JP2002025898A - Illuminating optical device, and aligner provided with the illuminating optical device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To form a secondary light source in a ring-belt shape, provided with a desired ring belt ratio without practically losing a light quantity in a lighting type for light-converging a mercury lamp, for instance, by an elliptical mirror. SOLUTION: This device is provided with a collimation optical system (5) for converting luminous fluxes from a light source (1) which is converged by a reflection mirror (2) to almost parallel luminous fluxes and a multiple light source forming means (7) for forming a practical surface light source, composed of many light sources based on the almost parallel luminous fluxes. The collimation optical system is constituted, so as to set the center opening part of the reflecting mirror and the incident surface of the multiple light source formation means to optically almost conjugate relation. In an optical path between the collimation optical system and the multiple light source formation means, a luminous flux conversion member (6) for practically converting incident luminous fluxes to the luminous fluxes in the ring belt shape or the plural luminous fluxes eccentric with respect to an optical axis is provided.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an illuminating optical apparatus and an exposure apparatus having the illuminating optical apparatus. The present invention relates to an illumination optical device suitable for an exposure device.

[0002]

2. Description of the Related Art In an exposure apparatus of this type, a light beam from a light source such as a mercury lamp (mercury arc lamp) is condensed by an elliptical mirror, converted into a parallel light beam by a collimating lens, and guided to a fly-eye lens. . In this way, a secondary light source including a large number of light sources is formed on the rear focal plane of the fly-eye lens. The light flux from the secondary light source is restricted via an aperture stop arranged near the rear focal plane of the fly-eye lens, and then enters the condenser lens.

The light beam condensed by the condenser lens illuminates a mask on which a predetermined pattern is formed in a superimposed manner. The light transmitted through the mask pattern forms an image on the wafer via the projection optical system. Thus, on the wafer,
The mask pattern is projected and exposed (transferred). The pattern formed on the mask is highly integrated. To accurately transfer this fine pattern onto the wafer, it is necessary to obtain a uniform illuminance distribution on the wafer, and the resolution and depth of focus of the projection optical system. It is important to improve.

In recent years, the size of the aperture (light transmitting portion) of the aperture stop arranged on the exit side of the fly-eye lens has been changed to provide coherency σ (σ value = aperture stop diameter / projection optics) for illumination. Attention has been paid to a technique of changing the pupil diameter of the system or the σ value = the exit-side numerical aperture of the illumination optical system / the entrance-side numerical aperture of the projection optical system. In addition, by setting the shape of the opening of the aperture stop arranged on the emission side of the fly-eye lens to an annular shape or a four-hole shape (ie, a quadrupole shape), the secondary light source formed by the fly-eye lens is formed. Attention has been paid to a technology for improving the depth of focus and the resolving power of a projection optical system by limiting the shape to an annular shape or a quadrupole shape.

However, in order to restrict the shape of the secondary light source to an annular shape or quadrupolar shape and perform deformed illumination (zonal illumination or quadrupolar illumination), a relatively large secondary light source formed by a fly-eye lens is required. Must be restricted by an aperture stop having an annular or quadrupole aperture. That is, in annular illumination or quadrupole illumination, a substantial portion of the light beam from the secondary light source is blocked by the aperture stop, and does not contribute to illumination (exposure). As a result, the illuminance on the mask and the wafer is reduced due to the loss of light amount in the aperture stop, and the throughput as an exposure apparatus is also reduced.

Accordingly, the applicant of the present invention has disclosed, for example,
In Japanese Patent Publication No. 188174, an annular secondary light source is formed without substantially losing the light amount by setting a substantially conjugate positional relationship between the center opening of the elliptical mirror and the entrance surface of the fly-eye lens. Disclosure technology. Also,
The present applicant discloses in Japanese Patent Application Laid-Open No. 5-251308, for example, a technique for forming an annular secondary light source without substantially losing the light amount by using an optical member having a conical refraction surface. I have.

[0007]

Problems to be Solved by the Invention
In the illumination optical device disclosed in Japanese Patent Application Publication No. 4 (1993) -214, an annular secondary light source is formed. I do.
In other words, in order to form a secondary light source having a desired annular ratio, it is necessary to set the central opening of the elliptical mirror to a desired size. However, the size of the central opening of the ellipsoidal mirror should be determined according to the light distribution characteristics of the mercury lamp. Light efficiency will be reduced.

On the other hand, in the illumination optical device disclosed in Japanese Patent Application Laid-Open No. 5-251308, an optical member having a conical refracting surface is arranged in the optical path of a parallel light beam, so that a desired annular zone ratio is obtained. A secondary light source is formed. By the way, as described above, the light from the mercury lamp is condensed by an elliptical mirror and then converted into a substantially parallel light beam through a collimating lens. The mercury lamp has an electrode spacing of 4 mm or more even though it is a short arc.

In this case, the light from the central portion of the luminescent spot positioned at the first focal position of the elliptical mirror is converted into a parallel light beam via the collimating lens. Light rays from the part are converted via a collimating lens into light rays that are not substantially parallel to the optical axis. As described above, in an illumination optical device using a mercury lamp as a light source, an optical member having a conical refracting surface is provided in an optical path between a collimator lens and a fly-eye lens, that is, in an optical path including substantially non-parallel light rays. Simply arranging cannot form a desired annular secondary light source.

The present invention has been made in view of the above-mentioned problems, and for example, in an illumination type in which a mercury lamp is condensed by an elliptical mirror, a ring having a desired annular zone ratio without substantially losing the amount of light. It is an object of the present invention to provide an illumination optical device capable of forming a band-shaped secondary light source and an exposure apparatus including the illumination optical device. Further, the present invention provides a method of manufacturing a microdevice capable of manufacturing a good microdevice with high throughput and high resolution by illuminating a mask with annular illumination having a desired annular ratio while suppressing light quantity loss satisfactorily. The aim is to provide a method.

[0011]

According to a first aspect of the present invention, there is provided an illumination optical apparatus for illuminating a surface to be illuminated, comprising: a light source for supplying a light beam; A reflecting mirror having a reflective surface and a central opening formed at the center of the reflecting surface for condensing light from the light source, and a light beam from the light source condensed by the reflecting mirror. A collimating optical system for converting into a parallel light beam, multiple light source forming means for forming a substantial surface light source composed of a large number of light sources based on the substantially parallel light beam through the collimating optical system, and A condenser optical system for condensing the light beam and guiding the light beam to the irradiated surface, wherein the collimating optical system is configured to allow the substantially annular light beam to enter the multi-light source forming unit. Center aperture of reflector And the incident surface of the multiple light source forming means are set to be in an optically conjugate relationship, and the incident light flux is substantially reduced in an optical path between the collimating optical system and the multiple light source forming means. And a light beam converting member for converting the light beam into a ring-shaped light beam or a plurality of light beams decentered with respect to the optical axis.

