TWI476048B - Platinum metal-supported catalyst, hydrogen peroxide decomposition method, dissolved oxygen removal method, and electronic part washing method - Google Patents
Platinum metal-supported catalyst, hydrogen peroxide decomposition method, dissolved oxygen removal method, and electronic part washing method Download PDFInfo
- Publication number
- TWI476048B TWI476048B TW099107429A TW99107429A TWI476048B TW I476048 B TWI476048 B TW I476048B TW 099107429 A TW099107429 A TW 099107429A TW 99107429 A TW99107429 A TW 99107429A TW I476048 B TWI476048 B TW I476048B
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- Taiwan
- Prior art keywords
- water
- monolith
- hydrogen peroxide
- anion exchanger
- platinum group
- Prior art date
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- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 title claims description 250
- 239000003054 catalyst Substances 0.000 title claims description 137
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 title claims description 122
- 238000000034 method Methods 0.000 title claims description 103
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims description 92
- 239000001301 oxygen Substances 0.000 title claims description 92
- 229910052760 oxygen Inorganic materials 0.000 title claims description 92
- 238000005406 washing Methods 0.000 title description 44
- 238000000354 decomposition reaction Methods 0.000 title description 32
- 229910052697 platinum Inorganic materials 0.000 title description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 277
- 150000001450 anions Chemical class 0.000 claims description 206
- 239000011148 porous material Substances 0.000 claims description 136
- 238000004519 manufacturing process Methods 0.000 claims description 101
- 229920002554 vinyl polymer Polymers 0.000 claims description 90
- 238000005349 anion exchange Methods 0.000 claims description 89
- 229910052751 metal Inorganic materials 0.000 claims description 44
- 239000002184 metal Substances 0.000 claims description 44
- 239000002245 particle Substances 0.000 claims description 32
- 238000004140 cleaning Methods 0.000 claims description 31
- 239000002082 metal nanoparticle Substances 0.000 claims description 29
- 238000001878 scanning electron micrograph Methods 0.000 claims description 25
- 229910052739 hydrogen Inorganic materials 0.000 claims description 21
- 239000001257 hydrogen Substances 0.000 claims description 21
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 13
- 238000012545 processing Methods 0.000 claims description 8
- 239000000470 constituent Substances 0.000 claims description 7
- 238000011068 loading method Methods 0.000 claims description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 121
- 239000000178 monomer Substances 0.000 description 115
- 239000000543 intermediate Substances 0.000 description 92
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 64
- 238000006116 polymerization reaction Methods 0.000 description 59
- 229910052763 palladium Inorganic materials 0.000 description 57
- 229910021642 ultra pure water Inorganic materials 0.000 description 52
- 239000012498 ultrapure water Substances 0.000 description 52
- 239000003431 cross linking reagent Substances 0.000 description 43
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 40
- 238000006243 chemical reaction Methods 0.000 description 40
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 38
- 238000005342 ion exchange Methods 0.000 description 34
- 239000000203 mixture Substances 0.000 description 32
- 239000003960 organic solvent Substances 0.000 description 31
- 239000002105 nanoparticle Substances 0.000 description 29
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 28
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- 238000009826 distribution Methods 0.000 description 25
- 239000000839 emulsion Substances 0.000 description 23
- -1 poly(α-methylstyrene) Polymers 0.000 description 22
- 230000008961 swelling Effects 0.000 description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 19
- 229920000642 polymer Polymers 0.000 description 18
- 239000003505 polymerization initiator Substances 0.000 description 18
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 17
- 239000002861 polymer material Substances 0.000 description 17
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 125000001453 quaternary ammonium group Chemical group 0.000 description 15
- 238000004132 cross linking Methods 0.000 description 14
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 13
- 239000007788 liquid Substances 0.000 description 13
- 230000000694 effects Effects 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 12
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 12
- 229910052753 mercury Inorganic materials 0.000 description 12
- 238000002156 mixing Methods 0.000 description 12
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 12
- 239000003921 oil Substances 0.000 description 12
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 12
- 239000012071 phase Substances 0.000 description 12
- 239000007864 aqueous solution Substances 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- 229920001577 copolymer Polymers 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- 239000004094 surface-active agent Substances 0.000 description 10
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical group CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 239000003957 anion exchange resin Substances 0.000 description 9
- 238000004453 electron probe microanalysis Methods 0.000 description 9
- 230000000379 polymerizing effect Effects 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- 238000011049 filling Methods 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 8
- 239000012046 mixed solvent Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 8
- CHRJZRDFSQHIFI-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;styrene Chemical compound C=CC1=CC=CC=C1.C=CC1=CC=CC=C1C=C CHRJZRDFSQHIFI-UHFFFAOYSA-N 0.000 description 7
- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 7
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 7
- 230000035515 penetration Effects 0.000 description 7
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 6
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000003197 catalytic effect Effects 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical group CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 230000001590 oxidative effect Effects 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 230000008595 infiltration Effects 0.000 description 5
- 238000001764 infiltration Methods 0.000 description 5
- 229920000620 organic polymer Polymers 0.000 description 5
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 5
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 4
- QLLUAUADIMPKIH-UHFFFAOYSA-N 1,2-bis(ethenyl)naphthalene Chemical compound C1=CC=CC2=C(C=C)C(C=C)=CC=C21 QLLUAUADIMPKIH-UHFFFAOYSA-N 0.000 description 4
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 4
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical group C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 description 4
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 4
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- 238000003917 TEM image Methods 0.000 description 4
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 229920006037 cross link polymer Polymers 0.000 description 4
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 4
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 4
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000003456 ion exchange resin Substances 0.000 description 4
- 229920003303 ion-exchange polymer Polymers 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 4
- ZORQXIQZAOLNGE-UHFFFAOYSA-N 1,1-difluorocyclohexane Chemical compound FC1(F)CCCCC1 ZORQXIQZAOLNGE-UHFFFAOYSA-N 0.000 description 3
- XIRPMPKSZHNMST-UHFFFAOYSA-N 1-ethenyl-2-phenylbenzene Chemical group C=CC1=CC=CC=C1C1=CC=CC=C1 XIRPMPKSZHNMST-UHFFFAOYSA-N 0.000 description 3
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- VXVUDUCBEZFQGY-UHFFFAOYSA-N 4,4-dimethylpentanenitrile Chemical compound CC(C)(C)CCC#N VXVUDUCBEZFQGY-UHFFFAOYSA-N 0.000 description 3
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 238000000944 Soxhlet extraction Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 3
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 3
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 3
- 229920001429 chelating resin Polymers 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000006837 decompression Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 3
- 239000001593 sorbitan monooleate Substances 0.000 description 3
- 235000011069 sorbitan monooleate Nutrition 0.000 description 3
- 229940035049 sorbitan monooleate Drugs 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 3
- 229960002447 thiram Drugs 0.000 description 3
- 239000003643 water by type Substances 0.000 description 3
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 2
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 2
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 2
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 2
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 2
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004971 Cross linker Substances 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 2
- 235000017858 Laurus nobilis Nutrition 0.000 description 2
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 2
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical group CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000005212 Terminalia tomentosa Nutrition 0.000 description 2
- 244000125380 Terminalia tomentosa Species 0.000 description 2
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical group CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- INLLPKCGLOXCIV-UHFFFAOYSA-N bromoethene Chemical compound BrC=C INLLPKCGLOXCIV-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- RZEKVGVHFLEQIL-UHFFFAOYSA-N celecoxib Chemical compound C1=CC(C)=CC=C1C1=CC(C(F)(F)F)=NN1C1=CC=C(S(N)(=O)=O)C=C1 RZEKVGVHFLEQIL-UHFFFAOYSA-N 0.000 description 2
- 229960000590 celecoxib Drugs 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 2
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical group 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 229940093499 ethyl acetate Drugs 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229960002089 ferrous chloride Drugs 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 238000010559 graft polymerization reaction Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 2
- 229940011051 isopropyl acetate Drugs 0.000 description 2
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000005502 peroxidation Methods 0.000 description 2
- 229920003251 poly(α-methylstyrene) Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229920002102 polyvinyl toluene Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 2
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical group CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- 239000004711 α-olefin Substances 0.000 description 2
- CDDDRVNOHLVEED-UHFFFAOYSA-N 1-cyclohexyl-3-[1-[[1-(cyclohexylcarbamoylamino)cyclohexyl]diazenyl]cyclohexyl]urea Chemical compound C1CCCCC1(N=NC1(CCCCC1)NC(=O)NC1CCCCC1)NC(=O)NC1CCCCC1 CDDDRVNOHLVEED-UHFFFAOYSA-N 0.000 description 1
- HOBGCONPBCCQHM-UHFFFAOYSA-N 2-(methylamino)ethane-1,1-diol Chemical group CNCC(O)O HOBGCONPBCCQHM-UHFFFAOYSA-N 0.000 description 1
- PYSGFFTXMUWEOT-UHFFFAOYSA-N 3-(dimethylamino)propan-1-ol Chemical group CN(C)CCCO PYSGFFTXMUWEOT-UHFFFAOYSA-N 0.000 description 1
- CDOUZKKFHVEKRI-UHFFFAOYSA-N 3-bromo-n-[(prop-2-enoylamino)methyl]propanamide Chemical compound BrCCC(=O)NCNC(=O)C=C CDOUZKKFHVEKRI-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- XZIIFPSPUDAGJM-UHFFFAOYSA-N 6-chloro-2-n,2-n-diethylpyrimidine-2,4-diamine Chemical compound CCN(CC)C1=NC(N)=CC(Cl)=N1 XZIIFPSPUDAGJM-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Natural products OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- XJUZRXYOEPSWMB-UHFFFAOYSA-N Chloromethyl methyl ether Chemical compound COCCl XJUZRXYOEPSWMB-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 102000016955 Erythrocyte Anion Exchange Protein 1 Human genes 0.000 description 1
- 108010014384 Erythrocyte Anion Exchange Protein 1 Proteins 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000012028 Fenton's reagent Substances 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NWGKJDSIEKMTRX-AAZCQSIUSA-N Sorbitan monooleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O NWGKJDSIEKMTRX-AAZCQSIUSA-N 0.000 description 1
- IYFATESGLOUGBX-YVNJGZBMSA-N Sorbitan monopalmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O IYFATESGLOUGBX-YVNJGZBMSA-N 0.000 description 1
- HVUMOYIDDBPOLL-XWVZOOPGSA-N Sorbitan monostearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O HVUMOYIDDBPOLL-XWVZOOPGSA-N 0.000 description 1
- 239000004147 Sorbitan trioleate Substances 0.000 description 1
- PRXRUNOAOLTIEF-ADSICKODSA-N Sorbitan trioleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](OC(=O)CCCCCCC\C=C/CCCCCCCC)[C@H]1OC[C@H](O)[C@H]1OC(=O)CCCCCCC\C=C/CCCCCCCC PRXRUNOAOLTIEF-ADSICKODSA-N 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229940006460 bromide ion Drugs 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229940061627 chloromethyl methyl ether Drugs 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000012050 conventional carrier Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- OGQYPPBGSLZBEG-UHFFFAOYSA-N dimethyl(dioctadecyl)azanium Chemical compound CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC OGQYPPBGSLZBEG-UHFFFAOYSA-N 0.000 description 1
- 235000019329 dioctyl sodium sulphosuccinate Nutrition 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 239000003657 drainage water Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000003673 groundwater Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- MGZTXXNFBIUONY-UHFFFAOYSA-N hydrogen peroxide;iron(2+);sulfuric acid Chemical compound [Fe+2].OO.OS(O)(=O)=O MGZTXXNFBIUONY-UHFFFAOYSA-N 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- POULHZVOKOAJMA-UHFFFAOYSA-N methyl undecanoic acid Natural products CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 1
- DVEKCXOJTLDBFE-UHFFFAOYSA-N n-dodecyl-n,n-dimethylglycinate Chemical compound CCCCCCCCCCCC[N+](C)(C)CC([O-])=O DVEKCXOJTLDBFE-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000010815 organic waste Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 150000004968 peroxymonosulfuric acids Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002454 poly(glycidyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000000244 polyoxyethylene sorbitan monooleate Substances 0.000 description 1
- 235000010482 polyoxyethylene sorbitan monooleate Nutrition 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000053 polysorbate 80 Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229940096992 potassium oleate Drugs 0.000 description 1
- MLICVSDCCDDWMD-KVVVOXFISA-M potassium;(z)-octadec-9-enoate Chemical compound [K+].CCCCCCCC\C=C/CCCCCCCC([O-])=O MLICVSDCCDDWMD-KVVVOXFISA-M 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 229940035044 sorbitan monolaurate Drugs 0.000 description 1
- 239000001570 sorbitan monopalmitate Substances 0.000 description 1
- 235000011071 sorbitan monopalmitate Nutrition 0.000 description 1
- 229940031953 sorbitan monopalmitate Drugs 0.000 description 1
- 239000001587 sorbitan monostearate Substances 0.000 description 1
- 235000011076 sorbitan monostearate Nutrition 0.000 description 1
- 229940035048 sorbitan monostearate Drugs 0.000 description 1
- 235000019337 sorbitan trioleate Nutrition 0.000 description 1
- 229960000391 sorbitan trioleate Drugs 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/70—Treatment of water, waste water, or sewage by reduction
- C02F1/705—Reduction by metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/18—Carbon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/44—Palladium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/06—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing polymers
- B01J31/08—Ion-exchange resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
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Description
本發明係關於一種鉑族金屬載持觸媒,其係用於發電站用水及半導體製造等之精密加工洗淨用水,用以去除超純水中之過氧化氫或溶氧之類的氧化性物質。The invention relates to a platinum group metal supporting catalyst, which is used for precision processing washing water for power station water and semiconductor manufacturing, etc., for removing oxidizing property such as hydrogen peroxide or dissolved oxygen in ultrapure water. substance.
已知發電站中所使用之用水中之溶氧會引起配管及熱交換器等構件之腐蝕,尤其於原子力發電站之一次系統及二次系統中必需極力減少溶氧。It is known that dissolved oxygen in water used in power plants causes corrosion of components such as pipes and heat exchangers, especially in primary systems and secondary systems of atomic power plants.
又,於半導體製造產業中,使用經高度去除雜質之超純水進行矽晶圓之洗淨等。超純水通常藉由將原水(河川水、地下水、工業用水等)中所含之懸浮物質及有機物之一部分於前處理步驟中去除後,將該處理水以一次純水系統及二次純水系統(子系統)依序處理而製造,供給至進行晶圓洗淨之使用點。此種超純水具有雜質之定量亦困難之程度之純度,並非完全不具有雜質。Further, in the semiconductor manufacturing industry, ultra-pure water with high impurity removal is used to wash the silicon wafer. Ultrapure water is usually removed from the pretreatment step by one of the suspended matter and organic matter contained in the raw water (river water, ground water, industrial water, etc.), and the treated water is once pure water system and secondary pure water. The system (subsystem) is manufactured in sequence and supplied to the point of use for wafer cleaning. Such ultrapure water has a purity which is difficult to quantify impurities, and is not completely free of impurities.
例如,超純水中所含之溶氧係於矽晶圓之表面形成自然氧化膜。若自然氧化膜形成於晶圓表面上,則妨礙低溫下之磊晶Si薄膜之成長,或成為閘極氧化膜之膜壓及膜質之精密控制之妨礙,或成為接觸孔之接觸電阻之增加原因。因此,必需極力抑制晶圓表面之自然氧化膜之形成。For example, the dissolved oxygen contained in the ultrapure water forms a natural oxide film on the surface of the tantalum wafer. If the natural oxide film is formed on the surface of the wafer, the growth of the epitaxial Si film at a low temperature is hindered, or the film pressure of the gate oxide film and the fine control of the film quality are hindered, or the contact resistance of the contact hole is increased. . Therefore, it is necessary to suppress the formation of a natural oxide film on the wafer surface as much as possible.
因此,於超純水製造裝置中,尤其於一次純水系統中,使用脫氣裝置減少溶氧。藉由該脫氣裝置,二次純水系統入口之被處理水(一次純水)中之溶氧濃度通常降低至100 μg/L以下。進而,亦有管理至10 μg/L以下之情況。Therefore, in an ultrapure water manufacturing apparatus, particularly in a primary pure water system, a deaerator is used to reduce dissolved oxygen. With the deaerator, the dissolved oxygen concentration in the treated water (primary pure water) at the inlet of the secondary pure water system is usually lowered to 100 μg/L or less. Furthermore, there are cases where the management is 10 μg/L or less.
上述超純水之製造中,通常利用設置於二次純水系統中之紫外線氧化裝置進行有機物之分解。於紫外線氧化處理之過程中副產生過氧化氫,因此於紫外線氧化裝置之處理水中通常殘存過氧化氫。該過氧化氫於二次純水系統之精加工步驟中部分地分解而生成氧,處理水中之溶氧濃度上升。In the production of the above ultrapure water, the decomposition of the organic matter is usually carried out by an ultraviolet ray oxidizing device provided in a secondary pure water system. Hydrogen peroxide is generated in the process of ultraviolet oxidation treatment, and thus hydrogen peroxide is usually left in the treated water of the ultraviolet oxidation device. The hydrogen peroxide is partially decomposed in the finishing step of the secondary pure water system to generate oxygen, and the dissolved oxygen concentration in the treated water is increased.
因此,提出有使用合成碳系粒狀吸附劑將紫外線氧化裝置之處理水中所含之過氧化氫吸附去除之方法(日本專利特開平9-29233號公報)。依據該方法,由於將紫外線氧化裝置之處理水中所殘存之過氧化氫自身去除,故可抑制晶圓表面之自然氧化皮膜之形成。然而該方法中,為了達成既定之過氧化氫去除率,而需要填充有大量合成碳系粒狀吸附劑之大型吸附塔。Therefore, there has been proposed a method of adsorbing and removing hydrogen peroxide contained in treated water of an ultraviolet ray oxidizing device using a synthetic carbon-based particulate adsorbent (Japanese Patent Laid-Open Publication No. Hei 9-29233). According to this method, since the hydrogen peroxide remaining in the treated water of the ultraviolet ray oxidizing device is removed by itself, the formation of the natural oxide film on the surface of the wafer can be suppressed. However, in this method, in order to achieve a predetermined hydrogen peroxide removal rate, a large adsorption column filled with a large amount of synthetic carbon-based particulate adsorbent is required.
又,提出有利用使鉑族金屬奈米膠體粒子載持於載體上之觸媒將紫外線氧化裝置之處理水中所含之過氧化氫分解的方法(日本專利特開2007-185587號公報)。Further, a method of decomposing hydrogen peroxide contained in the treated water of the ultraviolet ray oxidizing device by a catalyst for supporting the platinum group metal nanocolloid particles on the carrier has been proposed (Japanese Patent Laid-Open Publication No. 2007-185587).
[專利文獻1]日本專利特開平9-29233號公報(申請專利範圍)[Patent Document 1] Japanese Patent Laid-Open Publication No. Hei 9-29233 (Application No.)
[專利文獻2]日本專利特開2007-185587號公報(申請專利範圍)[Patent Document 2] Japanese Patent Laid-Open Publication No. 2007-185587 (Application No.)
然而,日本專利特開2007-185587號公報所記載之觸媒僅可於通水空間速度(SV,space velocity)為100~2000 h-1 之相對較低之區域使用,若SV超過2000 h-1 ,則有過氧化氫之分解去除變得不充分之缺點。However, the catalyst described in Japanese Laid-Open Patent Publication No. 2007-185587 can be used only in a relatively low area where the space velocity (SV) is 100 to 2000 h -1 , and if the SV exceeds 2000 h - 1 , there is a disadvantage that the decomposition and removal of hydrogen peroxide becomes insufficient.
因此,本發明之目的在於提供一種高性能觸媒,其即便以SV超過2000 h-1 之較大SV通水亦可進行過氧化氫之分解去除或溶氧之去除,進而,即便使觸媒之填充層高變薄亦可進行過氧化氫之分解去除或溶氧之去除。Therefore, an object of the present invention is to provide a high-performance catalyst capable of removing hydrogen peroxide or removing dissolved oxygen even when a large SV water having an SV of more than 2000 h -1 is used, and further, even if the catalyst is used The high-thinning filling layer can also be subjected to decomposition of hydrogen peroxide or removal of dissolved oxygen.
針對上述實際情況,本發明者等人進行了深入研究,結果發現,若於以日本專利特開2002-306976號公報所記載之方法所獲得之具有相對較大之細孔容積之單塊體狀有機多孔質體(中間體)之存在下,將乙烯基單體與交聯劑於特定有機溶劑中靜置聚合,則可獲得開口徑大、具有較中間體之有機多孔質體之骨架更粗之骨架的粗骨架之單塊體狀有機多孔質體,若於粗骨架之單塊體狀有機多孔質體中導入離子交換基,則由於粗骨架而膨潤大,因此可使開口更大。於在該粗骨架之單塊體狀有機多孔質體中導入有陰離子交換基之單塊體狀有機多孔質陰離子交換體(以下亦稱為「第1單塊體陰離子交換體」)上載持有平均粒徑1~100 nm之鉑族金屬之奈米粒子的鉑族金屬載持觸媒(以下亦稱作「第1鉑族金屬載持觸媒」),即便以SV超過2000 h-1 之較大SV通水亦可進行過氧化氫之分解去除或溶氧之去除,進而,即便使觸媒之填充層高變薄亦可進行過氧化氫之分解去除或溶氧之去除,從而完成了本發明。The present inventors have conducted intensive studies on the above-mentioned facts, and as a result, it has been found that a monolithic body having a relatively large pore volume obtained by the method described in Japanese Laid-Open Patent Publication No. 2002-306976 is obtained. In the presence of an organic porous material (intermediate), by allowing the vinyl monomer and the crosslinking agent to be statically polymerized in a specific organic solvent, a skeleton having a large opening diameter and an organic porous body having a larger intermediate can be obtained. When a monolithic organic porous body having a coarse skeleton of a skeleton is introduced into an ion exchange group in a monolithic organic porous body having a coarse skeleton, the swelling is large due to the coarse skeleton, so that the opening can be made larger. The monolithic organic porous anion exchanger (hereinafter also referred to as "first monolithic anion exchanger") having an anion exchange group introduced into the monolithic organic porous body of the coarse skeleton is carried on the top A platinum group metal-supporting catalyst (hereinafter also referred to as "the first platinum group metal-supporting catalyst") of a platinum group metal nanoparticle having an average particle diameter of 1 to 100 nm, even if the SV exceeds 2000 h -1 Larger SV water can also be decomposed or removed by hydrogen peroxide or dissolved in oxygen. Further, even if the filling layer of the catalyst is made thinner, the decomposition of hydrogen peroxide or the removal of dissolved oxygen can be performed, thereby completing the process. this invention.
又,本發明者等人進行深入研究之結果發現,若於以日本專利特開2002-306976號公報所記載之方法所獲得之具有較大細孔容積之單塊體狀有機多孔質體(中間體)之存在下,將芳香族乙烯基單體與交聯劑於特定有機溶劑中靜置聚合,則可獲得由三維性連續之芳香族乙烯基聚合物骨架及於該骨架相間三維性連續之空孔所構成、且兩相纏繞而成之共連續構造之疏水性單塊體,該共連續構造之單塊體係空孔之連續性高且其大小無偏差,流體穿透時之壓力損失低,進而由於該共連續構造之骨架粗,故若導入離子交換基,則可獲得單位體積之離子交換容量大之單塊體狀有機多孔質離子交換體。於在該共連續構造之單塊體中導入有陰離子交換基之單塊體狀有機多孔質陰離子交換體(以下亦稱為「第2單塊體陰離子交換體」)上載持有平均粒徑1~100 nm之鉑族金屬之奈米粒子的鉑族金屬載持觸媒(以下亦稱為「第2鉑族金屬載持觸媒」),與第1鉑族金屬載持觸媒同樣,即便以SV超過2000 h-1 之較大SV通水亦可進行過氧化氫之分解去除或溶氧之去除,進而,即便使觸媒之填充層高變薄亦可進行過氧化氫之分解去除或溶氧之去除,從而完成了本發明。Further, as a result of intensive studies, the present inventors have found that a monolithic organic porous body having a large pore volume obtained by the method described in JP-A-2002-306976 (middle) In the presence of a compound, by allowing the aromatic vinyl monomer and the crosslinking agent to be statically polymerized in a specific organic solvent, a three-dimensional continuous aromatic vinyl polymer skeleton and a three-dimensional continuous phase between the skeletons can be obtained. A hydrophobic monolith consisting of a hollow hole and a two-phase winding structure, the continuous structure of the monolithic system has high continuity and no deviation in size, and the pressure loss during fluid penetration is low. Further, since the skeleton of the co-continuous structure is coarse, when a ion exchange group is introduced, a monolithic organic porous ion exchanger having a large ion exchange capacity per unit volume can be obtained. The monolithic organic porous anion exchanger (hereinafter also referred to as "second monolithic anion exchanger") having an anion exchange group introduced into the monolith of the co-continuous structure has an average particle diameter of 1 The platinum group metal-supporting catalyst (hereinafter also referred to as "the second platinum group metal-supporting catalyst") of the platinum group metal nanoparticles of ~100 nm is the same as the first platinum group metal-supporting catalyst, even The larger SV water with an SV of more than 2000 h -1 can also be used for the decomposition of hydrogen peroxide or the removal of dissolved oxygen. Further, even if the filling layer of the catalyst is made thinner, the hydrogen peroxide can be decomposed or removed. The removal of dissolved oxygen completes the present invention.
即,本發明(1)係提供一種鉑族金屬載持觸媒,其係於有機多孔質陰離子交換體上載持有平均粒徑1~100 nm之鉑族金屬之奈米粒子,其特徵在於:該有機多孔質陰離子交換體係氣泡狀巨觀細孔彼此重合且其重疊部分形成於水濕潤狀態平均直徑為30~300 μm之開口之連續巨觀細孔構造體,總細孔容積為0.5~5 ml/g,水濕潤狀態之單位體積之陰離子交換容量為0.4~1.0 mg當量/ml,陰離子交換基於該有機多孔質陰離子交換體中均勻分布,且於該連續巨觀細孔構造體(乾燥體)之切斷面之掃描電子顯微鏡(SEM)圖像中,剖面所示之骨架部面積於圖像區域中為25~50%;並且該鉑族金屬之載持量於乾燥狀態為0.004~20重量%。That is, the present invention (1) provides a platinum group metal-supporting catalyst which is obtained by carrying a platinum group metal nanoparticle having an average particle diameter of 1 to 100 nm on an organic porous anion exchanger, and is characterized in that: The organic porous anion exchange system has a bubble-like macroscopic pores which are overlapped with each other and an overlapping portion thereof is formed in a continuous giant pore structure having an opening diameter of 30 to 300 μm in a water-wet state, and the total pore volume is 0.5 to 5 Ml/g, the anion exchange capacity per unit volume of the wet state of water is 0.4 to 1.0 mg equivalent/ml, the anion exchange is uniformly distributed based on the organic porous anion exchanger, and the continuous giant pore structure (dry body) In the scanning electron microscope (SEM) image of the cut surface, the area of the skeleton portion shown in the cross section is 25 to 50% in the image region; and the amount of the platinum group metal is 0.004 to 20 in the dry state. weight%.
又,本發明(2)係提供一種鉑族金屬載持觸媒,其係於有機多孔質陰離子交換體上載持有平均粒徑1~100 nm之鉑族金屬之奈米粒子,其特徵在於:該有機多孔質陰離子交換體係由以於導入有陰離子交換基之總構成單位中含有0.3~5.0莫耳%之交聯構造單位的芳香族乙烯基聚合物所形成且粗度於水濕潤狀態為1~60 μm之三維性連續之骨架、及於該骨架間直徑於水濕潤狀態為10~100 μm之三維性連續之空孔所構成的共連續構造體,總細孔容積為0.5~5 ml/g,水濕潤狀態下之單位體積之陰離子交換容量為0.3~1.0 mg當量/ml,陰離子交換基於該有機多孔質陰離子交換體中均勻分布;並且該鉑族金屬之載持量於乾燥狀態下為0.004~20重量%。Further, the present invention (2) provides a platinum group metal-supporting catalyst which is a nanoparticle of a platinum group metal having an average particle diameter of 1 to 100 nm supported on an organic porous anion exchanger, and is characterized in that: The organic porous anion exchange system is formed of an aromatic vinyl polymer having a crosslinked structural unit of 0.3 to 5.0 mol% in a total constituent unit to which an anion exchange group is introduced, and has a water wet state of 1 a three-dimensional continuous skeleton of ~60 μm, and a co-continuous structure composed of three-dimensional continuous pores having a diameter of 10 to 100 μm between the skeletons, and a total pore volume of 0.5 to 5 ml/ g, the anion exchange capacity per unit volume in the wet state of water is 0.3 to 1.0 mg equivalent/ml, the anion exchange is uniformly distributed based on the organic porous anion exchanger; and the carrying amount of the platinum group metal is in a dry state 0.004 to 20% by weight.
