TWI537806B - Touch panel - Google Patents

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TWI537806B
TWI537806B TW103144115A TW103144115A TWI537806B TW I537806 B TWI537806 B TW I537806B TW 103144115 A TW103144115 A TW 103144115A TW 103144115 A TW103144115 A TW 103144115A TW I537806 B TWI537806 B TW I537806B
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layer
inorganic dielectric
light shielding
dielectric layer
substrate
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TW103144115A
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Chinese (zh)
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TW201624239A (en
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林城興
郭威宏
周詩博
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友達光電股份有限公司
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Priority to TW103144115A priority Critical patent/TWI537806B/en
Priority to CN201510069152.1A priority patent/CN104679331B/en
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Publication of TW201624239A publication Critical patent/TW201624239A/en

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Description

觸控面板 Touch panel

本發明是有關於一種觸控面板。 The invention relates to a touch panel.

隨著科技的發展,觸控面板漸漸成為為消費性電子產品不可或缺的元件之一。根據觸控原理的不同,觸控面板可分為電容式觸控面板、電阻式觸控面板、音波式觸控面板、光學式觸控面板與電磁式觸控面板,其中又以電容式觸控面板為現今發展的主流。 With the development of technology, touch panels have gradually become one of the indispensable components for consumer electronics. According to different touch principles, the touch panel can be divided into a capacitive touch panel, a resistive touch panel, an acoustic touch panel, an optical touch panel and an electromagnetic touch panel, wherein capacitive touch is used. The panel is the mainstream of today's development.

在製作觸控面板時,通常係將疊層結構依序形成於一基板上。然而因疊層結構之材質相異,其對基板亦會產生不同的影響。舉例而言,於真空鍍膜製程中,疊層結構會產生不同的薄膜應力,其會導致應力集中並減弱該處之基板強度,使得基板龜裂,觸控面板之良率也會隨之降低。 When the touch panel is fabricated, the laminated structure is usually formed on a substrate in sequence. However, due to the different materials of the laminated structure, it also has different effects on the substrate. For example, in a vacuum coating process, the laminated structure may produce different film stresses, which may cause stress concentration and weaken the strength of the substrate at the place, causing the substrate to crack and the yield of the touch panel to be reduced.

本發明之一態樣提供一種觸控面板,包含基板、遮光元件層、無機介電堆疊層與觸控感測層。基板具有第一側壁與表面。表面具有顯示區與周邊區。周邊區環繞顯示區,且第一側壁毗鄰周邊區。遮光元件層設置於基板之表 面的周邊區,且具有鄰近第一側壁之側緣並與第一側壁相隔第一距離。無機介電堆疊層覆蓋表面之顯示區與部分之遮光元件層,且暴露出遮光元件層鄰近第一側壁之側緣。無機介電堆疊層包含第一無機介電層與第二無機介電層。第一無機介電層設置於表面與遮光元件層上。第二無機介電層設置於第一無機介電層上。觸控感測層設置於第一無機介電層與第二無機介電層之間。 One aspect of the present invention provides a touch panel including a substrate, a light shielding element layer, an inorganic dielectric stack layer, and a touch sensing layer. The substrate has a first side wall and a surface. The surface has a display area and a peripheral area. The peripheral area surrounds the display area, and the first side wall is adjacent to the surrounding area. The light shielding element layer is disposed on the surface of the substrate a peripheral region of the face and having a side edge adjacent the first side wall and spaced apart from the first side wall by a first distance. The inorganic dielectric stack layer covers the display area of the surface and a portion of the light shielding element layer, and exposes the side layer of the light shielding element layer adjacent to the first side wall. The inorganic dielectric stack layer includes a first inorganic dielectric layer and a second inorganic dielectric layer. The first inorganic dielectric layer is disposed on the surface and the light shielding element layer. The second inorganic dielectric layer is disposed on the first inorganic dielectric layer. The touch sensing layer is disposed between the first inorganic dielectric layer and the second inorganic dielectric layer.

在一或多個實施方式中,觸控面板更包含金屬導電層,設置於第一無機介電層與第二無機介電層之間,且電性連接觸控感測層。 In one or more embodiments, the touch panel further includes a metal conductive layer disposed between the first inorganic dielectric layer and the second inorganic dielectric layer and electrically connected to the touch sensing layer.

