TWI514464B - - Google Patents
Info
- Publication number
- TWI514464B TWI514464B TW101149901A TW101149901A TWI514464B TW I514464 B TWI514464 B TW I514464B TW 101149901 A TW101149901 A TW 101149901A TW 101149901 A TW101149901 A TW 101149901A TW I514464 B TWI514464 B TW I514464B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210124969.0A CN102629541B (zh) | 2012-04-25 | 2012-04-25 | 喷淋头及其形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201344783A TW201344783A (zh) | 2013-11-01 |
| TWI514464B true TWI514464B (enExample) | 2015-12-21 |
Family
ID=46587779
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101149901A TW201344783A (zh) | 2012-04-25 | 2012-12-25 | 噴淋頭及其形成方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102629541B (enExample) |
| TW (1) | TW201344783A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI582823B (zh) * | 2015-11-17 | 2017-05-11 | 弘潔科技股份有限公司 | 一種用於電漿反應室之氣體分散板 |
| TWI859447B (zh) * | 2020-06-17 | 2024-10-21 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 具有用於改善對腐蝕性化學環境的耐受性的稀土（氧）氟化物塗層之器件及用於製造和使用該等器件之方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW533494B (en) * | 2000-12-29 | 2003-05-21 | Lam Res Corp | Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| TW200712251A (en) * | 2005-06-17 | 2007-04-01 | Univ Tohoku | Protection film structure for a metal member, metal parts using the protection film structure, and semiconductor of flat display production apparatus using the protection film structure |
| TW201026632A (en) * | 2008-11-12 | 2010-07-16 | Applied Materials Inc | Protective coatings resistant to reactive plasma processing |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1501115B1 (en) * | 2003-07-14 | 2009-07-01 | FEI Company | Dual beam system |
-
2012
- 2012-04-25 CN CN201210124969.0A patent/CN102629541B/zh active Active
- 2012-12-25 TW TW101149901A patent/TW201344783A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW533494B (en) * | 2000-12-29 | 2003-05-21 | Lam Res Corp | Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| TW200712251A (en) * | 2005-06-17 | 2007-04-01 | Univ Tohoku | Protection film structure for a metal member, metal parts using the protection film structure, and semiconductor of flat display production apparatus using the protection film structure |
| TW201026632A (en) * | 2008-11-12 | 2010-07-16 | Applied Materials Inc | Protective coatings resistant to reactive plasma processing |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201344783A (zh) | 2013-11-01 |
| CN102629541A (zh) | 2012-08-08 |
| CN102629541B (zh) | 2016-02-17 |