TWI599287B - Method for manufacturing flexible printed circuit board - Google Patents
Method for manufacturing flexible printed circuit board Download PDFInfo
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- TWI599287B TWI599287B TW104133453A TW104133453A TWI599287B TW I599287 B TWI599287 B TW I599287B TW 104133453 A TW104133453 A TW 104133453A TW 104133453 A TW104133453 A TW 104133453A TW I599287 B TWI599287 B TW I599287B
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- photosensitive resin
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- circuit board
- conductive line
- flexible circuit
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0537—Transfer of pre-fabricated insulating pattern
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
本發明涉及電路板製造領域,尤其涉及一種柔性電路板製作方法。The present invention relates to the field of circuit board manufacturing, and in particular, to a method for fabricating a flexible circuit board.
目前,電路板製造領域通常採用的線路板製作方法中,如圖10所示,在完成線路製作後,導電線路61凸設在基底62上,導電線路61與基底62之間的粘著僅依靠所述導電線路61與基底62接觸的表面611與基底62之間的結合力。隨著導電線路向著精細化方向發展,所述導電線路與基底之間的接觸面積逐漸變小,使得所述導電線路容易與基底剝離,進而造成短路。另外,如圖11所示,在所述導電線路61上形成覆蓋膜70時,由於所述覆蓋膜70的膠層71因為壓合填充所述導電線路61之間的空隙,使得壓合後的電路板表面凹凸不平,不利於後續表面封裝。At present, in the circuit board manufacturing method generally used in the field of circuit board manufacturing, as shown in FIG. 10, after the circuit is completed, the conductive line 61 is protruded on the substrate 62, and the adhesion between the conductive line 61 and the substrate 62 depends only on The bonding force between the surface 611 of the conductive line 61 in contact with the substrate 62 and the substrate 62. As the conductive line develops toward the refinement direction, the contact area between the conductive line and the substrate gradually becomes smaller, so that the conductive line is easily peeled off from the substrate, thereby causing a short circuit. In addition, as shown in FIG. 11, when the cover film 70 is formed on the conductive line 61, since the adhesive layer 71 of the cover film 70 is filled and filled with a gap between the conductive lines 61, the pressed portion is pressed. The surface of the board is uneven, which is not conducive to subsequent surface packaging.
有鑑於此,有必要提供一種克服上述問題的柔性電路板製作方法。In view of the above, it is necessary to provide a flexible circuit board manufacturing method that overcomes the above problems.
一種柔性電路板製作方法,包括步驟:將一感光樹脂形成在一可移除的基底上;選擇性移除部分所述感光樹脂形成多條溝槽,所述溝槽暴露部分所述基底;在所述溝槽內填充導電金屬形成導電線路,所述導電線路表面與所述感光樹脂表面平齊;移除所述基底,得到導電線路嵌入感光樹脂的柔性電路板。A flexible circuit board manufacturing method comprising the steps of: forming a photosensitive resin on a removable substrate; selectively removing a portion of the photosensitive resin to form a plurality of grooves, the grooves exposing a portion of the substrate; The trench is filled with a conductive metal to form a conductive line, and the surface of the conductive line is flush with the surface of the photosensitive resin; the substrate is removed to obtain a flexible circuit board in which a conductive line is embedded in the photosensitive resin.
與先前技術相比,本發明提供的柔性電路板製作方法,由於採用感光樹脂作為基底,且將導電線路嵌設在所述感光樹脂中,一方面,可增大所述導電線路與所述基底之間的接觸面積,以增大所述導電線路與所述基底之間的粘著力;另一方面,可使得最終成型的柔性電路板表面平整,以利於後續表面封裝。Compared with the prior art, the flexible circuit board manufacturing method provided by the present invention can increase the conductive line and the substrate by using a photosensitive resin as a substrate and embedding a conductive line in the photosensitive resin. The contact area between them is to increase the adhesion between the conductive line and the substrate; on the other hand, the surface of the finally formed flexible circuit board can be flattened to facilitate subsequent surface packaging.
圖1係本發明實施方式提供的基底的剖面示意圖。1 is a schematic cross-sectional view of a substrate provided by an embodiment of the present invention.
