vinyl ether group is not particularly limited, and a vinyl ether (meth) acrylate is preferable. Specifically, 2-(2-ethylene) (meth) acrylate can be exemplified. Gethoxyethoxy)ethyl ester and the like.

進而,若含有環氧基及酸基的樹脂(A)包含酸酐基時,使一分子中具有能與酸酐基反應的官能基、及乙烯性碳-碳雙鍵的單體加成後來導入乙烯性碳-碳雙鍵亦可。作為能與酸酐基反應的官能基可舉例羥基。 Further, when the resin (A) containing an epoxy group and an acid group contains an acid anhydride group, a monomer having a functional group capable of reacting with an acid anhydride group and an ethylenic carbon-carbon double bond in one molecule is added and then introduced into ethylene. Carbon-carbon double bonds are also available. As the functional group reactive with the acid anhydride group, a hydroxyl group can be exemplified.

使含有環氧基及酸基的樹脂(A)中的羧基、環氧基或酸酐基、與具有反應性的官能基的單體加成來導入碳-碳雙鍵之反應,係添加與含有環氧基及酸基的樹脂(A)加成的單體、聚合抑制劑、和觸媒,較佳以50~150℃,又較佳以80~130℃來進行反應即可。尚,於此加成反應中,即使是包含使用於上述共聚合反應中之溶劑並無特別問題,故於共聚合反應結束後不用除去溶劑可進行加成反應。 A reaction in which a carboxyl group, an epoxy group or an acid anhydride group in a resin (A) containing an epoxy group and an acid group, and a monomer having a reactive functional group are added to introduce a carbon-carbon double bond, and is added and contained. The epoxy group and the acid group-containing resin (A)-added monomer, polymerization inhibitor, and catalyst are preferably reacted at 50 to 150 ° C, preferably 80 to 130 ° C. Further, in the addition reaction, even if the solvent used in the above copolymerization reaction is not particularly problematic, the addition reaction can be carried out without removing the solvent after completion of the copolymerization reaction.

於此,為了防止含有環氧基及酸基的樹脂(A)的聚合所造成的凝膠化亦可添加聚合抑制劑。作為聚合抑制劑並未特別限定,可舉例如氫醌、甲基氫醌、氫醌單甲基醚等。又,作為觸媒並未特別限定,可舉例如三乙基胺之類的第3級胺、三乙基苄基氯化銨之類的第4級銨鹽、三苯基膦之類的磷化合物、鉻的螯合化合物等。 Here, a polymerization inhibitor may be added in order to prevent gelation by polymerization of the epoxy group and the acid group-containing resin (A). The polymerization inhibitor is not particularly limited, and examples thereof include hydroquinone, methylhydroquinone, and hydroquinone monomethyl ether. Further, the catalyst is not particularly limited, and examples thereof include a third-order amine such as triethylamine, a fourth-order ammonium salt such as triethylbenzylammonium chloride, and a phosphorus such as triphenylphosphine. a compound, a chelating compound of chromium, and the like.

使用於本發明的含有環氧基及酸基的樹脂(A)之酸價(JIS K6901:2008 5.3.2)並無限制,若使用於彩色濾光器用途時,較佳為10~350mgKOH/g,又較佳為30~200mgKOH/g,更佳為50~180mgKOH/g,特佳為70~150mgKOH/g。若此酸價為10mgKOH/g以上時,可得到充分的顯影性。另一方面,若此酸價為350mgKOH/g以下時,曝光部分(光硬化部分)對於鹼顯影液將不會溶解,而可得到充分的顯影性。 The acid value (JIS K6901: 2008 5.3.2) of the epoxy group-containing acid group-containing resin (A) used in the present invention is not limited, and when used in a color filter, it is preferably 10 to 350 mgKOH/ g is preferably from 30 to 200 mgKOH/g, more preferably from 50 to 180 mgKOH/g, and particularly preferably from 70 to 150 mgKOH/g. When the acid value is 10 mgKOH/g or more, sufficient developability can be obtained. On the other hand, when the acid value is 350 mgKOH/g or less, the exposed portion (photohardenable portion) will not dissolve in the alkali developing solution, and sufficient developability can be obtained.

又,含有環氧基及酸基的樹脂(A)之分子量(使用後述之凝膠滲透層析法(GPC)所測定的聚苯乙烯換算之 重量平均分子量),較佳為1000~50000,又較佳為3000~40000。若該分子量為1000以上時,於顯影後沒有發生著色圖型之缺損之情形,而可得到良好的感度。另一方面,若該分子量為50000以下時,顯影時間將非常短而為實用。 Further, the molecular weight of the resin (A) containing an epoxy group and an acid group (in terms of polystyrene measured by gel permeation chromatography (GPC) described later) The weight average molecular weight) is preferably from 1,000 to 50,000, and more preferably from 3,000 to 40,000. When the molecular weight is 1,000 or more, no defect of the coloring pattern occurs after development, and good sensitivity can be obtained. On the other hand, when the molecular weight is 50,000 or less, the development time is extremely short and practical.

又,若含有環氧基及酸基的樹脂(A)為具有不飽和基時,該不飽和基當量並無限制,較佳為100~4000g/mol,又較佳為200~3000g/mol。若該不飽和基當量為100g/mol以上時,對於可進一步提高耐熱分解性、及耐熱黃變性而言為有效果。另一方面,若該不飽和基當量為4000g/mol以下時,對於可進一步提高感度而言為有效果。 Further, when the epoxy group and the acid group-containing resin (A) have an unsaturated group, the unsaturated group equivalent is not particularly limited, and is preferably from 100 to 4,000 g/mol, more preferably from 200 to 3,000 g/mol. When the unsaturated group equivalent is 100 g/mol or more, it is effective in further improving thermal decomposition resistance and heat yellowing resistance. On the other hand, when the unsaturated group equivalent is 4000 g/mol or less, it is effective in further improving the sensitivity.

本發明之樹脂組成物係含有「含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)」。作為含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B),可舉例如季戊四醇的二或三(甲基)丙烯酸酯的多元酸單酯、二季戊四醇的二、三、四或五(甲基)丙烯酸酯的多元酸單酯,具體而言,可舉例對於二季戊四醇五丙烯酸酯丁二酸改性物、季戊四醇三丙烯酸酯丁二酸改性物、二季戊四醇五丙烯酸酯鄰苯二甲酸改性物、季戊四醇三丙烯酸酯鄰苯二甲酸改性物等含有羥基的多官能(甲基)丙烯酸酯之羥基加成酸酐而成之多元酸改性物。該等係可單獨或組合2種以上來使用。該等之中,就耐溶劑性之觀點而言,以含有羥基的多官能(甲基)丙烯酸酯的丁二酸改性 物為較佳。 The resin composition of the present invention contains a polyhydric acid monoester (B) having a polyfunctional (meth) acrylate having a hydroxyl group. Examples of the polybasic acid monoester (B) containing a hydroxyl group-containing polyfunctional (meth) acrylate include a polybasic acid monoester of di- or tri(meth)acrylate of pentaerythritol, and two, three, or four of dipentaerythritol. A polybasic acid monoester of penta (meth) acrylate, specifically, for dipentaerythritol pentaacrylate succinic acid modification, pentaerythritol triacrylate succinic acid modification, dipentaerythritol pentaacrylate phthalic acid A polybasic acid modified product obtained by modifying a hydroxy group-forming anhydride of a hydroxyl group-containing polyfunctional (meth) acrylate such as a dicarboxylic acid modified product or a pentaerythritol triacrylate phthalic acid modified product. These may be used alone or in combination of two or more. Among these, from the viewpoint of solvent resistance, succinic acid modification with a polyfunctional (meth) acrylate containing a hydroxyl group The object is preferred.

