TWI485793B - Surface polishing device and surface polishing method - Google Patents

Description

Surface cleaning device and surface cleaning method

BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a surface cleaning apparatus and a surface cleaning method, and more particularly to a cleaning apparatus and a cleaning method for cleaning the substrate, such as overflowing glue, etc., which are applied to the electronics industry.

The cleaning of the surface of the substrate is a technique that is often required in the industry. Especially in the manufacture and processing of various products, it often leaves dirt on the surface of the article, affecting the function or look of the product, and must be removed by various applicable methods. However, with the advancement of electronic manufacturing technology, the size of various electronic products has been gradually reduced, making it more difficult to clean the surface of electronic product substrates.

For example, a so-called Quad Flat Non-leaded Package (QFN package), which is widely used in consumer electronic components, is a packaging method using a lead frame as a substrate. The packaging process mainly comprises: providing a lead frame having a plurality of cells, positioning the wafer in the heat sink portion of the lead frame, connecting the pad of the chip to the pad portion of the lead frame, and covering the lead frame with the packaging material. The surface of the wafer is filled with the encapsulating material to fill the opening portion of the lead frame. After the encapsulation material is hardened, a QFN package electronic component having a plurality of cells is formed. After the finished component is cut, the desired electronic components are obtained.

During the coating and hardening of the encapsulating material, the coating material may overflow beyond the opening of the lead frame to form an "excessive glue" or "overflow glue". In severe cases, the overflow will cover the contact portion of the lead frame, affecting the ohmic contact performance of the contact. Even if the overflow phenomenon is not serious, it is necessary to remove the overflow glue to maintain the performance and aesthetics of the electronic components.

Conventional techniques for the cleaning of such spills are mainly processed by grinding wheels. However, in cleaning spills and similar dirt, the technical problem is that the hardness of the glue or dirt may be higher than the hardness of the substrate. The ability to remove spilled or dirty grinding wheels or other tool surfaces will inevitably remove the surface of the substrate. Conversely, the grinding wheel or other tool surface on the surface of the substrate will not be removed, and the higher hardness spill or dirt cannot be removed. In the above QFN packaging technology, the surface of the lead frame is mainly a heat sink portion. If the thickness of the lead frame is removed by a thickness, it will affect its heat dissipation. In other applications, removing the surface of the device when removing glue or dirt can also damage the performance of the device, making the grinding method impossible to clean the surface.

For the above technical problems, the solution of the prior art includes positioning the surface to be treated, strictly controlling the distance between the surface of the grinding wheel and the surface to be treated, so that the grinding wheel can only remove the dirt on the surface to be treated, but does not damage the surface to be treated. . However, as described above, the hardness of the surface to be treated is generally lower than the hardness of the soil. It is implied that the surface to be treated is inevitably deformed when coating, hardening the encapsulating material, or performing other treatments, particularly heat treatment. The surface to be treated is not flat when the spill or dirt is removed. Therefore, even if the distance between the surface of the grinding wheel and the surface to be treated is strictly controlled, it is difficult to avoid damage to the surface to be treated. Needless to say, the surface of the grinding wheel or other tool is also removed during the grinding process, changing the surface height. The purpose of strictly controlling the surface height is also difficult to achieve.

Another method of cleaning the surface is to spray the surface to be treated with a high speed water column to remove spilled or dirty particles without damaging the surface to be treated. But this kind of technology called "wateriet" is expensive and difficult to apply to inexpensive electronic components. At the same time, due to the glue or dirt to be removed, it is often adhered to materials that do not need to be removed, such as packaging materials, and the viscosity is extremely high. As a result of the high-speed water column flushing, the material that does not need to be removed is also removed while removing the glue or dirt. Still can't get the quality you need.

Not only that, the above method of removing the surface dirt by the grinding wheel generates a large amount of dust; while the water knife removal method requires a large amount of water. Both methods seriously affect the environmental cleanliness and are not conducive to environmental protection.

Therefore, there is a need in the industry for a novel surface cleaning apparatus and method that can remove a table to be processed. The material on the surface, but does not damage the surface to be treated.

