TWI555217B - Optic detector - Google Patents

Optic detector Download PDF

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TWI555217B
TWI555217B TW103118831A TW103118831A TWI555217B TW I555217 B TWI555217 B TW I555217B TW 103118831 A TW103118831 A TW 103118831A TW 103118831 A TW103118831 A TW 103118831A TW I555217 B TWI555217 B TW I555217B
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gate electrode
photodetector
layer
active layer
electrode
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TW103118831A
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TW201545368A (en
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張鼎張
陳華茂
涂峻豪
鄭君丞
劉竹育
江明峯
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友達光電股份有限公司
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Priority to CN201410445197.XA priority patent/CN104183664B/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Receiving Elements (AREA)

Description

光偵測器及其操作方式 Light detector and its operation

本發明是有關於一種光偵測器,特別是一種可調式光偵測器。 The invention relates to a photodetector, in particular to an adjustable photodetector.

自動化已經成為目前科技發展的主流趨勢,為了提供系統更佳的環境辨識,各種的偵測器已陸續被開發出來。其中,可以偵測環境亮暗的光偵測器有相當廣泛的應用,例如作為自動燈具的開關、手機的亮度偵測、閃光燈的判斷。 Automation has become the mainstream trend of current technology development. In order to provide better environmental identification of the system, various detectors have been developed. Among them, light detectors that can detect bright and dark environments have a wide range of applications, such as switching for automatic lighting, brightness detection of mobile phones, and flashing.

然而,不同來源的光線所具有的強度皆不同,對於不同強度的光線,習知光偵測器難以用單一靈敏度滿足不同狀況。除此之外,由於光線為一種具有多種波長疊加的電磁波,當需要特別偵測某區間的光線時,習知光偵測器也需要面對不同波長的雜訊問題。因此,如何解決上述問題,已成了相關領域急欲解決的課題。 However, different sources of light have different intensities. For different intensity of light, it is difficult for conventional photodetectors to satisfy different conditions with a single sensitivity. In addition, since light is an electromagnetic wave with multiple wavelengths superimposed, when it is necessary to specifically detect light in a certain interval, conventional photodetectors also need to face noise problems of different wavelengths. Therefore, how to solve the above problems has become an urgent problem to be solved in related fields.

本發明實施例提出一種光偵測器,可對應不同環境 需求而改變靈敏度,達到可調式的效果。除此之外,使用不同主動層材料更可滿足針對單一波段光線作偵測,使得光偵測器有更精準的效果。 The embodiment of the invention provides a photodetector, which can correspond to different environments. The sensitivity is changed by demand to achieve an adjustable effect. In addition, the use of different active layer materials can better detect the single-band light, making the light detector more accurate.

本發明實施例提供一種光偵測器,包含基板、底閘極電極、第一絕緣層、主動層、電極層、第二絕緣層以及頂閘極電極。底閘極電極設置於基板上。第一絕緣層設置於基板以及底閘極電極上。主動層設置於第一絕緣層上,且位於底閘極電極上。主動層具有一能隙。電極層設置於主動層上。電極層包含源極電極、汲極電極以及開口。源極電極與主動層的一側連接。汲極電極與該主動層的另一側連接。開口位於源極電極與汲極電極之間,其中主動層暴露於開口處為光接收區。第二絕緣層設置於該電極層上。頂閘極電極設置於第二絕緣層上,且位於光接收區上。 Embodiments of the present invention provide a photodetector including a substrate, a bottom gate electrode, a first insulating layer, an active layer, an electrode layer, a second insulating layer, and a top gate electrode. The bottom gate electrode is disposed on the substrate. The first insulating layer is disposed on the substrate and the bottom gate electrode. The active layer is disposed on the first insulating layer and on the bottom gate electrode. The active layer has an energy gap. The electrode layer is disposed on the active layer. The electrode layer includes a source electrode, a drain electrode, and an opening. The source electrode is connected to one side of the active layer. The drain electrode is connected to the other side of the active layer. The opening is between the source electrode and the drain electrode, wherein the active layer is exposed to the opening as a light receiving region. A second insulating layer is disposed on the electrode layer. The top gate electrode is disposed on the second insulating layer and located on the light receiving region.

根據本發明一或多個實施例,光偵測器更包含阻隔層,設置於主動層與電極層之間。阻隔層包含穿孔,其中穿孔分別位於主動層的相對兩側,使得源極電極以及汲極電極透過穿孔與主動層連接。 According to one or more embodiments of the present invention, the photodetector further includes a barrier layer disposed between the active layer and the electrode layer. The barrier layer comprises perforations, wherein the perforations are respectively located on opposite sides of the active layer such that the source electrode and the drain electrode are connected to the active layer through the perforations.

根據本發明一或多個實施例,第二絕緣層、阻隔層以及頂閘極電極具有透光性。 According to one or more embodiments of the present invention, the second insulating layer, the barrier layer, and the top gate electrode are translucent.

根據本發明一或多個實施例,主動層為金屬氧化物層。 According to one or more embodiments of the invention, the active layer is a metal oxide layer.

根據本發明一或多個實施例,金屬氧化物層材料為銦鎵鋅氧化物(IGZO)、銦鎵鋅氧化物(IZO)、鎵氧化物(IGO)、鎵鋅氧化物(GZO)、鋅氧化物(ZnO)、銦氧化物 (InO)、氧化鋁鋅(AZO)或其組合。 According to one or more embodiments of the present invention, the metal oxide layer material is indium gallium zinc oxide (IGZO), indium gallium zinc oxide (IZO), gallium oxide (IGO), gallium zinc oxide (GZO), zinc. Oxide (ZnO), indium oxide (InO), aluminum zinc oxide (AZO) or a combination thereof.

根據本發明一或多個實施例,頂閘極電極之寬度分別小於光接收區與開口之寬度。 According to one or more embodiments of the present invention, the width of the top gate electrode is smaller than the width of the light receiving region and the opening, respectively.

本發明提出一種光偵測器的操作方式,包含施加第一偏壓於閘極電極,用以產生電位位障,電位位障作為限制載子通過。利用預定波段之光線激發主動層後,降低電位位障,並產生載子通道。施加第二偏壓於另一閘極電極,用以產生放大電流。 The invention provides a mode of operation of the photodetector, comprising applying a first bias voltage to the gate electrode for generating a potential barrier, and the potential barrier acts as a limiting carrier. After the active layer is excited by the light of the predetermined band, the potential barrier is lowered and a carrier channel is generated. A second bias voltage is applied to the other gate electrode for generating an amplified current.

根據本發明一或多個實施例,預定波段由主動層材料決定。 According to one or more embodiments of the invention, the predetermined band is determined by the active layer material.

