TWI569343B - Semiconductor device and temperature control method thereof and test system - Google Patents

Semiconductor device and temperature control method thereof and test system Download PDF

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TWI569343B
TWI569343B TW101128478A TW101128478A TWI569343B TW I569343 B TWI569343 B TW I569343B TW 101128478 A TW101128478 A TW 101128478A TW 101128478 A TW101128478 A TW 101128478A TW I569343 B TWI569343 B TW I569343B
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temperature
semiconductor device
control unit
temperature control
operating temperature
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TW101128478A
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TW201407705A (en
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張昆輝
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華邦電子股份有限公司
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半導體裝置及其溫度控制方法以及測試系統 Semiconductor device and temperature control method thereof and test system

本發明是有關於一種半導體裝置及其溫度控制方法以及測試系統。 The present invention relates to a semiconductor device, a temperature control method thereof, and a test system.

在生產半導體裝置的產品之過程中,通常需要在多個不同的溫度進行各項功能測試,例如溫度條件為45℃、85℃、95℃、105℃或125℃。現有技術對於不同溫度的測試條件,常藉由增加測試站來提供所需的測試溫度。然而,這種增加測試站的做法需要更大的空間來容置測試機台,且會大幅度地增加生產成本,並且在測試站之間運送產品時會拉長測試時間。 In the production of products for semiconductor devices, it is often necessary to perform various functional tests at a plurality of different temperatures, such as 45 ° C, 85 ° C, 95 ° C, 105 ° C or 125 ° C. The prior art tests conditions for different temperatures often provide the required test temperature by adding test stations. However, this practice of adding test stations requires more room to accommodate the test machine and can significantly increase production costs and lengthen the test time when shipping products between test stations.

有鑑於此,本發明提出一種半導體裝置及其溫度控制方法以及測試系統,藉以解決先前技術所述及的問題。 In view of this, the present invention provides a semiconductor device, a temperature control method thereof, and a test system, thereby solving the problems described in the prior art.

本發明提出一種半導體裝置,其包括至少一溫度控制單元以及至少一加熱單元。溫度控制單元用以反應於半導體裝置外部的一外部控制信號而運作。加熱單元耦接溫度控制單元。溫度控制單元反應於外部控制信號的第一指令信號而控制加熱單元的溫度,據以從第一工作溫度升溫至第二工作溫度。 The invention provides a semiconductor device comprising at least one temperature control unit and at least one heating unit. The temperature control unit operates to react to an external control signal external to the semiconductor device. The heating unit is coupled to the temperature control unit. The temperature control unit controls the temperature of the heating unit in response to the first command signal of the external control signal to thereby increase the temperature from the first operating temperature to the second operating temperature.

在本發明的一實施例中,當溫度控制單元接收到來自外部控制信號的第二指令信號時,溫度控制單元反應於第二指令信號而控制該加熱單元的溫度,據以從第二工作溫度升溫至第三工作溫度。 In an embodiment of the invention, when the temperature control unit receives the second command signal from the external control signal, the temperature control unit controls the temperature of the heating unit in response to the second command signal, thereby obtaining the second operating temperature. Warm up to the third working temperature.

在本發明的一實施例中,半導體裝置更包括邏輯控制單元。邏輯控制單元耦接溫度控制單元。邏輯控制單元根據各個溫度控制單元的回饋結果,於達到第二工作溫度時傳送第一回饋信號,還可於達到第三工作溫度時傳送第二回饋信號。 In an embodiment of the invention, the semiconductor device further includes a logic control unit. The logic control unit is coupled to the temperature control unit. The logic control unit transmits the first feedback signal when the second operating temperature is reached according to the feedback result of each temperature control unit, and may also transmit the second feedback signal when the third operating temperature is reached.

