TWI529502B - 投影曝光裝置 - Google Patents
投影曝光裝置 Download PDFInfo
- Publication number
- TWI529502B TWI529502B TW104136142A TW104136142A TWI529502B TW I529502 B TWI529502 B TW I529502B TW 104136142 A TW104136142 A TW 104136142A TW 104136142 A TW104136142 A TW 104136142A TW I529502 B TWI529502 B TW I529502B
- Authority
- TW
- Taiwan
- Prior art keywords
- mirror
- pupil
- lens
- projection objective
- image
- Prior art date
Links
- 210000001747 pupil Anatomy 0.000 claims description 253
- 230000005855 radiation Effects 0.000 claims description 76
- 238000005286 illumination Methods 0.000 claims description 68
- 230000003287 optical effect Effects 0.000 description 172
- 238000003384 imaging method Methods 0.000 description 52
- 238000007654 immersion Methods 0.000 description 46
- 230000004075 alteration Effects 0.000 description 32
- 238000012937 correction Methods 0.000 description 24
- 230000000694 effects Effects 0.000 description 23
- 239000000758 substrate Substances 0.000 description 22
- 230000008859 change Effects 0.000 description 19
- 239000007788 liquid Substances 0.000 description 19
- 239000000463 material Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 19
- 238000013461 design Methods 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 16
- 238000009826 distribution Methods 0.000 description 13
- 238000000671 immersion lithography Methods 0.000 description 12
- 238000001459 lithography Methods 0.000 description 12
- 238000004088 simulation Methods 0.000 description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 230000009467 reduction Effects 0.000 description 9
- 230000006835 compression Effects 0.000 description 8
- 238000007906 compression Methods 0.000 description 8
- 230000003044 adaptive effect Effects 0.000 description 7
- 238000005452 bending Methods 0.000 description 7
- 238000006073 displacement reaction Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 229910001868 water Inorganic materials 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 201000009310 astigmatism Diseases 0.000 description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 4
- 238000010276 construction Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 206010010071 Coma Diseases 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000003518 caustics Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- 241000700608 Sagitta Species 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000004323 axial length Effects 0.000 description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 description 2
- 238000005056 compaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 150000004673 fluoride salts Chemical class 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 208000022749 pupil disease Diseases 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910016036 BaF 2 Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 206010027646 Miosis Diseases 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 1
- NXEFKYQFCUFLNF-UHFFFAOYSA-K lithium;barium(2+);trifluoride Chemical compound [Li+].[F-].[F-].[F-].[Ba+2] NXEFKYQFCUFLNF-UHFFFAOYSA-K 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000003909 pattern recognition Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000005381 potential energy Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 1
Landscapes
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83731706P | 2006-08-14 | 2006-08-14 | |
| EP06016914A EP1890191A1 (en) | 2006-08-14 | 2006-08-14 | Catadioptric projection objective with pupil mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201604664A TW201604664A (zh) | 2016-02-01 |
| TWI529502B true TWI529502B (zh) | 2016-04-11 |
