TWI547768B - Prism optical system, illumination optical system, exposure apparatus, and device manufacturing method - Google Patents

Description

Optical system, illumination optical system, exposure apparatus, and method of manufacturing the same

The present invention relates to a krypton optical system, an illumination optical system, an exposure apparatus, and a device manufacturing method.

When manufacturing a semiconductor device, a liquid crystal display device, and other devices, in a photolithography step, an exposure device is used to illuminate a mask (reticle) with an illumination optical system and project an image of the mask pattern through a projection optical system Onto the substrate. A photoresist layer is formed on the substrate. In such an exposure apparatus, in order to secure a depth of focus while preserving high resolution, an effective light source distribution (lighting condition) is optimized according to a mask pattern. The effective light source distribution is the light intensity distribution on the pupil plane in the illumination optical system, and is also the angular distribution of light entering the mask (the surface to be illuminated) in the illumination optical system.

Japanese Patent Application Publication No. 2002-343715 discusses changing the cross-sectional shape of a luminous flux by using a conical or pyramidal cone to form a ring shape. The method of effective light source distribution (annular illumination). Japanese Patent Application Publication No. 11-271619 discusses a method of forming an annular illumination or quadruple illumination using a pair of conical ridges and a pair of pyramidal ridges.

In addition, International Publication (Translation of PCT Application) No. 99-25009 discusses a method of guiding light emitted from a cone to an optical system for uniformizing illumination light to form an annular illumination of a uniform light intensity distribution. An optical system for making illumination light uniform includes a columnar reflecting member and a cylindrical reflecting member.

Fig. 13 shows an exposure apparatus having an illumination optical system using a crucible as described in, for example, Japanese Patent Application Laid-Open No. 2002-343715 and Japanese Patent Application Laid-Open No. Hei No. 11-271619. The exposure apparatus includes an illumination optical system IL and a projection optical system PO. Light source 1 is a light source that emits light of a rotationally symmetric light distribution. Light emitted from the light source 1 passes through the optical system 2, the cone 3 and the optical system 4, and enters the mask M. The diffracted light emitted from the mask M enters the projection optical system PO, passes through the aperture stop (NA stop) 5, and forms an image on the substrate P. The conical dome 3 is arranged on a Fourier transform plane with respect to the mask M. The effective light source distribution changes from a circular shape to a circular shape. This is shown using solid lines and dashed lines. The broken line shows the state of the passing light in the case where the cone 3 is not provided. The solid line shows the state of the passing light in the case where the cone 3 is provided. It should be understood that the luminous flux expands due to the action of the conical ridge 3, and the light enters the mask M at an incident angle larger than the incident angle shown by the broken line. As a result, a part of the light is blocked by the aperture stop 5 in the projection optical system PO, and the amount of exposure of the substrate P is reduced. In other words, not using illumination from the light Part of the light of the system IL, and this means that the light utilization efficiency is reduced.

As described above, in the conventional conical crucible 3, the luminous flux is expanded, and a part of the light is blocked by the light shielding member disposed behind the conical crucible 3, and a part of the light is prevented from entering the optical element disposed behind the conical crucible 3. This makes the light utilization efficiency lower.

Further, when an optical system for making illumination light uniform as discussed in International Publication (Translation of PCT Application) No. 99/25009 is used, the angular distribution of light emitted from the optical system is larger than the angle of light entering the optical system. The distribution is wider. This prevents a portion of the light from entering the subsequent optical elements and degrading the light utilization efficiency.

The present invention is directed to providing an illumination optical system capable of suppressing a decrease in light use efficiency when a substrate is exposed to light from a crucible for changing a cross-sectional shape of a light flux.

According to an aspect of the invention, an illumination optical system includes a crucible configured to change a cross-sectional shape of a luminous flux, the illumination optical system being configured to illuminate a surface to be illuminated. The crucible includes a light incident surface, a light exit surface, and an outer side surface extending from the light incident surface side to the light exit surface side. The light incident surface includes a concave tapered surface, the light exit surface including a convex tapered surface, and the outer side surface includes a reflective surface for reflecting light entering the outer side from the light incident surface.

The present invention is more in the following description from the exemplary embodiments with reference to the accompanying drawings The characteristics will become clear.

