TWI492972B - Thermal conductive sheet - Google Patents

Thermal conductive sheet Download PDF

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TWI492972B
TWI492972B TW100103573A TW100103573A TWI492972B TW I492972 B TWI492972 B TW I492972B TW 100103573 A TW100103573 A TW 100103573A TW 100103573 A TW100103573 A TW 100103573A TW I492972 B TWI492972 B TW I492972B
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conductive sheet
thermally conductive
boron nitride
nitride particles
sheet
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TW100103573A
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TW201132691A (en
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Seiji Izutani
Hisae Uchiyama
Takahiro Fukuoka
Kazutaka Hara
Hitotsugu Hirano
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Nitto Denko Corp
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
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    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K5/00Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
    • C09K5/08Materials not undergoing a change of physical state when used
    • C09K5/14Solid materials, e.g. powdery or granular
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/38Boron-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/16Solid spheres
    • C08K7/18Solid spheres inorganic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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Description

熱傳導性片材Thermally conductive sheet

本發明係關於一種熱傳導性片材,詳細而言係關於可用於電力電子技術之熱傳導性片材。The present invention relates to a thermally conductive sheet, and more particularly to a thermally conductive sheet that can be used in power electronics.

近年來,於混成裝置、高亮度LED(light emitting diode,發光二極體)裝置、電磁感應加熱裝置等中,採用藉由半導體元件轉換‧控制電力之電力電子技術。於電力電子技術中,為了將大電流轉換成熱等,而要求半導體元件附近所配置之材料具有高散熱性(高熱傳導性)。In recent years, in a hybrid device, a high-brightness LED (light emitting diode) device, an electromagnetic induction heating device, and the like, a power electronic technology that converts and controls electric power by a semiconductor element is used. In power electronics technology, in order to convert a large current into heat or the like, a material disposed in the vicinity of a semiconductor element is required to have high heat dissipation (high thermal conductivity).

例如提出含有板狀氮化硼粉末及丙烯酸酯共聚合樹脂之熱傳導片材(例如參照日本專利特開2008-280496號公報)。For example, a heat conductive sheet containing a plate-like boron nitride powder and an acrylate copolymer resin is proposed (for example, see JP-A-2008-280496).

於日本專利特開2008-280496號公報之熱傳導片材中,氮化硼粉末係以其長軸方向(氮化硼粉末之與板厚正交之方向)沿著片材之厚度方向之方式配向,由此使熱傳導性片材之厚度方向的熱傳導性提高。In the heat conduction sheet of Japanese Laid-Open Patent Publication No. 2008-280496, the boron nitride powder is aligned in the longitudinal direction of the boron nitride powder (the direction perpendicular to the thickness of the boron nitride powder) along the thickness direction of the sheet. Thereby, the thermal conductivity of the thermally conductive sheet in the thickness direction is improved.

然而,熱傳導性片材有根據用途及目的而要求與厚度方向正交之正交方向(面方向)的高熱傳導性之情況。此時,日本專利特開2008-280496號公報之熱傳導片材中,氮化硼粉末之長軸方向相對於面方向而正交(交叉),因此存在該面方向之熱傳導性不充分之問題。However, the thermally conductive sheet may have high thermal conductivity in the orthogonal direction (surface direction) orthogonal to the thickness direction depending on the application and purpose. In the heat conduction sheet of Japanese Laid-Open Patent Publication No. 2008-280496, the long axis direction of the boron nitride powder is orthogonal (intersected) with respect to the plane direction, and thus the thermal conductivity in the surface direction is insufficient.

又,熱傳導性片材就操作性之觀點而言亦要求優異之柔軟性。Moreover, the heat conductive sheet also requires excellent flexibility from the viewpoint of workability.

本發明之目的在於提供一種柔軟性及面方向之熱傳導性優異之熱傳導性片材。An object of the present invention is to provide a thermally conductive sheet which is excellent in flexibility and surface thermal conductivity.

本發明之熱傳導性片材之特徵在於:其係含有板狀氮化硼粒子者,且氮化硼粒子之含有比例為35體積%以上,上述熱傳導性片材之相對於厚度方向之正交方向的熱導率為4 W/m‧K以上。The thermally conductive sheet of the present invention is characterized in that it contains plate-like boron nitride particles, and the content ratio of the boron nitride particles is 35 vol% or more, and the thermal conductive sheet has an orthogonal direction with respect to the thickness direction. The thermal conductivity is above 4 W/m‧K.

又,於本發明之熱傳導性片材中,較佳為上述氮化硼粒子藉由光散射法測定之平均粒徑為20 μm以上。Further, in the thermally conductive sheet of the present invention, it is preferred that the boron nitride particles have an average particle diameter of 20 μm or more as measured by a light scattering method.

又,於本發明之熱傳導性片材中,較佳為於依據JIS K 5600-5-1之圓筒形心軸法之耐彎曲性試驗中,藉由下述試驗條件進行評價時,未於上述熱傳導性片材上觀察到斷裂。Further, in the heat conductive sheet of the present invention, it is preferable that the bending resistance test according to the cylindrical mandrel method according to JIS K 5600-5-1 is evaluated by the following test conditions. A fracture was observed on the above thermally conductive sheet.

試驗條件Test conditions

試驗裝置:型號ITest device: Model I

心軸:直徑10 mmMandrel: 10 mm in diameter

彎曲角度:90度以上Bending angle: 90 degrees or more

上述熱傳導性片材之厚度:0.3 mmThickness of the above thermally conductive sheet: 0.3 mm

又,較佳為本發明之熱傳導性片材進而含有樹脂成分,於樹脂成分中,依據JIS K 7233(泡黏度計法)之動黏度試驗(溫度:25℃±0.5℃、溶劑:丁基卡必醇、固體成分濃度:40質量%)而測定的動黏度為0.22×10-4 ~2.00×10-4 m2 /s。Moreover, it is preferable that the heat conductive sheet of the present invention further contains a resin component, and the dynamic viscosity test according to JIS K 7233 (bubble viscosity meter method) in the resin component (temperature: 25 ° C ± 0.5 ° C, solvent: butyl card) The dynamic viscosity measured by the concentration of the alcohol and the solid content: 40% by mass was 0.22 × 10 -4 to 2.00 × 10 -4 m 2 /s.

於本發明之熱傳導性片材中,柔軟性及與厚度方向正交之面方向的熱傳導性優異。In the heat conductive sheet of the present invention, the flexibility and the thermal conductivity in the plane direction orthogonal to the thickness direction are excellent.

因此,作為操作性優異、並且面方向之熱傳導性優異之熱傳導性片材,可用於各種散熱用途。Therefore, the thermally conductive sheet which is excellent in workability and excellent in thermal conductivity in the surface direction can be used for various heat dissipation applications.

本發明之熱傳導性片材含有氮化硼粒子。The thermally conductive sheet of the present invention contains boron nitride particles.

具體而言,熱傳導性片材含有氮化硼(BN)粒子作為必須成分,進而例如含有樹脂成分。Specifically, the thermally conductive sheet contains boron nitride (BN) particles as an essential component, and further contains, for example, a resin component.

氮化硼粒子形成為板狀(或鱗片狀),於熱傳導性片材中以朝特定方向(後述)配向之形態分散。The boron nitride particles are formed into a plate shape (or a scaly shape) and are dispersed in a direction in which a thermally conductive sheet is aligned in a specific direction (described later).

氮化硼粒子之長邊方向長度(相對於板之厚度方向之正交方向的最大長度)之平均例如為1~100 μm、較佳為3~90 μm。又,氮化硼粒子之長邊方向長度之平均宜為5 μm以上、較佳為10 μm以上、尤佳為20 μm以上、特佳為30 μm以上、最佳為40 μm以上,通常例如為100 μm以下、較佳為90 μm以下。The average length of the boron nitride particles in the longitudinal direction (the maximum length in the direction orthogonal to the thickness direction of the sheet) is, for example, 1 to 100 μm, preferably 3 to 90 μm. Further, the average length of the boron nitride particles in the longitudinal direction is preferably 5 μm or more, preferably 10 μm or more, particularly preferably 20 μm or more, particularly preferably 30 μm or more, and most preferably 40 μm or more, and is usually, for example, 100 μm or less, preferably 90 μm or less.

又,氮化硼粒子之厚度(板之厚度方向長度、即粒子之短邊方向長度)之平均例如為0.01~20 μm、較佳為0.1~15 μm。Further, the average thickness of the boron nitride particles (the length in the thickness direction of the sheet, that is, the length in the short side direction of the particles) is, for example, 0.01 to 20 μm, preferably 0.1 to 15 μm.

又,氮化硼粒子之縱橫比(長邊方向長度/厚度)例如為2~10000、較佳為10~5000。Further, the aspect ratio (length in the longitudinal direction/thickness) of the boron nitride particles is, for example, 2 to 10,000, preferably 10 to 5,000.

並且,氮化硼粒子之藉由光散射法測定之平均粒徑例如為5 μm以上、較佳為10 μm以上、尤佳為20 μm以上、特佳為30 μm以上、最佳為40 μm以上,通常為100 μm以下。Further, the average particle diameter of the boron nitride particles measured by a light scattering method is, for example, 5 μm or more, preferably 10 μm or more, particularly preferably 20 μm or more, particularly preferably 30 μm or more, and most preferably 40 μm or more. , usually less than 100 μm.

再者,藉由光散射法測定之平均粒徑係藉由動態光散射式粒度分佈測定裝置測定之體積平均粒徑。Further, the average particle diameter measured by the light scattering method is a volume average particle diameter measured by a dynamic light scattering type particle size distribution measuring apparatus.

若氮化硼粒子之藉由光散射法測定之平均粒徑不滿足上述範圍,則有熱傳導性片材變脆,操作性降低之情形。When the average particle diameter of the boron nitride particles measured by the light scattering method does not satisfy the above range, the thermally conductive sheet becomes brittle and the workability is lowered.

又,氮化硼粒子之體密度(JIS K 5101、視密度)例如為0.3~1.5 g/cm3 、較佳為0.5~1.0 g/cm3Further, the bulk density (JIS K 5101, apparent density) of the boron nitride particles is, for example, 0.3 to 1.5 g/cm 3 , preferably 0.5 to 1.0 g/cm 3 .

又,氮化硼粒子可使用市售品或將其進行加工之加工品。作為氮化硼粒子之市售品,例如可列舉:日本邁圖高新材料(Momentive Performance Materials Japan)公司製造之「PT」系列(例如「PT-110」等)、昭和電工公司製造之「SHOBN UHP」系列(例如「SHOBN UHP-1」等)等。Further, as the boron nitride particles, commercially available products or processed products obtained by processing them can be used. For example, "PT" series (for example, "PT-110") manufactured by Momentive Performance Materials Japan Co., Ltd., and "SHOBN UHP" manufactured by Showa Denko Co., Ltd., may be mentioned as a commercial product of the boron nitride particles. Series (for example, "SHOBN UHP-1", etc.).

樹脂成分係可分散氮化硼粒子者、即分散氮化硼粒子之分散介質(基質),例如可列舉熱硬化性樹脂成分、熱塑性樹脂成分等樹脂成分。The resin component is a dispersion medium (matrix) in which boron nitride particles are dispersed, that is, a dispersion of boron nitride particles, and examples thereof include a resin component such as a thermosetting resin component and a thermoplastic resin component.

作為熱硬化性樹脂成分,例如可列舉:環氧樹脂、熱硬化性聚醯亞胺、酚樹脂、脲樹脂、三聚氰胺樹脂、不飽和聚酯樹脂、鄰苯二甲酸二烯丙酯樹脂、聚矽氧樹脂、熱硬化性胺酯樹脂等。Examples of the thermosetting resin component include an epoxy resin, a thermosetting polyimide, a phenol resin, a urea resin, a melamine resin, an unsaturated polyester resin, a diallyl phthalate resin, and a polyfluorene. Oxygen resin, thermosetting amine ester resin, and the like.

作為熱塑性樹脂成分,例如可列舉:聚烯烴(例如聚乙烯、聚丙烯、乙烯-丙烯共聚物等)、丙烯酸系樹脂(例如聚甲基丙烯酸甲酯等)、聚乙酸乙烯酯、乙烯-乙酸乙烯酯共聚物、聚氯乙烯、聚苯乙烯、聚丙烯腈、聚醯胺(尼龍(註冊商標))、聚碳酸酯、聚縮醛、聚對苯二甲酸乙二酯、聚苯醚、聚苯硫醚、聚碸、聚醚碸、聚醚醚酮、聚烯丙基碸、熱塑性聚醯亞胺、熱塑性胺酯樹脂、聚胺基雙馬來醯亞胺、聚醯胺醯亞胺、聚醚醯亞胺、雙馬來醯亞胺三樹脂、聚甲基戊烯、氟樹脂、液晶聚合物、烯烴-乙烯醇共聚物、離聚物、聚芳酯、丙烯腈-乙烯-苯乙烯共聚物、丙烯腈-丁二烯-苯乙烯共聚物、丙烯腈-苯乙烯共聚物等。Examples of the thermoplastic resin component include polyolefin (for example, polyethylene, polypropylene, ethylene-propylene copolymer, etc.), acrylic resin (for example, polymethyl methacrylate), polyvinyl acetate, and ethylene-vinyl acetate. Ester copolymer, polyvinyl chloride, polystyrene, polyacrylonitrile, polyamidamine (nylon (registered trademark)), polycarbonate, polyacetal, polyethylene terephthalate, polyphenylene ether, polyphenylene Thioether, polyfluorene, polyether oxime, polyetheretherketone, polyallyl fluorene, thermoplastic polyimine, thermoplastic amine ester resin, polyamine-based bismaleimide, polyamidoximine, poly Ether quinone imine, bismaleimide Resin, polymethylpentene, fluororesin, liquid crystal polymer, olefin-vinyl alcohol copolymer, ionomer, polyarylate, acrylonitrile-ethylene-styrene copolymer, acrylonitrile-butadiene-styrene copolymer , acrylonitrile-styrene copolymer, and the like.

該等樹脂成分可單獨使用或併用2種以上。These resin components may be used alone or in combination of two or more.

樹脂成分中,作為熱硬化性樹脂成分,較佳為可列舉環氧樹脂,作為熱塑性樹脂成分,較佳為可列舉聚烯烴。Among the resin components, an epoxy resin is preferable as the thermosetting resin component, and a polyolefin is preferable as the thermoplastic resin component.

環氧樹脂於常溫下為液態、半固態及固態之任一種形態。The epoxy resin is in any form of liquid, semi-solid and solid at normal temperature.