又,本發明(3)提供一種分解過氧化氫之處理水之製造方法,其特徵為:使含有過氧化氫之被處理水接觸本發明(1)或(2)中任一項之鉑族金屬載持觸媒,將該含有過氧化氫之被處理水中之過氧化氫分解去除。Further, the present invention (3) provides a process for producing treated water which decomposes hydrogen peroxide, which is characterized in that the treated water containing hydrogen peroxide is brought into contact with the platinum group of any one of the inventions (1) or (2). The metal carries a catalyst to decompose and decompose the hydrogen peroxide in the treated water containing hydrogen peroxide.
又,本發明(4)提供一種電子零件之洗淨方法,其特徵為:利用進行本發明(3)之分解過氧化氫之處理水之製造方法而獲得之處理水,洗淨電子零件或電子零件之製造器具。Further, the present invention (4) provides a method for cleaning an electronic component, which is characterized in that the treated water obtained by the method for producing treated water for decomposing hydrogen peroxide according to the invention (3) is used to wash electronic parts or electrons. Manufacturing equipment for parts.
又,本發明(5)提供一種去除溶氧之處理水之製造方法,其特徵為:於本發明(1)或(2)中任一項之鉑族金屬載持觸媒之存在下,使氫與含有氧之被處理水中之溶氧反應而生成水,藉此自該含有氧之被處理水中去除溶氧。Further, the present invention (5) provides a method for producing treated water for removing dissolved oxygen, which is characterized in that in the presence of the platinum group metal-supporting catalyst according to any one of the inventions (1) or (2), Hydrogen reacts with dissolved oxygen in the treated water containing oxygen to form water, thereby removing dissolved oxygen from the treated water containing oxygen.
又,本發明(6)提供一種電子零件之洗淨方法,其特徵為:利用進行本發明(5)之去除溶氧之處理水之製造方法而獲得之處理水,洗淨電子零件或電子零件之製造器具。Further, the invention (6) provides a method for cleaning an electronic component, which is characterized in that the treated water obtained by the method for producing the treated water for removing dissolved oxygen of the invention (5) is used to wash the electronic component or the electronic component. Manufacturing equipment.
根據本發明之鉑族金屬載持觸媒,即便以SV超過2000 h-1 之較大SV通水亦可進行過氧化氫之分解去除或溶氧之去除,進而,即便使觸媒之填充層高變薄亦可進行過氧化氫之分解去除或溶氧之去除。According to the platinum group metal-supporting catalyst of the present invention, even if the SV of the SV exceeds 2000 h -1 , the decomposition of hydrogen peroxide or the removal of dissolved oxygen can be performed, and even if the catalyst is filled. High thinning can also be carried out by decomposition of hydrogen peroxide or removal of dissolved oxygen.
用作本發明之鉑族金屬載持觸媒之載體的有機多孔質陰離子交換體為「第1單塊體陰離子交換體」或「第2單塊體陰離子交換體」。本說明書中,將「單塊體狀有機多孔質體」亦簡稱為「單塊體」,將「單塊體狀有機多孔質陰離子交換體」亦簡稱為「單塊體陰離子交換體」,將「單塊體狀有機多孔質中間體」亦簡稱為「單塊體中間體」。又,將於第1單塊體陰離子交換體上載持有鉑族金屬之鉑族金屬載持觸媒亦稱為「第1鉑族金屬載持觸媒」,將於第2單塊體陰離子交換體上載持有鉑族金屬之鉑族金屬載持觸媒亦稱為「第2鉑族金屬載持觸媒」。The organic porous anion exchanger used as a carrier of the platinum group metal-supporting catalyst of the present invention is a "first monolith anion exchanger" or a "second monolith anion exchanger". In the present specification, the "monolithic organic porous body" is also simply referred to as "monolithic body", and the "monolithic organic porous anion exchanger" is also simply referred to as "monolithic anion exchanger". The "monolithic organic porous intermediate" is also simply referred to as "monolithic intermediate". Further, the platinum group metal-supporting catalyst carrying the platinum group metal on the first monolith anion exchanger is also referred to as "the first platinum group metal carrier catalyst", and the second monolith anion exchange is performed. The platinum group metal-supporting catalyst holding a platinum group metal is also referred to as a "second platinum group metal-carrying catalyst".
<第1單塊體陰離子交換體之說明><Description of the first monolithic anion exchanger>
第1單塊體陰離子交換體係藉由在單塊體中導入陰離子交換基而獲得,係氣泡狀巨觀細孔彼此重合且其重疊部分形成於水濕潤狀態平均直徑為30~300 μm、較佳為30~200 μm、尤佳為40~100 μm之開口(間隙孔)之連續巨觀細孔構造體。由於在單塊體中導入陰離子交換基時單塊體整體膨潤,故單塊體陰離子交換體之開口之平均直徑大於單塊體之開口之平均直徑。若水濕潤狀態之開口之平均直徑未滿30 μm,則通水時之壓力損失變大,故欠佳;若水濕潤狀態之開口之平均直徑過大,則被處理水與單塊體陰離子交換體及所載持之鉑族金屬奈米粒子之接觸變得不充分,其結果為過氧化氫分解特性或溶氧之去除特性下降,故欠佳。再者,本發明中,乾燥狀態之單塊體中間體之開口之平均直徑、乾燥狀態之單塊體之開口之平均直徑及乾燥狀態之單塊體陰離子交換體之開口之平均直徑係利用汞滲法測定之值。又,水濕潤狀態之單塊體陰離子交換體之開口之平均直徑係將乾燥狀態之單塊體陰離子交換體之開口之平均直徑乘以膨潤率而算出之值。具體而言,若設水濕潤狀態之單塊體陰離子交換體之直徑為x1(mm)、使該水濕潤狀態之單塊體陰離子交換體乾燥而獲得的乾燥狀態之單塊體陰離子交換體之直徑為y1(mm)、利用汞滲法測定該乾燥狀態之單塊體陰離子交換體時之開口之平均直徑為z1(μm),則水濕潤狀態之單塊體陰離子交換體之開口之平均直徑(μm)係利用下式「水濕潤狀態之單塊體陰離子交換體之開口之平均直徑(μm)=z1×(x1/y1)」而算出。又,於陰離子交換基導入前之乾燥狀態之單塊體之開口之平均直徑、及水濕潤狀態之單塊體陰離子交換體相對於在該乾燥狀態之單塊體中導入有陰離子交換基時之乾燥狀態之單塊體的膨潤率為已知之情況,亦可將乾燥狀態之單塊體之開口之平均直徑乘以膨潤率而算出水濕潤狀態之單塊體陰離子交換體之開口之平均直徑。The first monolithic anion exchange system is obtained by introducing an anion exchange group into a monolith, and the bubble-like macroscopic pores overlap each other and the overlapping portion thereof is formed in a water-wet state with an average diameter of 30 to 300 μm, preferably A continuous giant pore structure of an opening (gap hole) of 30 to 200 μm, particularly preferably 40 to 100 μm. Since the monolith is swollen as a whole when the anion exchange group is introduced into the monolith, the average diameter of the openings of the monolith anion exchanger is larger than the average diameter of the openings of the monolith. If the average diameter of the opening of the water-wet state is less than 30 μm, the pressure loss at the time of water passing becomes large, which is not preferable; if the average diameter of the opening of the water-wet state is too large, the treated water and the monolithic anion exchanger and the The contact of the platinum group metal nanoparticles to be supported is insufficient, and as a result, the hydrogen peroxide decomposition property or the dissolved oxygen removal property is deteriorated, which is not preferable. Further, in the present invention, the average diameter of the opening of the monolith intermediate body in a dry state, the average diameter of the opening of the monolith in a dry state, and the average diameter of the opening of the monolith anion exchanger in a dry state are utilized by mercury. The value measured by the infiltration method. Further, the average diameter of the opening of the monolithic anion exchanger in the water-wet state is a value calculated by multiplying the average diameter of the opening of the monolithic anion exchanger in the dry state by the swelling ratio. Specifically, the monolith anion exchanger having a diameter of x1 (mm) in a water-wet state and a monolith anion exchanger obtained by drying the monolith anion exchanger in a water-wet state is dried. The average diameter of the opening of the monolithic anion exchanger in the dry state is z1 (μm) when the diameter is y1 (mm), and the average diameter of the opening of the monolithic anion exchanger in the water-wet state is y1 (mm) (μm) is calculated by the following formula "average diameter (μm) of the opening of the monolithic anion exchanger in the water-wet state = z1 × (x1/y1)". Further, the average diameter of the opening of the monolith in the dry state before the introduction of the anion exchange group, and the monolith anion exchanger in the water-wet state are when the anion exchange group is introduced into the monolith in the dry state. The swelling ratio of the monolith in the dry state is known, and the average diameter of the opening of the monolith anion exchanger in the water-wet state can be calculated by multiplying the average diameter of the opening of the monolith in the dry state by the swelling ratio.
第1單塊體陰離子交換體中,於連續巨觀細孔構造體之切斷面之SEM圖像中,剖面所示之骨架部面積於圖像區域中為25~50%,較佳為25~45%。若剖面所示之骨架部面積於圖像區域中為未滿25%,則成為較細之骨架,機械強度下降,尤其於以高流速通水時單塊體陰離子交換體大幅變形,故欠佳。進而,被處理水與單塊體陰離子交換體及載持於其上之鉑族金屬奈米粒子的接觸效率下降,觸媒效果下降,故欠佳;若超過50%,則骨架變得過粗,通水時之壓力損失增大,故欠佳。再者,日本專利特開2002-306976號公報所記載之單塊體即便實際使油相部相對於水之調配比變多而使骨架部分變粗,其調配比亦有界限以確保共同之開口,剖面所示之骨架部面積之最大值於圖像區域中無法超過25%。In the first monolith anion exchanger, in the SEM image of the cut surface of the continuous giant pore structure, the area of the skeleton shown by the cross section is 25 to 50%, preferably 25, in the image region. ~45%. If the area of the skeleton shown in the cross section is less than 25% in the image area, it becomes a fine skeleton, and the mechanical strength is lowered, especially when the monolith anion exchanger is greatly deformed when water is passed at a high flow rate, which is not preferable. . Further, the contact efficiency between the water to be treated and the monolith anion exchanger and the platinum group metal nanoparticles supported thereon is lowered, and the catalytic effect is lowered, which is not preferable; if it exceeds 50%, the skeleton becomes too thick. The pressure loss during the passage of water increases, so it is not good. In the monolith described in Japanese Laid-Open Patent Publication No. 2002-306976, even if the ratio of the oil phase portion to the water is actually increased, the skeleton portion is thickened, and the blending ratio is also limited to ensure a common opening. The maximum area of the skeleton shown in the section cannot exceed 25% in the image area.
用以獲得SEM圖像之條件只要為切斷面之剖面所示之骨架部鮮明顯現之條件即可,例如倍率為100~600、拍攝區域約為150 mm×100 mm。SEM觀察較佳為於在排除主觀之單塊體之任意切斷面之任意部位拍攝而得之切斷部位或拍攝部位不同之3張以上、較佳為5張以上之圖像中進行。經切斷之單塊體為供給至電子顯微鏡而為乾燥狀態。參照圖1及圖4對SEM圖像中之切斷面之骨架部進行說明。又,圖4係轉印有作為圖1之SEM照片之剖面而表示之骨架部。圖1及圖4中,大體上為不定形狀且以剖面所示者為本發明之「剖面所示之骨架部(元件符號12)」,圖1中所表示之圓形之孔為開口(間隙孔),又,相對較大之曲率或曲面者為巨觀細孔(圖4中之元件符號13)。圖4之剖面所示之骨架部面積於矩形狀圖像區域11中為28%。如此,骨架部可明確判斷。The conditions for obtaining the SEM image may be such that the skeleton portion shown by the cross section of the cut surface is fresh, for example, the magnification is 100 to 600, and the photographing area is about 150 mm × 100 mm. The SEM observation is preferably carried out in an image in which three or more, preferably five or more, different portions of the cut portion or the photographed portion are obtained by taking an arbitrary portion of the cut surface of the subject monolith. The cut monolith is in a dry state when supplied to an electron microscope. The skeleton portion of the cut surface in the SEM image will be described with reference to Figs. 1 and 4 . Moreover, FIG. 4 is a skeleton portion which is transferred and shown as a cross section of the SEM photograph of FIG. In Fig. 1 and Fig. 4, the shape of the skeleton is substantially indefinite and the cross-section of the skeleton (component symbol 12) shown in the section of the present invention is shown in Fig. 1. The circular hole shown in Fig. 1 is an opening (gap Hole), again, a relatively large curvature or curved surface is a giant pore (component symbol 13 in Figure 4). The area of the skeleton shown in the cross section of Fig. 4 is 28% in the rectangular image area 11. In this way, the skeleton can be clearly judged.
SEM圖像中,作為切斷面之剖面所示之骨架部之面積之測定方法,並無特別限制,可列舉進行公知之電腦處理等而確定該骨架部後,藉由利用電腦等之自動計算或手動計算而算出之方法。作為手動計算,可列舉將不定形狀物轉換成四角形、三角形、圓形或梯形等之集合物,將其等積層而求出面積之方法。In the SEM image, the method of measuring the area of the skeleton portion indicated by the cross section of the cut surface is not particularly limited, and an automatic calculation using a computer or the like is performed after the skeleton portion is determined by a known computer processing or the like. Or the method of calculating by hand. As a manual calculation, a method of converting an indefinite shape into a square, a triangle, a circle, a trapezoid, or the like, and laminating them to obtain an area is exemplified.
又,第1單塊體陰離子交換體之總細孔容積為0.5~5 ml/g,較佳為0.8~4 ml/g。若總細孔容積未滿0.5 ml/g,則通水時之壓力損失變大,故欠佳,進而,每單位剖面積之穿透流體量變小,處理能力下降,故欠佳。另一方面,若總細孔容積超過5 ml/g,則機械強度下降,尤其於以高流速通水時單塊體陰離子交換體大幅變形,故欠佳。進而,被處理水與單塊體陰離子交換體及載持於其上之鉑族金屬奈米粒子之接觸效率下降,故觸媒效果亦下降,故欠佳。再者,本發明中,單塊體(單塊體中間體、單塊體、單塊體陰離子交換體)之總細孔容積係利用汞滲法測定之值。又,單塊體(單塊體中間體、單塊體、單塊體陰離子交換體)之總細孔容積於乾燥狀態、水濕潤狀態均相同。Further, the total pore volume of the first monolith anion exchanger is from 0.5 to 5 ml/g, preferably from 0.8 to 4 ml/g. When the total pore volume is less than 0.5 ml/g, the pressure loss at the time of water passage becomes large, which is unsatisfactory. Further, the amount of the penetrating fluid per unit sectional area becomes small, and the treatment ability is lowered, which is not preferable. On the other hand, when the total pore volume exceeds 5 ml/g, the mechanical strength is lowered, and in particular, when the water is discharged at a high flow rate, the monolith anion exchanger is largely deformed, which is not preferable. Further, the contact efficiency between the water to be treated and the monolith anion exchanger and the platinum group metal nanoparticles supported thereon is lowered, so that the catalytic effect is also lowered, which is not preferable. Further, in the present invention, the total pore volume of the monolith (monolith intermediate, monolith, monolith anion exchanger) is measured by a mercury permeation method. Further, the total pore volume of the monolith (monolith intermediate, monolith, and monolith anion exchanger) was the same in both the dry state and the water wet state.
再者,使水穿透第1單塊體陰離子交換體時之壓力損失若以於填充有該陰離子交換體1 m之管柱中以通水線速度(LV)1 m/h通水時之壓力損失(以下稱為「差壓係數」)表示,則較佳為0.001~0.1 MPa/m‧LV之範圍,尤佳為0.005~0.05 MPa/m‧LV。Further, the pressure loss when the water passes through the first monolith anion exchanger is such that when the water is passed through the column packed with the anion exchanger 1 m at a water velocity (LV) of 1 m/h. The pressure loss (hereinafter referred to as "differential pressure coefficient") is preferably in the range of 0.001 to 0.1 MPa/m‧LV, and particularly preferably 0.005 to 0.05 MPa/m‧LV.
第1單塊體陰離子交換體的水濕潤狀態之單位體積之陰離子交換容量為0.4~1.0 mg當量/ml。如日本專利特開2002-306976號中所記載之具有與本發明不同之連續巨觀細孔構造之習知型單塊體狀有機多孔質陰離子交換體具有以下缺點:若為達成實用上所要求之低壓力損失而擴大開口徑,則總細孔容積亦隨之變大,因此單位體積之陰離子交換容量下降;若為使單位體積之交換容量增加而減小總細孔容積,則開口徑變小,因此壓力損失增加。相對於此,第1單塊體陰離子交換體由於可進一步擴大開口徑、同時使連續巨觀細孔構造體之骨架變粗(使骨架之壁部變厚),故可於將壓力損失抑制為較低之狀態下飛躍性地擴大單位體積之陰離子交換容量。若單位體積之陰離子交換容量未滿0.4 mg當量/ml,則單位體積之鉑族金屬之奈米粒子載持量下降,故欠佳。另一方面,若單位體積之陰離子交換容量超過1.0 mg當量/ml,則通水時之壓力損失增大,故欠佳。再者,第1單塊體陰離子交換體之單位重量之陰離子交換容量並無特別限定,但為將陰離子交換基均勻導入至多孔質體之表面及骨架內部,而為3.5~4.5 mg當量/g。再者,離子交換基僅導入至表面之多孔質體之離子交換容量係視多孔質體或離子交換基之種類而不同,無法一概決定,但最多為500 μg當量/g。The anion exchange capacity per unit volume of the water-wet state of the first monolith anion exchanger is 0.4 to 1.0 mg equivalent/ml. A conventional monolithic organic porous anion exchanger having a continuous giant pore structure different from the present invention as described in Japanese Laid-Open Patent Publication No. 2002-306976 has the following disadvantages: When the opening pressure is increased by the low pressure loss, the total pore volume is also increased, so the anion exchange capacity per unit volume is decreased; if the total pore volume is decreased to increase the exchange capacity per unit volume, the opening diameter is changed. Small, so the pressure loss increases. On the other hand, since the first monolith anion exchanger can further enlarge the opening diameter and thicken the skeleton of the continuous giant pore structure (the wall portion of the skeleton is thickened), the pressure loss can be suppressed to At a lower state, the anion exchange capacity per unit volume is dramatically expanded. If the anion exchange capacity per unit volume is less than 0.4 mg equivalent/ml, the amount of nanoparticle supported per unit volume of the platinum group metal is lowered, which is not preferable. On the other hand, if the anion exchange capacity per unit volume exceeds 1.0 mg equivalent/ml, the pressure loss at the time of water passage increases, which is not preferable. In addition, the anion exchange capacity per unit weight of the first monolith anion exchanger is not particularly limited, but the anion exchange group is uniformly introduced into the surface of the porous body and the inside of the skeleton to be 3.5 to 4.5 mg equivalent/g. . Further, the ion exchange capacity of the porous body introduced into the surface only by the ion exchange group differs depending on the type of the porous body or the ion exchange group, and cannot be determined in any way, but is at most 500 μg equivalent/g.
第1單塊體陰離子交換體中,構成連續巨觀細孔構造體之骨架之材料為具有交聯構造之有機聚合物材料。該聚合物材料之交聯密度並無特別限定,相對於構成聚合物材料之總構成單位,較佳為含有0.3~10莫耳%、較適宜為0.3~5莫耳%之交聯構造單位。若交聯構造單位未滿0.3莫耳%,則機械強度不足,故欠佳;另一方面,若超過10莫耳%,則有陰離子交換基之導入變得困難之情況,故欠佳。對該聚合物材料之種類並無特別限制,例如可列舉:聚苯乙烯、聚(α-甲基苯乙烯)、聚乙烯基甲苯、聚乙烯基苄基氯、聚乙烯基聯苯、聚乙烯基萘等芳香族乙烯基聚合物;聚乙烯、聚丙烯等聚烯烴;聚氯乙烯、聚四氟乙烯等聚(鹵化聚烯烴);聚丙烯腈等腈系聚合物;聚甲基丙烯酸甲酯、聚甲基丙烯酸環氧丙酯、聚丙烯酸乙酯等(甲基)丙烯酸系聚合物等交聯聚合物。上述聚合物可為使單獨之乙烯基單體與交聯劑共聚合而獲得之聚合物,亦可為使數種乙烯基單體與交聯劑聚合而獲得之聚合物,又,亦可為將兩種以上之聚合物摻合而成者。該等有機聚合物材料中,就連續巨觀細孔構造形成之容易度、陰離子交換基導入之容易性與機械強度之高度、及對酸或鹼之穩定性之高度而言,較佳為芳香族乙烯基聚合物之交聯聚合物,尤其可列舉苯乙烯-二乙烯基苯共聚合體或乙烯基苄基氯-二乙烯基苯共聚合體作為較佳材料。In the first monolith anion exchanger, the material constituting the skeleton of the continuous giant pore structure is an organic polymer material having a crosslinked structure. The crosslinking density of the polymer material is not particularly limited, and is preferably from 0.3 to 10 mol%, more preferably from 0.3 to 5 mol%, based on the total constituent unit of the polymer material. When the crosslinked structural unit is less than 0.3 mol%, the mechanical strength is insufficient, which is not preferable. On the other hand, if it exceeds 10 mol%, introduction of an anion exchange group becomes difficult, which is not preferable. The kind of the polymer material is not particularly limited, and examples thereof include polystyrene, poly(α-methylstyrene), polyvinyltoluene, polyvinylbenzyl chloride, polyvinylbiphenyl, and polyethylene. Aromatic vinyl polymer such as naphthalene; polyolefin such as polyethylene or polypropylene; poly(halogenated polyolefin) such as polyvinyl chloride or polytetrafluoroethylene; nitrile polymer such as polyacrylonitrile; polymethyl methacrylate A crosslinked polymer such as a (meth)acrylic polymer such as polyglycidyl methacrylate or polyethyl acrylate. The polymer may be a polymer obtained by copolymerizing a single vinyl monomer and a crosslinking agent, or a polymer obtained by polymerizing a plurality of vinyl monomers and a crosslinking agent, or may be A combination of two or more polymers. Among these organic polymer materials, the ease of formation of a continuous giant pore structure, the ease of introduction of an anion exchange group, the height of mechanical strength, and the height of stability to an acid or a base are preferably aromatic. As the crosslinked polymer of the group vinyl polymer, a styrene-divinylbenzene copolymer or a vinylbenzyl chloride-divinylbenzene copolymer is particularly exemplified as a preferred material.
作為第1單塊體陰離子交換體之陰離子交換基,可列舉:三甲基銨基、三乙基銨基、三丁基銨基、二甲基羥基乙基銨基、二甲基羥基丙基銨基、甲基二羥基乙基銨基等四級銨基,或第三鋶基、鏻基等。Examples of the anion exchange group of the first monolithic anion exchanger include a trimethylammonium group, a triethylammonium group, a tributylammonium group, a dimethylhydroxyethylammonium group, and a dimethylhydroxypropyl group. a quaternary ammonium group such as an ammonium group or a methyl dihydroxyethyl ammonium group; or a third fluorenyl group or a fluorenyl group.
第1單塊體陰離子交換體中,所導入之陰離子交換基不僅均勻分布於多孔質體之表面,而且均勻分布至多孔質體之骨架內部。此處所言之「陰離子交換基均勻分布」,係指陰離子交換基之分布至少以μm級均勻分布於表面及骨架內部。陰離子交換基之分布狀況係藉由將抗衡陰離子進行離子交換成氯化物離子、溴化物離子等後,使用EPMA而相對較簡單地確認。又,若陰離子交換基不僅均勻分布於單塊體之表面而且均勻分布至多孔質體之骨架內部,則可使表面與內部之物理性質及化學性質均勻,故對膨潤及收縮之耐久性提高。In the first monolithic anion exchanger, the introduced anion exchange group is not only uniformly distributed on the surface of the porous body but also uniformly distributed inside the skeleton of the porous body. As used herein, "an even distribution of anion exchange groups" means that the distribution of anion exchange groups is uniformly distributed on the surface and inside the skeleton at least in the order of μm. The distribution of the anion exchange group is relatively simple to confirm by ion-exchange of the counter anion into a chloride ion, a bromide ion or the like using EPMA. Further, if the anion exchange group is not only uniformly distributed on the surface of the monolith and uniformly distributed inside the skeleton of the porous body, the physical properties and chemical properties of the surface and the inside can be made uniform, so that the durability against swelling and shrinkage is improved.
(第1單塊體陰離子交換體之製造方法)(Method for producing first monolithic anion exchanger)
第1單塊體陰離子交換體係藉由進行如下步驟而獲得:I步驟,藉由將不含離子交換基之油溶性單體、界面活性劑及水之混合物攪拌而製備油中水滴型乳化液,繼而使油中水滴型乳化液聚合而獲得總細孔容積為5~16 ml/g之連續巨觀細孔構造之單塊體狀有機多孔質中間體(單塊體中間體);II步驟,製備包含乙烯基單體、一分子中具有至少2個以上乙烯基之交聯劑、乙烯基單體或交聯劑溶解但乙烯基單體聚合生成之聚合物不溶解之有機溶劑及聚合起始劑之混合物;III步驟,將II步驟中所獲得之混合物於靜置下、且於該I步驟中所獲得之單塊體中間體之存在下進行聚合,獲得具有較單塊體中間體之骨架更粗之骨架的粗骨架有機多孔質體;及IV步驟,於該III步驟中所獲得之粗骨架有機多孔質體中導入陰離子交換基。The first monolithic anion exchange system is obtained by the following steps: In the first step, a water-drop type emulsion in an oil is prepared by stirring a mixture of an oil-soluble monomer, a surfactant, and water without an ion exchange group. Then, the water droplet type emulsion in the oil is polymerized to obtain a monolithic organic porous intermediate (monolith intermediate) having a continuous pore size of 5 to 16 ml/g; Preparation of an organic solvent containing a vinyl monomer, a crosslinking agent having at least two vinyl groups in one molecule, a vinyl monomer or a crosslinking agent dissolved, but a polymer formed by polymerization of a vinyl monomer is insoluble, and polymerization initiation a mixture of the agents; in the step III, the mixture obtained in the step II is allowed to stand under the standing and the polymerization in the presence of the monolithic intermediate obtained in the step I to obtain a skeleton having a relatively monolithic intermediate. a coarse-framed organic porous body having a coarser skeleton; and an IV step of introducing an anion exchange group into the coarse-frame organic porous body obtained in the step III.
第I單塊體陰離子交換體之製造方法中,I步驟只要依據日本專利特開2002-306976號公報所記載之方法進行即可。In the method for producing the first monolithic anion exchanger, the first step may be carried out in accordance with the method described in JP-A-2002-306976.
I步驟之單塊體中間體之製造中,作為不含離子交換基之油溶性單體,例如可列舉不含羧酸基、磺酸基、四級銨基等離子交換基且對水之溶解性低而為親油性之單體。作為該等單體之較佳者,可列舉苯乙烯、α-甲基苯乙烯、乙烯基甲苯、乙烯基苄基氯、二乙烯基苯、乙烯、丙烯、異丁烯、丁二烯、乙二醇二甲基丙烯酸酯等。該等單體可將一種單獨使用或將兩種以上組合使用。其中,至少選擇二乙烯基苯、乙二醇二甲基丙烯酸酯等交聯性單體作為油溶性單體之一成分,且使其含量於所有油溶性單體中為0.3~10莫耳%、較佳為0.3~5莫耳%可於後續步驟中定量地導入陰離子交換基量,故較佳。In the production of the monolithic intermediate of the first step, the oil-soluble monomer which does not contain an ion-exchange group may, for example, be an ion-exchange group other than a carboxylic acid group, a sulfonic acid group or a quaternary ammonium group, and is soluble in water. Low and lipophilic monomer. Preferred examples of such monomers include styrene, α-methylstyrene, vinyltoluene, vinylbenzyl chloride, divinylbenzene, ethylene, propylene, isobutylene, butadiene, and ethylene glycol. Dimethacrylate and the like. These monomers may be used alone or in combination of two or more. Wherein at least a crosslinkable monomer such as divinylbenzene or ethylene glycol dimethacrylate is selected as one of the oil-soluble monomers, and the content thereof is 0.3 to 10 mol% in all the oil-soluble monomers. Preferably, it is preferably 0.3 to 5 mol%, and the amount of the anion exchange group can be quantitatively introduced in the subsequent step, which is preferable.
