TWI591088B - Flexible printed circuit board - Google Patents

Flexible printed circuit board Download PDF

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TWI591088B
TWI591088B TW105127924A TW105127924A TWI591088B TW I591088 B TWI591088 B TW I591088B TW 105127924 A TW105127924 A TW 105127924A TW 105127924 A TW105127924 A TW 105127924A TW I591088 B TWI591088 B TW I591088B
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Taiwan
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weight
epoxy resin
parts
cover film
circuit board
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TW105127924A
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TW201809057A (en
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丘建華
土橋秀
黃黎明
吳俊明
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新揚科技股份有限公司
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Description

軟性印刷電路板 Flexible printed circuit board

本發明是在提供一種樹脂組成物、覆蓋膜以及軟性印刷電路板,且特別是一種可製得具有單層結構之覆蓋膜的樹脂組成物。所製得之具有單層結構之覆蓋膜可直接設置於軟性印刷電路板之銅電路佈線層上。 The present invention provides a resin composition, a cover film, and a flexible printed circuit board, and more particularly, a resin composition which can produce a cover film having a single layer structure. The cover film having a single layer structure can be directly disposed on the copper circuit wiring layer of the flexible printed circuit board.

軟性印刷電路板為電子產品中不可或缺的元件。在現今科技產業強調輕、薄、短、小的發展趨勢下,軟性印刷電路板中各個元件的研發方向亦趨向上述目標。 Flexible printed circuit boards are indispensable components in electronic products. Under the current trend of light, thin, short and small in the technology industry, the research and development direction of various components in flexible printed circuit boards has also tended to the above objectives.

一般而言,目前已知之軟性印刷電路板可至少包含聚醯亞胺基材、設於聚醯亞胺基材之表面上的銅電路佈線層,以及設於銅電路佈線層上之覆蓋膜。習知之覆蓋膜係由高分子層以及黏著層之雙層結構所組成,高分子層通常為熱固化樹脂(例如:聚醯亞胺樹脂),以保護銅電路佈線層不易損壞。而上述黏著層係用以幫助高分子層貼合於銅電路佈線層上。 In general, the currently known flexible printed circuit board may comprise at least a polyimide substrate, a copper circuit wiring layer provided on the surface of the polyimide substrate, and a cover film provided on the copper circuit wiring layer. The conventional cover film is composed of a double layer structure of a polymer layer and an adhesive layer, and the polymer layer is usually a thermosetting resin (for example, a polyimide resin) to protect the copper circuit wiring layer from being easily damaged. The adhesive layer is used to help the polymer layer adhere to the copper circuit wiring layer.

上述雙層結構的厚度較厚,不符合目前電子產業輕薄化的發展趨勢。 The thickness of the above two-layer structure is relatively thick, which does not conform to the current development trend of the light and thin electronics industry.

為改善上述雙層結構的缺點,習知有一技術係提出一種樹脂組成物,其包含環氧樹脂、硬化促進劑、交聯劑以及含磷之酚醛樹脂。利用上述樹脂組成物所形成的半固化膜可直接設置於銅箔上。然而,上述之半固化膜與銅箔的附著性不佳,且其填覆性、焊接耐熱性、彎曲性、耐燃性以及抗離子遷移性仍無法滿足產業的需求。 In order to improve the disadvantages of the above two-layer structure, there is a technique which proposes a resin composition comprising an epoxy resin, a hardening accelerator, a crosslinking agent, and a phosphorus-containing phenol resin. The semi-cured film formed using the above resin composition can be directly disposed on the copper foil. However, the above-mentioned semi-cured film has poor adhesion to the copper foil, and its filling property, solder heat resistance, flexibility, flame resistance, and ion mobility resistance cannot satisfy the industrial demand.

習知另有一技術係提供一種樹脂組成物,其包含無鹵素環氧樹脂、熱塑性樹脂和/或合成橡膠、固化劑和含氮阻燃劑。然而,上述之樹脂組成物所製得之膜層的抗剝離強度、填覆性以及抗離子遷移性不佳。 Another technique is to provide a resin composition comprising a halogen-free epoxy resin, a thermoplastic resin and/or a synthetic rubber, a curing agent, and a nitrogen-containing flame retardant. However, the film layer obtained by the above resin composition has poor peeling strength, filling property, and ion migration resistance.

因此,目前亟需提出一種樹脂組成物,其可製得兼具良好抗剝離性、填覆性、焊接耐熱性、彎曲性、耐燃性以及抗離子遷移性的覆蓋膜,且上述覆蓋膜為單層結構,可直接設置於銅電路佈線層上,而不需經由黏著層幫助貼合。 Therefore, there is a need to provide a resin composition which can produce a cover film which has good peeling resistance, filling property, solder heat resistance, flexibility, flame resistance and ion migration resistance, and the above cover film is single The layer structure can be directly disposed on the copper circuit wiring layer without the need to help the bonding through the adhesive layer.

因此,本發明之一態樣是提出一種樹脂組成物,其包含特定之環氧樹脂以及增韌劑,可增加所製得之覆蓋膜之抗剝離強度、填覆性、焊接耐熱性、彎曲性、耐燃性以及抗離子遷移性。 Therefore, an aspect of the present invention is to provide a resin composition comprising a specific epoxy resin and a toughening agent, which can increase the peeling strength, the filling property, the solder heat resistance, and the bending property of the obtained cover film. , flame resistance and ion mobility.

本發明之另一態樣是提出一種覆蓋膜,其係利用上述樹脂組成物所製得,其可具有單層結構。 Another aspect of the present invention is to provide a cover film which is obtained by using the above resin composition, which may have a single layer structure.

本發明之又一態樣是在提出一種軟性印刷電路 板,其可具有上述之覆蓋膜。 Another aspect of the present invention is to propose a flexible printed circuit A plate, which may have the cover film described above.

根據本發明之上述態樣,首先提出一種樹脂組成物。在一實施例中,樹脂組成物可包含環氧樹脂(A)、硬化劑(B)、催化劑(C)、耐燃劑(D)、增韌劑(E)以及溶劑(F)。其中,環氧樹脂(A)包含第一環氧樹脂(a-1)和第二環氧樹脂(a-2),第一環氧樹脂(a-1)可具有如下式(I)所示之結構: According to the above aspect of the invention, a resin composition is first proposed. In an embodiment, the resin composition may include an epoxy resin (A), a hardener (B), a catalyst (C), a flame retardant (D), a toughening agent (E), and a solvent (F). Wherein the epoxy resin (A) comprises a first epoxy resin (a-1) and a second epoxy resin (a-2), and the first epoxy resin (a-1) may have the following formula (I) Structure:

於式(I)中,R1,R2,a為0至2之整數,且*代表鍵結處。 In the formula (I), R 1 is , R 2 is or , a is an integer from 0 to 2, and * represents a bond.

上述增韌劑(E)可包含聚酯樹脂。基於環氧樹脂(A)之使用量為100重量份,第一環氧樹脂(a-1)之使用量為 30重量份至50重量份,第二環氧樹脂(a-2)之使用量為50重量份至70重量份,硬化劑(B)之使用量為16重量份至20重量份,催化劑(C)之使用量為0.8重量份至1重量份,耐燃劑(D)之使用量為50重量份至60重量份,增韌劑(E)之使用量為70重量份至90重量份,以及溶劑(F)之使用量為75重量份至85重量份。 The above toughening agent (E) may comprise a polyester resin. The amount of the first epoxy resin (a-1) used is 100 parts by weight based on the epoxy resin (A). 30 parts by weight to 50 parts by weight, the second epoxy resin (a-2) is used in an amount of 50 parts by weight to 70 parts by weight, and the hardener (B) is used in an amount of 16 parts by weight to 20 parts by weight, based on the catalyst (C) The amount used is from 0.8 part by weight to 1 part by weight, the flame retardant (D) is used in an amount of from 50 parts by weight to 60 parts by weight, the toughening agent (E) is used in an amount of from 70 parts by weight to 90 parts by weight, and the solvent (F) is used in an amount of from 75 parts by weight to 85 parts by weight.

依據本發明之一實施例,第一環氧樹脂(a-1)係選自於由下式(I-1)至式(I-3)所示之結構之一族群的至少一者。 According to an embodiment of the present invention, the first epoxy resin (a-1) is at least one selected from the group consisting of the structures represented by the following formula (I-1) to formula (I-3).

依據本發明之一實施例,上述第二環氧樹脂(a-2)包含酚醛環氧樹脂、雙酚A型環氧樹脂、脂環型環氧樹脂、雜環型環氧樹脂、環氧丙基酯型環氧樹脂或上述之任意組合。 According to an embodiment of the present invention, the second epoxy resin (a-2) comprises a novolac epoxy resin, a bisphenol A epoxy resin, an alicyclic epoxy resin, a heterocyclic epoxy resin, and a propylene oxide A glycol ester type epoxy resin or any combination of the above.

依據本發明之一實施例,硬化劑(B)可包含多胺基化合物、酞酐化合物或上述之任意組合。 According to an embodiment of the present invention, the hardener (B) may comprise a polyamine-based compound, an phthalic anhydride compound, or any combination thereof.

