TWI581383B - Semiconductor chip package having double sided ball planting and the method for fabricating the same - Google Patents
Semiconductor chip package having double sided ball planting and the method for fabricating the same Download PDFInfo
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- TWI581383B TWI581383B TW105103721A TW105103721A TWI581383B TW I581383 B TWI581383 B TW I581383B TW 105103721 A TW105103721 A TW 105103721A TW 105103721 A TW105103721 A TW 105103721A TW I581383 B TWI581383 B TW I581383B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Description
本發明係有關於半導體封裝構造,特別是有關於一種雙面植球之半導體晶片封裝構造及其製造方法,可應用於半導體封裝堆疊結構(Package-On-Package,POP)的底部封裝構造。 The present invention relates to a semiconductor package structure, and more particularly to a semiconductor wafer package structure for double-sided ball implantation and a method of fabricating the same, which can be applied to a package package structure of a package-on-package (POP).
半導體封裝堆疊結構(POP)係將頂部與底部半導體封裝構造作上下立體堆疊並迴焊連接成一體。封裝堆疊的底部封裝構造與頂部封裝構造各密封適當的晶片,可以是相同也可以是不相同。通常為不相同晶片的個別密封,以構成一系統封裝。在底部封裝構造與頂部封裝構造之間的電性連接係除了使用到頂部封裝構造的底部銲球,更使用到複數個模封貫穿孔(through mold via,TMV),其係貫穿底部封裝構造之模封膠體。模封貫穿孔的形成方法係包含在底部封裝構造之模封膠體形成之後的雷射鑽孔(laser drilling),以裸露出球墊或埋設於模封膠體的中介銲球。無論在模封之前有無預先接植上中介銲球,雷射鑽孔的高能量都會造成球墊或中介銲球的表面損害。 The semiconductor package stack structure (POP) combines the top and bottom semiconductor package structures in a top-bottom stack and reflow soldering. The bottom package structure of the package stack and the top package structure each seal the appropriate wafer, which may or may not be the same. Individual seals that are typically different wafers to form a system package. The electrical connection between the bottom package structure and the top package structure is in addition to the use of the bottom solder ball to the top package structure, and a plurality of through mold vias (TMV) are used, which are through the bottom package structure. Molding the gel. The method of forming the through-holes includes laser drilling after the formation of the molding compound of the bottom package structure to expose the ball pads or the intermediate solder balls embedded in the molding compound. Whether or not the intermediate solder balls are pre-planted prior to molding, the high energy of the laser drilling can cause damage to the surface of the ball mat or the intermediate solder balls.
此外,以往的球格陣列封裝構造的製作係在基板條 等母板上單面植球,母板的厚度與結構強度不足以支撐雙面植球,容易發生掉球的問題。 In addition, the conventional ball grid array package structure is fabricated on the substrate strip When the single-sided ball is placed on the mother board, the thickness and structural strength of the mother board are insufficient to support the double-sided ball planting, and the problem of falling the ball is easy to occur.
為了解決上述之問題,本發明之主要目的係在於提供一種雙面植球之半導體晶片封裝構造及其製造方法,用以降低在接合雙面銲球的過程中掉球風險,並避免習知模封貫孔製作時的金屬表面損害。 In order to solve the above problems, the main object of the present invention is to provide a semiconductor wafer package structure for double-sided ball implantation and a manufacturing method thereof for reducing the risk of falling ball during the process of joining double-sided solder balls, and avoiding the conventional mold sealing. Damage to the metal surface during hole fabrication.
本發明之次一目的係在於提供一種雙面植球之半導體晶片封裝構造及其製造方法,能夠減少在接合雙面銲球的封裝流程,以達到封裝成本降低之功效。 A second object of the present invention is to provide a semiconductor wafer package structure and a manufacturing method thereof for double-sided ball implantation, which can reduce the packaging process of bonding double-sided solder balls to achieve the effect of reducing packaging cost.
本發明之再一目的係在於提供一種雙面植球之半導體晶片封裝構造及其製造方法,以達到封裝堆疊結構之底部散熱增益之功效。 A further object of the present invention is to provide a semiconductor wafer package structure for double-sided ball implantation and a method of fabricating the same to achieve the effect of heat dissipation gain at the bottom of the package stack structure.
