TWI480944B - Evaporative depositing equipment - Google Patents

Description

Vapor deposition device

The present invention relates to the field of vapor deposition technology, and in particular to an evaporation device.

Evaporation is a physical vapor deposition technique that physically deposits thin films. Specifically, it heats the film by an ion beam or an electron beam to make the film into a gaseous state, and deposits on the surface of the substrate to be plated to form an evaporated film layer. The vapor deposition technology is widely used because of its simple film formation process and easy control of the process, such as the surface reflective film layer of the optical component and the surface film layer of the decorative component.

The evaporation process needs to be carried out in an evaporation apparatus, which generally comprises an evaporation chamber, a conventional umbrella holder for carrying the substrate to be coated, and a carrier film directly under the umbrella frame. And the ion source that releases the oxidizing gas. In the conventional vapor deposition method, the substrate to be coated is placed on an umbrella stand, and then the gaseous or ionic film material is reacted with an oxidizing gas released from the ion source and deposited on the upper surface of the substrate to be coated. However, in general, the position of the ion source for releasing the oxidizing gas in the vapor deposition device is fixed. When coating with different film materials at different positions, it is likely that the film material of the gas state has not yet been obtained due to the positional relationship between the ion source and the film material. Complete oxidation is deposited on the substrate to be coated, thereby affecting the quality and effect of the coating.

In view of this, it is necessary to provide a vapor deposition device which can effectively improve the quality of the coating.

An evaporation device for coating a substrate to be coated; the coating device includes a base, a plurality of heating sources, a support rod, an ion source, a bracket and at least one carrier; the base includes a a top surface and a bottom surface, a through hole is defined in a central position of the top surface of the base, and the top surface is further provided with a plurality of grooves for carrying the film material, and the heating source is fixed at the bottom of the groove; The support rod is sleeved in the through hole, and the support rod protrudes from the side wall of one end of the top surface, and a vent is formed corresponding to the groove, and at least one of the support rod is connected with the vent. The air source is connected to the air duct; the bracket is vertically fixed on the end surface of the support rod protruding from one end of the top surface; the bearing seat is fixed on the bracket for carrying the substrate to be coated.

Compared with the prior art, the coating device provided by the present invention passes the oxidizing gas into the corresponding vent according to the position of the groove of the supporting film material during the evaporation process by using the film materials located in different grooves respectively. The gaseous film material can be completely oxidized by the oxidizing gas released from the ion source, thereby effectively improving the coating quality.

The technical solution will be further described in detail below with reference to the accompanying drawings and embodiments.

As shown in FIG. 1 , an evaporation apparatus 100 for coating a substrate 200 to be coated is provided in an embodiment of the present invention. The coating apparatus 100 includes a susceptor 10 , a plurality of heating sources 20 , and a support rod 30 . An ion source 40, a motor 50, a bracket 60, at least one carrier 70, and a control module 80.

The base 10 is a cylinder including a top surface 11 and a bottom surface 12. A through hole 13 penetrating through the bottom surface 12 is defined at a central position of the top surface 11 of the base 10. A plurality of grooves 111 for carrying the film material are formed on the top surface 11 around the through hole 13 , and the plurality of grooves 111 are evenly distributed on the top surface 11 centering on the through holes 13 . In this embodiment, the grooves 111 are four, and each of the two adjacent grooves 111 is spaced apart from each other with a heat insulating material.

The heating source 20 is a resistance wire that is fixed to the bottom of the groove 111. The heating source 20 is configured to heat the film material placed in the groove 111 to cause the solid film material to be vaporized by heat to become a gaseous film material. In the present embodiment, the heating sources 20 are four, and each of the heating sources 20 is disposed below the groove 111.

Referring to FIG. 2 together, the support rod 30 is a hollow rod including an outer cylinder 31 and a spacer 32. The outer cylinder 31 includes a closed end 311 and a communicating end 312. The support rod 30 is sleeved in the through hole 13 of the base 10, and the support rod 30 and the through hole 13 are in an interference fit, that is, the support rod 30 closely fits the inner wall of the through hole 13 to prevent The base 10 slides on the support rod 30. The closed end 311 protrudes from the top surface 11 of the base 10, the communication end 312 protrudes from the bottom surface of the base 10, and the support rod 30 protrudes from the side wall of one end of the top surface 11 corresponding to each of the grooves 111 respectively. A vent 313 is opened. In this embodiment, the spacer 32 has a cross shape, the spacer 32 is disposed in the outer cylinder 31, and the outer cylinder 31 is divided into four mutually independent air ducts 314, one for each air duct 314. The vents 313 are in communication. It can be understood that the support bar 30 may not include the spacer 32, and the entire outer cylinder 31 forms a separate air duct 314, and the air duct 314 is in communication with each vent 313.