在一或多個實施方式中,遮光元件層之側緣與基板於垂直投影方向上具有邊界,且無機介電堆疊層具有鄰近邊界之第二側壁。第二側壁介於金屬導電層與邊界之間。 In one or more embodiments, the side edges of the light shielding element layer have a boundary with the substrate in a vertical projection direction, and the inorganic dielectric stacked layer has a second side wall adjacent to the boundary. The second sidewall is interposed between the metal conductive layer and the boundary.

在一或多個實施方式中,無機介電堆疊層更包含第三無機介電層,置於第一無機介電層與第二無機介電層之間,且第三無機介電層覆蓋金屬導電層。觸控感測層包含第一導電層與第二導電層。第一導電層置於第一無機介電層與第三無機介電層之間。第二導電層置於第三無機介電層與第二無機介電層之間,且與第一導電層以及金屬導電層電性連接。 In one or more embodiments, the inorganic dielectric stack layer further includes a third inorganic dielectric layer disposed between the first inorganic dielectric layer and the second inorganic dielectric layer, and the third inorganic dielectric layer covers the metal Conductive layer. The touch sensing layer includes a first conductive layer and a second conductive layer. The first conductive layer is disposed between the first inorganic dielectric layer and the third inorganic dielectric layer. The second conductive layer is disposed between the third inorganic dielectric layer and the second inorganic dielectric layer, and is electrically connected to the first conductive layer and the metal conductive layer.

在一或多個實施方式中,側緣與第一側壁之間的第一距離為約50微米至5000微米。 In one or more embodiments, the first distance between the side edges and the first side wall is between about 50 microns and 5000 microns.

在一或多個實施方式中,遮光元件層之側緣與基板於垂直投影方向上具有邊界,且無機介電堆疊層具有鄰 近邊界之第二側壁。第二側壁與邊界於垂直投影方向上具有第二距離大於約1微米。 In one or more embodiments, the side edges of the light shielding element layer and the substrate have a boundary in a vertical projection direction, and the inorganic dielectric stacked layer has a neighbor The second side wall of the near boundary. The second sidewall and the boundary have a second distance greater than about 1 micron in a vertical projection direction.

在一或多個實施方式中,第二側壁與邊界之間的第二距離為約3微米至20微米。 In one or more embodiments, the second distance between the second sidewall and the boundary is between about 3 microns and 20 microns.

在一或多個實施方式中,遮光元件層包含遮光層與有機絕緣層。遮光層置於表面上。有機絕緣層覆蓋遮光層,且設置於遮光層與無機介電堆疊層之間。 In one or more embodiments, the light shielding element layer includes a light shielding layer and an organic insulating layer. The light shielding layer is placed on the surface. The organic insulating layer covers the light shielding layer and is disposed between the light shielding layer and the inorganic dielectric stacked layer.

在一或多個實施方式中,基板的材質為玻璃、塑膠或其他適合之材質。 In one or more embodiments, the substrate is made of glass, plastic or other suitable material.

本實施方式之觸控面板係利用遮光元件層隔離基板之周邊區與無機介電堆疊層,使得遮光元件層能夠緩衝無機介電堆疊層於製程中所產生的應力,因此基板強度不致於受到無機介電堆疊層的影響,可避免基板龜裂。 The touch panel of the present embodiment uses the light shielding element layer to isolate the peripheral region of the substrate from the inorganic dielectric stack layer, so that the light shielding device layer can buffer the stress generated by the inorganic dielectric stack layer during the process, so the substrate strength is not affected by the inorganic The influence of the dielectric stack layer can avoid substrate cracking.