具體而言,作為環氧樹脂,可列舉:例如雙酚型環氧樹脂(例如雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、氫化雙酚A型環氧樹脂、二聚酸改性雙酚型環氧樹脂等)、酚醛清漆型環氧樹脂(例如苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、聯苯型環氧樹脂等)、萘型環氧樹脂、茀型環氧樹脂(例如雙芳基茀型環氧樹脂等)、三苯基甲烷型環氧樹脂(例如三羥基苯基甲烷型環氧樹脂等)等芳香族系環氧樹脂,例如三環氧丙基異氰尿酸酯(三縮水甘油基異氰尿酸酯)、乙內醯脲環氧樹脂等含氮環環氧樹脂,例如脂肪族系環氧樹脂、脂環式環氧樹脂(例如二環環型環氧樹脂等)、縮水甘油醚型環氧樹脂、縮水甘油胺型環氧樹脂等。Specifically, examples of the epoxy resin include bisphenol type epoxy resins (for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, and hydrogenated bisphenol A type). Epoxy resin, dimer acid modified bisphenol type epoxy resin, etc.), novolak type epoxy resin (for example, phenol novolak type epoxy resin, cresol novolak type epoxy resin, biphenyl type epoxy resin, etc.) ), naphthalene type epoxy resin, fluorene type epoxy resin (for example, bisaryl fluorene type epoxy resin), triphenylmethane type epoxy resin (for example, trishydroxyphenylmethane type epoxy resin, etc.) Epoxy resin, such as triepoxypropyl isocyanurate (triglycidyl isocyanurate), beta-ureganil epoxy resin and other nitrogen-containing epoxy resin, such as aliphatic epoxy resin An alicyclic epoxy resin (for example, a bicyclic ring type epoxy resin), a glycidyl ether type epoxy resin, a glycidylamine type epoxy resin, or the like.

該等環氧樹脂可單獨使用或併用2種以上。These epoxy resins may be used alone or in combination of two or more.

較佳為可列舉單獨使用半固態環氧樹脂,更佳為可列舉單獨使用半固態芳香族系環氧樹脂。作為此種環氧樹脂,更具體而言,可列舉半固態茀型環氧樹脂。It is preferable to use a semi-solid epoxy resin alone, and it is more preferable to use a semi-solid aromatic epoxy resin alone. More specifically, such an epoxy resin is a semi-solid bismuth type epoxy resin.

又,較佳為可列舉液態環氧樹脂及固態環氧樹脂之組合,更佳為可列舉液態芳香族系環氧樹脂及芳香族系固態環氧樹脂之組合。作為此種組合,可列舉液態雙酚型環氧樹脂及固態三苯基甲烷型環氧樹脂之組合、液態雙酚型環氧樹脂及固態雙酚型環氧樹脂之組合。Further, a combination of a liquid epoxy resin and a solid epoxy resin is preferable, and a combination of a liquid aromatic epoxy resin and an aromatic solid epoxy resin is more preferable. As such a combination, a combination of a liquid bisphenol type epoxy resin and a solid triphenylmethane type epoxy resin, a combination of a liquid bisphenol type epoxy resin and a solid bisphenol type epoxy resin can be cited.

若為半固態環氧樹脂、或液態環氧樹脂及固態環氧樹脂之組合,則可提高熱傳導性片材之階差追隨性(後述)。In the case of a semi-solid epoxy resin or a combination of a liquid epoxy resin and a solid epoxy resin, the step followability (described later) of the thermally conductive sheet can be improved.

又,環氧樹脂之環氧當量例如為100~1000 g/eqiv.、較佳為180~700 g/eqiv.,軟化溫度(環球法)例如為80℃以下(具體為20~80℃)、較佳為70℃以下(具體為35~70℃)。Further, the epoxy equivalent of the epoxy resin is, for example, 100 to 1000 g/eqiv., preferably 180 to 700 g/eqiv., and the softening temperature (ring and ball method) is, for example, 80 ° C or less (specifically 20 to 80 ° C), It is preferably 70 ° C or less (specifically, 35 to 70 ° C).

又,環氧樹脂於80℃之熔融黏度例如為10~20000 mPa‧s、較佳為50~10000 mPa‧s。於併用2種以上環氧樹脂時,將作為該等之混合物的熔融黏度設定為上述範圍內。Further, the epoxy resin has a melt viscosity at 80 ° C of, for example, 10 to 20,000 mPa·s, preferably 50 to 10,000 mPa·s. When two or more types of epoxy resins are used in combination, the melt viscosity of the mixture is set to the above range.

又,於併用2種以上環氧樹脂時,例如可併用常溫下為固態之環氧樹脂、與常溫下為液態之環氧樹脂。又,於併用2種以上環氧樹脂時,可併用軟化溫度例如為未達45℃、較佳為35℃以下之第1環氧樹脂、及軟化溫度例如為45℃以上、較佳為55℃以上之第2環氧樹脂。藉此可將樹脂成分(混合物)之動黏度(依據JIS K 7233、後述)設定為所需範圍。Further, when two or more kinds of epoxy resins are used in combination, for example, an epoxy resin which is solid at normal temperature and an epoxy resin which is liquid at normal temperature can be used in combination. Further, when two or more kinds of epoxy resins are used in combination, the softening temperature may be, for example, a first epoxy resin of not more than 45 ° C, preferably 35 ° C or less, and a softening temperature of, for example, 45 ° C or higher, preferably 55 ° C. The second epoxy resin above. Thereby, the dynamic viscosity (according to JIS K 7233, later described) of the resin component (mixture) can be set to a desired range.

又,環氧樹脂中例如可含有硬化劑及硬化促進劑而製備為環氧樹脂組合物。Further, the epoxy resin may contain, for example, a curing agent and a curing accelerator to prepare an epoxy resin composition.

硬化劑係藉由加熱可使環氧樹脂硬化之潛伏性硬化劑(環氧樹脂硬化劑),例如可列舉:咪唑化合物、胺化合物、酸酐化合物、醯胺化合物、醯肼化合物、咪唑啉化合物等。又,除了上述外,亦可列舉酚化合物、脲化合物、聚硫化合物等。The curing agent is a latent curing agent (epoxy resin curing agent) which can cure the epoxy resin by heating, and examples thereof include an imidazole compound, an amine compound, an acid anhydride compound, a guanamine compound, an anthraquinone compound, an imidazoline compound, and the like. . Further, in addition to the above, a phenol compound, a urea compound, a polysulfide compound, or the like may be mentioned.

作為咪唑化合物,例如可列舉:2-苯基咪唑、2-甲基咪唑、2-乙基-4-甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑等。Examples of the imidazole compound include 2-phenylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, and 2-phenyl-4-methyl-5-hydroxymethylimidazole.

作為胺化合物,可列舉:例如乙二胺、丙二胺、二乙三胺、三乙四胺等聚胺、或該等胺加合物等,例如間苯二胺、二胺基二苯基甲烷、二胺基二苯基碸等。The amine compound may, for example, be a polyamine such as ethylenediamine, propylenediamine, diethylenetriamine or triethylenetetramine, or an amine adduct or the like, such as m-phenylenediamine or diaminodiphenyl. Methane, diaminodiphenyl hydrazine, and the like.

作為酸酐化合物,例如可列舉:鄰苯二甲酸酐、馬來酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、4-甲基-六氫鄰苯二甲酸酐、甲基耐地酸酐、均苯四甲酸二酐、十二碳烯基琥珀酸酐、二氯琥珀酸酐、二苯甲酮四甲酸二酐、氯菌酸酐等。Examples of the acid anhydride compound include phthalic anhydride, maleic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 4-methyl-hexahydrophthalic anhydride, and methylation resistance. Anic anhydride, pyromellitic dianhydride, dodecenyl succinic anhydride, dichlorosuccinic anhydride, benzophenone tetracarboxylic dianhydride, chloric anhydride, and the like.

作為醯胺化合物,例如可列舉:二氰基二醯胺、聚醯胺等。Examples of the guanamine compound include dicyanodiamine, polyamine, and the like.

作為醯肼化合物,例如可列舉:己二酸二醯肼等。Examples of the ruthenium compound include diammonium adipate and the like.

作為咪唑啉化合物,例如可列舉:甲基咪唑啉、2-乙基-4-甲基咪唑啉、乙基咪唑啉、異丙基咪唑啉、2,4-二甲基咪唑啉、苯基咪唑啉、十一烷基咪唑啉、十七烷基咪唑啉、2-苯基-4-甲基咪唑啉等。Examples of the imidazoline compound include methyl imidazoline, 2-ethyl-4-methylimidazoline, ethyl imidazoline, isopropyl imidazoline, 2,4-dimethylimidazoline, and phenylimidazole. Porphyrin, undecyl imidazoline, heptadecyl imidazoline, 2-phenyl-4-methylimidazoline and the like.

該等硬化劑可單獨使用或併用2種以上。These hardeners may be used alone or in combination of two or more.

作為硬化劑,較佳為可列舉咪唑化合物。As the curing agent, an imidazole compound is preferred.

作為硬化促進劑,可列舉:例如三乙二胺、三-2,4,6-二甲基胺基甲基苯酚等三級胺化合物,例如三苯基膦、四苯基鏻四苯基硼酸鹽、四正丁基鏻-o,o-二乙基二硫代磷酸鹽等磷化合物,例如四級銨鹽化合物,例如有機金屬鹽化合物,例如該等之衍生物等。該等硬化促進劑可單獨使用或併用2種以上。Examples of the curing accelerator include tertiary amine compounds such as triethylenediamine and tris-2,4,6-dimethylaminomethylphenol, such as triphenylphosphine and tetraphenylphosphonium tetraphenylborate. A phosphorus compound such as a salt or tetra-n-butylphosphonium-o,o-diethyldithiophosphate, such as a quaternary ammonium salt compound, for example, an organic metal salt compound, such as such a derivative. These hardening accelerators may be used alone or in combination of two or more.

環氧樹脂組合物中硬化劑之調配比例係相對於環氧樹脂100質量份,例如為0.5~50質量份、較佳為1~10質量份,硬化促進劑之調配比例例如為0.1~10質量份、較佳為0.2~5質量份。The blending ratio of the curing agent in the epoxy resin composition is, for example, 0.5 to 50 parts by mass, preferably 1 to 10 parts by mass, based on 100 parts by mass of the epoxy resin, and the blending ratio of the hardening accelerator is, for example, 0.1 to 10 parts by mass. The portion is preferably 0.2 to 5 parts by mass.

上述硬化劑及/或硬化促進劑視需要可藉由溶劑製備為溶解及/或分散之溶劑溶液及/或溶劑分散液而使用。The curing agent and/or the curing accelerator may be used as a solvent solution and/or a solvent dispersion which is dissolved and/or dispersed by a solvent, if necessary.

作為溶劑,可列舉:例如丙酮、甲基乙基酮等酮,例如乙酸乙酯等酯,例如N,N-二甲基甲醯胺等醯胺等有機溶劑等。又,作為溶劑,亦可列舉:例如水,例如甲醇、乙醇、丙醇、異丙醇等醇等水系溶劑。作為溶劑,較佳為可列舉有機溶劑,更佳為可列舉酮。The solvent may, for example, be a ketone such as acetone or methyl ethyl ketone, or an ester such as ethyl acetate, or an organic solvent such as decylamine such as N,N-dimethylformamide or the like. Further, examples of the solvent include water, for example, an aqueous solvent such as an alcohol such as methanol, ethanol, propanol or isopropanol. The solvent is preferably an organic solvent, and more preferably a ketone.

作為聚烯烴,較佳為可列舉聚乙烯、乙烯-丙烯共聚物。The polyolefin is preferably a polyethylene or an ethylene-propylene copolymer.

作為聚乙烯,例如可列舉低密度聚乙烯、高密度聚乙烯等。Examples of the polyethylene include low density polyethylene and high density polyethylene.

作為乙烯-丙烯共聚物,例如可列舉:乙烯及丙烯之無規共聚物、嵌段共聚物或接枝共聚物等。Examples of the ethylene-propylene copolymer include a random copolymer of ethylene and propylene, a block copolymer, and a graft copolymer.

該等聚烯烴可單獨使用或併用2種以上。These polyolefins may be used alone or in combination of two or more.

又,聚烯烴之重量平均分子量及/或數量平均分子量例如為1000~10000。Further, the weight average molecular weight and/or the number average molecular weight of the polyolefin is, for example, 1,000 to 10,000.

又,聚烯烴可單獨使用或併用複數種。Further, the polyolefin may be used singly or in combination of plural kinds.

樹脂成分中,較佳為可列舉熱硬化性樹脂成分,更佳為可列舉環氧樹脂。Among the resin components, a thermosetting resin component is preferable, and an epoxy resin is more preferable.

又,樹脂成分之藉由依據JIS K 7233(泡黏度計法)之動黏度試驗(溫度:25℃±0.5℃、溶劑:丁基卡必醇、樹脂成分(固體成分)濃度:40質量%)測定的動黏度例如為0.22×10-4 ~2.00×10-4 m2 /s、較佳為0.3×10-4 ~1.9×10-4 m2 /s、更佳為0.4×10-4 ~1.8×10-4 m2 /s。又,亦可將上述動黏度設定為例如0.22×10-4 ~1.00×10-4 m2 /s、較佳為0.3×10-4 ~0.9×10-4 m2 /s、更佳為0.4×10-4 ~0.8×10-4 m2 /s。Further, the resin component was subjected to a dynamic viscosity test in accordance with JIS K 7233 (bubble viscosity meter method) (temperature: 25 ° C ± 0.5 ° C, solvent: butyl carbitol, resin component (solid content) concentration: 40% by mass) The measured dynamic viscosity is, for example, 0.22 × 10 -4 to 2.00 × 10 -4 m 2 /s, preferably 0.3 × 10 -4 to 1.9 × 10 -4 m 2 /s, more preferably 0.4 × 10 -4 ~ 1.8 × 10 -4 m 2 / s. Further, the dynamic viscosity may be set to, for example, 0.22 × 10 -4 to 1.00 × 10 -4 m 2 /s, preferably 0.3 × 10 -4 to 0.9 × 10 -4 m 2 /s, more preferably 0.4. ×10 -4 ~ 0.8 × 10 -4 m 2 /s.

於樹脂成分之動黏度超過上述範圍時,存在無法對熱傳導性片材賦予優異之柔軟性及階差追隨性(後述)之情況。另一方面,於樹脂成分之動黏度不滿足上述範圍時,存在無法使氮化硼粒子朝特定方向配向之情況。When the dynamic viscosity of the resin component exceeds the above range, there is a case where excellent flexibility and step followability (described later) cannot be imparted to the thermally conductive sheet. On the other hand, when the dynamic viscosity of the resin component does not satisfy the above range, the boron nitride particles may not be aligned in a specific direction.

再者,於依據JIS K 7233(泡黏度計法)之動黏度試驗中,將樹脂成分樣品中泡之上升速度、與標準樣品(動黏度為已知)中泡之上升速度進行比較,藉由判定上升速度一致之標準樣品的動黏度為樹脂成分之動黏度,從而測定樹脂成分之動黏度。Furthermore, in the dynamic viscosity test according to JIS K 7233 (bubble viscosity meter method), the rising speed of the bubble in the resin component sample is compared with the rising speed of the bubble in the standard sample (the known dynamic viscosity is known). The dynamic viscosity of the standard sample in which the rising speed was determined was determined as the dynamic viscosity of the resin component, and the dynamic viscosity of the resin component was measured.

