TWI496682B - Polarizing materials and their exposure film manufacturing coatings and polarizing film - Google Patents

Polarizing materials and their exposure film manufacturing coatings and polarizing film Download PDF

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TWI496682B
TWI496682B TW100118561A TW100118561A TWI496682B TW I496682 B TWI496682 B TW I496682B TW 100118561 A TW100118561 A TW 100118561A TW 100118561 A TW100118561 A TW 100118561A TW I496682 B TWI496682 B TW I496682B
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coating
polarizing
metal
film
nanowire
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TW100118561A
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TW201204545A (en
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Ryouichi Miyamoto
Akihito Kubo
Hideki Hayashi
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Sekisui Chemical Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/28Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/02Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101Nanooptics

Description

偏光性材料及含其之偏光膜製造用塗料及偏光膜Polarizing material and coating film and polarizing film for polarizing film production therewith

本發明特別係關於一種於偏光板及亮度提升用偏光板之用途有用之偏光性材料及含其之偏光膜製造用塗料及偏光膜。In particular, the present invention relates to a polarizing material useful for use in a polarizing plate and a polarizing plate for brightness enhancement, and a coating material and a polarizing film for producing a polarizing film comprising the same.

當前,於室溫附近使用之偏光元件實際使用有液晶顯示用偏光板及亮度提升用偏光板(亦稱為亮度提升膜)。又,要求耐熱性之偏光元件,使目的在於在光通信所使用之光纖之連接界面去除雜訊而使用之光隔離器用偏光元件實用化。Currently, a polarizing plate for liquid crystal display and a polarizing plate for brightness enhancement (also referred to as a brightness enhancement film) are actually used for a polarizing element used in the vicinity of room temperature. In addition, a polarizing element for an optical isolator which is used for removing a noise at a connection interface of an optical fiber used for optical communication is put into practical use.

上述偏光板係使異向性之色素於膜上配向而獲得,具體而言係藉由使水溶性碘或水溶性染料含浸於吸水性聚乙烯醇(PVA)膜後進行拉伸而製作。The polarizing plate is obtained by aligning an anisotropic pigment on a film, and specifically, by impregnating a water-soluble iodine or a water-soluble dye with a water-absorbing polyvinyl alcohol (PVA) film and then stretching it.

上述亮度提升用偏光板係藉由於拉伸時,將非拉伸方向之折射率相同、拉伸方向之折射率不同之2種聚酯膜交替積層100~200層後進行拉伸而製作。該亮度提升用偏光板具有僅反射並再利用於拉伸方向具有電場(電場振動面)之偏光,而提高光之利用效率之作用。In the polarizing plate for brightness enhancement, two types of polyester films having the same refractive index in the non-stretching direction and different refractive indices in the stretching direction are laminated in an interval of 100 to 200 layers, and then stretched. The brightness-increasing polarizing plate has a function of reflecting and reusing the polarized light having an electric field (electric field vibrating surface) in the stretching direction, thereby improving the utilization efficiency of light.

上述光隔離器用偏光元件,為了焊接等,而要求一時承受260℃左右之耐熱性。使用所謂之積層型偏光元件作為光隔離器用偏光元件。積層型偏光元件係藉由製作於膜厚1μm左右之矽石膜蒸鍍10nm左右之鋁而成之膜,將其積層而製成矽石與鋁之交替多層膜後,較薄地切取而製作。The polarizing element for an optical isolator is required to withstand heat resistance of about 260 ° C for a while for soldering or the like. A so-called laminated type polarizing element is used as a polarizing element for an optical isolator. The laminated polarizing element is formed by depositing a film of about 10 nm of aluminum on a vermiculite film having a thickness of about 1 μm, and laminating it to form an alternating multilayer film of vermiculite and aluminum, and then cutting it thinly.

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於上述先前之偏光元件,存在如下問題。In the above-described prior polarizing element, there are the following problems.

(1)先前之偏光板所使用之碘、染料等色素之耐熱性低。又,存在成為基材之PVA之拉伸膜亦由於濕熱而發生尺寸變化,藉此產生相位差而使偏光度下降之問題。(1) The dyes such as iodine and dye used in the conventional polarizing plate have low heat resistance. Further, there is a problem in that the stretched film of the PVA serving as the base material is dimensionally changed due to moist heat, whereby a phase difference is generated and the degree of polarization is lowered.

(2)先前之亮度提升用偏光板係將上述2種聚酯膜交替貼合100~200層而進行拉伸,因此難以均勻拉伸,生產性差。又,存在非拉伸方向之透光率低之問題。(2) In the conventional polarizing plate for brightness enhancement, the above-mentioned two types of polyester films are stretched by alternately bonding 100 to 200 layers, and thus it is difficult to uniformly stretch and the productivity is poor. Further, there is a problem that the light transmittance in the non-stretching direction is low.

(3)於光隔離器用偏光元件所使用之上述積層型偏光元件亦存在製作所需之作業性與生產性差,操作中易破裂之問題。然而,於由其他材料構成之偏光元件,耐熱性低,因此存在無替代材料之問題。(3) The above-mentioned laminated polarizing element used for the polarizing element for an optical isolator has a problem that workability and productivity required for production are poor, and it is easy to be broken during handling. However, since the polarizing element composed of other materials has low heat resistance, there is a problem that there is no substitute material.

若有代替色素之耐熱性良好之偏光性材料與使其生產性良好地於基材上配向之技術,則可解決該等問題。Such a problem can be solved by a technique in which a polarizing material having good heat resistance in place of a dye and a technique for aligning the substrate with good productivity are provided.

藉此,本發明之主要目的在於提供一種代替色素之耐熱性良好之偏光性材料及含其之偏光膜製造用塗料及偏光膜。Accordingly, a main object of the present invention is to provide a polarizing material which is excellent in heat resistance in place of a dye, a coating material for producing a polarizing film, and a polarizing film.

本發明人為達成上述目的而反覆潛心研究,結果發現特定之金屬鍍敷奈米線(metal plating nanowire)可用作偏光性材料,耐熱性良好,而且可生產性良好地於基材上配向,從而完成本發明。The present inventors have made intensive studies to achieve the above object, and as a result, have found that a specific metal plating nanowire can be used as a polarizing material, has good heat resistance, and can be aligned on a substrate with good productivity. The present invention has been completed.

即,本發明係關於下述偏光性材料、偏光膜製造用塗料及偏光膜。That is, the present invention relates to the following polarizing material, a coating material for producing a polarizing film, and a polarizing film.

1.一種偏光性材料,其係由金屬鍍敷奈米線構成,該金屬鍍敷奈米線係藉由於由平均粗度20~300nm、平均長度0.4μm以上之介電體構成之奈米線的表面形成厚度1~15nm之金屬鍍敷層而獲得。A polarizing material comprising a metal-plated nanowire which is composed of a nanowire composed of a dielectric body having an average thickness of 20 to 300 nm and an average length of 0.4 μm or more. The surface is formed by forming a metal plating layer having a thickness of 1 to 15 nm.

2.如上述第1項之偏光性材料,其中,上述介電體之折射率為1.47~2.2。2. The polarizing material according to item 1 above, wherein the dielectric material has a refractive index of 1.47 to 2.2.

3.如上述第1項之偏光性材料,其中,上述介電體具有核心層及形成於其表面之塗層,上述核心層之折射率為1.47~2.2,上述塗層之折射率,於將上述核心層之折射率設為nc時,為nc±0.4以內。3. The polarizing material according to item 1, wherein the dielectric body has a core layer and a coating layer formed on the surface thereof, and the core layer has a refractive index of 1.47 to 2.2, and the refractive index of the coating layer is When the refractive index of the core layer is nc, it is within nc ± 0.4.

4.如上述第1項之偏光性材料,其中,上述金屬鍍敷層為選自由鎳、鉻、鋅、鉭、鈮、銀、鐵及鋁構成之群中之至少1種的金屬鍍敷層。4. The polarizing material according to the above item 1, wherein the metal plating layer is at least one metal plating layer selected from the group consisting of nickel, chromium, zinc, lanthanum, cerium, silver, iron, and aluminum. .

5.一種偏光膜製造用塗料,含有上述第1項之偏光性材料。A coating material for producing a polarizing film comprising the polarizing material according to the above item 1.

6.如上述第5項之塗料,其中,上述塗料含有樹脂,上述樹脂之折射率,於將上述介電體之折射率設為nd時,為nd±0.4以內。6. The coating according to the above item 5, wherein the coating material contains a resin, and a refractive index of the resin is nd ± 0.4 or less when the refractive index of the dielectric body is nd.

7.一種偏光膜製造用塗料,含有上述第3項之偏光性材料及樹脂,上述樹脂之折射率,於將上述核心層之折射率設為nc時,為nc±0.4以內。A coating material for producing a polarizing film, comprising the polarizing material of the above item 3 and a resin, wherein a refractive index of the resin is nc ± 0.4 or less when the refractive index of the core layer is nc.

8.如上述第5項之塗料,其中,上述塗料包含(甲基)丙烯酸樹脂及交聯劑。8. The coating according to item 5 above, wherein the coating material comprises a (meth)acrylic resin and a crosslinking agent.

9.一種偏光膜,其係藉由於基材膜之表面塗佈上述第5項之塗料後,使其乾燥而獲得。A polarizing film obtained by applying the coating material of the above item 5 to the surface of the substrate film and then drying the coating material.

