TWI586614B - The groove processing method of the substrate and the groove processing device - Google Patents
The groove processing method of the substrate and the groove processing device Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims description 141
- 238000003672 processing method Methods 0.000 title claims description 10
- 238000003754 machining Methods 0.000 claims description 58
- 230000007246 mechanism Effects 0.000 claims description 52
- 238000000034 method Methods 0.000 claims description 11
- 238000003825 pressing Methods 0.000 claims description 9
- 238000012790 confirmation Methods 0.000 claims description 8
- 239000010408 film Substances 0.000 description 17
- 230000008569 process Effects 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 240000001973 Ficus microcarpa Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- -1 chalcopyrite structure compound Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
- B23K26/0876—Devices involving movement of the laser head in at least one axial direction in at least two axial directions
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
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Description
本發明係關於一種溝槽加工方法,尤其係關於沿著加工預定線於基板表面形成溝槽之基板之溝槽加工方法。又,係關於用以實現其方法之基板之溝槽加工裝置。 The present invention relates to a trench processing method, and more particularly to a trench processing method for a substrate in which a trench is formed on a surface of a substrate along a predetermined line. Further, it relates to a groove processing apparatus for a substrate for realizing the method.
薄膜太陽能電池例如由如以下所示之步驟而製造。即,首先,於玻璃等之基板上形成由Mo膜所構成之下部電極膜,其後,於下部電極膜形成溝槽,藉此分割為短條狀。其次,於下部電極膜上形成CIGS膜等之包含黃銅礦構造化合物半導體膜之化合物半導體膜。然後,將該等半導體膜之一部分藉由溝槽加工而條紋狀地除去並分割為短條狀,以覆蓋該等之方式而形成上部電極膜。最後,將上部電極膜之一部分藉由溝槽加工而條紋狀地剝離並分割為短條狀。 The thin film solar cell is manufactured, for example, by the steps as shown below. That is, first, a lower electrode film made of a Mo film is formed on a substrate such as glass, and then a groove is formed in the lower electrode film, thereby dividing into a short strip shape. Next, a compound semiconductor film containing a chalcopyrite structure compound semiconductor film such as a CIGS film is formed on the lower electrode film. Then, one of the semiconductor films is removed in a stripe shape by trench processing and divided into short strips to cover the surface to form an upper electrode film. Finally, one of the upper electrode films is peeled off in a stripe shape by groove processing and divided into short strips.
於如以上之薄膜太陽能電池之製造中,使用如專利文獻1所示之劃線裝置。該專利文獻1之裝置中,具備載置基板之平台、配置於平台之上方之支承構件及膜切除機構。膜切除機構具有升降自如且於溝槽形成方向揺動自如之擺錘揺動體。 In the manufacture of the above thin film solar cell, a scribing apparatus as disclosed in Patent Document 1 is used. The device of Patent Document 1 includes a platform on which a substrate is placed, a support member disposed above the platform, and a film cutting mechanism. The membrane cutting mechanism has a pendulum swaying body that is freely movable and freely movable in the direction in which the groove is formed.
該專利文獻1之裝置中,於擺錘揺動體之前端裝設溝槽加工工具。藉由如此之構成,於每次往返移行時,可於膜上形成溝槽。 In the apparatus of Patent Document 1, a groove processing tool is attached to the front end of the pendulum swaying body. With such a configuration, a groove can be formed in the film every time it is moved back and forth.
[專利文獻1]日本特開2010-245255號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-245255
專利文獻1之裝置中,裝設有工具之揺動體由揺動軸支承而揺動。又,揺動軸由框體及兩股之構件支承。 In the apparatus of Patent Document 1, the swaying body provided with the tool is supported by the raking shaft and is tilted. Further, the raking shaft is supported by the frame body and the two members.
於如此之專利文獻1之裝置中,為了使揺動體順利地揺動,而必須於揺動軸之軸方向,於揺動體與支承其之兩股之構件之間設置微小之餘量(間隙)。 In the apparatus of Patent Document 1, in order to smoothly sway the swaying body, it is necessary to provide a small margin between the swaying body and the members supporting the two members in the axial direction of the swaying shaft ( gap).
由於該間隙,於溝槽之加工時若使揺動體向溝槽形成方向移動,則揺動體及裝設於其之溝槽加工工具於揺動軸之軸方向搖晃,而溝槽加工工具之位置變得不穩定。因此,無法精度良好地形成溝槽。 Due to the gap, if the swaying body is moved in the direction of the groove formation during the processing of the groove, the swaying body and the groove processing tool mounted thereon are swayed in the axial direction of the swaying shaft, and the groove processing tool The position becomes unstable. Therefore, the groove cannot be formed with high precision.
本發明之課題在於在使用揺動自如地支承溝槽加工工具之頭部於基板形成溝槽之情形時,可使溝槽加工工具穩定,並精度良好地進行溝槽加工。 An object of the present invention is to stabilize a groove processing tool and perform groove processing with high precision when a groove is formed on a substrate by using a head of a groove processing tool.
本發明之第1態樣之基板之溝槽加工方法係如下方法:藉由具備具有載置基板之載置面之平台、頭部、及移動機構之加工裝置而沿著於Y方向延伸之加工預定線於基板表面形成溝槽。頭部具有:揺動軸,其揺動自如地支承溝槽加工工具且於X方向延伸;及限制機構,其限制溝槽加工工具沿著揺動軸移動。移動機構係用以使平台與頭部於水平面內於X方向及與X方向正交之Y方向相對地移動之機構。而且,該溝槽加工方法包含以下之步驟。 A groove processing method for a substrate according to a first aspect of the present invention is a method of extending in the Y direction by a processing apparatus including a stage, a head, and a moving mechanism having a mounting surface on which a substrate is placed. The predetermined line forms a groove on the surface of the substrate. The head has a swaying shaft that slidably supports the groove machining tool and extends in the X direction, and a restriction mechanism that restricts movement of the groove machining tool along the sway axis. The moving mechanism is a mechanism for moving the platform and the head relatively in the horizontal direction in the X direction and the Y direction orthogonal to the X direction. Moreover, the trench processing method includes the following steps.
