TWI499484B - Nozzle handling device - Google Patents

Nozzle handling device Download PDF

Info

Publication number
TWI499484B
TWI499484B TW100123287A TW100123287A TWI499484B TW I499484 B TWI499484 B TW I499484B TW 100123287 A TW100123287 A TW 100123287A TW 100123287 A TW100123287 A TW 100123287A TW I499484 B TWI499484 B TW I499484B
Authority
TW
Taiwan
Prior art keywords
holder
pair
processing apparatus
centrifugal projectors
bead processing
Prior art date
Application number
TW100123287A
Other languages
Chinese (zh)
Other versions
TW201217100A (en
Inventor
Kyouji Yamashita
Young Gyo Jung
Tsunetoshi Suzuki
Takuji Yamamoto
Original Assignee
Sintokogio Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintokogio Ltd filed Critical Sintokogio Ltd
Publication of TW201217100A publication Critical patent/TW201217100A/en
Application granted granted Critical
Publication of TWI499484B publication Critical patent/TWI499484B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/18Abrasive blasting machines or devices; Plants essentially provided with means for moving workpieces into different working positions
    • B24C3/20Abrasive blasting machines or devices; Plants essentially provided with means for moving workpieces into different working positions the work being supported by turntables
    • B24C3/24Apparatus using impellers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C9/00Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Crushing And Pulverization Processes (AREA)
  • Projection Apparatus (AREA)

Description

噴珠處理裝置Bead processing device

本發明係關於噴珠處理裝置。The present invention relates to a bead processing apparatus.

於專利文獻1揭示有於箱體上部及下部具備有離心式投射機之噴珠處理裝置。Patent Document 1 discloses a bead processing apparatus including a centrifugal projector in an upper portion and a lower portion of a casing.

專利文獻1:日本特許2868169號公報Patent Document 1: Japanese Patent No. 2868169

然而,專利文獻1所記載之噴珠處理裝置,在從各離心式投射機投射投射材時,來自於箱體上部所具備之離心式投射機之投射材與來自於箱體下部所具備之離心式投射機之投射材係相抵銷,而有投射效率降低之虞。However, in the bead processing apparatus described in Patent Document 1, when the projection material is projected from each of the centrifugal projectors, the projection material from the centrifugal projector provided in the upper portion of the casing and the centrifugal material from the lower portion of the casing are provided. The projection material of the projector is offset, and the projection efficiency is reduced.

本發明係有鑒於上述課題而完成者,其目的在於提供能使投射效率提升之噴珠處理裝置。The present invention has been made in view of the above problems, and an object thereof is to provide a bead processing apparatus capable of improving projection efficiency.

為解決前述課題,第1觀點之發明之噴珠處理裝置,具備:保持具,能自轉且能滑動,於自轉軸線上保持工件;以及一對離心式投射機,分別具有能旋轉之葉輪,各前述葉輪之旋轉軸線彼此平行且彼此於前述葉輪之旋轉軸線方向偏置配置,並能隨著前述各葉輪之旋轉而朝向前述工件並列投射投射材。In order to solve the above problems, the bead processing apparatus according to the first aspect of the invention includes: a holder capable of rotating and slidable to hold a workpiece on a rotation axis; and a pair of centrifugal projectors each having a rotatable impeller The rotation axes of the impellers are parallel to each other and are disposed offset from each other in the rotation axis direction of the impeller, and can project the projection material in parallel with the workpiece along with the rotation of the impellers.

此噴珠處理裝置,係在於保持具之自轉軸線上保持有工件之狀態下,保持具自轉且滑動。接著,藉由於一對離心式投射機所具備之葉輪旋轉,而從各離心式投射機對工件投射投射材,藉此對工件加工。In the bead processing apparatus, the holder rotates and slides while the workpiece is held on the rotation axis of the holder. Next, the projections are projected from the respective centrifugal projectors to the workpiece by the impeller rotation of the pair of centrifugal projectors, thereby processing the workpiece.

此處,一對離心式投射機,各葉輪之旋轉軸線彼此平行,且彼此於葉輪之旋轉軸線方向偏置配置。接著,從一對離心式投射機朝向工件並列投射投射材。因此,即使在從一對離心式投射機分別投射投射材之情形,亦可抑制來自一方之離心式投射機之投射材與來自另一方之離心式投射機之投射材相抵銷,而能使投射效率提升。Here, in a pair of centrifugal projectors, the rotation axes of the respective impellers are parallel to each other, and are arranged offset from each other in the direction of the rotation axis of the impeller. Next, the projecting material is projected in parallel from the pair of centrifugal projectors toward the workpiece. Therefore, even when the projection material is projected from a pair of centrifugal projectors, it is possible to suppress the projection material of the centrifugal projector from one side from being offset by the projection material of the centrifugal projector from the other side, thereby enabling Increased projection efficiency.

第2觀點之發明之噴珠處理裝置,係於第1觀點之發明之噴珠處理裝置中,進一步具備箱體,該箱體具有相對前述保持具配置於上方之上壁與配置於前述保持具側方之側壁;前述一對離心式投射機中之一方設於前述上壁而能將投射材往下方投射;前述一對離心式投射機中之另一方設於前述側壁而能將投射材往下方投射。According to a second aspect of the invention, in a bead processing apparatus according to the first aspect of the invention, the bead processing apparatus further includes a casing, wherein the casing is disposed on the upper upper wall and the holder is disposed on the holder a side wall; one of the pair of centrifugal projectors is disposed on the upper wall to project the projection material downward; and the other of the pair of centrifugal projectors is disposed on the side wall to move the projection material toward Cast below.

根據此噴珠處理裝置,一對離心式投射機由於分別設於上壁及側壁,因此例如即使工件具有複雜之形狀,亦能加以對應(能對工件適切地投射投射材)。而且,一對離心式投射機能將投射材往下方投射。因此,在從一對離心式投射機投射投射材之情形,由於能藉由重力之作用使投射材加速,因此能更加使投射效率提升。According to this bead processing apparatus, since the pair of centrifugal projectors are provided on the upper wall and the side walls, for example, even if the workpiece has a complicated shape, it can be matched (the projection material can be appropriately projected to the workpiece). Moreover, a pair of centrifugal projectors can project the projecting material downward. Therefore, in the case where the projection material is projected from a pair of centrifugal projectors, since the projection material can be accelerated by the action of gravity, the projection efficiency can be further improved.