並且,於熱傳導性片材中,氮化硼粒子之體積基準之含有比例(固體成分、即樹脂成分包含熱塑性樹脂成分時,氮化硼粒子相對於熱塑性樹脂成分及氮化硼粒子之總體積的體積百分率)為35體積%以上、較佳為60體積%以上、更佳為75體積%以上,通常例如為95體積%以下、較佳為90體積%以下。Further, in the heat conductive sheet, the volume ratio of the boron nitride particles is based on the solid content, that is, when the resin component contains the thermoplastic resin component, the total volume of the boron nitride particles relative to the thermoplastic resin component and the boron nitride particles The volume percentage) is 35% by volume or more, preferably 60% by volume or more, more preferably 75% by volume or more, and is usually, for example, 95% by volume or less, preferably 90% by volume or less.

於氮化硼粒子之體積基準之含有比例不滿足上述範圍時,無法使氮化硼粒子於熱傳導性片材中朝特定方向配向。另一方面,於氮化硼粒子之體積基準之含有比例超過上述範圍時,有熱傳導性片材變脆,操作性及階差追隨性(後述)降低之情況。When the content ratio of the volume basis of the boron nitride particles does not satisfy the above range, the boron nitride particles cannot be aligned in a specific direction in the thermally conductive sheet. On the other hand, when the content ratio of the volume of the boron nitride particles is more than the above range, the thermally conductive sheet becomes brittle, and the workability and the step followability (described later) are lowered.

又,相對於形成熱傳導性片材之各成分(氮化硼粒子及樹脂成分)總量(固體成分總量)100質量份,氮化硼粒子之質量基準之調配比例例如為40~95質量份、較佳為65~90質量份,相對於形成熱傳導性片材之各成分總量100質量份,樹脂成分之質量基準之調配比例例如為5~60質量份、較佳為10~35質量份。再者,氮化硼粒子之相對於樹脂成分100質量份之質量基準的調配比例例如為60~1900質量份、較佳為185~900質量份。In addition, the blending ratio of the mass ratio of the boron nitride particles is, for example, 40 to 95 parts by mass based on 100 parts by mass of the total amount (the total amount of solid components) of each component (boron nitride particles and resin component) forming the thermally conductive sheet. It is preferably 65 to 90 parts by mass, and the blending ratio of the resin component is, for example, 5 to 60 parts by mass, preferably 10 to 35 parts by mass, based on 100 parts by mass of the total amount of each component forming the thermally conductive sheet. . In addition, the blending ratio of the boron nitride particles to the mass basis of 100 parts by mass of the resin component is, for example, 60 to 1900 parts by mass, preferably 185 to 900 parts by mass.

又,於併用2種環氧樹脂(第1環氧樹脂及第2環氧樹脂)時,第1環氧樹脂相對於第2環氧樹脂之質量比例(第1環氧樹脂之質量/第2環氧樹脂之質量)可根據各環氧樹脂(第1環氧樹脂及第2環氧樹脂)之軟化溫度等進行適當設定,例如為1/99~99/1、較佳為10/90~90/10。When the two types of epoxy resins (the first epoxy resin and the second epoxy resin) are used in combination, the mass ratio of the first epoxy resin to the second epoxy resin (the mass of the first epoxy resin / the second The mass of the epoxy resin can be appropriately set according to the softening temperature of each epoxy resin (the first epoxy resin and the second epoxy resin), and is, for example, 1/99 to 99/1, preferably 10/90~ 90/10.

再者,樹脂成分中除了上述各成分(聚合物)外,例如還可含有聚合物前驅物(例如包含寡聚物之低分子量聚合物等)、及/或單體。Further, the resin component may contain, for example, a polymer precursor (for example, a low molecular weight polymer containing an oligomer) and/or a monomer in addition to the above respective components (polymer).

圖1係表示本發明之熱傳導性片材之一實施形態的立體圖,圖2係表示用以說明圖1所示之熱傳導性片材之製造方法的步驟圖。Fig. 1 is a perspective view showing an embodiment of a thermally conductive sheet of the present invention, and Fig. 2 is a view showing a step of explaining a method of manufacturing the thermally conductive sheet shown in Fig. 1.

繼而,參照圖1及圖2對製造本發明之熱傳導性片材之一實施形態的方法進行說明。Next, a method of manufacturing an embodiment of the thermally conductive sheet of the present invention will be described with reference to Figs. 1 and 2 .

於該方法中,首先藉由上述調配比例來調配上述各成分,並進行攪拌混合,藉此製備混合物。In this method, the above components are first formulated by the above-mentioned blending ratio, and stirred and mixed, whereby a mixture is prepared.

於攪拌混合中,為了高效地混合各成分,例如可將溶劑與上述各成分一起調配、或例如藉由加熱使樹脂成分(較佳為熱塑性樹脂成分)熔融。In the stirring and mixing, in order to mix the components efficiently, for example, a solvent may be blended with each of the above components, or a resin component (preferably a thermoplastic resin component) may be melted, for example, by heating.

作為溶劑,可列舉與上述相同之有機溶劑。又,於將上述硬化劑及/或硬化促進劑製備為溶劑溶液及/或溶劑分散液時,於攪拌混合時可不追加溶劑,而直接供給溶劑溶液及/或溶劑分散液之溶劑作為用以攪拌混合的混合溶劑。或於攪拌混合時亦可進一步追加溶劑作為混合溶劑。The solvent is the same as the above-mentioned organic solvent. Further, when the curing agent and/or the curing accelerator are prepared as a solvent solution and/or a solvent dispersion, the solvent of the solvent solution and/or the solvent dispersion may be directly supplied as a solvent for stirring without stirring. Mixed solvent mixture. Alternatively, a solvent may be further added as a mixed solvent when stirring and mixing.

使用溶劑進行攪拌混合時,於攪拌混合後將溶劑去除。When stirring and mixing using a solvent, the solvent was removed after stirring and mixing.

為了去除溶劑,例如於室溫下放置1~48小時,或例如於40~100℃下加熱0.5~3小時,或例如於0.001~50 kPa之減壓環境下、於20~60℃下加熱0.5~3小時。In order to remove the solvent, for example, it is allowed to stand at room temperature for 1 to 48 hours, or for example, at 40 to 100 ° C for 0.5 to 3 hours, or for example, under a reduced pressure of 0.001 to 50 kPa, at a temperature of 20 to 60 ° C. ~3 hours.

於藉由加熱使樹脂成分(較佳為熱塑性樹脂成分)熔融時,加熱溫度例如為樹脂成分之軟化溫度附近或超過其之溫度,具體為40~150℃、較佳為70~140℃。When the resin component (preferably a thermoplastic resin component) is melted by heating, the heating temperature is, for example, near or above the softening temperature of the resin component, specifically 40 to 150 ° C, preferably 70 to 140 ° C.

繼而,於該方法中,將所得之混合物進行熱壓。Then, in the method, the resulting mixture is subjected to hot pressing.

具體如圖2(a)所示般,將混合物例如視需要經由2片脫模膜4進行熱壓,藉此獲得壓製片材1A。熱壓之條件係溫度例如為50~150℃、較佳為60~140℃,壓力例如為1~100 MPa、較佳為5~50 MPa,時間例如為0.1~100分鐘、較佳為1~30分鐘。Specifically, as shown in FIG. 2(a), the mixture is hot-pressed via, for example, two release films 4 as needed, whereby the pressed sheet 1A is obtained. The temperature of the hot pressing is, for example, 50 to 150 ° C, preferably 60 to 140 ° C, and the pressure is, for example, 1 to 100 MPa, preferably 5 to 50 MPa, and the time is, for example, 0.1 to 100 minutes, preferably 1 to 1. 30 minutes.

更佳為將混合物進行真空熱壓。真空熱壓之真空度例如為1~100 Pa、較佳為5~50 Pa,溫度、壓力及時間與上述熱壓之溫度、壓力及時間相同。More preferably, the mixture is subjected to vacuum hot pressing. The vacuum degree of the vacuum hot pressing is, for example, 1 to 100 Pa, preferably 5 to 50 Pa, and the temperature, pressure, and time are the same as the temperature, pressure, and time of the above hot pressing.

熱壓之溫度、壓力及/或時間為上述範圍外時,存在無法將熱傳導性片材1之空隙率P(後述)調整為所需值之情況。When the temperature, the pressure, and/or the time of the hot pressing are outside the above range, the void ratio P (described later) of the thermally conductive sheet 1 may not be adjusted to a desired value.

藉由熱壓而獲得之壓製片材1A之厚度例如為50~1000μm、較佳為100~800 μm。The pressed sheet 1A obtained by hot pressing has a thickness of, for example, 50 to 1000 μm, preferably 100 to 800 μm.

繼而,於該方法中,如圖2(b)所示般,將壓製片材1A分割成複數個(例如4個),而獲得分割片材1B(分割步驟)。於壓製片材1A之分割中,以朝厚度方向投影時分割成複數個之方式,將壓製片材1A沿著其厚度方向切割。再者,壓製片材1A係以各分割片材1B朝厚度方向投影時成為相同形狀之方式進行切割。Then, in this method, as shown in FIG. 2(b), the pressed sheet 1A is divided into a plurality of (for example, four) sheets to obtain a divided sheet 1B (dividing step). In the division of the pressed sheet 1A, the pressed sheet 1A is cut along the thickness direction thereof by being divided into a plurality of pieces when projected in the thickness direction. In addition, the pressed sheet 1A is cut so that each divided sheet 1B has the same shape when projected in the thickness direction.

繼而,於該方法中,如圖2(c)所示般,將各分割片材1B於厚度方向積層,而獲得積層片材1C(積層步驟)。Then, in this method, as shown in FIG. 2(c), each of the divided sheets 1B is laminated in the thickness direction to obtain a laminated sheet 1C (layering step).

然後,於該方法中,如圖2(a)所示般,將積層片材1C進行熱壓(較佳為真空熱壓)(熱壓步驟)。熱壓之條件與上述混合物之熱壓之條件相同。Then, in this method, as shown in Fig. 2 (a), the laminated sheet 1C is subjected to hot pressing (preferably vacuum hot pressing) (hot pressing step). The conditions of hot pressing are the same as those of the above mixture.

熱壓後之積層片材1C之厚度例如為1 mm以下、較佳為0.8 mm以下,通常例如為0.05 mm以上、較佳為0.1 mm以上。The thickness of the laminated sheet 1C after the hot pressing is, for example, 1 mm or less, preferably 0.8 mm or less, and is usually 0.05 mm or more, preferably 0.1 mm or more.

然後,於熱傳導性片材1中,為使氮化硼粒子2於樹脂成分3中朝特定方向有效地配向,而反覆實施上述分割步驟(圖2(b))、積層步驟(圖2(c))及熱壓步驟(圖2(a))之一系列步驟。重複次數並無特別限定,可根據氮化硼粒子之填充狀態進行適當設定,例如為1~10次、較佳為2~7次。Then, in the thermally conductive sheet 1, in order to effectively align the boron nitride particles 2 in the resin component 3 in a specific direction, the above-described dividing step (Fig. 2(b)) and the laminating step (Fig. 2 (c) are repeatedly performed. )) and a series of steps in the hot pressing step (Fig. 2(a)). The number of repetitions is not particularly limited, and may be appropriately set depending on the filling state of the boron nitride particles, and is, for example, 1 to 10 times, preferably 2 to 7 times.

藉此可獲得熱傳導性片材1。Thereby, the thermally conductive sheet 1 can be obtained.

所得熱傳導性片材1之厚度例如為1 mm以下、較佳為0.8 mm以下,通常例如為0.05 mm以上、較佳為0.1 mm以上。The thickness of the obtained thermally conductive sheet 1 is, for example, 1 mm or less, preferably 0.8 mm or less, and is usually 0.05 mm or more, preferably 0.1 mm or more.

又,熱傳導性片材1中之氮化硼粒子之體積基準的含有比例(固體成分、即氮化硼粒子相對於樹脂成分及氮化硼粒子之總體積的體積百分率)如上所述般,為35體積%以上(較佳為60體積%以上、更佳為75體積%以上),通常為95體積%以下(較佳為90體積%以下)。In addition, the volume ratio of the boron nitride particles in the thermally conductive sheet 1 (the solid content, that is, the volume percentage of the boron nitride particles to the total volume of the resin component and the boron nitride particles) is as described above. 35 vol% or more (preferably 60 vol% or more, more preferably 75 vol% or more) is usually 95% by volume or less (preferably 90% by volume or less).

於氮化硼粒子之含有比例不滿足上述範圍時,存在法使氮化硼粒子於熱傳導性片材中朝特定方向調配。When the content ratio of the boron nitride particles does not satisfy the above range, there is a method in which the boron nitride particles are blended in a specific direction in the thermally conductive sheet.

又,於樹脂成分3為熱硬化性樹脂成分時,藉由在上述熱壓步驟(圖2(a))後,使未硬化(或半硬化(B階狀態))之熱傳導性片材1進行熱硬化,而製作硬化後之熱傳導性片材1。Further, when the resin component 3 is a thermosetting resin component, the uncured (or semi-cured (B-stage)) thermally conductive sheet 1 is subjected to the hot pressing step (Fig. 2 (a)). The heat-curable sheet 1 after hardening is produced by heat hardening.

使熱傳導性片材1熱硬化時,可使用上述熱壓機或乾燥機。較佳為使用乾燥機。該熱硬化之條件係溫度例如為60~250℃、較佳為80~200℃。使用熱壓機時,壓力例如為100 MPa以下、較佳為50 MPa以下。When the thermally conductive sheet 1 is thermally cured, the above-described hot press or dryer can be used. It is preferred to use a dryer. The temperature hardening condition is, for example, 60 to 250 ° C, preferably 80 to 200 ° C. When a hot press is used, the pressure is, for example, 100 MPa or less, preferably 50 MPa or less.

並且,如此而得之熱傳導性片材1中,如圖1及其部分放大示意圖所示般,氮化硼粒子2之長邊方向LD沿著與熱傳導性片材1之厚度方向TD交叉(正交)的面方向SD而配向。Further, in the thermally conductive sheet 1 thus obtained, as shown in FIG. 1 and a partially enlarged schematic view, the longitudinal direction LD of the boron nitride particles 2 intersects with the thickness direction TD of the thermally conductive sheet 1 (positive The direction of the face is SD and is aligned.

又,氮化硼粒子2之長邊方向LD與熱傳導性片材1之面方向SD所成角度的算術平均(氮化硼粒子2相對於熱傳導性片材1之配向角度α)例如為25度以下、較佳為20度以下,通常為0度以上。Further, the arithmetic mean of the angle between the longitudinal direction LD of the boron nitride particles 2 and the surface direction SD of the thermally conductive sheet 1 (the alignment angle α of the boron nitride particles 2 with respect to the thermally conductive sheet 1) is, for example, 25 degrees. Hereinafter, it is preferably 20 degrees or less, and usually 0 degrees or more.