基板載置步驟:以使基板之加工預定線相對於Y方向於既 定之角度範圍內傾斜之方式將基板載置於平台上。 Substrate mounting step: the planned line of the substrate is aligned with respect to the Y direction The substrate is placed on the platform in a manner that is tilted within a range of angles.
加工位置運算步驟:對基板之加工預定線之加工開始位置與加工結束位置進行運算。 Processing position calculation step: calculating a machining start position and a machining end position of a planned line of the substrate.
加工步驟:根據經運算之加工開始位置與加工結束位置,而一面使溝槽加工工具相對於基板於X方向及Y方向相對移動,一面沿著加工預定線執行溝槽加工。 Processing step: groove processing is performed along the planned line while the groove machining tool is relatively moved in the X direction and the Y direction with respect to the substrate in accordance with the calculated machining start position and the machining end position.
此處,藉由使平台與頭部相對性地移動,而利用裝設於頭部之溝槽加工工具,於基板形成溝槽。 Here, by moving the platform relative to the head, a groove is formed in the substrate by a groove processing tool mounted on the head.
於該溝槽加工時,基板係以加工預定線相對於Y方向於既定之角度範圍內傾斜之方式而載置於平台上。因此,溝槽加工工具相對於Y方向而傾斜移動。此時,由於加工阻力作用於溝槽加工工具,故而藉由該加工阻力,而壓抵於揺動軸之軸方向一側之分力、與沿揺動軸之周圍揺動之分力作用於頭部。如此,藉由加工阻力將頭部壓抵於揺動軸之一端側,故於加工時,頭部與用以支承其之構件之間之間隙消失。因此,溝槽加工時之頭部之位置穩定,從而可精度良好地形成溝槽。 At the time of the groove processing, the substrate is placed on the stage such that the planned line is inclined with respect to the Y direction within a predetermined angle range. Therefore, the groove processing tool is tilted with respect to the Y direction. At this time, since the machining resistance acts on the groove machining tool, the component force that is pressed against the axial direction of the sway axis and the component force that pulsates around the sway axis are acted upon by the machining resistance. head. Thus, the head is pressed against one end side of the swaying shaft by the machining resistance, so that the gap between the head and the member for supporting it disappears during processing. Therefore, the position of the head at the time of groove processing is stabilized, so that the groove can be formed with high precision.
本發明之第2態樣之基板之溝槽加工方法係如第1態樣之溝槽加工方法,其中基板載置步驟包含以下之步驟。 A trench processing method for a substrate according to a second aspect of the present invention is the trench processing method according to the first aspect, wherein the substrate mounting step includes the following steps.
第1步驟:將基板載置於平台上。 Step 1: Place the substrate on the platform.
第2步驟:確認載置於平台之基板之姿勢。 Step 2: Confirm the posture of the substrate placed on the platform.
第3步驟:判定基板中之加工預定線是否相對於Y方向處於既定之傾斜角度之範圍內。 The third step: determining whether the planned line in the substrate is within a range of a predetermined tilt angle with respect to the Y direction.
第4步驟:於基板之加工預定線並非既定之傾斜角度範圍內之情形時,以使之成為既定之角度範圍內之方式控制基板之姿勢。 Step 4: When the planned line of the substrate is not within a predetermined range of the tilt angle, the posture of the substrate is controlled so as to be within a predetermined angle range.
此處,於基板載置於平台上時,於在既定之角度範圍內傾斜之情形時,直接執行以後之步驟。又,於基板載置於平台上時,於基板不 在既定之角度範圍內傾斜之情形時,控制基板之姿勢。因此,於溝槽加工時,頭部與用以支承其之構件之間之間隙確實消失,頭部之位置穩定。 Here, when the substrate is placed on the stage, when the substrate is tilted within a predetermined angle range, the subsequent steps are directly performed. Moreover, when the substrate is placed on the platform, the substrate is not The posture of the substrate is controlled in the case of tilting within a predetermined angle range. Therefore, during the processing of the groove, the gap between the head and the member for supporting it does disappear, and the position of the head is stable.
本發明之第3側面之基板之溝槽加工方法係如第2態樣之溝槽加工方法,其中於第2步驟中,拍攝載置於平台上之基板之對準標記以確認基板之姿勢。 A groove processing method for a substrate according to a third aspect of the present invention is the groove processing method according to the second aspect, wherein in the second step, an alignment mark of the substrate placed on the stage is photographed to confirm the posture of the substrate.
本發明之第4態樣之基板之溝槽加工裝置係沿著於Y方向延伸之加工預定線於基板表面形成溝槽之裝置,且具備:具有載置基板之載置面之平台、頭部、移動機構、基板姿勢確認裝置、基板姿勢控制機構、及控制手段。頭部具有於與Y方向正交之X方向延伸之揺動軸,且具有由揺動軸揺動自如地支承溝槽加工工具、限制溝槽加工工具沿著揺動軸移動之限制機構。移動機構使平台與頭部於水平面內於X方向及Y方向相對性地移動。基板姿勢確認裝置確認載置於平台上之基板之姿勢。基板姿勢控制機構控制相對於頭部之平台上之基板之姿勢。控制手段根據來自基板姿勢確認裝置之確認結果,控制移動機構及基板姿勢控制機構。 A groove processing apparatus for a substrate according to a fourth aspect of the present invention is a device for forming a groove on a surface of a substrate along a planned line extending in the Y direction, and includes: a platform having a mounting surface on which the substrate is placed, and a head The moving mechanism, the substrate posture confirming device, the substrate posture control mechanism, and the control means. The head has a swaying shaft extending in the X direction orthogonal to the Y direction, and has a restricting mechanism that supports the groove machining tool by the swaying shaft and restricts movement of the groove machining tool along the swaying axis. The moving mechanism relatively moves the platform and the head in the horizontal direction in the X direction and the Y direction. The substrate posture confirming device confirms the posture of the substrate placed on the platform. The substrate attitude control mechanism controls the posture of the substrate on the platform relative to the head. The control means controls the moving mechanism and the substrate posture control means based on the confirmation result from the substrate posture confirming means.