依據本發明之一實施例,催化劑(C)可包含咪唑化合物、三級膦、氟化硼錯合物或上述之任意組合。 According to an embodiment of the invention, the catalyst (C) may comprise an imidazole compound, a tertiary phosphine, a boron fluoride complex or any combination of the above.

依據本發明之一實施例,耐燃劑(D)可由含磷化合物以及含金屬化合物所組成,其中含金屬化合物可包含金屬氧化物或金屬氫氧化物。 According to an embodiment of the present invention, the flame retardant (D) may be composed of a phosphorus-containing compound and a metal-containing compound, wherein the metal-containing compound may comprise a metal oxide or a metal hydroxide.

依據本發明之一實施例,上述含金屬化合物之平均粒徑範圍為1μm至5μm。 According to an embodiment of the present invention, the metal-containing compound has an average particle diameter ranging from 1 μm to 5 μm.

依據本發明之一實施例,聚酯樹脂可為聚胺基甲酸酯。 According to an embodiment of the invention, the polyester resin may be a polyurethane.

根據本發明之上述態樣,另提出一種覆蓋膜,其係藉由上述之樹脂組成物,經過塗佈步驟、烘烤步驟以及熟化步驟,形成於基材之表面上。 According to the above aspect of the invention, there is further provided a cover film formed on the surface of the substrate by the coating step, the baking step, and the aging step by the above resin composition.

根據本發明之上述態樣,又提出一種軟性印刷 電路板,其係包含基材、設於基材上之銅電路佈線層以及前述之覆蓋膜,其中覆蓋膜係設於銅電路佈線層上,且覆蓋膜為單層結構,不具有黏著層。 According to the above aspect of the invention, a soft printing method is further proposed. The circuit board comprises a substrate, a copper circuit wiring layer provided on the substrate, and the above-mentioned cover film, wherein the cover film is disposed on the copper circuit wiring layer, and the cover film has a single layer structure and does not have an adhesive layer.

應用本發明之樹脂組成物,可使所製得的覆蓋膜具有單層結構,且覆蓋膜可直接設於銅電路佈線層上,進而可減少軟性印刷電路板的整體厚度。此外,上述覆蓋膜可兼具良好的抗剝離性、填覆性、焊接耐熱性、彎曲性、耐燃性以及抗離子遷移性。 By applying the resin composition of the present invention, the obtained cover film can have a single layer structure, and the cover film can be directly disposed on the copper circuit wiring layer, thereby reducing the overall thickness of the flexible printed circuit board. Further, the cover film can have good peeling resistance, filling property, solder heat resistance, bendability, flame resistance, and ion mobility resistance.

100、200‧‧‧封裝品 100,200‧‧‧Package

110、210‧‧‧覆蓋膜 110, 210‧‧ ‧ cover film

120、220‧‧‧塑膠基材 120, 220‧‧‧ plastic substrate

130、230‧‧‧離型紙 130, 230‧‧‧ release paper

200F‧‧‧軟性印刷電路板 200F‧‧‧Soft printed circuit board

241‧‧‧銅電路佈線層 241‧‧‧ copper circuit wiring layer

243‧‧‧聚醯亞胺基板 243‧‧‧ Polyimine substrate

240‧‧‧軟性印刷電路板半成品 240‧‧‧Soft printed circuit board semi-finished products

250‧‧‧緩衝材阻膠離型膜 250‧‧‧buffering material release film

310A、310B、310C、310D、310E、310F‧‧‧覆蓋膜 310A, 310B, 310C, 310D, 310E, 310F‧‧‧ cover film

320A、320B、320C、320D、320E、320F‧‧‧銅電路佈線層 320A, 320B, 320C, 320D, 320E, 320F‧‧‧ copper circuit wiring layer

DI、D2、D3、D4、D5、D6‧‧‧間距 DI, D2, D3, D4, D5, D6‧‧‧ spacing

為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之詳細說明如下:[圖1]係繪示包含本發明之覆蓋膜之封裝品;[圖2A]至[圖2F]係繪示本發明之軟性印刷電路板之製造方法的中間製程剖面圖;[圖3]係繪示應用本發明實施例3之樹脂組成物所形成之覆蓋膜的軟性印刷電路板之絕緣阻抗的變化圖;以及[圖4]係繪示本發明實施例3之樹脂組成物所形成之覆蓋膜應用於製作軟性印刷電路板之剖面電子顯微鏡圖。 The above and other objects, features, advantages and embodiments of the present invention will become more <RTIgt; <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; 2A] to [FIG. 2F] are cross-sectional views showing the intermediate process of the method for manufacturing the flexible printed circuit board of the present invention; [FIG. 3] showing the softness of the cover film formed by applying the resin composition of Example 3 of the present invention. A variation diagram of the insulation resistance of the printed circuit board; and [Fig. 4] is a cross-sectional electron micrograph showing a cover film formed by the resin composition of the embodiment 3 of the present invention applied to a flexible printed circuit board.

本發明之一態樣是提出一種樹脂組成物,其係包含環氧樹脂(A)、硬化劑(B)、催化劑(C)、耐燃劑(D)、 增韌劑(E)以及溶劑(F)。藉由上述樹脂組成物所製得之覆蓋膜,具有單層結構並可直接設於銅電路佈線層上,以減少所製得之軟性印刷電路板的厚度。此外,所述覆蓋膜兼具良好的抗剝離性、填覆性、焊接耐熱性、彎曲性、耐燃性以及抗離子遷移性。 One aspect of the present invention provides a resin composition comprising an epoxy resin (A), a hardener (B), a catalyst (C), a flame retardant (D), Toughener (E) and solvent (F). The cover film obtained by the above resin composition has a single layer structure and can be directly provided on the copper circuit wiring layer to reduce the thickness of the obtained flexible printed circuit board. Further, the cover film has good peeling resistance, filling property, solder heat resistance, bendability, flame resistance, and ion mobility resistance.

本發明此處所稱之單層結構,係指覆蓋膜不需使用黏著劑(意即覆蓋膜不包含黏著層),而可直接設於銅電路佈線層上。 The single layer structure referred to in the present invention means that the cover film does not need to use an adhesive (that is, the cover film does not include an adhesive layer), and can be directly disposed on the copper circuit wiring layer.

以下具體說明本發明之樹脂組成物的各個成分。 Hereinafter, each component of the resin composition of the present invention will be specifically described.

樹脂組成物Resin composition 環氧樹脂(A)Epoxy resin (A)

本發明此處所稱之環氧樹脂(A)包含第一環氧樹脂(a-1)和第二環氧樹脂(a-2)。 The epoxy resin (A) referred to herein as the first epoxy resin (a-1) and the second epoxy resin (a-2).

第一環氧樹脂(a-1)First epoxy resin (a-1)

本發明此處所稱之第一環氧樹脂(a-1)可包含如下式(I)所示之結構: The first epoxy resin (a-1) referred to herein as the present invention may comprise the structure represented by the following formula (I):

於上述式(I)中,R1,R2,a為0至2之整數,且*代表鍵結處。 In the above formula (I), R 1 is , R 2 is or , a is an integer from 0 to 2, and * represents a bond.

具體而言,第一環氧樹脂(a-1)可為具有如下式(I-1)至式(I-3)所示之結構的化合物或上述化合物的任意組合。 Specifically, the first epoxy resin (a-1) may be a compound having a structure represented by the following formula (I-1) to formula (I-3) or any combination of the above compounds.

在一例子中,第一環氧樹脂(a-1)可使用如卡德萊公司(Cardolite Corporation)所製之型號為NC-513、NC-514、NC-547的商品或上述之任意組合。 In an example, the first epoxy resin (a-1) may be a product of the model number NC-513, NC-514, NC-547 manufactured by Cardolite Corporation or any combination of the above.

基於環氧樹脂(A)之使用量為100重量份,第一環氧樹脂(a-1)的使用量可為30重量份至50重量份。若環氧樹脂(A)中不含第一環氧樹脂(a-1),或其使用量過少,所製得之覆蓋膜的抗剝離強度、耐燃性和焊接耐熱性不佳。另一方面,若第一環氧樹脂(a-1)的使用量過多,由於第一環氧樹脂(a-1)屬於低黏度之環氧樹脂,當進行覆蓋膜的製程時,樹脂組成物會有成形性不佳的問題。 The first epoxy resin (a-1) may be used in an amount of 30 parts by weight to 50 parts by weight based on 100 parts by weight of the epoxy resin (A). If the epoxy resin (A) does not contain the first epoxy resin (a-1), or the amount thereof is too small, the resulting cover film is inferior in peeling strength, flame resistance, and solder heat resistance. On the other hand, if the amount of the first epoxy resin (a-1) is too large, since the first epoxy resin (a-1) is a low-viscosity epoxy resin, the resin composition is used in the process of covering the film. There will be problems with poor formability.

