TWI528102B - Diaphragm device, camera and electronic equipment - Google Patents

Diaphragm device, camera and electronic equipment Download PDF

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Publication number
TWI528102B
TWI528102B TW100127697A TW100127697A TWI528102B TW I528102 B TWI528102 B TW I528102B TW 100127697 A TW100127697 A TW 100127697A TW 100127697 A TW100127697 A TW 100127697A TW I528102 B TWI528102 B TW I528102B
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Taiwan
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aperture
filter
light
filter layer
opening
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TW100127697A
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Chinese (zh)
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TW201222141A (en
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戶丸崇
郡直道
原澤大輔
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日本精密測器股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00Exposure-making shutters; Diaphragms
    • G03B9/02Diaphragms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B11/00Filters or other obturators specially adapted for photographic purposes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B37/00Panoramic or wide-screen photography; Photographing extended surfaces, e.g. for surveying; Photographing internal surfaces, e.g. of pipe
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00Exposure-making shutters; Diaphragms
    • G03B9/08Shutters
    • G03B9/10Blade or disc rotating or pivoting about axis normal to its plane
    • G03B9/14Two separate members moving in opposite directions
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Optics & Photonics (AREA)
  • Blocking Light For Cameras (AREA)
  • Diaphragms For Cameras (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Studio Devices (AREA)

Description

光圈裝置,攝影機及電子機器Aperture device, camera and electronic machine

本發明係關於一種具有一對光圈葉片之光圈裝置、與具備此之攝影機及電子機器。The present invention relates to an aperture device having a pair of aperture blades, and a camera and an electronic device therewith.

通常,於晝夜兼用之監視攝影機,組裝有可進行彩色攝影之攝像元件。此種監視攝影機,會在被攝體較亮時、與被攝體較暗時切換攝影模式。具體而言,以於被攝體較亮之白晝等之攝影時應用彩色攝影模式,於被攝體較暗之夜間等之攝影時應用單色攝影模式之方式切換攝影模式。Usually, an imaging device capable of color photography is assembled in a surveillance camera that is used both day and night. Such a surveillance camera switches the shooting mode when the subject is brighter and the subject is darker. Specifically, the color photographing mode is applied to the photographing of a brighter white or the like, and the photographing mode is switched in a manner of applying a monochrome photographing mode at the time of photographing at night when the subject is dark.

又,於彩色攝影模式,係於攝像元件之前段(光之入射側)配置有紅外線截止濾光片。因此,於以彩色攝影模式進行攝影時,自外部所入射之光係經由紅外線截止濾光片而到達攝像元件。相對於此,於單色攝影模式時,係使紅外線截止濾光片自攝像元件之前段退避。因此,於以單色攝像模式進行攝影時,自外部所入射之光將不經由紅外線截止濾光片而到達攝像元件。Further, in the color photographing mode, an infrared cut filter is disposed in front of the image pickup element (light incident side). Therefore, when photographing is performed in the color photographing mode, light incident from the outside reaches the image pickup element via the infrared cut filter. On the other hand, in the monochrome photographing mode, the infrared cut filter is retracted from the front side of the image sensor. Therefore, when photographing is performed in the monochrome imaging mode, light incident from the outside does not reach the imaging element via the infrared cut filter.

於包含上述監視攝影機之各種攝影機中,係組裝有用以調整自外部入射至該攝影機之光量(以下,記為「入射光量」)之光圈裝置。光圈裝置係藉由改變存在於入射光之光路徑上之光圈開口的大小而調整(適當化)入射光量者。In the various cameras including the above-described surveillance cameras, an aperture device for adjusting the amount of light incident on the camera from the outside (hereinafter referred to as "incident light amount") is incorporated. The aperture device adjusts (appropriates) the amount of incident light by changing the size of the aperture opening existing on the light path of the incident light.

圖8係表示習知之光圈裝置之一例之分解斜視圖。光圈裝置200主要係構成為具備有光圈基板201、一對光圈葉片202、203、濾光片基板204、葉片蓋205、光圈驅動部206、濾光片驅動部207、及一對ND濾光片208、209。Fig. 8 is an exploded perspective view showing an example of a conventional aperture device. The aperture device 200 is mainly configured to include a diaphragm substrate 201, a pair of diaphragm blades 202 and 203, a filter substrate 204, a blade cover 205, a diaphragm driving unit 206, a filter driving unit 207, and a pair of ND filters. 208, 209.

光圈基板201係移動自如地(滑動自如)支持一對光圈葉片202、203者。又,光圈基板201係支持光圈驅動部206與濾光片驅動部207者。The diaphragm substrate 201 is slidably movable (slidably) to support the pair of diaphragm blades 202 and 203. Further, the diaphragm substrate 201 supports the diaphragm driving unit 206 and the filter driving unit 207.

一對光圈葉片202、203,係以相互疊合之狀態形成光圈開口者。此光圈開口係藉由形成於一方之光圈葉片202之孔部210、與設置於另一方之光圈葉片203之灣部211所形成者。The pair of aperture blades 202, 203 form a diaphragm opening in a state of being superposed on each other. This aperture opening is formed by the hole portion 210 formed in one of the aperture blades 202 and the bay portion 211 provided on the other aperture blade 203.

濾光片基板204係具有將自外部所入射之光中,截止紅外線區域(包括近紅外線區域)之光的過濾功能。具體而言,如圖9及圖10所示,濾光片基板204係構成為於玻璃基板212之單面形成有紅外線截止濾光片層213。又,濾光片基板204係安裝於框架構件214。而且,藉由濾光片基板204與框架構件214之組合構成濾光片單元215。The filter substrate 204 has a filtering function of cutting off light in the infrared region (including the near-infrared region) from the light incident from the outside. Specifically, as shown in FIGS. 9 and 10 , the filter substrate 204 is configured such that an infrared cut filter layer 213 is formed on one surface of the glass substrate 212 . Further, the filter substrate 204 is attached to the frame member 214. Further, the filter unit 215 is constituted by a combination of the filter substrate 204 and the frame member 214.

葉片蓋205係自外部遮蔽安裝於光圈基板201之一對光圈葉片202、203而加以保護者。The blade cover 205 is shielded from the outside by one of the diaphragm substrates 201 and protected by the diaphragm blades 202 and 203.

光圈驅動部206係使一對光圈葉片202、203相對地移動(以下,亦僅記為「相對移動」)者。一對光圈葉片262、203之相對移動,係成為使此等朝相互接近或遠離之方向所進行的移動。The diaphragm driving unit 206 moves the pair of diaphragm blades 202 and 203 relatively (hereinafter, simply referred to as “relative movement”). The relative movement of the pair of aperture blades 262, 203 is such that the movement is made in such a direction as to approach or move away from each other.

濾光片驅動部207係使包含濾光片基板204及框架構件214之濾光片單元215進行移動者。藉由濾光片驅動部207使濾光片單元215進行之移動,係於使濾光片基板204前進至入射光之光路徑上、及使濾光片基板204自入射光之光路徑上退避時進行。The filter driving unit 207 moves the filter unit 215 including the filter substrate 204 and the frame member 214. The filter unit 215 is moved by the filter driving unit 207 to advance the filter substrate 204 to the light path of the incident light and to evacuate the filter substrate 204 from the light path of the incident light. Time to proceed.

ND濾光片208、209係分別使光衰減者。如圖11所示,ND濾光片208係使用接著劑安裝於一方之光圈葉片202之孔部210之邊緣,而ND濾光片209係使用接著劑安裝於另一方之光圈葉片203之灣部211之邊緣。The ND filters 208 and 209 respectively attenuate the light. As shown in FIG. 11, the ND filter 208 is attached to the edge of the hole portion 210 of one of the aperture blades 202 using an adhesive, and the ND filter 209 is attached to the bay portion of the other aperture blade 203 using an adhesive. The edge of 211.

於包含上述構成之光圈裝置200中,當使一對光圈葉片202、203疊合而安裝於光圈基板201時,如圖12所示,於孔部210與灣部211之相疊合之部分係形成有光圈開口216。而且,若於光圈基板201上驅動光圈驅動部206,則一對之光圈葉片202、203將朝相互接近或遠離之方向移動。如此一來,光圈開口216之大小將因應一對光圈葉片202、203之移動方向及移動量而產生變化。In the aperture device 200 including the above-described configuration, when the pair of aperture blades 202 and 203 are stacked and attached to the aperture substrate 201, as shown in FIG. 12, the portion where the hole portion 210 and the bay portion 211 are overlapped is An aperture opening 216 is formed. When the diaphragm driving unit 206 is driven on the diaphragm substrate 201, the pair of diaphragm blades 202 and 203 are moved toward or away from each other. As a result, the size of the aperture opening 216 will vary depending on the direction of movement and the amount of movement of the pair of aperture blades 202, 203.

具體而言,若一對光圈葉片202、203朝相互接近之方向(圖12之實線之箭頭方向)移動,則光圈開口216將隨此變大,與此相反,若一對光圈葉片202、203朝相互遠離之方向(圖12之虛線之箭頭方向)移動,則光圈開口216隨此變小。又,若使一對之光圈葉片202、203處於最接近之狀態,則光圈開口216將成為最大(全開狀態),若使一對之光圈葉片202、203處於最遠離之狀態,則光圈開口216將成為最小(完全關閉之狀態或者接近完全關閉之狀態)。圖13係表示使光圈開口開放(全開)之狀態,圖14係表示使光圈開口成為小光圈之狀態。Specifically, when the pair of aperture blades 202 and 203 are moved toward each other (the direction of the arrow of the solid line in FIG. 12), the aperture opening 216 will become larger, and conversely, if a pair of aperture blades 202, When the 203 moves toward the direction away from each other (the direction of the arrow of the broken line in Fig. 12), the aperture opening 216 becomes smaller accordingly. When the pair of aperture blades 202 and 203 are in the closest state, the aperture opening 216 is maximized (full open state), and if the pair of aperture blades 202 and 203 are in the farthest state, the aperture opening 216 Will be the smallest (completely closed state or near fully closed state). Fig. 13 shows a state in which the aperture opening is opened (fully opened), and Fig. 14 shows a state in which the aperture opening is made into a small aperture.

又,對於光圈基板201,以使濾光片基板204相對於上述光圈開口216可進退(可插拔)之方式,於一對光圈葉片202、203之間(間隙部分)配置有濾光片單元215(濾光片基板204、框架構件214)。而且,若於光圈基板201上驅動濾光片驅動部207,則濾光片基板204將與框架構件214成為一體並進行移動。此時,若使濾光片基板204朝一側移動,則濾光片基板204將成為前進至通過光圈開口216之入射光之光路徑上之狀態。又,若使濾光片基板204朝另一側移動,則濾光片基板204將成為自上述光路徑上退避之狀態。Further, in the diaphragm substrate 201, a filter unit is disposed between the pair of diaphragm blades 202 and 203 (gap portion) so that the filter substrate 204 can advance and retreat (pluggable) with respect to the diaphragm opening 216. 215 (filter substrate 204, frame member 214). When the filter driving unit 207 is driven on the diaphragm substrate 201, the filter substrate 204 is integrated with the frame member 214 and moved. At this time, when the filter substrate 204 is moved to one side, the filter substrate 204 is in a state of proceeding to the light path of the incident light passing through the aperture opening 216. Further, when the filter substrate 204 is moved to the other side, the filter substrate 204 is retracted from the optical path.

於進行此一動作之光圈裝置200中,濾光片基板204與ND濾光片208、209係因各自不同之使用目的而組裝。即,濾光片基板204係於以適用於白晝等之彩色攝影模式進行攝影時,用以防止起因於紅外光之入射所導致影像之色偏差(影像偏紅色之現象)而組裝。相對於此,ND濾光片208、209係用以使即便在白晝等之攝影時為了不使攝像元件之像素之信號飽和而在將光圈開口216縮小之狀況下,亦可精細地控制入射光量而組裝。In the aperture device 200 that performs this operation, the filter substrate 204 and the ND filters 208 and 209 are assembled for different purpose of use. That is, the filter substrate 204 is assembled to prevent color deviation (image redness) caused by the incident of infrared light when photographing in a color photographing mode suitable for daylight or the like. On the other hand, the ND filters 208 and 209 are used to finely control the amount of incident light even when the aperture opening 216 is reduced in order to prevent the signal of the pixel of the imaging element from being saturated during imaging such as daylight. And assembly.