本發明的目的及解決其技術問題是採用以下技術方案來實現的。本發明係揭示一種雙面植球之半導體晶片封裝構造,包含一基板、複數個第一銲球、一晶片、一模封膠體、複數個第二銲球以及複數個第三銲球。該基板係具有一上表面以及一下表面,該上表面係設置有複數個第一接墊及複數個周邊球墊,該下表面係設置有複數個第一球墊及複數個第二球墊,該基板係另具有複數個第一導通孔與複數個第二導通孔,該些第一導通孔係連接該些第一接墊與該些第一球墊,該些第二導通孔係連接該些周邊球墊與該些第二球墊。該些第一銲球係接合於該些周邊球 墊。該晶片係設置於該基板之該上表面上並覆蓋該些第一接墊。該模封膠體係形成於該基板之該上表面上,以密封該晶片,該模封膠體係更局部密封該些第一銲球,該模封膠體之厚度係大於該晶片之設置高度但小於該些第一銲球之高度,以顯露出該些第一銲球之弧面。該些第二銲球係接合於該些第一球墊。該些第三銲球係接合於該些第二球墊。本發明另揭示上述雙面植球之半導體晶片封裝構造之製造方法。 The object of the present invention and solving the technical problems thereof are achieved by the following technical solutions. The present invention discloses a semiconductor wafer package structure for double-sided ball implantation, comprising a substrate, a plurality of first solder balls, a wafer, a mold sealing body, a plurality of second solder balls, and a plurality of third solder balls. The substrate has an upper surface and a lower surface. The upper surface is provided with a plurality of first pads and a plurality of peripheral ball pads, and the lower surface is provided with a plurality of first ball pads and a plurality of second ball pads. The substrate has a plurality of first vias and a plurality of second vias, the first vias connecting the first pads and the first ball pads, and the second vias are connected to the Some peripheral ball pads and the second ball pads. The first solder balls are bonded to the peripheral balls pad. The chip is disposed on the upper surface of the substrate and covers the first pads. The mold encapsulation system is formed on the upper surface of the substrate to seal the wafer, and the mold encapsulation system partially seals the first solder balls. The thickness of the mold encapsulant is greater than the set height of the wafer but less than The height of the first solder balls to reveal the curved surfaces of the first solder balls. The second solder balls are bonded to the first ball pads. The third solder balls are bonded to the second ball pads. The present invention further discloses a method of fabricating the semiconductor wafer package structure of the double-sided ball.
本發明的目的及解決其技術問題還可採用以下技術措施進一步實現。 The object of the present invention and solving the technical problems thereof can be further achieved by the following technical measures.
在前述半導體晶片封裝構造中,係可另包含複數個凸塊,係可固設於該晶片之一主動面並接合至該些第一接墊,以使該晶片覆晶接合於該基板之該上表面。 In the foregoing semiconductor chip package structure, the plurality of bumps may be further disposed on the active surface of the wafer and bonded to the first pads, so that the wafer is flip-chip bonded to the substrate. Upper surface.
在前述半導體晶片封裝構造中,係可另包含一底部填充膠,係可形成於該晶片與該基板之間,以包覆該些凸塊。 In the foregoing semiconductor wafer package structure, an underfill may be further formed between the wafer and the substrate to cover the bumps.
在前述半導體晶片封裝構造中,該晶片之一背面係可利用一黏晶層貼附於該基板之該上表面並遮蓋該些第一接墊,該基板之該上表面係可更設置有複數個第二接墊,其係可位於該些第一接墊與該些周邊球墊之間,複數個銲線係可連接該晶片之複數個銲墊至該些第二接墊。 In the foregoing semiconductor chip package structure, a back surface of the wafer may be attached to the upper surface of the substrate by a die bonding layer and cover the first pads, and the upper surface of the substrate may be further provided with a plurality of The second pads are located between the first pads and the peripheral ball pads, and the plurality of bonding wires can connect the plurality of pads of the chip to the second pads.
在前述半導體晶片封裝構造中,由該些第一銲球距離至該晶片之鄰近側面之一最小間隙係可不大於該些第一銲球之平均間隙。 In the foregoing semiconductor chip package configuration, the minimum gap from the first solder balls to one of the adjacent sides of the wafer may be no more than the average gap of the first solder balls.