According to a preferred aspect of the first invention, the collimating optical system forms an image of a central opening of the reflecting mirror at a position of an incident surface of the multiple light source forming means, and a central opening of the reflecting mirror. An image of the peripheral aperture located farthest from the light source is formed at a position farthest from the entrance surface of the multiple light source forming means. Alternatively, it is preferable that the collimating optical system forms an image of a reflecting surface of the reflecting mirror at a position of an incident surface of the multiple light source forming unit.

According to a preferred aspect of the first invention,
The light beam conversion member includes a first refraction surface formed on the light source side and a second refraction surface formed on the irradiated surface side with respect to the first refraction surface, and the first refraction surface and the second refraction surface At least one of them is formed in a conical shape or a pyramid shape. Further, it is preferable that the light beam conversion member is disposed closer to the irradiated surface than a position where the light intensity of the substantially parallel light beam passing through the collimating optical system on the optical axis becomes substantially zero. In this case, the light beam conversion member is configured to be switchable between a first state in which the first refraction surface faces the light source and a second state in which the second refraction surface faces the light source. Is preferred.

According to a second aspect of the present invention, there is provided the illumination optical device according to the first aspect of the present invention, and a projection optical system for projecting and exposing a mask pattern set on the surface to be irradiated onto a photosensitive substrate. An exposure apparatus is provided.

According to a third aspect of the present invention, there is provided an exposure apparatus comprising: the illumination optical apparatus according to the first aspect; and a projection optical system for projecting and exposing a mask pattern set on the surface to be irradiated onto a photosensitive substrate. In the method of manufacturing an apparatus, the light flux conversion member is set to the first state to guide light to the projection optical system, and at least one of astigmatism, field curvature, and distortion remaining in the projection optical system. A first measuring step of measuring two aberrations, and setting the light flux conversion member in the second state to guide light to the projection optical system, and at least one of spherical aberration and coma remaining in the projection optical system A second measurement step of measuring the aberration of the projection optical system, and an adjustment step of adjusting the projection optical system based on the measurement result in the first measurement step and the measurement result in the second measurement step. Manufacturing of exposure equipment The law provides.

According to a fourth aspect of the present invention, there is provided a method of manufacturing an exposure apparatus having a projection optical system for projecting a pattern formed on a mask onto a photosensitive substrate, the method comprising the steps of: The first light that guides light and remains in the projection optical system
A first measuring step of measuring aberrations, and a second different from the first aberration that guides light to the projection optical system under a second illumination condition different from the first illumination condition and remains in the projection optical system.
An exposure comprising: a second measurement step of measuring aberration; and an adjustment step of adjusting the projection optical system based on a measurement result in the first measurement step and a measurement result in the second measurement step. An apparatus manufacturing method is provided.

According to a preferred aspect of the fourth invention, in the first measuring step, the light intensity increases from the center to the periphery at or near the pupil of the illumination optical system for guiding the light to the projection optical system. Such an annular or multipolar first light intensity distribution is formed, and in the second measurement step, a substantially circular light cross section is formed at or near a pupil of an illumination optical system for guiding light to the projection optical system. To form a second light intensity distribution. Further, it is preferable that an effective outer diameter of the first light intensity distribution is larger than an effective outer diameter of the second light intensity distribution. Furthermore, it is preferable that the first aberration is at least one of astigmatism, field curvature, and distortion, and the second aberration is at least one of spherical aberration and coma.

According to a fifth aspect of the present invention, there is provided a method of manufacturing an exposure apparatus having a projection optical system for projecting a pattern formed on a mask onto a photosensitive substrate, wherein the illumination optical system includes an optical member having a conical surface or a pyramidal surface. A first measurement step of guiding light to the projection optical system using a system to measure aberrations remaining in the projection optical system, a first adjustment step of adjusting the optical member, and adjustment by the first adjustment step. A second measurement step of guiding light to the projection optical system using the illumination optical system including the optical member and measuring aberrations remaining in the projection optical system;
A second adjusting the projection optical system based on the measurement result in the first measurement step and the measurement result in the second measurement step
And an adjusting step.

According to a sixth aspect of the present invention, there is provided a method of manufacturing an exposure apparatus having a projection optical system for projecting a pattern formed on a mask onto a photosensitive substrate, the method comprising the steps of: A first measurement step of guiding light to the projection optical system using an illumination optical system including an optical member that forms multipolar light composed of light and measuring aberrations remaining in the projection optical system; and A first adjustment step of adjusting, and a second measurement of guiding light to the projection optical system using the illumination optical system including the optical member adjusted in the first adjustment step, and measuring an aberration remaining in the projection optical system The step and the first
And a second adjustment step of adjusting the projection optical system based on a measurement result in the measurement step and a measurement result in the second measurement step.

According to a seventh aspect of the present invention, a preparation step for preparing an exposure apparatus manufactured by the method of manufacturing an exposure apparatus according to the third to sixth aspects, and setting the mask on an object plane of the projection optical system. A mask setting step, a substrate setting step of setting the photosensitive substrate on an image plane of the projection optical system, an exposure step of exposing the pattern of the mask to the photosensitive substrate using the exposure device, and And a developing step of developing the photosensitive substrate.

[0021]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, for example, light from a light source such as an ultra-high pressure mercury lamp is condensed by a reflecting mirror such as an elliptical mirror, and then converted into a substantially parallel light beam via a collimating optical system. It leads to multiple light source forming means such as a fly-eye lens. Here, the collimating optical system sets the center opening of the elliptical mirror and the entrance surface of the fly-eye lens in an optically conjugate relationship in order to make the annular light flux enter the fly-eye lens. I have. Further, in the optical path between the collimating optical system and the fly-eye lens, as a light beam conversion member for converting an incident light beam into a substantially annular light beam or a plurality of light beams decentered with respect to the optical axis, for example, A conical prism is provided. Here, the conical prism is
It has a concave conical refraction surface on the entrance side and a convex conical refraction surface on the exit side.

When no conical prism is provided,
On the rear focal plane of the fly-eye lens, there is formed an annular secondary light source having a very narrow range of the light intensity around the optical axis, that is, a so-called annular ratio. As a result, a large amount of light loss occurs in the annular aperture stop which is disposed on the rear focal plane of the fly-eye lens and restricts the luminous flux from the secondary light source. In order to reduce the light quantity loss in the annular aperture stop, it is necessary to enlarge the range of the light intensity around the optical axis of the annular secondary light source, which is almost zero, and to increase the annular ratio of the secondary light source. is there.

