TWI480969B - Substrate processing system and substrate processing method - Google Patents

Substrate processing system and substrate processing method Download PDF

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TWI480969B
TWI480969B TW098125464A TW98125464A TWI480969B TW I480969 B TWI480969 B TW I480969B TW 098125464 A TW098125464 A TW 098125464A TW 98125464 A TW98125464 A TW 98125464A TW I480969 B TWI480969 B TW I480969B
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substrate
transport
substrate processing
control device
pin
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TW201015660A (en
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Genshin Nakazawa
Yugo Fukushima
Manabu Kamatani
Sadahiko Ito
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Toray Eng Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/41815Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by the cooperation between machine tools, manipulators and conveyor or other workpiece supply system, workcell
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/4189Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by the transport system
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/31From computer integrated manufacturing till monitoring
    • G05B2219/31002Computer controlled agv conveys workpieces between buffer and cell
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45031Manufacturing semiconductor wafers

Description

基板處理系統及基板處理方法Substrate processing system and substrate processing method

本發明是關於對基板(substrate)施以處理之基板處理系統及基板處理方法。The present invention relates to a substrate processing system and a substrate processing method for processing a substrate.

例如在液晶顯示器(liquid crystal display)或電漿顯示器(plasma display)等的平面面板顯示器(flat panel display)使用有塗佈有光阻(resist)液的玻璃基板(glass substrate)(以下也稱為塗佈基板)。用以得到該塗佈基板之基板處理系統除了對玻璃基板塗佈光阻液之塗佈裝置(例如參照專利文獻1),及對塗佈裝置進行玻璃基板的運送之運送裝置外,還具備統括該等裝置之主控制裝置。For example, a flat panel display such as a liquid crystal display or a plasma display uses a glass substrate coated with a resist liquid (hereinafter also referred to as a glass substrate). Coating the substrate). The substrate processing system for obtaining the coated substrate includes a coating device for applying a photoresist to a glass substrate (for example, see Patent Document 1), and a transfer device for transporting a glass substrate to the coating device. The main control unit of these devices.

塗佈裝置及運送裝置的各個與主控制裝置是藉由專用通信線連接,運送裝置一接收由主控制裝置傳送來的指令信號,運送裝置就將玻璃基板運送至塗佈裝置。完成玻璃基板的運送之運送裝置傳送運送完了的信號至主控制裝置,主控制裝置一接收運送完了的信號,就傳送指令信號至塗佈裝置。接收指令信號的塗佈裝置開始塗佈光阻液至玻璃基板的處理,若塗佈完成,則傳送塗佈完了的信號至 主控制裝置。接收塗佈完了的信號之主控制裝置將運送塗佈基板至下一個製程的指令信號傳送至運送裝置。如此,運送裝置及塗佈裝置是等待來自主控制裝置的指令信號進行動作而構成,藉由使玻璃基板的運送及給予玻璃基板的處理(光阻液的塗佈)自動化,謀求塗佈基板的製造時間的縮短。Each of the coating device and the transport device is connected to the main control device by a dedicated communication line, and the transport device receives the command signal transmitted by the main control device, and the transport device transports the glass substrate to the coating device. The transport device that completes the transport of the glass substrate transmits the transported signal to the main control device, and upon receiving the transmitted signal, the main control device transmits a command signal to the coating device. The coating device that receives the command signal starts the process of applying the photoresist liquid to the glass substrate, and if the coating is completed, the coated signal is transmitted to Main control unit. The main control device that receives the coated signal transmits a command signal for transporting the coated substrate to the next process to the transport device. In this way, the transport device and the coating device are configured to wait for a command signal from the main control device to operate, and the glass substrate is transported and the glass substrate is processed (application of the photoresist liquid) to be automated. Shortening of manufacturing time.

[專利文獻1]日本國特開2008-205120號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-205120

如前述,在習知的基板處理系統中,主控制裝置傳送指令信號至運送裝置及塗佈裝置,藉由該指令信號使玻璃基板的運送開始的時序(timing)及/或光阻液的塗佈開始的時序被控制。但是,此情形由於主控制裝置中的掃描時間(scan time)的產生,或在主控制裝置與運送裝置及塗佈裝置之間需要通信時間等的因素,使精密地連繫運送裝置與塗佈裝置之動作時序的控制很困難。因此,在習知的系統中在將玻璃基板搬進塗佈裝置後,完成光阻液的塗佈作業,進行到搬出塗佈基板為止的時間縮短也有界限。As described above, in the conventional substrate processing system, the main control device transmits a command signal to the transport device and the coating device, and the timing of the start of transport of the glass substrate and/or the coating of the photoresist liquid by the command signal is used. The timing at which the cloth starts is controlled. However, in this case, due to the generation of the scan time in the main control device, or the communication time between the main control device and the transport device and the coating device, the precise connection transport device and the coating are required. Control of the timing of the operation of the device is difficult. Therefore, in the conventional system, after the glass substrate is carried into the coating device, the coating operation of the photoresist liquid is completed, and the time until the application of the coated substrate is shortened is also limited.

因此,本發明的目的為提供一種基板處理系統及基板處理方法,使基板處理裝置與運送裝置的動作時序連繫的控制容易,更進一步的時間縮短為可能。Accordingly, an object of the present invention is to provide a substrate processing system and a substrate processing method which are easy to control the timing of the operation of the substrate processing apparatus and the transport apparatus, and further shorten the time.

用以解決前述課題之本發明的基板處理系統,包含:具有為處理基板而動作的動作部之基板處理裝置;具有為運送前述基板而對前述基板處理裝置接近背離移動的運送 部之運送裝置,藉由發出指令信號至前述基板處理裝置及前述運送裝置的主控制部統括有該基板處理裝置及該運送裝置,其特徵包含:在前述基板處理裝置與前述運送裝置之間進行信號的傳送接收之傳輸路徑(transmission path);藉由根據透過前述傳輸路徑在前述基板處理裝置與前述運送裝置之間被傳送的信號,在前述動作部的動作完了前使前述運送部的移動開始,使該動作部的動作與該運送部的移動並行之控制部,前述動作部可移動於不與為進行前述基板的遞送而接近來的前述運送部干涉的目標位置,及於移動方向超越前述目標位置,不與前述運送部干涉的超出位置(overrun position)而被配設,前述基板處理裝置具有使前述動作部於前述移動方向通過前述目標位置且在前述超出位置的跟前使前述動作部減速,使前述動作部由前述超出位置折回前述目標位置而控制的超出控制部。A substrate processing system according to the present invention for solving the above-described problems includes: a substrate processing apparatus having an operation unit that operates to process a substrate; and a transport that moves the substrate to move away from the substrate processing apparatus The main transport unit that issues a command signal to the substrate processing apparatus and the transport apparatus includes the substrate processing apparatus and the transport apparatus, and the method includes: performing between the substrate processing apparatus and the transport apparatus a transmission path for transmitting and receiving a signal; the movement of the transport unit is started before the operation of the operation unit is completed by a signal transmitted between the substrate processing device and the transport device through the transmission path a control unit that moves the operation of the operation unit in parallel with the movement of the transport unit, wherein the operation unit is movable to a target position that does not interfere with the transport unit that is close to the delivery of the substrate, and that the movement direction exceeds the aforementioned The target position is disposed in an overrun position that does not interfere with the transport unit, and the substrate processing apparatus has the operation unit decelerated by the target position in the moving direction and before the excess position Activating the aforementioned action portion from the aforementioned excess position to the aforementioned target position The control is beyond the control.

而且,藉由該基板處理系統執行的基板處理方法是使用有為運送基板運送部對基板處理裝置接近背離移動的運送裝置,為前述基板的處理而使前述基板處理裝置所具有的動作部動作,其特徵為:藉由根據在前述基板處理裝置與前述運送裝置之間透過傳輸路徑傳送的信號,在前述動作部的動作完了前使前述運送部的移動開始,使該動作部的動作與該運送部的移動並行,前述動作部可移動於不與為進行前述基板的遞送而接近來的前述運送部干涉的目標位置,及於移動方向超越前述目標位置,不與前述運送部干 涉的超出位置而被配設,前述基板處理裝置具有使前述動作部於前述移動方向通過前述目標位置且在前述超出位置的跟前使前述動作部減速,使前述動作部由前述超出位置折回前述目標位置而控制的超出控制部。In the substrate processing method performed by the substrate processing system, a transport device that moves toward the substrate processing device for transporting the substrate transport unit is used, and the operation unit of the substrate processing device is operated for the processing of the substrate. According to the signal transmitted through the transmission path between the substrate processing apparatus and the transport apparatus, the movement of the transport unit is started before the operation of the operation unit is completed, and the operation of the operation unit and the transport are performed. In parallel, the movement portion is movable to a target position that does not interfere with the transport portion that is close to the delivery of the substrate, and that the movement direction exceeds the target position and does not interfere with the transport portion. The substrate processing apparatus is configured such that the operation unit passes the target position in the moving direction and decelerates the operation unit before the excess position, and the operation unit is folded back from the excess position. The position is controlled beyond the control.

依照前述基板處理系統及前述基板處理方法,因透過基板處理裝置與運送裝置之間的傳輸路徑進行信號的傳送接收,故使基板處理裝置的動作部與運送裝置的運送部的動作時序連繫的控制變的容易。而且,該使其連繫的控制藉由根據透過傳輸路徑在基板處理裝置與運送裝置之間被傳送的信號,在動作部的動作完了前使運送部的移動開始,藉由進行使動作部的動作與運送部的移動並行之控制,可使使動作部的動作與運送部的移動時間地重疊,使時間縮短為可能。According to the substrate processing system and the substrate processing method described above, since the signals are transmitted and received through the transmission path between the substrate processing device and the transport device, the operation timing of the substrate processing device and the operation timing of the transport portion of the transport device are linked. Control is easy. Further, the control of the connection is performed by the signal transmitted between the substrate processing apparatus and the transport apparatus based on the transmission path, and the movement of the transport unit is started before the operation of the operation unit is completed, and the operation unit is operated. By controlling the movement in parallel with the movement of the transport unit, it is possible to overlap the movement of the operation unit and the movement time of the transport unit, and it is possible to shorten the time.

此情形,因超出控制部使動作部於移動方向通過目標位置且在超出位置的跟前使動作部減速,故動作部可迅速地超越目標位置。In this case, since the control unit causes the operation unit to pass the target position in the moving direction and decelerates the operation unit before the position exceeds the position, the operation unit can quickly exceed the target position.

相對於此,在不是使動作部移動至超出位置,而是使其直接到達目標位置的情形下,使動作部移動之一般的機器的構成上,因需於在目標位置的跟前使動作部減速後,在目標位置使其停止,故使動作部到達目標位置為止需要時間。On the other hand, when the operation unit is not moved to the position beyond, but the target unit is directly reached, the configuration of the general machine that moves the operation unit is required to slow down the operation unit before the target position. After that, the target position is stopped, so it takes time to move the operation unit to the target position.

但是,依照前述超出控制部,由於動作部迅速地超越目標位置,以早的時序得到動作部與運送部不干涉的狀態,故為進行基板的遞送而能以早的時序使運送部開始接 近基板處理裝置,更進一步的時間縮短為可能。而且,藉由前述超出控制部使動作部由超出位置折回目標位置,可使動作部到達目標位置,可使其準備至下一個動作。However, according to the above-described excess control unit, since the operation unit quickly exceeds the target position, the operation unit and the transport unit do not interfere with each other at an early timing. Therefore, the transport unit can be started at an early timing in order to deliver the substrate. Near the substrate processing apparatus, further time reduction is possible. Further, the excess control unit causes the operating unit to be folded back to the target position from the over position, so that the operating unit can reach the target position and can be prepared for the next operation.

而且,在前述基板處理裝置具有前述超出控制部的情形下,藉由前述控制部在前述動作部折回並到達前述目標位置的動作完了前使前述運送部的移動開始,使該動作部的移動與該運送部的移動並行較佳。Further, when the substrate processing apparatus includes the above-described excess control unit, the control unit starts the movement of the transport unit before the operation of the operation unit is folded back and reaches the target position, and the movement of the operation unit is performed. The movement of the transport unit is preferably parallel.

