TWI541385B - Manufacturing method of anode for oxygen generation - Google Patents
Manufacturing method of anode for oxygen generation Download PDFInfo
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- TWI541385B TWI541385B TW101150074A TW101150074A TWI541385B TW I541385 B TWI541385 B TW I541385B TW 101150074 A TW101150074 A TW 101150074A TW 101150074 A TW101150074 A TW 101150074A TW I541385 B TWI541385 B TW I541385B
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Description
本發明係關於各種工業電解所使用的氧產生用陽極及其製造方法;更詳言之,係關於電解銅箔等電解金屬箔製造、鋁液中供電、連續電鍍鋅鋼板製造、金屬採取等工業電解中所使用,在高負荷電解條件下具有優異耐久性的耐高負荷用氧產生用陽極及其製造方法。 The present invention relates to an oxygen generating anode used in various industrial electrolysis and a method for producing the same, and more particularly to an industrial production of electrolytic copper foil such as electrolytic copper foil, power supply in aluminum liquid, continuous electrogalvanizing steel sheet manufacturing, metal taking, and the like. An anode for oxygen generation for high load resistance having excellent durability under high-load electrolysis conditions, and a method for producing the same, used in electrolysis.
在電解銅箔、鋁液中供電、連續電鍍鋅鋼板、金屬採取等工業電解時,因為在陽極會伴隨氧產生,因而陽極大多採用在金屬鈦基體上主要塗敷著當作電極觸媒用之對氧產生具耐性的氧化銥。一般在陽極會伴隨氧產生的此種工業電解,就從生產效率、省能源等層面而言,多數情況係依定電流施行電解。電流密度係設定於從金屬採取等業界主要採用的數A/dm2,至電解銅箔用的最大100A/dm2範圍內。 In industrial electrolysis such as electrolytic copper foil, aluminum liquid supply, continuous electrogalvanized steel sheet, metal take-up, etc., since the anode is accompanied by oxygen generation, the anode is mostly coated on the metal titanium substrate and used as an electrode catalyst. Produces resistant cerium oxide to oxygen. Generally, such industrial electrolysis, which is accompanied by oxygen generation at the anode, is carried out in accordance with a constant current in terms of production efficiency, energy saving, and the like. It is set based on the current density taken from the metal industry and the like is mainly used in a number A / dm 2, the electrolytic copper foil to a maximum of 100A / in the range of dm 2.
但是,近年為求製品的品質提升、及賦予特殊性能,而依300A/dm2~700A/dm2或更高電流密度施行電解的情況亦時有常見。此種高電流可認為並非流通於工業電解設備中所安裝的全部陽極,而是為對依電解所獲得製品的特殊性能,而在成為高負荷電解條件下的特定地方當作輔助陽極設置。 However, in recent years, in order to improve the quality of products and to impart special properties, it is also common to perform electrolysis at a current density of 300 A/dm 2 to 700 A/dm 2 or higher. Such a high current is considered not to flow through all the anodes installed in the industrial electrolysis apparatus, but to the special properties of the products obtained by electrolysis, and is set as an auxiliary anode in a specific place under high-load electrolysis conditions.
在此種高電流密度的電解下,因為對電極觸媒層的負荷提高,且容易發生電流集中,因而加速電極觸媒層的消耗。又, 為求製品的安定化而有添加有機物、雜質元素,因而會引發各種電化學反應、化學反應,導致因氧產生反應而衍生的氫離子濃度提高(pH降低),造成電極觸媒的消耗更加快速。 Under such high current density electrolysis, since the load on the electrode catalyst layer is increased and current concentration is likely to occur, the consumption of the electrode catalyst layer is accelerated. also, In order to stabilize the product, organic substances and impurity elements are added, which causes various electrochemical reactions and chemical reactions, resulting in an increase in the concentration of hydrogen ions (pH lowering) derived from the oxygen generation reaction, resulting in faster consumption of the electrode catalyst. .
為解決此種情形,增加電極觸媒層的表面積而降低實際電流負荷可認為便屬解決策略之一。例如藉由取代習知的板基材,改為使用篩網、沖孔金屬板等基材,而物理性增加表面積亦屬一種解決策略。但是,若使用該等基材,會出現因多餘的加工費用而衍生成本提高等缺失。又,藉由物理性增加基材表面積便會降低實際電流密度,但並不會改善電流集中於電極觸媒層,對觸媒消耗的抑制效果僅些微而已。 To solve this situation, increasing the surface area of the electrode catalyst layer and reducing the actual current load is considered to be one of the solution strategies. For example, by replacing a conventional plate substrate, a substrate such as a mesh or a punched metal plate is used instead, and physical increase in surface area is also a solution strategy. However, if such substrates are used, there is a loss of a derivative cost due to excessive processing costs. Moreover, by actually increasing the surface area of the substrate, the actual current density is lowered, but the current is not concentrated on the electrode catalyst layer, and the effect on the catalyst consumption is only slightly reduced.
再者,電極觸媒層重複塗佈~煅燒的熱分解形成方法,若簡單思考,假設能增加每1次的銥塗佈量,便可形成鬆軟的觸媒層,僅依靠此種方法,就電極的觸媒層有效表面積增加僅些微而已,並未明確發現抑制高負荷條件下的觸媒層消耗、與耐久性提升效果。 Furthermore, the electrode catalyst layer is repeatedly coated and calcined to form a thermal decomposition method. If simple thinking is made, it is assumed that the amount of ruthenium coating can be increased every time to form a soft catalyst layer, and only by this method is used. The effective surface area of the catalyst layer of the electrode is only slightly increased, and it has not been clearly found that the catalyst layer consumption and the durability improvement effect under high load conditions are suppressed.
此種電解用電極要求氧產生電位低、且壽命長的電極。習知此種電極係使用在鈦等導電性金屬基體上,利用含有貴金屬或貴金屬氧化物的觸媒層予以被覆之不溶性電極。例如專利文獻1有揭示:在鈦等導電性金屬基體上,將含有氧化銥與閥金屬氧化物的觸媒層在650℃~850℃氧化環境中施行加熱煅燒,而成為具有閥金屬氧化物其中一部分經結晶化之觸媒層的不溶性電極。但是,因為該電極係在650℃以上的 高溫下施行煅燒,因而會出現鈦等金屬基體的界面腐蝕,導致鈦等金屬基體成為不良導電體,造成氧過電壓上昇,致使無法使用為電極。又,觸媒層中的氧化銥晶粒徑變大,結果會有觸媒層的有效表面積變小、觸媒活性差的缺點。 Such an electrode for electrolysis requires an electrode having a low oxygen generating potential and a long life. Conventionally, such an electrode is used as an insoluble electrode coated on a conductive metal substrate such as titanium and coated with a catalyst layer containing a noble metal or a noble metal oxide. For example, Patent Document 1 discloses that a catalyst layer containing cerium oxide and a valve metal oxide is heated and calcined in an oxidizing atmosphere of 650 ° C to 850 ° C on a conductive metal substrate such as titanium to form a valve metal oxide. A portion of the insoluble electrode of the crystallized catalyst layer. However, because the electrode is above 650 ° C When calcination is performed at a high temperature, interfacial corrosion of a metal substrate such as titanium occurs, and a metal substrate such as titanium becomes a poor electric conductor, causing an increase in oxygen overvoltage, making it impossible to use it as an electrode. Further, the particle size of the cerium oxide in the catalyst layer is increased, and as a result, the effective surface area of the catalyst layer is small and the catalyst activity is poor.
再者,專利文獻2有揭示:在鈦等導電性金屬基體上,設置由非晶質氧化銥及非晶質氧化鉭混雜的觸媒層,並使用鍍銅及銅箔製造用陽極。但是,因為該電極係以非晶質氧化銥為特徵,因而電極耐久性嫌不足。若成為非晶質氧化銥,便會導致耐蝕性降低的理由,係非晶質氧化銥屬於非晶質狀態,相較於結晶性氧化銥之下,銥與氧間之鍵結呈不穩定。 Further, Patent Document 2 discloses that a catalyst layer in which an amorphous yttrium oxide and an amorphous yttrium oxide are mixed is provided on a conductive metal substrate such as titanium, and an anode for copper plating and copper foil production is used. However, since the electrode is characterized by amorphous cerium oxide, the electrode durability is insufficient. When amorphous yttrium oxide is formed, the reason why the corrosion resistance is lowered is that the amorphous cerium oxide is in an amorphous state, and the bond between cerium and oxygen is unstable compared to the crystalline cerium oxide.