10.如上述第9項之偏光膜,其中,10. The polarizing film of item 9 above, wherein

上述塗佈係使用塗佈棒之棒式塗佈法來進行:The above coating is carried out by a bar coating method using a coating bar:

(1)上述塗佈係於上述塗佈棒之圓周部與上述基材膜之接觸長度P成為P≧1000×L(L:金屬鍍敷奈米線之平均長度)之條件下進行;(1) The coating is performed under the condition that the contact length P between the circumferential portion of the coating bar and the base film is P≧1000×L (L: the average length of the metal plated nanowire);

(2)上述塗佈棒係至少於上述塗佈棒與上述基材膜接觸之區域均等地設置溝,上述溝之寬度W為50×Φ ≦W≦10000×Φ (Φ :金屬鍍敷奈米線之平均粗度)。(2) The coating bar is provided with a groove at least uniformly in a region where the coating bar is in contact with the substrate film, and the width W of the groove is 50 × Φ ≦ W ≦ 10000 × Φ ( Φ : metal plated nano The average thickness of the line).

11.如上述第9項之偏光膜,係使用為偏光板或亮度提升用偏光板。11. The polarizing film according to item 9 above is used as a polarizing plate or a polarizing plate for brightness enhancement.

以下,首先對金屬奈米線與偏光性之關係加以說明,其次對本發明之偏光性材料(金屬鍍敷奈米線)及偏光膜製造用塗料及偏光膜加以說明。Hereinafter, the relationship between the metal nanowire and the polarizing property will be described first, and then the polarizing material (metal plated nanowire) of the present invention and a coating material for polarizing film production and a polarizing film will be described.

金屬奈米線與偏光性之關係Relationship between metal nanowires and polarization

光可分為於垂直於行進方向之面內,在互成直角之方向振動之2種偏光(於本說明書中稱為p偏光及s偏光)。偏光膜具有透射2種偏光中之一種偏光,而阻斷(吸收或反射)另一種偏光之功能。The light can be divided into two types of polarized light (referred to as p-polarized light and s-polarized light in the present specification) which are vibrated in a direction perpendicular to the traveling direction in a direction perpendicular to the traveling direction. The polarizing film has a function of transmitting one of two kinds of polarized lights and blocking (absorbing or reflecting) another polarized light.

最近,報告有寬度及長度為奈米尺寸之棒狀金屬對光等電磁波顯示出異向性。再者,有時將長度1μm以上之棒狀金屬稱為金屬奈米線,將長度未達1μm之棒狀金屬稱為金屬奈米棒,但以下,於本說明書,將兩者匯總而將長度0.4μm以上之棒狀金屬稱為金屬奈米線。Recently, it has been reported that a rod-shaped metal having a width and a length of nanometer exhibits an anisotropy to electromagnetic waves such as light. Further, a rod-shaped metal having a length of 1 μm or more may be referred to as a metal nanowire, and a rod-shaped metal having a length of less than 1 μm may be referred to as a metal nanorod. However, in the present specification, the two are combined to have a length. A rod-shaped metal of 0.4 μm or more is called a metal nanowire.

以下,列舉以光為電磁波之例加以說明。Hereinafter, an example in which light is an electromagnetic wave will be described.

考慮到金屬奈米線之長度長於光之波長,寬度充分地細於光之波長之情形。若光入射至金屬奈米線,則金屬奈米線之長度方向具有電場振動面之偏光係藉由使金屬奈米線之自由電子振動而吸收或反射。另一方面,已知金屬奈米線之寬度方向具有電場振動面之偏光,因為難以引起金屬奈米線之自由電子與光共振之振動故會透射(準確而言,表示為「前方散射」較正確,但以下簡稱為「透射」)。Considering that the length of the metal nanowire is longer than the wavelength of light, the width is sufficiently thinner than the wavelength of light. When light is incident on the metal nanowire, the polarized light having the electric field vibration surface in the longitudinal direction of the metal nanowire is absorbed or reflected by the free electrons of the metal nanowire. On the other hand, it is known that the width direction of the metal nanowire has a polarization of the electric field vibration surface, and it is difficult to cause the vibration of the free electrons of the metal nanowire to resonate with the light, so that it is transmitted (accurately, it is expressed as "forward scattering". Correct, but hereinafter referred to as "transmission").

金屬吸收或反射光之原因在於,光為電磁波,金屬中之自由電子與光之電場共振而振動,光能轉變為動能。藉此,金屬為吸收或反射光,於與光之行進方向垂直之方向,必須要有金屬中之自由電子會儘可能振動之金屬之寬度。The reason why a metal absorbs or reflects light is that light is an electromagnetic wave, and free electrons in the metal resonate with the electric field of the light to vibrate, and the light energy is converted into kinetic energy. Thereby, the metal absorbs or reflects light, and in the direction perpendicular to the traveling direction of the light, it is necessary to have the width of the metal in which the free electrons in the metal vibrate as much as possible.

於Mie理論及瑞利(Rayleigh)散射理論,認為若金屬之寬度成為10nm左右以下,則自由電子會無法振動,並在不引起光之吸收或反射的情況下透射。又,認為反之若金屬之寬度為光之波長以上,則會良好效率地吸收或反射。藉此,認為於金屬奈米線之情形時,若長度長於光之波長,寬度為10nm左右以下,則成為良好之偏光性材料。According to the Mie theory and the Rayleigh scattering theory, it is considered that if the width of the metal is about 10 nm or less, the free electrons cannot vibrate and transmit without causing absorption or reflection of light. Further, it is considered that if the width of the metal is equal to or higher than the wavelength of light, it is absorbed or reflected efficiently. Therefore, in the case of a metal nanowire, when the length is longer than the wavelength of light and the width is about 10 nm or less, it is a good polarizing material.

其次,一面參照圖1一面對金屬奈米線之長度長於光之波長,寬度為10nm左右之情形時的光之吸收、反射的不同加以說明。再者,將電場振動面與金屬奈米線之長度方向一致的光設為s偏光,將電場振動面與金屬奈米線之寬度方向一致的光設為p偏光。與光之行進方向成直角地排列有四角柱狀之金屬奈米線之情形時的s偏光及p偏光之電場的振動方向,與金屬奈米線之長度方向、寬度方向及厚度方向的關係示於圖1。Next, the difference in absorption and reflection of light when the length of the metal nanowire is longer than the wavelength of light and the width is about 10 nm will be described with reference to FIG. Further, the light in which the electric field vibration surface coincides with the longitudinal direction of the metal nanowire is s-polarized light, and the light in which the electric field vibration surface coincides with the width direction of the metal nanowire is p-polarized light. The relationship between the direction of the s-polarized light and the electric field of the p-polarized light when the metal nanowires are arranged at right angles to the direction of travel of the light, and the relationship between the longitudinal direction, the width direction and the thickness direction of the metal nanowire In Figure 1.

若金屬奈米線之寬度為10nm左右以下,則p偏光不會使金屬奈米線之自由電子振動。藉此,無論金屬奈米線之長度、厚度如何,p偏光均未吸收或反射而透射。When the width of the metal nanowire is about 10 nm or less, the p-polarized light does not vibrate the free electrons of the metal nanowire. Thereby, regardless of the length and thickness of the metal nanowire, the p-polarized light is not absorbed or reflected and transmitted.

若金屬奈米線之長度長於光之波長,則s偏光會使金屬奈米線之自由電子振動。此時,即便寬度為10nm以下,光亦經吸收或反射。再者,光經吸收或反射由金屬奈米線之厚度決定。If the length of the metal nanowire is longer than the wavelength of light, the s-polarized light will cause the free electrons of the metal nanowire to vibrate. At this time, even if the width is 10 nm or less, light is absorbed or reflected. Furthermore, the absorption or reflection of light is determined by the thickness of the metal nanowire.

將入射之光之強度成為自然對數之1/2次方(=約1/7.5)之厚度稱為「表皮深度」,表皮深度為(2/ωμσ)之1/2次方。再者,ω為光之角頻率,μ為金屬之磁導率,σ為金屬之導電率。The thickness of the incident light is 1/2 power (= about 1/7.5) of the natural logarithm, which is called "skin depth", and the skin depth is 1/2 of the (2/ωμσ). Furthermore, ω is the angular frequency of light, μ is the magnetic permeability of metal, and σ is the electrical conductivity of metal.

藉此,於波長500nm之可見光之情形時,ωμ大致固定為4.8×10-9 ,金屬之導電率σ(S/m)為,銀:61×106 、鋁:40×106 、鎳:15×106 、鉭:8×106 ,因此表皮深度分別成為,銀:2.7nm、鋁:3.5nm、鎳:4.1nm、鉭:5.3nm。Thereby, in the case of visible light having a wavelength of 500 nm, ωμ is substantially fixed at 4.8×10 -9 , the conductivity σ (S/m) of the metal is, silver: 61×10 6 , aluminum: 40×10 6 , nickel: 15×10 6 and 钽: 8×10 6 , so the skin depths were respectively: silver: 2.7 nm, aluminum: 3.5 nm, nickel: 4.1 nm, and 钽: 5.3 nm.

即,於使光入射至導電率為8×106 S/m左右以上之導電性良好之金屬之情形時,若厚度為4~5nm左右,則光經吸收。又,若厚度為其2倍以上(10nm以上),則於表面吸收光後,電磁場引起與金屬之下層相反之電流,而產生反射光,因此引起光之反射。即,若金屬奈米線之厚度為5nm左右則經吸收,若厚度為10nm左右則經反射。該情況,於金屬奈米線之形狀由四角柱變為多角柱之情形時亦相同。In other words, when light is incident on a metal having a conductivity of about 8 × 10 6 S/m or more, when the thickness is about 4 to 5 nm, light is absorbed. Further, when the thickness is twice or more (10 nm or more), after the surface absorbs light, the electromagnetic field causes a current opposite to the underlying layer of the metal to generate reflected light, thereby causing reflection of light. That is, when the thickness of the metal nanowire is about 5 nm, it is absorbed, and when the thickness is about 10 nm, it is reflected. In this case, the same is true in the case where the shape of the metal nanowire is changed from a square column to a polygonal column.

