TWI564231B - Air Float Handling Device and Air Floating Handling Method - Google Patents

Air Float Handling Device and Air Floating Handling Method Download PDF

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Publication number
TWI564231B
TWI564231B TW101144796A TW101144796A TWI564231B TW I564231 B TWI564231 B TW I564231B TW 101144796 A TW101144796 A TW 101144796A TW 101144796 A TW101144796 A TW 101144796A TW I564231 B TWI564231 B TW I564231B
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Taiwan
Prior art keywords
transport
rail
conveyance
substrate
vortex flow
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TW101144796A
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Chinese (zh)
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TW201343520A (en
Inventor
Takahiro Yasuda
Koichi Tsunoda
Toshiyuki Ikeda
Hideo Ozawa
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Oiles Industry Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • B65G49/064Transporting devices for sheet glass in a horizontal position
    • B65G49/065Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04Arrangements of vacuum systems or suction cups
    • B65G2249/045Details of suction cups suction cups

Description

空浮搬運裝置及空浮搬運方法 Air-floating handling device and air-floating handling method

本發明係有關使搬運對象浮空而以非接觸搬運之空浮搬運技術。 The present invention relates to an air-floating transport technique in which a transport object is floated and transported in a non-contact manner.

在製造線等當中,習知有使搬運對象從搬運用軌道等的搬運面浮空而以非接觸搬運之空浮搬運裝置。舉例來說,專利文獻1中揭示一種空浮搬運裝置,其從搬運用軌道的搬運面同時進行氣體的噴出與吸引,藉此可使搬運對象從搬運用軌道的搬運面的空浮高度穩定並搬運。 In the manufacturing line or the like, there is a known floating transport device that transports a transport object from a transport surface such as a transport rail and transports it in a non-contact manner. For example, Patent Document 1 discloses an air-floating transport device that simultaneously discharges and sucks gas from a transport surface of a transport rail, thereby stabilizing the transport target from the transport surface of the transport rail. Handling.

〔先前技術文獻〕 [Previous Technical Literature] 〔專利文獻〕 [Patent Document]

〔專利文獻1〕日本特開2008-7319號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-7319

然而,專利文獻1記載之空浮搬運裝置,必須在搬運用軌道內構築氣體噴出用及氣體吸引用這二種系統的通氣路徑。再者,必須要有對應氣體噴出及氣體吸引兩者之泵浦。因此,裝置構造會複雜化,成本會升高。 However, in the air-floating transport apparatus described in Patent Document 1, it is necessary to construct a ventilation path for the two systems for gas discharge and gas suction in the transport rail. Furthermore, it is necessary to have a pump corresponding to both gas ejection and gas suction. Therefore, the device configuration is complicated and the cost is increased.

此外,一般在空浮搬運裝置中,若想延伸搬運對象的搬運距離時,普遍採行的方式是將搬運用軌道沿著搬運對象的搬運方向追加。專利文獻1記載之空浮搬運裝置中, 由於是將二條搬運用軌道以沿著搬運方向並排的狀態來構築空浮搬運線,故於搬運方向上相鄰搬運用軌道不會密合,它們之間(亦即搬運用軌道的連接處)會形成搬運面的不連續部,也就是間隙。此外,依據空浮搬運裝置用途不同,於搬運方向上,在相鄰搬運用軌道間可能也會設置間隙,以用來例如配置雷射切割(laser scribe)單元等。 In addition, when the transport distance of the transport target is to be extended in the air-floating transport apparatus, it is generally adopted to add the transport rail along the transport direction of the transport target. In the air-floating transport device described in Patent Document 1, Since the two transport rails are arranged in parallel along the transport direction, the adjacent transport rails are not in close contact with each other in the transport direction (ie, the joint of the transport rails). A discontinuity in the conveying surface, that is, a gap, is formed. Further, depending on the use of the air-floating transport device, a gap may be provided between adjacent transport rails in the transport direction for, for example, a laser scribe unit or the like.

在這種搬運用軌道間的間隙,由於難以將氣體噴向搬運對象,故氣體膜壓難以產生。是故,當搬運中的搬運對象,從沿著搬運方向並排的相鄰二條搬運用軌道的一方至另一方,通過搬運用軌道間的間隙而移動時,在搬運對象的端部位於該間隙時會因自身重量而產生撓曲,該搬運對象的端部可能會與另一方搬運用軌道的端部接觸。特別是,如液晶顯示器、電漿顯示器(Plasma Panel Display,PDP)等平面顯示器所使用之大型玻璃基板等,非常薄而容易撓曲,故在搬運中,玻璃基板的端部在通過搬運用軌道間的間隙時,很有可能與後續的搬運用軌道端部接觸。 In the gap between the conveyance rails, it is difficult to spray the gas to the conveyance target, so that the gas film pressure is hard to occur. When the object to be transported during transportation is moved from one of the two adjacent transport rails that are arranged along the transport direction to the other by the gap between the transport rails, when the end of the transport target is located in the gap The deflection may occur due to its own weight, and the end of the object to be transported may come into contact with the end of the other carrying rail. In particular, a large-sized glass substrate used for a flat panel display such as a liquid crystal display or a plasma panel display (PDP) is very thin and easily deflected, so that the end portion of the glass substrate passes through the transport track during transportation. When there is a gap between them, it is likely to come into contact with the end of the subsequent transport rail.

