TWI570904B - Light-emitting diode device - Google Patents

Light-emitting diode device Download PDF

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TWI570904B
TWI570904B TW104133593A TW104133593A TWI570904B TW I570904 B TWI570904 B TW I570904B TW 104133593 A TW104133593 A TW 104133593A TW 104133593 A TW104133593 A TW 104133593A TW I570904 B TWI570904 B TW I570904B
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light
emitting diode
units
substrate
diode device
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TW104133593A
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TW201603260A (en
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王誌賢
許嘉良
陳怡名
賴易堂
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晶元光電股份有限公司
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發光二極體元件Light-emitting diode component

本發明係關於一種二維式陣列發光二極體元件,尤其是關於一種具有高出光效率的二維式陣列高壓發光二極體元件。The present invention relates to a two-dimensional array of light-emitting diode elements, and more particularly to a two-dimensional array of high-voltage light-emitting diode elements having high light-emitting efficiency.

發光二極體(LED)之發光原理和結構與傳統光源並不相同,具有耗電量低、元件壽命長、無須暖燈時間、反應速度快等優點,再加上其體積小、耐震動、適合量產,容易配合應用需求製成極小或陣列式的元件,在市場上的應用頗為廣泛。例如,光學顯示裝置、雷射二極體、交通號誌、資料儲存裝置、通訊裝置、照明裝置、以及醫療裝置等。The principle and structure of the light-emitting diode (LED) are different from those of the traditional light source, and have the advantages of low power consumption, long component life, no need for warming time, fast reaction speed, etc., plus small size and vibration resistance. It is suitable for mass production, and it is easy to make small or array components with application requirements. It is widely used in the market. For example, an optical display device, a laser diode, a traffic sign, a data storage device, a communication device, a lighting device, and a medical device.

習知的二維式陣列發光二極體元件1,如第1A圖與第1B圖所示,包含一透明基板10、複數個發光二極體單元12以二維方向延伸,緊密排列形成於透明基板10上,每一個發光二極體單元12包含一p型半導體層121、一發光層122、以及一n型半導體層123。由於透明基板10不導電,因此於複數個發光二極體單元12之間由蝕刻形成溝渠14後可使各發光二極體單元12彼此絕緣,另外再藉由部分蝕刻複數個發光二極體單元12至n型半導體層123,分別於n型半導體層123的暴露區域以及p型半導體層121上形成一第一電極18以及一第二電極16。再藉由導電配線結構19選擇性連接複數個發光二極體單元12之第一電極18及第二電極16,使得複數個發光二極體單元12之間形成串聯或並聯之電路。其中,導電配線結構19下方可以是空氣;也可以預先在形成導電配線結構19之前,在發光二極體單元12的磊晶層部分表面及相近的發光二極體單元12磊晶層間以化學氣相沉積方式(CVD)、物理氣相沉積方式(PVD)、濺鍍(sputtering)等技術沉積形成絕緣層13,作為磊晶層的保護與相近發光二極體單元12間的電性絕緣。絕緣層13的材質較佳例如可以是氧化鋁(Al2O3)、氧化矽(SiO2)、氮化鋁(AlN)、氮化矽(SiNx)、二氧化鈦(TiO2)等材料或其複合組合。The conventional two-dimensional array light-emitting diode element 1 includes a transparent substrate 10 and a plurality of light-emitting diode units 12 extending in a two-dimensional direction and closely arranged in a transparent manner as shown in FIGS. 1A and 1B. On the substrate 10, each of the LED units 12 includes a p-type semiconductor layer 121, a light-emitting layer 122, and an n-type semiconductor layer 123. Since the transparent substrate 10 is not electrically conductive, the light-emitting diode units 12 can be insulated from each other after the trenches 14 are formed by etching between the plurality of light-emitting diode units 12, and a plurality of light-emitting diode units are partially etched. The 12-n semiconductor layer 123 has a first electrode 18 and a second electrode 16 formed on the exposed region of the n-type semiconductor layer 123 and the p-type semiconductor layer 121, respectively. The first electrode 18 and the second electrode 16 of the plurality of LED units 12 are selectively connected by the conductive wiring structure 19, so that a plurality of LED units 12 form a circuit connected in series or in parallel. The conductive wiring structure 19 may be air under the conductive wiring structure 19; before the conductive wiring structure 19 is formed, the chemical vapor may be between the surface of the epitaxial layer portion of the light emitting diode unit 12 and the epitaxial layer of the adjacent light emitting diode unit 12 The insulating layer 13 is deposited by techniques such as phase deposition (CVD), physical vapor deposition (PVD), sputtering, etc., as the protection of the epitaxial layer and the electrical insulation between the adjacent light-emitting diode units 12. The material of the insulating layer 13 is preferably, for example, a material such as alumina (Al 2 O 3 ), yttrium oxide (SiO 2 ), aluminum nitride (AlN), tantalum nitride (SiNx), or titanium dioxide (TiO 2 ), or a composite combination thereof.

然而,藉由導電配線結構19進行發光二極體單元12間的電路連結時,由於發光二極體單元12與之間的溝渠14高低差距頗大,在形成導電配線結構19時容易產生導線連結不良或斷線的問題,進而影響元件的良率。However, when the circuit connection between the light-emitting diode units 12 is performed by the conductive wiring structure 19, the gap between the light-emitting diode unit 12 and the trench 14 is relatively large, and wire bonding is likely to occur when the conductive wiring structure 19 is formed. Bad or broken problems, which in turn affect component yield.

此外,上述之發光二極體元件1更可以進一步地與其他元件組合連接以形成一發光裝置(light-emitting apparatus)。第11圖為習知之發光裝置結構示意圖,如第11圖所示,一發光裝置100包含一具有至少一電路101之次載體(sub-mount)110,將上述發光二極體元件1黏結固定於次載體110上;以及,一電性連接結構104,以電性連接發光元件1之第一電極襯墊16’、第二電極襯墊18’與次載體110上之電路101;其中,上述之次載體110 可以是導線架(lead frame)或大尺寸鑲嵌基底(mounting substrate),以方便發光裝置100之電路規劃並提高其散熱效果。上述之電性連接結構104可以是焊線(bonding wire)或其他連結結構。Further, the above-described light-emitting diode element 1 can be further combined with other elements to form a light-emitting apparatus. 11 is a schematic structural view of a conventional light-emitting device. As shown in FIG. 11, a light-emitting device 100 includes a sub-mount 110 having at least one circuit 101, and the light-emitting diode element 1 is bonded and fixed to On the secondary carrier 110; and an electrical connection structure 104 for electrically connecting the first electrode pad 16' of the light-emitting element 1, the second electrode pad 18' and the circuit 101 on the sub-carrier 110; The secondary carrier 110 may be a lead frame or a large-sized mounting substrate to facilitate circuit planning of the light-emitting device 100 and improve its heat dissipation effect. The electrical connection structure 104 described above may be a bonding wire or other bonding structure.