藉由上述的技術手段,本發明可以達成在接合雙面銲球的過程中掉球風險的降低,另可免除雷射鑽孔的製程,以避免封裝堆疊焊接面的表面損害,故能減少封裝流程,並具有降低封裝成本之優勢。。在一具體應用中,可以先進行封裝堆疊的底部封裝構造的頂側(top side)植球與晶片置放,晶片連接方式係可為覆晶(flip-chip,FC)接合或打線鍵合(wire bonding,WB),使用上模有薄膜(film)的壓模機壓模,在合模注膠時,頂側(top side)銲球會有局部嵌陷於薄膜中。在完成注膠離模之後,包覆於薄膜(film)中的銲球部位會裸露出來,以供封裝堆疊的頂部封裝構造的銲球作焊接,藉此達到立體封裝堆疊。 By the above technical means, the invention can achieve the risk of falling ball during the process of joining the double-sided solder balls, and the laser drilling process can be eliminated, so as to avoid surface damage of the soldering surface of the package stack, thereby reducing the package. Process and have the advantage of reducing packaging costs. . In a specific application, the top side ball placement and wafer placement of the bottom package structure of the package stack may be performed first, and the wafer connection may be flip-chip (FC) bonding or wire bonding ( Wire bonding, WB), using a stamper press die with a film on the top mold, the top side solder balls are partially trapped in the film during the mold injection. After the injection molding is completed, the solder ball portion covered in the film is exposed to be soldered for the solder ball of the top package structure of the package stack, thereby achieving the three-dimensional package stack.
100‧‧‧半導體晶片封裝構造 100‧‧‧Semiconductor chip package construction
110‧‧‧基板 110‧‧‧Substrate
111‧‧‧上表面 111‧‧‧Upper surface
112‧‧‧下表面 112‧‧‧ lower surface
113‧‧‧第一接墊 113‧‧‧First mat
114‧‧‧周邊球墊 114‧‧‧around ball pad
115‧‧‧第一球墊 115‧‧‧First ball mat
116‧‧‧第二球墊 116‧‧‧second ball mat
117‧‧‧第一導通孔 117‧‧‧First via
118‧‧‧第二導通孔 118‧‧‧Second via
120‧‧‧第一銲球 120‧‧‧First solder ball
121‧‧‧弧面 121‧‧‧ curved surface
130‧‧‧晶片 130‧‧‧ wafer
131‧‧‧主動面 131‧‧‧Active surface
132‧‧‧背面 132‧‧‧Back
140‧‧‧模封膠體 140‧‧‧Mold sealant
140A‧‧‧模封膠體之前驅物 140A‧‧·Mold sealant precursor
150‧‧‧第二銲球 150‧‧‧second solder ball
160‧‧‧第三銲球 160‧‧‧ third solder ball
170‧‧‧凸塊 170‧‧‧Bumps
171‧‧‧銲料 171‧‧‧ solder
180‧‧‧底部填充膠 180‧‧‧ underfill
200‧‧‧半導體晶片封裝構造 200‧‧‧Semiconductor chip package construction
233‧‧‧銲墊 233‧‧‧ solder pads
219‧‧‧第二接墊 219‧‧‧second mat
270‧‧‧銲線 270‧‧‧welding line
280‧‧‧黏晶層 280‧‧‧Mack layer
310‧‧‧上模具 310‧‧‧Upper mold
311‧‧‧離形膜 311‧‧‧Dissecting film
第1圖:依據本發明之第一具體實施例,一種雙面植球之半導體晶片封裝構造之截面示意圖。 1 is a cross-sectional view showing a semiconductor wafer package structure of a double-sided ball in accordance with a first embodiment of the present invention.
第2A至2F圖:依據本發明之第一具體實施例,繪示在該半導體晶片封裝構造之製造方法中各主要步驟之元件截面示意圖。 2A to 2F are schematic cross-sectional views showing the main steps of the manufacturing method of the semiconductor wafer package structure according to the first embodiment of the present invention.
第3A至3C圖:依據本發明之第一具體實施例,繪示在該半導體晶片封裝構造之製造方法中關於一模封膠體之形成過程之各次要步驟之元件截面示意圖。 3A to 3C are cross-sectional views showing the components of the semiconductor chip package structure in the secondary steps of the formation process of a mold encapsulant in accordance with the first embodiment of the present invention.
第4圖:依據本發明之第二具體實施例,另一種雙面植球之半導體晶片封裝構造之截面示意圖。 Figure 4 is a cross-sectional view showing another semiconductor wafer package structure for double-sided ball implantation in accordance with a second embodiment of the present invention.