本發明係有鑑於上述事情而創作者,目的在於提供一種空浮搬運技術,係在將具有從搬運面噴出氣體的機構之搬運用軌道,沿搬運方向並排複數個以構築之空浮搬運線當中,能夠防止搬運對象與搬運用軌道衝撞,藉此可穩定地以非接觸方式搬運搬運對象,且低成本。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an air-floating transport technique in which a transport rail having a mechanism for ejecting a gas from a transport surface is arranged side by side in a plurality of air transport lines arranged in the transport direction. It is possible to prevent the object to be transported from colliding with the transport rail, thereby stably transporting the transport object in a non-contact manner and at low cost.

為解決上述課題,本發明之空浮搬運裝置,係於具備 設有複數個對搬運對象噴出氣體之氣體噴出口的搬運面之搬運用軌道,當搬運對象的搬運方向一方的端部,通過搬運面的搬運方向一方之端部時,在搬運對象的搬運方向另一方的端部所對應之搬運面的位置,至少設置一個渦漩流生成手段,其噴出氣體以生成渦漩流(Swirling Flow),藉此使負壓產生。 In order to solve the above problems, the air-floating conveying device of the present invention is provided When the end of one of the conveyance directions of the conveyance surface passes through one end of the conveyance surface of the conveyance surface, the conveyance rail of the conveyance surface of the conveyance surface which is a gas discharge port which discharges the gas to be conveyed is the conveyance direction of the conveyance target. At least one vortex flow generating means is provided at the position of the conveying surface corresponding to the other end portion, which ejects a gas to generate a swirling flow, thereby generating a negative pressure.

舉例來說,本發明屬於使搬運對象從於搬運方向設有間隙而排列之複數個搬運用軌道的搬運面浮空,而於搬運方向以非接觸方式搬運之空浮搬運裝置,其特徵為:前述複數個搬運用軌道,包含第一搬運用軌道、及於前述搬運方向位於前述第一搬運用軌道的下游測的隔壁之第二搬運用軌道、及於前述搬運方向位於前述第二搬運用軌道的下游測的隔壁之第三搬運用軌道,前述第二搬運用軌道,具有:複數個渦漩流生成手段,設於該第二搬運用軌道的搬運面,噴出氣體以生成渦漩流,藉此使負壓產生;及複數個氣體噴出口,形成於該第二搬運用軌道的搬運面之,比設有前述渦漩流生成手段之區域還靠前述搬運方向上的前述第二搬運用軌道的兩端側之區域,且朝向前述搬運對象噴出氣體;前述複數個渦漩流生成手段,包含:複數個第一渦漩流生成手段,當前述搬運方向上的前述搬運對象的先端部,從前述第二搬運用軌道側到達前述第二及第三搬運用軌道的間隙時,在前述第二搬運用軌道 的搬運面之,和前述搬運方向上的前述搬運對象的後端部相對應之第一區域,朝穿越前述搬運方向之方向排列;及複數個第二渦漩流生成手段,當前述搬運方向上的前述搬運對象的後端部,從前述第一搬運用軌道側到達前述第一及第二搬運用軌道的間隙時,在前述第二搬運用軌道的搬運面之,和前述搬運方向上的前述搬運對象的先端部相對應之第二區域,朝穿越前述搬運方向之方向排列;及複數個第三渦漩流生成手段,在位於前述第一及第二區域間的第三區域,以朝穿越前述搬運方向之方向排列的個數比前述第一及第二渦漩流生成手段還少的配置而設置。 For example, the present invention relates to an air-floating transport device that transports a plurality of transport rails in which a transport target is arranged with a gap in a transport direction and that is transported in a non-contact manner in a transport direction, and is characterized in that: The plurality of transport rails include a first transport rail and a second transport rail that is located at a partition wall downstream of the first transport rail in the transport direction, and a second transport rail in the transport direction. The third transport rail for the downstream side of the partition, the second transport rail includes a plurality of vortex flow generating means, and is disposed on the transport surface of the second transport rail to eject a gas to generate a swirl flow. The negative pressure is generated, and the plurality of gas discharge ports are formed on the conveying surface of the second conveying rail, and the second conveying rail in the conveying direction is further located than the region where the swirling flow generating means is provided. a region on both end sides and ejecting gas toward the object to be transported; the plurality of vortex flow generating means including: a plurality of first vortex flow generating means The distal end portion of said transfer object in the conveying direction, from reaching the second conveying track with the second and third side conveying track with a gap, in the second conveying track a first conveying surface corresponding to the rear end portion of the conveying target in the conveying direction, arranged in a direction crossing the conveying direction; and a plurality of second swirling flow generating means in the conveying direction When the rear end portion of the object to be conveyed reaches the gap between the first and second conveyance rails from the first conveyance rail side, the conveyance surface of the second conveyance rail and the aforementioned conveyance direction a second region corresponding to the tip end portion of the transport object, arranged in a direction crossing the transport direction; and a plurality of third vortex flow generating means for traversing the third region between the first and second regions The number of the directions in which the conveyance directions are arranged is smaller than the arrangement of the first and second swirl flow generation means.