此情形,藉由控制部在動作部折回並到達目標位置的動作完了前使運送部的移動開始,可使使動作部到達目標位置的動作與基板的遞送用的運送部的移動時間地重疊。其結果,由超出控制部產生的時間縮短的功效被相乘地加到由使動作部的動作與運送部的移動並行的控制產生的時間縮短的功效。In this case, the movement of the transport unit is started before the operation of the control unit is folded back and reaches the target position, and the movement of the operation unit to the target position can be overlapped with the movement of the transport unit for delivery of the substrate. As a result, the effect of shortening the time that is exceeded by the control unit is multiplied to the effect of shortening the time due to the control in parallel with the movement of the operating unit and the movement of the transport unit.

而且,在前述基板處理裝置具有前述超出控制部的情形下,進行速度控制,俾動作部在通過前述目標位置後該動作部達到最大移動速度也可以,惟前述超出控制部進行速度控制,俾前述動作部在達到最大移動速度後通過前述目標位置較佳。Further, when the substrate processing apparatus includes the above-described excess control unit, the speed control is performed, and the operation unit may reach the maximum moving speed after passing through the target position, but the excess control unit performs speed control. It is preferable that the action portion passes the aforementioned target position after reaching the maximum moving speed.

此情形,動作部可迅速地超越目標位置,能以更早的時序使運送部開始接近基板處理裝置。In this case, the operating portion can quickly overtake the target position, and the transport portion can be brought closer to the substrate processing device at an earlier timing.

依照本發明,藉由使基板處理裝置的動作部的動作與運送裝置的運送部的移動時間地重疊,使時間縮短為可 能,可縮短基板的運送時間,提高基板的生產效率(處理效率)。According to the present invention, the time is shortened to be possible by overlapping the operation of the operation unit of the substrate processing apparatus with the movement time of the transport unit of the transport apparatus. Therefore, the transportation time of the substrate can be shortened, and the production efficiency (processing efficiency) of the substrate can be improved.

以下根據圖面說明本發明的實施的形態。Hereinafter, embodiments of the present invention will be described based on the drawings.

[基板處理系統1的全體構成][Entire Configuration of Substrate Processing System 1]

圖1是顯示本發明的基板處理系統1的實施的一形態之概略構成圖。該基板處理系統1為塗佈藥液或光阻液等的液狀物(以下稱為塗佈液)至基板(玻璃基板)W並可製造塗佈基板之裝置,具備:主控制裝置2、作為基板處理裝置的塗佈裝置3、作為運送裝置的搬進裝置4及搬出裝置5。主控制裝置2是由統括塗佈裝置3、搬進裝置4及搬出裝置5之可程式邏輯控制器(PLC:Programmable Logic Controller)構成,塗佈裝置3、搬進裝置4及搬出裝置5可根據來自主控制裝置2的指令信號進行動作。Fig. 1 is a schematic block diagram showing an embodiment of an embodiment of a substrate processing system 1 of the present invention. The substrate processing system 1 is a device that applies a liquid material (hereinafter referred to as a coating liquid) such as a chemical liquid or a photoresist liquid to a substrate (glass substrate) W, and can manufacture a coated substrate, and includes a main control device 2. The coating device 3 as a substrate processing apparatus, the loading device 4 as a transport device, and the carry-out device 5. The main control device 2 is composed of a programmable logic controller (PLC: Programmable Logic Controller) that integrates the coating device 3, the loading device 4, and the unloading device 5. The coating device 3, the loading device 4, and the loading device 5 can be The command signal from the main control device 2 operates.

塗佈裝置3具有:為塗佈塗佈液於基板W上而動作之塗佈裝置本體10;控制該塗佈裝置本體10的動作之塗佈用控制裝置16。搬進裝置4具有:為由圖外的區域將基板W搬進塗佈裝置本體10而對該塗佈裝置本體10接近背離移動之搬進機械手臂(robot)20;控制該搬進機械手臂20的動作之搬進用控制裝置23。搬出裝置5具有:為由塗佈裝置本體10將基板W搬出到圖外的區域而對該塗佈裝置本體10接近背離移動之搬出機械手臂30;控制該搬出機械手臂30的動作之搬出用控制裝置33。搬進機械手臂20與搬出 機械手臂30是夾住塗佈裝置本體10而被配置。The coating device 3 includes a coating device main body 10 that operates to apply a coating liquid onto the substrate W, and a coating control device 16 that controls the operation of the coating device main body 10. The loading device 4 includes a loading robot 20 that moves the substrate W into the coating device body 10 from a region outside the drawing, and moves the coating device body 10 away from the moving device 10; and controls the loading robot 20 The operation of the movement control device 23. The unloading device 5 has a loading/unloading robot 30 that moves the substrate W out of the region outside the drawing by the coating device main body 10, and moves the dispensing device body 10 away from the moving device arm 10; Device 33. Move into the robot arm 20 and move out The robot arm 30 is disposed to sandwich the coating device body 10.

塗佈用控制裝置16、搬進用控制裝置23及搬出用控制裝置33與主控制裝置2是透過專用通信線(L1、L2、L3)各自連接,且在兩者間可通信。而且,在該基板處理系統1中,塗佈用控制裝置16與搬進用控制裝置23是藉由專用通信線L4連接,並藉由該通信線L4在塗佈用控制裝置16與搬進用控制裝置23之間進行信號(後述的各種動作信號)的傳送接收。而且,塗佈用控制裝置16與搬出用控制裝置33是藉由專用通信線L5連接,並藉由該通信線L5在塗佈用控制裝置16與搬出用控制裝置33之間進行信號(後述的各種動作信號)的傳送接收。通信線的具體例有CC-Link(註冊商標)通信用纜線(cable)、Ethernet(乙太網路)(註冊商標)通信用纜線、數位輸入/輸出用纜線。The coating control device 16, the loading control device 23, and the carry-out control device 33 are connected to the main control device 2 via dedicated communication lines (L1, L2, and L3), and are communicable therebetween. Further, in the substrate processing system 1, the coating control device 16 and the loading control device 23 are connected by the dedicated communication line L4, and the communication control unit 16 and the loading control device 16 are used for loading. Transmission and reception of signals (various operation signals to be described later) are performed between the control devices 23. Further, the application control device 16 and the carry-out control device 33 are connected by the dedicated communication line L5, and a signal is transmitted between the application control device 16 and the carry-out control device 33 via the communication line L5 (described later). Transmission and reception of various motion signals). Specific examples of the communication line include a CC-Link (registered trademark) communication cable (cable), an Ethernet (registered trademark) communication cable, and a digital input/output cable.

[塗佈裝置3][Coating device 3]

塗佈裝置本體10具有:基台11;配置於基台11的中央,放置有基板W的平台(stage)12;在水平方向移動於該平台12上之台架(gantry)13。台架13具有吐出塗佈液的開縫噴嘴部(slit nozzle part)(未圖示),可移動於正交於基板W的運送方向(在圖1中為左右方向)之方向。藉由台架13移動於被放置在平台12頂面的基板W上,塗佈塗佈液於該基板W。The coating apparatus main body 10 has a base 11 , a stage 12 in which a substrate W is placed in the center of the base 11 , and a gantry 13 that is horizontally moved on the stage 12 . The gantry 13 has a slit nozzle part (not shown) that discharges the coating liquid, and is movable in a direction orthogonal to the transport direction of the substrate W (the horizontal direction in FIG. 1). The coating liquid is applied to the substrate W by being placed on the substrate W placed on the top surface of the stage 12 by the stage 13.

在平台12形成有在其頂面開口的複數個吸引孔,在該等吸引孔連接有吸引泵(未圖示)。若於在平台12的頂面放置有基板W的狀態下吸引泵動作,則基板W被吸附於平台 12的頂面。而且,在平台12形成有複數個貫通於上下方向的銷孔(pin hole),在該銷孔配設有作為可移動於上下方向的動作部之銷(頂出銷:lift pin)14。複數根銷14是以平面視被配置成格子狀。在基台11配設有使複數根銷14上下運動的銷驅動機構15。銷驅動機構15例如可藉由電動致動器(electric actuator)構成,其構成可採用以往已知者。A plurality of suction holes are formed in the top surface of the platform 12, and a suction pump (not shown) is connected to the suction holes. If the suction pump operates in a state where the substrate W is placed on the top surface of the stage 12, the substrate W is adsorbed to the stage. The top surface of 12. Further, a plurality of pin holes penetrating in the vertical direction are formed in the stage 12, and a pin (lift pin) 14 as an operation portion movable in the vertical direction is disposed in the pin hole. The plurality of root pins 14 are arranged in a lattice shape in plan view. A pin drive mechanism 15 for moving the plurality of pins 14 up and down is disposed on the base 11. The pin drive mechanism 15 can be constituted by, for example, an electric actuator, and its configuration can be known in the art.

位於初始位置的銷14是其尖端位於平台12的頂面以下的高度。若於在平台12上放置有基板W的狀態下,藉由銷驅動機構15同時使複數根銷14上升,則銷14的尖端將基板W推上去,可使基板W移動到預定的高度,藉由銷14基板W在預定的高度位置被保持(圖1的狀態)。The pin 14 in the initial position is the height at which the tip end is below the top surface of the platform 12. If the plurality of pins 14 are simultaneously raised by the pin driving mechanism 15 in a state where the substrate W is placed on the stage 12, the tip end of the pin 14 pushes up the substrate W, and the substrate W can be moved to a predetermined height. The substrate W is held by the pin 14 at a predetermined height position (state of Fig. 1).

台架13的移動、台架13中的塗佈液的吐出、利用吸引泵進行之基板W的吸附及銷驅動機構14的動作是藉由塗佈用控制裝置16控制。The movement of the gantry 13, the discharge of the coating liquid in the gantry 13, the adsorption of the substrate W by the suction pump, and the operation of the pin driving mechanism 14 are controlled by the coating control device 16.

[搬進裝置4及搬出裝置5][Loading device 4 and carrying device 5]

搬進機械手臂20具有:承載接著進行塗佈液的塗佈的基板W之機械手部(運送部)21;使機械手部21移動於對塗佈裝置本體10接近背離方向(水平方向)及上下方向之搬進驅動機構22,並具有將基板W傳遞至上升起來的銷14的頂面之功能。因此,機械手部21可由不與台架13干涉的位置移動至平台12的上方的預定位置,且不與配置成格子狀已上升的銷14干涉而成梳子形狀。使機械手部21移動的搬進驅動機構22的動作是藉由搬進用控制裝置23控 制。The loading robot 20 has a robot hand (transporting portion) 21 that carries the substrate W to which the coating liquid is applied, and moves the robot hand 21 to face the coating device body 10 in the direction of deviation (horizontal direction) and The drive mechanism 22 is moved in the vertical direction, and has a function of transmitting the substrate W to the top surface of the raised pin 14. Therefore, the robot portion 21 can be moved to a predetermined position above the stage 12 by a position that does not interfere with the stage 13, and does not interfere with the pin 14 that has been arranged in a lattice shape to form a comb shape. The movement of the loading drive mechanism 22 that moves the robot hand 21 is controlled by the loading control device 23 system.

搬出機械手臂30具有:承載完成塗佈液的塗佈的基板W之機械手部(運送部)31;使機械手部31移動於對塗佈裝置本體10接近背離方向(水平方向)及上下方向之搬出驅動機構32,並具有由上升且承載基板W的銷14接受該基板W的功能。因此,機械手部31可由不與台架13干涉的位置移動至平台12的上方的預定位置,且不與配置成格子狀已上升的銷14干涉而成梳子形狀。使機械手部31移動的搬出驅動機構32的動作是藉由搬出用控制裝置33控制。The unloading robot arm 30 has a robot hand (transporting portion) 31 that carries the coated substrate W that has been coated with the coating liquid, and moves the robot hand portion 31 in a direction away from the coating device body 10 (horizontal direction) and in the up and down direction. The drive mechanism 32 is carried out and has a function of receiving the substrate W by the pin 14 that rises and carries the substrate W. Therefore, the robot portion 31 can be moved to a predetermined position above the stage 12 by a position that does not interfere with the stage 13, and does not interfere with the pin 14 that has been arranged in a lattice shape to form a comb shape. The operation of the carry-out drive mechanism 32 that moves the robot hand 31 is controlled by the carry-out control device 33.