而且,控制手段具有加工位置運算功能與移動控制功能。加工位置運算功能係以基板之加工預定線成為既定之角度範圍內之方式對載置於平台之基板中之加工預定線之加工開始位置與加工結束位置進行運算。移動控制功能係根據加工位置運算功能之運算結果控制移動機構,使溝槽加工工具自加工開始位置移動至加工結束位置。 Moreover, the control means has a machining position calculation function and a movement control function. The machining position calculation function calculates the machining start position and the machining end position of the machining planned line placed on the substrate of the platform such that the planned line of the substrate becomes within a predetermined angular range. The movement control function controls the moving mechanism based on the calculation result of the machining position calculation function to move the groove machining tool from the machining start position to the machining end position.
此處,藉由使平台與頭部相對性地移動,而利用裝設於頭部之溝槽加工工具,於基板形成溝槽。 Here, by moving the platform relative to the head, a groove is formed in the substrate by a groove processing tool mounted on the head.
此時,與第1態樣之方法相同,藉由加工阻力將頭部壓抵於揺動軸之一端部,於加工時,頭部與用以支承其之構件之間之間隙消失。因此,溝槽加工時之頭部之位置穩定,從而可精度良好地形成溝槽。 At this time, as in the first aspect, the head is pressed against one end of the swaying shaft by the machining resistance, and the gap between the head and the member for supporting it disappears during processing. Therefore, the position of the head at the time of groove processing is stabilized, so that the groove can be formed with high precision.
本發明之第5態樣之基板之溝槽加工裝置係如第4態樣之裝 置,其中溝槽加工裝置進一步具備控制相對於頭部之平台上之基板之姿勢之基板姿勢控制機構。而且,控制手段進一步具有基板姿勢判定功能與基板姿勢控制功能。基板姿勢判定功能係根據基板姿勢確認裝置所得之確認結果,而判定於載置於平台之基板中,加工預定線是否相對於Y方向於既定之角度範圍內傾斜。基板姿勢控制功能係於基板之加工預定線並非既定之傾斜角度範圍內之情形時,控制基板姿勢控制機構,以使基板之加工預定線成為既定之角度範圍內之方式控制基板之姿勢。而且,控制手段根據來自基板姿勢確認裝置之確認結果,控制基板姿勢控制機構及移動機構。 The groove processing device for the substrate of the fifth aspect of the present invention is as in the fourth aspect The trench processing apparatus further includes a substrate attitude control mechanism that controls a posture of the substrate on the platform of the head. Further, the control means further has a substrate posture determination function and a substrate posture control function. The substrate posture determination function determines whether or not the planned line is inclined within a predetermined angle range with respect to the Y direction based on the result of the confirmation by the substrate posture checking device. The substrate posture control function controls the substrate posture control mechanism to control the posture of the substrate such that the planned line of the substrate is within a predetermined angle range when the predetermined line of processing of the substrate is not within a predetermined tilt angle range. Further, the control means controls the substrate posture control means and the moving means based on the confirmation result from the substrate posture confirming means.
本發明之第6態樣之基板之溝槽加工裝置係如第4或第5態樣之裝置,其中頭部具有基座、保持具、及按壓構件。保持具係相對於基座於上下方向移動自如地支承,並且保持溝槽加工工具。按壓構件係以既定之按壓力將被保持於保持具之溝槽加工工具對基板按壓。 A groove processing apparatus for a substrate according to a sixth aspect of the invention is the device of the fourth or fifth aspect, wherein the head has a base, a holder, and a pressing member. The holder is movably supported in the up and down direction with respect to the susceptor, and holds the groove processing tool. The pressing member presses the groove processing tool held by the holder to the substrate with a predetermined pressing force.
該裝置中,溝槽加工工具係藉由按壓構件對基板以既定之按壓力按壓,並往返移動。而且,於去向移動時與來向移動時之兩者於基板上形成溝槽。 In the device, the groove processing tool presses the substrate with a predetermined pressing force by the pressing member and moves back and forth. Moreover, grooves are formed on the substrate during both the moving direction and the moving direction.
本發明之第7態樣之基板之溝槽加工裝置係如第6態樣之裝置,其中保持具具有保持具本體、固定於保持具本體之支承構件、及揺動構件。揺動構件係於保持具本體與支承構件揺動自如,且沿著揺動軸之軸方向移動自如地支承,於前端裝設有溝槽加工工具,沿著揺動軸之周圍揺動而取得去向移動位置與來向移動位置。 A groove processing apparatus for a substrate according to a seventh aspect of the invention is the apparatus of the sixth aspect, wherein the holder has a holder body, a support member fixed to the holder body, and a raking member. The swaying member is slidably supported by the holder main body and the support member, and is movably supported along the axial direction of the swaying shaft, and is provided with a groove processing tool at the front end, and is obtained by pulsing around the swaying shaft. Go to the moving position and the moving direction.
