TWI492267B - - Google Patents

Info

Publication number
TWI492267B
TWI492267B TW102128789A TW102128789A TWI492267B TW I492267 B TWI492267 B TW I492267B TW 102128789 A TW102128789 A TW 102128789A TW 102128789 A TW102128789 A TW 102128789A TW I492267 B TWI492267 B TW I492267B
Authority
TW
Taiwan
Application number
TW102128789A
Other languages
Chinese (zh)
Other versions
TW201432775A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=48314825&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI492267(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed filed Critical
Publication of TW201432775A publication Critical patent/TW201432775A/en
Application granted granted Critical
Publication of TWI492267B publication Critical patent/TWI492267B/zh

Links

TW102128789A 2013-02-05 2013-08-12 Plasma processing device TW201432775A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310046172.8A CN103107059B (en) 2013-02-05 2013-02-05 Plasma treatment appts

Publications (2)

Publication Number Publication Date
TW201432775A TW201432775A (en) 2014-08-16
TWI492267B true TWI492267B (en) 2015-07-11

Family

ID=48314825

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102128789A TW201432775A (en) 2013-02-05 2013-08-12 Plasma processing device

Country Status (2)

Country Link
CN (1) CN103107059B (en)
TW (1) TW201432775A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104752565B (en) * 2015-04-09 2017-01-04 江苏盎华光伏工程技术研究中心有限公司 Multistage blowing type silicon wafer texturing processing device and control method thereof
CN113385489B (en) * 2021-07-26 2022-05-20 深圳市傲月光电科技有限公司 Plasma cleaning machine convenient for replacing vacuum cavity

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2937841Y (en) * 2005-11-01 2007-08-22 雍占锋 Microway plasma burner
TW200742506A (en) * 2006-02-17 2007-11-01 Noritsu Koki Co Ltd Plasma generation apparatus and work process apparatus
TW200932936A (en) * 2007-12-06 2009-08-01 Intevac Inc System and method for dual-sided sputter etch of substrates
CN101481793B (en) * 2008-12-26 2010-09-01 上海拓引数码技术有限公司 Large area microwave plasma CVD device
TW201204866A (en) * 2010-07-16 2012-02-01 Asiatree Technology Co Ltd Thin film deposition apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0997926B1 (en) * 1998-10-26 2006-01-04 Matsushita Electric Works, Ltd. Plasma treatment apparatus and method
WO2007086875A1 (en) * 2006-01-30 2007-08-02 Amarante Technologies, Inc. Work processing system and plasma generating apparatus
DE112012002786A5 (en) * 2011-07-01 2014-03-20 Reinhausen Plasma Gmbh Apparatus and method for the plasma treatment of surfaces
CN203179834U (en) * 2013-02-05 2013-09-04 珠海宝丰堂电子科技有限公司 Plasma processing device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2937841Y (en) * 2005-11-01 2007-08-22 雍占锋 Microway plasma burner
TW200742506A (en) * 2006-02-17 2007-11-01 Noritsu Koki Co Ltd Plasma generation apparatus and work process apparatus
TW200932936A (en) * 2007-12-06 2009-08-01 Intevac Inc System and method for dual-sided sputter etch of substrates
CN101481793B (en) * 2008-12-26 2010-09-01 上海拓引数码技术有限公司 Large area microwave plasma CVD device
TW201204866A (en) * 2010-07-16 2012-02-01 Asiatree Technology Co Ltd Thin film deposition apparatus

Also Published As

Publication number Publication date
TW201432775A (en) 2014-08-16
CN103107059B (en) 2015-09-30
CN103107059A (en) 2013-05-15

Similar Documents

Publication Publication Date Title
AP2016009275A0 (en)
BR112016013465A2 (en)
BR102016010778A2 (en)
BR112014017733A2 (en)
BR112014017739A2 (en)
BR112014018502A2 (en)
BR122022020319A2 (en)
BR112014018480A2 (en)
BR112014017765A2 (en)
BR112014017855A2 (en)
BR112014017669A2 (en)
BR112016005705A2 (en)
BR112014018468A2 (en)
BR112014018207A2 (en)
BR112014017901A2 (en)
BR112016011034A2 (en)
BR112016014125A2 (en)
BR112014017722A2 (en)
BR112014018483A2 (en)
BR112014017794A2 (en)
BR112014017653A2 (en)
BR112014017601A2 (en)
BR112016013580A2 (en)
BR112016000925A2 (en)
BR112014018353A2 (en)