本發明中,當搬運對象從沿著搬運方向並排之二條搬運用軌道的一方至另一方,通過搬運用軌道間的間隙而移動時,當搬運對象的搬運方向一方之端部位於該間隙時,搬運對象會因自身重量而撓曲,搬運對象的搬運方向另一方之端部,會產生試圖朝遠離搬運面的方向(浮空方向)移動之力。但,該力在搬運對象另一方之端部所對應之搬運面位置,會藉由渦漩流生成手段所生成之渦漩流所產生的負壓而被抵消,搬運對象的搬運方向另一方之端部會被拉近至搬運面。如此一來,能夠防止搬運對象因自身重量而產生撓曲,能夠防止搬運對象的搬運方向的端部與搬運用軌道的搬運方向的端部衝撞。 In the present invention, when one of the two transport rails that are arranged in the transport direction is moved by the gap between the transport rails, when one end of the transport target is located in the gap, The object to be conveyed is deflected by its own weight, and the other end of the conveyance direction of the object to be transported has a force to move in a direction away from the conveyance surface (floating direction). However, the position of the conveying surface corresponding to the end of the other object to be conveyed is canceled by the negative pressure generated by the vortex flow generated by the vortex flow generating means, and the conveying direction of the object to be transported is the other. The ends will be pulled closer to the carrying surface. In this way, it is possible to prevent the conveyance target from being deflected by its own weight, and it is possible to prevent the end portion of the conveyance target in the conveyance direction from colliding with the end portion of the conveyance rail in the conveyance direction.

此外,本發明中,係噴出氣體以生成渦漩流,使負壓產生以將搬運對象拉近至搬運用軌道的搬運面,故壓縮氣體噴出口與渦漩流生成手段能夠共同供應氣體之通氣路徑及泵浦,其中壓縮氣體噴出口是用來噴出使搬運對象從搬運面浮空之氣體,渦漩流生成手段是用來噴出將搬運物端部拉近至搬運面之氣體。因此,按照本發明,能夠提供一種空浮搬運技術,其即使將搬運用軌道沿著搬運方向並排複數個以構築空浮搬運線的情形下,也能防止搬運對象與搬運用軌道衝撞,藉此可穩定地以非接觸方式搬運搬運對象,且低成本。 Further, in the present invention, the gas is ejected to generate a vortex flow, and the negative pressure is generated to bring the object to be transported to the transport surface of the transport rail. Therefore, the compressed gas discharge port and the vortex flow generating means can supply the gas together. The path and the pump, wherein the compressed gas discharge port is for discharging a gas that causes the object to be transported to float from the conveying surface, and the swirling flow generating means is for discharging the gas that pulls the end of the carrier closer to the conveying surface. Therefore, according to the present invention, it is possible to provide an air-floating transport technique capable of preventing the object to be transported from colliding with the transport rail even when the transport rails are arranged side by side in the transport direction to construct the air transport line. The object to be transported can be stably transported in a non-contact manner at a low cost.

以下參照圖面,說明本發明一實施形態。 Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

圖1為本實施形態之基板搬運裝置1之概略構成圖。 Fig. 1 is a schematic configuration diagram of a substrate transfer device 1 of the embodiment.

如圖所示,本實施形態之基板搬運裝置1,具有:軌道2,其具備搬運面20,用來以非接觸方式搬運液晶顯示器、電漿顯示器等平坦的平面顯示器所使用之大型玻璃基板等基板5(參照圖3);及泵浦3,供應壓縮氣體;及管4,連結泵浦3的壓縮氣體噴出口(未圖示)與軌道2的給氣口(未圖示)。 As shown in the figure, the substrate transfer device 1 of the present embodiment includes a rail 2 including a transport surface 20 for transporting a large-sized glass substrate used for a flat flat display such as a liquid crystal display or a plasma display in a non-contact manner. The substrate 5 (see FIG. 3) and the pump 3 supply compressed gas; and the tube 4 is connected to a compressed gas discharge port (not shown) of the pump 3 and an air supply port (not shown) of the rail 2.

此處,在軌道2內部形成有與給氣口相連之通氣路徑(未圖示),而在軌道2的搬運面20分別形成有複數個:壓縮氣體噴出口22,與該通氣路徑相連;及渦漩流生成部23,含有與該通氣路徑相連之後述渦漩流噴出口26 (參照圖2)。另,圖1及後述圖3中,為求圖示簡略,僅對一部分的壓縮氣體噴出口22與一部分的渦漩流生成部23標注符號。 Here, a ventilation path (not shown) connected to the air supply port is formed inside the rail 2, and a plurality of compressed gas discharge ports 22 are formed on the conveying surface 20 of the rail 2, and are connected to the ventilation path; The swirling flow generating portion 23 includes a swirling flow discharge port 26 which is connected to the air passage. (Refer to Figure 2). In FIG. 1 and FIG. 3 to be described later, only a part of the compressed gas discharge port 22 and a part of the swirl flow generation unit 23 are denoted by reference numerals for the sake of simplicity of illustration.

壓縮氣體噴出口22,是在軌道2的搬運面20上之軌道2長邊兩端21a、21b側的區域(壓縮氣體噴出區域)29內各形成複數個。這些壓縮氣體噴出口22分別朝向搬運面20的垂直方向開口,將供應至通氣路徑的壓縮氣體a,在搬運面20上朝搬運中的基板5噴出(參照圖4(A)、(B))。如後述圖4所示,當將二條軌道2(2A、2B)沿著基板搬運方向A相隔規定的間隙d而並排時,在搬運中的基板5通過軌道2A上的渦漩流生成區域28上的期間,於基板搬運方向A(軌道2長邊),各壓縮氣體噴出區域29的寬度,其尺寸係做成比基板5的寬度H與間隙d寬度的差還狹窄,以使基板5的先端部51a或後端部51b跨越間隙d。 The compressed gas discharge port 22 is formed in a plurality of regions (compressed gas discharge regions) 29 on the side of the long sides 21a and 21b of the rail 2 on the conveying surface 20 of the rail 2, respectively. The compressed gas discharge ports 22 are respectively opened in the vertical direction of the conveyance surface 20, and the compressed gas a supplied to the air passage is discharged onto the conveyed surface 20 on the conveyance surface 20 (see FIGS. 4(A) and (B)). . As shown in FIG. 4 which will be described later, when the two rails 2 (2A, 2B) are arranged side by side with a predetermined gap d along the substrate conveyance direction A, the substrate 5 being conveyed passes through the swirl flow generation region 28 on the rail 2A. In the substrate transport direction A (long side of the track 2), the width of each compressed gas discharge region 29 is made smaller than the difference between the width H of the substrate 5 and the width of the gap d, so that the tip end of the substrate 5 is narrowed. The portion 51a or the rear end portion 51b spans the gap d.

另一方面,渦漩流生成部23係在區域(渦漩流生成區域)28內形成複數個,該區域28是被位於軌道2的搬運面20上的兩端部21a、21b側之壓縮氣體噴出口區域29所包夾。這些渦漩流生成部23分別使供應至通氣路徑之壓縮氣體E迴旋,藉此生成渦漩流b(參照圖2(A)、圖4(A)、(B))。 On the other hand, the vortex flow generation unit 23 is formed in a plurality of regions (vortex flow generation regions) 28 which are compressed gases on the side of the both end portions 21a and 21b of the conveyance surface 20 of the rail 2 The discharge port area 29 is sandwiched. These vortex flow generating units 23 respectively swirl the compressed gas E supplied to the air passage to generate the swirl flow b (see FIG. 2(A), FIGS. 4(A) and (B)).

圖2(A)為軌道2的搬運面20上之渦漩流生成部23的形成部分擴大圖、圖2(B)為圖2(A)所示渦漩流生成部23的A-A截面圖。 2(A) is an enlarged view showing a portion where the vortex flow generating portion 23 is formed on the conveying surface 20 of the rail 2, and FIG. 2(B) is a cross-sectional view taken along line A-A of the swirling flow generating portion 23 shown in FIG. 2(A).

如圖所示,渦漩流生成部23具有:圓筒狀之凹部24,形成於軌道2的搬運面20;及渦漩流用噴出口26,形成於凹部24的內周面25,且於凹部24的內周面25的切線方向噴出壓縮氣體E。 As shown in the figure, the vortex flow generating portion 23 has a cylindrical recess 24 formed on the conveying surface 20 of the rail 2, and a swirling flow outlet 26 formed in the inner peripheral surface 25 of the recess 24 and in the recess The compressed gas E is ejected in the tangential direction of the inner peripheral surface 25 of 24.

渦漩流用噴出口26與通氣路徑相連,從泵浦3經由通氣路徑而供應之壓縮氣體E,會從渦漩流用噴出口26,在凹部24內部朝該凹部24的內周面25的切線方向噴出,沿著凹部24的內周面25迴旋。藉此,形成渦漩流b。又,在凹部24的內周面25,於開口側設有推拔面27,以便被捲入該渦漩流之氣體,可容易地從凹部24朝軌道2的搬運面20與搬運中的基板5之間噴出。 The vortex flow discharge port 26 is connected to the air passage, and the compressed gas E supplied from the pump 3 through the air passage is tangential to the inner peripheral surface 25 of the recess 24 from the swirl flow discharge port 26 inside the recess 24. The ink is ejected and swirled along the inner circumferential surface 25 of the concave portion 24. Thereby, the swirling flow b is formed. Further, on the inner peripheral surface 25 of the recessed portion 24, a push-out surface 27 is provided on the opening side so as to be caught in the swirling flow gas, and the transport surface 20 of the rail 2 and the transported substrate can be easily moved from the recessed portion 24 to the rail 2 Squirt between 5

此外,在軌道2的搬運面20上的區域28,分散配置有產生右旋渦漩流之渦漩流生成部23及產生左旋渦漩流之渦漩流生成部23。如此一來,會抵消渦漩流所生之力矩,該力矩係作用在軌道2的搬運面20上以非接觸方式被搬運之基板5上。 Further, a vortex flow generating portion 23 that generates a right-handed swirling flow and a swirling flow generating portion 23 that generates a left-lateral swirling flow are dispersedly disposed in a region 28 on the conveying surface 20 of the rail 2. In this way, the moment generated by the vortex flow is counteracted, and the moment acts on the substrate 5 on which the transport surface 20 of the rail 2 is transported in a non-contact manner.

另,本實施形態中,係將渦漩流生成部23的凹部24及渦漩流用噴出口26直接形成於軌道2的搬運面20,但亦可將噴頭(tip)埋入軌道2的搬運面20以形成渦漩流生成部23,該噴頭係具有圓筒室、及形成為可朝圓筒室的內周方向的切線方向噴出氣體之噴嘴。 In the present embodiment, the concave portion 24 and the swirling flow ejection port 26 of the swirling flow generating portion 23 are directly formed on the conveying surface 20 of the rail 2, but a tip may be buried in the conveying surface of the rail 2. The vortex flow generating unit 23 has a cylindrical chamber and a nozzle formed to discharge a gas in a tangential direction in the inner circumferential direction of the cylindrical chamber.

圖3為將基板搬運裝置1的軌道2沿著基板搬運方向A並排複數個而構築之基板搬運線6一例說明用圖。 FIG. 3 is a view for explaining an example of the substrate conveyance line 6 which is formed by stacking the rails 2 of the substrate transfer device 1 in the substrate conveyance direction A.