本發明之第8態樣之基板之溝槽加工裝置係如第7態樣之裝置,其中於保持具本體與支承構件之間,形成有收納被揺動軸支承之揺動構件之空間,限制機構係由保持具本體與支承構件而構成。 A groove processing apparatus for a substrate according to an eighth aspect of the present invention is the device of the seventh aspect, wherein a space for accommodating the swaying member supported by the swaying shaft is formed between the holder main body and the support member, and the restriction is restricted. The mechanism is composed of a holder body and a support member.
如以上之本發明,於使用揺動自如地支承溝槽加工工具之頭 部於基板形成溝槽之情形時,可使溝槽加工工具穩定,並可精度良好地形成溝槽。 According to the invention as described above, the head of the groove processing tool is supported by using the sway When the groove is formed in the substrate, the groove processing tool can be stabilized, and the groove can be formed with high precision.
1‧‧‧平台 1‧‧‧ platform
2‧‧‧工具 2‧‧‧ Tools
3‧‧‧頭部 3‧‧‧ head
4‧‧‧照相機(基板姿勢確認裝置) 4‧‧‧ Camera (substrate posture confirmation device)
6a‧‧‧Y方向驅動機構 6a‧‧‧Y direction drive mechanism
6b‧‧‧θ驅動機構(基板姿勢控制機構) 6b‧‧‧θ drive mechanism (substrate posture control mechanism)
6c‧‧‧X方向驅動機構 6c‧‧‧X direction drive mechanism
17‧‧‧保持具 17‧‧‧Holding
18‧‧‧揺動構件 18‧‧‧ 揺 moving components
19‧‧‧氣缸 19‧‧‧ cylinder
22‧‧‧保持具本體(限制機構) 22‧‧‧Holding body (restricting mechanism)
23‧‧‧支承構件(限制機構) 23‧‧‧Support members (restriction mechanism)
36‧‧‧工具本體 36‧‧‧Tool body
38a、38b‧‧‧刀 38a, 38b‧‧‧ knife
40‧‧‧控制部 40‧‧‧Control Department
圖1係本發明之一實施形態之基板之溝槽加工裝置之外觀立體圖。 Fig. 1 is a perspective view showing the appearance of a groove processing apparatus for a substrate according to an embodiment of the present invention.
圖2係溝槽加工裝置之頭部之前視圖。 Figure 2 is a front elevational view of the head of the groove processing apparatus.
圖3係用以說明溝槽加工時之動作之模式圖。 Fig. 3 is a schematic view for explaining the operation of the groove processing.
圖4係溝槽加工裝置之控制方塊圖。 Figure 4 is a control block diagram of the groove processing apparatus.
圖5係溝槽加工之流程圖。 Figure 5 is a flow chart of the groove processing.
圖6係表示溝槽加工時之基板之姿勢之控制的圖。 Fig. 6 is a view showing control of the posture of the substrate during the groove processing.
圖7係表示溝槽加工時之揺動構件之移動之模式圖。 Fig. 7 is a schematic view showing the movement of the swaying member during the groove processing.
圖8係表示溝槽加工時之揺動構件之移動之模式圖。 Fig. 8 is a schematic view showing the movement of the swaying member during the groove processing.
圖1表示本發明之一實施形態之溝槽加工裝置之外觀立體圖。 Fig. 1 is a perspective view showing the appearance of a groove processing apparatus according to an embodiment of the present invention.
該裝置具備:載置基板W之平台1、裝設有溝槽加工工具(以下,簡稱為工具)2之頭部3、及作為基板之姿勢確認裝置之2個照相機4及2個監視器5。 This apparatus includes a table 1 on which the substrate W is placed, a head 3 on which a groove processing tool (hereinafter simply referred to as a tool) 2 is attached, and two cameras 4 and two monitors 5 as posture correcting devices for the substrate. .
平台1係藉由Y方向驅動機構6a(參照圖4)於水平面內可向圖1之Y方向移動,又,藉由θ驅動機構6b(參照圖4)於水平面內可旋轉至任意之角度。該等驅動機構6a、6b分別包含馬達等,且配置於平台 1之下方。藉由利用θ驅動機構6b使平台1於水平面內旋轉,可控制載置於平台1上之基板W之姿勢。 The platform 1 is movable in the Y direction in the horizontal plane by the Y-direction drive mechanism 6a (see FIG. 4), and is rotatable to an arbitrary angle in the horizontal plane by the θ drive mechanism 6b (see FIG. 4). The drive mechanisms 6a and 6b respectively include a motor or the like and are disposed on the platform. Below the 1st. By rotating the stage 1 in the horizontal plane by the θ drive mechanism 6b, the posture of the substrate W placed on the stage 1 can be controlled.
頭部3係藉由X方向驅動機構6c,於平台1之上方可向X方向移動。再者,如圖1所示,X方向係於水平面內與Y方向正交之方向。X方向驅動機構6c具有:1對之支承柱7a、7b,設置於1對之支承柱7a、7b間之導桿8,及驅動形成於導桿8之導引器9之馬達10。頭部3係可沿著導引器9,如上所述向X方向移動。 The head 3 is movable in the X direction above the stage 1 by the X-direction drive mechanism 6c. Furthermore, as shown in FIG. 1, the X direction is a direction orthogonal to the Y direction in the horizontal plane. The X-direction drive mechanism 6c has a pair of support columns 7a and 7b, a guide rod 8 provided between the pair of support columns 7a and 7b, and a motor 10 that drives the guide 9 formed on the guide rod 8. The head 3 can be moved along the guide 9 in the X direction as described above.
2個照相機4分別固定於台座12。各台座12可沿著設置於支承台13且於X方向延伸之導引器14移動。2個照相機4可上下移動,各照相機4所攝影之圖像顯示於對應之監視器5。 The two cameras 4 are fixed to the pedestal 12, respectively. Each of the pedestals 12 is movable along an introducer 14 that is disposed on the support table 13 and extends in the X direction. The two cameras 4 are movable up and down, and images captured by the cameras 4 are displayed on the corresponding monitor 5.
