TWI562214B - Method of processing substrate - Google Patents
Method of processing substrateInfo
- Publication number
- TWI562214B TWI562214B TW101117644A TW101117644A TWI562214B TW I562214 B TWI562214 B TW I562214B TW 101117644 A TW101117644 A TW 101117644A TW 101117644 A TW101117644 A TW 101117644A TW I562214 B TWI562214 B TW I562214B
- Authority
- TW
- Taiwan
- Prior art keywords
- processing substrate
- substrate
- processing
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101117644A TWI562214B (en) | 2012-05-17 | 2012-05-17 | Method of processing substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101117644A TWI562214B (en) | 2012-05-17 | 2012-05-17 | Method of processing substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201349313A TW201349313A (en) | 2013-12-01 |
TWI562214B true TWI562214B (en) | 2016-12-11 |
Family
ID=50157512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101117644A TWI562214B (en) | 2012-05-17 | 2012-05-17 | Method of processing substrate |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI562214B (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020035762A1 (en) * | 2000-09-22 | 2002-03-28 | Seiichiro Okuda | Substrate processing apparatus |
US20050215445A1 (en) * | 2002-07-29 | 2005-09-29 | Mohamed Boumerzoug | Methods for residue removal and corrosion prevention in a post-metal etch process |
US7364626B2 (en) * | 2001-11-01 | 2008-04-29 | Tokyo Electron Limited | Substrate processing apparatus and substrate processing method |
-
2012
- 2012-05-17 TW TW101117644A patent/TWI562214B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020035762A1 (en) * | 2000-09-22 | 2002-03-28 | Seiichiro Okuda | Substrate processing apparatus |
US7364626B2 (en) * | 2001-11-01 | 2008-04-29 | Tokyo Electron Limited | Substrate processing apparatus and substrate processing method |
US20050215445A1 (en) * | 2002-07-29 | 2005-09-29 | Mohamed Boumerzoug | Methods for residue removal and corrosion prevention in a post-metal etch process |
Also Published As
Publication number | Publication date |
---|---|
TW201349313A (en) | 2013-12-01 |
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