There is also a need for a novel surface cleaning apparatus and method that can be used to remove material on a surface to be treated in a simple manner without damaging the surface to be treated.

There is also a need for a novel surface cleaning apparatus and method that reduces environmental pollution caused by removal of material on the surface to be treated.

It is an object of the present invention to provide a novel surface cleaning apparatus and method that removes material on a surface to be treated without damaging the surface to be treated.

It is also an object of the present invention to provide a novel surface cleaning apparatus and method that can be used to remove material on a surface to be treated in a simple manner without damaging the surface to be treated.

It is also an object of the present invention to provide a novel surface cleaning apparatus and method that reduces environmental pollution caused by removal of material on a surface to be treated.

A surface cleaning apparatus according to the present invention includes a substrate positioning device for fixing a surface to be treated; a broom device for continuously sweeping the surface to be treated; and a moving device for making the surface to be treated The broom device is used for relative movement; and a first-class quality cleaning material supply device is provided for supplying the first-class quality cleaning material to the broom surface of the broom device for removing a part of the material on the surface to be treated; wherein the liquid material The cleaning material includes a flowable carrier and at least one particle of high hardness material.

In an embodiment of the invention, the substrate positioning device can be a vacuum chuck. The moving device is configured to move the surface to be treated to the broom surface of the broom device or to move the broom surface of the broom device to the surface to be treated and to move the two relative to each other. The mobile device can be mounted on the broom device, the positioning device, or both.

The broom device provides a continuous broom surface function and can be a rotary broom device, flat type Broom device or rotary broom device. The broom material is continuously broomed at a high speed on the surface to be treated. The broom material can be a soft strip of material having a substantial length. In the embodiment of the invention, a non-woven fabric is used. The broom device can also be a wheeled material having a soft surface.

The fluid cleaning material supply device is a device that controls the supply of liquid. The flowable carrier of the fluid cleaning material is preferably a liquid or viscous object. Water is used in the embodiment of the invention. As for the high hardness material particles, it is usually a material having a hardness of 8 or more and a particle size between #500 and #1500. Tantalum carbide is used in the embodiment of the present invention to obtain an excellent effect. The ratio of the high hardness material particles to the flowable carrier may be between about 10 g/l and 50 g/l, preferably between 15 g/l and 25 g/l.

The surface cleaning apparatus of the present invention may further comprise a cleaning device for cleaning the surface to be treated from which the material to be treated has been removed. The surface cleaning apparatus of the present invention may further comprise a drying device for drying the treated or cleaned surface to be treated. Further, the surface cleaning apparatus of the present invention may further comprise a recovery means for recovering the used liquid cleaning material.

The surface cleaning method according to the present invention comprises the steps of: fixing a surface to be treated; applying a first-class quality cleaning material to the surface to be treated; and continuously sweeping the surface to be treated with a broom material while applying: wherein the liquid is The cleaning material includes a flowable carrier and at least one particle of high hardness material.

The surface cleaning method of the present invention may further comprise the step of relatively moving the surface to be treated with the broom surface of the broom material.

In an embodiment of the invention, the surface to be treated may be secured by a positioning device or a moving positioning device. If it is a mobile positioning device, in addition to fixing, the surface to be treated can be moved to move relative to the broom surface of the broom material. Of course, the relative motion can also utilize the side of the broom material. Or in the manner of moving the surface to be treated and the broom material at the same time.

In an embodiment of the invention, the broom material may also be rotated by a broom, a flat broom or a rotating broom, or a combination of the above, to sweep the surface to be treated.

The method of the present invention may further comprise the steps of washing the cleaned surface to be treated, drying the surface to be treated and other surfaces, and/or recovering the liquid cleaning material and removing the material.

The flowable carrier of the fluid cleaning material is preferably a liquid or viscous object. Water is used in the embodiment of the invention. The high hardness material particles may be materials having a hardness of 8 or more and a particle size between #500 and #1500. In the embodiment of the invention, tantalum carbide is used. The ratio of the high hardness material particles to the flowable carrier may be between about 10 g/l and 50 g/l, preferably between 15 g/l and 25 g/l.