若一併考慮金屬之表皮深度,則可知若金屬奈米線之長度為400nm(0.4μm)以上且厚度為5nm以下則p偏光透射,s偏光經吸收。又,可知若長度為400nm(0.4μm)以上且厚度為10nm左右則p偏光透射,s偏光經反射。藉此,若將該尺寸之金屬奈米線進行配向,則可獲得偏光板及亮度提升用偏光板。When the depth of the metal is considered together, it is understood that when the length of the metal nanowire is 400 nm (0.4 μm) or more and the thickness is 5 nm or less, p-polarized light is transmitted, and s-polarized light is absorbed. Further, it is understood that when the length is 400 nm (0.4 μm) or more and the thickness is about 10 nm, p-polarized light is transmitted, and s-polarized light is reflected. Thereby, when the metal nanowire of this size is aligned, a polarizing plate and a polarizing plate for brightness enhancement can be obtained.

然而,為提高偏光性及配向性,而要求金屬奈米線為直線,但寬度為數nm且直線性良好、生產性良好之金屬奈米線之製造方法幾乎仍為未知。又,金屬奈米線之寬度越細,操作中越易彎曲或凝聚,因此生產上亦存在問題。However, in order to improve the polarizing property and the alignment property, the metal nanowire is required to be a straight line, but the manufacturing method of the metal nanowire having a width of several nm and good linearity and good productivity is almost unknown. Further, the finer the width of the metal nanowire, the more easily bent or agglomerated during operation, and thus there are problems in production.

藉此,於本發明中,代替金屬奈米線,使用金屬鍍敷奈米線作為偏光性材料,該金屬鍍敷奈米線係藉由於由平均粗度20~300nm、平均長度0.4μm以上之介電體構成之奈米線之表面形成厚度1~15nm之金屬鍍敷層而獲得。若為該金屬鍍敷奈米線,則平均粗度20~300nm、平均長度0.4μm以上之介電體可生產性良好地製造直線性良好者,因此可生產性良好地製造直線性及配向性良好之金屬鍍敷奈米線。又,藉由形成厚度1~15nm之金屬鍍敷層,可製成使厚度方向之光透射,而吸收長度方向之光的偏光板,或可製成使厚度方向之光透射,而反射(亦包含一部分反射)長度方向之光的亮度提升用偏光板,而可作為偏光性材料使用。進而,可提供一種金屬鍍敷層代替先前之色素(表現偏光性之手段),耐熱性優異之偏光板或亮度提升用偏光板。Therefore, in the present invention, instead of the metal nanowire, a metal-plated nanowire is used as the polarizing material, and the metal-plated nanowire is composed of an average thickness of 20 to 300 nm and an average length of 0.4 μm or more. The surface of the nanowire composed of a dielectric body is formed by forming a metal plating layer having a thickness of 1 to 15 nm. When the metal wire is coated with a nanowire, a dielectric body having an average thickness of 20 to 300 nm and an average length of 0.4 μm or more can be produced with good linearity, and thus linearity and alignment can be produced with good productivity. Good metal plated nanowires. Further, by forming a metal plating layer having a thickness of 1 to 15 nm, a polarizing plate that transmits light in the thickness direction and absorbs light in the longitudinal direction can be formed, or light in the thickness direction can be transmitted and reflected (also A polarizing plate for brightness enhancement including a part of light reflected in the longitudinal direction can be used as a polarizing material. Further, it is possible to provide a polarizing plate or a polarizing plate for brightness enhancement in which a metal plating layer is used in place of the previous coloring matter (a means for exhibiting polarization).

本發明之偏光性材料Polarizing material of the invention

本發明之偏光性材料係藉由於由平均粗度20~300nm、平均長度0.4μm以上之介電體構成之奈米線之表面形成厚度1~15nm之金屬鍍敷層而獲得的金屬鍍敷奈米線。The polarizing material of the present invention is a metal plated layer obtained by forming a metal plating layer having a thickness of 1 to 15 nm on the surface of a nanowire composed of a dielectric body having an average thickness of 20 to 300 nm and an average length of 0.4 μm or more. Rice noodles.

於本發明中,使用由平均粗度20~300nm、平均長度0.4μm以上之介電體所構成之奈米線。再者,「平均」係於電子顯微鏡像中任意選出10根奈米線時之粗度及長度之分別的平均值。In the present invention, a nanowire composed of a dielectric body having an average thickness of 20 to 300 nm and an average length of 0.4 μm or more is used. In addition, "average" is an average value of the thickness and the length of each of the ten nanowires in an electron microscope image.

介電體之平均粗度為20~300nm,較佳為50~200nm。再者,於介電體為圓柱狀或仿圓柱狀之情形時粗度=厚度,但於非此情形時,例如,於多角柱狀或多角柱彎曲之形狀之情形時,亦設為粗度=厚度。再者,較佳為多角柱之一邊之長度充分地短於光之波長。The average thickness of the dielectric body is from 20 to 300 nm, preferably from 50 to 200 nm. Further, in the case where the dielectric body is cylindrical or cylindrical, the thickness is the thickness, but in the case where it is not, for example, in the case of the shape of the polygonal column or the polygonal column, the thickness is also set to the thickness. = thickness. Furthermore, it is preferred that the length of one side of the polygonal column is sufficiently shorter than the wavelength of the light.

介電體之縱橫比雖無限定,但較佳為10以上。於介電體之長度超過20μm之情形時,有介電體之直線性變得易失去之虞。又,於縱橫比未達10之情形時,有偏光性與配向性下降之虞。The aspect ratio of the dielectric body is not limited, but is preferably 10 or more. When the length of the dielectric body exceeds 20 μm, the linearity of the dielectric body becomes easy to be lost. Further, when the aspect ratio is less than 10, there is a problem that the polarizing property and the alignment property are lowered.

由介電體構成之奈米線,係以藉由電紡絲(electrospinning)法獲得之奈米線,合成有(甲基)丙烯酸樹脂之奈米線、矽石之奈米線等。又,以藉由氣相法獲得之奈米線,合成有氧化鋁等之奈米線。又,於Langmuir,2004,20(11),4784~4786頁及Crystal Growth and Design,2006,6(6),1504~1508頁,以藉由水熱法獲得之奈米線,報告有粗度為30~120nm、長度為數μm~50μm之羥磷灰石或氟磷灰石之奈米線(任一者之折射率均為1.64左右)。進而,於Langmuir,2007,23(19),9850~9859頁報告有水鋁礦(boehmite)之奈米線(折射率為1.7左右)之合成法。The nanowire composed of a dielectric material is a nanowire obtained by an electrospinning method, and a nanowire of a (meth)acrylic resin, a nanowire of vermiculite, or the like is synthesized. Further, a nanowire such as alumina is synthesized by a nanowire obtained by a vapor phase method. Also, in Langmuir, 2004, 20(11), 4784~4786 and Crystal Growth and Design, 2006, 6(6), 1504~1508, the thickness of the nanowire obtained by hydrothermal method is reported. The nanowires of hydroxyapatite or fluoroapatite having a length of from 30 to 120 nm and a length of several μm to 50 μm (any of which has a refractive index of about 1.64). Further, a synthesis method of a nanowire of boehmite (having a refractive index of about 1.7) is reported on Langmuir, 2007, 23 (19), pages 9850 to 9859.

此外,由介電體構成之奈米線,亦已知有由矽、鋁等之氧化物或氫氧化物構成之奈米線,或由鎂、鋁、鈣、鋅及鉀中任一種金屬之磷酸鹽、硫酸鹽、硼酸鹽、矽酸鹽或苯基磷酸鹽所構成之奈米線。In addition, a nanowire composed of an oxide or a hydroxide of ruthenium or aluminum, or a metal of any one of magnesium, aluminum, calcium, zinc, and potassium is also known as a nanowire composed of a dielectric. a nanowire composed of phosphate, sulfate, borate, citrate or phenyl phosphate.

於本發明,並不限定於該等介電體,若為介電體之折射率(nd)為1.47~2.2之奈米線,則可較佳地使用。其中,折射率(nd)更佳為1.47~1.8。於本發明,於該等介電體之中,可尤佳地使用聚(甲基)丙烯酸甲酯等(甲基)丙烯酸樹脂、碳酸鈣、氟磷灰石、鈦酸鉀、硫酸鎂等。The present invention is not limited to these dielectric materials, and can be preferably used if the refractive index (nd) of the dielectric material is a nanowire of 1.47 to 2.2. Among them, the refractive index (nd) is more preferably 1.47 to 1.8. In the present invention, among the dielectric materials, a (meth)acrylic resin such as polymethyl (meth) acrylate, calcium carbonate, fluoroapatite, potassium titanate, magnesium sulfate or the like can be preferably used.

於介電體由結晶所構成之情形時,通常具有多角柱狀或多角柱彎曲之形狀。藉此,可視需要,以具有相同程度之折射率之相同或其他之介電體塗佈介電體之表面,製成使表面為曲面之圓柱狀或仿圓柱狀之奈米線而使用。於此情形時,塗佈後之奈米線係為平均粗度20~300nm、平均長度0.4μm以上,較佳為縱橫比成為10以上之方式進行設定。In the case where the dielectric body is composed of crystals, it generally has a polygonal columnar shape or a polygonal column shape. Thereby, the surface of the dielectric body can be applied to the same or other dielectric body having the same degree of refractive index as needed, and a nanowire having a cylindrical or cylindrical shape with a curved surface can be used. In this case, the nanowire after coating is set to have an average thickness of 20 to 300 nm and an average length of 0.4 μm or more, and preferably has an aspect ratio of 10 or more.