1‧‧‧beam

2‧‧‧beam

3‧‧‧ Beam

4‧‧‧ Beam

5‧‧‧ Beam

6‧‧‧ Beam

23‧‧‧ gap

101‧‧‧Light source

102‧‧‧Oval mirror

104‧‧‧稜鏡 (optical system)

104A‧‧‧稜鏡

104A1‧‧‧ concave cone

104A2‧‧‧flat surface (first surface)

104A3‧‧‧ convex cone

104A4‧‧‧flat surface (second surface)

104A5‧‧‧ inner surface

104A6‧‧‧Outside

104B‧‧‧Optical component group

104B1‧‧‧Optical components (first optical component)

104B2‧‧‧Optical components (second optical components)

104C‧‧‧Optical component group

104C1‧‧‧Optical components

104C2‧‧‧Optical components (third optical component)

104D‧‧‧Optical component group

104D1‧‧‧Optical components

104E‧‧‧稜鏡

104E1‧‧‧Optical components

104E2‧‧‧Optical components

104E11‧‧‧ concave cone

104E12‧‧‧ convex cone

104E22‧‧‧ inner surface

104E13‧‧‧Outside

105‧‧‧First optical system

106‧‧‧稜鏡

107‧‧‧ deflection mirror

108‧‧‧ plane

109‧‧‧Flying eye optical system

110‧‧‧σ光阑

111‧‧‧ Field of view

112‧‧‧稜鏡 converter

113‧‧‧σ optical converter

113A‧‧‧σ光阑

113B‧‧‧σ光阑

113C‧‧‧σ光阑

114‧‧‧Optical rod

120‧‧‧Light source unit

131‧‧‧ lens unit

132‧‧‧ lens unit

140‧‧‧Second optical system

150‧‧‧ Third optical system

160‧‧‧Fourth optical system

1061‧‧‧Convex cone

1062‧‧‧Convex cone

1063‧‧‧ concave cone

IL‧‧‧Lighting Optical System

JS‧‧‧Measuring device

M‧‧‧ mask

O‧‧‧ optical axis

P‧‧‧Substrate

PO‧‧‧Projection Optical System

PS‧‧‧ substrate table

FIG. 1 is a schematic structural view showing an illumination optical system according to a first exemplary embodiment.

Fig. 2 is a schematic structural view showing a fly-eye optical system.

Fig. 3 is a schematic structural view showing a field stop.

4A, 4B, and 4C illustrate a crucible according to the first exemplary embodiment.

5A, 5B, 5C, and 5D illustrate effects of the cymbal according to the first exemplary embodiment.

FIG. 6 shows a UI according to a second exemplary embodiment.

Fig. 7 shows a crucible according to a third exemplary embodiment.

FIG. 8 shows a UI according to a fourth exemplary embodiment.

FIG. 9 is a schematic structural view showing an exposure apparatus according to a second exemplary embodiment.

Figure 10 shows a hexagonal optical rod.

11A and 11B illustrate a crucible according to a second exemplary embodiment.

Fig. 12 is a schematic structural view of a σ pupil transducer.

Figure 13 shows the problem in the conventional cymbal.

Fig. 14 shows a UI according to a fifth exemplary embodiment.

Various exemplary embodiments, features, and aspects of the invention are described in detail below with reference to the drawings.

The structure of an illumination optical system according to a first exemplary embodiment of the present invention will be described with reference to Figs. 1-8.

An illumination optical system according to an exemplary embodiment is used, for example, in an exposure apparatus. The illumination optical system is a device for guiding light emitted from a light source to a mask (reticle) as a target to be illuminated. A pattern is formed on the mask. The exposure apparatus forms an image by using a projection optical system using diffracted light from a pattern of the mask, and projects an image of the pattern of the mask onto a substrate (for example, a wafer and a glass plate) to expose the substrate.

FIG. 1 is a schematic structural view illustrating an illumination optical system according to an exemplary embodiment. The light source unit 120 includes a light source 101 and an elliptical mirror 102. The illumination optical system includes a pupil (optical system) 104, a first optical system 105, a deflection mirror 107, a second optical system 140, a fly's eye optical system 109, an σ diaphragm 110, a third optical system 150, and a field diaphragm. 111 and fourth optical system 160. The illumination optical system illuminates the mask M on the surface to be illuminated.