根據本發明一或多個實施例,預定波段為紫外光波段,主動層之材料為銦鎵鋅氧化物(IGZO)、銦氧化物(InO3)、錫氧化物(SnO2)、鋅氧化物(ZnO)或其組合。 According to one or more embodiments of the present invention, the predetermined wavelength band is an ultraviolet light band, and the active layer material is indium gallium zinc oxide (IGZO), indium oxide (InO3), tin oxide (SnO2), zinc oxide (ZnO). ) or a combination thereof.

根據本發明一或多個實施例,光偵測器的操作方式更包含調整第二偏壓,用以控制放大電流,以及施加起始電壓於汲極電極上,用以控制起始電流。 According to one or more embodiments of the present invention, the operation of the photodetector further includes adjusting a second bias voltage for controlling the amplification current and applying a starting voltage to the drain electrode for controlling the initial current.

本發明實施例所提供的光偵測器為一種可調式光偵測器,使用時,將偏壓輸入至頂閘極電極以及底閘極電極,並藉由偏壓大小控制靈敏度。並且,對於所需要偵測的預定波段之光線,配合使用不同的主動層材料,光偵測器將可實現針對單一波段作偵測,以達到不失真效果。 The photodetector provided by the embodiment of the invention is an adjustable photodetector. In use, a bias voltage is input to the top gate electrode and the bottom gate electrode, and the sensitivity is controlled by the bias voltage. Moreover, for different predetermined active layer materials for the light of the predetermined band to be detected, the photodetector can detect the single band to achieve the distortion-free effect.

100‧‧‧光偵測器 100‧‧‧Photodetector

102‧‧‧基板 102‧‧‧Substrate

104‧‧‧底閘極電極 104‧‧‧Bottom gate electrode

106‧‧‧第一絕緣層 106‧‧‧First insulation

110‧‧‧主動層 110‧‧‧ active layer

112‧‧‧電極層 112‧‧‧electrode layer

113‧‧‧源極電極 113‧‧‧Source electrode

114‧‧‧汲極電極 114‧‧‧汲electrode

116‧‧‧開口 116‧‧‧ openings

118‧‧‧光接收區 118‧‧‧Light receiving area

119‧‧‧第二絕緣層 119‧‧‧Second insulation

120‧‧‧頂閘極電極 120‧‧‧ top gate electrode

122‧‧‧阻隔層 122‧‧‧Barrier

124‧‧‧穿孔 124‧‧‧Perforation

126‧‧‧導引層 126‧‧‧Guiding layer

128‧‧‧導柱 128‧‧‧ Guide column

130‧‧‧光線 130‧‧‧Light

140、142、144、146‧‧‧曲線 140, 142, 144, 146‧‧‧ curves

S10~S50‧‧‧步驟 S10~S50‧‧‧Steps

A、A’、B、B’、C、C’‧‧‧資料點 A, A’, B, B’, C, C’‧‧‧ data points

D‧‧‧放大比 D‧‧‧ magnification ratio

第1A圖為依照本發明之光偵測器第一實施例的正面示意圖。 Figure 1A is a front elevational view of a first embodiment of a photodetector in accordance with the present invention.

第1B圖為第1A圖的光偵測器的俯視示意圖 FIG. 1B is a schematic top view of the photodetector of FIG. 1A

第2A圖為依照本發明之光偵測器第二實施例的正面示意圖。 2A is a front elevational view of a second embodiment of a photodetector in accordance with the present invention.

第2B圖為第2A圖的光偵測器的俯視示意圖。 2B is a top plan view of the photodetector of FIG. 2A.

第3圖為本發明之光偵測器操作方法一實施例的流程圖。 FIG. 3 is a flow chart of an embodiment of a method for operating a photodetector of the present invention.

第4圖為本發明之光偵測器操作方法另一實施例的流程圖。 4 is a flow chart of another embodiment of a method of operating a photodetector of the present invention.

第5圖為本發明之光偵測器不同操作模式下的電流電壓曲線圖。 Fig. 5 is a graph showing current and voltage curves in different operation modes of the photodetector of the present invention.

第6圖為本發明之光偵測器操作模式一實施例的電流電壓曲線圖。 Figure 6 is a graph showing current and voltage of an embodiment of the operation mode of the photodetector of the present invention.

第7圖為本發明之光偵測器一實施例應用結果的操作示意圖。 Figure 7 is a schematic diagram showing the operation of an embodiment of the photodetector of the present invention.

第8A圖為本發明光偵測器的汲極電極偏壓為10伏特的操作示意圖。 Fig. 8A is a schematic view showing the operation of the photodetector of the present invention with the gate electrode biased at 10 volts.

第8B圖為本發明光偵測器的汲極電極偏壓為5伏特的操作示意圖。 Fig. 8B is a schematic view showing the operation of the photodetector of the present invention with the gate electrode biased at 5 volts.

第8C圖為本發明光偵測器的汲極電極偏壓為1伏特的操作示意圖。 Figure 8C is a schematic view showing the operation of the photodetector of the present invention with the gate electrode biased at 1 volt.

第8D圖為本發明光偵測器的汲極電極偏壓為0.1伏特的操作示意圖。 Fig. 8D is a schematic view showing the operation of the photodetector of the present invention with the gate electrode biased at 0.1 volt.

第9圖為依照本發明之光偵測器第三實施例的正面示意圖。 Figure 9 is a front elevational view of a third embodiment of a photodetector in accordance with the present invention.

以下將以圖式及詳細說明清楚說明本發明之精神,任何所屬技術領域中具有通常知識者在了解本發明之較佳實施例後,當可由本發明所教示之技術,加以改變及修飾,其並不脫離本發明之精神與範圍。 The spirit and scope of the present invention will be apparent from the following description of the preferred embodiments of the invention. The spirit and scope of the invention are not departed.

有鑑於習知光偵測器只具有固定一種光靈敏度,而由於實際光強度不為單一強度,由於無法調整光靈敏度,將使偵測結果失真。另外,當需要特別針對某一波段的光線作偵測時,其他波段的光線所帶來的雜訊也會使偵測結果失真。 In view of the fact that the conventional photodetector only has a fixed light sensitivity, since the actual light intensity is not a single intensity, the detection result is distorted because the light sensitivity cannot be adjusted. In addition, when it is necessary to detect light in a certain band, the noise caused by light in other bands can also distort the detection result.

因此,本發明所提供的光偵測器藉由控制不同的頂閘極電極以及底閘極電極偏壓組合調整光靈敏度。並且,藉由不同的主動層材料,對特定單一波段光線作偵測,以達到更精準偵測的效果。 Therefore, the photodetector provided by the present invention adjusts the light sensitivity by controlling different top gate electrodes and bottom gate electrode bias combinations. Moreover, different active layer materials are used to detect specific single-band light to achieve more accurate detection.