The apparatus and method of the present invention will be described below by way of examples. It is to be understood that the following description of the embodiments of the invention is intended to be illustrative of the embodiments of the invention Therefore, it cannot be used to limit the scope of the invention.

A surface cleaning apparatus according to the present invention includes a substrate positioning device for fixing a surface to be treated; a broom device for continuously sweeping the surface to be treated; and a moving device for making the surface to be treated The broom device is used for relative movement; and a first-class quality cleaning material supply device is provided to supply a first-class quality cleaning material to the broom surface of the broom device for removing material on the surface to be treated; wherein the liquid cleaning The material includes a flowable carrier and at least one high hardness material particle; and the substrate movement positioning device can transfer the surface to be treated to the broom surface of the broom device.

In an embodiment of the invention, the substrate positioning device is used to secure the surface to be treated, and thus any substrate positioning device commonly used in the industry can be utilized. The positioning device can be a vacuum chuck, a clamp or a clamping mechanism. The moving device is configured to move the surface to be treated and the broom device to move the surface to be processed Move to the broom surface of the broom device or move the broom surface of the broom device to the surface to be treated and cause the two to move relative to each other (referred to as the cleaning position). The mobile device can of course also use an automatic or manual type mobile device commonly used in the industry, and the application can be a screw, a pulley, a slide driving device and the like. The mobile device can be mounted on the broom device, the positioning device, or both. The above two are common equipments in the industry, and their detailed structure, composition and operation are not mentioned here.

The broom device provides a continuous broom surface function and can be a rotary broom device, a flat broom device or a rotary broom device. The broom device includes a broom material which may be a soft strip of material having a substantial length. The material to be applied is not limited as long as it can drive the liquid cleaning material to flow on the surface to be treated. Suitable materials include: rubber, plastic, resin, wood, plant fiber, animal fiber, animal body hair, rayon, composite fiber, paper, and composite materials formed between these materials or other materials. Among them, non-woven fabric is a particularly applicable example because it is easy to obtain and low in cost. If a rotary broom device or a rotary broom device is used, one end of the broom material can be fixed to the surface of a wheel, and the wheel rotates at a high speed to sweep the broom material from the wheel surface of the wheel. The surface to be treated (rotary type broom device) or the broom material is swept from the axial surface of the wheel (the surface perpendicular to the rotating shaft) to the surface to be treated (rotary type broom device). The rotational speed of the rotary broom device can be typically 800 M/min., while the rotational speed of the rotary broom device can typically be 1,725 M/min. In the case of a flat type broom device, one end of the broom material can be fixed to a fixed rod or a plurality of fixed rods, so that the fixed rod moves continuously or back and forth at high speed, and the free end of the broom material is continuously or swept back and forth.拂 The surface to be treated. The moving speed of the flat type broom device fixing rod can usually be 300 M/min. The broom device can also be a wheeled material having a soft surface. Suitable materials are as described above.

The liquid cleaning material supply device is used for continuously supplying liquid cleaning materials, so it can be any liquid supply device commonly used in the industry, for example, a device capable of controlling the supply of liquid, including a storage tank, a conveying pipe, A control drive and at least one supply head. The supply head can be a tubular opening, a sprinkler head or a nozzle. Depending on the composition of the fluid cleaning material, the supply rate of the fluid cleaning material is between about 300 ml/min. and 800 ml/min. However, it is not a technical limitation, and the person in the industry can determine by experiment based on the composition of the liquid cleaning material and the characteristics of the surface to be treated and the material to be removed. As for the liquid cleaning material supply device, since it is a known device, the detailed structure, composition and operation thereof need not be described here.