Light source 101 is a high pressure mercury lamp. Alternatively, as the light source 101, for example, a xenon lamp and a quasi-molecular laser can be used. The elliptical mirror 102 is a light concentrating optical system for collecting light emitted from the light source 101. The elliptical mirror 102 takes the shape of a portion of the ellipse. The light source 101 is arranged in an ellipse One of the two focus positions.

Light emitted from the light source 101 and reflected by the elliptical mirror 102 is concentrated to a crucible 104 disposed near another focus position of the ellipse. The crucible 104 transmits incident light, changes the cross-sectional shape of the luminous flux of the incident light, and emits light. Light passing through the crucible 104 is directed by the first optical system 105 to the deflecting mirror 107 and reflected by the deflecting mirror 107.

In this exemplary embodiment, two light source units 120 are disposed, and a deflection mirror 107 is disposed for each of the light source units. The arrangement of the deflecting mirrors is different depending on the number of light sources. The number of light sources may be one or three or more.

The plane 108 is set to occupy a position that is substantially Fourier transformed with respect to the exit surface of the crucible 104. Thus, the annular light intensity distribution on the exit surface of the crucible 104 becomes the angular distribution of light entering the plane 108. Figure 1 shows the beam in the angular distribution (light intensity distribution on plane 108) of the light emerging from the exit surface of the crucible 104. Light from plane 108 is directed by second optical system 140 to fly's eye optical system 109. In the second optical system 140, the incident surface of the fly's eye optical system 109 is set to occupy a position that is substantially in a Fourier transform relationship with respect to the plane 108.

FIG. 2 shows a fly's eye optical system 109. As shown in FIG. 2, the fly's eye optical system 109 includes two lens units 131 and 132 having a plurality of plano-convex lenses joined in a planar state. The curved surfaces of these lenses are arranged to face each other such that at the focus position of each of the plano-convex lenses constituting the lens units 131 and 132, the corresponding plano-convex lenses are placed in pairs Set. The use of the fly's eye optical system 109 forms a secondary light source distribution (effective light source distribution) at the exit surface side of the fly's eye optical system 109.

The luminous flux emitted from the exit surface of the fly's eye optical system 109 is directed by the third optical system 150 to the field stop 111 through the σ stop 110. The σ diaphragm 110 adjusts the shape of the effective light source distribution through the shape of the holes. In the third optical system 150, the position of the field stop 111 is set to be substantially Fourier-transformed with respect to the exit surface 110 of the fly's eye optical system 109. Since a secondary light source distribution is formed at the exit surface side of the fly's eye optical system 109, a uniform light intensity distribution can be obtained on the field stop 111.

FIG. 3 is a structural view showing the field stop 111. On the field stop 111, an arc-shaped slit (opening) 23 is formed, and light other than the slit 23 is blocked. The third optical system 160 uniformly illuminates the mask M with the curved light flux transmitted through the slit 23. The shape of the slit of the field diaphragm 111 is an arc shape. Alternatively, other shapes, such as a rectangular shape, may be used.

An exemplary embodiment of the UI 104 will be described.

4A, 4B, and 4C illustrate a crucible 104A according to a first exemplary embodiment. FIG. 4A is a perspective view showing the crucible 104A. 4B is a cross-sectional view taken along a plane including the optical axis of the crucible 104A and a side view as seen from the right side. In the crucible 104A, based on the columnar optical rod, a portion around the center of one side is configured to form a concave tapered surface as shown as the surface 104A1, and a portion around the center of the other side is configured to form as Shown as a convex tapered surface of surface 104A3. The axis connecting the apex of the concave tapered surface 104A1 and the apex of the convex tapered surface 104A3 is the optical axis.

In the illumination optical system, the concave tapered surface 104A1 of the crucible 104A is disposed on the light source side, and the convex tapered surface 104A2 is disposed on the other side of the light source side. The outer side surface, the light exit surface, and the light incident surface of the crucible 104A are formed as one optical element. The light incident surface of the crucible 104A includes a concave tapered surface 104A1 and an annular flat surface 104A2 (first surface) formed around the concave tapered surface 104A1. Specifically, on the light incident surface, the first surface 104A2 is disposed on the outer side as viewed from the central axis of the concave tapered surface 104A1. The concave tapered surface 104A1 is rotationally symmetrical with respect to a central axis (optical axis) passing through the apex. The light exit surface includes a convex tapered surface 104A3 and an annular surface 104A4 (second surface) formed around the convex tapered surface 104A3. Specifically, on the light exit surface, the second surface 104A4 is disposed on the outer side as viewed from the central axis of the convex tapered surface 104A3. The convex tapered surface 104A3 is rotationally symmetrical with respect to a central axis (optical axis) passing through the apex. The light exit surface includes a cylindrical inner surface 104A5 between the convex cone surface 104A3 and the surface 104A4. The inner surface 104A5 is formed to connect the outermost circumference as viewed from the central axis of the convex tapered surface 104A3 and the inner periphery of the second surface 104A4. The inner surface 104A5 is a columnar side surface that is disposed to surround the convex tapered surface 104A3. The crucible 104A further includes an outer side surface 104A6 that extends from the light incident surface side to the light exit surface side. The outer side surface 104A6 is formed to connect the outer circumference of the first surface 104A2 of the light incident surface and the outer circumference of the second surface 104A4 of the light exit surface.

Fig. 4C shows how the respective light beams from the light source pass through the inside of the crucible 104A. The beam 1 enters the first surface 104A2 and is totally reflected by the outer side 104A6. Light is then emitted from the second surface 104A4. The beam 2 enters the concave tapered surface 104A1 and exits from the convex tapered surface 104A3. Beam 3 The concave tapered surface 104A1 is emitted from the convex tapered surface 104A3 and is reflected by the inner surface 104A5.

As described above, the light entering the outer side surface 104A6 from the light incident surface is totally reflected by the outer side surface 104A6. A reflective film may be formed on the outer side surface 104A6 to form a reflective surface. That is, the outer side surface 104A6 includes a reflective surface that reflects light entering from the light incident surface to the outer side surface. Therefore, the expansion and emission of light entering from the light incident surface to the outside can be reduced, and the outer diameter of the light flux at the incident side and the outer diameter of the light flux at the exit side can be the same. Therefore, the amount of light from the crucible 104A and blocked by the pupil on the pupil plane in the projection optical system can be reduced, or the amount of light that is kicked out without entering the subsequent optical element can be reduced. In other words, it is possible to suppress a decrease in light use efficiency when the substrate is exposed by light from the crucible 104A. If the concave tapered surface 104A1 and the convex tapered surface 104A3 have similar shapes and the first surface and the second surface are parallel to each other, the angle of the incident light with respect to the optical axis is the same as the angle of the emitted light and is maintained as it is. For example, light entering in parallel with the optical axis is emitted in parallel with the optical axis.

The inner surface 104A5 is a reflective surface formed of, for example, a reflective film that reflects light emitted from the convex tapered surface 104A3. The reflective film on the inner surface 104A5 can be omitted. However, by forming the reflective film, light emitted from the convex tapered surface 104A3 is reflected by the inner surface 104A5, and while maintaining the angle of the light emitted from the crucible 104A with respect to the optical axis, the spread of light can be reduced.

If the reflective film is formed on the inner surface 104A5, the expansion of the light emitted from the crucible 104A can be reduced as compared with the expansion of the light entering the crucible 104A. Therefore, in the optical system behind the 稜鏡104A, it can be reduced The amount of blocked light can further suppress the decrease in light utilization efficiency. The size of 稜鏡104A is ro=17.5, ri=17.5, t=35 and d=52.5 (the unit of size is mm), and the glass material is synthetic quartz.

For example, it is assumed that the light having the intensity distribution shown in FIG. 5A enters from the light source side to the incident surface of the crucible 104A, wherein the direction of the optical axis is in a direction perpendicular to the plane of the paper passing through the origin of the coordinates in FIG. 5A. In this condition, as shown in FIG. 5B, the light intensity distribution on the exit surface of the crucible 104A has an annular shape.

If the crucible 104A is not used, in order to generate a circular light intensity distribution, the intensity distribution shown in Fig. 5A must be cut into an annular shape, for example, by an aperture stop, and the obtained light intensity distribution is used. Fig. 5C shows a light intensity distribution cut into an annular shape from the intensity distribution in Fig. 5A by an aperture stop.

FIG. 5D shows the energy distribution in the section cut along the broken line in FIGS. 5B and 5C. The solid line in Fig. 5D shows the case in Fig. 5B, and the broken line in Fig. 5D shows the case in Fig. 5C. When these lines are compared, the light energy accumulated in the case of Fig. 5B (using 稜鏡104A) is about 60% higher than the light energy accumulated in the case of Fig. 5C.

A second exemplary embodiment of the port 104 is described. The crucible 104 according to this exemplary embodiment is an optical element group 104B including a segmented crucible 104A used in the first exemplary embodiment.

FIG. 6 is a cross-sectional view showing an optical element group 104B including an optical axis. Optical element group 104B includes two optical elements 104B1 and 104B2. As the glass material, synthetic quartz is used as an example. Optical component (first The optical element 104B1 has a shape formed by hollowing out the center of the columnar optical rod. The optical element 104B1 is a hollow cylindrical optical rod and has an outer side surface 104A6 having a flat surface 104A2 (first surface) of the crucible 104A and a flat surface 104A4 (second surface) as Bottom and top. The optical element 104B2 (second optical element) is a conical ridge having a concave tapered surface on one side and a convex tapered surface on the other side. The concave tapered surface in optical element 104B2 is similar to concave tapered surface 104A1, and the convex tapered surface in optical element 104B2 is similar to concave tapered surface 104A3. The optical element 104B2 is disposed in a hollow portion of the optical element 104B1.

The optical element group 104B may be disposed in the illumination optical system 100 in a similar manner to the crucible 104A, and a similar effect can be expected.

When the crucible 104A is manufactured, it is difficult to machine the convex taper surface and the concave taper surface. Further, in the crucible 104A, it is desirable to apply a transmissive film on the planar portion and the tapered portion, however, it is difficult to uniformly apply the transmissive film. On the other hand, in the optical element group 104B, the optical element 104B1 and the optical element 104B2 are separately manufactured and assembled, and this can solve the above problem. Therefore, the manufacture of the optical element group 104B is easier than the manufacture of the crucible 104A, which can increase the manufacturing yield.

Further, it is desirable to bond the optical element 104B1 and the optical element 104B2 to fabricate the optical element group 104B. In the manufacturing process, on the bonding surface of the optical element 104B1 and the optical element 104B2, a dielectric film having a refractive index lower than that of synthetic quartz can be formed at a thickness similar to the wavelength of light to be used. In this case, in the optical component At the boundary region between 104B1 and optical element 104B2, light is totally reflected and the energy of the light can be maintained.

A third exemplary embodiment of the crucible 104 is described. The crucible 104 according to this exemplary embodiment is an optical element group 104C including a segmented crucible 104A used in the first exemplary embodiment. The segmentation method is different from the optical element group 104B.

FIG. 7 is a cross-sectional view showing an optical element group 104C including an optical axis. Optical element group 104C includes two optical elements 104C1 and 104C2. As the glass material, synthetic quartz is used as an example. The optical element (fourth optical element) 104C1 has a shape formed by hollowing out the center of the center of the columnar optical rod. The optical element 104C1 is a hollow columnar rod having a flat surface 104A4 (second surface) of the crucible 104A on the light exit surface side and having a portion of the outer side surface 104A6. The optical element (third optical element) 104C2 is a crucible having a concave tapered surface 104A1 of a crucible 104A, a flat surface 104A2 (first surface), a convex tapered surface 104A3, and a part of the outer side surface 104A6. Optical element 104C1 has a convex tapered surface 104A3 of optical element 104C2 in the hollow of optical element 104C1.

The optical element group 104C may be disposed in the illumination optical system 100 in a similar manner to the crucible 104A, and a similar effect can be expected. Similar to the second exemplary embodiment, likewise, the manufacture of the optical element group 104C is easier than the manufacture of the crucible 104A.

Similar to the inner surface 104A5 in the crucible 104A, if the reflective film is to be formed on the inner surface of the optical element 104C1, due to the optical element group The 104C includes a plurality of optical elements, so that it is easier to evaporate the reflective film on the inner surface of the optical element 104C1 than the crucible 104A. Furthermore, evaporation of the reflective film over the entire inner surface of the optical element 104C1 is easier than evaporation of the film on a portion of the inner surface of the optical element 104B1.