以下將配合所附圖示詳細說明本發明之實施例,然應注意的是,該些圖示均為簡化之示意圖,僅以示意方法來說明本發明之基本架構或實施方法,故僅顯示與本案有關之元件與組合關係,圖中所顯示之元件並非以實際實施之數目、形狀、尺寸做等比例繪製,某些尺寸比例與其他相關尺寸比例或已誇張或是簡化處理,以提供更清楚的描述。實際實施之數目、形狀及尺寸比例為一種選置性之設計,詳細之元件佈局可能更為複雜。 The embodiments of the present invention will be described in detail below with reference to the accompanying drawings in which FIG. The components and combinations related to this case, the components shown in the figure are not drawn in proportion to the actual number, shape and size of the actual implementation. Some size ratios are proportional to other related sizes or have been exaggerated or simplified to provide clearer description of. The actual number, shape and size ratio of the implementation is an optional design, and the detailed component layout may be more complicated.
依據本發明之第一具體實施例,一種雙面植球之半導體晶片封裝構造100舉例說明於第1圖之截面示意圖。該半導體晶片封裝構造100係包含一基板110、複數個第一銲球120、一晶片130、一模封膠體140、複數個第二銲球150以及複數個第三銲球160。 In accordance with a first embodiment of the present invention, a double-sided ball-on semiconductor wafer package structure 100 is illustrated in cross-section in FIG. The semiconductor chip package structure 100 includes a substrate 110, a plurality of first solder balls 120, a wafer 130, a molding compound 140, a plurality of second solder balls 150, and a plurality of third solder balls 160.
請參閱第1圖,該基板110係具有一上表面111以及一下表面112,該上表面111係設置有複數個第一接墊113及複數個周邊球墊114,該下表面112係設置有複數個第一球墊115及複數個第二球墊116。通常該基板110係可為一微型印刷電路板。該基板110係另具有複數個第一導通孔117與複數個第二導通孔118,該些第一導通孔117係連接該些第一接墊113與該些第一球墊115,該些第二導通孔118係連接該些周邊球墊114與該些第二球墊116。在本實施例中,該些第一接墊113係可為覆晶接合之訊號傳輸墊,該些第一導通孔117與該些第二導通孔118係可為訊號傳 輸之鍍通孔,孔內有金屬結構,並且分別位於該基板110之中央與周邊。藉由上述的組合,可以加強該基板110之結構強度與散熱性。 Referring to FIG. 1 , the substrate 110 has an upper surface 111 and a lower surface 112. The upper surface 111 is provided with a plurality of first pads 113 and a plurality of peripheral ball pads 114. The lower surface 112 is provided with a plurality of The first ball pad 115 and the plurality of second ball pads 116. Typically, the substrate 110 can be a miniature printed circuit board. The substrate 110 has a plurality of first vias 117 and a plurality of second vias 118. The first vias 117 are connected to the first pads 113 and the first ball pads 115. The two through holes 118 are connected to the peripheral ball pads 114 and the second ball pads 116. In this embodiment, the first pads 113 can be flip-chip bonded signal transmission pads, and the first vias 117 and the second vias 118 can be signal transmissions. The plated through holes are provided with metal structures in the holes and are respectively located at the center and the periphery of the substrate 110. With the combination described above, the structural strength and heat dissipation of the substrate 110 can be enhanced.
該些第一銲球120係接合於該些周邊球墊114。該些第一銲球120係可供封裝堆疊時接合相同或不同之頂部封裝構造。該些第一銲球120之材質係可為焊接金屬材質,例如錫鉛或錫銀銅。在一較佳特徵表現下,由該些第一銲球120距離至該晶片130之鄰近側面之一最小間隙係可不大於該些第一銲球120之平均間隙,能省略用以形成模封貫孔之雷射鑽孔製程,該晶片130與該些第一銲球120係不互相碰觸與干擾。 The first solder balls 120 are bonded to the peripheral ball pads 114. The first solder balls 120 are used to bond the same or different top package configurations when the package is stacked. The materials of the first solder balls 120 may be made of a solder metal material such as tin-lead or tin-silver-copper. In a preferred feature, the minimum gap between the first solder balls 120 and one of the adjacent sides of the wafer 130 may be no more than the average gap of the first solder balls 120, and may be omitted for forming the mold gap. In the laser drilling process of the hole, the wafer 130 and the first solder balls 120 do not touch and interfere with each other.