圖2中將頭部3抽出而表示。頭部3具有板狀之基座16、保持具17、及氣缸19。 In Fig. 2, the head 3 is drawn out. The head 3 has a plate-shaped base 16, a holder 17, and a cylinder 19.
保持具17經由未圖示之軌道,相對於基座16於上下方向滑動自如地支承。保持具17具有保持具本體22、固定於保持具本體22之表面之支承構件23、及揺動構件18。 The holder 17 is slidably supported in the vertical direction with respect to the susceptor 16 via a rail (not shown). The holder 17 has a holder body 22, a support member 23 fixed to the surface of the holder body 22, and a swaying member 18.
保持具本體22形成為板狀,且於上部具有開口22a。支承構件23係於橫方向較長之矩形狀之構件,且於內部形成有插通揺動構件18之貫通孔23a。 The holder body 22 is formed in a plate shape and has an opening 22a at the upper portion. The support member 23 is a rectangular member that is long in the lateral direction, and has a through hole 23a through which the swaying member 18 is inserted.
揺動構件18揺動自如地支承於保持具本體22及支承構件23。更詳細而言,於保持具本體22與支承構件23之間,形成有收納揺動構件之空間。而且,揺動構件18藉由保持具本體22與支承構件23而限制揺動軸之軸方向之移動。即,由保持具本體22與支承構件23而構成限制機構。揺動構件18具有下部之工具裝設部24、及自工具裝設部24向上方延伸而 形成之延長部25。 The swaying member 18 is slidably supported by the holder body 22 and the support member 23. More specifically, a space in which the swaying member is housed is formed between the holder main body 22 and the support member 23. Further, the swaying member 18 restricts the movement of the yaw axis in the axial direction by the holder body 22 and the support member 23. That is, the retaining body 22 and the support member 23 constitute a restricting mechanism. The swaying member 18 has a lower tool mounting portion 24 and extends upward from the tool mounting portion 24 An extension 25 is formed.
於工具裝設部24形成有溝槽,於該溝槽中插入工具2,進而藉由固定板24a將工具2固定於溝槽內。 A groove is formed in the tool mounting portion 24, and the tool 2 is inserted into the groove, and the tool 2 is fixed in the groove by the fixing plate 24a.
於延長部25之下部,形成有於水平方向且與溝槽形成方向正交之方向貫通之貫通孔25a。而且,以貫通該孔25a之銷26為中心而揺動構件18揺動自如。銷26藉由保持具本體22與支承構件23而支承。再者,於揺動構件18與保持具本體22及支承構件23之間,以使揺動構件18可順利地揺動之方式而設置有既定之間隙。而且,揺動構件18可沿著銷26於軸方向移動。 A through hole 25a penetrating in a direction orthogonal to the groove forming direction in the horizontal direction is formed in a lower portion of the extension portion 25. Further, the swaying member 18 is freely movable around the pin 26 penetrating the hole 25a. The pin 26 is supported by the holder body 22 and the support member 23. Further, between the swaying member 18 and the holder main body 22 and the support member 23, a predetermined gap is provided so that the swaying member 18 can be smoothly swayed. Moreover, the swaying member 18 is movable in the axial direction along the pin 26.
於延長部25之上端部25b之左右兩側,設置有1對之限制構件27a、27b。如圖3所示,各限制構件27a、27b具有:固定於保持具本體22之筒狀構件28a、28b,及插入於筒狀構件28a、28b之內部之彈簧29a、29b。而且,藉由將各彈簧29a、29b之前端抵接於延長部25之上端部25b,而揺動構件18維持於如圖2及圖3(b)所示之中立位置。又,揺動構件18揺動而按壓任一個彈簧29a、29b,將延長部25之上端部25b抵接於筒狀構件28a、28b,藉此限制揺動角度。再者,圖3係模式性地表示揺動構件18之移動。 A pair of restriction members 27a and 27b are provided on the left and right sides of the upper end portion 25b of the extension portion 25. As shown in Fig. 3, each of the restricting members 27a and 27b has cylindrical members 28a and 28b fixed to the holder main body 22, and springs 29a and 29b inserted into the inside of the tubular members 28a and 28b. Further, by abutting the front ends of the respective springs 29a and 29b against the upper end portion 25b of the extension portion 25, the oscillating member 18 is maintained at the neutral position as shown in Figs. 2 and 3(b). Further, the swaying member 18 is swayed and pressed against any one of the springs 29a and 29b, and the upper end portion 25b of the extended portion 25 abuts against the tubular members 28a and 28b, thereby restricting the sway angle. Furthermore, FIG. 3 schematically shows the movement of the swaying member 18.
氣缸19固定於缸體支承構件30之上表面。缸體支承構件30配置於保持具17之上部,且固定於基座16。於缸體支承構件30形成有於上下方向貫通之孔,氣缸19之活塞桿(未圖示)貫通該貫通孔,將桿前端連結於保持具17。 The cylinder 19 is fixed to the upper surface of the cylinder supporting member 30. The cylinder support member 30 is disposed on the upper portion of the holder 17 and is fixed to the base 16 . A hole penetrating in the vertical direction is formed in the cylinder supporting member 30, and a piston rod (not shown) of the cylinder 19 penetrates the through hole, and the rod end is coupled to the holder 17.
又,於基座16之上部設置有彈簧支承構件31。於彈簧支承構件31與保持具17之間設置有彈簧32,藉由彈簧32而保持具17向上方施壓。藉由該彈簧32,可大致消除保持具17之自重。 Further, a spring supporting member 31 is provided on the upper portion of the susceptor 16. A spring 32 is provided between the spring support member 31 and the holder 17, and the holder 17 is pressed upward by the spring 32. By the spring 32, the dead weight of the holder 17 can be substantially eliminated.