110、910‧‧‧基板 110, 910‧‧‧ substrate

102‧‧‧邊界 102‧‧‧ border

112‧‧‧第一側壁 112‧‧‧First side wall

114‧‧‧表面 114‧‧‧ surface

116a‧‧‧顯示區 116a‧‧‧ display area

116b‧‧‧周邊區 116b‧‧‧ surrounding area

120、920‧‧‧遮光元件層 120, 920‧‧‧ shading element layer

121‧‧‧側緣 121‧‧‧ side edge

122‧‧‧遮光層 122‧‧‧Lighting layer

124‧‧‧有機絕緣層 124‧‧‧Organic insulation

130‧‧‧無機介電堆疊層 130‧‧‧Inorganic dielectric stack

132‧‧‧第一無機介電層 132‧‧‧First inorganic dielectric layer

134‧‧‧第二無機介電層 134‧‧‧Second inorganic dielectric layer

136‧‧‧第三無機介電層 136‧‧‧ Third inorganic dielectric layer

138‧‧‧第二側壁 138‧‧‧ second side wall

140‧‧‧觸控感測層 140‧‧‧Touch sensing layer

142‧‧‧第一導電層 142‧‧‧First conductive layer

144‧‧‧第二導電層 144‧‧‧Second conductive layer

150‧‧‧金屬導電層 150‧‧‧Metal conductive layer

930‧‧‧無機介電層 930‧‧‧Inorganic dielectric layer

d1‧‧‧第一距離 D1‧‧‧first distance

d2‧‧‧第二距離 D2‧‧‧Second distance

T1、T2‧‧‧厚度 T1, T2‧‧‧ thickness

TH1‧‧‧第一接觸窗 TH1‧‧‧ first contact window

TH2‧‧‧第二接觸窗 TH2‧‧‧Second contact window

第1圖為本發明一實施方式之觸控面板的側視示意圖。 FIG. 1 is a side view of a touch panel according to an embodiment of the present invention.

第2A圖為一實施例之基板與無機介電層的側視示意圖。 2A is a side elevational view of the substrate and inorganic dielectric layer of an embodiment.

第2B圖為另一實施例之基板與遮光元件層的側視示意圖。 2B is a side view showing the substrate and the light shielding element layer of another embodiment.

第2C圖為再一實施例之基板、遮光元件層與無機介電層的側視示意圖。 2C is a side view showing the substrate, the light shielding device layer, and the inorganic dielectric layer of still another embodiment.

第3圖為本發明另一實施方式之觸控面板的側視示意圖。 FIG. 3 is a side view of a touch panel according to another embodiment of the present invention.

以下將以圖式揭露本發明的複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。 The embodiments of the present invention are disclosed in the following drawings, and for the purpose of clarity However, it should be understood that these practical details are not intended to limit the invention. That is, in some embodiments of the invention, these practical details are not necessary. In addition, some of the conventional structures and elements are shown in the drawings in a simplified schematic manner in order to simplify the drawings.

第1圖為本發明一實施方式之觸控面板的側視示意圖。觸控面板包含基板110、遮光元件層120、無機介電堆疊層130與觸控感測層140。基板110具有第一側壁112與表面114。表面114具有顯示區116a與周邊區116b。周邊區116b環繞顯示區116a,且第一側壁112毗鄰周邊區116b。遮光元件層120設置於基板110之表面114的周邊區116b,且具有鄰近第一側壁112之側緣121並與第一側壁112相隔第一距離d1。無機介電堆疊層130覆蓋表面114之顯示區116a與部分之遮光元件層120,且暴露出遮光元件層120鄰近第一側壁112之側緣121。無機介電堆疊層130包含第一無機介電層132與第二無機介電層134。第一無機介電層132設置於基板110與遮光元件層120上。第二無機介電層134設置於第一無機介電層132上。觸控感測層140設置於第一無機介電層132與第二無機介電層134之間。 FIG. 1 is a side view of a touch panel according to an embodiment of the present invention. The touch panel includes a substrate 110 , a light shielding device layer 120 , an inorganic dielectric stack layer 130 , and a touch sensing layer 140 . The substrate 110 has a first sidewall 112 and a surface 114. Surface 114 has a display area 116a and a peripheral area 116b. The peripheral zone 116b surrounds the display zone 116a and the first sidewall 112 is adjacent to the perimeter zone 116b. The light shielding element layer 120 is disposed on the peripheral region 116b of the surface 114 of the substrate 110 and has a side edge 121 adjacent to the first sidewall 112 and spaced apart from the first sidewall 112 by a first distance d1. The inorganic dielectric stack layer 130 covers the display region 116a of the surface 114 and a portion of the light shielding device layer 120, and exposes the light shielding device layer 120 adjacent to the side edge 121 of the first sidewall 112. The inorganic dielectric stack layer 130 includes a first inorganic dielectric layer 132 and a second inorganic dielectric layer 134. The first inorganic dielectric layer 132 is disposed on the substrate 110 and the light shielding device layer 120. The second inorganic dielectric layer 134 is disposed on the first inorganic dielectric layer 132. The touch sensing layer 140 is disposed between the first inorganic dielectric layer 132 and the second inorganic dielectric layer 134 .

