TWI484527B - - Google Patents
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- Publication number
- TWI484527B TWI484527B TW101151245A TW101151245A TWI484527B TW I484527 B TWI484527 B TW I484527B TW 101151245 A TW101151245 A TW 101151245A TW 101151245 A TW101151245 A TW 101151245A TW I484527 B TWI484527 B TW I484527B
- Authority
- TW
- Taiwan
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Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210175897.2A CN103456591B (en) | 2012-05-31 | 2012-05-31 | The inductively coupled plasma process chamber of automatic frequency tuning source and biased radio-frequency power supply |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201349280A TW201349280A (en) | 2013-12-01 |
TWI484527B true TWI484527B (en) | 2015-05-11 |
Family
ID=49738844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101151245A TW201349280A (en) | 2012-05-31 | 2012-12-28 | Inductively coupled plasma processing chamber with automatic frequency tuning for source and bias RF power |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN103456591B (en) |
TW (1) | TW201349280A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI667487B (en) * | 2016-09-29 | 2019-08-01 | 美商超精細研究股份有限公司 | Radio frequency coil tuning methods and apparatus |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI647735B (en) * | 2013-03-15 | 2019-01-11 | 美商蘭姆研究公司 | Modeling to establish ion energy associated with the plasma system |
CN106298418B (en) * | 2015-05-18 | 2018-10-16 | 中微半导体设备(上海)有限公司 | inductively coupled plasma processing system and processing method |
CN106298419B (en) * | 2015-05-18 | 2018-10-16 | 中微半导体设备(上海)有限公司 | inductively coupled plasma processing system and processing method |
CN104849598B (en) * | 2015-05-25 | 2018-04-10 | 上海美诺福科技股份有限公司 | The control circuit and detecting system of a kind of radio-frequency signal generator |
US10347464B2 (en) * | 2015-09-15 | 2019-07-09 | Lam Research Corporation | Cycle-averaged frequency tuning for low power voltage mode operation |
CN110416047B (en) * | 2018-04-27 | 2021-03-02 | 北京北方华创微电子装备有限公司 | Radio frequency impedance matching method and device and semiconductor processing equipment |
US11355325B2 (en) | 2020-05-28 | 2022-06-07 | Applied Materials, Inc. | Methods and systems for monitoring input power for process control in semiconductor process systems |
CN113065237B (en) * | 2021-03-19 | 2022-11-08 | 四川英杰电气股份有限公司 | Method for automatically setting frequency modulation boundary and radio frequency power supply |
CN114446758B (en) * | 2022-01-21 | 2024-04-12 | 北京北方华创微电子装备有限公司 | Semiconductor process chamber and semiconductor process method |
CN114724945A (en) * | 2022-05-18 | 2022-07-08 | 北京屹唐半导体科技股份有限公司 | Plasma nitridation doping method and device and semiconductor device |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030192646A1 (en) * | 2002-04-12 | 2003-10-16 | Applied Materials, Inc. | Plasma processing chamber having magnetic assembly and method |
TW200829087A (en) * | 2006-11-22 | 2008-07-01 | Pearl Kogyo Co Ltd | High frequency power source device and supply method of high frequency power |
TW200903625A (en) * | 2007-07-04 | 2009-01-16 | Advanced Micro Fab Equip Inc | Multi-station decoupled reactive ion etch chamber |
US20100089319A1 (en) * | 2008-10-09 | 2010-04-15 | Applied Materials, Inc. | Rf return path for large plasma processing chamber |
TW201108866A (en) * | 2009-08-17 | 2011-03-01 | Advanced Micro Fab Equip Inc | Plasma processing chamber having switchable bias frequency and a switchable match network therefore |
US20110135844A1 (en) * | 2009-11-17 | 2011-06-09 | Applied Materials, Inc. | Large area plasma processing chamber with at-electrode rf matching |
CN201962350U (en) * | 2010-11-09 | 2011-09-07 | 中微半导体设备(上海)有限公司 | Device for in situ cleaning deposition reaction chamber of III-group element and V-group element compounds |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0170387B1 (en) * | 1989-10-03 | 1999-03-30 | 제임스 조셉 드롱 | High-frequency semiconductor wafer processing method using a negative self-bias |
US5688357A (en) * | 1995-02-15 | 1997-11-18 | Applied Materials, Inc. | Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
TW200300649A (en) * | 2001-11-27 | 2003-06-01 | Alps Electric Co Ltd | Plasma processing apparatus, its driving method, matching circuit design system, and plasma processing method |
KR20060029621A (en) * | 2003-06-19 | 2006-04-06 | 플라즈마 컨트롤 시스템 엘엘씨 | Plasma production device and method and rf driver circuit with adjustable duty cycle |
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2012
- 2012-05-31 CN CN201210175897.2A patent/CN103456591B/en active Active
- 2012-12-28 TW TW101151245A patent/TW201349280A/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030192646A1 (en) * | 2002-04-12 | 2003-10-16 | Applied Materials, Inc. | Plasma processing chamber having magnetic assembly and method |
TW200829087A (en) * | 2006-11-22 | 2008-07-01 | Pearl Kogyo Co Ltd | High frequency power source device and supply method of high frequency power |
TW200903625A (en) * | 2007-07-04 | 2009-01-16 | Advanced Micro Fab Equip Inc | Multi-station decoupled reactive ion etch chamber |
US20100089319A1 (en) * | 2008-10-09 | 2010-04-15 | Applied Materials, Inc. | Rf return path for large plasma processing chamber |
TW201108866A (en) * | 2009-08-17 | 2011-03-01 | Advanced Micro Fab Equip Inc | Plasma processing chamber having switchable bias frequency and a switchable match network therefore |
US20110135844A1 (en) * | 2009-11-17 | 2011-06-09 | Applied Materials, Inc. | Large area plasma processing chamber with at-electrode rf matching |
CN201962350U (en) * | 2010-11-09 | 2011-09-07 | 中微半导体设备(上海)有限公司 | Device for in situ cleaning deposition reaction chamber of III-group element and V-group element compounds |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI667487B (en) * | 2016-09-29 | 2019-08-01 | 美商超精細研究股份有限公司 | Radio frequency coil tuning methods and apparatus |
TWI685668B (en) * | 2016-09-29 | 2020-02-21 | 美商超精細研究股份有限公司 | Magnetic resonance imaging system, and tuning system for use with the magnetic resonance imaging system |
Also Published As
Publication number | Publication date |
---|---|
CN103456591A (en) | 2013-12-18 |
TW201349280A (en) | 2013-12-01 |
CN103456591B (en) | 2016-04-06 |