此外,搬進驅動機構22及搬出驅動機構32可藉由電動致動器構成,其構成可採用以往已知者。Further, the carry-in drive mechanism 22 and the carry-out drive mechanism 32 may be constituted by an electric actuator, and the configuration thereof may be conventionally known.

[關於各控制裝置][About each control device]

塗佈用控制裝置16、搬進用控制裝置23及搬出用控制裝置33是由具有CPU及記憶部(RAM和ROM)的電腦構成。在記憶部記憶有用以執行規定的各功能之程式,塗佈用控制裝置16、搬進用控制裝置23及搬出用控制裝置33是當作藉由前述程式執行的功能部各自具有位置檢測部(6a、6b、6c)。而且,塗佈用控制裝置16是當作藉由前述程式執行的功能部,具有控制銷14的升降動作,亦即銷驅動機構15的動作之超出控制部7。針對該超出控制部7的功能於之後說明。The coating control device 16, the loading control device 23, and the carry-out control device 33 are constituted by a computer having a CPU and a storage unit (RAM and ROM). The program for controlling the functions to perform the predetermined functions is stored in the memory unit, and the application control device 16, the carry-in control device 23, and the carry-out control device 33 are each provided with a position detecting unit as a functional unit that is executed by the program. 6a, 6b, 6c). Further, the coating control device 16 is a functional portion that is executed by the above-described program, and has a lifting operation of the control pin 14, that is, the operation of the pin driving mechanism 15 is beyond the control portion 7. The function of the excess control unit 7 will be described later.

塗佈用控制裝置16的位置檢測部6a具有檢測銷14(的尖端)的高度位置的功能及檢測台架13的位置的功能。搬進用控制裝置23的位置檢測部6b具有檢測機械手 部21對平台12的位置的功能,搬出用控制裝置33的位置檢測部6c具有檢測機械手部31對平台12的位置的功能。利用前述位置檢測部6a進行的銷14的位置檢測可根據銷驅動機構15的動作量進行,例如可藉由銷驅動機構15所具有,與使銷14升降的馬達等連接之編碼器(encoder)進行位置檢測。而且,針對其他的位置檢測也可藉由同樣的構成實現。此外,針對機械手部21、31也可以藉由另外配設的非接觸式的感測器(sensor)(例如圖3的感測器17a~17d)進行位置檢測。The position detecting unit 6a of the coating control device 16 has a function of detecting the height position of the (tip of) the pin 14 and a function of detecting the position of the gantry 13. The position detecting unit 6b of the loading control device 23 has a detecting robot The function of the position of the platform 12 with respect to the position of the platform 12, the position detecting unit 6c of the carry-out control device 33 has a function of detecting the position of the robot hand 31 with respect to the platform 12. The position detection of the pin 14 by the position detecting unit 6a can be performed in accordance with the amount of movement of the pin driving mechanism 15, and can be, for example, an encoder that is connected to a motor or the like that raises and lowers the pin 14 by the pin driving mechanism 15. Perform position detection. Moreover, other position detection can also be realized by the same configuration. Further, the robot hand 21, 31 may be position-detected by a separately provided non-contact type sensor (for example, the sensors 17a to 17d of FIG. 3).

此處針對感測器17a~17d來說明。該等感測器17a~17d是當作聯鎖(interlock)而作用。該等感測器17a~17d的檢測結果的信號被輸入塗佈用控制裝置16。感測器17a是用以防止機械手部31與台架13接觸,感測器17d是用以防止機械手部21與台架13接觸。亦即,藉由機械手部31和機械手部21不在後述的跟前位置而是位於平台12側,感測器17a、17d一成為ON的狀態並成為檢測出機械手部31、21的狀態,塗佈用控制裝置16就使台架13的移動停止(禁止)。This will be described with respect to the sensors 17a to 17d. The sensors 17a-17d function as interlocks. Signals of the detection results of the sensors 17a to 17d are input to the coating control device 16. The sensor 17a is for preventing the robot hand 31 from coming into contact with the gantry 13, and the sensor 17d is for preventing the robot hand 21 from coming into contact with the gantry 13. In other words, the robot hand 31 and the robot hand 21 are located on the side of the platform 12 instead of the front position, which will be described later, and the sensors 17a and 17d are turned ON, and the state of the robot parts 31 and 21 is detected. The coating control device 16 stops (disables) the movement of the gantry 13.

而且,感測器17b是用以防止機械手部31與銷14上的基板W接觸,感測器17c是用以防止機械手部21與銷14上的基板W接觸。據此,可確認機械手部31、21由平台12上退避。亦即,藉由機械手部31、21位於平台12上,感測器17b、17c一成為ON的狀態並成為檢測出機械手部31、21的狀態,塗佈用控制裝置16就使銷14的移動 停止(禁止)。Further, the sensor 17b is for preventing the robot hand 31 from coming into contact with the substrate W on the pin 14, and the sensor 17c is for preventing the robot hand 21 from coming into contact with the substrate W on the pin 14. Accordingly, it can be confirmed that the robot portions 31 and 21 are retracted from the platform 12. In other words, when the robot portions 31 and 21 are positioned on the stage 12, the sensors 17b and 17c are turned ON and the state of the robot portions 31 and 21 is detected, and the coating control device 16 causes the pin 14 to be turned. Move Stop (prohibited).

[關於塗佈液之塗佈於基板W的動作][Operation of Application of Coating Liquid to Substrate W]

說明藉由如以上構成的基板處理系統1進行的塗佈液之塗佈於基板W的處理。圖2是由上方看基板處理系統1之概略構成圖。而且,圖3、圖4及圖5是說明塗佈處理之說明圖。The treatment of applying the coating liquid by the substrate processing system 1 configured as above to the substrate W will be described. FIG. 2 is a schematic configuration view of the substrate processing system 1 as seen from above. 3, 4, and 5 are explanatory views for explaining the coating process.

(1、塗佈液的塗佈程序)(1. Coating procedure of coating solution)

在圖2中台架13進行為塗佈塗佈液於基板W而由初始位置E移動至完成塗佈作業的作業完了位置F,更由作業完了位置F返回初始位置E之動作。亦即,台架13進行由初始位置E開始移動,到達作業完了位置F後,返回初始位置E之往復動作。該往復動作是藉由塗佈用控制裝置16控制。初始位置E是基台11的一端部的位置,且即使機械手部21、31進入平台12上,機械手部21、31也不與台架13干涉的位置。相反地,在台架13的移動中若機械手部21、31進入平台12上,則兩者會碰撞。作業完了位置F是基台11的另一端部的位置。台架13的各位置是藉由塗佈用控制裝置16的前述位置檢測部6a(參照圖1)檢測。In FIG. 2, the gantry 13 performs an operation of applying the coating liquid to the substrate W, moving from the initial position E to the work-finished position F at which the coating operation is completed, and returning to the initial position E from the work-completed position F. That is, the gantry 13 performs a reciprocating motion that starts from the initial position E and returns to the initial position E after reaching the work position F. This reciprocating motion is controlled by the coating control device 16. The initial position E is the position of one end portion of the base 11, and even if the robot portions 21, 31 enter the platform 12, the robot portions 21, 31 do not interfere with the gantry 13. Conversely, if the robot hands 21, 31 enter the platform 12 during the movement of the gantry 13, the two will collide. The position F at the end of the work is the position of the other end of the base 11. Each position of the gantry 13 is detected by the position detecting unit 6a (see FIG. 1) of the coating control device 16.

在圖1中若由主控制裝置2透過通信線L1將當作指令信號之使塗佈液的塗佈作業開始的開始信號傳送至塗佈用控制裝置16,則前述感測器17a、17d為OFF狀態(未檢測出機械手部31、21的狀態)被確認,藉由塗佈用控制裝置16的控制,台架13進行往復動作於基台11上,在其間塗佈塗佈液於平台12上的基板W。塗佈塗佈液時,基板W被 吸附於平台12上。In FIG. 1, when the main control device 2 transmits a start signal for starting the coating operation of the coating liquid as a command signal to the coating control device 16 via the communication line L1, the sensors 17a and 17d are The OFF state (the state in which the grippers 31 and 21 are not detected) is confirmed, and the gantry 13 reciprocates on the base 11 by the control of the coating control device 16, and the coating liquid is applied to the platform therebetween. Substrate W on 12. When the coating liquid is applied, the substrate W is Adsorbed on the platform 12.

而且,在台架13進行前述往復動作時,由主控制裝置2透過通信線L2、L3將當作指令信號之容許基板W的搬進及搬出動作的運送可能信號預先傳送至搬進用控制裝置23及搬出用控制裝置33。據此,成為搬進用控制裝置23及搬出用控制裝置33等待使位於退避位置(evacuation location)的機械手部21、31開始進出於平台12側的信號的狀態。When the gantry 13 performs the above-described reciprocating operation, the main control device 2 transmits the transport possibility signal of the loading and unloading operation of the permissible substrate W as the command signal to the carry-in control device in advance via the communication lines L2 and L3. 23 and the carry-out control device 33. As a result, the loading control device 23 and the carry-out control device 33 wait for the robot hand 21, 31 located at the evacuation position to start entering the signal on the platform 12 side.

而且,在前述往復動作中主控制裝置2透過通信線L1將用以使位於退避位置的機械手部21、31進出至後述的跟前位置的準備信號傳送至塗佈用控制裝置16。成為塗佈用控制裝置16可藉由接收前述準備信號發出使機械手部21、31開始進出於跟前位置的信號之狀態。In the reciprocating operation, the main control device 2 transmits a preparation signal for moving the robot parts 21 and 31 located at the retracted position to a position to be described later to the coating control device 16 via the communication line L1. The coating control device 16 can emit a signal for causing the robot hands 21, 31 to start moving in the preceding position by receiving the aforementioned preparation signal.

而且,接受前述準備信號的塗佈用控制裝置16以前述往復動作中的規定的時序透過通信線L5將當作動作信號的進入準備信號傳送至搬出用控制裝置33。搬出用控制裝置33一接收前述進入準備信號,就立即使位於待機位置的機械手部31移動至基台11的跟前位置(以圖2的二點鏈線表示的位置)。此處,機械手部31的跟前位置為在該機械手部31的軌道上對平台12成最短距離的位置,不會干涉台架13,為最接近台架13的位置。位於該跟前位置的機械手部31存在於比台架13的軌跡還外側(與平台12相反側)。Then, the coating control device 16 that has received the preparation signal transmits an entry preparation signal as an operation signal to the carry-out control device 33 via the communication line L5 at a predetermined timing in the reciprocating operation. Upon receiving the entry preparation signal, the carry-out control device 33 immediately moves the robot hand 31 located at the standby position to the front position of the base 11 (the position indicated by the two-dot chain line of FIG. 2). Here, the front position of the robot hand 31 is a position that is the shortest distance to the platform 12 on the track of the robot hand 31, and does not interfere with the gantry 13 and is the position closest to the gantry 13. The robot portion 31 located at the front position is present outside the trajectory of the gantry 13 (on the side opposite to the platform 12).