本發明提供一種二維式陣列發光二極體元件,尤其是關於一種具有高出光效率的二維式陣列高壓發光二極體元件。The invention provides a two-dimensional array light-emitting diode element, in particular to a two-dimensional array high-voltage light-emitting diode element with high light-emitting efficiency.

本發明的一實施例提供一種二維式陣列發光二極體元件,包含一透明基板,具有一第一表面;複數相鄰的發光單元,每一個發光單元包含複數側邊及一周長,配置在第一表面上;以及複數導電配線結構,電性連接上述複數相鄰的發光單元,配置在第一表面上;其中,每一發光單元的側邊與最近的發光單元間具有複數垂直距離,當上述複數垂直距離大於50μm時,發光單元的側邊與最近的發光單元不相近;其中,上述複數發光單元中每一發光單元與最近的發光單元不相近的側邊長度總和與發光單元的周長比大於50%。An embodiment of the present invention provides a two-dimensional array of light-emitting diode elements, including a transparent substrate having a first surface; a plurality of adjacent light-emitting units, each of the light-emitting units including a plurality of sides and a length of one circumference, and is disposed at And a plurality of conductive wiring structures electrically connected to the plurality of adjacent light emitting units disposed on the first surface; wherein each side of the light emitting unit has a plurality of vertical distances between the light emitting unit and the nearest light emitting unit. When the plurality of vertical distances are greater than 50 μm, the sides of the light emitting unit are not close to the nearest light emitting unit; wherein, the sum of the side lengths of each of the plurality of light emitting units and the nearest light emitting unit and the circumference of the light emitting unit The ratio is greater than 50%.

本發明的另一實施例提供一種二維式陣列發光二極體元件,包含一透明基板,具有一第一表面;複數發光單元,其中,每一個發光單元包含一第一電性半導體層,配置於透明基板的第一表面上;一第二電性半導體層;配置於第一電性半導體層上;以及一發光層,配置於第一電性半導體層與第二電性半導體層之間;以及複數導電配線結構,電性連接上述複數發光單元,配置在第一表面上;其中,每一發光單元的發光層間間距大於35μm。Another embodiment of the present invention provides a two-dimensional array of light emitting diode elements, including a transparent substrate having a first surface, and a plurality of light emitting units, wherein each of the light emitting units includes a first electrical semiconductor layer, and is configured On the first surface of the transparent substrate; a second electrical semiconductor layer; disposed on the first electrical semiconductor layer; and a light emitting layer disposed between the first electrical semiconductor layer and the second electrical semiconductor layer; And a plurality of conductive wiring structures electrically connected to the plurality of light emitting units and disposed on the first surface; wherein a spacing between the light emitting layers of each of the light emitting units is greater than 35 μm.

以下配合圖式說明本發明之各實施例。首先,第2A圖與第2B圖所示為本發明第一實施例之二維式陣列發光二極體元件2的上視圖與側視圖。二維式陣列發光二極體元件2具有一個透明基板20,透明基板20具有第一表面201與底面202,其中第一表面201與底面202相對。透明基板20並不限定為單一材料,亦可以是由複數不同材料組合而成的複合式透明基板。例如:透明基板20可以包含兩個相互接合的第一透明基板與第二透明基板(圖未示)。本實施例中,透明基板20的材質為藍寶石(sapphire)。然而,透明基板20的材質亦可以包含但不限於鋁酸鋰(lithium aluminum oxide, LiAlO2)、氧化鋅(zinc oxide, ZnO)、磷化鎵(gallium nitride, GaP)、玻璃(Glass)、有機高分子板材、氮化鋁(aluminum nitride, AlN)。接著,在透明基板20的第一表面201上,形成複數二維延伸排列的發光二極體單元22陣列。在本實施例中,製作方式如下所述:Embodiments of the present invention are described below in conjunction with the drawings. First, FIGS. 2A and 2B are a top view and a side view showing the two-dimensional array light-emitting diode element 2 of the first embodiment of the present invention. The two-dimensional array light-emitting diode element 2 has a transparent substrate 20 having a first surface 201 and a bottom surface 202, wherein the first surface 201 is opposite to the bottom surface 202. The transparent substrate 20 is not limited to a single material, and may be a composite transparent substrate in which a plurality of different materials are combined. For example, the transparent substrate 20 may include two first transparent substrates and a second transparent substrate (not shown) that are bonded to each other. In this embodiment, the material of the transparent substrate 20 is sapphire. However, the material of the transparent substrate 20 may include, but is not limited to, lithium aluminum oxide (LiAlO 2 ), zinc oxide (ZnO), gallium nitride (GaP), glass (Glass), and organic high. Molecular sheet, aluminum nitride (AlN). Next, on the first surface 201 of the transparent substrate 20, a plurality of arrays of two-dimensionally elongated light-emitting diode units 22 are formed. In this embodiment, the production method is as follows:

首先,以傳統的磊晶成長製程,在一成長基板(圖未示)上依序形成n型半導體層221,發光層222,以及p型半導體層223。在本實施例中,成長基板的材質為砷化鎵(GaAs)。當然,除了砷化鎵(GaAs)基板之外,成長基板的材質係可包含但不限於鍺(germanium, Ge)、磷化銦(indium phosphide, InP)、藍寶石(sapphire)、碳化矽(silicon carbide)、矽(silicon)、氧化鋰鋁(lithium aluminum oxide, LiAlO2)、氧化鋅(zinc oxide, ZnO)、氮化鎵(gallium nitride, GaN)、氮化鋁(aluminum nitride)。First, an n-type semiconductor layer 221, a light-emitting layer 222, and a p-type semiconductor layer 223 are sequentially formed on a growth substrate (not shown) by a conventional epitaxial growth process. In the present embodiment, the material of the growth substrate is gallium arsenide (GaAs). Of course, in addition to a gallium arsenide (GaAs) substrate, the material of the grown substrate may include, but is not limited to, germanium (Ge), indium phosphide (InP), sapphire, and silicon carbide. ), silicon, lithium aluminum oxide (LiAlO2), zinc oxide (ZnO), gallium nitride (GaN), aluminum nitride.