界面活性劑只要為將不含離子交換基之油溶性單體與水混合時可形成油中水滴型(W/O)乳化液,則並無特別限制,可使用:山梨糖醇酐單油酸酯、山梨糖醇酐單月桂酯、山梨糖醇酐單棕櫚酸酯、山梨糖醇酐單硬脂酸酯、山梨糖醇酐三油酸酯、聚氧乙烯壬基苯醚、聚氧乙烯硬脂醚、聚氧乙烯山梨糖醇酐單油酸酯等非離子界面活性劑;油酸鉀、十二烷基苯磺酸鈉、磺基琥珀酸二辛基鈉等陰離子界面活性劑;氯化二硬脂基二甲基銨等陽離子界面活性劑;月桂基二甲基甜菜鹼等兩性界面活性劑。該等界面活性劑可將一種單獨使用或將兩種以上組合使用。再者,所謂油中水滴型乳化液,係指油相成為連續相且於其中分散有水滴之乳化液。作為上述界面活性劑之添加量,係根據油溶性單體之種類及目標乳化液粒子(巨觀細孔)之大小而大幅變動,故無法一概而論,可於相對於油溶性單體與界面活性劑之合計量為約2~70%之範圍選擇。The surfactant is not particularly limited as long as it can form an oil-in-water type (W/O) emulsion when the oil-soluble monomer containing no ion-exchange group is mixed with water, and can be used: sorbitan monooleic acid Ester, sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan trioleate, polyoxyethylene nonylphenyl ether, polyoxyethylene hard Nonionic surfactants such as aliphatic ethers, polyoxyethylene sorbitan monooleate; anionic surfactants such as potassium oleate, sodium dodecylbenzenesulfonate, dioctyl sodium sulfosuccinate; chlorination a cationic surfactant such as distearyl dimethyl ammonium; an amphoteric surfactant such as lauryl dimethyl betaine. These surfactants may be used alone or in combination of two or more. In addition, the oil-water droplet type emulsion refers to an emulsion in which an oil phase is a continuous phase and water droplets are dispersed therein. The amount of the surfactant added is greatly changed depending on the type of the oil-soluble monomer and the size of the target emulsion particles (gird pores), so that it cannot be generalized with respect to the oil-soluble monomer and the surfactant. The total amount is selected in the range of about 2 to 70%.
又,I步驟中,於油中水滴型乳化液形成時,視需要亦可使用聚合起始劑。聚合起始劑適宜使用藉由熱及光照射而產生自由基之化合物。聚合起始劑可為水溶性亦可為油溶性,例如可列舉偶氮雙異丁腈、偶氮雙二甲基戊腈、偶氮雙環己腈、偶氮雙環己甲腈、過氧化苯甲醯、過硫酸鉀、過硫酸銨、過氧化氫-氯化亞鐵、過硫酸鈉-酸性亞硫酸鈉、二硫化四甲基秋蘭姆等。Further, in the first step, when a water-drop type emulsion is formed in the oil, a polymerization initiator may be used as needed. As the polymerization initiator, a compound which generates a radical by heat and light irradiation is suitably used. The polymerization initiator may be water-soluble or oil-soluble, and examples thereof include azobisisobutyronitrile, azobisdimethylvaleronitrile, azobiscyclohexanenitrile, azobiscyclohexanecarbonitrile, and benzoic acid peroxide. Barium, potassium persulfate, ammonium persulfate, hydrogen peroxide - ferrous chloride, sodium persulfate - acidic sodium sulfite, tetramethyl thiuram disulfide, and the like.
作為將不含離子交換基之油溶性單體、界面活性劑、水及聚合起始劑混合而形成油中水滴型乳化液時之混合方法,並無特別限制,可使用:將各成分總括地一次性混合之方法;分別均勻溶解作為油溶性單體、界面活性劑及油溶性聚合起始劑之油溶性成分,及水或作為水溶性聚合起始劑之水溶性成分後,將各成分混合之方法等。對用以形成乳化液之混合裝置並無特別限制,可使用通常之混合機或均質機、高壓均質機等,只要選擇適合於獲得目標乳化液粒徑之裝置即可。又,對混合條件並無特別限制,可任意設定可獲得目標乳化液粒徑之攪拌轉速或攪拌時間。The method of mixing the oil-soluble monomer, the surfactant, the water, and the polymerization initiator which do not contain an ion-exchange group to form a water-drop type emulsion is not particularly limited, and it is possible to use a combination of components. a one-time mixing method; separately dissolving the oil-soluble component as an oil-soluble monomer, a surfactant, and an oil-soluble polymerization initiator, and water or a water-soluble component as a water-soluble polymerization initiator, and mixing the components Method and so on. The mixing device for forming the emulsion is not particularly limited, and a usual mixer, homogenizer, high-pressure homogenizer, or the like can be used, and a device suitable for obtaining the particle size of the target emulsion can be selected. Further, the mixing conditions are not particularly limited, and the stirring rotation speed or the stirring time at which the particle diameter of the target emulsion can be obtained can be arbitrarily set.
I步驟中所獲得之單塊體中間體具有連續巨觀細孔構造。若使其於聚合系統中共存,則以單塊體中間體之構造為模型而形成具有粗骨架之骨架之多孔構造。又,單塊體中間體為具有交聯構造之有機聚合物材料。該聚合物材料之交聯密度並無特別限定,較佳為相對於構成聚合物材料之總構成單位而含有0.3~10莫耳%、較佳為0.3~5莫耳%之交聯構造單位。若交聯構造單位未滿0.3莫耳%,則機械強度不足,故欠佳。尤其於總細孔容積大至10~16 ml/g之情況,為維持連續巨觀細孔構造,較佳為含有2莫耳%以上之交聯構造單位。另一方面,若超過10莫耳%,則有陰離子交換基之導入變得困難之情況,故欠佳。The monolithic intermediate obtained in the first step has a continuous macroporous structure. When it coexists in a polymerization system, the structure of a monolith intermediate body is used as a model, and the porous structure which has the skeleton of a rough skeleton is formed. Further, the monolith intermediate is an organic polymer material having a crosslinked structure. The crosslinking density of the polymer material is not particularly limited, but is preferably a crosslinking structural unit containing 0.3 to 10 mol%, preferably 0.3 to 5 mol%, based on the total constituent unit of the polymer material. If the crosslinked structural unit is less than 0.3 mol%, the mechanical strength is insufficient, which is not preferable. In particular, in the case where the total pore volume is as large as 10 to 16 ml/g, in order to maintain the continuous macroporous structure, it is preferred to contain 2 mol% or more of a crosslinked structural unit. On the other hand, when it exceeds 10 mol%, introduction of an anion exchange group becomes difficult, and it is unpreferable.
作為單塊體中間體之聚合物材料之種類,並無特別限制,可列舉與上述單塊體聚合物材料相同者。藉此,於單塊體中間體之骨架形成同樣之聚合物,可使骨架變粗而獲得均勻之骨架構造之單塊體。The type of the polymer material as the monolithic intermediate is not particularly limited, and examples thereof are the same as those of the above monolithic polymer material. Thereby, the same polymer is formed on the skeleton of the monolithic intermediate, and the skeleton can be made thick to obtain a monolith having a uniform skeleton structure.
單塊體中間體之總細孔容積為5~16 ml/g,較適宜為6~16 ml/g。若總細孔容積過小,則使乙烯基單體聚合後所獲得之單塊體之總細孔容積變得過小,流體穿透時之壓力損失變大,故欠佳。另一方面,若總細孔容積過大,則使乙烯基單體聚合後所獲得之單塊體之構造偏離連續巨觀細孔構造,故欠佳。為使單塊體中間體之總細孔容積為上述數值範圍,只要將單體與水之比設為大致1:5~1:20即可。The total pore volume of the monolithic intermediate is 5 to 16 ml/g, preferably 6 to 16 ml/g. When the total pore volume is too small, the total pore volume of the monolith obtained after the polymerization of the vinyl monomer becomes too small, and the pressure loss at the time of fluid penetration becomes large, which is not preferable. On the other hand, if the total pore volume is too large, the structure of the monolith obtained by polymerizing the vinyl monomer deviates from the continuous giant pore structure, which is not preferable. In order to make the total pore volume of the monolith intermediate body into the above numerical range, the ratio of the monomer to water may be approximately 1:5 to 1:20.
又,單塊體中間體係巨觀細孔與巨觀細孔之重疊部分即開口(間隙孔)之平均直徑於乾燥狀態為20~200 μm。若乾燥狀態下之開口之平均直徑未滿20 μm,則使乙烯基單體聚合後所獲得之單塊體之開口徑變小,通水時之壓力損失變大,故欠佳。另一方面,若超過200 μm,則使乙烯基單體聚合後所獲得之單塊體之開口徑變得過大,被處理水與單塊體陰離子交換體之接觸變得不充分,其結果為過氧化氫分解特性或溶氧去除特性下降,故欠佳。單塊體中間體較適宜為巨觀細孔之大小或開口之徑一致之均勻構造,但並不限定於此,亦可為均勻構造中點狀存在有較均勻巨觀細孔之大小更大之不均勻巨觀細孔者。Further, the average diameter of the opening (gap hole) in which the macroscopic pores and the giant pores overlap in the monolithic intermediate system is 20 to 200 μm in a dry state. When the average diameter of the opening in the dry state is less than 20 μm, the opening diameter of the monolith obtained after the polymerization of the vinyl monomer becomes small, and the pressure loss at the time of water passage becomes large, which is not preferable. On the other hand, when it exceeds 200 μm, the opening diameter of the monolith obtained after the polymerization of the vinyl monomer becomes too large, and the contact between the water to be treated and the monolith anion exchanger becomes insufficient, and as a result, Hydrogen peroxide decomposition characteristics or dissolved oxygen removal characteristics are degraded, which is not preferable. The monolithic intermediate is preferably a uniform structure in which the size of the macroscopic pores or the diameter of the openings is uniform, but is not limited thereto, and the size of the uniform macropores may be larger in the uniform structure. Uneven macroscopic pores.
II步驟係製備包含乙烯基單體、一分子中具有至少2個以上乙烯基之交聯劑、乙烯基單體或交聯劑溶解但乙烯基單體聚合生成之聚合物不溶解之有機溶劑及聚合起始劑之混合物的步驟。再者,並無I步驟與II步驟之順序,可於I步驟後進行II步驟,亦可於II步驟後進行I步驟。The second step is to prepare an organic solvent comprising a vinyl monomer, a crosslinking agent having at least two vinyl groups in one molecule, a vinyl monomer or a crosslinking agent dissolved, but a polymer formed by polymerization of the vinyl monomer is insoluble. A step of polymerizing a mixture of initiators. Furthermore, there is no order of steps I and II, and step II can be performed after step I, or step I can be performed after step II.
作為II步驟中所使用之乙烯基單體,只要為分子中含有可聚合之乙烯基、且對有機溶劑之溶解性高之親油性乙烯基單體,則並無特別限制,較佳為選定生成與共存於上述聚合系統中之單塊體中間體為同種或類似之聚合物材料的乙烯基單體。作為該等乙烯基單體之具體例,可列舉:苯乙烯、α-甲基苯乙烯、乙烯基甲苯、乙烯基苄基氯、乙烯基聯苯、乙烯基萘等芳香族乙烯基單體;乙烯、丙烯、1-丁烯、異丁烯等α-烯烴;丁二烯、異戊二烯、氯丁二烯等二烯系單體;氯乙烯、溴乙烯、偏二氯乙烯、四氟乙烯等鹵化烯烴;丙烯腈、甲基丙烯腈等腈系單體;乙酸乙烯酯、丙酸乙烯酯等乙烯酯;丙烯酸甲酯、丙烯酸乙酯、丙烯酸丁酯、丙烯酸2-乙基己酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸丁酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸環己酯、甲基丙烯酸苄酯、甲基丙烯酸環氧丙酯等(甲基)丙烯酸系單體。該等單體可將一種單獨使用或將兩種以上組合使用。本發明中適宜使用之乙烯基單體為苯乙烯、乙烯基苄基氯等芳香族乙烯基單體。The vinyl monomer to be used in the second step is not particularly limited as long as it is a lipophilic vinyl monomer having a polymerizable vinyl group in the molecule and having high solubility in an organic solvent, and is preferably selected to be produced. The monolithic intermediate coexisting in the above polymerization system is a vinyl monomer of the same or similar polymeric material. Specific examples of the vinyl monomer include aromatic vinyl monomers such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl chloride, vinylbiphenyl, and vinylnaphthalene; Alpha-olefin such as ethylene, propylene, 1-butene or isobutylene; diene monomer such as butadiene, isoprene or chloroprene; vinyl chloride, vinyl bromide, vinylidene chloride, tetrafluoroethylene, etc. Halogenated olefin; nitrile monomer such as acrylonitrile or methacrylonitrile; vinyl ester such as vinyl acetate or vinyl propionate; methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, methyl Methyl acrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, methacrylic acid epoxy A (meth)acrylic monomer such as propyl ester. These monomers may be used alone or in combination of two or more. The vinyl monomer suitably used in the present invention is an aromatic vinyl monomer such as styrene or vinylbenzyl chloride.
關於該等乙烯基單體之添加量,相對於聚合時共存之單塊體中間體以重量計為3~50倍,較佳為4~40倍。若乙烯基單體添加量相對於多孔質體未滿3倍,則無法使所生成之單塊體之骨架(單塊體骨架之壁部之厚度)變粗,陰離子交換基導入後之單位體積之陰離子交換容量變小,故欠佳。另一方面,若乙烯基單體添加量超過50倍,則開口徑變小,通水時之壓力損失變大,故欠佳。The amount of the vinyl monomer to be added is 3 to 50 times, preferably 4 to 40 times by weight based on the weight of the monolithic intermediate which is present during the polymerization. When the amount of the vinyl monomer added is not more than three times that of the porous body, the skeleton of the formed monolith (the thickness of the wall portion of the monolith skeleton) cannot be made thick, and the unit volume after the introduction of the anion exchange group is not obtained. The anion exchange capacity becomes small, which is not preferable. On the other hand, when the amount of the vinyl monomer added exceeds 50 times, the opening diameter becomes small, and the pressure loss at the time of water passage becomes large, which is not preferable.
II步驟中所使用之交聯劑適宜使用分子中含有至少2個可聚合之乙烯基且對有機溶劑之溶解性高者。作為交聯劑之具體例,可列舉二乙烯基苯、二乙烯基萘、二乙烯基聯苯、乙二醇二甲基丙烯酸酯、三羥甲基丙烷三丙烯酸酯、丁二醇二丙烯酸酯等。該等交聯劑可將一種單獨使用或將兩種以上組合使用。就機械強度之高度與對水解之穩定性而言,較佳之交聯劑為二乙烯基苯、二乙烯基萘、二乙烯基聯苯等芳香族聚乙烯基化合物。交聯劑使用量相對於乙烯基單體與交聯劑之合計量較佳為0.3~10莫耳%,尤佳為0.3~5莫耳%。若交聯劑使用量未滿0.3莫耳%,則單塊體之機械強度不足,故欠佳。另一方面,若超過10莫耳%,則有陰離子交換基之導入量減少之情況,故欠佳。再者,上述交聯劑使用量較佳為以與乙烯基單體/交聯劑聚合時共存之單塊體中間體之交聯密度大致相等之之方式使用。若兩者之使用量懸殊,則所生成之單塊體中產生交聯密度分布之偏差,於陰離子交換基導入反應時容易產生裂痕。The crosslinking agent used in the step II is preferably one which contains at least two polymerizable vinyl groups in the molecule and has high solubility in an organic solvent. Specific examples of the crosslinking agent include divinylbenzene, divinylnaphthalene, divinylbiphenyl, ethylene glycol dimethacrylate, trimethylolpropane triacrylate, and butanediol diacrylate. Wait. These crosslinking agents may be used alone or in combination of two or more. The preferred crosslinking agent is an aromatic polyvinyl compound such as divinylbenzene, divinylnaphthalene or divinylbiphenyl in terms of the height of the mechanical strength and the stability to hydrolysis. The amount of the crosslinking agent used is preferably from 0.3 to 10 mol%, particularly preferably from 0.3 to 5 mol%, based on the total amount of the vinyl monomer and the crosslinking agent. If the amount of the crosslinking agent used is less than 0.3 mol%, the mechanical strength of the monolith is insufficient, which is not preferable. On the other hand, when it exceeds 10 mol%, the introduction amount of an anion exchange group may fall, and it is unpreferable. Further, the crosslinking agent is preferably used in such a manner that the crosslinking density of the monolithic intermediate which coexists with the polymerization of the vinyl monomer/crosslinking agent is substantially equal. If the amount of use of the two is extremely large, a variation in the crosslink density distribution occurs in the resulting monolith, and cracks are likely to occur when the anion exchange group is introduced into the reaction.
II步驟中所使用之有機溶劑為乙烯基單體或交聯劑溶解但乙烯基單體聚合生成之聚合物不溶解之有機溶劑,換言之,為對乙烯基單體聚合生成之聚合物的不良溶劑。該有機溶劑係視乙烯基單體之種類而大不相同,故難以列舉一般之具體例,例如於乙烯基單體為苯乙烯之情況,作為有機溶劑,可列舉:甲醇、乙醇、丙醇、丁醇、己醇、環己醇、辛醇、2-乙基己醇、癸醇、十二烷醇、乙二醇、丙二醇、四亞甲基二醇、丙三醇等醇類;二乙醚、乙二醇二甲醚、賽路蘇、甲基賽路蘇、丁基賽路蘇、聚乙二醇、聚丙二醇、聚四亞甲基二醇等鏈狀(聚)醚類;己烷、庚烷、辛烷、異辛烷、癸烷、十二烷等鏈狀飽和烴類;乙酸乙酯、乙酸異丙酯、乙酸賽路蘇、丙酸乙酯等酯類。又,即便如二烷或THF、甲苯般為聚苯乙烯之良溶劑,於與上述不良溶劑一起使用且其使用量少之情況,亦可用作有機溶劑。該等有機溶劑之使用量較佳為以上述乙烯基單體之濃度達到30~80重量%之方式使用。若有機溶劑使用量偏離上述範圍而乙烯基單體濃度未滿30重量%,則聚合速度下降,或聚合後之單塊體構造偏離本發明之範圍,故欠佳。另一方面,若乙烯基單體濃度超過80重量%,則有聚合失控之虞,故欠佳。The organic solvent used in the step II is an organic solvent in which a vinyl monomer or a crosslinking agent is dissolved but a polymer obtained by polymerizing a vinyl monomer is insoluble, in other words, a poor solvent for a polymer obtained by polymerizing a vinyl monomer. . The organic solvent is largely different depending on the type of the vinyl monomer. Therefore, it is difficult to cite a general example. For example, when the vinyl monomer is styrene, examples of the organic solvent include methanol, ethanol, and propanol. Butanol, hexanol, cyclohexanol, octanol, 2-ethylhexanol, decyl alcohol, dodecanol, ethylene glycol, propylene glycol, tetramethylene glycol, glycerol and other alcohols; diethyl ether , ethylene glycol dimethyl ether, 赛路苏, methyl 赛路苏, butyl 赛路苏, polyethylene glycol, polypropylene glycol, polytetramethylene glycol and other chain (poly) ethers; hexane Chain-saturated hydrocarbons such as heptane, octane, isooctane, decane, and dodecane; esters such as ethyl acetate, isopropyl acetate, celecoxib acetate, and ethyl propionate. Again, even as two Alkane, THF or toluene is a good solvent for polystyrene. It can also be used as an organic solvent when it is used together with the above-mentioned poor solvent and its use amount is small. The amount of the organic solvent used is preferably such that the concentration of the above vinyl monomer is 30 to 80% by weight. If the amount of the organic solvent used is out of the above range and the vinyl monomer concentration is less than 30% by weight, the polymerization rate is lowered, or the monolithic structure after polymerization deviates from the range of the present invention, which is not preferable. On the other hand, if the vinyl monomer concentration exceeds 80% by weight, there is a possibility that the polymerization is out of control, which is not preferable.
作為聚合起始劑,適宜使用藉由熱及光照射而產生自由基之化合物。聚合起始劑較佳為油溶性。作為本發明中所使用之聚合起始劑之具體例,可列舉:2,2'-偶氮雙(異丁腈)、2,2'-偶氮雙(2,4-二甲基戊腈)、2,2'-偶氮雙(2-甲基丁腈)、2,2'-偶氮雙(4-甲氧基-2,4-二甲基戊腈)、2,2'-偶氮雙異丁酸二甲酯、4,4'-偶氮雙(4-氰基戊酸)、1,1-偶氮雙(環己-1-甲腈)、過氧化苯甲醯、過氧化月桂醯、過硫酸鉀、過硫酸銨、二硫化四甲基秋蘭姆等。聚合起始劑之使用量係視單體之種類或聚合溫度等而大幅變動,但可相對於乙烯基單體與交聯劑之合計量以約0.01~5%之範圍使用。As the polymerization initiator, a compound which generates a radical by heat and light irradiation is suitably used. The polymerization initiator is preferably oil-soluble. Specific examples of the polymerization initiator used in the present invention include 2,2'-azobis(isobutyronitrile) and 2,2'-azobis(2,4-dimethylvaleronitrile). ), 2,2'-azobis(2-methylbutyronitrile), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), 2,2'- Dimethyl azobisisobutyrate, 4,4'-azobis(4-cyanovaleric acid), 1,1-azobis(cyclohexyl-1-carbonitrile), benzammonium peroxide, Peroxidized laurel, potassium persulfate, ammonium persulfate, tetramethyl thiuram disulfide, and the like. The amount of the polymerization initiator to be used varies greatly depending on the type of the monomer, the polymerization temperature, and the like, but it can be used in the range of about 0.01 to 5% based on the total amount of the vinyl monomer and the crosslinking agent.
III步驟係將II步驟中所獲得之混合物於靜置下、且於該I步驟中所獲得之單塊體中間體之存在下進行聚合,而獲得具有較該單塊體中間體之骨架粗之骨架的粗骨架之單塊體的步驟。III步驟中所使用之單塊體中間體不僅創造出本發明之具有嶄新構造之單塊體,而且承擔極重要之作用。如日本專利特表平7-501140號等所揭示,若於單塊體中間體不存在下使乙烯基單體與交聯劑於特定有機溶劑中靜置聚合,則獲得粒子凝集型之單塊體狀有機多孔質體。相對於此,若如本發明所述使上述聚合系統中存在連續巨觀細孔構造之單塊體中間體,則聚合後之單塊體之構造急遽變化,粒子凝集構造消失,獲得上述粗骨架之單塊體。其原因並未查明,一般認為,於單塊體中間體不存在之情況,藉由聚合而產生之交聯聚合物以粒子狀析出‧沈澱,由此形成粒子凝集構造,相對於此,若聚合系統中存在多孔質體(中間體),則乙烯基單體及交聯劑自液相中吸附或分配至多孔質體(中間體)之骨架部,於多孔質體(中間體)中進行聚合而獲得粗骨架之單塊體。再者,開口徑隨著聚合之進行而變窄,但由於單塊體中間體之總細孔容積大,故即便骨架成為粗骨架亦獲得適度大小之開口徑。In the third step, the mixture obtained in the step II is subjected to polymerization under the condition of standing and the monolith intermediate obtained in the step I, to obtain a skeleton having a coarser than the monolith intermediate. The step of a single block of the skeleton of the skeleton. The monolithic intermediate used in the third step not only creates a monolith having a novel structure of the present invention, but also plays a very important role. As disclosed in Japanese Patent Laid-Open No. Hei 7-501140, if a vinyl monomer and a crosslinking agent are allowed to stand in a specific organic solvent in the absence of a monolithic intermediate, a monolith of particle agglomerated type is obtained. Bulk organic porous body. On the other hand, when the monolith intermediate body having a continuous macroscopic pore structure is present in the polymerization system as described in the present invention, the structure of the monolithic body after polymerization changes rapidly, and the particle agglomerate structure disappears, and the above coarse skeleton is obtained. Monolithic body. The reason for this is not ascertained, and it is considered that, in the case where the monolith intermediate is not present, the crosslinked polymer produced by the polymerization is precipitated in the form of particles, thereby forming a particle agglomerated structure. When a porous body (intermediate) is present in the polymerization system, the vinyl monomer and the crosslinking agent are adsorbed or distributed from the liquid phase to the skeleton portion of the porous body (intermediate), and are carried out in the porous body (intermediate). Polymerization to obtain a monolithic body of a coarse skeleton. Further, the opening diameter is narrowed as the polymerization progresses, but since the total pore volume of the monolith intermediate body is large, an opening diameter of an appropriate size is obtained even if the skeleton becomes a thick skeleton.
反應容器之內容積只要為使單塊體中間體存在於反應容器中之大小者,則並無特別限制,可為於反應容器內載置單塊體中間體時俯視而單塊體之周圍形成間隙者、於反應容器內無間隙地放入單塊體中間體者中之任一者。其中,聚合後之粗骨架之單塊體不受容器內壁之按壓且無間隙地放入至反應容器內者,不會使單塊體發生變形,且無反應原料等之浪費而有效率。再者,即便為反應容器之內容積大,聚合後之單塊體之周圍存在間隙之情況,亦由於乙烯基單體或交聯劑經吸附、分配至單塊體中間體上,而於反應容器內之間隙部分不生成粒子凝集構造物。The internal volume of the reaction vessel is not particularly limited as long as the monolith intermediate is present in the reaction vessel, and may be formed in a plan view and placed around the monolith when the monolith intermediate is placed in the reaction vessel. Any one of the gaps and the monolith intermediates are placed in the reaction vessel without a gap. Among them, the monolithic body of the thick skeleton after the polymerization is not pressed into the reaction container without being pressed by the inner wall of the container, and the monolith is not deformed, and the raw material is not wasted and efficiently. Furthermore, even if the internal volume of the reaction vessel is large, there is a gap around the monolithic body after polymerization, and the vinyl monomer or the crosslinking agent is adsorbed and distributed to the monolith intermediate, and the reaction is carried out. The particle agglomerate structure is not formed in the gap portion in the container.
III步驟中,反應容器中,單塊體中間體係置於經混合物(溶液)含浸之狀態。II步驟中所獲得之混合物與單塊體中間體之調配比如上所述,較適宜為以相對於單塊體中間體,乙烯基單體之添加量以重量計成為3~50倍、較佳為4~40倍之方式調配。藉此,可獲得具有適度開口徑且具有粗骨架之單塊體。反應容器中,混合物中之乙烯基單體與交聯劑係吸附、分配至靜置之單塊體中間體之骨架,於單塊體中間體之骨架內進行聚合。In the third step, in the reaction vessel, the monolithic intermediate system is placed in a state of being impregnated with the mixture (solution). The preparation of the mixture obtained in the step II and the monolith intermediate is, as described above, preferably, the amount of the vinyl monomer added is 3 to 50 times by weight relative to the monolith intermediate. It is 4 to 40 times. Thereby, a monolith having a moderate opening diameter and having a thick skeleton can be obtained. In the reaction vessel, the vinyl monomer and the crosslinking agent in the mixture are adsorbed and distributed to the skeleton of the standing monolith intermediate, and polymerization is carried out in the skeleton of the monolith intermediate.