具體而言,介電體具有核心層及形成於其表面之塗層,核心層之折射率為1.47~2.2,塗層之折射率較佳為於將核心層之折射率設為nc時,為nc±0.4以內。其中,核心層之折射率(nc)更佳為1.47~1.8,塗層之折射率更佳為nc±0.2以內。Specifically, the dielectric body has a core layer and a coating layer formed on the surface thereof, and the core layer has a refractive index of 1.47 to 2.2, and the refractive index of the coating layer is preferably when the refractive index of the core layer is nc. Within nc ± 0.4. The refractive index (nc) of the core layer is preferably 1.47 to 1.8, and the refractive index of the coating layer is preferably nc ± 0.2 or less.

塗層,可列舉使與核心層相同之化合物於相同之析出反應以不花費結晶化時間之方式縮短時間並使其析出,但並不限定於此。The coating layer is exemplified by the fact that the same compound as the core layer is subjected to the same precipitation reaction to shorten the time and precipitate without crystallization time, but is not limited thereto.

核心層,例如,較佳為(甲基)丙烯酸樹脂、矽樹脂等。又,亦可視需要,於(甲基)丙烯酸樹脂、矽樹脂等添加交聯劑(例如,鈦系交聯劑、鋯系交聯劑)製成核心層。藉由添加交聯劑,可調整核心層之折射率,或提高最終所獲得之偏光性材料之配向性。The core layer is, for example, preferably a (meth)acrylic resin, an anthracene resin or the like. Further, a core layer may be formed by adding a crosslinking agent (for example, a titanium-based crosslinking agent or a zirconium-based crosslinking agent) to a (meth)acrylic resin or a fluorene resin, as needed. By adding a crosslinking agent, the refractive index of the core layer can be adjusted, or the orientation of the finally obtained polarizing material can be improved.

於J. Am. Chem. Soc.,2005年,127(46),16040~16041頁;Crystak Growth and Design,2006年,6(11),2422~2426頁;J. Phys. Chem. B,2006年,110(2),807~811頁等記載有於上述核心層之表面以(甲基)丙烯酸樹脂、矽樹脂等非晶性樹脂形成塗層,而製作表面為由曲面所構成之奈米線。又,於J. Phys. Chem. B,2005年,109(1),151~154頁及J. Phys. Chem. B,2006年,110(2),807~811頁等記載有使用矽石形成塗層。J. Am. Chem. Soc., 2005, 127(46), pp. 16040–16041; Crystak Growth and Design, 2006, 6(11), pages 2422–2426; J. Phys. Chem. B, 2006 In the case of the surface of the core layer, a coating layer is formed of an amorphous resin such as a (meth)acrylic resin or a ruthenium resin, and the surface is made of a curved surface. line. Also, in J. Phys. Chem. B, 2005, 109(1), pp. 151-154 and J. Phys. Chem. B, 2006, 110(2), pp. 807-811, etc. A coating is formed.

於由介電體構成之奈米線之表面形成之金屬鍍敷層較佳為藉由無電電鍍形成。無電電鍍之金屬較佳為:1)於液層中之反應易析出者、2)難以腐蝕者、3)利用於表面形成鈍態層或依據其之保護層而難以腐蝕者。The metal plating layer formed on the surface of the nanowire composed of a dielectric body is preferably formed by electroless plating. The electroless plating metal is preferably: 1) a reaction easily precipitated in a liquid layer, 2) a person who is difficult to corrode, and 3) a surface formed into a passivation layer or which is difficult to corrode according to a protective layer thereof.

於金屬鍍敷層所使用之金屬,較佳為鎳、鉻、鋅、鉭、鈮、銀、鐵及鋁中之至少1種。於上述之中,就確保金屬鍍敷層之無著色性之觀點而言,更佳為鎳、鉻、鋅、鉭、鈮及鋁中之至少1種。尤其是關於鍍鋁,於Chem. Mater. 2006,18,1634報告有藉由於三甲苯中對環戊二烯基鋁(cyclopentadienyl aluminum)進行熱分解而析出,亦可於該反應液中鍍鋁。The metal used for the metal plating layer is preferably at least one of nickel, chromium, zinc, lanthanum, cerium, silver, iron, and aluminum. Among the above, at least one of nickel, chromium, zinc, lanthanum, cerium, and aluminum is more preferable from the viewpoint of ensuring coloring resistance of the metal plating layer. In particular, regarding aluminum plating, it has been reported in Chem. Mater. 2006, 18, 1634 that it is precipitated by thermal decomposition of cyclopentadienyl aluminum in trimethylbenzene, and aluminum may be plated in the reaction liquid.

金屬鍍敷層之厚度只要為1~15nm即可,較佳為1~10nm。於金屬鍍敷層之表面以鈍態被膜被覆之情形時,鈍態被膜之厚度較佳為薄於金屬鍍敷層之厚度。又,金屬鍍敷層與鈍態被膜合併之厚度較佳為金屬鍍敷層之厚度的2倍以下。再者,目的在形成鈍態被膜時,可藉由將金屬鍍敷奈米線於溶劑中加熱或以氧化劑進行表面處理而形成。The thickness of the metal plating layer may be 1 to 15 nm, preferably 1 to 10 nm. When the surface of the metal plating layer is covered with a passive film, the thickness of the passive film is preferably thinner than the thickness of the metal plating layer. Further, the thickness of the metal plating layer and the passivation film is preferably twice or less the thickness of the metal plating layer. Further, in order to form a passivation film, it is possible to form a metal plated nanowire by heating in a solvent or surface treatment with an oxidizing agent.

已知於形成數nm左右之金屬鍍敷層之情形時,若使用與金屬之親和性高者為金屬鍍敷液之溶劑,則於溶劑中金屬凝聚,而難以獲得均勻之金屬鍍敷層。該方面,於J. Phys. Chem. B,2004年,108(28),9745~9751頁;J. Phys. Chem. C,2008年,112(11),4042~4048頁報告有於形成數nm左右之金屬鍍敷層之情形時,較佳為使用配位性低之溶劑或於溶劑之沸點附近進行反應。藉此,較佳為選擇此種溶劑,或以偶合劑對奈米線之表面進行處理而提高與金屬之親和性,再進行金屬鍍敷。When a metal plating layer having a thickness of about several nm is formed, when a solvent having a high affinity with a metal is used as a metal plating solution, the metal is agglomerated in the solvent, and it is difficult to obtain a uniform metal plating layer. This aspect is reported in J. Phys. Chem. B, 2004, 108 (28), pages 9745 to 9751; J. Phys. Chem. C, 2008, 112 (11), 4042 to 4048. In the case of a metal plating layer of about nm, it is preferred to use a solvent having a low coordinating property or to carry out a reaction in the vicinity of the boiling point of the solvent. Therefore, it is preferred to select such a solvent, or to treat the surface of the nanowire with a coupling agent to improve the affinity with the metal, and then perform metal plating.

於本發明,亦可視需要,進而以50nm以下之介電體被膜塗佈金屬鍍敷奈米線之表面。塗佈所使用之介電體較佳為折射率相對於上述nd為±0.4以內,更佳為nd±0.2以內。塗佈材料,例如,可列舉將烷氧基矽烷與烷氧基鋯以酸或鹼進行水解而獲得之烷氧基矽烷與烷氧基鈦之共聚物,或將烷氧基矽烷與烷氧基鋯以酸或鹼進行水解而獲得之烷氧基矽烷與烷氧基鋯之共聚物。如此,於進而以介電體被膜塗佈金屬鍍敷奈米線之表面之情形時,可調整偏光性材料之折射率,並且可進一步提高偏光性材料之配向性。In the present invention, the surface of the metal plated nanowire is coated with a dielectric film of 50 nm or less, as needed. The dielectric used for coating preferably has a refractive index of ±0.4 or less, more preferably nd±0.2 or less with respect to the above nd. The coating material may, for example, be a copolymer of an alkoxy decane and an alkoxide titanium obtained by hydrolyzing an alkoxy decane with an alkoxy zirconium with an acid or a base, or alkoxy decane and an alkoxy group. A copolymer of alkoxy decane and zirconium alkoxide obtained by hydrolysis of zirconium with an acid or a base. As described above, when the surface of the metal plated nanowire is coated with a dielectric film, the refractive index of the polarizing material can be adjusted, and the alignment property of the polarizing material can be further improved.

本發明之偏光性材料,藉由使其於折射率(nr)為nd±0.4以內之樹脂中分散、配向,可用作偏光板、亮度提升用偏光板、光隔離器用偏光元件。折射率(nr),更佳為nd±0.2以內。The polarizing material of the present invention can be used as a polarizing plate, a polarizing plate for brightness enhancement, and a polarizing element for an optical isolator by dispersing and aligning the resin in a resin having a refractive index (nr) of nd ± 0.4 or less. The refractive index (nr) is more preferably within nd ± 0.2.

分散於樹脂中之情形時之偏光性材料之含量,於將樹脂及偏光性材料之合計量設為100重量%時,較佳為10~70重量%左右,更佳為30重量%~50重量%左右。又,於分散於樹脂中後有效率地進行配向時,較佳為於分散後進行單軸拉伸。藉此可獲得偏光膜。When the total amount of the resin and the polarizing material is 100% by weight, the content of the polarizing material in the case of being dispersed in the resin is preferably about 10 to 70% by weight, more preferably 30% by weight to 50% by weight. %about. Further, when the alignment is carried out efficiently after being dispersed in the resin, it is preferred to carry out uniaxial stretching after dispersion. Thereby, a polarizing film can be obtained.

關於本發明之偏光性材料之光學行為,如下所述。The optical behavior of the polarizing material of the present invention is as follows.