作為此種光圈裝置,例如已知有於專利文獻1中所記載者。又,雖然並非利用一對光圈葉片者,但作為監視攝影機用途之透鏡,已知有使紅外線截止濾光片與ND濾光片形成為一體者(參照專利文獻2)。As such an aperture device, for example, those described in Patent Document 1 are known. In addition, it is known that the infrared cut filter and the ND filter are integrally formed as a lens for monitoring a camera (see Patent Document 2).

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本專利特開2007-17594號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-17594

[專利文獻2]日本專利特開平5-110938號公報[Patent Document 2] Japanese Patent Laid-Open No. Hei 5-110938

於上述習知之光圈裝置200中,係形成為配合各自之使用目的而分別安裝濾光片基板204與ND濾光片208、209之構成。In the above-described aperture device 200, the filter substrate 204 and the ND filters 208 and 209 are separately mounted for the purpose of use.

即,關於濾光片基板204,於白晝等之攝影時,必須使其前進至入射光之光路徑上,而於夜間等之攝影時,則必須使其自入射光之光路徑上退避。因此,採用藉由於框架構件214安裝濾光片基板204,而使濾光片基板204與其框架構件214一體地移動之構成。In other words, the filter substrate 204 must be advanced to the light path of the incident light during imaging such as daylight, and must be retracted from the light path of the incident light during shooting at night or the like. Therefore, the filter substrate 204 is moved integrally with the frame member 214 by the filter member substrate 204 being attached to the frame member 214.

另一方面,關於ND濾光片208、209,於縮小光圈開口216時,必須使ND濾光片208、209有效地發揮功能。因此,採用藉由於一對光圈葉片202、203分別安裝ND濾光片208、209,而使各自之光圈葉片202、203與ND濾光片208、209一體地移動之構成。On the other hand, in the ND filters 208 and 209, when the aperture opening 216 is reduced, it is necessary to effectively function the ND filters 208 and 209. Therefore, the ND filters 208 and 209 are attached to the pair of aperture blades 202 and 203, and the respective aperture blades 202 and 203 and the ND filters 208 and 209 are integrally moved.

然而,於習知之光圈裝置200中,存在著如下之缺陷。However, in the conventional aperture device 200, there are the following drawbacks.

即,若藉由一對光圈葉片202、203之相對移動而使光圈開口216自全開狀態逐漸縮小,則如上述圖12所示,於其中途,一對ND濾光片208、209將開始疊合。於該情形下,通過光圈開口216之光,係區分為:通過單獨存在之ND濾光片208或ND濾光片209的部分之光;通過2個ND濾光片208、209相疊合的部分之光;及通過ND濾光片208、209以外的部分之光。因此,於通過光圈開口216之光量中會產生部分之差別。That is, if the aperture opening 216 is gradually reduced from the fully open state by the relative movement of the pair of aperture blades 202, 203, as shown in FIG. 12 above, a pair of ND filters 208, 209 will start to overlap. Hehe. In this case, the light passing through the aperture opening 216 is divided into: light passing through a portion of the ND filter 208 or the ND filter 209 which is separately present; superimposed by the two ND filters 208, 209 Part of the light; and a portion of the light passing through the ND filters 208, 209. Therefore, a partial difference occurs in the amount of light passing through the aperture opening 216.

其結果,於利用未圖示之攝像元件所取像之影像中(一個畫面中),將不依存被攝體之亮度而產生3種亮度之分布。因此,將使遮光等特性劣化。又,由於無法穩定地進行光圈開口216之調整,故有招致振盪(hunting)現象之虞。尤其是在縮小光圈開口216之狀態下,易產生振盪現象。As a result, in the image captured by the imaging element (not shown) (in one screen), three kinds of luminance distributions are generated without depending on the brightness of the subject. Therefore, characteristics such as light shielding are deteriorated. Further, since the adjustment of the aperture opening 216 cannot be performed stably, there is a risk of causing a hunting phenomenon. In particular, in a state where the aperture opening 216 is reduced, an oscillation phenomenon is apt to occur.

再者,於包含一對光圈葉片之習知之光圈裝置中,亦存在著僅於一方之光圈葉片上安裝ND濾光片之類型。然而,該種類型之光圈裝置,ND濾光片之位置係相對於光圈開口之中心而偏向於一方。因此,必然會產生遮光等缺陷。Further, in the conventional aperture device including a pair of aperture blades, there is also a type in which an ND filter is attached to only one of the aperture blades. However, in this type of aperture device, the position of the ND filter is biased to one side with respect to the center of the aperture opening. Therefore, defects such as shading are inevitably generated.

本發明之主要目的,在於提供一種於可利用一對光圈葉片改變光圈開口,同時使濾光片基板避退移動於該光圈開口之光圈裝置中,可同時實現零件件數之削減與提高遮光等特性之技術。A main object of the present invention is to provide a diaphragm device that can change a diaphragm opening by using a pair of aperture blades while moving the filter substrate away from the aperture opening, thereby reducing the number of parts and improving shading, etc. The technology of the characteristics.

本發明之第1態樣係一種光圈裝置,其特徵在於具備:一對光圈葉片,其係以相互疊合之狀態形成光圈開口;濾光片基板,其係具有可見光穿透區;光圈驅動部,其係使上述一對光圈葉片相對地移動以調整上述光圈開口之大小;及濾光片驅動部,其係使上述濾光片基板相對於通過上述光圈開口之入射光之光路徑而進退移動;且上述濾光片基板係更具備有在通過上述光圈開口的光之中,至少使可通過上述可見光穿透區之光衰減的光衰減區;上述光衰減區係具有較上述可見光穿透區小之區域而形成於該可見光穿透區內,在使上述濾光片基板前進至上述光路徑上時配置成與上述光圈開口為同心狀者。A first aspect of the present invention is an aperture device comprising: a pair of aperture blades that form a diaphragm opening in a state of being superposed on each other; a filter substrate having a visible light transmission region; and an aperture driving portion And moving the pair of aperture blades relatively to adjust the size of the aperture opening; and the filter driving unit moving forward and backward with respect to the optical path of the incident light passing through the aperture opening And the filter substrate further includes a light attenuating region that attenuates at least light passing through the visible light penetrating region among the light passing through the aperture of the aperture; the light attenuating region has a visible light transmitting region The small area is formed in the visible light transmission region, and is disposed concentrically with the aperture opening when the filter substrate is advanced to the optical path.

本發明之第2態樣係如第1態樣之光圈裝置,其中,上述光衰減區係形成為圓形。A second aspect of the invention is the aperture device of the first aspect, wherein the light attenuating region is formed in a circular shape.

本發明之第3態樣係如上述第1態樣之光圈裝置,其中,上述光衰減區係形成為與上述光圈開口之開口形狀相似之形狀。A third aspect of the invention is the aperture device of the first aspect, wherein the light attenuating region is formed in a shape similar to an opening shape of the aperture opening.

本發明之第4態樣係如上述第1、2或3態樣之光圈裝置,其中,上述可見光穿透區係包含形成於上述濾光片基板之至少一方之主面的紅外線截止濾光片層;上述光衰減區係包含形成於上述濾光片基板之一方之主面或另一方之主面或者雙方之主面的ND濾光片層。A fourth aspect of the invention is the aperture device of the first aspect, the second aspect or the third aspect, wherein the visible light transmission region includes an infrared cut filter formed on a principal surface of at least one of the filter substrates The light attenuation region includes an ND filter layer formed on one of the main surfaces of the filter substrate or the other main surface or both main surfaces.

本發明之第5態樣係如上述第4態樣之光圈裝置,其中,上述紅外線截止濾光片層及上述ND濾光片層,係以積層狀態形成於上述濾光片基板之共通之主面上。According to a fifth aspect of the present invention, in the fourth aspect, the infrared cut filter layer and the ND filter layer are formed in a laminated state on a common side of the filter substrate. On the surface.

本發明之第6態樣係一種攝影機,其特徵在於具備有:上述第1至5態樣中任一態樣所記載之光圈裝置;及光電轉換元件,其係將通過上述光圈開口之入射光轉換為電信號。According to a sixth aspect of the invention, there is provided a camera comprising: the aperture device described in any one of the first to fifth aspects; and the photoelectric conversion element which is incident light passing through the aperture opening Converted to an electrical signal.

本發明之第7態樣係一種電子機器,其特徵在於具備有:上述第6態樣所記載之攝影機;及影像處理部,其係對自上述攝影機所輸出之影像信號進行處理。A seventh aspect of the present invention provides an electronic apparatus comprising: the camera described in the sixth aspect; and an image processing unit that processes the image signal output from the camera.

根據本發明,於可使用一對光圈葉片改變光圈開口,同時使濾光片基板相對於此光圈開口進退移動之光圈裝置中,可同時實現零件件數之削減與遮光等特性之提昇。According to the present invention, in the aperture device which can change the aperture opening by using a pair of aperture blades and simultaneously move the filter substrate relative to the aperture opening, the number of parts can be reduced and the characteristics such as light shielding can be improved at the same time.

以下,一面參照圖式一面針對本發明之實施形態進行詳細說明。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

按照以下之順序,對本發明之實施形態進行說明。Embodiments of the present invention will be described in the following order.

1.攝影機之構成1. The composition of the camera

2.光圈裝置之構成2. Composition of the aperture device

2-1.光圈裝置整體之構成2-1. The overall composition of the aperture device

2-2.光圈裝置局部之構成2-2. Part of the aperture device

3.光圈裝置之動作3. Action of the aperture device

3-1.關於光圈開口之調整之動作3-1. About the adjustment of the aperture opening

3-2.關於攝影模式之切換之動作3-2. About the switching action of the photography mode

4.關於實施形態之效果4. About the effect of the implementation

5.變形例5. Modifications

<1.攝影機之構成><1. Composition of camera>

圖1係表示應用本發明之攝影機之構成例者,(A)係攝影機整體之外觀圖,(B)係鏡筒內部之概略圖。圖示之攝影機100,例如,係基於保全目的而設置於建築物之天花板部分(或牆壁等)之監視攝影機。此攝影機100係具備有安裝基座101、及攝影機本體102。安裝基座101,例如,係成為藉由固定螺絲而固定於建築物之天花板部分之結構。Fig. 1 is a view showing an example of a configuration of a camera to which the present invention is applied, (A) is an external view of the entire camera, and (B) is a schematic view of the inside of the lens barrel. The illustrated camera 100 is, for example, a surveillance camera that is installed on a ceiling portion (or a wall or the like) of a building for security purposes. The camera 100 includes a mounting base 101 and a camera body 102. The mounting base 101 is, for example, a structure that is fixed to a ceiling portion of a building by a fixing screw.

攝影機本體102係具備有鏡筒部103、及物鏡104。於鏡筒部103之內部組裝有包含物鏡104之光學系統。物鏡104係安裝於鏡筒部103之前端。又,於攝影機本體102中,作為光學系統之一個功能部,組裝有光圈裝置1與攝像元件105。針對光圈裝置1係於後進行詳細說明。The camera body 102 includes a barrel portion 103 and an objective lens 104. An optical system including the objective lens 104 is assembled inside the barrel portion 103. The objective lens 104 is attached to the front end of the barrel portion 103. Further, in the camera body 102, the diaphragm device 1 and the imaging element 105 are incorporated as one functional portion of the optical system. The aperture device 1 will be described in detail later.

攝像元件105為可進行彩色攝影之攝像元件,例如係由CCD(Charge Coupled Device;電荷耦合器件)攝像元件、CMOS(Complementary Metal Oxide Semiconductor;互補式金氧半導體)攝像元件等所構成。攝像元件105,例如,係具有將複數(多數)個像素配置為矩陣狀而成之攝像面。攝像元件105係作為將通過光圈裝置1之光圈開口而入射至上述攝像面之光轉換為電信號之光電轉換元件之一例而組裝。The imaging element 105 is an imaging element capable of color photography, and is configured by, for example, a CCD (Charge Coupled Device) imaging device, a CMOS (Complementary Metal Oxide Semiconductor) imaging device, or the like. The imaging element 105 has, for example, an imaging surface in which a plurality of (majority) pixels are arranged in a matrix. The imaging element 105 is incorporated as an example of a photoelectric conversion element that converts light incident on the imaging surface by the aperture opening of the aperture device 1 into an electrical signal.

再者,本發明並不限定於在此所例示之攝影機100,亦可應用於具備光圈裝置1之其他構成之攝影機。又,作為光學系統之構成,亦可將透鏡之種類、片數、配置、或光圈裝置1之配置等進行各種之變更。Furthermore, the present invention is not limited to the camera 100 exemplified herein, and can be applied to a camera having another configuration of the diaphragm device 1. Further, as the configuration of the optical system, various types of lenses, the number of sheets, the arrangement, and the arrangement of the diaphragm device 1 can be variously changed.