聚合條件係根據單體之種類、起始劑之種類而選擇各種條件。例如,使用2,2'-偶氮雙(異丁腈)、2,2'-偶氮雙(2,4-二甲基戊腈)、過氧化苯甲醯、過氧化月桂醯、過硫酸鉀等作為起始劑時,只要於惰性氣體環境下之密封容器內,於30~100℃加熱聚合1~48小時即可。藉由加熱聚合,吸附、分配至單塊體中間體之骨架之乙烯基單體與交聯劑於該骨架內聚合,使該骨架變粗。聚合結束後,取出內容物,以未反應乙烯基單體與有機溶劑之去除為目的,以丙酮等溶劑萃取而獲得粗骨架之單塊體。The polymerization conditions are selected depending on the kind of the monomer and the kind of the initiator. For example, 2,2'-azobis(isobutyronitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), benzammonium peroxide, lauric acid peroxide, persulfuric acid When potassium or the like is used as the initiator, it may be heated and polymerized at 30 to 100 ° C for 1 to 48 hours in a sealed container under an inert gas atmosphere. By heating polymerization, a vinyl monomer adsorbed and distributed to the skeleton of the monolith intermediate is polymerized in the skeleton to thicken the skeleton. After the completion of the polymerization, the contents are taken out, and the unreacted vinyl monomer and the organic solvent are removed for extraction, and a monolith of a crude skeleton is obtained by extraction with a solvent such as acetone.
繼而,利用上述方法製造單塊體後導入陰離子交換基之方法就可嚴密控制所得單塊體陰離子交換體之多孔構造的方面而言較佳。Then, the method of producing a monolith and introducing an anion exchange group by the above method is preferable in that the porous structure of the obtained monolith anion exchanger can be closely controlled.
作為於上述單塊體中導入陰離子交換基之方法,並無特別限制,可使用高分子反應或接枝聚合等公知方法。例如,作為導入四級銨基之方法,可列舉:若單塊體為苯乙烯-二乙烯基苯共聚物等,則藉由氯甲基甲醚等導入氯甲基後,使其與三級胺反應之方法;藉由氯甲基苯乙烯與二乙烯基苯之共聚合而製造單塊體,使其與三級胺反應之方法;於單塊體中,均勻地將自由基起始基或鏈轉移基導入至骨架表面及骨架內部,使N,N,N-三甲基銨乙基丙烯酸酯或N,N,N-三甲基銨丙基丙烯醯胺接枝聚合之方法;同樣地使甲基丙烯酸環氧丙酯接枝聚合後,藉由官能基變換而導入四級銨基之方法等。該等方法中,作為導入四級銨基之方法,就可均勻且定量地導入離子交換基之方面而言,較佳為:於苯乙烯-二乙烯基苯共聚合體中藉由氯甲基甲醚等導入氯甲基後,使其與三級胺反應之方法;或藉由氯甲基苯乙烯與二乙烯基苯之共聚合而製造單塊體,使其與三級胺反應之方法。再者,作為所導入之離子交換基,可列舉三甲基銨基、三乙基銨基、三丁基銨基、二甲基羥基乙基銨基、二甲基羥基丙基銨基、甲基二羥基乙基銨基等四級銨基,或第三鋶基、鏻基等。The method of introducing the anion exchange group into the monolith is not particularly limited, and a known method such as polymer reaction or graft polymerization can be used. For example, as a method of introducing a quaternary ammonium group, when a monolith is a styrene-divinylbenzene copolymer or the like, a chloromethyl group is introduced by chloromethyl methyl ether or the like, and then it is combined with a third stage. A method for reacting an amine; a method for producing a monolith by copolymerization of chloromethylstyrene and divinylbenzene to react with a tertiary amine; uniformly conducting a radical starting group in a monolith Or a chain transfer group introduced into the surface of the skeleton and the inside of the skeleton to graft or polymerize N,N,N-trimethylammoniumethyl acrylate or N,N,N-trimethylammoniumpropyl acrylamide; After the graft polymerization of glycidyl methacrylate is carried out, a method of introducing a quaternary ammonium group by a functional group conversion or the like is carried out. In these methods, as a method of introducing a quaternary ammonium group, the ion exchange group can be introduced uniformly and quantitatively, and it is preferred to use chloromethyl group in the styrene-divinylbenzene copolymer. A method in which an ether or the like is introduced into a chloromethyl group to cause reaction with a tertiary amine; or a method in which a monolith is produced by copolymerization of chloromethylstyrene and divinylbenzene to react with a tertiary amine. Further, examples of the ion exchange group to be introduced include a trimethylammonium group, a triethylammonium group, a tributylammonium group, a dimethylhydroxyethylammonium group, a dimethylhydroxypropylammonium group, and a A quaternary ammonium group such as a bishydroxyethylammonium group, or a third fluorenyl group or a fluorenyl group.
第1單塊體陰離子交換體係於粗骨架之單塊體中導入陰離子交換基,故大幅膨潤至例如粗骨架單塊體之1.4~1.9倍。即,膨潤度遠遠大於日本專利特開2002-306976所記載之於習知單塊體中導入有離子交換基者。因此,即便粗骨架單塊體之開口徑小,單塊體離子交換體之開口徑亦大致以上述倍率變大。又,即便開口徑由於膨潤而變大,總細孔容積亦不變化。因此,第1單塊體離子交換體儘管開口徑非常大,但由於具有粗骨架而機械強度高。Since the first monolith anion exchange system introduces an anion exchange group into a monolith of a coarse skeleton, it is greatly swollen to, for example, 1.4 to 1.9 times the coarse skeleton monolith. That is, the degree of swelling is much larger than that of the conventional monolith introduced into the ion exchange group described in JP-A-2002-306976. Therefore, even if the opening diameter of the coarse skeleton monolith is small, the opening diameter of the monolithic ion exchanger becomes substantially larger at the above magnification. Further, even if the opening diameter is increased due to swelling, the total pore volume does not change. Therefore, although the first monolith ion exchanger has a very large opening diameter, it has a high mechanical strength due to a thick skeleton.
<第2單塊體陰離子交換體之說明><Description of the second monolithic anion exchanger>
第2單塊體陰離子交換體係由以於導入有陰離子交換基之總構成單位中含有0.3~5.0莫耳%之交聯構造單位的芳香族乙烯基聚合物所形成且平均粗度於水濕潤狀態為1~60 μm之三維性連續之骨架、及於該骨架間平均直徑於水濕潤狀態為10~100 μm之三維性連續之空孔所構成之共連續構造體,總細孔容積為0.5~5 ml/g,水濕潤狀態之單位體積之離子交換容量為0.3~1.0 mg當量/ml,並且陰離子交換基於該多孔質離子交換體中均勻分布。The second monolith anion exchange system is formed of an aromatic vinyl polymer containing 0.3 to 5.0 mol% of a crosslinked structural unit in a total constituent unit to which an anion exchange group is introduced, and has an average thickness in a water-wet state. a three-dimensional continuous skeleton of 1 to 60 μm and a co-continuous structure composed of three-dimensional continuous pores having an average diameter of 10 to 100 μm in a water-wet state, and a total pore volume of 0.5 to ~ 5 ml/g, the ion exchange capacity per unit volume in the wet state of water is 0.3 to 1.0 mg equivalent/ml, and anion exchange is uniformly distributed based on the porous ion exchanger.
第2單塊體陰離子交換體係由導入有陰離子交換基之平均粗度於水濕潤狀態為1~60 μm、較佳為3~58 μm之三維性連續之骨架,及於該骨架間平均直徑於水濕潤狀態為10~100 μm、較佳為15~90 μm、尤佳為20~80 μm之三維性連續之空孔所構成之共連續構造體。即,共連續構造如圖6之示意圖所示,係連續之骨架相1與連續之空孔相2纏繞,且各自均三維性連續之構造10。該連續之空孔2與先前之連續氣泡型單塊體或粒子凝集型單塊體相比,空孔之連續性較高且其大小無偏差,因此可達成極均勻之離子吸附行為。又,由於骨架粗故機械強度高。The second monolith anion exchange system has a three-dimensional continuous skeleton in which the average thickness of the anion exchange group is 1 to 60 μm, preferably 3 to 58 μm, and the average diameter between the skeletons is The water-wet state is a co-continuous structure composed of three-dimensional continuous pores of 10 to 100 μm, preferably 15 to 90 μm, and more preferably 20 to 80 μm. That is, the co-continuous structure is shown in the schematic view of Fig. 6, and is a structure 10 in which a continuous skeleton phase 1 is wound with a continuous pore phase 2, and each of which is three-dimensionally continuous. The continuous pores 2 have higher continuity of pores and no deviation in size compared with the conventional continuous bubble type monolith or particle agglomerated monolith, so that extremely uniform ion adsorption behavior can be achieved. Moreover, the mechanical strength is high due to the coarse skeleton.
由於在單塊體中導入陰離子交換基時單塊體整體膨潤,故第2單塊體陰離子交換體之骨架之粗度及空孔之直徑大於單塊體之骨架之粗度及空孔之直徑。該連續之空孔與先前之連續氣泡型單塊體狀有機多孔質陰離子交換體或粒子凝集型單塊體狀有機多孔質陰離子交換體相比,空孔之連續性較高且其大小無偏差,因此可達成極均勻之陰離子之吸附行為。若三維性連續之空孔之平均直徑於水濕潤狀態未滿10 μm,則通水時之壓力損失變大,故欠佳;若超過100 μm,被處理水與有機多孔質陰離子交換體之接觸變得不充分,其結果為被處理水中之過氧化氫之分解或溶氧之去除變得不充分,故欠佳。又,若骨架之平均粗度於水濕潤狀態未滿1 μm,則除單位體積之陰離子交換容量下降之缺點之外,機械強度下降,尤其於以高流速通水時單塊體陰離子交換體大幅變形,故欠佳。進而,被處理水與單塊體陰離子交換體之接觸效率下降,觸媒效果下降,故欠佳。另一方面,若骨架之粗度超過60 μm,則骨架變得過粗,通水時之壓力損失增大,故欠佳。Since the monolith is swollen as a whole when the anion exchange group is introduced into the monolith, the thickness of the skeleton of the second monolith anion exchanger and the diameter of the pores are larger than the thickness of the skeleton of the monolith and the diameter of the pores. . The continuous pores have higher continuity of pores and no deviation in size compared with the conventional continuous bubble type monolithic organic porous anion exchanger or particle agglomerated monolithic organic porous anion exchanger. Therefore, an extremely uniform anion adsorption behavior can be achieved. If the average diameter of the three-dimensional continuous pores is less than 10 μm in the wet state of water, the pressure loss during the passage of water becomes large, which is not preferable; if it exceeds 100 μm, the contact of the treated water with the organic porous anion exchanger The result is insufficient, and as a result, the decomposition of hydrogen peroxide or the removal of dissolved oxygen in the treated water becomes insufficient, which is not preferable. Further, if the average thickness of the skeleton is less than 1 μm in the water-wet state, the mechanical strength is lowered in addition to the disadvantage that the anion exchange capacity per unit volume is lowered, especially when the water flows at a high flow rate, the monolith anion exchanger is largely large. Deformation, so it is not good. Further, the contact efficiency between the water to be treated and the monolith anion exchanger is lowered, and the catalytic effect is lowered, which is not preferable. On the other hand, if the thickness of the skeleton exceeds 60 μm, the skeleton becomes too thick, and the pressure loss at the time of water passage increases, which is not preferable.
上述連續構造體之空孔於水濕潤狀態之平均直徑係將以汞滲法測定的乾燥狀態之單塊體陰離子交換體之空孔之平均直徑乘以膨潤率而算出之值。具體而言,若設水濕潤狀態之單塊體陰離子交換體之直徑為x2(mm)、使該水濕潤狀態之單塊體陰離子交換體乾燥而獲得之乾燥狀態之單塊體陰離子交換體之直徑為y2(mm)、且利用汞滲法測定該乾燥狀態之單塊體陰離子交換體時之空孔之平均直徑為z2(μm),則單塊體陰離子交換體之空孔於水濕潤狀態之平均直徑(μm)係利用下式「水濕潤狀態之單塊體陰離子交換體之空孔之平均直徑(μm)=z2×(x2/y2)」而算出。又,於陰離子交換基導入前之乾燥狀態之單塊體之空孔之平均直徑、及水濕潤狀態之單塊體陰離子交換體相對於在該乾燥狀態之單塊體中導入有陰離子交換基時之乾燥狀態之單塊體的膨潤率為已知之情況,亦可將乾燥狀態之單塊體之空孔之平均直徑乘以膨潤率而算出水濕潤狀態之單塊體陰離子交換體之空孔之平均直徑。又,上述連續構造體之骨架之水濕潤狀態之平均粗度係進行至少3次乾燥狀態之單塊體陰離子交換體之SEM觀察,測定所獲得之圖像中之骨架之粗度,將其平均值乘以膨潤率而算出之值。具體而言,若設水濕潤狀態之單塊體陰離子交換體之直徑為x3(mm)、使該水濕潤狀態之單塊體陰離子交換體乾燥而獲得之乾燥狀態之單塊體陰離子交換體之直徑為y3(mm)、且進行至少3次該乾燥狀態之單塊體陰離子交換體之SEM觀察並測定所獲得之圖像中之骨架之粗度而設其平均值為Z3(μm),則水濕潤狀態之單塊體陰離子交換體之連續構造體之骨架之平均粗度(μm)係利用下式「水濕潤狀態之單塊體陰離子交換體之連續構造體之骨架之平均粗度(μm)=z3×(x3/y3)」而算出。又,於陰離子交換基導入前之乾燥狀態之單塊體之骨架之平均粗度、及水濕潤狀態之單塊體陰離子交換體相對於在該乾燥狀態之單塊體中導入有陰離子交換基時之乾燥狀態之單塊體的膨潤率為已知之情況,亦可將乾燥狀態之單塊體之骨架之平均粗度乘以膨潤率而算出水濕潤狀態之單塊體陰離子交換體之骨架之平均粗度。再者,骨架為棒狀且為圓形剖面形狀,亦可包含楕圓剖面形狀等異徑剖面者。此時之粗度為短徑與長徑之平均。The average diameter of the pores in the water-wet state of the continuous structure is a value calculated by multiplying the average diameter of the pores of the monolithic anion exchanger in a dry state measured by the mercury permeation method by the swelling ratio. Specifically, a monolithic anion exchanger having a diameter of x2 (mm) in a water-wet state and a monolith anion exchanger obtained by drying the monolithic anion exchanger in a wet state is provided. When the diameter of the monolith anion exchanger in the dry state is z2 (μm) by the mercury permeation method, the pores of the monolithic anion exchanger are wetted by water. The average diameter (μm) is calculated by the following formula "average diameter (μm) of the pores of the monolith anion exchanger in the water-wet state = z2 × (x2 / y2)". Further, the average diameter of the pores in the dry state before the introduction of the anion exchange group, and the monolith anion exchanger in the water-wet state are introduced to the anion exchange group in the monolith of the dry state. In the case where the swelling rate of the monolith in the dry state is known, the average diameter of the pores of the monolith in the dry state may be multiplied by the swelling ratio to calculate the pores of the monolith anion exchanger in the water-wet state. The average diameter. Further, the average thickness of the water-wet state of the skeleton of the continuous structure is SEM observation of a monolithic anion exchanger at least three times in a dry state, and the thickness of the skeleton in the obtained image is measured and averaged. The value is multiplied by the value of the swelling rate. Specifically, a monolithic anion exchanger having a diameter of x3 (mm) in a water-wet state and a monolith anion exchanger in which the water is wet is dried to obtain a dry state. SEM observation of a monolithic anion exchanger having a diameter of y3 (mm) and at least three times of this dry state, and measuring the thickness of the skeleton in the obtained image, and setting the average value to Z3 (μm) The average thickness (μm) of the skeleton of the continuous structure of the monolithic anion exchanger in the water-wet state is the average thickness (μm) of the skeleton of the continuous structure of the monolithic anion exchanger in the water-wet state. ) = z3 × (x3 / y3)" is calculated. Further, the average bulk of the skeleton of the monolith in the dry state before the introduction of the anion exchange group, and the monolith anion exchanger in the water-wet state are introduced with the anion exchange group in the monolith of the dry state. In the case where the swelling rate of the monolith in the dry state is known, the average of the skeleton of the monolith in the dry state is multiplied by the swelling ratio to calculate the average of the skeleton of the monolith anion exchanger in the water-wet state. roughness. Further, the skeleton has a rod shape and a circular cross-sectional shape, and may also include a cross-sectional profile such as a circular cross-sectional shape. The thickness at this time is the average of the short diameter and the long diameter.
又,第2單塊體陰離子交換體之總細孔容積為0.5~5ml/g。若總細孔容積未滿0.5 ml/g,則通水時之壓力損失變大,故欠佳,進而,每單位剖面積之穿透水量變小,處理水量下降,故欠佳。另一方面,若總細孔容積超過5 ml/g,則單位體積之陰離子交換容量下降,鉑族金屬奈米粒子之載持量亦下降,觸媒效果下降,故欠佳。又,機械強度下降,尤其於以高流速通水時單塊體陰離子交換體大幅變形,故欠佳。進而,被處理水與單塊體陰離子交換體之接觸效率下降,故過氧化氫分解效果或溶氧去除效果亦下降,故欠佳。若三維性連續之空孔之大小及總細孔容積在上述範圍內,則與被處理水之接觸極均勻,接觸面積亦大,且可進行低壓力損失下之通水。再者,單塊體(單塊體中間體、單塊體、單塊體陰離子交換體)之總細孔容積於乾燥狀態、水濕潤狀態均相同。Further, the total pore volume of the second monolith anion exchanger is 0.5 to 5 ml/g. When the total pore volume is less than 0.5 ml/g, the pressure loss at the time of water passage becomes large, which is unsatisfactory. Further, the amount of permeated water per unit sectional area becomes small, and the amount of treated water decreases, which is not preferable. On the other hand, when the total pore volume exceeds 5 ml/g, the anion exchange capacity per unit volume decreases, and the amount of platinum group metal nanoparticles is also lowered, and the catalytic effect is lowered, which is not preferable. Further, the mechanical strength is lowered, and in particular, when the water is passed through at a high flow rate, the monolith anion exchanger is largely deformed, which is not preferable. Further, since the contact efficiency between the water to be treated and the monolith anion exchanger is lowered, the hydrogen peroxide decomposition effect or the dissolved oxygen removal effect is also lowered, which is not preferable. When the size of the three-dimensional continuous pores and the total pore volume are within the above range, the contact with the water to be treated is extremely uniform, the contact area is also large, and water passing under low pressure loss can be performed. Further, the total pore volume of the monolith (monolith intermediate, monolith, monolith anion exchanger) was the same in both the dry state and the water wet state.
再者,使水穿透第2單塊體陰離子交換體時之壓力損失若以於填充有多孔質體1 m之管柱中以通水線速度(LV)1 m/h通水時之壓力損失(以下稱為「差壓係數」)表示,則為0.001~0.5 MPa/m‧LV之範圍,尤其為0.005~0.1 MPa/m‧LV。Further, the pressure loss when the water penetrates the second monolith anion exchanger is such that the pressure in the column filled with the porous body 1 m is water at a water velocity (LV) of 1 m/h. The loss (hereinafter referred to as "differential pressure coefficient") means a range of 0.001 to 0.5 MPa/m ‧ LV, particularly 0.005 to 0.1 MPa/m ‧ LV.
第2單塊體陰離子交換體中,構成共連續構造體之骨架之材料為在總構成單位中含有0.3~5莫耳%、較佳為0.5~3.0莫耳%之交聯構造單位之芳香族乙烯基聚合物,為疏水性。若交聯構造單位未滿0.3莫耳%,則機械強度不足,故欠佳;另一方面,若超過5莫耳%,則多孔質體之構造容易偏離共連續構造。對該芳香族乙烯基聚合物之種類並無特別限制,例如可列舉聚苯乙烯、聚(α-甲基苯乙烯)、聚乙烯基甲苯、聚乙烯基苄基氯、聚乙烯基聯苯、聚乙烯基萘等。上述聚合物可為使單獨之乙烯基單體與交聯劑共聚合而獲得之聚合物,亦可為使數種乙烯基單體與交聯劑聚合而獲得之聚合物,又,亦可為將兩種以上之聚合物摻合而成者。該等有機聚合物材料中,就共連續構造形成之容易度、陰離子交換基導入之容易性與機械強度之高度、及對酸或鹼之穩定性之高度而言,較佳為苯乙烯-二乙烯基苯共聚合體或乙烯基苄基氯-二乙烯基苯共聚合體。In the second monolith anion exchanger, the material constituting the skeleton of the co-continuous structure is an aromatic group containing 0.3 to 5 mol%, preferably 0.5 to 3.0 mol% of the crosslinked structural unit in the total constituent unit. A vinyl polymer that is hydrophobic. If the crosslinked structural unit is less than 0.3 mol%, the mechanical strength is insufficient, which is not preferable. On the other hand, if it exceeds 5 mol%, the structure of the porous body tends to deviate from the co-continuous structure. The type of the aromatic vinyl polymer is not particularly limited, and examples thereof include polystyrene, poly(α-methylstyrene), polyvinyltoluene, polyvinylbenzyl chloride, and polyvinylbiphenyl. Polyvinyl naphthalene and the like. The polymer may be a polymer obtained by copolymerizing a single vinyl monomer and a crosslinking agent, or a polymer obtained by polymerizing a plurality of vinyl monomers and a crosslinking agent, or may be A combination of two or more polymers. Among these organic polymer materials, styrene-second is preferable in terms of easiness of formation of a continuous structure, easiness of introduction of anion exchange groups, height of mechanical strength, and height of stability to an acid or a base. Vinyl benzene copolymer or vinylbenzyl chloride-divinylbenzene copolymer.
第2單塊體陰離子交換體具有水濕潤狀態之單位體積之陰離子交換容量為0.3~1.0 mg當量/ml之離子交換容量。如日本專利特開2002-306976號中記載之具有與本發明不同之連續巨觀細孔構造的習知型單塊體狀有機多孔質離子交換體中具有以下缺點:若為達成實用上所要求之低壓力損失而擴大開口徑,則總細孔容積隨之變大,因此單位體積之離子交換容量下降;若為使單位體積之交換容量增加而減小總細孔容積,則開口徑變小因此壓力損失增加。相對於此,本發明之第2單塊體陰離子交換體由於三維性連續之空孔之連續性或均勻性高,故即便使總細孔容積下降,壓力損失亦不太增加。因此,可於將壓力損失抑制為較低之狀態下飛躍性地擴大單位體積之陰離子交換容量。若單位體積之陰離子交換容量未滿0.3 mg當量/ml,則單位體積之鉑族金屬之奈米粒子載持量下降,故欠佳。另一方面,若單位體積之陰離子交換容量超過1.0 mg當量/ml,則通水時之壓力損失增大,故欠佳。再者,第2單塊體陰離子交換體之乾燥狀態之單位重量之陰離子交換容量並無特別限定,為將離子交換基均勻地導入至多孔質體之骨架表面及骨架內部,為3.5~4.5 mg當量/g。再者,將離子交換基僅導入至骨架表面之多孔質體之離子交換容量係視多孔質體或離子交換基之種類而不同,無法一概決定,但最多為500 μg當量/g。The second monolith anion exchanger has an ion exchange capacity of from 0.3 to 1.0 mg equivalent/ml per unit volume of the anion exchange capacity in a water-wet state. A conventional monolithic organic porous ion exchanger having a continuous macroscopic pore structure different from the present invention as described in Japanese Laid-Open Patent Publication No. 2002-306976 has the following disadvantages: When the opening diameter is increased by the low pressure loss, the total pore volume becomes larger, so the ion exchange capacity per unit volume decreases; if the total pore volume is decreased to increase the exchange capacity per unit volume, the opening diameter becomes smaller. Therefore, the pressure loss increases. On the other hand, in the second monolith anion exchanger of the present invention, since the continuity or uniformity of the three-dimensional continuous pores is high, the pressure loss does not increase even if the total pore volume is decreased. Therefore, the anion exchange capacity per unit volume can be dramatically expanded in a state where the pressure loss is suppressed to be low. If the anion exchange capacity per unit volume is less than 0.3 mg equivalent/ml, the amount of nanoparticle supported per unit volume of the platinum group metal is lowered, which is not preferable. On the other hand, if the anion exchange capacity per unit volume exceeds 1.0 mg equivalent/ml, the pressure loss at the time of water passage increases, which is not preferable. In addition, the anion exchange capacity per unit weight of the dry state of the second monolith anion exchanger is not particularly limited, and the ion exchange group is uniformly introduced into the skeleton surface of the porous body and the inside of the skeleton, and is 3.5 to 4.5 mg. Equivalent / g. Further, the ion exchange capacity in which the ion exchange group is introduced only into the porous body on the surface of the skeleton differs depending on the type of the porous body or the ion exchange group, and cannot be determined in a single manner, but is at most 500 μg equivalent/g.
作為第2單塊體陰離子交換體中之陰離子交換基,與第1單塊體陰離子交換體中之陰離子交換基相同,故省略其說明。第2單塊體陰離子交換體中,所導入之陰離子交換基不僅均勻分布於多孔質體之表面,而且均勻分布至多孔質體之骨架內部。均勻分布之定義係與第1單塊體陰離子交換體之均勻分布之定義相同。The anion exchange group in the second monolith anion exchanger is the same as the anion exchange group in the first monolith anion exchanger, and thus the description thereof will be omitted. In the second monolith anion exchanger, the introduced anion exchange group is not only uniformly distributed on the surface of the porous body but also uniformly distributed inside the skeleton of the porous body. The definition of uniform distribution is the same as the definition of the uniform distribution of the first monolithic anion exchanger.
(第2單塊體陰離子交換體之製造方法)(Method for producing second monolithic anion exchanger)
第2單塊體陰離子交換體係藉由進行如下步驟而獲得:I步驟,藉由將不含離子交換基之油溶性單體、界面活性劑及水之混合物攪拌而製備油中水滴型乳化液,繼而使油中水滴型乳化液聚合而獲得總細孔容積超過16 ml/g且30 ml/g以下之連續巨觀細孔構造之單塊體狀有機多孔質中間體;II步驟,製備包含芳香族乙烯基單體、一分子中具有至少2個以上乙烯基之於所有油溶性單體中為0.3~5莫耳%之交聯劑、芳香族乙烯基單體或交聯劑溶解但芳香族乙烯基單體聚合生成之聚合物不溶解之有機溶劑及聚合起始劑之混合物;III步驟,將II步驟中所獲得之混合物於靜置下、且於I步驟中所獲得之單塊體狀有機多孔質中間體之存在下進行聚合,獲得共連續構造體;IV步驟,於該III步驟中所獲得之共連續構造體中導入陰離子交換基。The second monolithic anion exchange system is obtained by the following steps: In the first step, a water-drop type emulsion in an oil is prepared by stirring a mixture of an oil-soluble monomer, a surfactant, and water without an ion exchange group. Then, the water-drop type emulsion in the oil is polymerized to obtain a monolithic organic porous intermediate having a continuous pore volume of more than 16 ml/g and 30 ml/g or less; II step, preparation comprising aroma a vinyl group monomer having at least 2 or more vinyl groups in one molecule of 0.3 to 5 mol% of a crosslinker, an aromatic vinyl monomer or a crosslinker dissolved in all oil-soluble monomers but aromatic a mixture of an organic solvent insoluble in a polymer obtained by polymerizing a vinyl monomer and a polymerization initiator; a step of III, a monolith obtained in the step I, which is obtained in the step I, and obtained in the step I The polymerization is carried out in the presence of an organic porous intermediate to obtain a co-continuous structure; in the IV step, an anion exchange group is introduced into the co-continuous structure obtained in the III step.
獲得第2單塊體陰離子交換體中之單塊體中間體之I步驟只要依據日本專利特開2002-306976號公報所記載之方法進行即可。The I step of obtaining the monolithic intermediate in the second monolith anion exchanger may be carried out in accordance with the method described in JP-A-2002-306976.
即,I步驟中,作為不含離子交換基之油溶性單體,例如可列舉不含羧酸基、磺酸基、四級銨基等離子交換基且對水之溶解性低而為親油性之單體。作為該等單體之具體例,可列舉:苯乙烯、α-甲基苯乙烯、乙烯基甲苯、乙烯基苄基氯、乙烯基聯苯、乙烯基萘等芳香族乙烯基單體;乙烯、丙烯、1-丁烯、異丁烯等α-烯烴;丁二烯、異戊二烯、氯丁二烯等二烯系單體;氯乙烯、溴乙烯、偏二氯乙烯、四氟乙烯等鹵化烯烴;丙烯腈、甲基丙烯腈等腈系單體;乙酸乙烯酯、丙酸乙烯酯等乙烯酯;丙烯酸甲酯、丙烯酸乙酯、丙烯酸丁酯、丙烯酸2-乙基己酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸丁酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸環己酯、甲基丙烯酸苄酯、甲基丙烯酸環氧丙酯等(甲基)丙烯酸系單體。該等單體中,適宜者為芳香族乙烯基單體,例如可列舉苯乙烯、α-甲基苯乙烯、乙烯基甲苯、乙烯基苄基氯、二乙烯基苯等。該等單體可將一種單獨使用或將兩種以上組合使用。其中,至少選擇二乙烯基苯、乙二醇二甲基丙烯酸酯等交聯性單體作為油溶性單體酯之一成分且使其含量於總油溶性單體中為0.3~5莫耳%、較佳為0.3~3莫耳%有利於共連續構造之形成,故較佳。In other words, in the first step, the oil-soluble monomer which does not contain an ion-exchange group is, for example, an ion-exchange group which does not contain a carboxylic acid group, a sulfonic acid group or a quaternary ammonium group, and has low solubility in water and is lipophilic. monomer. Specific examples of the monomers include aromatic vinyl monomers such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl chloride, vinylbiphenyl, and vinylnaphthalene; and ethylene; Alpha-olefins such as propylene, 1-butene and isobutylene; diene monomers such as butadiene, isoprene and chloroprene; halogenated olefins such as vinyl chloride, vinyl bromide, vinylidene chloride and tetrafluoroethylene Nitrile monomers such as acrylonitrile and methacrylonitrile; vinyl esters such as vinyl acetate and vinyl propionate; methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, and methacrylic acid Ester, ethyl methacrylate, propyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, glycidyl methacrylate A (meth)acrylic monomer. Among these monomers, an aromatic vinyl monomer is suitable, and examples thereof include styrene, α-methylstyrene, vinyltoluene, vinylbenzyl chloride, and divinylbenzene. These monomers may be used alone or in combination of two or more. Wherein at least a crosslinkable monomer such as divinylbenzene or ethylene glycol dimethacrylate is selected as one of the oil-soluble monomeric esters and the content thereof is 0.3 to 5 mol% in the total oil-soluble monomer. Preferably, 0.3 to 3 mol% is advantageous for the formation of a co-continuous structure, which is preferred.
界面活性劑與第1單塊體陰離子交換體之I步驟中所使用之界面活性劑相同,故省略其說明。Since the surfactant is the same as the surfactant used in the first step of the first monolith anion exchanger, the description thereof will be omitted.
又,I步驟中,油中水滴型乳化液形成時視需要亦可使用聚合起始劑。聚合起始劑適宜使用藉由熱及光照射而產生自由基之化合物。聚合起始劑可為水溶性亦可為油溶性,例如可列舉:2,2'-偶氮雙(異丁腈)、2,2'-偶氮雙(2,4-二甲基戊腈)、2,2'-偶氮雙(2-甲基丁腈)、2,2'-偶氮雙(4-甲氧基-2,4-二甲基戊腈)、2,2'-偶氮雙異丁酸二甲酯、4,4'-偶氮雙(4-氰基戊酸)、1,1'-偶氮雙(環己-1-甲腈)、過氧化苯甲醯、過氧化月桂醯、過硫酸鉀、過硫酸銨、二硫化四甲基秋蘭姆、過氧化氫-氯化亞鐵、過硫酸鈉-酸性亞硫酸鈉等。Further, in the first step, a polymerization initiator may be used as needed in the formation of the water droplet type emulsion in the oil. As the polymerization initiator, a compound which generates a radical by heat and light irradiation is suitably used. The polymerization initiator may be water-soluble or oil-soluble, and examples thereof include 2,2'-azobis(isobutyronitrile) and 2,2'-azobis(2,4-dimethylvaleronitrile). ), 2,2'-azobis(2-methylbutyronitrile), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), 2,2'- Dimethyl azobisisobutyrate, 4,4'-azobis(4-cyanovaleric acid), 1,1'-azobis(cyclohexyl-1-carbonitrile), benzammonium peroxide , oxidized laurel, potassium persulfate, ammonium persulfate, tetramethyl thiuram disulfide, hydrogen peroxide - ferrous chloride, sodium persulfate - acidic sodium sulfite, and the like.
作為將不含離子交換基之油溶性單體、界面活性劑、水及聚合起始劑混合而形成油中水滴型乳化液時之混合方法,與第1單塊體陰離子交換體酯I步驟中之混合方法相同,故省略其說明。a method for mixing a water-soluble monomer, an intervening agent, water, and a polymerization initiator which do not contain an ion exchange group to form a water-drop type emulsion, and the first monolith anion exchanger ester I step Since the mixing method is the same, the description thereof is omitted.
第2單塊體陰離子交換體之製造方法中,I步驟中所獲得之單塊體中間體為具有交聯構造之有機聚合物材料,較適宜為芳香族乙烯基聚合物。該聚合物材料之交聯密度並無特別限定,較佳為相對於構成聚合物材料之總構成單位而含有0.3~5莫耳%、較佳為0.3~3莫耳%之交聯構造單位。若交聯構造單位未滿0.3莫耳%,則機械強度不足,故欠佳。另一方面,若超過5莫耳%,則單塊體之構造容易偏離共連續構造,故欠佳。尤其於總細孔容積在本發明中小至16~20 ml/g之情況,為形成共連續構造,交聯構造單位較佳為未滿3莫耳%。In the method for producing the second monolith anion exchanger, the monolith intermediate obtained in the first step is an organic polymer material having a crosslinked structure, and is preferably an aromatic vinyl polymer. The crosslinking density of the polymer material is not particularly limited, and is preferably a crosslinking structural unit containing 0.3 to 5 mol%, preferably 0.3 to 3 mol%, based on the total constituent unit of the polymer material. If the crosslinked structural unit is less than 0.3 mol%, the mechanical strength is insufficient, which is not preferable. On the other hand, if it exceeds 5 mol%, the structure of the monolith tends to deviate from the co-continuous structure, which is not preferable. Particularly, in the case where the total pore volume is as small as 16 to 20 ml/g in the present invention, in order to form a co-continuous structure, the crosslinking structural unit is preferably less than 3 mol%.
單塊體中間體之聚合物材料之種類與第1單塊體陰離子交換體之單塊體中間體之聚合物材料之種類相同,故省略其說明。The type of the polymer material of the monolithic intermediate is the same as the type of the polymer material of the monolithic intermediate of the first monolith anion exchanger, and therefore the description thereof will be omitted.
單塊體中間體之總細孔容積為超過16 ml/g且30 ml/g以下,較適宜為超過16 ml/g且25 ml/g以下。即,該單塊體中間體基本上為連續巨觀細孔構造,但由於巨觀細孔與巨觀細孔之重疊部分即開口(間隙孔)非常大,故構成單塊體構造之骨架具有自二維之壁面無限接近於一維之棒狀骨架之構造。若使其共存於聚合系統中,則以單塊體中間體之構造為模型而形成共連續構造之多孔質體。若總細孔容積過小,則使乙烯基單體聚合後所獲得之單塊體之構造由共連續構造變化為連續巨觀細孔構造,故欠佳;另一方面,若總細孔容積過大,則使乙烯基單體聚合後所獲得之單塊體之機械強度下降,單位體積之陰離子交換容量下降,故欠佳。為使單塊體中間體之總細孔容積為第2單塊體陰離子交換體之特定範圍,只要將單體與水之比設為大致1:20~1:40即可。The total pore volume of the monolithic intermediate is more than 16 ml/g and less than 30 ml/g, more preferably more than 16 ml/g and less than 25 ml/g. That is, the monolith intermediate body is basically a continuous giant pore structure, but since the overlap between the macroscopic pores and the giant pores, that is, the opening (gap pore) is very large, the skeleton constituting the monolithic structure has The wall from the two-dimensional wall is infinitely close to the structure of the one-dimensional rod-shaped skeleton. When it coexists in a polymerization system, a porous body of a co-continuous structure is formed by using the structure of a monolith intermediate body as a model. If the total pore volume is too small, the structure of the monolith obtained after the polymerization of the vinyl monomer is changed from a co-continuous structure to a continuous giant pore structure, which is not preferable; on the other hand, if the total pore volume is too large Then, the mechanical strength of the monolith obtained after the polymerization of the vinyl monomer is lowered, and the anion exchange capacity per unit volume is lowered, which is not preferable. In order to make the total pore volume of the monolith intermediate body a specific range of the second monolith anion exchanger, the ratio of the monomer to water may be approximately 1:20 to 1:40.
又,單塊體中間體係巨觀細孔與巨觀細孔之重疊部分即開口(間隙孔)之平均直徑於乾燥狀態為5~100 μm。若開口之平均直徑於乾燥狀態未滿5 μm,則使乙烯基單體聚合後所獲得之單塊體之開口徑變小,流體穿透時之壓力損失變大,故欠佳。另一方面,若超過100 μm,則使乙烯基單體聚合後所獲得之單塊體之開口徑變得過大,被處理水與單塊體陰離子交換體之接觸變得不充分,其結果為過氧化氫分解特性或溶氧去除特性下降,故欠佳。單塊體中間體較適宜為巨觀細孔之大小或開口之徑一致之均勻構造,但並不限定於此,亦可為均勻構造中點狀存在有較均勻巨觀細孔之大小更大之不均勻巨觀細孔者。Further, the average diameter of the opening (gap hole) in which the macroscopic pores and the giant pores overlap in the monolithic intermediate system is 5 to 100 μm in a dry state. When the average diameter of the opening is less than 5 μm in the dry state, the opening diameter of the monolith obtained after the polymerization of the vinyl monomer becomes small, and the pressure loss at the time of fluid penetration becomes large, which is not preferable. On the other hand, when it exceeds 100 μm, the opening diameter of the monolith obtained after the polymerization of the vinyl monomer becomes too large, and the contact between the water to be treated and the monolith anion exchanger becomes insufficient, and as a result, Hydrogen peroxide decomposition characteristics or dissolved oxygen removal characteristics are degraded, which is not preferable. The monolithic intermediate is preferably a uniform structure in which the size of the macroscopic pores or the diameter of the openings is uniform, but is not limited thereto, and the size of the uniform macropores may be larger in the uniform structure. Uneven macroscopic pores.
第2單塊體陰離子交換體之製造方法中,II步驟為製備包含芳香族乙烯基單體、一分子中具有至少2個以上乙烯基之於所有油溶性單體中為0.3~5莫耳%之交聯劑、芳香族乙烯基單體或交聯劑溶解但芳香族乙烯基單體聚合生成之聚合物不溶解之有機溶劑及聚合起始劑的混合物的步驟。再者,並無I步驟與II步驟之順序,可於I步驟後進行II步驟,亦可於II步驟後進行I步驟。In the method for producing the second monolithic anion exchanger, the second step is to prepare an aromatic vinyl monomer, and at least two or more vinyl groups in one molecule are 0.3 to 5 mol% of all the oil-soluble monomers. The step of dissolving the cross-linking agent, the aromatic vinyl monomer or the cross-linking agent, but dissolving the mixture of the organic solvent and the polymerization initiator which are formed by polymerizing the aromatic vinyl monomer. Furthermore, there is no order of steps I and II, and step II can be performed after step I, or step I can be performed after step II.
第2單塊體陰離子交換體之製造方法中,作為II步驟中所使用之芳香族乙烯基單體,只要為分子中含有可聚合之乙烯基且對有機溶劑之溶解性高之親油性芳香族乙烯基單體,則並無特別限制,較佳為選定生成與共存於上述聚合系統中之單塊體中間體為同種或類似之聚合物材料的乙烯基單體。作為該等乙烯基單體之具體例,可列舉苯乙烯、α-甲基苯乙烯、乙烯基甲苯、乙烯基苄基氯、乙烯基聯苯、乙烯基萘等。該等單體可將一種單獨使用或將兩種以上組合使用。本發明中適宜使用之芳香族乙烯基單體為苯乙烯、乙烯基苄基氯等。In the method for producing the second monolith anion exchanger, the aromatic vinyl monomer used in the second step is a lipophilic aromatic having a polymerizable vinyl group in the molecule and having high solubility in an organic solvent. The vinyl monomer is not particularly limited, and it is preferred to select a vinyl monomer which is a polymer material of the same or similar type as the monolith intermediate which is present in the above polymerization system. Specific examples of the vinyl monomer include styrene, α-methylstyrene, vinyltoluene, vinylbenzyl chloride, vinylbiphenyl, and vinylnaphthalene. These monomers may be used alone or in combination of two or more. The aromatic vinyl monomer suitably used in the present invention is styrene, vinylbenzyl chloride or the like.
關於該等芳香族乙烯基單體之添加量,相對於聚合時共存之單塊體中間體以重量計為5~50倍,較佳為5~40倍。若芳香族乙烯基單體添加量相對於單塊體中間體為未滿5倍,則無法使棒狀骨架變粗,陰離子交換基導入後之單位體積之陰離子交換容量變小,故欠佳。另一方面,若芳香族乙烯基單體添加量超過50倍,則連續空孔之徑變小,通水時之壓力損失變大,故欠佳。The amount of the aromatic vinyl monomer to be added is 5 to 50 times, preferably 5 to 40 times by weight based on the weight of the monolithic intermediate which is present during the polymerization. When the amount of the aromatic vinyl monomer added is less than 5 times the amount of the monolithic intermediate, the rod-shaped skeleton cannot be made thick, and the anion exchange capacity per unit volume after the introduction of the anion exchange group becomes small, which is not preferable. On the other hand, when the amount of the aromatic vinyl monomer added exceeds 50 times, the diameter of the continuous pores becomes small, and the pressure loss at the time of water passage becomes large, which is not preferable.
II步驟中所使用之交聯劑適宜使用分子中含有至少2個可聚合之乙烯基、且對有機溶劑之溶解性高者。作為交聯劑之具體例,可列舉:二乙烯基苯、二乙烯基萘、二乙烯基聯苯、乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、丁二醇二丙烯酸酯等。該等交聯劑可將一種單獨使用或將兩種以上組合使用。就機械強度之高度及對水解之穩定性而言,較佳之交聯劑為二乙烯基苯、二乙烯基萘、二乙烯基聯苯等芳香族多乙烯基化合物。關於交聯劑使用量,相對於乙烯基單體與交聯劑之合計量(所有油溶性單體)為0.3~5莫耳%,尤其為0.3~3莫耳%。若交聯劑使用量未滿0.3莫耳%,則單塊體之機械強度不足,故欠佳;另一方面,若過多,則有陰離子交換基之定量導入變得困難之情況,故欠佳。再者,上述交聯劑使用量較佳為以與乙烯基單體/交聯劑聚合時共存之單塊體中間體之交聯密度大致相等之方式使用。若兩者之使用量懸殊,則所生成之單塊體中產生交聯密度分布之偏差,陰離子交換基導入反應時容易產生裂痕。The crosslinking agent used in the second step is preferably one which contains at least two polymerizable vinyl groups in the molecule and has high solubility in an organic solvent. Specific examples of the crosslinking agent include divinylbenzene, divinylnaphthalene, divinylbiphenyl, ethylene glycol diacrylate, trimethylolpropane triacrylate, butanediol diacrylate, and the like. . These crosslinking agents may be used alone or in combination of two or more. The preferred crosslinking agent is an aromatic polyvinyl compound such as divinylbenzene, divinylnaphthalene or divinylbiphenyl in terms of the height of the mechanical strength and the stability to hydrolysis. The amount of the crosslinking agent used is 0.3 to 5 mol%, particularly 0.3 to 3 mol%, based on the total amount of the vinyl monomer and the crosslinking agent (all oil-soluble monomers). When the amount of the crosslinking agent used is less than 0.3 mol%, the mechanical strength of the monolith is insufficient, which is not preferable. On the other hand, if the amount is too large, the quantitative introduction of the anion exchange group becomes difficult, so that it is not preferable. . Further, the amount of the crosslinking agent used is preferably such that the crosslinking density of the monolithic intermediate which coexists with the polymerization of the vinyl monomer/crosslinking agent is substantially equal. If the amount of use of the two is extremely large, a variation in the crosslink density distribution occurs in the resulting monolith, and cracks are likely to occur when the anion exchange group is introduced into the reaction.
II步驟中所使用之有機溶劑為芳香族乙烯基單體或交聯劑溶解但芳香族乙烯基單體聚合生成之聚合物不溶解之有機溶劑,換言之,為對芳香族乙烯基單體聚合生成之聚合物的不良溶劑。該有機溶劑係視芳香族乙烯基單體之種類而大不相同,因此難以列舉一般之具體例,例如於芳香族乙烯基單體為苯乙烯之情況,作為有機溶劑,可列舉:甲醇、乙醇、丙醇、丁醇、己醇、環己醇、辛醇、2-乙基己醇、癸醇、十二烷醇、丙二醇、四亞甲基二醇等醇類;二乙醚、丁基賽路蘇、聚乙二醇、聚丙二醇、聚四亞甲基二醇等鏈狀(聚)醚類;己烷、庚烷、辛烷、異辛烷、癸烷、十二烷等鏈狀飽和烴類;乙酸乙酯、乙酸異丙酯、乙酸賽路蘇、丙酸乙酯等酯類。又,即便如二烷或THF、甲苯般為聚苯乙烯之良溶劑,於與上述不良溶劑一起使用且其使用量少之情況,亦可用作有機溶劑。關於該等有機溶劑之使用量,較佳為以上述芳香族乙烯基單體之濃度達到30~80重量%之方式使用。若有機溶劑使用量偏離上述範圍而芳香族乙烯基單體濃度未滿30重量%,則聚合速度下降,聚合後之單塊體構造偏離本發明之範圍,故欠佳。另一方面,若芳香族乙烯基單體濃度超過80重量%,則有聚合失控之虞,故欠佳。The organic solvent used in the step II is an organic solvent in which an aromatic vinyl monomer or a crosslinking agent is dissolved but a polymer obtained by polymerizing an aromatic vinyl monomer is insoluble, in other words, a polymerization of an aromatic vinyl monomer A poor solvent for the polymer. Since the organic solvent differs greatly depending on the type of the aromatic vinyl monomer, it is difficult to cite a general example. For example, when the aromatic vinyl monomer is styrene, examples of the organic solvent include methanol and ethanol. , alcohols such as propanol, butanol, hexanol, cyclohexanol, octanol, 2-ethylhexanol, decyl alcohol, dodecanol, propylene glycol, tetramethylene glycol; diethyl ether, butyl Chain-like (poly)ethers such as Lucu, polyethylene glycol, polypropylene glycol, and polytetramethylene glycol; chain saturation such as hexane, heptane, octane, isooctane, decane, and dodecane Hydrocarbons; esters of ethyl acetate, isopropyl acetate, celecoxib acetate, ethyl propionate, and the like. Again, even as two Alkane, THF or toluene is a good solvent for polystyrene. It can also be used as an organic solvent when it is used together with the above-mentioned poor solvent and its use amount is small. The amount of the organic solvent to be used is preferably such that the concentration of the aromatic vinyl monomer is 30 to 80% by weight. When the amount of the organic solvent used is out of the above range and the aromatic vinyl monomer concentration is less than 30% by weight, the polymerization rate is lowered, and the monolith structure after polymerization deviates from the range of the present invention, which is not preferable. On the other hand, when the aromatic vinyl monomer concentration exceeds 80% by weight, the polymerization is uncontrolled, which is not preferable.
聚合起始劑係與第1單塊體陰離子交換體之II步驟中所使用之聚合起始劑相同,故省略其說明。The polymerization initiator is the same as the polymerization initiator used in the second step of the first monolith anion exchanger, and the description thereof will be omitted.
第2單塊體陰離子交換體之製造方法中,III步驟係將II步驟中所獲得之混合物於靜置下、且於該I步驟中所獲得之單塊體中間體之存在下進行聚合,使該單塊體中間體之連續巨觀細孔構造變化為共連續構造而獲得共連續構造之單塊體的步驟。III步驟中所使用之單塊體中間體不僅創造出本發明之具有嶄新構造之單塊體,而且承擔極重要之作用。若如日本專利特表平7-501140號等所揭示般,於單塊體中間體不存在下使乙烯基單體與交聯劑於特定有機溶劑中靜置聚合,則獲得粒子凝集型單塊體狀有機多孔質體。相對於此,若如本發明之第2單塊體般,使上述聚合系統中存在特定連續巨觀細孔構造之單塊體中間體,則聚合後之單塊體之構造急遽變化,粒子凝集構造消失,獲得上述共連續構造之單塊體。其原因並未查明,一般認為,於單塊體中間體不存在之情況,藉由聚合而產生之交聯聚合物以粒子狀析出‧沈澱,由此形成粒子凝集構造,相對於此,若於聚合系統中存在總細孔溶劑大之多孔質體(中間體),則乙烯基單體係自液相中吸附或分配至多孔質體之骨架部,於多孔質體中進行聚合,構成單塊體構造之骨架自二維之壁面變化為一維之棒狀骨架而形成具有共連續構造之單塊體狀有機多孔質體。In the method for producing the second monolith anion exchanger, the step III is carried out by subjecting the mixture obtained in the step II to stand-up and allowing the polymerization in the presence of the monolith intermediate obtained in the first step. The step of changing the continuous macroscopic pore structure of the monolithic intermediate to a co-continuous structure to obtain a monocontinuum of a co-continuous structure. The monolithic intermediate used in the third step not only creates a monolith having a novel structure of the present invention, but also plays a very important role. If the vinyl monomer and the crosslinking agent are allowed to stand in a specific organic solvent in the absence of the monolithic intermediate, as disclosed in Japanese Patent Laid-Open No. Hei 7-501140, a particle agglomerated monolith is obtained. Bulk organic porous body. On the other hand, when the monolithic intermediate having a specific continuous macroscopic pore structure is present in the polymerization system as in the second monolith of the present invention, the structure of the monolith after polymerization is rapidly changed, and the particles are agglomerated. The structure disappears, and the monolithic body of the above-described co-continuous structure is obtained. The reason for this is not ascertained, and it is considered that, in the case where the monolith intermediate is not present, the crosslinked polymer produced by the polymerization is precipitated in the form of particles, thereby forming a particle agglomerated structure. When a porous body (intermediate) having a large total pore solvent is present in the polymerization system, the vinyl single system is adsorbed or distributed from the liquid phase to the skeleton portion of the porous body, and polymerization is carried out in the porous body to form a single sheet. The skeleton of the block structure changes from a two-dimensional wall surface to a one-dimensional rod-shaped skeleton to form a monolithic organic porous body having a co-continuous structure.
反應容器之內容積係與第1單塊體陰離子交換體之反應容器之內容積之說明相同,故省略其說明。The internal volume of the reaction vessel is the same as the internal volume of the reaction vessel of the first monolith anion exchanger, and the description thereof will be omitted.
於III步驟中,反應容器中,單塊體中間體以經混合物(溶液)含浸之狀態放置。II步驟中所獲得之混合物與單塊體中間體之調配比如上所述,較適宜為以相對於單塊體中間體而芳香族乙烯基單體之添加量以重量計達到5~50倍、較佳為5~40倍之方式調配。藉此,可獲得適度大小之空孔三維性連續、且粗骨架三維性連續之共連續構造之單塊體。反應容器中,混合物中之芳香族乙烯基單體與交聯劑係吸附、分配至靜置之單塊體中間體之骨架,於單塊體中間體之骨架內進行聚合。In the step III, in the reaction vessel, the monolith intermediate is placed in a state of being impregnated with the mixture (solution). The blending of the mixture obtained in the step II with the monolithic intermediate is, as described above, preferably 5 to 50 times by weight based on the amount of the aromatic vinyl monomer added to the monolith intermediate. It is preferably 5 to 40 times. Thereby, a monolithic body having a three-dimensional continuous shape of a moderately sized pore and a three-dimensional continuous continuous skeleton structure can be obtained. In the reaction vessel, the aromatic vinyl monomer and the crosslinking agent in the mixture are adsorbed and distributed to the skeleton of the standing monolith intermediate, and polymerization is carried out in the skeleton of the monolith intermediate.
具有共連續構造之單塊體之基本構造為配置有平均粗度於乾燥狀態為0.8~40 μm之三維性連續之骨架、及於該骨架間平均直徑於乾燥狀態為8~80 μm之三維性連續之空孔的構造。上述三維性連續之空孔之乾燥狀態之平均直徑可利用汞滲法測定細孔分布曲線,作為細孔分布曲線之極大值而獲得。乾燥狀態之單塊體之骨架之粗度只要進行至少3次SEM觀察並測定所獲得之圖像中之骨架之平均粗度而算出即可。又,具有共連續構造之單塊體具有0.5~5 ml/g之總細孔容積。The basic structure of the monolith having a co-continuous structure is a three-dimensional continuous skeleton having an average thickness of 0.8 to 40 μm in a dry state, and a three-dimensionality in which the average diameter between the skeletons is 8 to 80 μm in a dry state. The construction of continuous holes. The average diameter of the dry state of the three-dimensional continuous pores can be determined by a mercury permeation method to determine a pore distribution curve as a maximum value of the pore distribution curve. The thickness of the skeleton of the monolith in the dry state may be calculated by performing at least three SEM observations and measuring the average thickness of the skeleton in the obtained image. Further, the monolith having a co-continuous structure has a total pore volume of 0.5 to 5 ml/g.
聚合條件與第1單塊體陰離子交換體之III步驟之聚合條件之說明相同,故省略其說明。The polymerization conditions are the same as those of the polymerization conditions of the first step of the first monolith anion exchanger, and the description thereof will be omitted.
IV步驟中,於具有共連續構造之單塊體中導入陰離子交換基之方法與第1單塊體陰離子交換體中的於單塊體中導入陰離子交換基之方法相同,故省略其說明。In the IV step, the method of introducing the anion exchange group into the monolith having the co-continuous structure is the same as the method of introducing the anion exchange group into the monolith in the first monolith anion exchanger, and the description thereof will be omitted.
第2單塊體陰離子交換體係於共連續構造之單塊體中導入陰離子交換基,故大幅膨潤至例如單塊體之1.4~1.9倍。又,即便空孔徑膨潤而變大,總細孔容積亦不變化。因此,第2單塊體陰離子交換體儘管三維性連續之空孔之大小非常大,亦由於具有粗骨架而機械強度高。又,由於骨架粗,故可擴大水濕潤狀態之單位體積之陰離子交換容量,進而,可將被處理水以低壓、大流量而長期通水。Since the second monolith anion exchange system introduces an anion exchange group into a monolith of a co-continuous structure, it is greatly swollen to, for example, 1.4 to 1.9 times the monolith. Further, even if the pore diameter is swollen and becomes large, the total pore volume does not change. Therefore, the second monolith anion exchanger has a high mechanical strength although it has a very large size due to the three-dimensional continuous pores. Further, since the skeleton is thick, the anion exchange capacity per unit volume in the water-wet state can be increased, and further, the water to be treated can be passed through the water at a low pressure and a large flow rate for a long period of time.
<第1鉑族金屬載持觸媒及第2鉑族金屬載持觸媒><The first platinum group metal supported catalyst and the second platinum group metal supported catalyst>
本發明之第1鉑族金屬載持觸媒係於第1單塊體陰離子交換體中載持有鉑族金屬之奈米粒子的鉑族金屬載持觸媒。又,本發明之第2鉑族金屬載持觸媒係於第2單塊體陰離子交換體上載持有鉑族金屬之奈米粒子的鉑族金屬載持觸媒。The first platinum group metal-supporting catalyst of the present invention is a platinum group metal-supporting catalyst carrying a platinum group metal-containing nanoparticle in the first monolith anion exchanger. Further, the second platinum group metal-supporting catalyst of the present invention is a platinum group metal-supporting catalyst in which a platinum group metal nanoparticle is carried on a second monolith anion exchanger.