The fluid cleaning material comprises a flowable carrier and at least one particle of high hardness material. Wherein, the flowable carrier is preferably a liquid or viscous object and can be formed of any suitable material or material composition. Water is used in the embodiment of the invention. Because it is easy to obtain, low in cost, and easy to recycle, it will not pollute the environment. Other materials such as ethanol, oil bodies, including plant-derived oil bodies and mineral-derived oil bodies, as well as compositions of the above materials, can be used in the present invention. As for the high hardness material particles, there is no limitation in the present invention. In general, a material having a hardness of 8 or more and a material having a particle size between #500 and #1500 is suitable for use in the present invention. Suitable materials include: various metal oxides, carbonates, tannins, tantalum carbide, and silicon carbide, walnut sand, and the like. Among them, tantalum carbide is used in the embodiment of the invention to obtain an excellent effect. In terms of concentration, in general, the ratio of the high hardness material particles to the flowable carrier may be between about 10 g/l and 50 g/l, preferably between 15 g/l and 25 g/l. However, this concentration is not a technical limitation. If the content of the high hardness material is too low, the effect of cleaning will be degraded, and if the content is too high, the surface to be treated may be damaged. This industry can be determined experimentally based on the characteristics of the liquid cleaning particles and the surface to be treated and the material to be removed. The point is because the fluid cleaning material of the present invention comprises a flowable carrier and particles of high hardness material. There are advantages to improving the tolerance of the application. Further, the high hardness material particles preferably exhibit a state of being suspended in the flowable carrier when used to enhance the cleaning effect.

The surface cleaning device of the present invention may further comprise a cleaning device for cleaning the removed to be processed The surface to be treated of the material. The cleaning device can be a cleaning device commonly used in the industry to remove substances left on the surface to be treated and other surfaces during the cleaning process. The cleaning device is typically a device that supplies cleaning liquid, provides cleaning liquid to the surface to be cleaned, and removes surface material by flushing, dissolving, and the like. Further, the surface cleaning device of the present invention may further comprise a drying device for drying the treated or cleaned surface to be treated. The drying device can be an airflow generating device to supply airflow to the surface to be treated to remove residual cleaning fluid, flowable carrier, particles of high hardness material, and/or material removed.

The surface cleaning apparatus of the present invention may further comprise a recovery unit for recovering the used fluid cleaning material. The recycling device can collect the used liquid cleaning material by gravity or the like for subsequent processing. In the examples of the present invention, water is used as the flowable carrier, and tantalum carbide is used as the particles of the high hardness material. If the material to be treated is an encapsulating material, the niobium carbide and the encapsulating material contained in the recovered liquid cleaning material are different in specific gravity and do not dissolve in water, so that they are easily separated after recovery. The separated high-hardness material particles can be easily treated and reused. Therefore, the present invention can minimize the contamination of the environment by surface cleaning.

The surface cleaning method according to the present invention comprises the steps of: fixing a surface to be treated; applying a first-class quality cleaning material to the surface to be treated; and continuously sweeping the surface to be treated with a broom material while applying: wherein the liquid is The cleaning material includes a flowable carrier and at least one particle of high hardness material.

The surface cleaning method of the present invention may further comprise the step of relatively moving the surface to be treated with the broom surface of the broom material.

In an embodiment of the invention, the surface to be treated may be secured by a positioning device or a moving positioning device. If it is a mobile positioning device, in addition to fixing, the surface to be treated can be moved to The broom surface of the crucible material is moved relative to each other. Of course, the relative motion can also be implemented by moving the broom material or by simultaneously moving the surface to be treated and the broom material.

In the example of the present invention, the apparatus, material, and characteristics of the broom material and the fluid cleaning material are as described above. The broom material can also be rotated by a broom, a flat broom or a rotating broom, or a combination of the above, to sweep the surface to be treated. Also as above.

The method of the present invention may further comprise the steps of washing the cleaned surface to be treated, drying the surface to be treated and other surfaces, and/or recovering the liquid cleaning material and removing the material. The embodiment is also as described above.

Surface cleaning suitable for the surface cleaning apparatus and surface cleaning method of the present invention includes various industrially produced products. The apparatus and method of the present invention can provide effective removal without compromising the advantages of the surface to be treated, as it is required to remove a higher hardness material from a lower hardness surface. When applied to the electronics industry, the surface to be treated may be a substrate surface, including substrates of various materials, such as a germanium substrate, a glass substrate, a metal substrate, a plastic, a rubber substrate, and the like. The material to be removed includes materials, impurities, dirt, and even other substrate or substrate materials attached to the substrate to be processed. In the above QFN package, the surface to be treated is the surface of the lead frame, and the material to be removed is overflowed and dirty. In other processes or packaging methods, the surface to be treated may be any surface of the device or component produced in any of the process steps, and the material to be removed is any material or material attached to the surface.