第3觀點之發明之噴珠處理裝置,係於第1或第2觀點之發明之噴珠處理裝置中,前述一對離心式投射機配置成從前述各葉輪呈扇狀擴展而投射之投射材在前述保持具上之擴展方向,分別與前述保持具之滑動方向及自轉軸線方向正交。According to a third aspect of the invention, in the bead processing apparatus of the first aspect or the second aspect, the pair of centrifugal projectors are arranged to project a projection material from the impellers in a fan shape. The extending direction of the holder is orthogonal to the sliding direction and the rotation axis direction of the holder.

根據此噴珠處理裝置,一對離心式投射機配置成從各葉輪呈扇狀擴展而投射之投射材在保持具上之擴展方向,分別與保持具之滑動方向及自轉軸線方向正交。因此,相較於上述擴展方向與滑動方向為平行之情形,即使係工件被滑動之情形,亦能減少投射至從工件偏離之位置之投射材之數目(能抑制投射材之浪費)。According to the bead processing apparatus, the pair of centrifugal projectors are arranged such that the projection material projected from the respective impellers in a fan shape is expanded in the holder in the direction in which the projections are perpendicular to the sliding direction and the rotation axis direction of the holder. Therefore, compared with the case where the above-described expansion direction and the sliding direction are parallel, even if the workpiece is slid, the number of projection materials projected to the position deviated from the workpiece can be reduced (the waste of the projection material can be suppressed).

第3觀點之發明之噴珠處理裝置,係於第3觀點之發明之噴珠處理裝置中,前述一對離心式投射機配置成在從分別與前述保持具之滑動方向及自轉軸線方向正交之方向觀看時,前述各葉輪之旋轉面相對前述保持具之自轉軸線傾斜既定角度。According to a third aspect of the invention, in the bead processing apparatus of the third aspect of the invention, the pair of centrifugal projectors are arranged to be orthogonal to a sliding direction and a rotation axis direction of the holder, respectively. When viewed in the direction, the rotating surface of each of the impellers is inclined at a predetermined angle with respect to the rotation axis of the holder.

根據此噴珠處理裝置,一對離心式投射機配置成在從分別與保持具之滑動方向及自轉軸線方向正交之方向觀看時,各葉輪之旋轉面相對保持具之自轉軸線傾斜既定角度。因此,由於係從相對保持具之自轉軸線為傾斜之方向對工件投射投射材,因此即使工件具有側面或影子之部分,亦能對此部分投射投射材,且能將投射材投射於工件之較寬廣範圍。According to the bead processing apparatus, the pair of centrifugal projectors are arranged such that the rotation faces of the respective impellers are inclined at a predetermined angle with respect to the rotation axis of the holder when viewed from a direction orthogonal to the sliding direction of the holder and the direction of the rotation axis. Therefore, since the projection material is projected onto the workpiece from the direction in which the rotation axis of the holder is inclined, even if the workpiece has a side or a shadow portion, the projection material can be projected on the portion, and the projection material can be projected onto the workpiece. A wide range.

第5觀點之發明之噴珠處理裝置,係於第1~4觀點之發明之噴珠處理裝置中,進一步具備:自轉驅動部,使前述保持具自轉;滑動驅動部,使前述保持具滑動;以及控制部,使前述滑動驅動部驅動而使前述保持具在前述滑動方向之複數個停止位置停止,且使前述保持具停止於前述各停止位置時,使前述自轉驅動部驅動以使前述保持具自轉且使前述一對離心式投射機作動以投射投射材。The bead processing apparatus of the invention according to the first aspect of the invention, further comprising: a rotation driving unit that rotates the holder; and a sliding driving unit that slides the holder; And a control unit that drives the slide drive unit to stop the holder at a plurality of stop positions in the sliding direction, and when the holder stops at each of the stop positions, drives the rotation drive unit to drive the holder The rotation is performed and the aforementioned pair of centrifugal projectors are actuated to project the projecting material.

根據此噴珠處理裝置,由於能在使保持具停止於滑動方向之複數個停止位置之狀態下對自轉之工件投射投射材,因此能抑制投射不均。According to the bead processing apparatus, since the projection material can be projected on the workpiece that rotates while the holder is stopped at the plurality of stop positions in the sliding direction, projection unevenness can be suppressed.

第6觀點之發明之噴珠處理裝置,係於第1~5觀點之發明之噴珠處理裝置中,前述一對離心式投射機彼此為相同構成;具備將前述一對離心式投射機控制成前述各葉輪以相同轉數旋轉之控制部。According to a third aspect of the invention, in the bead processing apparatus of the first to fifth aspects, the pair of centrifugal projectors have the same configuration; and the pair of centrifugal projectors are controlled to Each of the impellers is rotated at the same number of revolutions as a control unit.

根據此噴珠處理裝置,一對離心式投射機由於彼此為相同構成,且各葉輪亦係以相同轉數旋轉,因此能簡化裝置,而能降低成本。According to this bead processing apparatus, since the pair of centrifugal projectors have the same configuration and each of the impellers rotates at the same number of revolutions, the apparatus can be simplified and the cost can be reduced.

如以上所詳述,根據本發明能提升投射效率。As detailed above, the projection efficiency can be improved in accordance with the present invention.

首先,說明本發明之第1實施形態。First, a first embodiment of the present invention will be described.

此外,各圖中所示之箭頭FR、箭頭UP、箭頭LH,係顯示以下說明之噴珠處理裝置10之前側、上側、左側。Moreover, the arrow FR, the arrow UP, and the arrow LH shown in each figure show the front side, the upper side, and the left side of the bead processing apparatus 10 demonstrated below.

如圖1所示,本發明之第1實施形態之噴珠處理裝置10,例如係為了除去附著於金屬製工件12之氧化鏽而使用之珠擊裝置,具備保持具14、箱體16、自轉驅動部18、滑動驅動部20、一對離心式投射機22,24、以及控制部26。As shown in Fig. 1, the bead processing apparatus 10 according to the first embodiment of the present invention is provided with a bead device for removing rust which adheres to the metal workpiece 12, and includes a holder 14, a case 16, and a rotation. The drive unit 18, the slide drive unit 20, the pair of centrifugal projectors 22, 24, and the control unit 26.