本發明之所謂鉑族金屬,係指釕、銠、鈀、鋨、銥、鉑。該等鉑族金屬可將一種單獨使用,亦可將兩種以上之金屬組合使用,進而,亦可將兩種以上之金屬製成合金而使用。該等之中,鉑、鈀、鉑/鈀合金係觸媒活性高而適宜使用。The platinum group metal of the present invention means ruthenium, rhodium, palladium, iridium, osmium or platinum. These platinum group metals may be used singly or in combination of two or more kinds of metals. Further, two or more kinds of metals may be used as an alloy. Among these, platinum, palladium, and platinum/palladium alloys have high catalytic activity and are suitably used.
本發明之鉑族金屬之奈米粒子之平均粒徑為1~100 nm,較佳為1~50 nm,更佳為1~20 nm。若平均粒徑未滿1 nm,則奈米粒子自載體脫離之可能性變高,故欠佳;另一方面,若平均粒徑超過100 nm,則金屬之每單位質量之表面積變少,無法有效率地獲得觸媒效果,故欠佳。再者,於奈米粒子之平均粒徑在上述範圍內之情況,藉由表面電漿共振而奈米粒子濃厚地著色,故以目視亦可確認The platinum group metal nanoparticles of the present invention have an average particle diameter of from 1 to 100 nm, preferably from 1 to 50 nm, more preferably from 1 to 20 nm. When the average particle diameter is less than 1 nm, the possibility that the nanoparticles are detached from the carrier becomes high, which is not preferable. On the other hand, if the average particle diameter exceeds 100 nm, the surface area per unit mass of the metal is small, and it is impossible to It is not good to get the catalyst effect efficiently. Further, in the case where the average particle diameter of the nanoparticles is within the above range, the surface particles are strongly colored by the surface plasma resonance, so that it can be visually confirmed.
乾燥狀態之第1鉑族金屬載持觸媒中之鉑族金屬奈米粒子之載持量((鉑族金屬奈米粒子/乾燥狀態之第1鉑族金屬載持觸媒)×100)為0.004~20重量%,較佳為0.005~15重量%。又,乾燥狀態之第2鉑族金屬載持觸媒中之鉑族金屬奈米粒子之載持量((鉑族金屬奈米粒子/乾燥狀態之第2鉑族金屬載持觸媒)×100)為0.004~20重量%,較佳為0.005~15重量%。若鉑族金屬奈米粒子之載持量未滿0.004重量%,則過氧化氫分解效果或溶氧之去除效果變得不充分,故欠佳。另一方面,若鉑族金屬奈米粒子之載持量超過20重量%,則確認到金屬溶出至水中,故欠佳。The amount of platinum group metal nanoparticles supported in the first platinum group metal supporting catalyst in a dry state ((platinum group metal nanoparticles/first platinum group metal carrier in a dry state) × 100) is 0.004 to 20% by weight, preferably 0.005 to 15% by weight. Further, the amount of platinum group metal nanoparticles supported on the second platinum group metal supporting catalyst in a dry state ((platinum group metal nanoparticles/second platinum group metal carrier in a dry state) × 100 ) is 0.004 to 20% by weight, preferably 0.005 to 15% by weight. When the amount of the platinum group metal nanoparticles is less than 0.004% by weight, the hydrogen peroxide decomposition effect or the dissolved oxygen removal effect is insufficient, which is not preferable. On the other hand, when the amount of the platinum group metal nanoparticles is more than 20% by weight, it is confirmed that the metal is eluted into the water, which is not preferable.
對第1鉑族金屬載持觸媒及第2鉑族金屬載持觸媒之製造方法並無特別限制,可藉由利用公知方法使第1單塊體陰離子交換體或第2單塊體陰離子交換體載持鉑族金屬之奈米粒子,而獲得第1鉑族金屬載持觸媒或第2鉑族金屬載持觸媒。例如可列舉以下方法:將乾燥狀態之第1單塊體陰離子交換體或第2單塊體陰離子交換體浸漬於氯化鈀之鹽酸水溶液中,藉由離子交換使氯化鈀酸根陰離子吸附於單塊體陰離子交換體上,繼而與還原劑接觸而將鈀金屬奈米粒子載持於第1單塊體陰離子交換體或第2單塊體陰離子交換體上的方法;或者將第1單塊體陰離子交換體或第2單塊體陰離子交換體填充於管柱中,通入氯化鈀之鹽酸水溶液,藉由離子交換使氯化鈀酸根陰離子吸附於第1單塊體陰離子交換體或第2單塊體陰離子交換體上,繼而通入還原劑而將鈀金屬奈米粒子載持於第1單塊體陰離子交換體或第2單塊體陰離子交換體上的方法等。對所使用之還原劑亦無特別限制,可列舉:甲醇、乙醇、異丙醇等醇;或甲酸、乙二酸、檸檬酸、抗壞血酸等羧酸;丙酮、甲基乙基酮等酮;甲醛或乙醛等醛;硼氫化鈉;肼等。The method for producing the first platinum group metal-supporting catalyst and the second platinum group metal-carrying catalyst is not particularly limited, and the first mono-block anion exchanger or the second mono-block anion can be obtained by a known method. The exchange body carries the platinum group metal nanoparticles to obtain the first platinum group metal carrier catalyst or the second platinum group metal carrier catalyst. For example, the first monolith anion exchanger or the second monolith anion exchanger in a dry state may be immersed in an aqueous hydrochloric acid solution of palladium chloride, and the palladium chloride anion may be adsorbed to the single by ion exchange. a method of supporting a palladium metal nanoparticle on a first monolith anion exchanger or a second monolith anion exchanger in contact with a reducing agent in contact with a reducing agent; or a first monolith The anion exchanger or the second monolith anion exchanger is filled in a column, and a hydrochloric acid aqueous solution of palladium chloride is introduced, and the palladium chloride anion is adsorbed to the first monolith anion exchanger or the second by ion exchange. A method of carrying a palladium metal nanoparticle on a monolithic anion exchanger or a second monolith anion exchanger, followed by a reducing agent in a monolithic anion exchanger. The reducing agent to be used is not particularly limited, and examples thereof include alcohols such as methanol, ethanol, and isopropanol; or carboxylic acids such as formic acid, oxalic acid, citric acid, and ascorbic acid; ketones such as acetone and methyl ethyl ketone; and formaldehyde. Or an aldehyde such as acetaldehyde; sodium borohydride;
第1鉑族金屬載持觸媒中,作為鉑族金屬奈米粒子之載體的第1單塊體陰離子交換體之離子形於載持鉑族金屬奈米粒子後,通常成為如氯化物形之鹽形。本發明中,可將此種鹽形者用作過氧化氫分解用或溶氧去除用之觸媒。又,第1鉑族金屬載持觸媒並不限定於此,亦可為將第1單塊體陰離子交換體之離子形再生為OH形者。並且,該等之中,第1單塊體陰離子交換體之離子形為OH形可獲得較高之觸媒效果,故較佳。又,同樣地,第2鉑族金屬載持觸媒中,作為鉑族金屬奈米粒子之載體的第2單塊體陰離子交換體之離子形於載持鉑族金屬奈米粒子後,通常成為如氯化物形之鹽形。本發明中,可將此種鹽形者用作過氧化氫分解用或溶氧去除用之觸媒。又,第2鉑族金屬載持觸媒並不限定於此,亦可為將第2單塊體陰離子交換體之離子形再生為OH形者。並且,該等之中,第2單塊體陰離子交換體之離子形為OH形可獲得較高之觸媒效果,故較佳。對載持鉑族金屬奈米粒子後之單塊體陰離子交換體之再生為OH形之方法並無特別限制,使用通入氫氧化鈉水溶液等之公知方法即可。In the first platinum group metal-supporting catalyst, the ionic shape of the first monolith anion exchanger as a carrier of the platinum group metal nanoparticles is usually in the form of a chloride after supporting the platinum group metal nanoparticles. Salt shape. In the present invention, such a salt form can be used as a catalyst for decomposing hydrogen peroxide or removing dissolved oxygen. Further, the first platinum group metal-supporting catalyst is not limited thereto, and the ion shape of the first monolith anion exchanger may be regenerated into an OH shape. Further, among these, the ionic shape of the first monolithic anion exchanger is preferably OH-shaped, so that a high catalytic effect can be obtained. In the same manner, in the second platinum group metal-supporting catalyst, the ionic shape of the second monolith anion exchanger as a carrier of the platinum group metal nanoparticles is usually after the platinum group metal nanoparticles are supported. Such as the shape of a salt of chloride. In the present invention, such a salt form can be used as a catalyst for decomposing hydrogen peroxide or removing dissolved oxygen. Further, the second platinum group metal-supporting catalyst is not limited thereto, and the ion shape of the second monolith anion exchanger may be regenerated into an OH shape. Further, among these, the ionic shape of the second monolith anion exchanger is preferably an OH form, and a higher catalyst effect is obtained. The method of regenerating the monolith anion exchanger after carrying the platinum group metal nanoparticles to have an OH shape is not particularly limited, and a known method such as passing an aqueous sodium hydroxide solution or the like may be used.
<本發明之分解過氧化氫之處理水之製造方法><Method for Producing Process Water for Decomposing Hydrogen Peroxide of the Present Invention>
本發明之分解過氧化氫之處理水之製造方法係使含有過氧化氫之被處理水接觸第1鉑族金屬載持觸媒或第2鉑族金屬載持觸媒,將含有過氧化氫之被處理水中之過氧化氫分解去除的分解過氧化氫之處理水之製造方法。再者,以下亦將第1鉑族金屬載持觸媒及第2鉑族金屬載持觸媒總稱而共同記載為本發明之鉑族金屬載持觸媒。In the method for producing treated water for decomposing hydrogen peroxide according to the present invention, the water to be treated containing hydrogen peroxide is contacted with the first platinum group metal supporting catalyst or the second platinum group metal supporting catalyst, and the hydrogen peroxide is contained. A method for producing treated water decomposing hydrogen peroxide which is decomposed by hydrogen peroxide in the treated water. In the following, the first platinum group metal-supporting catalyst and the second platinum group metal-supporting catalyst are collectively referred to as the platinum group metal-supporting catalyst of the present invention.
含有過氧化氫之被處理水只要為含有過氧化氫者則無特別限制,例如可列舉於半導體製造等電子零件之製造以及用以洗淨電子零件之製造器具的超純水之製造中,由其中之各種步驟產生之水,具體而言,可列舉進行用以分解水中之有機物的紫外線氧化處理步驟後之水。又,作為含有過氧化氫之被處理水,除上述以外可列舉於用廢水系統中添加過氧化氫進行氧化、還原、殺菌、洗淨之處理液或處理水或者使用該等處理液或處理水進行處理後之廢液或排水。例如可列舉:為將自半導體製造步驟中排出之含有過氧化氫之洗淨排水、自半導體製造步驟中排出之含有機物之洗淨排水作為超純水而回收再利用,於過氧化氫之存在下照射紫外線,將有機物氧化分解而獲得之處理水;使用費頓試劑(Fenton's reagent)將有機物分解而獲得之處理水;將以過氧化氫對逆滲透膜、超濾膜等進行殺菌或洗淨後之排水及含有6價鉻之排水以過氧化氫進行還原處理而獲得之處理水等。The water to be treated containing hydrogen peroxide is not particularly limited as long as it contains hydrogen peroxide. For example, it can be exemplified in the manufacture of electronic components such as semiconductor manufacturing and the production of ultrapure water for cleaning electronic parts. The water produced by the various steps therein, specifically, the water after the ultraviolet oxidation treatment step for decomposing the organic matter in the water. In addition, the water to be treated containing hydrogen peroxide may be, for example, a treatment liquid or treated water obtained by adding hydrogen peroxide to a wastewater system to be oxidized, reduced, sterilized, or washed, or using the treatment liquid or treated water. Waste liquid or drainage after treatment. For example, in order to recover and reuse the cleaned water containing hydrogen peroxide discharged from the semiconductor manufacturing step and the organic waste water discharged from the semiconductor manufacturing step as ultrapure water, the hydrogen peroxide is present. a treatment water obtained by oxidizing and decomposing an organic substance by oxidative decomposition; a treatment water obtained by decomposing an organic substance using Fenton's reagent; and sterilizing or washing a reverse osmosis membrane, an ultrafiltration membrane, etc. with hydrogen peroxide The latter drainage water and treated water containing hexavalent chromium are treated by reduction treatment with hydrogen peroxide.
含有過氧化氫之被處理水中之過氧化氫濃度並無特別限制,通常為0.01~100 mg/L。於超純水製造之子系統中,通常過氧化氫濃度為10~50 μg/L。若過氧化氫濃度超過100 mg/L,則作為母體之單塊體陰離子交換體之劣化容易進行。The concentration of hydrogen peroxide in the treated water containing hydrogen peroxide is not particularly limited and is usually from 0.01 to 100 mg/L. In the subsystem manufactured by ultrapure water, the hydrogen peroxide concentration is usually 10 to 50 μg/L. When the hydrogen peroxide concentration exceeds 100 mg/L, the deterioration of the monolith anion exchanger as a precursor easily proceeds.
作為使含有過氧化氫之被處理水接觸本發明之鉑族金屬載持觸媒之方法,並無特別限制,例如可列舉如下方法等:於觸媒填充塔中填充本發明之鉑族金屬載持觸媒,且向觸媒填充塔供給含有過氧化氫之被處理液,藉此向本發明之鉑族金屬載持觸媒通入含有過氧化氫之被處理水。The method for bringing the water to be treated containing hydrogen peroxide into contact with the platinum group metal-supporting catalyst of the present invention is not particularly limited, and examples thereof include a method of filling a platinum group metal of the present invention in a catalyst packed column. The treated liquid containing hydrogen peroxide is supplied to the catalyst packed column, and the treated water containing hydrogen peroxide is supplied to the platinum group metal supporting catalyst of the present invention.
於上述方法之情況,可向本發明之鉑族金屬載持觸媒以SV=2000~20000 h-1 、較佳為SV=5000~10000 h-1 通入含有過氧化氫之被處理水。若使用本發明之鉑族金屬載持觸媒,則即便以SV超過2000 h-1 般之較大SV通入被處理水,亦可進行過氧化氫之分解去除。進而,即便SV為10000 h-1 ,若本發明之鉑族金屬載持觸媒,則亦可進行過氧化氫之分解,本發明之鉑族金屬載持觸媒表現出大幅超越於粒子狀陰離子交換樹脂上載持有鉑族金屬奈米粒子之習知載持觸媒之處理極限的卓越性能。含有過氧化氫之被處理水對本發明之鉑族金屬載持觸媒的通水速度並無特別限制,較佳為SV=2000~20000 h-1 ,尤佳為SV=5000~10000h-1 。再者,本發明之鉑族金屬載持觸媒由於過氧化氫分解能力顯著高,故不必將通水速度設為未滿SV=2000 h-1 之區域,但亦可將通水速度設為未滿SV=2000 h-1 之區域,即便於將通水速度設為未滿SV=2000 h-1 之區域的情況,本發明之鉑族金屬載持觸媒亦發揮優異之過氧化氫分解能力。另一方面,若SV超過20000 h-1 ,則存在通水差壓變得過大之傾向。In the case of the above method, the platinum group metal-supporting catalyst of the present invention can be supplied with treated water containing hydrogen peroxide at SV = 2000 to 20000 h -1 , preferably SV = 5000 to 10000 h -1 . When the platinum group metal-supporting catalyst of the present invention is used, even if a large SV having a SV of more than 2000 h -1 is introduced into the water to be treated, decomposition and removal of hydrogen peroxide can be performed. Further, even if the SV is 10000 h -1 , if the platinum group metal of the present invention carries a catalyst, decomposition of hydrogen peroxide can be performed, and the platinum group metal-supporting catalyst of the present invention exhibits a significant overshoot of the particulate anion. The exchange resin carries excellent performance in the processing limits of conventional catalysts holding platinum group metal nanoparticles. The water to be treated containing hydrogen peroxide is not particularly limited to the flow rate of the platinum group metal-carrying catalyst of the present invention, and is preferably SV = 2,000 to 20,000 h -1 , and more preferably SV = 5,000 to 10,000 h -1 . Furthermore, since the platinum group metal-supporting catalyst of the present invention has a significantly high decomposition ability due to hydrogen peroxide, it is not necessary to set the water passing speed to an area less than SV=2000 h -1 , but the water passing speed can also be set to area under SV = 2000 h -1, so that even in the case of water-passing speed was set to SV = h -1 under the area 2000, carrying a platinum group metal catalyst of the present invention also exhibits excellent decomposition of hydrogen peroxide ability. On the other hand, when the SV exceeds 20,000 h -1 , the water-passing differential pressure tends to be excessive.
進而,本發明之鉑族金屬載持觸媒由於過氧化氫分解能力顯著高,故即便使觸媒之填充層高變薄亦可進行過氧化氫之分解去除。Further, since the platinum group metal-supporting catalyst of the present invention has a remarkably high decomposing ability of hydrogen peroxide, decomposition and removal of hydrogen peroxide can be performed even if the filling layer of the catalyst is made thinner.
進行本發明之分解過氧化氫之處理水之製造方法而獲得之處理水中之過氧化氫濃度較佳為1 μg/L以下。The concentration of hydrogen peroxide in the treated water obtained by the method for producing the treated water for decomposing hydrogen peroxide of the present invention is preferably 1 μg/L or less.
本發明之電子零件之洗淨方法(I)係利用進行本發明之分解過氧化氫之處理水之製造方法而獲得之處理水,洗淨電子零件或電子零件之製造器具的電子零件之洗淨方法。The method (I) for cleaning an electronic component according to the present invention is a process for washing an electronic component of a manufacturing tool for cleaning an electronic component or an electronic component by using the process water obtained by the method for producing the treated water of decomposing hydrogen peroxide of the present invention. method.
參照圖13及圖14,對本發明之電子零件之洗淨方法(I)之形態例進行說明。圖13係本發明之電子零件之洗淨方法(I)之第一形態例的示意性流程圖,圖14係本發明之電子零件之洗淨方法(I)之第二形態例的示意性流程圖。An example of the method of cleaning the electronic component (I) of the present invention will be described with reference to Figs. 13 and 14 . Figure 13 is a schematic flow chart showing a first embodiment of the cleaning method (I) of the electronic component of the present invention, and Figure 14 is a schematic flow chart showing a second embodiment of the cleaning method (I) of the electronic component of the present invention. Figure.
如圖13所示,本發明之電子零件之洗淨方法(I)之第一形態例包括:第1步驟21,用以使被洗淨物接觸含有臭氧之水(以下亦記載為含臭氧之水),洗淨被洗淨物;第2步驟22,使被洗淨物接觸含有氫之水(以下亦記載為含氫之水),一面施以500 kHz以上之振動一面洗淨被洗淨物;第3步驟23,用以使被洗淨物接觸含有氫氟酸及過氧化氫之水,洗淨被洗淨物;及第4步驟24,使被洗淨物接觸含氫之水,一面施以500 kHz以上之振動一面洗淨被洗淨物。As shown in Fig. 13, a first embodiment of the method (I) for cleaning an electronic component according to the present invention includes a first step 21 for bringing the object to be washed into contact with ozone-containing water (hereinafter also referred to as ozone-containing). Water), washing the washed matter; in the second step 22, the washed object is brought into contact with water containing hydrogen (hereinafter also referred to as hydrogen-containing water), and washed and washed while being vibrated at 500 kHz or more. The third step 23 is for bringing the washed object into contact with water containing hydrofluoric acid and hydrogen peroxide to wash the washed matter; and in the fourth step 24, contacting the washed object with water containing hydrogen, The object to be washed is washed while applying vibration of 500 kHz or more.
供給至第1步驟21之洗淨水係使臭氧溶解於超純水32中而製備之含臭氧之水。並且,超純水由於在其製造步驟中經紫外線氧化處理等,故含有過氧化氫。因此,本發明之電子零件之洗淨方法(I)之第一形態例中,於使臭氧33溶解於超純水32中之前,進行將超純水32作為被處理水而進行本發明之分解過氧化氫之處理水之製造方法的過氧化氫去除步驟25,使臭氧33溶解於所獲得之處理水中,作為第1步驟21之洗淨水而供給。The washing water supplied to the first step 21 is ozone-containing water prepared by dissolving ozone in the ultrapure water 32. Further, the ultrapure water contains hydrogen peroxide because it is subjected to ultraviolet oxidation treatment or the like in the production step. Therefore, in the first aspect of the method for cleaning the electronic component (I) of the present invention, the ultrapure water 32 is treated as the water to be treated, and the decomposition of the present invention is performed before the ozone 33 is dissolved in the ultrapure water 32. In the hydrogen peroxide removal step 25 of the method for producing treated water of hydrogen peroxide, the ozone 33 is dissolved in the obtained treated water and supplied as the washing water in the first step 21.
又,供給至第2步驟22之洗淨水係使氫溶解於超純水32中而製備之含氫之水。因此,本發明之電子零件之洗淨方法(I)之第一形態例中,於使氫34溶解於超純水32中之前,進行將超純水32作為被處理水而進行本發明之分解過氧化氫之處理水之製造方法的過氧化氫去除步驟26,使氫34溶解於所獲得之處理水中,作為第2步驟22之洗淨水而供給。本發明之電子零件之洗淨方法(I)之第一形態例中,第4步驟24亦同樣,於使氫36溶解於超純水32中之前,進行將超純水作為被處理水而進行本發明之分解過氧化氫之處理水之製造方法的過氧化氫去除步驟28,使氫36溶解於所獲得之處理水中,作為第4步驟24之洗淨水而供給。再者,使氫34或36溶解之時期可為過氧化氫去除步驟26或28之前段。Further, the washing water supplied to the second step 22 is a hydrogen-containing water prepared by dissolving hydrogen in the ultrapure water 32. Therefore, in the first embodiment of the method (I) for cleaning an electronic component according to the present invention, the ultrapure water 32 is treated as the water to be treated, and the decomposition of the present invention is performed before the hydrogen 34 is dissolved in the ultrapure water 32. In the hydrogen peroxide removal step 26 of the method for producing treated water of hydrogen peroxide, the hydrogen 34 is dissolved in the obtained treated water and supplied as the washing water in the second step 22. In the first aspect of the method for cleaning the electronic component (I) of the present invention, in the fourth step 24, the ultrapure water is treated as the water to be treated before the hydrogen 36 is dissolved in the ultrapure water 32. In the hydrogen peroxide removal step 28 of the method for producing hydrogen peroxide-treated water of the present invention, hydrogen 36 is dissolved in the obtained treated water and supplied as the washing water in the fourth step 24. Further, the period in which the hydrogen 34 or 36 is dissolved may be the previous stage of the hydrogen peroxide removal step 26 or 28.
又,本發明之電子零件之洗淨方法(I)之第一形態例中,亦可進行將超純水32作為被處理水而進行本發明之分解過氧化氫之處理水之製造方法的過氧化氫去除步驟27,使氫氟酸及過氧化氫35溶解於所獲得之處理水中,將所獲得之含有氫氟酸及過氧化氫之水作為第3步驟23之洗淨水而供給。Further, in the first aspect of the method for cleaning the electronic component (I) of the present invention, the method for producing the treated water for decomposing hydrogen peroxide according to the present invention may be carried out by using the ultrapure water 32 as the water to be treated. In the hydrogen peroxide removal step 27, hydrofluoric acid and hydrogen peroxide 35 are dissolved in the obtained treated water, and the obtained water containing hydrofluoric acid and hydrogen peroxide is supplied as the washing water in the third step 23.
並且,將洗淨前之電子零件20a作為被洗淨物,依序進行第1步驟21~第4步驟24,獲得洗淨後之電子零件30a。Then, the electronic component 20a before washing is used as the object to be washed, and the first step 21 to the fourth step 24 are sequentially performed to obtain the cleaned electronic component 30a.
如圖14所示,本發明之電子零件之洗淨方法(I)之第二形態例包括:第1步驟41,用以使被洗淨物接觸含有硫酸及過氧化氫之溶液,洗淨被洗淨物;第2步驟42,以超純水沖洗;第3步驟43,用以使被洗淨物接觸含有氫氟酸之水(稀氟酸),洗淨被洗淨物;第4步驟44,以超純水沖洗;第5步驟45,使被洗淨物接觸含有氨及過氧化氫之水,洗淨被洗淨物;第6步驟46,以超純水沖洗;第7步驟47,用以使被洗淨物接觸經加熱之超純水,洗淨被洗淨物;第8步驟48,以超純水沖洗;第9步驟49,用以使被洗淨物接觸含有鹽酸及過氧化氫之水,洗淨被洗淨物;第10步驟50,以超純水沖洗;第11步驟51,用以使被洗淨物接觸含有氫氟酸之水(稀氟酸),洗淨被洗淨物;及第12步驟52,以超純水沖洗。As shown in Fig. 14, a second embodiment of the method (I) for cleaning an electronic component according to the present invention includes a first step 41 for bringing the object to be washed into contact with a solution containing sulfuric acid and hydrogen peroxide, and washing the solution. The second step 42 is to rinse with ultrapure water; the third step is 43 to bring the washed matter into contact with hydrofluoric acid-containing water (dilute hydrofluoric acid) to wash the washed matter; 44, rinse with ultrapure water; in step 5, the washed matter is contacted with water containing ammonia and hydrogen peroxide, and the washed matter is washed; in step 6, 46, rinse with ultrapure water; step 7 For washing the object to be washed with heated ultrapure water, washing the object to be washed; in step 8, step 48, washing with ultrapure water; and step 9 in order to bring the object to be washed into contact with hydrochloric acid and Washing the washed water with water of hydrogen peroxide; step 10, washing with ultrapure water; step 11 of step 51, contacting the washed object with water containing hydrofluoric acid (dilute hydrofluoric acid), washing The net is washed; and in step 12, rinse with ultrapure water.
供給至圖14中之第3、5、9及11步驟之洗淨水63、65、69及71係使各步驟所必需之藥劑溶解於超純水中之水。因此,本發明之電子零件之洗淨方法(I)之第二形態例中,與圖13所示之本發明之電子零件之洗淨方法(I)之第一形態例同樣,於使各步驟所必需之藥劑溶解於超純水中之前,進行將超純水作為被處理水而進行本發明之分解過氧化氫之處理水之製造方法的過氧化氫去除步驟,使各步驟所必需之藥劑溶解於所獲得之處理水中,作為各步驟之洗淨水(洗淨液)而供給。The washing waters 63, 65, 69, and 71 supplied to the third, fifth, ninth, and eleventh steps in Fig. 14 are such that the chemicals necessary for each step are dissolved in water in ultrapure water. Therefore, in the second embodiment of the method (I) for cleaning the electronic component of the present invention, the steps are the same as in the first embodiment of the cleaning method (I) of the electronic component of the present invention shown in FIG. The hydrogen peroxide removal step of the method for producing the treated water for decomposing hydrogen peroxide of the present invention by using ultrapure water as the water to be treated is dissolved in the ultrapure water, and the necessary reagents for each step are prepared. It is dissolved in the obtained treated water, and is supplied as washing water (washing liquid) of each step.
又,供給至圖14中之第2、4、6、7、8、10及12步驟之洗淨水62、64、66、67、68、70及72為超純水。因此,於本發明之電子零件之洗淨方法(I)之第二形態例中,進行將超純水作為被處理水而進行本發明之分解過氧化氫之處理水之製造方法的過氧化氫去除步驟,將所獲得之處理水作為各步驟之洗淨水而供給。Further, the washing waters 62, 64, 66, 67, 68, 70, and 72 supplied to the second, fourth, sixth, seventh, eighth, tenth, and twelfth steps in Fig. 14 are ultrapure water. Therefore, in the second aspect of the method (I) for cleaning the electronic component of the present invention, hydrogen peroxide is produced by using the ultrapure water as the water to be treated and the method for producing the treated water for decomposing hydrogen peroxide of the present invention. In the removal step, the obtained treated water is supplied as washing water in each step.
並且,將洗淨前之電子零件20b作為被洗淨物,依序進行第1步驟41~第12步驟52,獲得洗淨後之電子零件30b。Then, the electronic component 20b before washing is used as the object to be washed, and the first step 41 to the twelfth step 52 are sequentially performed to obtain the cleaned electronic component 30b.