再者,專利文獻3有揭示:為抑制觸媒層消耗、提升電極耐久性,而被覆著由結晶質氧化銥所構成下層、與由非晶質氧化銥所構成上層的雙層構造觸媒層之電極。然而,專利文獻3所揭示的電極,因為觸媒層上層係由非晶質氧化銥構成,因而電極耐久性不足。又,結晶質氧化銥僅存在於下層,觸媒層全體並未呈均勻性分佈,導致電極耐久性不足。 Further, Patent Document 3 discloses that a double-layered catalytic layer composed of a crystalline lower layer of cerium oxide and an upper layer composed of amorphous cerium oxide is coated in order to suppress the consumption of the catalyst layer and improve the durability of the electrode. The electrode. However, in the electrode disclosed in Patent Document 3, since the upper layer of the catalyst layer is composed of amorphous ruthenium oxide, the electrode durability is insufficient. Further, the crystalline cerium oxide is only present in the lower layer, and the entire catalyst layer is not uniformly distributed, resulting in insufficient electrode durability.
再者,專利文獻4係有揭示:以在鈦等導電性金屬基體上含有非晶質氧化銥為必要要件,設置由結晶質氧化銥與非晶質氧化銥混雜的觸媒層之鋅電解採取用陽極;專利文獻5有揭示:以在鈦等導電性金屬基體上含有非晶質氧化銥為必要要件,設置由氧化銥結晶質與氧化銥非晶質混雜的觸媒層之鈷電解採取用陽極。然而,因為任一種電極均係以含有大 量非晶質氧化銥為必要要件,因而可認為電極耐久性不足。 Further, Patent Document 4 discloses that zinc oxide is provided by a catalyst layer in which a mixed layer of crystalline cerium oxide and amorphous cerium oxide is contained, in which an amorphous cerium oxide is contained on a conductive metal substrate such as titanium. In the case of an anode, it is disclosed in Patent Document 5 that it is necessary to contain an amorphous yttrium oxide on a conductive metal substrate such as titanium, and a cobalt electrolysis layer in which a cerium oxide crystal and a cerium oxide amorphous mixed catalyst layer are provided is used. anode. However, because any of the electrodes are large The amount of amorphous cerium oxide is an essential component, and thus it is considered that the electrode durability is insufficient.
本發明者等為解決該等問題,主要目的在於降低氧產生過電壓,開發出:當每1次的銥塗佈量在2g/m2以下時,(1)形成依低溫煅燒(370℃~400℃)+高溫後烘烤(520℃~600℃)形成之結晶質氧化銥與非晶質氧化銥混雜的觸媒層之煅燒方法、及(2)僅含有依高溫煅燒(410℃~450℃)+高溫後烘烤(520℃~560℃)形成之略完全結晶質氧化銥的觸媒層之煅燒方法,遂於連同本申請案於同日內提出2件專利申請案。 In order to solve these problems, the inventors of the present invention have mainly aimed at reducing the overvoltage of oxygen generation, and developed that (1) formation of low temperature calcination (370 ° C~) when the amount of ruthenium coating per one time is 2 g/m 2 or less 400 ° C) + high temperature post-baking (520 ° C ~ 600 ° C) formed by the formation of crystalline cerium oxide and amorphous cerium oxide mixed catalyst layer calcination method, and (2) only contains high temperature calcination (410 ° C ~ 450 °C) + high temperature post-baking (520 ° C ~ 560 ° C) formed a slightly complete crystalline cerium oxide catalyst layer calcination method, together with this application filed two patent applications in the same day.
根據該2件發明,在100A/dm2以下電流密度的電解條件,當每1次的銥塗佈量在2g/m2以下時,便可達成鉛不易附著性,且藉由增加觸媒層有效面積而達成提升耐久性、降低氧產生過電壓。 According to the two inventions, in the electrolysis conditions of a current density of 100 A/dm 2 or less, when the amount of ruthenium coating per one time is 2 g/m 2 or less, the lead is less likely to adhere and the catalyst layer is increased. The effective area is achieved to improve durability and reduce oxygen generation overvoltage.
然而,近年為求製品的品質提升、及賦予特殊性能,而依300A/dm2~700A/dm2或更高電流密度施行電解的情況亦時有常見。此種高電流可認為並非流通於工業電解設備中所安裝的全部陽極,而是為對依電解所獲得製品的特殊性能,而在成為高負荷電解條件下的特定地方當作輔助陽極設置。 However, in recent years, for the sake of quality improvement of the article, and to impart special properties, and according to 300A / dm 2 ~ 700A / dm 2 or higher current density electrolysis purposes is also the case when there is common. Such a high current is considered not to flow through all the anodes installed in the industrial electrolysis apparatus, but to the special properties of the products obtained by electrolysis, and is set as an auxiliary anode in a specific place under high-load electrolysis conditions.
在此種高電流密度的電解下,因為對電極觸媒層的負荷提高,且容易發生電流集中,因而電極觸媒層的消耗變為快速,且為求製品的安定化而有添加有機物、雜質元素,因而會引發各種電化學反應、化學反應,導致因氧產生反應而衍生的氫離子濃度提高(pH降低),造成電極觸媒的消耗更加 快速,故得知根據本發明者等所提申的上述2件專利申請案發明,並無法充分達成利用增加觸媒層的有效面積,而提升耐久性、降低氧產生過電壓。 Under such high current density electrolysis, since the load on the electrode catalyst layer is increased and current concentration is likely to occur, the consumption of the electrode catalyst layer becomes fast, and organic matter and impurities are added for stabilization of the product. The element, thus causing various electrochemical reactions and chemical reactions, leads to an increase in the concentration of hydrogen ions (pH lowering) derived from the reaction of oxygen, resulting in more consumption of the electrode catalyst. In view of the above-mentioned two patent application inventions proposed by the inventors of the present invention, it is not possible to sufficiently achieve an increase in durability and a reduction in oxygen generation overvoltage by increasing the effective area of the catalyst layer.
專利文獻1:日本專利特開2002-275697號公報(專利第3654204號) Patent Document 1: Japanese Patent Laid-Open Publication No. 2002-275697 (Patent No. 3654204)
專利文獻2:日本專利特開2004-238697號公報(專利第3914162號) Patent Document 2: Japanese Patent Laid-Open Publication No. 2004-238697 (Patent No. 3914162)
專利文獻3:日本專利特開2007-146215號公報 Patent Document 3: Japanese Patent Laid-Open Publication No. 2007-146215
專利文獻4:日本專利特開2009-293117號公報(專利第4516617號) Patent Document 4: Japanese Patent Laid-Open Publication No. 2009-293117 (Patent No. 4516617)
專利文獻5:日本專利特開2010-1556號公報(專利第4516618號) Patent Document 5: Japanese Patent Laid-Open Publication No. 2010-1556 (Patent No. 4516618)
本發明為解決該等問題,提供:在高負荷條件下,藉由增加電極觸媒層的有效表面積,俾改善對電極觸媒層的電流分佈,能抑制電極觸媒消耗、提升電極觸媒耐久性,在高負荷電解條件下具有優異耐久性的耐高負荷用氧產生用陽極及其製造方法。 In order to solve the above problems, the present invention provides: under high load conditions, by increasing the effective surface area of the electrode catalyst layer, improving the current distribution of the electrode catalyst layer, suppressing electrode catalyst consumption, and improving electrode catalyst durability. An anode for high-resistance oxygen generation which has excellent durability under high-load electrolysis conditions and a method for producing the same.