接著,以黃光微影製程技術選擇性移除部分磊晶層後,殘餘的磊晶層在成長基板上形成如第2B圖所示,分開排列的多個發光二極體單元22的磊晶層部分結構。其中,更可包含以黃光微影製程技術蝕刻形成每一個發光二極體單元22的n型半導體層暴露區域,以做為後續電極結構的形成平台。Then, after partially removing the epitaxial layer by the yellow light lithography process, the residual epitaxial layer forms an epitaxial layer portion of the plurality of light emitting diode units 22 arranged separately on the growth substrate as shown in FIG. 2B. structure. Wherein, the exposed region of the n-type semiconductor layer of each of the light-emitting diode units 22 is etched by a yellow light lithography process to serve as a formation platform for the subsequent electrode structure.

為了增加元件整體的出光效率,透過基板轉移與基板接合的技術,將發光二極體單元22磊晶層結構設置於透明基板20之上。發光二極體單元22可以以加熱或加壓的方式與透明基板20直接接合,或是透過透明黏著層(圖未示)將發光二極體單元22與透明基板20黏著接合。其中,透明黏著層可以是一有機高分子透明膠材,例如聚醯亞胺(polyimide)、苯環丁烯類高分子(BCB)、全氟環丁基類高分子(PFCB)、環氧類樹脂(Epoxy)、壓克力類樹脂(Acrylic Resin)、聚脂類樹脂(PET)、聚碳酸酯類樹脂(PC)等材料或其組合;或一透明導電氧化金屬層,例如氧化銦錫(ITO)、氧化銦(InO)、氧化錫(SnO)、氧化錫氟(FTO)、銻錫氧化物(ATO)、鎘錫氧化物(CTO)、氧化鋅鋁(AZO)、掺鎘氧化鋅(GZO)等材料或其組合;或一無機絕緣層,例如氧化鋁(Al2O3)、氮化矽(SiNx)、氧化矽(SiO2)、氮化鋁(AlN)、二氧化鈦(TiO2)等材料或其組合。In order to increase the light extraction efficiency of the entire device, the epitaxial layer structure of the light emitting diode unit 22 is disposed on the transparent substrate 20 through a technique of substrate transfer and substrate bonding. The light-emitting diode unit 22 may be directly bonded to the transparent substrate 20 by heating or pressurization, or may be adhered to the transparent substrate 20 through a transparent adhesive layer (not shown). The transparent adhesive layer may be an organic polymer transparent adhesive material, such as polyimide, benzocyclobutene polymer (BCB), perfluorocyclobutyl polymer (PFCB), epoxy. A material such as Epoxy, Acrylic Resin, Polyester Resin (PET), Polycarbonate Resin (PC) or a combination thereof; or a transparent conductive oxidized metal layer such as indium tin oxide ( ITO), indium oxide (InO), tin oxide (SnO), tin oxide fluoride (FTO), antimony tin oxide (ATO), cadmium tin oxide (CTO), zinc aluminum oxide (AZO), cadmium-doped zinc oxide ( Material such as GZO) or a combination thereof; or an inorganic insulating layer such as alumina (Al2O3), tantalum nitride (SiNx), yttrium oxide (SiO2), aluminum nitride (AlN), titanium dioxide (TiO2), or the like, or a combination thereof .

在本實施例中,發光二極體單元22係以苯環丁烯類高分子(BCB)做為透明黏著層與透明基板20進行接合。實際上,將發光二極體單元22設置於透明基板20上的方法不限於此,於本技術領域中具有通常知識的人應可以理解,根據不同的結構特性,發光二極體單元22亦可以磊晶成長的方式直接形成於透明的基板上。此外,根據基板轉移次數的不同,亦可以形成p型半導體層與基板相鄰,且n型半導體層在p型半導體層上,中間夾有發光層的結構。In the present embodiment, the light-emitting diode unit 22 is bonded to the transparent substrate 20 by using a benzocyclobutene polymer (BCB) as a transparent adhesive layer. In fact, the method of disposing the LED unit 22 on the transparent substrate 20 is not limited thereto, and those having ordinary knowledge in the art should understand that the LED unit 22 can also be used according to different structural characteristics. The epitaxial growth mode is formed directly on a transparent substrate. Further, depending on the number of times of substrate transfer, a p-type semiconductor layer may be formed adjacent to the substrate, and the n-type semiconductor layer may have a structure in which a light-emitting layer is interposed on the p-type semiconductor layer.

接著,在發光二極體單元22的磊晶層部分表面及相鄰發光二極體單元22磊晶層間以化學氣相沉積方式(CVD)、物理氣相沉積方式(PVD)、濺鍍(sputtering)等技術沉積形成絕緣層23,作為磊晶層的保護與相鄰發光二極體單元22間的電性絕緣。絕緣層23的材質較佳例如可以是氧化鋁(Al2O3)、氧化矽(SiO2)、氮化鋁(AlN)、氮化矽(SiNx)、二氧化鈦(TiO2)等材料或其複合組合。Then, between the surface of the epitaxial layer portion of the light emitting diode unit 22 and the epitaxial layer of the adjacent light emitting diode unit 22, chemical vapor deposition (CVD), physical vapor deposition (PVD), sputtering (sputtering) The technique is deposited to form the insulating layer 23 as an electrical insulation between the protection of the epitaxial layer and the adjacent light-emitting diode unit 22. The material of the insulating layer 23 is preferably, for example, a material such as alumina (Al 2 O 3 ), cerium oxide (SiO 2 ), aluminum nitride (AlN), tantalum nitride (SiNx), or titanium oxide (TiO 2 ), or a composite combination thereof.