含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)之調配量,相對於(A)成分與(B)成分的總和,較佳為10~90質量%,又較佳為20~80質量%,更佳為25~70質量%。只要是此範圍之調配量,將成為具有適當的黏度之樹脂組成物,且藉由調配後述之光聚合起始劑(D)而具有適當的光硬化性。 The compounding amount of the polyfunctional (meth) acrylate polybasic acid monoester (B) having a hydroxyl group is preferably from 10 to 90% by mass, more preferably from 10 to 90% by mass based on the total of the components (A) and (B). 20 to 80% by mass, more preferably 25 to 70% by mass. As long as it is a compounding amount in this range, it will become a resin composition which has a suitable viscosity, and it has suitable photocurability by mixing the photopolymerization initiator (D) mentioned later.

本發明之樹脂組成物係含有溶劑(C)。作為溶劑(C),只要是可溶解「含有環氧基及酸基的樹脂(A)」及「含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)」、且不與該等反應之惰性的溶劑即可並未特別限定。 The resin composition of the present invention contains a solvent (C). The solvent (C) is a polybasic acid monoester (B) which can dissolve the "epoxy group and acid group-containing resin (A)" and the "hydroxy group-containing polyfunctional (meth) acrylate", and does not The inert solvent of the reaction is not particularly limited.

作為溶劑(C),可使用於製造含有環氧基及酸基的樹脂(A)時之共聚合反應所用之溶劑為相同者,亦可直接使用於共聚合反應後所包含之溶劑。於本發明之樹脂組成物之調製時亦可進而添加溶劑。或於添加後述之其他成分時,亦可直接使用與該等成分共存之溶劑。作為溶劑(C)之具體例,可舉例丙二醇單甲基醚、丙二醇單甲基醚乙酸酯、二丙二醇單甲基醚乙酸酯、乙酸乙酯、乙酸丁酯、乙酸異丙酯、二丙二醇單甲基醚、三丙二醇單甲基醚、乙二醇單甲基醚、二乙二醇單甲基醚、甲基乙基酮、甲基異丁基酮、環己酮、乙二醇單乙基醚乙酸酯、二乙二醇單乙基醚乙酸酯等。該等係可單獨或組合2種以上來使用。又,該等之中,以於製造含有環氧基及酸基的樹脂 (A)時之共聚合反應中所使用之丙二醇單甲基醚、丙二醇單甲基醚乙酸酯等的二醇醚系溶劑為較佳。 The solvent (C) can be used in the same manner as the solvent used for the copolymerization reaction for producing the epoxy group and the acid group-containing resin (A), and can be used as it is in the solvent after the copolymerization reaction. Further, a solvent may be added in the preparation of the resin composition of the present invention. Alternatively, when adding other components described later, a solvent which coexists with the components may be used as it is. Specific examples of the solvent (C) include propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether acetate, ethyl acetate, butyl acetate, isopropyl acetate, and Propylene glycol monomethyl ether, tripropylene glycol monomethyl ether, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, ethylene glycol Monoethyl ether acetate, diethylene glycol monoethyl ether acetate, and the like. These may be used alone or in combination of two or more. Moreover, among these, a resin containing an epoxy group and an acid group is produced. A glycol ether solvent such as propylene glycol monomethyl ether or propylene glycol monomethyl ether acetate used in the copolymerization reaction at the time of (A) is preferred.

溶劑(C)之調配量,若將除去本發明之樹脂組成物中之溶劑(C)的成分之總和設為100質量份時,較佳為30~1000質量份,又較佳為50~800質量份,更佳為100~700質量份。只要是此範圍之調配量,將成為具有適當的黏度之樹脂組成物。 When the total amount of the solvent (C) in the resin composition of the present invention is 100 parts by mass, it is preferably 30 to 1000 parts by mass, and more preferably 50 to 800. The mass fraction is more preferably 100 to 700 parts by mass. As long as it is a blending amount in this range, it will become a resin composition having an appropriate viscosity.

將本發明之樹脂組成物使用於彩色濾光器的著色圖型之形成時,以進而調配光聚合起始劑(D)及著色劑(E)來使用。 When the resin composition of the present invention is used in the formation of a color pattern of a color filter, the photopolymerization initiator (D) and the color former (E) are further used.

作為光聚合起始劑(D)並未特別限定,可舉例如安息香、安息香甲基醚等的安息香與該烷基醚類;苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、1,1-二氯苯乙酮、4-(1-t-丁基二氧基-1-甲基乙基)苯乙酮等的苯乙酮類;1-羥基環己基苯基酮、2-羥基-2-甲基-1-苯基丙烷-1-酮等的苯烷基酮類;2-甲基蒽醌、2-戊基蒽醌、2-t-丁基蒽醌、1-氯蒽醌等的蒽醌類;2,4-二甲基噻噸酮、2,4-二異丙基噻噸酮、2-氯噻噸酮等的噻噸酮類;苯乙酮二甲基縮酮、苄基二甲基縮酮等的縮酮類;二苯基酮、4-(1-t-丁基二氧基-1-甲基乙基)二苯基酮、3,3’,4,4'-肆(t-丁基二氧基羰基)二苯基酮等的二苯基酮類;1,2-辛二酮、1-〔4-(苯硫基)-,2-(O-苯甲醯肟)〕、乙酮、1-〔9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基〕-,1-(0-乙醯肟)等的肟酯類;2-甲基-1-〔4-(甲硫基)苯基〕-2-嗎啉基-丙烷-1- 酮;2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)丁酮-1;2,4,6-三甲基苯甲醯基二苯基膦氧化物、雙(2,4,6-三甲基苯甲醯基)苯基膦氧化物等的醯基膦氧化物類;及呫噸酮類等。該等係可單獨或組合2種以上來使用。 The photopolymerization initiator (D) is not particularly limited, and examples thereof include benzoin such as benzoin and benzoin methyl ether, and the alkyl ethers; acetophenone and 2,2-dimethoxy-2-phenyl group; Acetophenones such as acetophenone, 1,1-dichloroacetophenone, 4-(1-t-butyldioxy-1-methylethyl)acetophenone; 1-hydroxycyclohexylbenzene Phenyl ketones such as ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one; 2-methylindole, 2-pentylindole, 2-t-butylindole Anthraquinones such as hydrazine and 1-chloroindole; thioxanthones such as 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone and 2-chlorothioxanthone; benzene a ketal such as ethyl ketone dimethyl ketal or benzyl dimethyl ketal; diphenyl ketone, 4-(1-t-butyldioxy-1-methylethyl) diphenyl ketone Diphenyl ketones such as 3,3',4,4'-fluorene (t-butyldioxycarbonyl)diphenyl ketone; 1,2-octanedione, 1-[4-(phenylsulfonate) Base, -, 2-(O-benzhydrazide), ethyl ketone, 1-[9-ethyl-6-(2-methylbenzhydryl)-9H-indazol-3-yl]- , an oxime ester such as 1-(0-acetamidine); 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinyl-propane-1- Ketone; 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butanone-1; 2,4,6-trimethylbenzimidyldiphenylphosphine oxide And mercaptophosphine oxides such as bis(2,4,6-trimethylbenzylidene)phenylphosphine oxide; and xanthone. These may be used alone or in combination of two or more.

光聚合起始劑(D)之調配量,若將(A)成分與(B)成分之總和設為100質量份時,較佳為0.1~30質量份,又較佳為0.5~20質量份,更佳為1~15質量份。只要是此範圍之調配量,將可成為具有適當的光硬化性之樹脂組成物。 When the total amount of the component (A) and the component (B) is 100 parts by mass, the amount of the photopolymerization initiator (D) is preferably 0.1 to 30 parts by mass, more preferably 0.5 to 20 parts by mass. More preferably, it is 1 to 15 parts by mass. As long as it is a blending amount in this range, it can be a resin composition having appropriate photocurability.