於保持具17之左右兩側,設置有1對之空氣供給部34a、 34b。1對之空氣供給部34a、34b均為相同之構成,分別具有接頭35與空氣噴嘴36。 On the left and right sides of the holder 17, a pair of air supply portions 34a are provided, 34b. Each of the pair of air supply portions 34a and 34b has the same configuration, and has a joint 35 and an air nozzle 36, respectively.
該溝槽加工裝置具有進行各部之控制之控制部40。如圖4所示,控制部40中輸入有來自照相機4之圖像資料。又,控制部40連接於頭部3之氣缸19、用以使平台1向Y方向移動之Y方向驅動機構6a、用以使頭部3向X方向移動之X方向驅動機構6c、及用以使平台1於水平面內旋轉之θ驅動機構6b。 The groove processing device has a control unit 40 that controls each unit. As shown in FIG. 4, image data from the camera 4 is input to the control unit 40. Further, the control unit 40 is connected to the cylinder 19 of the head 3, the Y-direction drive mechanism 6a for moving the platform 1 in the Y direction, the X-direction drive mechanism 6c for moving the head 3 in the X direction, and A θ drive mechanism 6b that rotates the platform 1 in a horizontal plane.
該控制部40由微電腦而構成,且具有以下之功能。 The control unit 40 is constituted by a microcomputer and has the following functions.
基板姿勢判定功能:根據由照相機4所獲得之圖像資料,判定載置於平台1之基板W中,加工預定線是否相對於Y方向於既定之角度範圍內傾斜之功能。 Substrate posture determination function: Based on the image data obtained by the camera 4, it is determined whether or not the planned line is tilted within a predetermined angle range with respect to the Y direction based on the substrate W placed on the stage 1.
基板姿勢控制功能:於基板W之加工預定線並非既定之傾斜角度範圍內之情形時,控制θ驅動機構,以使基板W之加工預定線成為既定之角度範圍內之方式控制基板W之姿勢之功能。 Substrate posture control function: When the planned line of the substrate W is not within a predetermined tilt angle range, the θ drive mechanism is controlled to control the posture of the substrate W in such a manner that the planned line of the substrate W is within a predetermined angle range. Features.
加工位置運算功能:對由基板姿勢控制功能經姿勢控制之基板W中之加工預定線之加工開始位置與加工結束位置進行運算之功能。 The machining position calculation function is a function of calculating a machining start position and a machining end position of the machining planned line in the substrate W controlled by the posture of the substrate posture control function.
移動控制功能:根據加工位置運算機構之運算結果控制X、Y移動機構6,使工具2自加工開始位置移動至加工結束位置之功能。 Movement control function: The function of controlling the X and Y moving mechanism 6 to move the tool 2 from the machining start position to the machining end position according to the calculation result of the machining position calculation mechanism.
於工具2之前端部形成有刀。具體而言,如圖2所示,於刀之前端,於移動方向之兩側形成有第1刀38a及第2刀38b。此處,第1刀38a為用以於去向移動時進行溝槽加工之刀,第2刀38b為用以於來向移動時進行溝 槽加工之刀。 A knife is formed at the end of the tool 2 before. Specifically, as shown in FIG. 2, the first blade 38a and the second blade 38b are formed on both sides in the moving direction at the front end of the blade. Here, the first blade 38a is a blade for performing groove processing during the forward movement, and the second blade 38b is for performing groove during the movement. Slot processing knife.
使用圖5之流程圖,對使用如以上之裝置對薄膜太陽能電池基板進行溝槽加工之動作進行說明。 The operation of groove processing the thin film solar cell substrate using the above apparatus will be described using the flowchart of Fig. 5 .
若將基板W載置於平台1上,則於步驟S1中,使用照相機4拍攝基板W之姿勢。於步驟S2中,根據該拍攝資料,對加工預定線之方向進行運算。即,例如拍攝基板W上之對準標記等,對基板W中之加工預定線相對於Y方向之傾斜角度進行運算。 When the substrate W is placed on the stage 1, the posture of the substrate W is photographed using the camera 4 in step S1. In step S2, the direction of the planned line is calculated based on the photographed data. That is, for example, an alignment mark or the like on the substrate W is photographed, and the inclination angle of the planned line in the substrate W with respect to the Y direction is calculated.
其次,於步驟S3中,判定步驟S2中所求出之傾斜角度是否為既定之傾斜角度。於傾斜角度並非既定之角度範圍內之情形時,自步驟S3移行至步驟S4。於步驟S4中,如圖6(a)及(b)所示,藉由θ驅動機構6b而使平台1旋轉,控制基板W之姿勢。而且,使基板W之加工預定線相對於Y方向之傾斜角度進入既定之角度範圍內(此處,將傾斜角度設為θ 1)。其後,移行至步驟S5。 Next, in step S3, it is determined whether or not the inclination angle obtained in step S2 is a predetermined inclination angle. When the inclination angle is not within the predetermined angle range, the process proceeds from step S3 to step S4. In step S4, as shown in FIGS. 6(a) and (b), the stage 1 is rotated by the θ drive mechanism 6b to control the posture of the substrate W. Further, the inclination angle of the planned line of the substrate W with respect to the Y direction is entered within a predetermined angle range (here, the inclination angle is θ 1). Thereafter, the process proceeds to step S5.
又,於將基板W載置於平台1之狀態下,於加工預定線相對於Y方向之傾斜角度已經為既定之角度範圍內之情形時,自步驟S3移行至步驟S5。 Further, in a state where the substrate W is placed on the stage 1, when the inclination angle of the planned line with respect to the Y direction is already within a predetermined angle range, the process proceeds from step S3 to step S5.