本發明第1課題解決手段係為達成上述目的,所提供的氧產生用陽極,係具備有:導電性金屬基體、以及形成於該導電性金屬基體上且含有氧化銥的觸媒層;其中,該觸媒層每1次的銥塗佈量達2g/m2以上,在430℃~480℃較高溫區域中施行加熱煅燒,而形成含有非晶質氧化銥的觸媒層,接著含有該非晶質氧化銥的上述觸媒層依520℃~600℃的更高溫區域施行後烘烤,而使該觸媒層中的氧化銥略全量結晶化。 In order to achieve the above object, the first aspect of the present invention provides an anode for oxygen generation, comprising: a conductive metal substrate; and a catalyst layer formed on the conductive metal substrate and containing ruthenium oxide; the catalyst layer per one volume of iridium coated 2g / m 2 or more, calcined at higher temperature heating purposes region 430 ℃ ~ 480 ℃ in to form a catalyst layer containing amorphous iridium oxide, the amorphous subsequently comprising The above-mentioned catalyst layer of the cerium oxide is post-baked in a higher temperature region of 520 ° C to 600 ° C, and the cerium oxide in the catalyst layer is slightly crystallized.
本發明第2課題解決手段係為達成上述目的,所提供的氧產生用陽極,係具備有:導電性金屬基體、以及形成於該導電性金屬基體上且含有氧化銥的觸媒層;其中,該觸媒層每1次的銥塗佈量達2g/m2以上;上述後烘烤後的觸媒層中之氧化銥結晶化度係設定為80%以上。 The second object of the present invention is to provide an anode for oxygen generation, comprising: a conductive metal substrate; and a catalyst layer containing ruthenium oxide formed on the conductive metal substrate; The amount of ruthenium coating per one time of the catalyst layer was 2 g/m 2 or more, and the degree of crystallization of cerium oxide in the catalyst layer after the post-baking was set to 80% or more.
本發明第3課題解決手段係為達成上述目的,所提供的氧產生用陽極,係具備有:導電性金屬基體、以及形成於該導電性金屬基體上且含有氧化銥的觸媒層;其中,該觸媒層每1次的銥塗佈量達2g/m2以上;上述觸媒層中的氧化銥晶粒徑係設定為9.0nm以下。 The third aspect of the present invention provides an anode for oxygen generation, comprising: a conductive metal substrate; and a catalyst layer containing ruthenium oxide formed on the conductive metal substrate; The amount of ruthenium coating per one time of the catalyst layer is 2 g/m 2 or more, and the oxidized twin crystal grain size in the catalyst layer is set to 9.0 nm or less.
本發明第4課題解決手段係為達成上述目的,所提供的氧產生用陽極,係具備有:導電性金屬基體、以及形成於該導電性金屬基體上且含有氧化銥的觸媒層;其中,在形成該觸媒層之前,便於上述導電性金屬基體上,利用電弧離子鍍(以 下稱「AIP」)法,形成含有鉭與鈦成分的AIP底塗層。 According to a fourth aspect of the present invention, in an object of the present invention, there is provided an anode for oxygen generation comprising: a conductive metal substrate; and a catalyst layer formed on the conductive metal substrate and containing ruthenium oxide; Before forming the catalyst layer, it is convenient to use arc ion plating on the conductive metal substrate Hereinafter, the "AIP" method is used to form an AIP undercoat layer containing bismuth and titanium components.
本發明第5課題解決手段係為達成上述目的,所提供的氧產生用陽極之製造方法,係在導電性金屬基體的表面上,將該觸媒層每1次的銥塗佈量設定為2g/m2以上,並利用依430℃~480℃較高溫區域施行加熱煅燒,而形成含有非晶質氧化銥的觸媒層,然後再將該含有非晶質氧化銥的觸媒層依520℃~600℃的更高溫區域施行後烘烤,而使該觸媒層中的氧化銥略全量結晶化。 According to a fifth aspect of the present invention, in order to achieve the above object, a method for producing an anode for generating oxygen is provided on a surface of a conductive metal substrate, and the amount of ruthenium coating per one time of the catalyst layer is set to 2 g. /m 2 or more, and using a calcination in a relatively high temperature region of 430 ° C to 480 ° C to form a catalyst layer containing amorphous cerium oxide, and then the catalyst layer containing amorphous cerium oxide is 520 ° C Post-baking is performed in a higher temperature region of ~600 ° C, and the cerium oxide in the catalyst layer is slightly crystallized.
本發明第6課題解決手段係為達成上述目的,所提供的氧產生用陽極之製造方法,係在導電性金屬基體的表面上,將該觸媒層每1次的銥塗佈量設定為2g/m2以上,並利用依430℃~480℃較高溫區域施行加熱煅燒,而形成含有非晶質氧化銥的觸媒層,然後,再將該含有非晶質氧化銥的觸媒層依520℃~600℃的更高溫區域施行後烘烤,而使該觸媒層中的氧化銥結晶化度達80%以上。 According to a sixth aspect of the present invention, in order to achieve the above object, a method for producing an anode for generating oxygen is provided on a surface of a conductive metal substrate, and the amount of coating of the catalyst layer per one time is set to 2 g. /m 2 or more, and using a heating zone calcined in a relatively high temperature region of 430 ° C to 480 ° C to form a catalyst layer containing amorphous cerium oxide, and then the catalyst layer containing amorphous cerium oxide is 520 The post-baking is performed in a higher temperature region of °C to 600 °C, and the degree of crystallization of cerium oxide in the catalyst layer is more than 80%.
本發明第7課題解決手段係為達成上述目的,所提供的氧產生用陽極之製造方法,係將該觸媒層每1次的銥塗佈量設定為2g/m2以上,並利用依430℃~480℃較高溫區域施行加熱煅燒,而形成含有非晶質氧化銥的觸媒層,然後,再將該含有非晶質氧化銥的觸媒層依520℃~600℃的更高溫區域施行後烘烤,而使該觸媒層中的氧化銥晶粒徑在9.0nm以下。 According to a seventh aspect of the present invention, in a method for producing an anode for oxygen generation, which is to achieve the above object, the amount of ruthenium coating per one time of the catalyst layer is set to 2 g/m 2 or more, and 430 is used. Heating and calcining in a relatively high temperature range of °C~480°C to form a catalyst layer containing amorphous cerium oxide, and then performing the catalyst layer containing amorphous cerium oxide at a higher temperature region of 520 ° C to 600 ° C After baking, the cerium oxide crystal grain size in the catalyst layer is 9.0 nm or less.
本發明第8課題解決手段係為達成上述目的,所提供的氧產生用陽極之製造方法,係具備有:導電性金屬基體、以及形成於該導電性金屬基體上且含有氧化銥之觸媒層的氧產生用陽極之製造方法;在形成該觸媒層之前,便於上述導電性金屬基體上利用AIP法形成含有鉭與鈦成分的AIP底塗層。 In order to achieve the above object, a method for producing an anode for oxygen generation according to the present invention includes: a conductive metal substrate; and a catalyst layer containing ruthenium oxide formed on the conductive metal substrate A method for producing an anode for oxygen generation; and forming an AIP undercoat layer containing a bismuth and titanium component by the AIP method on the conductive metal substrate before forming the catalyst layer.