本發明另提出一種半導體裝置的溫度控制方法,其包括以下步驟。提供測試機台以控制半導體裝置的運作。測試機台傳送第一指令信號至半導體裝置的溫度控制單元。溫度控制單元反應於第一指令信號而控制半導體裝置的加熱單元的溫度,據以從第一工作溫度升溫至第二工作溫度。 The present invention further provides a temperature control method for a semiconductor device, which includes the following steps. A test machine is provided to control the operation of the semiconductor device. The test machine transmits a first command signal to a temperature control unit of the semiconductor device. The temperature control unit controls the temperature of the heating unit of the semiconductor device in response to the first command signal to thereby increase the temperature from the first operating temperature to the second operating temperature.

本發明另提出一種測試系統。測試系統包括測試機台以及半導體裝置。半導體裝置包括至少一溫度控制單元以及至少一加熱單元。溫度控制單元用以反應於測試機台的控制而運作。加熱單元耦接溫度控制單元。溫度控制單元反應於測試機台的第一指令信號而控制加熱單元的溫度,據以從第一工作溫度升溫至第二工作溫度。 The invention further provides a test system. The test system includes a test machine and a semiconductor device. The semiconductor device includes at least one temperature control unit and at least one heating unit. The temperature control unit is operative to react to the control of the test machine. The heating unit is coupled to the temperature control unit. The temperature control unit controls the temperature of the heating unit in response to the first command signal of the testing machine to thereby increase the temperature from the first operating temperature to the second operating temperature.

基於上述,本發明的半導體裝置內配置了加熱單元,當測試特定的溫度時,可控制半導體裝置內的加熱單元的溫度,以在特定的溫度進行功能測試,從而減少測試站的數量與所需的測試空間。 Based on the above, a heating unit is disposed in the semiconductor device of the present invention, and when testing a specific temperature, the temperature of the heating unit in the semiconductor device can be controlled to perform a function test at a specific temperature, thereby reducing the number of test stations and required Test space.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the invention will be apparent from the following description.

現將詳細參考本發明之實施例,並在附圖中說明所述實施例。然而,本發明概念可以許多不同形式體現且不應被解釋為限於本文中所闡述之實施例。另外,在圖式及實施方式中使用相同標號的元件/構件代表相同或類似部分。在圖式中,為清楚起見,可誇示不同元件/構件的相對大小。 The embodiments of the present invention will now be described in detail, and illustrated in the drawings. However, the inventive concept may be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. In addition, elements/members that use the same reference numerals in the drawings and the embodiments represent the same or similar parts. In the drawings, the relative sizes of the various elements/components may be exaggerated for clarity.

圖1是依照本發明一實施例之測試系統的示意圖。圖2是依照本發明一實施例之測試溫度的示意圖。圖3是依照本發明一實施例之測試流程圖。請合併參閱圖1、圖2和圖3。測試系統100A包括測試機台110以及半導體裝置120。待測試的半導體裝置120包括溫度控制單元130以及加熱單元140_1、140_2。測試機台110用以測試半導體裝置120的各項功能。而半導體裝置120可以為積體電路的晶片或是封裝體。加熱單元140_1、140_2耦接溫度控制單元130。請注意,本發明不限制溫度控制單元或加熱單元的數量。 1 is a schematic diagram of a test system in accordance with an embodiment of the present invention. 2 is a schematic illustration of test temperatures in accordance with an embodiment of the present invention. 3 is a flow chart of a test in accordance with an embodiment of the present invention. Please refer to Figure 1, Figure 2 and Figure 3. Test system 100A includes test machine 110 and semiconductor device 120. The semiconductor device 120 to be tested includes a temperature control unit 130 and heating units 140_1, 140_2. The test machine 110 is used to test various functions of the semiconductor device 120. The semiconductor device 120 can be a wafer or a package of an integrated circuit. The heating units 140_1, 140_2 are coupled to the temperature control unit 130. Please note that the invention does not limit the number of temperature control units or heating units.