如圖所示,一般而言,基板搬運線6是將配合基板搬 運線6線長的條數之軌道2沿著基板搬運方向A並排成一列,再配合基板5的寬度h將其配置複數列而構築成的。舉例來說,因佈置上的方便等理由,於基板搬運方向A,會在相鄰的軌道2的端部21a、21b間設置間隙d。因此,在基板搬運線6上會產生軌道2的搬運面20的不連續部,在該位置無法將壓縮氣體噴向基板5。 As shown in the figure, in general, the substrate transfer line 6 is to move the mating substrate The rails 2 of the 6-line length of the transport line are arranged side by side in the substrate transport direction A, and are arranged in a plurality of columns in accordance with the width h of the substrate 5. For example, due to the convenience of layout and the like, a gap d is provided between the end portions 21a and 21b of the adjacent rails 2 in the substrate conveyance direction A. Therefore, a discontinuous portion of the conveyance surface 20 of the rail 2 is generated on the substrate conveyance line 6, and the compressed gas cannot be ejected toward the substrate 5 at this position.

此外,如圖所示,渦漩流生成部23係至少形成複數個於:當搬運中的基板5的先端部51a到達後續軌道2B的搬運面20的基板搬運方向A後方之端部(後端部)21b時,基板5的後端部51b所對應之軌道2A的搬運面20上的位置(圖4(A));以及當搬運中的基板5的後端部51b到達軌道2A的搬運面20的基板搬運方向A前方之端部(先端部)21a時,基板5的先端部51a所對應之軌道2B的搬運面20上的位置(圖4(B))。此外,壓縮氣體噴出口22,除了渦漩流生成部23的形成區域28之外,係在搬運面20上的區域29全面形成複數個。 Further, as shown in the figure, at least a plurality of vortex flow generating portions 23 are formed at the end portion of the rear surface portion 51a of the substrate 5 being conveyed to the rear side in the substrate conveyance direction A of the conveyance surface 20 of the subsequent rail 2B (rear end portion) At the portion 21b, the position on the transport surface 20 of the track 2A corresponding to the rear end portion 51b of the substrate 5 (Fig. 4(A)); and the rear end portion 51b of the substrate 5 being conveyed reach the transport surface of the track 2A. When the end portion (front end portion) 21a of the front side of the substrate conveyance direction A of the substrate 5 is 20, the position on the conveyance surface 20 of the rail 2B corresponding to the front end portion 51a of the substrate 5 is obtained (Fig. 4(B)). Further, the compressed gas discharge port 22 is formed in a plurality of regions 29 on the conveying surface 20 in addition to the formation region 28 of the swirling flow generating portion 23.

圖4(A)、(B)為從搬運面20浮空而以非接觸方式在基板搬運線6上被搬運的基板5之情形說明用圖。 4(A) and 4(B) are diagrams for explaining the case where the substrate 5 that is transported on the substrate conveyance line 6 in a non-contact manner from the conveyance surface 20 is floated.

如圖4(A)所示,基板5是藉由形成於軌道2A的搬運面20之複數個壓縮氣體噴出口22所噴出的壓縮氣體a,而從軌道2A的搬運面20浮空,同時以非接觸方式朝基板搬運方向A被搬運。又,當基板5的先端部51a通過軌道2A的先端部21a,到達該軌道2A的先端部21a與後續的軌道2B的後端部21b之間隙d時,由於基板5自身 重量,在基板5的先端部51a會發生撓曲,而試圖落下至間隙d與軌道2B衝撞。如此一來,基板5的後端部51b,會試圖朝遠離軌道2A的搬運面20之方向(浮空方向)移動。此時,複數個渦漩流生成部23形成於與基板5的後端部51b相向之軌道2A於搬運面20上的位置,藉由其生成的渦漩流b的中心部的負壓P,基板5的後端部51b側會被拉近至軌道2A的搬運面20。如此一來,基板5的先端部51a側會抬起,故會防止基板5的先端部51a因自身重量而落下,能避免基板5與軌道2B衝撞。 As shown in FIG. 4(A), the substrate 5 is compressed by the compressed gas a discharged from the plurality of compressed gas discharge ports 22 formed on the conveying surface 20 of the rail 2A, and is floated from the conveying surface 20 of the rail 2A. The non-contact method is carried in the substrate transport direction A. Further, when the leading end portion 51a of the substrate 5 passes through the leading end portion 21a of the rail 2A and reaches the gap d between the leading end portion 21a of the rail 2A and the rear end portion 21b of the subsequent rail 2B, the substrate 5 itself The weight is deflected at the tip end portion 51a of the substrate 5, and attempts to fall to the gap d collides with the rail 2B. As a result, the rear end portion 51b of the substrate 5 is attempted to move in a direction (floating direction) away from the conveying surface 20 of the rail 2A. At this time, the plurality of vortex flow generating portions 23 are formed at a position on the transport surface 20 of the rail 2A facing the rear end portion 51b of the substrate 5, and the negative pressure P at the center portion of the swirl flow b generated by the The rear end portion 51b side of the substrate 5 is drawn closer to the conveying surface 20 of the rail 2A. As a result, the front end portion 51a side of the substrate 5 is lifted, so that the tip end portion 51a of the substrate 5 is prevented from falling due to its own weight, and the substrate 5 and the rail 2B can be prevented from colliding.