該機械手部31的移動是在台架13的前述往復動作中 進行。而且,位於跟前位置的機械手部31不與移動中的台架13干涉(參照圖3(a))。亦即,可藉由感測器17a防止機械手部31與台架13干涉。具體上,機械手部31是藉由搬出用控制裝置33的位置檢測部6c而位於跟前位置而被驅動控制。假設機械手部31不在跟前位置而是位於平台12側的情形,藉由感測器17a被ON使台架13的移動停止。據此,可事前避免機械手部31與台架13碰撞。The movement of the robot hand 31 is in the aforementioned reciprocating motion of the gantry 13. get on. Further, the robot portion 31 located at the front position does not interfere with the moving gantry 13 (refer to Fig. 3 (a)). That is, the robot hand 31 can be prevented from interfering with the gantry 13 by the sensor 17a. Specifically, the robot unit 31 is driven and controlled by being positioned at the front position by the position detecting unit 6c of the carry-out control device 33. Assuming that the robot hand 31 is not at the front position but on the side of the platform 12, the movement of the gantry 13 is stopped by the sensor 17a being turned ON. According to this, the robot hand 31 can be prevented from colliding with the gantry 13 in advance.

而且,若機械手部31完成移動至跟前位置,則搬出用控制裝置33透過通信線L5將當作動作信號的進入準備完了信號傳送至塗佈用控制裝置16。When the robot hand 31 finishes moving to the front position, the carry-out control device 33 transmits a signal for completion of the entry as an operation signal to the coating control device 16 via the communication line L5.

如此,接收前述進入準備信號的搬出用控制裝置33以該進入準備信號為契機(亦即進入準備信號成為扳機(trigger)),在台架13的前述往復動作完了前開始使位於待機位置的機械手部31移動至跟前位置,使台架13的往復動作與機械手部31的進入準備動作一部分並行。而且,在往復動作中機械手部31到達跟前位置。如此,藉由使機械手部31預先移動至跟前位置,可預先縮短由待機位置到平台12上的位置之機械手部31的移動衝程(stroke)。而且,藉由在台架13的往復動作完了前使機械手部31的進入準備動作開始,可使塗佈塗佈液於基板W的處理用之台架13的往復動作與接受基板W用之機械手部31的移動時間地重疊,可縮短接受基板W用的時間。In this manner, the carry-out control device 33 that receives the entry preparation signal triggers the entry preparation signal (that is, the entry preparation signal becomes a trigger), and starts the machine at the standby position before the reciprocation of the gantry 13 is completed. The hand 31 is moved to the front position, and the reciprocating motion of the gantry 13 is partially parallel to the preparation preparation operation of the robot hand 31. Moreover, the robot hand 31 reaches the preceding position during the reciprocating motion. As described above, by moving the robot hand 31 to the front position in advance, the stroke of the robot hand 31 from the standby position to the position on the stage 12 can be shortened in advance. Further, by starting the preparation preparation operation of the robot hand 31 before the reciprocation of the gantry 13 is completed, the reciprocating operation of the tying 13 for processing the coating liquid on the substrate W and the receiving substrate W can be used. The movement time of the robot hand 31 overlaps, and the time required to receive the substrate W can be shortened.

如以上,本發明的基板處理系統1可執行的並行動作之中之一為如下構件之間的並行動作:塗佈裝置3所具 備,當作為對基板W施以塗佈液的塗佈處理而動作的動作部之台架13;搬出裝置5所具備,為搬出基板W而對塗佈裝置本體10接近背離移動之搬出機械手臂30(機械手部31)。藉由塗佈用控制裝置16與搬出用控制裝置33透過專用通信線L5連接,以該通信線L5在塗佈用控制裝置16與搬出用控制裝置33之間直接進行信號的傳送接收,使台架13與搬出機械手臂30的動作時序精密地連繫,使執行前述並行動作的控制為可能。As described above, one of the parallel operations executable by the substrate processing system 1 of the present invention is a parallel operation between the following components: The gantry 13 is an operation unit that operates as a coating process for applying a coating liquid to the substrate W. The unloading device 5 is provided to carry out the substrate W and move the robot close to the coating device body 10 30 (manipulator part 31). The application control device 16 and the carry-out control device 33 are connected via the dedicated communication line L5, and the signal is directly transmitted and received between the application control device 16 and the carry-out control device 33 via the communication line L5. The frame 13 is closely connected to the operation timing of the carry-out robot arm 30, and it is possible to perform the control of the parallel operation described above.

(2、搬出程序)(2, move out the program)

說明由平台12搬出塗佈有塗佈液的基板W之搬出程序。The unloading procedure of the substrate W coated with the coating liquid by the platform 12 will be described.

在平台12上基板W的吸附被解除,若塗佈用控制裝置16檢測出台架13返回到前述初始位置E(參照圖2),則在確認了感測器17a成為OFF的狀態後,開始搬出程序。台架13一返回到初始位置E,塗佈用控制裝置16就控制銷驅動機構15,如圖3(b)所示使銷14上升。據此,變成基板W離開平台12承載於銷14的尖端的狀態。When the coating control device 16 detects that the gantry 13 has returned to the initial position E (see FIG. 2), the coating control unit 16 detects that the sensor 17a is turned off, and then starts to move out. program. Upon return of the gantry 13 to the initial position E, the coating control device 16 controls the pin drive mechanism 15 to raise the pin 14 as shown in Fig. 3(b). According to this, the state in which the substrate W is carried away from the tip end of the pin 14 is caused.

此處,使銷14上升時藉由塗佈用控制裝置16確認有感測器17b成為OFF。假設機械手部31超越跟前位置位於平台12側的情形,藉由感測器17b被ON使銷14的上升停止。亦即,在機械手部31不在跟前位置而是位於平台12側的狀態下並在使銷14驅動且使基板W上升的情形下,有機械手部31與基板W干涉,基板W損傷之虞。因此,藉由確認在使銷14上升時感測器17b成為OFF,可避免基板W 損傷。Here, when the pin 14 is raised, the coating control device 16 confirms that the sensor 17b is turned off. Assuming that the robot hand 31 is positioned on the side of the platform 12 beyond the preceding position, the rise of the pin 14 is stopped by the sensor 17b being turned ON. In other words, in a state where the robot hand 31 is not in the front position but on the side of the platform 12 and the pin 14 is driven and the substrate W is raised, the robot hand 31 interferes with the substrate W, and the substrate W is damaged. . Therefore, the substrate W can be avoided by confirming that the sensor 17b is turned off when the pin 14 is raised. damage.

銷14為其尖端可移動於平台12的上方的上目標位置,且該上目標位置的更上方的上超出位置而被配設,為了將基板W傳遞至機械手部31的處理,後述的上超出動作被進行。此外,上目標位置是機械手部31(機械手部21)可進入平台12上的位置,是使該基板W配置於比該機械手部31還上面的位置,俾承載於銷14的尖端的基板W不干涉為基板W的遞送而於水平方向接近到平台12上的機械手部31。而且,上超出位置為比上目標位置更上方的位置,即使是銷14的尖端位於上超出位置的狀態,該尖端上的基板W與機械手部31也不干涉。The pin 14 is disposed such that its tip can be moved to the upper target position above the platform 12, and the upper target position of the upper target position is exceeded. In order to transfer the substrate W to the robot portion 31, the latter will be described later. Exceeding the action is performed. Further, the upper target position is a position at which the robot hand 31 (the robot hand 21) can enter the platform 12, and the substrate W is disposed at a position above the robot hand 31, and is carried by the tip end of the pin 14. The substrate W does not interfere with the delivery of the substrate W and approaches the robot hand 31 on the stage 12 in the horizontal direction. Further, the upper excess position is a position higher than the upper target position, and even if the tip end of the pin 14 is in the upper out position, the substrate W on the tip does not interfere with the robot portion 31.

前述[上超出動作]是藉由塗佈用控制裝置16的前述超出控制部7控制銷驅動機構15而被執行的動作,為如圖6(銷14尖端的位置的說明圖)所示藉由使初始位置(尖端為平台12的頂面以下)的銷14上升,使銷14的尖端朝上方通過上目標位置,且到達上超出位置後,使銷14下降,使銷14的尖端由上超出位置折回並使其到達上目標位置為止的動作。The above-mentioned [upper-out operation] is an operation performed by the above-described control unit 16 of the coating control device 16 to control the pin drive mechanism 15, and is shown by FIG. 6 (illustration of the position of the tip end of the pin 14). The pin 14 of the initial position (the tip is below the top surface of the platform 12) is raised so that the tip end of the pin 14 passes upwardly through the upper target position, and after reaching the upper excess position, the pin 14 is lowered, so that the tip end of the pin 14 is exceeded The action of folding back and bringing it to the upper target position.

因塗佈用控制裝置16(位置檢測部6a)是可取得關於銷14(的尖端)的高度位置之資訊,故可檢測銷14的尖端到達上目標位置。因此,若位置檢測部6a在前述上超出動作中檢測出位於初始位置的銷14的尖端成為上目標位置以上,則塗佈用控制裝置16透過通信線L5(參照圖1)將當作動作信號之使機械手部31由前述跟前位置開始進入平 台12上之進入開始信號傳送至搬出用控制裝置33。Since the coating control device 16 (position detecting portion 6a) can obtain information on the height position of the (tip of) the pin 14, it is possible to detect that the tip end of the pin 14 reaches the upper target position. Therefore, when the position detecting unit 6a detects that the tip end of the pin 14 located at the initial position becomes the upper target position or more in the above-described overrun operation, the coating control device 16 transmits the communication line L5 (see FIG. 1) as an action signal. So that the robot hand 31 starts to enter the flat from the aforementioned front position The entry start signal on the stage 12 is transmitted to the carry-out control device 33.

接收進入開始信號的搬出用控制裝置33以該進入開始信號為契機(亦即進入開始信號成為扳機),在前述超出動作完了前使機械手部31開始進入平台12上,可使銷14的上超出動作與機械手部31的進入平台12上的動作一部分並行(包含第一超出動作的並行動作)。而且,如圖3(c)所示,在機械手部31進入平台12上的途中,銷14的尖端由上超出位置返回到上目標位置並到達上目標位置。如此,藉由在銷14的上超出動作完了前使機械手部31的進入開始,可使為傳遞基板W的處理而使銷14的尖端到達上目標位置的動作與搬出基板W用的機械手部31的移動時間地重疊,可縮短遞送並運送基板W用的時間。The carry-out control device 33 that receives the entry start signal takes the entry start signal as a trigger (that is, the entry start signal becomes a trigger), and causes the robot hand 31 to start entering the stage 12 before the overrun operation is completed, so that the pin 14 can be placed thereon. The excess action is in parallel with a portion of the action on the entry platform 12 of the robot 31 (including the parallel action of the first overrun action). Moreover, as shown in FIG. 3(c), on the way of the robot hand 31 entering the platform 12, the tip end of the pin 14 is returned from the upper out position to the upper target position and reaches the upper target position. As described above, by the start of the entry of the robot hand 31 before the completion of the operation of the pin 14, the operation of transferring the substrate W can cause the tip end of the pin 14 to reach the upper target position and the robot for carrying out the substrate W. The movement of the portions 31 is temporally overlapped, and the time for delivering and transporting the substrate W can be shortened.

而且,針對前述上超出動作時的銷14的移動速度藉由圖7來說明。在初始位置停止的銷14到隨著開始上升其速度變成規定值(最大移動速度)為止被加速(時刻t1),以該規定值變成等速。此外,以高速使銷14升降的銷驅動機構15之機械的構成上,為了使銷14在規定的位置停止,需在該使其停止的位置的跟前使其減速。因此,在本發明中藉由前述超出控制部7的控制,在銷14的尖端到達上超出位置的跟前使銷14減速(時刻t2~t3)。如此,因在銷14的尖端到達上超出位置的跟前使銷14減速,故位於初始位置的銷14的尖端可迅速地超越上目標位置。Further, the moving speed of the pin 14 in the case where the above-described upper limit operation is performed will be described with reference to FIG. The pin 14 stopped at the initial position is accelerated until the speed starts to rise to a predetermined value (maximum moving speed) (time t1), and the predetermined value becomes the constant speed. Further, in the mechanical configuration of the pin drive mechanism 15 for raising and lowering the pin 14 at a high speed, in order to stop the pin 14 at a predetermined position, it is necessary to decelerate the position of the pin 14 before it is stopped. Therefore, in the present invention, the pin 14 is decelerated (time t2 to t3) when the tip end of the pin 14 reaches the upper end position by the control of the excess control unit 7. Thus, since the pin 14 is decelerated before the tip end of the pin 14 reaches the upper end position, the tip end of the pin 14 in the initial position can quickly overtake the upper target position.