<2.光圈裝置之構成><2. Composition of aperture device> [2-1.光圈裝置整體之構成][2-1. Composition of the entire aperture device]

圖2係表示本發明之實施形態之光圈裝置整體的構成例之分解斜視圖。圖示之光圈裝置1,主要係構成為具備有光圈基板2、一對(2個)光圈葉片3、4、濾光片基板5、葉片蓋6、光圈驅動部7、及濾光片驅動部8。Fig. 2 is an exploded perspective view showing an example of the configuration of the entire aperture device according to the embodiment of the present invention. The aperture device 1 shown in the drawings is mainly configured to include a diaphragm substrate 2, a pair of (two) aperture blades 3 and 4, a filter substrate 5, a blade cover 6, a diaphragm drive unit 7, and a filter drive unit. 8.

光圈基板2係成為用以安裝構成光圈裝置1之各自之構成構件之基座者。一對之光圈葉片3、4係以相互疊合之狀態而形成光圈開口者。光圈開口係配置於入射至攝影機之光之光路徑上以限定通過該處之光量。即,當光圈開口之大小變大,則通過光路徑之光量相對地增加,當光圈開口之大小變小,則通過光路徑之光量相對地減少。濾光片基板5係對於入射光具有光學之過濾功能者。葉片蓋6係自外部遮蔽一對之光圈葉片3、4而加以保護者。The diaphragm substrate 2 is a base for mounting the constituent members constituting each of the diaphragm devices 1. The pair of aperture blades 3, 4 are formed so as to overlap each other to form a diaphragm opening. The aperture opening is disposed on a light path of light incident on the camera to define the amount of light passing therethrough. That is, when the size of the aperture opening is increased, the amount of light passing through the optical path is relatively increased, and when the size of the aperture opening is decreased, the amount of light passing through the optical path is relatively reduced. The filter substrate 5 is an optical filter function for incident light. The blade cover 6 protects the pair of aperture blades 3, 4 from the outside.

光圈驅動部7係使一對光圈葉片3、4相對地移動以調整光圈開口之大小者。濾光片驅動部8係使濾光片基板5移動以將濾光片基板5切換為使用狀態與非使用狀態者。所謂濾光片基板5之使用狀態,係指使濾光片基板5前進至入射光之光路徑上之狀態。所謂濾光片基板5之非使用狀態,係指使濾光片基板5自入射光之光路徑上退避(後退)之狀態。The diaphragm driving unit 7 moves the pair of diaphragm blades 3 and 4 relatively to adjust the size of the diaphragm opening. The filter driving unit 8 moves the filter substrate 5 to switch the filter substrate 5 to a use state and a non-use state. The state in which the filter substrate 5 is used refers to a state in which the filter substrate 5 is advanced to the light path of the incident light. The non-use state of the filter substrate 5 is a state in which the filter substrate 5 is retracted (retracted) from the light path of the incident light.

[2-2.光圈裝置局部之構成][2-2. Part of the aperture device] (光圈基板)(aperture substrate)

光圈基板2,例如,係使用樹脂所構成者,整體形成為俯視之大致長方形。於光圈基板2係形成有開口部10、及複數個突起部11a、11b、11c、11d。開口部10係形成為正圓形或接近正圓形之圓形狀。複數個突起部11a、11b、11c、11d係用以導引一對光圈葉片3、4之移動者。各個突起部11a、11b、11c、11d之端部,係分別朝向光圈基板2之外側彎曲為L字形。The diaphragm substrate 2 is formed of, for example, a resin, and is formed in a substantially rectangular shape in plan view. The aperture substrate 2 is formed with an opening 10 and a plurality of protrusions 11a, 11b, 11c, and 11d. The opening portion 10 is formed in a circular shape that is a perfect circle or a nearly circular shape. The plurality of protrusions 11a, 11b, 11c, and 11d are for guiding the movers of the pair of diaphragm blades 3, 4. The end portions of the respective projections 11a, 11b, 11c, and 11d are bent in an L shape toward the outer side of the diaphragm substrate 2, respectively.

(光圈葉片)(aperture blade)

一對之光圈葉片3、4,例如,係構成為使用以碳膜將由聚對苯二甲酸乙二酯(PET;polyethylene terephthalate)所構成之板狀素材之表面所覆蓋者。各個光圈葉片3、4係整體形成為薄板狀。於一方之光圈葉片3設置有1個孔部15,3個導引槽16a、16b、16c、及1個卡合孔17。The pair of aperture blades 3 and 4 are configured, for example, by using a carbon film to cover the surface of a plate-like material made of polyethylene terephthalate (PET). Each of the diaphragm blades 3 and 4 is formed in a thin plate shape as a whole. One aperture portion 15, three guide grooves 16a, 16b, 16c, and one engagement hole 17 are provided in one of the aperture blades 3.

孔部15係具有將正圓形或接近正圓形之圓形狀之一部分放大為大致V字形之形態之平面形狀。3個導引槽16a、16b、16c係沿著光圈葉片3之長度方向相互平行地形成。於3個導引槽16a、16b、16c之中,2個導引槽16b、16c係形成於同一直線上。而且,剩餘之1個導引槽16a係介隔著孔部15而形成於相對於此等2個導引槽16b、16c之相反側。卡合孔17係形成於上述2個導引槽16b、16c之延長線上。又,卡合孔17係沿著光圈葉片3之短邊方向形成為俯視之長孔狀。The hole portion 15 has a planar shape in which a part of a circular shape that is a perfect circle or a nearly circular shape is enlarged to a substantially V shape. The three guide grooves 16a, 16b, and 16c are formed in parallel with each other along the longitudinal direction of the diaphragm blades 3. Among the three guide grooves 16a, 16b, and 16c, the two guide grooves 16b and 16c are formed on the same straight line. Further, the remaining one of the guide grooves 16a is formed on the opposite side of the two guide grooves 16b and 16c via the hole portion 15. The engagement holes 17 are formed on the extension lines of the two guide grooves 16b and 16c. Further, the engagement hole 17 is formed in a long hole shape in plan view along the short side direction of the diaphragm blade 3.

相對於此,於另一方之光圈葉片4,係設置有1個灣部18、3個導引槽19a、19b、19c、及1個卡合孔20。灣部18係具有將半圓形(或橢圓形)之一部分放大為大致V字形之平面形狀。3個導引槽19a、19b、19c係沿著光圈葉片4之長度方向相互平行地形成。於3個導引槽19a、19b、19c之中,2個導引槽19a、19b係形成於同一直線上。而且,剩餘之1個導引槽19c係介隔著灣部18而形成於相對於此等2個導引槽19a、19b之相反側。卡合孔20係形成於上述2個導引槽19a、19b之延長線上。又,卡合孔20係沿著光圈葉片4之短邊方向形成為俯視之長孔狀。On the other hand, the other one of the aperture blades 4 is provided with one bay portion 18, three guide grooves 19a, 19b, and 19c, and one engagement hole 20. The bay portion 18 has a planar shape in which one of the semicircular (or elliptical) portions is enlarged to a substantially V shape. The three guide grooves 19a, 19b, and 19c are formed in parallel with each other along the longitudinal direction of the diaphragm blades 4. Among the three guide grooves 19a, 19b, and 19c, the two guide grooves 19a and 19b are formed on the same straight line. Further, the remaining one of the guide grooves 19c is formed on the opposite side of the two guide grooves 19a and 19b via the bay portion 18. The engagement hole 20 is formed on an extension line of the two guide grooves 19a and 19b. Further, the engagement hole 20 is formed in a long hole shape in plan view along the short side direction of the diaphragm blade 4.

(濾光片基板)(filter substrate)

濾光片基板5係以插入於一對光圈葉片3、4之間(間隙部分)之狀態所配置者。濾光片基板5,例如,係構成為使用具有透光性之圓形之玻璃基板。若將濾光片基板5之正面及背面分別定義為濾光片基板5之主面,則至少於濾光片基板5之一方之主面係形成有濾光片層。針對具備此濾光片層之濾光片基板5之構成係於後進行詳細說明。The filter substrate 5 is disposed in a state of being inserted between the pair of diaphragm blades 3 and 4 (gap portion). The filter substrate 5 is configured, for example, by using a circular glass substrate having light transmissivity. When the front surface and the back surface of the filter substrate 5 are each defined as the main surface of the filter substrate 5, a filter layer is formed on at least one of the main surfaces of the filter substrate 5. The configuration of the filter substrate 5 including the filter layer will be described in detail later.

濾光片基板5係安裝於框架構件23。框架構件23係具有與濾光片基板5之外形對應之圓形開口(未圖示)者。濾光片基板5與框架構件23,係藉由相互組成為一體而構成一個濾光片單元24。具體而言,濾光片基板5與框架構件23,例如,係藉由接著等固定手段組成為一體。The filter substrate 5 is attached to the frame member 23. The frame member 23 has a circular opening (not shown) corresponding to the outer shape of the filter substrate 5. The filter substrate 5 and the frame member 23 are integrally formed to constitute one filter unit 24. Specifically, the filter substrate 5 and the frame member 23 are integrally formed by, for example, a fixing means such as the following.

框架構件23,例如,係使用樹脂所構成。於框架構件23係一體地形成有臂部25。臂部25係彎曲為大致L字形,且於其彎曲部分形成有圓孔26。又,於臂部25之前端側係形成有長孔27。而且,於框架構件23係一體地形成有2個突出部28、29。各自之突出部28、29主要具有兩個目的。一個目的係藉由與上述臂部25之突出部分之相互作用而達到使一對光圈葉片3、4之移動穩定化之目的。另一個目的則是於利用接著劑將濾光片基板5固定於框架構件23時,達到確保接著部分之目的。The frame member 23 is made of, for example, a resin. An arm portion 25 is integrally formed on the frame member 23 . The arm portion 25 is bent in a substantially L shape, and a circular hole 26 is formed in a curved portion thereof. Further, a long hole 27 is formed on the front end side of the arm portion 25. Further, two projecting portions 28 and 29 are integrally formed on the frame member 23. The respective projections 28, 29 serve primarily two purposes. One object is to stabilize the movement of the pair of diaphragm blades 3, 4 by interaction with the protruding portion of the arm portion 25. Another object is to secure the subsequent portion when the filter substrate 5 is fixed to the frame member 23 by means of an adhesive.

(葉片蓋)(blade cover)

葉片蓋6,例如,係使用鋁等金屬形成為板狀。葉片蓋6係與上述光圈基板2同樣地,形成為俯視之大致長方形。於葉片蓋6係設置有1個開口部30、及2個餘隙槽(Clearance Groove)部31a、31b。開口部30係形成為正圓形或接近正圓形之圓形狀。開口部30係以疊合於一對光圈葉片3、4所形成之光圈開口之方式進行配置。餘隙槽部31a、31b係成對地形成於葉片蓋6之短邊方向之一方與另一方。各個餘隙槽部31a、31b係以貫穿葉片蓋6之厚度方向之狀態形成為俯視之大致弧狀。而且,於葉片蓋6一體地形成有臂部32。臂部32係以朝葉片蓋6之短邊方向之一方突出之狀態所形成。於臂部32係形成有長孔33。而且,於葉片蓋6係形成有一對孔部36a、36b與一對缺口部37a、37b。The blade cover 6 is formed into a plate shape using, for example, a metal such as aluminum. Similarly to the above-described diaphragm substrate 2, the blade cover 6 is formed in a substantially rectangular shape in plan view. The blade cover 6 is provided with one opening 30 and two clearance grooves 31a and 31b. The opening portion 30 is formed in a circular shape that is a perfect circle or a nearly circular shape. The opening 30 is disposed so as to overlap the aperture opening formed by the pair of diaphragm blades 3 and 4. The clearance groove portions 31a and 31b are formed in pairs in one direction and the other in the short side direction of the blade cover 6. Each of the clearance groove portions 31a and 31b is formed in a substantially arc shape in plan view in a state of penetrating the thickness direction of the blade cover 6. Further, an arm portion 32 is integrally formed on the blade cover 6. The arm portion 32 is formed in a state of protruding toward one of the short sides of the blade cover 6. A long hole 33 is formed in the arm portion 32. Further, the blade cover 6 is formed with a pair of hole portions 36a and 36b and a pair of notch portions 37a and 37b.