若偏光性材料之長度為光之波長以上,則s偏光藉由金屬鍍敷層內之自由電子之振動而經吸收或反射而非透射。若金屬鍍敷層之厚度足以短於光之波長,則p偏光不會引起金屬鍍敷層內之自由電子之運動,金屬表現出與介電體相同之光學行為,入射之光藉由束縛於分子之電子之偶極振動而散射。於此情形時,必須確認散射是否為前方散射(=透射)。又,該光於內部之介電體層亦同樣地散射,因此亦必須確認該散射方向。以下,對散射方向進行驗證。If the length of the polarizing material is longer than the wavelength of light, the s-polarized light is absorbed or reflected rather than transmitted by the vibration of free electrons in the metal plating layer. If the thickness of the metal plating layer is sufficiently shorter than the wavelength of light, the p-polarized light does not cause the movement of free electrons in the metal plating layer, and the metal exhibits the same optical behavior as the dielectric body, and the incident light is bound by The dipole of the electrons of the molecule vibrates and scatters. In this case, it must be confirmed whether the scattering is forward scattering (= transmission). Further, since the light is internally scattered in the dielectric layer, it is necessary to confirm the scattering direction. Hereinafter, the scattering direction is verified.

於由分子中之電子引起之偶極振動,與入射光相同之光發生彈性散射。於均勻層中光直線前進,但於介電常數不同之物質之界面,於界面為充分地大於光之波長之平面時,產生反射光或衰減波(evanescent wave)。其係基於夾持界面且於相當於波長之長度之界面分子群共振而產生偶極振動。The dipole vibration caused by the electrons in the molecule is elastically scattered by the same light as the incident light. The light travels straight in the uniform layer, but at the interface of substances having different dielectric constants, when the interface is sufficiently larger than the plane of the wavelength of light, reflected light or an evanescent wave is generated. This is based on the clamping interface and resonance of the interface molecule group corresponding to the length of the wavelength to generate dipole vibration.

然而,於p偏光之情形時,於金屬鍍敷奈米線之厚度方向無相當於波長之界面之長度,因此不會產生反射光及衰減波。因此,關於p偏光,只要調整透射金屬鍍敷奈米線之光之方向即可。However, in the case of p-polarized light, there is no length corresponding to the interface of the wavelength in the thickness direction of the metal-plated nanowire, and therefore, reflected light and fading waves are not generated. Therefore, regarding the p-polarized light, it is only necessary to adjust the direction of the light transmitted through the metal plated nanowire.

以下,考慮於樹脂中分散、配向本發明之偏光性材料(金屬鍍敷奈米線),且偏光性材料為由介電體層(介電體為1層)與金屬鍍敷層所構成,並藉由圖2來確認散射之方向=波前法線之方向(以s表示單位向量)。Hereinafter, it is considered that the polarizing material (metal plated nanowire) of the present invention is dispersed and aligned in the resin, and the polarizing material is composed of a dielectric layer (one dielectric layer) and a metal plating layer, and The direction of the scattering = the direction of the wavefront normal (the unit vector in s) is confirmed by Fig. 2.

於圖2,光以樹脂層(1)→邊界a→金屬鍍敷層(2)→邊界b→介電體層(3)之順序行進,將樹脂層(1)內之磁場設為H1 ,光之速度設為v1 ,折射率設為n1 ,波前法線之單位向量設為s1 ,金屬鍍敷層(2)內之磁場設為H2 ,光之速度設為v2 ,折射率設為n2 ,波前法線之單位向量設為s2 ,介電體層(3)內之磁場設為H3 ,光之速度設為v3 ,折射率設為n3 ,波前法線之單位向量設為s3 ,時間設為t,邊界a之位置向量設為ra ,邊界b之位置向量設為rb 。此時,於邊界a之樹脂層(1)內之磁場H1 ,金屬鍍敷層(2)內之磁場H2 分別為:In FIG. 2, the light travels in the order of the resin layer (1)→the boundary a→the metal plating layer (2)→the boundary b→the dielectric layer (3), and the magnetic field in the resin layer (1) is set to H 1 . The speed of light is set to v 1 , the refractive index is set to n 1 , the unit vector of the wavefront normal is set to s 1 , the magnetic field in the metal plating layer (2) is set to H 2 , and the speed of light is set to v 2 . The refractive index is set to n 2 , the unit vector of the wavefront normal is set to s 2 , the magnetic field in the dielectric layer (3) is set to H 3 , the speed of light is set to v 3 , and the refractive index is set to n 3 , wavefront The unit vector of the normal is set to s 3 , the time is set to t, the position vector of the boundary a is set to r a , and the position vector of the boundary b is set to r b . In this case, the boundary of a magnetic field within the resin layer (1) H 1, the magnetic field within the metal plating layer (2) cladding H 2 are:

H1 =H01 expiω(t-ra ‧s1 /v1 )及H 1 =H 01 expiω(tr a ‧s 1 /v 1 ) and

H2 =H02 expiω(t-ra ‧s2 /v2 )。H 2 =H 02 expiω(tr a ‧s 2 /v 2 ).

由於邊界a中之磁場成分之切線成分及法線成分為連續,故而Since the tangential component and the normal component of the magnetic field component in the boundary a are continuous,

s1 /v1 =s2 /v2 ,因此成為s1x /v1 =s2x /v2s 1 /v 1 =s 2 /v 2 , so s 1x /v 1 =s 2x /v 2 ,

由v1 n1 =v2 n2 ,s1x /s2x =sinθ1 /sinθ2 From v 1 n 1 =v 2 n 2 ,s 1x /s 2x =sinθ 1 /sinθ 2

成為n1 sinθ1 =n2 sinθ2 ,振幅不變,行進方向與斯奈爾定律(Snell's law)同樣地折射。It becomes n 1 sin θ 1 =n 2 sin θ 2 , the amplitude is constant, and the traveling direction is refracted in the same manner as Snell's law.

於邊界b同樣振幅不變,The same amplitude is constant at boundary b,

成為n3 sinθ3 =n2 sinθ2 =n1 sinθ1It becomes n 3 sin θ 3 = n 2 sin θ 2 = n 1 sin θ 1 .

若n3 =n1 ,則θ31 ,入射於金屬鍍敷奈米線之光,於金屬鍍敷層(2)左右,光之強度與光之行進方向均不變。同樣,以介電體層(3)→金屬鍍敷層(2)→樹脂層(1)之順序出射之光,亦使強度與行進方向均不變。因此,p偏光以保持行進方向之狀態於金屬鍍敷奈米線中透射。其係基於藉由不引起反射而引起前方散射。When n 3 = n 1 , θ 3 = θ 1 , and the light incident on the metal-plated nanowire is about the metal plating layer (2), and the intensity of the light and the traveling direction of the light are not changed. Similarly, the light emitted in the order of the dielectric layer (3) → the metal plating layer (2) → the resin layer (1) also makes the intensity and the traveling direction constant. Therefore, the p-polarized light is transmitted through the metal plated nanowire in a state of maintaining the traveling direction. It is based on causing forward scattering by not causing reflection.

進而,於金屬鍍敷層之表面存在光吸收度低之數nm之鈍態被膜之情形時,認為被膜厚度為固定。若樹脂層與介電體層之折射率相同,則同樣地光之振幅與行進方向不變,p偏光透射。即,s偏光經吸收或反射,p偏光透射。Further, in the case where a passive film having a low light absorbance of several nm is present on the surface of the metal plating layer, the film thickness is considered to be constant. If the refractive index of the resin layer and the dielectric layer are the same, the amplitude of the light and the direction of travel are the same, and the p-polarized light is transmitted. That is, the s-polarized light is absorbed or reflected, and the p-polarized light is transmitted.

再者,為提高偏光度,於圖2中,p偏光之振動方向之寬度w越短越好,根據之前揭示之日本特開2006-201540號公報及NIKKEI MICRODEVICE,2005年12月號,156~157頁等,w較佳為100nm以下。其中,認為若考慮金屬鍍敷層較薄,奈米線之側面朝向所有方向,則奈米線之粗度為200nm以下,w之平均值充分地短於100nm,而達成作為偏光膜所要求之偏光度。In addition, in order to increase the degree of polarization, in FIG. 2, the width w of the vibration direction of the p-polarized light is as short as possible. According to the previously disclosed Japanese Patent Laid-Open Publication No. 2006-201540 and NIKKEI MICRODEVICE, December 2005, 156- On page 157, etc., w is preferably 100 nm or less. Among them, it is considered that if the metal plating layer is thin and the side surface of the nanowire is oriented in all directions, the thickness of the nanowire is 200 nm or less, and the average value of w is sufficiently shorter than 100 nm to achieve the requirement as a polarizing film. Polarization.

偏光膜製造用塗料及偏光膜Polarizing film manufacturing paint and polarizing film

本發明中包含含有上述偏光性材料之偏光膜製造用塗料。偏光膜製造用塗料含有上述偏光性材料,且為用作塗料而含有樹脂黏合劑、溶劑等之中的至少1種。In the present invention, a coating material for producing a polarizing film containing the above polarizing material is included. The coating material for producing a polarizing film contains the above-mentioned polarizing material, and contains at least one of a resin binder, a solvent, and the like as a coating material.

使金屬奈米線生產性良好地配向之方法,於日本特開2008-279434號公報公開有金屬奈米線之配向塗佈法,於本發明較佳為使用該塗佈法塗佈塗料,使偏光性材料於基板上配向。A method of aligning a metal nanowire with good productivity is disclosed in Japanese Laid-Open Patent Publication No. 2008-279434, which is incorporated herein by reference. The polarizing material is aligned on the substrate.

上述塗佈法係藉由塗佈棒塗佈含有偏光性材料之塗料者,為使偏光性材料配向,必須使佈敷中之偏光性材料之布朗運動平穩。此處,偏光性材料越重越長,布朗運動越平穩。In the above coating method, a coating material containing a polarizing material is applied by a coating bar, and in order to align the polarizing material, it is necessary to stabilize the Brownian motion of the polarizing material during the coating. Here, the heavier and longer the polarizing material, the smoother the Brownian motion.