本發明係在含有氧化銥的電極觸媒層形成中,將該觸媒層每1次的銥塗佈量設定為2g/m2以上,取代習知依氧化銥結晶完全析出溫度的500℃以上重複施行煅燒,改為依2階段施行煅燒,首先依430℃~480℃較高溫區域施行加熱煅燒,而形成含有非晶質氧化銥的觸媒層,然後,依520℃~600℃的更高溫區域施行後烘烤,而將電極觸媒層中的氧化銥晶粒徑抑制為較小,較佳係使晶粒徑在9.0nm以下,且使氧化銥大部分呈結晶化,較佳係結晶化度達80%以上的結晶化,便可抑制氧化銥的晶粒徑成長,且能增加觸媒層的有效表面積。所以,根據本發明,之所以能抑制氧化銥的晶粒徑成長,其理由可認為依2階段施行煅燒,因為首先依430℃~480℃較高溫區域重複施行塗佈與煅燒,因而即便爾後依520℃~600℃的更高溫區域施行後烘烤,晶粒徑相較於如習知法般的從最初起便施行高溫煅燒之情況下,晶粒徑不會變大超過某程度以上。依此,氧化銥的晶粒徑成長便受抑制, 晶粒徑越小,則觸媒層的有效表面積便越增加,便可降低電極的氧產生過電壓,促進氧產生,且可抑制從鉛離子中生成PbO2的反應。所以,能制止PbO2朝電極上的附著.被覆。 In the present invention, in the formation of an electrode catalyst layer containing ruthenium oxide, the amount of ruthenium coating per one time of the catalyst layer is set to 2 g/m 2 or more, instead of 500 ° C or more, which is based on the complete precipitation temperature of cerium oxide crystals. The calcination is repeated, and the calcination is carried out according to the two stages. First, the calcination is carried out in a relatively high temperature region of 430 ° C to 480 ° C to form a catalyst layer containing amorphous cerium oxide, and then, at a higher temperature of 520 ° C to 600 ° C. The area is post-baking, and the particle size of the cerium oxide in the electrode catalyst layer is suppressed to be small, preferably the crystal grain size is below 9.0 nm, and most of the cerium oxide is crystallized, preferably crystallization. The crystallization of more than 80% of the degree of crystallization can suppress the growth of the crystal grain size of the cerium oxide and increase the effective surface area of the catalyst layer. Therefore, according to the present invention, it is possible to suppress the growth of the crystal grain size of cerium oxide. The reason for this is considered to be calcination in two stages, because the coating and calcination are repeatedly carried out in a relatively high temperature region of 430 ° C to 480 ° C, so that even after The post-baking is carried out in a higher temperature region of 520 ° C to 600 ° C, and the crystal grain size does not become larger than a certain degree in the case where the crystal grain size is subjected to high-temperature calcination from the beginning as in the conventional method. Accordingly, the crystal grain size growth of cerium oxide is suppressed, and the smaller the crystal grain size, the more the effective surface area of the catalyst layer is increased, thereby reducing the oxygen generation overvoltage of the electrode, promoting oxygen generation, and suppressing lead. A reaction in which PbO 2 is formed in ions. Therefore, it is possible to prevent the adhesion of PbO 2 to the electrode.
再者,根據本發明,同時藉由增加觸媒層的有效表面積,便使電流分佈呈分散,俾可抑制電流集中,抑制因電解造成的觸媒層消耗,俾提升電極耐久性。 Further, according to the present invention, by increasing the effective surface area of the catalyst layer, the current distribution is dispersed, and current concentration can be suppressed, the consumption of the catalyst layer due to electrolysis can be suppressed, and the durability of the electrode can be improved.
再者,根據本發明,藉由將該觸媒層每1次的銥塗佈量設定為2g/m2以上,便可提升製品的品質、賦予特殊性能,因而即便依300A/dm2~700A/dm2或以上的電流密度施行電解時,或者為對依電解所獲得製品賦予特殊性能,而在成為高負荷電解條件下的特定地方當作輔助陽極設置時,仍可減輕對電極觸媒層的負荷,且可防止電流集中、抑制電極觸媒層消耗。 Further, according to the present invention, by setting the amount of ruthenium coating per one time of the catalyst layer to 2 g/m 2 or more, the quality of the product can be improved and special properties can be imparted, so that even at 300 A/dm 2 to 700 A / dm 2 current density at or above the electrolysis purposes, or for the time obtained by electrolysis products impart special properties, becomes a specific place in the high load condition as auxiliary anode electrolysis provided, can lessen the electrode catalyst layer The load can prevent current concentration and suppress the consumption of the electrode catalyst layer.
以下,針對本發明的實施態樣一併與圖式進行詳細說明。本發明中,以抑制氧化鉛對電極表面的附著反應為目的,發現若增加電極觸媒層的有效表面積,便可降低氧產生過電壓,藉此可促進氧產生,且能抑制氧化鉛的附著反應。又,本發明同時為能提升電極耐久性,認為觸媒層的氧化銥必需主要為結晶質,經重複實驗遂完成本發明。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the present invention, in order to suppress the adhesion reaction of lead oxide on the surface of the electrode, it has been found that increasing the effective surface area of the electrode catalyst layer can reduce the overvoltage of oxygen generation, thereby promoting oxygen generation and suppressing adhesion of lead oxide. reaction. Further, in the present invention, at the same time, the durability of the electrode can be improved, and it is considered that the cerium oxide of the catalyst layer must be mainly crystalline, and the present invention has been completed through repeated experiments.
本發明係依2階段施行煅燒,首先依430℃~480℃較高溫區域煅燒形成含有非晶質IrO2的觸媒層,然後再依 520℃~600℃得更高溫區域施行後烘烤,而使觸媒層的氧化銥呈略完全結晶化。 The invention performs calcination according to two stages, firstly calcining to form a catalyst layer containing amorphous IrO 2 in a relatively high temperature region of 430 ° C to 480 ° C, and then performing post-baking at a higher temperature region according to 520 ° C to 600 ° C, and The cerium oxide of the catalyst layer is slightly crystallized.
根據本發明者的實驗,得知含有非晶質氧化銥的觸媒層雖可大幅增加有效表面積,但因電解造成的非晶質氧化銥消耗卻相當快速,耐久性相對的降低。即,認為若觸媒層的氧化銥沒有結晶化,便無法提升電極耐久性。所以,本發明目的為能達成增加電極觸媒層的有效表面積,俾降低電極之過電壓,本發明係藉由施行高溫煅燒+高溫後烘烤的2階段煅燒,便可控制觸媒層的氧化銥晶粒徑,可析出較習知物更小的氧化銥結晶,相較於習知物之下,可增加電極觸媒層的有效表面積,便可實現降低過電壓。 According to experiments by the inventors, it has been found that although the catalyst layer containing amorphous cerium oxide can greatly increase the effective surface area, the consumption of amorphous cerium oxide due to electrolysis is relatively fast, and the durability is relatively lowered. That is, it is considered that if the cerium oxide of the catalyst layer is not crystallized, the durability of the electrode cannot be improved. Therefore, the object of the present invention is to increase the effective surface area of the electrode catalyst layer and reduce the overvoltage of the electrode. The present invention can control the oxidation of the catalyst layer by performing two-stage calcination of high temperature calcination + high temperature post-baking. The twin crystal grain size can precipitate smaller cerium oxide crystals than the conventional ones, and the effective surface area of the electrode catalyst layer can be increased compared with the conventional ones, thereby reducing the overvoltage.
本發明中,於導電性金屬基體的表面上,利用依430℃~480℃較高溫區域施行加熱煅燒,而形成含有非晶質氧化銥的觸媒層,然後,再將該非晶質氧化銥的觸媒層依520℃~600℃得更高溫區域施行後烘烤,而使觸媒層的氧化銥呈略完全結晶化。 In the present invention, the surface of the conductive metal substrate is heated and calcined in a relatively high temperature region of 430 ° C to 480 ° C to form a catalyst layer containing amorphous cerium oxide, and then the amorphous cerium oxide is further formed. The catalyst layer is post-baked in a higher temperature region at 520 ° C to 600 ° C, and the cerium oxide of the catalyst layer is slightly completely crystallized.
藉由將本發明氧化銥觸媒層每1次之銥塗佈量設定為2g/m2以上,便可提升製品的品質、賦予特殊性能,因而即便依300A/dm2~700A/dm2或以上的電流密度施行電解時,或者為對依電解所獲得製品賦予特殊性能,而在成為高負荷電解條件下的特定地方當作輔助陽極設置時,仍可減輕對電極觸媒層的負荷,且可防止電流集中、抑制電極觸媒層消耗。 By setting the amount of the cerium oxide catalyst layer of the present invention to 2 g/m 2 or more per liter, the quality of the product can be improved and the special properties can be imparted, so that even at 300 A/dm 2 to 700 A/dm 2 or When the above current density is subjected to electrolysis, or special properties are imparted to the product obtained by electrolysis, and the auxiliary anode is disposed at a specific place under high-load electrolysis conditions, the load on the electrode catalyst layer can be alleviated, and It can prevent current concentration and suppress electrode catalyst layer consumption.