保持具14形成為圓盤狀且設為水平。於此保持具14背側之中央部形成有沿噴珠處理裝置10之高度方向往下方延伸之軸部28。又,此保持具14藉由軸部28被後述之自轉驅動部18所具備之支撐部52支撐成能旋轉,而能以噴珠處理裝置10之高度方向為中心軸自轉。The holder 14 is formed in a disk shape and is horizontal. A shaft portion 28 extending downward in the height direction of the bead processing apparatus 10 is formed at a central portion of the back side of the holder 14. In addition, the holder 14 is rotatably supported by the support portion 52 of the rotation driving unit 18, which will be described later, by the shaft portion 28, and can be rotated about the height direction of the bead processing device 10.

箱體16構成為箱狀,收容有保持具14。此箱體16具有配置於保持具14上方之上壁30、配置於保持具14側方之複數個側壁32,34,36,38。The casing 16 is formed in a box shape and houses the holder 14. The casing 16 has a plurality of side walls 32, 34, 36, 38 disposed on the upper wall 30 above the holder 14 and disposed on the side of the holder 14.

自轉驅動部18係用以使保持具14自轉者,具有馬達40、滾子42、旋轉構件44。馬達40固定於後述之滑動驅動部20之臂50,滾子42固定於馬達40之旋轉軸。旋轉構件44配置於與保持具14相同之軸上,固定於保持具14。又,上述滾子42係以被按壓之狀態接觸於旋轉構件44。又,此自轉驅動部18,係構成為在滾子42被旋轉後保持具14與旋轉構件44一起自轉。The rotation drive unit 18 is provided with a motor 40, a roller 42, and a rotating member 44 for causing the holder 14 to rotate. The motor 40 is fixed to an arm 50 of a slide driving unit 20 to be described later, and the roller 42 is fixed to a rotating shaft of the motor 40. The rotating member 44 is disposed on the same axis as the holder 14 and is fixed to the holder 14 . Further, the roller 42 is in contact with the rotating member 44 in a pressed state. Further, the rotation driving unit 18 is configured such that the holder 14 rotates together with the rotating member 44 after the roller 42 is rotated.

滑動驅動部20係用以使保持具14滑動於噴珠處理裝置10前後方向者,具有馬達46、旋轉軸48、臂50、以及支撐部52。馬達46及旋轉軸48配置成其旋轉軸線與噴珠處理裝置10之高度方向一致。又,馬達46固定於側壁34,旋轉軸48被側壁34支撐成能旋轉。The slide drive unit 20 is provided with a motor 46, a rotary shaft 48, an arm 50, and a support portion 52 for sliding the holder 14 in the front-rear direction of the bead processing apparatus 10. The motor 46 and the rotating shaft 48 are disposed such that their rotation axes coincide with the height direction of the bead processing apparatus 10. Further, the motor 46 is fixed to the side wall 34, and the rotating shaft 48 is supported by the side wall 34 so as to be rotatable.

於馬達46之旋轉軸設有齒輪54,此齒輪54與設於旋轉軸48上端之齒輪56咬合。臂50延伸於水平方向,其長度設定為較保持具14之半徑長。臂50之基端部固定於旋轉軸48之長度方向中間部,於臂50之前端部設有支撐部52。又,此噴珠處理裝置10,藉由馬達46之旋轉軸正反旋轉而使臂50擺動,使保持具14能滑動於水平方向(能往復移動)。A gear 54 is provided on the rotating shaft of the motor 46. The gear 54 meshes with a gear 56 provided at the upper end of the rotating shaft 48. The arm 50 extends in the horizontal direction and has a length set to be longer than the radius of the holder 14. The base end portion of the arm 50 is fixed to the intermediate portion in the longitudinal direction of the rotary shaft 48, and the support portion 52 is provided at the front end portion of the arm 50. Further, in the bead processing apparatus 10, the arm 50 is swung by the rotation of the rotating shaft of the motor 46, and the holder 14 can be slid in the horizontal direction (reciprocally movable).

一對離心式投射機22,24如圖2所示,為分別具有葉輪60與馬達62之所謂離心式,為彼此相同之構成。一方之離心式投射機22設於形成在上壁30之側壁32側之傾斜部30A,另一方之離心式投射機24設於側壁32之上壁30側。各葉輪60分別固定於馬達62之旋轉軸。As shown in FIG. 2, the pair of centrifugal projectors 22 and 24 have the same configuration as the so-called centrifugal type in which the impeller 60 and the motor 62 are respectively provided. One of the centrifugal projectors 22 is provided on the inclined portion 30A formed on the side wall 32 side of the upper wall 30, and the other centrifugal projector 24 is provided on the upper wall 30 side of the side wall 32. Each of the impellers 60 is fixed to a rotating shaft of the motor 62.

又,此一對離心式投射機22,24,各自之葉輪60之旋轉軸線A彼此為平行,且彼此於葉輪60之旋轉軸線方向偏置配置(偏置量為α)。又,此一對離心式投射機22,24配置成在從分別與保持具14之滑動方向Y及自轉軸線方向Z正交之方向X(參照圖3)觀看時,各葉輪60之旋轉面B(與葉輪60之旋轉軸垂直之面)相對保持具14之自轉軸線C傾斜成分別具有θ1及θ2之角度(參照圖2)。Further, in the pair of centrifugal projectors 22, 24, the rotation axes A of the respective impellers 60 are parallel to each other, and are arranged offset from each other in the rotation axis direction of the impeller 60 (the offset amount is α). Further, the pair of centrifugal projectors 22, 24 are arranged such that the rotation faces B of the impellers 60 are viewed from a direction X (see FIG. 3) orthogonal to the sliding direction Y of the holder 14 and the rotation axis direction Z (see FIG. 3). (the surface perpendicular to the rotation axis of the impeller 60) is inclined with respect to the rotation axis C of the holder 14 to have angles of θ1 and θ2, respectively (refer to FIG. 2).