本發明之偏光性材料之大小、比重均小。因此,為有效率地配向,較佳為製成以抑制布朗運動為目的而溶解有增黏用樹脂而成之至少數百mPa‧s以上之黏度的塗料。於此情形時,增黏用樹脂,成為於塗膜乾燥後,於塗膜中包圍偏光性材料之樹脂層。該樹脂層之折射率,為改善p偏光之透射率,如上所述,較佳為與奈米線之折射率nd之差為±0.4以內,更佳為±0.2以內。例如,藉由以(甲基)丙烯酸樹脂或丙烯醯胺樹脂為主成分,視需要併用交聯劑(例如鈦系交聯劑、鋯系交聯劑等),可將樹脂層之折射率調整至1.47~2.2。The size and specific gravity of the polarizing material of the present invention are small. Therefore, in order to efficiently align, it is preferable to produce a coating material having a viscosity of at least several hundred mPa·s or more which is obtained by dissolving a tackifying resin for the purpose of suppressing Brownian motion. In this case, the tackifying resin surrounds the resin layer of the polarizing material in the coating film after the coating film is dried. The refractive index of the resin layer is such that, in order to improve the transmittance of p-polarized light, as described above, the difference from the refractive index nd of the nanowire is preferably within ±0.4, more preferably within ±0.2. For example, the refractive index of the resin layer can be adjusted by using a (meth)acrylic resin or a acrylamide resin as a main component, and if necessary, a crosslinking agent (for example, a titanium-based crosslinking agent or a zirconium-based crosslinking agent) can be used in combination. To 1.47 to 2.2.

適宜為,於沸點150℃以下之溶劑添加(甲基)丙烯酸樹脂或丙烯醯胺樹脂,視需要添加交聯劑(例如鈦系交聯劑、鋯系交聯劑等)成為黏度300mPa‧s以上之樹脂溶液,使偏光性材料分散於其中而製成塗料。It is preferable to add a (meth)acrylic resin or a acrylamide resin to a solvent having a boiling point of 150 ° C or less, and if necessary, a crosslinking agent (for example, a titanium-based crosslinking agent or a zirconium-based crosslinking agent) is added to have a viscosity of 300 mPa·s or more. The resin solution is obtained by dispersing a polarizing material therein to prepare a coating material.

並且,以使用塗佈棒之棒式塗佈法將上述塗料塗佈於基材膜上時,Further, when the coating material is applied onto the substrate film by a bar coating method using a coating bar,

(1)上述塗佈係於上述塗佈棒之圓周部與上述基材膜之接觸長度P成為P≧1000×L(L:金屬鍍敷奈米線之平均長度)之條件下的塗佈;(1) The coating is applied under the condition that the contact length P between the circumferential portion of the coating bar and the base film is P≧1000×L (L: the average length of the metal plated nanowire);

(2)較佳為上述塗佈棒至少於上述塗佈棒與上述基材膜接觸之區域中勻等地設置溝,上述溝之寬度W為50×Φ ≦W≦10000×Φ (Φ :金屬鍍敷奈米線之平均粗度)。(2) Preferably, the coating bar is uniformly provided with a groove at least in a region where the coating bar is in contact with the substrate film, and the width W of the groove is 50 × Φ ≦ W ≦ 10000 × Φ ( Φ : metal Average thickness of plated nanowires).

溝之寬度W必須有充分地寬於金屬鍍敷奈米線之平均粗度,但若溝之寬度過寬,或接觸長度P較短,則配向性會變得不充分。The width W of the groove must be sufficiently wider than the average thickness of the metal-coated nanowire. However, if the width of the groove is too wide or the contact length P is short, the alignment property may be insufficient.

於本發明中,設置有溝之塗敷棒,使用將具有固定直徑之線緊密地捲繞於塗敷棒之表面而成者(所謂之「線棒」),或於塗敷棒本身之表面以固定間距設置具有固定寬度、深度之溝(所謂之「Meyer棒」)。再者,關於線棒,鄰接之線之間隙成為溝。In the present invention, a coating rod provided with a groove is formed by closely winding a wire having a fixed diameter on the surface of the coating bar (so-called "wire bar"), or on the surface of the coating bar itself. A groove having a fixed width and a depth (so-called "Meyer rod") is provided at a fixed pitch. Further, regarding the wire rod, the gap between the adjacent lines becomes a groove.

上述溝係以溝之寬度W成為50×Φ ≦W≦10000×Φ (Φ :金屬鍍敷奈米線之平均粗度)之方式進行設定。若50×Φ >W,則金屬鍍敷奈米線之平均粗度Φ ×50變得大於溝之寬度W,金屬鍍敷奈米線之短軸無法進入溝,因此無法配向。又,若W>10000×Φ ,則金屬鍍敷奈米線之短軸變得難以配向。若溝之寬度W滿足上述條件,則於各溝中使金屬鍍敷奈米線引起剪力流(shear flow),金屬鍍敷奈米線於塗佈方向配向。關於溝之深度,若大於金屬鍍敷奈米線之平均粗度Φ ,則無特別限定。The groove is set such that the width W of the groove becomes 50 × Φ ≦ W ≦ 10000 × Φ ( Φ : average roughness of the metal plated nanowire). If 50 × Φ > W, the average thickness Φ × 50 of the metal-plated nanowire becomes larger than the width W of the groove, and the short axis of the metal-plated nanowire cannot enter the groove, and thus cannot be aligned. Further, when W>10000× Φ , the short axis of the metal-plated nanowire becomes difficult to align. When the width W of the groove satisfies the above conditions, the metal-plated nanowires cause a shear flow in each of the grooves, and the metal-plated nanowires are aligned in the coating direction. The depth of the groove is not particularly limited as long as it is larger than the average thickness Φ of the metal-plated nanowire.

於本發明中,塗佈棒之圓周部與基材膜之接觸長度P係以滿足P≧1000×L(L:金屬鍍敷奈米線之平均長度)之條件之方式進行設定。若接觸長度P不滿足上述條件,則未充分地引起剪力流,而難以使金屬鍍敷奈米線以配向率80%以上進行配向。In the present invention, the contact length P between the circumferential portion of the coating bar and the substrate film is set so as to satisfy the condition of P ≧ 1000 × L (L: the average length of the metal plated nanowire). If the contact length P does not satisfy the above conditions, the shear flow is not sufficiently caused, and it is difficult to align the metal-plated nanowire with an alignment ratio of 80% or more.

上述接觸長度P係以藉由根據所使用之塗佈棒之直徑R調整夾角θ,而滿足上述條件之方式進行設定。即,只要以滿足πR×θ/360≧150×L之方式進行各種調整即可。The contact length P is set so as to satisfy the above condition by adjusting the angle θ according to the diameter R of the coating bar to be used. In other words, various adjustments may be performed so as to satisfy πR × θ / 360 ≧ 150 × L.

塗佈棒之直徑R較佳為15~200mm。若將塗佈棒之直徑設為細於15mm,則因基材之彎曲彈性之影響,塗佈棒與基材膜之密合易變得不良。又,若為200mm以上,則塗佈棒變重,塗佈機之馬達負載增加,因此欠佳。The diameter R of the coating bar is preferably from 15 to 200 mm. When the diameter of the coating bar is made thinner than 15 mm, the adhesion between the coating bar and the base film tends to be poor due to the influence of the bending elasticity of the substrate. Moreover, when it is 200 mm or more, the coating bar becomes heavy, and the motor load of a coater increases, and it is unpreferable.

關於夾角θ,若滿足πR×θ/360≧150×L,則無特別限定,只要配合塗佈裝置等而適宜決定即可。The angle θ is not particularly limited as long as it satisfies π R × θ / 360 ≧ 150 × L, and may be appropriately determined by blending a coating device or the like.

乾燥塗膜之厚度並無限定,但為發揮所欲的偏光特性,較佳為0.1μm~10μm左右。The thickness of the dried coating film is not limited, but it is preferably about 0.1 μm to 10 μm in order to exhibit desired polarizing characteristics.

配向後之偏光性材料(金屬鍍敷奈米線)較佳為鄰接之偏光性材料彼此之間隙成為未達光之波長。The aligned polarizing material (metal plated nanowire) is preferably such that the gap between adjacent polarizing materials becomes a wavelength at which light is not reached.

又,塗料所使用之溶劑,較佳為沸點低於150℃者,較佳為脂肪族醇、脂肪族醚、脂肪族酮、脂肪酸酯、脂肪族鹵化物、芳香族醇、芳香族醚、芳香族酮、芳香族酯、芳香族鹵化物等中,沸點為150℃以下者。Further, the solvent used in the coating material is preferably a boiling point of less than 150 ° C, preferably an aliphatic alcohol, an aliphatic ether, an aliphatic ketone, a fatty acid ester, an aliphatic halide, an aromatic alcohol, an aromatic ether, Among aromatic ketones, aromatic esters, aromatic halides and the like, the boiling point is 150 ° C or lower.

塗佈塗料之基材膜,只要為可發揮本發明之偏光性材料之偏光特性者,則無特別限定,例如,可列舉:玻璃或樹脂製之膜。又,為提高配向性,可於塗佈後,將膜拉伸2倍以下。The base film of the coating material is not particularly limited as long as it exhibits the polarizing characteristics of the polarizing material of the present invention, and examples thereof include a film made of glass or resin. Further, in order to improve the alignment property, the film may be stretched by 2 times or less after coating.

成為基材之膜,較佳為可見光透射性高,且耐水、耐熱性之膜,較佳為聚對苯二甲酸乙二酯等聚酯膜、未皂化之醋酸纖維素等纖維素酯膜、環狀聚烯烴樹脂(polyolefin resin)膜、聚碳酸酯樹脂膜、聚碸樹脂膜、聚醚碸樹脂膜等。The film to be a substrate is preferably a film having high visible light transmittance and water resistance and heat resistance, and is preferably a polyester film such as polyethylene terephthalate or a cellulose ester film such as unsaponified cellulose acetate. A polyolefin resin film, a polycarbonate resin film, a polyfluorene resin film, a polyether oxime resin film, or the like.