請參照第1A圖,第1A圖為依照本發明之光偵測器第一實施例的正面示意圖。光偵測器100包含基板102、底閘極電極104、第一絕緣層106、主動層110、電極層112、第二絕緣層119以及頂閘極電極120。 Please refer to FIG. 1A, which is a front elevational view of a first embodiment of a photodetector in accordance with the present invention. The photodetector 100 includes a substrate 102, a bottom gate electrode 104, a first insulating layer 106, an active layer 110, an electrode layer 112, a second insulating layer 119, and a top gate electrode 120.

底閘極電極104設置於基板102上。第一絕緣層106設置於基板102以及底閘極電極104上。其中基板102上的底閘極電極104被第一絕緣層106所包覆。 The bottom gate electrode 104 is disposed on the substrate 102. The first insulating layer 106 is disposed on the substrate 102 and the bottom gate electrode 104. The bottom gate electrode 104 on the substrate 102 is covered by the first insulating layer 106.

主動層110設置於第一絕緣層106上,且位於底閘極電極104上。其中,主動層110除了位於底閘極電極104上方外,主動層110與底閘極電極104於基板102上的投 影面積有部份重疊。 The active layer 110 is disposed on the first insulating layer 106 and on the bottom gate electrode 104. Wherein, in addition to being located above the bottom gate electrode 104, the active layer 110 and the bottom gate electrode 104 are cast on the substrate 102. The shadow area overlaps partially.

主動層110的材料特性為具有一能隙,亦即主動層110在吸收光能後,將產生激子(exciton),並在適當條件下分離成為電子電洞對(hole-electron)。因此,主動層110材料在選擇上,較佳為半導體材料。 The material property of the active layer 110 is such that it has an energy gap, that is, after the active layer 110 absorbs light energy, an exciton is generated and separated into an electron hole-hole under appropriate conditions. Therefore, the active layer 110 material is preferably a semiconductor material.

例如,主動層110可為一金屬氧化物層,其材料為銦鎵鋅氧化物(IGZO)、銦鋅氧化物(IZO)、銦鎵氧化物(IGO)、鎵鋅氧化物(GZO)、鋅氧化物(ZnO)、銦氧化物(InO)、氧化鋁鋅(AZO)或其組合。 For example, the active layer 110 may be a metal oxide layer made of indium gallium zinc oxide (IGZO), indium zinc oxide (IZO), indium gallium oxide (IGO), gallium zinc oxide (GZO), zinc. Oxide (ZnO), indium oxide (InO), aluminum zinc oxide (AZO), or a combination thereof.

或是,主動層110可為一有機半導體層,其材料包括但不限制為有機染料電解液、有機高分子材料、有機小分子材料或是常見於有機光伏的施體/受體材料。 Alternatively, the active layer 110 can be an organic semiconductor layer, the material of which includes, but is not limited to, an organic dye electrolyte, an organic polymer material, an organic small molecule material, or a donor/acceptor material commonly found in organic photovoltaics.

電極層112設置於主動層110上。電極層112包含源極電極113、汲極電極114以及開口116。源極電極113與主動層110的一側連接,而汲極電極114與主動層110的另一側連接。開口116位於源極電極113與汲極電極114之間,使得源極電極113與汲極電極114為透過主動層110連接。 The electrode layer 112 is disposed on the active layer 110. The electrode layer 112 includes a source electrode 113, a drain electrode 114, and an opening 116. The source electrode 113 is connected to one side of the active layer 110, and the drain electrode 114 is connected to the other side of the active layer 110. The opening 116 is located between the source electrode 113 and the drain electrode 114 such that the source electrode 113 and the drain electrode 114 are connected to the active layer 110.

其中,底閘極電極104、源極電極113以及汲極電極114材料包含但不限定為鈦(Ti)、鋁(Al)、鉬(Mo)、銀(Ag)、金(Au)、銅(Cu)、銦錫氧化物(ITO)或其組合。 The materials of the bottom gate electrode 104, the source electrode 113 and the drain electrode 114 include, but are not limited to, titanium (Ti), aluminum (Al), molybdenum (Mo), silver (Ag), gold (Au), copper ( Cu), indium tin oxide (ITO), or a combination thereof.

第二絕緣層119設置於電極層112上,而頂閘極電極120設置於第二絕緣層119上,其中第二絕緣層119以及頂閘極電極120具有透光性。第二絕緣層119位於電極 層112以及頂閘極電極120之間,並提供電性隔離電極層112以及頂閘極電極120之效果。 The second insulating layer 119 is disposed on the electrode layer 112, and the top gate electrode 120 is disposed on the second insulating layer 119, wherein the second insulating layer 119 and the top gate electrode 120 are translucent. The second insulating layer 119 is located at the electrode Between the layer 112 and the top gate electrode 120, the effect of electrically isolating the electrode layer 112 and the top gate electrode 120 is provided.

其中,第一絕緣層106以及第二絕緣層119材料包含但不限定於二氧化矽(SiO2)、氮化矽(Si3N4)、氮氧化矽(SiON)、氧化鋁(Al2O3)、有機樹脂類或其組合的絕緣體材料。 The materials of the first insulating layer 106 and the second insulating layer 119 include, but are not limited to, cerium oxide (SiO 2 ), cerium nitride (Si 3 N 4 ), cerium oxynitride (SiON), and aluminum oxide (Al 2 O). 3 ), an insulator material of an organic resin or a combination thereof.

具體而言,源極電極113、汲極電極114與主動層110電性耦接,且至少部份源極電極113、汲極電極114可位於主動層110的上方。第二絕緣層119以及頂閘極電極120位於主動層110上方。且由於第二絕緣層119以及頂閘極電極120具有透光性,使得源極電極113與汲極電極114間的開口116所暴露的主動層110區域成為一光接收區118。 Specifically, the source electrode 113 and the drain electrode 114 are electrically coupled to the active layer 110 , and at least a portion of the source electrode 113 and the drain electrode 114 may be located above the active layer 110 . The second insulating layer 119 and the top gate electrode 120 are located above the active layer 110. Moreover, since the second insulating layer 119 and the top gate electrode 120 have light transmissivity, the active layer 110 region exposed by the opening 116 between the source electrode 113 and the drain electrode 114 becomes a light receiving region 118.

除此之外,頂閘極電極120位於光接收區118的上方。請見第1B圖,第1B圖為第1A圖的光偵測器的俯視示意圖。開口116位於源極電極113與汲極電極114間,且主動層110暴露於開口116處為光接收區118(本圖中的陰影部分)。 In addition to this, the top gate electrode 120 is located above the light receiving region 118. Please refer to FIG. 1B. FIG. 1B is a schematic top view of the photodetector of FIG. 1A. The opening 116 is located between the source electrode 113 and the drain electrode 114, and the active layer 110 is exposed at the opening 116 as a light receiving region 118 (shaded portion in the figure).