又,此噴珠處理裝置10,如圖3所示,隨著各葉輪60之旋轉而朝向工件12並列投射投射材68。亦即,從一方之離心式投射機22朝向保持具14之滑動區域S內之第一區域S1投射投射材68,從另一方之離心式投射機24朝向保持具14之滑動區域S內之第一區域S1與於保持具14之滑動方向Y相鄰之第二區域S2投射投射材68。Further, as shown in FIG. 3, the bead processing apparatus 10 projects the projection material 68 in parallel with the workpiece 12 as the impellers 60 rotate. That is, the projection material 68 is projected from the one centrifugal projector 22 toward the first region S1 in the sliding region S of the holder 14, and from the other centrifugal projector 24 toward the sliding region S of the holder 14. A region S1 projects a projection material 68 with a second region S2 adjacent to the sliding direction Y of the holder 14.

進而,此一對離心式投射機22,24配置成從各葉輪60分別扇狀擴展而投射之投射材68在保持具14上之擴展方向W,分別與保持具14之滑動方向Y及自轉軸線方向Z正交。又,此一對離心式投射機22,24配置於保持具14上方,而能將投射材68往下方投射。Further, the pair of centrifugal projectors 22, 24 are arranged so as to extend in a fan shape from each of the impellers 60, and the projecting material 68 projected in the extending direction W of the holder 14 is respectively in the sliding direction Y and the rotation axis of the holder 14. The direction Z is orthogonal. Further, the pair of centrifugal projectors 22, 24 are disposed above the holder 14, and the projection material 68 can be projected downward.

此外,本實施形態中如圖2所示,例如一對離心式投射機22,24之各葉輪60之旋轉面B與自轉軸線C所構成之傾斜角θ1,θ2設定為較0°大且為35°以下、較佳為15°。又,如圖4所示,臂50之偏角θ3設定為40°以下、較佳為22°,保持具14之滑動範圍L設定為500mm以下、較佳為300mm。又,保持具14在滑動方向之位置,係藉由未圖示之感測器偵測旋轉軸48之轉數而檢測出。Further, in the present embodiment, as shown in Fig. 2, for example, the inclination angles θ1 and θ2 of the rotation surface B of each of the impellers 60 of the pair of centrifugal projectors 22 and 24 and the rotation axis C are set to be larger than 0° and 35° or less, preferably 15°. Further, as shown in FIG. 4, the yaw angle θ3 of the arm 50 is set to 40° or less, preferably 22°, and the sliding range L of the holder 14 is set to 500 mm or less, preferably 300 mm. Further, the position of the holder 14 in the sliding direction is detected by the sensor (not shown) detecting the number of revolutions of the rotary shaft 48.

圖1,圖2所示之控制部26係與上述自轉驅動部18之馬達40、滑動驅動部20之馬達46、一對離心式投射機22,24之各馬達62電氣連接,構成為控制此等之動作。關於此控制部26之動作詳細,與之後之噴珠處理裝置10之動作合併說明。The control unit 26 shown in Fig. 1 and Fig. 2 is electrically connected to the motor 40 of the rotation driving unit 18, the motor 46 of the slide driving unit 20, and the motors 62 of the pair of centrifugal projectors 22 and 24, and is configured to control this. Wait for the action. The details of the operation of the control unit 26 will be described in conjunction with the operation of the subsequent bead processing apparatus 10.

又,此噴珠處理裝置10,作為將投射至工件12之投射材回收至各離心式投射機22,24之機構,具有螺旋輸送機80、斗式升降機82、分離機84、斗86、一對導入管88,90。Further, the bead processing apparatus 10 includes a screw conveyor 80, a bucket elevator 82, a separator 84, a bucket 86, and a mechanism for collecting the projection material projected onto the workpiece 12 to each of the centrifugal projectors 22, 24. Pair the introduction tubes 88, 90.

螺旋輸送機80配置於箱體16下部,構成為能將所投射之投射材回收至斗式升降機82側之處,斗式升降機82與螺旋輸送機80連接,能將藉由螺旋輸送機80回收之投射材持起至上方。The screw conveyor 80 is disposed at a lower portion of the casing 16 so that the projected projecting material can be collected to the bucket elevator 82 side, and the bucket elevator 82 is connected to the screw conveyor 80, and can be recovered by the screw conveyor 80. The projecting material is held up to the top.

分離機84連接於斗式升降機82上部,且具有未圖示之集塵管用突緣。又,斗86配置於分離機84下部,構成為能將投射材暫時貯存,導入管88,90分別連結斗86與離心式投射機22,24。The separator 84 is connected to the upper portion of the bucket elevator 82 and has a flange for a dust collecting pipe (not shown). Further, the bucket 86 is disposed at the lower portion of the separator 84, and is configured to temporarily store the projection material, and the introduction pipes 88 and 90 are connected to the bucket 86 and the centrifugal projectors 22 and 24, respectively.

其次,與上述噴珠處理裝置10之動作合併說明將工件12作珠擊處理之方法。Next, a method of performing the bead blasting process on the workpiece 12 will be described in conjunction with the operation of the above-described bead processing apparatus 10.

首先,如圖1,圖2所示,在於保持具14之自轉軸線C上保持有工件12之狀態下,藉由控制部26控制馬達40,使保持具14自轉。此時,保持具14係維持停止於第一停止位置(以圖4之P1所示之位置)之狀態。又,藉由控制部26控制馬達62使葉輪60旋轉,而從各離心式投射機22,24對工件12投射投射材。藉此,保持具14一邊在停止於第一停止位置之狀態下被自轉、一邊開始工件12之研掃。First, as shown in FIG. 1 and FIG. 2, in a state in which the workpiece 12 is held on the rotation axis C of the holder 14, the motor 40 is controlled by the control unit 26 to rotate the holder 14. At this time, the holder 14 is maintained in a state of being stopped at the first stop position (the position shown by P1 in FIG. 4). Further, the control unit 26 controls the motor 62 to rotate the impeller 60, and the projection material is projected from the centrifugal projectors 22 and 24 to the workpiece 12. Thereby, the holder 14 starts the grinding of the workpiece 12 while being rotated while stopping at the first stop position.