該晶片130係設置於該基板110之該上表面111上並覆蓋該些第一接墊113。該晶片130係可為具有積體電路之半導體晶片。在本實施例中,該半導體晶片封裝構造100係可另包含複數個凸塊170,係可固設於該晶片130之一主動面131並接合至該些第一接墊113,以使該晶片130覆晶接合於該基板110之該上表面111,該晶片130之一背面132係相對地遠離該基板110,故可藉由該些凸塊170電性連接該晶片130與該些第一接墊113。該些凸塊170係可為例如銅柱之柱狀凸塊,每一凸塊170係以一銲料171焊接於對應之第一接墊113上 The wafer 130 is disposed on the upper surface 111 of the substrate 110 and covers the first pads 113. The wafer 130 can be a semiconductor wafer having an integrated circuit. In this embodiment, the semiconductor chip package structure 100 can further include a plurality of bumps 170, which can be fixed on one active surface 131 of the wafer 130 and bonded to the first pads 113 to make the wafer. The flip-chip is bonded to the upper surface 111 of the substrate 110. The back surface 132 of the wafer 130 is relatively away from the substrate 110. Therefore, the bumps 170 can be electrically connected to the wafer 130 and the first interfaces. Pad 113. The bumps 170 may be columnar bumps such as copper pillars, and each bump 170 is soldered to the corresponding first pad 113 by a solder 171.
該模封膠體140係形成於該基板110之該上表面111上,以密封該晶片130。該模封膠體140係可為模封形成之熱固化複合膠體。此外,該模封膠體140係更局部密封該些第一銲球 120,該模封膠體140之厚度係大於該晶片130之設置高度但小於該些第一銲球120之高度,以顯露出該些第一銲球120之弧面121。弧面121係小於該些第一銲球120之表面積百分之五十並且不需要研磨平整,以維持該些第一銲球120之球體外形。在本實施例中,該些第一銲球120之弧面121係可作為POP封裝堆疊對上接合之免用銲料接點。 The molding compound 140 is formed on the upper surface 111 of the substrate 110 to seal the wafer 130. The molding compound 140 can be a thermosetting composite colloid formed by molding. In addition, the molding compound 140 partially seals the first solder balls. 120. The thickness of the molding compound 140 is greater than the height of the wafer 130 but less than the height of the first solder balls 120 to expose the curved surfaces 121 of the first solder balls 120. The curved surface 121 is less than fifty percent of the surface area of the first solder balls 120 and does not need to be ground flat to maintain the spherical shape of the first solder balls 120. In this embodiment, the curved surfaces 121 of the first solder balls 120 can serve as solder-free solder joints for the upper bonding of the POP package stack.
該些第二銲球150係接合於該些第一球墊115。該些第三銲球160係接合於該些第二球墊116。該些第二銲球150與該些第三銲球160之材質係可相同於該些第一銲球120之材質。該些第二銲球150與該些第三銲球160係可供對外電性連接。 The second solder balls 150 are bonded to the first ball pads 115. The third solder balls 160 are bonded to the second ball pads 116. The materials of the second solder balls 150 and the third solder balls 160 may be the same as the materials of the first solder balls 120. The second solder balls 150 and the third solder balls 160 are electrically connected to each other.
為了盡可能降低該晶片130之覆晶接合高度,以利該些第一銲球120微突出於該模封膠體140,該晶片130與該基板110之間之空隙將不利於該模封膠體140之填充。該半導體晶片封裝構造100係可另包含一底部填充膠180,係可形成於該晶片130與該基板110之間,以包覆該些凸塊170,故該晶片130係可進一步固定在該基板110上,該些凸塊170係可不互相干擾。 In order to reduce the flip chip bonding height of the wafer 130 as much as possible, so that the first solder balls 120 protrude slightly from the mold sealing body 140, the gap between the wafer 130 and the substrate 110 will be disadvantageous to the molding compound 140. Filled. The semiconductor chip package structure 100 can further include an underfill layer 180 between the wafer 130 and the substrate 110 to cover the bumps 170, so that the wafer 130 can be further fixed on the substrate. 110, the bumps 170 may not interfere with each other.
因此,本發明可以達成在接合雙面銲球的過程中掉球風險的降低,另可免除雷射鑽孔的製程,以避免封裝堆疊焊接面的表面損害。 Therefore, the present invention can achieve a reduction in the risk of falling the ball during the process of joining the double-sided solder balls, and can also eliminate the laser drilling process to avoid surface damage of the package stack soldering surface.
關於上述雙面植球之半導體晶片封裝構造100之製造方法係進一步說明如後,第2A至2F圖係在繪示該半導體晶片封裝構造100之製造方法中各主要步驟之元件截面示意圖。 The manufacturing method of the semiconductor wafer package structure 100 for the above-described double-sided ball implantation is further described as follows. FIGS. 2A to 2F are schematic cross-sectional views showing the main steps of the manufacturing process of the semiconductor wafer package structure 100.