圖2係在圖1的基底的相背兩側分別壓合感光樹脂及光致抗蝕層後的剖面示意圖。2 is a schematic cross-sectional view showing the photosensitive resin and the photoresist layer being pressed on opposite sides of the substrate of FIG.
圖3係選擇性移除圖2中的部分所述感光樹脂形成多條溝槽及將所述光致抗蝕層製作形成電鍍阻擋層後的立體示意圖。FIG. 3 is a schematic perspective view showing a portion of the photosensitive resin of FIG. 2 selectively removing a plurality of trenches and forming the photoresist layer to form a plating barrier layer.
圖4係圖3在感光樹脂形成多條溝槽後的剖面示意圖。4 is a schematic cross-sectional view of FIG. 3 after the photosensitive resin is formed into a plurality of grooves.
圖5係在自圖4的溝槽內填充導電金屬形成導電線路後的剖面示意圖。FIG. 5 is a schematic cross-sectional view showing a conductive line formed by filling a conductive metal from the trench of FIG. 4. FIG.
圖6係移除圖5中的所述電鍍阻擋層後的剖面示意圖。Figure 6 is a schematic cross-sectional view showing the plating barrier layer of Figure 5 removed.
圖7係在圖6中的所述感光樹脂及導電線路表面形成第一覆蓋膜後的剖面示意圖。Fig. 7 is a schematic cross-sectional view showing the surface of the photosensitive resin and the conductive wiring in Fig. 6 after the first cover film is formed.
圖8係移除圖7中的基底,露出所述感光樹脂及導電線路後的剖面示意圖。Figure 8 is a schematic cross-sectional view showing the substrate of Figure 7 removed to expose the photosensitive resin and conductive lines.
圖9係在圖8的所述感光樹脂及導電線路背離第一覆蓋膜側形成第二覆蓋膜後的剖面示意圖。Figure 9 is a schematic cross-sectional view showing the photosensitive resin and the conductive trace of Figure 8 after forming a second cover film away from the first cover film side.
圖10係先前技術中完成線路製作後的剖視圖。Figure 10 is a cross-sectional view showing the completion of the line fabrication in the prior art.
圖11係在圖10的線路表面壓合覆蓋膜後的剖視圖。Figure 11 is a cross-sectional view of the line surface of Figure 10 after the cover film is pressed.
下面結合具體實施方式對本發明提供的柔性電路板製作方法進行詳細說明。The method for fabricating the flexible circuit board provided by the present invention will be described in detail below with reference to specific embodiments.
本發明實施方式提供的柔性電路板製作方法,包括步驟:A flexible circuit board manufacturing method provided by an embodiment of the present invention includes the following steps:
第一步,請參閱圖1,提供一個基底10。In the first step, referring to Figure 1, a substrate 10 is provided.
所述基底10包括相背的第一表面11及第二表面12。所述基底10可為銅、鋁、銀等導電金屬材料。本實施方式中,所述基底10為純銅。The substrate 10 includes opposing first and second surfaces 11 and 12. The substrate 10 may be a conductive metal material such as copper, aluminum or silver. In this embodiment, the substrate 10 is pure copper.
第二步,請參閱圖2,將一感光樹脂21形成在所述基底10上。In the second step, referring to FIG. 2, a photosensitive resin 21 is formed on the substrate 10.
本實施方式中,藉由真空壓合方式將所述感光樹脂21形成在所述基底10的第一表面11上。所述基底10可自所述感光樹脂21移除。本實施方式中,在將一感光樹脂21形成在所述第一表面11上的同時,在所述第二表面12真空壓合光致抗蝕層22。In the present embodiment, the photosensitive resin 21 is formed on the first surface 11 of the substrate 10 by vacuum pressing. The substrate 10 is removable from the photosensitive resin 21. In the present embodiment, the photoresist layer 22 is vacuum-bonded to the second surface 12 while a photosensitive resin 21 is formed on the first surface 11.