在圖2中。假設溫度F0為室溫,測試的溫度條件可以為工作溫度F1和F2,或者再增加一工作溫度F3,或者是類似地再增加其他的工作溫度。而測試區間A0至A6表示不同時間點之間的區間。請注意,工作溫度F3大於 工作溫度F2,且工作溫度F2大於工作溫度F1。 In Figure 2. Assuming that the temperature F0 is room temperature, the temperature conditions tested may be the operating temperatures F1 and F2, or an additional operating temperature F3, or similarly increased to other operating temperatures. The test intervals A0 to A6 represent intervals between different time points. Please note that the operating temperature F3 is greater than The operating temperature is F2, and the operating temperature F2 is greater than the operating temperature F1.

在測試區間A0,半導體裝置120在測試機台110外面。 In the test interval A0, the semiconductor device 120 is outside the test machine 110.

如步驟S310所示,在時間點T1,開始進入測試區間A1。半導體裝置120被載入測試機台110且測試機台110本身的加熱器開始升溫。而在時間點T2表示已經達到工作溫度F1(例如,85℃)。 As shown in step S310, at time point T1, the entry into the test section A1 is started. The semiconductor device 120 is loaded into the test machine 110 and the heater of the test machine 110 itself begins to heat up. At the time point T2, it is indicated that the operating temperature F1 has been reached (for example, 85 ° C).

如步驟S320所示,在測試區間A2(時間點T2至T3),半導體裝置120處於工作溫度F1,測試機台110可以對半導體裝置120進行第一階段的各項功能測試。 As shown in step S320, in the test section A2 (time point T2 to T3), the semiconductor device 120 is at the operating temperature F1, and the test machine 110 can perform various functional tests of the first stage on the semiconductor device 120.

如步驟S330所示,在時間點T3,測試機台110可以傳送致能信號ES1至半導體裝置120(或是將具有致能信號ES1的外部控制信號傳送至半導體裝置120)。此時,半導體裝置120的溫度控制單元130反應於測試機台110(或外部控制信號)的控制,而根據致能信號ES1控制加熱單元140_1、140_2的溫度,據以使半導體裝置120的本身溫度從工作溫度F1(例如,85℃)升溫至工作溫度F2(例如,105℃)。 As shown in step S330, at time point T3, the test machine 110 can transmit the enable signal ES1 to the semiconductor device 120 (or transmit an external control signal having the enable signal ES1 to the semiconductor device 120). At this time, the temperature control unit 130 of the semiconductor device 120 reacts to the control of the test machine 110 (or an external control signal), and controls the temperature of the heating units 140_1, 140_2 according to the enable signal ES1, so as to make the temperature of the semiconductor device 120 itself. The temperature is raised from the operating temperature F1 (for example, 85 ° C) to the operating temperature F2 (for example, 105 ° C).

另外,溫度控制單元130可以檢測加熱單元140_1和140_2的升溫情形,在達到工作溫度F2的時間點T4,傳送回饋信號FBS1至測試機台110,以使測試機台110得知目前半導體裝置120的平均工作溫度。 In addition, the temperature control unit 130 may detect the temperature rising condition of the heating units 140_1 and 140_2, and transmit the feedback signal FBS1 to the testing machine 110 at the time point T4 when the operating temperature F2 is reached, so that the testing machine 110 knows the current semiconductor device 120. Average operating temperature.

如步驟S340所示,在測試區間A4(時間點T4至T5),半導體裝置120處於工作溫度F2,測試機台110可以對半導體裝置120進行第二階段的各項功能測試。 As shown in step S340, in the test section A4 (time point T4 to T5), the semiconductor device 120 is at the operating temperature F2, and the test machine 110 can perform various functional tests of the second stage on the semiconductor device 120.

在又一實施例中,倘若測試機台110欲再增加一工作溫度F3的測試條件。如步驟S350所示,在時間點T5,測試機台110可以傳送致能信號ES2至半導體裝置120(或是將具有致能信號ES2的外部控制信號傳送至半導體裝置120)。此時,半導體裝置120的溫度控制單元130反應於測試機台110(或外部控制信號)的控制,而根據致能信號ES2控制加熱單元140_1、140_2的溫度,據以使半導體裝置120的本身溫度從工作溫度F2(例如,105℃)升溫至工作溫度F3(例如,125℃)。 In still another embodiment, if the test machine 110 is to add another test condition of the operating temperature F3. As shown in step S350, at time point T5, the test machine 110 can transmit the enable signal ES2 to the semiconductor device 120 (or transmit an external control signal having the enable signal ES2 to the semiconductor device 120). At this time, the temperature control unit 130 of the semiconductor device 120 reacts to the control of the test machine 110 (or an external control signal), and controls the temperature of the heating units 140_1, 140_2 according to the enable signal ES2, so that the temperature of the semiconductor device 120 itself is The temperature is raised from the operating temperature F2 (for example, 105 ° C) to the operating temperature F3 (for example, 125 ° C).

類似地,溫度控制單元130可以檢測加熱單元140_1和140_2的溫度,在達到工作溫度F3的時間點T6,傳送回饋信號FBS2至測試機台110。於是如步驟S360所示,在測試區間A6(時間點T6至T7),半導體裝置120處於工作溫度F3,測試機台110可以對半導體裝置120進行第三階段的各項功能測試。 Similarly, the temperature control unit 130 may detect the temperatures of the heating units 140_1 and 140_2, and at a time point T6 when the operating temperature F3 is reached, transmit the feedback signal FBS2 to the test machine 110. Then, as shown in step S360, in the test section A6 (time point T6 to T7), the semiconductor device 120 is at the operating temperature F3, and the test machine 110 can perform various functional tests of the third stage on the semiconductor device 120.

另外,測試區間A2(時間點T2至T3),測試機台110可傳送一校正信號CS,而溫度控制單元130根據校正信號CS對半導體裝置120進行工作溫度F1的溫度校正。例如,校正信號CS表示測試機台已經升溫而達到溫度85℃,所以溫度控制單元130需將目前檢測到半導體裝置120的溫度同步校正為85℃。請注意,本發明的校正溫度數值不以此實施例所列舉的數值為限。 Further, in the test section A2 (time point T2 to T3), the test machine 110 can transmit a correction signal CS, and the temperature control unit 130 performs temperature correction of the operating temperature F1 on the semiconductor device 120 based on the correction signal CS. For example, the correction signal CS indicates that the test machine has warmed up to a temperature of 85 ° C, so the temperature control unit 130 needs to correct the temperature of the currently detected semiconductor device 120 to 85 ° C. Please note that the corrected temperature value of the present invention is not limited to the values recited in this embodiment.

另外,加熱單元140_1、140_2可以為電阻、金屬導線或其他的耗電元件所組成的電路,而溫度控制單元130利 用電流流量來控制加熱單元140_1、140_2的溫度範圍。 In addition, the heating unit 140_1, 140_2 may be a circuit composed of a resistor, a metal wire or other power consuming components, and the temperature control unit 130 The current flow rate is used to control the temperature range of the heating units 140_1, 140_2.

圖4是依照本發明另一實施例之測試系統的示意圖。請參閱圖2和圖4。測試系統100B包括測試機台110以及半導體裝置120A。而測試系統100B類似於圖1的測試系統100A的架構。半導體裝置120A包括邏輯控制單元150、溫度控制單元130A、130B、加熱單元140A_1、...、140A_n以及加熱單元140B_1、...、140B_m。運用多個加熱單元可以使半導體裝置120A的升溫受熱更為平均。 4 is a schematic diagram of a test system in accordance with another embodiment of the present invention. Please refer to Figure 2 and Figure 4. Test system 100B includes test machine 110 and semiconductor device 120A. Test system 100B is similar to the architecture of test system 100A of FIG. The semiconductor device 120A includes a logic control unit 150, temperature control units 130A, 130B, heating units 140A_1, ..., 140A_n, and heating units 140B_1, ..., 140B_m. The heating and heating of the semiconductor device 120A can be more evenly averaged by using a plurality of heating cells.

邏輯控制單元150耦接溫度控制單元130A和130B。溫度控制單元130A可以檢測加熱單元140A_1、...、140A_n的升溫情形,而溫度控制單元130B可以檢測加熱單元140B_1、...、140B_m的升溫情形,並且溫度控制單元130A和130B將溫度檢測的回饋結果傳送至邏輯控制單元150。 The logic control unit 150 is coupled to the temperature control units 130A and 130B. The temperature control unit 130A can detect the temperature rising condition of the heating units 140A_1, . . . , 140A_n, and the temperature control unit 130B can detect the temperature rising condition of the heating units 140B_1, . . . , 140B_m, and the temperature control units 130A and 130B will detect the temperature. The feedback result is transmitted to the logic control unit 150.

在此實施例中,回饋信號FBS1或FBS2可以透過邏輯控制單元150來傳送至測試機台110。邏輯控制單元150可以包括及閘的電路(未繪示),其中及閘的各輸入端分別接收溫度控制單元130A、130B的回饋結果,而及閘的輸出端用以輸出回饋信號FBS1或FBS2。於是,邏輯控制單元150可以根據溫度控制單元130A和130B的回饋結果,於達到工作溫度F2時傳送回饋信號FBS1至測試機台110。並且,邏輯控制單元150可以在達到工作溫度F3時,傳送回饋信號FBS2至測試機台110,以使測試機台110得知目前半導體裝置120的平均工作溫度。 In this embodiment, the feedback signal FBS1 or FBS2 can be transmitted to the test machine 110 through the logic control unit 150. The logic control unit 150 may include a circuit (not shown) of the gate, wherein each input terminal of the gate receives the feedback result of the temperature control unit 130A, 130B, and the output of the gate is used to output the feedback signal FBS1 or FBS2. Thus, the logic control unit 150 can transmit the feedback signal FBS1 to the test machine 110 when the operating temperature F2 is reached according to the feedback result of the temperature control units 130A and 130B. Moreover, the logic control unit 150 may transmit the feedback signal FBS2 to the test machine 110 when the operating temperature F3 is reached, so that the test machine 110 knows the current average operating temperature of the semiconductor device 120.

基於上述實施例所揭示的內容,可以彙整出一種通用 的半導體裝置的溫度控制方法。更清楚來說,圖5繪示為本發明一實施例之半導體裝置的溫度控制方法的流程圖。請合併參閱圖1和圖5,本實施例之溫度控制方法可以包括以下步驟。 Based on the content disclosed in the above embodiments, a general purpose can be collected A method of temperature control of a semiconductor device. More specifically, FIG. 5 is a flow chart showing a temperature control method of a semiconductor device according to an embodiment of the present invention. Referring to FIG. 1 and FIG. 5 together, the temperature control method of this embodiment may include the following steps.

如步驟S510所示,提供測試機台110以控制半導體裝置120的運作。 As shown in step S510, the test machine 110 is provided to control the operation of the semiconductor device 120.

接著如步驟S520所示,測試機台110傳送致能信號ES1至半導體裝置120的溫度控制單元130。 Next, as shown in step S520, the test machine 110 transmits the enable signal ES1 to the temperature control unit 130 of the semiconductor device 120.

然後,如步驟S530所示,溫度控制單元130反應於致能信號ES1而控制半導體裝置120的加熱單元140_1、140_2的溫度,據以從第一工作溫度升溫至第二工作溫度。 Then, as shown in step S530, the temperature control unit 130 controls the temperature of the heating units 140_1, 140_2 of the semiconductor device 120 in response to the enable signal ES1 to thereby increase the temperature from the first operating temperature to the second operating temperature.

在又一示範性實施例中,在步驟S540時,測試機台110傳送致能信號ES2至半導體裝置120的溫度控制單元130。然後,如步驟S550所示,溫度控制單元130反應於致能信號ES2而控制半導體裝置120的加熱單元140_1、140_2的溫度,據以從第二工作溫度升溫至第三工作溫度。 In still another exemplary embodiment, at step S540, the test machine 110 transmits the enable signal ES2 to the temperature control unit 130 of the semiconductor device 120. Then, as shown in step S550, the temperature control unit 130 controls the temperature of the heating units 140_1, 140_2 of the semiconductor device 120 in response to the enable signal ES2, thereby heating up from the second operating temperature to the third operating temperature.

請注意,第三工作溫度(例如,95℃)大於第二工作溫度(例如,85℃),且第二工作溫度大於第一工作溫度(例如,45℃)。 Note that the third operating temperature (eg, 95 ° C) is greater than the second operating temperature (eg, 85 ° C) and the second operating temperature is greater than the first operating temperature (eg, 45 ° C).

綜上所述,本發明在待測試的半導體裝置內配置了至少一個加熱單元,當測試特定的溫度時,可透過半導體裝置內的加熱單元控制溫度,以在特定的溫度進行功能測試,從而可在同一測試機台進行兩種以上的溫度測試,而且有效地減少測試站的數量與所需的測試空間。 In summary, the present invention configures at least one heating unit in the semiconductor device to be tested. When testing a specific temperature, the temperature can be controlled by the heating unit in the semiconductor device to perform a functional test at a specific temperature. Perform more than two temperature tests on the same test machine and effectively reduce the number of test stations and the required test space.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and those skilled in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

100A、100B‧‧‧測試系統 100A, 100B‧‧‧ test system

110‧‧‧測試機台 110‧‧‧Test machine

120、120A‧‧‧半導體裝置 120, 120A‧‧‧ semiconductor devices

130、130A、130B‧‧‧溫度控制單元 130, 130A, 130B‧‧‧ Temperature Control Unit

140_1、140_2、140A_1、140A_n、140B_1、140B_m‧‧‧加熱單元 140_1, 140_2, 140A_1, 140A_n, 140B_1, 140B_m‧‧‧ heating unit

150‧‧‧邏輯控制單元 150‧‧‧Logical Control Unit

A0~A6‧‧‧測試區間 A0~A6‧‧‧ test interval

CS‧‧‧校正信號 CS‧‧‧Correction signal

ES1、ES2‧‧‧致能信號 ES1, ES2‧‧‧ enable signal

FBS1、FBS2‧‧‧回饋信號 FBS1, FBS2‧‧‧ feedback signal

F0‧‧‧室溫 F0‧‧‧ room temperature

F1、F2、F3‧‧‧工作溫度 F1, F2, F3‧‧‧ working temperature

S310~S360‧‧‧本發明一實施例之測試流程的各步驟 S310~S360‧‧‧ steps of the test flow of an embodiment of the present invention

S510~S550‧‧‧本發明一實施例之半導體裝置的溫度控制方法的各步驟 S510~S550‧‧‧ steps of a temperature control method for a semiconductor device according to an embodiment of the present invention

T1~T7‧‧‧時間點 T1~T7‧‧‧ time point

下面的所附圖式是本發明的說明書的一部分,繪示了本發明的示例實施例,所附圖式與說明書的描述一起說明本發明的原理。 The following drawings are a part of the specification of the invention, and illustrate the embodiments of the invention

圖1是依照本發明一實施例之測試系統的示意圖。 1 is a schematic diagram of a test system in accordance with an embodiment of the present invention.

圖2是依照本發明一實施例之測試溫度的示意圖。 2 is a schematic illustration of test temperatures in accordance with an embodiment of the present invention.

圖3是依照本發明一實施例之測試流程圖。 3 is a flow chart of a test in accordance with an embodiment of the present invention.

圖4是依照本發明另一實施例之測試系統的示意圖。 4 is a schematic diagram of a test system in accordance with another embodiment of the present invention.