於步驟S5中,根據由步驟S2所得之加工預定線之方向、或藉由步驟S4而進行姿勢控制之傾斜角度θ 1,對加工預定線之加工開始位置與加工結束位置(參照圖6(b))進行運算。 In step S5, the machining start position and the machining end position of the machining planned line are based on the direction of the machining planned line obtained in step S2 or the inclination angle θ1 of the posture control by step S4 (refer to FIG. 6(b). )) Perform calculations.
於步驟S6中,使工具2自加工開始位置移動至加工結束位置,而執行溝槽加工。 In step S6, the tool 2 is moved from the machining start position to the machining end position, and groove machining is performed.
具體而言,首先,驅動氣缸19而使保持具17及揺動構件18下降,使工具2之前端抵接於薄膜。此時之工具2對薄膜之加壓力藉由 供給至氣缸19之空氣壓力而調整。再者,於以下之說明中,基板W係以相對於Y方向僅以角度θ 1傾斜之姿勢而載置於平台1上。 Specifically, first, the air cylinder 19 is driven to lower the holder 17 and the swaying member 18, and the front end of the tool 2 is brought into contact with the film. At this time, the tool 2 applies pressure to the film by The air pressure supplied to the cylinder 19 is adjusted. In the following description, the substrate W is placed on the stage 1 in a posture inclined only by the angle θ 1 with respect to the Y direction.
其次,驅動X方向驅動機構6c及Y方向驅動機構6b,使頭部3沿著溝槽加工預定線L而掃描。圖3模式性地表示此時之揺動構件18及工具2之姿勢。 Next, the X-direction drive mechanism 6c and the Y-direction drive mechanism 6b are driven to scan the head portion 3 along the groove processing planned line L. Fig. 3 schematically shows the posture of the swaying member 18 and the tool 2 at this time.
於圖3(a)所示之去向移動時(於圖3中向右側之移動時),第1刀38a與基板上之薄膜接觸。此處,如圖6(b)及圖7所示,加工線L相對於Y方向僅以角度θ 1傾斜,故而使工具2向+M方向移動而產生加工阻力(R),則沿著揺動軸之周圍而揺動之第1分力(Fy)、與壓抵於保持具本體22側之第2分力(Fx)作用於揺動構件18。 When moving in the forward direction shown in Fig. 3 (a) (when moving to the right side in Fig. 3), the first blade 38a comes into contact with the film on the substrate. Here, as shown in FIG. 6(b) and FIG. 7, the processing line L is inclined only by the angle θ1 with respect to the Y direction, so that the tool 2 is moved in the +M direction to generate the machining resistance (R), and along the 揺The first component force (Fy) that is swayed around the moving shaft and the second component force (Fx) that is pressed against the holder body 22 side act on the swaying member 18.
藉由以上之第1分力(Fy),而揺動構件18以銷26為中心而順時針地揺動。如圖3(a)所示,該揺動藉由將揺動構件18之上端部25b抵接於右側之筒狀構件28a而被限制。又,藉由第2分力(Fx),而揺動構件18向保持具本體22側移動並壓抵於保持具本體22。即,保持具本體22限制沿著揺動構件18及保持於揺動構件18之工具2之揺動軸之移動。 With the above first component force (Fy), the swaying member 18 is pivoted clockwise around the pin 26. As shown in FIG. 3(a), the sway is restricted by abutting the upper end portion 25b of the swaying member 18 against the right cylindrical member 28a. Further, by the second component force (Fx), the swaying member 18 moves toward the holder body 22 side and is pressed against the holder body 22. That is, the holder body 22 limits the movement of the swaying axis along the swaying member 18 and the tool 2 held by the swaying member 18.
如以上般,工具2以圖3(a)及圖7所示之姿勢而穩定,且於該狀態下向+M方向移動,而形成溝槽。 As described above, the tool 2 is stabilized in the posture shown in FIGS. 3( a ) and 7 , and moves in the +M direction in this state to form a groove.
其次,於步驟S7中,判斷是否對所有加工預定線結束溝槽加工。於並非對所有加工預定線結束溝槽加工之情形時,自步驟S7返回至步驟S5,重複執行與上述相同之處理。 Next, in step S7, it is judged whether or not the groove processing is completed for all the planned lines. When the groove processing is not completed for all the processing lines, the process returns from step S7 to step S5, and the same processing as described above is repeatedly executed.
即,使頭部3相對於基板而相對性地移動,使工具2向其次應下降之溝槽加工預定線上移動。而且,於上述同樣地,將工具2壓抵於基板上之薄膜,使頭部3向與上述相反之方向移動。 That is, the head 3 is relatively moved with respect to the substrate, and the tool 2 is moved to the groove processing planned line which is to be lowered next. Further, in the same manner as described above, the tool 2 is pressed against the film on the substrate, and the head 3 is moved in the opposite direction to the above.
於該來向移動時(於圖3中向左側之移動時),第2刀38b與基板上之薄膜接觸。此處,如圖8之模式圖所示,與去向移動時相反, 產生加工阻力(-R)發生。於是,沿著揺動軸之周圍而揺動之第1分力(-Fy)、與壓抵於支承構件23側之第2分力(-Fx)作用於揺動構件18。 At the time of this movement (when moving to the left in FIG. 3), the second blade 38b is in contact with the film on the substrate. Here, as shown in the schematic diagram of FIG. 8, as opposed to when moving to the opposite direction, A machining resistance (-R) occurs. Then, the first component force (-Fy) that is swayed along the periphery of the sway shaft and the second component force (-Fx) that is pressed against the support member 23 side act on the swaying member 18.