(光圈驅動部)(aperture drive unit)

光圈驅動部7係藉由將成為驅動源之馬達之驅動力,經由未圖示之驅動力傳達機構(齒輪機構等)傳達至一對光圈葉片3、4,而使一對光圈葉片3、4進行相對地移動者。其驅動源,例如,係使用動磁式馬達。光圈驅動部7係具有一對驅動銷34a、34b。一對之驅動銷34a、34b係以錯開約180°之位置配置於同一圓周上。一對之驅動銷34a、34b係藉由上述驅動源之驅動而於同一圓周上等量地朝同一方向移動。而且,光圈驅動部7與一對光圈葉片3、4,係分別藉由將一方之驅動銷34b卡合於光圈葉片3之卡合孔17,將另一方之驅動銷34a卡合於光圈葉片4之卡合孔20而相互地連結。The diaphragm drive unit 7 transmits a pair of diaphragm blades 3 and 4 to a pair of diaphragm blades 3 and 4 via a driving force transmission mechanism (such as a gear mechanism) (not shown) via a driving force of a motor serving as a driving source. Perform relative moves. The driving source thereof is, for example, a moving magnet motor. The diaphragm driving unit 7 has a pair of driving pins 34a and 34b. The pair of drive pins 34a and 34b are disposed on the same circumference at positions shifted by about 180 degrees. The pair of drive pins 34a, 34b are equally moved in the same direction on the same circumference by the drive of the drive source. Further, the diaphragm driving unit 7 and the pair of diaphragm blades 3 and 4 are engaged with the diaphragm blades 4 by engaging one of the driving pins 34b with the engaging holes 17 of the diaphragm blades 3, respectively. The engagement holes 20 are coupled to each other.

(濾光片驅動部)(filter drive unit)

濾光片驅動部8係藉由將成為驅動源之馬達之驅動力,經由未圖示之驅動力傳達機構(齒輪機構等)傳達至濾光片單元24,而使包含濾光片基板5之濾光片單元24進行移動者。其驅動源,例如,係使用步進馬達。濾光片單元24係藉由將臂部25之圓孔26插入支持軸35,而形成以支持軸35為中心旋轉自如地支持。支持軸35,例如,係一體地形成於光圈基板2者。濾光片驅動部8與濾光片單元24,例如,係藉由將驅動銷設置於濾光片驅動部8,且將此驅動銷卡合於臂部25之長孔27而相互地連結。The filter driving unit 8 transmits the driving force of the motor serving as the driving source to the filter unit 24 via a driving force transmission mechanism (such as a gear mechanism) (not shown), so that the filter substrate 5 is included. The filter unit 24 performs the movement. Its drive source, for example, uses a stepper motor. The filter unit 24 is rotatably supported around the support shaft 35 by inserting the circular hole 26 of the arm portion 25 into the support shaft 35. The support shaft 35 is, for example, integrally formed on the diaphragm substrate 2. The filter driving unit 8 and the filter unit 24 are connected to each other by, for example, providing a driving pin to the filter driving unit 8 and engaging the driving pin with the long hole 27 of the arm portion 25.

(組裝)(assembly)

接著,針對使用上述各自之構成部分組裝光圈裝置1時之步驟進行概略說明。再者,在此作為一例,係於將一對光圈葉片3、4、濾光片單元24、及葉片蓋6,分別安裝於光圈基板2之前,使光圈驅動部7與濾光片驅動部8安裝於光圈基板2者。Next, a description will be given of a procedure for assembling the diaphragm device 1 using the respective components described above. Here, as an example, the pair of diaphragm blades 3 and 4, the filter unit 24, and the blade cover 6 are attached to the diaphragm substrate 2, and the diaphragm driving unit 7 and the filter driving unit 8 are attached. Mounted on the aperture substrate 2.

首先,於光圈基板2安裝光圈葉片3。此時,將光圈基板2之突起部11a、11c、11d,分別嵌入光圈葉片3之導引槽16a、16b、16c。又,將光圈驅動部7之一方之驅動銷34b嵌入光圈葉片3之卡合孔17。First, the diaphragm blades 3 are attached to the aperture substrate 2. At this time, the projections 11a, 11c, and 11d of the diaphragm substrate 2 are fitted into the guide grooves 16a, 16b, and 16c of the diaphragm blade 3, respectively. Further, one of the drive driving pins 34b of the diaphragm driving unit 7 is fitted into the engaging hole 17 of the diaphragm blade 3.

接著,於光圈基板2安裝濾光片單元24。於該情形,將臂部25之圓孔26嵌入光圈基板2之支持軸35,同時將濾光片驅動部8之未圖示之驅動銷嵌入臂部25之長孔27。Next, the filter unit 24 is attached to the aperture substrate 2. In this case, the circular hole 26 of the arm portion 25 is fitted into the support shaft 35 of the diaphragm substrate 2, and a driving pin (not shown) of the filter driving portion 8 is fitted into the long hole 27 of the arm portion 25.

接著,於光圈基板2安裝光圈葉片4。此時,將光圈基板2之突起部11a、11b、11c,分別嵌入光圈葉片4之導引槽19a、19b、19c。又,將光圈驅動部7之另一方之驅動銷34a嵌入光圈葉片4之卡合孔20。Next, the diaphragm blades 4 are attached to the aperture substrate 2. At this time, the projections 11a, 11b, and 11c of the diaphragm substrate 2 are fitted into the guide grooves 19a, 19b, and 19c of the diaphragm blade 4, respectively. Further, the other drive pin 34a of the diaphragm drive unit 7 is fitted into the engagement hole 20 of the diaphragm blade 4.

接著,於光圈基板2安裝葉片蓋6。此時,將光圈基板2之支持軸35嵌入葉片蓋6之臂部32之長孔33。相對於光圈基板2之基片蓋6的固定,例如,係藉由嵌合等進行。Next, the blade cover 6 is attached to the aperture substrate 2. At this time, the support shaft 35 of the diaphragm substrate 2 is fitted into the long hole 33 of the arm portion 32 of the blade cover 6. The fixing of the substrate cover 6 with respect to the diaphragm substrate 2 is performed, for example, by fitting or the like.

於如此之將葉片蓋6安裝於光圈基板2時,兩者在位置上之干擾係以如下之方式避開。首先,通過光圈葉片3之卡合孔17而突出之光圈驅動部7之一方之驅動銷34b與葉片蓋6在位置上的干擾,係藉由餘隙槽部31b避開。同樣地,通過光圈葉片4之卡合孔20而突出之光圈驅動部7之另一方之驅動銷34a與葉片蓋6在位置上的干擾,係藉由餘隙槽部31a避開。又,光圈基板2之突起部11a、11c與葉片蓋6之位置之干擾,係藉由一對孔部36a、36b避開,而光圈基板2之突起部11b、11d與葉片蓋6之位置之干擾,係藉由一對缺口部37a、37b避開。When the blade cover 6 is attached to the diaphragm substrate 2 in this manner, the interference between the two is avoided in the following manner. First, the positional interference of the drive pin 34b and the blade cover 6 which are protruded by the engagement hole 17 of the aperture blade 3 is prevented by the clearance groove portion 31b. Similarly, the positional interference of the other driving pin 34a of the diaphragm driving portion 7 which protrudes through the engaging hole 20 of the diaphragm blade 4 and the blade cover 6 is avoided by the clearance groove portion 31a. Further, the interference between the projections 11a and 11c of the diaphragm substrate 2 and the position of the blade cover 6 is avoided by the pair of holes 36a and 36b, and the positions of the projections 11b and 11d of the aperture substrate 2 and the blade cover 6 are The interference is avoided by the pair of notch portions 37a, 37b.

於如此組裝光圈裝置1之情形時,一對光圈葉片3、4係藉由在光圈基板2上之4個突起部11a、11b、11c、11d而移動(滑動)自如地支持。又,濾光片單元24係朝以支持軸35為中心旋轉之方向移動自如地支持。又,光圈基板2之開口部10與葉片蓋6之開口部30,係於光圈基板2之厚度方向以相對向之狀態(相疊合之狀態)配置,而且使光圈葉片3之孔部15與光圈葉片4之灣部18以相互疊合之狀態配置於其相對向部分。When the diaphragm device 1 is assembled as described above, the pair of diaphragm blades 3 and 4 are movably supported by sliding (sliding) by the four projections 11a, 11b, 11c, and 11d on the diaphragm substrate 2. Further, the filter unit 24 is movably supported in a direction in which the support shaft 35 is rotated about the center. Further, the opening portion 10 of the diaphragm substrate 2 and the opening portion 30 of the blade cover 6 are disposed in a state in which the thickness of the diaphragm substrate 2 is opposed to each other (in a state of being superposed), and the hole portion 15 of the diaphragm blade 3 is The bay portions 18 of the diaphragm blades 4 are disposed on opposite sides thereof in a state of being superposed on each other.

規定光圈葉片3之孔部15之大致圓形狀的直徑、與規定光圈葉片4之灣部18之半圓部分的直徑係為大致相同之尺寸。而且,在使2片光圈葉片3、4相互疊合之狀態下,於光圈葉片3之孔部15與光圈葉片4之灣部18相疊合之部分將形成光圈開口。因此,利用一對光圈葉片3、4所形成之光圈開口,於光圈基板2之開口部10與葉片蓋6之開口部30為對向之區域內,將放大或縮小。然而,亦存在著根據光圈葉片3、4之位置,而將光圈開口完全關閉之情形。The diameter of the substantially circular shape of the hole portion 15 of the diaphragm blade 3 is set to be substantially the same as the diameter of the semicircular portion of the bay portion 18 of the predetermined diaphragm blade 4. Further, in a state where the two aperture blades 3, 4 are superposed on each other, a portion of the aperture portion 15 of the aperture blade 3 and the bay portion 18 of the aperture blade 4 are overlapped to form a diaphragm opening. Therefore, the aperture opening formed by the pair of aperture blades 3 and 4 is enlarged or reduced in the region where the opening portion 10 of the aperture substrate 2 and the opening portion 30 of the blade cover 6 are opposed to each other. However, there is also a case where the aperture opening is completely closed depending on the positions of the aperture blades 3, 4.

(濾光片基板之詳細說明)(Detailed description of the filter substrate)

於此,進一步針對上述濾光片基板5之構成進行詳細說明。Here, the configuration of the above-described filter substrate 5 will be described in detail.

圖3係將濾光片單元放大後之俯視圖。又,圖4係濾光片基板之剖視圖。再者,圖3所示之圓形虛線係表示形成於框架構件之開口。Fig. 3 is a plan view showing the filter unit enlarged. 4 is a cross-sectional view of the filter substrate. Further, the circular dotted line shown in Fig. 3 indicates an opening formed in the frame member.

濾光片基板5,例如,係於基座上構成玻璃基板40。於玻璃基板40,作為一例,係使用紫外線(UV;UltraViolet)截止玻璃。於濾光片基板5之一方之主面,係形成有紅外線截止濾光片層41與ND(Neutral Density)濾光片層42。紅外線截止濾光片層41係截止紅外區(包括近紅外區)之光之濾光片層。紅外線截止濾光片層41係於玻璃基板40之一方之主面上,以覆蓋該主面之整個面之方式,涵蓋該主面之整個區域而形成。又,紅外線截止濾光片層41係以相同之厚度形成於玻璃基板40上。根據如此於玻璃基板40形成紅外線截止濾光片層41,使形成有該紅外線截止濾光片層41之區域,成為遮蔽紅外線區域之光之區域。又,由於玻璃基板40係由紫外線截止玻璃所形成,故其整個區域係成為遮蔽紫外線區域之光之區域。因此,形成玻璃基板40之紅外線截止濾光片層41之區域,係在去除紅外線區域及紫外線區域之光之狀態下,為可使可見光穿透之區域,即,可見光穿透區。然而,可見光穿透區亦可並非為嚴格地僅使可見光穿透之區域。具體而言,於穿透可見光穿透區之光中,除了可見光以外,亦可包含屬於紫外線區域之一部分的光、或屬於紅外線區域之一部分的光。The filter substrate 5 is formed, for example, on a susceptor to constitute a glass substrate 40. As an example of the glass substrate 40, ultraviolet (UV; UltraViolet) cut glass is used. An infrared cut filter layer 41 and an ND (Neutral Density) filter layer 42 are formed on one of the main surfaces of the filter substrate 5. The infrared cut filter layer 41 is a filter layer that cuts off the light of the infrared region (including the near-infrared region). The infrared cut filter layer 41 is formed on one main surface of the glass substrate 40 so as to cover the entire surface of the main surface, covering the entire area of the main surface. Further, the infrared cut filter layer 41 is formed on the glass substrate 40 with the same thickness. Thus, the infrared cut filter layer 41 is formed on the glass substrate 40, and the region in which the infrared cut filter layer 41 is formed is a region that shields the light in the infrared region. Further, since the glass substrate 40 is formed of ultraviolet cut glass, the entire area is a region that shields light in the ultraviolet region. Therefore, the region in which the infrared cut filter layer 41 of the glass substrate 40 is formed is a region through which visible light can be transmitted, that is, a visible light penetrating region, in a state where light in the infrared region and the ultraviolet region is removed. However, the visible light penetrating region may not be a region that strictly penetrates only visible light. Specifically, in the light penetrating the visible light penetrating region, in addition to the visible light, light belonging to a part of the ultraviolet region or light belonging to a part of the infrared region may be included.