第二環氧樹脂(a-2)Second epoxy resin (a-2)

本發明此處所述之第二環氧樹脂(a-2)可包含 酚醛環氧樹脂、雙酚A型環氧樹脂、脂環型環氧樹脂、雜環型環氧樹脂、環氧丙基酯型環氧樹脂或上述之任意組合。 The second epoxy resin (a-2) described herein may comprise A novolac epoxy resin, a bisphenol A epoxy resin, an alicyclic epoxy resin, a heterocyclic epoxy resin, a glycidyl ester epoxy resin, or any combination thereof.

前述之酚醛環氧樹脂可例如使用南亞塑膠工業股份有限公司製之商品型號為NPPN-431A70或NPEB-454A80之產品、長春人造樹脂股份有限公司製之商品型號為CNE-200EL系列之產品、陶氏化學公司製之商品型號為D.E.N438之產品或上述之任意組合,然本發明不限於此。 The phenolic epoxy resin may be, for example, a product of the product type NPPN-431A70 or NPEB-454A80 manufactured by Nanya Plastics Co., Ltd., a product of the CNE-200EL series manufactured by Changchun Synthetic Resin Co., Ltd., Dow. The product model of the company manufactured by Chemical Co., Ltd. is a product of DEN 438 or any combination of the above, but the invention is not limited thereto.

前述之雙酚A型環氧樹脂可例如為長春人造樹脂股份有限公司製之商品型號為BE-188之產品、陶氏化學公司製之商品型號為DER671之產品、亨斯邁公司(Huntsman)製之商品名為GT-7071或GT-7072之產品、Kukdo化學公司製之商品型號為KD-211G之產品或上述之任意組合,然本發明不限於此。 The bisphenol A type epoxy resin described above may be, for example, a product of the product type BE-188 manufactured by Changchun Synthetic Resin Co., Ltd., a product of the product type DER671 manufactured by The Dow Chemical Co., Ltd., manufactured by Huntsman. The product of the trade name of GT-7071 or GT-7072, the product of Kukdo Chemical Co., Ltd. of the product type KD-211G, or any combination of the above, is not limited thereto.

前述之脂環型環氧樹脂可例如使用3,4-環氧環己基甲基-3’,4’-環氧環己烷羧酸酯、3,4-環氧環己基甲基-3’,4’-環氧環己烷羧酸酯與己內酯的二聚體加成物、1,2,8,9-二環氧檸烯或上述之任意組合。具體而言可例如為DAICEL公司製之商品型號為CELLOXIDE 2021、2081或3000之產品,然本發明不限於此。 As the aforementioned alicyclic epoxy resin, for example, 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, 3,4-epoxycyclohexylmethyl-3' can be used. , a dimer adduct of 4'-epoxycyclohexane carboxylate and caprolactone, 1,2,8,9-diepoxylimene or any combination thereof. Specifically, it can be, for example, a product of the type of CELLOXIDE 2021, 2081 or 3000 manufactured by DAICEL Co., Ltd., but the present invention is not limited thereto.

前述之雜環型環氧樹脂可例如使用亨斯邁先進材料製之商品名為AralditePT810之產品、日產化學工業社製之商品名為TEPIC之產品或上述之組合,然本發明不限於此。 The above heterocyclic epoxy resin may be, for example, a product of the trade name of Araldite PT810 manufactured by Huntsman Advanced Materials, a product of the trade name TEPIC manufactured by Nissan Chemical Industries, Ltd., or a combination thereof, but the present invention is not limited thereto.

前述之環氧丙基酯型環氧樹脂可包含甲基丙烯酸環氧丙基酯共聚系環氧樹脂、環己基馬來醯亞胺與甲基丙烯酸環氧丙基酯的共聚環氧樹脂或上述之組合,然本發明不限於此。 The above-mentioned epoxy propyl ester type epoxy resin may comprise a copolymerized epoxy resin of a glycidyl methacrylate copolymer copolymer, a cyclohexylmaleimide and a glycidyl methacrylate or the above Combinations of the invention are not limited thereto.

在一較佳的例子中,可例如將第一環氧樹脂(a-1)與酚醛環氧樹脂和雙酚A型環氧樹脂同時使用。 In a preferred embodiment, the first epoxy resin (a-1) can be used, for example, with a novolac epoxy resin and a bisphenol A type epoxy resin.

基於環氧樹脂(A)的使用量為100重量份,第二環氧樹脂(a-2)的使用量可為50重量份至70重量份。若樹脂組成物中未使用第二環氧樹脂(a-2),則樹脂組成物的成形性不佳,不易形成覆蓋膜。 The second epoxy resin (a-2) may be used in an amount of 50 parts by weight to 70 parts by weight based on 100 parts by weight of the epoxy resin (A). When the second epoxy resin (a-2) is not used in the resin composition, the moldability of the resin composition is not good, and it is difficult to form a cover film.

硬化劑(B)Hardener (B)

本發明此處所稱之硬化劑(B)可包含多胺基化合物、酞酐化合物或上述之任意組合。 The hardener (B) referred to herein as the present invention may comprise a polyamine-based compound, an phthalic anhydride compound, or any combination thereof.

具體而言,上述多胺基化合物可例如為二乙撐基三胺、二胺基二苯基甲烷、3,3’-二胺基二苯基碸、4,4’-二胺基二苯基碸、雙腈胺或上述之任意組合。 Specifically, the above polyamine compound may be, for example, diethylenetriamine, diaminodiphenylmethane, 3,3'-diaminodiphenylphosphonium, 4,4'-diaminodiphenyl Base, dinitramine or any combination of the above.

具體而言,上述之酞酐化合物可例如為酞酐、四氫酞酐或上述之任意組合。 Specifically, the above phthalic anhydride compound may be, for example, phthalic anhydride, tetrahydrophthalic anhydride or any combination of the above.

在一較佳的例子中,可選擇性地於樹脂組成物中使用具有不同作用溫度之硬化劑,例如:同時使用二胺基二苯基碸和雙腈胺,可使樹脂組成物於不同溫度下,具有不同的熱固化程度。 In a preferred embodiment, a hardener having different operating temperatures can be selectively used in the resin composition, for example, using both diaminodiphenylphosphonium and dinitrileamine to make the resin composition at different temperatures. Under, have different degrees of thermal cure.

基於上述環氧樹脂(A)的使用量為100重量 份,硬化劑(B)的使用量可為16重量份至20重量份。若硬化劑(B)的使用量未落於上述主張的範圍中,覆蓋膜會有耐燃性、焊接耐熱性及/或抗剝離強度不佳的問題。 Based on the above epoxy resin (A), the amount used is 100 weight. The curing agent (B) may be used in an amount of from 16 parts by weight to 20 parts by weight. If the amount of the curing agent (B) used does not fall within the above-mentioned range, the cover film may have a problem of poor flame resistance, solder heat resistance, and/or peel strength.

催化劑(C)Catalyst (C)

本發明此處所稱之催化劑(C)可包含咪唑化合物、三級膦、氟化硼錯合物或上述之任意組合。 The catalyst (C) referred to herein as the invention may comprise an imidazole compound, a tertiary phosphine, a boron fluoride complex or any combination of the above.

在一具體例子中,上述之咪唑化合物可包括但不限於1-甲基咪唑、2-甲基咪唑、2-乙基-4-甲基咪唑或上述之組合。 In a specific example, the imidazole compound described above may include, but is not limited to, 1-methylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, or a combination thereof.

在一具體例子中,上述之三級膦可為三苯基膦、三丁基膦或上述之組合。 In a specific example, the above tertiary phosphine may be triphenylphosphine, tributylphosphine or a combination thereof.

在一具體例子中,上述之氟化硼錯合物可例如為三氟化硼與單乙基胺之錯合物、三氟化硼與正丁基胺之錯合物、三氟化硼與苯胺之錯合物、氟硼化鋅或上述之組合。 In a specific example, the boron fluoride complex may be, for example, a complex of boron trifluoride and monoethylamine, a complex of boron trifluoride and n-butylamine, and boron trifluoride. An aniline complex, zinc borohydride or a combination thereof.

在一較佳的例子中,催化劑(C)可為氟化硼錯合物與咪唑化合物之組合。 In a preferred embodiment, the catalyst (C) can be a combination of a boron fluoride complex and an imidazole compound.

基於上述環氧樹脂(A)的使用量為100重量份,催化劑(C)之使用量可為0.8重量份至1重量份。本發明之催化劑係作為硬化促進劑使用,其有助於樹脂組成物的固化。若催化劑(C)的使用量過少,則由樹脂組成物所製得之覆蓋膜的耐燃性和焊接耐熱性不佳。 The catalyst (C) may be used in an amount of from 0.8 part by weight to 1 part by weight based on 100 parts by weight of the epoxy resin (A). The catalyst of the present invention is used as a hardening accelerator which contributes to the curing of the resin composition. When the amount of the catalyst (C) used is too small, the flame retardancy and solder heat resistance of the cover film obtained from the resin composition are not good.