再者,氮化硼粒子2相對於熱傳導性片材1之配向角度α係以如下方式算出:藉由剖面拋光儀(CP,Cross Section Polisher)將熱傳導性片材1沿著厚度方向進行切割加工,對由此出現的剖面利用掃描型電子顯微鏡(SEM)以可觀察200個以上氮化硼粒子2之視野的倍率拍攝照片,根據所得SEM照片取得氮化硼粒子2之長邊方向LD相對於熱傳導性片材1之面方向SD(與厚度方向TD正交之方向)的傾斜角α,以其平均值之形式算出。Further, the alignment angle α of the boron nitride particles 2 with respect to the thermally conductive sheet 1 is calculated as follows: the thermally conductive sheet 1 is cut in the thickness direction by a cross section polisher (CP, Cross Section Polisher) The cross section thus formed was photographed by a scanning electron microscope (SEM) at a magnification at which the field of view of 200 or more boron nitride particles 2 was observed, and the longitudinal direction LD of the boron nitride particles 2 was obtained from the obtained SEM photograph. The inclination angle α of the surface direction SD of the thermally conductive sheet 1 (the direction orthogonal to the thickness direction TD) is calculated as the average value.

藉此,熱傳導性片材1之面方向SD之熱導率為4 W/m‧K以上、較佳為5 W/m‧K以上、更佳為10 W/m‧K以上、尤佳為15 W/m‧K以上、特佳為25 W/m‧K以上,通常為200 W/m‧K以下。Thereby, the thermal conductivity of the surface direction SD of the thermally conductive sheet 1 is 4 W/m‧K or more, preferably 5 W/m‧K or more, more preferably 10 W/m‧K or more, and particularly preferably 15 W/m‧K or more, especially preferably 25 W/m‧K or more, usually 200 W/m‧K or less.

又,至於熱傳導性片材1之面方向SD之熱導率,於樹脂成分3為熱硬化性樹脂成分時,於熱硬化前後實質上相同。In addition, the thermal conductivity of the surface direction SD of the thermally conductive sheet 1 is substantially the same before and after the thermosetting when the resin component 3 is a thermosetting resin component.

若熱傳導性片材1之面方向SD之熱導率不滿足上述範圍,則有因面方向SD之熱傳導性不充分,而無法用於要求此種面方向SD之熱傳導性的散熱用途之情況。When the thermal conductivity of the surface direction SD of the thermally conductive sheet 1 does not satisfy the above range, the thermal conductivity in the surface direction SD may be insufficient, and it may not be used for the heat dissipation application in which the thermal conductivity of the surface direction SD is required.

再者,熱傳導性片材1之面方向SD之熱導率藉由脈衝加熱法進行測定。脈衝加熱法係使用氙閃光分析儀「LFA-447型」(NETZSCH公司製造)。Further, the thermal conductivity of the surface direction SD of the thermally conductive sheet 1 was measured by a pulse heating method. The pulse heating method was a "FLA-447 type" (manufactured by NETZSCH Co., Ltd.) using a xenon flash analyzer.

又,熱傳導性片材1之厚度方向TD之熱導率例如為0.5~15 W/m‧K、較佳為1~10 W/m‧K。Further, the thermal conductivity of the thermally conductive sheet 1 in the thickness direction TD is, for example, 0.5 to 15 W/m‧K, preferably 1 to 10 W/m‧K.

再者,熱傳導性片材1之厚度方向TD之熱導率藉由脈衝加熱法、雷射閃光法或TWA(Temperature Wave Analysis,溫度波形分析)法進行測定。脈衝加熱法係使用與上述相同者,雷射閃光法係使用「TC-9000」(ULVAC-RIKO公司製造),TWA法係使用「ai-Phase mobiIe」(ai-Phase公司製造)。Further, the thermal conductivity in the thickness direction TD of the thermally conductive sheet 1 is measured by a pulse heating method, a laser flash method, or a TWA (Temperature Wave Analysis) method. The same applies to the pulse heating method. The laser flash method uses "TC-9000" (manufactured by ULVAC-RIKO Co., Ltd.), and the TWA method uses "ai-Phase mobiIe" (manufactured by ai-Phase Co., Ltd.).

藉此,熱傳導性片材1之面方向SD之熱導率相對於熱傳導性片材1之厚度方向TD之熱導率之比(面方向SD之熱導率/厚度方向TD之熱導率)例如為1.5以上、較佳為3以上、更佳為4以上,通常為20以下。Thereby, the ratio of the thermal conductivity of the surface direction SD of the thermally conductive sheet 1 to the thermal conductivity of the thickness direction TD of the thermally conductive sheet 1 (thermal conductivity in the plane direction SD / thermal conductivity in the thickness direction TD) For example, it is 1.5 or more, preferably 3 or more, more preferably 4 or more, and usually 20 or less.

又,於熱傳導性片材1中,雖然未於圖1中進行圖示,但例如可形成有空隙(間隙)。Moreover, although the heat conductive sheet 1 is not illustrated in FIG. 1, for example, a void (gap) can be formed.

熱傳導性片材1中空隙之比例、即空隙率P可藉由氮化硼粒子2之含有比例(體積基準)、進而氮化硼粒子2及樹脂成分3之混合物之熱壓(圖2(a))的溫度、壓力及/或時間來調整,具體而言,藉由將上述熱壓(圖2(a))之溫度、壓力及/或時間設定為上述範圍內而進行調整。The ratio of the voids in the thermally conductive sheet 1, that is, the void ratio P, can be obtained by the ratio of the content of the boron nitride particles 2 (volume basis), and further the hot pressing of the mixture of the boron nitride particles 2 and the resin component 3 (Fig. 2 (a The temperature, pressure, and/or time are adjusted, and specifically, the temperature, pressure, and/or time of the hot pressing (Fig. 2(a)) are set within the above range.

熱傳導性片材1中之空隙率P例如為30體積%以下、較佳為10體積%以下。The porosity P in the thermally conductive sheet 1 is, for example, 30% by volume or less, preferably 10% by volume or less.

上述空隙率P藉由以下方式進行測定:例如首先藉由剖面拋光儀(CP)將熱傳導性片材1沿著厚度方向進行切割加工,對由此出現之剖面藉由掃描型電子顯微鏡(SEM)以200倍進行觀察而獲得像,根據所得之像對空隙部分與其以外之部分進行二值化處理,繼而算出空隙部分相對於熱傳導性片材1整個剖面積之面積比。The void ratio P is measured by, for example, first cutting the thermally conductive sheet 1 in the thickness direction by a cross-section polisher (CP), and the resulting cross section is scanned by a scanning electron microscope (SEM). The image was observed at 200 times, and the void portion and the other portions were subjected to binarization treatment based on the obtained image, and then the area ratio of the void portion to the entire cross-sectional area of the thermally conductive sheet 1 was calculated.

再者,於熱傳導性片材1中,硬化後之空隙率P2相對於硬化前之空隙率P1,例如為100%以下、較佳為50%以下。In the thermally conductive sheet 1, the void ratio P2 after curing is, for example, 100% or less, preferably 50% or less, with respect to the void ratio P1 before curing.

於空隙率P(P1)之測定中,於樹脂成分3為熱硬化性樹脂成分時,可使用熱硬化前之熱傳導性片材1。In the measurement of the porosity P (P1), when the resin component 3 is a thermosetting resin component, the thermally conductive sheet 1 before thermal curing can be used.

若熱傳導性片材1之空隙率P為上述範圍內,則可提高熱傳導性片材1之階差追隨性(後述)。When the porosity P of the thermally conductive sheet 1 is within the above range, the step followability (described later) of the thermally conductive sheet 1 can be improved.

又,熱傳導性片材1於依據JIS K 5600-5-1之圓筒形心軸法之耐彎曲性試驗中,藉由下述試驗條件進行評價時,例如未觀察到斷裂。In addition, in the bending resistance test of the cylindrical mandrel method according to JIS K 5600-5-1, the thermal conductive sheet 1 was evaluated by the following test conditions, for example, no fracture was observed.

試驗條件Test conditions

試驗裝置:型號ITest device: Model I

心軸:直徑10 mmMandrel: 10 mm in diameter

彎曲角度:90度以上Bending angle: 90 degrees or more

熱傳導性片材1之厚度:0.3 mmThickness of the thermally conductive sheet 1 : 0.3 mm

再者,將型號I之試驗裝置之立體圖示於圖9及圖10,以下對型號I之試驗裝置進行說明。Further, a perspective view of the test device of the model I is shown in Figs. 9 and 10, and a test device of the model I will be described below.

於圖9及圖10中,型號I之試驗裝置10具備:第1平板11、與第1平板11並列配置之第2平板12、為使第1平板11及第2平板12相對轉動而設置之心軸(旋轉軸)13。In the test apparatus 10 of the model I, the first flat plate 11 and the second flat plate 12 arranged in parallel with the first flat plate 11 are provided to relatively rotate the first flat plate 11 and the second flat plate 12 in FIGS. 9 and 10 . Mandrel (rotation axis) 13.

第1平板11形成為大致矩形平板狀。又,於第1平板11之一端部(自由端部)設置有止動部14。止動部14係於第2平板12之表面以沿著第2平板12之一端部延伸之方式形成。The first flat plate 11 is formed in a substantially rectangular flat plate shape. Further, a stopper portion 14 is provided at one end portion (free end portion) of the first flat plate 11. The stopper portion 14 is formed on the surface of the second flat plate 12 so as to extend along one end portion of the second flat plate 12.

第2平板12形成大致矩形平板狀,以其1邊與第1平板11之1邊(與設置有止動部14之一端部相對側之另一端部(基端部)之1邊)鄰接之方式進行配置。The second flat plate 12 is formed in a substantially rectangular flat plate shape, and one side thereof is adjacent to one side of the first flat plate 11 (one side of the other end portion (base end portion) on the side opposite to the end portion on which the stopper portion 14 is provided). The way to configure.

心軸13係以沿著相互鄰接之第1平板11及第2平板12之1邊延伸之方式形成。The mandrel 13 is formed to extend along one side of the first flat plate 11 and the second flat plate 12 adjacent to each other.

該型號I之試驗裝置10如圖9所示般,於開始耐彎曲性試驗前,第1平板11之表面與第2平板12之表面形成為同一平面。As shown in Fig. 9, the test apparatus 10 of the model I had the same plane as the surface of the second flat plate 12 before the start of the bending resistance test.

並且,於實施耐彎曲性試驗時,將熱傳導性片材1載置於第1平板11之表面與第2平板12之表面。再者,將熱傳導性片材1以其1邊與止動部14抵接之方式載置。Further, when the bending resistance test is performed, the thermally conductive sheet 1 is placed on the surface of the first flat plate 11 and the surface of the second flat plate 12. Further, the thermally conductive sheet 1 is placed such that one side thereof abuts against the stopper portion 14.

繼而,如圖10所示般,使第1平板11及第2平板12相對轉動。具體而言,使第1平板11之自由端部與第2平板12之自由端部以心軸13為中心僅轉動特定之角度。詳細而言,使第1平板11及第2平板12以其等之自由端部之表面接近(對向)之方式轉動。Then, as shown in FIG. 10, the first flat plate 11 and the second flat plate 12 are relatively rotated. Specifically, the free end portion of the first flat plate 11 and the free end portion of the second flat plate 12 are rotated only by a specific angle around the mandrel 13 . Specifically, the first flat plate 11 and the second flat plate 12 are rotated such that the surfaces of the free end portions thereof approach (opposite).

藉此,熱傳導性片材1一面追隨第1平板11及第2平板12之轉動,一面以心軸13為中心進行彎曲。Thereby, the thermally conductive sheet 1 is bent around the mandrel 13 while following the rotation of the first flat plate 11 and the second flat plate 12.

較佳為,熱傳導性片材1於上述試驗條件中,即便將彎曲角度設定為180度,亦未觀察到斷裂。Preferably, in the above-described test conditions, the thermally conductive sheet 1 is not observed to have a fracture even when the bending angle is set to 180 degrees.

於以上述彎曲角度所進行之耐彎曲性試驗中於熱傳導性片材1上觀察到斷裂時,存在無法對熱傳導性片材1賦予優異之柔軟性之情況。When the fracture was observed on the thermally conductive sheet 1 in the bending resistance test by the above bending angle, the thermal conductive sheet 1 could not be provided with excellent flexibility.

再者,於耐彎曲性試驗中,於樹脂成分3為熱硬化性樹脂成分時,可使用熱硬化前之熱傳導性片材1。In the bending resistance test, when the resin component 3 is a thermosetting resin component, the thermally conductive sheet 1 before thermosetting can be used.

又,該熱傳導性片材1於依據JIS K 7171(2008年)的三點彎曲試驗中,藉由下述試驗條件進行評價時,例如未觀察到斷裂。Moreover, in the three-point bending test according to JIS K 7171 (2008), the thermal conductive sheet 1 was evaluated by the following test conditions, and for example, no fracture was observed.

試驗條件Test conditions

試驗片:尺寸20 mm×15 mmTest piece: size 20 mm × 15 mm

支點間距離:5 mmDistance between fulcrums: 5 mm

試驗速度:20 mm/min(壓頭之下壓速度)Test speed: 20 mm/min (pressure speed under the head)

彎曲角度:120度Bending angle: 120 degrees

評價方法:目視觀察藉由上述試驗條件進行試驗時之試驗片中央部有無龜裂等斷裂。Evaluation method: The presence or absence of cracks such as cracks in the center portion of the test piece when the test was carried out under the above test conditions was visually observed.

再者,於三點彎曲試驗中,於樹脂成分3為熱硬化性樹脂成分時,可使用熱硬化前之熱傳導性片材1。In the three-point bending test, when the resin component 3 is a thermosetting resin component, the thermally conductive sheet 1 before thermosetting can be used.

因此,該熱傳導性片材1由於在上述三點彎曲試驗中未觀察到斷裂,因此階差追隨性優異。再者,所謂階差追隨性,係指將熱傳導性片材1設置於具有階差之設置對象上時,以沿著該階差密接之方式進行追隨的特性。Therefore, since the thermally conductive sheet 1 was not observed to be broken in the above three-point bending test, the step followability was excellent. In addition, the step followability refers to a characteristic that follows when the thermally conductive sheet 1 is placed on a setting object having a step difference, and is closely adhered along the step.

又,於熱傳導性片材1上可附著例如文字、符號等標記。即熱傳導性片材1之標記附著性優異。所謂標記附著性,係指可使上述標記確實地附著於熱傳導性片材1上之特性。Further, for example, a mark such as a character or a symbol may be attached to the thermally conductive sheet 1. That is, the thermally conductive sheet 1 is excellent in the adhesion of the mark. The term "marking adhesion" means a property in which the above-mentioned mark can be surely adhered to the thermally conductive sheet 1.

標記具體而言可藉由印刷、或刻印等而附著(塗佈、固定或固著)於熱傳導性片材1上。Specifically, the mark can be attached (coated, fixed or fixed) to the thermally conductive sheet 1 by printing, engraving or the like.

作為印刷,例如可列舉:噴墨印刷、凸版印刷、凹版印刷、雷射印刷等。Examples of the printing include inkjet printing, letterpress printing, gravure printing, and laser printing.

再者,藉由噴墨印刷、凸版印刷或凹版印刷將標記進行印刷時,例如可將用以提高標記之固定性的油墨固定層設置於熱傳導性片材1之表面(印刷側面)。Further, when the mark is printed by inkjet printing, letterpress printing or gravure printing, for example, an ink fixing layer for improving the fixing property of the marking can be provided on the surface (printing side) of the thermally conductive sheet 1.