相對於此,ND濾光片層42係使入射至該ND濾光片層42之光衰減之濾光片層。又,ND濾光片層42係與形成有紅外線截止濾光片層41之區域(以下,亦稱為「可見光穿透區」)相比,為波長依存性較低之濾光片層。因此,形成有ND濾光片層42之區域,係於通過光圈開口之光中,為至少使可穿透可見光穿透區之光衰減之區域,即光衰減區。例如,只要僅可見光為可穿透可見光穿透區之光,則使此可見光衰減之區域即為光衰減區。於該情形時,ND濾光片層42之可見光之穿透率,係依存於攝影機中所組裝之攝像元件之特性,例如以設為6%左右為佳。然而,ND濾光片層42係具有以均勻之穿透率使紫外線區域、可見光區域及紅外線區域之各區域之光衰減之特性。因此,可利用ND濾光片層42進行衰減之光並不限定於可見光。On the other hand, the ND filter layer 42 is a filter layer that attenuates light incident on the ND filter layer 42. Further, the ND filter layer 42 is a filter layer having a lower wavelength dependency than a region in which the infrared cut filter layer 41 is formed (hereinafter also referred to as a "visible light transmission region"). Therefore, the region where the ND filter layer 42 is formed is a region that attenuates at least light that can penetrate the visible light penetrating region, that is, a light attenuating region, in the light passing through the aperture opening. For example, as long as only visible light is light that can penetrate the visible light transmission region, the region where the visible light is attenuated is the light attenuation region. In this case, the transmittance of visible light of the ND filter layer 42 depends on the characteristics of the image pickup element incorporated in the camera, and is preferably set to about 6%. However, the ND filter layer 42 has a characteristic of attenuating light of each of the ultraviolet region, the visible region, and the infrared region at a uniform transmittance. Therefore, the light that can be attenuated by the ND filter layer 42 is not limited to visible light.

於濾光片基板5之主面內,作為可見光穿透區與光衰減區之相對之面積比,較理想的是於使光圈開口成為全開狀態而有效地將發揮功能之可見光穿透區之面積設為100%時,以使相對於此之光衰減區之面積之比率成為4~33%之方式進行設定。如此廣泛地規定光衰減區之面積比之理由,係因適當之光衰減區之面積比相對於使光圈開口為全開狀態時之可見光穿透區之面積係根據該全開時之光圈開口直徑而變化。具體而言,伴隨全開時之光圈開口直徑變大,適當之光衰減區之面積比變小,而與此相反地,伴隨全開時之光圈開口直徑變小,適當之光衰減區之面積比變大。In the main surface of the filter substrate 5, as an area ratio of the visible light transmitting region and the light attenuating region, it is preferable to make the aperture opening into a fully open state and effectively function as a visible light transmitting region. When it is set to 100%, it is set so that the ratio of the area of the light-diffusion area with respect to this is 4 to 33%. The reason why the area ratio of the light-attenuating region is so widely defined is that the area ratio of the light-attenuating region is changed according to the aperture opening diameter when the aperture opening is fully opened, and the area of the visible light-transmitting region when the aperture opening is fully opened. . Specifically, as the aperture opening diameter increases with full opening, the area ratio of the appropriate light attenuation region becomes smaller, and conversely, as the aperture opening diameter becomes smaller with full opening, the area ratio of the appropriate light attenuation region becomes smaller. Big.

ND濾光片層42係以積層之狀態形成於玻璃基板40之一方之主面側之紅外線截止濾光片層41上。又,ND濾光片層42係以相同之厚度形成於紅外線截止濾光片層41上。ND濾光片層42係於以俯視觀察濾光片基板5時,相對於形成有紅外線截止濾光片層41之區域,於其中央部形成為圓形。即,濾光片基板5係成為眼球型之濾光片結構。具體而言,成為將形成有紅外線截止濾光片層41之區域設為鞏膜部分,將於其更為內側而形成有ND濾光片層42之區域設為虹膜部分之眼球型的結構。The ND filter layer 42 is formed on the infrared cut filter layer 41 on the main surface side of one of the glass substrates 40 in a laminated state. Further, the ND filter layer 42 is formed on the infrared cut filter layer 41 with the same thickness. The ND filter layer 42 is formed in a circular shape at a central portion thereof with respect to a region where the infrared cut filter layer 41 is formed when the filter substrate 5 is viewed in a plan view. That is, the filter substrate 5 is an eyeball type filter structure. Specifically, the region in which the infrared cut filter layer 41 is formed is a scleral portion, and the region in which the ND filter layer 42 is formed on the inner side is an eyeball type having an iris portion.

由圖可得知,ND濾光片層42係根據較形成有紅外線截止濾光片層41之區域小之區域而形成於濾光片基板5之中心部。又,如上述形成有紅外線截止濾光片層41之區域係可見光穿透區。因此,ND濾光片層42係形成於可見光穿透區內。As can be seen from the figure, the ND filter layer 42 is formed on the central portion of the filter substrate 5 in accordance with a region smaller than the region in which the infrared cut filter layer 41 is formed. Further, the region in which the infrared cut filter layer 41 is formed as described above is a visible light penetrating region. Therefore, the ND filter layer 42 is formed in the visible light penetrating region.

如圖5所示,ND濾光片層42之外形尺寸(圖例之情形為直徑)係根據於形成有一對光圈葉片3、4之光圈開口43成為小光圈之狀態時之開口尺寸所設定。於本說明書中,所謂小光圈之狀態,係指實際之光圈開口43之開口面積為相對於使光圈開口43全開時之開口面積之1/3以下之狀態。於小光圈之狀態下,藉由於光圈葉片3之孔部15之一部分形成為V字形之缺口部分、與於光圈葉片4之灣部18之一部分形成為V字形之缺口部分,使光圈開口43之開口形狀成為四角形(菱形)。As shown in Fig. 5, the outer dimensions of the ND filter layer 42 (diameter in the case of the figure) are set according to the opening size when the aperture opening 43 of the pair of aperture blades 3, 4 is formed into a small aperture. In the present specification, the state of the small aperture means that the opening area of the actual aperture opening 43 is 1/3 or less with respect to the opening area when the aperture opening 43 is fully opened. In the state of the small aperture, the aperture opening 43 is formed by forming a V-shaped notch portion in one of the hole portions 15 of the aperture blade 3 and forming a V-shaped notch portion in a portion of the bay portion 18 of the aperture blade 4. The shape of the opening becomes a quadrangle (diamond).

關於在玻璃基板40上形成紅外線截止濾光片層41或ND濾光片層42時之具體製造方法,例如,可採用真空蒸鍍法、濺鍍法、塗布法等眾所周知之成膜方法。又,於在玻璃基板40上形成紅外線截止濾光片層41後,要形成ND濾光片層42時,必須限制ND濾光片層42之形成區域。於該情形時,可以僅使欲形成ND濾光片層42之部分對已形成有紅外線截止濾光片層41之玻璃基板40開口之方式,在進行遮罩處理之狀態下形成ND濾光片層42。As a specific manufacturing method for forming the infrared cut filter layer 41 or the ND filter layer 42 on the glass substrate 40, for example, a well-known film forming method such as a vacuum deposition method, a sputtering method, or a coating method can be employed. Further, after the infrared cut filter layer 41 is formed on the glass substrate 40, when the ND filter layer 42 is to be formed, it is necessary to restrict the formation region of the ND filter layer 42. In this case, only the portion where the ND filter layer 42 is to be formed may be opened to the glass substrate 40 on which the infrared cut filter layer 41 has been formed, and the ND filter may be formed in a state where the masking process is performed. Layer 42.

又,在如上述使濾光片基板5前進至入射光之光路徑上而成為使用狀態時,使濾光片基板5之中心對準形成有一對光圈葉片3、4之光圈開口之中心位置。因此,於濾光片基板5之使用狀態下,使形成有ND濾光片層42之區域(光衰減區)與光圈開口成為同心狀地配置。因此,若使光圈開口成為小光圈之狀態,則ND濾光片層42占光圈開口之開口面積之面接觸比率將變得非常高。尤其是在明亮之環境(晴天之室外等)下進行攝影時,因使光圈開口縮小,故以遮蓋光圈開口之整個區域之方式配置ND濾光片層42。Further, when the filter substrate 5 is advanced to the light path of the incident light as described above, the center of the filter substrate 5 is aligned with the center position of the aperture opening in which the pair of diaphragm blades 3 and 4 are formed. Therefore, in the use state of the filter substrate 5, the region (light attenuating region) in which the ND filter layer 42 is formed is arranged concentrically with the aperture opening. Therefore, if the aperture opening is made into a small aperture state, the surface contact ratio of the ND filter layer 42 to the aperture area of the aperture opening becomes extremely high. In particular, when photographing is performed in a bright environment (outdoor of a sunny day, etc.), since the aperture opening is reduced, the ND filter layer 42 is disposed so as to cover the entire area of the aperture opening.

<3.光圈裝置之動作><3. Action of aperture device>

接著,針對本發明之實施形態之光圈裝置1之動作進行說明。Next, the operation of the aperture device 1 according to the embodiment of the present invention will be described.

[3-1.關於光圈開口之調整之動作][3-1. About the adjustment of the aperture opening]

首先,針對光圈裝置1之基本動作原理進行說明。First, the basic operation principle of the diaphragm device 1 will be described.

於調整利用一對光圈葉片3、4所形成之光圈開口之情形時,驅動光圈驅動部7。如此一來,受到光圈驅動部7之驅動力使一對光圈葉片3、4朝相對接近或遠離之方向移動。When the aperture opening formed by the pair of aperture blades 3, 4 is adjusted, the diaphragm driving portion 7 is driven. As a result, the driving force of the diaphragm driving unit 7 causes the pair of diaphragm blades 3 and 4 to move in a relatively close or distant direction.

在如上述使一對光圈葉片3、4相對地移動時,光圈開口43之大小係根據其等之移動方向及移動量而變化。具體而言,若一對光圈葉片3、4朝相互接近之方向(圖5之實線之箭頭方向)移動,則光圈開口43將隨之變大,若一對光圈葉片3、4朝相互遠離之方向(圖5之虛線之箭頭方向)移動,則光圈開口43將隨之變小。又,於使一對光圈葉片3、4最接近之狀態下,光圈開口43將成為最大(全開狀態),而於使一對光圈葉片3、4最遠離之狀態下,光圈開口43將成為最小(完全關閉之狀態或接近完全關閉之狀態)。When the pair of diaphragm blades 3, 4 are relatively moved as described above, the size of the diaphragm opening 43 changes depending on the moving direction and the amount of movement of the diaphragm opening 43. Specifically, when the pair of aperture blades 3, 4 are moved toward each other (the direction of the arrow in the solid line of FIG. 5), the aperture opening 43 will become larger as the pair of aperture blades 3, 4 are moved away from each other. When the direction (the direction of the arrow of the broken line in Fig. 5) moves, the aperture opening 43 will become smaller. Further, in a state where the pair of aperture blades 3, 4 are closest to each other, the aperture opening 43 will be maximized (fully open state), and in a state where the pair of aperture blades 3, 4 are farthest apart, the aperture opening 43 will be minimized. (A state of complete shutdown or a state of near complete shutdown).

圖6係表示使光圈開口開放(全開)之狀態之圖式。於以單色攝影模式進行攝影時,濾光片基板5係成為自光圈開口43退避之狀態。圖7係表示使光圈開口43成為小光圈之狀態之圖式。於使光圈開口43成為小光圈時,如上述圖5亦表示,光圈開口43於一對光圈葉片3、4之孔部15與灣部18之疊合部分係形成為大致菱形。而且,以完全遮蓋(覆蓋)此光圈開口43之狀態配置有ND濾光片層42。然而,於光圈開口43配置ND濾光片層42者,係僅於使濾光片基板5前進至入射光之光路徑上之情形。Fig. 6 is a view showing a state in which the aperture opening is opened (fully opened). When the photographing is performed in the monochrome photographing mode, the filter substrate 5 is in a state of being retracted from the aperture opening 43. Fig. 7 is a view showing a state in which the aperture opening 43 is made into a small aperture. When the aperture opening 43 is made into a small aperture, as shown in FIG. 5 described above, the aperture opening 43 is formed in a substantially rhombic shape at a portion where the aperture portion 15 of the pair of aperture blades 3 and 4 and the bay portion 18 are overlapped. Further, the ND filter layer 42 is disposed in a state in which the aperture opening 43 is completely covered (covered). However, the case where the ND filter layer 42 is disposed in the aperture opening 43 is only to advance the filter substrate 5 to the light path of the incident light.