光接收區118的面積、底閘極電極(本圖未繪示)投影至光接收區118的面積以及頂閘極電極120投影至光接收區118的面積會至少部份重疊。其中,頂閘極電極120之寬度可以分別等於或小於光接收區118與開口116之寬度。 The area of the light receiving region 118, the area of the bottom gate electrode (not shown) projected to the light receiving region 118, and the area projected by the top gate electrode 120 to the light receiving region 118 may at least partially overlap. The width of the top gate electrode 120 may be equal to or smaller than the width of the light receiving region 118 and the opening 116, respectively.

請同時參照第2A圖以及第2B圖。第2A圖為依照 本發明之光偵測器第二實施例的正面示意圖。第2B圖為第2A圖的光偵測器的俯視示意圖。光偵測器100包含基板102、底閘極電極104、第一絕緣層106、主動層110、阻隔層122、電極層112、第二絕緣層119以及頂閘極電極120。電極層112包含源極電極113以及汲極電極114。 Please refer to both Figure 2A and Figure 2B. Figure 2A is based on A front view of a second embodiment of the photodetector of the present invention. 2B is a top plan view of the photodetector of FIG. 2A. The photodetector 100 includes a substrate 102, a bottom gate electrode 104, a first insulating layer 106, an active layer 110, a barrier layer 122, an electrode layer 112, a second insulating layer 119, and a top gate electrode 120. The electrode layer 112 includes a source electrode 113 and a drain electrode 114.

本實施例與第一實施例相異在於,本實施例設置一阻隔層122於主動層110與電極層112之間。阻隔層122的用途為一蝕刻終止層。當光偵測器100在製作時,需要透過蝕刻製程以定義源極電極113與汲極電極114形狀,而作為蝕刻終止層的阻隔層122將保護主動層110不在蝕刻製程中受到損害。阻隔層122材料為二氧化矽(SiO2)、氮化矽(Si3N4)、氮氧化矽(SiON)、氧化鋁(Al2O3)、有機樹脂類或其組合的絕緣體材料。 This embodiment is different from the first embodiment in that a barrier layer 122 is disposed between the active layer 110 and the electrode layer 112. The use of barrier layer 122 is an etch stop layer. When the photodetector 100 is fabricated, an etching process is required to define the shape of the source electrode 113 and the drain electrode 114, and the barrier layer 122 as an etch stop layer will protect the active layer 110 from damage during the etching process. The material of the barrier layer 122 is an insulator material of cerium oxide (SiO 2 ), cerium nitride (Si 3 N 4 ), cerium oxynitride (SiON), aluminum oxide (Al 2 O 3 ), an organic resin, or a combination thereof.

阻隔層122包含穿孔124,其中穿孔124分別位於主動層110的相對兩側,使得源極電極113以及汲極電極114透過穿孔124與主動層110連接。 The barrier layer 122 includes vias 124, wherein the vias 124 are respectively located on opposite sides of the active layer 110 such that the source electrode 113 and the drain electrode 114 are connected to the active layer 110 through the vias 124.

另外,源極電極113與汲極電極114間仍具有開口116,以定義其所暴露的主動層110區域為光接收區118,如第2B圖中的陰影區域。 In addition, there is still an opening 116 between the source electrode 113 and the drain electrode 114 to define a region of the active layer 110 to which it is exposed as the light receiving region 118, such as the shaded region in FIG. 2B.

參照第3圖。第3圖為本發明之光偵測器操作方法一實施例的流程圖。步驟S10為施加第一偏壓於閘極電極,用以產生電位位障,電位位障作為限制載子通過。步驟S20為利用預定波段之光線激發主動層後,降低電位位障,並產生載子通道。步驟S30為施加第二偏壓於另一閘極電極, 用以產生放大電流。 Refer to Figure 3. FIG. 3 is a flow chart of an embodiment of a method for operating a photodetector of the present invention. Step S10 is to apply a first bias voltage to the gate electrode for generating a potential barrier, and the potential barrier acts as a limiting carrier. In step S20, after the active layer is excited by the light of the predetermined wavelength band, the potential barrier is lowered, and the carrier channel is generated. Step S30 is to apply a second bias to the other gate electrode, Used to generate an amplified current.

請再回到第2A圖,本發明之光偵測器100具有頂閘極電極120以及底閘極電極104,其工作機制可透過施加偏壓於頂閘極電極120以及底閘極電極104控制。例如,於頂閘極電極120施加偏壓,以定義光偵測器100的開關狀態。即當頂閘極電極120被施加偏壓時,主動層110所提供的載子通道為關閉使得載子無法通過。此狀態為相對於步驟S10。 Returning to FIG. 2A, the photodetector 100 of the present invention has a top gate electrode 120 and a bottom gate electrode 104, and the working mechanism can be controlled by applying a bias voltage to the top gate electrode 120 and the bottom gate electrode 104. . For example, a bias is applied to the top gate electrode 120 to define the switching state of the photodetector 100. That is, when the top gate electrode 120 is biased, the carrier channel provided by the active layer 110 is turned off so that the carrier cannot pass. This state is relative to step S10.

此處所指的”關閉”為載子通道受到一定程度的限制,致使源極電極113與汲極電極114間僅有微弱的電流,而非表示毫無電流。而當載子通道不受此限制時,電流相對放大數倍,以此差異定義”關閉”,合先敘明。 The "closed" referred to herein is such that the carrier channel is somewhat limited such that there is only a weak current between the source electrode 113 and the drain electrode 114, rather than indicating no current. When the carrier channel is not limited by this, the current is amplified several times, and the difference is defined as "off", which is described first.

接著,在光偵測器100被定義為關閉下,當光線130入射於光接收區118時,主動層110受到光線130激發產生電子電洞對,而使得源極電極113與汲極電極114間有電流流過(遠大於無光照時的電流)。此狀態為相對於步驟S20。 Next, when the photodetector 100 is defined as being turned off, when the light ray 130 is incident on the light receiving region 118, the active layer 110 is excited by the light ray 130 to generate an electron hole pair, such that the source electrode 113 and the drain electrode 114 are interposed. There is a current flowing (far greater than the current when there is no light). This state is relative to step S20.

而於上述情況下,施加另外一偏壓於底閘極電極104,即可加大源極電極113與汲極電極114間的電流。此狀態為相對於步驟S30。 In the above case, by applying another bias voltage to the bottom gate electrode 104, the current between the source electrode 113 and the drain electrode 114 can be increased. This state is relative to step S30.