進而,為消除水分或氧對偏光性材料之影響,或防止膜之捲曲,而可於塗佈塗料使偏光性材料配向後,使用樹脂系黏著劑貼合聚酯膜、纖維素酯膜、環狀聚烯烴樹脂膜、聚碳酸酯樹脂膜、聚碸樹脂膜、聚醚碸樹脂膜等膜而進行保護。又,為貼於液晶單元上,將無機氧化物等之無機層與有機聚合物層積層於該膜,而製成不透氣(gas barrier)性之膜。Further, in order to eliminate the influence of moisture or oxygen on the polarizing material, or to prevent curling of the film, the coating material may be used to align the polarizing material, and then the polyester film, the cellulose ester film, and the ring may be bonded together using a resin-based adhesive. The film is protected by a film such as a polyolefin resin film, a polycarbonate resin film, a polyfluorene resin film, or a polyether oxime resin film. Further, in order to adhere to the liquid crystal cell, an inorganic layer such as an inorganic oxide and an organic polymer are laminated on the film to form a gas barrier film.

若為本發明之金屬鍍敷奈米線,則平均粗度20~300nm、平均長度0.4μm以上之介電體可生產性良好地製造直線性良好者,因此可生產性良好地製造直線性及配向性良好之金屬鍍敷奈米線。又,藉由形成厚度1~15nm之金屬鍍敷層,可製成使厚度方向的光透射,而吸收長度方向的光之偏光板,或使厚度方向的光透射,而反射(亦包含一部分反射)長度方向的光之亮度提升用偏光板,而可用作偏光性材料。進而,可提供一種金屬鍍敷層代替先前之色素(表現偏光性之手段),耐熱性優異之偏光板或亮度提升用偏光板。In the case of the metal-plated nanowire of the present invention, a dielectric body having an average thickness of 20 to 300 nm and an average length of 0.4 μm or more can be produced with good linearity, and the linearity can be produced with good productivity. Metal-coated nanowires with good alignment. Further, by forming a metal plating layer having a thickness of 1 to 15 nm, it is possible to form a polarizing plate that transmits light in the thickness direction and absorbs light in the longitudinal direction, or transmits light in the thickness direction, and reflects (including a part of the reflection). The brightness of the light in the longitudinal direction is raised by a polarizing plate, and can be used as a polarizing material. Further, it is possible to provide a polarizing plate or a polarizing plate for brightness enhancement in which a metal plating layer is used in place of the previous coloring matter (a means for exhibiting polarization).

以下表示實施例及比較例來具體地說明本發明。然而,本發明並不限定於實施例。The present invention will be specifically described below by way of examples and comparative examples. However, the invention is not limited to the embodiments.

實施例1Example 1

使於平均粗度100nm、平均長度2μm之圓柱狀之聚甲基丙烯酸甲酯(PMMA)之奈米線的表面形成有金屬鍍敷層之金屬鍍敷奈米線於丙烯酸系樹脂(折射率1.49)之塗膜中分散、配向(參照圖3)。再者,PMMA奈米線之折射率為1.49。使塗膜乾燥而製成偏光膜。以下,簡記為「塗膜」。A metal-plated nanowire of a metal plating layer was formed on the surface of a columnar polymethyl methacrylate (PMMA) nanowire having an average thickness of 100 nm and an average length of 2 μm on an acrylic resin (refractive index 1.49). The coating film is dispersed and aligned (see Fig. 3). Furthermore, the refractive index of the PMMA nanowire is 1.49. The coating film was dried to prepare a polarizing film. Hereinafter, it is abbreviated as "coating film".

以市售之有限差分時域法(Finite-difference time-domain method)軟體計算塗膜之偏光性能的結果示於表1。The results of calculating the polarizing performance of the coating film by a commercially available finite difference time-domain method software are shown in Table 1.

(其中,關於鍍鎳奈米線,於塗膜中鍍鎳奈米線大量重疊之情形時之計算,計算量龐大,因此如圖3所示,將平均粗度100nm之奈米線,於200nm厚度之塗膜上以平均間距200nm平行地配向者設為1層,以有限差分時域法求出1層之透射率,進而使用Lambert-Beer之方法求出2.6μm=13層之透射率)。(Where, regarding the nickel-plated nanowire, when the nickel-plated nanowires in the coating film are largely overlapped, the calculation amount is large, so as shown in Fig. 3, the nanowire with an average thickness of 100 nm is at 200 nm. The coating film having a thickness of 200 nm in parallel is set to be one layer in parallel, and the transmittance of one layer is obtained by a finite difference time domain method, and the transmittance of 2.6 μm = 13 layers is obtained by a Lambert-Beer method) .

表1中之偏光度係將p偏光之透射率設為Tx ,將s偏光之透射率設為Ty ,使用由該等計算之單體透射率T,平行透射率Tp 及正交透射率Tc 而算出。具體而言如以下所示,關於其他實施例及比較例亦相同。The degree of polarization in Table 1 is such that the transmittance of p-polarized light is set to T x , and the transmittance of s-polarized light is set to T y , and the transmittance of the monomer T calculated by the above, parallel transmittance T p and orthogonal transmission are used. Calculated by the rate T c . Specifically, the following is the same as the other examples and comparative examples.

‧單體透射率T(%)=(Tx +Ty )/2‧Single transmittance T(%)=(T x +T y )/2

‧平行透射率Tp (%)=(Tx 2 +Ty 2 )/2‧Parallel transmittance T p (%)=(T x 2 +T y 2 )/2

‧正交透射率Tc (%)=Tx ‧Ty ‧Orthogonal transmittance T c (%)=T x ‧T y

‧偏光度(%)= ‧Polarization (%)=

由表1之結果,將金屬鍍敷層設為鎳(厚度3.5nm)時之塗膜之偏光板的性能,將金屬鍍敷層設為鋁(厚度13nm)時之塗膜之亮度提升偏光板的性能均良好。As a result of Table 1, the performance of the polarizing plate of the coating film when the metal plating layer was made of nickel (thickness: 3.5 nm) and the brightness of the coating film when the metal plating layer was made of aluminum (thickness: 13 nm) were used to raise the polarizing plate. The performance is good.

實施例2~4及比較例1~2Examples 2 to 4 and Comparative Examples 1 to 2

使於平均粗度100nm、平均長度20μm之圓柱狀之氟磷灰石(折射率1.635)之奈米線的表面形成有鉻電鍍層作為金屬鍍敷層之金屬鍍敷奈米線於丙烯酸系樹脂之塗膜(折射率1.49,厚度0.2μm)中分散、配向。於每個實施例及比較例變更鉻電鍍層之厚度。使用SIGMA KOKI公司製造之偏光分析裝置(特訂物品)評價塗膜之偏光性能之結果示於表2。The surface of the nanowire having a columnar fluoroapatite (refractive index of 1.635) having an average thickness of 100 nm and an average length of 20 μm is formed with a chromium plating layer as a metal plating layer of a metal-plated nanowire on an acrylic resin. The coating film (refractive index 1.49, thickness 0.2 μm) was dispersed and aligned. The thickness of the chrome plating layer was changed for each of the examples and the comparative examples. The results of evaluating the polarizing performance of the coating film using a polarizing analyzer (special article) manufactured by SIGMA KOKI Co., Ltd. are shown in Table 2.

於鉻電鍍層較薄之情形(比較例1)時,s偏光之反射率低,未獲得充分之偏光分離。又,於鉻電鍍層較厚之情形(比較例2)時,s偏光之反射率高且透射率變低而充分獲得偏光分離,但p偏光之透射率下降而為偏光元件之損失變大,故而欠佳。藉此,較佳為將金屬鍍敷層之厚度設定為2~15nm。In the case where the chromium plating layer was thin (Comparative Example 1), the reflectance of the s-polarized light was low, and sufficient polarization separation was not obtained. Further, when the chromium plating layer is thick (Comparative Example 2), the reflectance of the s-polarized light is high and the transmittance is low, and polarization separation is sufficiently obtained, but the transmittance of the p-polarized light is lowered to cause a large loss of the polarizing element. It is not good. Therefore, it is preferable to set the thickness of the metal plating layer to 2 to 15 nm.

實施例5~6及比較例3~4Examples 5 to 6 and Comparative Examples 3 to 4

使於改變平均粗度之平均長度20μm之圓柱狀的PMMA(折射率1.49)之奈米線形成有7.5μm厚之鋁電鍍層而成之金屬鍍敷奈米線於丙烯酸系樹脂之塗膜(折射率1.49)中分散、配向。使用上述偏光分析裝置評價塗膜之偏光性能之結果示於表3。基本上將塗膜之厚度設為0.2μm,於奈米線之平均粗度為200nm之情形時設為0.3μm,於300nm之情形時設為0.35μm。A cylindrical PMMA (refractive index 1.49) nanowire having an average length of 20 μm was formed to form a metal-plated nanowire having a 7.5 μm-thick aluminum plating layer on a coating film of an acrylic resin ( Dispersion and alignment in a refractive index of 1.49). The results of evaluating the polarizing performance of the coating film using the above polarizing analyzer were shown in Table 3. The thickness of the coating film was basically 0.2 μm, 0.3 μm in the case where the average thickness of the nanowire was 200 nm, and 0.35 μm in the case of 300 nm.

於奈米線之平均粗度細之情形(比較例3)時,未充分獲得偏光分離。於平均粗度寬之情形(比較例4)時,s偏光之反射率大而獲得偏光分離,於粗度為300nm時亦發揮偏光功能。其中,於比較例4某種程度上亦發現s偏光之透射率,故而更佳之奈米線之粗度為100~200nm。In the case where the average thickness of the nanowire was fine (Comparative Example 3), polarization separation was not sufficiently obtained. In the case where the average thickness is wide (Comparative Example 4), the reflectance of the s-polarized light is large, and polarization separation is obtained, and the polarizing function is also exhibited when the thickness is 300 nm. Among them, in Comparative Example 4, the transmittance of s-polarized light was also found to some extent, and thus the thickness of the preferred nanowire was 100 to 200 nm.