耐燃劑(D)Flame retardant (D)

本發明此處所稱之耐燃劑(D)可由含磷化合物以及含金屬化合物所組成。上述含金屬化合物包含金屬氧化物或金屬氫氧化物。較佳地,含金屬化合物其平均粒徑為1μm至5μm。 The flame retardant (D) referred to herein as being composed of a phosphorus-containing compound and a metal-containing compound. The above metal-containing compound contains a metal oxide or a metal hydroxide. Preferably, the metal-containing compound has an average particle diameter of from 1 μm to 5 μm.

具體而言,上述含磷化合物包括但不限於雙酚聯苯磷酸鹽、聚磷酸銨、對苯二酚-雙-(聯苯基磷酸鹽)、亞磷酸鉀、亞磷酸鈉、二乙基磷酸鋁或上述之任意組合。 Specifically, the above phosphorus-containing compound includes, but is not limited to, bisphenol biphenyl phosphate, ammonium polyphosphate, hydroquinone-bis-(biphenyl phosphate), potassium phosphite, sodium phosphite, diethyl phosphate Aluminum or any combination of the above.

具體而言,上述金屬氧化物可包含三氧化銻。 Specifically, the above metal oxide may contain antimony trioxide.

具體而言上述金屬氫氧化物可例如為氫氧化鋁、氫氧化鎂或上述之組合。 Specifically, the above metal hydroxide may be, for example, aluminum hydroxide, magnesium hydroxide or a combination thereof.

基於上述環氧樹脂(A)的使用量為100重量份,耐燃劑(D)的使用量可為50重量份至60重量份。在一較佳的例子中,基於耐燃劑(D)的使用量為100重量份,含金屬化合物之使用量為30重量份至50重量份。 The flame retardant (D) may be used in an amount of 50 parts by weight to 60 parts by weight based on 100 parts by weight of the epoxy resin (A). In a preferred example, the amount of the metal-containing compound used is from 30 parts by weight to 50 parts by weight based on 100 parts by weight of the flame retardant (D).

補充說明的是,若含金屬化合物的平均粒徑不小於5μm,則耐燃劑(D)無法均勻分散於樹脂組成物中,使得樹脂組成物無法均勻塗佈於基材上。 In addition, when the average particle diameter of the metal-containing compound is not less than 5 μm, the flame retardant (D) cannot be uniformly dispersed in the resin composition, so that the resin composition cannot be uniformly applied to the substrate.

增韌劑(E)Toughener (E)

本發明此處所稱之增韌劑(E)至少包含聚酯樹脂。在一例子中,上述聚酯樹脂較佳可為聚胺基甲基酯。 The toughening agent (E) referred to herein as at least comprises a polyester resin. In one example, the above polyester resin may preferably be a polyaminomethyl ester.

在一實施例中,增韌劑(E)可更包含其他增韌劑,例如:丁腈橡膠、苯氧基樹脂、聚醯胺醯亞胺樹脂或上述之任意組合。 In an embodiment, the toughening agent (E) may further comprise other toughening agents, such as: nitrile rubber, phenoxy resin, polyamidoximine resin, or any combination thereof.

在一例子中,丁腈橡膠可例如為羧基丙烯基腈丁二烯橡膠、丁二烯-丙烯腈共聚物、環氧變性丁二烯橡膠或上述之任意組合。 In one example, the nitrile rubber can be, for example, a carboxyacrylonitrile butadiene rubber, a butadiene-acrylonitrile copolymer, an epoxy modified butadiene rubber, or any combination thereof.

基於上述環氧樹脂(A)的使用量為100重量份,增韌劑(E)除了可加強樹脂組成物所製得之覆蓋膜的彎曲性之外,也可進一步提升覆蓋膜的耐燃性。使用量可為70重量份至90重量份。本發明此處選用聚酯樹脂作為增韌劑(E),因此,若未使用聚酯樹脂作為增韌劑(E)或增韌劑(E)的使用量過少,覆蓋膜的耐燃性不佳。然而,若添加過多的增韌劑(E),覆蓋膜的彎曲性亦不佳。 The toughening agent (E) can further improve the flame resistance of the cover film in addition to the flexibility of the cover film obtained by reinforcing the resin composition, based on the use amount of the epoxy resin (A) of 100 parts by weight. The amount used may be from 70 parts by weight to 90 parts by weight. In the present invention, a polyester resin is used as the toughening agent (E). Therefore, if the polyester resin is not used as the toughening agent (E) or the toughening agent (E) is too small, the flame resistance of the cover film is not good. . However, if too much toughening agent (E) is added, the flexibility of the cover film is also poor.

溶劑(F)Solvent (F)

本發明此處所稱之溶劑(F)並無特別限制,僅以可溶解環氧樹脂(A),並分散硬化劑(B)、催化劑(C)、耐燃劑(D)以及增韌劑(E),但不與上述成分反應者為宜。 The solvent (F) referred to herein as the solvent is not particularly limited, and is only soluble in the epoxy resin (A), and the hardener (B), the catalyst (C), the flame retardant (D), and the toughening agent (E) are dispersed. ), but it is not suitable for the reaction with the above components.

在一具體的例子中,溶劑(F)可包括但不限於丙酮、丁酮、甲苯、二甲苯、二甲基甲醯胺、乙二醇單甲醚、丙二醇甲基醚或上述之任意組合。 In a specific example, the solvent (F) may include, but is not limited to, acetone, methyl ethyl ketone, toluene, xylene, dimethylformamide, ethylene glycol monomethyl ether, propylene glycol methyl ether, or any combination thereof.

基於上述環氧樹脂(A)的使用量為100重量份,溶劑(F)的使用量可為75重量份至85重量份。 The solvent (F) may be used in an amount of from 75 to 85 parts by weight based on 100 parts by weight of the epoxy resin (A).

添加劑(G)Additive (G)

本發明之樹脂組成物可更包含添加劑(G)。上述添加劑(G)可包括但不限於抗氧化劑、陽離子捕捉劑、陰 離子捕捉劑、分散劑、流平劑或上述之任意組合。 The resin composition of the present invention may further contain an additive (G). The above additive (G) may include, but is not limited to, an antioxidant, a cation scavenger, and a yin Ion trapping agent, dispersing agent, leveling agent or any combination of the above.

上述之抗氧化劑可例如為二硬脂基季戊四醇二亞磷酸酯、亞磷酸一苯二異癸酯和碳烷基-4,4二異叉-脂肪醇-亞磷酸螯合化合聚合物或上述之任意組合。具體而言,抗氧化劑可使用如ADEKA公司所製造之型號為STAB PEP-8T(AR-2)之產品。 The above antioxidant may be, for example, distearyl pentaerythritol diphosphite, phenyl diisononyl phosphite, and a carbon alkyl-4,4 diisoprene-fatty alcohol-phosphite chelate compound or the above random combination. Specifically, as the antioxidant, a product of the type STAB PEP-8T (AR-2) manufactured by ADEKA Corporation can be used.

上述分散劑可例如為聚酯改性之聚二甲基矽烷。具體而言,分散劑可使用由畢克化學助劑與儀器製造之型號為BYK-310之產品。上述流平劑可例如使用由畢克化學助劑與儀器製造之型號為BYK-W903之產品。 The above dispersing agent may, for example, be a polyester-modified polydimethyldecane. Specifically, the dispersant may be a product of the type BYK-310 manufactured by BYK Chemical Additives and Instruments. The above leveling agent can be, for example, a product of the type BYK-W903 manufactured by BYK Chemical Additives and Instruments.

特別說明的是,雖然可額外添加陽離子捕捉劑及/或陰離子捕捉劑於本發明之樹脂組成物中,以增加抗離子遷移性。然而,在本發明中,陽離子捕捉劑及/或陰離子捕捉劑並非必要添加,代表本發明之樹脂組成物具有滿足目前市場需求之良好的抗離子遷移性。 In particular, although a cation scavenger and/or an anionic scavenger may be additionally added to the resin composition of the present invention to increase the ion mobility. However, in the present invention, the cation scavenger and/or the anion scavenger are not necessarily added, and the resin composition of the present invention has good ion mobility resistance which satisfies the current market demand.

樹脂組成物的製造方法Method for producing resin composition

本發明之樹脂組成物之製造方法係首先將硬化劑(B)、催化劑(C)、選擇性添加的添加劑(G)以及溶劑(F),加入反應器中混合。之後,於上述反應器中加入環氧樹脂(A)以及耐燃劑(D),並進行混合。接著,於上述反應器中加入增韌劑(E),並於室溫中混合攪拌,以製得本發明之樹脂組成物。其中,在25℃下,樹脂組成物的黏度較佳為1000cps至2000cps。 The method for producing a resin composition of the present invention is to first add a curing agent (B), a catalyst (C), a selectively added additive (G), and a solvent (F) to a reactor for mixing. Thereafter, an epoxy resin (A) and a flame retardant (D) were added to the above reactor and mixed. Next, a toughening agent (E) is added to the above reactor, and stirred and stirred at room temperature to obtain a resin composition of the present invention. Among them, the viscosity of the resin composition at 25 ° C is preferably from 1000 cps to 2000 cps.

覆蓋膜的製造方法Cover film manufacturing method

本發明此處之覆蓋膜的製造方法,其係將上述樹脂組成物進行塗佈步驟、烘烤步驟以及熟化步驟後,將覆蓋膜形成於基材之表面上。 In the method for producing a cover film according to the present invention, after the resin composition is subjected to a coating step, a baking step, and a aging step, a cover film is formed on the surface of the substrate.

選擇性地,可於覆蓋膜之另一表面(未與基材接觸的一面)上,設置離型紙,以便於所製得之覆蓋膜的運送和保存。 Alternatively, a release paper may be provided on the other surface of the cover film (the side not in contact with the substrate) to facilitate the transport and storage of the prepared cover film.

具體而言,上述之製造方法係首先將樹脂組成物塗佈於基材之表面上。在一例子中,上述基材可例如為聚乙烯對苯二甲酸酯(Polyethylene Terephthalate;PET)之塑膠基材。對塗佈後之基材進行烘烤步驟,以去除樹脂組成物中的溶劑。之後,以70℃的溫度以及1.6kgf/cm2的壓力進行壓合,以製得如圖1所示之封裝品100。圖1係繪示包含本發明之覆蓋膜之封裝品100。在圖1中,覆蓋膜110係設於塑膠基材120和離型紙130之間,以保護覆蓋膜110在運送過程中不易受損。為控制溢膠量,覆蓋膜經過50℃至70℃之溫度下熟化,即可製得本發明之覆蓋膜。 Specifically, in the above production method, the resin composition is first applied onto the surface of the substrate. In one example, the substrate may be, for example, a plastic substrate of polyethylene terephthalate (PET). The coated substrate is subjected to a baking step to remove the solvent in the resin composition. Thereafter, press-bonding was carried out at a temperature of 70 ° C and a pressure of 1.6 kgf / cm 2 to obtain a package 100 as shown in FIG. Figure 1 illustrates a package 100 comprising a cover film of the present invention. In FIG. 1, the cover film 110 is disposed between the plastic substrate 120 and the release paper 130 to protect the cover film 110 from being easily damaged during transportation. In order to control the amount of overflow, the cover film is aged at a temperature of 50 ° C to 70 ° C to obtain the cover film of the present invention.

補充說明的是,圖1所示之封裝品100具有三層膜(覆蓋膜110、塑膠基材120和離型紙130),然而當應用於製造軟性印刷電路板時,僅使用覆蓋膜110來保護銅電路佈線層。換言之,本發明之覆蓋膜110應用於製造軟性印刷電路板時,具有單層結構,不需透過黏著層就可以直接設置於軟性印刷電路板的銅電路佈線層上。 It should be noted that the package 100 shown in FIG. 1 has a three-layer film (cover film 110, plastic substrate 120, and release paper 130), but when applied to manufacture a flexible printed circuit board, only the cover film 110 is used for protection. Copper circuit wiring layer. In other words, the cover film 110 of the present invention has a single-layer structure when it is used to manufacture a flexible printed circuit board, and can be directly disposed on the copper circuit wiring layer of the flexible printed circuit board without passing through the adhesive layer.

軟性印刷電路板的製造方法Flexible printed circuit board manufacturing method

接下來請參照圖2A至圖2F,其係繪示本發明之軟性印刷電路板之製造方法的中間製程剖面圖。首先,如圖2A所示,提供包含本發明之覆蓋膜的封裝品200,其包含覆蓋膜210、塑膠基材220以及離型紙230。接下來,如圖2B所示,將離型紙230撕除,以暴露出覆蓋膜210。之後,如圖2C所示,將覆蓋膜210設於軟性印刷電路板半成品240之銅電路佈線層241上,並進行預貼達10秒,其中銅電路佈線層241係設於基板243上。在一實施例中,基板243可為聚醯亞胺基板。然後,如圖2D所示,將覆於覆蓋膜210上之基材220撕除。之後,如圖2E所示,高溫進行熱壓合,其中可使用緩衝材阻膠離型膜250將覆蓋膜210與壓合機隔開,以避免覆蓋膜210受損。接著,加熱至前述硬化劑(B)的硬化溫度,以進行硬化步驟,則可製得本發明之軟性印刷電路板200F。 2A to 2F, which are cross-sectional views showing an intermediate process of the method of manufacturing the flexible printed circuit board of the present invention. First, as shown in FIG. 2A, a package 200 comprising a cover film of the present invention is provided, which comprises a cover film 210, a plastic substrate 220, and a release paper 230. Next, as shown in FIG. 2B, the release paper 230 is peeled off to expose the cover film 210. Thereafter, as shown in FIG. 2C, the cover film 210 is placed on the copper circuit wiring layer 241 of the flexible printed circuit board blank 240, and pre-adhered for 10 seconds, wherein the copper circuit wiring layer 241 is attached to the substrate 243. In an embodiment, the substrate 243 can be a polyimide substrate. Then, as shown in FIG. 2D, the substrate 220 overlying the cover film 210 is peeled off. Thereafter, as shown in FIG. 2E, the high temperature is subjected to thermocompression, wherein the buffer film release film 250 may be used to separate the cover film 210 from the press to prevent the cover film 210 from being damaged. Next, the flexible printed circuit board 200F of the present invention can be obtained by heating to the curing temperature of the curing agent (B) to perform a hardening step.

特別說明的是,如圖2F可知,本發明之覆蓋膜210可在不使用黏著劑的情況下,直接與銅電路佈線層241以及基材243壓合,故本發明之覆蓋膜210為單層結構。 Specifically, as shown in FIG. 2F, the cover film 210 of the present invention can be directly pressed against the copper circuit wiring layer 241 and the substrate 243 without using an adhesive, so that the cover film 210 of the present invention is a single layer. structure.

在一實施例中,可對封裝品200進行開洞步驟,以使覆蓋膜210可具有通孔,以利於暴露出特定部份的銅電路佈線層(未繪示),增加軟性印刷電路板與其他插件結合之應用性。 In one embodiment, the package 200 may be subjected to a hole opening step so that the cover film 210 may have a through hole to facilitate exposure of a specific portion of the copper circuit wiring layer (not shown), adding a flexible printed circuit board and Other plug-ins combine the applicability.

接下來以數個實施例具體說明本發明之樹脂組 成物以及其所達到的功效。 Next, the resin group of the present invention will be specifically described in several embodiments. The substance and the effect it achieves.

實施例1Example 1

首先將15.2重量份之4,4’-二胺基二苯基碸(B-1)、3.0重量份之二乙撐基三胺(B-2)、0.5重量份之三氟化硼與單乙基胺之錯合物(C-1)、0.4重量份之2-甲基咪唑(C-2)、1.6重量份之二硬脂基季戊四醇二亞磷酸酯(G-1)、0.04重量份之分散劑(畢克化學助劑與儀器製,型號為BYK-310;G-2)、0.22重量份之流平劑(畢克化學助劑與儀器製,型號為BYK-W903;G-3)、69重量份之丁酮(F-1)以及9重量份的甲苯(F-2),加入反應器中進行混合。之後,於上述反應器中加入40重量份如式(I-2)所示之第一環氧樹脂(a-1-1)、40重量份之雙酚A型環氧樹脂(長春人造樹脂股份有限公司製,型號為BE-188;a-2-2)、20重量份之酚醛環氧樹脂(長春人造樹脂股份有限公司製,型號為CNE-200ELB;a-2-1)、33重量份之二乙基磷酸鋁(D-1),以及27重量份且平均粒徑為3μm的氫氧化鋁(D-2),並進行混合。接著,加入80重量份之聚胺基甲基酯(TOYOBO製,型號為SD-5000;E-1),並於室溫中混合,以製得實施例1之樹脂組成物。其中,在25℃下,實施例1之樹脂組成物的黏度為1450cps。 First, 15.2 parts by weight of 4,4'-diaminodiphenylphosphonium (B-1), 3.0 parts by weight of diethylenetriamine (B-2), 0.5 parts by weight of boron trifluoride and a single Ethylamine complex (C-1), 0.4 parts by weight of 2-methylimidazole (C-2), 1.6 parts by weight of distearyl pentaerythritol diphosphite (G-1), 0.04 parts by weight Dispersant (by BYK Chemical Additives and Instruments, model number BYK-310; G-2), 0.22 parts by weight of leveling agent (by BYK Chemical Additives and Instruments, model number BYK-W903; G-3 69 parts by weight of methyl ethyl ketone (F-1) and 9 parts by weight of toluene (F-2) were added to the reactor for mixing. Thereafter, 40 parts by weight of the first epoxy resin (a-1-1) represented by the formula (I-2) and 40 parts by weight of a bisphenol A type epoxy resin (Changchun Synthetic Resin Co., Ltd.) were added to the above reactor. Co., Ltd., model BE-188; a-2-2), 20 parts by weight of phenolic epoxy resin (manufactured by Changchun Synthetic Resin Co., Ltd., model: CNE-200ELB; a-2-1), 33 parts by weight The aluminum diethyl phosphate (D-1) and 27 parts by weight of aluminum hydroxide (D-2) having an average particle diameter of 3 μm were mixed. Next, 80 parts by weight of polyaminomethyl ester (manufactured by TOYOBO, model: SD-5000; E-1) was added and mixed at room temperature to obtain a resin composition of Example 1. Here, the viscosity of the resin composition of Example 1 at 14 ° C was 1450 cps.