In this case, in order to increase the annular zone ratio of the secondary light source to a desired value, a method of enlarging the center opening of the elliptical mirror can be considered. However, the size of the central opening of the elliptical mirror should be determined according to the light distribution characteristics of the light source. If the central opening is made larger than necessary, a large amount of light loss occurs in the elliptical mirror. Therefore, in the present invention, a conical prism as a light beam conversion member is provided in the optical path between the collimating lens system and the fly-eye lens. The conical prism is disposed closer to the irradiated surface than a position where the light intensity on the optical axis of the substantially parallel light beam via the collimating lens system becomes substantially zero.

Thus, in the present invention, the action of the attached conical prism expands the substantially zero range of the light intensity centered on the optical axis in the annular secondary light source, and thus the annular ratio of the secondary light source. Becomes larger. Here, in the annular secondary light source, the rate at which the almost zero range of the light intensity centered on the optical axis is expanded (or the rate at which the annular light source ratio of the secondary light source increases) depends on the characteristics of the conical prism. Angle, axial thickness, refractive index, etc.). In other words, by appropriately setting the characteristics of the conical prism, it is possible to form an annular secondary light source having a desired annular ratio without substantially losing the light amount by the elliptical mirror and the annular aperture stop. it can.

In the present invention, for example, the first state for annular illumination in which the conical concave refracting surface of the conical prism faces the light source side, and the second state in which the conical convex refracting surface faces the light source side. By simply switching to, circular illumination can be performed. In this case, a circular secondary light source having an outer diameter smaller than the outer diameter of the annular secondary light source formed by installing the conical prism in the first state is formed. Then, in conjunction with the switching of the conical prism from the first state to the second state, switching from the annular aperture stop to the circular aperture stop is performed.
Thus, by switching the conical prism posture, the elliptical mirror and the circular aperture stop substantially do not lose the light amount.
Circular illumination having a smaller σ value than annular illumination can be performed.

When the illumination optical apparatus of the present invention is applied to an exposure apparatus, the residual aberration of the projection optical system is measured when manufacturing the exposure apparatus. At this time, in the annular illumination, since the light flux near the optical axis is missing near the pupil plane of the projection optical system, the spherical aberration and the coma cannot be correctly evaluated. However, as described above, in the exposure apparatus incorporating the illumination optical device of the present invention, switching between annular illumination and circular illumination is performed only by changing the attitude of the conical prism.

Therefore, the distortion, the field curvature and the astigmatism remaining in the projection optical system under the annular illumination are measured, and under the circular illumination realized only by changing the attitude of the conical prism. The spherical aberration and coma remaining in the projection optical system can be measured, and the projection optical system can be satisfactorily adjusted based on the correctly evaluated residual aberration result. In addition, since the σ value is smaller in circular illumination than in annular illumination, spherical aberration and coma can be measured with good sensitivity.

Further, in the present invention, by using a pyramid prism instead of a conical prism, a multipole (quadrupole, octupole, etc.) comprising a plurality of surface light sources decentered with respect to the optical axis is used.
Can be formed. At this time, the annular ratio of the multipolar secondary light source depends on the characteristics (vertex angle, axial thickness, refractive index, etc.) of the pyramid prism. In other words, by appropriately setting the characteristics of the pyramid prism, it is possible to form a multipolar secondary light source having a desired annular ratio without substantially losing the light amount by the elliptical mirror and the multipole aperture stop. Can be.

In the case of the pyramid prism, the first state for multipole illumination in which the concave surface of the pyramid is directed toward the light source is switched to the second state in which the convex surface of the pyramid is directed toward the light source. Alone, circular illumination can be performed. In this case, the switching from the multipole aperture stop to the circular aperture stop is performed in conjunction with the switching of the pyramid prism from the first state to the second state. In this way, by switching the attitude of the pyramid prism, circular illumination having a smaller σ value than that of the multipole illumination can be performed without substantially losing the light amount by the elliptical mirror and the circular aperture stop.

As described above, according to the illumination optical apparatus of the present invention, in the illumination type in which the mercury lamp is condensed by the elliptical mirror, the annular or multipole having a desired annular ratio can be obtained without substantial loss of light quantity. Secondary light source can be formed. Therefore, in the exposure apparatus provided with the illumination optical device of the present invention, the mask is illuminated with annular illumination or multipolar illumination having a desired annular ratio, while suppressing a loss of light amount, and is excellent in high throughput and high resolution. A micro device can be manufactured.

An embodiment of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a diagram schematically illustrating a configuration of an exposure apparatus including an illumination optical device according to an embodiment of the present invention.
In FIG. 1, the Z axis is parallel to the optical axis AX of the projection optical system PL,
The Y axis is set in a plane perpendicular to the optical axis AX in parallel with the plane of FIG. 1, and the X axis is set in a plane perpendicular to the optical axis AX in a plane perpendicular to the plane of FIG.

The exposure apparatus shown in FIG.
The light source 1 includes an ultra-high pressure mercury lamp that supplies light including a line and an emission line of an h-line. The light source 1 is positioned at a first focal position of an elliptical mirror 2 having an elliptical reflecting surface rotationally symmetric with respect to the optical axis AX and a circular central opening centered on the optical axis AX. Therefore, the illumination light beam emitted from the light source 1 is transmitted through the reflecting mirror (plane mirror) 3 to the elliptical mirror 2.
The light source image is formed at the second focal position of the light source. A shutter 4 for turning ON / OFF the exposure operation is arranged at the second focal position.

The divergent light beam from the light source image formed at the second focal position of the elliptical mirror 2 is converted into a substantially parallel light beam by the collimating lens system 5, and then the conical prism 6 via a wavelength selection filter (not shown). Incident on. In the wavelength selection filter, g-line (436 nm) light and h-line (405n)
m) and i-line (365 nm) light are simultaneously selected as exposure light. In the wavelength selection filter, for example, g-line light and h-line light can be simultaneously selected, h-line light and i-line light can be simultaneously selected, and further, i-line light can be selected. Only light can be selected.

The conical prism 6 has a light source side surface (FIG. 1).
The surface on the middle right side is formed in a conical concave shape toward the light source side, and the surface on the mask side (the left surface in FIG. 1) is formed in a conical convex shape toward the mask side. More specifically, the refracting surface on the light source side of the conical prism 6 (6 in FIG. 2)
a) and the refraction surface on the mask side (6b in FIG. 2)
It corresponds to a conical surface (side surface excluding the bottom surface) of a cone symmetrical with respect to the optical axis AX, and is configured such that two refraction surfaces are substantially parallel to each other.