又,藉由雷射印刷將標記進行印刷時,例如可將用以提高標記之固定性的碳粉固定層設置於熱傳導性片材1之表面(印刷側面)。Further, when the mark is printed by laser printing, for example, a toner fixing layer for improving the fixing property of the mark can be provided on the surface (printing side) of the heat conductive sheet 1.

作為刻印,例如可列舉雷射刻印、打刻等。As the engraving, for example, laser marking, engraving, and the like can be cited.

又,熱傳導性片材1之體積電阻R例如為1×1010 Ω‧cm以上、較佳為1×1012 Ω‧cm以上,通常為1×1020 Ω‧cm以下。Further, the volume resistance R of the thermally conductive sheet 1 is, for example, 1 × 10 10 Ω ‧ cm or more, preferably 1 × 10 12 Ω ‧ cm or more, and usually 1 × 10 20 Ω ‧ cm or less.

熱傳導性片材1之體積電阻R係依據JIS K 6911(熱硬化性塑膠一般試驗方法、2006年版)而測定。The volume resistance R of the thermally conductive sheet 1 is measured in accordance with JIS K 6911 (General Test Method for Thermosetting Plastics, 2006 Edition).

熱傳導性片材1之體積電阻R不滿足上述範圍時,存在無法防止後述電子元件間之短路之情況。When the volume resistance R of the thermally conductive sheet 1 does not satisfy the above range, there is a case where it is impossible to prevent a short circuit between electronic components to be described later.

再者,於熱傳導性片材1中,於樹脂成分3為熱硬化性樹脂成分時,體積電阻R係硬化後之熱傳導性片材1之值。In the thermally conductive sheet 1, when the resin component 3 is a thermosetting resin component, the volume resistive R is a value of the thermally conductive sheet 1 after curing.

又,熱傳導性片材1之依據JIS C 2110(2010年版)而測定之絕緣破壞電壓例如為10 kV/mm以上。於熱傳導性片材1之絕緣破壞電壓不滿足10 kV/mm時,存在無法確保優異耐絕緣破壞性(耐漏電起痕性)之情況。Further, the dielectric breakdown voltage of the thermally conductive sheet 1 measured in accordance with JIS C 2110 (2010 edition) is, for example, 10 kV/mm or more. When the dielectric breakdown voltage of the thermally conductive sheet 1 does not satisfy 10 kV/mm, there is a case where excellent insulation breakdown resistance (tracking resistance) cannot be ensured.

再者,上述絕緣破壞電壓係依據JIS C 2110-2(2010年版)之「固體電氣絕緣材料-絕緣破壞之強度之試驗方法-第2部:施加直流電壓之試驗」之記載而測定。詳細而言係藉由升壓速度為1000 V/s的短時間(急速升壓)試驗,測定於熱傳導性片材1上產生絕緣破壞之電壓作為絕緣破壞電壓。In addition, the above-mentioned dielectric breakdown voltage is measured in accordance with JIS C 2110-2 (2010 edition), "Test Method for Strength of Insulating Destruction - Part 2: Test for Applying DC Voltage". Specifically, a voltage at which insulation breakdown occurs in the thermally conductive sheet 1 is measured as a dielectric breakdown voltage by a short-time (rapid boost) test with a step-up speed of 1000 V/s.

又,熱傳導性片材1之絕緣破壞電壓較佳為15 kV/mm以上,通常為100 kV/mm以下。Further, the dielectric breakdown voltage of the thermally conductive sheet 1 is preferably 15 kV/mm or more, and is usually 100 kV/mm or less.

於樹脂成分3為熱硬化性樹脂成分時,熱傳導性片材1之絕緣破壞電壓於熱傳導性片材1之熱硬化前後實質上相同。When the resin component 3 is a thermosetting resin component, the dielectric breakdown voltage of the thermally conductive sheet 1 is substantially the same before and after thermal curing of the thermally conductive sheet 1.

又,熱傳導性片材1之玻璃轉移點例如為125℃以上、較佳為130℃以上、更佳為140℃以上、尤佳為150℃以上、進而較佳為170℃以上、進而更佳為190℃以上、進而尤佳為210℃以上,通常為300℃以下。Further, the glass transition point of the thermally conductive sheet 1 is, for example, 125 ° C or higher, preferably 130 ° C or higher, more preferably 140 ° C or higher, still more preferably 150 ° C or higher, further preferably 170 ° C or higher, and even more preferably It is 190 ° C or higher, more preferably 210 ° C or higher, and usually 300 ° C or lower.

若玻璃轉移點為上述下限以上,則可確保熱傳導性片材之優異耐熱性,因此可降低高溫下之變形,並抑制剝離。When the glass transition point is at least the above lower limit, excellent heat resistance of the thermally conductive sheet can be ensured, so that deformation at a high temperature can be reduced and peeling can be suppressed.

即,於將熱傳導性片材1貼合於各種裝置時,於該裝置之溫度上升,超過熱傳導性片材1之玻璃轉移點時等,有熱傳導性片材1因線膨脹係數之變化而自各種裝置剝離之情況。但是,該熱傳導性片材1中,由於玻璃轉移點為上述上限以上,因此即便裝置之溫度上升,亦可抑制超過熱傳導性片材1之玻璃轉移點,其結果可降低熱傳導性片材1之變形而抑制剝離。In other words, when the heat conductive sheet 1 is bonded to various devices, the temperature of the device rises, and when the temperature exceeds the glass transition point of the thermally conductive sheet 1, the thermal conductive sheet 1 changes from the coefficient of linear expansion. The situation in which various devices are stripped. However, in the thermally conductive sheet 1, since the glass transition point is equal to or higher than the above upper limit, even if the temperature of the apparatus rises, the glass transition point exceeding the thermally conductive sheet 1 can be suppressed, and as a result, the thermally conductive sheet 1 can be lowered. Deformation inhibits peeling.

再者,玻璃轉移點係以藉由10赫茲之頻率進行動態黏彈性測定時所得的tanδ(損失正切)之峰值的形式而求得。Further, the glass transition point was obtained in the form of a peak of tan δ (loss tangent) obtained by dynamic viscoelasticity measurement at a frequency of 10 Hz.

又,熱傳導性片材1之5%質量減少溫度例如為250℃以上、較佳為300℃以上,通常為450℃以下。Further, the 5% mass reduction temperature of the thermally conductive sheet 1 is, for example, 250 ° C or higher, preferably 300 ° C or higher, and usually 450 ° C or lower.

若5%質量減少溫度為上述下限以上,則即便暴露於高溫下亦可抑制分解,並可高效地傳導由各種裝置產生之熱。When the 5% mass reduction temperature is at least the above lower limit, decomposition can be suppressed even when exposed to a high temperature, and heat generated by various devices can be efficiently conducted.

再者,5%質量減少溫度可藉由熱質量分析(升溫速度10℃/分鐘、氮氣環境下),依據JIS K 7120而測定。Further, the 5% mass reduction temperature can be measured by thermal mass analysis (temperature up rate 10 ° C / min, nitrogen atmosphere) in accordance with JIS K 7120.

又,熱傳導性片材1於以下初始黏接力試驗(1)中,例如不自被黏接體脫落。即保持熱傳導性片材1與被黏接體之暫時固定狀態。Further, in the following initial adhesion test (1), the thermally conductive sheet 1 does not fall off from the adherend, for example. That is, the temporarily conductive state of the thermally conductive sheet 1 and the adherend is maintained.

初始黏接力試驗(1):將熱傳導性片材1加熱壓接於沿著水平方向之被黏接體上進行暫時固定,放置10分鐘後,使被黏接體上下反轉。Initial adhesion test (1): The thermally conductive sheet 1 was heat-compressed and bonded to the bonded body in the horizontal direction to be temporarily fixed, and after being left for 10 minutes, the adherend was inverted upside down.

作為被黏接體,例如可列舉:包含不鏽鋼(例如SUS304等)之基板、或封裝有複數個IC(積體電路)晶片、電容器、線圈、電阻器等電子零件之筆記型電腦用封裝基板等。再者,於筆記型電腦用封裝基板中,電子零件通常於上表面(一個面)於面方向(筆記型電腦用封裝基板之面方向)相互隔開間隔而配置。Examples of the adherend include a substrate including stainless steel (for example, SUS304), or a package substrate for a notebook computer in which a plurality of IC (integrated circuit) chips, capacitors, coils, resistors, and the like are packaged. . Further, in the package substrate for a notebook computer, the electronic components are usually arranged at intervals in the surface direction (the surface direction of the package substrate for the notebook computer) on the upper surface (one surface).

至於壓接,例如一面使包含聚矽氧樹脂等樹脂之海綿輥對熱傳導性片材1進行推壓,一面使熱傳導性片材1之表面轉動。In the pressure bonding, for example, the surface of the thermally conductive sheet 1 is rotated while pressing the thermal conductive sheet 1 with a sponge roll containing a resin such as a polyoxyn resin.

又,至於加熱壓接之溫度,於樹脂成分3為熱硬化性樹脂成分(例如環氧樹脂)時,例如為80℃。Moreover, when the resin component 3 is a thermosetting resin component (for example, an epoxy resin), the temperature of the heat-compression bonding is 80 degreeC, for example.

另一方面,加熱壓接之溫度於樹脂成分3為熱塑性樹脂成分(例如聚乙烯)時,例如為於熱塑性樹脂成分之軟化點或熔點上加10~30℃之溫度,較佳為於熱塑性樹脂成分之軟化點或熔點上加15~25℃之溫度,更佳為於熱塑性樹脂成分之軟化點或熔點上加20℃之溫度,具體為120℃(即熱塑性樹脂成分之軟化點或熔點為100℃,於該100℃上加20℃之溫度)。On the other hand, when the resin component 3 is a thermoplastic resin component (for example, polyethylene), for example, a temperature of 10 to 30 ° C is applied to the softening point or melting point of the thermoplastic resin component, preferably a thermoplastic resin. Adding a temperature of 15 to 25 ° C to the softening point or melting point of the component, more preferably adding a temperature of 20 ° C to the softening point or melting point of the thermoplastic resin component, specifically 120 ° C (ie, the softening point or melting point of the thermoplastic resin component is 100 °C, at a temperature of 20 ° C at 20 ° C).

熱傳導性片材1於上述初始黏接力試驗(1)中自被黏接體脫落時,即未保持熱傳導性片材1與被黏接體之暫時固定狀態時,存在無法確實地將熱傳導性片材1暫時固定於被黏接體上之情況。When the thermally conductive sheet 1 is detached from the adherend in the initial adhesion test (1), that is, when the thermally conductive sheet 1 and the adherend are temporarily held, the thermally conductive sheet 1 cannot be reliably provided. The material 1 is temporarily fixed to the bonded body.

再者,於樹脂成分3為熱硬化性樹脂成分時,供於初始黏接力試驗(1)及初始黏接力試驗(2)(後述)之熱傳導性片材1為未硬化之熱傳導性片材1,藉由初始黏接力試驗(1)及初始黏接力試驗(2)中之加熱壓接,而使熱傳導性片材1成為B階狀態。In the case where the resin component 3 is a thermosetting resin component, the thermally conductive sheet 1 to be subjected to the initial adhesion test (1) and the initial adhesion test (2) (described later) is an uncured heat conductive sheet 1 The thermally conductive sheet 1 is brought into the B-stage state by the thermal bonding in the initial adhesion test (1) and the initial adhesion test (2).

又,於樹脂成分3為熱塑性樹脂成分時,供於初始黏接力試驗(1)及初始黏接力試驗(2)(後述)之熱傳導性片材1為固體狀熱傳導性片材1,藉由初始黏接力試驗(1)及初始黏接力試驗(2)中之加熱壓接,而使熱傳導性片材1成為軟化狀態。Further, when the resin component 3 is a thermoplastic resin component, the thermally conductive sheet 1 to be subjected to the initial adhesion test (1) and the initial adhesion test (2) (described later) is a solid heat conductive sheet 1 by initial In the adhesion test (1) and the initial adhesion test (2), the heat conductive sheet 1 was softened.

較佳為,熱傳導性片材1於上述初始黏接力試驗(1)及以下初始黏接力試驗(2)之兩試驗中不自被黏接體脫落。即,保持熱傳導性片材1與被黏接體之暫時固定狀態。Preferably, the thermally conductive sheet 1 does not fall off from the adherend in the two tests of the initial adhesion test (1) and the initial adhesion test (2). That is, the temporarily conductive state of the thermally conductive sheet 1 and the adherend is maintained.

初始黏接力試驗(2):將熱傳導性片材1於沿著水平方向之被黏接體上進行加熱壓接而暫時固定,放置10分鐘後,使被黏接體以沿著垂直方向(上下方向)之方式進行配置。Initial adhesion test (2): The heat conductive sheet 1 is temporarily fixed by heat-compression bonding on the bonded body in the horizontal direction, and after being left for 10 minutes, the bonded body is placed in the vertical direction (up and down) Directional mode configuration.

初始黏接力試驗(2)之加熱壓接時之溫度與上述初始黏接力試驗(1)之加熱壓接時之溫度相同。The temperature at the time of the heat bonding of the initial adhesion test (2) was the same as the temperature at the time of the heat bonding of the initial adhesion test (1).

並且,於該熱傳導性片材1中,柔軟性及面方向SD之熱傳導性優異。Further, in the thermally conductive sheet 1, the flexibility and the thermal conductivity in the plane direction SD are excellent.

因此,作為操作性優異、並且面方向SD之熱傳導性優異之熱傳導性片材,可用於各種散熱用途,具體而言,可用作電力電子技術中所採用之熱傳導性片材,更詳細而言,例如可用作應用於LED散熱基板、電池用散熱材之熱傳導性片材。Therefore, the thermally conductive sheet which is excellent in workability and excellent in thermal conductivity in the surface direction SD can be used for various heat dissipation applications, and specifically, can be used as a heat conductive sheet used in power electronics technology, and more specifically, For example, it can be used as a heat conductive sheet applied to an LED heat sink substrate or a battery heat sink.

又,上述熱傳導性片材1由於面方向SD之熱傳導性優異,並且體積電阻R為特定範圍內,因此電氣絕緣性亦優異。Moreover, the thermal conductive sheet 1 is excellent in thermal conductivity in the plane direction SD, and the volume resistance R is in a specific range, and therefore is excellent in electrical insulating properties.

因此,若藉由熱傳導性片材1被覆電子元件,則可保護該電子元件,且可使電子元件之熱有效地熱傳導,並且可防止電子元件間之短路。Therefore, if the electronic component is covered by the thermally conductive sheet 1, the electronic component can be protected, and the heat of the electronic component can be thermally efficiently conducted, and the short circuit between the electronic components can be prevented.

再者,作為被覆於熱傳導性片材1之電子元件,並無特別限定,例如可列舉IC(積體電路)晶片、電容器、線圈、電阻器、發光二極體等。該等電子元件通常設置於基板上,於面方向(基板之面方向)上相互隔開間隔而配置。In addition, the electronic component to be coated on the thermally conductive sheet 1 is not particularly limited, and examples thereof include an IC (integrated circuit) wafer, a capacitor, a coil, a resistor, and a light-emitting diode. These electronic components are usually disposed on the substrate and are arranged at intervals in the plane direction (the direction of the surface of the substrate).