此外,比較例如以圖7的虛線表示的,在不是使銷的尖端移動至上超出位置,而是直接到達上目標位置的情形 下,需使銷減速直到銷的尖端到達上目標位置,在上目標位置使其停止(設速度為零)。因此,比較例的情形,到最初使銷的尖端到達上目標位置為止的時間若與實施例比較則僅慢時間△t。Further, the comparison is, for example, indicated by the broken line of FIG. 7, in the case where the tip end of the pin is not moved to the upper end position but directly reaches the upper target position. Next, the pin needs to be decelerated until the tip of the pin reaches the upper target position and stops at the upper target position (set the speed to zero). Therefore, in the case of the comparative example, the time until the tip end of the pin first reaches the upper target position is only a slow time Δt as compared with the embodiment.

依照實施例,藉由銷14的尖端提早到達上目標位置,能以早的時序得到銷14的尖端上的基板W與機械手部31不干涉的狀態。因此,為基板W的遞送而能以早的時序使機械手部31開始接近平台12上,可縮短為運送基板W所需的時間。而且,藉由使銷14由上超出位置折回上目標位置,可使銷14到達上目標位置(時刻t4),可使其準備於接著進行的基板W的遞送動作。According to the embodiment, by the tip end of the pin 14 reaching the upper target position early, the state in which the substrate W on the tip end of the pin 14 does not interfere with the robot hand 31 can be obtained at an early timing. Therefore, the robot hand 31 can be brought close to the stage 12 at an early timing for the delivery of the substrate W, and the time required for transporting the substrate W can be shortened. Further, by folding the pin 14 back from the upper position to the upper target position, the pin 14 can be brought to the upper target position (time t4), and it can be prepared for the subsequent delivery operation of the substrate W.

而且,因超出控制部7進行速度控制,俾銷14在達到最大移動速度後通過上目標位置,故銷14的尖端可更迅速地超越上目標位置,能以更早的時序使機械手部31開始接近平台12上。而且,超出控制部7拉長圖7的等速(最大移動速度)區間(亦即減緩減速開始),以最大移動速度使銷14通過上目標位置也可以。超出控制部7具有可針對銷14的上升及下降的速度及加減速調整(變更)的功能。Further, since the speed control is performed beyond the control portion 7, the dowel 14 passes the upper target position after reaching the maximum moving speed, so that the tip end of the pin 14 can more quickly exceed the upper target position, and the robot hand 31 can be made at an earlier timing. Start approaching platform 12. Further, the control unit 7 is extended beyond the constant speed (maximum moving speed) section of FIG. 7 (that is, the slowdown start is started), and the pin 14 may be passed through the upper target position at the maximum moving speed. The excess control unit 7 has a function of adjusting (changing) the speed and the acceleration/deceleration of the pin 14 .

如圖3(d)所示,若機械手部31於水平方向朝平台12上移動並到達銷14上的基板W的下方位置,則搬出用控制裝置33的位置檢測部6c(參照圖1)檢測出其到達,進行藉由搬出驅動裝置32使機械手部31上升的控制,並且搬出用控制裝置33透過通信線L5將當作動作信號的銷下降開始信號傳送至塗佈用控制裝置16。塗佈用控制裝置16一 接收銷下降開始信號,位於上目標位置的銷14的下降就開始(圖6與圖7的時刻t5)。亦即,機械手部31的上升與銷14的下降被並行進行,藉由機械手部31的頂面超越銷14的尖端並位移至上側,使銷14上的基板W被傳遞至機械手部31上。藉由與機械手部31的上升一起使銷14下降,可縮小基板W的遞送所需的機械手部31的上升距離。而且,位於跟前位置的機械手部31開始移動後到接受基板W之間,搬出用控制裝置33透過通信線L5將當作動作信號的進入動作中信號傳送至塗佈用控制裝置16。As shown in Fig. 3 (d), when the robot hand 31 moves in the horizontal direction toward the stage 12 and reaches the position below the substrate W on the pin 14, the position detecting unit 6c of the carry-out control device 33 (see Fig. 1) When the arrival of the robot 31 is raised by the carry-out driving device 32, the carry-out control device 33 transmits a pin lowering start signal as an operation signal to the coating control device 16 via the communication line L5. Coating control device 16 The pin lowering start signal is received, and the lowering of the pin 14 at the upper target position is started (times t5 in Fig. 6 and Fig. 7). That is, the rise of the robot hand 31 and the lowering of the pin 14 are performed in parallel, and the top surface of the robot hand 31 is moved beyond the tip end of the pin 14 and displaced to the upper side, so that the substrate W on the pin 14 is transferred to the robot hand. 31. By lowering the pin 14 together with the rise of the robot hand 31, the rising distance of the robot hand 31 required for the delivery of the substrate W can be reduced. Then, the robot unit 31 located at the front position starts to move between the receiving substrate W, and the carry-out control device 33 transmits an in-operation operation signal as an operation signal to the coating control device 16 via the communication line L5.

而且,在圖6與圖7中在時刻t5位於上目標位置的銷14開始下降後,在時刻t6開始減速,然後基板W的遞送實際被進行。亦即,基板W的遞送被進行時,令銷14的下降速度為低速。此乃是為了減弱基板W之遞送時的給予該基板W的碰撞。而且,若完成遞送(時刻t7),則使下降的銷14加速,切換下降速度成高速,超越下目標位置(時刻t8)並使其減速,使其到達下超出位置(時刻t9),然後使銷14的移動方向朝上升反轉,使其到達下目標位置(時刻t10)。如此,藉由在使尖端位於上目標位置的銷14下降,使銷14的尖端朝下方使其通過下目標位置且到達下超出位置後,使銷14上升,進行使銷14的尖端由下超出位置折回並使其到達下目標位置為止的下超出動作。針對下目標位置及下超出位置於之後說明。Further, after the pin 14 located at the upper target position at time t5 starts to descend in FIGS. 6 and 7, the deceleration starts at time t6, and then the delivery of the substrate W is actually performed. That is, when the delivery of the substrate W is performed, the falling speed of the pin 14 is made low. This is to weaken the collision given to the substrate W at the time of delivery of the substrate W. When the delivery is completed (time t7), the lowered pin 14 is accelerated, the falling speed is switched to a high speed, and the lower target position (time t8) is exceeded and decelerated to reach the lower excess position (time t9), and then The moving direction of the pin 14 is reversed toward the rising direction to reach the lower target position (time t10). Thus, by lowering the pin 14 having the tip end located at the upper target position, the tip end of the pin 14 is passed downward to pass the lower target position and reaches the lower excess position, the pin 14 is raised, and the tip end of the pin 14 is made to pass downward. The position is folded back and causes it to reach the lower target position. The following description is given for the lower target position and the lower position.

在搬出機械手臂30的機械手部31配設有檢測基板W的有無之感測器(未圖示),搬出用控制裝置33可檢測機械 手部31上的基板W的有無。A sensor (not shown) for detecting the presence or absence of the substrate W is disposed in the robot hand 31 that carries out the robot arm 30, and the carry-out control device 33 can detect the machine. The presence or absence of the substrate W on the hand 31.

銷14上的基板W一被傳送至機械手部31,搬出用控制裝置33就透過通信線L5將當作動作信號的基板接受完了信號傳送至塗佈用控制裝置16。搬出用控制裝置33可透過以前述感測器檢測出基板W承載於機械手部31上,輸出前述基板接受完了信號。The substrate W on the pin 14 is conveyed to the robot hand 31, and the carry-out control device 33 transmits a substrate received signal as an operation signal to the coating control device 16 via the communication line L5. The carry-out control device 33 can detect that the substrate W is carried on the robot hand 31 by the sensor, and outputs the signal that the substrate has been received.

而且,若返回圖3(b)說明的話,塗佈用控制裝置16在銷14的前述上超出動作中透過通信線L4將當作動作信號之使位於退避位置的搬進機械手臂20的機械手部21移動至平台12的跟前位置之進入準備信號傳送至搬進用控制裝置23。據此,搬進用控制裝置23使位於待機位置的機械手部21移動至平台12的跟前位置。據此,預先使由待機位置至平台12上的位置之機械手部21的移動衝程縮短。When it is described in FIG. 3(b), the coating control device 16 causes the robot to be moved into the robot arm 20, which is the operation signal, and is located at the retracted position, through the communication line L4 during the above-described overrun of the pin 14. The entry preparation signal of the portion 21 moving to the front position of the platform 12 is transmitted to the carry-in control device 23. Thereby, the loading control device 23 moves the robot hand 21 located at the standby position to the front position of the platform 12. According to this, the movement stroke of the robot hand 21 from the standby position to the position on the stage 12 is shortened in advance.

前述搬進機械手臂20的機械手部21的[跟前位置]是平台12的跟前的位置,此點與設基台11的跟前的位置為[跟前位置]的搬出機械手臂30的機械手部31不同。亦即如前述,因搬出機械手臂30的機械手部31的[跟前位置]需在塗佈動作後的台架13移動至初始位置E時避免台架13與機械手部31的接觸,故被設定於比台架13的移動路徑還外的位置。但是,因搬進機械手臂20的機械手部21在台架13完成移動至初始位置E(參照圖2)後,在位於初始位置E的狀態下移動,故不被台架13的移動影響。因此,即使是在台架13的移動路徑上也在平台12的跟前的位置 (最近的位置)設定有機械手部21的[跟前位置]。The [front position] of the robot hand 21 that is moved into the robot arm 20 is a position in front of the platform 12, and the robot hand portion 31 of the carry-out robot arm 30 that is located at the front position of the base 11 is the front position. different. In other words, as described above, the [front position] of the robot hand 31 that is carried out of the robot arm 30 is required to avoid contact between the gantry 13 and the robot hand 31 when the gantry 13 after the application operation is moved to the initial position E. It is set to a position other than the movement path of the gantry 13. However, since the robot hand 21 that has been moved into the robot arm 20 moves to the initial position E (see FIG. 2) after the gantry 13 has finished moving, it moves in the state of the initial position E, and thus is not affected by the movement of the gantry 13. Therefore, even in the moving path of the gantry 13 is the position in front of the platform 12. The [closest position] is set to the [front position] of the robot hand 21.

在該機械手部21的跟前位置中,機械手部21與基板W不干涉。具體上,藉由搬進用控制裝置23的位置檢測部6b使機械手部21由退避位置位於跟前位置而被驅動控制。假設比跟前位置還靠平台12側的情形,透過感測器17c被ON使銷14的動作被鎖緊。據此,可事前避免機械手部21與基板W碰撞。In the front position of the robot hand 21, the robot hand 21 does not interfere with the substrate W. Specifically, the position detecting unit 6b of the loading control device 23 causes the robot hand 21 to be driven and controlled by the retracted position at the preceding position. It is assumed that the action of the pin 14 is locked by the sensor 17c being turned on by the side of the platform 12 being closer to the front position. According to this, the robot hand 21 can be prevented from colliding with the substrate W in advance.

而且,如圖4(e)所示,藉由機械手部31接受基板W,塗佈用控制裝置16接收前述基板接受信號,且檢測銷14的尖端到達下目標位置(圖6與圖7的時刻t8),透過通信線L5將當作動作信號之使讓機械手部31由平台12上退避至前述待機位置側的動作開始的退避開始信號(退避開始的扳機)傳送至搬出用控制裝置33。接收前述退避開始信號的搬出用控制裝置33是藉由搬出驅動機構32使機械手部31退避(參照圖4(f))。Then, as shown in FIG. 4(e), the substrate W is received by the robot portion 31, and the coating control device 16 receives the substrate receiving signal, and the tip end of the detecting pin 14 reaches the lower target position (FIG. 6 and FIG. 7). At time t8), the retraction start signal (trigger of the start of retraction) for causing the robot hand 31 to be retracted from the stage 12 to the standby position side as the operation signal is transmitted to the carry-out control device 33 as the operation signal. . The carry-out control device 33 that receives the retraction start signal retracts the robot hand 31 by the carry-out drive mechanism 32 (see FIG. 4(f)).