Therefore, when a circular parallel light beam is incident on the conical prism 6, it is refracted radially around the optical axis AX (deflected at all angles in all directions),
An annular (ie, annular) parallel light beam is formed. As described above, the conical prism 6 constitutes a light beam conversion member for converting a circular light beam into an annular light beam. The luminous flux passing through the collimating lens system 5 and the conical prism 6 is converted into a zonal luminous flux having a zonal light intensity distribution, and is incident on a fly-eye lens 7 as a multiple light source forming unit. Detailed operations of the collimating lens system 5 and the conical prism 6 will be described later.

The fly-eye lens 7 is constituted by arranging a large number of positive lens elements vertically and horizontally and densely so that the central axis thereof extends along the optical axis AX. Therefore, the light beam incident on the fly-eye lens 7 is split into wavefronts by a large number of lens elements, and a substantial surface light source (a light source image having the same number of light source images as the number of lens elements on the rear focal plane (that is, near the exit plane)). Less than,
"Secondary light source"). That is, on the rear focal plane of the fly-eye lens 7, an annular secondary light source having a light intensity distribution substantially the same as the light intensity distribution of the incident light beam is formed. In addition, the cross-sectional shape of many lens elements constituting the fly-eye lens 7 can be formed in a rectangular shape, a hexagonal shape, or the like.

The luminous flux from the annular secondary light source is restricted by an aperture stop 8 disposed on the rear focal plane of the fly-eye lens 7 and then enters a condenser lens system 9. The aperture stop 8 is arranged at a position optically conjugate to the entrance pupil plane of the projection optical system PL (the position of the illumination pupil) described later, and has an annular shape for defining the range of the secondary light source contributing to illumination. Having an opening. The aperture stop 8 is arranged on the front focal plane of the condenser lens system 9.

Therefore, the light beam condensed via the condenser lens system 9 illuminates the illumination field stop 10 for defining the illumination area (illumination field) of the mask M in a superimposed manner. The light beam passing through the rectangular opening of the illumination field stop 10 illuminates the mask M on which a predetermined transfer pattern is formed in a superimposed manner via the imaging optical system 11. Thus, an image of the opening of the illumination field stop 10, that is, a rectangular illumination area is formed on the mask M. Note that the imaging optical system 1
In the optical path 1, there is a reflecting mirror (plane mirror) 1 for bending the optical path.
2 are arranged.

The mask M is provided via a mask holder MH.
The mask stage MS is held parallel to the XY plane. The mask stage MS is two-dimensionally movable along the mask surface (that is, the XY plane) and is rotatable around the Z axis by the action of a drive system (not shown). The position coordinates of the mask stage MS are measured and controlled by the mask interferometer MIF. The light flux transmitted through the pattern of the mask M forms an image of the mask pattern on the wafer W as a photosensitive substrate via the projection optical system PL.

The wafer W is transferred via a wafer holder WH.
It is held on wafer stage WS in parallel with the XY plane. The wafer stage WS is two-dimensionally movable along the wafer surface (that is, the XY plane) and is rotatable around the Z axis by the action of a drive system (not shown). The position coordinates of the wafer stage WS are measured and controlled by the wafer interferometer WIF. In this manner, the batch exposure or the scan exposure is performed while the wafer W is two-dimensionally driven and controlled in a plane (XY plane) orthogonal to the optical axis of the projection optical system PL.
Are sequentially exposed.

Incidentally, in the batch exposure, a so-called step
According to the AND-repeat method, the mask pattern is collectively exposed to each exposure region of the wafer. In this case, the shape of the illumination area on the mask M is a rectangular shape close to a square, and the cross-sectional shape of each lens element of the fly-eye lens 7 is also a rectangular shape close to a square. On the other hand, in scan exposure, according to a so-called step-and-scan method, a mask pattern is scan-exposed (scan-exposed) on each exposure region of the wafer while the mask and wafer are relatively moved with respect to the projection optical system. in this case,
The shape of the illumination area on the mask M is a rectangular shape having a ratio of the short side to the long side of, for example, 1: 3, and the cross-sectional shape of each lens element of the fly-eye lens 7 is also a similar rectangular shape.

FIG. 2 is a diagram for explaining the operation of the collimating lens system 5 and the conical prism 6 of FIG. FIG. 3 shows the light distribution characteristics of the extra-high pressure mercury lamp 1 of FIG.
FIG. 4 is a diagram for explaining a relationship with a reflection surface shape. Referring to FIG. 2, the elliptical mirror 2 has an elliptical reflection surface 2a rotationally symmetric with respect to the optical axis AX in order to collect a light beam from the ultra-high pressure mercury lamp 1 positioned at the first focal position.

At the center of the elliptical mirror 2, a circular central opening 2b centered on the optical axis AX is formed. In the elliptical mirror 2, a circular peripheral opening 2c centered on the optical axis AX is formed at a position farthest from the central opening 2b. The surface shape of the elliptical reflecting surface 2a of the elliptical mirror 2 (and the size of the central opening 2b) is as shown by the hatched portion in FIG. It is determined according to the light distribution characteristics of the ultra-high pressure mercury lamp 1.

In this embodiment, the image of the central opening 2b of the elliptical mirror 2 is formed on the incident surface B0 of the fly-eye lens 7 via the collimating lens system 5. Further, the image of the peripheral opening 2c of the elliptical mirror 2 is formed via the collimating lens system 5 on a surface B1 which is somewhat away from the incident surface B0 of the fly-eye lens 7 toward the light source. Further, the outermost light beam among the light beams reflected by the reflection surface portion adjacent to the center opening 2b on the elliptical reflection surface 2a is transmitted through the collimating lens system 5 to the surface B2 which is separated from the surface B1 to the light source side to some extent. It is configured to intersect on the axis AX.

Therefore, when the conical prism 6 is not provided, the light intensity on the optical axis AX of the substantially parallel light beam via the collimating lens system 5 becomes almost zero when it reaches the surface B2. Then, from the surface B2 to the incident surface B0 of the fly-eye lens 7, the range of almost zero light intensity expands around the optical axis AX. As a result, an annular light beam having a light intensity distribution as shown in FIG. 4 is incident on the incident surface B0 of the fly-eye lens 7, and a secondary light source having an annular shape having a light intensity distribution as shown in FIG. It is formed on the rear focal plane of the eye lens 7.

On the other hand, as shown in FIG.
It has a ring-shaped opening (light transmitting portion shown by hatching in the figure) 8a having an inner diameter of φi and an outer diameter of φo. Here, the ratio φi / φo of the inner diameter φi to the outer diameter φo is the ring zone ratio, and the ring zone ratio φi / φo is set to a predetermined value within a range of, for example, 0.3 to 0.7. In the case of the aperture stop 8 having the orbital ratio φi / φo of the normal value, as shown in FIG. 4, in the annular secondary light source, the range of almost zero light intensity around the optical axis AX is very narrow. A large light amount loss occurs in the aperture stop 8.