A fourth exemplary embodiment of the 稜鏡 104 is described. The crucible 104 according to this exemplary embodiment is an optical element group 104D including the divided crucible 104A used in the first exemplary embodiment.

FIG. 8 is a cross-sectional view showing an optical element group 104D including an optical axis. Optical element group 104D includes three optical elements 104C1, 104B2, and 104D1.

The optical element 104C1 is the optical element described in the third exemplary embodiment. The optical element 104B2 is the optical element described in the second exemplary embodiment. The optical element 104D1 is a hollow cylindrical optical rod having a flat surface 104A2 (first surface) of the crucible 104A and a portion of the outer side surface 104A6.

As other examples of the optical element group in the crucible 104, the present invention can be applied to divide the optical element 104C1 into two or four by a section passing through the central axis of the column or by dividing the optical element according to various other division methods. Optical element group obtained by 104C1.

The crucible 104 including such a crucible and optical element group can also suppress a decrease in light utilization efficiency and a decrease in illumination on the surface to be illuminated in off-axis illumination such as ring illumination.

In this exemplary embodiment, a conical surface is used in the crucible 104. Alternatively, a rectangular cylinder can be used. In this case, you can use Concave and convex of a circular or rectangular column. In this exemplary embodiment, the side of the crucible 104 is a cylinder. Alternatively, however, a rectangular column can be used.

Further, for example, in order to increase the amount of light captured by the projection optical system, the diameter of the opening of the aperture stop in the pupil plane may be increased. However, if the diameter of the opening of the aperture stop 5 is increased, the numerical aperture (NA) of the projection optical system also increases and the depth of focus decreases, so that the processing margin is lost in the exposure apparatus.

A fifth exemplary embodiment of the 稜鏡 104 is described. Figure 14 is a cross-sectional view taken along a plane including the optical axis of the crucible 104E and a side view as seen from the right side of the crucible 104E. The crucible 104E includes an optical element 104E1 and an optical element 104E2. The optical element 104E1 includes a circular concave tapered surface 104E11, a circular convex tapered surface 104E12, and an outer circumferential surface 104E13 connecting the outer circumference of the circular concave tapered surface 104E11 and the outer circumference of the circular convex tapered surface 104E12. Optical element 104E2 is a hollow cylindrical member and includes an inner surface 104E22. On the inner surface 104E22, a reflective film is provided. The inner surface 104E22 is a cylindrical side surface that is disposed to surround the circular convex tapered surface 104E12. The beam 1E enters a circular concave tapered surface 104E11, passes through the optical element 104E1, and exits from the circular convex tapered surface 104E12. The beam 2E enters a circular concave tapered surface 104E11, passes through the optical element 104E1, and exits from the circular convex tapered surface 104E12. In addition, the light beam is reflected by the inner surface 104E22 and is emitted from the crucible 104E. That is, the light beam 2E enters the circular concave tapered surface 104E11 at an angle in the outer direction with respect to the optical axis, and is emitted from the circular convex tapered surface 104E12. Then the beam is covered by the inner surface 104E22 reflects and exits in the medial direction. The beam 3E enters the circular concave tapered surface 104E11 and is totally reflected by the outer side surface 104E13 in the middle through the optical element 104E1. The beam is then ejected from a circular convex cone surface 104E12. As described above, the outer side surface 104E13 has a function of a reflecting surface for totally reflecting light. The light beam 3E is refracted in the outer direction by the circular concave tapered surface 104E11, and is totally reflected by the outer side surface 104E13, and therefore, the light beam 3E travels in the inner side direction. Therefore, the outer side surface 104E13 and the inner surface 104E22 reduce the spread of light emitted from the crucible 104E. If the circular concave tapered surface 104E11 and the circular convex tapered surface 104E12 have similar shapes, the outer side surface 104E13 and the inner surface 104E22 are parallel to the optical axis. The emitted light is emitted at an angle similar to the incident light.

Referring to Fig. 9, a projection exposure apparatus according to a second exemplary embodiment of the present invention will be described. The same reference numerals are used in the drawings, and a part of the description is omitted.