本實施方式之觸控面板係利用遮光元件層120隔離基板110之周邊區116b與無機介電堆疊層130,使得遮光元件層120能夠緩衝無機介電堆疊層130於製程中所產生的應力,因此基板110強度不致於受到無機介電堆疊層130的影響,可避免基板110龜裂。詳細而言,本實施方式之觸控面板可應用於單片式玻璃解決方案(One Glass Solution,OGS)之觸控面板,其係於一大片基材(如玻璃)上製作觸控感測元件後,再將其分割成複數個觸控面板。在本實施方式中,基板110之第一側壁112為切割處,因遮光元件層120與第一側壁112之間相隔第一距離d1,因此在切割時可避免切至遮光元件層120而破壞遮光元件層120。另一方面,本實施方式之基板110例如為玻璃,因無機介電堆疊層130具有晶格化特性,若無機介電堆疊層130直接接觸基板110,無機介電堆疊層130之薄膜應力會影響到基板110,進而減弱基板110之玻璃強度。舉例而言,若無機介電堆疊層130設置於遮光元件層120與第一側壁112之間的表面114上,應力便會集中於遮光元件層120、無機介電堆疊層130與基板110之間的交界處。詳細而言,應力會集中於基板110與遮光元件層120的側緣121於垂直投影方向之邊界102上,使得基板110較容易在強度測試時產生龜裂的情況。 The touch panel of the present embodiment is used to isolate the peripheral region 116b of the substrate 110 from the inorganic dielectric stack layer 130 by using the light shielding device layer 120, so that the light shielding device layer 120 can buffer the stress generated by the inorganic dielectric stack layer 130 during the process. The strength of the substrate 110 is not affected by the inorganic dielectric stack layer 130, and the substrate 110 can be prevented from being cracked. In detail, the touch panel of the present embodiment can be applied to a touch panel of a One Glass Solution (OGS), which is formed on a large substrate (such as glass) to form a touch sensing component. After that, it is divided into a plurality of touch panels. In the present embodiment, the first side wall 112 of the substrate 110 is a cut portion. Since the light shielding element layer 120 and the first side wall 112 are separated by a first distance d1, the light shielding element layer 120 can be prevented from being cut to break the light shielding during cutting. Element layer 120. On the other hand, the substrate 110 of the present embodiment is, for example, glass. Since the inorganic dielectric stacked layer 130 has lattice characteristics, if the inorganic dielectric stacked layer 130 directly contacts the substrate 110, the film stress of the inorganic dielectric stacked layer 130 may be affected. The substrate 110 is further weakened by the glass strength of the substrate 110. For example, if the inorganic dielectric stack layer 130 is disposed on the surface 114 between the light shielding device layer 120 and the first sidewall 112, stress is concentrated between the light shielding device layer 120, the inorganic dielectric stack layer 130, and the substrate 110. Junction. In detail, the stress is concentrated on the boundary 102 between the substrate 110 and the side edge 121 of the light shielding element layer 120 in the vertical projection direction, so that the substrate 110 is more likely to be cracked during the strength test.

在本實施方式中,無機介電堆疊層130暴露出部分之遮光元件層120的側緣121,亦即無機介電堆疊層130未覆蓋側緣121的邊界102,因此無機介電堆疊層130 之薄膜應力不會集中在側緣121的邊界102上。另外,本實施方式之遮光元件層120可為遮光矩陣(Black Matrix,BM),其材質為有機材料。有機材料之材料特性較無機介電堆疊層130柔軟,因此設置於基板110與無機介電堆疊層130之間時,可作為無機介電堆疊層130之應力緩衝釋放層,應力較不易集中於邊界102上。如此一來,應用本實施方式之觸控面板即可避免基板110於製作過程中或是於強度測試時產生龜裂的情況。 In the present embodiment, the inorganic dielectric stack layer 130 exposes a portion of the side edge 121 of the light shielding device layer 120, that is, the inorganic dielectric stack layer 130 does not cover the boundary 102 of the side edge 121, and thus the inorganic dielectric stack layer 130 The film stress is not concentrated on the boundary 102 of the side edge 121. In addition, the light shielding element layer 120 of the present embodiment may be a light shielding matrix (Black Matrix, BM) made of an organic material. The material property of the organic material is softer than that of the inorganic dielectric stack layer 130. Therefore, when disposed between the substrate 110 and the inorganic dielectric stack layer 130, it can serve as a stress buffer release layer of the inorganic dielectric stack layer 130, and the stress is less likely to concentrate on the boundary. 102. In this way, the touch panel of the embodiment can be used to avoid the cracking of the substrate 110 during the manufacturing process or during the strength test.