首先,請參閱第2A圖,提供一基板110,該基板110係具有一上表面111以及一下表面112。在本步驟中,該基板110係為母板型態。該上表面111係設置有複數個第一接墊113及複數個周邊球墊114,該下表面112係設置有複數個第一球墊115及複數個第二球墊116,該基板110係另具有複數個第一導通孔117與複數個第二導通孔118,該些第一導通孔117係連接該些第一接墊113與該些第一球墊115,該些第二導通孔118係連接該些周邊球墊114與該些第二球墊116。之後,請參閱第2B圖,設置複數個第一銲球120於該基板110之該上表面111上,該些第一銲球120係接合於該些周邊球墊114。 First, referring to FIG. 2A, a substrate 110 having an upper surface 111 and a lower surface 112 is provided. In this step, the substrate 110 is in a mother board type. The upper surface 111 is provided with a plurality of first pads 113 and a plurality of peripheral ball pads 114. The lower surface 112 is provided with a plurality of first ball pads 115 and a plurality of second ball pads 116, and the substrate 110 is another The plurality of first vias 117 and the plurality of second vias 118 are connected to the first pads 113 and the first ball pads 115. The second vias 118 are connected to the first pads 113. The peripheral ball pads 114 and the second ball pads 116 are connected. Then, referring to FIG. 2B , a plurality of first solder balls 120 are disposed on the upper surface 111 of the substrate 110 , and the first solder balls 120 are bonded to the peripheral ball pads 114 .
之後,請參閱第2C圖,設置一晶片130於該基板110之該上表面111上,該晶片130係覆蓋該些第一接墊113。在本實施例中,複數個凸塊170係固設於該晶片130之一主動面131並接合至該些第一接墊113,以使該晶片130覆晶接合於該基板110之該上表面111,每一凸塊170係以一銲料171焊接於對應之第一接墊113上。之後,請參閱第2D圖,更具體地,形成一底部填充膠180於該晶片130與該基板110之間,以包覆該些凸塊170。 Then, referring to FIG. 2C, a wafer 130 is disposed on the upper surface 111 of the substrate 110, and the wafer 130 covers the first pads 113. In this embodiment, a plurality of bumps 170 are fixed on one active surface 131 of the wafer 130 and bonded to the first pads 113 such that the wafer 130 is flip-chip bonded to the upper surface of the substrate 110. 111, each bump 170 is soldered to the corresponding first pad 113 by a solder 171. Thereafter, please refer to FIG. 2D, and more specifically, an underfill 180 is formed between the wafer 130 and the substrate 110 to cover the bumps 170.
之後,請參閱第2E圖,形成一模封膠體140於該基板110之該上表面111上,以密封該晶片130,該模封膠體140係更局部密封該些第一銲球120,該模封膠體140之厚度係大於該晶片130之設置高度但小於該些第一銲球120之高度,以顯露出該些第一銲球120之弧面121。上述形成該模封膠體140之細部步驟請容 後詳述於第3A至3C圖之製程步驟說明。 Then, referring to FIG. 2E, a molding compound 140 is formed on the upper surface 111 of the substrate 110 to seal the wafer 130. The molding compound 140 partially seals the first solder balls 120. The thickness of the sealing body 140 is greater than the height of the wafer 130 but less than the height of the first solder balls 120 to expose the curved surfaces 121 of the first solder balls 120. The above steps of forming the molding compound 140 are as follows. The process steps described in detail in Figures 3A through 3C are described in detail later.
之後,請參閱第2F圖,設置複數個第二銲球150與複數個第三銲球160於該基板110之該下表面112上,該些第二銲球150係接合於該些第一球墊115,該些第三銲球160係接合於該些第二球墊116。最後,進行一單體化切割步驟,以製成複數個如第1圖所示之半導體晶片封裝構造100。 Then, referring to FIG. 2F, a plurality of second solder balls 150 and a plurality of third solder balls 160 are disposed on the lower surface 112 of the substrate 110, and the second solder balls 150 are coupled to the first balls. Pads 115, the third solder balls 160 are coupled to the second ball pads 116. Finally, a singulation step is performed to form a plurality of semiconductor wafer package structures 100 as shown in FIG.
第3A至3C圖係繪示在該半導體晶片封裝構造100之製造方法中關於該模封膠體140之形成過程之各次要步驟之元件截面示意圖。 3A to 3C are schematic cross-sectional views showing elements of the secondary steps of the formation process of the mold encapsulant 140 in the method of fabricating the semiconductor wafer package structure 100.