藉由以上之第1分力(-Fy),而揺動構件18以銷26為中心逆時針地揺動。如圖3(c)所示,該揺動藉由將揺動構件18之上端部25b抵接於右側之筒狀構件28b而被限制。又,藉由第2分力(-Fx),而揺動構件18向支承構件23側移動並壓抵於支承構件23。即,支承構件23限制沿著揺動構件18及保持於揺動構件18之工具2之揺動軸之移動。 With the above first component force (-Fy), the swaying member 18 is tilted counterclockwise around the pin 26. As shown in FIG. 3(c), the sway is restricted by abutting the upper end portion 25b of the swaying member 18 against the right cylindrical member 28b. Further, by the second component force (-Fx), the swaying member 18 is moved toward the support member 23 side and pressed against the support member 23. That is, the support member 23 restricts the movement of the sway axis along the swaying member 18 and the tool 2 held by the swaying member 18.
如以上般,工具2以圖3(c)及圖8所示之姿勢而穩定,且於該狀態下向-M方向移動,而形成溝槽。 As described above, the tool 2 is stabilized in the posture shown in FIGS. 3(c) and 8 and moves in the -M direction in this state to form a groove.
再者,於來向移動時,於對加工開始位置與加工結束位置進行運算時,必須進行對於除了加工預定線之間距部分之距離以外,工具2沿著揺動軸移動部分(間隙部分)之距離之座標修正。 Further, when the moving direction is calculated, when calculating the machining start position and the machining end position, it is necessary to perform the distance of the moving portion (gap portion) of the tool 2 along the sway axis in addition to the distance from the portion between the planned lines. The coordinates are corrected.
重複執行以上之處理,若對於所有加工預定線之溝槽加工結束,則結束加工處理。 The above processing is repeated, and if the groove processing for all the planned lines is completed, the processing is terminated.
由於頭部3移動之加工預定線相對於Y方向僅傾斜既定角度,故於加工時,藉由加工阻力將揺動構件18壓抵於揺動軸之軸方向一側。因此,於加工中揺動構件18之姿勢穩定,可精度良好地形成溝槽。 Since the planned line for moving the head 3 is inclined only by a predetermined angle with respect to the Y direction, the squeezing member 18 is pressed against the axial direction side of the swaying shaft by machining resistance during machining. Therefore, the posture of the swaying member 18 is stabilized during processing, and the groove can be formed with high precision.
本發明並不限定於如以上之實施形態,可不脫離本發明之範圍而實施各種變形或修正。 The present invention is not limited to the above embodiments, and various modifications and changes can be made without departing from the scope of the invention.
18‧‧‧揺動構件 18‧‧‧ 揺 moving components
22‧‧‧保持具本體 22‧‧‧ Keeping the body
23‧‧‧支承構件 23‧‧‧Support members
26‧‧‧銷 26‧‧ ‧ sales
Fx‧‧‧第2分力 Fx‧‧‧2nd force
Fy‧‧‧第1分力 Fy‧‧1st force
L‧‧‧溝槽加工預定線 L‧‧‧ groove processing line
R‧‧‧加工阻力 R‧‧‧Processing resistance
θ 1‧‧‧傾斜角度 θ 1‧‧‧ tilt angle
Claims (7)
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JP2012163736A JP5981795B2 (en) | 2012-07-24 | 2012-07-24 | Substrate groove processing method and groove processing apparatus |
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TW201404747A TW201404747A (en) | 2014-02-01 |
TWI586614B true TWI586614B (en) | 2017-06-11 |
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JP (1) | JP5981795B2 (en) |
KR (1) | KR20140015183A (en) |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2004115356A (en) * | 2002-09-26 | 2004-04-15 | Honda Motor Co Ltd | Mechanical scribing apparatus |
JP2012119610A (en) * | 2010-12-03 | 2012-06-21 | Mitsuboshi Diamond Industrial Co Ltd | Grooving tool for thin film solar cell |
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JP3114790U (en) * | 2005-05-16 | 2005-10-27 | エービーイーダイヤモンド株式会社 | Scriber holder |
KR100924083B1 (en) * | 2008-03-05 | 2009-11-02 | 세메스 주식회사 | Scribing apparatus, apparatus and method for cutting substrate using the same |
TWI424580B (en) * | 2009-02-24 | 2014-01-21 | Mitsuboshi Diamond Ind Co Ltd | A trench processing tool, a trench processing method and a cutting device using a thin film solar cell |
JP5436007B2 (en) * | 2009-04-06 | 2014-03-05 | 株式会社シライテック | Film scribe device for solar panel |
TWI451587B (en) * | 2010-01-08 | 2014-09-01 | Mitsuboshi Diamond Ind Co Ltd | Groove machining tool for use with a thin-film solar cell |
JP2011216646A (en) * | 2010-03-31 | 2011-10-27 | Mitsuboshi Diamond Industrial Co Ltd | Scribing device |
JP5728359B2 (en) * | 2010-12-21 | 2015-06-03 | 三星ダイヤモンド工業株式会社 | Grooving tool for thin film solar cell and grooving device for thin film solar cell |
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- 2012-07-24 JP JP2012163736A patent/JP5981795B2/en not_active Expired - Fee Related
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2004115356A (en) * | 2002-09-26 | 2004-04-15 | Honda Motor Co Ltd | Mechanical scribing apparatus |
JP2012119610A (en) * | 2010-12-03 | 2012-06-21 | Mitsuboshi Diamond Industrial Co Ltd | Grooving tool for thin film solar cell |
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KR20140015183A (en) | 2014-02-06 |
TW201404747A (en) | 2014-02-01 |
JP5981795B2 (en) | 2016-08-31 |
CN103579409B (en) | 2017-08-08 |
CN103579409A (en) | 2014-02-12 |
JP2014024125A (en) | 2014-02-06 |
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