TWI476810B - - Google Patents
Info
- Publication number
- TWI476810B TWI476810B TW101145126A TW101145126A TWI476810B TW I476810 B TWI476810 B TW I476810B TW 101145126 A TW101145126 A TW 101145126A TW 101145126 A TW101145126 A TW 101145126A TW I476810 B TWI476810 B TW I476810B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210091577.9A CN103367089B (zh) | 2012-03-30 | 2012-03-30 | 一种具有双外壳的等离子体处理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201340166A TW201340166A (zh) | 2013-10-01 |
| TWI476810B true TWI476810B (https=) | 2015-03-11 |
Family
ID=49368199
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101145126A TW201340166A (zh) | 2012-03-30 | 2012-11-30 | 一種具有雙外殼的等離子體處理裝置 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103367089B (https=) |
| TW (1) | TW201340166A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107369602B (zh) * | 2016-05-12 | 2019-02-19 | 北京北方华创微电子装备有限公司 | 反应腔室及半导体加工设备 |
| CN112117176B (zh) * | 2019-06-20 | 2023-03-07 | 中微半导体设备(上海)股份有限公司 | 等离子体处理设备及等离子体处理系统 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030056901A1 (en) * | 2001-06-29 | 2003-03-27 | Alps Electric Co., Ltd. | Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system |
| US20050247404A1 (en) * | 2002-07-18 | 2005-11-10 | Matsushita Electric Industrial Co., Ltd. | Plasma processing apparatus and plasma processing method |
| TW200610837A (en) * | 2004-08-20 | 2006-04-01 | Advanced Display Proc Eng Co | Plasma processing apparatus |
| TW200729297A (en) * | 2006-01-27 | 2007-08-01 | Advanced Micro Fab Equip Inc | A plasma processing apparatus |
| CN100516291C (zh) * | 2005-10-14 | 2009-07-22 | 中微半导体设备(上海)有限公司 | 等离子体处理装置 |
| TWM370181U (en) * | 2009-07-03 | 2009-12-01 | Advanced Micro Fab Equip Inc | A plasma processing apparatus |
| US20110030899A1 (en) * | 2009-08-07 | 2011-02-10 | Keizo Suzuki | Plasma processing apparatus using transmission electrode |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3131865B2 (ja) * | 1994-09-05 | 2001-02-05 | 東京エレクトロン株式会社 | プラズマ成膜装置 |
| US20040025791A1 (en) * | 2002-08-09 | 2004-02-12 | Applied Materials, Inc. | Etch chamber with dual frequency biasing sources and a single frequency plasma generating source |
| KR20050001831A (ko) * | 2003-06-26 | 2005-01-07 | 삼성전자주식회사 | 플라즈마 처리 장치 |
| JP5222598B2 (ja) * | 2008-03-25 | 2013-06-26 | 東京エレクトロン株式会社 | プラズマ処理装置及び給電棒 |
-
2012
- 2012-03-30 CN CN201210091577.9A patent/CN103367089B/zh active Active
- 2012-11-30 TW TW101145126A patent/TW201340166A/zh unknown
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030056901A1 (en) * | 2001-06-29 | 2003-03-27 | Alps Electric Co., Ltd. | Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system |
| US20050247404A1 (en) * | 2002-07-18 | 2005-11-10 | Matsushita Electric Industrial Co., Ltd. | Plasma processing apparatus and plasma processing method |
| TW200610837A (en) * | 2004-08-20 | 2006-04-01 | Advanced Display Proc Eng Co | Plasma processing apparatus |
| CN100516291C (zh) * | 2005-10-14 | 2009-07-22 | 中微半导体设备(上海)有限公司 | 等离子体处理装置 |
| TW200729297A (en) * | 2006-01-27 | 2007-08-01 | Advanced Micro Fab Equip Inc | A plasma processing apparatus |
| TWM370181U (en) * | 2009-07-03 | 2009-12-01 | Advanced Micro Fab Equip Inc | A plasma processing apparatus |
| US20110030899A1 (en) * | 2009-08-07 | 2011-02-10 | Keizo Suzuki | Plasma processing apparatus using transmission electrode |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103367089B (zh) | 2016-04-06 |
| CN103367089A (zh) | 2013-10-23 |
| TW201340166A (zh) | 2013-10-01 |