其次,在對工件12投射投射材既定時間後,藉由控制部26控制馬達46,使保持具14滑動至第二停止位置(為以圖4之P2所示之位置且為第一停止位置與後述之第三停止位置之中間位置,例如在保持具14之滑動範圍為300mm時,係與第一停止位置相距150mm之位置)。接著,保持具14一邊在停止於第二停止位置之狀態下被自轉、一邊持續工件12之研掃。Next, after the projection material is projected onto the workpiece 12 for a predetermined time, the control unit 26 controls the motor 46 to slide the holder 14 to the second stop position (the position shown by P2 in FIG. 4 and the first stop position and The intermediate position of the third stop position, which will be described later, is, for example, a position 150 mm apart from the first stop position when the sliding range of the holder 14 is 300 mm. Next, the holder 14 continues to sweep the workpiece 12 while being rotated while stopping at the second stop position.

又,與上述同樣地,在對工件12投射投射材既定時間後,藉由控制部26控制馬達46,使保持具14滑動至第三停止位置(為以圖4之P3所示之位置)。接著,保持具14一邊在停止於第三停止位置之狀態下被自轉、一邊持續工件12之研掃。Further, similarly to the above, after the projecting material is projected onto the workpiece 12 for a predetermined period of time, the control unit 26 controls the motor 46 to slide the holder 14 to the third stop position (the position shown by P3 in Fig. 4). Next, while the holder 14 is rotated while being stopped at the third stop position, the workpiece 12 is continuously swept.

另一方面,在保持具14停止於第三停止位置之狀態下對工件12投射投射材既定時間後,藉由控制部26控制成馬達46往與上述相反方向被驅動,使保持具14滑動至第二停止位置。接著,保持具14一邊在停止於第二停止位置之狀態下被自轉、一邊持續工件12之研掃。On the other hand, after the projection material is projected onto the workpiece 12 in a state where the holder 14 is stopped at the third stop position, the control unit 26 controls the motor 46 to be driven in the opposite direction to slide the holder 14 to the same position. Second stop position. Next, the holder 14 continues to sweep the workpiece 12 while being rotated while stopping at the second stop position.

又,與上述同樣地,在對工件12投射投射材既定時間後,藉由控制部26控制馬達46,使保持具14滑動至第一停止位置。接著,保持具14一邊在停止於第一停止位置之狀態下被自轉、一邊持續工件12之研掃。Further, similarly to the above, after the projecting material is projected onto the workpiece 12 for a predetermined period of time, the control unit 26 controls the motor 46 to slide the holder 14 to the first stop position. Then, while the holder 14 is rotated while stopping at the first stop position, the workpiece 12 is continuously swept.

接著,此噴珠處理裝置10,藉由反覆上述步驟複數次來研掃工件12。此外,上述步驟中,葉輪60係以相同轉數旋轉。又,上述方法為一例,除上述以外,亦能在噴珠處理裝置10所能動作之範圍內進行各種變形。Next, the bead processing apparatus 10 grinds the workpiece 12 by repeating the above steps a plurality of times. Further, in the above steps, the impeller 60 is rotated at the same number of revolutions. Further, the above method is an example, and various modifications can be made within the range in which the bead processing apparatus 10 can operate in addition to the above.

其次,說明本發明之第1實施形態之作用及效果。Next, the action and effect of the first embodiment of the present invention will be described.

如圖2所示,根據本發明之第1實施形態之噴珠處理裝置10,一對離心式投射機22,24,各葉輪60之旋轉軸線A彼此平行,且彼此於葉輪60之旋轉軸線方向偏置配置。接著,藉此,從一對離心式投射機22,24朝向工件12並列投射投射材(參照圖3)。因此,即使在從一對離心式投射機22,24分別投射投射材之情形,亦可抑制來自一方之離心式投射機22之投射材與來自另一方之離心式投射機24之投射材相抵銷,而能使投射效率提升。As shown in Fig. 2, in the bead processing apparatus 10 according to the first embodiment of the present invention, a pair of centrifugal projectors 22, 24, the rotation axes A of the respective impellers 60 are parallel to each other, and are in the direction of the rotation axis of the impeller 60. Offset configuration. Then, the projecting material is projected in parallel from the pair of centrifugal projectors 22 and 24 toward the workpiece 12 (see FIG. 3). Therefore, even when the projection material is projected from the pair of centrifugal projectors 22, 24, it is possible to suppress the projection material from one of the centrifugal projectors 22 from the projection material from the other centrifugal projector 24. Pin, which can improve the efficiency of projection.

又,一對離心式投射機22,24由於分別設於上壁30及側壁32,因此例如即使工件12具有複雜之形狀,亦能加以對應(能對工件12適切地投射投射材)。而且,一對離心式投射機22,24能將投射材往下方投射。因此,在從一對離心式投射機22,24投射投射材之情形,由於能藉由重力之作用使投射材加速,因此能更加使投射效率提升。Further, since the pair of centrifugal projectors 22 and 24 are provided on the upper wall 30 and the side wall 32, for example, even if the workpiece 12 has a complicated shape, it can be matched (the projection material can be appropriately projected to the workpiece 12). Moreover, a pair of centrifugal projectors 22, 24 can project the projecting material downward. Therefore, in the case where the projection material is projected from the pair of centrifugal projectors 22, 24, since the projection material can be accelerated by the action of gravity, the projection efficiency can be further improved.

又,一對離心式投射機22,24如圖3所示,配置成從各葉輪60分別扇狀擴展而投射之投射材在保持具14上之擴展方向W,分別與保持具14之滑動方向Y及自轉軸線方向Z正交。因此,例如相較於上述擴展方向W與滑動方向Y為平行之情形,即使係工件12被滑動之情形,亦能減少投射至從工件12偏離之位置之投射材之數目(能抑制投射材之浪費)。Further, as shown in FIG. 3, the pair of centrifugal projectors 22, 24 are arranged so as to extend in a fan shape from each of the impellers 60, and the projected projection material is projected in the extending direction W of the holder 14 and the sliding direction of the holder 14 respectively. Y and the axis of rotation axis Z are orthogonal. Therefore, for example, in the case where the expansion direction W and the sliding direction Y are parallel, even if the workpiece 12 is slid, the number of projection materials projected to the position deviated from the workpiece 12 can be reduced (the projection material can be suppressed). waste).