再者,根據本發明依上述較高溫區域的煅燒溫度430℃~480℃、與更高溫區域的後烘烤溫度之溫度範圍520℃~600℃,係依照觸媒層中所形成氧化銥的結晶粒徑與結晶化度便可求得,依照上述溫度範圍便可形成氧過電壓較低、且耐蝕性佳的觸媒層。 Furthermore, according to the present invention, the calcination temperature in the higher temperature region is 430 ° C to 480 ° C, and the post-baking temperature in the higher temperature region is in the range of 520 ° C to 600 ° C according to the crystallization of yttrium oxide formed in the catalyst layer. The particle size and the degree of crystallization can be obtained, and a catalyst layer having a low oxygen overvoltage and excellent corrosion resistance can be formed in accordance with the above temperature range.
本發明中,將電極觸媒層中的氧化銥晶粒徑抑制於較小,較佳係設定為晶粒徑在9.0nm以下,且氧化銥的大部分呈結晶化,較佳係依結晶化度達80%以上進行結晶化,藉此便可抑制氧化銥的晶粒徑成長,且能增加觸媒層的有效表面積。 In the present invention, the particle size of the cerium oxide in the electrode catalyst layer is suppressed to be small, and it is preferable to set the crystal grain size to 9.0 nm or less, and most of the cerium oxide is crystallized, preferably depending on the crystallization. Crystallization is carried out at a degree of 80% or more, whereby the crystal grain size growth of cerium oxide can be suppressed, and the effective surface area of the catalyst layer can be increased.
再者,在形成該觸媒層之前,於上述導電性金屬基體上設置含有鉭與鈦成分的AIP底塗層時,便可更加防止金屬基體的界面腐蝕。 Further, when an AIP undercoat layer containing a bismuth and a titanium component is provided on the conductive metal substrate before the formation of the catalyst layer, interfacial corrosion of the metal substrate can be further prevented.
再者,亦可取代AIP底塗層,改為形成由TiTaOx氧化物層構成的底塗層。 Further, instead of the AIP undercoat layer, an undercoat layer composed of a TiTaO x oxide layer may be formed instead.
使用AIP被覆鈦基材,並以IrCl3/Ta2Cl5的鹽酸水溶液為塗佈液,依每1次3g-Ir/m2施行塗佈,再依IrO2會部分性結晶化的溫度施行(430~480℃)的煅燒,而使形成觸媒層。重複上述塗佈/煅燒步驟直到成為必要觸媒載持量為止後,再依更高溫度(520℃~600℃)實施1小時的後烘烤,便製得電極樣品。針對所製得樣品施行利用XRD進行的觸媒層IrO2結晶性、氧產生過電壓、電極靜電容等測定、以及硫酸.明膠電解評價、鉛附著試驗評價。 The titanium substrate was coated with AIP, and an aqueous solution of IrCl 3 /Ta 2 Cl 5 was used as a coating liquid, and applied at a rate of 3 g-Ir/m 2 per one time, and then subjected to partial crystallization at a temperature of IrO 2 . Calcination (430 ~ 480 ° C), so that the formation of a catalyst layer. The coating/calcination step was repeated until the necessary catalyst loading amount was reached, and then post-baking was performed at a higher temperature (520 ° C to 600 ° C) for 1 hour to prepare an electrode sample. The catalyst layer IrO 2 crystallinity, oxygen generation overvoltage, electrode electrostatic capacitance, etc., and sulfuric acid were measured by XRD. Evaluation of gelatin electrolysis and lead adhesion test.
結果,雖所形成觸媒層的IrO2大部分呈結晶質,但晶粒徑變小,可增加電極有效表面積。經施行加速電解壽命評價,如後述,硫酸電解壽命係習知物約1.4倍,明膠電解壽命係習知物約1.5倍,確認到耐久性提升效果。 As a result, although most of the IrO 2 formed in the catalyst layer is crystalline, the crystal grain size becomes small, and the effective surface area of the electrode can be increased. The accelerated electrolytic life evaluation was carried out, and as described later, the sulfuric acid electrolytic life was about 1.4 times as long as the conventional one, and the gelatin electrolytic life was about 1.5 times as long as the conventional one, and the durability improvement effect was confirmed.
以下,敘述本發明的實驗條件及方法。為調查非晶質氧化銥的形成溫度、與爾後施行結晶化的後烘烤溫度範圍,便製作表1所示試料,並施行X射線繞射分析、循環伏安、及氧產生過電壓等測定。 Hereinafter, the experimental conditions and methods of the present invention will be described. In order to investigate the formation temperature of amorphous yttrium oxide and the post-baking temperature range after crystallization, the samples shown in Table 1 were prepared, and X-ray diffraction analysis, cyclic voltammetry, and oxygen generation overvoltage were measured. .
試料的製作方法係如下。 The preparation method of the sample is as follows.
對JIS I種鈦板的表面利用鐵網(G120尺寸)施行乾式噴砂處理,接著再於沸騰濃鹽酸水溶液中施行10分鐘酸洗處理,而施行電極金屬基體的洗淨處理。經洗淨過的電極金屬基體安裝於蒸發源係使用Ti-Ta合金靶材的電弧離子鍍裝置中,對電極金屬基體表面施行鉭與鈦合金底塗層塗敷被覆。被覆條件係如表1所示。 The surface of the JIS I titanium plate was subjected to a dry blasting treatment using an iron mesh (G120 size), and then subjected to a pickling treatment in a boiling concentrated aqueous hydrochloric acid solution for 10 minutes to carry out a washing treatment of the electrode metal substrate. The cleaned electrode metal substrate is attached to an arc ion plating apparatus using a Ti-Ta alloy target in an evaporation source, and a surface of the electrode metal substrate is coated with a titanium alloy undercoat layer. The coating conditions are shown in Table 1.
其次,上述被覆處理畢金屬基體在空氣循環式電爐中施行530℃、180分鐘的熱處理。 Next, the above-mentioned coated and treated metal substrate was subjected to heat treatment at 530 ° C for 180 minutes in an air circulating electric furnace.
其次,將四氯化銥與五氯化鉭溶解於濃鹽酸中而成為塗佈液,塗佈於上述被覆處理完畢金屬基體上,經乾燥後,於空氣循環式電爐中依表2所示溫度施行15分鐘的熱分解被覆,便形成由氧化銥與氧化鉭的混合氧化物所構成電極觸媒層。上述塗佈液的量係設定為塗佈液每1次的塗佈厚度,依換算成銥金屬為大致3.0g/m2狀態,重複該塗佈~煅燒的操作計9次,便獲得依銥金屬換算約27.0g/m2的電極觸媒層。 Next, antimony tetrachloride and antimony pentachloride are dissolved in concentrated hydrochloric acid to form a coating liquid, which is applied onto the coated metal substrate, dried, and then subjected to an air circulating electric furnace according to the temperature shown in Table 2. After 15 minutes of thermal decomposition coating, an electrode catalyst layer composed of a mixed oxide of cerium oxide and cerium oxide was formed. The amount of the coating solution is set based coating thickness per one coating solution, in terms of iridium metal by substantially 3.0g / m 2 state, repeating the operation of coating and firing count 9, it is obtained by iridium The electrode catalyst layer of about 27.0 g/m 2 was converted into metal.
其次,上述經觸媒層被覆完畢的試料在空氣循環式電爐中,依表2所示溫度更施行1小時後烘烤,便製得電解用電極。又,為求比較,而製作沒有施行後烘烤的試料。 Next, the sample coated with the catalyst layer was baked in an air circulating electric furnace at a temperature shown in Table 2 for 1 hour, and an electrode for electrolysis was obtained. Further, for comparison, samples were prepared without post-baking.
各試料的煅燒溫度與後烘烤溫度清單係如表2所示。 The calcination temperature and post-baking temperature list of each sample are shown in Table 2.
依照X射線繞射法測定觸媒層的IrO2結晶性與晶粒徑。從繞射尖峰強度推算結晶化度。 The catalyst layer in accordance with the measured X-ray diffraction method and IrO 2 crystalline grain size. The degree of crystallization is estimated from the diffraction peak intensity.
電解液:150g/L H2SO4 aq. Electrolyte: 150g/LH 2 SO 4 aq.
電解溫度:60℃ Electrolysis temperature: 60 ° C
電解面積:10×10mm2 Electrolytic area: 10 × 10mm 2
輔助電極:Zr板(20mm×70mm) Auxiliary electrode: Zr plate (20mm × 70mm)
參考電極:硫酸亞汞電極(SSE) Reference electrode: mercury sulphide electrode (SSE)
電流中斷法(current interrupt method) Current interrupt method
電解液:150g/L H2SO4 aq. Electrolyte: 150g/LH 2 SO 4 aq.