接著,將實施例1之樹脂組成物塗佈於塑膠基材。然後,進行烘烤步驟以去除樹脂組成物中的溶劑。之後,進行熱壓合以及熟化步驟控制溢膠量,即可製得實施例1之 覆蓋膜。實施例1之覆蓋膜的評價結果悉如表1所示。 Next, the resin composition of Example 1 was applied to a plastic substrate. Then, a baking step is performed to remove the solvent in the resin composition. After that, the hot pressing and the aging step are performed to control the amount of overflow, and then the first embodiment can be obtained. Cover film. The evaluation results of the cover film of Example 1 are shown in Table 1.

實施例2至3以及比較例2至3Examples 2 to 3 and Comparative Examples 2 to 3

實施例2至3以及比較例2至3係使用與實施例1相同的方法進行,不同的是,實施例2至3以及比較例2至3係改變樹脂組成物中各成份的種類或使用量。關於實施例2至3以及比較例2至3具體之成分種類、使用量以及評價結果悉如表1所示,此處不另贅述。 Examples 2 to 3 and Comparative Examples 2 to 3 were carried out in the same manner as in Example 1, except that Examples 2 to 3 and Comparative Examples 2 to 3 were used to change the kind or amount of each component in the resin composition. . The specific component types, usage amounts, and evaluation results of Examples 2 to 3 and Comparative Examples 2 to 3 are shown in Table 1, and are not described herein.

比較例1Comparative example 1

比較例1係利用與實施例1相同之方法製得覆蓋膜,不同的是,比較例1之覆蓋膜上更設有聚醯亞胺層。換言之,比較例1係屬於雙層結構。關於比較例1之樹脂覆蓋膜的成分及評價結果悉如表1所示。補充說明的是,倘若比較例1未使用聚醯亞胺層,其評價結果類似於比較例2。 In Comparative Example 1, a cover film was obtained by the same method as in Example 1, except that the cover film of Comparative Example 1 was further provided with a polyimide layer. In other words, Comparative Example 1 belongs to a two-layer structure. The components and evaluation results of the resin coating film of Comparative Example 1 are shown in Table 1. It is to be noted that, in the case of Comparative Example 1, the polyimide layer was not used, and the evaluation result was similar to that of Comparative Example 2.

評價方式Evaluation method 1.結構Structure

本發明此處所稱之結構係以單層為佳。具體而言,單層係指所製得之覆蓋膜可直接設置於銅電路佈線層上,不須經由黏著層,使覆蓋膜與銅電路佈線層貼合。另一方面,雙層則係指覆蓋膜係經由黏著層而與銅電路佈線層貼合。本發明以單層結構為較佳。 The structure referred to herein as a single layer is preferred. Specifically, the single layer means that the obtained cover film can be directly disposed on the copper circuit wiring layer, and the cover film and the copper circuit wiring layer are not bonded via the adhesive layer. On the other hand, the double layer means that the cover film is bonded to the copper circuit wiring layer via the adhesive layer. The present invention is preferably a single layer structure.

2.覆蓋膜厚度2. Cover film thickness

本發明此處之覆蓋膜厚度越薄越佳。補充說明的是,在上述所稱之雙層結構中,覆蓋膜厚度為黏著層與覆蓋膜的總厚度。 The thinner the thickness of the cover film herein, the better. It is additionally noted that in the above-mentioned two-layer structure, the thickness of the cover film is the total thickness of the adhesive layer and the cover film.

3.溢膠量3. The amount of glue overflow

將組成物半成品填入圓形溢膠槽中,高溫進行熱壓合,之後加熱至硬化劑(B)的硬化溫度,以進行硬化步驟,使其硬化成膜。檢視上述之膜溢出圓形溢膠槽之寬度,即為所稱之溢膠量。一般而言,上述寬度以0.1mm至0.2mm為宜。倘若溢膠量未落於上述範圍中,會造成使用樹脂組成物而形成的覆蓋膜有絕緣阻抗過大或對基材黏著性不佳的缺點。 The semi-finished product is filled in a circular overflow tank, and is thermocompression-bonded at a high temperature, and then heated to a hardening temperature of the hardener (B) to perform a hardening step to harden it into a film. The width of the above-mentioned film overflow circular overflow tank is examined, which is the so-called overflow amount. In general, the above width is preferably from 0.1 mm to 0.2 mm. If the amount of overflow does not fall within the above range, the coating film formed using the resin composition may have a disadvantage of excessive insulation resistance or poor adhesion to the substrate.

4.剝離強度(對銅或對聚醯亞胺樹脂)4. Peel strength (for copper or p-polyimine resin)

本發明此處所稱之剝離強度係分別將由實施例1至3以及比較例1至3的樹脂組成物所形成之覆蓋膜,形成於銅質基材或聚醯亞胺樹脂基材上,以測試本發明之覆蓋膜對上述二種基材的附著性。 The peeling strength referred to herein is a cover film formed of the resin compositions of Examples 1 to 3 and Comparative Examples 1 to 3, respectively, formed on a copper substrate or a polyimide substrate to be tested. The adhesion of the cover film of the present invention to the above two substrates.

具體而言,首先將前述實施例1至3以及比較例1至3的樹脂組成物塗佈於基材(銅質基材或聚醯亞胺樹脂基材)上。接著,對塗佈後的基材進行熱壓合。之後,再進行硬化,以於基材之表面上形成覆蓋膜。然後,將覆蓋膜切割為寬度1公分、長度10公分的試片。將上述試片以180度 之方向以及50mm/min的速度之剝離力拉曳,檢測覆蓋膜於上述基材剝離時所承受之壓力。 Specifically, first, the resin compositions of the above-described Examples 1 to 3 and Comparative Examples 1 to 3 were applied onto a substrate (a copper substrate or a polyimide substrate). Next, the coated substrate is thermocompression bonded. Thereafter, hardening is further performed to form a cover film on the surface of the substrate. Then, the cover film was cut into test pieces having a width of 1 cm and a length of 10 cm. Take the above test piece at 180 degrees The direction and the peeling force of the speed of 50 mm/min were pulled, and the pressure applied to the cover film when the substrate was peeled off was examined.

5.焊接耐熱性5. Solder heat resistance

焊接耐熱性的測試係首先將本發明之覆蓋膜形成於銅質基材上,其具體形成方式如前述剝離強度的評價方式所述,故此處不另說明。 The test for solder heat resistance is first to form the cover film of the present invention on a copper substrate, and the specific formation method is as described above for the evaluation of the peel strength, and therefore, it will not be described here.

將形成有覆蓋膜之基材裁切為5公分×5公分的試片。之後,將上述試片含浸於288℃之錫液中達30秒。取出試片後,觀察試片是否有脫層或變色。本發明之焊接耐熱性的評價標準如下: The substrate on which the cover film was formed was cut into test pieces of 5 cm × 5 cm. Thereafter, the test piece was immersed in a tin liquid at 288 ° C for 30 seconds. After the test piece was taken out, it was observed whether the test piece had delamination or discoloration. The evaluation criteria of the solder heat resistance of the present invention are as follows:

○:無脫層且無變色。 ○: No delamination and no discoloration.

X:脫層或變色。 X: delamination or discoloration.

6.彎曲性6. Flexibility

彎曲性的測試係首先將本發明之覆蓋膜形成於銅質基材上,其形成方法悉如前述剝離強度的測試方法所示,此處不另說明。之後,將設有覆蓋膜之銅質基材裁切為30mm×5mm的試片。本發明此處所稱之彎曲性係依照MIT法進行,其中作為MIT耐折裝置採用東洋精機制作所製造的帶槽膜耐折疲勞試驗機(型號:549),以彎曲半徑0.38mm、荷重500g,對上述試片進行反復彎曲,直至電路無法導通為止。彎曲次數越多代表彎曲性越佳。 The test of the bendability is first to form the cover film of the present invention on a copper substrate, and the method of forming the same is shown in the test method for the peel strength described above, and is not described here. Thereafter, the copper substrate provided with the cover film was cut into a test piece of 30 mm × 5 mm. The bending property referred to in the present invention is carried out in accordance with the MIT method, and as the MIT folding device, a grooved film folding fatigue tester (model: 549) manufactured by Toyo Seiki Co., Ltd. is used, with a bending radius of 0.38 mm and a load of 500 g. The test piece was repeatedly bent until the circuit could not be turned on. The more the number of bends, the better the bendability.

7.耐燃性7. Flame resistance

本發明此處所稱之耐燃性係以UL94-V0的規定來進行。具體而言,對本發明之覆蓋膜進行2次各為10秒的燃燒測試,若火焰在30秒內熄滅且無燃燒物落下,代表耐燃性佳。反之則耐燃性不佳。具體的評價標準如下: The flame resistance referred to in the present invention is carried out in accordance with the regulations of UL94-V0. Specifically, the cover film of the present invention was subjected to a burning test of 10 seconds each, and if the flame was extinguished within 30 seconds and no burning matter fell, it represented good flame resistance. On the contrary, the flame resistance is not good. The specific evaluation criteria are as follows:

○:火焰在30秒內熄滅且無燃燒物落下,耐燃性佳。 ○: The flame was extinguished within 30 seconds and no burning matter fell, and the flame resistance was good.