其後如圖4(B)所示,當基板5的後端部51b通過軌道2A的先端部21a,到達該軌道2A的先端部21a與後續的軌道2B的後端部21b之間隙d時,由於基板5自身重量,在基板5的後端部51b側會發生撓曲,而試圖落下至該間隙d。如此一來,基板5的先端部51a,會試圖朝遠離後續的軌道2B的搬運面20之方向移動。此時,複數個渦漩流生成部23形成於與基板5的先端部51a相向之軌道2B於搬運面20上的位置,藉由其生成的渦漩流b的中心部的負壓P,基板5的先端部51a側會被拉近至後續的軌道2B的搬運面20。如此一來,基板5的後端部51b側會抬起,故會防止基板5的後端部51b因自身重量而落下,能避免基板5與軌道2B衝撞。 Thereafter, as shown in FIG. 4(B), when the rear end portion 51b of the substrate 5 passes the tip end portion 21a of the rail 2A and reaches the gap d between the tip end portion 21a of the rail 2A and the rear end portion 21b of the subsequent rail 2B, Due to the weight of the substrate 5 itself, deflection occurs on the side of the rear end portion 51b of the substrate 5, and it is attempted to fall to the gap d. As a result, the tip end portion 51a of the substrate 5 is attempted to move away from the conveying surface 20 of the subsequent rail 2B. At this time, the plurality of vortex flow generating portions 23 are formed at a position on the transport surface 20 of the rail 2B facing the tip end portion 51a of the substrate 5, and the negative pressure P at the center portion of the swirl flow b generated by the substrate The side of the leading end portion 51a of the 5 is drawn to the conveying surface 20 of the subsequent rail 2B. As a result, the rear end portion 51b side of the substrate 5 is lifted, so that the rear end portion 51b of the substrate 5 is prevented from falling due to its own weight, and the collision between the substrate 5 and the rail 2B can be avoided.

以上已說明本發明之一實施形態。 An embodiment of the present invention has been described above.

本實施形態中,如圖4(A)、(B)所示,藉由將基板5一方之端部(先端部51a或後端部51b)側拉近至軌 道2的搬運面20,基板5另一方之端部(後端部51b或先端部51a)會抬起,故能夠防止在基板搬運線6上搬運中的基板5的先端部51a或後端部51b,在基板搬運線6上的軌道2的搬運面20之不連續部(於基板搬運方向A與相鄰軌道2間形成之間隙d)因自身重量而落下,藉此避免與軌道2B衝撞。此外,本實施形態中,從泵浦3供應至軌道2內的通氣路徑之壓縮氣體,會從軌道2的搬運面20的壓縮氣體噴出口22朝向軌道2的搬運面20上的基板5噴出,且亦從渦漩流生成部23的渦漩流用噴出口26噴出而形成渦漩流b,藉由該渦漩流b的中央部產生之負壓P來將基板5拉近至軌道2的搬運面20,故於壓縮氣體噴出口22與渦漩流生成部23,能夠共同軌道2內的通氣路徑(未圖示)及泵浦3。因此,按照本實施形態,即使於基板搬運線6存在有軌道2的搬運面20的不連續部,也能防止基板5與搬運用軌道2的衝撞,藉此能穩定地以非接觸方式搬運基板5,能抑制基板搬運裝置1的成本。 In the present embodiment, as shown in Figs. 4(A) and 4(B), the end portion (the tip end portion 51a or the rear end portion 51b) of the substrate 5 is pulled closer to the rail. In the conveyance surface 20 of the road 2, the other end portion (the rear end portion 51b or the tip end portion 51a) of the substrate 5 is lifted, so that the tip end portion 51a or the rear end portion of the substrate 5 being conveyed on the substrate conveyance line 6 can be prevented. 51b, the discontinuous portion (the gap d formed between the substrate conveyance direction A and the adjacent rail 2) on the conveyance surface 20 of the rail 2 on the substrate conveyance line 6 is dropped by its own weight, thereby avoiding collision with the rail 2B. Further, in the present embodiment, the compressed gas supplied from the pump 3 to the air passage in the rail 2 is ejected from the compressed gas discharge port 22 of the conveyance surface 20 of the rail 2 toward the substrate 5 on the conveyance surface 20 of the rail 2. Further, the swirling flow b is ejected from the swirling flow outlet 26 of the swirling flow generating portion 23 to form the swirling flow b, and the substrate 5 is pulled to the rail 2 by the negative pressure P generated in the central portion of the swirling flow b. The surface 20 is such that the compressed gas discharge port 22 and the swirl flow generating unit 23 can share the air passage (not shown) and the pump 3 in the rail 2. Therefore, according to the present embodiment, even if the substrate conveyance line 6 has the discontinuous portion of the conveyance surface 20 of the rail 2, the collision between the substrate 5 and the conveyance rail 2 can be prevented, whereby the substrate can be stably conveyed in a non-contact manner. 5. The cost of the substrate transfer device 1 can be suppressed.

此外,本實施形態中,係在軌道2的搬運面20設置圓筒狀之凹部24,而將朝該凹部24的內周面25的切線方向噴出壓縮氣體E之渦漩流用噴出口26,設置於該凹部24的內周面25,藉此形成渦漩流生成部23。因此,能以簡單的構成來使負壓P產生,將基板5拉近至軌道2的搬運面20。 In the present embodiment, the cylindrical recess 24 is provided on the transport surface 20 of the rail 2, and the swirling flow outlet 26 for the compressed gas E is ejected toward the tangential direction of the inner peripheral surface 25 of the recess 24. The swirling flow generating portion 23 is formed on the inner peripheral surface 25 of the recess portion 24. Therefore, the negative pressure P can be generated with a simple configuration, and the substrate 5 can be brought closer to the conveyance surface 20 of the rail 2.