進而,上述熱傳導性片材1由於面方向SD之熱傳導性優異,並且絕緣破壞電壓為特定範圍內,因此耐絕緣破壞性(耐漏電起痕性)亦優異。Further, the thermal conductive sheet 1 is excellent in thermal conductivity in the surface direction SD and has an insulation breakdown voltage within a specific range, and therefore is excellent in insulation breakdown resistance (striking resistance).

因此,若藉由熱傳導性片材1被覆電力電子中所採用之電子零件及/或封裝有其之封裝基板,則可防止熱傳導性片材1之絕緣破壞,並且藉由該熱傳導性片材1而可使電子零件及/或封裝基板之熱沿著面方向SD散熱。Therefore, when the electronic component used in the power electronic device and/or the package substrate packaged therewith is covered by the thermally conductive sheet 1, the insulation breakdown of the thermally conductive sheet 1 can be prevented, and the thermally conductive sheet 1 can be prevented by the thermal conductive sheet 1 The heat of the electronic component and/or the package substrate can be dissipated along the surface direction SD.

作為電力電子中所採用之電子零件,例如可列舉IC(積體電路)晶片(特別是IC晶片中之寬度狹窄之電極端子部分)、閘流體(整流器)、馬達零件、變壓器、送電用零件、電容器、線圈、電阻器、發光二極體等。Examples of the electronic component used in the power electronics include an IC (integrated circuit) wafer (particularly, an electrode terminal portion having a narrow width in an IC chip), a thyristor (rectifier), a motor component, a transformer, and a power transmission component. Capacitors, coils, resistors, light-emitting diodes, etc.

又,於封裝基板上,將上述電子零件封裝於表面(一個面),於該封裝基板中,電子零件於面方向(封裝基板之面方向)上相互隔開間隔而配置。Further, the electronic component is packaged on the surface (one surface) of the package substrate, and the electronic component is placed at a distance from each other in the plane direction (the direction of the surface of the package substrate).

又,被覆上述電子零件及/或封裝基板之熱傳導性片材1亦可防止因由電子零件及/或封裝基板產生之高頻雜訊等而劣化。Further, the thermally conductive sheet 1 covering the electronic component and/or the package substrate can be prevented from being deteriorated by high frequency noise or the like generated by the electronic component and/or the package substrate.

進而,於上述熱傳導性片材1中,由於面方向SD之熱傳導性優異,而且玻璃轉移點為特定範圍內,因此耐熱性亦優異。Further, in the above-described thermally conductive sheet 1, since the thermal conductivity in the surface direction SD is excellent and the glass transition point is within a specific range, heat resistance is also excellent.

因此,作為可降低高溫下之變形、抑制剝離,並且操作性優異、且面方向之熱傳導性優異的熱傳導性片材,可用於各種散熱用途,具體而言,可用作電力電子技術中所採用之熱傳導性片材,更詳細而言,例如可用作應用於LED散熱基板、電池用散熱材之熱傳導性片材。Therefore, the thermally conductive sheet which is excellent in handleability and excellent in thermal conductivity in the surface direction can be used for various heat dissipation applications, and can be used as a power electronic technology. More specifically, the heat conductive sheet can be used, for example, as a heat conductive sheet applied to an LED heat sink substrate or a battery heat sink.

又,於上述熱傳導性片材1中,由於柔軟性及面方向SD之熱傳導性優異,而且5%質量減少溫度為特定範圍內,因此耐熱性亦優異。Further, in the above-described thermally conductive sheet 1, since the flexibility and the surface direction SD are excellent in thermal conductivity, and the 5% mass reduction temperature is within a specific range, heat resistance is also excellent.

即,根據該熱傳導性片材1,例如即便暴露於200℃以上之高溫下亦可抑制分解,作為操作性優異、且面方向SD之熱傳導性優異之熱傳導性片材,而用於各種散熱用途,具體而言,可用作於產生200~250℃之高溫的電力電子技術中所採用之熱傳導性片材,更詳細而言,例如可用作應用於SiC晶片、LED散熱基板、電池用散熱材之熱傳導性片材。In other words, the thermally conductive sheet 1 can be prevented from being decomposed even when exposed to a high temperature of 200 ° C or higher, and is used as a heat conductive sheet having excellent handleability and excellent thermal conductivity in the surface direction SD. Specifically, it can be used as a heat conductive sheet used in a power electronic technology that generates a high temperature of 200 to 250 ° C, and more specifically, for example, can be used for application of a SiC wafer, an LED heat sink substrate, and a battery for heat dissipation. Thermal conductive sheet of material.

進而,上述熱傳導性片材1由於面方向SD之熱傳導性優異,且於上述初始黏接力試驗(1)中,例如不自被黏接體脫落,因此對於被黏接體之特定溫度之加熱壓接後的黏接力(初始黏接力)亦優異。Further, the thermal conductive sheet 1 is excellent in thermal conductivity in the plane direction SD, and in the initial adhesion test (1), for example, does not fall off from the adherend, and therefore the heating pressure is applied to the specific temperature of the adherend. The adhesion (initial adhesion) is also excellent.

因此,若將熱傳導性片材1於被黏接體上進行加熱壓接,則可使熱傳導性片材1確實地固定(暫時固定)於被黏接體。Therefore, when the thermally conductive sheet 1 is heated and pressure-bonded to the adherend, the thermally conductive sheet 1 can be surely fixed (temporarily fixed) to the adherend.

因此,於B階狀態將熱傳導性片材1於被黏接體上暫時固定,然後,藉由加熱使熱傳導性片材1熱硬化,藉此可使熱傳導性片材1確實地黏接於被黏接體上,並且可藉由熱傳導性片材1使被黏接體之熱沿著熱傳導性片材1之面方向SD有效地熱傳導。Therefore, the thermally conductive sheet 1 is temporarily fixed to the adherend in the B-stage state, and then the thermally conductive sheet 1 is thermally cured by heating, whereby the thermally conductive sheet 1 can be surely bonded to the thermally conductive sheet 1 The heat of the adherend can be efficiently thermally conducted along the surface direction SD of the thermally conductive sheet 1 by the thermally conductive sheet 1 on the adhesive body.

再者,作為被黏接體,並無特別限定,例如除了上述電子零件(IC晶片、電容器、線圈、電阻器等)外,亦可列舉發光二極體等。In addition, the bonded body is not particularly limited, and examples thereof include a light-emitting diode and the like in addition to the above-described electronic component (IC chip, capacitor, coil, resistor, etc.).

另一方面,熱傳導性片材1於被黏接體上暫時固定後,視需要為了位置調整而有暫時剝離,並欲再貼合(二次加工)之情況,上述熱傳導性片材1為B階狀態,二次加工性良好。因此,熱傳導性片材1於剝離時可防止殘存於被黏接體之表面,並且可容易地進行二次加工。On the other hand, after the heat conductive sheet 1 is temporarily fixed to the adherend, if necessary, it is temporarily peeled off for positional adjustment, and it is intended to be re-bonded (secondary processing), and the thermally conductive sheet 1 is B. The state of the order is good in secondary workability. Therefore, the thermally conductive sheet 1 can be prevented from remaining on the surface of the adherend at the time of peeling, and secondary processing can be easily performed.

進而,即便熱傳導性片材1殘存於被黏接體之表面,若熱傳導性片材1為未硬化(硬化前),則亦可容易地擦拭(去除)殘存物。Further, even if the thermally conductive sheet 1 remains on the surface of the adherend, if the thermally conductive sheet 1 is not cured (before curing), the residue can be easily wiped (removed).

再者,於上述熱壓(圖2(a))步驟中,例如亦可藉由複數個砑光輥等將混合物及積層片材1C進行壓延。Further, in the hot pressing (Fig. 2 (a)) step, for example, the mixture and the laminated sheet 1C may be rolled by a plurality of calender rolls or the like.

又,於樹脂成分3為熱硬化性樹脂成分時,亦可如上所述般不進行熱硬化,並如上所述般以未硬化之熱傳導性片材1之形式獲得熱傳導性片材。In addition, when the resin component 3 is a thermosetting resin component, the heat conductive sheet may be obtained as the uncured heat conductive sheet 1 as described above without performing thermal curing.

即,本發明之熱傳導性片材於樹脂成分為熱硬化性樹脂成分時,熱硬化之有無及時間並無特別限定,例如亦可如上所述般可於積層步驟(圖2(c))後、或自上述熱壓步驟(圖2(a)、為混合物之熱壓、且不進行熱硬化之熱壓)經過特定時間後,具體而言,於應用於電力電子技術時、或自該應用經過特定時間後,進行熱硬化。In other words, when the resin component is a thermosetting resin component, the heat conductive sheet of the present invention is not particularly limited in terms of the presence or absence of heat curing, and may be, for example, a laminate step (Fig. 2(c)) as described above. Or after the specific time from the above-mentioned hot pressing step (Fig. 2(a), hot pressing of the mixture, and hot pressing without thermal hardening), specifically, when applied to power electronics technology, or from the application After a certain period of time, heat hardening is performed.

實施例Example

以下揭示實施例及比較例,對本發明進行更具體地說明,但本發明並不受實施例及比較例任何限定。The present invention will be more specifically described by the following examples and comparative examples, but the present invention is not limited to the examples and comparative examples.

實施例1Example 1

依據表1之調配處方,調配各成分(氮化硼粒子及環氧樹脂組合物)並攪拌,於室溫(23℃)下放置1晚使甲基乙基酮(硬化劑之溶劑/硬化劑之分散媒)揮發,而製備半固態混合物。According to the formulation of Table 1, the ingredients (boron nitride particles and epoxy resin composition) were blended and stirred, and left at room temperature (23 ° C) for 1 night to make methyl ethyl ketone (solvent/hardener of hardener) The dispersion medium is volatilized to prepare a semi-solid mixture.

繼而,將所得混合物用經聚矽氧處理之2片脫模膜夾持,對於該等藉由真空加熱壓機於80℃下、於10 Pa之環境(真空環境)下、以5噸之荷重(20 MPa)熱壓2分鐘,藉此獲得厚度0.3 mm之壓製片材(參照圖2(a))。Then, the obtained mixture was sandwiched by two release films treated with polyoxyxylene, and the load was 5 tons at 80 ° C in a 10 Pa environment (vacuum environment) by a vacuum heating press. (20 MPa) hot pressing for 2 minutes, whereby a pressed sheet having a thickness of 0.3 mm was obtained (refer to Fig. 2 (a)).

然後,將所得壓製片材以朝壓製片材之厚度方向投影時分割成複數個之方式進行切割,藉此獲得分割片材(參照圖2(b)),繼而將分割片材於厚度方向進行積層而獲得積層片材(參照圖2(c))。Then, the obtained pressed sheet is cut into a plurality of pieces when projected in the thickness direction of the pressed sheet, thereby obtaining a divided sheet (refer to FIG. 2(b)), and then the divided sheet is subjected to thickness direction. A laminated sheet is obtained by laminating (see Fig. 2(c)).

繼而,將所得之積層片材藉由與上述相同之真空加熱壓機藉由與上述相同之條件進行熱壓(參照圖2(a))。Then, the obtained laminated sheet was hot-pressed by the same conditions as above by the same vacuum heating press as described above (refer to Fig. 2 (a)).

繼而,重複4次上述切割、積層及熱壓之一系列操作(參照圖2),而獲得厚度0.3 mm之熱傳導性片材。Then, one of the above-described cutting, laminating, and hot pressing series operations (refer to FIG. 2) was repeated four times to obtain a thermally conductive sheet having a thickness of 0.3 mm.

然後,將所得之熱傳導性片材投入至乾燥機,於150℃下加熱120分鐘,藉此進行熱硬化。Then, the obtained thermally conductive sheet was placed in a dryer and heated at 150 ° C for 120 minutes to be thermally cured.

實施例2~8、10~16及比較例1、2Examples 2-8, 10-16, and Comparative Examples 1, 2

依據表1~表3之調配處方及製造條件,以與實施例1相同之方式進行處理,藉此分別獲得實施例2~8、10~16及比較例1、2之厚度0.3 mm的熱傳導性片材。According to the formulation and manufacturing conditions of Tables 1 to 3, the treatment was carried out in the same manner as in Example 1 to obtain thermal conductivity of 0.3 mm in thickness of Examples 2 to 8, 10 to 16, and Comparative Examples 1 and 2, respectively. Sheet.

實施例9Example 9

依據表2之調配處方,調配各成分(氮化硼粒子及聚乙烯)並攪拌,藉此製備混合物。即,於攪拌各成分時,加熱至130℃而使聚乙烯熔融。According to the formulation of Table 2, each component (boron nitride particles and polyethylene) was blended and stirred to prepare a mixture. That is, when the components were stirred, the mixture was heated to 130 ° C to melt the polyethylene.

繼而,將所得混合物用經聚矽氧處理之2片脫模膜夾持,對於該等藉由真空加熱壓機於120℃下、於10 Pa之環境(真空環境)下、以1噸之荷重(4 MPa)熱壓2分鐘,藉此獲得厚度0.3 mm之壓製片材(參照圖2(a))。Then, the obtained mixture was sandwiched by two release films treated with polyfluorene, for a load of 1 ton in a 10 Pa environment (vacuum environment) by a vacuum heating press at 120 ° C. (4 MPa) was hot pressed for 2 minutes, whereby a pressed sheet having a thickness of 0.3 mm was obtained (refer to Fig. 2 (a)).

然後,將所得之壓製片材以朝壓製片材之厚度方向投影時分割成複數個之方式進行切割,藉此獲得分割片材(參照圖2(b)),繼而將分割片材於厚度方向進行積層而獲得積層片材(參照圖2(c))。Then, the obtained pressed sheet is cut into a plurality of pieces when projected in the thickness direction of the pressed sheet, thereby obtaining a divided sheet (refer to FIG. 2(b)), and then the divided sheet is in the thickness direction. The laminate is laminated to obtain a laminated sheet (see Fig. 2(c)).

繼而,將所得之積層片材藉由與上述相同之真空加熱壓機藉由與上述相同之條件進行熱壓(參照圖2(a))。Then, the obtained laminated sheet was hot-pressed by the same conditions as above by the same vacuum heating press as described above (refer to Fig. 2 (a)).

繼而,重複4次上述切割、積層及加壓之一系列操作(參照圖2),藉此獲得厚度0.3 mm之熱傳導性片材。Then, one of the above-described series of cutting, laminating, and pressurizing (refer to FIG. 2) was repeated four times, whereby a thermally conductive sheet having a thickness of 0.3 mm was obtained.

(評價)(Evaluation)

(1) 熱導率(1) Thermal conductivity

對由各實施例及各比較例獲得之熱傳導性片材測定熱導率。The thermal conductivity of the thermally conductive sheet obtained from each of the examples and the comparative examples was measured.

即,藉由使用氙閃光分析儀「LFA-447型」(NETZSCH公司製造)之脈衝加熱法測定面方向(SD)之熱導率。又,藉由使用「ai-Phase mobile」(ai-Phase公司製造)之TWA法測定厚度方向(TD)之熱導率。Namely, the thermal conductivity in the plane direction (SD) was measured by a pulse heating method using a 氙flash analyzer "LFA-447 type" (manufactured by NETZSCH Co., Ltd.). Moreover, the thermal conductivity in the thickness direction (TD) was measured by the TWA method using "ai-Phase mobile" (manufactured by ai-Phase Co., Ltd.).