之後,以濺鍍的方式在發光二極體單元22的n型半導體層暴露區域表面,p型半導體層表面,以及透明基板的第一表面201上形成第一電極28、第二電極26及導電配線結構29,以進行發光二極體單元22之間的電性連結。以本實施例為例,在第一發光二極體單元22的n型半導體層暴露區域上形成第一電極28,在相鄰的發光二極體單元22的p型半導體層223上形成第二電極26,以及形成一導電配線結構29於兩個電極之間,以串聯的方式電性連結兩個相鄰的發光二極體單元22。導電配線結構29與電極26,28的材質較佳例如可以是金屬,例如金(Au)、銀(Ag)、銅(Cu)、鉻(Cr)、鋁(Al)、鉑(Pt)、鎳(Ni)、鈦(Ti)、錫(Sn)等,其合金或其層疊組合。形成第一電極28、第二電極26與導電配線結構29的材質可以相同或不同,其結構可以是單一次製程,也可以是由多次製程所完成。Thereafter, the first electrode 28, the second electrode 26, and the conductive are formed on the surface of the exposed region of the n-type semiconductor layer of the light emitting diode unit 22, the surface of the p-type semiconductor layer, and the first surface 201 of the transparent substrate by sputtering. The wiring structure 29 is electrically connected between the light emitting diode units 22. Taking the embodiment as an example, the first electrode 28 is formed on the exposed region of the n-type semiconductor layer of the first light-emitting diode unit 22, and the second electrode is formed on the p-type semiconductor layer 223 of the adjacent light-emitting diode unit 22. The electrode 26 and the conductive wiring structure 29 are formed between the two electrodes to electrically connect the two adjacent light emitting diode units 22 in series. The material of the conductive wiring structure 29 and the electrodes 26, 28 is preferably, for example, a metal such as gold (Au), silver (Ag), copper (Cu), chromium (Cr), aluminum (Al), platinum (Pt), nickel. (Ni), titanium (Ti), tin (Sn), etc., alloys thereof or a combination thereof. The material of the first electrode 28, the second electrode 26 and the conductive wiring structure 29 may be the same or different, and the structure may be a single process or may be performed by multiple processes.

除此之外,如第2A圖所示,為了減少不透光的金屬結構對發光二極體元件2出光效率所產生的影響,依據不同的電路設計,分別自本實施例中的發光二極體單元22串列之中其中兩個發光二極體單元22 的p型半導體層223及n型半導體層221表面形成兩組導電配線結構29,延伸至磊晶層之外的透明基板20第一表面201上形成第一電極襯墊26'與第二電極襯墊28'。藉由兩個電極襯墊,可以以打線或焊錫等方式與外部電源形成電性連接。其中,形成電極襯墊26',28'的製程,可以與形成電極26,28及導電配線結構29於單一次製程中進行,也可以由多次製程所完成。而形成電極襯墊26’,28’的材質,可以分別與形成電極26,28或導電配線結構29的材質相同或不同。In addition, as shown in FIG. 2A, in order to reduce the influence of the opaque metal structure on the light-emitting efficiency of the light-emitting diode element 2, the light-emitting diodes from the present embodiment are respectively determined according to different circuit designs. The two types of conductive wiring structures 29 are formed on the surface of the p-type semiconductor layer 223 and the n-type semiconductor layer 221 of the two light-emitting diode units 22, and the transparent substrate 20 extending beyond the epitaxial layer is first. A first electrode pad 26' and a second electrode pad 28' are formed on the surface 201. The two electrode pads can be electrically connected to an external power source by wire bonding or soldering. The process of forming the electrode pads 26', 28' may be performed in a single process with the forming electrodes 26, 28 and the conductive wiring structure 29, or may be performed by multiple processes. The material forming the electrode pads 26', 28' may be the same as or different from the material forming the electrodes 26, 28 or the conductive wiring structure 29, respectively.

第3圖所示為發光二極體單元22放大之上視圖。在本實施例中,每一個發光二極體單元22係為長方形,依序具有四個側邊22a,長度為a、側邊22b,長度為b、側邊22c,長度為a、以及側邊22d,長度為b。而發光二極體單元22的周長即為四個側邊的長度總和,即2a+2b。Fig. 3 is an enlarged top view of the light-emitting diode unit 22. In this embodiment, each of the LED units 22 is rectangular, and has four side edges 22a, a length a, side 22b, length b, side 22c, length a, and sides. 22d, length is b. The circumference of the light-emitting diode unit 22 is the sum of the lengths of the four sides, that is, 2a+2b.

值得注意的是,在本發明之中,為了增加發光二極體元件的出光效率,對發光二極體單元22的排列方式進行了調整。It is to be noted that in the present invention, in order to increase the light-emitting efficiency of the light-emitting diode element, the arrangement of the light-emitting diode units 22 is adjusted.

習知的二維式陣列發光二極體元件之中,當發光二極體單元22之間設置距離過近時,發光二極體單元所產生的光容易被相近發光二極體單元中能帶相近的半導體層(尤其是發光層)再吸收,進而影響元件整體的出光效率。Among the conventional two-dimensional array light-emitting diode elements, when the distance between the light-emitting diode units 22 is too close, the light generated by the light-emitting diode unit is easily banded by the light-emitting diode unit. The similar semiconductor layers (especially the luminescent layer) are reabsorbed, which in turn affects the light extraction efficiency of the entire component.

在本發明的實施例中,為減少發光二極體單元之間的再吸收現象,使每一個不同的發光二極體單元22之間距離拉大。以本實施例為例,由於發光層之間能帶相近,再吸收現象尤其明顯。因此,以發光層間的距離為基準,調整十個發光二極體單元彼此之間的發光層間距都大於35μm。除此之外,不同的發光二極體單元22間,側邊的相鄰比例應儘量減少。以第4A圖為例,當不同發光二極體單元22之間的側邊垂直距離x大於50μm時,相鄰的發光二極體單元之間的再吸收機會較低,因此可以定義為兩側邊之間不相近。這樣的定義,可以廣泛適用於不同形狀的發光二極體單元22結構之中,如第4B圖所示,圓形的發光二極體單元22也可以適當地以彼此不相近的方式以二維陣列的方式設置在基板上,減少彼此之間再吸收的機會,增加發光二極體元件的出光效率。In an embodiment of the invention, in order to reduce the re-absorption phenomenon between the light-emitting diode units, the distance between each of the different light-emitting diode units 22 is increased. Taking this embodiment as an example, since the energy bands between the light-emitting layers are similar, the re-absorption phenomenon is particularly remarkable. Therefore, the light-emitting layer spacing between the ten light-emitting diode units is adjusted to be greater than 35 μm based on the distance between the light-emitting layers. In addition, between adjacent light-emitting diode units 22, the adjacent proportion of the sides should be minimized. Taking FIG. 4A as an example, when the lateral vertical distance x between different light-emitting diode units 22 is greater than 50 μm, the chance of re-absorption between adjacent light-emitting diode units is low, so it can be defined as two sides. The sides are not similar. Such a definition can be widely applied to the structures of the light-emitting diode units 22 of different shapes. As shown in FIG. 4B, the circular light-emitting diode units 22 can also be appropriately two-dimensionally in a manner different from each other. The array is arranged on the substrate to reduce the chance of re-absorption between each other and increase the light-emitting efficiency of the light-emitting diode element.