再者,一對離心式投射機22,24如圖2所示,配置成在從分別與保持具14之滑動方向Y及自轉軸線方向Z正交之方向X(參照圖3)觀看時,各葉輪60之旋轉面B(與葉輪60之旋轉軸垂直之面)相對保持具14之自轉軸線C傾斜成分別具有θ1及θ2之角度。因此,由於係從相對保持具14之自轉軸線C為傾斜之方向對工件12投射投射材,因此即使工件12具有側面或影子之部分,亦能對此部分投射投射材,且能將投射材投射於工件12之較寬廣範圍。Further, as shown in FIG. 2, the pair of centrifugal projectors 22 and 24 are arranged so as to be viewed in a direction X (see FIG. 3) orthogonal to the sliding direction Y of the holder 14 and the rotation axis direction Z (see FIG. 3). The rotating surface B of the impeller 60 (the surface perpendicular to the rotational axis of the impeller 60) is inclined with respect to the rotation axis C of the holder 14 to have angles of θ1 and θ2, respectively. Therefore, since the projection material is projected onto the workpiece 12 from the direction in which the rotation axis C of the holder 14 is inclined, even if the workpiece 12 has a side or a shadow portion, the projection material can be projected on the portion, and the projection material can be projected. It is a wide range of workpieces 12.

又,由於能在使保持具14停止於滑動方向之複數個停止位置之狀態下對自轉之工件12投射投射材,因此能抑制投射不均。Moreover, since the projection material can be projected to the workpiece 12 that rotates while the holder 14 is stopped at the plurality of stop positions in the sliding direction, projection unevenness can be suppressed.

又,一對離心式投射機22,24由於彼此為相同構成,且各葉輪60亦係以相同轉數旋轉,因此能簡化裝置,而能降低成本。Further, since the pair of centrifugal projectors 22 and 24 have the same configuration and each of the impellers 60 rotates at the same number of revolutions, the apparatus can be simplified and the cost can be reduced.

其次,說明本發明之第1實施形態之變形例。Next, a modification of the first embodiment of the present invention will be described.

上述實施形態中,噴珠處理裝置10雖係作為珠擊(shot blast)裝置使用,但亦能作為噴珠(shot peening)裝置使用。In the above embodiment, the bead processing apparatus 10 is used as a shot blast apparatus, but can also be used as a shot peening apparatus.

又,保持具14雖係被從下方之稱之所謂桌台型,但亦可為從上方吊下之所謂懸掛型。Further, although the holder 14 is a so-called table type which is called from below, it may be a so-called suspension type which is suspended from above.

又,控制部26雖係構成為使保持具14停止於三處停止位置,但只要係複數處,停止位置亦可係三處以外。Further, although the control unit 26 is configured to stop the holder 14 at the three stop positions, the stop position may be three or more as long as it is plural.

其次,說明本發明之第2實施形態。Next, a second embodiment of the present invention will be described.

圖5~圖7所示之本發明之第2實施形態之噴珠處理裝置110,具備滑動驅動部120而取代上述之滑動驅動部20(參照圖1)。The bead processing apparatus 110 according to the second embodiment of the present invention shown in FIG. 5 to FIG. 7 includes a slide driving unit 120 instead of the above-described slide driving unit 20 (see FIG. 1).

滑動驅動部120具有馬達146、托架148、鏈條150、滑件152、以及一對軌154。馬達146固定於箱體16之下壁,於該旋轉軸固定有齒輪156。托架148沿噴珠處理裝置110之前後方向設為水平,固定於滑件152。The slide drive unit 120 has a motor 146, a bracket 148, a chain 150, a slider 152, and a pair of rails 154. The motor 146 is fixed to the lower wall of the casing 16, and a gear 156 is fixed to the rotating shaft. The bracket 148 is horizontally fixed in the front and rear directions of the bead processing apparatus 110, and is fixed to the slider 152.

鏈條150沿此托架148之下部設置,與齒輪156咬合。滑件152係將保持具14支撐成能自轉,可滑動地支撐於一對軌154。一對軌154係排列配置於噴珠處理裝置110之左右方向,且延伸於噴珠處理裝置110之前後方向。The chain 150 is disposed along the lower portion of the bracket 148 and engages with the gear 156. The slider 152 supports the holder 14 to be self-rotating and slidably supported by the pair of rails 154. The pair of rails 154 are arranged in the left-right direction of the bead processing apparatus 110 and extend in the front-rear direction of the bead processing apparatus 110.

又,此滑動驅動部120,在驅動馬達146而使齒輪156旋轉後,滑件152及保持具14係與鏈條150一起滑動。又,保持具14在滑動方向之位置,係藉由未圖示之感測器偵測滑件152之滑動位置而檢測出。此外,自轉驅動部18固定於托架148,保持具14被滑件152支撐成能自轉。Further, in the slide driving unit 120, after the motor 146 is driven to rotate the gear 156, the slider 152 and the holder 14 slide together with the chain 150. Further, the position of the holder 14 in the sliding direction is detected by the sensor (not shown) detecting the sliding position of the slider 152. Further, the rotation driving portion 18 is fixed to the bracket 148, and the holder 14 is supported by the slider 152 to be rotatable.

如上述構成亦能進行與上述本發明之第1實施形態之噴珠處理裝置10(參照圖1~圖4)相同之動作,且能發揮相同之作用及效果。According to the above configuration, the same operations as those of the bead processing apparatus 10 (see FIGS. 1 to 4) of the first embodiment of the present invention can be performed, and the same actions and effects can be exhibited.

以上,雖說明了本發明之一實施形態,但本發明當然不限定於上述,除了上述以外,在不脫離其要旨之範圍內可進行各種變形來實施。The embodiment of the present invention has been described above, but the present invention is not limited to the above, and various modifications can be made without departing from the spirit and scope of the invention.

10,110...噴珠處理裝置10,110. . . Bead processing device

12...工件12. . . Workpiece

14...保持具14. . . Holder

16...箱體16. . . Box

18...自轉驅動部18. . . Rotation drive

20,120...滑動驅動部20,120. . . Sliding drive

22,24...離心式投射機22,24. . . Centrifugal projector

26...控制部26. . . Control department

30...上壁30. . . Upper wall

32...側壁32. . . Side wall

60...葉輪60. . . impeller

A...葉輪之旋轉軸線A. . . Rotation axis of the impeller

B...葉輪之旋轉面(與葉輪之旋轉軸垂直之面)B. . . The rotating surface of the impeller (the plane perpendicular to the axis of rotation of the impeller)

C...保持具之自轉軸線C. . . Rotation axis of the holder

W...投射材在保持具上之擴展方向W. . . Projection material expands on the holder

X...分別與保持具之滑動方向及自轉軸線方向正交之方向X. . . The direction orthogonal to the sliding direction of the holder and the direction of the rotation axis

Y...保持具之滑動方向Y. . . Keep the sliding direction of the tool

Z...保持具之自轉軸線方向Z. . . The axis of rotation of the holder

圖1係本發明之第1實施形態之噴珠處理裝置之前視圖。Fig. 1 is a front view of a bead processing apparatus according to a first embodiment of the present invention.