Family
ID=41591684
Family Applications (6)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104136142A TWI529502B (zh) | 2006-08-14 | 2007-08-13 | 投影曝光裝置 |
| TW96129863A TWI430042B (zh) | 2006-08-14 | 2007-08-13 | 具有光瞳鏡（ｐｕｐｉｌ ｍｉｒｒｏｒ）之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 |
| TW107116998A TW201908871A (zh) | 2006-08-14 | 2007-08-13 | 具有光瞳鏡（pupil mirror）之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 |
| TW105139440A TW201732443A (zh) | 2006-08-14 | 2007-08-13 | 具有光瞳鏡（pupil mirror） 之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 |
| TW104136141A TWI531874B (zh) | 2006-08-14 | 2007-08-13 | 投影曝光裝置 |
| TW103101879A TW201426205A (zh) | 2006-08-14 | 2007-08-13 | 具有光瞳鏡（ｐｕｐｉｌ ｍｉｒｒｏｒ）之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 |
Family Applications After (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96129863A TWI430042B (zh) | 2006-08-14 | 2007-08-13 | 具有光瞳鏡（ｐｕｐｉｌ ｍｉｒｒｏｒ）之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 |
| TW107116998A TW201908871A (zh) | 2006-08-14 | 2007-08-13 | 具有光瞳鏡（pupil mirror）之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 |
| TW105139440A TW201732443A (zh) | 2006-08-14 | 2007-08-13 | 具有光瞳鏡（pupil mirror） 之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 |
| TW104136141A TWI531874B (zh) | 2006-08-14 | 2007-08-13 | 投影曝光裝置 |
| TW103101879A TW201426205A (zh) | 2006-08-14 | 2007-08-13 | 具有光瞳鏡（ｐｕｐｉｌ ｍｉｒｒｏｒ）之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (8) | JP5462625B2 (enrdf_load_stackoverflow) |
| CN (1) | CN101523294B (enrdf_load_stackoverflow) |
| TW (6) | TWI529502B (enrdf_load_stackoverflow) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103135356B (zh) * | 2011-11-23 | 2015-04-15 | 上海微电子装备有限公司 | 反射式光刻投影物镜 |
| CN102436058B (zh) * | 2011-12-14 | 2013-08-21 | 北京理工大学 | 一种用于深紫外波段的全球面折反式准直物镜 |
| JP6028350B2 (ja) * | 2012-03-16 | 2016-11-16 | 株式会社ニコン | 基板処理装置、デバイス製造システム及びデバイス製造方法 |
| US9651872B2 (en) | 2013-03-13 | 2017-05-16 | Carl Zeiss Smt Gmbh | Projection lens with wavefront manipulator |
| DE102013204391B3 (de) * | 2013-03-13 | 2014-05-28 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Wellenfrontmanipulator |
| CN103353669B (zh) * | 2013-07-30 | 2015-07-15 | 中国科学院光电技术研究所 | 一种高数值孔径浸没投影物镜 |
| TW201514541A (zh) * | 2013-09-19 | 2015-04-16 | 尼康股份有限公司 | 投影光學系統、投影光學系統的調整方法、曝光裝置、曝光方法以及元件製造方法 |
| CN105116527B (zh) * | 2015-09-25 | 2018-10-30 | 上海新跃仪表厂 | 一种大相对孔径低畸变广角长红外折反射式光学系统 |
| JP6748482B2 (ja) * | 2016-05-25 | 2020-09-02 | キヤノン株式会社 | 露光装置、および、物品の製造方法 |
| CN108152940B (zh) * | 2016-12-05 | 2021-04-27 | 佳能株式会社 | 反射折射光学系统、照明光学系统、曝光装置 |
| CN109581622B (zh) * | 2017-09-29 | 2020-12-04 | 上海微电子装备（集团）股份有限公司 | 一种投影物镜 |
| JP2019124796A (ja) * | 2018-01-16 | 2019-07-25 | キヤノン株式会社 | 結像光学系、画像投射装置およびカメラシステム |
| US11067389B2 (en) * | 2018-03-13 | 2021-07-20 | Kla Corporation | Overlay metrology system and method |
| CN109298517B (zh) * | 2018-11-05 | 2020-10-30 | 中国航空工业集团公司洛阳电光设备研究所 | 一种多光谱同轴折反式无焦光学系统 |
| JP7431319B2 (ja) * | 2019-09-10 | 2024-02-14 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィプロセスのサブフィールド制御及び関連する装置 |
| KR102409108B1 (ko) * | 2020-09-18 | 2022-06-15 | 삼성전기주식회사 | 촬상 광학계 |
| CN113687500B (zh) * | 2021-08-03 | 2024-03-26 | 润坤(上海)光学科技有限公司 | 折转式探测器光学系统 |
| DE102021213827A1 (de) * | 2021-12-06 | 2023-06-07 | Carl Zeiss Smt Gmbh | Verfahren zur Optimierung einer Pupillen-Blendenform zur Nachbildung von Beleuchtungs- und Abbildungseigenschaften eines optischen Produktionssystems bei der Beleuchtung und Abbildung eines Objekts mittels eines optischen Messsystems |
| TWI813395B (zh) * | 2022-07-22 | 2023-08-21 | 新鉅科技股份有限公司 | 光學透鏡組和頭戴式電子裝置 |
| CN115332030B (zh) * | 2022-08-23 | 2025-07-11 | 苏州博众仪器科技有限公司 | 一种物镜及其结构设计方法、透射电子显微镜 |