著色劑(E)只要是可溶解或分散於本發明之樹脂組成物中者,並未特別限定,可舉例如染料或顏料等。 The coloring agent (E) is not particularly limited as long as it is soluble or dispersible in the resin composition of the present invention, and examples thereof include a dye and a pigment.

特別是本發明之樹脂組成物即使如後述般以較低的溫度(215℃以下)下進行烘烤,因為可得到充分的耐溶劑性,故具有染料不易因熱而產生劣化之優點。因此,本發明之樹脂組成物可更加自由地使用多種類的染料來得到著色圖型。 In particular, the resin composition of the present invention is baked at a relatively low temperature (215 ° C or lower) as described later, and since sufficient solvent resistance can be obtained, there is an advantage that the dye is less likely to be deteriorated by heat. Therefore, the resin composition of the present invention can use a plurality of types of dyes more freely to obtain a colored pattern.

作為染料,就對於本發明之樹脂組成物之溶解性或分散性、與樹脂組成物中之其他成分之相互作用、耐熱性等的觀點而言,以使用具有羧基等的酸性基之酸性染料、與酸性染料的氮化合物之鹽、酸性染料的磺醯胺體等為較佳。作為如此般染料之例子,可舉例acid alizarin violet N;acid black1、2、24、48;acid blue1、7、9、25、29、40、45、62、70、74、80、83、90、92、112、 113、120、129、147;acid chrome violet K;acid Fuchsin;acid green1、3、5、25、27、50;acid orange6、7、8、10、12、50、51、52、56、63、74、95;acid red1、4、8、14、17、18、26、27、29、31、34、35、37、42、44、50、51、52、57、69、73、80、87、88、91、92、94、97、103、111、114、129、133、134、138、143、145、150、151、158、176、183、198、211、215、216、217、249、252、257、260、266、274;acid violet 6B、7、9、17、19;acid yellow1、3、9、11、17、23、25、29、34、36、42、54、72、73、76、79、98、99、111、112、114、116;food yellow3;VALIFAST Blue2620及該等的衍生物等。該等之中,以偶氮系、呫噸系、蒽醌系或酞青素系的酸性染料為較佳。該等係可因應於目的之畫素顏色可以單獨或組合2種以上來使用。 The dye is an acid dye having an acidic group having a carboxyl group or the like from the viewpoints of solubility or dispersibility of the resin composition of the present invention, interaction with other components in the resin composition, heat resistance, and the like. A salt of a nitrogen compound of an acid dye, a sulfonamide of an acid dye, or the like is preferred. As an example of such a dye, acid alizarin violet N; acid black 1, 2, 24, 48; acid blue 1, 7, 9, 25, 29, 40, 45, 62, 70, 74, 80, 83, 90, 92, 112, 113, 120, 129, 147; acid chrome violet K; acid Fuchsin; acid green 1, 3, 5, 25, 27, 50; acid orange 6, 7, 8, 10, 12, 50, 51, 52, 56, 63, 74,95; acid red1,4,8,14,17,18,26,27,29,31,34,35,37,42,44,50,51,52,57,69,73,80,87 , 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 183, 198, 211, 215, 216, 217, 249 , 252, 257, 260, 266, 274; acid violet 6B, 7, 9, 17, 19; acid yellow1,3,9,11,17,23,25,29,34,36,42,54,72, 73, 76, 79, 98, 99, 111, 112, 114, 116; food yellow3; VALIFAST Blue 2620 and such derivatives. Among these, an acid dye of an azo type, a xanthene type, an anthraquinone type or an anthraquinone type is preferable. These may be used alone or in combination of two or more depending on the color of the pixel.

作為顏料之例子,可舉例C.I.Pigment Yellow1、3、12、13、14、15、16、17、20、24、31、53、83、86、93、94、109、110、117、125、128、137、138、139、147、148、150、153、154、166、173、194、214等的黃色顏料;C.I.Pigment Orange13、31、36、38、40、42、43、51、55、59、61、64、65、71、73等的橘色顏料;C.I.Pigment Red9、97、105、122、123、144、149、166、168、176、177、180、192、209、215、216、224、242、254、255、264、265等的紅色顏料; C.I.Pigment Blue15、15:3、15:4、15:6、60等的藍色顏料;C.I.Pigment Violet1、19、23、29、32、36、38等的紫色顏料;C.I.pigment green 7、36、58等的綠色顏料;C.I.Pigment Brown23、25等的褐色顏料;C.I.Pigment Black1、7、碳黑、鈦黑、氧化鐵等的黑色顏料等。該等係可因應於目的之畫素顏色可以單獨或組合2種以上來使用。 As examples of the pigment, CIPigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128 can be exemplified. Yellow pigments of 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 194, 214, etc.; CIPigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59 Orange pigments of 61, 64, 65, 71, 73, etc.; CIPigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 209, 215, 216, Red pigments of 224, 242, 254, 255, 264, 265, etc.; CIPigment Blue15, 15:3, 15:4, 15:6, 60, etc. blue pigment; CIPigment Violet1, 19, 23, 29, 32, 36, 38, etc. purple pigment; CIpigment green 7, 36, A green pigment such as 58; a brown pigment such as CIPigment Brown 23 or 25; a black pigment such as CIPigment Black 1, 7, carbon black, titanium black, or iron oxide. These may be used alone or in combination of two or more depending on the color of the pixel.

尚,因應於目的之畫素顏色,亦可組合上述染料及顏料來使用。 In addition, the dyes and pigments described above may be used in combination with the color of the target.

若調配著色劑(E)時,該調配量相對於除去本發明之樹脂組成物中之溶劑(C)的成分之總和100質量份,較佳為5~80質量份,又較佳為5~70質量份,更佳為10~60質量份。 When the coloring agent (E) is blended, the blending amount is preferably from 5 to 80 parts by mass, more preferably from 5 to 80 parts by mass, per 100 parts by mass of the total of the components of the solvent (C) in the resin composition of the present invention. 70 parts by mass, more preferably 10 to 60 parts by mass.

若使用顏料來作為著色劑(E)時,就使顏料之分散性提昇之觀點而言,將周知的分散劑調配於樹脂組成物中亦可。作為分散劑係以使用經時的分散穩定性為優異之高分子分散劑為較佳。作為高分子分散劑之例子,可舉例胺基甲酸乙酯系分散劑、聚乙烯亞胺系分散劑、聚氧乙烯烷基醚系分散劑、聚氧乙二醇二酯系分散劑、去水山梨醇脂肪族酯系分散劑、脂肪族改性酯系分散劑等。作為如此般高分子分散劑,亦可使用以EFKA(註冊商標、FK chemicals BV(BASF)公司製)、Disperbyk(註冊商標、BYK Chemie.Japan(股)製)、Disparlon(註冊商標、楠本化成(股)製)、SOLSPERSE(註冊商標、 Lubrizo公司製)等的商品名所市售者。 When a pigment is used as the coloring agent (E), a known dispersing agent may be blended in the resin composition from the viewpoint of improving the dispersibility of the pigment. As the dispersant, a polymer dispersant excellent in dispersion stability over time is preferably used. Examples of the polymer dispersant include a urethane dispersant, a polyethyleneimine dispersant, a polyoxyethylene alkyl ether dispersant, a polyoxyethylene glycol diester dispersant, and dewatering. A sorbitol aliphatic ester dispersant, an aliphatic modified ester dispersant, or the like. As such a polymer dispersant, EFKA (registered trademark, FK chemicals BV (BASF) company), Disperbyk (registered trademark, BYK Chemie. Japan), Disparlon (registered trademark, Nanben Chemical Co., Ltd.) can be used. Stock system), SOLSPERSE (registered trademark, A trade name of a product such as Lubrizo Co., Ltd.).

分散劑之調配量係因應所使用之顏料等的種類來適當設定即可。 The blending amount of the dispersing agent may be appropriately set depending on the type of the pigment or the like to be used.