X:火焰未在30秒內熄滅,或有無燃燒物落下,耐燃性不佳。 X: The flame is not extinguished within 30 seconds, or there is no burning matter falling, and the flame resistance is not good.

8.抗離子遷移性8. Resistance to ion mobility

本發明進一步將實施例3之樹脂組成物形成覆蓋膜,以進行抗離子遷移性之測試。首先將覆蓋膜貼合於軟性印刷電路板之銅電路佈線層上,其中上述之貼合步驟係以快壓方式進行。接著,對上述之軟性印刷電路板進行硬化程序,以製得抗離子遷移性之測試所需的試片。接下來,在85℃以及相對溼度85%的環境下,對上述試片施加100V之電壓達1000個小時,並紀錄其絕緣阻抗之變化情形。一般而言,在經過1000小時的測試後,絕緣阻抗仍維持在109Ω以上,且測試前後之絕緣阻抗差異小於1個數量級(101)以內,即符合規格(O代表合格;X代表不合格),代表抗離子遷移性佳,其評價結果悉如圖3所示。上述絕緣阻抗差異的計算方式如下式(II)所示。 In the present invention, the resin composition of Example 3 was further formed into a cover film to carry out a test for resistance to ion mobility. First, the cover film is attached to the copper circuit wiring layer of the flexible printed circuit board, and the above-mentioned bonding step is performed in a fast press manner. Next, the above flexible printed circuit board was subjected to a hardening process to obtain a test piece required for the test for resistance to ion mobility. Next, a voltage of 100 V was applied to the test piece for 1000 hours in an environment of 85 ° C and a relative humidity of 85%, and the change in the insulation resistance was recorded. In general, after 1000 hours of testing, the insulation resistance is maintained above 10 9 Ω, and the insulation resistance difference before and after the test is less than 1 order of magnitude (10 1 ), that is, the specifications are met (O stands for pass; X stands for no Qualified), which represents good ion mobility, and the evaluation results are shown in Figure 3. The above difference in insulation resistance is calculated as shown in the following formula (II).

絕緣阻抗差異=測試前的絕緣阻抗/測試後之絕緣阻抗式(II) Insulation resistance difference = insulation resistance before test / insulation resistance after test (II)

9.填覆性9. Coverage

本發明進一步將實施例3之樹脂組成物形成覆蓋膜,以進行填覆性之測試。上述測試係採用與抗離子遷移性之測試相同製造方法所製得之試片,惟填覆性之測試採用具有不同間距(25μm、30μm、35μm、40μm、45μm以及50μm)之銅電路佈線層。將上述試片之剖面以電子顯微鏡觀察,若電路佈線之間的空隙可為本發明之覆蓋膜所填滿,代表填覆性佳。填覆性之評價結果悉如圖4所示。 In the present invention, the resin composition of Example 3 was further formed into a cover film for the test of the filling property. The above test was a test piece prepared by the same manufacturing method as the ion mobility resistance test, except that the test for the filling property was a copper circuit wiring layer having different pitches (25 μm, 30 μm, 35 μm, 40 μm, 45 μm, and 50 μm). The cross section of the test piece was observed by an electron microscope, and the gap between the circuit wirings was filled with the cover film of the present invention, indicating that the filling property was good. The results of the evaluation of the filling are shown in Figure 4.

根據表1之實施例1至3可知,利用本發明之樹脂組成物所製得之覆蓋膜,可具有單層結構,進而可具有較薄的厚度。此外,本發明之覆蓋膜對銅質基材以及聚醯亞胺基材都具有良好的抗剝離強度(或稱附著性)以及焊接耐熱性,且覆蓋膜更具有良好的彎曲性、耐燃性以及抗離子遷移性。 According to the examples 1 to 3 of Table 1, the cover film obtained by using the resin composition of the present invention may have a single layer structure and further have a relatively thin thickness. In addition, the cover film of the present invention has good peeling strength (or adhesion) and solder heat resistance to the copper substrate and the polyimide substrate, and the cover film has better bendability and flame resistance. Resistance to ion mobility.

此外,根據圖3可知,本發明之樹脂組成物所形成的覆蓋膜,在經過1000個小時100V電壓的測試後,整體絕緣阻抗仍有109Ω,且測試前後之絕緣阻抗差異小於1個數量級,代表所製得之覆蓋膜具有良好的抗離子遷移性。再者,根據圖4可知,本發明之覆蓋膜(例如:覆蓋膜310A至覆蓋膜310F)對於間距在25μm至50μm(間距D1為50μm、間距D2為45μm、間距D3為40μm、間距D4為35μm、間距D5為30μm以及間距D6為25μm)之銅電路佈線層(例如銅電路佈線層320A至銅電路佈線層320F)的軟性印刷電路 板,可具有良好的填覆性。 In addition, according to FIG. 3, the cover film formed by the resin composition of the present invention has an overall insulation resistance of 10 9 Ω after 1000 hours of voltage measurement for 1000 hours, and the difference in insulation resistance before and after the test is less than one order of magnitude. , representing that the prepared cover film has good resistance to ion mobility. 4, the cover film of the present invention (for example, the cover film 310A to the cover film 310F) has a pitch of 25 μm to 50 μm (pitch D1 of 50 μm, pitch D2 of 45 μm, pitch D3 of 40 μm, and pitch D4 of 35 μm). The flexible printed circuit board of the copper circuit wiring layer (for example, the copper circuit wiring layer 320A to the copper circuit wiring layer 320F) having a pitch D5 of 30 μm and a pitch D6 of 25 μm can have good filling property.

另一方面,根據表1之比較例可知,當樹脂組成物中的各成分或其使用量未符合本發明所主張的範圍時,無法達到本發明預定的厚度、溢膠量、剝離強度、彎曲性、耐燃性及/或焊接耐熱性。特別是,根據表1之比較例1可知,在未使用本發明之第一環氧樹脂(a-1)的情況下,利用習知之雙層結構(聚醯亞胺層加黏著層)的覆蓋膜雖然可改善抗剝離強度,並藉由所覆蓋之聚醯亞胺層增加彎曲性,然而比較例1之覆蓋膜的厚度較厚,不符合目前追求輕薄化之目標。此外,倘若比較例1之覆蓋膜未形成雙層結構,其組成類似於比較例2,故其評價結果亦類似於比較例2,無法達到本發明預定之性質。 On the other hand, according to the comparative example of Table 1, it is understood that when the respective components in the resin composition or the amount thereof used do not conform to the range claimed by the present invention, the predetermined thickness, the amount of overflow, the peel strength, and the bending of the present invention cannot be attained. Properties, flame resistance and/or solder heat resistance. In particular, according to Comparative Example 1 of Table 1, it is understood that, in the case where the first epoxy resin (a-1) of the present invention is not used, coverage by a conventional two-layer structure (polyimine layer plus adhesive layer) is used. Although the film can improve the peeling strength and increase the flexibility by the covered polyimide layer, the thickness of the cover film of Comparative Example 1 is thick, which does not meet the current goal of thinning. Further, if the cover film of Comparative Example 1 did not form a two-layer structure and its composition was similar to that of Comparative Example 2, the evaluation result was also similar to that of Comparative Example 2, and the intended properties of the present invention could not be attained.

應用本發明之樹脂組成物、覆蓋膜以及軟性印刷電路板,藉由樹脂組成物特定組成(如:第一環氧樹脂(a-1)與第二環氧樹脂(a-2)之特定使用量比例,以及特定種類之增韌劑),可使所製得之覆蓋膜在不需黏著劑層的情況下,直接設置於銅電路佈線層上,換言之,覆蓋膜具有單層結構且厚度較薄。此外,覆蓋膜兼具良好的抗剝離強度、焊接耐熱性、彎曲性、耐燃性、抗離子遷移性以及填覆性。 The resin composition, the cover film, and the flexible printed circuit board of the present invention are applied by a specific composition of the resin composition (for example, specific use of the first epoxy resin (a-1) and the second epoxy resin (a-2) The ratio of the amount, and the specific type of toughening agent, can be directly disposed on the copper circuit wiring layer without the adhesive layer, in other words, the cover film has a single layer structure and the thickness is relatively small. thin. In addition, the cover film has good peel strength, solder heat resistance, bendability, flame resistance, ion mobility resistance, and filling properties.