所述感光樹脂21完全覆蓋所述第一表面11。所述光致抗蝕層22完全覆蓋所述第二表面12。本實施方式中,所述光致抗蝕層22為普通幹膜。所述感光樹脂21具有優良的阻燃性、無銻無鹵、解析度高、優良的抗離子遷移性及耐化金性、排斥性低等優點。所述感光樹脂21較所述光致抗蝕層22具有相對較低的散失因數Df(Dissipation Factor)及介電常數Dk(Dielectric Constant)。本實施方式中,所述感光樹脂21的介電常數Dk為2.8,散失因數Df為0.005。所述感光樹脂21的厚度可為25,30,38或45微米。The photosensitive resin 21 completely covers the first surface 11. The photoresist layer 22 completely covers the second surface 12. In the embodiment, the photoresist layer 22 is a common dry film. The photosensitive resin 21 has excellent flame retardancy, no halogen, no halogen, high resolution, excellent ion migration resistance, gold resistance, and low repellency. The photosensitive resin 21 has a relatively low dissipation factor Df (Dissipation Factor) and a dielectric constant Dk (Dielectric Constant) compared to the photoresist layer 22. In the present embodiment, the photosensitive resin 21 has a dielectric constant Dk of 2.8 and a loss factor Df of 0.005. The photosensitive resin 21 may have a thickness of 25, 30, 38 or 45 μm.
第三步,請一併參閱圖2,圖3及圖4,選擇性移除部分所述感光樹脂21形成多條溝槽211。In the third step, referring to FIG. 2, FIG. 3 and FIG. 4, the photosensitive resin 21 is selectively removed to form a plurality of grooves 211.
本實施方式中,藉由曝光顯影方式選擇性移除部分所述感光樹脂21,以形成所述溝槽211。所述溝槽211曝露部分所述基底10的第一表面11。每條所述溝槽211具有兩個側壁2111。本實施方式中,所述側壁2111相互平行,且所述側壁2111垂直於所述基底10的第一表面11。In the present embodiment, a portion of the photosensitive resin 21 is selectively removed by an exposure development method to form the trench 211. The trench 211 exposes a portion of the first surface 11 of the substrate 10. Each of the grooves 211 has two side walls 2111. In this embodiment, the sidewalls 2111 are parallel to each other, and the sidewalls 2111 are perpendicular to the first surface 11 of the substrate 10.
本實施方式中,在選擇性移除部分所述感光樹脂21的同時,對所述光致抗蝕層22進行曝光顯影以形成電鍍阻擋層31。所述電鍍阻擋層31完全覆蓋所述第二表面12。In the present embodiment, the photoresist layer 22 is subjected to exposure development to selectively form the plating resist layer 31 while selectively removing a portion of the photosensitive resin 21. The plating barrier layer 31 completely covers the second surface 12.
第四步,請參閱圖5,在所述溝槽211內填充導電金屬形成導電線路40。In the fourth step, referring to FIG. 5, a conductive metal is filled in the trench 211 to form a conductive line 40.
所述導電線路40嵌入所述感光樹脂21中。所述導電線路40的表面與所述感光樹脂21的表面平齊。即,所述導電線路40背離所述基底10的表面與所述感光樹脂21背離所述基底10的表面位於同一平面內。The conductive line 40 is embedded in the photosensitive resin 21. The surface of the conductive line 40 is flush with the surface of the photosensitive resin 21. That is, the surface of the conductive line 40 facing away from the substrate 10 and the surface of the photosensitive resin 21 facing away from the substrate 10 are in the same plane.
本實施方式中,所述導電線路40可藉由電鍍方式形成。In this embodiment, the conductive line 40 can be formed by electroplating.
第五步,請一併參閱圖5及圖6,移除所述電鍍阻擋層31,露出所述基底10。In the fifth step, referring to FIG. 5 and FIG. 6, the plating barrier layer 31 is removed to expose the substrate 10.
第六步,請參閱圖7,在所述感光樹脂21及導電線路40表面形成第一覆蓋膜51。In the sixth step, referring to FIG. 7, a first cover film 51 is formed on the surface of the photosensitive resin 21 and the conductive line 40.
所述第一覆蓋膜51包括第一膠層511及第一膜層512。所述第一膠層511較所述第一膜層512靠近所述感光樹脂21及導電線路40。The first cover film 51 includes a first adhesive layer 511 and a first film layer 512. The first adhesive layer 511 is closer to the photosensitive resin 21 and the conductive line 40 than the first film layer 512.