The ion source 40 is located below the susceptor 10 and is in communication with the air duct 314 in the communication end 312 of the support rod 30. The ion source 40 further includes four electronically controlled switches (not shown), the electronically controlled switches are located in the air duct 314, and when the electronic control switch is turned on, the conduction to the air duct 314 is achieved; When the control switch is closed, the closing of the air duct 314 is achieved. The ion source 40 releases oxidative gaseous ions, such as oxygen ions in a negative divalent state. It can be understood that the electronically controlled switch can also be disposed at the vent 313 for controlling the opening and closing of each vent 313.

The motor 50 includes a driving portion 51 and a transmission portion 52. The driving portion 51 is vertically fixed to the end surface of the closed end 311 of the support rod 30, and the motor 50 is located on the same line as the support rod 30.

Referring to FIG. 3 together, the bracket 60 includes a joint portion 61 and a plurality of connecting rods 62. In the present embodiment, the joint portion 61 is a rectangular parallelepiped comprising four side walls 611 which are vertically connected in series and a lower surface 612 which is perpendicularly connected to the four side walls 611. A fixing hole 612a is defined in the lower surface 612. The connecting rods 62 are four, and one end of each of the connecting rods 62 is respectively fixed on the side wall 611 of the joint portion 61. The bracket 60 is fixedly coupled to the motor 50, and the fixing hole 612a of the joint portion 61 is sleeved on the transmission portion 52 of the motor and can rotate together with the transmission portion 52.

One side of the carrier 70 is vertically fixed at the other end of the connecting rod 62 away from the joint portion 61. The carrier 70 includes a bearing surface 71 that faces the base 10. A first baffle 711 extends perpendicularly from the two opposite edges of the bearing surface 71. The two first baffles 711 extend away from the bearing surface 71 and extend perpendicularly to the bearing surface 71. The second baffle 712, the first baffle 711, the second baffle 712 and the bearing surface 71 form an engaging portion 72 for fixing the substrate to be coated 200 to the carrier 70. In this embodiment, the carrier 70 is four.

The control module 80 is electrically connected to the plurality of heating sources 20, the ion source 40, and the motor 50, respectively. The control module 80 is configured to control the opening of a heating source 20 and an electronically controlled switch to ensure that the oxidizing gas generated by the ion source 40 during vapor deposition using the film material in one of the grooves 111 is performed. It can be released from the corresponding air duct 314 and completely oxidize the produced gaseous film material. The motor 50 is used to drive the substrate to be coated 200 on the carrier 70 to rotate, so that each substrate to be coated 200 can be uniformly coated.

Referring to FIG. 4 together, before the coating begins, the substrate to be coated 200 is placed in the engaging portion 72 of the carrier 70, and the surface of the substrate to be coated 200 to be coated faces the susceptor 10. The control module 80 controls one of the heating sources 20 to be turned on according to a preset program, and controls the ion source 40 to generate an oxidizing gas, and opens the air duct 314 corresponding to the groove 111 in the heating process. The oxidizing gas released from the air passage 314 is released from the vent 313 of the groove 111 in the heating state, and is diffused directly above the corresponding groove 111, so that the gaseous state evaporates from the groove 111. The film can be completely oxidized. The control module 80 also controls the rotation of the motor 50. The motor 50 drives the carrier 70 fixed on the bracket 60 to rotate around the support rod 30. When it is desired to perform coating using a film material accommodated in another groove 111, the control module 80 controls the heating source 20 that was previously heated to be turned off, and continues to keep the opening of the previous air channel 314 so that it is recessed from the previous The gaseous film evaporated in the tank 111 can be completely oxidized. Then, the control module 80 closes the previous air duct 314, simultaneously opens the heating source 20 corresponding to the groove 111 used in the coating, and opens the air duct 314 corresponding to the heating source 20, thereby ensuring that the air duct 314 is corresponding to the heating source 20. The coated substrate 200 is always opposite to the film material and the ion source 40, thereby ensuring the quality of the coating, and it is also possible to perform coating of a plurality of different film materials in one evaporation device 100. In the present embodiment, the amount of the vaporized film material and the oxidizing gas evaporated can be adjusted by adjusting the heat source 20 and the ion source 40.

The coating device provided by the embodiment of the present invention passes the oxidizing gas to the corresponding vent according to the position of the groove of the bearing film material during the evaporation process by using the film materials located in different grooves respectively, so that the film material of the gas state is made. It can be completely oxidized by the oxidizing gas released from the ion source, thereby effectively improving the coating quality.