電解溫度:60℃ Electrolysis temperature: 60 ° C
電解面積:10×10mm2 Electrolytic area: 10 × 10mm 2
輔助電極:Zr板(20mm×70mm) Auxiliary electrode: Zr plate (20mm × 70mm)
參考電極:硫酸亞汞電極(SSE) Reference electrode: mercury sulphide electrode (SSE)
依照煅燒溫度及後烘烤溫度所造成的IrO2結晶性變化,係如下述。 The change in crystallinity of IrO 2 caused by the calcination temperature and the post-baking temperature is as follows.
結晶化度的推算係將習知物的結晶繞射尖峰(θ=28°)強度設為100,並將各樣品的同結晶繞射尖峰(θ=28°)強度與習知物強度的比例設為結晶度。結果如表2所示。又,根據表2所示結晶化度的相關數據所製成的圖形,如圖1所示。 The crystallization degree is estimated by setting the intensity of the crystal diffraction peak (θ=28°) of the conventional material to 100, and the ratio of the intensity of the same crystal diffraction peak (θ=28°) of each sample to the intensity of the conventional material. Set to crystallinity. The results are shown in Table 2. Further, a graph made based on the data relating to the degree of crystallization shown in Table 2 is shown in Fig. 1.
由表2及圖1中得知,本發明實施例(430℃~480℃較高溫 區域的高溫煅燒+520℃~600℃更高溫區域的後烘烤)的樣品2~4及6~8,經後烘烤後的氧化銥結晶化度係達80%以上。另一方面,沒有施行後烘烤而是依430℃煅燒製作電極觸媒層(樣品1),並沒有發現氧化銥的清晰尖峰,確認到該試料的觸媒層係由非晶質氧化銥形成。沒有施行後烘烤而是依480℃煅燒製作的電極觸媒層(樣品5)結晶化度係72%,殘留頗多的非晶質氧化銥。又,屬於習知物的樣品9雖完全結晶化,結晶化度達100%,但晶粒徑卻為9.1nm的較大值,因而靜電容為7.6的偏低值,有效表面積較小。 It is known from Table 2 and FIG. 1 that the embodiment of the invention (430 ° C ~ 480 ° C higher temperature Samples 2~4 and 6~8 of the high-temperature calcination in the region + post-baking in the higher temperature region of 520 ° C ~ 600 ° C, after crystallization, the crystallization degree of cerium oxide is more than 80%. On the other hand, the electrode catalyst layer (sample 1) was produced by calcination at 430 ° C without performing post-baking, and no clear peak of cerium oxide was observed, and it was confirmed that the catalyst layer of the sample was formed of amorphous cerium oxide. . The electrode catalyst layer (sample 5) prepared by calcination at 480 ° C without a post-baking was 72% crystallinity, and a large amount of amorphous cerium oxide remained. Further, the sample 9 belonging to the conventional product was completely crystallized, and the degree of crystallization was 100%, but the crystal grain size was a large value of 9.1 nm. Therefore, the static capacitance was a low value of 7.6, and the effective surface area was small.
即,相關依高溫後烘烤所造成的結晶化度變化,經430℃煅燒後,再施行更高溫後的烘烤,可發現隸屬於電極觸媒層的IrO2清晰尖峰,得知利用高溫後烘烤,觸媒層的非晶質IrO2會轉換為結晶質。又,得知不管依任何烘烤溫度,尖峰強度均與習知物同樣,並沒有殘存非晶質IrO2。另一方面,得知480℃煅燒品經更高溫後烘烤,便可使結晶化度增加。但是,得知經520℃與560℃的後烘烤後,IrO2非晶質仍會有少量殘存。相對於此,經600℃後烘烤後的IrO2結晶化度則與習知物大致同等,得知已完全結晶化。 That is, according to the change in the degree of crystallization caused by the high-temperature post-baking, after calcination at 430 ° C, and then baking at a higher temperature, the sharp peak of IrO 2 belonging to the electrode catalyst layer can be found, and it is known that after using the high temperature baking, the amorphous IrO 2 catalyst layer is converted to a crystalline mass. Further, it was found that the peak intensity was the same as that of the conventional one regardless of any baking temperature, and no amorphous IrO 2 remained. On the other hand, it is known that the 480 ° C calcined product is baked at a higher temperature to increase the degree of crystallization. However, it is known that after post-baking at 520 ° C and 560 ° C, a small amount of amorphous IrO 2 remains. On the other hand, the degree of crystallization of IrO 2 after baking at 600 ° C was substantially the same as that of the conventional one, and it was found that it was completely crystallized.
其次,利用X射線繞射分析施行晶粒徑的計算。結果如表2所示。又,根據表2所示晶粒徑的相關數據製成之圖形係如圖2所示。 Next, the calculation of the crystal grain size was carried out by X-ray diffraction analysis. The results are shown in Table 2. Further, a pattern produced based on the correlation data of the crystal grain size shown in Table 2 is shown in Fig. 2.
因為在沒有施行後烘烤的情況下施行430℃煅燒而生成 非晶質IrO2,因而晶粒徑設為「0」。若有施行後烘烤,非晶質IrO2會被結晶化,得知結晶的晶粒徑相較於習知物之下有變小。又,幾乎沒有出現後烘烤溫度與IrO2晶粒徑間之依存性。 Since the amorphous IrO 2 was formed by calcination at 430 ° C without performing post-baking, the crystal grain size was set to "0". If it is baked after the application, the amorphous IrO 2 is crystallized, and it is found that the crystal grain size of the crystal is smaller than that of the conventional one. Moreover, there is almost no dependence between the post-baking temperature and the IrO 2 crystal grain size.
另一方面,得知經施行後烘烤過的480℃煅燒品,無關於後烘烤溫度,所形成的晶粒徑均較小於習知物。即,藉由後烘烤,依低溫煅燒所形成觸媒層的IrO2結晶化度會上昇,但會抑制IrO2晶粒徑的增加。 On the other hand, it was found that the calcined product of 480 ° C which was baked after the execution was not related to the post-baking temperature, and the crystal grain size formed was smaller than that of the conventional one. That is, by post-baking, the degree of crystallization of IrO 2 in the catalyst layer formed by low-temperature calcination increases, but the increase in the grain size of IrO 2 is suppressed.
由表2及圖2中得知,本發明實施例(430℃~480℃較高溫區域的高溫煅燒+520℃~600℃更高溫區域的後烘烤)的樣品2~4及6~8,經後烘烤後的氧化銥晶粒徑係9.0nm以下。另一方面,沒有施行後烘烤而是依430℃煅燒製作電極觸媒層(樣品1),並沒有發現氧化銥的清晰尖峰,確認到該試料的觸媒層係由非晶質氧化銥形成。沒有施行後烘烤而是依480℃煅燒製作的電極觸媒層(樣品5),晶粒徑為較大的9.3nm。又,屬於習知物的樣品9,氧化銥的晶粒徑係較大的9.1nm。 2 and 4 and 6 to 8 of the examples of the present invention (high temperature calcination in a relatively high temperature region at 430 ° C to 480 ° C + post-baking in a higher temperature region at 520 ° C to 600 ° C), as shown in Table 2 and FIG. The cerium oxide crystal grain size after post-baking is 9.0 nm or less. On the other hand, the electrode catalyst layer (sample 1) was produced by calcination at 430 ° C without performing post-baking, and no clear peak of cerium oxide was observed, and it was confirmed that the catalyst layer of the sample was formed of amorphous cerium oxide. . The electrode catalyst layer (sample 5) prepared by calcination at 480 ° C was not subjected to post-baking, and the crystal grain size was 9.3 nm. Further, in the sample 9 belonging to the conventional material, the crystal grain size of cerium oxide was 9.1 nm which was large.
其次,測定由依430℃~480℃較高溫區域之高溫煅燒+依520℃~600℃的更高溫區域之後烘烤,所造成電極觸媒層的有效表面積變化。 Next, the high-temperature calcination in a relatively high temperature region of 430 ° C to 480 ° C + a higher temperature region of 520 ° C to 600 ° C is measured, and the effective surface area of the electrode catalyst layer is changed.