[3-2.關於攝影模式之切換之動作][3-2. About the switching of the shooting mode]

作為攝影模式之切換之形態,存在著自彩色攝影模式切換為單色攝影模式之情形、及自單色攝影模式切換為彩色攝影模式之情形。然而,任一情形於切換攝影模式時,均會驅動濾光片驅動部8。以下,區分情形進行說明。As a form of switching between the shooting modes, there are cases where the color shooting mode is switched to the monochrome shooting mode, and the case where the monochrome shooting mode is switched to the color shooting mode. However, in either case, the filter driving unit 8 is driven when the shooting mode is switched. The following describes the situation.

首先,於將攝影模式自彩色攝影模式切換為單色攝影模式時,接受到伴隨濾光片驅動部8驅動之驅動力將使濾光片單元24以將支持軸35作為中心進行旋轉之方式移動。藉此,使濾光片基板5自通過光圈開口43入射之光之光路退避至偏離位置。因此,於以單色攝影模式進行攝影時,使通過光圈開口43入射之光不會經由濾光片基板5而到達攝像元件(未圖示)。因此,除了不會發生因紅外線截止濾光片層41所導致光量之減少,亦不會發生因ND濾光片層42所導致光量之減少。因此,成為適於以較少之光量得到必要之解像度之夜間等之攝影者。First, when the photographing mode is switched from the color photographing mode to the monochrome photographing mode, receiving the driving force driven by the filter driving unit 8 causes the filter unit 24 to move around the support shaft 35 as a center. . Thereby, the optical path of the light incident on the filter substrate 5 from the aperture opening 43 is retracted to the offset position. Therefore, when photographing is performed in the monochrome photographing mode, the light incident through the aperture opening 43 does not reach the imaging element (not shown) via the filter substrate 5. Therefore, in addition to the decrease in the amount of light caused by the infrared cut filter layer 41, the amount of light caused by the ND filter layer 42 does not decrease. Therefore, it becomes a photographer who is suitable for nighttime and the like which obtains the necessary resolution with a small amount of light.

相對於此,於將攝影模式自單色攝影模式切換為彩色攝影模式之情形時,以反轉上述情形之動作方向之方式驅動濾光片驅動部8。如此一來,接受到濾光片驅動部8之驅動力將使濾光片單元24以將支持軸35作為中心進行旋轉之方式移動。藉此,使濾光片基板5前進至介存於通過光圈開口43入射之光之光路徑上之位置。因此,於以彩色攝影模式進行攝影之情形時,使通過光圈開口43入射之光經由濾光片基板5而到達攝像元件(未圖示)。On the other hand, when the photographing mode is switched from the monochrome photographing mode to the color photographing mode, the filter driving unit 8 is driven to reverse the operation direction of the above-described case. As a result, the driving force received by the filter driving unit 8 causes the filter unit 24 to move so as to rotate the support shaft 35 as a center. Thereby, the filter substrate 5 is advanced to a position on the light path of the light incident through the aperture opening 43. Therefore, when photographing is performed in the color photographing mode, the light incident through the aperture opening 43 is passed through the filter substrate 5 to the imaging element (not shown).

於此,彩色攝影模式係適用於白晝等明亮之環境。又,於此一攝影環境下,在如上述縮小光圈開口43而使攝像元件之像素之信號不飽和之狀態下,進行利用光圈裝置1之光量調整。因此,光圈開口43之整個部分或大部分,係成為由包含紅外線截止濾光片層41及ND濾光片層42之2層之過濾功能層所遮蓋之狀態。藉此,即便不採用如習知之將ND濾光片分別安裝於一對光圈葉片之結構,因紅外線截止濾光片層41及ND濾光片層42之過濾功能亦會一起發揮作用。因此,成為適於攝影環境明亮之白晝等之攝影者。Here, the color photography mode is suitable for bright environments such as daylight. Further, in this imaging environment, the light amount adjustment by the diaphragm device 1 is performed in a state where the aperture of the pixel of the imaging element is not saturated as described above. Therefore, the entire or most of the aperture opening 43 is covered by the filter function layer including the infrared cut filter layer 41 and the ND filter layer 42. Thereby, even if the ND filters are separately attached to the pair of diaphragm blades as in the prior art, the filtering functions of the infrared cut filter layer 41 and the ND filter layer 42 also function together. Therefore, it becomes a photographer suitable for a bright day or the like in a photographic environment.

又,即便為白晝等時段,例如天氣較差之情形、或者因攝影機之設置場所等之影響,亦可能於微暗之環境下進行攝影。於該情形時,為確保所需之光量,使濾光片基板5維持在前入之狀態下,使光圈開口43成為比小光圈之狀態時更大地開口。因此,光圈開口43係成為較ND濾光片層42之形成區域更大地開口。相對於此,由於紅外線截止濾光片層41係形成於濾光片基板5單側的整個面,故即便使光圈開口43開放為全開狀態,亦隨時以使紅外線截止濾光片層41遮蓋光圈開口43之方式配置。因此,於以彩色攝影模式進行攝影時,即便為確保光量等而使光圈開口43變大,亦無起因於紅外光之入射所產生影像之顏色偏差之虞。Moreover, even in the case of daylight, such as a bad weather, or due to the location of a camera, it is possible to perform photography in a dim environment. In this case, in order to secure the required amount of light, the filter substrate 5 is maintained in the forward state, and the aperture opening 43 is opened larger than in the state of the small aperture. Therefore, the aperture opening 43 is opened larger than the formation area of the ND filter layer 42. On the other hand, since the infrared cut filter layer 41 is formed on the entire surface on one side of the filter substrate 5, even if the aperture opening 43 is opened to the fully open state, the infrared cut filter layer 41 is always covered by the aperture. The opening 43 is configured in a manner. Therefore, when photographing in the color photographing mode, even if the aperture opening 43 is made larger in order to secure the amount of light or the like, there is no possibility of color deviation due to the incident of the infrared light.

<4.關於實施形態之效果><4. Effect on the embodiment>

於本發明之實施形態之光圈裝置與具備此之攝影機中,如上述除了成為適於可以較少之光量得到所需之解像度之夜間等之攝影者以外,可同時實現零件件數之削減與遮光等之特性提昇。於下陳述其理由。In the aperture device according to the embodiment of the present invention, the camera having the above-described camera can reduce the number of components and the shading at the same time, in addition to the photographer who is suitable for nighttime and the like which can obtain a desired resolution with a small amount of light. And so on. The reasons are stated below.

首先,作為光圈裝置1之構成,係於濾光片基板5形成紅外線截止濾光片層41與ND濾光片層42。因此,與將如習知之ND濾光片作為獨立之零件安裝於光圈葉片之情形相比,可削減零件之件數。First, as the configuration of the aperture device 1, the infrared cut filter layer 41 and the ND filter layer 42 are formed on the filter substrate 5. Therefore, the number of parts can be reduced as compared with the case where the conventional ND filter is attached to the diaphragm blade as a separate component.

又,作為光圈裝置1之構成,當使濾光片基板5前進至通過光圈開口43而入射之光之光路徑上時,ND濾光片層42係構成為與光圈開口43成為同心狀地配置。因此,於使光圈開口43成為小光圈而進行攝影時,不僅ND濾光片層42會有效地發揮功能,而且光圈開口43整體亦成為由ND濾光片層42所遮蓋之狀態。因此,即便在小光圈之狀態下,影像整體亦成為均勻之亮度。因此,遮光等特性係得以提昇。Further, as the configuration of the aperture device 1, when the filter substrate 5 is advanced to the light path of the light incident through the aperture opening 43, the ND filter layer 42 is configured to be concentric with the aperture opening 43. . Therefore, when the aperture opening 43 is made into a small aperture and the imaging is performed, not only the ND filter layer 42 functions effectively, but also the entire aperture opening 43 is covered by the ND filter layer 42. Therefore, even in the state of a small aperture, the image as a whole becomes uniform brightness. Therefore, characteristics such as shading are improved.

而且,即便於使光圈開口43成為比小光圈之狀態時更大地開口時,亦可實現遮光等特性之提昇。即,使光圈開口43成為比小光圈之狀態更大地開口之動作狀態,例如,係應用於白晝之微暗之環境等。因此,若與白晝明亮之環境相比,則入射至攝影機之光量將變得相當少。因此,假使即便相較於ND濾光片層42之形成區域更大地開放光圈開口43,若與白晝明亮之環境相比,則起因於ND濾光片層42之存在之明暗的差亦將成為明顯較小者。又,由於即便藉由一對光圈葉片3、4之相對移動而使光圈開口43之大小發生變化,ND濾光片層42之位置亦不會改變,故亮度之中心位置不會偏移。因此,與如習知之光圈裝置將ND濾光片分別安裝於一對光圈葉片之構成相比,遮光等特性將得以提昇。Further, even when the aperture opening 43 is opened larger than the state of the small aperture, the characteristics such as light shielding can be improved. In other words, the diaphragm opening 43 is in an operating state that is larger than the state of the small diaphragm, and is applied to, for example, a dim environment of daylight. Therefore, the amount of light incident on the camera will become relatively small compared to the bright environment of daylight. Therefore, even if the aperture opening 43 is opened larger than the formation region of the ND filter layer 42, the difference in brightness between the ND filter layer 42 and the ND filter layer 42 will become Significantly smaller. Further, even if the size of the aperture opening 43 is changed by the relative movement of the pair of aperture blades 3, 4, the position of the ND filter layer 42 does not change, so that the center position of the luminance does not shift. Therefore, compared with the configuration in which the ND filter is separately attached to the pair of aperture blades as in the conventional aperture device, characteristics such as light shielding are improved.

而且,於習知之光圈裝置之情形時,當使光圈開口自小光圈之狀態逐漸開放時,通過光圈開口之光係區分為通過2片ND濾光片之疊合部分之光、通過任一方之ND濾光片之光、及不通過ND濾光片之部分之光的3者。相對於此,於本實施形態之光圈裝置之情形時,通過光圈開口43之光係限定為通過ND濾光片層42之部分(光圈開口43之中央部分)之光、及通過ND濾光片層42以外之部分(光圈開口43之周圍部分)之光之2者。因此,可抑制明暗不同分布之不均勻。因此,使遮光等特性提昇之效果成為更加顯著者。Further, in the case of the conventional aperture device, when the aperture opening is gradually opened from the state of the small aperture, the light passing through the aperture opening is divided into light passing through the overlapping portions of the two ND filters, passing either of them. The light of the ND filter and the light that does not pass through part of the ND filter. On the other hand, in the case of the aperture device of the present embodiment, the light passing through the aperture opening 43 is limited to the light passing through the portion of the ND filter layer 42 (the central portion of the aperture opening 43), and passing through the ND filter. The light of the portion other than the layer 42 (the surrounding portion of the aperture opening 43). Therefore, unevenness in the distribution of light and dark can be suppressed. Therefore, the effect of improving characteristics such as shading is more remarkable.

又,伴隨著上述零件件數之削減,亦可獲得如下之效果。即,於製造光圈裝置1之情形時,不需要於光圈葉片上安裝ND濾光片之步驟。又,於利用接著劑將ND濾光片貼附於光圈葉片上之情形時,有必要在ND濾光片之厚度上(例如,約0.1 mm)添加接著劑之厚度,以設定一對光圈葉片相對地移動之間隙。相對於此,於在濾光片基板5上形成ND濾光片層42之情形時,該厚度僅數μm~十數μm左右。因此,可實現光圈裝置1之薄型化。而且,於光圈裝置之動作上,由於光圈葉片係頻繁地反覆移動,故藉由接著等將ND濾光片貼附於光圈葉片者,將有起因於伴隨光圈葉片之移動之振動等而導致ND濾光片有脫落之虞。相對於此,於濾光片基板5上形成ND濾光片層42者,則不發生此一缺陷。因此,可實現於長期使用下,動作之可靠性優異之光圈裝置。Further, as the number of parts described above is reduced, the following effects can be obtained. That is, in the case of manufacturing the aperture device 1, there is no need to install the ND filter on the diaphragm blade. Further, in the case where the ND filter is attached to the diaphragm blade by means of an adhesive, it is necessary to add the thickness of the adhesive to the thickness of the ND filter (for example, about 0.1 mm) to set a pair of aperture blades. The gap that moves relatively. On the other hand, when the ND filter layer 42 is formed on the filter substrate 5, the thickness is only about several μm to several tens of μm. Therefore, the thickness of the aperture device 1 can be reduced. Further, in the operation of the aperture device, since the aperture blade is frequently moved in the reverse direction, the ND filter is attached to the aperture blade by the next step or the like, and the ND is caused by the vibration accompanying the movement of the aperture blade. The filter has fallen off. On the other hand, when the ND filter layer 42 is formed on the filter substrate 5, such a defect does not occur. Therefore, it is possible to realize an aperture device which is excellent in reliability of operation under long-term use.