以本實施例為例,我們可以推算出每一個發光二極體單元22與其他發光二極體單元的側邊不相近值α。不相近值α的定義為單一發光二極體單元與其他發光二極體單元不相近的側邊長度總和與周長的比值。如第5圖所示,我們將十個發光二極體單元22進行編號,計算發光二極體單元22-1的不相近值α。發光二極體單元22-1與下方的發光二極體單元22-2側邊部分經由導電配線結構29相連接,側邊22-1c與側邊22-2d之間的垂直距離小於或等於50μm時,彼此相近,相近的長度為b。同樣的,發光二極體單元22-1的側邊22-1d與左側的發光二極體單元22-3的側邊22-3b垂直距離小於50μm,也是彼此相近,相近的長度為b;此外,發光二極體單元22-1的周長為2a+2b。在本實施例中,有2b長度的側邊與其他的發光二極體單元相近,不相近的側邊長度總和為(2a+2b)-2b=2a。因此,發光二極體單元22-1的不相近值α為2a/(2a+2b)。相同的計算公式,同樣可以應用在不同形狀的發光二極體單元22結構之中。把單一發光二極體單元的側邊分割為無數的點,沿著每一個點的側邊做切線,就任一點依垂直其切線方向計算與最近的發光二極體單元側邊的垂直距離。確認每一個點與最近的發光二極體單元的距離後,把所有不相近的側邊以積分的方式加總,所獲得的積分值即為不相近的側邊長度總和,不相近值α即為積分值與周長的比值。Taking this embodiment as an example, we can infer that the side values of each of the light-emitting diode units 22 and other light-emitting diode units are not close to each other. The non-similar value α is defined as the ratio of the length of the side lengths to the circumference of a single light-emitting diode unit that is not similar to other light-emitting diode units. As shown in Fig. 5, we number ten light-emitting diode units 22 to calculate the non-similar value α of the light-emitting diode unit 22-1. The light emitting diode unit 22-1 and the lower side of the light emitting diode unit 22-2 are connected via the conductive wiring structure 29, and the vertical distance between the side 22-1c and the side 22-2d is less than or equal to 50 μm. When they are close to each other, the similar length is b. Similarly, the side 22-1d of the LED unit 22-1 and the side 22-3b of the left LED unit 22-3 are perpendicular to each other by less than 50 μm, and are also close to each other, and the similar length is b; The circumference of the light-emitting diode unit 22-1 is 2a+2b. In this embodiment, the side having the length of 2b is similar to the other light-emitting diode units, and the sum of the lengths of the side edges which are not close is (2a+2b)-2b=2a. Therefore, the close-in value α of the light-emitting diode unit 22-1 is 2a/(2a+2b). The same calculation formula can also be applied to the structure of the light-emitting diode unit 22 of different shapes. The side of the single light-emitting diode unit is divided into a plurality of points, and a tangent is made along the side of each point, and the vertical distance from the side of the nearest light-emitting diode unit is calculated for any point in the direction perpendicular to the tangential direction. After confirming the distance between each point and the nearest LED unit, all the dissimilar sides are summed in an integrated manner, and the obtained integral value is the sum of the side lengths that are not close, and the non-similar value α is Is the ratio of the integral value to the perimeter.

以第6A圖與第6B圖為例,我們可以延伸計算形狀為不規則形的發光二極體單元每一點與其他發光二極體單元是否相近。當發光二極體單元的形狀為不規則形狀時,以側邊上的每一個點垂直於此側邊的方向計算與最近的發光二極體單元側邊的垂直距離x,當側邊為弧形時,則以弧形上的每一個點對弧形做切線後,就此點垂直於其切線方向計算垂直距離。在第6A圖與第6B圖中,分別以發光二極體單元32-1與發光二極體單元42-1為例,標示出發光二極體單元側邊不同位置與最近發光二極體單元32-2,32-3,42-2,42-3間垂直距離x的計算方式。Taking FIG. 6A and FIG. 6B as an example, we can extend the calculation of whether each point of the light-emitting diode unit having an irregular shape is similar to other light-emitting diode units. When the shape of the light emitting diode unit is irregular, the vertical distance x from the side of the nearest light emitting diode unit is calculated by the direction perpendicular to the side of each side point on the side, when the side is an arc In the case of a shape, the arc is tangent to each point on the arc, and the vertical distance is calculated perpendicular to the tangent direction. In FIGS. 6A and 6B, the LED unit 32-1 and the LED unit 42-1 are respectively taken as an example, and the different positions of the side of the LED unit and the nearest LED unit 32 are indicated. The calculation of the vertical distance x between -2, 32-3, 42-2, and 42-3.

根據實驗的結果可以發現,當二維式陣列發光二極體元件上發光二極體的單元不相近值α大於50%時,發光二極體元件2可以比習知緊密排列的二維式陣列發光二極體元件3提升發光效率5%,如第7圖提供的發光二極體元件對元件發光效率與每顆發光二極體單元的發光能量比較表所示。當發光二極體元件2中的每一個發光二極體單元側邊長a值為560μm,側邊長b值為290μm時,不相近值α約為65%,發光二極體元件2之發光效率比習知緊密排列的二維式陣列發光二極體元件提升10%。According to the experimental results, it can be found that when the cell non-similar value α of the light-emitting diode on the two-dimensional array light-emitting diode element is greater than 50%, the light-emitting diode element 2 can be closely arranged in a two-dimensional array. The light-emitting diode element 3 enhances the luminous efficiency by 5%, as shown in the comparison table of the luminous efficiency of the light-emitting diode element and the luminous energy of each of the light-emitting diode units as shown in FIG. When the side length a of each of the light-emitting diode elements 2 is 560 μm and the side length b is 290 μm, the non-similar value α is about 65%, and the light-emitting diode element 2 emits light. The efficiency is 10% higher than the conventionally arranged two-dimensional array of light-emitting diode elements.

除了本實施例之外,第8A圖至第8C圖提供其它符合不相近值α大於50%的發光二極體單元排列方式所組成的二維式陣列發光二極體元件的實施例。In addition to the present embodiment, FIGS. 8A to 8C provide other embodiments of the two-dimensional array light-emitting diode elements which are composed of the arrangement of the light-emitting diode units having the non-similar values α greater than 50%.

此外,為了增加元件整體的出光效率,我們還可以利用乾蝕刻或濕蝕刻等方式在透明基板的第一表面及/或背面進行表面粗化,以增加光線散射與出光機率。此外,自上視圖觀之,發光二極體單元22設置於透明基板20上時,發光二極體單元22的發光層垂直投影於第一表面的位置與透明基板20任一側邊之間最短距離較佳應大於20μm,以增加光自透明基板20摘出的機會。In addition, in order to increase the light extraction efficiency of the entire component, we can also perform surface roughening on the first surface and/or the back surface of the transparent substrate by dry etching or wet etching to increase the light scattering and light emission probability. In addition, when the light emitting diode unit 22 is disposed on the transparent substrate 20, the position where the light emitting layer of the light emitting diode unit 22 is vertically projected on the first surface is the shortest between any side of the transparent substrate 20. The distance should preferably be greater than 20 μm to increase the chance of light being picked up from the transparent substrate 20.

在相同的發明精神之下,我們可以將單列的串聯式高壓發光二極體元件接合於透明基板上,利用適當的二微陣列排列方式,也可以達到增加串聯式高壓發光二極體元件中每一顆發光單元的不相近值α的效果,以形成具有高出光效率的二維式陣列發光二極體元件。Under the same spirit of the invention, we can join a series of series high-voltage light-emitting diode elements on a transparent substrate, and by using an appropriate two-microarray arrangement, it is also possible to increase the number of series high-voltage light-emitting diode elements. The effect of a non-similar value α of one light-emitting unit to form a two-dimensional array light-emitting diode element having high light-emitting efficiency.

第9A圖至第9D圖分別顯示單列的串聯式高壓發光二極體元件4、5、6、7。其中,每一個高壓發光二極體元件分別包含有四個發光二極體單元42、52、62、72,以磊晶成長或接合的方式形成於基板40、50、60、70之上。與上述的結構相同,先在第一發光二極體單元42、52、62、72的n型半導體層暴露區域上形成第一電極46、56、66、76,延伸出導電配線結構49、59、69、79至另一個相鄰的發光二極體單元42、52、62、72,並形成第二電極48、58、68、78於相鄰的發光二極體單元42的p型半導體層上,以串聯的方式電性連結兩個相鄰的發光二極體單元42、52、62、72。在每一個單列的串聯式高壓發光二極體元件4、5、6、7之中,行列末端的兩個發光二極體單元42、52、62、72更分別形成有第一電極襯墊46’、56’、66’、76’與第二電極襯墊48’、58’、68’、78’,用以與外部元件或電源形成電性連接。Figures 9A through 9D show a series of series high voltage light emitting diode elements 4, 5, 6, and 7, respectively. Each of the high-voltage light-emitting diode elements includes four light-emitting diode units 42 , 52 , 62 , and 72 respectively formed on the substrates 40 , 50 , 60 , and 70 by epitaxial growth or bonding. Similar to the above structure, the first electrodes 46, 56, 66, 76 are formed on the exposed regions of the n-type semiconductor layers of the first light-emitting diode units 42, 52, 62, 72, and the conductive wiring structures 49, 59 are extended. , 69, 79 to another adjacent light emitting diode unit 42, 52, 62, 72, and forming a second electrode 48, 58, 68, 78 in the p-type semiconductor layer of the adjacent light emitting diode unit 42 In the above, two adjacent light emitting diode units 42, 52, 62, 72 are electrically connected in series. Among the single-series series high-voltage light-emitting diode elements 4, 5, 6, and 7, the two light-emitting diode units 42, 52, 62, and 72 at the end of the row are further formed with the first electrode pads 46, respectively. ', 56', 66', 76' and second electrode pads 48', 58', 68', 78' for electrically connecting with external components or power supplies.

我們可以將複數個上述第9A圖至第9D圖所示的單列的串聯式高壓發光二極體元件4、5、6、7以透明黏著層設置於一個單一的透明基板80上,發光二極體元件4、5、6、7彼此之間可以透過打線製程或黃光製程形成導電配線結構89的方式進行電性連結,在適當的排列之下,可以形成較習知緊密排列的二維式陣列發光二極體元件具有較高不相近值α的二維式陣列發光二極體元件,以達成較高的元件整體出光效率,如第10圖所示。We can arrange a plurality of series of high-voltage light-emitting diode elements 4, 5, 6, and 7 shown in the above-mentioned 9A to 9D with a transparent adhesive layer on a single transparent substrate 80, and a light-emitting diode. The body elements 4, 5, 6, and 7 can be electrically connected to each other through a wire bonding process or a yellow light process to form the conductive wiring structure 89. Under appropriate arrangement, a two-dimensional type that is closely arranged can be formed. The array light-emitting diode element has a two-dimensional array light-emitting diode element with a high in-phase value α to achieve a higher overall light-emitting efficiency of the element, as shown in FIG.

本發明所列舉之各實施例僅用以說明本發明,並非用以限制本發明之範圍。任何人對本發明所作之任何顯而易知之修飾或變更皆不脫離本發明之精神與範圍。The examples of the invention are intended to be illustrative only and not to limit the scope of the invention. Any changes or modifications of the present invention to those skilled in the art will be made without departing from the spirit and scope of the invention.

