TWI596658B - Protecting apparatus and semiconductor processing equipment including the same - Google Patents

Description

Guard and semiconductor process machine

The invention relates to a protective device and a semiconductor processing machine, in particular to a protective device and a semiconductor processing machine capable of preventing contamination of a monitoring window.

In the semiconductor film growth process, a sophisticated In-situ monitor monitors the temperature or reflectivity of a workpiece through a monitoring window to monitor the development of the process. The monitoring window is also susceptible to contamination by by-products (By-product) as the machine's production time is affected. Therefore, in order to remove by-products or foreign matter adhering to the monitoring window during the growth of the workpiece, it is necessary to frequently maintain the machine, for example, first destroying the vacuum state of the reaction chamber, cleaning and maintaining the monitoring window, and then resealing. Reaction chamber. However, the above steps require re-disassembly and assembly of the monitoring window or associated optical path components for maintenance, and suspension of production to reduce the production utilization of the machine.

In summary, how to provide a semiconductor process machine that can prevent the monitoring window from being contaminated is the goal that is currently in great demand.

The invention provides a shielding device and a semiconductor processing machine, which are arranged between a workpiece and a monitoring window by using a multi-piece light-transmissive mask, so that by-products or foreign matter generated in the semiconductor process are directly adhered to the light-transmitting cover. Cover, not attached to the monitoring window. When the predetermined number of productions is reached, the next clear light transmissive mask can be switched.

The guard device of one embodiment of the present invention is coupled to a reaction chamber, and the reaction chamber has a first opening. The guard includes a housing, a plurality of light transmissive masks, and a drive mechanism. The housing has a second opening and a window opposite the second opening, wherein the second opening of the housing is coupled to the first opening of the reaction chamber. A plurality of light transmissive masks are disposed between the second opening and the window. The drive mechanism is coupled to the plurality of light transmissive masks. The driving mechanism drives the plurality of light transmissive masks to switch between the different light transmissive masks to the second opening and the window.

A semiconductor process machine according to another embodiment of the present invention includes a reaction chamber and a guard. The reaction chamber has a first opening for performing a semiconductor process. The guard includes a housing, a plurality of light transmissive masks, and a drive mechanism. The housing has a second opening and a window opposite the second opening, wherein the second opening of the housing is coupled to the first opening of the reaction chamber. A plurality of light transmissive masks are disposed between the second opening and the window. The drive mechanism is coupled to the plurality of light transmissive masks. The driving mechanism drives the plurality of light transmissive masks to switch between the different light transmissive masks to the second opening and the window.

The purpose, technical contents, features, and effects achieved by the present invention will become more apparent from the detailed description of the appended claims.

The embodiments of the present invention will be described in detail below with reference to the drawings. In addition to the detailed description, the present invention may be widely practiced in other embodiments, and any alternatives, modifications, and equivalent variations of the described embodiments are included in the scope of the present invention. quasi. In the description of the specification, numerous specific details are set forth in the description of the invention. In addition, well-known steps or elements are not described in detail to avoid unnecessarily limiting the invention. The same or similar elements in the drawings will be denoted by the same or similar symbols. It is to be noted that the drawings are for illustrative purposes only and do not represent the actual dimensions or quantities of the components. Some of the details may not be fully drawn in order to facilitate the simplicity of the drawings.

Referring to FIG. 1, a semiconductor process machine according to an embodiment of the present invention includes a reaction chamber 1 and a guard 2. The reaction chamber 1 has a first opening 10 for performing a semiconductor process. For example, the semiconductor process may include, but is not limited to, physical vapor deposition (PVD), chemical vapor deposition (CVD), and ion implantation (Ion Implant).

Following the above description, with continued reference to FIG. 1, the guard 2 includes a housing 21, a plurality of light transmissive masks 22, and a drive mechanism. The housing 21 has a second opening 20 and a window 24 opposite to the second opening 20, wherein the second opening 20 of the housing 21 is connected to the first opening 10 of the reaction chamber 1. In one embodiment, the housing 21 forms a closed space with the reaction chamber 1.

It can be understood that a monitoring device M can monitor the process parameters such as temperature or coating reflectance during processing of a workpiece in the reaction chamber 1 through the window 24 to monitor a semiconductor process. In one embodiment shown in FIG. 3, the window 24 further includes a connecting member 240 for connecting to the monitoring device M and being fixed.