圖2係圖1所示之噴珠處理裝置之左側視圖。Figure 2 is a left side view of the bead processing apparatus shown in Figure 1.

圖3係說明圖1所示之一對遠心式投射機、箱體、以及保持具之配置關係之立體圖。Fig. 3 is a perspective view showing the arrangement relationship between one of the telecentric projector, the casing, and the holder shown in Fig. 1.

圖4係說明圖1所示之保持具之滑動範圍之俯視圖。Fig. 4 is a plan view showing the sliding range of the holder shown in Fig. 1.

圖5係本發明之第2實施形態之噴珠處理裝置之前視圖。Fig. 5 is a front view showing a bead processing apparatus according to a second embodiment of the present invention.

圖6係圖5所示之噴珠處理裝置之左側視圖。Figure 6 is a left side view of the bead processing apparatus shown in Figure 5.

圖7係說明圖5所示之保持具之滑動範圍之俯視圖。Fig. 7 is a plan view showing the sliding range of the holder shown in Fig. 5.

10...噴珠處理裝置10. . . Bead processing device

12...工件12. . . Workpiece

14...保持具14. . . Holder

16...箱體16. . . Box

18...自轉驅動部18. . . Rotation drive

20...滑動驅動部20. . . Sliding drive

22,24...離心式投射機22,24. . . Centrifugal projector

26...控制部26. . . Control department

28...軸部28. . . Shaft

30...上壁30. . . Upper wall

32,34,36,38...側壁32, 34, 36, 38. . . Side wall

40...馬達40. . . motor

42...滾子42. . . Roller

44...旋轉構件44. . . Rotating member

46...馬達46. . . motor

48...旋轉軸48. . . Rotary axis

50...臂50. . . arm

52...支撐部52. . . Support

54,56...齒輪54,56. . . gear

60...葉輪60. . . impeller

80...螺旋輸送機80. . . Screw conveyor

82...斗式升降機82. . . Bucket lift

84...分離機84. . . Separator

86...斗86. . . Fight

88,90...導入管88,90. . . Inlet tube

Claims (7)

一種噴珠處理裝置,具備:保持具,能自轉且能滑動,於自轉軸線上保持工件;以及一對離心式投射機,分別具有能旋轉之葉輪,各前述葉輪之旋轉軸線彼此平行且彼此於前述葉輪之旋轉軸線方向偏置配置,並能隨著前述各葉輪之旋轉而朝向前述工件並列投射投射材;前述一對離心式投射機配置成在從分別與前述保持具之滑動方向及自轉軸線方向正交之方向觀看時,前述各葉輪之旋轉面相對前述保持具之自轉軸線傾斜既定角度。 A bead processing device comprising: a holder capable of rotating and slidable to hold a workpiece on a rotation axis; and a pair of centrifugal projectors each having a rotatable impeller, wherein the rotation axes of the impellers are parallel to each other and to each other The impeller is arranged offset in the direction of the rotation axis, and can project the projection material in parallel with the workpiece according to the rotation of the impellers; the pair of centrifugal projectors are disposed in a sliding direction and a rotation axis from the holder respectively When viewed in a direction orthogonal to the direction, the rotating surfaces of the impellers are inclined at a predetermined angle with respect to the rotation axis of the holder. 如申請專利範圍第1項之噴珠處理裝置,其具備箱體,該箱體具有相對前述保持具配置於上方之上壁與配置於前述保持具側方之側壁;前述一對離心式投射機中之一方設於前述上壁而能將投射材往下方投射;前述一對離心式投射機中之另一方設於前述側壁而能將投射材往下方投射。 The bead processing apparatus according to claim 1, further comprising a case having a side wall disposed on the upper upper wall and the side of the holder opposite to the holder; the pair of centrifugal projectors One of the pair of centrifugal projectors is disposed on the side wall to project the projecting material downward, and one of the pair of centrifugal projectors is disposed on the side wall. 如申請專利範圍第1或2項之噴珠處理裝置,其中,前述一對離心式投射機配置成從前述各葉輪呈扇狀擴展投射之投射材在前述保持具上之擴展方向,分別與前述保持具之滑動方向及自轉軸線方向正交。 The bead processing apparatus according to claim 1 or 2, wherein the pair of centrifugal projectors are arranged such that the projection material projected from the impellers in a fan shape expands in a direction of the holder, respectively The sliding direction of the holder and the direction of the rotation axis are orthogonal. 如申請專利範圍第1或2項之噴珠處理裝置,其具備:自轉驅動部,使前述保持具自轉; 滑動驅動部,使前述保持具滑動;以及控制部,使前述滑動驅動部驅動而使前述保持具在前述滑動方向之複數個停止位置停止,且使前述保持具停止於前述各停止位置時,使前述自轉驅動部驅動以使前述保持具自轉且使前述一對離心式投射機作動以投射投射材。 The bead processing apparatus according to claim 1 or 2, further comprising: a rotation driving unit that rotates the holder; a sliding drive unit that slides the holder; and a control unit that drives the slide drive unit to stop the holder at a plurality of stop positions in the sliding direction, and causes the holder to stop at each of the stop positions The rotation driving unit is driven to rotate the holder and to operate the pair of centrifugal projectors to project a projection material. 如申請專利範圍第3項之噴珠處理裝置,其具備:自轉驅動部,使前述保持具自轉;滑動驅動部,使前述保持具滑動;以及控制部,使前述滑動驅動部驅動而使前述保持具在前述滑動方向之複數個停止位置停止,且使前述保持具停止於前述各停止位置時,使前述自轉驅動部驅動以使前述保持具自轉且使前述一對離心式投射機作動以投射投射材。 The bead processing apparatus according to claim 3, further comprising: a rotation driving unit that rotates the holder; a sliding driving unit that slides the holder; and a control unit that drives the sliding driving unit to maintain the holding When the plurality of stop positions in the sliding direction are stopped, and the holder is stopped at each of the stop positions, the rotation driving unit is driven to rotate the holder and the pair of centrifugal projectors are actuated to project projection material. 如申請專利範圍第1或2項之噴珠處理裝置,其中,前述一對離心式投射機彼此為相同構成;具備將前述一對離心式投射機控制成前述各葉輪以相同轉數旋轉之控制部。 The bead processing apparatus according to claim 1 or 2, wherein the pair of centrifugal projectors have the same configuration; and the control of controlling the pair of centrifugal projectors to rotate the respective impellers by the same number of revolutions unit. 如申請專利範圍第3項之噴珠處理裝置,其中,前述一對離心式投射機彼此為相同構成;具備將前述一對離心式投射機控制成前述各葉輪以相同轉數旋轉之控制部。 The bead processing apparatus according to claim 3, wherein the pair of centrifugal projectors have the same configuration, and the control unit that controls the pair of centrifugal projectors to rotate the impellers by the same number of revolutions.
TW100123287A 2010-09-30 2011-06-30 Nozzle handling device TWI499484B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010222731 2010-09-30