依循環伏安法所計算出的電極靜電容,如表2所示。電極靜電容係與電極的有效表面積成比例,可謂若靜電容提高, 則有效表面積亦較大。根據表2的數據,觸媒層的煅燒條件與靜電容間之關係圖,如圖3所示。 The electrostatic capacitance of the electrode calculated by cyclic voltammetry is shown in Table 2. The electrostatic capacitance of the electrode is proportional to the effective surface area of the electrode, which means that if the electrostatic capacitance is increased, The effective surface area is also large. According to the data of Table 2, the relationship between the calcination conditions of the catalyst layer and the electrostatic capacitance is shown in FIG.
由表2及圖3中得知,本發明實施例(430℃~480℃較高溫區域的高溫煅燒+520℃~600℃更高溫區域的後烘烤)的樣品2~4及6~8,電極靜電容高達11.6以上。另一方面,沒有施行後烘烤而是依430℃煅燒製作觸媒層之IrO2(樣品1),因為屬於非晶質,因而呈現最大的有效表面積(靜電容)。得知經實施後烘烤之後,因為IrO2呈結晶化,因而有效表面積(靜電容)會減少,但較高於習知物。此現象可認為所形成的晶粒徑變為較小於習知物所致。又,發現因後烘烤溫度的增加,會造成電極有效表面積(靜電容)有減少的傾向。 2 and 4 and 6 to 8 of the examples of the present invention (high temperature calcination in a relatively high temperature region of 430 ° C to 480 ° C + post-baking in a higher temperature region at 520 ° C to 600 ° C), as shown in Table 2 and FIG. The electrostatic capacitance of the electrode is as high as 11.6 or more. On the other hand, IrO 2 (Sample 1) in which the catalyst layer was formed by calcination at 430 ° C without performing post-baking was the largest effective surface area (static capacitance) because it was amorphous. It is known that after baking after the implementation, since IrO 2 is crystallized, the effective surface area (static capacitance) is reduced, but higher than that of the conventional one. This phenomenon is considered to be caused by the crystal grain size formed being smaller than that of the conventional one. Further, it has been found that the increase in the post-baking temperature tends to reduce the effective surface area (static capacitance) of the electrode.
再者,當在480℃煅燒後有施行後烘烤時(樣品5~8),無關於後烘烤溫度,有效表面積(靜電容)均大致同等,但若相較於習知物之下,得知增加2倍。此現象可認為IrO2晶粒徑較小於習知物,且非晶質IrO2少量殘存的緣故所致。又,即便提升後烘烤溫度,電極有效表面積(靜電容)仍不會有變化。 Furthermore, when post-baking was performed after calcination at 480 ° C (samples 5 to 8), the effective surface area (static capacitance) was approximately the same regardless of the post-baking temperature, but if compared with the conventional one, I learned that it increased by 2 times. This phenomenon is considered to be caused by the fact that the IrO 2 crystal grain size is smaller than that of the conventional one and the amorphous IrO 2 remains in a small amount. Also, even if the post-baking temperature is raised, the effective surface area (static capacitance) of the electrode does not change.
施行各試料的氧產生過電壓(V vs.SSE @100A/dm2)測定。結果如表2所示。又,煅燒條件與氧產生過電壓間之依存性,如圖4所示。圖4的圖形變化傾向,係與圖3相反,出現隨電極有效表面積的增加,會有試料的氧產生過電壓降低之傾向。此現象可認為因電極有效表面積的增加,可使電 流分佈呈分散,而降低實際電流的緣故所致。 The oxygen generation overvoltage (V vs. SSE @100A/dm 2 ) of each sample was measured. The results are shown in Table 2. Moreover, the dependence between the calcination conditions and the oxygen generation overvoltage is as shown in FIG. The pattern change of Fig. 4 tends to be opposite to that of Fig. 3, and there is a tendency for the oxygen generation overvoltage of the sample to decrease as the effective surface area of the electrode increases. This phenomenon is thought to be caused by an increase in the effective surface area of the electrode, which can cause the current distribution to be dispersed and reduce the actual current.
具有最大有效表面積但未施行後烘烤的430℃煅燒品,呈現最低的氧過電壓,但利用後烘烤造成的有效表面積減少,會使氧過電壓上昇。480℃煅燒品的氧過電壓與後烘烤溫度間之依存性發現有同樣的傾向。又,得知該等試料的氧過電壓較高於習知物。此現象可認為表面積較習知物增加的緣故所致。 The 430 ° C calcined product having the largest effective surface area but not post-baking exhibited the lowest oxygen overvoltage, but the reduction in the effective surface area due to post-baking caused the oxygen overvoltage to rise. The dependence between the oxygen overvoltage of the 480 ° C calcined product and the post-baking temperature was found to have the same tendency. Further, it was found that the oxygen overvoltage of the samples was higher than that of the conventional materials. This phenomenon is considered to be caused by an increase in surface area compared with conventional ones.
由表2及圖4中得知,本發明實施例(依430℃~480℃較高溫區域之高溫煅燒+依520℃~600℃的更高溫區域之後烘烤)的樣品2~4及6~8,氧產生過電壓均有降低。 It can be seen from Table 2 and FIG. 4 that the examples of the present invention (high temperature calcination in a relatively high temperature region of 430 ° C to 480 ° C + after baking in a higher temperature region of 520 ° C to 600 ° C) are sample 2~4 and 6~ 8, oxygen generation overvoltage is reduced.
如上述,依430℃~480℃較高溫區域之高溫煅燒+依520℃~600℃更高溫區域之後烘烤的煅燒手段所製作的電極,相較於習知物之下,觸媒層的IrO2結晶較小,可增加電極表面積。該等試料在高負荷條件下能分散電流分佈,而降低實際電流負荷,因而觸媒消耗的抑制效果較大,亦認為能期待耐久性提升。 As described above, the electrode prepared by the high-temperature calcination in the relatively high temperature region of 430 ° C to 480 ° C + the calcination method after baking in the higher temperature region of 520 ° C to 600 ° C is compared with the IrO of the catalyst layer under the conventional material. 2 The crystal is small, which increases the surface area of the electrode. These samples can disperse the current distribution under high load conditions and reduce the actual current load. Therefore, the catalyst consumption is greatly suppressed, and it is considered that durability can be expected to be improved.
其次,針對本發明實施例進行說明,惟本發明並不僅侷限於該等。 Next, the embodiments of the present invention will be described, but the present invention is not limited to the above.
對JIS I種鈦板的表面利用鐵網(G120尺寸)施行乾式噴砂處理,接著再於沸騰濃鹽酸水溶液中施行10分鐘酸洗處 理,而施行電極金屬基體的洗淨處理。經洗淨過的電極金屬基體安裝於蒸發源係使用Ti-Ta合金靶材的電弧離子鍍裝置中,對電極金屬基體表面施行含有鉭與鈦的AIP底塗層塗敷被覆。被覆條件係如表1所示。 The surface of the JIS I titanium plate was subjected to dry blasting using an iron mesh (G120 size), followed by a 10-minute pickling in a boiling concentrated aqueous hydrochloric acid solution. The treatment of the electrode metal substrate is performed. The washed electrode metal substrate was attached to an arc ion plating apparatus using a Ti-Ta alloy target in an evaporation source, and an AIP undercoat layer containing ruthenium and titanium was applied to the surface of the electrode metal substrate. The coating conditions are shown in Table 1.
其次,上述被覆處理畢金屬基體在空氣循環式電爐中施行530℃、180分鐘的熱處理。 Next, the above-mentioned coated and treated metal substrate was subjected to heat treatment at 530 ° C for 180 minutes in an air circulating electric furnace.