第七步,請一併參閱圖7及圖8,移除所述基底10,露出所述感光樹脂21及導電線路40。In the seventh step, referring to FIG. 7 and FIG. 8, the substrate 10 is removed to expose the photosensitive resin 21 and the conductive line 40.
本實施方式中,採用蝕刻方式移除所述基底10。In the present embodiment, the substrate 10 is removed by etching.
第八步,請一併參閱圖8及圖9,在所述感光樹脂21及導電線路40背離所述第一覆蓋膜51側形成第二覆蓋膜52。In the eighth step, referring to FIG. 8 and FIG. 9, a second cover film 52 is formed on the side of the photosensitive resin 21 and the conductive line 40 facing away from the first cover film 51.
所述第二覆蓋膜52包括第二膠層521及第二膜層522。所述第二膠層521較所述第二膜層522靠近所述感光樹脂21及導電線路40。The second cover film 52 includes a second adhesive layer 521 and a second film layer 522. The second adhesive layer 521 is closer to the photosensitive resin 21 and the conductive line 40 than the second film layer 522.
可以理解的是,其他實施方式中,前述第五步與第六步可變換順序。It can be understood that in other embodiments, the foregoing fifth step and the sixth step can change the order.
可以理解的是,其他實施方式中,所述柔性電路板製作方法也可不包括在所述基底10的第二表面12真空壓合光致抗蝕層22;對所述光致抗蝕層22曝光顯影形成所述電鍍阻擋層31;及移除所述電鍍阻擋層31,露出所述基底10的步驟。此時,在所述溝槽211內填充導電金屬形成導電線路40的同時,在所述基底10的第二表面12形成鍍層;在移除所述基底10的同時,移除所述基底10的第二表面12上的鍍層即可。It can be understood that, in other embodiments, the flexible circuit board manufacturing method may not include vacuum-bonding the photoresist layer 22 on the second surface 12 of the substrate 10; exposing the photoresist layer 22 Developing the plating barrier layer 31; and removing the plating barrier layer 31 to expose the substrate 10. At this time, while the conductive metal is filled in the trench 211 to form the conductive line 40, a plating layer is formed on the second surface 12 of the substrate 10; while the substrate 10 is removed, the substrate 10 is removed. The plating on the second surface 12 is sufficient.
可以理解的是,其他實施方式中,所述基底10可採用介電材料製成。此時,在所述溝槽211內填充導電金屬形成所述導電線路40前,先在所述溝槽211曝露的基底10的第一表面11及所述溝槽211的側壁2111形成電鍍種子層。It can be understood that in other embodiments, the substrate 10 can be made of a dielectric material. At this time, before the conductive metal is filled in the trench 211 to form the conductive line 40, a plating seed layer is formed on the first surface 11 of the substrate 10 and the sidewall 2111 of the trench 211 exposed by the trench 211. .
與先前技術相比,本發明提供的柔性電路板製作方法,由於採用感光樹脂作為基底,且將導電線路嵌設在所述感光樹脂中,一方面,可增大所述導電線路與所述基底之間的接觸面積,以增大所述導電線路與所述基底之間的粘著力;另一方面,可使得最終成型的柔性電路板表面平整,以利於後續表面封裝。Compared with the prior art, the flexible circuit board manufacturing method provided by the present invention can increase the conductive line and the substrate by using a photosensitive resin as a substrate and embedding a conductive line in the photosensitive resin. The contact area between them is to increase the adhesion between the conductive line and the substrate; on the other hand, the surface of the finally formed flexible circuit board can be flattened to facilitate subsequent surface packaging.
綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施方式及所列之數據為作試驗及參考之所用,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only for the preferred embodiment of the present invention and the data listed therein are used for testing and reference, and the scope of patent application in this case cannot be limited thereby. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.