首先,請參閱第3A圖,進行一合模之操作,令一上模具310位於該基板110之上方,該上模具310之表面係貼附有一離形膜311,該離形膜311至該基板110之間隙係大於該晶片130之設置高度但小於該些第一銲球120之高度,該些第一銲球120係局部嵌陷於該離形膜311中。 First, referring to FIG. 3A, a mold clamping operation is performed to place an upper mold 310 above the substrate 110. A surface of the upper mold 310 is attached with a release film 311 to the substrate. The gap of 110 is greater than the height of the wafer 130 but less than the height of the first solder balls 120. The first solder balls 120 are partially trapped in the release film 311.
之後,請參閱第3B圖,進行一注膠之操作,令該模封膠體之前趨物140A係灌注於上述間隙中。更具體地,「上述間隙」指的是合模之後該基板110之該上表面111至該離形膜311之間隙,可注膠空間係排除該晶片130、該底部填充膠180及該些第一銲球120之佔據空間。 Thereafter, referring to FIG. 3B, a glue injection operation is performed to cause the mold sealant precursor 140A to be infused into the gap. More specifically, the “gap” refers to the gap between the upper surface 111 of the substrate 110 and the release film 311 after the mold clamping, and the glue injection space excludes the wafer 130, the underfill 180, and the first A solder ball 120 occupies space.
之後,請參閱第3C圖,進行一膠固化之操作,以使該模封膠體之前趨物140A固化為該模封膠體140,並由該模封膠體140脫離該上模具310與該離形膜311。更具體地,移除該上模 具310與該離形膜311之後,該模封膠體140係密封該晶片130且該模封膠體140係更局部密封該些第一銲球120,以顯露出該些第一銲球120之弧面121。 Thereafter, referring to FIG. 3C, a gel curing operation is performed to cure the molding compound precursor 140A to the molding compound 140, and the molding compound 140 is separated from the upper mold 310 and the release film. 311. More specifically, removing the upper mold After the mold 310 and the release film 311, the mold seal 140 seals the wafer 130 and the mold seal 140 partially seals the first solder balls 120 to expose the arcs of the first solder balls 120. Face 121.
依據本發明之第二具體實施例,另一種雙面植球之半導體晶片封裝構造200舉例說明於第4圖之截面示意圖,其中對應於第一具體實施例相同名稱與功能之元件以第一具體實施例的元件圖號表示,並且不再贅述其細部相同結構。該半導體晶片封裝構造200係包含一基板110、複數個第一銲球120、一晶片130、一模封膠體140、複數個第二銲球150以及複數個第三銲球160。 According to a second embodiment of the present invention, another double-sided ball-on semiconductor chip package structure 200 is illustrated in a cross-sectional view of FIG. 4, wherein the components of the same name and function corresponding to the first embodiment are first specific. The component numbers of the embodiments are shown, and the details of the details are not described again. The semiconductor chip package structure 200 includes a substrate 110, a plurality of first solder balls 120, a wafer 130, a molding compound 140, a plurality of second solder balls 150, and a plurality of third solder balls 160.
請參閱第4圖,該基板110係具有一上表面111以及一下表面112,該上表面111係設置有複數個第一接墊113及複數個周邊球墊114,該下表面112係設置有複數個第一球墊115及複數個第二球墊116,該基板110係另具有複數個第一導通孔117與複數個第二導通孔118,該些第一導通孔117係連接該些第一接墊113與該些第一球墊115,該些第二導通孔118係連接該些周邊球墊114與該些第二球墊116。在本實施例中,該些第一接墊113係係為導熱接墊,該些第一導通孔117係為導熱孔。該基板110之該上表面111係可更設置有複數個第二接墊219,其係可位於該些第一接墊113與該些周邊球墊114之間,以作為訊號傳輸接墊。 Referring to FIG. 4, the substrate 110 has an upper surface 111 and a lower surface 112. The upper surface 111 is provided with a plurality of first pads 113 and a plurality of peripheral ball pads 114. The lower surface 112 is provided with a plurality of The first ball pad 115 and the plurality of second ball pads 116 further comprise a plurality of first through holes 117 and a plurality of second conductive holes 118, and the first conductive holes 117 are connected to the first The pad 113 and the first ball pads 115 are connected to the peripheral ball pads 114 and the second ball pads 116. In the embodiment, the first pads 113 are thermally conductive pads, and the first vias 117 are thermally conductive holes. The upper surface 111 of the substrate 110 can be further provided with a plurality of second pads 219, which can be located between the first pads 113 and the peripheral ball pads 114 as signal transmission pads.