將其結果示於表1~表3(實施例1~16、比較例1及2)及圖8(實施例1~4、比較例1及2)。The results are shown in Tables 1 to 3 (Examples 1 to 16 and Comparative Examples 1 and 2) and Fig. 8 (Examples 1 to 4 and Comparative Examples 1 and 2).

(2) 藉由電子顯微鏡觀察剖面(2) Observing the section by electron microscope

藉由剖面拋光儀將實施例1、3、5、比較例1及2之熱傳導性片材沿著厚度方向進行切割,對其切割面藉由電子顯微鏡(SEM)進行觀察。The thermally conductive sheets of Examples 1, 3, and 5 and Comparative Examples 1 and 2 were cut in the thickness direction by a cross-section polisher, and the cut surface thereof was observed by an electron microscope (SEM).

將該等之圖像處理圖分別示於圖3~圖7。The image processing maps are shown in Figures 3 to 7 respectively.

(3) 耐彎曲性(柔軟性)(3) Bending resistance (softness)

對各實施例及各比較例之熱傳導性片材實施依據JIS K 5600-5-1耐彎曲性(圓筒形心軸法)之耐彎曲性試驗。The heat conductive sheet of each of the examples and the comparative examples was subjected to a bending resistance test in accordance with JIS K 5600-5-1 bending resistance (cylindrical mandrel method).

即,首先對於實施例1~8、10~16及比較例1、2之熱傳導性片材,準備硬化前之厚度0.3 mm之積層片材作為樣品,並將其供於耐彎曲性試驗。Specifically, first, for the thermally conductive sheets of Examples 1 to 8, 10 to 16, and Comparative Examples 1 and 2, a laminated sheet having a thickness of 0.3 mm before curing was prepared as a sample, and this was subjected to a bending resistance test.

又,對於實施例9之熱傳導性片材,將所得之厚度0.3 mm之熱傳導性片材直接供於耐彎曲性試驗。Further, with respect to the thermally conductive sheet of Example 9, the obtained thermally conductive sheet having a thickness of 0.3 mm was directly subjected to a bending resistance test.

然後,藉由下述試驗條件對各熱傳導性片材之耐彎曲性(柔軟性)進行評價。Then, the bending resistance (softness) of each of the heat conductive sheets was evaluated by the following test conditions.

試驗條件Test conditions

試驗裝置:型號ITest device: Model I

心軸:直徑10 mmMandrel: 10 mm in diameter

並且,使未硬化之各熱傳導性片材以超過0度且為180度以下之彎曲角度進行彎曲,根據熱傳導性片材產生斷裂(損傷)之角度,以如下方式進行評價。Further, each of the uncured heat conductive sheets was bent at a bending angle of more than 0 degrees and not more than 180 degrees, and evaluated according to the angle at which the thermally conductive sheet was broken (damaged).

將其結果示於表1~表3。The results are shown in Tables 1 to 3.

◎:180度、即便彎曲亦未產生斷裂。◎: 180 degrees, and no breakage occurred even when bent.

○:90度以上未達180度、若彎曲則產生斷裂。○: 90 degrees or more is less than 180 degrees, and if it is bent, cracking occurs.

△:10度以上未達90度、若彎曲則產生斷裂。△: 10 degrees or more is less than 90 degrees, and if it is bent, cracking occurs.

×:超過0度未達10度、若彎曲則產生斷裂。×: Less than 0 degrees is less than 10 degrees, and if it is bent, cracking occurs.

(4) 空隙率(P)(4) Void ratio (P)

藉由下述測定方法測定各實施例及各比較例之熱硬化前的熱傳導性片材之空隙率(P1)。The porosity (P1) of the thermally conductive sheet before thermal curing of each of the examples and the comparative examples was measured by the following measurement method.

空隙率之測定方法:首先,藉由剖面拋光儀(CP)將熱傳導性片材沿著厚度方向進行切割加工,將由此出現之剖面藉由掃描型電子顯微鏡(SEM)以200倍進行觀察而獲得像。然後,根據所得之像對空隙部分與其以外之部分進行二值化處理,繼而算出空隙部分相對於熱傳導性片材整個剖面積之面積比。Method for measuring void ratio: First, the thermally conductive sheet was cut in the thickness direction by a cross-section polisher (CP), and the cross-section thus obtained was observed by scanning electron microscopy (SEM) at 200 times. image. Then, the void portion and the other portions are subjected to binarization processing based on the obtained image, and then the area ratio of the void portion to the entire cross-sectional area of the thermally conductive sheet is calculated.

將其結果示於表1~表3。The results are shown in Tables 1 to 3.

(5) 階差追隨性(三點彎曲試驗)(5) Step followability (three-point bending test)

對於各實施例及各比較例之熱硬化前之熱傳導性片材,依據JIS K 7171(2010年)實施下述試驗條件下之三點彎曲試驗,藉此根據下述評價基準來評價階差追隨性。將其結果示於表1~表3。The three-point bending test under the following test conditions was carried out in accordance with JIS K 7171 (2010) in accordance with JIS K 7171 (2010) for the thermally conductive sheets before thermal curing of the respective examples and the comparative examples, thereby evaluating the step following in accordance with the following evaluation criteria. Sex. The results are shown in Tables 1 to 3.

試驗條件Test conditions

試驗片:尺寸20 mm×15 mmTest piece: size 20 mm × 15 mm

支點間距離:5 mmDistance between fulcrums: 5 mm

試驗速度:20 mm/min(壓頭之下壓速度)Test speed: 20 mm/min (pressure speed under the head)

彎曲角度:120度Bending angle: 120 degrees

(評價基準)(evaluation benchmark)

◎:完全未觀察到斷裂。◎: No break was observed at all.

○:幾乎未觀察到斷裂。○: Little break was observed.

×:明顯觀察到斷裂。×: A fracture was clearly observed.

(6) 印刷標記視覺辨認性(印刷標記附著性:藉由噴墨印刷或雷射印刷之標記附著性)(6) Print mark visual recognition (print mark adhesion: mark adhesion by inkjet printing or laser printing)

對於實施例1~16之熱傳導性片材藉由噴墨印刷及雷射印刷來印刷標記,並觀察該標記。The thermally conductive sheets of Examples 1 to 16 were printed with marks by inkjet printing and laser printing, and the marks were observed.

其結果係實施例1~16之熱傳導性片材中任一種均可良好的視覺辨認藉由噴墨印刷及雷射印刷之兩者所得之標記,並確認到印刷標記附著性良好。As a result, any of the thermally conductive sheets of Examples 1 to 16 was able to visually recognize the marks obtained by both inkjet printing and laser printing, and confirmed that the printed mark adhesion was good.

(7) 體積電阻(7) Volume resistance

測定各實施例及各比較例之熱傳導性片材之體積電阻(R)。The volume resistance (R) of the thermally conductive sheet of each of the examples and the comparative examples was measured.

即,熱傳導性片材之體積電阻(R)係依據JIS K 6911(熱硬化性塑膠一般試驗方法、2006年版)進行測定。That is, the volume resistance (R) of the thermally conductive sheet was measured in accordance with JIS K 6911 (General Test Method for Thermosetting Plastics, 2006 Edition).

將其結果示於表1~表3。The results are shown in Tables 1 to 3.

(8) 絕緣破壞試驗(JIS C 2110(2010年版))(8) Insulation failure test (JIS C 2110 (2010 edition))

對於由各實施例及各比較例獲得之熱傳導性片材,依據JIS C 2110(2010年版)測定絕緣破壞電壓。The dielectric breakdown voltage was measured in accordance with JIS C 2110 (2010 edition) for the thermally conductive sheets obtained in the respective examples and comparative examples.

即,絕緣破壞電壓係依據JIS C 2110-2(2010年版)之「固體電氣絕緣材料-絕緣破壞之強度之試驗方法-第2部:施加直流電壓之試驗」之記載,藉由升壓速度為1000 V/s之短時間(急速升壓)試驗進行測定。That is, the dielectric breakdown voltage is based on JIS C 2110-2 (2010 edition), "Test method for strength of dielectric electrical insulation - Insulation damage - Part 2: Test for applying DC voltage", A short time (rapid boost) test of 1000 V/s was performed.

將其結果示於表1~表3。The results are shown in Tables 1 to 3.

(9) 玻璃轉移點(9) Glass transfer point

對於由各實施例及各比較例獲得之熱傳導性片材測定玻璃轉移點。The glass transition point was measured about the heat conductive sheet obtained from each Example and each comparative example.

即,藉由動態黏彈性測定裝置(型號:DMS6100、SEICO Electronics industrial公司製造),以升溫速度1℃/分鐘、頻率10赫茲,對熱傳導性片材進行分析。In other words, the thermal conductive sheet was analyzed by a dynamic viscoelasticity measuring apparatus (model: DMS6100, manufactured by SEICO Electronics Industrial Co., Ltd.) at a temperature increase rate of 1 ° C/min and a frequency of 10 Hz.

根據所得之資料,以tanδ之峰值之形式求出玻璃轉移點。Based on the obtained data, the glass transition point was obtained in the form of the peak of tan δ.

將其結果示於表1~表3。The results are shown in Tables 1 to 3.

(10) 質量減少測量(10) Quality reduction measurement

藉由使用熱質量分析裝置之熱質量分析(升溫速度10℃/分鐘、氮氣環境下),依據JIS K 7120測定由各實施例及各比較例獲得之熱傳導性片材之5%質量減少溫度。The 5% mass reduction temperature of the thermally conductive sheet obtained from each of the examples and the comparative examples was measured in accordance with JIS K 7120 by thermal mass analysis using a thermal mass spectrometer (temperature rising rate: 10 ° C/min, nitrogen atmosphere).

將其結果示於表1~表3。The results are shown in Tables 1 to 3.

(11) 初始黏接力試驗(11) Initial adhesion test A. 對筆記型電腦用封裝基板之初始黏接力試驗A. Initial adhesion test for package substrates for notebook computers

對於各實施例及各比較例之未硬化之熱傳導性片材,實施針對封裝有複數個電子零件之筆記型電腦用封裝基板的初始黏接力試驗(1)及(2)。For the uncured heat conductive sheets of the respective examples and the comparative examples, initial adhesion test (1) and (2) for a package substrate for a notebook computer in which a plurality of electronic components were packaged were carried out.

即,使用包含聚矽氧樹脂之海綿輥,將熱傳導性片材於沿著水平方向之筆記型電腦用封裝基板之表面(封裝有電子零件之側)於80℃(實施例1~8及實施例10~16)或120℃(實施例9)下進行加熱壓接而暫時固定,放置10分鐘後,將筆記型電腦用封裝基板以沿著上下方向之方式進行設置(初始黏接力試驗(2))。That is, using a sponge roll containing a polyoxyxylene resin, the thermally conductive sheet was placed on the surface of the package substrate for notebook computers (the side on which the electronic components were packaged) at 80 ° C (Examples 1 to 8 and implemented). In Example 10 to 16) or 120 ° C (Example 9), the film was fixed by heat and pressure bonding, and after being left for 10 minutes, the notebook substrate for the notebook computer was placed in the vertical direction (initial adhesion test (2) )).

繼而,將筆記型電腦用封裝基板以熱傳導性片材指向下側之方式(即以自剛暫時固定後之狀態進行上下反轉之方式)進行設置(初始黏接力試驗(1))。Then, the package substrate for the notebook computer is placed such that the thermally conductive sheet is directed to the lower side (that is, the upper and lower sides are reversed from the state immediately after being temporarily fixed) (initial adhesion test (1)).

並且,上述初始黏接力試驗(1)及初始黏接力試驗(2)中,根據下述基準對熱傳導性片材進行評價。將其結果示於表1~表3。Further, in the initial adhesion test (1) and the initial adhesion test (2), the thermally conductive sheet was evaluated in accordance with the following criteria. The results are shown in Tables 1 to 3.

<基準><benchmark>

○:確認到熱傳導性片材未自筆記型電腦用封裝基板脫落。○: It was confirmed that the thermally conductive sheet did not fall off from the package substrate for the notebook computer.

×:確認到熱傳導性片材自筆記型電腦用封裝基板脫落。x: It was confirmed that the thermally conductive sheet was peeled off from the package substrate for the notebook computer.

B. 針對不鏽鋼基板之初始黏接力試驗B. Initial adhesion test for stainless steel substrates

對於各實施例及各比較例之未硬化之熱傳導性片材,以與上述相同之方式實施針對不鏽鋼基板(SUS304製)之初始黏接力試驗(1)及(2)。The initial adhesion test (1) and (2) for a stainless steel substrate (manufactured by SUS304) were carried out in the same manner as above for the uncured heat conductive sheets of the respective examples and the comparative examples.

並且,於上述初始黏接力試驗(1)及初始黏接力試驗(2)中,根據下述基準對熱傳導性片材進行評價。將其結果示於表1~表3。Further, in the initial adhesion test (1) and the initial adhesion test (2), the thermally conductive sheet was evaluated in accordance with the following criteria. The results are shown in Tables 1 to 3.

<基準><benchmark>

○:確認到熱傳導性片材未自不鏽鋼基板脫落。○: It was confirmed that the thermally conductive sheet did not fall off from the stainless steel substrate.

×:確認到熱傳導性片材自不鏽鋼基板脫落。×: It was confirmed that the thermally conductive sheet fell off from the stainless steel substrate.

(12)氮化硼粒子之配向角度(α)(12) Orientation angle of boron nitride particles (α)

藉由剖面拋光儀(CP)將熱傳導性片材沿著厚度方向進行切割加工,將由此出現之剖面藉由掃描型電子顯微鏡(SEM)以100~2000倍拍攝照片,根據所得之SEM照片(參照圖3~圖7),取得氮化硼粒子之長邊方向(LD)相對於熱傳導性片材之面方向(SD)的傾斜角(α),以其平均值之形式算出氮化硼粒子之配向角度(α)。The heat conductive sheet is cut along the thickness direction by a profile polishing machine (CP), and the resulting cross section is photographed by a scanning electron microscope (SEM) at 100 to 2000 times, according to the obtained SEM photograph (refer to 3 to 7), the inclination angle (α) of the longitudinal direction (LD) of the boron nitride particles with respect to the plane direction (SD) of the thermally conductive sheet is obtained, and the boron nitride particles are calculated as the average value thereof. Orientation angle (α).

將其結果示於表1~表3。The results are shown in Tables 1 to 3.

(13) 樹脂成分之動黏度(13) Dynamic viscosity of resin component

藉由依據JIS K 7233(泡黏度計法)之動黏度試驗,測定各實施例及各比較例中所用之樹脂成分之動黏度。The dynamic viscosity of the resin component used in each of the examples and the comparative examples was measured by a dynamic viscosity test in accordance with JIS K 7233 (bubble viscosity meter method).