The illumination optical system includes a crucible 104A according to the first exemplary embodiment, a hexagonal optical rod 114 illustrated in FIG. 10, and a crucible 106 illustrated in FIG. The illumination optics further includes a chirp converter 112 for carrying the optical components into and out of the optical path to selectively provide an optical component in the optical path.

As shown in FIG. 11A, the crucible 106 includes a convex conical surface 1061 and an inner convex conical surface 1062 on the light incident surface. The illumination optics also includes a concave tapered surface 1063 on the light exit surface and the central portion is hollow. FIG. 11B shows the light beam passing through the crucible 106. When the convex cone surface is disposed on the incident surface and the concave tapered surface is disposed on the exit surface side, the light beam 4 enters the convex cone Face 1061 and becomes closer to optical axis O. However, in the case where the light beam 5 and the light beam 6 pass through the hollow region and no refractive surface is provided therein, as shown in the drawing, the light propagation path is not affected. Thus, when helium 106 is used, the diameter of the exiting light flux can be less than the diameter of the incident light flux.

In order to reduce the spread of the light intensity distribution (effective light source distribution) to be formed on the pupil plane in the illumination optical system, it is necessary to cut the peripheral portion of the effective light source distribution, for example, using an σ pupil. However, in this case, the light utilization efficiency is lowered. However, by using the crucible 106, the effective light source shape can be narrowed, and the reduction in light utilization efficiency can be suppressed.

The illumination optical system includes an σ-optical transducer 113 around the exit surface of the fly-eye optical system 109, which is capable of selectively arranging a plurality of σ pupils having different opening shapes.

FIG. 12 is a schematic structural view of the σ diaphragm converter 113. For example, when the helium transducer 112 is driven to dispose the optical rod 114 in the optical path, the sigma-iris transducer 113 is driven such that the σ diaphragm 113A is disposed around the exit surface of the fly-eye optical system 109. When the chirp converter 112 is driven to dispose the crucible 104 in the optical path, the σ diaphragm converter 113 is driven such that the σ diaphragm 113B is disposed around the exit surface of the fly's eye optical system 109. When the 稜鏡 transducer 112 is driven to arrange the 稜鏡 106 in the optical path, the σ-iridium transducer 113 is driven such that the σ pupil 113C is disposed around the exit surface of the fly-eye optical system 109.

The projection exposure apparatus according to an exemplary embodiment may use the sigma converter 112 and the sigma transducer 113 to form a plurality of types of effective light source distributions (lighting conditions). Therefore, according to the pattern of the mask M, the selection is effective The light source is distributed to illuminate the mask M. The projection exposure apparatus projects a pattern of the mask M onto the substrate P through the projection optical system PO to expose the substrate P. In the projection exposure apparatus according to the exemplary embodiment, according to the pattern of the mask M, an effective light source distribution having a high pattern resolution may be selected to illuminate the mask M to expose the substrate. Therefore, productivity can be increased.

The projection exposure apparatus according to an exemplary embodiment includes a measuring device JS for measuring an angular distribution (effective light source distribution) of light entering the substrate P. The measuring device JS is disposed in the substrate stage PS that holds the substrate and moves. The measuring device JS includes a pinhole plate on which a pinhole having a diameter of 1 mm or less is formed, and a charge coupled device (CCD) camera at a position separated from the pinhole by about 100 mm. In measuring the angular distribution of the light entering the substrate P, the measuring device JS is moved in the exposure region to arrange the pinhole on the image plane, and an image of the light distribution of the light transmitted through the pinhole is captured by the CCD camera. Using the image data captured by the CCD camera, the angular distribution of light entering the substrate P can be calculated. Then, using the calculated angular distribution, the position and orientation of the crucible 104 are adjusted such that the angular distribution of light entering the substrate P becomes a desired angular distribution. The measuring device JS can also be used for the adjustment of the telecentricity in the projection optical system.

In the following, a third exemplary embodiment will be described. A method of using the above-described exposure apparatus manufacturing apparatus (semiconductor integrated circuit device, liquid crystal display device, etc.) will be described. The apparatus is manufactured using the above-described exposure apparatus in the steps of exposing a substrate (for example, a wafer and a glass substrate) to which a photosensitive material is applied, developing a substrate (photosensitive material), and other known steps. Other known steps include, for example, etching, resist stripping, dice, bonding, and Package. According to the device manufacturing method, a device having a quality superior to that of the known device can be manufactured.