請同時參照第2A圖以及第4圖,第4圖為本發明之光偵測器操作方法另一實施例的流程圖。步驟S10為施加第一偏壓於閘極電極,用以產生電位位障,電位位障作為限制載子通過。步驟S20為利用預定波段之光線激發主 動層後,降低電位位障,並產生載子通道。步驟S30為施加第二偏壓於另一閘極電極,用以產生放大電流。步驟S40為調整第二偏壓,用以控制放大電流。步驟S50為施加起始電壓於汲極電極上,用以控制起始電流。 Please refer to FIG. 2A and FIG. 4 simultaneously. FIG. 4 is a flow chart of another embodiment of the method for operating the photodetector of the present invention. Step S10 is to apply a first bias voltage to the gate electrode for generating a potential barrier, and the potential barrier acts as a limiting carrier. Step S20 is to activate the main light by using the light of the predetermined band. After the moving layer, the potential barrier is lowered and a carrier channel is generated. Step S30 is to apply a second bias voltage to the other gate electrode for generating an amplification current. Step S40 is to adjust the second bias voltage to control the amplification current. Step S50 is to apply a starting voltage to the drain electrode for controlling the starting current.

無論光偵測器100有無受光照,透過調整底閘極電極104的偏壓大小,即可調整源極電極113與汲極電極114間的電流大小。而另外,除了調整底閘極電極104的偏壓大小,於汲極電極114上施加一偏壓,則可調整光偵測器100於無光照時的起始電流。 Regardless of whether or not the photodetector 100 is illuminated, the magnitude of the current between the source electrode 113 and the drain electrode 114 can be adjusted by adjusting the bias voltage of the bottom gate electrode 104. In addition, in addition to adjusting the bias voltage of the bottom gate electrode 104 and applying a bias voltage to the gate electrode 114, the initial current of the photodetector 100 in the absence of illumination can be adjusted.

綜合前述,初步來說,本發明之光偵測器100能對光線的有無作為運作的依據,以下將以光偵測器100第二實施例配合實際操作之電流電壓圖對各步驟作更進一步的說明。其中,由於光偵測器100的預定偵測波段由主動層110材料決定,下列實際操作所預定偵測波段以紫外光波段(即以300nm至450nm波長的光為主)為例。因此,相對應的主動層110材料可以包含或者係為銦鎵鋅氧化物(IGZO)、銦氧化物(InO3)、錫氧化物(SnO2)、鋅氧化物(ZnO)或其組合。採用銦鎵鋅氧化物(IGZO)、銦氧化物(InO3)、錫氧化物(SnO2)、鋅氧化物(ZnO)或其組合作為主動層,可以提高感測器的S/N比。 In summary, initially, the photodetector 100 of the present invention can operate on the presence or absence of light as a basis for operation. In the following, the second embodiment of the photodetector 100 is further adapted to the steps of the actual operation. instruction of. Wherein, since the predetermined detection band of the photodetector 100 is determined by the material of the active layer 110, the following actual operation of the predetermined detection band is exemplified by an ultraviolet band (ie, light having a wavelength of 300 nm to 450 nm). Accordingly, the corresponding active layer 110 material may comprise or be indium gallium zinc oxide (IGZO), indium oxide (InO 3 ), tin oxide (SnO 2 ), zinc oxide (ZnO), or a combination thereof. The use of indium gallium zinc oxide (IGZO), indium oxide (InO 3 ), tin oxide (SnO 2 ), zinc oxide (ZnO) or a combination thereof as the active layer can increase the S/N ratio of the sensor.

然而,應了解到,以上所舉之預定偵測波段僅為例示,而非用以限制本發明,本發明所屬技術領域中具有通常知識者,可依實際需要,彈性選擇主動層110的材料,以擬定光偵測器100的預定偵測波段。 However, it should be understood that the above-mentioned predetermined detection band is merely an exemplification, and is not intended to limit the present invention. Those having ordinary knowledge in the technical field of the present invention can flexibly select the material of the active layer 110 according to actual needs. To determine the predetermined detection band of the photodetector 100.

請同時參照第2A圖以及第5圖。第5圖為本發明之光偵測器不同操作模式下的電流電壓曲線圖。本圖中,縱軸為汲極電極114電流大小,橫軸為不同的底閘極電極104電壓大小。其中,曲線140為對應光偵測器100的頂閘極電極120無施加偏壓(0伏特)。曲線142為對應光偵測器100的頂閘極電極120被施加-20伏特的偏壓。曲線144為對應光偵測器100的頂閘極電極120被施加-40伏特的偏壓。除此之外,曲線140、142、144皆為無光線入射於光偵測器100的情況。 Please refer to Figure 2A and Figure 5 at the same time. Fig. 5 is a graph showing current and voltage curves in different operation modes of the photodetector of the present invention. In the figure, the vertical axis represents the magnitude of the current of the drain electrode 114, and the horizontal axis represents the voltage of the bottom electrode 101 of the bottom. The curve 140 is not biased (0 volts) corresponding to the top gate electrode 120 of the photodetector 100. Curve 142 is a bias voltage of -20 volts applied to top gate electrode 120 of photodetector 100. Curve 144 is a bias voltage of -40 volts applied to top gate electrode 120 of photodetector 100. In addition, the curves 140, 142, and 144 are all cases where no light is incident on the photodetector 100.

於無光照下,當施加偏壓於頂閘極電極120時,光偵測器100可被定義為關閉狀態。此時,調整底閘極電極104的電壓大小,可驅動以及控制源極電極113與汲極電極114間的電流大小。然而,不同的頂閘極電極120電壓,有不同效果。 In the absence of illumination, when a bias voltage is applied to the top gate electrode 120, the photodetector 100 can be defined as a closed state. At this time, the magnitude of the voltage of the bottom gate electrode 104 is adjusted to drive and control the magnitude of the current between the source electrode 113 and the drain electrode 114. However, different top gate electrode 120 voltages have different effects.

例如,當頂閘極電極120無施加偏壓,於底閘極電極104施加大致為0伏特以上的電壓,即可驅動,如曲線140。而當頂閘極電極120施加-20伏特的偏壓,則底閘極電極104則需施加大致為10伏特以上的電壓,才可驅動,如曲線142。而對於頂閘極電極120施加-40伏特的偏壓,即使底閘極電極104施加20伏特的電壓,仍無法驅動,如曲線144。 For example, when the top gate electrode 120 is not biased, a voltage of substantially 0 volts or more is applied to the bottom gate electrode 104 to be driven, as shown by curve 140. When the top gate electrode 120 applies a bias voltage of -20 volts, the bottom gate electrode 104 needs to apply a voltage of approximately 10 volts or more to drive, such as curve 142. While a bias of -40 volts is applied to the top gate electrode 120, even if the bottom gate electrode 104 applies a voltage of 20 volts, it cannot be driven, as in curve 144.