即,首先使樹脂成分及標準品以固體成分濃度為40質量%之方式於溫度25±0.5℃下溶解於溶劑(丁基卡必醇),而分別製備樹脂成分樣品及標準樣品。再者,標準樣品根據其動黏度而分為A5~A1、A~Z、及Z1~Z10,與該等相對應之動黏度處於0.005×10-4 m2 /s~1066×10-4 m2 /s之範圍內。Specifically, the resin component and the standard product were first dissolved in a solvent (butyl carbitol) at a temperature of 25 ± 0.5 ° C at a solid concentration of 40% by mass to prepare a resin component sample and a standard sample. Furthermore, the standard samples are classified into A5~A1, A~Z, and Z1~Z10 according to their dynamic viscosity, and the corresponding dynamic viscosity is 0.005×10 -4 m 2 /s~1066×10 -4 m. Within the range of 2 / s.

繼而,將樹脂成分樣品中之泡之上升速度、與標準樣品(動黏度為已知)中之泡之上升速度進行比較,藉由判定上升速度一致之標準樣品的動黏度為樹脂成分之動黏度,從而測定各樹脂成分之動黏度。Then, the rising speed of the bubble in the resin component sample is compared with the rising speed of the bubble in the standard sample (the known dynamic viscosity is known), and the dynamic viscosity of the standard sample having the same rising speed is determined as the dynamic viscosity of the resin component. Thus, the dynamic viscosity of each resin component was measured.

將其結果示於表1~表3。The results are shown in Tables 1 to 3.

表1Table 1

表2Table 2

表3table 3

表1~表3中之各成分中之數值於未特別記載之情形時,表示g數。The numerical values in the respective components in Tables 1 to 3 indicate the number of g unless otherwise specified.

再者,於表1~表3之氮化硼粒子之欄中,上段之數值為氮化硼粒子之調配質量(g),中段之數值為熱傳導性片材中氮化硼粒子相對於除硬化劑外之固體成分(即氮化硼粒子與環氧樹脂或聚乙烯之固體成分)之總體積的體積百分率(體積%),下段之數值為氮化硼粒子相對於熱傳導性片材之固體成分(即氮化硼粒子與環氧樹脂及硬化劑之固體成分)之總體積的體積百分率(體積%)。Furthermore, in the column of boron nitride particles in Tables 1 to 3, the value of the upper stage is the blending mass (g) of the boron nitride particles, and the value of the middle stage is the boron nitride particle in the thermally conductive sheet relative to the hardening. The volume fraction (% by volume) of the total volume of the solid component outside the agent (ie, the solid content of the boron nitride particles and the epoxy resin or polyethylene), and the value of the lower segment is the solid content of the boron nitride particles relative to the thermally conductive sheet. (volume percentage (% by volume) of the total volume of the boron nitride particles and the solid content of the epoxy resin and the hardener).

又,表1~表3之各成分中,對於附※符號之成分,以下記載其詳細內容。In addition, among the components of Tables 1 to 3, the details of the components with the symbols of ※ are described below.

PT-110※1 :商品名、板狀氮化硼粒子、平均粒徑(光散射法)45 μm、日本邁圖高新材料公司製造PT-110 *1 : Trade name, plate-shaped boron nitride particles, average particle size (light scattering method) 45 μm, manufactured by Japan Momentive Advanced Materials Co., Ltd.

UHP-1※2 :商品名:SHOBN UHP-1、板狀氮化硼粒子、平均粒徑(光散射法)9 μm、昭和電工公司製造UHP-1 *2 : Product name: SHOBN UHP-1, plate-shaped boron nitride particles, average particle size (light scattering method) 9 μm, manufactured by Showa Denko

環氧樹脂A※3 :OGSOL EG(商品名)、雙芳基茀型環氧樹脂、半固態、環氧當量294 g/eqiv.、軟化溫度(環球法)47℃、熔融黏度(80℃)1360 mPa‧s、大阪氣體化學(Osaka Gas Chemicals)公司製造Epoxy Resin A *3 : OGSOL EG (trade name), bisaryl fluorene epoxy resin, semi-solid, epoxy equivalent 294 g/eqiv., softening temperature (ring and ball method) 47 ° C, melt viscosity (80 ° C) 1360 mPa‧s, manufactured by Osaka Gas Chemicals

環氧樹脂B※4 :JER828(商品名)、雙酚A型環氧樹脂、液態、環氧當量184~194 g/eqiv.、軟化溫度(環球法)未達25℃、熔融黏度(80℃)70 mPa‧s、日本環氧樹脂(Japan Epoxy Resins)公司製造Epoxy resin B ※4 : JER828 (trade name), bisphenol A epoxy resin, liquid, epoxy equivalent 184~194 g/eqiv., softening temperature (ring and ball method) less than 25 ° C, melt viscosity (80 ° C ) 70 mPa‧s, made by Japan Epoxy Resins

環氧樹脂C※5 :JER1002(商品名)、雙酚A型環氧樹脂、固態、環氧當量600~700 g/eqiv.、軟化溫度(環球法)78℃、熔融黏度(80℃)10000 mPa‧s以上(測定極限以上)、日本環氧樹脂公司製造Epoxy resin C ※5 : JER1002 (trade name), bisphenol A epoxy resin, solid, epoxy equivalent 600~700 g/eqiv., softening temperature (ring and ball method) 78°C, melt viscosity (80°C) 10000 mPa‧s or more (above the measurement limit), manufactured by Japan Epoxy Resin Co., Ltd.

環氧樹脂D※6 :EPPN-501HY(商品名)、三苯基甲烷型環氧樹脂、固態、環氧當量163~175 g/eqiv.、軟化溫度(環球法)57~63℃、日本化藥公司製造Epoxy resin D ※6 : EPPN-501HY (trade name), triphenylmethane epoxy resin, solid state, epoxy equivalent 163~175 g/eqiv., softening temperature (ring and ball method) 57~63°C, Nipponization Manufactured by a pharmaceutical company

硬化劑※7 :Curezol 2PZ(商品名、四國化成公司製造)之5質量%甲基乙基酮溶液Hardener *7 : 5 mass% methyl ethyl ketone solution of Curezol 2PZ (trade name, manufactured by Shikoku Chemicals Co., Ltd.)

硬化劑※8 :Curezol 2P4MHZ-PW(商品名、四國化成公司製造)之5質量%甲基乙基酮分散液Hardener *8 : 5 mass% methyl ethyl ketone dispersion of Curezol 2P4MHZ-PW (trade name, manufactured by Shikoku Chemicals Co., Ltd.)

聚乙烯※9 :低密度聚乙烯、質量平均分子量(Mw)4000、數量平均分子量(Mn)1700、Aldrich公司製造Polyethylene ※9 : Low density polyethylene, mass average molecular weight (Mw) 4000, number average molecular weight (Mn) 1700, manufactured by Aldrich

再者,上述說明係作為本發明之例示的實施形態而提供,其只不過為例示,並非限定性解釋。該技術領域之業者應明白,本發明之變形例亦包含於後述之申請專利範圍中。In addition, the above description is provided as an exemplified embodiment of the present invention, which is merely illustrative and not limiting. It should be understood by those skilled in the art that modifications of the present invention are also included in the scope of the claims described below.

1...熱傳導性片材1. . . Thermally conductive sheet

1A...壓製片材1A. . . Pressed sheet

1B...分割片材1B. . . Split sheet

1C...積層片材1C. . . Laminated sheet

2...氮化硼粒子2. . . Boron nitride particles

3...樹脂成分3. . . Resin composition

4...脫模膜4. . . Release film

10...型號I之試驗裝置10. . . Model I test device

11...第1平板11. . . First tablet

12...第2平板12. . . 2nd tablet

13...心軸13. . . Mandrel

14...止動部14. . . Stop

LD...長邊方向LD. . . Long side direction

SD...面方向SD. . . Face direction

TD...厚度方向TD. . . Thickness direction

α...配向角度α. . . Orientation angle

圖1係表示本發明之熱傳導性片材之一實施形態的立體圖。Fig. 1 is a perspective view showing an embodiment of a thermally conductive sheet of the present invention.

圖2係用以說明圖1所示之熱傳導性片材之製造方法的步驟圖,且2 is a step diagram for explaining a method of manufacturing the thermally conductive sheet shown in FIG. 1, and

(a) 表示對混合物或積層片材進行熱壓之步驟、(a) indicates the step of hot pressing the mixture or laminated sheet,

(b) 表示將壓製片材分割成複數個之步驟、(b) shows the step of dividing the pressed sheet into a plurality of pieces,

(c) 係表示積層分割片材之步驟。(c) is a step of displaying a laminated sheet.

圖3係表示實施例1之硬化後之熱傳導性片材的沿著厚度方向之剖面的SEM照片之圖像處理圖。3 is an image processing diagram showing an SEM photograph of a cross section along the thickness direction of the thermally conductive sheet after curing in Example 1. FIG.

圖4係表示實施例3之硬化後之熱傳導性片材的沿著厚度方向之剖面的SEM照片之圖像處理圖。4 is an image processing diagram showing an SEM photograph of a cross section along the thickness direction of the thermally conductive sheet after curing in Example 3. FIG.

圖5係表示實施例5之硬化後之熱傳導性片材的沿著厚度方向之剖面的SEM照片之圖像處理圖。Fig. 5 is an image processing diagram showing an SEM photograph of a cross section along the thickness direction of the thermally conductive sheet after curing in Example 5.

圖6係表示比較例1之硬化後之熱傳導性片材的沿著厚度方向之剖面的SEM照片之圖像處理圖。Fig. 6 is an image processing diagram showing an SEM photograph of a cross section along the thickness direction of the thermally conductive sheet after curing of Comparative Example 1.

圖7係表示比較例2之硬化後之熱傳導性片材的沿著厚度方向之剖面的SEM照片之圖像處理圖。Fig. 7 is an image processing diagram showing an SEM photograph of a cross section along the thickness direction of the thermally conductive sheet after curing of Comparative Example 2.

圖8係表示實施例1~4、比較例1及2中的氮化硼粒子之含有比例與熱傳導性片材之熱導率之關係的圖表。Fig. 8 is a graph showing the relationship between the content ratio of boron nitride particles in Examples 1 to 4 and Comparative Examples 1 and 2 and the thermal conductivity of the thermally conductive sheet.

圖9係表示耐彎曲性試驗之型號I的試驗裝置(耐彎曲性試驗前)之立體圖。Fig. 9 is a perspective view showing a test device (before the bending resistance test) of the model I of the bending resistance test.

圖10係表示耐彎曲性試驗之型號I的試驗裝置(耐彎曲性試驗中途)之立體圖。Fig. 10 is a perspective view showing a test device (in the middle of the bending resistance test) of the model I of the bending resistance test.

1...熱傳導性片材1. . . Thermally conductive sheet

2...氮化硼粒子2. . . Boron nitride particles

3...樹脂成分3. . . Resin composition

LD...長邊方向LD. . . Long side direction

SD...面方向SD. . . Face direction

TD...厚度方向TD. . . Thickness direction

α...配向角度α. . . Orientation angle

Claims (7)

一種熱傳導性片材,其特徵在於:其係含有板狀氮化硼粒子及樹脂成分者,且氮化硼粒子之含有比例為35體積%以上,上述氮化硼粒子相對於上述熱傳導性片材之配向角度為25度以下,其係以上述氮化硼粒子之長邊方向與相對於上述熱傳導性片材之厚度方向之正交方向所成角度的算術平均之形式算出,上述熱傳導性片材之相對於上述厚度方向之上述正交方向的熱導率為4W/m‧K以上。 A thermally conductive sheet containing plate-like boron nitride particles and a resin component, and a boron nitride particle content ratio of 35% by volume or more, and the boron nitride particles described above with respect to the heat conductive sheet The alignment angle is 25 degrees or less, and is calculated as an arithmetic mean of the angle between the longitudinal direction of the boron nitride particles and the direction perpendicular to the thickness direction of the thermally conductive sheet, and the thermally conductive sheet is used. The thermal conductivity in the orthogonal direction with respect to the thickness direction is 4 W/m ‧ K or more. 如請求項1之熱傳導性片材,其中上述氮化硼粒子藉由光散射法測定之平均粒徑為20μm以上。 The thermally conductive sheet according to claim 1, wherein the boron nitride particles have an average particle diameter of 20 μm or more as measured by a light scattering method. 如請求項1之熱傳導性片材,其中於依據JIS K 5600-5-1之圓筒形心軸法之耐彎曲性試驗中,藉由下述試驗條件評價上述熱傳導性片材時,未於上述熱傳導性片材上觀察到斷裂:試驗條件試驗裝置:型號I心軸:直徑10mm彎曲角度:90度以上上述熱傳導性片材之厚度:0.3mm。 The heat conductive sheet according to claim 1, wherein in the bending resistance test according to the cylindrical mandrel method according to JIS K 5600-5-1, when the heat conductive sheet is evaluated by the following test conditions, A fracture was observed on the above thermally conductive sheet: Test condition test apparatus: Model I mandrel: diameter 10 mm Bending angle: 90 degrees or more The thickness of the above thermally conductive sheet: 0.3 mm. 如請求項1之熱傳導性片材,其中於樹脂成分中,藉由依據JIS K 7233(泡黏度計法)之動黏度試驗(溫度:25℃±0.5℃、溶劑:丁基卡必醇、固體 成分濃度:40質量%)而測定的動黏度為0.22×10-4 ~2.00×10-4 m2 /s。The thermally conductive sheet of claim 1, wherein the resin component is subjected to a dynamic viscosity test according to JIS K 7233 (bubble viscosity meter method) (temperature: 25 ° C ± 0.5 ° C, solvent: butyl carbitol, solid The component concentration: 40% by mass) and the measured dynamic viscosity was 0.22 × 10 -4 to 2.00 × 10 -4 m 2 /s. 如請求項1至4中任一項之熱傳導性片材,其係以下述步驟製備:將上述氮化硼粒子及上述樹脂成分混合所製備之混合物進行熱壓以製備壓製片材之步驟,將上述壓製片材分割成複數個分割片材之分割步驟,將上述複數個分割片材積層以製備積層片材之積層步驟,及將上述積層片材熱壓之熱壓步驟。 The thermally conductive sheet according to any one of claims 1 to 4, which is prepared by the steps of: hot pressing a mixture prepared by mixing the above boron nitride particles and the above resin component to prepare a pressed sheet, The step of dividing the pressed sheet into a plurality of divided sheets, the step of laminating the plurality of divided sheets to form a laminated sheet, and the step of hot pressing the laminated sheet. 如請求項5之熱傳導性片材,其係藉由反覆實施上述分割步驟、上述積層步驟及上述熱壓步驟之一系列步驟而製備,該等步驟之重複次數為2~7次。 The thermally conductive sheet according to claim 5, which is prepared by repeatedly performing the above-described dividing step, the laminating step and the hot pressing step, and the number of repetitions of the steps is 2 to 7 times. 如請求項1之熱傳導性片材,其中上述熱傳導性片材之上述正交方向之熱導率相對於上述熱傳導性片材之上述厚度方向之熱導率之比為4以上、20以下。 The thermally conductive sheet according to claim 1, wherein a ratio of a thermal conductivity in the orthogonal direction of the thermally conductive sheet to a thermal conductivity in the thickness direction of the thermally conductive sheet is 4 or more and 20 or less.
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US20110259569A1 (en) 2011-10-27
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