Publications (2)

Publication Number Publication Date
TW201217100A TW201217100A (en) 2012-05-01
TWI499484B true TWI499484B (en) 2015-09-11

Family

ID=45892471

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100123287A TWI499484B (en) 2010-09-30 2011-06-30 Nozzle handling device

Country Status (5)

Country Link
JP (1) JP5614455B2 (en)
KR (1) KR101631683B1 (en)
CN (1) CN102985224B (en)
TW (1) TWI499484B (en)
WO (1) WO2012042991A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6304957B2 (en) * 2013-07-10 2018-04-04 中央発條株式会社 Shot peening equipment
MX2016017406A (en) * 2014-06-24 2017-04-27 Sintokogio Ltd Shot processing device and projector.
TWI637815B (en) * 2014-07-23 2018-10-11 日商新東工業股份有限公司 Shot blasting device
CN106558205A (en) * 2015-09-28 2017-04-05 三亚中兴软件有限责任公司 Alert processing method and device
CN105215861B (en) * 2015-09-30 2019-01-08 北京国电富通科技发展有限责任公司 A kind of tube surface cleaning plant
CN105666342A (en) * 2016-02-19 2016-06-15 太仓市磁力驱动泵有限公司 Method for polishing and grinding impeller passage by adopting dry method
CN107891375A (en) * 2017-11-30 2018-04-10 宁波鑫神泽汽车零部件有限公司 Auto parts machinery abrasive blast equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4840540B1 (en) * 1970-10-12 1973-12-01
JPH10118935A (en) * 1996-10-25 1998-05-12 Sintokogio Ltd Blast processing method of small lot multi-product and device therefor

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5549164Y2 (en) * 1976-07-28 1980-11-17
JPS57156170A (en) * 1981-03-17 1982-09-27 Sintokogio Ltd Product automatic rotary device for shotblast equipment
CN2076009U (en) * 1989-08-18 1991-05-01 青岛铸造机械厂 Multiple working position rotary table abrator with indexing mechanism
JP2868169B2 (en) * 1992-07-24 1999-03-10 新東工業株式会社 Shot blasting equipment
DE4226680A1 (en) * 1992-08-12 1993-09-30 Manfred Ullrich Mobile centrifugal blasting machine
JP4085353B2 (en) * 2000-06-26 2008-05-14 新東工業株式会社 Centrifugal projector
JP2003305648A (en) * 2002-04-16 2003-10-28 Jfe Steel Kk Surface treatment facility of metal plate and manufacturing method of metal plate
ATE415244T1 (en) * 2005-04-21 2008-12-15 Disa Ind Ag SPRING BLASTING SYSTEM FOR BLASTING WORKPIECES MADE OF LIGHT METAL ALLOYS

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4840540B1 (en) * 1970-10-12 1973-12-01
JPH10118935A (en) * 1996-10-25 1998-05-12 Sintokogio Ltd Blast processing method of small lot multi-product and device therefor

Also Published As

Publication number Publication date
KR101631683B1 (en) 2016-06-20
TW201217100A (en) 2012-05-01
JP5614455B2 (en) 2014-10-29
CN102985224A (en) 2013-03-20
WO2012042991A1 (en) 2012-04-05
JPWO2012042991A1 (en) 2014-02-06
KR20130091254A (en) 2013-08-16
CN102985224B (en) 2015-09-30

Similar Documents

Publication Publication Date Title
TWI499484B (en) Nozzle handling device
TWI597124B (en) Centrifugal drum grinding device and drum grinding method
KR101969206B1 (en) Robot cell
JP2014176902A (en) Shot treatment device
JP5455158B2 (en) Sharpening device
TW201200298A (en) Drum for shot blast apparatus and shot blast apparatus
CN106736585B (en) Cutting driving device before a kind of flaw detection
CN110421473A (en) A kind of surface grinding device
CN205614467U (en) Sand processing apparatus of wear -resisting ball
US20140202491A1 (en) Method and apparatus for cleaning grinding work chuck using a scraper
CN106312773A (en) Deruster
CN208575650U (en) A kind of grinding device and equipment
JP2005036520A (en) Wall-surface shifter
JP6351428B2 (en) Shot blasting equipment
JPS5830113B2 (en) Shotplast equipment
JP5321092B2 (en) Automatic full surface cleaning equipment
CN103990615B (en) Automatic sand blasting dust removal device for injected part
JP6842248B2 (en) Shot blasting device
CN104440410B (en) A kind of iron pan glossing
KR102372944B1 (en) Shot blast equipment for inside of multi-control valve casting
CN211491085U (en) Bearing sand blasting and derusting equipment capable of preventing sand grains from remaining
TWI628044B (en) Work processing equipment
CN115365947B (en) Polishing device for nonferrous metal material processing
US20230256564A1 (en) Workpiece processing apparatus blast gun plate assembly
CN106903577A (en) A kind of square chest numerical control polishing system