其次,將四氯化銥與五氯化鉭溶解於濃鹽酸中而成為塗佈液,塗佈於上述被覆處理畢金屬基體上,經乾燥後,於空氣循環式電爐中施行480℃、15分鐘的熱分解被覆,便形成由氧化銥與氧化鉭的混合氧化物所構成之電極觸媒層。塗佈液的量係設定為塗佈液每1次的塗佈厚度,依換算成銥金屬為大致3.0g/m2狀態,重複該塗佈~煅燒的操作計9次,便獲得依銥金屬換算約27.0g/m2的電極觸媒層。 Next, antimony tetrachloride and antimony pentachloride were dissolved in concentrated hydrochloric acid to form a coating liquid, which was applied onto the coated metal substrate, dried, and then subjected to 480 ° C for 15 minutes in an air circulating electric furnace. The thermal decomposition coating forms an electrode catalyst layer composed of a mixed oxide of cerium oxide and cerium oxide. An amount of coating solution per one line is set to a coating thickness of the coating solution, in terms of iridium metal by substantially 3.0g / m 2 state, repeating the operation of coating and firing count 9, it is obtained by iridium genus An electrode catalyst layer of about 27.0 g/m 2 was converted.
針對該試料經施行X射線繞射,結果雖有發現隸屬於電極觸媒層的氧化銥清晰尖峰,但尖峰強度卻較低於比較例1,得知結晶質IrO2有部分性析出。 X-ray diffraction was applied to the sample. As a result, although a clear peak of cerium oxide belonging to the electrode catalyst layer was found, the peak intensity was lower than that of Comparative Example 1, and it was found that the crystalline IrO 2 was partially precipitated.
其次,經被覆上述觸媒層的試料,在空氣循環式電爐中更進一步施行520℃、1小時的後烘烤,而製作電解用電極。 Next, the sample coated with the above-mentioned catalyst layer was further subjected to post-baking at 520 ° C for 1 hour in an air circulating electric furnace to prepare an electrode for electrolysis.
針對經後烘烤後的試料施行X射線繞射分析,結果有發現隸屬於電極觸媒層的IrO2清晰尖峰,尖峰強度較高於後烘烤前,但仍較低於比較例1。依此得知,在高溫後烘烤前,依低溫煅燒的被覆步驟所形成觸媒層的結晶化度有增加,但 非晶質IrO2會部分性殘存。 X-ray diffraction analysis was performed on the post-baked sample. As a result, it was found that the IrO 2 sharp peak belonging to the electrode catalyst layer was higher than the post-baking, but still lower than that of Comparative Example 1. From this, it is understood that the degree of crystallization of the catalyst layer formed by the coating step of the low-temperature calcination increases before the baking at a high temperature, but the amorphous IrO 2 partially remains.
針對依此製作的電解用電極,施行表3所示2種壽命評價試驗(純硫酸溶液與有添加明膠添的硫酸溶液二項)。結果如表4所示。相較於表4的比較例1(習知物)之下,硫酸電解壽命成為1.7倍、明膠電解壽命成為1.1倍,因而得知針對硫酸或有機添加物二者的耐久性均有提升。 For the electrode for electrolysis produced in accordance therewith, two kinds of life evaluation tests (a pure sulfuric acid solution and a sulfuric acid solution with added gelatin addition) shown in Table 3 were carried out. The results are shown in Table 4. Compared with Comparative Example 1 (conventional material) of Table 4, the sulfuric acid electrolysis life was 1.7 times and the gelatin electrolysis life was 1.1 times, and thus it was found that the durability against both sulfuric acid or organic additives was improved.
除將空氣循環式電爐中的後烘烤溫度設定為560℃之外,其餘均與實施例1同樣地施行評價用電極的製作,更施行同樣的電解評價。 The evaluation electrode was produced in the same manner as in Example 1 except that the post-baking temperature in the air circulation type electric furnace was set to 560 ° C, and the same electrolysis evaluation was performed.
在後烘烤後經施行X射線繞射分析,結果發現觸媒層的IrO2結晶化度與晶粒徑,係與實施例1相同程度。 After the post-baking, X-ray diffraction analysis was carried out, and it was found that the IrO 2 crystallinity and crystal grain size of the catalyst layer were the same as in Example 1.
如表4所示,相較於表4的比較例1(習知物)之下,硫酸電解壽命成為1.5倍、明膠電解壽命成為1.3倍,因而得知針對硫酸或有機添加物的耐久性均獲提升。 As shown in Table 4, compared with Comparative Example 1 (conventional material) of Table 4, the electrolysis life of sulfuric acid was 1.5 times, and the electrolysis life of gelatin was 1.3 times, so that the durability against sulfuric acid or organic additives was known. Improved.
將實施例1的空氣循環式電爐中之煅燒溫度、煅燒時間,變更為520℃、15分鐘施行熱分解被覆,而形成由氧化銥與氧化鉭的混合氧化物所構成之電極觸媒層。依此所製作的電極於沒有施行後烘烤情況下,施行與實施例1同樣的X射線繞射分析及電解評價。 The calcination temperature and the calcination time in the air circulating electric furnace of Example 1 were changed to 520 ° C for 15 minutes to carry out thermal decomposition coating to form an electrode catalyst layer composed of a mixed oxide of cerium oxide and cerium oxide. The electrode prepared in accordance with this was subjected to the same X-ray diffraction analysis and electrolytic evaluation as in Example 1 without performing post-baking.
針對該試料經施行X射線繞射,結果有發現隸屬於電極觸媒層的氧化銥清晰尖峰,確認到觸媒層的IrO2屬結晶質。 When X-ray diffraction was applied to the sample, it was found that the yttrium oxide peak belonging to the electrode catalyst layer was sharp, and it was confirmed that IrO 2 of the catalyst layer was crystalline.
經施行與實施例1同樣的壽命評價。從表4所示結果,可確認到本發明所提案藉由低溫煅燒+高溫後烘烤的觸媒層形成,針對高負荷條件下的電解能提升耐久性。 The same life evaluation as in Example 1 was carried out. From the results shown in Table 4, it was confirmed that the catalyst layer formed by low-temperature calcination + high-temperature post-baking was proposed in the present invention, and the durability under high-load conditions was improved.
除沒有施行後烘烤之外,其餘均與實施例1同樣的製作評價用電極,接著施行與實施例1同樣的電解評價。 The evaluation electrode was produced in the same manner as in Example 1 except that the post-baking was not performed, and the same electrolysis evaluation as in Example 1 was carried out.
如表4所示,在沒有施行後烘烤情況施行480℃煅燒的電極,硫酸電解壽命與明膠電解壽命係與比較例1的習知物同等,並無發現耐久性提升效果。 As shown in Table 4, the electrode which was calcined at 480 ° C in the case where post-baking was not performed, the sulfuric acid electrolysis life and the gelatin electrolysis life were the same as those of the comparative example 1, and the durability improvement effect was not found.
本發明係關於各種工業電解所使用的氧產生用陽極及其製造方法;更詳言之,電解銅箔等電解金屬箔製造、鋁液中供電、連續電鍍鋅鋼板製造、金屬採取等工業電解中所使用,在高負荷電解條件下具有優異耐久性,能有效利用為耐高負荷用氧產生用陽極。 The present invention relates to an oxygen generating anode used in various industrial electrolysis and a method for producing the same; more specifically, electrolytic copper foil production such as electrolytic copper foil, power supply in aluminum liquid, continuous electrogalvanizing steel sheet manufacturing, metal taking, etc. It has excellent durability under high-load electrolysis conditions and can be effectively utilized as an anode for generating oxygen for high load resistance.
圖1係表示由煅燒溫度與後烘烤溫度所造成觸媒層的氧化銥(IrO2)結晶化度變化圖。 Fig. 1 is a graph showing changes in the degree of crystallization of cerium oxide (IrO 2 ) in a catalyst layer caused by a calcination temperature and a post-baking temperature.
圖2係表示由煅燒溫度與後烘烤溫度所造成觸媒層的氧化銥(IrO2)晶粒徑變化圖。 Fig. 2 is a graph showing the change in particle size of cerium oxide (IrO 2 ) crystals of the catalyst layer caused by the calcination temperature and the post-baking temperature.
圖3係表示由煅燒溫度與後烘烤溫度所造成電極靜電容的變化圖表。 Figure 3 is a graph showing changes in electrode electrostatic capacitance caused by calcination temperature and post-baking temperature.
圖4係表示煅燒條件與氧過電壓間之依存性圖表。 Fig. 4 is a graph showing the dependence of the calcination conditions on the oxygen overvoltage.
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