| CN118981149B (zh) * | 2024-07-09 | 2025-03-07 | 上海微电子装备（集团）股份有限公司 | 基于瞳面调制的垂向测量方法、调焦调平系统及曝光装置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01120855U (enrdf_load_stackoverflow) * | 1988-02-08 | 1989-08-16 | ||
| JPH0215131U (enrdf_load_stackoverflow) * | 1988-07-13 | 1990-01-30 | ||
| JP3368091B2 (ja) * | 1994-04-22 | 2003-01-20 | キヤノン株式会社 | 投影露光装置及びデバイスの製造方法 |
| JP3781044B2 (ja) * | 1994-11-07 | 2006-05-31 | 株式会社ニコン | 反射屈折光学系および投影露光装置 |
| JPH10301058A (ja) * | 1997-04-30 | 1998-11-13 | Nikon Corp | 反射屈折投影光学系 |
| DE19824030A1 (de) * | 1998-05-29 | 1999-12-02 | Zeiss Carl Fa | Katadioptrisches Projektionsobjektiv mit adaptivem Spiegel und Projektionsbelichtungsverfahren |
| DE10120446C2 (de) * | 2001-04-26 | 2003-04-17 | Zeiss Carl | Projektionsbelichtungsanlage sowie Verfahren zur Kompensation von Abbildungsfehlern in einer Projektionsbelichtungsanlage, insbesondere für die Mikro-Lithographie |
| JP2005037896A (ja) * | 2003-05-23 | 2005-02-10 | Canon Inc | 投影光学系、露光装置及びデバイスの製造方法 |
| JP2005019628A (ja) * | 2003-06-25 | 2005-01-20 | Nikon Corp | 光学装置、露光装置、並びにデバイス製造方法 |
| KR101179350B1 (ko) * | 2004-01-14 | 2012-09-11 | 칼 짜이스 에스엠티 게엠베하 | 반사굴절식 투영 대물렌즈 |
| JP2005311020A (ja) * | 2004-04-21 | 2005-11-04 | Nikon Corp | 露光方法及びデバイス製造方法 |
| KR101376931B1 (ko) * | 2004-05-17 | 2014-03-25 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| JP4843272B2 (ja) * | 2004-07-31 | 2011-12-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の光学システム |
| JP4581662B2 (ja) * | 2004-12-07 | 2010-11-17 | 株式会社ニコン | 投影光学系及び露光装置並びにデバイスの製造方法 |
| JP2009122247A (ja) * | 2007-11-13 | 2009-06-04 | Kayaba Ind Co Ltd | 使用時に人体皮膚が接触する物品 |
-
2007
- 2007-08-10 CN CN2007800383365A patent/CN101523294B/zh not_active Expired - Fee Related
- 2007-08-10 JP JP2009524108A patent/JP5462625B2/ja not_active Expired - Fee Related
- 2007-08-13 TW TW104136142A patent/TWI529502B/zh not_active IP Right Cessation
- 2007-08-13 TW TW96129863A patent/TWI430042B/zh not_active IP Right Cessation
- 2007-08-13 TW TW107116998A patent/TW201908871A/zh unknown
- 2007-08-13 TW TW105139440A patent/TW201732443A/zh unknown
- 2007-08-13 TW TW104136141A patent/TWI531874B/zh active
- 2007-08-13 TW TW103101879A patent/TW201426205A/zh unknown
-
2010
- 2010-08-10 JP JP2010179225A patent/JP5462739B2/ja active Active
-
2014
- 2014-01-14 JP JP2014004396A patent/JP5684412B2/ja not_active Expired - Fee Related
- 2014-01-14 JP JP2014004442A patent/JP5684413B2/ja not_active Expired - Fee Related
-
2015
- 2015-01-09 JP JP2015003177A patent/JP2015109463A/ja active Pending
-
2016
- 2016-04-13 JP JP2016080405A patent/JP2016157137A/ja active Pending
-
2017
- 2017-07-28 JP JP2017146821A patent/JP2017199031A/ja not_active Withdrawn
-
2018
- 2018-01-31 JP JP2018015238A patent/JP2018077534A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| JP5684413B2 (ja) | 2015-03-11 |
| JP5462739B2 (ja) | 2014-04-02 |
| TW201732443A (zh) | 2017-09-16 |
| CN101523294A (zh) | 2009-09-02 |
| JP5684412B2 (ja) | 2015-03-11 |
| JP5462625B2 (ja) | 2014-04-02 |
| TW201604663A (zh) | 2016-02-01 |
| TW201604664A (zh) | 2016-02-01 |
| JP2011013681A (ja) | 2011-01-20 |
| JP2014074930A (ja) | 2014-04-24 |
| JP2015109463A (ja) | 2015-06-11 |
| JP2018077534A (ja) | 2018-05-17 |
| JP2017199031A (ja) | 2017-11-02 |
| TW200827938A (en) | 2008-07-01 |
| TW201426205A (zh) | 2014-07-01 |
| TWI531874B (zh) | 2016-05-01 |
| TWI430042B (zh) | 2014-03-11 |
| JP2014123749A (ja) | 2014-07-03 |
| CN101523294B (zh) | 2012-08-08 |
| JP2010500769A (ja) | 2010-01-07 |
| TW201908871A (zh) | 2019-03-01 |
| JP2016157137A (ja) | 2016-09-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |