TWI485761B - 研磨液及研磨方法 - Google Patents

研磨液及研磨方法 Download PDF

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Publication number
TWI485761B
TWI485761B TW097128553A TW97128553A TWI485761B TW I485761 B TWI485761 B TW I485761B TW 097128553 A TW097128553 A TW 097128553A TW 97128553 A TW97128553 A TW 97128553A TW I485761 B TWI485761 B TW I485761B
Authority
TW
Taiwan
Prior art keywords
group
polishing
acid
polishing liquid
benzotriazole derivative
Prior art date
Application number
TW097128553A
Other languages
English (en)
Chinese (zh)
Other versions
TW200915411A (en
Inventor
Tetsuya Kamimura
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200915411A publication Critical patent/TW200915411A/zh
Application granted granted Critical
Publication of TWI485761B publication Critical patent/TWI485761B/zh

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  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW097128553A 2007-09-27 2008-07-29 研磨液及研磨方法 TWI485761B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007251941A JP2009087981A (ja) 2007-09-27 2007-09-27 研磨液及び研磨方法

Publications (2)

Publication Number Publication Date
TW200915411A TW200915411A (en) 2009-04-01
TWI485761B true TWI485761B (zh) 2015-05-21

Family

ID=40661073

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097128553A TWI485761B (zh) 2007-09-27 2008-07-29 研磨液及研磨方法

Country Status (2)

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JP (1) JP2009087981A (ja)
TW (1) TWI485761B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5441345B2 (ja) * 2008-03-27 2014-03-12 富士フイルム株式会社 研磨液、及び研磨方法
US8387477B2 (en) 2009-03-31 2013-03-05 Honda Motor Co., Ltd. Gear shift device
EP2717297B1 (en) * 2011-05-24 2016-07-27 Kuraray Co., Ltd. Erosion inhibitor for chemical mechanical polishing, slurry for chemical mechanical polishing, and chemical mechanical polishing method
JPWO2014112418A1 (ja) * 2013-01-16 2017-01-19 日立化成株式会社 金属用研磨液及び研磨方法
KR102264348B1 (ko) * 2013-07-11 2021-06-11 바스프 에스이 부식 저해제로서 벤조트리아졸 유도체를 포함하는 화학-기계적 연마 조성물
JP5857310B2 (ja) * 2013-09-30 2016-02-10 株式会社フジミインコーポレーテッド 研磨用組成物およびその製造方法
JP6876687B2 (ja) * 2016-05-26 2021-05-26 富士フイルム株式会社 研磨液、研磨液の製造方法、研磨液原液、及び化学的機械的研磨方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070181534A1 (en) * 2006-02-07 2007-08-09 Fujifilm Corporation Barrier polishing liquid and chemical mechanical polishing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006261333A (ja) * 2005-03-16 2006-09-28 Fuji Photo Film Co Ltd 金属用研磨液及び研磨方法
JP5026710B2 (ja) * 2005-09-02 2012-09-19 株式会社フジミインコーポレーテッド 研磨用組成物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070181534A1 (en) * 2006-02-07 2007-08-09 Fujifilm Corporation Barrier polishing liquid and chemical mechanical polishing method

Also Published As

Publication number Publication date
JP2009087981A (ja) 2009-04-23
TW200915411A (en) 2009-04-01

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