Further, since the present invention uses the broom device and the liquid cleaning material supply device, the flatness of the surface to be treated is not strictly limited, that is, it is not strictly controlled. In other words, the substrate which has been subjected to the heat treatment and hardening by the application of the encapsulating material can be removed, and the present invention can remove the glue and dirt on the surface of the substrate with a simple fixing. It does not damage the surface of the substrate.

Example

Fig. 1 is a view showing an embodiment of a surface cleaning apparatus of the present invention used in cleaning a substrate after QFN packaging. The figure shows that the substrate 10 to be processed is placed on a vacuum chuck 21 which is coupled to a vacuum generator 23 by a line 22. On the vacuum chuck 21, the line 22 and the compressor vacuum generator 23 form the substrate holding device 20 of the present invention. In the present example, the broom device 40 includes an axle 41, a reel 42, a broom material 43 having one end fixed to the rotating surface of the reel, and a driving device (not shown) for driving the reel 42. The driving device drives the rotating wheel to rotate along the rotating shaft 41, and drives the broom material 43 to sweep the surface of the lower substrate 10 at a high speed.

In the present embodiment, the position of the broom device 40 is fixed. The moving device 30 includes a drive wheel 31, a belt 32, an axle 33, and a drive motor (not shown). A plurality of positioning seats 34 are provided on the belt 32 for fixing the vacuum chuck 21 of the fixing device 20. When the drive motor rotates, the wheel shaft 33 is rotated to move the positioning seat 34 and the vacuum chuck 21 thereon, together with the substrate 10 to be processed, to the broom surface of the broom material 43. The broom surface represents the area covered by the position at which the free end of the broom material 43 can be contacted, and is not simply a mathematical "plane". In the present example, when cleaning is performed, the substrate to be processed 10 is linearly moved under the broom material 43 to receive a broom to clean the surface thereof. In other examples, the substrate to be processed 10 is moved linearly back and forth under the broom material 43 to receive a broom to improve the cleaning effect.

In other embodiments of the invention, the broom device 40 is moved to access the surface of the substrate 10 to be processed. Regardless of the method, the crucible device 40 can be moved individually or simultaneously with the substrate 10 to be processed, and the relative movement can be repeated to improve the cleaning effect.

The broom device 40 in this embodiment rotationally drives the broom material 43. However, as previously mentioned, the broom material 43 can also be used as a flat broom or as a rotating broom. At this time, the broom material 43 is preferably rigid, but the hardness is insufficient to scratch the material of the surface of the substrate 10, such as bristles of various materials.

The fluid cleaning material supply device 50 includes a storage tank, a pump (none of which is shown), a delivery tube 51 and a supply head 52. The liquid cleaning material 53 has been supplied to the surface to be treated of the substrate 10. The fluid cleaning material 53 contains a flowable carrier and at least one particle of high hardness material.

Although the present invention is not limited to any theory, the inventors have found that after the liquid cleaning material 53 is supplied to the surface to be treated of the substrate 10, the substrate 10 is scraped by the continuous broom of the broom material 43. Surface to be treated. The high-hardness material particles contained in the liquid cleaning material 53 are moved in parallel with the surface to be treated by the broom material 43, and collide with the surface, the glue, and the like on the surface to be treated, and can be scraped off. However, because it is doped with a flowable carrier and is driven only by a broom, it can be slowed to collide with the surface to be treated, thus preventing the surface to be treated from being scraped.

Although not shown in FIG. 1, the surface cleaning apparatus of the present invention further includes a control device coupled to the positioning device 20, the moving device 30, the broom device 40, and the liquid cleaning material supply device 50 for controlling For example, the vacuum chuck 21 of the positioning device 20 is opened and closed, the movement of the moving device 30, the direction and speed, the position and rotation speed of the broom device 40, and the opening and closing and supply rate of the liquid cleaning material supply device 50, and the like. . However, such control is a technology known in the industry. There is no need to repeat them here.