再者,如上所述,本發明中,所謂利用進行本發明之分解過氧化氫之處理水之製造方法而獲得之處理水洗淨電子零件或電子零件之製造器具,並非僅指利用剛進行本發明之分解過氧化氫之處理水之製造方法後之處理水洗淨電子零件或電子零件之製造器具,而係指利用在製造電子零件或電子零件之製造器具之洗淨中所用之超純水的步驟之任1處或2處以上進行本發明之分解過氧化氫之處理水之製造方法,並進行超純水之製造步驟之所有步驟而獲得之超純水,洗淨電子零件或電子零件之製造器具。Further, as described above, in the present invention, the manufacturing apparatus for washing the electronic parts or the electronic parts by the treated water obtained by the method for producing the treated water for decomposing hydrogen peroxide of the present invention is not limited to the use of the original The invention relates to a method for manufacturing a treated water for decomposing hydrogen peroxide, which is a manufacturing device for washing an electronic component or an electronic component, and refers to an ultrapure water used for cleaning a manufacturing device for manufacturing an electronic component or an electronic component. The method for producing the treated water for decomposing hydrogen peroxide of the present invention at any one or two or more steps, and the ultrapure water obtained by performing all the steps of the ultrapure water manufacturing step, and washing the electronic parts or electronic parts Manufacturing equipment.
<本發明之去除溶氧之處理水之製造方法><Method for Producing Treated Water for Removing Dissolved Oxygen of the Present Invention>
本發明之去除溶氧之處理水之製造方法係於第1鉑族金屬載持觸媒或第2鉑族金屬載持觸媒之存在下,使含有氧之被處理水中之溶氧與氫反應生成水,藉此自含有氧之被處理水中去除溶氧的去除溶氧之處理水之製造方法。The method for producing treated water for removing dissolved oxygen according to the present invention is a method for reacting dissolved oxygen with hydrogen in a treated water containing oxygen in the presence of a first platinum group metal supported catalyst or a second platinum group metal supported catalyst. A method for producing water, thereby removing dissolved oxygen from the treated water containing oxygen to remove dissolved oxygen.
含有氧之被處理水只要為含有氧者則無特別限制,例如可列舉半導體製造等電子零件之製造以及用以洗淨電子零件之製造器具等之超純水之製造中所使用之原水或其製造步驟中之各種水等,具體而言可列舉超純水製造子系統之循環水,例如紫外線氧化裝置之出口水等。又,作為含有溶氧之被處理水,除上述以外可列舉發電站中所使用之用水、各種工廠中所使用之鍋爐水或冷卻水等。The water to be treated containing oxygen is not particularly limited as long as it contains oxygen, and examples thereof include the production of electronic components such as semiconductor manufacturing and the raw water used in the production of ultrapure water for cleaning electronic parts and the like. Specific examples of the water and the like in the production step include circulating water of an ultrapure water production subsystem, such as outlet water of an ultraviolet oxidation apparatus. In addition, as water to be treated containing dissolved oxygen, water used in a power station, boiler water or cooling water used in various factories, and the like can be cited.
含有氧之被處理水中之溶氧濃度並無特別限制,通常為0.01~10 mg/L。The dissolved oxygen concentration in the water to be treated containing oxygen is not particularly limited and is usually from 0.01 to 10 mg/L.
與溶氧反應之氫之量並無特別限制,為氧濃度之1倍當量~10倍當量,較佳為1.1倍當量~5倍當量。The amount of hydrogen to be reacted with the dissolved oxygen is not particularly limited, and is 1 to 10 equivalents, preferably 1.1 to 5 equivalents, of the oxygen concentration.
作為於本發明之鉑族金屬載持觸媒之存在下使含有氧之被處理水中之溶氧與氫反應之方法,並無特別限制,例如可列舉如下方法等:於觸媒填充塔中填充本發明之鉑族金屬載持觸媒,向觸媒填充塔中供給含有氧之被處理液,同時向被處理液之供給管內注入氫氣,藉此向本發明之鉑族金屬載持觸媒通入含有溶存氫及溶氧之被處理水。The method of reacting dissolved oxygen with hydrogen in the water to be treated containing oxygen in the presence of the platinum group metal-supporting catalyst of the present invention is not particularly limited, and examples thereof include the following methods: filling in a catalyst packed column The platinum group metal supporting catalyst of the present invention supplies a liquid containing oxygen to the catalyst charging tower, and simultaneously injects hydrogen into the supply pipe of the liquid to be treated, thereby carrying the catalyst to the platinum group metal of the present invention. The treated water containing dissolved hydrogen and dissolved oxygen is introduced.
於上述方法之情況,可向本發明之鉑族金屬載持觸媒以SV=2000~20000 h-1 、較佳為SV=5000~10000 h-1 通入含有氧之被處理水。若使用本發明之鉑族金屬載持觸媒,則即便以SV超過2000 h-1 般之較大SV通入被處理水亦可進行溶氧之去除。進而,即便SV為10000 h-1 ,若使用本發明之鉑族金屬載持觸媒,則亦可進行溶氧之去除,本發明之鉑族金屬載持觸媒表現出大幅超越於粒子狀陰離子交換樹脂上載持有鉑族金屬奈米粒子之習知載持觸媒之處理極限的卓越性能。含有氧之被處理水向本發明之鉑族金屬載持觸媒之通水速度並無特別限制,較佳為SV=2000~20000 h-1 ,尤佳為SV=5000~10000 h-1 。再者,本發明之鉑族金屬載持觸媒由於溶氧去除能力明顯高,故即便以大幅超越於粒子狀陰離子交換樹脂上載持有鉑族金屬奈米粒子之習知載持觸媒之處理極限的通水速度通入被處理水,亦可分解被處理水中之溶氧。In the case of the above method, the platinum group metal-supporting catalyst of the present invention may be supplied with treated water containing oxygen at SV = 2000 to 20000 h -1 , preferably SV = 5000 to 10000 h -1 . When the platinum group metal-supporting catalyst of the present invention is used, the dissolved oxygen can be removed even if a large SV is introduced into the water to be treated as the SV exceeds 2000 h -1 . Further, even if the SV is 10000 h -1 , if the platinum group metal-supporting catalyst of the present invention is used, the dissolved oxygen can be removed, and the platinum group metal-supporting catalyst of the present invention exhibits a large excess of the particulate anion. The exchange resin carries excellent performance in the processing limits of conventional catalysts holding platinum group metal nanoparticles. The flow rate of the water to be treated containing oxygen to the platinum group metal-supporting catalyst of the present invention is not particularly limited, and is preferably SV = 2000 to 20000 h -1 , and more preferably SV = 5000 to 10000 h -1 . Furthermore, since the platinum group metal-supporting catalyst of the present invention has a significantly high dissolved oxygen removal ability, even a conventional carrier catalyst which carries a platinum group metal nanoparticle on a particulate anion exchange resin is carried out. The limit water flow rate is passed into the treated water, and the dissolved oxygen in the treated water can also be decomposed.
進而,本發明之鉑族金屬載持觸媒由於溶氧去除能力顯著高,故即便使觸媒之填充層高變薄亦可進行溶氧之去除。Further, since the platinum group metal-carrying catalyst of the present invention has a remarkably high oxygen removal ability, the dissolved oxygen can be removed even if the filler layer of the catalyst is made thinner.
進行本發明之去除溶氧之處理水之製造方法而獲得之處理水中之溶氧濃度較佳為10 μg/L以下。The dissolved oxygen concentration in the treated water obtained by the method for producing the treated water for removing dissolved oxygen of the present invention is preferably 10 μg/L or less.
本發明之電子零件之洗淨方法(II)係利用進行本發明之去除溶氧之處理水之製造方法而獲得之處理水,洗淨電子零件或電子零件之製造器具的電子零件之洗淨方法。The method for cleaning an electronic component according to the present invention (II) is a method for cleaning an electronic component by using the process water obtained by the method for producing a treated water for removing dissolved oxygen of the present invention, and for manufacturing an electronic component or an electronic component. .
空氣中之氧溶入水中而成為溶氧。溶氧係作為超純水中之雜質而被管理,如上所述,超純水製造裝置之二次純水系統入口之被處理水(一次純水)中之溶氧濃度通常係經降低至100 μg/L以下。進而,亦有經管理至10 μg/L以下之情況。並且,超純水中之溶氧濃度亦有經管理至10 μg/L以下、進而管理至1 μg/L以下之情況。另一方面,於超純水之製造步驟中,由於紫外線氧化處理等而產生之過氧化氫分解時產生氧。因此,於本發明之電子零件之洗淨方法(II)之形態例中,將進行實行本發明之去除溶氧之處理水之製造方法之溶氧去除步驟而獲得之處理水作為供給至電子零件之洗淨方法之各步驟的洗淨水(洗淨液)或其製備用之超純水。The oxygen in the air dissolves into the water to become dissolved oxygen. The dissolved oxygen is managed as an impurity in ultrapure water. As described above, the dissolved oxygen concentration in the treated water (primary pure water) at the inlet of the secondary pure water system of the ultrapure water production apparatus is usually reduced to 100. Below μg/L. Furthermore, there are cases where it is managed to be 10 μg/L or less. Furthermore, the dissolved oxygen concentration in ultrapure water is also managed to 10 μg/L or less, and is managed to 1 μg/L or less. On the other hand, in the manufacturing process of ultrapure water, oxygen is generated when hydrogen peroxide is decomposed by ultraviolet oxidation treatment or the like. Therefore, in the embodiment of the method (II) for cleaning the electronic component of the present invention, the treated water obtained by the dissolved oxygen removing step of the method for producing the treated water for removing dissolved oxygen of the present invention is supplied to the electronic component. Washing water (washing liquid) for each step of the washing method or ultrapure water for preparation thereof.
本發明之電子零件之洗淨方法(II)之第一形態例係將圖13中之過氧化氫去除步驟25、26、27及28替代為將超純水32作為被處理水而進行本發明之溶氧之去除處理水之製造方法的溶氧去除步驟者。並且,將洗淨前之電子零件20a作為被洗淨物,依序進行第1步驟21~第4步驟24,獲得洗淨後之電子零件30a。The first embodiment of the method (II) for cleaning an electronic component of the present invention replaces the hydrogen peroxide removing steps 25, 26, 27, and 28 in FIG. 13 with the ultrapure water 32 as treated water to carry out the present invention. The dissolved oxygen removal step of the method for producing dissolved oxygen treatment water. Then, the electronic component 20a before washing is used as the object to be washed, and the first step 21 to the fourth step 24 are sequentially performed to obtain the cleaned electronic component 30a.
本發明之電子零件之洗淨方法(II)之第二形態例係進行將超純水作為被處理水而進行本發明之去除溶氧之處理水之製造方法的溶氧去除步驟,使各步驟所必需之藥劑溶解於所獲得之處理水中,藉此製備供給至圖14中之第3、5、9及11步驟之洗淨水(洗淨液)63、65、69及71,又,進行將超純水作為被處理水而進行本發明之去除溶氧之處理水之製造方法的溶氧去除步驟,藉此獲得供給至圖14中之第2、4、6、7、8、10及12步驟之洗淨水62、64、66、67、68、70及72。並且,將洗淨前之電子零件20b作為被洗淨物,依序進行第1步驟41~第12步驟52,獲得洗淨後之電子零件30b。The second aspect of the method for cleaning an electronic component of the present invention (II) is a step of removing a dissolved oxygen by performing the method for producing treated water for removing dissolved oxygen according to the present invention by using ultrapure water as water to be treated, and performing each step. The necessary chemicals are dissolved in the treated water obtained, thereby preparing the washing water (washing liquid) 63, 65, 69 and 71 supplied to the steps 3, 5, 9 and 11 in Fig. 14, and further, The dissolved oxygen removal step of the method for producing treated water for removing dissolved oxygen of the present invention is carried out by using ultrapure water as the treated water, thereby obtaining the supply to the second, fourth, sixth, seventh, eighth, and tenth portions in FIG. 12 steps of washing water 62, 64, 66, 67, 68, 70 and 72. Then, the electronic component 20b before washing is used as the object to be washed, and the first step 41 to the twelfth step 52 are sequentially performed to obtain the cleaned electronic component 30b.
再者,如上所述,本發明中,所謂利用進行本發明之去除溶氧之處理水之製造方法而獲得之處理水洗淨電子零件或電子零件之製造器具,不僅指利用剛進行本發明之去除溶氧之處理水之製造方法後之處理水洗淨電子零件或電子零件之製造器具,而係指利用在製造電子零件或電子零件之製造器具之洗淨中所用之超純水的步驟之任1處或2處以上進行本發明之去除溶氧之處理水之製造方法,並進行超純水之製造步驟之所有步驟而獲得之超純水,洗淨電子零件或電子零件之製造器具。In the present invention, the manufacturing apparatus for washing the electronic parts or the electronic parts by the treated water obtained by the method for producing the treated water for removing dissolved oxygen of the present invention is not limited to the use of the present invention. A process for washing an electronic component or an electronic component after the process for removing the dissolved oxygen treatment water, and a step of using ultrapure water used for cleaning the manufacturing device for manufacturing an electronic component or an electronic component. The method for producing the treated water for removing dissolved oxygen of the present invention, the ultrapure water obtained by performing all the steps of the ultrapure water production step, and the manufacturing apparatus for cleaning the electronic component or the electronic component.
以下,列舉實施例,對本發明進行具體說明,但其僅為例示,並非限制本發明。The present invention is specifically described by the following examples, which are merely illustrative and not restrictive.
[實施例][Examples]
<第1單塊體陰離子交換體之製造(參考例1)><Manufacture of the first monolithic anion exchanger (Reference Example 1)>
(I步驟:單塊體中間體之製造)(I step: manufacture of monolithic intermediates)
將苯乙烯19.9 g、二乙烯基苯0.4 g、山梨糖醇酐單油酸酯(以下簡稱為SMO)1.0 g及2,2'-偶氮雙(異丁腈)0.26 g混合,使其均勻溶解。繼而,將該苯乙烯/二乙烯基苯/SMO/2,2'-偶氮雙(異丁腈)混合物添加於含有1.8 ml之THF之180 g純水中,使用作為行星式攪拌裝置之真空攪拌脫泡混合機(EME公司製造),於5~20℃之溫度範圍在減壓下攪拌,獲得油中水滴型乳化液。將該乳化液快速移至反應容器中,密封後於靜置下於60℃聚合24小時。聚合結束後,取出內容物,以異丙醇萃取後,進行減壓乾燥,製造具有連續巨觀細孔構造之單塊體中間體。利用汞滲法測定之該單塊體中間體之巨觀細孔與巨觀細孔重疊之部分之開口(間隙孔)之平均直徑為56 μm,總細孔容積為7.5 ml/g。Mixing 19.9 g of styrene, 0.4 g of divinylbenzene, 1.0 g of sorbitan monooleate (hereinafter abbreviated as SMO) and 0.26 g of 2,2'-azobis(isobutyronitrile) to make it uniform Dissolved. Then, the styrene/divinylbenzene/SMO/2,2'-azobis(isobutyronitrile) mixture was added to 180 g of pure water containing 1.8 ml of THF, using a vacuum as a planetary stirring device. A stirred defoaming mixer (manufactured by EME Co., Ltd.) was stirred under reduced pressure at a temperature of 5 to 20 ° C to obtain a water-drop type emulsion in oil. The emulsion was quickly transferred to a reaction vessel, sealed, and polymerized at 60 ° C for 24 hours under standing. After completion of the polymerization, the content was taken out, extracted with isopropyl alcohol, and dried under reduced pressure to produce a monolith intermediate having a continuous macroporous structure. The opening (gap hole) of the portion in which the macroscopic pores and the macroscopic pores of the monolith intermediate body were measured by the mercury permeation method had an average diameter of 56 μm and a total pore volume of 7.5 ml/g.
(單塊體之製造)(Manufacture of single block)
繼而,將苯乙烯49.0 g、二乙烯基苯1.0 g、1-癸醇50 g、2,2'-偶氮雙(2,4-二甲基戊腈)0.5 g混合,使其均勻溶解(II步驟)。繼而將上述單塊體中間體切斷為外徑70 mm、厚度約20 mm之圓盤狀,分取7.6 g。將分取之單塊體中間體放入至內徑90 mm之反應容器中,使其浸漬於上述苯乙烯/二乙烯基苯/1-癸醇/2,2'-偶氮雙(2,4-二甲基戊腈)混合物中,於減壓腔室中脫泡後,將反應容器密封,於靜置下於60℃聚合24小時。聚合結束後,取出厚度約30 mm之單塊體狀內容物,以丙酮進行索氏萃取(Soxhlet extraction)後,於85℃減壓乾燥一夜(III步驟)。Then, 49.0 g of styrene, 1.0 g of divinylbenzene, 50 g of 1-nonanol, and 0.5 g of 2,2'-azobis(2,4-dimethylvaleronitrile) were mixed to uniformly dissolve ( Step II). Then, the above monolith intermediate body was cut into a disk shape having an outer diameter of 70 mm and a thickness of about 20 mm, and 7.6 g was taken. The fractionated monolith intermediate was placed in a reaction vessel having an inner diameter of 90 mm and immersed in the above styrene/divinylbenzene/1-nonanol/2,2'-azobis (2, After defoaming in a decompression chamber in a 4-dimethylvaleronitrile mixture, the reaction vessel was sealed and polymerized at 60 ° C for 24 hours under standing. After the completion of the polymerization, a monolithic body having a thickness of about 30 mm was taken out, subjected to Soxhlet extraction with acetone, and dried under reduced pressure at 85 ° C overnight (Step III).
對以上述方式獲得之由苯乙烯/二乙烯基苯共聚合體所構成之含有1.3莫耳%之交聯成分的單塊體(乾燥體)之內部構造利用SEM進行觀察,將結果示於圖1中。圖1之SEM圖像係將單塊體以任意位置切斷而獲得之切斷面之任意位置的圖像。由圖1所明示,該單塊體具有連續巨觀細孔構造,構成連續巨觀細孔構造體之骨架遠粗於參考例3之公知品之SEM圖像(圖11),又,構成骨架之壁部之厚度較厚。The internal structure of the monolith (dry body) containing 1.3 mol% of the cross-linking component composed of the styrene/divinylbenzene copolymer obtained in the above manner was observed by SEM, and the results are shown in Fig. 1. in. The SEM image of Fig. 1 is an image obtained by cutting a single block at an arbitrary position and obtaining an arbitrary position of the cut surface. As shown in Fig. 1, the monolith has a continuous giant pore structure, and the skeleton constituting the continuous giant pore structure is much thicker than the SEM image of the known product of Reference Example 3 (Fig. 11), and constitutes a skeleton. The thickness of the wall portion is thicker.
繼而,根據將所得單塊體於排除主觀而與上述位置不同之位置切斷所得之SEM圖像2張、總共3張來測定壁部之厚度及剖面所示之骨架部面積。壁部之厚度為自1張SEM照片獲得之8點之平均,骨架部面積係藉由圖像分析而求出。再者,壁部為上述定義者。又,骨架部面積係以3張SEM圖像之平均表示。其結果,壁部之平均厚度為30 μm,剖面所示之骨架部面積於SEM圖像中為28%。又,利用汞滲法測定之該單塊體之開口之平均直徑為31 μm,總細孔容積為2.2 ml/g。Then, the thickness of the wall portion and the area of the skeleton portion indicated by the cross section were measured based on two SEM images obtained by cutting the obtained monolithic body at a position different from the above position by excluding the subject. The thickness of the wall portion is an average of 8 points obtained from one SEM photograph, and the skeleton portion area is obtained by image analysis. Furthermore, the wall portion is defined above. Further, the skeleton portion area is represented by an average of three SEM images. As a result, the average thickness of the wall portion was 30 μm, and the area of the skeleton portion shown by the cross section was 28% in the SEM image. Further, the opening of the monolith was measured by the mercury infiltration method to have an average diameter of 31 μm and a total pore volume of 2.2 ml/g.
(單塊體陰離子交換體之製造)(Manufacture of monolithic anion exchanger)
將以上述方法製造之單塊體切斷為外徑70 mm、厚度約15 mm之圓盤狀。向其添加二甲氧基甲烷1400 ml、四氯化錫20 ml,於冰浴冷卻下滴加氯硫酸560 ml。滴加結束後,升溫而使其於35℃反應5小時,導入氯甲基。反應結束後,將母液以虹吸管抽出,以THF/水=2/1之混合溶劑洗淨後,進一步以THF洗淨。向該氯甲基化單塊體添加1000 ml之THF及三甲胺30%水溶液600 ml,使其於60℃反應6小時。反應結束後,將產物以甲醇/水混合溶劑洗淨,繼而以純水洗淨而單離。The monolith produced by the above method was cut into a disk shape having an outer diameter of 70 mm and a thickness of about 15 mm. 1400 ml of dimethoxymethane and 20 ml of tin tetrachloride were added thereto, and 560 ml of chlorosulfuric acid was added dropwise thereto under ice cooling. After completion of the dropwise addition, the mixture was heated, and allowed to react at 35 ° C for 5 hours to introduce a chloromethyl group. After completion of the reaction, the mother liquid was extracted with a siphon, washed with a mixed solvent of THF/water = 2/1, and further washed with THF. To the chloromethylated monolith, 1000 ml of THF and 600 ml of a 30% aqueous solution of trimethylamine were added, and the mixture was reacted at 60 ° C for 6 hours. After completion of the reaction, the product was washed with a methanol/water mixed solvent, followed by washing with pure water to separate.
所得單塊體陰離子交換體之反應前後之膨潤率為1.7倍,單位體積之陰離子交換容量於水濕潤狀態為0.60 mg當量/ml。根據單塊體之值及水濕潤狀態之單塊體陰離子交換體之膨潤率估算水濕潤狀態之單塊體陰離子交換體之開口之平均直徑,結果為54 μm,以與單塊體相同之方法求出之構成骨架之壁部之平均厚度為50 μm,骨架部面積於SEM照片之拍攝區域中為28%,總細孔容積為2.2ml/g。又,作為使水穿透時之壓力損失之指標的差壓係數為0.017 MPa/m‧LV,與實用上要求之壓力損失相比較,為低於其之較低壓力損失。進而,測定該單塊體陰離子交換體之氟化物離子相關之離子交換帶長度,結果LV=20 m/h之離子交換帶長度為25 mm,與市售之作為強鹼性陰離子交換樹脂的Amberlite IRA402BL(Rohm and Hass公司製造)之值(165 mm)相比絕對短。The swelling ratio of the obtained monolithic anion exchanger before and after the reaction was 1.7 times, and the anion exchange capacity per unit volume was 0.60 mg equivalent/ml in the water wet state. The average diameter of the opening of the monolithic anion exchanger in the water-wet state was estimated from the value of the monolith and the swelling ratio of the monolith anion exchanger in the water-wet state, and the result was 54 μm in the same manner as the monolith. The average thickness of the wall portion constituting the skeleton was 50 μm, the area of the skeleton portion was 28% in the imaging region of the SEM photograph, and the total pore volume was 2.2 ml/g. Further, the differential pressure coefficient as an index of the pressure loss at the time of water penetration is 0.017 MPa/m‧LV, which is a lower pressure loss than the practically required pressure loss. Further, the length of the ion exchange band associated with the fluoride ion of the monolithic anion exchanger was measured, and as a result, the length of the ion exchange zone of LV = 20 m/h was 25 mm, and a commercially available Amberlite as a strongly basic anion exchange resin. The value of IRA402BL (manufactured by Rohm and Hass) (165 mm) is absolutely shorter.
繼而,為確認單塊體陰離子交換體中之四級銨基之分布狀態,將單塊體陰離子交換體以鹽酸水溶液進行處理而製成氯化物形後,利用EPMA觀察氯化物離子之分布狀態。將單塊體陰離子交換體之表面的氯化物離子之分布狀態示於圖2中,骨架剖面之氯化物離子之分布狀態示於圖3中,可確認,氯化物離子不僅均勻分布於單塊體陰離子交換體之骨架表面,而且亦均勻分布於骨架內部,四級銨基係均勻導入至單塊體陰離子交換體中。再者,圖3中,骨架下部之氯化物離子濃度表觀上高於骨架上部之氯化物離子濃度,但其係由於切斷時剖面之平面性不充分而以骨架下部較骨架上部隆起之狀態切斷,氯化物離子之分布係實質上均勻。Then, in order to confirm the distribution state of the quaternary ammonium group in the monolith anion exchanger, the monolith anion exchanger was treated with an aqueous hydrochloric acid solution to form a chloride form, and then the distribution state of the chloride ions was observed by EPMA. The distribution state of the chloride ions on the surface of the monolithic anion exchanger is shown in Fig. 2, and the distribution state of the chloride ions in the skeleton cross section is shown in Fig. 3. It is confirmed that the chloride ions are not uniformly distributed in the monolith. The surface of the skeleton of the anion exchanger is uniformly distributed inside the skeleton, and the quaternary ammonium group is uniformly introduced into the monolith anion exchanger. Further, in Fig. 3, the chloride ion concentration in the lower portion of the skeleton is apparently higher than the chloride ion concentration in the upper portion of the skeleton, but the lower portion of the skeleton is less than the upper portion of the skeleton due to insufficient planarity of the cross section at the time of cutting. Upon cutting, the distribution of chloride ions is substantially uniform.
<第2單塊體陰離子交換體之製造(參考例2)><Manufacture of second monolithic anion exchanger (Reference Example 2)>
(I步驟:單塊體中間體之製造)(I step: manufacture of monolithic intermediates)
將苯乙烯5.29 g、二乙烯基苯0.28 g、山梨糖醇酐單油酸酯(以下簡稱為SMO)1.39 g及2,2'-偶氮雙(異丁腈)0.26 g混合,使其均勻溶解。繼而,將該苯乙烯/二乙烯基苯/SMO/2,2'-偶氮雙(異丁腈)混合物添加於180 g之純水中,使用作為行星式攪拌裝置之真空攪拌脫泡混合機(EME公司製造),於5~20℃之溫度範圍在減壓下攪拌,獲得油中水滴型乳化液。將該乳化液快速移至反應容器中,密封後於靜置下於60℃聚合24小時。聚合結束後,取出內容物,以甲醇萃取後,進行減壓乾燥,製造具有連續巨觀細孔構造之單塊體中間體。利用SEM圖像(圖12)觀察以上述方式獲得之單塊體中間體(乾燥體)之內部構造,結果劃分鄰接2個巨觀細孔之壁部極細而為棒狀,但具有連續氣泡構造,利用汞滲法測定之巨觀細孔與巨觀細孔重疊之部分之開口(間隙孔)之平均直徑為70 μm,總細孔容積為17.8 ml/g。Mixing 5.29 g of styrene, 0.28 g of divinylbenzene, 1.39 g of sorbitan monooleate (hereinafter abbreviated as SMO) and 0.26 g of 2,2'-azobis(isobutyronitrile) to make it uniform Dissolved. Then, the styrene/divinylbenzene/SMO/2,2'-azobis(isobutyronitrile) mixture was added to 180 g of pure water using a vacuum stirring defoaming mixer as a planetary stirring device. (manufactured by EME Co., Ltd.), the mixture was stirred under reduced pressure at a temperature of 5 to 20 ° C to obtain a water-drop type emulsion in oil. The emulsion was quickly transferred to a reaction vessel, sealed, and polymerized at 60 ° C for 24 hours under standing. After completion of the polymerization, the content was taken out, extracted with methanol, and dried under reduced pressure to produce a monolith intermediate having a continuous macroporous structure. The internal structure of the monolith intermediate body (dried body) obtained in the above manner was observed by the SEM image (Fig. 12), and as a result, the wall portion adjacent to the two giant pores was extremely thin and rod-shaped, but had a continuous bubble structure. The opening (gap hole) of the portion where the macroscopic pores and the macroscopic pores overlap by the mercury permeation method has an average diameter of 70 μm and a total pore volume of 17.8 ml/g.