請參照第2A圖,其為一實施例之基板910與無機介電層930的側視示意圖。在第2A圖中,基板910之材質為玻璃,而無機介電層930之材質為銦氧化錫(Indium Tin Oxide,ITO),其厚度T1為130奈米。在本實施例中,基板910之玻璃強度為1980.95Mpa,而加上無機介電層930後,其強度下降至942.51Mpa。因此可證明當基板910與無機介電層930接觸後,無機介電層930會減弱基板910本身的玻璃強度。 Please refer to FIG. 2A , which is a schematic side view of the substrate 910 and the inorganic dielectric layer 930 of an embodiment. In FIG. 2A, the material of the substrate 910 is glass, and the material of the inorganic dielectric layer 930 is Indium Tin Oxide (ITO) having a thickness T1 of 130 nm. In the present embodiment, the glass strength of the substrate 910 is 1980.95 MPa, and after the inorganic dielectric layer 930 is added, the strength is lowered to 942.51 MPa. Therefore, it can be confirmed that the inorganic dielectric layer 930 weakens the glass strength of the substrate 910 itself after the substrate 910 is in contact with the inorganic dielectric layer 930.

接著請參照第2B圖,其為另一實施例之基板910與遮光元件層920的側視示意圖。在第2B圖中,基板910之材質為玻璃,遮光元件層920之材質為有機材料(碳矽氧聚合物),其厚度T2為3微米。在本實施例中,加上遮光元件層920後,基板910的玻璃強度仍維持於1960.46Mpa,因此可證明遮光元件層920直接接觸基板910並不會對其強度產生實質影響。 Next, please refer to FIG. 2B , which is a schematic side view of the substrate 910 and the light shielding device layer 920 of another embodiment. In FIG. 2B, the material of the substrate 910 is glass, and the material of the light shielding element layer 920 is an organic material (carbon oxy-polymer) having a thickness T2 of 3 μm. In the present embodiment, after the light shielding element layer 920 is added, the glass strength of the substrate 910 is still maintained at 1960.46 MPa, so that it can be proved that the light shielding element layer 920 directly contacts the substrate 910 without substantially affecting its strength.

接著請參照第2C圖,其為再一實施例之基板910、遮光元件層920與無機介電層930的側視示意圖。在第2C圖中,遮光元件層920置於基板910與無機介電層930之間。基板910之材質為玻璃;遮光元件層920之材質為有機材料(碳矽氧聚合物);無機介電層930之材質為銦氧化錫(Indium Tin Oxide,ITO),其厚度T1為130奈米。當遮光元件層920之厚度T2為2微米時,基板910之玻璃強度為1953.01Mpa,而當遮光元件層920之厚度T2為3微米時,基板910之玻璃強度為2068.25Mpa。也就是說,不論厚度T2為3微米或2微米時,遮光元件層920皆能夠緩衝並均勻無機介電層930之應力,避免基板910之玻璃強度受到影響。 Next, please refer to FIG. 2C , which is a schematic side view of the substrate 910 , the light shielding device layer 920 and the inorganic dielectric layer 930 according to still another embodiment. In FIG. 2C, the light shielding device layer 920 is interposed between the substrate 910 and the inorganic dielectric layer 930. The material of the substrate 910 is glass; the material of the light shielding device layer 920 is an organic material (carbon oxy-polymer); the material of the inorganic dielectric layer 930 is Indium Tin Oxide (ITO), and the thickness T1 is 130 nm. . When the thickness T2 of the light shielding element layer 920 is 2 μm, the glass strength of the substrate 910 is 1953.01 MPa, and when the thickness T2 of the light shielding element layer 920 is 3 μm, the glass strength of the substrate 910 is 2068.25 MPa. That is, regardless of the thickness T2 of 3 micrometers or 2 micrometers, the light-shielding element layer 920 can buffer and uniformly stress the inorganic dielectric layer 930, thereby preventing the glass strength of the substrate 910 from being affected.

綜上所述,由實驗結果得知無機介電層930接觸基板910會使基板910之玻璃強度減低,然而遮光元件層920可緩和無機介電層930之應力,使得基板910可維持其玻璃強度。 In summary, it is found from the experimental results that the inorganic dielectric layer 930 contacts the substrate 910 to reduce the glass strength of the substrate 910. However, the light shielding device layer 920 can alleviate the stress of the inorganic dielectric layer 930, so that the substrate 910 can maintain its glass strength. .