In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

100‧‧‧Vapor deposition unit
10‧‧‧ Pedestal
11‧‧‧ top surface
12‧‧‧ bottom
13‧‧‧through hole
111‧‧‧ Groove
20‧‧‧heat source
30‧‧‧Support rod
311‧‧‧closed end
312‧‧‧Connected end
313‧‧‧ vents
40‧‧‧Ion source
50‧‧‧ motor
51‧‧‧ Drive Department
52‧‧‧Transmission Department
60‧‧‧ bracket
61‧‧‧Combination Department
62‧‧‧ Connecting rod
70‧‧‧ bearing seat
71‧‧‧ bearing surface
72‧‧‧Clock Department
711‧‧‧First baffle
712‧‧‧Second baffle
80‧‧‧Control Module
200‧‧‧Substrate
31‧‧‧Outer tube
32‧‧‧ spacers
314‧‧‧Wind
611‧‧‧ side wall
612‧‧‧ lower surface
612a‧‧‧Fixed holes

FIG. 1 is an exploded perspective view of a coating apparatus according to an embodiment of the present invention.

2 is a schematic cross-sectional view of a support rod of the coating device of FIG. 1.

3 is a schematic structural view of a bracket of the coating device of FIG. 1.

4 is a schematic view showing the combination of the coating device of FIG. 1.

100‧‧‧Vapor deposition unit

10‧‧‧ Pedestal

11‧‧‧ top surface

12‧‧‧ bottom

13‧‧‧through hole

111‧‧‧ Groove

20‧‧‧heat source

30‧‧‧Support rod

311‧‧‧closed end

312‧‧‧Connected end

313‧‧‧ vents

40‧‧‧Ion source

50‧‧‧Motor

51‧‧‧ Drive Department

52‧‧‧Transmission Department

60‧‧‧ bracket

61‧‧‧Combination Department

62‧‧‧ Connecting rod

70‧‧‧ bearing seat

71‧‧‧ bearing surface

72‧‧‧Clock Department

711‧‧‧First baffle

712‧‧‧Second baffle

80‧‧‧Control Module

200‧‧‧Substrate

Claims (9)

An evaporation device for coating a substrate to be coated; the coating device includes a base, a plurality of heating sources, a support rod, an ion source, a bracket and at least one carrier; the base includes a a top surface and a bottom surface, a through hole is defined in a central position of the top surface of the base, and the top surface is further provided with a plurality of grooves for carrying the film material, and the heating source is fixed at the bottom of the groove; The support rod is sleeved in the through hole, and the support rod protrudes from the side wall of one end of the top surface, and a vent is formed corresponding to the groove, and at least one of the support rod is connected with the vent. The air source is connected to the air duct; the bracket is vertically fixed on the end surface of the support rod protruding from one end of the top surface; the bearing seat is fixed on the bracket for carrying the substrate to be coated. The vapor deposition device of claim 1, wherein the coating device further comprises a motor, the motor comprising a driving portion and a transmission portion, the driving portion being vertically fixed on the support rod protruding from the top The bracket is fixed to the transmission portion on the end surface of one end of the surface. The vapor deposition device of claim 1, wherein the support rod comprises an outer cylinder and a spacer, the spacer is disposed in the outer cylinder and divides the outer cylinder into a plurality of air ducts, wherein each The air ducts are respectively connected to a vent. The vapor deposition device of claim 3, wherein the vapor deposition device further comprises a control module, wherein the control module is respectively connected to a heating source, an ion source and a motor, and the control module is used for the control module The film material in the groove is heated by controlling the corresponding heating source, and the ion source is controlled to pass the oxidizing gas into the air passage corresponding to the groove and control the rotation of the motor. The vapor deposition device of claim 1, wherein the bracket comprises a joint portion and a plurality of connecting rods, one end of the connecting rod is fixed to the side wall of the joint portion, and the other end is fixedly connected with the bearing seat. . The vapor deposition device of claim 1, wherein: the carrier includes a bearing surface, the bearing surface is opposite to the base; and two opposite edges of the bearing surface extend vertically a first baffle, wherein the two first baffles extend away from the bearing end to a second baffle that is parallel to the bearing surface; the first baffle, the second baffle and the bearing surface A snap portion is formed for fixing the substrate to be coated on the carrier. The vapor deposition device of claim 1, wherein the base is a cylinder, and the plurality of grooves are evenly distributed on a top surface of the base centering on the through hole. The vapor deposition device of claim 1, wherein the through hole and the support rod have an interference fit. The vapor deposition device of claim 1, wherein: each of the air passages is provided with an electric control switch, and the electric control switch is used for controlling the conduction and closing of the air passage.