Referring to FIG. 1 and FIG. 2 together, a plurality of transparent masks 22 are disposed between the second opening 20 and the window 24 . The drive mechanism is coupled to the plurality of light transmissive masks 22. The driving mechanism drives the plurality of light transmissive masks 22 to move between the different light transmissive masks 22 to the second opening 20 and the window 24. Preferably, the plurality of light transmissive masks 22 are disposed adjacent to the second opening, that is, the light transmissive mask 22 is closer to the reaction chamber 1 and the workpiece to directly block by-products or foreign matter from the reaction chamber, so that the semiconductor By-products or foreign matter generated in the process are directly adhered to the light-transmitting mask 22 without being attached to the window 24. When the predetermined production run of the semiconductor processing machine is reached, the protective device is switched to the next clean transparent mask. With the above-mentioned plurality of light-transmitting masks, the production line can suspend the maintenance of the semiconductor processing machine without frequent frequent monitoring of the window, and then only need to clean a plurality of transparent maintenance according to the original maintenance schedule of the semiconductor processing machine. A light mask can be used.

In an embodiment, referring to FIG. 3 , the plurality of transparent masks 22 are disposed on a pedestal 25 . Therefore, the driving mechanism can drive the base 25 to rotate to switch between the different transparent masks 22 to the second opening 20 and the window 24, but not limited thereto. In another embodiment, the plurality of light transmissive masks can be integrated into one body. For example, the plurality of light-transmissive masks 22 as shown in FIG. 3 may be an integrally formed light-transmitting plate, so that the structural design is simpler, and the person skilled in the art can modify the change by itself, but not limited thereto.

In order to improve the efficacy of the protective device by-product or foreign matter, please refer to FIG. 3. In an embodiment, the shielding device 2 further includes a tube 30, the two ends of which are respectively connected to the first opening 10 of the reaction chamber 1 and the housing. The second openings 20 of 21 are connected. Preferably, the side wall of the pipe body 30 includes an air inlet port 32 and an air outlet port 34 opposite to the air inlet port 32 for introducing a purge airflow into the pipe body 30 via the air inlet port 32, and through the air outlet. The interface 34 is discharged. According to the above structure, the purge airflow can blow out by-products or foreign matter falling into the pipe body 30 to reduce by-products or foreign matter falling on the light-transmitting mask to further extend the use time of the light-transmitting mask. In an embodiment, the inner diameter of the intake port 32 may be smaller than the inner diameter of the air outlet port 34 to facilitate the discharge of by-products or foreign objects through the air outlet interface 34.

In order to maintain the guard in a vacuum state and simultaneously drive a plurality of light transmissive masks, please refer to FIG. 3. In an embodiment, the drive mechanism 23 includes a rotary feedthrough connected to a drive motor 27. Therefore, the driving mechanism 23 can drive the base 25 to rotate to switch between the different light-transmitting masks 22 to the second opening 20 and the window 24 while maintaining the guard 2 in a vacuum state.

Referring to FIG. 4 , in an embodiment, a plurality of light transmissive masks 22 are disposed on a strip 28 . The strip 28 is coupled to a roller 26 and the drive mechanism 23 drives the roller 26 to switch between the different light transmissive masks 22 to the second opening 20 and the window 24. It should be noted that the plurality of light-transmitting masks may be respectively disposed on a strip or integrally formed to form a strip. For example, a plurality of light-transmissive masks may be segmented on a crawler belt, and the crawler belts are rotated by the rollers to switch different light-transmitting masks; or, the plurality of light-transmitting masks may be integrally formed transparent materials. To form a long strip, the web is rotated by a roller to switch the clean light transmissive mask between the second opening 20 and the window 24. Those who have the usual knowledge can modify the transformation by themselves, but not limited to this.

Referring to FIG. 1 to FIG. 4 together, a semiconductor process machine according to an embodiment of the invention comprises a reaction chamber 1 and a protection device 2, wherein the protection device 2 is connected to a reaction chamber 1. It will be appreciated that the semiconductor process tool of the present invention further includes other components required to implement the semiconductor process. For example, the heater heats the workpiece to the desired process temperature; the reaction gas source is required for film growth; the ion source generator is required for ion implantation. The above-described components required for realizing the semiconductor process are conventional techniques and are not the main technical features of the present invention, and therefore will be omitted. The guard 2 includes a housing 21, a plurality of light transmissive masks 22, and a drive mechanism 23. The technical features of the respective components of the guard 2, the connection relationship with each other, and the connection relationship with the reaction chamber 1 have been described above, and thus will not be described again.

In summary, the protective device of the present invention utilizes a multi-piece light-transmissive mask disposed between the workpiece and the monitoring window to directly adhere the by-product or foreign matter generated in the semiconductor process to the light-transmitting mask. Without sticking to the monitoring window. When the predetermined number of productions is reached, the next clear light transmissive mask can be switched.

The embodiments described above are only intended to illustrate the technical idea and the features of the present invention, and the purpose of the present invention is to enable those skilled in the art to understand the contents of the present invention and to implement the present invention. That is, the equivalent variations or modifications made by the spirit of the present invention should still be included in the scope of the present invention.