又,作為濾光片基板5之構成,係將包含ND濾光片層42之光衰減區形成為圓形。因此,即便光圈開口43成為小光圈時之開口形狀例如為多邊形或橢圓形,若以外接於此之圓之直徑以下之圓形形成光衰減區,則無關於該開口形狀之差異,亦可使遮光等特性提昇。因此,成為通用性優異者。Further, as a configuration of the filter substrate 5, the light attenuating region including the ND filter layer 42 is formed into a circular shape. Therefore, even if the aperture shape of the aperture opening 43 is a small aperture, for example, a polygonal shape or an elliptical shape, if a circle having a diameter smaller than or equal to the diameter of the circle is formed to form a light attenuation region, the difference in the shape of the opening may be made. Features such as shading are improved. Therefore, it is excellent in versatility.

又,尤其作為較佳之例,亦可採用以與光圈開口43之開口形狀相似之形狀形成光衰減區之構成。例如,於使一對光圈葉片3、4相疊合時,在使由孔部15與灣部18所形成之光圈開口43之形狀因各自之V字形缺口部分之存在而成為四角形(菱形)之情形時,形成光衰減區為其相似形。Further, particularly as a preferred example, a configuration in which a light attenuating region is formed in a shape similar to the shape of the opening of the aperture opening 43 may be employed. For example, when the pair of diaphragm blades 3 and 4 are superimposed, the shape of the aperture opening 43 formed by the hole portion 15 and the bay portion 18 is quadrangular (diamond) due to the existence of the respective V-shaped notch portions. In the case, the light attenuating region is formed into a similar shape.

採用該構成之情形,係於使光圈開口43作為小光圈而進行彩色攝影時,維持利用ND濾光片層42遮蓋光圈開口43之狀態,直至光圈開口43之開口尺寸與ND濾光片層42之形成區域之外形尺寸一致為止。因此,可最大限度且不浪費地利用ND濾光片層42之形成區域。又,伴隨於此,可將ND濾光片層42之形成區域限定於最小限度。因此,可極力抑制在彩色攝影模式下開放光圈開口43時之光量之減少。According to this configuration, when the aperture opening 43 is used as the small aperture for color photography, the state in which the aperture opening 43 is covered by the ND filter layer 42 is maintained until the aperture size of the aperture opening 43 and the ND filter layer 42 are maintained. The shape and shape outside the formation area are the same. Therefore, the formation region of the ND filter layer 42 can be utilized to the utmost and without waste. Further, along with this, the formation region of the ND filter layer 42 can be minimized. Therefore, the reduction in the amount of light when the aperture opening 43 is opened in the color photographing mode can be suppressed as much as possible.

又,於比小光圈之狀態更大地開放光圈開口43之情形時,未形成ND濾光片層42之區域(以下,記為「非形成區域」)係涵蓋光圈開口43之外緣部分之整個周圍均勻地存在。因此,於光圈開口43之開口區域中,在位於其中央部分之ND濾光片層42之形成區域中,影像係相對地較暗,而於ND濾光片層42之非形成區域中,則影像相對地較亮。相對於此,攝影用之透鏡通常係中央部較亮,越向邊緣部分則越暗。因此,可藉由該等之相抵而使影像之亮度均勻化。Further, when the aperture opening 43 is opened larger than the state of the small aperture, the region where the ND filter layer 42 is not formed (hereinafter referred to as "non-formation region") covers the entire outer edge portion of the aperture opening 43. It is evenly distributed around. Therefore, in the opening region of the aperture opening 43, in the formation region of the ND filter layer 42 at the central portion thereof, the image system is relatively dark, and in the non-formation region of the ND filter layer 42, The image is relatively bright. On the other hand, the lens for photography is generally brighter at the center portion and darker toward the edge portion. Therefore, the brightness of the image can be made uniform by the comparison.

又,於濾光片基板5之構成上,在玻璃基板40之共通之主面,係以積層狀態形成紅外線截止濾光片層41與ND濾光片層42。因此,於製造濾光片基板5時,可不使玻璃基板40進行正背面反轉而依序形成(成膜)紅外線截止濾光片層41與ND濾光片層42。Further, in the configuration of the filter substrate 5, the infrared cut filter layer 41 and the ND filter layer 42 are formed in a laminated state on the common surface of the glass substrate 40. Therefore, when the filter substrate 5 is manufactured, the infrared cut filter layer 41 and the ND filter layer 42 can be sequentially formed (formed) without causing the glass substrate 40 to be reversed in the front and back directions.

<5.變形例><5. Modifications>

本發明之技術範圍並不受限於上述實施形態,可於能引導出藉由發明之構成要件或其組合而獲得之特定效果之範圍內,亦包含添加各種變更或改良之形態。The technical scope of the present invention is not limited to the above-described embodiments, and various modifications and improvements may be added to the extent that the specific effects obtained by the constituent elements of the invention or a combination thereof can be guided.

例如,關於ND濾光片層42,亦可並非形成於玻璃基板40之一方之主面,而形成於與形成有紅外線截止濾光片層41之主面為相反側之主面。又,關於紅外線截止濾光片層41及ND濾光片層42,亦可分別形成於玻璃基板40之雙方之主面。而且,作為包含ND濾光片層42之光衰減區之平面形狀,亦可並不限定於上述圓形等形狀,例如可為屬於多邊形之三角形、四角形、五角形、六角形、(以下,省略),亦可為其以外之形狀,例如星形、花瓣型、十字形、雲朵形、半月形。For example, the ND filter layer 42 may be formed not on one main surface of the glass substrate 40 but on the main surface opposite to the main surface on which the infrared cut filter layer 41 is formed. Further, the infrared cut filter layer 41 and the ND filter layer 42 may be formed on the main surfaces of both of the glass substrates 40, respectively. Further, the planar shape of the light attenuating region including the ND filter layer 42 is not limited to the above-described circular shape, and may be, for example, a triangle belonging to a polygon, a square, a pentagon, or a hexagon, (hereinafter, omitted) It can also be other shapes, such as star, petal, cross, cloud, and half moon.

又,亦可使於玻璃基板40上積層紅外線截止濾光片層41與ND濾光片層42時之順序,為與上述實施形態相反之順序,即於ND濾光片層42上以覆蓋ND濾光片層42之狀態形成紅外線截止濾光片層41者。Further, the order of laminating the infrared cut filter layer 41 and the ND filter layer 42 on the glass substrate 40 may be reversed to the above embodiment, that is, over the ND filter layer 42 to cover the ND. The state of the filter layer 42 forms the infrared cut filter layer 41.

又,亦可分別於各自之玻璃基板上形成紅外線截止濾光片層41與ND濾光片層42,且採用藉由例如接著等使此等玻璃基板而成為一體化之構成之濾光片基板。Further, the infrared cut filter layer 41 and the ND filter layer 42 may be formed on the respective glass substrates, and the filter substrate may be formed by integrating the glass substrates, for example, or the like. .

又,亦可為藉由例如直線之滑動式之移動動作,而非如上述實施形態之以支持軸35為中心之旋轉動作進行用以切換攝影模式而進行之濾光片基板5之動作的構成。於採用該構成之情形時,亦可形成例如將長方形之基板之主面區域沿著該基板之長度方向區分為2個區域,僅於一方之區域形成紅外線截止濾光片層,且於其中央部分形成ND濾光片層之構成。Further, it is also possible to perform a movement operation of the filter substrate 5 by switching the photographing mode by a sliding operation of, for example, a linear motion, instead of the rotation operation centering on the support shaft 35 as in the above embodiment. . In the case of adopting such a configuration, for example, the main surface region of the rectangular substrate may be divided into two regions along the longitudinal direction of the substrate, and the infrared cut filter layer may be formed only in one region, and in the center thereof. Part of the formation of the ND filter layer.

又,作為具有紅外線截止功能之濾光片基板5之構成,並不僅限定於如上述實施形態之在玻璃基板40上形成紅外線截止濾光片層41之構成,例如,亦可為玻璃基板40本身具有截止紅外線之功能者,即可為採用由紅外線截止玻璃所構成之玻璃基板40之構成。Further, the configuration of the filter substrate 5 having the infrared cutoff function is not limited to the configuration in which the infrared cut filter layer 41 is formed on the glass substrate 40 as in the above embodiment, and for example, the glass substrate 40 itself may be used. The function of having a function of cutting off infrared rays is a configuration using a glass substrate 40 composed of infrared cut glass.

又,作為具有紫外線截止功能之濾光片基板5之構成,並不限定於如上述實施形態之由紫外線截止玻璃所構成玻璃基板40者,亦可為於玻璃基板之主面形成紫外線截止濾光片層之構成。Further, the configuration of the filter substrate 5 having the ultraviolet cutoff function is not limited to the glass substrate 40 composed of the ultraviolet cut glass as in the above embodiment, and the ultraviolet cut filter may be formed on the main surface of the glass substrate. The composition of the slice.

又,亦可採用於薄膜基材上形成ND濾光片層42,且將此膜基材貼附於玻璃基板40之構成。Further, the ND filter layer 42 may be formed on the film substrate, and the film substrate may be attached to the glass substrate 40.

又,於本發明之光圈裝置之構成上,關於「可見光穿透區」,該可見光穿透區係使可見光穿透之區域,詳細而言係在去除既定之波長區之光之狀態下使可見光穿透之區域,更詳細而言係在去除可見光中之攝影機攝影時所不需要之光之狀態下使可見光穿透的區域。此情形之所謂在攝影機之攝影時所不需要之光,係指於「波長長於可見光之光」及「波長短於可見光之光」中之至少一方之光。更具體而言,紅外光(包括近紅外光)及紫外光(包括近紫外光)中至少一方之光係相當於「攝影機攝影時所不需要之光」者。Further, in the configuration of the aperture device of the present invention, regarding the "visible light transmission region", the visible light transmission region is a region through which visible light is transmitted, and in detail, visible light is removed in a state where light of a predetermined wavelength region is removed. The region of penetration, more specifically, the region through which visible light is transmitted in a state where light which is not required for photographing of a camera in visible light is removed. In this case, the light that is not required for the photographing of the camera refers to light of at least one of "light having a wavelength longer than visible light" and "light having a shorter wavelength than visible light". More specifically, at least one of infrared light (including near-infrared light) and ultraviolet light (including near-ultraviolet light) corresponds to "light that is not required for camera photography".

因此,濾光片基板5所具有之「可見光穿透區」,係除了具有紅外線截止濾光片及紫外線截止濾光片之雙方之過濾功能的情形以外,亦可能存在著僅具有紅外線截止濾光片之功能之情形、或僅具有紫外線截止濾光片之功能之情形。然而,就防止影像之顏色偏差而言,較理想的是具有紅外線截止濾光片及紫外線截止濾光片之雙方之過濾功能之區域。又,關於可見光穿透區,並無必要使玻璃基板40之主面上之整個區域均成為可見光穿透區,只要以成為比光衰減區大之區域之方式確保可見光穿透區即可。Therefore, in addition to the filtering function of both the infrared cut filter and the ultraviolet cut filter, the "visible light transmission region" of the filter substrate 5 may have only infrared cut filter. The case of the function of the film, or the case of having only the function of the ultraviolet cut filter. However, in terms of preventing color deviation of the image, it is preferable to have an area of the filtering function of both the infrared cut filter and the ultraviolet cut filter. Further, in the visible light transmission region, it is not necessary to make the entire region on the main surface of the glass substrate 40 a visible light transmission region, and it is only necessary to secure the visible light transmission region so as to be larger than the light attenuation region.