此外,本實施形態中,由於生成右旋渦漩流之渦漩流生成部23、以及生成左旋渦漩流之渦漩流生成部23係分 散存在於軌道2的搬運面20上,故能抵消渦漩流所生之力矩,該力矩係作用在軌道2的搬運面20上以非接觸方式被搬運之基板5上。因此,可更穩定地以非接觸方式搬運基板5。 Further, in the present embodiment, the vortex flow generating unit 23 that generates the right-handed swirling flow and the swirling flow generating unit 23 that generates the left-handed swirling flow are divided into points. Since it is scattered on the conveyance surface 20 of the rail 2, the moment generated by the vortex flow can be offset, and this moment acts on the conveyance surface 20 of the rail 2 on the substrate 5 which is conveyed in a non-contact manner. Therefore, the substrate 5 can be carried in a non-contact manner more stably.

另,本實施形態中,係將渦漩流生成部23配置成,當基板5的先端部51a到達渦漩流生成部23上時,基板5的後端部51b會位於壓縮氣體噴出口22上;在此情形下,藉由渦漩流b的中心部的負壓P,基板5的先端部51a會被拉近至搬運面20,且藉由從噴出口22噴出之壓縮氣體a,基板5的後端部51b會試圖朝遠離搬運面20之方向移動。但,即使在此情形下,於渦漩流生成部23,被捲入渦漩流之氣體e(參照圖4),會從凹部24的周圍流出至基板5與軌道2的搬運面20之間,故能夠防止基板5的先端部51a被太過拉近而與搬運面20接觸。 Further, in the present embodiment, the vortex flow generating portion 23 is disposed such that when the tip end portion 51a of the substrate 5 reaches the vortex flow generating portion 23, the rear end portion 51b of the substrate 5 is positioned on the compressed gas discharge port 22. In this case, by the negative pressure P of the central portion of the swirling flow b, the leading end portion 51a of the substrate 5 is drawn to the carrying surface 20, and the compressed gas a is ejected from the ejection port 22, the substrate 5 The rear end portion 51b will attempt to move away from the conveying surface 20. However, even in this case, the gas e (refer to FIG. 4) that is entangled in the vortex flow in the vortex flow generating portion 23 flows out from the periphery of the concave portion 24 to between the substrate 5 and the conveying surface 20 of the rail 2. Therefore, it is possible to prevent the tip end portion 51a of the substrate 5 from being too close to be in contact with the conveying surface 20.

此外,本實施形態中,雖舉例以液晶顯示器、電漿顯示器等平面顯示器所使用之大型玻璃基板等基板5作為搬運對象之情形,但並不限於基板,凡是容易撓曲的片狀搬運物均能良好地搬運。 In the present embodiment, the substrate 5 such as a large-sized glass substrate used for a flat panel display such as a liquid crystal display or a plasma display is used as a transport target. However, the substrate 5 is not limited to a substrate, and any sheet-like conveyance that is easily deflected is used. It can be handled well.

1‧‧‧基板搬運裝置 1‧‧‧Substrate handling device

2‧‧‧軌道 2‧‧‧ Track

3‧‧‧泵浦 3‧‧‧ pump

4‧‧‧管 4‧‧‧ tube

5‧‧‧基板 5‧‧‧Substrate

6‧‧‧基板搬運線 6‧‧‧Substrate handling line

20‧‧‧搬運面 20‧‧‧Transport surface

21a‧‧‧搬運面的先端部 21a‧‧‧The tip of the carrying surface

21b‧‧‧搬運面的後端部 21b‧‧‧The rear end of the carrying surface

22‧‧‧壓縮氣體噴出口 22‧‧‧Compressed gas outlet

23‧‧‧渦漩流生成部 23‧‧‧Vortex flow generation

24‧‧‧凹部 24‧‧‧ recess

25‧‧‧凹部的內周面 25‧‧‧ inner circumference of the recess

26‧‧‧渦漩流用噴出口 26‧‧‧Vortex flow outlet

27‧‧‧推拔面 27‧‧‧ pushed face

28‧‧‧壓縮氣體噴出區域 28‧‧‧Compressed gas ejection area

29‧‧‧渦漩流生成區域 29‧‧‧Vortex flow generation area

51a‧‧‧基板的先端部 51a‧‧‧The apex of the substrate

51b‧‧‧基板的後端部 51b‧‧‧ back end of the substrate

〔圖1〕圖1為本發明一實施形態之基板搬運裝置1之概略構成圖。 Fig. 1 is a schematic configuration diagram of a substrate transfer device 1 according to an embodiment of the present invention.

〔圖2〕圖2(A)為軌道2的搬運面20上之渦漩流生成部23的形成部分擴大圖、圖2(B)為圖2(A)所示 渦漩流生成部23的A-A截面圖。 2(A) is an enlarged view showing a portion where the vortex flow generating portion 23 is formed on the conveying surface 20 of the rail 2, and FIG. 2(B) is a view showing FIG. 2(A). A-A cross-sectional view of the vortex flow generating portion 23.

〔圖3〕圖3為將基板搬運裝置1的軌道2沿著基板搬運方向A並排複數個而構築之基板搬運線6一例說明用圖。 [Fig. 3] Fig. 3 is a view for explaining an example of a substrate conveyance line 6 constructed by stacking a plurality of rails 2 of the substrate transfer device 1 along the substrate conveyance direction A.

〔圖4〕圖4(A)、(B)為從搬運面20浮空而以非接觸方式在基板搬運線6上被搬運的基板5之情形說明用圖。 4(A) and 4(B) are diagrams for explaining the case where the substrate 5 that is transported on the substrate conveyance line 6 in a non-contact manner from the conveyance surface 20 is floated.