雖然本發明已以數個實施例揭露如上,然其並非用以限定本發明,在本發明所屬技術領域中任何具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above in terms of several embodiments, it is not intended to limit the scope of the invention, and the invention may be practiced in various embodiments without departing from the spirit and scope of the invention. The scope of protection of the present invention is defined by the scope of the appended claims.

a-1-1式(I-2)之化合物(卡德萊公司製;NC-514) Compound of formula (1-1) (a-2) (made by Cardolite Co., Ltd.; NC-514)

a-2-1酚醛環氧樹脂(長春人造樹脂股份有限公司製;型號為CNE-200ELB;環氧當量:200g/eq) A-2-1 phenolic epoxy resin (manufactured by Changchun Synthetic Resin Co., Ltd.; model: CNE-200ELB; epoxy equivalent: 200g/eq)

a-2-2雙酚A型環氧樹脂(長春人造樹脂股份有限公司製;型號為BE-188;環氧當量:187g/eq) A-2-2 bisphenol A epoxy resin (manufactured by Changchun Synthetic Resin Co., Ltd.; model BE-188; epoxy equivalent: 187g/eq)

a-3-1雙酚A型環氧樹脂(長春人造樹脂股份有限公司製;型號為BE-150X-75;環氧當量:500g/eq) A-3-1 bisphenol A epoxy resin (manufactured by Changchun Synthetic Resin Co., Ltd.; model: BE-150X-75; epoxy equivalent: 500g/eq)

B-1 4,4’-二胺基二苯基碸(Atul公司製;商品名為AtulSulpho 44DDS) B-1 4,4'-diaminodiphenyl hydrazine (manufactured by Atul; trade name AtulSulpho 44DDS)

B-2 二乙撐基三胺(勤裕企業製) B-2 Diethylenetriamine (made by Qinyu Enterprise)

C-1 三氟化硼與單乙基胺之錯合物(東信化學製) C-1 Complex of boron trifluoride and monoethylamine (manufactured by Toshin Chemical Co., Ltd.)

C-2 2-甲基咪唑(四國化成製) C-2 2-methylimidazole (four countries)

D-1 二乙基磷酸鋁(科萊恩化學公司製;型號為OP935) D-1 diethylaluminum phosphate (manufactured by Clariant Chemical Co., Ltd.; model OP935)

D-2 氫氧化鋁(昭和化工製;型號為H-42M(FAL):平均粒徑為3μm) D-2 aluminum hydroxide (manufactured by Showa Chemical; model H-42M (FAL): average particle size 3 μ m)

E-1 聚胺基甲基酯(TOYOBO製;型號為SD-5000) E-1 Polyaminomethyl ester (TOYOBO; model SD-5000)

E-2 丙烯腈-丁二烯橡膠(南帝化工製;型號為Hycarl042) E-2 Acrylonitrile-butadiene rubber (made by Nandi Chemical; model is Hycarl042)

F-1 丁酮 F-1 butanone

F-2 甲苯 F-2 toluene

G-1 二硬脂基季戊四醇二亞磷酸酯(抗氧化劑;ADEKA公司製;型號為STAB PEP-8T(AR-2)) G-1 distearyl pentaerythritol diphosphite (antioxidant; manufactured by ADEKA; model STAB PEP-8T (AR-2))

G-2 分散劑(畢克化學助劑與儀器製;型號為BYK-310) G-2 dispersant (BYK chemical additives and instruments; model BYK-310)

G-3 流平劑(畢克化學助劑與儀器製;型號為BYK-W903) G-3 leveling agent (by BYK Chemical Additives and Instruments; model number BYK-W903)

200F‧‧‧軟性印刷電路板 200F‧‧‧Soft printed circuit board

210‧‧‧覆蓋膜 210‧‧‧ Cover film

241‧‧‧銅電路佈線層 241‧‧‧ copper circuit wiring layer

243‧‧‧聚醯亞胺基板 243‧‧‧ Polyimine substrate

Claims (9)

一種軟性印刷電路板,包含:一基材;一銅電路佈線層,設於該基材之一表面上;以及一覆蓋膜,設於該銅電路佈線層上,其中該覆蓋膜為一單層結構,不具有一黏著層,該覆蓋膜包含一樹脂組成物,且該樹脂組成物包含:環氧樹脂(A),包含:一第一環氧樹脂(a-1),其中該第一環氧樹脂(a-1)具有如下式(I)所示之結構: 於該式(I)中,該R1, 該R2,該a為0至2之整數,且該*為鍵結處;以及 一第二環氧樹脂(a-2);一硬化劑(B);一催化劑(C);一耐燃劑(D);一增韌劑(E),其中該增韌劑(E)包含聚酯樹脂;以及一溶劑(F),其中基於該環氧樹脂(A)之使用量為100重量份,該第一環氧樹脂(a-1)之使用量為30重量份至50重量份,該第二環氧樹脂(a-2)之使用量為50重量份至70重量份,該硬化劑(B)之使用量為16重量份至20重量份,該催化劑(C)之使用量為0.8重量份至1重量份,該耐燃劑(D)之使用量為50重量份至60重量份,該增韌劑(E)之使用量為70重量份至90重量份,以及該溶劑(F)之使用量為75重量份至85重量份。 A flexible printed circuit board comprising: a substrate; a copper circuit wiring layer disposed on a surface of the substrate; and a cover film disposed on the copper circuit wiring layer, wherein the cover film is a single layer The structure does not have an adhesive layer, the cover film comprises a resin composition, and the resin composition comprises: an epoxy resin (A) comprising: a first epoxy resin (a-1), wherein the first ring The oxygen resin (a-1) has a structure represented by the following formula (I): In the formula (I), the R 1 is , the R 2 is or a is an integer from 0 to 2, and the * is a bond; and a second epoxy resin (a-2); a hardener (B); a catalyst (C); a flame retardant (D) a toughening agent (E), wherein the toughening agent (E) comprises a polyester resin; and a solvent (F), wherein the first ring is used based on the epoxy resin (A) used in an amount of 100 parts by weight The oxygen resin (a-1) is used in an amount of 30 parts by weight to 50 parts by weight, and the second epoxy resin (a-2) is used in an amount of 50 parts by weight to 70 parts by weight, and the curing agent (B) is used. The amount of the catalyst (C) is from 0.8 part by weight to 1 part by weight, the amount of the flame retardant (D) used is from 50 parts by weight to 60 parts by weight, the toughening agent (for the amount of from 16 parts by weight to 20 parts by weight) E) is used in an amount of from 70 parts by weight to 90 parts by weight, and the solvent (F) is used in an amount of from 75 parts by weight to 85 parts by weight. 如申請專利範圍第1項所述之軟性印刷電路板,其中該第一環氧樹脂(a-1)係選自於由下式(I-1)至式(I-3)所示結構所組成之一族群的至少一者。 The flexible printed circuit board according to claim 1, wherein the first epoxy resin (a-1) is selected from the structures represented by the following formulas (I-1) to (I-3) Forming at least one of a group. 如申請專利範圍第1項所述之軟性印刷電路板,其中該第二環氧樹脂(a-2)包含酚醛環氧樹脂、雙酚A型環氧樹脂、脂環型環氧樹脂、雜環型環氧樹脂、環氧丙基酯型環氧樹脂或上述之任意組合。 The flexible printed circuit board according to claim 1, wherein the second epoxy resin (a-2) comprises a novolac epoxy resin, a bisphenol A epoxy resin, an alicyclic epoxy resin, and a heterocyclic ring. Type epoxy resin, epoxy propyl ester type epoxy resin or any combination of the above. 如申請專利範圍第1項所述之軟性印刷電路板,其中該硬化劑(B)包含多胺基化合物、酞酐化合物或上述之任意組合。 The flexible printed circuit board of claim 1, wherein the hardener (B) comprises a polyamine compound, an phthalic anhydride compound, or any combination thereof. 如申請專利範圍第1項所述之軟性印刷電 路板,其中該催化劑(C)包含咪唑化合物、三級膦、氟化硼錯合物或上述之任意組合。 Soft printing as described in item 1 of the patent application A circuit board in which the catalyst (C) comprises an imidazole compound, a tertiary phosphine, a boron fluoride complex or any combination of the above. 如申請專利範圍第1項所述之軟性印刷電路板,其中該耐燃劑(D)係由一含磷化合物以及一含金屬化合物所組成,且該含金屬化合物包含金屬氧化物或金屬氫氧化物。 The flexible printed circuit board of claim 1, wherein the flame retardant (D) is composed of a phosphorus-containing compound and a metal-containing compound, and the metal-containing compound comprises a metal oxide or a metal hydroxide. . 如申請專利範圍第6項所述之軟性印刷電路板,其中該含金屬化合物之一平均粒徑範圍為1μm至5μm。 The flexible printed circuit board of claim 6, wherein one of the metal-containing compounds has an average particle diameter ranging from 1 μm to 5 μm. 如申請專利範圍第1項所述之軟性印刷電路板,其中該聚酯樹脂為聚胺基甲酸酯。 The flexible printed circuit board of claim 1, wherein the polyester resin is a polyurethane. 如申請專利範圍第1項所述之軟性印刷電路板,其中該覆蓋膜係藉由該樹脂組成物,經一塗佈步驟、一烘烤步驟以及一熟化步驟,設於該銅電路佈線層上。 The flexible printed circuit board of claim 1, wherein the cover film is provided on the copper circuit wiring layer by a coating step, a baking step, and a curing step by the resin composition. .
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