若將本發明之樹脂組成物使用於彩色濾光器之著色圖型之形成時,含有環氧基及酸基的樹脂(A)、含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)、溶劑(C)、光聚合起始劑(D)及著色劑(E)之調配量,較佳為相對於(A)成分與(B)成分之總和,以含有環氧基及酸基的樹脂(A)為90~10質量%、含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)為10~90質量%;若將除去樹脂組成物中之溶劑(C)的成分之總和設為100質量份時,以溶劑(C)為30~1000質量份;若將(A)成分與(B)成分之總和設為100質量份時,以光聚合起始劑(D)為0.1~30質量份;將除去樹脂組成物中之溶劑(C)的成分之總和設為100質量份時,以著色劑(E)為5~80質量份。又較佳為相對於(A)成分與(B)成分之總和,以含有環氧基及酸基的樹脂(A)為80~20質量%、含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)為20~80質量%;若將除去樹脂組成物中之溶劑(C)的成分之總和設為100質量份時,以溶劑(C)為50~800質量份;若將(A)成分與(B)成分之總和設為100質量份時,以光聚合起始劑(D)為0.5~20質量份;若將除去樹脂組成物中之溶劑(C)的成分之總和設為100質量份時,以著色劑(E) 為5~70質量份。更佳為相對於(A)成分與(B)成分之總和,以含有環氧基及酸基的樹脂(A)為75~30質量%、含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)為25~70質量%;若將除去樹脂組成物中之溶劑(C)的成分之總和設為100質量份時,以溶劑(C)為100~700質量份;若將(A)成分與(B)成分之總和設為100質量份時,以光聚合起始劑(D)為1~15質量份;若將除去樹脂組成物中之溶劑(C)的成分之總和設為100質量份時,以著色劑(E)為10~60質量份。 When the resin composition of the present invention is used in the formation of a color pattern of a color filter, a resin (A) containing an epoxy group and an acid group, and a polybasic acid group containing a polyfunctional (meth) acrylate having a hydroxyl group. The compounding amount of the ester (B), the solvent (C), the photopolymerization initiator (D), and the coloring agent (E) is preferably a ratio of the components (A) and (B) to the epoxy group. The acid-based resin (A) is 90 to 10% by mass, and the hydroxyl group-containing polyfunctional (meth) acrylate polybasic acid monoester (B) is 10 to 90% by mass; if the solvent in the resin composition is removed When the total of the components (C) is 100 parts by mass, the solvent (C) is 30 to 1000 parts by mass, and when the total of the components (A) and (B) is 100 parts by mass, photopolymerization is used. The starting agent (D) is 0.1 to 30 parts by mass, and when the total of the components of the solvent (C) in the resin composition is removed to 100 parts by mass, the coloring agent (E) is used in an amount of 5 to 80 parts by mass. Further, it is preferably a polyfunctional (meth) acrylate having a hydroxyl group of 80 to 20% by mass based on the total of the components (A) and (B), and the resin (A) containing an epoxy group and an acid group. The polybasic acid monoester (B) is 20 to 80% by mass; and when the total of the components of the solvent (C) in the resin composition is removed to 100 parts by mass, the solvent (C) is 50 to 800 parts by mass; When the total of the component (A) and the component (B) is 100 parts by mass, the photopolymerization initiator (D) is used in an amount of 0.5 to 20 parts by mass; if the component of the solvent (C) in the resin composition is removed, When the sum is set to 100 parts by mass, the coloring agent (E) It is 5 to 70 parts by mass. More preferably, it is a polyfunctional (meth) acrylate having a hydroxyl group-containing resin (A) in an amount of 75 to 30% by mass based on the total of the (A) component and the (B) component. The acid monoester (B) is 25 to 70% by mass; and when the total of the components of the solvent (C) in the resin composition is removed to 100 parts by mass, the solvent (C) is 100 to 700 parts by mass; When the total of the components (A) and (B) is 100 parts by mass, the photopolymerization initiator (D) is 1 to 15 parts by mass; and the sum of the components of the solvent (C) in the resin composition is removed. When it is 100 parts by mass, the coloring agent (E) is used in an amount of 10 to 60 parts by mass.

即使本發明之樹脂組成物不包含著色劑(E)時,含有環氧基及酸基的樹脂(A)、含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)、溶劑(C)及光聚合起始劑(D)之調配量仍可適用上述數值。 Even when the resin composition of the present invention does not contain the colorant (E), the epoxy group and the acid group-containing resin (A), the hydroxyl group-containing polyfunctional (meth) acrylate polybasic acid monoester (B), and the solvent The above values can still be applied to the blending amount of (C) and photopolymerization initiator (D).

相同地,即使本發明之樹脂組成物不包含光聚合起始劑(D)及著色劑(E)時,含有環氧基及酸基的樹脂(A)、含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)及溶劑(C)之調配量仍可適用上述數值。 Similarly, even if the resin composition of the present invention does not contain the photopolymerization initiator (D) and the color former (E), the epoxy group and the acid group-containing resin (A) and the hydroxyl group-containing polyfunctional (meth) group The above-mentioned values can still be applied to the compounding amount of the acrylate polybasic acid monoester (B) and the solvent (C).

本發明之樹脂組成物,除了上述成分以外,為了賦予指定特性,亦可調配周知的偶合劑、均勻劑、熱聚合抑制劑等的周知的添加劑。該等的添加劑之調配量只要不阻礙本發明的效果之範圍內並未特別限定。 In addition to the above components, the resin composition of the present invention may be formulated with a well-known additive such as a known coupling agent, a homogenizer, or a thermal polymerization inhibitor in order to impart a specified characteristic. The amount of the additives to be added is not particularly limited as long as it does not impair the effects of the present invention.

本發明之樹脂組成物係可藉由使用周知的混合裝置混合上述成分來進行製造。 The resin composition of the present invention can be produced by mixing the above components using a well-known mixing device.

尚,本發明之樹脂組成物首先調製含有環氧基及酸基 的樹脂(A)、含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)及溶劑(C)之樹脂組成物後,將光聚合起始劑(D)及任意的著色劑(E)混合後來製造亦為可能。尚,本發明之樹脂組成物除了可使用於彩色濾光器之著色圖型之形成以外,亦可使用於其他的用途。 Further, the resin composition of the present invention is first prepared to contain an epoxy group and an acid group. After the resin (A), the polyfunctional acid monoester (B) of the hydroxyl group-containing poly (meth) acrylate, and the resin composition of the solvent (C), the photopolymerization initiator (D) and any color former are used. (E) It is also possible to mix and manufacture later. Further, the resin composition of the present invention can be used for other purposes in addition to the formation of a color pattern for a color filter.

如上述之方式所得到的本發明之樹脂組成物係因為具有鹼顯影性,故可藉由使用鹼水溶液來進行顯影。特別是本發明之樹脂組成物係可賦予感度或顯影性為優異,同時耐溶劑性為優異之硬化塗膜。因此,本發明之樹脂組成物適合使用作為各種光阻、特別是適用於形成有機EL顯示器、液晶顯示裝置、固體攝影元件所內建的彩色濾光器之著色圖型所使用的光阻。又,本發明之樹脂組成物係因為可賦予耐溶劑性等的特性為優異之硬化塗膜,故亦可使用於各種塗敷、接著劑、印刷油墨用黏結劑等。 Since the resin composition of the present invention obtained as described above has alkali developability, development can be carried out by using an aqueous alkali solution. In particular, the resin composition of the present invention can provide a cured coating film which is excellent in sensitivity or developability and excellent in solvent resistance. Therefore, the resin composition of the present invention is suitably used as a photoresist used as a color pattern of various photoresists, particularly for forming a color filter built in an organic EL display, a liquid crystal display device, or a solid-state imaging device. Moreover, since the resin composition of the present invention is a cured coating film which is excellent in properties such as solvent resistance, it can be used in various coatings, adhesives, and binders for printing inks.