在本實施方式中,觸控面板更包含金屬導電層150,設置於第一無機介電層132與第二無機介電層134之間,且電性連接觸控感測層140。金屬導電層150用以作為觸控面板之訊號線,觸控感測層140之訊號藉由金屬導電層150而與外部電路(例如電路板)連接。另外,金屬導電層150設置第一無機介電層132上且於垂直投影方向上與遮光元件層120重疊,因此遮光元件層120可用於遮蔽金屬導電層150,以避免金屬導電層150影響觸控面板的外觀。 In the embodiment, the touch panel further includes a metal conductive layer 150 disposed between the first inorganic dielectric layer 132 and the second inorganic dielectric layer 134 and electrically connected to the touch sensing layer 140 . The metal conductive layer 150 is used as a signal line of the touch panel, and the signal of the touch sensing layer 140 is connected to an external circuit (for example, a circuit board) by the metal conductive layer 150. In addition, the metal conductive layer 150 is disposed on the first inorganic dielectric layer 132 and overlaps the light shielding device layer 120 in the vertical projection direction. Therefore, the light shielding device layer 120 can be used to shield the metal conductive layer 150 to prevent the metal conductive layer 150 from affecting the touch. The appearance of the panel.

在本實施方式中,無機介電堆疊層130具有鄰近邊界102之第二側壁138。第二側壁138介於金屬導電層150與邊界102之間。在一些實施方式中,第二側壁138與邊界102於垂直投影方向上具有第二距離d2大於約1微米,其中垂直投影方向實質為表面114之法線方向。在另一些實施方式中,第二距離d2為約1微米至3微米,然而第二距離d2亦可大於3微米,端視製程需求。基本上,只要無機介電堆疊層130暴露出遮光元件層120之側緣121,且覆蓋金屬導電層150,皆在本發明之範疇中。 In the present embodiment, the inorganic dielectric stack layer 130 has a second sidewall 138 adjacent the boundary 102. The second sidewall 138 is interposed between the metal conductive layer 150 and the boundary 102. In some embodiments, the second sidewall 138 and the boundary 102 have a second distance d2 greater than about 1 micron in a vertical projection direction, wherein the vertical projection direction is substantially the normal direction of the surface 114. In other embodiments, the second distance d2 is about 1 micron to 3 microns, whereas the second distance d2 can also be greater than 3 microns, depending on process requirements. Basically, as long as the inorganic dielectric stack layer 130 exposes the side edges 121 of the light shielding device layer 120 and covers the metal conductive layer 150, it is within the scope of the present invention.

在本實施方式中,無機介電堆疊層130更包含第三無機介電層136,設置於第一無機介電層132與第二無機介電層134之間,且第三無機介電層136覆蓋金屬導電層150。觸控感測層140包含第一導電層142與第二導電層144。觸控感測層140例如可為單層透明導電膜(Single Indium Tin Oxide,SITO)結構,然而本發明不以此為限。在其他的實施方式中,觸控感測層140亦可為其他觸控結構。在本實施方式中,第一導電層142設置於第一無機介電層132與第三無機介電層136之間。第二導電層144置於第三無機介電層136與第二無機介電層134之間,且與第一導電層142與金屬導電層150透過第二導電層144電性連接。詳細而言,第三無機介電層136設有第一接觸窗TH1與第二接觸窗TH2,其中第一導電層142與第二導電層144透過第一接觸窗TH1電性連接,而第二導電層144與金屬導電層 150透過第二接觸窗TH2電性連接。因此,第一導電層142與第二導電層144可形成具有不同延伸方向之感測層。 In the present embodiment, the inorganic dielectric stack layer 130 further includes a third inorganic dielectric layer 136 disposed between the first inorganic dielectric layer 132 and the second inorganic dielectric layer 134, and the third inorganic dielectric layer 136. The metal conductive layer 150 is covered. The touch sensing layer 140 includes a first conductive layer 142 and a second conductive layer 144. The touch sensing layer 140 can be, for example, a single-layer transparent conductive film (SITO) structure, but the invention is not limited thereto. In other embodiments, the touch sensing layer 140 can also be other touch structures. In the embodiment, the first conductive layer 142 is disposed between the first inorganic dielectric layer 132 and the third inorganic dielectric layer 136 . The second conductive layer 144 is disposed between the third inorganic dielectric layer 136 and the second inorganic dielectric layer 134 , and is electrically connected to the first conductive layer 142 and the metal conductive layer 150 through the second conductive layer 144 . In detail, the third inorganic dielectric layer 136 is provided with a first contact window TH1 and a second contact window TH2, wherein the first conductive layer 142 and the second conductive layer 144 are electrically connected through the first contact window TH1, and the second Conductive layer 144 and metal conductive layer 150 is electrically connected through the second contact window TH2. Therefore, the first conductive layer 142 and the second conductive layer 144 may form sensing layers having different extending directions.