又,本發明並不限定於光圈裝置或使用光圈裝置之攝影機,亦可應用於具備該攝影機之電子機器(例如,保安機器等)。該電子機器係構成為具備本發明之實施形態之攝影機、及處理自該攝影機所輸出之影像信號的影像處理部。Further, the present invention is not limited to a diaphragm device or a camera using an aperture device, and can be applied to an electronic device (for example, a security device or the like) including the camera. The electronic device is configured to include a camera according to an embodiment of the present invention and a video processing unit that processes video signals output from the camera.

1、200...光圈裝置1,200. . . Aperture device

2、201...光圈基板2, 201. . . Aperture substrate

3、4、202、203...光圈葉片3, 4, 202, 203. . . Aperture blade

5、204...濾光片基板5, 204. . . Filter substrate

6...葉片蓋6. . . Blade cover

7...光圈驅動部7. . . Aperture drive unit

8...濾光片驅動部8. . . Filter drive unit

10、30...開口部10, 30. . . Opening

11a、11b、11c、11d...突起部11a, 11b, 11c, 11d. . . Protrusion

15、、26、210、36a、36b...孔部15, 26, 210, 36a, 36b. . . Hole

16a、16b、16c、19a、19b、19c...導引槽16a, 16b, 16c, 19a, 19b, 19c. . . Guide slot

17、20...卡合孔17,20. . . Engagement hole

18、211...灣部18, 211. . . Bay Department

23、214...框架構件23,214. . . Frame member

24、215...濾光片單元24,215. . . Filter unit

25、32...臂部25, 32. . . Arm

27、33...長孔27, 33. . . Long hole

28、29...突出部28, 29. . . Protruding

31a、31b...餘隙部31a, 31b. . . Clearance

34a、34b...驅動銷34a, 34b. . . Drive pin

35...支持軸35. . . Support shaft

37a、37b...缺口部37a, 37b. . . Notch

40...玻璃基板40. . . glass substrate

41‧‧‧紅外線截止濾光片層 41‧‧‧Infrared cut filter layer

42‧‧‧ND濾光片層 42‧‧‧ND filter layer

43、216‧‧‧光圈開口 43,216‧‧‧ aperture opening

100‧‧‧攝影機 100‧‧‧ camera

101‧‧‧安裝基座 101‧‧‧Installation base

102‧‧‧攝影機本體 102‧‧‧ camera body

103‧‧‧鏡筒部 103‧‧‧Mirror tube

104‧‧‧物鏡 104‧‧‧ Objective lens

105‧‧‧攝像元件 105‧‧‧Photographic components

205‧‧‧葉片蓋 205‧‧‧ blade cover

206‧‧‧光圈驅動部 206‧‧‧Aperture drive department

207‧‧‧濾光片驅動部 207‧‧‧Filter Driver

208、209‧‧‧ND濾光片 208, 209‧‧ ND filters

210‧‧‧孔部 210‧‧‧ Hole Department

212‧‧‧玻璃基板 212‧‧‧ glass substrate

213‧‧‧濾光片層 213‧‧‧Filter layer

圖1係表示應用本發明之攝影機之構成例者,(A)係攝影機整體之外觀圖,(B)係鏡筒內部之概略圖。Fig. 1 is a view showing an example of a configuration of a camera to which the present invention is applied, (A) is an external view of the entire camera, and (B) is a schematic view of the inside of the lens barrel.

圖2係表示本發明實施形態之光圈裝置整體的構成例之分解斜視圖。Fig. 2 is an exploded perspective view showing an example of the configuration of the entire aperture device according to the embodiment of the present invention.

圖3係將實施形態之濾光片單元放大之俯視圖。Fig. 3 is a plan view showing an enlarged view of the filter unit of the embodiment.

圖4係圖3所示之濾光片基板之剖視圖。4 is a cross-sectional view of the filter substrate shown in FIG. 3.

圖5係表示使一對光圈葉片相疊合之狀態之圖式。Fig. 5 is a view showing a state in which a pair of diaphragm blades are superposed.

圖6係表示使光圈開口開放(全開)之狀態之圖式。Fig. 6 is a view showing a state in which the aperture opening is opened (fully opened).

圖7係表示使光圈開口43成為小光圈之狀態之圖式。Fig. 7 is a view showing a state in which the aperture opening 43 is made into a small aperture.

圖8係表示習知之光圈裝置之一例之分解斜視圖。Fig. 8 is an exploded perspective view showing an example of a conventional aperture device.

圖9係將習知之濾光片單元放大之俯視圖。Fig. 9 is a plan view showing an enlarged view of a conventional filter unit.

圖10係圖9所示之濾光片基板之剖視圖。Figure 10 is a cross-sectional view showing the filter substrate shown in Figure 9.

圖11係表示於習知之光圈裝置,在光圈葉片上安裝有ND濾光片之狀態之分解斜視圖。Fig. 11 is an exploded perspective view showing a state in which an ND filter is mounted on a diaphragm blade in a conventional aperture device.

圖12係表示使一對葉片基板相疊合之狀態之圖式。Fig. 12 is a view showing a state in which a pair of blade substrates are superposed.

圖13係表示使光圈開口開放(全開)之狀態之圖式。Fig. 13 is a view showing a state in which the aperture opening is opened (fully opened).

圖14係表示使光圈開口成為小光圈之狀態之圖式。Fig. 14 is a view showing a state in which the aperture opening is made into a small aperture.

1...光圈裝置1. . . Aperture device

2...光圈基板2. . . Aperture substrate

3、4...光圈葉片3, 4. . . Aperture blade

5...濾光片基板5. . . Filter substrate

6...葉片蓋6. . . Blade cover

7...光圈驅動部7. . . Aperture drive unit

8...濾光片驅動部8. . . Filter drive unit

10、30...開口部10, 30. . . Opening

11a、11b、11c、11d...突起部11a, 11b, 11c, 11d. . . Protrusion

15、26、36a、36b...孔部15, 26, 36a, 36b. . . Hole

16a、16b、16c、19a、19b、19c...導引槽16a, 16b, 16c, 19a, 19b, 19c. . . Guide slot

17、20...卡合孔17,20. . . Engagement hole

18...灣部18. . . Bay Department

23...框架構件twenty three. . . Frame member

24...濾光片單元twenty four. . . Filter unit

25、32...臂部25, 32. . . Arm

27、33...長孔27, 33. . . Long hole

28、29...突出部28, 29. . . Protruding

31a、31b...餘隙部31a, 31b. . . Clearance

34a、34b...驅動銷34a, 34b. . . Drive pin

35...支持軸35. . . Support shaft

37a、37b...缺口部37a, 37b. . . Notch

42...ND濾光片層42. . . ND filter layer

Claims (11)

一種光圈裝置,其特徵在於,具備有:一對光圈葉片,其係以相互疊合之狀態形成光圈開口;濾光片基板,其具有可見光穿透區;光圈驅動部,其係使上述一對光圈葉片相對地移動以調整上述光圈開口之大小;及濾光片驅動部,其係使上述濾光片基板相對於通過上述光圈開口之入射光之光路徑而進退移動;且上述濾光片基板進一步具備有:光衰減區,該光衰減區係在通過上述光圈開口的光之中,使可通過上述可見光穿透區之光衰減的光衰減區;上述光衰減區係以較上述可見光穿透區小之區域形成於該可見光穿透區內,且配置成在使上述濾光片基板前進至上述光路徑上時與上述光圈開口呈同心狀者。 An aperture device comprising: a pair of aperture blades that form a diaphragm opening in a state of being overlapped with each other; a filter substrate having a visible light transmission region; and a diaphragm driving portion that couples the pair The aperture blade is relatively moved to adjust the size of the aperture opening; and the filter driving portion moves forward and backward with respect to the optical path of the incident light passing through the aperture opening; and the filter substrate Further, there is provided: a light attenuating region which is a light attenuating region which can attenuate light passing through the visible light penetrating region among the light passing through the aperture of the aperture; the light attenuating region penetrates through the visible light The small area is formed in the visible light transmissive area, and is disposed to be concentric with the aperture opening when the filter substrate is advanced to the optical path. 如申請專利範圍第1項之光圈裝置,其中,上述光衰減區係形成為圓形。 The aperture device of claim 1, wherein the light attenuating region is formed in a circular shape. 如申請專利範圍第1項之光圈裝置,其中,上述光衰減區係形成為與上述光圈開口之開口形狀相似之形狀。 The aperture device of claim 1, wherein the light attenuating region is formed in a shape similar to an opening shape of the aperture opening. 如申請專利範圍第1、2或3項之光圈裝置,其中,上述可見光穿透區包含形成於上述濾光片基板之至少一方之主面的紅外線截止濾光片層, 上述光衰減區包含形成於上述濾光片基板之一方之主面或另一方之主面或者雙方之主面的ND濾光片層。 The aperture device of claim 1, wherein the visible light transmission region includes an infrared cut filter layer formed on a principal surface of at least one of the filter substrates. The light attenuating region includes an ND filter layer formed on one of the main surfaces of the filter substrate or the other main surface or both main surfaces. 如申請專利範圍第4項之光圈裝置,其中,上述紅外線截止濾光片層及上述ND濾光片層,係以積層狀態形成於上述濾光片基板共通之主面上。 The aperture device of claim 4, wherein the infrared cut filter layer and the ND filter layer are formed in a laminated state on a common surface of the filter substrate. 如申請專利範圍第1至3項中任一項之光圈裝置,其中,上述濾光片基板係由紫外線截止玻璃所構成者或於玻璃基板之主面形成有紫外線截止濾光片層者。 The aperture device according to any one of claims 1 to 3, wherein the filter substrate is formed of an ultraviolet cut glass or an ultraviolet cut filter layer formed on a main surface of the glass substrate. 如申請專利範圍第4項之光圈裝置,其中,上述ND濾光片層係以相同的厚度形成於上述紅外線截止濾光片層上。 The aperture device of claim 4, wherein the ND filter layer is formed on the infrared cut filter layer with the same thickness. 如申請專利範圍第7項之光圈裝置,其中,於使上述光圈開口成為全開狀態時將有效地發揮功能之上述可見光穿透區設為100%的情形時,上述光衰減區之面積相對於上述可見光穿透區之面積為4~33%。 The aperture device of claim 7, wherein the area of the light attenuating area is relative to the above when the visible light penetration area that effectively functions when the aperture opening is fully opened is 100% The area of the visible light penetration zone is 4 to 33%. 如申請專利範圍第7項之光圈裝置,其中,上述ND濾光片層之可見光穿透率為6%。 The aperture device of claim 7, wherein the ND filter layer has a visible light transmittance of 6%. 一種攝影機,其特徵在於,具備有:申請專利範圍第1至5項中任一項之光圈裝置;及光電轉換元件,其係將通過上述光圈開口之入射光轉換為電信號。 A photographic apparatus comprising: the aperture device according to any one of claims 1 to 5; and a photoelectric conversion element that converts incident light passing through the aperture opening into an electrical signal. 一種電子機器,其特徵在於,具備有: 申請專利範圍第10項之攝影機;及影像處理部,其係對自上述攝影機所輸出之影像信號進行處理。 An electronic machine characterized by having: The camera of claim 10; and the image processing unit for processing the image signal output from the camera.
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Families Citing this family (9)

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TWI584053B (en) * 2013-03-05 2017-05-21 Japan Prec Instr Inc Aperture devices and cameras
KR102208491B1 (en) * 2014-08-04 2021-01-27 한화테크윈 주식회사 Diaphragm device
JP2016038183A (en) * 2014-08-11 2016-03-22 日立アプライアンス株式会社 Air conditioner and air conditioning operation control method
JP5994952B2 (en) * 2015-02-03 2016-09-21 大日本印刷株式会社 Vapor deposition mask manufacturing method, vapor deposition mask manufacturing apparatus, laser mask, and organic semiconductor element manufacturing method
JP6568829B2 (en) * 2016-08-01 2019-08-28 日本電産コパル株式会社 Blade drive device
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EP3343287B1 (en) * 2016-12-28 2018-11-21 Axis AB A method for sequential control of ir-filter, and an assembly performing such method
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Family Cites Families (8)

* Cited by examiner, † Cited by third party
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JP3461061B2 (en) * 1995-06-30 2003-10-27 株式会社リコー Camera light adjustment device
JP4200270B2 (en) * 2002-05-30 2008-12-24 パナソニック株式会社 Light amount adjustment device, lens barrel, imaging device
AU2003241900A1 (en) * 2003-05-29 2005-01-21 Nihon Seimitsu Sokki Co., Ltd. Diaphragm
JP4671410B2 (en) * 2005-05-24 2011-04-20 キヤノン電子株式会社 Light aperture device and camera with ND filter with IR cut function
JP4625729B2 (en) * 2005-07-06 2011-02-02 日本精密測器株式会社 Aperture device
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