In order to reduce the light amount loss in the aperture stop 8, the range of the light intensity around the optical axis AX in the annular secondary light source is almost zero, and the annular ratio of the secondary light source is reduced. Need to be larger. In this case, in order to increase the annular zone ratio of the secondary light source to a desired value, a method of enlarging the center opening 2a of the elliptical mirror 2 is considered. However, as described with reference to FIG. 2, the size of the central opening 2 a of the elliptical mirror 2 should be determined according to the light distribution characteristics of the ultra-high pressure mercury lamp 1. If it is increased, the light amount loss in the elliptical mirror 2 is large.

Therefore, in this embodiment, a conical prism 6 as a light beam converting member is provided in the optical path between the collimating lens system 5 and the fly-eye lens 7. As described above, when a circular parallel light beam is incident, the conical prism 6 is deflected at equal angles around the optical axis AX in all directions to form an annular parallel light beam. Therefore, when the annular parallel light beam enters the conical prism 6, a parallel annular light beam whose inner diameter is enlarged without changing its width (difference between the outer diameter and the inner diameter) is formed.

In this embodiment, the conical prism 6 is disposed on the mask side of the plane B2 where the light intensity of the substantially parallel light beam passing through the collimating lens system 5 on the optical axis AX becomes substantially zero. Therefore, an annular light beam having a very small inside diameter, that is, a very small annular ratio is formed by the conical prism 6.
Will be incident. Then, by the above-described operation of the conical prism 6, an annular light beam having an enlarged inner diameter and a relatively large annular ratio is formed without changing its width.
As a result, an annular light beam having a light intensity distribution as shown in FIG. 6 is incident on the incident surface B0 of the fly-eye lens 7, and a secondary light source having an annular shape having a light intensity distribution as shown in FIG. It is formed on the rear focal plane of the eye lens 7.

4 and FIG. 6, the action of the conical prism 6 expands the substantially zero range of the light intensity around the optical axis AX in the annular secondary light source, and consequently the secondary light source. It can be seen that the ring zone ratio has increased. Here, in the annular secondary light source, the rate at which the almost zero range of the light intensity centered on the optical axis AX is expanded (or the rate at which the annular light source ratio of the secondary light source increases) is the top of the conical prism 6. It depends on the angle (the angle between the optical axis AX and the conical refracting surface), the axial thickness (the thickness along the optical axis AX), the refractive index, and the like.

In other words, in the present embodiment in which the ultra-high pressure mercury lamp 1 is condensed by the elliptical mirror 2, the characteristics (vertical angle, axial thickness, refractive index, etc.) of the conical prism 6 are set appropriately. Without substantially losing the light amount by the elliptical mirror 2,
As can be seen from a comparison between FIGS. 4 and 6, an annular secondary light source having a desired annular ratio can be formed without substantially losing the light amount at the aperture stop 8.

In the present embodiment, the conical prism 6 includes the first state shown in FIG. 2 for annular illumination in which the conical concave refracting surface 6a faces the light source side, and the conical convex refracting surface 6b. 7 for circular illumination in which the light is directed toward the light source.
The state can be switched between. Hereinafter, referring to FIG. 7, the conical convex refracting surface 6 of the conical prism 6 will be described.
A description will be given of circular illumination performed by directing b toward the light source.

In the conical prism 6 having the conical convex refracting surface 6b facing the light source side, when a circular or annular parallel light beam enters, a circular shape having an outer diameter smaller than the outer diameter of the incident light beam. Are formed. Here, the rate at which the outer diameter is reduced depends on the apex angle, axial thickness, refractive index, and the like of the conical prism 6. Therefore, when the posture of the conical prism 6 is switched from the first state to the second state, a circular shape having an outer diameter smaller than the outer diameter of the annular luminous flux in FIG. A light beam enters. As a result, a circular secondary light source having an outer diameter smaller than the outer diameter of the annular secondary light source in FIG. 2 is formed on the rear focal plane of the fly-eye lens 7.

Further, from the first state of the conical prism 6 to the second state,
In conjunction with the switching to the state, the switching from the annular aperture stop 8 having the annular aperture to the circular aperture stop 8 'is performed. Here, the circular aperture stop 8 ′ has a circular opening having an outer diameter corresponding to the outer diameter of the circular secondary light source formed on the rear focal plane of the fly-eye lens 7. In this way, by switching the attitude of the conical prism 6, the sigma value (aperture stop diameter / pupil diameter of the projection optical system) is larger than that of the annular illumination shown in FIG. Alternatively, it is possible to perform circular illumination with a small numerical aperture on the exit side of the illumination optical system / numerical aperture on the entrance side of the projection optical system.

The exposure according to the present embodiment is performed by electrically, mechanically or optically connecting the optical members, the stages, and the like in the embodiment shown in FIG. 1 so as to achieve the above-described functions. The device can be assembled. In this case, aberrations to be adjusted may remain in the projection optical system of the actually manufactured exposure apparatus due to various factors. Hereinafter, a method for correcting the residual aberration of the projection optical system, and a method for manufacturing the exposure apparatus according to the present embodiment will be described.

FIG. 8 is a flowchart showing a manufacturing flow in the method of manufacturing an exposure apparatus according to the present embodiment. As shown in FIG. 8, in the method of manufacturing the exposure apparatus according to the present embodiment, under the annular illumination in which the conical prism 6 is set to the first state, the non-light remaining in the actually manufactured projection optical system PL is obtained. The point aberration, the curvature of field and the distortion are measured (S11). In the annular illumination, since the light flux near the optical axis is missing near the pupil plane of the projection optical system PL, the spherical aberration and the coma cannot be correctly evaluated.

More specifically, the residual aberration of the projection optical system PL is measured by, for example, a test exposure (test printing) technique. In the test exposure method, a test mark formed at an ideal lattice point on a test mask is statically exposed on a wafer W whose flatness is specially managed through a projection optical system PL. Then, after developing the exposed wafer W, the wafer W is transferred to a measuring device different from the exposing device, and the coordinate position and the amount of positional shift of the transferred test mark are measured, whereby the non-residual remaining in the projection optical system PL is measured. The point aberration, the curvature of field, and the distortion are measured.