也就是說,本發明所屬技術領域中具有通常知識者,可依實際需要,分別彈性選擇頂閘極電極120以及底閘極電極104的偏壓大小,以定義光偵測器100的開關狀 態。 That is to say, those skilled in the art to which the present invention pertains can flexibly select the bias voltages of the top gate electrode 120 and the bottom gate electrode 104 to define the switch shape of the photodetector 100. state.

請參照第6圖。第6圖為本發明之光偵測器操作模式一實施例的電流電壓曲線圖。縱軸為汲極電極電流大小,橫軸為不同的底閘極電極電壓大小。本實施例中,光偵測器的頂閘極電極被施加-40伏特的偏壓。曲線144為對應光線無入射光偵測器,曲線146為對應光線有入射光偵測器。 Please refer to Figure 6. Figure 6 is a graph showing current and voltage of an embodiment of the operation mode of the photodetector of the present invention. The vertical axis is the magnitude of the drain electrode current, and the horizontal axis is the different bottom gate electrode voltage. In this embodiment, the top gate electrode of the photodetector is biased at -40 volts. Curve 144 is a corresponding light non-incident light detector, and curve 146 is an incident light detector corresponding to the light.

以底閘極電極施加偏壓5伏特為例,曲線146的汲極電極電流明顯大於曲線144的汲極電極電流。本發明之.光偵測器以汲極電極電流的變化程度作為偵測有無光照的依據。 Taking the bottom gate electrode as a bias voltage of 5 volts, the drain electrode current of curve 146 is significantly greater than the drain electrode current of curve 144. The photodetector of the present invention uses the degree of change of the drain electrode current as a basis for detecting the presence or absence of illumination.

根據本發明一實施例,當頂閘極電極為-40伏特且底閘極電極為0伏特左右時,以資料點A以及資料點A’為例,無光照的資料點A以及有光照的資料點A’,其汲極電極電流相差大於103倍。於此偏壓設定下,無光照時載子通道為關閉(off)狀態,有光照時載子通道為打開(on)狀態,致使電流產生顯著的放大效果。因此,本發明之光偵測器根據載子通道開關狀態(on/off)作為光照依據。 According to an embodiment of the invention, when the top gate electrode is -40 volts and the bottom gate electrode is about 0 volts, the data point A and the data point A' are taken as an example, the unlit data point A and the illuminated data Point A', the drain electrode currents differ by more than 10 3 times. Under this bias setting, the carrier channel is off when there is no illumination, and the carrier channel is on when there is illumination, resulting in a significant amplification effect of the current. Therefore, the photodetector of the present invention is based on the on/off state of the carrier channel.

當增加底閘極電極至10伏特左右時,以資料點B以及資料點B’為例,無光照的資料點B以及有光照的資料點B’,其汲極電極電流相差大於106倍。由於底閘極電極偏壓增加,載子通道傳輸效果受到提升,致使電流有更加顯著的放大效果。同樣地,本發明之光偵測器能根據載子通道開關狀態(on/off)作為有無光照依據。 When the bottom gate electrode is increased to about 10 volts, taking the data point B and the data point B' as an example, the unpolarized data point B and the illuminated data point B' have a difference in the drain electrode current greater than 106 times. Due to the increased bias of the bottom gate electrode, the transmission effect of the carrier channel is improved, resulting in a more significant amplification of the current. Similarly, the photodetector of the present invention can be used as a basis for the presence or absence of illumination depending on the on/off state of the carrier channel.

或是,當增加底閘極電極至20伏特左右時,以資料點C以及資料點C’為例,無光照的資料點C以及有光照的資料點C’,其汲極電極電流相差大於107倍。因此,當持續增加底閘極電極,本發明之光偵測器同樣能根據載子通道開關狀態(on/off)作為有無光照依據。 Or, when the bottom gate electrode is increased to about 20 volts, taking the data point C and the data point C' as an example, the un-lighted data point C and the illuminated data point C' have a difference in the drain electrode current greater than 10 7 times. Therefore, when the bottom gate electrode is continuously increased, the photodetector of the present invention can also be based on the on/off state of the carrier channel as the basis for the presence or absence of illumination.

綜合上述結果,本發明藉由施加不同的底閘極電極偏壓,使得汲極電極電流放大倍率不同,並以此定義光偵測器作為開關狀態的光靈敏度。更具體地來說,只要調整底閘極電極偏壓,就能得到不同的電流放大效果,因此,本發明之光偵測器具有可調式的光靈敏度。 In summary of the above results, the present invention differs in the current amplification of the gate electrode by applying different bottom gate electrode biases, and thereby defines the light sensitivity of the photodetector as a switching state. More specifically, as long as the bottom gate electrode bias is adjusted, different current amplification effects can be obtained. Therefore, the photodetector of the present invention has an adjustable light sensitivity.

此效果可應用於,當至環境光偏弱環境時,增加底閘極電極偏壓,則輸出較大的電流,以利於偵測。反之,當至環境光偏強環境時,降低底閘極電極偏壓,則就輸出較小的電流,以防止載子通道不預期的被開啟。 This effect can be applied to increase the bottom gate electrode bias when the ambient light is weak, and output a larger current to facilitate detection. Conversely, when the ambient gate light is strong, the bottom gate electrode bias is lowered, and a smaller current is output to prevent the carrier channel from being unintentionally turned on.

然而,應了解到,以上所舉之頂閘極電極以及底閘極電極的偏壓組合僅為例示,而非用以限制本發明,本發明所屬技術領域中具有通常知識者,可依實際需要,彈性選擇頂閘極電極以及底閘極電極的偏壓組合,以定義光偵測器的光靈敏度。 However, it should be understood that the above-mentioned bias combination of the top gate electrode and the bottom gate electrode is merely an example, and is not intended to limit the present invention, and those having ordinary knowledge in the technical field of the present invention may be required according to actual needs. The bias combination of the top gate electrode and the bottom gate electrode is elastically selected to define the light sensitivity of the photodetector.

參照第7圖,第7圖為本發明之光偵測器一實施例應用結果的操作示意圖。本圖中,縱軸為汲極電極電流,而橫軸為時間秒數。本實施例中,頂閘極電極與底閘極電極偏壓分別為-40伏特與20伏特。除此之外,本實施例中於汲極電極施加10伏特偏壓,且以50秒為週期作光源的 開關切換。 Referring to FIG. 7, FIG. 7 is a schematic diagram showing the operation of an embodiment of the photodetector of the present invention. In this figure, the vertical axis is the drain electrode current and the horizontal axis is the time second. In this embodiment, the top gate electrode and the bottom gate electrode are biased at -40 volts and 20 volts, respectively. In addition, in this embodiment, a bias voltage of 10 volts is applied to the drain electrode, and the light source is used in a cycle of 50 seconds. Switching.