接著,對於使用本發明之樹脂組成物所製造的彩色濾光器來作說明。本發明的彩色濾光器係具有由上述樹脂組成物所得到的著色圖型。 Next, a description will be given of a color filter manufactured using the resin composition of the present invention. The color filter of the present invention has a coloring pattern obtained from the above resin composition.

以下對於本發明之一實施形態之彩色濾光器使用圖面來作說明。 Hereinafter, a color filter according to an embodiment of the present invention will be described using a drawing.

圖1係本發明之一實施形態之彩色濾光器之剖面圖。在圖1中,彩色濾光器係由:基板1;形成於基板1上之RGB的畫素2及形成畫素2的交界之黑色矩陣3;形成於畫素2及黑色矩陣3上之保護膜4所構成。在此構成中,除了畫素2及黑色矩陣3(著色圖型)之至少一個係使用 上述樹脂組成物所形成以外,其他的構成係可採用周知者。尚,圖1所表示的彩色濾光器係為一例子,並不受此構成所侷限。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing a color filter according to an embodiment of the present invention. In FIG. 1, the color filter is composed of: a substrate 1; RGB pixels 2 formed on the substrate 1 and a black matrix 3 forming a boundary of the pixel 2; protection formed on the pixel 2 and the black matrix 3. The film 4 is composed of. In this configuration, at least one of the pixel 2 and the black matrix 3 (coloring pattern) is used. Other than the formation of the above resin composition, other configurations can be employed. Further, the color filter shown in Fig. 1 is an example and is not limited by this configuration.

接著,對於本發明之一實施形態之彩色濾光器之製造方法來作說明。 Next, a method of manufacturing a color filter according to an embodiment of the present invention will be described.

首先,在基板1上形成著色圖型。具體而言,在基板1上依序形成黑色矩陣3及畫素2。於此,作為基板1並未特別限定,可使用玻璃基板、矽基板、聚碳酸酯基板、聚酯基板、聚醯胺基板、聚醯胺醯亞胺基板、聚醯亞胺基板、鋁基板、印刷電路基板、陣列基板等。 First, a color pattern is formed on the substrate 1. Specifically, the black matrix 3 and the pixel 2 are sequentially formed on the substrate 1. Here, the substrate 1 is not particularly limited, and a glass substrate, a tantalum substrate, a polycarbonate substrate, a polyester substrate, a polyamide substrate, a polyimide substrate, a polyimide substrate, an aluminum substrate, or the like can be used. Printed circuit board, array substrate, and the like.

著色圖型係可藉由使用光微影工法來形成。具體而言,將上述樹脂組成物塗佈於基板1上形成塗佈膜後,介隔著指定圖型的光罩將塗佈膜曝光,而使曝光部分光硬化。又,未曝光部分以鹼水溶液顯影後,藉由烘烤可形成指定圖型。 The coloring pattern can be formed by using a photolithography method. Specifically, after the resin composition is applied onto the substrate 1 to form a coating film, the coating film is exposed through a mask of a predetermined pattern, and the exposed portion is photocured. Further, after the unexposed portion is developed with an aqueous alkali solution, a prescribed pattern can be formed by baking.

作為樹脂組成物之塗佈方法並未特別限定,可使用網版印刷法、輥式塗佈法、簾式塗佈法、噴霧塗佈法、旋轉塗布法等。又,於樹脂組成物之塗佈後,因應所需藉由使用循環式烘箱、紅外線加熱器、加熱板等的加熱方法來加熱,而使溶劑(C)等的揮發成分揮發亦可。加熱條件並未特別限定,因應所使用之樹脂組成物之種類適宜設定即可。一般而言,在50℃~120℃的溫度下加熱30秒鐘~30分鐘即可。 The coating method of the resin composition is not particularly limited, and a screen printing method, a roll coating method, a curtain coating method, a spray coating method, a spin coating method, or the like can be used. In addition, after the application of the resin composition, the volatile component such as the solvent (C) may be volatilized by heating by a heating method such as a circulating oven, an infrared heater, or a hot plate. The heating conditions are not particularly limited, and may be appropriately set depending on the type of the resin composition to be used. In general, it can be heated at a temperature of 50 ° C to 120 ° C for 30 seconds to 30 minutes.

作為曝光所使用之光源並未特別限定,可使 用低壓水銀燈、中壓水銀燈、高壓水銀燈、氙燈、金屬鹵素燈等。又,曝光量亦未特別限定,因應所使用之樹脂組成物之種類適當調整即可。 The light source used for the exposure is not particularly limited, and Use low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, xenon lamps, metal halide lamps, etc. Further, the amount of exposure is not particularly limited, and may be appropriately adjusted depending on the type of the resin composition to be used.

作為顯影所使用之鹼水溶液並未特別限定,可使用碳酸鈉、碳酸鉀、碳酸鈣、氫氧化鈉、氫氧化鉀等的水溶液;乙基胺、二乙基胺、二甲基乙醇胺等的胺系化合物之水溶液;3-甲基-4-胺基-N,N-二乙基苯胺、3-甲基-4-胺基-N-乙基-N-β-羥基乙基苯胺、3-甲基-4-胺基-N-乙基-N-β-甲烷磺醯胺乙基苯胺、3-甲基-4-胺基-N-乙基-N-β-甲氧基乙基苯胺及該等的硫酸鹽、鹽酸鹽或p-甲苯磺酸鹽等的p-苯二胺系化合物之水溶液等。該等之中,以使用p-苯二胺系化合物之水溶液為較佳。尚,於該等的水溶液中,因應所需亦可添加消泡劑或界面活性劑。又,藉由上述鹼水溶液而使顯影後,以進行水洗並使其乾燥為較佳。 The aqueous alkali solution used for development is not particularly limited, and an aqueous solution of sodium carbonate, potassium carbonate, calcium carbonate, sodium hydroxide or potassium hydroxide; an amine such as ethylamine, diethylamine or dimethylethanolamine can be used. An aqueous solution of a compound; 3-methyl-4-amino-N,N-diethylaniline, 3-methyl-4-amino-N-ethyl-N-β-hydroxyethylaniline, 3- Methyl-4-amino-N-ethyl-N-β-methanesulfonamide ethyl aniline, 3-methyl-4-amino-N-ethyl-N-β-methoxyethylaniline And an aqueous solution of a p-phenylenediamine compound such as a sulfate, a hydrochloride or a p-toluenesulfonate. Among these, an aqueous solution using a p-phenylenediamine compound is preferred. Further, in such aqueous solutions, an antifoaming agent or a surfactant may be added as needed. Further, it is preferred to carry out water washing and drying after the development by the aqueous alkali solution.

烘烤之條件並未特別限定,因應所使用之樹脂組成物的種類來進行加熱處理即可,但藉由使用本發明之樹脂組成物,將可用較以往為低溫來烘烤,以較佳為215℃以下,又較佳為130~215℃下加熱10~60分鐘即可。因為即使是較以往為低的烘烤溫度仍可得到充分的耐溶劑性,故對於以往因熱所導致劣化問題而無法使用的染料,變得可使用更多種類的染料。 The baking conditions are not particularly limited, and heat treatment may be carried out depending on the type of the resin composition to be used. However, by using the resin composition of the present invention, it is possible to use a lower temperature than conventional baking, preferably It is preferably 215 ° C or less, and preferably heated at 130 to 215 ° C for 10 to 60 minutes. Since sufficient solvent resistance can be obtained even at a baking temperature lower than that of the prior art, it is possible to use a wider variety of dyes for dyes which have not been conventionally used due to deterioration due to heat.