與前述退避開始信號的傳送一起,塗佈用控制裝置16透過通信線L4將當作動作信號之使機械手部21由平台12的跟前位置開始進入平台12上的動作之進入開始信號(進入開始的扳機)傳送至搬進用控制裝置23。接收前述進入開始信號的搬進用控制裝置23藉由搬進驅動機構22使承載下一個基板W的機械手部21進出於平台12上(參照圖4(f))。The coating control device 16 transmits an operation start signal to the operation of the robot hand 21 from the front position of the platform 12 to the platform 12 via the communication line L4 via the communication line L4. The trigger is transmitted to the loading control device 23. The loading control device 23 that receives the entry start signal causes the robot hand 21 that carries the next substrate W to enter the platform 12 by the loading drive mechanism 22 (see FIG. 4(f)).

據此,機械手部31的退避動作與使機械手部21進出於平台12上,將下一個基板W搬進塗佈裝置本體10的動 作被並行進行。Accordingly, the retracting operation of the robot hand 31 and the movement of the robot hand 21 into the platform 12 to move the next substrate W into the coating device body 10 are performed. The work is done in parallel.

到機械手部31返回待機位置為止之間,搬出用控制裝置33透過通信線L5將當作動作信號的退避動作中信號傳送至塗佈用控制裝置16。機械手部31一超越跟前位置並退避至待機位置(圖4(g)),搬出用控制裝置33就透過通信線L5將當作動作信號的退避完了信號傳送至塗佈用控制裝置16。而且,成為主控制裝置2可進行發出容許搬出機械手臂30的動作開始的指令信號的控制之狀態。而且,若搬出用控制裝置33藉由前述感測器(未圖示)檢測出在機械手部31上存在基板W,則透過通信線L5將基板在籍信號傳送至塗佈用控制裝置16,且透過通信線L3將基板在籍信號傳送至主控制裝置2,主控制裝置2更新塗佈塗佈液的基板W的POS資料(data)。而且,由平台12搬出的基板W前進到下一個製程之利用乾燥裝置(VCD)進行的乾燥製程。When the robot unit 31 returns to the standby position, the carry-out control device 33 transmits a signal for the retracting operation as the operation signal to the coating control device 16 via the communication line L5. When the robot unit 31 passes beyond the preceding position and retreats to the standby position (Fig. 4(g)), the carry-out control device 33 transmits a signal indicating that the operation signal is retracted to the coating control device 16 via the communication line L5. Further, the main control device 2 can perform a state of controlling the command signal for starting the operation of the robot 30. When the carry-out control device 33 detects that the substrate W is present on the robot unit 31 by the sensor (not shown), the substrate signal is transmitted to the coating control device 16 via the communication line L5. The substrate registration signal is transmitted to the main control device 2 via the communication line L3, and the main control device 2 updates the POS data of the substrate W to which the coating liquid is applied. Further, the substrate W carried out by the stage 12 is advanced to a drying process by a drying device (VCD) of the next process.

(3、搬進程序)(3, moving into the program)

說明將塗佈塗佈液的下一個基板W搬進平台12的搬進程序。A loading procedure for moving the next substrate W to which the coating liquid is applied into the stage 12 will be described.

在前述下超出動作中,若銷14的尖端最初到達下目標位置(圖6與圖7的時刻t8)並成為該下目標位置以下,則如前述,塗佈用控制裝置16傳送使機械手部31由平台12上退避至待機位置側的動作開始的退避開始信號,並且塗佈用控制裝置16透過通信線L4(參照圖1)將當作動作信號之使機械手部21由跟前位置開始進入平台12上的進入開 始信號傳送至搬進用控制裝置23。搬進用控制裝置23一接收前述進入開始信號,如圖4(f)所示就使位於跟前位置的機械手部21移動至平台12上。When the tip end of the pin 14 first reaches the lower target position (time t8 in FIGS. 6 and 7) and becomes below the lower target position, the coating control device 16 transmits the robot arm portion as described above. 31 is a back-off start signal that is retracted from the platform 12 to the operation on the standby position side, and the coating control device 16 transmits the robot hand 21 from the front position as an operation signal via the communication line L4 (see FIG. 1). Entry on platform 12 The start signal is transmitted to the carry-in control device 23. Upon receiving the aforementioned entry start signal, the loading control device 23 moves the robot portion 21 located at the front position to the stage 12 as shown in Fig. 4(f).

前述下目標位置如圖4(f)所示是承載基板W的機械手部21可進入平台12上的位置,是在機械手部31上的基板W的下方存在銷14的尖端,俾藉由機械手部21搬進平台12上的基板W與銷14的尖端不干涉的位置。而且,在比下目標位置更下方設定有前述下超出位置,即使是該下超出位置,機械手部31上的基板W與銷14的尖端也不干涉。As shown in FIG. 4(f), the lower target position is a position at which the robot hand 21 carrying the substrate W can enter the platform 12, and the tip end of the pin 14 is present below the substrate W on the robot portion 31. The robot hand 21 is moved into a position where the substrate W on the stage 12 does not interfere with the tip end of the pin 14. Further, the lower end position is set below the lower target position, and even if the lower position is exceeded, the substrate W on the robot hand 31 does not interfere with the tip end of the pin 14.

如前述,接收進入開始信號的搬進用控制裝置23以該進入開始信號為契機(亦即進入開始信號成為扳機),在前述下超出動作完了前使機械手部21之進入平台12上開始。據此,為了搬進基板W的處理,可使銷14的下超出動作與機械手部21之進入平台12上的動作一部分並行(包含第二超出動作之並行動作)。而且,在機械手部21進入平台12上的途中,銷14的尖端由下超出位置返回到下目標位置並到達下目標位置。此外,下超出動作是藉由塗佈用控制裝置16的前述超出控制部7控制銷驅動機構15而執行。As described above, the carry-in control device 23 that receives the entry start signal triggers the entry start signal (that is, the entry start signal becomes a trigger), and starts the entry of the robot hand 21 onto the stage 12 before the above-described overrun operation is completed. Accordingly, in order to carry out the processing of the substrate W, the downward movement of the pin 14 can be parallel with the operation of the robot hand 21 on the entry platform 12 (including the parallel operation of the second overrun operation). Moreover, on the way that the robot hand 21 enters the platform 12, the tip end of the pin 14 returns from the lower over position to the lower target position and reaches the lower target position. Further, the lower overrunning operation is performed by the above-described excess control unit 7 of the coating control device 16 controlling the pin driving mechanism 15.

如此,藉由在銷14的下超出動作完了前使機械手部21的進入開始,可使為基板W的遞送的處理而使銷14的尖端到達下目標位置的動作,與傳遞下一個基板W至銷14的處理用的機械手部21的移動時間地重疊,可縮短為運送基板W所需的時間。而且,如圖7所示藉由使銷14在下超 出位置的跟前(時刻t8~t9)減速,銷14的尖端可迅速地超越下目標位置。因此,能以早的時序得到機械手部21上的基板W與銷14的尖端不干涉的狀態,故能以早的時序使機械手部21開始接近平台12上,可縮短運送基板W用的時間。Thus, by starting the entry of the robot hand 21 before the lowering of the pin 14 is completed, the action of the delivery of the substrate W can be made to bring the tip end of the pin 14 to the lower target position, and the next substrate W can be transferred. The movement time of the robot hand 21 for the processing of the pin 14 is overlapped, and the time required for transporting the substrate W can be shortened. Moreover, as shown in Figure 7, by making the pin 14 in the lower The front end of the position (time t8~t9) is decelerated, and the tip end of the pin 14 can quickly exceed the lower target position. Therefore, the state in which the substrate W on the robot hand 21 and the tip end of the pin 14 do not interfere with each other can be obtained at an early timing. Therefore, the robot hand 21 can be approached to the stage 12 at an early timing, and the transport of the substrate W can be shortened. time.

而且,如圖4(g)所示若機械手部21移動於水平方向並到達銷14的尖端的上方位置,則搬進用控制裝置23透過通信線L4將當作動作信號的銷上升開始信號傳送至塗佈用控制裝置16。此時,藉由感測器17b成為OFF,在平台12上不存在機械手部31被確認。亦即,機械手部31與基板W的干涉被防止。而且,藉由接收銷上升開始信號的塗佈用控制裝置16使銷14上升,銷14的尖端超越機械手部21的頂面並位移至上側,機械手部21上的基板W被傳遞至銷14上(參照圖4(h))。此外,在該銷14的上升中藉由超出控制部7進行與前述上超出動作相同的動作。When the robot hand 21 moves in the horizontal direction and reaches the upper position of the tip end of the pin 14 as shown in Fig. 4(g), the loading control device 23 transmits a pin rising start signal as an operation signal via the communication line L4. It is sent to the coating control device 16. At this time, when the sensor 17b is turned OFF, the robot hand 31 is not confirmed on the stage 12. That is, the interference of the robot portion 31 with the substrate W is prevented. Further, the coating control device 16 that receives the pin rise start signal raises the pin 14, the tip end of the pin 14 passes over the top surface of the robot hand portion 21 and is displaced to the upper side, and the substrate W on the robot hand portion 21 is transferred to the pin. 14 (refer to Figure 4 (h)). Further, during the rise of the pin 14, the same operation as the above-described overrun operation is performed by the control unit 7.

塗佈用控制裝置16若在該上超出動作中檢測出上升的銷14的尖端成為上目標位置以上,則透過通信線L4將當作動作信號之使機械手部21由平台12上退避至退避位置側的退避開始信號傳送至搬進用控制裝置23。接收該退避開始信號的搬進用控制裝置23以該退避開始信號為契機(亦即退避開始信號成為扳機),在前述上超出動作完了前使機械手部21之由平台12上退避開始。據此,可使銷14的上超出動作與機械手部21之由平台12上退避的動作一部分並行(包含第三超出動作之並行動作)。而且,如圖 5(i)所示在機械手部21由平台12上退避的途中,銷14的尖端由上超出位置返回到上目標位置並到達上目標位置。When the tip end of the pin 14 that has detected the rise in the upper movement operation is equal to or higher than the upper target position, the coating control device 16 retracts the robot hand 21 from the platform 12 to the evacuation via the communication line L4 as an operation signal. The back-off start signal on the position side is transmitted to the carry-in control device 23. The carry-in control device 23 that receives the back-off start signal is triggered by the back-off start signal (that is, the back-off start signal is a trigger), and the robot 12 is retracted from the platform 12 before the above-described overrun operation is completed. Accordingly, the upward movement of the pin 14 can be made in parallel with a part of the operation of the robot 21 that is retracted from the platform 12 (including the parallel operation of the third excess operation). And, as shown 5(i) shows that on the way of the robot hand 21 retreating from the platform 12, the tip end of the pin 14 returns from the upper out position to the upper target position and reaches the upper target position.

如此,藉由在銷14的上超出動作完了前使機械手部21的退避開始,可使為搬進基板W的處理而使銷14的尖端到達上目標位置的動作,與搬入基板W後的機械手部21的移動時間地重疊,可縮短基板W的運送所需的時間。而且,在前述上超出動作中藉由使銷14的尖端在上超出位置的跟前減速,使銷14的尖端可迅速地超越上目標位置,能以早的時序使機械手部21由平台12上退避,可縮短運送基板W用的時間。By starting the retraction of the robot hand 21 before the operation of the pin 14 is completed, the operation of loading the substrate W can cause the tip end of the pin 14 to reach the upper target position, and after the substrate W is loaded. The movement time of the robot hand 21 overlaps, and the time required for the conveyance of the substrate W can be shortened. Moreover, in the above-described over-excession action, the tip end of the pin 14 can quickly overtake the upper target position by decelerating the tip end of the pin 14 above the position, and the robot hand 21 can be placed on the platform 12 at an early timing. By retreating, the time required to transport the substrate W can be shortened.