圖5是依照本發明一實施例之半導體裝置的溫度控制方法的流程圖。 FIG. 5 is a flow chart of a temperature control method of a semiconductor device in accordance with an embodiment of the present invention.

100A‧‧‧測試系統 100A‧‧‧Test System

110‧‧‧測試機台 110‧‧‧Test machine

120‧‧‧半導體裝置 120‧‧‧Semiconductor device

130‧‧‧溫度控制單元 130‧‧‧Temperature Control Unit

140_1、140_2‧‧‧加熱單元 140_1, 140_2‧‧‧ heating unit

CS‧‧‧校正信號 CS‧‧‧Correction signal

ES1、ES2‧‧‧致能信號 ES1, ES2‧‧‧ enable signal

FBS1、FBS2‧‧‧回饋信號 FBS1, FBS2‧‧‧ feedback signal

Claims (12)

一種半導體裝置,包括:至少一溫度控制單元,用以反應於該半導體裝置外部的一外部控制信號而運作;以及至少一加熱單元,耦接該溫度控制單元;其中,該半導體裝置為積體電路的晶片或是封裝體,該溫度控制單元反應於該外部控制信號的一第一致能信號而控制該加熱單元的溫度,據以從一第一工作溫度升溫至一第二工作溫度。 A semiconductor device comprising: at least one temperature control unit for operating in response to an external control signal external to the semiconductor device; and at least one heating unit coupled to the temperature control unit; wherein the semiconductor device is an integrated circuit The wafer or the package, the temperature control unit controls the temperature of the heating unit in response to a first enable signal of the external control signal, thereby heating up from a first operating temperature to a second operating temperature. 如申請專利範圍第1項所述之半導體裝置,其中當該溫度控制單元接收到來自該外部控制信號的一第二致能信號時,該溫度控制單元反應於該第二致能信號而控制該加熱單元的溫度,據以從該第二工作溫度升溫至一第三工作溫度。 The semiconductor device of claim 1, wherein when the temperature control unit receives a second enable signal from the external control signal, the temperature control unit controls the second enable signal to control the The temperature of the heating unit is thereby increased from the second operating temperature to a third operating temperature. 如申請專利範圍第2項所述之半導體裝置,更包括:一邏輯控制單元,耦接該溫度控制單元,該邏輯控制單元根據各個該溫度控制單元的回饋結果,於達到該第二工作溫度時傳送一第一回饋信號。 The semiconductor device of claim 2, further comprising: a logic control unit coupled to the temperature control unit, the logic control unit, according to a feedback result of each of the temperature control units, when the second operating temperature is reached A first feedback signal is transmitted. 如申請專利範圍第3項所述之半導體裝置,其中該邏輯控制單元根據各個該溫度控制單元的回饋結果,於達到該第三工作溫度時傳送一第二回饋信號。 The semiconductor device of claim 3, wherein the logic control unit transmits a second feedback signal when the third operating temperature is reached according to a feedback result of each of the temperature control units. 一種半導體裝置的溫度控制方法,包括:提供一測試機台以控制該半導體裝置的運作,該半導 體裝置為積體電路的晶片或是封裝體;該測試機台傳送一第一致能信號至該半導體裝置的一溫度控制單元;以及該溫度控制單元反應於該第一致能信號而控制該半導體裝置的一加熱單元的溫度,據以從一第一工作溫度升溫至一第二工作溫度。 A temperature control method for a semiconductor device, comprising: providing a test machine to control operation of the semiconductor device, the semiconductor The body device is a wafer or package of the integrated circuit; the test machine transmits a first enable signal to a temperature control unit of the semiconductor device; and the temperature control unit controls the first enable signal to control the The temperature of a heating unit of the semiconductor device is thereby increased from a first operating temperature to a second operating temperature. 如申請專利範圍第5項所述之半導體裝置的溫度控制方法,更包括:當該溫度控制單元接收到來自該測試機台的一第二致能信號時,該溫度控制單元反應於該第二致能信號而控制該加熱單元的溫度,據以從該第二工作溫度升溫至一第三工作溫度。 The temperature control method of the semiconductor device of claim 5, further comprising: when the temperature control unit receives a second enable signal from the test machine, the temperature control unit reacts to the second The enabling signal controls the temperature of the heating unit to increase from the second operating temperature to a third operating temperature. 