TWI485761B - 研磨液及研磨方法 - Google Patents
研磨液及研磨方法 Download PDFInfo
- Publication number
- TWI485761B TWI485761B TW097128553A TW97128553A TWI485761B TW I485761 B TWI485761 B TW I485761B TW 097128553 A TW097128553 A TW 097128553A TW 97128553 A TW97128553 A TW 97128553A TW I485761 B TWI485761 B TW I485761B
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- polishing
- acid
- polishing liquid
- benzotriazole derivative
- Prior art date
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- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007251941A JP2009087981A (ja) | 2007-09-27 | 2007-09-27 | 研磨液及び研磨方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200915411A TW200915411A (en) | 2009-04-01 |
TWI485761B true TWI485761B (zh) | 2015-05-21 |
Family
ID=40661073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW097128553A TWI485761B (zh) | 2007-09-27 | 2008-07-29 | 研磨液及研磨方法 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2009087981A (ja) |
TW (1) | TWI485761B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5441345B2 (ja) * | 2008-03-27 | 2014-03-12 | 富士フイルム株式会社 | 研磨液、及び研磨方法 |
US8387477B2 (en) | 2009-03-31 | 2013-03-05 | Honda Motor Co., Ltd. | Gear shift device |
EP2717297B1 (en) * | 2011-05-24 | 2016-07-27 | Kuraray Co., Ltd. | Erosion inhibitor for chemical mechanical polishing, slurry for chemical mechanical polishing, and chemical mechanical polishing method |
JPWO2014112418A1 (ja) * | 2013-01-16 | 2017-01-19 | 日立化成株式会社 | 金属用研磨液及び研磨方法 |
KR102264348B1 (ko) * | 2013-07-11 | 2021-06-11 | 바스프 에스이 | 부식 저해제로서 벤조트리아졸 유도체를 포함하는 화학-기계적 연마 조성물 |
JP5857310B2 (ja) * | 2013-09-30 | 2016-02-10 | 株式会社フジミインコーポレーテッド | 研磨用組成物およびその製造方法 |
JP6876687B2 (ja) * | 2016-05-26 | 2021-05-26 | 富士フイルム株式会社 | 研磨液、研磨液の製造方法、研磨液原液、及び化学的機械的研磨方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070181534A1 (en) * | 2006-02-07 | 2007-08-09 | Fujifilm Corporation | Barrier polishing liquid and chemical mechanical polishing method |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006261333A (ja) * | 2005-03-16 | 2006-09-28 | Fuji Photo Film Co Ltd | 金属用研磨液及び研磨方法 |
JP5026710B2 (ja) * | 2005-09-02 | 2012-09-19 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
-
2007
- 2007-09-27 JP JP2007251941A patent/JP2009087981A/ja active Pending
-
2008
- 2008-07-29 TW TW097128553A patent/TWI485761B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070181534A1 (en) * | 2006-02-07 | 2007-08-09 | Fujifilm Corporation | Barrier polishing liquid and chemical mechanical polishing method |
Also Published As
Publication number | Publication date |
---|---|
JP2009087981A (ja) | 2009-04-23 |
TW200915411A (en) | 2009-04-01 |
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