在本實施方式中,側緣121與第一側壁112之間的第一距離d1為約50微米至5000微米。另外,雖然上述實施例皆以玻璃基板作為說明,然而在其他的實施方式中,基板110的材質亦可為塑膠或其他適合之材質,本發明不以此為限。 In the present embodiment, the first distance d1 between the side edge 121 and the first side wall 112 is between about 50 microns and 5000 microns. In addition, although the glass substrate is used as the description in the above embodiments, in other embodiments, the material of the substrate 110 may be plastic or other suitable materials, and the invention is not limited thereto.

接著請參照第3圖,其為本發明另一實施方式之觸控面板的側視示意圖。本實施方式之觸控面板與第1圖的不同處在於遮光元件層120的結構。在本實施方式中,遮光元件層120包含遮光層122與有機絕緣層124。遮光層122置於表面114上。有機絕緣層124覆蓋遮光層122,且設置於遮光層122與無機介電堆疊層130之間。具體而言,遮光層122可為遮光矩陣,因此遮光層122與有機絕緣層124之材質皆為有機材料,其可緩衝無機介電堆疊層130所產生的應力。在一些實施方式中,有機絕緣層124可為透明或不透明之材質,其可為依照觸控面板之需求而加入光學層,用以調整觸控面板之光學性質,然而本發明不以此為限。至於本實施方式的其他細節因與第1圖相同,因此便不再贅述。 Please refer to FIG. 3 , which is a side view of a touch panel according to another embodiment of the present invention. The difference between the touch panel of the present embodiment and FIG. 1 lies in the structure of the light shielding element layer 120. In the present embodiment, the light shielding element layer 120 includes a light shielding layer 122 and an organic insulating layer 124. The light shielding layer 122 is placed on the surface 114. The organic insulating layer 124 covers the light shielding layer 122 and is disposed between the light shielding layer 122 and the inorganic dielectric stacked layer 130 . Specifically, the light shielding layer 122 can be a light shielding matrix. Therefore, the materials of the light shielding layer 122 and the organic insulating layer 124 are organic materials, which can buffer the stress generated by the inorganic dielectric stack layer 130. In some embodiments, the organic insulating layer 124 may be a transparent or opaque material, which may be added to the optical layer according to the requirements of the touch panel to adjust the optical properties of the touch panel. However, the present invention is not limited thereto. . Other details of the present embodiment are the same as those of Fig. 1, and therefore will not be described again.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.

102‧‧‧邊界 102‧‧‧ border

110‧‧‧基板 110‧‧‧Substrate

112‧‧‧第一側壁 112‧‧‧First side wall

114‧‧‧表面 114‧‧‧ surface

116a‧‧‧顯示區 116a‧‧‧ display area

116b‧‧‧周邊區 116b‧‧‧ surrounding area

120‧‧‧遮光元件層 120‧‧‧ shading element layer

121‧‧‧側緣 121‧‧‧ side edge

130‧‧‧無機介電堆疊層 130‧‧‧Inorganic dielectric stack

132‧‧‧第一無機介電層 132‧‧‧First inorganic dielectric layer

134‧‧‧第二無機介電層 134‧‧‧Second inorganic dielectric layer

136‧‧‧第三無機介電層 136‧‧‧ Third inorganic dielectric layer

138‧‧‧第二側壁 138‧‧‧ second side wall

140‧‧‧觸控感測層 140‧‧‧Touch sensing layer

142‧‧‧第一導電層 142‧‧‧First conductive layer

144‧‧‧第二導電層 144‧‧‧Second conductive layer

150‧‧‧金屬導電層 150‧‧‧Metal conductive layer

d1‧‧‧第一距離 D1‧‧‧first distance

d2‧‧‧第二距離 D2‧‧‧Second distance

TH1‧‧‧第一接觸窗 TH1‧‧‧ first contact window

TH2‧‧‧第二接觸窗 TH2‧‧‧Second contact window

Claims (9)