如申請專利範圍第5項所述之半導體裝置的溫度控制方法,其中在從該第一工作溫度升溫至該第二工作溫度的過程中,該半導體裝置於達到該第二工作溫度時傳送一第一回饋信號至該測試機台。 The temperature control method of the semiconductor device of claim 5, wherein the semiconductor device transmits a first time when the temperature rises from the first operating temperature to the second operating temperature A feedback signal is sent to the test machine. 如申請專利範圍第5項所述之半導體裝置的溫度控制方法,其中在從該第二工作溫度升溫至該第三工作溫度的過程中,該半導體裝置於達到該第三工作溫度時傳送一第二回饋信號至該測試機台。 The method of controlling a temperature of a semiconductor device according to claim 5, wherein the semiconductor device transmits a first time when the temperature rises from the second operating temperature to the third operating temperature The second feedback signal is sent to the test machine. 一種測試系統,包括:一測試機台;以及一半導體裝置,該半導體裝置為積體電路的晶片或是封裝體,包括: 至少一溫度控制單元,用以反應於該測試機台的控制而運作;以及至少一加熱單元,耦接該溫度控制單元;其中,該溫度控制單元反應於該測試機台的一第一致能信號而控制該加熱單元的溫度,據以從一第一工作溫度升溫至一第二工作溫度。 A test system comprising: a test machine; and a semiconductor device, the semiconductor device being a wafer or package of an integrated circuit, comprising: At least one temperature control unit for operating in response to control of the test machine; and at least one heating unit coupled to the temperature control unit; wherein the temperature control unit is responsive to a first enablement of the test machine The temperature of the heating unit is controlled by a signal to increase the temperature from a first operating temperature to a second operating temperature. 如申請專利範圍第9項所述之測試系統,其中當該溫度控制單元接收到來自該測試機台的一第二致能信號時,該溫度控制單元反應於該第二致能信號而控制該加熱單元的溫度,據以從該第二工作溫度升溫至一第三工作溫度。 The test system of claim 9, wherein when the temperature control unit receives a second enable signal from the test machine, the temperature control unit controls the second enable signal to control the The temperature of the heating unit is thereby increased from the second operating temperature to a third operating temperature. 如申請專利範圍第10項所述之測試系統,其中該半導體裝置更包括:一邏輯控制單元,耦接該溫度控制單元,該邏輯控制單元根據各個該溫度控制單元的回饋結果,於達到該第二工作溫度時傳送一第一回饋信號至該測試機台。 The test system of claim 10, wherein the semiconductor device further comprises: a logic control unit coupled to the temperature control unit, wherein the logic control unit reaches the first level according to a feedback result of each of the temperature control units At the second operating temperature, a first feedback signal is transmitted to the test machine. 如申請專利範圍第11項所述之測試系統,其中該邏輯控制單元根據各個該溫度控制單元的回饋結果,於達到該第三工作溫度時傳送一第二回饋信號至該測試機台。 The test system of claim 11, wherein the logic control unit transmits a second feedback signal to the test machine when the third operating temperature is reached according to the feedback result of each of the temperature control units.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW518639B (en) * 1999-11-18 2003-01-21 Tokyo Electron Ltd Heat treatment device, cooling treatment device and cooling treatment method
TWM383759U (en) * 2010-01-15 2010-07-01 Astro Thermal Technology Corp Wireless input device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW518639B (en) * 1999-11-18 2003-01-21 Tokyo Electron Ltd Heat treatment device, cooling treatment device and cooling treatment method
TWM383759U (en) * 2010-01-15 2010-07-01 Astro Thermal Technology Corp Wireless input device

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