It should be noted that the projection optical system PL is not limited to the test exposure technique, but may be, for example, a Fizeau interferometer.
By measuring the wavefront aberration and analyzing the measured wavefront aberration, each aberration component remaining in the projection optical system PL can also be obtained. Further, the residual aberration of projection optical system PL can be measured using, for example, an aerial image detector (not shown) fixed on wafer table WS. In the method using an aerial image detector, an image of a test mark formed at each ideal lattice point on a test mask is projected with illumination light for exposure, and the image is scanned with a knife edge of the aerial image detector. The residual aberration of the projection optical system PL is measured by moving the wafer stage WS two-dimensionally in the X direction and the Y direction and analyzing the waveform of the photoelectric signal output from the aerial image detector at that time. .

Next, the conical prism 6 is moved from the first state to the second state.
The posture is switched to the state (S12). As previously mentioned,
In conjunction with the switching of the conical prism 6 from the first state to the second state, switching from the annular aperture stop 8 to the circular aperture stop 8 'is performed. Thus, the spherical aberration and coma remaining in the projection optical system PL are measured under the circular illumination in which the conical prism 6 is set to the second state (S13). As described above, when measuring spherical aberration and coma,
Test exposure, Fizeau interferometer, aerial image detector, and the like can be used.

Finally, based on the measurement result of the residual aberration of the projection optical system PL obtained under two different illumination conditions, ie, annular illumination and circular illumination, the projection optical system P
L is adjusted (S14). Here, the adjustment of the projection optical system PL is performed by, for example, moving (in the optical axis direction or in the direction orthogonal to the optical axis), tilting, and rotating the optical members constituting the projection optical system PL. Further, the adjustment can be performed by sealing a specific air space in the projection optical system PL against the outside air, and increasing or decreasing the gas pressure in the sealed chamber within a predetermined range. Further, the adjustment can be performed by attaching a predetermined optical member to the projection optical system PL, or by processing or replacing the predetermined optical member.

As described above, according to the manufacturing method of this embodiment,
Astigmatism remaining in the projection optical system PL under annular illumination,
After measuring the field curvature and the distortion, the conical prism 6
The spherical aberration and coma remaining in the projection optical system PL can be measured under circular illumination realized only by switching the posture from the first state to the second state. Moreover,
As described above, the circular illumination has a smaller σ value than the annular illumination, so that spherical aberration and coma can be measured with good sensitivity.

As described above, the exposure apparatus having the adjusted projection optical system is prepared (preparation step), a mask is set on the object plane of the projection optical system (mask setting step), and the exposure plane is set on the image plane of the projection optical system PL. By setting a photosensitive substrate (substrate setting step) and exposing a mask pattern to the photosensitive substrate using an exposure apparatus (exposure step), a micro device (semiconductor element, image pickup element, liquid crystal display element, thin film magnetic head) Etc.) can be manufactured. Hereinafter, an example of a method for obtaining a semiconductor device as a micro device by forming a predetermined circuit pattern on a wafer or the like as a photosensitive substrate using the exposure apparatus of the present embodiment shown in FIG. This will be described with reference to a flowchart.

First, in step 301 of FIG.
A metal film is deposited on the wafers of the lot. In the next step 302, a photoresist is applied on the metal film on the l lot of wafers. Then, step 303
1, an image of a pattern on a mask (reticle) is sequentially exposed and transferred to each shot area on a wafer in the lot through the projection optical system using the exposure apparatus shown in FIG. Thereafter, in step 304, the photoresist on the one lot of wafers is developed, and in step 305, the resist on the one lot of wafers is etched using the resist pattern as a mask to form a pattern on the mask. The corresponding circuit pattern is
It is formed in each shot area on each wafer. Thereafter, a device such as a semiconductor element is manufactured by forming a circuit pattern of an upper layer and the like. According to the above-described semiconductor device manufacturing method, a semiconductor device having an extremely fine circuit pattern can be obtained with high throughput.

In the exposure apparatus shown in FIG. 1, a liquid crystal display element as a micro device can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate). Less than,
An example of the technique at this time will be described with reference to the flowchart in FIG. In FIG. 10, in a pattern forming step 401, a so-called photolithography step of transferring and exposing a reticle pattern to a photosensitive substrate (eg, a glass substrate coated with a resist) using the exposure apparatus of the present embodiment is performed. By this photolithography process, a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate. Thereafter, the exposed substrate is subjected to various steps such as a developing step, an etching step, and a reticle peeling step, whereby a predetermined pattern is formed on the substrate, and the process proceeds to the next color filter forming step 402.

Next, in the color filter forming step 402, three colors corresponding to R (Red), G (Green) and B (Blue)
Many sets of dots are arranged in a matrix,
Alternatively, a color filter in which a plurality of sets of three stripe filters of R, G, and B are arranged in the horizontal scanning line direction is formed. Then, after the color filter forming step 402, a cell assembling step 403 is performed. In the cell assembly step 403, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern formation step 401, the color filter obtained in the color filter formation step 402, and the like. In the cell assembling step 403, for example, a liquid crystal is injected between the substrate having the predetermined pattern obtained in the pattern forming step 401 and the color filter obtained in the color filter forming step 402, and a liquid crystal panel (liquid crystal cell) is formed. ) To manufacture.

Thereafter, in a module assembling step 404, components such as an electric circuit and a backlight for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) are attached to complete a liquid crystal display element. According to the above-described method for manufacturing a liquid crystal display device, a liquid crystal display device having an extremely fine circuit pattern can be obtained with high throughput.

In the above-described embodiment, a conical prism is used as the light beam conversion member. However, by using a pyramid prism instead of the conical prism, a multi-plane light source having a plurality of surface light sources decentered with respect to the optical axis is used. It is also possible to form a polar (quadrupole, octupole, etc.) secondary light source. Hereinafter, as an example, a modified example of forming a quadrupole secondary light source including four surface light sources symmetrically decentered with respect to the optical axis using a regular quadrangular pyramid prism will be described.

The surface on the light source side of the regular quadrangular pyramid prism is composed of four refraction surfaces, and is formed in a pyramid concave shape as a whole toward the light source side. More specifically, the four refractive surfaces are:
It corresponds to a pyramid surface of a square pyramid symmetrical with respect to the optical axis AX (side surface excluding the bottom surface). The mask-side surface of the regular quadrangular pyramid prism includes four refraction surfaces parallel to the four refraction surfaces on the light source side, and is formed in a pyramid convex shape as a whole toward the light source side.

Therefore, when a circular parallel light beam enters, the regular quadrangular pyramid prism deflects along the four directions at equal angles around the optical axis AX, and the four prisms symmetrically decentered with respect to the optical axis. A parallel light beam is formed. That is, in a modified example in which a regular quadrangular pyramid prism is disposed instead of the conical prism 6, four light beams symmetrically decentered with respect to the optical axis, that is, quadrupolar light beams, enter the incident surface B0 of the fly-eye lens 7, Similarly, a quadrupolar secondary light source is formed on the rear focal plane of the fly-eye lens 7. The luminous flux from the quadrupole secondary light source is restricted via a quadrupole aperture stop, which also has a quadrupole aperture.