2、2A、2B‧‧‧軌道 2, 2A, 2B‧‧ track

5‧‧‧基板 5‧‧‧Substrate

6‧‧‧基板搬運線 6‧‧‧Substrate handling line

21a‧‧‧搬運面的先端部 21a‧‧‧The tip of the carrying surface

21b‧‧‧搬運面的後端部 21b‧‧‧The rear end of the carrying surface

22‧‧‧壓縮氣體噴出口 22‧‧‧Compressed gas outlet

23‧‧‧渦漩流生成部 23‧‧‧Vortex flow generation

28‧‧‧壓縮氣體噴出區域 28‧‧‧Compressed gas ejection area

29‧‧‧渦漩流生成區域 29‧‧‧Vortex flow generation area

51a‧‧‧基板的先端部 51a‧‧‧The apex of the substrate

51b‧‧‧基板的後端部 51b‧‧‧ back end of the substrate

Claims (3)

一種空浮搬運裝置,屬於使搬運對象從於搬運方向設有間隙而排列之複數個搬運用軌道的搬運面浮空,而於前述搬運方向以非接觸方式搬運之空浮搬運裝置,其特徵為:前述複數個搬運用軌道,包含第一搬運用軌道、及於前述搬運方向位於前述第一搬運用軌道的下游測的隔壁之第二搬運用軌道、及於前述搬運方向位於前述第二搬運用軌道的下游測的隔壁之第三搬運用軌道,前述第二搬運用軌道,具有:複數個渦漩流生成手段,設於該第二搬運用軌道的搬運面,噴出氣體以生成渦漩流,藉此使負壓產生;及複數個氣體噴出口,形成於該第二搬運用軌道的搬運面之,比設有前述渦漩流生成手段之區域還靠前述搬運方向上的前述第二搬運用軌道的兩端側之區域,且朝向前述搬運對象噴出氣體;前述複數個渦漩流生成手段,包含:複數個第一渦漩流生成手段,當前述搬運方向上的前述搬運對象的先端部,從前述第二搬運用軌道側到達前述第二及第三搬運用軌道的間隙時,在前述第二搬運用軌道的搬運面之,和前述搬運方向上的前述搬運對象的後端部相對應之第一區域,朝穿越前述搬運方向之方向排列;及複數個第二渦漩流生成手段,當前述搬運方向上的前述搬運對象的後端部,從前述第一搬運用軌道側到達前述 第一及第二搬運用軌道的間隙時,在前述第二搬運用軌道的搬運面之,和前述搬運方向上的前述搬運對象的先端部相對應之第二區域,朝穿越前述搬運方向之方向排列;及複數個第三渦漩流生成手段,在位於前述第一及第二區域間的第三區域,以朝穿越前述搬運方向之方向排列的個數比前述第一及第二渦漩流生成手段還少的配置而設置。 An air-floating transport device is an air-floating transport device that transports a transport surface on which a plurality of transport rails are arranged in a transport direction from a transport direction, and is transported in a non-contact manner in the transport direction. The plurality of transport rails include a first transport rail and a second transport rail that is located at a partition wall downstream of the first transport rail in the transport direction, and the second transport rail is located in the transport direction. a third transport rail for the partition wall measured downstream of the rail, the second transport rail having a plurality of vortex flow generating means provided on the transport surface of the second transport rail to eject a gas to generate a swirl flow. Thereby, a negative pressure is generated; and a plurality of gas discharge ports are formed on the conveyance surface of the second conveyance rail, and the second conveyance is further provided in the conveyance direction than the region in which the swirl flow generation means is provided. a region on both end sides of the rail, and ejecting gas toward the transport object; the plurality of vortex flow generating means including: a plurality of first vortex generators When the tip end portion of the object to be conveyed in the conveyance direction reaches the gap between the second and third conveyance rails from the second conveyance rail side, the conveyance surface of the second conveyance rail and the aforementioned a first region corresponding to a rear end portion of the object to be transported in the transport direction is arranged in a direction crossing the transport direction; and a plurality of second vortex flow generating means are disposed at a rear end of the transport target in the transport direction a part that reaches the aforementioned from the side of the first transport rail In the gap between the first and second transport rails, the second region corresponding to the tip end portion of the transport target in the transport direction of the second transport rail is in a direction crossing the transport direction And a plurality of third vortex flow generating means for arranging the first and second vortex flows in a third region between the first and second regions in a direction crossing the conveying direction The generation means is set with less configuration. 如申請專利範圍第1項之空浮搬運裝置,其中,前述渦漩流生成手段,具有:圓筒狀之凹部,形成於前述搬運面;及渦漩流用噴出口,形成於前述凹部的內周面,且朝向該凹部的內周面的切線方向噴出氣體。 The vortex flow generating device according to the first aspect of the invention, wherein the vortex flow generating means includes a cylindrical recess formed in the conveying surface, and a swirling flow outlet formed in an inner circumference of the recess The surface is ejected with gas toward the tangential direction of the inner peripheral surface of the recess. 如申請專利範圍第1或2項之空浮搬運裝置,其中,前述渦漩流生成手段,係設置複數個生成朝某一方向旋轉的渦漩流之一方向渦漩流生成手段、以及生成朝與該某一方向旋轉呈逆方向旋轉的渦漩流之逆方向渦漩流生成手段,且彼此分散存在。 The air-floating device according to claim 1 or 2, wherein the vortex flow generating means is provided with a plurality of vortex flow generating means for generating a swirl flow in a certain direction, and generating The swirling flow generation means in the reverse direction of the swirling flow that rotates in the opposite direction in the one direction is dispersed and dispersed.
TW101144796A 2012-02-14 2012-11-29 Air Float Handling Device and Air Floating Handling Method TWI564231B (en)

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