一種觸控面板,包含:一基板,具有一第一側壁與一表面,該表面具有一顯示區與一周邊區,該周邊區環繞該顯示區,且該第一側壁毗鄰該周邊區;一遮光元件層,設置於該基板之該表面的該周邊區,且具有鄰近該第一側壁之一側緣並與該第一側壁相隔一第一距離;一無機介電堆疊層,覆蓋該表面之該顯示區與部分之該遮光元件層,且暴露出該遮光元件層鄰近該第一側壁之該側緣,其中該無機介電堆疊層包含:一第一無機介電層,設置於該表面與該遮光元件層上;以及一第二無機介電層,設置於該第一無機介電層上;以及一觸控感測層,設置於該第一無機介電層與該第二無機介電層之間。 A touch panel includes: a substrate having a first sidewall and a surface, the surface having a display area and a peripheral area, the peripheral area surrounding the display area, and the first side wall adjacent to the peripheral area; a shading element a layer disposed on the peripheral region of the surface of the substrate and having a side edge adjacent to the first sidewall and spaced apart from the first sidewall by a first distance; an inorganic dielectric stack layer covering the display of the surface And a portion of the light shielding device layer, and exposing the light shielding device layer adjacent to the side edge of the first sidewall, wherein the inorganic dielectric stack layer comprises: a first inorganic dielectric layer disposed on the surface and the light shielding layer And a second inorganic dielectric layer disposed on the first inorganic dielectric layer; and a touch sensing layer disposed on the first inorganic dielectric layer and the second inorganic dielectric layer between. 如請求項1所述之觸控面板,更包含:一金屬導電層,設置於該第一無機介電層與該第二無機介電層之間,且電性連接該觸控感測層。 The touch panel of claim 1, further comprising: a metal conductive layer disposed between the first inorganic dielectric layer and the second inorganic dielectric layer and electrically connected to the touch sensing layer. 如請求項2所述之觸控面板,其中該遮光元件層之該側緣與該基板於垂直投影方向上具有一邊界, 且該無機介電堆疊層具有鄰近該邊界之一第二側壁,該第二側壁介於該金屬導電層與該邊界之間。 The touch panel of claim 2, wherein the side edge of the light shielding element layer has a boundary with the substrate in a vertical projection direction. And the inorganic dielectric stack layer has a second sidewall adjacent to the boundary, the second sidewall being interposed between the metal conductive layer and the boundary. 如請求項2所述之觸控面板,其中該無機介電堆疊層更包含:一第三無機介電層,置於該第一無機介電層與該第二無機介電層之間,且該第三無機介電層覆蓋該金屬導電層;以及該觸控感測層包含:一第一導電層,置於該第一無機介電層與該第三無機介電層之間;以及一第二導電層,置於該第三無機介電層與該第二無機介電層之間,且與該第一導電層以及該金屬導電層電性連接。 The touch panel of claim 2, wherein the inorganic dielectric stack further comprises: a third inorganic dielectric layer disposed between the first inorganic dielectric layer and the second inorganic dielectric layer, and The third inorganic dielectric layer covers the metal conductive layer; and the touch sensing layer comprises: a first conductive layer disposed between the first inorganic dielectric layer and the third inorganic dielectric layer; and a The second conductive layer is disposed between the third inorganic dielectric layer and the second inorganic dielectric layer, and is electrically connected to the first conductive layer and the metal conductive layer. 如請求項1所述之觸控面板,其中該側緣與該第一側壁之間的該第一距離為約50微米至5000微米。 The touch panel of claim 1, wherein the first distance between the side edge and the first sidewall is between about 50 microns and 5000 microns. 如請求項1所述之觸控面板,其中該遮光元件層之該側緣與該基板於垂直投影方向上具有一邊界,且該無機介電堆疊層鄰近該邊界之一第二側壁,該第二側壁與該邊界於垂直投影方向上具有一第二距離大於約1微米。 The touch panel of claim 1, wherein the side edge of the light shielding element layer has a boundary with the substrate in a vertical projection direction, and the inorganic dielectric stack layer is adjacent to a second sidewall of the boundary, the first The two sidewalls have a second distance greater than about 1 micron from the boundary in the vertical projection direction. 如請求項6所述之觸控面板,該第二側壁與該邊界之間的該第二距離為約3微米至20微米。 The touch panel of claim 6, wherein the second distance between the second sidewall and the boundary is about 3 microns to 20 microns. 如請求項1所述之觸控面板,其中該遮光元件層包含:一遮光層,置於該表面上;以及一有機絕緣層,覆蓋該遮光層,且設置於該遮光層與該無機介電堆疊層之間。 The touch panel of claim 1, wherein the light shielding element layer comprises: a light shielding layer disposed on the surface; and an organic insulating layer covering the light shielding layer, and disposed on the light shielding layer and the inorganic dielectric layer Between stacked layers. 如請求項1所述之觸控面板,其中該基板的材質為玻璃、塑膠或其他適合之材質。 The touch panel of claim 1, wherein the substrate is made of glass, plastic or other suitable material.
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