Also, in the quadrupolar secondary light source, similarly to the annular secondary light source, the inner diameter (inscribed in the four surface light sources) with respect to its outer diameter (diameter of a circle circumscribing the four surface light sources). The ratio of the diameter of the circle is defined as the orbicular zone ratio. Therefore, even in the modified example, by appropriately setting the characteristics (vertical angle, axial thickness, refractive index, etc.) of the regular quadrangular pyramid prism, the elliptical mirror and the 4-pole aperture stop do not substantially lose the light amount. A quadrupole secondary light source having a desired annular ratio can be formed.

By the way, also in the modified example, the posture is changed from the first state for quadrupole illumination with the pyramid concave refraction surface facing the light source side to the second state with the pyramid convex refraction surface facing the light source side. By switching, circular illumination can be performed.
In this case, the switching from the 4-pole aperture stop having the 4-pole aperture to the circular aperture stop is performed in conjunction with the switching of the posture of the regular quadrangular pyramid prism from the first state to the second state. Here, the circular aperture stop has a circular opening having an outer diameter corresponding to the outer diameter of the circular secondary light source formed on the rear focal plane of the fly-eye lens 7. Thus, also in the modified example, by switching the posture of the regular quadrangular pyramid prism, circular illumination having a smaller σ value than quadrupole illumination can be performed without substantially losing the light amount by the elliptical mirror and the circular aperture stop.

In the above-described embodiment, both sides of the conical prism are formed in a conical shape, but a configuration in which only one surface is formed in a conical shape is also possible. Similarly, for the pyramid prism, it is also possible to form only one surface in a pyramid shape without forming both surfaces in a pyramid shape.

Further, the above-described embodiment shows an example in which one conical prism is used. However, without being limited to this, one conical prism or a pyramid prism selected from a plurality of conical prisms and pyramid prisms having different characteristics (vertical angle, axial thickness, refractive index, etc.) is positioned in the illumination light path. It is also possible to adopt a configuration in which: In this case, depending on the characteristics of the conical prism or the pyramid prism positioned in the illumination light path, an annular or multipolar secondary light source having a different annular ratio is formed.

Further, in the above-described embodiment, Japanese Patent Laid-Open No.
Similarly to the illumination optical device disclosed in Japanese Patent Publication No. 188174, an image of the central opening 2b of the elliptical mirror 2 is formed on the incident surface B0 of the fly-eye lens 7, and an image of the peripheral opening 2c is incident on the fly-eye lens 7. It is formed on a surface B1 that is separated from the surface B0 to the light source side to some extent. However, without being limited to this, the image of the elliptical reflecting surface 2a of the elliptical mirror 2 is formed on the incident surface B0 of the fly-eye lens 7, as in the illumination optical device disclosed in, for example, JP-A-6-216008. It can also be configured to do so.

In the above-described embodiment, the fly-eye lens is used as the multiple light source forming means (optical integrator). However, a micro fly-eye can be used instead of the fly-eye lens. The micro fly's eye is formed, for example, by etching a parallel flat glass plate to form a group of microlenses. Here, each micro lens constituting the micro fly's eye is smaller than each lens element constituting the fly's eye lens.

The micro fly's eye is different from a fly's eye lens composed of lens elements separated from each other, and a plurality of micro lenses are formed integrally without being separated from each other. However, a micro fly's eye is the same as a fly's eye lens in that lens elements having positive refractive power are arranged vertically and horizontally. in this case,
By setting the cross-sectional area of each micro element constituting the micro fly's eye to be sufficiently small, it is also possible to omit the arrangement of the aperture stop 8 and not restrict the luminous flux of the secondary light source at all. In addition, as a multiple light source forming means (optical integrator), instead of a fly-eye lens, an internal reflection type integrator (hollow rod, glass rod, etc.)
Can also be used.

In the above-described embodiment, the present invention has been described by taking an exposure apparatus having an illumination optical device as an example. However, the present invention is applied to a general illumination optical device for uniformly illuminating an irradiated surface other than a mask. It is clear that can be applied.

[0078]

As described above, in the illumination optical apparatus of the present invention, in the illumination type in which the mercury lamp is condensed by the elliptical mirror, the optical path between the collimating optical system and the multi-light source forming means (fly-eye lens). By providing a light beam conversion member (cone prism, pyramid prism) therein, an annular or multipolar secondary light source having a desired annular ratio can be obtained without substantially losing the light amount by the aperture stop and the elliptical mirror. Can be formed.

Therefore, in the exposure apparatus provided with the illumination optical apparatus of the present invention, the mask is illuminated by the annular illumination or the multipole illumination having a desired annular ratio while the light quantity loss is suppressed favorably. A good microdevice can be manufactured with high resolving power.

Further, in the illumination optical device of the present invention, it is possible to switch from annular illumination or multipolar illumination to circular illumination having a small σ value only by switching the attitude of the light beam conversion member. Therefore, in the manufacturing method of the exposure apparatus having the illumination optical device of the present invention, for example, distortion aberration, field curvature and astigmatism remaining in the projection optical system under annular illumination or multipolar illumination are measured, The spherical aberration and coma remaining in the projection optical system can be measured under circular illumination realized only by changing the attitude of the light beam conversion member, and the projection optical system can be measured based on the correctly evaluated residual aberration results. Can be satisfactorily adjusted.

[Brief description of the drawings]

FIG. 1 is a diagram schematically showing a configuration of an exposure apparatus including an illumination optical device according to an embodiment of the present invention.

FIG. 2 is a diagram illustrating the operation of a collimating lens system 5 and a conical prism 6 of FIG.

3 is a diagram illustrating the relationship between the light distribution characteristics of the ultrahigh-pressure mercury lamp 1 of FIG. 1 and the shape of the reflecting surface of the elliptical mirror 2. FIG.

FIG. 4 is a diagram showing a light intensity distribution of a secondary light source formed in a comparative example in which the conical prism 6 is not provided.

FIG. 5 is a diagram schematically showing a configuration of an aperture stop 8;

FIG. 6 is a diagram showing a light intensity distribution of a secondary light source formed in the present embodiment provided with a conical prism 6;

FIG. 7 is a diagram corresponding to FIG. 2 and illustrates a state in which the conical prism 6 is switched to a second state to perform circular illumination.

FIG. 8 is a flowchart showing a manufacturing flow in the method of manufacturing the exposure apparatus according to the embodiment.

FIG. 9 is a flowchart of a method for obtaining a semiconductor device as a micro device using the exposure apparatus of the present embodiment.