當無光照時,由於載子通道關閉(off),汲極電極電流大約介於10-15安培與10-13安培間,而當有光照時,載子通道開啟(on),汲極電極電流大約為10-6安培左右。因此,兩者的放大比D至少為106倍。除此之外,由於載子通道的開關狀態(on/off)切換快速,電流變化自無光(有光)轉為有光(無光)的時距短暫。藉由上述優點,本發明之光偵測器可達到即時偵測且可辨識度高的功效。 When there is no light, the drain electrode current is between 10 -15 amps and 10 -13 amps due to the carrier channel off (off), and when there is illumination, the carrier channel is turned on (on), the drain electrode current It is about 10 -6 amps. Therefore, the amplification ratio D of the two is at least 106 times. In addition, since the switching state (on/off) of the carrier channel is switched rapidly, the current change is changed from no light (light) to light (no light). Through the above advantages, the photodetector of the present invention can achieve the effect of instant detection and high recognizability.

另外,除了調整底閘極電極偏壓以調整光靈敏度外,本發明之光偵測器更可以藉由不同的汲極電極偏壓調整汲極電極的起始電流。 In addition, in addition to adjusting the bottom gate electrode bias to adjust the light sensitivity, the photodetector of the present invention can adjust the initial current of the drain electrode by different gate electrode biases.

以頂閘極電極與底閘極電極偏壓皆為-15伏特為例,以下將配合第8A圖至第8D圖說明。第8A圖為本發明光偵測器的汲極電極偏壓為10伏特的操作示意圖。第8B圖為本發明光偵測器的汲極電極偏壓為5伏特的操作示意圖。第8C圖為本發明光偵測器的汲極電極偏壓為1伏特的操作示意圖。第8D圖為本發明光偵測器的汲極電極偏壓為0.1伏特的操作示意圖。其中標號三角形為入射光強度5700勒克斯(LUX),標號圓形為入射光強度1000LUX。 For example, the top gate electrode and the bottom gate electrode are both -15 volts, and the following description will be made in conjunction with Figs. 8A to 8D. Fig. 8A is a schematic view showing the operation of the photodetector of the present invention with the gate electrode biased at 10 volts. Fig. 8B is a schematic view showing the operation of the photodetector of the present invention with the gate electrode biased at 5 volts. Figure 8C is a schematic view showing the operation of the photodetector of the present invention with the gate electrode biased at 1 volt. Fig. 8D is a schematic view showing the operation of the photodetector of the present invention with the gate electrode biased at 0.1 volt. The reference triangle is the incident light intensity of 5,700 lux (LUX), and the circular number is the incident light intensity of 1000 LUX.

當汲極電極偏壓為10伏特時,汲極電極的未照光電流大約為10-11安培至10-12安培之間。當汲極電極偏壓為5伏特時,汲極電極的未照光電流大約為10-12安培。當汲極電極偏壓為1伏特時,汲極電極的未照光電流大約為10-12安培至10-13安培之間。當汲極電極偏壓為0.1伏特 時,汲極電極的未照光電流大約為10-12安培至10-13安培之間。 When the drain electrode bias is 10 volts, the unilluminated current of the drain electrode is between about 10 -11 amps and 10 -12 amps. When the gate electrode bias is 5 volts, the unilluminated current of the drain electrode is approximately 10 -12 amps. When the drain electrode bias is 1 volt, the unilluminated current of the drain electrode is between about 10 -12 amps and 10 -13 amps. When the drain electrode bias is 0.1 volts, the unilluminated current of the drain electrode is between about 10 -12 amps and 10 -13 amps.

於上述情況中,未照光時,先施加偏壓於汲極電極,使得汲極電極有一起始電流。而不同的偏壓致使的起始電流也不同。當照光後,汲極電極電流當然也不相同。因此,本發明之光偵測器也能透過施加偏壓於汲極電極,進一步定義出不同的光靈敏度。也就是說,本發明所屬技術領域中具有通常知識者,可依實際需要,彈性選擇頂閘極電極、底閘極電極以及汲極電極的偏壓組合,以定義光偵測器的光靈敏度以及輸出電流。 In the above case, when the light is not illuminated, a bias voltage is applied to the drain electrode so that the drain electrode has an initial current. Different bias voltages cause different starting currents. When illuminated, the drain electrode current is of course different. Therefore, the photodetector of the present invention can further define different light sensitivities by applying a bias voltage to the drain electrode. That is to say, those having ordinary knowledge in the technical field of the present invention can flexibly select the bias combination of the top gate electrode, the bottom gate electrode and the drain electrode according to actual needs to define the light sensitivity of the photodetector and Output current.

請參照第9圖,第9圖為依照本發明之光偵測器第三實施例的正面示意圖。光偵測器100包含基板102、底閘極電極104、第一絕緣層106、主動層110、阻隔層122、電極層112、第二絕緣層119、頂閘極電極120以及導引層126。電極層112包含源極電極113以及汲極電極114,且源極電極113以及汲極電極114間有開口116,以定義光接收區118。 Please refer to FIG. 9. FIG. 9 is a front elevational view showing a third embodiment of the photodetector according to the present invention. The photodetector 100 includes a substrate 102, a bottom gate electrode 104, a first insulating layer 106, an active layer 110, a barrier layer 122, an electrode layer 112, a second insulating layer 119, a top gate electrode 120, and a guiding layer 126. The electrode layer 112 includes a source electrode 113 and a drain electrode 114, and an opening 116 is defined between the source electrode 113 and the drain electrode 114 to define a light receiving region 118.

本實施例與第二實施例相異在於,本實施例中增設導引層126於開口116,且導引層126與光接收區118位置重疊,其中導引層126由導柱128所定義。如此,當光線130入射進入光接收區118時,將會透過導柱128進入主動層110。導柱128可為奈米等級的柱體(nanorod)或管體(nanotube),亦可是微米等級。導柱128可為具有Z軸生長特性的材料,包含但不限定如氧化鋅(ZnO)或二氧化鈦 (TiO2)。 The present embodiment is different from the second embodiment in that a guiding layer 126 is added to the opening 116 in the embodiment, and the guiding layer 126 is overlapped with the light receiving area 118, wherein the guiding layer 126 is defined by the guiding post 128. As such, when the light 130 enters the light receiving region 118, it will enter the active layer 110 through the pillars 128. The guide post 128 can be a nanoscale cylinder or a nanotube, or a micron scale. The pillars 128 can be materials having Z-axis growth characteristics including, but not limited to, zinc oxide (ZnO) or titanium dioxide (TiO 2 ).