而且,到機械手部21移動至平台12上,將基板W傳遞至銷14之間,搬進用控制裝置23透過通信線L4將當作動作信號之進入動作中信號傳送至塗佈用控制裝置16。而且,若機械手部21上的基板W被傳遞至銷14,則搬進用控制裝置23透過通信線L4將當作動作信號之基板遞送完了信號傳送至塗佈用控制裝置16。Then, the robot hand 21 moves to the stage 12, and the substrate W is transferred between the pins 14. The carry-in control device 23 transmits a signal indicating the operation of the operation signal to the coating control device via the communication line L4. 16. When the substrate W on the robot unit 21 is transmitted to the pin 14, the carry-in control device 23 transmits a signal indicating that the substrate is an operation signal to the coating control device 16 via the communication line L4.

而且,如圖5(j)所示搬進用控制裝置23使機械手部21退避至待機位置側。到機械手部21返回到待機位置之間,搬進用控制裝置23透過通信線L4將當作動作信號之退避動作中信號傳送至塗佈用控制裝置16。若成為機械手部21超越跟前位置並退避至待機位置的狀態,則搬進用控制裝置23透過通信線L4將當作動作信號之退避完了信號傳送至塗佈用控制裝置16。Then, as shown in FIG. 5(j), the loading control device 23 retracts the robot hand 21 to the standby position side. When the robot unit 21 returns to the standby position, the loading control device 23 transmits a signal for the retracting operation as the operation signal to the coating control device 16 via the communication line L4. When the robot unit 21 is in a state of being over the forward position and retracted to the standby position, the loading control device 23 transmits a signal indicating that the operation signal is retracted to the coating control device 16 via the communication line L4.

塗佈用控制裝置16一接收前述退避完了信號,如圖5(k)所示,就使承載基板W的銷14下降,當作已將基板W承載於平台12上的狀態。此時,藉由感測器17c為OFF被確認,機械手部21與基板W的干涉被避免。而且,使基板W吸附於平台12,開始前述塗佈製程。而且,成為可進行機械手部21一到達待機位置,主控制裝置2就發出容許搬進機械手臂20的動作開始的指令信號之控制的狀態。As soon as the coating control device 16 receives the retraction signal, as shown in FIG. 5(k), the pin 14 of the carrier substrate W is lowered to assume that the substrate W has been placed on the stage 12. At this time, it is confirmed that the sensor 17c is OFF, and interference between the robot hand 21 and the substrate W is avoided. Further, the substrate W is adsorbed to the stage 12 to start the aforementioned coating process. When the robot hand 21 reaches the standby position, the main control device 2 can control the command signal for allowing the movement of the robot arm 20 to start.

依照如以上構成的基板處理系統1,因塗佈裝置3與搬出裝置5可不透過主控制裝置2而直接藉由通信線L5通信,塗佈裝置3與搬進裝置4可不透過主控制裝置2而直接藉由通信線L4通信,故精密地連繫塗佈裝置3與搬出裝置5的動作時序之控制,以及精密地連繫塗佈裝置3與搬進裝置4的動作時序之控制變的容易。According to the substrate processing system 1 configured as described above, since the coating device 3 and the unloading device 5 can communicate directly via the communication line L5 without passing through the main control device 2, the coating device 3 and the loading device 4 can be prevented from passing through the main control device 2. Since it is directly communicated by the communication line L4, it is easy to precisely control the operation timing of the application device 3 and the carry-out device 5, and to precisely control the operation timing of the application device 3 and the loading device 4.

而且,藉由搬出用控制裝置33及搬進用控制裝置23以由塗佈裝置3透過通信線L5、L4傳送的動作信號為契機,在使銷14(台架13)到達目標位置(作業完了位置)之動作完了前使機械手部的移動開始,可使使銷14(台架13)到達目標位置(作業完了位置)之動作與基板W的遞送用的機械手部的移動時間地重疊。因此,可縮短到搬進基板W、塗佈塗佈液於該基板W、搬出基板W為止的程序所需的時間,可提高基板W的生產效率(處理效率)。Then, the carry-out control device 33 and the carry-in control device 23 cause the pin 14 (the gantry 13) to reach the target position when the operation signal transmitted from the application device 3 through the communication lines L5 and L4 is turned on (the work is completed). When the movement of the robot hand is started before the operation of the position is completed, the movement of the pin 14 (the gantry 13) to the target position (the work-completed position) can be overlapped with the movement time of the robot for the delivery of the substrate W. Therefore, the time required for the process of loading the substrate W, applying the coating liquid to the substrate W, and carrying out the substrate W can be shortened, and the production efficiency (processing efficiency) of the substrate W can be improved.

說明別的實施形態的基板處理系統51所執行的並行動作。如圖8所示,該基板處理系統51為基板處理裝置具備:乾燥裝置(VCD)40、搬進裝置4及搬出裝置5。乾燥裝 置40是使藉由前述塗佈裝置3塗佈有塗佈液的基板W上的塗佈膜乾燥。乾燥裝置40具備:(相當於前述塗佈用控制裝置16之)乾燥用控制裝置45、乾燥機械手臂46,乾燥機械手臂46除了具備與前述塗佈裝置3同樣的基台41及升降的銷44外,還具備由上面覆蓋基台41上的基板W之蓋42,與使該蓋42升降之蓋驅動機構43。搬進裝置4及搬出裝置5與在圖1的形態被使用者相同。The parallel operation performed by the substrate processing system 51 of the other embodiment will be described. As shown in FIG. 8, the substrate processing system 51 includes a drying device (VCD) 40, a loading device 4, and a carrying device 5 as a substrate processing device. Drying The coating 40 is to dry the coating film on the substrate W coated with the coating liquid by the coating device 3. The drying device 40 includes a drying control device 45 (corresponding to the coating control device 16) and a drying robot arm 46. The drying robot arm 46 includes a base 41 and a lifting pin 44 similar to the coating device 3 described above. Further, a cover 42 that covers the substrate W on the base 41 from above and a cover drive mechanism 43 that lifts and lowers the cover 42 are provided. The loading device 4 and the unloading device 5 are the same as those of the user in the form of Fig. 1 .

藉由乾燥機械手臂46乾燥基板W時,如圖8(a)所示,蓋42在基台41上位於最下位置,藉由蓋42與基台41的頂面形成有密閉狀態的乾燥用空間V。而且,銷44的上端位於基台41的頂面以下的位置。When the substrate W is dried by the drying robot arm 46, as shown in Fig. 8(a), the lid 42 is positioned at the lowest position on the base 41, and the lid 42 and the top surface of the base 41 are formed to be sealed in a sealed state. Space V. Further, the upper end of the pin 44 is located below the top surface of the base 41.

若完成基板W的乾燥處理,則蓋42移動至基台41的上方的上升位置(目標位置)。在該上升位置中,即使成為搬進機械手臂20的機械手部21及搬出機械手臂30的機械手部31進入平台12上的狀態,蓋42與機械手部21、31也不會干涉。相反地,到蓋42到達上升位置為止若機械手部21、31進入平台12上,則兩者碰撞。蓋42的位置可藉由乾燥用控制裝置45所具有的位置檢測部(與在前述實施形態說明的一樣)檢測。When the drying process of the substrate W is completed, the lid 42 is moved to the upward position (target position) above the base 41. In the raised position, even if the robot hand 21 that has been loaded into the robot arm 20 and the robot hand 31 that carries out the robot arm 30 enter the platform 12, the cover 42 and the robot portions 21 and 31 do not interfere. Conversely, if the manipulators 21, 31 enter the platform 12 until the cover 42 reaches the raised position, the two collide. The position of the cover 42 can be detected by the position detecting unit (which is the same as that described in the above embodiment) included in the drying control device 45.

而且,該實施形態中的並行動作為如下構件之間的動作:當作為施以使基板W乾燥的處理而進行上下動作的動作部之前述蓋42;前述搬出裝置5所具備,為運送基板W而對基台41接近背離移動之機械手部31。In addition, in the above-described embodiment, the operation is performed as the above-described cover 42 as an operation unit that performs a vertical operation by applying a process of drying the substrate W. The carry-out device 5 is provided to transport the substrate W. The base 41 is approached away from the moving robot 31.

為了實現該並行動作,與前述的實施形態(圖1)一 樣,乾燥用控制裝置45與搬出用控制裝置33藉由專用通信線L5連接。而且,藉由以該通信線L5在乾燥用控制裝置45與搬出用控制裝置33之間進行信號的傳送接收,使蓋42與搬出機械手臂30的動作時序連繫的控制為可能。In order to achieve this parallel operation, one of the above embodiments (Fig. 1) The drying control device 45 and the carry-out control device 33 are connected by a dedicated communication line L5. In addition, by the transmission and reception of signals between the drying control device 45 and the carry-out control device 33 by the communication line L5, it is possible to control the timing of the operation of the cover 42 and the carry-out robot 30.

說明藉由如此構成的基板處理系統51進行的基板W的乾燥處理。藉由塗佈裝置塗佈有塗佈液的基板W藉由搬進裝置4搬進乾燥機械手臂46的基台41上,蓋42下降成最下位置,在前述乾燥用空間V內使基板W乾燥(參照圖8(a))。基板W的乾燥一結束,就使蓋42移動至基台41的上方的上升位置(目標位置),並且為將基板W傳遞至搬出機械手臂30而使銷44上升並舉起該基板W。蓋42的上升動作時,主控制裝置2透過通信線將使機械手部31進出於乾燥機械手臂46的跟前位置(以圖8的二點鏈線表示的位置)用的準備信號傳送至乾燥用控制裝置45。The drying process of the substrate W by the substrate processing system 51 thus constituted will be described. The substrate W coated with the coating liquid by the coating device is carried into the base 41 of the drying robot arm 46 by the loading device 4, and the lid 42 is lowered to the lowest position, and the substrate W is made in the drying space V. Dry (refer to Figure 8 (a)). When the drying of the substrate W is completed, the lid 42 is moved to the upward position (target position) above the base 41, and the substrate W is lifted to the carry-out robot arm 30 to raise the pin 44 and lift the substrate W. When the lid 42 is raised, the main control device 2 transmits the preparation signal for moving the robot hand 31 to the front position of the drying robot arm 46 (the position indicated by the two-dot chain line of FIG. 8) through the communication line to the drying. Control device 45.

接收準備信號的乾燥用控制裝置45在蓋42的上升動作中,透過通信線L5將當作動作信號之使位於退避位置的機械手部31進出至乾燥機械手臂46的跟前位置的進入準備信號傳送至搬出用控制裝置33。接收進入準備信號的搬出用控制裝置33以該進入準備信號為契機(亦即進入準備信號成為扳機),在蓋42的前述上升動作完了前使位於待機位置的機械手部31開始朝前述跟前位置移動。此外,位於前述跟前位置的機械手部31不與上升中的蓋42干涉。據此,可使蓋42的上升動作與搬出機械手臂30的準備進入動作一部分並行。藉由使位於待機位置的機械手部31 開始朝跟前位置移動,可預先縮短由待機位置到基台41上的位置之機械手部31的移動衝程。而且,藉由在蓋42的上升動作完了前使搬出機械手臂30的進入開始,可使蓋42的上升動作與接受基板W的處理用的機械手部31的移動時間地重疊,可縮短運送基板W用的時間。The drying control device 45 that receives the preparation signal transmits the entry ready signal transmission to and from the robot arm portion 31 at the retracted position as the operation signal to the front position of the drying robot arm 46 through the communication line L5 during the ascending operation of the cover 42. It is up to the carry-out control device 33. The carry-out control device 33 that receives the entry preparation signal triggers the entry preparation signal (that is, the entry preparation signal becomes a trigger), and causes the robot hand 31 located at the standby position to start toward the preceding position before the rising operation of the cover 42 is completed. mobile. Further, the robot portion 31 located at the aforementioned front position does not interfere with the rising cover 42. As a result, the upward movement of the lid 42 can be made parallel with the preparation operation of the carry-out robot arm 30. By bringing the robot portion 31 in the standby position Starting to move toward the front position, the movement stroke of the robot hand 31 from the standby position to the position on the base 41 can be shortened in advance. By the start of the entry of the carry-out robot 30 before the upward movement of the cover 42 is completed, the upward movement of the cover 42 and the movement of the robot hand 31 for receiving the substrate W can be overlapped, and the transport substrate can be shortened. W used time.