FIG. 10 is a flowchart of a method for obtaining a liquid crystal display element as a micro device using the exposure apparatus of the present embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Light source 2 Elliptical mirror 4 Shutter 5 Collimating lens system 6 Conical prism 7 Fly-eye lens 8 Aperture stop 9 Condenser optical system 10 Illumination field stop 11 Imaging optical system M Mask MS Mask stage PL Projection optical system W Wafer WS Wafer stage

Claims (15)

[Claims] An illumination optical device for illuminating a surface to be illuminated, comprising: a light source for supplying a light beam; a reflecting surface rotationally symmetric with respect to an optical axis; A reflecting mirror for condensing the light beam from the light source; a collimating optical system for converting the light beam from the light source condensed by the reflecting mirror into a substantially parallel light beam; A multiple light source forming means for forming a substantial surface light source composed of a number of light sources based on the parallel light beam, and a condenser optical system for condensing the light beam from the surface light source and guiding the light beam to the irradiated surface The collimating optical system optically connects a central opening of the reflecting mirror and an incidence surface of the multi-light source forming unit so that a substantially annular light beam is incident on the multi-light source forming unit. Almost conjugate relationship In the optical path between the collimating optical system and the multiple light source forming unit, the incident light beam is converted into a substantially annular light beam or a plurality of light beams decentered with respect to the optical axis. Optical device, provided with a light beam converting member for use. 2. The collimating optical system forms an image of a central opening of the reflecting mirror at a position of an incident surface of the multiple light source forming unit, and a peripheral portion located farthest from the central opening of the reflecting mirror. The illumination optical device according to claim 1, wherein an image of the opening is formed at a position distant from an incident surface of the multiple light source forming unit. 3. The illumination optical apparatus according to claim 1, wherein the collimating optical system forms an image of a reflecting surface of the reflecting mirror at a position of an incident surface of the multiple light source forming unit. 4. The light beam conversion member includes a first refraction surface formed on the light source side and a second refraction surface formed on the irradiation surface side with respect to the first refraction surface. 4. The illumination optical device according to claim 1, wherein at least one of the second refraction surfaces is formed in a conical shape or a pyramid shape. 5. 5. The light beam converting member is disposed closer to the irradiated surface than a position where the light intensity of the substantially parallel light beam passing through the collimating optical system on the optical axis becomes substantially zero. The illumination optical device according to claim 1. 6. The light beam converting member is configured to be switchable between a first state in which the first refraction surface faces the light source and a second state in which the second refraction surface faces the light source. The illumination optical device according to claim 4, wherein the illumination optical device is provided. 7. An illumination optical device according to claim 1, further comprising: a projection optical system configured to project and expose a pattern of a mask set on the surface to be irradiated onto a photosensitive substrate. An exposure apparatus, comprising: 8. A method for manufacturing an exposure apparatus, comprising: the illumination optical device according to claim 6; and a projection optical system for projecting and exposing a mask pattern set on the surface to be irradiated onto a photosensitive substrate. In the above, the light flux conversion member is set to the first state to guide light to the projection optical system, and astigmatism remaining in the projection optical system,
A first measurement step of measuring at least one aberration of field curvature and distortion, setting the light flux conversion member to the second state, guiding light to the projection optical system, and remaining in the projection optical system A second measurement step of measuring at least one of spherical aberration and coma aberration, and adjusting the projection optical system based on a measurement result in the first measurement step and a measurement result in the second measurement step. A method of manufacturing an exposure apparatus, comprising: 9. A method for manufacturing an exposure apparatus having a projection optical system for projecting a pattern formed on a mask onto a photosensitive substrate, wherein light is guided to the projection optical system under a first illumination condition. A first measurement step of measuring a first aberration remaining in the system, and guiding the light to the projection optical system under a second illumination condition different from the first illumination condition, the first measurement process remaining in the projection optical system. A second measurement step of measuring a second aberration different from the aberration; and an adjustment step of adjusting the projection optical system based on the measurement result in the first measurement step and the measurement result in the second measurement step. A method for manufacturing an exposure apparatus, comprising: 10. In the first measurement step, an annular or multipolar shape in which the light intensity increases from the center to the periphery at or near the pupil of the illumination optical system for guiding light to the projection optical system. And forming a second light intensity distribution having a substantially circular light cross section at or near a pupil of an illumination optical system for guiding light to the projection optical system in the second measuring step. The method of manufacturing an exposure apparatus according to claim 9, wherein the exposure apparatus is formed. 11. The exposure according to claim 9, wherein an effective outer diameter of the first light intensity distribution is larger than an effective outer diameter of the second light intensity distribution. Device manufacturing method. 12. The first aberration is at least one of astigmatism, field curvature and distortion, and the second aberration is at least one of spherical aberration and coma. 12. The method according to claim 9, wherein:
13. The method for manufacturing an exposure apparatus according to claim 1. 13. A method of manufacturing an exposure apparatus having a projection optical system for projecting a pattern formed on a mask onto a photosensitive substrate, wherein the projection is performed using an illumination optical system including an optical member having a conical surface or a pyramidal surface. A first measurement step of guiding light to an optical system to measure an aberration remaining in the projection optical system; a first adjustment step of adjusting the optical member; and an illumination including the optical member adjusted by the first adjustment step. A second measurement step of guiding light to the projection optical system using an optical system and measuring aberrations remaining in the projection optical system; and a measurement result in the first measurement step and a measurement result in the second measurement step. Adjusting the projection optical system based on the second
An exposure apparatus manufacturing method, comprising: an adjusting step. 14. A method for manufacturing an exposure apparatus having a projection optical system for projecting a pattern formed on a mask onto a photosensitive substrate, comprising: a multipolar light comprising a ring-shaped light or a plurality of lights decentered from an optical axis. A first measurement step of guiding light to the projection optical system using an illumination optical system including an optical member that forms the light, and measuring an aberration remaining in the projection optical system; and a first adjustment step of adjusting the optical member. A second measurement step of guiding light to the projection optical system using the illumination optical system including the optical member adjusted in the first adjustment step, and measuring an aberration remaining in the projection optical system; A second adjusting the projection optical system based on the measurement result in the measurement step and the measurement result in the second measurement step
An exposure apparatus manufacturing method, comprising: an adjusting step. 15. A preparation step for preparing an exposure apparatus manufactured by the method of manufacturing an exposure apparatus according to claim 8, and a mask for setting the mask on an object plane of the projection optical system. A setting step, a substrate setting step of setting the photosensitive substrate on an image plane of the projection optical system, an exposure step of exposing the pattern of the mask to the photosensitive substrate using the exposure apparatus, and And a developing step of developing the photosensitive substrate.