In addition, although not shown in FIG. 1, the surface cleaning apparatus of the present invention further includes a cleaning device 61 for cleaning the cleaned substrate 10, a drying device 62 for drying the cleaned substrate 10, and a recycling device. Apparatus 63 for recovering used fluid cleaning material. Such control is also a technology known in the industry. There is no need to repeat them here.

Fig. 2 is a flow chart showing the application of the surface cleaning method of the present invention to the above embodiment. As shown in the figure, the substrate 10 is placed on the vacuum chuck 21 in step 201. The broom device 40 is turned on in step 202, the broom material 43 is started to sweep, and the liquid cleaning material supply device 50 is turned on. Supply liquid cleaning materials. The substrate 10 is moved in step 203 into and through the broom surface of the broom material 43. If If necessary, repeat step 203 a certain number of times. Then, in step 204, the substrate 10 is moved to the cleaning device 61 for cleaning, and in step 205, the substrate 10 is moved to the drying device 62 for drying. The cleaning process of the substrate 10 is thus completed.

Figure 3 shows the cleaning effect of the present invention. 3A is a photograph of a substrate after a QFN package process; and FIG. 3B is a photograph of the substrate processed by the device and method of the present invention. It is shown that the present invention does remove most of the spill and dirt. The visual results also showed that the substrate treated by the present invention had no scratches or breakage on the surface. It is proved that the present invention achieves the purpose of cleaning the substrate without damaging the substrate.

In addition, the substrate after QFN packaging has the possibility of deformation and poor surface flatness. However, the present invention is cleaned using a broom method and a liquid cleaning material, so that even if the substrate is deformed, the present invention can achieve a good cleaning effect without damaging the substrate surface.

Moreover, the machine used in the present invention has a simple structure and can be completed by a slight change of the conventional machine. The liquid cleaning materials used are also easy to obtain and low cost materials. The liquid cleaning material is easily separated from the material removed on the substrate after use, and is reused. The invention has the advantages of low cost, easy implementation and environmental protection.

The above is a description of the method of carrying out the invention and is intended to illustrate the invention. It is not difficult for those who are accustomed to the art to make various changes and derivatives. It is within the scope of the invention as long as it does not go beyond the scope of the patent application of the present invention.

10‧‧‧Substrate

20‧‧‧Substrate fixing device

21‧‧‧vacuum suction cup

22‧‧‧ pipeline

23‧‧‧Vacuum generator

30‧‧‧Mobile devices

31‧‧‧Drive wheel

32‧‧‧Land

33‧‧‧Axle

34‧‧‧ Positioning Block

40‧‧‧Broom device

41‧‧‧Axle

42‧‧‧Runner

43‧‧‧Broom material

50‧‧‧liquid cleaning material supply device

51‧‧‧ delivery tube

52‧‧‧Supply head

53‧‧‧liquid cleaning materials

Fig. 1 is a view showing an embodiment of a surface cleaning apparatus of the present invention used in cleaning a substrate after QFN packaging.

Figure 2 is a flow chart of its application method.

Fig. 3 is a photograph showing the cleaning effect of the present invention, wherein Fig. 3A is before processing, and Fig. 3B is After processing.

10‧‧‧Substrate

20‧‧‧Substrate fixing device

21‧‧‧vacuum suction cup

22‧‧‧ pipeline

23‧‧‧Vacuum generator

30‧‧‧Mobile devices

31‧‧‧Drive wheel

32‧‧‧Land

33‧‧‧Axle

34‧‧‧ Positioning Block

40‧‧‧Broom device

41‧‧‧Axle

42‧‧‧Runner

43‧‧‧Broom material

50‧‧‧liquid cleaning material supply device

51‧‧‧ delivery tube

52‧‧‧Supply head

53‧‧‧liquid cleaning materials

Claims (31)