而且,乾燥用控制裝置45若檢測出蓋42到達前述上升位置,則透過通信線L5將當作動作信號之使機械手部31由前述跟前位置開始進入基台41上的進入開始信號傳送至搬出用控制裝置33,搬出用控制裝置33以該進入開始信號為契機,使機械手部31開始進入基台41上(圖8(c))。而且,與前述形態一樣,機械手部31接受銷44上的基板W,可搬出該基板W。When the drying control device 45 detects that the cover 42 has reached the rising position, the drying start signal is transmitted to the loading/unloading signal by the communication line L5, which causes the robot hand 31 to enter the base 41 from the preceding position. With the control device 33, the carry-out control device 33 causes the robot hand 31 to start entering the base 41 by the entry start signal (Fig. 8(c)). Further, as in the above-described embodiment, the robot hand 31 receives the substrate W on the pin 44 and can carry out the substrate W.

此外,本發明的基板處理系統1不限於圖示的形態,在本發明的範圍內為其他的形態者也可以。在前述實施形態中雖然是以在裝置間傳送接收信號的傳輸路徑當作通信線(纜線)來說明,惟該傳輸路徑藉由無線構成也可以。而且,主控制裝置2與塗佈用控制裝置16不是不同體而是被收納於共同的框體內的裝置也可以。Further, the substrate processing system 1 of the present invention is not limited to the illustrated embodiment, and may be other forms within the scope of the present invention. In the above embodiment, the transmission path for transmitting and receiving signals between the devices is described as a communication line (cable), but the transmission path may be configured by wireless. Further, the main control device 2 and the coating control device 16 may be different from each other but may be housed in a common casing.

1‧‧‧基板處理系統1‧‧‧Substrate processing system

2‧‧‧主控制裝置(主控制部)2‧‧‧Main control unit (main control unit)

3‧‧‧塗佈裝置(基板處理裝置)3‧‧‧ Coating device (substrate processing device)

4‧‧‧搬進裝置(第一傳送裝置)4‧‧‧Moving device (first conveyor)

5‧‧‧搬出裝置(第二傳送裝置)5‧‧‧Withdrawal device (second conveyor)

6a、6b、6c‧‧‧位置檢測部6a, 6b, 6c‧‧‧ position detection department

7‧‧‧超出控制部7‧‧‧Exceeding the Control Department

10‧‧‧塗佈裝置本體10‧‧‧ Coating device body

11‧‧‧基台11‧‧‧Abutment

12‧‧‧平台12‧‧‧ platform

13‧‧‧台架(動作部)13‧‧‧Rack (action department)

14‧‧‧銷(動作部)14‧‧‧ Pin (Action Department)

15‧‧‧銷驅動機構15‧‧‧ pin drive mechanism

16‧‧‧塗佈用控制裝置16‧‧‧ Coating control device

17a~17d‧‧‧感測器17a~17d‧‧‧ sensor

20‧‧‧搬進機械手臂20‧‧‧ Moving into the robotic arm

21、31‧‧‧機械手部(運送部)21, 31‧‧‧ Robots (Transportation Department)

22‧‧‧搬進驅動機構22‧‧‧ Moving into the drive mechanism

23‧‧‧搬進用控制裝置23‧‧‧ Moving control device

30‧‧‧搬出機械手臂30‧‧‧Moving out the robotic arm

32‧‧‧搬出驅動機構32‧‧‧ Moving out of the drive mechanism

33‧‧‧搬出用控制裝置33‧‧‧Moving control device

40‧‧‧乾燥裝置(基板處理裝置)40‧‧‧Drying device (substrate processing device)

41‧‧‧基台41‧‧‧Abutment

42‧‧‧蓋(動作部)42‧‧‧ cover (action department)

43‧‧‧蓋驅動機構43‧‧‧ cover drive mechanism

44‧‧‧銷44‧‧ ‧ sales

45‧‧‧乾燥用控制裝置45‧‧‧Drying control device

46‧‧‧乾燥機械手臂46‧‧‧Drying robot

E‧‧‧初始位置E‧‧‧ initial position

F‧‧‧作業完了位置F‧‧‧Location finished

L1~L5‧‧‧專用通信線(傳輸路徑)L1~L5‧‧‧ dedicated communication line (transmission path)

W‧‧‧基板W‧‧‧Substrate

圖1是顯示本發明的基板處理系統的實施的一形態之概略構成圖。Fig. 1 is a schematic block diagram showing an embodiment of an embodiment of a substrate processing system of the present invention.

圖2是由上方看基板處理系統之概略構成圖。Fig. 2 is a schematic block diagram of the substrate processing system as seen from above.

圖3是藉由本發明的基板處理系統進行的塗佈處理之 說明圖。Figure 3 is a coating process performed by the substrate processing system of the present invention. Illustrating.

圖4是藉由本發明的基板處理系統進行的塗佈處理之說明圖。4 is an explanatory view of a coating process performed by the substrate processing system of the present invention.

圖5是藉由本發明的基板處理系統進行的塗佈處理之說明圖。Fig. 5 is an explanatory view of a coating process performed by the substrate processing system of the present invention.

圖6是銷尖端的位置之說明圖。Fig. 6 is an explanatory view of the position of the pin tip.

圖7是銷的移動速度之說明圖。Fig. 7 is an explanatory diagram of the moving speed of the pin.

圖8是別的實施形態的基板處理系統所執行的並行動作之說明圖。Fig. 8 is an explanatory diagram of parallel operations performed by the substrate processing system of another embodiment.

1‧‧‧基板處理系統1‧‧‧Substrate processing system

2‧‧‧主控制裝置(主控制部)2‧‧‧Main control unit (main control unit)

3‧‧‧塗佈裝置(基板處理裝置)3‧‧‧ Coating device (substrate processing device)

4‧‧‧搬進裝置(第一傳送裝置)4‧‧‧Moving device (first conveyor)

5‧‧‧搬出裝置(第二傳送裝置)5‧‧‧Withdrawal device (second conveyor)

6a、6b、6c‧‧‧位置檢測部6a, 6b, 6c‧‧‧ position detection department

7‧‧‧超出控制部7‧‧‧Exceeding the Control Department

10‧‧‧塗佈裝置本體10‧‧‧ Coating device body

11‧‧‧基台11‧‧‧Abutment

12‧‧‧平台12‧‧‧ platform

13‧‧‧台架(動作部)13‧‧‧Rack (action department)

14‧‧‧銷(動作部)14‧‧‧ Pin (Action Department)

15‧‧‧銷驅動機構15‧‧‧ pin drive mechanism

16‧‧‧塗佈用控制裝置16‧‧‧ Coating control device

20‧‧‧搬進機械手臂20‧‧‧ Moving into the robotic arm

21、31‧‧‧機械手部(運送部)21, 31‧‧‧ Robots (Transportation Department)

22‧‧‧搬進驅動機構22‧‧‧ Moving into the drive mechanism

23‧‧‧搬進用控制裝置23‧‧‧ Moving control device

30‧‧‧搬出機械手臂30‧‧‧Moving out the robotic arm

32‧‧‧搬出驅動機構32‧‧‧ Moving out of the drive mechanism

33‧‧‧搬出用控制裝置33‧‧‧Moving control device

L1~L5‧‧‧專用通信線(傳輸路徑)L1~L5‧‧‧ dedicated communication line (transmission path)

W‧‧‧基板W‧‧‧Substrate

Claims (4)

一種基板處理系統,包含:具有為處理基板而動作的動作部之基板處理裝置;具有為運送該基板而對該基板處理裝置接近背離移動的運送部之運送裝置,藉由發出指令信號至該基板處理裝置及該運送裝置的主控制部統括有該基板處理裝置及該運送裝置,其特徵包含:在該基板處理裝置與該運送裝置之間進行信號的傳送接收之傳輸路徑;以及藉由根據透過該傳輸路徑在該基板處理裝置與該運送裝置之間被傳送的信號,在該動作部的動作完了前使該運送部的移動開始,使該動作部的動作與該運送部的移動並行之控制部,該動作部可移動於不與為進行該基板的遞送而接近來的該運送部干涉的目標位置,及於移動方向超越該目標位置,不與該運送部干涉的超出位置而被配設,該基板處理裝置具有使該動作部於該移動方向通過該目標位置且在該超出位置的跟前使該動作部減速,使該動作部由該超出位置折回該目標位置而控制的超出控制部。 A substrate processing system includes: a substrate processing device having an operation portion that operates to process a substrate; and a transfer device having a transport portion that transports the substrate to move away from the substrate processing device, and issues a command signal to the substrate The processing device and the main control unit of the transport device include the substrate processing device and the transport device, and the method includes: a transmission path for transmitting and receiving signals between the substrate processing device and the transport device; and The transmission path is a signal transmitted between the substrate processing apparatus and the transport apparatus, and the movement of the transport unit is started before the operation of the operation unit is completed, and the operation of the operation unit and the movement of the transport unit are controlled in parallel. The moving portion is movable to a target position that does not interfere with the transport portion that is approaching for the delivery of the substrate, and is disposed at an over position that does not interfere with the transport portion in the moving direction beyond the target position. The substrate processing apparatus has a moving portion that passes the target position in the moving direction and is in the excess position The operation of the deceleration portion, so that the folded back portion of the operation beyond the position of the target position beyond the control of the control unit. 如申請專利範圍第1項之基板處理系統,其中藉由該控制部在該動作部折回並到達該目標位置的動作完了前使該運送部的移動開始,使該動作部的移動與該運送部的移動並行。 The substrate processing system according to claim 1, wherein the movement of the transport unit is started before the operation of the control unit is folded back and reaches the target position, and the movement of the operation unit and the transport unit are performed. The movement is parallel. 如申請專利範圍第1項之基板處理系統,其中該超出控制部進行速度控制,俾該動作部在達到最大移動速度 後通過該目標位置。 The substrate processing system of claim 1, wherein the excess control unit performs speed control, and the action portion reaches a maximum moving speed. After passing the target position. 一種基板處理方法,是使用有為運送基板運送部對基板處理裝置接近背離移動的運送裝置,為該基板的處理而使該基板處理裝置所具有的動作部動作,其特徵為:藉由根據在該基板處理裝置與該運送裝置之間透過傳輸路徑傳送的信號,在該動作部的動作完了前使該運送部的移動開始,使該動作部的動作與該運送部的移動並行,該動作部可移動於不與為進行該基板的遞送而接近來的該運送部干涉的目標位置,及於移動方向超越該目標位置,不與該運送部干涉的超出位置而被配設,該基板處理裝置具有使該動作部於該移動方向通過該目標位置且在該超出位置的跟前使該動作部減速,使該動作部由該超出位置折回該目標位置而控制的超出控制部。In a substrate processing method, a transport device that moves toward a substrate processing device for transporting a substrate transport unit is used, and an operation unit of the substrate processing device is operated for processing of the substrate, and is characterized in that: The signal transmitted between the substrate processing apparatus and the transport apparatus through the transmission path starts the movement of the transport unit before the operation of the operation unit is completed, and the operation of the operation unit is parallel to the movement of the transport unit. The operation portion is movable to a target position that does not interfere with the transport portion that is approaching for the delivery of the substrate, and is disposed at an over position that does not interfere with the transport portion beyond the target position in the moving direction. The substrate processing apparatus includes an excess control unit that controls the operation unit to pass the target position in the moving direction, decelerates the operation unit before the excess position, and controls the operation unit to be folded back to the target position from the excess position.
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