該些第一銲球120係接合於該些周邊球墊114。該晶片130係設置於該基板110之該上表面111上並覆蓋該些第一接墊113。在本實施例中,該晶片130之一背面132係可利用一黏晶層 280貼附於該基板110之該上表面111並遮蓋該些第一接墊113,複數個銲線270係可連接該晶片130在其主動面之複數個銲墊233至該些第二接墊219。更具體地,該些銲線270係可以打線鍵合(wire bonding,WB)之方式形成,以電連接該晶片130之該銲墊233至該些第二接墊219。 The first solder balls 120 are bonded to the peripheral ball pads 114. The wafer 130 is disposed on the upper surface 111 of the substrate 110 and covers the first pads 113. In this embodiment, one back surface 132 of the wafer 130 can utilize a die bond layer. 280 is attached to the upper surface 111 of the substrate 110 and covers the first pads 113. The plurality of bonding wires 270 can connect the plurality of pads 233 of the wafer 130 on the active surface thereof to the second pads. 219. More specifically, the bonding wires 270 can be formed by wire bonding (WB) to electrically connect the pads 233 of the die 130 to the second pads 219.
該模封膠體140係形成於該基板110之該上表面111上,以密封該晶片130與該些銲線270。此外,該模封膠體140係更局部密封該些第一銲球120,該模封膠體140之厚度係大於該晶片130之設置高度但小於該些第一銲球120之高度,以顯露出該些第一銲球120之弧面121。該些第二銲球150係接合於該些第一球墊115。該些第三銲球160係接合於該些第二球墊116。 The molding compound 140 is formed on the upper surface 111 of the substrate 110 to seal the wafer 130 and the bonding wires 270. In addition, the molding compound 140 partially seals the first solder balls 120. The thickness of the molding compound 140 is greater than the height of the wafer 130 but less than the height of the first solder balls 120 to reveal the The arc faces 121 of the first solder balls 120. The second solder balls 150 are bonded to the first ball pads 115. The third solder balls 160 are bonded to the second ball pads 116.
因此,本發明可以達成在接合雙面銲球的過程中掉球風險的降低,另可免除雷射鑽孔的製程,以避免封裝堆疊焊接面的表面損害。 Therefore, the present invention can achieve a reduction in the risk of falling the ball during the process of joining the double-sided solder balls, and can also eliminate the laser drilling process to avoid surface damage of the package stack soldering surface.
以上所揭露的僅為本發明較佳實施例而已,當然不能以此來限定本發明之權利範圍,因此依本發明權利要求所作的等同變化,仍屬本發明所涵蓋的範圍。 The above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto, and thus equivalent changes made in the claims of the present invention are still within the scope of the present invention.
100‧‧‧半導體晶片封裝構造 100‧‧‧Semiconductor chip package construction
110‧‧‧基板 110‧‧‧Substrate
111‧‧‧上表面 111‧‧‧Upper surface
112‧‧‧下表面 112‧‧‧ lower surface
113‧‧‧第一接墊 113‧‧‧First mat
114‧‧‧周邊球墊 114‧‧‧around ball pad
115‧‧‧第一球墊 115‧‧‧First ball mat
116‧‧‧第二球墊 116‧‧‧second ball mat
117‧‧‧第一導通孔 117‧‧‧First via
118‧‧‧第二導通孔 118‧‧‧Second via
120‧‧‧第一銲球 120‧‧‧First solder ball
121‧‧‧弧面 121‧‧‧ curved surface
130‧‧‧晶片 130‧‧‧ wafer
131‧‧‧主動面 131‧‧‧Active surface
132‧‧‧背面 132‧‧‧Back
140‧‧‧模封膠體 140‧‧‧Mold sealant
150‧‧‧第二銲球 150‧‧‧second solder ball
160‧‧‧第三銲球 160‧‧‧ third solder ball
170‧‧‧凸塊 170‧‧‧Bumps
171‧‧‧銲料 171‧‧‧ solder
180‧‧‧底部填充膠 180‧‧‧ underfill
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CN116959996A (en) * | 2022-04-12 | 2023-10-27 | 礼鼎半导体科技秦皇岛有限公司 | Packaging substrate with double-sided conductive bumps and manufacturing method thereof |
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