A surface cleaning device comprising: a substrate positioning device for fixing a surface to be treated; and a broom device for continuously sweeping the surface to be treated with a broom material; wherein the broom material is a soft strip having a considerable length Shaped material. a moving device for moving the surface to be treated and the broom device; and a first-class quality cleaning material supply device for supplying the first-class quality cleaning material to the broom surface of the broom device for removing the A portion of the material on the surface to be treated; wherein the fluid cleaning material comprises a flowable carrier and at least one particle of high hardness material. The surface cleaning device of claim 1, wherein the substrate positioning device is a vacuum chuck. The surface cleaning device of claim 1, wherein the moving device moves the surface to be treated to a broom surface of the broom device. A surface cleaning apparatus according to claim 1, wherein the moving device moves the broom surface of the broom device to a surface to be treated. The surface cleaning device of claim 3, wherein the moving device moves the surface to be treated and the broom device to move relative to each other. The surface cleaning device of claim 1, wherein the broom device is one selected from the group consisting of a rotary broom device, a flat broom device, and a rotary broom device. The surface cleaning device of claim 1, wherein the broom material is a non-woven fabric. The surface cleaning device of claim 1, wherein the liquid cleaning material supply device It is a device that controls the supply of liquid. The surface cleaning device of claim 1, wherein the flowable carrier of the fluid cleaning material is a liquid or a viscous object. The surface cleaning device of claim 9, wherein the liquid cleaning material is water. The surface cleaning device of claim 1, wherein the high hardness material particles are materials having a hardness of 8 or more and a particle size between #500 and #1500. The surface cleaning device of claim 11, wherein the high hardness material particles are niobium carbide. The surface cleaning apparatus of claim 1, wherein the ratio of the high hardness material particles to the flowable carrier is between about 10 g/l and 50 g/l. The surface cleaning device of claim 13, wherein the ratio of the high hardness material particles to the flowable carrier is between 15 g/l and 25 g/l. The surface cleaning device of claim 1, further comprising a cleaning device for cleaning the surface to be treated from which the material to be treated has been removed. The surface cleaning device of claim 1, further comprising a drying device for drying the treated or cleaned surface to be treated. The surface cleaning device of claim 1, further comprising a recovery device for recovering the used liquid cleaning material. A surface cleaning method comprising the steps of: fixing a surface to be treated; applying a first-class quality cleaning material to the surface to be treated; and continuously sweeping the surface to be treated with a broom material while applying; Wherein, the broom material is a soft strip material having a considerable length; and wherein the fluid cleaning material comprises a flowable carrier and at least one high hardness material particle. The surface cleaning method of claim 18, further comprising the step of causing the surface to be treated to move relative to the broom surface of the broom material. The surface cleaning method of claim 19, wherein the surface to be treated is fixed by a moving positioning device to fix and move the surface to be treated to move relative to the broom surface of the broom material. The surface cleaning method of claim 19, wherein the relative movement is: a method of moving the surface to be treated, moving the broom material, and simultaneously moving the surface to be treated and the broom material, Either way. The surface cleaning method of claim 18, wherein the broom material sweeps the surface to be treated by at least one of a rotating broom, a flat broom and a rotating broom. The surface cleaning method of claim 18, further comprising the step of cleaning the cleaned surface to be treated. The surface cleaning method of claim 18, further comprising the step of drying the surface to be treated and other surfaces. The surface cleaning method of claim 18, further comprising the step of recovering the liquid cleaning material and removing the material. The surface cleaning method of claim 18, wherein the flowable carrier of the fluid cleaning material is a liquid or a viscous object. The surface cleaning method of claim 26, wherein the fluid cleaning material is flowable The carrier is water. The surface cleaning method of claim 18, wherein the high hardness material particles are materials having a hardness of 8 or more and a particle size between #500 and #1500. The surface cleaning method of claim 28, wherein the high hardness material particles are niobium carbide. The surface cleaning method of claim 18, wherein the ratio of the high hardness material particles to the flowable carrier is between about 10 g/l and 50 g/l. The surface cleaning method of claim 30, wherein the ratio of the high hardness material particles to the flowable carrier is between about 15 g/l and 25 g/l.