According to the above-described exemplary embodiment, the decrease in light use efficiency can be suppressed when the substrate is exposed by using light from a crucible for changing the cross-sectional shape of the luminous flux.

While the invention has been described with reference to exemplary embodiments thereof, it is understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the

104A1‧‧‧ concave cone

104A2‧‧‧flat surface (first surface)

104A3‧‧‧ convex cone

104A4‧‧‧flat surface (second surface)

104A5‧‧‧ inner surface

104A6‧‧‧Outside

Claims (11)

An illumination optical system for illuminating a plane to be illuminated, the illumination optical system comprising an optical system constructed to have a cross-sectional shape for changing a luminous flux, wherein the crucible includes a light incident surface, a light exit surface, and a The light incident surface side extends to an outer side of the light exit surface side, the light incident surface includes a concave tapered surface, the light exit surface includes a convex tapered surface, and the outer side surface includes a reflection from the light incident surface incident on the outer side a reflective surface of light, wherein the light incident surface includes a first surface disposed outside the concave tapered surface with respect to a central axis passing through the apex of the concave tapered surface, and the light exiting surface includes opposite to the through A central axis of the apex of the tapered surface is disposed on a second surface of the outer side of the convex tapered surface, and wherein the illumination optical system directs the light to enter the concave tapered surface of the light incident surface and the first surface. The illumination optical system of claim 1, wherein the reflective surface totally reflects light entering from the light incident surface. The illumination optical system according to claim 1, wherein the reflective surface is a surface on which a reflective film is formed. The illumination optical system according to claim 1, wherein the crucible is formed by joining a plurality of optical elements, and on the bonding surface of the optical elements, forming a refractive index ratio of the optical elements A film with a low refractive index. The illumination optical system of claim 1, wherein the crucible has a hollow cylindrical optical element having a first surface and a second surface as bottom and top surfaces, respectively, and having the outer side, and The hollow cylindrical optical element has an optical element having the concave tapered surface and the convex tapered surface in the hollow portion. The illumination optical system of claim 1, wherein the crucible comprises an optical element having the concave tapered surface, the first surface, the convex tapered surface, and the outer side surface, and having the second surface and the A hollow cylindrical optical element on the outer side, wherein the convex tapered surface is disposed in a hollow portion of the hollow cylindrical optical element. An illumination optical system for illuminating a plane to be illuminated, the illumination optical system comprising an optical system constructed to have a cross-sectional shape for changing a luminous flux, wherein the crucible includes a light incident surface, a light exit surface, and a The light incident surface side extends to an outer side of the light exit surface side, the light incident surface includes a concave tapered surface, the light exit surface includes a convex tapered surface, and the outer side surface includes a reflection from the light incident surface incident on the outer side a reflective surface of light, wherein the optical system has the haptic comprising a reflective surface for reflecting light emerging from the convex cone. According to the illumination optical system described in claim 7 of the patent application, The reflective surface for reflecting light emerging from the convex tapered surface is formed on a cylindrical side surface disposed to surround the convex tapered surface. An illumination optical system for illuminating a plane to be illuminated, the illumination optical system comprising an optical system constructed to have a cross-sectional shape for changing a luminous flux, wherein the crucible includes a light incident surface, a light exit surface, and a The light incident surface side extends to an outer side of the light exit surface side, the light incident surface includes a concave tapered surface, the light exit surface includes a convex tapered surface, and the outer side surface includes a reflection from the light incident surface incident on the outer side a reflective surface of light, wherein the optical system has the crucible, comprising an optical element having the concave tapered surface, the convex tapered surface and the outer side surface, and a hollow cylindrical optical element having a surface formed on the inner side a reflective surface that reflects light that exits the convex cone surface. An exposure apparatus comprising: the illumination optical system according to any one of claims 1 to 9 for illuminating a mask; and a projection optical system for projecting a pattern image of the mask onto the substrate . A method of manufacturing a device, comprising: exposing a substrate using an exposure apparatus according to claim 10 of the patent application; The exposed substrate is developed.