實施例7~8及比較例5Examples 7-8 and Comparative Example 5

使於平均粗度100nm,改變平均長度之圓柱狀之氟磷灰石(折射率1.635)之奈米線之表面形成有10nm厚之鉻電鍍層而成的金屬鍍敷奈米線於丙烯酸系樹脂之塗膜(折射率1.49,厚度0.2μm)中分散、配向。使用上述偏光分析裝置評價塗膜之偏光性能之結果示於表4。A metal-plated nanowire formed of a 10 nm-thick chromium plating layer on the surface of a nanowire having a mean thickness of 100 nm and an average length of columnar fluoroapatite (refractive index: 1.635) is formed on an acrylic resin. The coating film (refractive index 1.49, thickness 0.2 μm) was dispersed and aligned. The results of evaluating the polarizing properties of the coating film using the above polarizing analyzer were shown in Table 4.

於奈米線之平均長度短之情形(比較例5)時,s偏光之透射率高於反射率,而未充分獲得偏光分離。若奈米線之平均長度為2μm以上,則發揮偏光分離功能。其中,就奈米線之操作容易度而言,較佳為20μm以下。In the case where the average length of the nanowire is short (Comparative Example 5), the transmittance of the s-polarized light is higher than the reflectance, and the polarization separation is not sufficiently obtained. When the average length of the nanowire is 2 μm or more, the polarization separation function is exhibited. Among them, the ease of handling of the nanowire is preferably 20 μm or less.

實施例9~11及比較例6Examples 9 to 11 and Comparative Example 6

使於平均粗度100nm、平均長度20μm之圓柱狀之奈米線形成有7.5μm厚之鋁電鍍層而成的金屬鍍敷奈米線於樹脂塗膜中分散、配向。使用上述偏光分析裝置評價塗膜之偏光性能之結果示於表5。各實施例及比較例為改變折射率差者,組合(奈米線/樹脂)如下所示。A metal-plated nanowire in which a columnar nanowire having an average thickness of 100 nm and an average length of 20 μm was formed into an aluminum plating layer having a thickness of 7.5 μm was dispersed and aligned in the resin coating film. The results of evaluating the polarizing properties of the coating film using the above polarizing analyzer were shown in Table 5. In each of the examples and the comparative examples, the difference in refractive index was changed, and the combination (nanowire/resin) was as follows.

‧實施例9:硫酸鎂(折射率1.53)/丙烯酸系(折射率1.49)‧Example 9: Magnesium sulfate (refractive index 1.53) / acrylic (refractive index 1.49)

‧實施例10:鈦酸鉀(折射率2.2)/環硫(episulfide)系(折射率1.8)‧Example 10: Potassium titanate (refractive index 2.2) / episulfide (refractive index 1.8)

‧實施例9:於鈦酸鉀(折射率2.2)塗佈10nm厚之環硫系(折射率1.8)/硫胺甲酸乙酯(thiourethane)系(折射率1.65)‧Example 9: Coating a 10 nm thick ring-sulfur system (refractive index 1.8) / thiourethane system (refractive index 1.65) in potassium titanate (refractive index 2.2)

‧比較例6:鈦酸鉀(折射率2.2)/丙烯酸系(折射率1.49)‧Comparative Example 6: Potassium titanate (refractive index 2.2) / acrylic (refractive index 1.49)

如實施例所示,即便奈米線與塗膜之折射率差稍微大一些,亦充分發揮偏光分離功能,但如比較例所示,若折射率差過大,則s偏光之透射率增加,製成亮度提升偏光板時之性能下降。As shown in the examples, even if the refractive index difference between the nanowire and the coating film is slightly larger, the polarization separation function is sufficiently exhibited. However, as shown in the comparative example, if the refractive index difference is too large, the transmittance of the s-polarized light increases. When the brightness is increased, the performance of the polarizing plate is lowered.

圖1係表示與光之行進方向成直角地排列有四角柱狀之金屬奈米線之情形時的s偏光及p偏光之電場的振動方向,與金屬奈米線之長度方向、寬度方向及厚度方向之關係圖。具體而言,係表示s偏光經吸收或反射,p偏光透射,而成為偏光性材料之圖。Fig. 1 is a view showing the vibration directions of the electric fields of the s-polarized light and the p-polarized light when the metal nanowires of the quadrangular prism shape are arranged at right angles to the direction of travel of the light, and the longitudinal direction, the width direction and the thickness of the metal nanowires. Diagram of direction. Specifically, it means that s-polarized light is absorbed or reflected, and p-polarized light is transmitted to form a polarizing material.

圖2係表示通過樹脂層(1)→金屬鍍敷層(2)→介電體層(3)之p偏光之行進方向與其電場的圖。係說明p偏光之電場於與紙面平行、與行進方向成直角之方向振動,於該電場金屬鍍敷層內之自由電子於w之方向運動,w越短p偏光之透射性越良好的圖。Fig. 2 is a view showing the traveling direction of p-polarized light and the electric field thereof through the resin layer (1) → metal plating layer (2) → dielectric layer (3). The electric field of the p-polarized light is vibrated in a direction parallel to the plane of the paper and at a right angle to the traveling direction, and the free electrons in the metal plating layer in the electric field move in the direction of w, and the shorter the w, the better the transmittance of the p-polarized light.

圖3係表示用以藉由有限差分時域法模擬本發明之偏光膜(一例)之偏光性的模型圖。Fig. 3 is a model diagram for simulating the polarization of the polarizing film (an example) of the present invention by the finite difference time domain method.

Claims (10)

一種偏光性材料,其係由金屬鍍敷奈米線構成,該金屬鍍敷奈米線係藉由於由平均粗度20~300nm、平均長度0.4μm以上之介電體構成之奈米線的表面形成厚度1~15nm之金屬鍍敷層而獲得,該金屬鍍敷層由選自由鎳、鉻、鋅、鉭、鈮、銀、鐵及鋁構成之群中之至少1種的金屬構成。 A polarizing material consisting of a metal-plated nanowire by a surface of a nanowire composed of a dielectric body having an average thickness of 20 to 300 nm and an average length of 0.4 μm or more. It is obtained by forming a metal plating layer having a thickness of 1 to 15 nm, and the metal plating layer is made of a metal selected from the group consisting of nickel, chromium, zinc, lanthanum, cerium, silver, iron, and aluminum. 如申請專利範圍第1項之偏光性材料,其中,該介電體之折射率為1.47~2.2。 The polarizing material of claim 1, wherein the dielectric has a refractive index of 1.47 to 2.2. 如申請專利範圍第1項之偏光性材料,其中,該介電體具有核心層及形成於其表面之塗層,該核心層之折射率為1.47~2.2,該塗層之折射率,於將該核心層之折射率設為nc時,為nc±0.4以內。 The polarizing material of claim 1, wherein the dielectric body has a core layer and a coating layer formed on the surface thereof, and the core layer has a refractive index of 1.47 to 2.2, and the refractive index of the coating layer is When the refractive index of the core layer is nc, it is within nc ± 0.4. 一種偏光膜製造用塗料,含有申請專利範圍第1項之偏光性材料。 A coating material for producing a polarizing film, comprising the polarizing material of claim 1 of the patent application. 如申請專利範圍第4項之塗料,其中,該塗料含有樹脂,該樹脂之折射率,於將該介電體之折射率設為nd時,為nd±0.4以內。 The coating material according to claim 4, wherein the coating material contains a resin, and the refractive index of the resin is within nd ± 0.4 when the refractive index of the dielectric body is nd. 如申請專利範圍第4項之塗料,其中,該塗料包含(甲基)丙烯酸樹脂及交聯劑。 The coating of claim 4, wherein the coating comprises a (meth)acrylic resin and a crosslinking agent. 一種偏光膜製造用塗料,含有申請專利範圍第3項之偏光性材料及樹脂,該樹脂之折射率,於將該核心層之折射率設為nc時,為nc±0.4以內。 A coating material for producing a polarizing film, comprising the polarizing material of claim 3 and a resin, wherein the refractive index of the resin is within nc ± 0.4 when the refractive index of the core layer is nc. 一種偏光膜,其係藉由於基材膜之表面塗佈申請專利 範圍第4項之塗料後,使其乾燥而獲得。 A polarizing film which is patented by surface coating of a substrate film After the coating of the fourth item is dried, it is obtained. 如申請專利範圍第8項之偏光膜,其中,該塗佈係使用塗佈棒之棒式塗佈法來進行:(1)該塗佈係於該塗佈棒之圓周部與該基材膜之接觸長度P成為P≧1000×L(L:金屬鍍敷奈米線之平均長度)之條件下進行;(2)該塗佈棒係至少於該塗佈棒與該基材膜接觸之區域均等地設置溝,該溝之寬度W為50×≦W≦10000×(:金屬鍍敷奈米線之平均粗度)。The polarizing film of claim 8, wherein the coating is performed by a bar coating method using a coating bar: (1) the coating is applied to a circumferential portion of the coating bar and the substrate film The contact length P is performed under the condition of P≧1000×L (L: the average length of the metal plated nanowire); (2) the coating bar is at least in the region where the coating bar is in contact with the substrate film Equally set the groove, the width W of the groove is 50× ≦W≦10000× ( : Average thickness of metal plated nanowires). 如申請專利範圍第8項之偏光膜,係使用為偏光板或亮度提升用偏光板。For example, the polarizing film of claim 8 is used as a polarizing plate or a polarizing plate for brightness enhancement.
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