藉由使用黑色矩陣3用的樹脂組成物、及畫素2用的樹脂組成物,來依序重覆進行如上述般的塗佈、曝光、顯影及烘烤,可形成所希望的著色圖型。 By using the resin composition for the black matrix 3 and the resin composition for the pixel 2, the coating, exposure, development, and baking as described above are sequentially repeated, and a desired color pattern can be formed. .

尚,於上述中說明了藉由光硬化而使著色圖型形成之方法,但以替代光聚合起始劑(D),只要使用調配有硬化促進劑及周知的環氧基樹脂之樹脂組成物,藉由噴墨法進行塗佈後經加熱,亦可形成所希望的著色圖型。 Further, in the above, a method of forming a coloring pattern by photohardening has been described, but instead of using the photopolymerization initiator (D), a resin composition containing a curing accelerator and a well-known epoxy resin is used. The desired color pattern can also be formed by heating after coating by an inkjet method.

接著,於著色圖型(畫素2及黑色矩陣3)上形成保護膜4。作為保護膜4並未特別限定,使用周知者來形成即可。 Next, a protective film 4 is formed on the coloring pattern (pixel 2 and black matrix 3). The protective film 4 is not particularly limited and may be formed by using a known person.

以如此般之方式所製造之彩色濾光器,係使用可賦予感度或顯影性為優異,同時耐溶劑性為優異之硬化塗膜之樹脂組成物所製造,故具有耐溶劑性為優異之著色圖型。 The color filter manufactured in such a manner is produced by using a resin composition which is excellent in sensitivity and developability and has excellent solvent resistance and is excellent in solvent resistance, so that it has excellent solvent resistance. Graphic type.

〔實施例〕 [Examples]

下參照實施例並對本發明作詳細說明,而本發明不受該等實施例限定。尚,在本實施例之中只要沒有特別解釋,份及百分比皆以質量為基準。又,所謂酸價意思為依據JIS K6901:2008 5.3.2所測定之含有環氧基及酸基的樹脂(A)之酸價,係為了中和含有環氧基及酸基的樹脂(A)1g中所包含的酸性成分所需要的氫氧化鉀的mg數之意。又,所謂重量平均分子量意思為使用凝膠滲透層析法(GPC),以下述條件所測定之標準聚苯乙烯換算重量平均分子量。 The invention is described in detail below with reference to the embodiments, and the invention is not limited by the embodiments. In addition, in the present embodiment, unless otherwise specified, the parts and percentages are based on mass. In addition, the acid value means the acid value of the epoxy group and the acid group-containing resin (A) measured in accordance with JIS K6901:2008 5.3.2, in order to neutralize the epoxy group and the acid group-containing resin (A). The number of mg of potassium hydroxide required for the acidic component contained in 1 g is intended. In addition, the weight average molecular weight means the weight average molecular weight converted by the standard polystyrene measured by the following conditions using the gel permeation chromatography (GPC).

管柱:Shodex(註冊商標)LF-804+LF-804(昭和電工(股)製) Pipe column: Shodex (registered trademark) LF-804+LF-804 (Showa Denko (share) system)

管柱溫度:40℃ Column temperature: 40 ° C

試樣:樹脂的0.2%四氫呋喃溶液 Sample: 0.2% tetrahydrofuran solution of resin

展開劑:四氫呋喃 Developer: tetrahydrofuran

檢出器:示差折射計(Shodex(註冊商標)RI-71S)(昭和電工(股)製) Detector: Shodex (registered trademark) RI-71S (Showa Electric Co., Ltd.)

流速:1mL/min Flow rate: 1mL/min

<合成例1> <Synthesis Example 1>

在具備有攪拌裝置、滴液漏斗、冷凝器、溫度計及氣體導入管的燒瓶中,加入324質量份的丙二醇單甲基醚乙酸酯,一邊以氮氣取代一邊攪拌並昇溫至80℃。接著,在由甲基丙烯酸86質量份(1莫耳)及甲基丙烯酸縮水甘油酯71質量份(0.5莫耳)所成之單體混合物中添加17質量份的2,2-偶氮雙(2,4-二甲基戊腈)(聚合起始劑、和光純藥工業(股)製V-65),將所得之物經過2時間由滴液漏斗滴入燒瓶中。滴入結束後,以80℃進而攪拌2小時進行共聚合反應,可得到No.1的樹脂含有液(固形分酸價320mgKOH/g、重量平均分子量10000)。尚,相對於所得到的樹脂含有液中之樹脂的酸基1莫耳之環氧基的莫耳數為0.5。 In a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and a gas introduction tube, 324 parts by mass of propylene glycol monomethyl ether acetate was added, and the mixture was stirred while stirring with nitrogen gas, and the temperature was raised to 80 °C. Next, 17 parts by mass of 2,2-azobis (yield) was added to a monomer mixture of 86 parts by mass of methacrylic acid (1 mol) and 71 parts by mass of glycidyl methacrylate (0.5 mol). 2,4-Dimethylvaleronitrile) (Polymerization Initiator, V-65, manufactured by Wako Pure Chemical Industries, Ltd.), and the obtained product was dropped into the flask from the dropping funnel over 2 hours. After the completion of the dropwise addition, the mixture was further stirred at 80 ° C for 2 hours to carry out a copolymerization reaction to obtain a resin-containing liquid of No. 1 (solid content acid value: 320 mgKOH/g, weight average molecular weight: 10,000). Further, the number of moles of the epoxy group of the acid group 1 mol of the resin in the obtained resin-containing resin was 0.5.

<合成例2~5> <Synthesis Example 2~5>

如表1所表示般,除了將丙二醇單甲基醚乙酸酯(PGMEA)、甲基丙烯酸(MAa)及甲基丙烯酸縮水甘 油酯(GMA)之使用量變更以外,與合成例1相同之方式可得到No.2~5的樹脂含有液。 As shown in Table 1, in addition to propylene glycol monomethyl ether acetate (PGMEA), methacrylic acid (MAa) and dimethyl methacrylate A resin-containing liquid of Nos. 2 to 5 can be obtained in the same manner as in Synthesis Example 1 except that the amount of use of the oil ester (GMA) is changed.

<合成例6> <Synthesis Example 6>

在具備有攪拌裝置、滴液漏斗、冷凝器、溫度計及氣體導入管的燒瓶中,加入470質量份的丙二醇單甲基醚乙酸酯,一邊以氮氣取代一邊攪拌並昇溫至80℃。接著,在由甲基丙烯酸86質量份(1莫耳)及甲基丙烯酸縮水甘油酯142質量份(1莫耳)所成之單體混合物中添加25質量份的2,2-偶氮雙(2,4-二甲基戊腈)(聚合起始劑、和光純藥工業(股)製V-65),將所得之物經由2小時由滴液漏斗滴入於燒瓶中。滴入結束後,以80℃進而攪拌2小時進行共聚合反應。 470 parts by mass of propylene glycol monomethyl ether acetate was placed in a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and a gas introduction tube, and the mixture was stirred and heated to 80 ° C while being replaced with nitrogen. Next, 25 parts by mass of 2,2-azobis (25 parts by mass) was added to a monomer mixture of 86 parts by mass of methacrylic acid (1 mol) and 142 parts by mass of glycidyl methacrylate (1 mol). 2,4-Dimethylvaleronitrile) (Polymerization Initiator, V-65, manufactured by Wako Pure Chemical Industries, Ltd.), and the obtained product was dropped into a flask through a dropping funnel over 2 hours. After completion of the dropwise addition, the copolymerization reaction was carried out by further stirring at 80 ° C for 2 hours.