1、2、3、4、5、6、7、8‧‧‧二維式陣列發光二極體元件
10、20、40、50、60、70、80‧‧‧透明基板
12、22、42、52、62、72、22-1、22-2、22-3、32-1、32-2、32-3、42-1、42-2、42-3‧‧‧發光二極體單元
13、23‧‧‧絕緣層
101‧‧‧電路
104‧‧‧電性連接結構
110‧‧‧次載體
121、223‧‧‧p型半導體層
122、222‧‧‧發光層
123、221‧‧‧n型半導體層
14‧‧‧溝渠
16、26、48、58、68、78‧‧‧第二電極
18、28、46、56、66、76‧‧‧第一電極
19、29、49、59、69、79、89‧‧‧導電配線結構
201‧‧‧第一表面
202‧‧‧底面
22a、22b、22c、22d、22-1c、22-1d、22-3b、22-2d‧‧‧側邊
16’、26’、46’、56’、66’、76’‧‧‧第一電極襯墊
18’、28’、48’、58’、68’、78’‧‧‧第二電極襯墊
x‧‧‧垂直距離
a、b‧‧‧邊長
1, 2, 3, 4, 5, 6, 7, 8‧‧‧Two-dimensional array light-emitting diode components
10, 20, 40, 50, 60, 70, 80‧‧ ‧ transparent substrate
12, 22, 42, 52, 62, 72, 22-1, 22-2, 22-3, 32-1, 32-2, 32-3, 42-1, 42-2, 42-3‧‧ Light-emitting diode unit
13, 23‧‧‧Insulation
101‧‧‧ Circuitry
104‧‧‧Electrical connection structure
110‧‧‧ times carrier
121, 223‧‧‧p type semiconductor layer
122, 222‧‧‧Lighting layer
123, 221‧‧‧n type semiconductor layer
14‧‧‧ Ditch
16, 26, 48, 58, 68, 78‧‧‧ second electrode
18, 28, 46, 56, 66, 76‧‧‧ first electrode
19, 29, 49, 59, 69, 79, 89‧‧‧ Conductive wiring structure
201‧‧‧ first surface
202‧‧‧ bottom
22a, 22b, 22c, 22d, 22-1c, 22-1d, 22-3b, 22-2d‧‧‧ side
16', 26', 46', 56', 66', 76' ‧ ‧ first electrode pads
18', 28', 48', 58', 68', 78'‧‧‧ second electrode pads
X‧‧‧vertical distance
a, b‧‧‧

第1圖為一結構圖,顯示一習知二維式陣列發光二極體元件側視結構圖;1 is a structural diagram showing a side view of a conventional two-dimensional array of light-emitting diode elements;

第2A圖為一結構圖,顯示依據本發明一實施例的二維式陣列發光二極體元件上視結構圖;2A is a structural diagram showing a top view of a two-dimensional array light-emitting diode element according to an embodiment of the invention;

第2B圖為一結構圖,顯示依據本發明一實施例的二維式陣列發光二極體元件側視結構圖;2B is a structural diagram showing a side view of a two-dimensional array of light-emitting diode elements according to an embodiment of the present invention;

第3圖為一結構圖,顯示依據本發明一實施例的發光二極體單元上視結構圖;3 is a structural diagram showing a top view of a light emitting diode unit according to an embodiment of the invention;

第4A-4B圖為一示意圖,顯示依據本發明一實施例的二維式陣列發光二極體元件上視示意圖;4A-4B are schematic views showing a top view of a two-dimensional array light-emitting diode element according to an embodiment of the invention;

第5圖為一結構圖,顯示依據本發明一實施例的二維式陣列發光二極體元件上視結構圖;FIG. 5 is a structural diagram showing a top view of a two-dimensional array light-emitting diode element according to an embodiment of the invention; FIG.

第6A-6B圖為一示意圖,顯示依據本發明另一實施例的二維式陣列發光二極體元件上視示意圖;6A-6B are schematic views showing a top view of a two-dimensional array light-emitting diode element according to another embodiment of the present invention;

第7圖為一表格,顯示依據不同二維式陣列發光二極體元件對發光效率與每顆發光二極體單元的發光能量比較表;Figure 7 is a table showing a comparison table of luminous efficiency and luminous energy of each of the light emitting diode units according to different two-dimensional array light emitting diode elements;

第8A-8C圖為一結構圖,顯示依據本發明另一實施例的二維式陣列發光二極體元件上視結構圖;8A-8C is a structural diagram showing a top view of a two-dimensional array light-emitting diode element according to another embodiment of the present invention;

第9A-9D圖為一結構圖,顯示一種單列的串聯式高壓發光二極體元件上視結構圖。Figure 9A-9D is a structural diagram showing a top view of a series of high voltage light emitting diode elements in series.

第10圖為一結構圖,顯示依據本發明另一實施例的二維式陣列發光二極體元件上視結構圖;。Figure 10 is a block diagram showing a top view of a two-dimensional array of light-emitting diode elements in accordance with another embodiment of the present invention;

第11圖為一示意圖,顯示一習知發光裝置示意圖。Figure 11 is a schematic view showing a conventional light-emitting device.

2‧‧‧二維式陣列發光二極體元件 2‧‧‧Two-dimensional array light-emitting diode components

20‧‧‧透明基板 20‧‧‧Transparent substrate

201‧‧‧第一表面 201‧‧‧ first surface

22‧‧‧發光二極體單元 22‧‧‧Lighting diode unit

221‧‧‧n型半導體層 221‧‧‧n type semiconductor layer

223‧‧‧p型半導體層 223‧‧‧p-type semiconductor layer

26‧‧‧第一電極 26‧‧‧First electrode

26’‧‧‧第一電極襯墊 26'‧‧‧First electrode pad

28‧‧‧第二電極 28‧‧‧second electrode

28’‧‧‧第二電極襯墊 28'‧‧‧Second electrode pad

29‧‧‧導電配線結構 29‧‧‧Electrical wiring structure

Claims (20)