10、62‧‧‧基底10, 62‧‧‧ base
11‧‧‧第一表面11‧‧‧ first surface
12‧‧‧第二表面12‧‧‧ second surface
21‧‧‧感光樹脂21‧‧‧Photosensitive resin
22‧‧‧光致抗蝕層22‧‧‧Photoresist
211‧‧‧溝槽211‧‧‧ trench
31‧‧‧電鍍阻擋層31‧‧‧ plating barrier
40、61‧‧‧導電線路40, 61‧‧‧ conductive lines
51‧‧‧第一覆蓋膜51‧‧‧First cover film
511‧‧‧第一膠層511‧‧‧First layer
512‧‧‧第一膜層512‧‧‧ first film
52‧‧‧第二覆蓋膜52‧‧‧second cover film
521‧‧‧第二膠層521‧‧‧Second layer
522‧‧‧第二膜層522‧‧‧Second film
70‧‧‧覆蓋膜70‧‧‧ Cover film
71‧‧‧膠層71‧‧‧ glue layer
611‧‧‧表面611‧‧‧ surface
無no
21‧‧‧感光樹脂 21‧‧‧Photosensitive resin
40‧‧‧導電線路 40‧‧‧Electrical circuit
51‧‧‧第一覆蓋膜 51‧‧‧First cover film
52‧‧‧第二覆蓋膜 52‧‧‧second cover film
521‧‧‧第二膠層 521‧‧‧Second layer
522‧‧‧第二膜層 522‧‧‧Second film
Claims (7)
將一感光樹脂形成在一可移除的基底上;
選擇性移除部分所述感光樹脂形成多條溝槽,所述溝槽暴露部分所述基底;
在所述溝槽內填充導電金屬形成導電線路,所述導電線路表面與所述感光樹脂表面平齊;
移除所述基底,得到導電線路嵌入感光樹脂的柔性電路板。A method for manufacturing a flexible circuit board, comprising the steps of:
Forming a photosensitive resin on a removable substrate;
Selectively removing a portion of the photosensitive resin to form a plurality of grooves, the grooves exposing a portion of the substrate;
Filling a conductive metal in the trench to form a conductive line, the conductive line surface being flush with the surface of the photosensitive resin;
The substrate is removed to obtain a flexible circuit board in which a conductive line is embedded in the photosensitive resin.
The method of fabricating a flexible circuit board according to claim 1, wherein the conductive metal is filled in the trench by electroplating to form a conductive line.
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CN201510638404.8A CN106561070B (en) | 2015-10-06 | 2015-10-06 | Flexible circuit board manufacturing method |
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CN109360674A (en) * | 2018-10-18 | 2019-02-19 | 吴江友鑫新材料科技有限公司 | A kind of transparent conductive metal grid film and preparation method thereof |
CN113950204B (en) * | 2020-07-16 | 2024-04-12 | 深南电路股份有限公司 | Manufacturing method of prefabricated circuit board and prefabricated circuit board |
CN114171663A (en) * | 2021-12-07 | 2022-03-11 | 丰鹏电子(珠海)有限公司 | Heat dissipation substrate and preparation method thereof |
CN114786329A (en) * | 2022-05-26 | 2022-07-22 | 大连吉星电子股份有限公司 | High-leveling-degree flexible circuit board and preparation method thereof |
CN219627975U (en) * | 2023-02-28 | 2023-09-01 | 瑞声光电科技(常州)有限公司 | Flexible circuit board |
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WO2004054337A1 (en) * | 2002-12-09 | 2004-06-24 | Noda Screen Co., Ltd. | Method for manufacturing printed wiring board |
WO2004110117A1 (en) * | 2003-06-04 | 2004-12-16 | Zeon Corporation | Substrate and process for producing the same |
US20070209200A1 (en) * | 2004-03-31 | 2007-09-13 | Tadahiro Ohmi | Circuit Board, Method Of Manufacturing Circuit Board, And Display Device Having Circuit Board |
KR101114502B1 (en) * | 2010-06-28 | 2012-02-24 | 램테크놀러지 주식회사 | Cleaning composition and method of forming semiconductor pattern using the same |
CN104219876A (en) * | 2013-05-31 | 2014-12-17 | 宏启胜精密电子(秦皇岛)有限公司 | Circuit board and manufacture method thereof |
TWI573498B (en) * | 2013-07-26 | 2017-03-01 | Adv Flexible Circuits Co Ltd | The flattened cladding structure of soft circuit board |
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CN106561070A (en) | 2017-04-12 |
TW201720256A (en) | 2017-06-01 |
CN106561070B (en) | 2019-06-11 |
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