之後,以60℃將0.1質量份的月桂酸二丁基錫(觸媒、和光純藥工業(股)製)及甲基丙烯酸2-異氰酸酯乙酯(昭和電工(股)製)78質量份(0.5莫耳)投入至燒 瓶中並攪拌1小時,之後,投入160質量份的丙二醇單甲基醚乙酸酯,可得到No.6的樹脂含有液(固形分酸價85mgKOH/g、重量平均分子量13000)。尚,相對於所得到的樹脂含有液中之樹脂的酸基1莫耳之環氧基的莫耳數為2。 After that, 0.1 parts by mass of dibutyltin laurate (manufactured by Wako Pure Chemical Industries, Ltd.) and 2-isocyanate ethyl methacrylate (manufactured by Showa Denko Co., Ltd.) were added in an amount of 78 parts by mass (0.5 mol) at 60 °C. Ear) to burn The mixture was stirred for 1 hour, and then 160 parts by mass of propylene glycol monomethyl ether acetate was added to obtain a resin-containing liquid of No. 6 (solid content acid value: 85 mgKOH/g, weight average molecular weight: 13,000). Further, the number of moles of the epoxy group having 1 mol of the acid group of the resin in the obtained resin-containing resin was 2.

<合成例7> <Synthesis Example 7>

在具備有攪拌裝置、滴液漏斗、冷凝器、溫度計及氣體導入管的燒瓶中,加入977質量份的丙二醇單甲基醚乙酸酯,一邊以氮氣取代一邊攪拌並昇溫至80℃。接著,在由甲基丙烯酸86質量份(1莫耳)、苯乙烯104質量份(1莫耳)及甲基丙烯酸縮水甘油酯284質量份(2莫耳)所成之單體混合物中添加52質量份的2,2-偶氮雙(2,4-二甲基戊腈)(聚合起始劑、和光純藥工業(股)製V-65),將所得之物經由2小時由滴液漏斗滴入燒瓶中。滴入結束後,以80℃進而攪拌2小時進行共聚合反應,可得到No.7的樹脂含有液(固形分酸價120mgKOH/g、重量平均分子量8000)。尚,相對於所得到的樹脂含有液中之樹脂的酸基1莫耳之環氧基的莫耳數為2。 In a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and a gas introduction tube, 977 parts by mass of propylene glycol monomethyl ether acetate was added, and the mixture was stirred while stirring with nitrogen, and the temperature was raised to 80 °C. Next, 52 parts were added to a monomer mixture of 86 parts by mass of methacrylic acid (1 mol), 104 parts by mass of styrene (1 mol), and 284 parts by mass of glycidyl methacrylate (2 mol). 2 parts by mass of 2,2-azobis(2,4-dimethylvaleronitrile) (polymerization initiator, V-65 manufactured by Wako Pure Chemical Industries, Ltd.), and the obtained product was dropped by 2 hours. The funnel was dropped into the flask. After completion of the dropwise addition, the mixture was further stirred at 80 ° C for 2 hours to carry out a copolymerization reaction to obtain a resin-containing liquid of No. 7 (solid content acid value: 120 mgKOH/g, weight average molecular weight: 8,000). Further, the number of moles of the epoxy group having 1 mol of the acid group of the resin in the obtained resin-containing resin was 2.

<樹脂組成物之調製> <Modulation of Resin Composition>

將表2所表之調配作為基本調配,將樹脂含有液及聚合性單體之種類以表3及4所表示般變更,並調製實施例 1~10及比較例1~7之樹脂組成物。 The formulation shown in Table 2 was used as a basic formulation, and the types of the resin-containing liquid and the polymerizable monomer were changed as shown in Tables 3 and 4, and the examples were prepared. The resin compositions of 1 to 10 and Comparative Examples 1 to 7.

<耐溶劑性之評價> <Evaluation of solvent resistance>

對於在彩色濾光器之保護膜形成步驟中一般所使用的溶劑N-甲基-2-吡咯啶酮(NMP)進行耐溶劑性之評價。 Solvent resistance was evaluated for the solvent N-methyl-2-pyrrolidone (NMP) generally used in the protective film forming step of the color filter.

將所調製的樹脂組成物旋轉塗布於5cm方形玻璃基板(無鹼玻璃基板)上,使在210℃下烘烤後的厚度成為2.5μm後,以90℃下加熱3分鐘以使溶劑揮發。接著,對於塗佈膜進行曝光波長365nm的光(曝光量300mJ/cm2),使其曝光部分光硬化後,放置於烘烤溫度210℃的乾燥器中20分鐘來製作硬化塗膜。使用分光光度計UV-1650PC((股)島津製作所製)來測定附有硬化塗膜的試片於波長675nm之透過率。接著,在附有蓋的培養皿中加入55質量份的N-甲基-2-吡咯啶酮(NMP),於其中浸漬附有硬化塗膜的試片後,測定以60℃經過30分鐘後之透過率。將結果表示於表5。透過率之上昇係代表著色劑正溶出至N-甲基-2-吡咯啶酮(NMP)之意思,且初期透過率與N-甲基-2-吡咯啶酮(NMP)含浸後透過率之差為較少者,可以說耐溶劑性為高。 The prepared resin composition was spin-coated on a 5 cm square glass substrate (alkali-free glass substrate), and the thickness after baking at 210 ° C was 2.5 μm, and then heated at 90 ° C for 3 minutes to volatilize the solvent. Next, the coating film was exposed to light having an exposure wavelength of 365 nm (exposure amount: 300 mJ/cm 2 ), and the exposed portion was photocured, and then placed in a desiccator at a baking temperature of 210 ° C for 20 minutes to prepare a cured coating film. The transmittance of the test piece with the cured coating film at a wavelength of 675 nm was measured using a spectrophotometer UV-1650PC (manufactured by Shimadzu Corporation). Next, 55 parts by mass of N-methyl-2-pyrrolidone (NMP) was placed in a petri dish with a lid, and a test piece with a hardened coating film was immersed therein, and then measured at 60 ° C for 30 minutes. Transmittance. The results are shown in Table 5. The increase in transmittance is indicative of the fact that the colorant is being dissolved to N-methyl-2-pyrrolidone (NMP), and the initial transmittance is intrinsic to N-methyl-2-pyrrolidone (NMP) after impregnation. If the difference is small, it can be said that the solvent resistance is high.

<鹼顯影性之評價> <Evaluation of alkali developability>

將所調製的樹脂組成物旋轉塗布於5cm方形玻璃基板(無鹼玻璃基板)上,以使曝光後的厚度成為2.5μm後,以90℃加熱3分鐘以使溶劑揮發。接著,在距離塗佈膜100μm之距離配置指定圖型的光罩,介隔此光罩使塗佈膜曝光(曝光量150mJ/cm2),並使曝光部分光硬化。接著,藉由在23℃的溫度及0.3MPa的壓力下,將包含0.1 質量%的碳酸鈉之水溶液加以噴霧,以使未曝光部分溶解而顯影後,藉由在210℃下30分鐘烘烤來形成指定圖型,並確認鹼顯影後的殘渣。鹼顯影後的殘渣係使用(股)日立Hitachi High-Technologies Corporation製電子顯微鏡S-3400藉由觀察來確認鹼顯影後的圖型。此評價之基準係如以下般。將結果表示於表5。 The prepared resin composition was spin-coated on a 5 cm square glass substrate (alkali-free glass substrate) so that the thickness after the exposure became 2.5 μm, and then heated at 90 ° C for 3 minutes to volatilize the solvent. Next, a mask of a predetermined pattern was placed at a distance of 100 μm from the coating film, and the coating film was exposed through the mask (exposure amount: 150 mJ/cm 2 ), and the exposed portion was photo-cured. Next, an aqueous solution containing 0.1% by mass of sodium carbonate was sprayed at a temperature of 23 ° C and a pressure of 0.3 MPa to dissolve the unexposed portion and developed, and then baked at 210 ° C for 30 minutes. The specified pattern was formed, and the residue after alkali development was confirmed. The residue after alkali development was confirmed by observation using an electron microscope S-3400 manufactured by Hitachi High-Technologies Corporation. The basis of this evaluation is as follows. The results are shown in Table 5.

