TWI492267B - - Google Patents
Info
- Publication number
- TWI492267B TWI492267B TW102128789A TW102128789A TWI492267B TW I492267 B TWI492267 B TW I492267B TW 102128789 A TW102128789 A TW 102128789A TW 102128789 A TW102128789 A TW 102128789A TW I492267 B TWI492267 B TW I492267B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310046172.8A CN103107059B (en) | 2013-02-05 | 2013-02-05 | Plasma treatment appts |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201432775A TW201432775A (en) | 2014-08-16 |
TWI492267B true TWI492267B (en) | 2015-07-11 |
Family
ID=48314825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102128789A TW201432775A (en) | 2013-02-05 | 2013-08-12 | Plasma processing device |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN103107059B (en) |
TW (1) | TW201432775A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104752565B (en) * | 2015-04-09 | 2017-01-04 | 江苏盎华光伏工程技术研究中心有限公司 | Multistage blowing type silicon wafer texturing processing device and control method thereof |
CN113385489B (en) * | 2021-07-26 | 2022-05-20 | 深圳市傲月光电科技有限公司 | Plasma cleaning machine convenient for replacing vacuum cavity |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2937841Y (en) * | 2005-11-01 | 2007-08-22 | 雍占锋 | Microway plasma burner |
TW200742506A (en) * | 2006-02-17 | 2007-11-01 | Noritsu Koki Co Ltd | Plasma generation apparatus and work process apparatus |
TW200932936A (en) * | 2007-12-06 | 2009-08-01 | Intevac Inc | System and method for dual-sided sputter etch of substrates |
CN101481793B (en) * | 2008-12-26 | 2010-09-01 | 上海拓引数码技术有限公司 | Large area microwave plasma CVD device |
TW201204866A (en) * | 2010-07-16 | 2012-02-01 | Asiatree Technology Co Ltd | Thin film deposition apparatus |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0997926B1 (en) * | 1998-10-26 | 2006-01-04 | Matsushita Electric Works, Ltd. | Plasma treatment apparatus and method |
WO2007086875A1 (en) * | 2006-01-30 | 2007-08-02 | Amarante Technologies, Inc. | Work processing system and plasma generating apparatus |
DE112012002786A5 (en) * | 2011-07-01 | 2014-03-20 | Reinhausen Plasma Gmbh | Apparatus and method for the plasma treatment of surfaces |
CN203179834U (en) * | 2013-02-05 | 2013-09-04 | 珠海宝丰堂电子科技有限公司 | Plasma processing device |
-
2013
- 2013-02-05 CN CN201310046172.8A patent/CN103107059B/en active Active
- 2013-08-12 TW TW102128789A patent/TW201432775A/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2937841Y (en) * | 2005-11-01 | 2007-08-22 | 雍占锋 | Microway plasma burner |
TW200742506A (en) * | 2006-02-17 | 2007-11-01 | Noritsu Koki Co Ltd | Plasma generation apparatus and work process apparatus |
TW200932936A (en) * | 2007-12-06 | 2009-08-01 | Intevac Inc | System and method for dual-sided sputter etch of substrates |
CN101481793B (en) * | 2008-12-26 | 2010-09-01 | 上海拓引数码技术有限公司 | Large area microwave plasma CVD device |
TW201204866A (en) * | 2010-07-16 | 2012-02-01 | Asiatree Technology Co Ltd | Thin film deposition apparatus |
Also Published As
Publication number | Publication date |
---|---|
TW201432775A (en) | 2014-08-16 |
CN103107059B (en) | 2015-09-30 |
CN103107059A (en) | 2013-05-15 |