根據本發明一實施例,藉由導柱128,光線130將更有效率地被收集於主動層110。更具體地來說,當光線130於主動層110表面發生反射時,將於導柱128發生散射回主動層110。而根據相同機制,亦可在主動層110表面生成奈米洞(nanohole)或是奈米線(nanowires)的形貌(未繪示),其形貌將提升主動層110收集光線130的能力,以提升本發明光偵測器100的偵測效率。 According to an embodiment of the invention, light rays 130 will be collected more efficiently on active layer 110 by pillars 128. More specifically, when the light ray 130 is reflected on the surface of the active layer 110, the conductive pillars 110 are scattered back to the active layer 110. According to the same mechanism, a nanohole or a nanowires (not shown) may be formed on the surface of the active layer 110, and the topography thereof enhances the ability of the active layer 110 to collect the light 130. To improve the detection efficiency of the photodetector 100 of the present invention.

總結來說,本發明提供一種光偵測器,其藉由主動層的材料能隙定義預定偵測範圍的波長,使得範圍外的波長光線不會成為雜訊而使偵測失真。以及,透過不同的頂閘極電極以及底閘極電極的偏壓組合,以定義出所需要的光靈敏度。另外,更可以透過設定汲極電極的偏壓,以調整汲極電極的初始電流,以進行更深入的光靈敏度調控。 In summary, the present invention provides a photodetector that defines a wavelength of a predetermined detection range by a material gap of an active layer such that wavelength light outside the range does not become noise and detects distortion. And, through a combination of bias voltages of different top gate electrodes and bottom gate electrodes, to define the required light sensitivity. In addition, the initial current of the drain electrode can be adjusted by setting the bias voltage of the drain electrode for more in-depth light sensitivity control.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.

100‧‧‧光偵測器 100‧‧‧Photodetector

102‧‧‧基板 102‧‧‧Substrate

104‧‧‧底閘極電極 104‧‧‧Bottom gate electrode

106‧‧‧第一絕緣層 106‧‧‧First insulation

110‧‧‧主動層 110‧‧‧ active layer

112‧‧‧電極層 112‧‧‧electrode layer

113‧‧‧源極電極 113‧‧‧Source electrode

114‧‧‧汲極電極 114‧‧‧汲electrode

116‧‧‧開口 116‧‧‧ openings

118‧‧‧光接收區 118‧‧‧Light receiving area

119‧‧‧第二絕緣層 119‧‧‧Second insulation

120‧‧‧頂閘極電極 120‧‧‧ top gate electrode

122‧‧‧阻隔層 122‧‧‧Barrier

124‧‧‧穿孔 124‧‧‧Perforation

130‧‧‧入射光 130‧‧‧Incoming light

Claims (9)

一種光偵測器,包含:一基板;一底閘極電極,設置於該基板上;一第一絕緣層,設置於該基板以及該底閘極電極上;一主動層,設置於該第一絕緣層上且位於該底閘極電極上,其中該主動層為一金屬氧化物層,且該主動層具有一能隙;一電極層,設置於該主動層上,包含:一源極電極,與該主動層的一側連接;一汲極電極,與該主動層的另一側連接;以及一開口,位於該源極電極與該汲極電極之間,其中該主動層暴露於該開口處為一光接收區;一第二絕緣層,設置於該電極層上;以及一頂閘極電極,設置於該第二絕緣層上且位於該光接收區上。 A photodetector includes: a substrate; a bottom gate electrode disposed on the substrate; a first insulating layer disposed on the substrate and the bottom gate electrode; an active layer disposed on the first On the insulating layer, and on the bottom gate electrode, wherein the active layer is a metal oxide layer, and the active layer has an energy gap; an electrode layer is disposed on the active layer, and includes: a source electrode, Connected to one side of the active layer; a drain electrode connected to the other side of the active layer; and an opening between the source electrode and the drain electrode, wherein the active layer is exposed to the opening a light receiving region; a second insulating layer disposed on the electrode layer; and a top gate electrode disposed on the second insulating layer and located on the light receiving region. 如請求項1所述之光偵測器,更包含一阻隔層,設置於該主動層與該電極層之間,該阻隔層包含複數個穿孔,其中該些穿孔分別位於該主動層的相對兩側,使得該源極電極以及該汲極電極透過該些穿孔與該主動層連接。 The photodetector of claim 1, further comprising a barrier layer disposed between the active layer and the electrode layer, the barrier layer comprising a plurality of perforations, wherein the perforations are respectively located in opposite sides of the active layer The side is such that the source electrode and the drain electrode are connected to the active layer through the through holes. 如請求項2所述之光偵測器,其中該第二絕緣層、該阻隔層以及該頂閘極電極具有透光性。 The photodetector of claim 2, wherein the second insulating layer, the barrier layer, and the top gate electrode are translucent. 如請求項1所述之光偵測器,其中該金屬氧化物層材料為銦鎵鋅氧化物、銦鋅氧化物、銦鎵氧化物、鎵鋅氧化物、鋅氧化物、銦氧化物、氧化鋁鋅或其組合。 The photodetector of claim 1, wherein the metal oxide layer material is indium gallium zinc oxide, indium zinc oxide, indium gallium oxide, gallium zinc oxide, zinc oxide, indium oxide, oxidation Aluminum zinc or a combination thereof. 如請求項1至4任一項所述之光偵測器,其中該頂閘極電極之寬度分別小於該光接收區與該開口之寬度。 The photodetector of any one of claims 1 to 4, wherein the width of the top gate electrode is smaller than the width of the light receiving region and the opening, respectively. 一種光偵測器的操作方式,包含:施加一第一偏壓於一閘極電極,用以產生一電位位障,該電位位障作為限制載子通過;利用一預定波段之光線激發一主動層後,降低該電位位障,並產生一載子通道;以及施加一第二偏壓於另一閘極電極,用以產生一放大電流。 A method of operating a photodetector includes: applying a first bias voltage to a gate electrode for generating a potential barrier, the potential barrier acts as a limiting carrier; and exciting an active light with a predetermined wavelength band After the layer, the potential barrier is lowered and a carrier channel is generated; and a second bias voltage is applied to the other gate electrode for generating an amplification current. 如請求項6所述之光偵測器的操作方式,其中該預定波段由該主動層材料決定。 The mode of operation of the photodetector of claim 6, wherein the predetermined band is determined by the active layer material. 如請求項6所述之光偵測器的操作方式,更包含:調整該第二偏壓,用以控制該放大電流;以及施加一起始電壓於一汲極電極上,用以控制一起始電流。 The operation mode of the photodetector of claim 6, further comprising: adjusting the second bias voltage to control the amplification current; and applying a starting voltage to a drain electrode for controlling an initial current . 如請求項6至8任一項所述之光偵測器的操作方式,其中該預定波段為一紫外光波段,該主動層之材料為銦鎵鋅氧化物、銦氧化物、錫氧化物、鋅氧化物或其組合。 The operation mode of the photodetector according to any one of claims 6 to 8, wherein the predetermined wavelength band is an ultraviolet light band, and the material of the active layer is indium gallium zinc oxide, indium oxide, tin oxide, Zinc oxide or a combination thereof.
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