一種發光二極體裝置包含:一基板;數個發光二極體單元設於該基板上;及數個電性連接結構電性連接於該數個發光二極體單元;兩個電極襯墊被該數個發光二極體單元包圍。 A light-emitting diode device comprises: a substrate; a plurality of light-emitting diode units are disposed on the substrate; and a plurality of electrical connection structures are electrically connected to the plurality of light-emitting diode units; the two electrode pads are The plurality of light emitting diode units are surrounded. 如申請專利範圍第1項所述之發光二極體裝置,其中該基板具有一周邊區域及被該周邊區域所圍繞之一中心區域,該數個發光二極體單元設於該周邊區域,且該中心區域不具有任何發光二極體單元。 The illuminating diode device of claim 1, wherein the substrate has a peripheral region and a central region surrounded by the peripheral region, and the plurality of light emitting diode units are disposed in the peripheral region, and This central area does not have any light emitting diode elements. 如申請專利範圍第1或2項所述之發光二極體裝置,其中該基板為透明基板。 The light-emitting diode device according to claim 1 or 2, wherein the substrate is a transparent substrate. 如申請專利第1或2項所述之發光二極體裝置,其中該數個發光二極體單元排列形成一個封閉圖案。 The light emitting diode device of claim 1 or 2, wherein the plurality of light emitting diode units are arranged to form a closed pattern. 如申請專利範圍第1或2項所述之發光二極體裝置,其中各該數個發光二極體單元之間的間距超過35μm。 The light-emitting diode device according to claim 1 or 2, wherein a distance between each of the plurality of light-emitting diode units exceeds 35 μm. 如申請專利範圍第1或2項所述之發光二極體裝置,更包含一黏著層形成於該基板及該數個發光二極體單元之間。 The light-emitting diode device according to claim 1 or 2, further comprising an adhesive layer formed between the substrate and the plurality of light-emitting diode units. 如申請專利範圍第6項所述之發光二極體裝置,其中該黏著層為一透明黏著層。 The light-emitting diode device of claim 6, wherein the adhesive layer is a transparent adhesive layer. 如申請專利範圍第7項所述之發光二極體裝置,其中該透明黏著層的材料包含高分子材料或氧化物。 The light-emitting diode device of claim 7, wherein the material of the transparent adhesive layer comprises a polymer material or an oxide. 如申請專利範圍第1或2項所述之發光二極體裝置,其中該基板為一複合基板。 The light-emitting diode device according to claim 1 or 2, wherein the substrate is a composite substrate. 如申請專利範圍第1或2項所述之發光二極體裝置,其中各該數個發光二極體單元包含一第一導電型半導體層在該基板上,一第二導電型半導體層在該第一導電型半導體層上,以及一發光層設於該第一導電型半導體層及該第二導電型半導體層之間,各該電性連接結構設於兩個相鄰的發光二極體單元之間,且使其中一個相鄰的發光二極體之第一導電型半導體層電性連接於另一個相鄰的發光二極體單元之該第二導電型半導體層。 The illuminating diode device of claim 1 or 2, wherein each of the plurality of illuminating diode units comprises a first conductive semiconductor layer on the substrate, and a second conductive semiconductor layer is A first conductive semiconductor layer is disposed between the first conductive semiconductor layer and the second conductive semiconductor layer, and each of the electrical connection structures is disposed on two adjacent light emitting diode units And electrically connecting the first conductive semiconductor layer of one of the adjacent light emitting diodes to the second conductive semiconductor layer of another adjacent light emitting diode unit. 如申請專利範圍第1或2項所述之發光二極體裝置,其中一該數個發光二極體單元與該基板的任一側邊之最短距離不小於20μm。 The light-emitting diode device according to claim 1 or 2, wherein a shortest distance between the one of the plurality of light-emitting diode units and either side of the substrate is not less than 20 μm. 如申請專利範圍第1或2項所述之發光二極體裝置,其中該基板包含一第一邊及一第二邊;其中該第二邊連接於該第一邊且與該第一邊朝不同方向延伸,沿著該第一邊設置的該數個發光二極體單元的總數目係等於沿著該第二邊設置的該數個發光二極體單元的總數目。 The illuminating diode device of claim 1 or 2, wherein the substrate comprises a first side and a second side; wherein the second side is connected to the first side and the first side Extending in different directions, the total number of the plurality of light emitting diode units disposed along the first side is equal to the total number of the plurality of light emitting diode units disposed along the second side. 如申請專利範圍第1項所述之發光二極體裝置,更包含一發光二極體單元被該數個發光二極體單元包圍。 The light-emitting diode device according to claim 1, further comprising a light-emitting diode unit surrounded by the plurality of light-emitting diode units. 如申請專利範圍第1或2項所述之發光二極體裝置,其中該數個發光二極體單元實質上排列為格狀。 The light-emitting diode device according to claim 1 or 2, wherein the plurality of light-emitting diode units are substantially arranged in a lattice shape. 如申請專利範圍第1或2項所述之發光二極體裝置,其中各該數個發光二極體單元包含一長邊及一短邊,且該電性連接結構設於兩相鄰發光二極體單元之短邊之間。 The light-emitting diode device of claim 1 or 2, wherein each of the plurality of light-emitting diode units comprises a long side and a short side, and the electrical connection structure is disposed on two adjacent light-emitting diodes Between the short sides of the polar body unit. 如申請專利範圍第1或2項所述之發光二極體裝置,其中任一該數個發光二極體單元包含一長邊及一短邊,且一該數個發光二極體單元之長邊係垂直於另一該數個發光二極體單元之長邊。 The light-emitting diode device of claim 1 or 2, wherein any one of the plurality of light-emitting diode units comprises a long side and a short side, and a length of the plurality of light-emitting diode units The sides are perpendicular to the long sides of the other of the plurality of light emitting diode units. 如申請專利範圍第1或2項所述之發光二極體裝置,另包含一絕緣層部分地形成於該數個發光二極體單元上,且位於兩個相鄰的該發光二極體單元之間。 The illuminating diode device of claim 1 or 2, further comprising an insulating layer partially formed on the plurality of illuminating diode units and located in two adjacent illuminating diode units between. 如申請專利範圍第1或2項所述之發光二極體裝置,其中該數個發光二極體單元各包含一成長基板。 The light-emitting diode device of claim 1 or 2, wherein the plurality of light-emitting diode units each comprise a growth substrate. 如申請專利第1項所述之發光二極體裝置,其中一該數個發光二極體單元隔開兩個該電極襯墊。 The light-emitting diode device of claim 1, wherein the one of the plurality of light-emitting diode units separates the two electrode pads. 如申請專利第1項所述之發光二極體裝置,其中兩個電極襯墊設於該基板上。 The light-emitting diode device of claim 1, wherein two electrode pads are disposed on the substrate.
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TW200929612A (en) * 2007-12-31 2009-07-01 Epistar Corp A light-emitting device having a thinned structure and the manufacturing method thereof
TW201103121A (en) * 2009-07-07 2011-01-16 Epistar Corp Light-emitting device
TW201203620A (en) * 2010-06-01 2012-01-16 Lg Innotek Co Ltd Light emitting device package

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200929612A (en) * 2007-12-31 2009-07-01 Epistar Corp A light-emitting device having a thinned structure and the manufacturing method thereof
TW201103121A (en) * 2009-07-07 2011-01-16 Epistar Corp Light-emitting device
TW201203620A (en) * 2010-06-01 2012-01-16 Lg Innotek Co Ltd Light emitting device package

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