1‧‧‧reaction chamber
10‧‧‧ first opening
2‧‧‧Protection devices
20‧‧‧second opening
21‧‧‧ housing
22‧‧‧Multiple light-transmissive masks
23‧‧‧ drive mechanism
24‧‧‧Window
240‧‧‧Connecting components
25‧‧‧Base
26‧‧‧Rolling
27‧‧‧Drive motor
28‧‧‧Strip
30‧‧‧pipe body
32‧‧‧Intake interface
34‧‧‧Exhaust interface
M‧‧‧Monitor

1 is a schematic view showing a guard device and a semiconductor process machine thereof according to an embodiment of the present invention. 2 is a schematic view showing a plan view of a plurality of light transmissive masks in accordance with an embodiment of the present invention. 3 is a schematic view showing a guard device and a semiconductor process machine thereof according to another embodiment of the present invention. 4 is a graph showing a guard device and a semiconductor process machine thereof according to still another embodiment of the present invention.

1‧‧‧reaction chamber

10‧‧‧ first opening

2‧‧‧Protection devices

20‧‧‧second opening

21‧‧‧ housing

22‧‧‧Multiple light-transmissive masks

24‧‧‧Window

M‧‧‧Monitor

Claims (22)

A guard device is coupled to a reaction chamber, and the reaction chamber has a first opening, the guard device comprising: a housing having a second opening and a window opposite the second opening, wherein The second opening of the housing is connected to the first opening of the reaction chamber; a plurality of transparent masks are disposed between the second opening and the window; and a driving mechanism, and the plurality of transparent a light mask connection, the driving mechanism driving the plurality of light transmissive masks to switch between the different light transmissive masks to the second opening and the window. The protection device of claim 1, further comprising: a tube body, the two ends of which are respectively connected to the first opening of the reaction chamber and the second opening of the housing. The protection device of claim 2, wherein the side wall of the tube body comprises an air inlet interface and an air outlet interface opposite to the air inlet interface, so that a Purge airflow is introduced into the tube through the air inlet interface. The body is discharged through the outlet interface. The guard device of claim 3, wherein an inner diameter of the air inlet interface is smaller than an inner diameter of the air outlet interface. The protective device of claim 1, wherein the plurality of light transmissive masks are disposed adjacent to the second opening. The protective device of claim 1, wherein the plurality of light transmissive masks are integrated. The protective device of claim 1, wherein the window further comprises a connecting component for connecting to a monitoring device. The protection device of claim 1, wherein the plurality of light transmissive masks are disposed on a base, and the driving mechanism drives the base to rotate to switch different light transmissive masks to the second opening Between windows. The guard of claim 8 wherein the drive mechanism includes a rotary feedthrough. The protection device of claim 1, wherein the plurality of light-transmitting masks are disposed on a strip body, the strip-shaped body is coupled to a roller, and the driving mechanism drives the roller to switch differently. A light mask is placed between the second opening and the window. The protective device of claim 1, wherein the housing forms a closed space with the reaction chamber. A semiconductor processing machine comprising: a reaction chamber having a first opening for performing a semiconductor process; and a guard comprising: a housing having a second opening and disposed opposite the second opening a window, wherein the second opening of the housing is connected to the first opening of the reaction chamber; a plurality of light transmissive masks disposed between the second opening and the window; and a driving mechanism Provided in the housing, the driving mechanism drives the plurality of transparent masks to move between the different transparent masks to the second opening and the window. The semiconductor processing machine of claim 12, further comprising: a tube body, the two ends of which are respectively connected to the first opening of the reaction chamber and the second opening of the housing. The semiconductor processing machine of claim 13, wherein the sidewall of the tube body comprises an air inlet interface and an air outlet interface opposite to the air inlet interface, wherein a clear airflow is introduced into the tube body through the air inlet interface. And discharged through the outlet interface. The semiconductor processing machine of claim 14, wherein an inner diameter of the air inlet interface is smaller than an inner diameter of the air outlet interface. The semiconductor processing machine of claim 12, wherein the plurality of light transmissive masks are disposed adjacent to the second opening. The semiconductor processing machine of claim 12, wherein the plurality of light transmissive masks are integrated. The semiconductor processing machine of claim 12, wherein the window further comprises a connecting component for connecting to a monitoring device. The semiconductor processing machine of claim 12, wherein the plurality of light transmissive masks are disposed on a base, and the driving mechanism drives the base to rotate to switch different light transmissive masks to the second opening Between this window and the window. The semiconductor process machine of claim 19, wherein the drive mechanism comprises a rotary feedthrough. The semiconductor processing machine of claim 12, wherein the plurality of light transmissive masks are disposed on a strip body, the strip body is coupled to a roller, and the driving mechanism drives the roller to switch between different ones. The light transmissive mask is between the second opening and the window. The semiconductor processing machine of claim 12, wherein the housing forms a closed space with the reaction chamber.