○:無殘渣 ○: no residue

×:有殘渣 ×: There is residue

<感度之評價> <Evaluation of sensitivity>

行30秒鐘使用上述噴霧之鹼顯影,並依藉由觸針式高低差計ET4000M(小坂研究所製)測定於鹼顯影前後之圖型厚度的減少量,來判定感度的好壞。此圖型厚度係因為減少量越少感度可以說越為良好,故此評價之基準係如以下般。將結果表示於表5。 The development of the alkali of the spray was carried out for 30 seconds, and the amount of reduction in the thickness of the pattern before and after the alkali development was measured by a stylus type height difference meter ET4000M (manufactured by Otaru Laboratory) to determine the sensitivity. The thickness of this pattern is because the sensitivity is reduced as the amount of reduction is less, so the basis of the evaluation is as follows. The results are shown in Table 5.

○:未滿0.20μm ○: less than 0.20 μm

×:0.20μm以上 ×: 0.20 μm or more

由表5之結果可得知,若使用實施例1~10之樹脂組成物時顯影性及感度為良好,並可賦予耐溶劑性為優異之硬化塗膜,相較於此,若使用比較例1~7之樹脂組成物時耐溶劑性將為不充分。 As is clear from the results of Table 5, when the resin compositions of Examples 1 to 10 were used, the developability and sensitivity were good, and a cured coating film having excellent solvent resistance was provided. The solvent resistance of the resin composition of 1 to 7 will be insufficient.

〔產業利用性〕 [Industry Utilization]

以上結果可得知,依據本發明可提供感度或顯影性為良好,同時可形成具有充分的耐溶劑性之硬化塗膜之樹脂組成物。因此,本發明的樹脂組成物係適合作為彩色濾光器用光阻。進而,藉由使用本發明的樹脂組成物,可得到具有耐溶劑性為優異的著色圖型、且可靠性為高的彩色濾光器。 As is apparent from the above results, according to the present invention, it is possible to provide a resin composition which is excellent in sensitivity or developability and which can form a cured coating film having sufficient solvent resistance. Therefore, the resin composition of the present invention is suitable as a photoresist for a color filter. Further, by using the resin composition of the present invention, a color filter having a coloring pattern excellent in solvent resistance and having high reliability can be obtained.

1‧‧‧基板 1‧‧‧Substrate

2‧‧‧畫素 2‧‧‧ pixels

3‧‧‧黑色矩陣 3‧‧‧Black matrix

4‧‧‧保護膜 4‧‧‧Protective film

Claims (13)

一種樹脂組成物,其係含有:含有環氧基及酸基的樹脂(A);含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B);溶劑(C);與光聚合起始劑(D),其特徵為,相對於前述含有環氧基及酸基的樹脂(A)中的酸基1莫耳,環氧基為0.5~3.0莫耳。 A resin composition comprising: an epoxy group and an acid group-containing resin (A); a hydroxyl group-containing polyfunctional (meth) acrylate polybasic acid monoester (B); a solvent (C); and photopolymerization The initiator (D) is characterized in that the epoxy group is 0.5 to 3.0 mols based on 1 mol of the acid group in the epoxy group- and acid group-containing resin (A). 如請求項1之樹脂組成物,其中,作為前述含有環氧基及酸基的樹脂(A)之構成單體單位係含有來自於一分子中具有乙烯性碳-碳雙鍵與環氧基的單體(a-1)的單體單位。 The resin composition of claim 1, wherein the constituent monomer unit of the epoxy group and the acid group-containing resin (A) contains an ethylenic carbon-carbon double bond and an epoxy group in one molecule. Monomer unit of monomer (a-1). 如請求項1或2之樹脂組成物,其中,作為前述含有環氧基及酸基的樹脂(A)之構成單體單位係含有來自於不飽和羧酸(a-2)的單體單位。 The resin composition of claim 1 or 2, wherein the constituent monomer unit of the epoxy group and the acid group-containing resin (A) contains a monomer unit derived from the unsaturated carboxylic acid (a-2). 如請求項3之樹脂組成物,其中,前述含有環氧基及酸基的樹脂(A)係含有使來自於前述不飽和羧酸(a-2)的羧基的一部份、與單體(a-3)加成而得的具有乙烯性碳-碳雙鍵的構成單體單位,該單體(a-3)係一分子中具有能與羧基反應的官能基與乙烯性碳-碳雙鍵。 The resin composition of claim 3, wherein the epoxy group-containing acid group-containing resin (A) contains a part of a carboxyl group derived from the unsaturated carboxylic acid (a-2) and a monomer ( A-3) an exemplified monomer unit having an ethylenic carbon-carbon double bond which has a functional group capable of reacting with a carboxyl group and an ethylene carbon-carbon double in one molecule key. 如請求項2之樹脂組成物,其中,前述一分子中具有乙烯性碳-碳雙鍵與環氧基的單體(a-1)係含有環氧基的(甲基)丙烯酸酯。 The resin composition of claim 2, wherein the monomer (a-1) having an ethylenic carbon-carbon double bond and an epoxy group in the above molecule is an epoxy group-containing (meth) acrylate. 如請求項4之樹脂組成物,其中,前述一分子中具有能與羧基反應的官能基與乙烯性碳-碳雙鍵的單體(a- 3)係選自含有環氧基的(甲基)丙烯酸酯及含有異氰酸酯基的(甲基)丙烯酸酯之1種或2種以上。 The resin composition of claim 4, wherein the one molecule having a functional group capable of reacting with a carboxyl group and an ethylenic carbon-carbon double bond (a- 3) One or two or more selected from the group consisting of an epoxy group-containing (meth) acrylate and an isocyanate group-containing (meth) acrylate. 如請求項1或2之樹脂組成物,其中,前述含有羥基的多官能(甲基)丙烯酸酯的多元酸單酯(B)係選自由季戊四醇的二或三(甲基)丙烯酸酯的多元酸單酯、二季戊四醇的二、三、四或五(甲基)丙烯酸酯的多元酸單酯所成之群之1種或2種以上。 The resin composition of claim 1 or 2, wherein the polyhydric (meth) acrylate-containing polybasic acid monoester (B) containing the hydroxy group is selected from the group consisting of di- or tri-(meth) acrylate polybasic acid of pentaerythritol. One or more selected from the group consisting of monoesters and dipentaerythritol di-, tri-, tetra- or penta-(meth) acrylate polybasic monoesters. 如請求項1或2之樹脂組成物,其中,前述含有環氧基及酸基的樹脂(A)之酸價為10~350mgKOH/g。 The resin composition of claim 1 or 2, wherein the epoxy group and the acid group-containing resin (A) have an acid value of 10 to 350 mgKOH/g. 如請求項1或2之樹脂組成物,其中,進而含有著色劑(E)。 The resin composition of claim 1 or 2, further comprising a colorant (E). 如請求項9之樹脂組成物,其中,前述著色劑(E)係選自由染料及顏料所成之群之至少1種。 The resin composition of claim 9, wherein the coloring agent (E) is at least one selected from the group consisting of a dye and a pigment. 一種彩色濾光器,其係具有由請求項9或10之樹脂組成物之硬化塗膜所成之著色圖型。 A color filter having a color pattern formed by a hard coat film of the resin composition of claim 9 or 10. 一種影像顯示元件,其係具備請求項11之彩色濾光器。 An image display element having the color filter of claim 11. 一種彩色濾光器之製造方法,其係包含:於基板上將請求項9或10之樹脂組成物進行塗佈、曝光及藉由鹼水溶液的顯影之步驟;與以215℃以下之溫度條件烘烤,來形成著色圖型之步驟。 A method of manufacturing a color filter, comprising: coating, exposing, and developing a resin composition of claim 9 or 10 on a substrate; and drying at a temperature of 215 ° C or lower Bake, to form the step of coloring the pattern.
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