(單塊體之製造)(Manufacture of single block)
繼而,將苯乙烯39.2 g、二乙烯基苯0.8 g、1-癸醇60 g、2,2'-偶氮雙(2,4-二甲基戊腈)0.8 g混合,使其均勻溶解(II步驟)。繼而,將上述單塊體中間體切斷為直徑70nm、厚度約30 mm之圓盤狀,分取2.4 g。將分取之單塊體中間體放入至內徑75 mm之反應容器中,使其浸漬於上述苯乙烯/二乙烯基苯/1-癸醇/2,2'-偶氮雙(2,4-二甲基戊腈)混合物中,於減壓腔室中脫泡後,將反應容器密封,於靜置下於60℃聚合24小時。聚合結束後,取出厚度約60 mm之單塊體狀內容物,以丙酮進行索氏萃取後,於85℃減壓乾燥一夜(III步驟)。Then, 39.2 g of styrene, 0.8 g of divinylbenzene, 60 g of 1-nonanol, and 0.8 g of 2,2'-azobis(2,4-dimethylvaleronitrile) were mixed to uniformly dissolve ( Step II). Then, the monolith intermediate was cut into a disk shape having a diameter of 70 nm and a thickness of about 30 mm, and 2.4 g was taken. The fractionated monolith intermediate was placed in a reaction vessel having an inner diameter of 75 mm and immersed in the above styrene/divinylbenzene/1-nonanol/2,2'-azobis (2, After defoaming in a decompression chamber in a 4-dimethylvaleronitrile mixture, the reaction vessel was sealed and polymerized at 60 ° C for 24 hours under standing. After the completion of the polymerization, a monolithic body having a thickness of about 60 mm was taken out, subjected to Soxhlet extraction with acetone, and dried under reduced pressure at 85 ° C overnight (Step III).
對以上述方式獲得之由苯乙烯/二乙烯基苯共聚合體所構成之含有1.3莫耳%之交聯成分的單塊體(乾燥體)之內部構造利用SEM進行觀察,將結果示於圖7。如圖7所明示,該單塊體係骨架及空孔分別三維性連續、且兩相纏繞之共連續構造。又,根據SEM圖像測定之骨架之粗度為8 μm。又,利用汞滲法測定之該單塊體之三維性連續之空孔之平均直徑為18 μm,總細孔容積為2.0 ml/g。The internal structure of the monolith (dry body) containing 1.3 mol% of the cross-linking component composed of the styrene/divinylbenzene copolymer obtained in the above manner was observed by SEM, and the results are shown in Fig. 7. . As shown in Fig. 7, the monolithic system skeleton and the voids are respectively three-dimensionally continuous and two-phase wound in a continuous structure. Further, the thickness of the skeleton measured from the SEM image was 8 μm. Further, the three-dimensional continuous pores of the monolith were measured by the mercury infiltration method to have an average diameter of 18 μm and a total pore volume of 2.0 ml/g.
(單塊體陰離子交換體之製造)(Manufacture of monolithic anion exchanger)
將以上述方法製造之單塊體切斷為直徑70mm、厚度約15mm之圓盤狀。向其添加二甲氧基甲烷1400 ml、四氯化錫20 ml,於冰浴冷卻下滴加氯硫酸560 ml。滴加結束後,升溫而使其於35℃反應5小時,導入氯甲基。反應結束後,將母液以虹吸管抽出,以THF/水=2/1之混合溶劑洗淨後,進一步以THF洗淨。向該氯甲基化單塊體添加1000 ml之THF及三甲胺30%水溶液600 ml,使其於60℃反應6小時。反應結束後,將產物以甲醇/水混合溶劑洗淨,繼而以純水洗淨而單離。The monolith produced by the above method was cut into a disk shape having a diameter of 70 mm and a thickness of about 15 mm. 1400 ml of dimethoxymethane and 20 ml of tin tetrachloride were added thereto, and 560 ml of chlorosulfuric acid was added dropwise thereto under ice cooling. After completion of the dropwise addition, the mixture was heated, and allowed to react at 35 ° C for 5 hours to introduce a chloromethyl group. After completion of the reaction, the mother liquid was extracted with a siphon, washed with a mixed solvent of THF/water = 2/1, and further washed with THF. To the chloromethylated monolith, 1000 ml of THF and 600 ml of a 30% aqueous solution of trimethylamine were added, and the mixture was reacted at 60 ° C for 6 hours. After completion of the reaction, the product was washed with a methanol/water mixed solvent, followed by washing with pure water to separate.
所得單塊體陰離子交換體之反應前後之膨潤率為1.6倍,單位體積之陰離子交換容量於水濕潤狀態為0.44 mg當量/ml。根據單塊體之值及水濕潤狀態之單塊體陰離子交換體之膨潤率估算水濕潤狀態之單塊體離子交換體之連續空孔之平均直徑,結果為29 μm,骨架之平均粗度為13 μm,總細孔容積為2.0 ml/g。The swelling ratio of the obtained monolithic anion exchanger before and after the reaction was 1.6 times, and the anion exchange capacity per unit volume was 0.44 mg equivalent/ml in the water wet state. The average diameter of the continuous pores of the monolithic ion exchanger in the water-wet state was estimated from the value of the monolith and the swelling ratio of the monolith anion exchanger in the water-wet state. The result was 29 μm, and the average thickness of the skeleton was 13 μm with a total pore volume of 2.0 ml/g.
又,作為使水穿透時之壓力損失之指標的差壓係數為0.040 MPa/m‧LV,為實用上無障礙之低壓力損失。進而,測定該單塊體陰離子交換體之氟化物離子相關之離子交換帶長度,結果LV=20 m/h之離子交換帶長度為22 mm,與市售之作為強鹼性陰離子交換樹脂的Amberlite IRA402BL(Rohm and Hass公司製造)之值(165 mm)相比絕對短。Moreover, the differential pressure coefficient which is an index of the pressure loss at the time of water penetration is 0.040 MPa/m‧LV, and it is a practically unobstructed low pressure loss. Further, the length of the ion exchange band associated with the fluoride ion of the monolithic anion exchanger was measured, and as a result, the length of the ion exchange band of LV = 20 m/h was 22 mm, and a commercially available Amberlite as a strongly basic anion exchange resin. The value of IRA402BL (manufactured by Rohm and Hass) (165 mm) is absolutely shorter.
繼而,為確認單塊體陰離子交換體中之四級銨基之分布狀態,將單塊體陰離子交換體以鹽酸水溶液進行處理而製成氯化物型式後,利用EPMA觀察氯化物離子之分布狀態。將單塊體陰離子交換體之表面的氯化物離子之分布狀態示於圖8中,骨架剖面之氯化物離子之分布狀態示於圖9中,可確認,氯化物離子不僅均勻分布於單塊體陰離子交換體之骨架表面,而且亦均勻分布於骨架內部,四級銨基係均勻導入至單塊體陰離子交換體中。再者,圖9中,骨架周邊部之氯化物離子濃度表觀上高於骨架中心部之氯化物離子濃度,但其係由於切斷時剖面之平面性不充分而以骨架周邊部較內部隆起之狀態切斷,氯化物離子之分布係實質上均勻。Then, in order to confirm the distribution state of the quaternary ammonium group in the monolith anion exchanger, the monolith anion exchanger was treated with an aqueous hydrochloric acid solution to prepare a chloride pattern, and then the distribution state of the chloride ions was observed by EPMA. The distribution state of the chloride ions on the surface of the monolithic anion exchanger is shown in Fig. 8. The distribution state of the chloride ions in the skeleton cross section is shown in Fig. 9, and it is confirmed that the chloride ions are not uniformly distributed in the monolith. The surface of the skeleton of the anion exchanger is uniformly distributed inside the skeleton, and the quaternary ammonium group is uniformly introduced into the monolith anion exchanger. Further, in Fig. 9, the chloride ion concentration in the peripheral portion of the skeleton is apparently higher than the chloride ion concentration in the center portion of the skeleton, but the peripheral portion of the skeleton is more internal due to the insufficient planarity of the cross section at the time of cutting. The state is cut off and the distribution of chloride ions is substantially uniform.
<參考例3><Reference Example 3>
(具有連續巨觀細孔構造之單塊體狀有機多孔質體(公知品)之製造)(Manufacture of monolithic organic porous body (known product) having a continuous giant pore structure)
依據日本專利特開2002-306976號記載之製造方法,製造具有連續巨觀細孔構造之單塊體狀有機多孔質體。即,將苯乙烯19.2 g、二乙烯基苯1.0 g、1.0 g之SMO及2,2'-偶氮雙(異丁腈)0.26 g混合,使其均勻溶解。繼而,將該苯乙烯/二乙烯基苯/SMO/2,2'-偶氮雙(異丁腈)混合物添加於180 g之純水中,使用作為行星式攪拌裝置之真空攪拌脫泡混合機(EME公司製造),於5~20℃之溫度範圍在減壓下攪拌,獲得油中水滴型乳化液。將該乳化液快速移至反應容器中,密封後於靜置下於60℃聚合24小時。聚合結束後,取出內容物,以異丙醇萃取後,進行減壓乾燥,製造具有連續巨觀細孔構造之單塊體狀有機多孔質體。According to the production method described in Japanese Laid-Open Patent Publication No. 2002-306976, a monolithic organic porous body having a continuous giant pore structure is produced. Namely, 19.2 g of styrene, 1.0 g of divinylbenzene, 1.0 g of SMO, and 0.26 g of 2,2'-azobis(isobutyronitrile) were mixed and uniformly dissolved. Then, the styrene/divinylbenzene/SMO/2,2'-azobis(isobutyronitrile) mixture was added to 180 g of pure water using a vacuum stirring defoaming mixer as a planetary stirring device. (manufactured by EME Co., Ltd.), the mixture was stirred under reduced pressure at a temperature of 5 to 20 ° C to obtain a water-drop type emulsion in oil. The emulsion was quickly transferred to a reaction vessel, sealed, and polymerized at 60 ° C for 24 hours under standing. After completion of the polymerization, the content was taken out, extracted with isopropyl alcohol, and dried under reduced pressure to produce a monolithic organic porous body having a continuous macroporous structure.
對以上述方式獲得之由苯乙烯/二乙烯基苯共聚合體所構成之含有3.3莫耳%之交聯成分的單塊體之內部構造利用SEM進行觀察,將結果示於圖11中。如圖11所明示,該單塊體具有連續巨觀細孔構造,但構成連續巨觀細孔構造體之骨架的壁部之厚度薄於參考例1(圖1)。根據該單塊體之SEM圖像測定之壁部之平均厚度為5 μm,骨架部面積於SEM圖像區域中為10%。又,利用汞滲法測定之該單塊體之開口之平均直徑為29 μm,總細孔容積為8.6 ml/g。The internal structure of the monolith containing 3.3 mol% of the cross-linking component composed of the styrene/divinylbenzene copolymer obtained in the above manner was observed by SEM, and the results are shown in Fig. 11 . As shown in Fig. 11, the monolith has a continuous giant pore structure, but the thickness of the wall portion constituting the skeleton of the continuous giant pore structure is thinner than that of Reference Example 1 (Fig. 1). The average thickness of the wall portion measured by the SEM image of the monolith was 5 μm, and the skeleton portion area was 10% in the SEM image region. Further, the opening of the monolith was measured by the mercury infiltration method to have an average diameter of 29 μm and a total pore volume of 8.6 ml/g.
[實施例1][Example 1]
(第1鉑族金屬載持觸媒之製備)(Preparation of the first platinum group metal-supporting catalyst)
將參考例1之單塊體陰離子交換體(第1單塊體陰離子交換體)離子交換成Cl形後,於水濕潤狀態切出為圓柱狀,進行減壓乾燥。乾燥後之單塊體陰離子交換體之重量為1.2 g。將該乾燥狀態之單塊體陰離子交換體於溶解有氯化鈀270 mg之稀鹽酸中浸漬24小時,離子交換成氯化鈀酸型式。浸漬結束後,將單塊體陰離子交換體以純水洗淨數次,於肼水溶液中浸漬24小時進行還原處理。氯化鈀酸形單塊體陰離子交換體為棕色,相對於此,還原處理結束後之單塊體陰離子交換體係著色為黑色,暗示鈀奈米粒子之生成。將以上述方式獲得之第1鈀奈米粒子載持觸媒a以純水洗淨數次,進行乾燥。The monolithic anion exchanger (first monolith anion exchanger) of Reference Example 1 was ion-exchanged into a Cl shape, and then cut into a column shape in a wet state of water, and dried under reduced pressure. The weight of the monolithic anion exchanger after drying was 1.2 g. The monolithic anion exchanger in a dry state was immersed in dilute hydrochloric acid in which 270 mg of palladium chloride was dissolved for 24 hours, and ion-exchanged into a palladium chloride acid type. After the completion of the immersion, the monolith anion exchanger was washed several times with pure water, and immersed in a hydrazine aqueous solution for 24 hours to carry out a reduction treatment. The palladium chloride-based monolith anion exchanger is brown. On the other hand, the monolith anion exchange system after the reduction treatment is colored black, suggesting the formation of palladium nanoparticles. The first palladium nanoparticle-carrying catalyst a obtained in the above manner was washed several times with pure water and dried.
載持於乾燥狀態之第1鈀奈米粒子載持觸媒a上之鈀奈米粒子之載持量為10.9重量%。為測定所載持之鈀奈米粒子之平均粒徑,而進行穿透型電子顯微鏡(TEM)觀察。將所獲得之TEM圖像示於圖5中。鈀奈米粒子之平均粒徑為5 nm。將乾燥狀態之鈀奈米粒子載持觸媒a填充於內徑10 mm之管柱中,通入氫氧化鈉水溶液而使作為載體之單塊體陰離子交換體成為OH形,用於過氧化氫分解特性之評價。第1鈀奈米粒子載持觸媒a之填充層高為11 mm。此時,鈀奈米粒子相對於水濕潤狀態之樹脂體積之載持量為9.7 g-Pd/L-R(每1L鈀奈米粒子載持觸媒所載持之鈀重量)。The amount of the palladium nanoparticle supported on the first palladium nanoparticle-carrying catalyst a in a dry state was 10.9% by weight. In order to measure the average particle diameter of the palladium nanoparticles held, a transmission electron microscope (TEM) observation was performed. The obtained TEM image is shown in Fig. 5. The average particle size of the palladium nanoparticles is 5 nm. The palladium nanoparticle-carrying catalyst a in a dry state is filled in a column having an inner diameter of 10 mm, and an aqueous sodium hydroxide solution is passed to make a monolithic anion exchanger as a carrier into an OH shape for hydrogen peroxide. Evaluation of decomposition characteristics. The filling layer height of the first palladium nanoparticle-carrying catalyst a was 11 mm. At this time, the loading amount of the resin volume of the palladium nanoparticle with respect to the water-wet state was 9.7 g-Pd/L-R (the weight of palladium carried per 1 L of the palladium nanoparticle-supporting catalyst).
(觸媒之評價)(evaluation of catalyst)
向填充於內徑10 mm之管柱中之上述第1鈀奈米粒子載持觸媒a以SV=5000 h-1 、27小時以向下流動之方式通入含有過氧化氫15~30 μg/L之超純水,於管柱出口採取試料水,測定過氧化氫濃度。其結果,於管柱出口採取之試料水中之過氧化氫濃度未滿1 μg/L,過氧化氫係經分解去除。繼而,將SV設為10000 h-1 進行同樣之處理。儘管SV為10000 h-1 而非常快,且觸媒之填充層高薄至11 mm,於管柱出口採取之試料水中之過氧化氫濃度亦未滿1 μg/L,過氧化氫係經分解去除。The first palladium nanoparticle-loaded catalyst a filled in a column having an inner diameter of 10 mm was supplied with hydrogen peroxide 15 to 30 μg at a flow rate of SV=5000 h -1 for 27 hours. /L ultra pure water, sample water was taken at the outlet of the column, and the hydrogen peroxide concentration was measured. As a result, the concentration of hydrogen peroxide in the sample water taken at the outlet of the column was less than 1 μg/L, and the hydrogen peroxide was decomposed and removed. Then, the same processing was performed by setting SV to 10000 h -1 . Although the SV is very fast at 10000 h -1 and the filling layer of the catalyst is as thin as 11 mm, the hydrogen peroxide concentration in the sample water taken at the outlet of the column is less than 1 μg/L, and the hydrogen peroxide is decomposed. Remove.
[實施例2][Embodiment 2]
(第2鉑族金屬載持觸媒之製備)(Preparation of the second platinum group metal-supporting catalyst)
除使用參考例2之單塊體陰離子交換體(第2單塊體陰離子交換體)代替參考例1之單塊體陰離子交換體(第1單塊體陰離子交換體)作為觸媒載體,並且將所切出之單塊體陰離子交換體之乾燥時重量設為1.4 g代替1.2 g以外,以與實施例1相同之方法於參考例2之單塊體陰離子交換體(第2單塊體陰離子交換體)上載持鈀奈米粒子,獲得第2鈀奈米粒子載持觸媒a。The monolith anion exchanger (the second monolith anion exchanger) of Reference Example 1 was used instead of the monolithic anion exchanger (the first monolith anion exchanger) of Reference Example 1 as a catalyst carrier, and The monolithic anion exchanger of the reference example 2 was used in the same manner as in Example 1 except that the weight of the monolith anion exchanger to be cut was 1.4 g instead of 1.2 g (the second monolith anion exchange) The palladium nanoparticle is loaded on the body to obtain the second palladium nanoparticle-carrying catalyst a.
載持於所得乾燥狀態之第2鈀奈米粒子載持觸媒a上之鈀奈米粒子之載持量為9.8重量%。為測定所載持之鈀奈米粒子之平均粒徑,而進行穿透型電子顯微鏡(TEM)觀察。將所獲得之TEM圖像示於圖10中。鈀奈米粒子之平均粒徑為3 nm。將乾燥狀態之第2鈀奈米粒子載持觸媒填充於內徑10 mm之管柱中,通入氫氧化鈉水溶液而使作為載體之單塊體陰離子交換體成為OH形,用於過氧化氫分解特性之評價。觸媒之填充層高為13 mm。此時,鈀奈米粒子相對於水濕潤狀態之樹脂體積之載持量為8.7 g-Pd/L-R。The amount of the palladium nanoparticle supported on the second palladium nanoparticle-carrying catalyst a in the obtained dry state was 9.8% by weight. In order to measure the average particle diameter of the palladium nanoparticles held, a transmission electron microscope (TEM) observation was performed. The obtained TEM image is shown in Fig. 10. The average particle size of the palladium nanoparticles is 3 nm. The second palladium nanoparticle-carrying catalyst in a dry state is filled in a column having an inner diameter of 10 mm, and a sodium hydroxide aqueous solution is introduced to make a monolithic anion exchanger as a carrier into an OH shape for peroxidation. Evaluation of hydrogen decomposition characteristics. The fill level of the catalyst is 13 mm. At this time, the loading amount of the palladium nanoparticle with respect to the resin in a wet state of water was 8.7 g-Pd/L-R.
(觸媒之評價)(evaluation of catalyst)
除使用第2鈀奈米粒子載持觸媒a代替第1鈀奈米粒子載持觸媒作為觸媒以外,以與實施例1相同之方法評價第2鈀奈米粒子載持觸媒a之過氧化氫分解效果。其結果,即便於欲以SV=5000 h-1 及10000 h-1 通入超純水之任一種情況,於管柱出口採取之試料水中之過氧化氫濃度亦未滿1 μg/L,過氧化氫係經分解去除。The second palladium nanoparticle-carrying catalyst a was evaluated in the same manner as in Example 1 except that the second palladium nanoparticle-carrying catalyst a was used instead of the first palladium nanoparticle-carrying catalyst as a catalyst. Hydrogen peroxide decomposition effect. As a result, even if any of the ultrapure waters are to be introduced at SV=5000 h -1 and 10000 h -1 , the hydrogen peroxide concentration in the sample water taken at the outlet of the column is less than 1 μg/L. Hydrogen peroxide is removed by decomposition.
[實施例3][Example 3]
除將所切出之第1單塊體陰離子交換體之乾燥時重量設為1.7 g代替1.2 g,並且溶解氯化鈀2.5 mg代替溶解氯化鈀270 mg以外,以與實施例1相同之方法於參考例1之單塊體陰離子交換體(第1單塊體陰離子交換體)上載持鈀奈米粒子,獲得第1鈀奈米粒子載持觸媒b。The same method as in Example 1 except that the weight of the first monolith anion exchanger excised was 1.7 g instead of 1.2 g, and 2.5 mg of palladium chloride was dissolved instead of dissolving 270 mg of palladium chloride. Palladium nanoparticle was carried on the monolithic anion exchanger (first monolith anion exchanger) of Reference Example 1, and the first palladium nanoparticle-carrying catalyst b was obtained.
載持於所得乾燥狀態之第1鈀奈米粒子載持觸媒b上之鈀奈米粒子之載持量為0.05重量%。將乾燥狀態之第1鈀奈米粒子載持觸媒b填充於內徑10 mm之管柱中,通入氫氧化鈉水溶液而使作為載體之單塊體陰離子交換體成為OH形,用於過氧化氫分解特性之評價。觸媒之填充層高為19 mm。此時,鈀奈米粒子相對於水濕潤狀態之樹脂體積之載持量為0.07 g-Pd/L-R。The amount of the palladium nanoparticle supported on the first palladium nanoparticle-carrying catalyst b in the obtained dry state was 0.05% by weight. The first palladium nanoparticle-carrying catalyst b in a dry state is filled in a column having an inner diameter of 10 mm, and a sodium hydroxide aqueous solution is introduced to form a monolithic anion exchanger as a carrier into an OH shape. Evaluation of the decomposition characteristics of hydrogen peroxide. The fill level of the catalyst is 19 mm. At this time, the loading amount of the palladium nanoparticle relative to the resin volume in the wet state of water was 0.07 g-Pd/L-R.
(觸媒之評價)(evaluation of catalyst)
除使用第1鈀奈米粒子載持觸媒b代替第1鈀奈米粒子載持觸媒a作為觸媒以外,以與實施例1相同之方法評價第1鈀奈米粒子載持觸媒b之過氧化氫分解效果。於以SV=5000 h-1 通水之情況,於管柱出口採取之試料水中之過氧化氫濃度未滿1 μg/L,過氧化氫係經分解去除。繼而將SV設為10000 h-1 進行同樣之處理。於管柱出口採取之試料水中之過氧化氫濃度為1.7 μg/L,儘管鈀奈米粒子之載持量為0.07 g-Pd/L-R而非常低,亦獲得過氧化氫分解效果高之結果。The first palladium nanoparticle-carrying catalyst b was evaluated in the same manner as in Example 1 except that the first palladium nanoparticle-carrying catalyst b was used instead of the first palladium nanoparticle-carrying catalyst a as a catalyst. The hydrogen peroxide decomposition effect. In the case of water passing SV=5000 h -1 , the concentration of hydrogen peroxide in the sample water taken at the outlet of the column is less than 1 μg/L, and the hydrogen peroxide is decomposed and removed. The SV is then set to 10000 h -1 for the same processing. The concentration of hydrogen peroxide in the sample water taken at the outlet of the column was 1.7 μg/L, and although the loading amount of the palladium nanoparticles was 0.07 g-Pd/LR, the decomposition effect of hydrogen peroxide was high.
[比較例1][Comparative Example 1]
於水分保有能力以OH形基準計為60~70%且為凝膠形之粒子狀強鹼陰離子交換樹脂(I型)上以公知方法載持鈀奈米粒子,獲得鈀奈米粒子載持粒狀離子交換樹脂觸媒。將Cl形之粒子狀陰離子交換樹脂浸漬於氯化鈀之鹽酸水溶液中,水洗後,以肼水溶液進行還原處理。通入氫氧化鈉水溶液而使粒子狀陰離子交換樹脂成為OH形,用於過氧化氫分解特性之評價。此時,鈀奈米粒子載持量於乾燥狀態為0.4重量%,於水濕潤狀態為970 mg-Pd/L-R。將該載持有鈀之OH形粒子狀離子交換樹脂於內徑25 mm之管柱中填充40 mL(層高80 mm),以與實施例1相同之方法進行過氧化氫減少之實驗。Palladium nanoparticle-supported particles are supported by a known method by carrying a palladium nanoparticle on a gel-like particulate strong alkali anion exchange resin (type I) having a water retention capacity of 60 to 70% on a OH basis. Ion exchange resin catalyst. The Cl-shaped particulate anion exchange resin was immersed in a hydrochloric acid aqueous solution of palladium chloride, washed with water, and then subjected to reduction treatment with a hydrazine aqueous solution. The aqueous solution of sodium hydroxide was passed through to make the particulate anion exchange resin into an OH form for evaluation of hydrogen peroxide decomposition characteristics. At this time, the palladium nanoparticle-supporting amount was 0.4% by weight in a dry state and 970 mg-Pd/L-R in a water-wet state. The OH-form particle-shaped ion exchange resin containing palladium was filled in a column of an inner diameter of 25 mm in 40 mL (layer height: 80 mm), and an experiment of reducing hydrogen peroxide was carried out in the same manner as in Example 1.
(觸媒之評價)(evaluation of catalyst)
除使用上述鈀奈米粒子載持粒狀離子交換樹脂觸媒代替第1鈀奈米粒子載持觸媒a作為觸媒,並且以SV=1500 h-1 及2500 h-1 通入超純水以外,以與實施例1相同之方法評價鈀奈米粒子載持粒狀離子交換樹脂觸媒之過氧化氫分解效果。其結果,於管柱出口採取之試料水中之過氧化氫濃度分別為未滿1 μg/L、及1.6 μg/L。於SV=1500 h-1 時過氧化氫未滿1 μg/L,但若將SV提高至2500 h-1 ,則過氧化氫洩漏至處理水中。如此,先前技術之於粒子狀陰離子交換樹脂上載持有鈀奈米粒子之觸媒,即便設定較實施例更慢之SV、更厚之觸媒填充層高的易於去除過氧化氫之條件,於SV=2500 h-1 時過氧化氫亦會洩漏。In addition to using the above-mentioned palladium nanoparticle-carrying granular ion-exchange resin catalyst instead of the first palladium nanoparticle-carrying catalyst a as a catalyst, and introducing ultrapure water at SV=1500 h -1 and 2500 h -1 The hydrogen peroxide decomposition effect of the palladium nanoparticle-supporting particulate ion exchange resin catalyst was evaluated in the same manner as in Example 1 except for the same method as in Example 1. As a result, the concentration of hydrogen peroxide in the sample water taken at the outlet of the column was less than 1 μg/L and 1.6 μg/L, respectively. Hydrogen peroxide was less than 1 μg/L at SV=1500 h -1 , but if SV was increased to 2500 h -1 , hydrogen peroxide leaked into the treated water. Thus, the prior art in the particulate anion exchange resin carries the catalyst of the palladium nanoparticle, even if the SV is slower than the embodiment, and the thicker catalyst filler layer is high, the condition for easily removing hydrogen peroxide is Hydrogen peroxide also leaks when SV = 2500 h -1 .
[比較例2][Comparative Example 2]
不載持鈀奈米粒子而僅使用參考例1之單塊體陰離子交換體(第1單塊體陰離子交換體),以與實施例1相同之方法評價SV=10000 h-1 時之過氧化氫分解效果。其結果確認不到過氧化氫之分解效果。Peroxidation at SV = 10000 h -1 was evaluated in the same manner as in Example 1 except that the palladium nanoparticle was not supported and only the monolith anion exchanger (the first monolith anion exchanger) of Reference Example 1 was used. Hydrogen decomposition effect. As a result, it was confirmed that the decomposition effect of hydrogen peroxide was not obtained.
<第1單塊體陰離子交換體之單塊體之製造(參考例4~13)><Manufacture of monolith of the first monolithic anion exchanger (Reference Examples 4 to 13)>
(單塊體之製造)(Manufacture of single block)
除將苯乙烯之使用量、交聯劑之種類及使用量、有機溶劑之種類及使用量、苯乙烯及二乙烯基苯含浸聚合時共存之單塊體中間體之多孔構造、交聯密度及使用量變更為表1所示之調配量以外,以與參考例1相同之方法製造單塊體。將其結果示於表1及表2中。再者,根據參考例4~13之SEM圖像(未圖示)及表2,參考例4~13之單塊體之開口之平均直徑大至22~70 μm、構成骨架之壁部之平均厚度亦厚至25~50 μm、骨架部面積於SEM圖像區域中為26~44%,係粗骨架之單塊體。再者,表1中,「添加」一欄中自左起依序表示II步驟中使用之乙烯基單體、交聯劑、I步驟中所獲得之單塊體中間體、II步驟中使用之有機溶劑。再者,以下之表中所示之間隙孔之直徑、壁面之厚度、骨架之直徑(粗度)、及空孔之直徑為平均值。In addition to the amount of styrene used, the type and amount of the crosslinking agent, the type and amount of the organic solvent, the porous structure of the monolithic intermediate which coexists in the styling polymerization of styrene and divinylbenzene, and the crosslinking density and A monolith was produced in the same manner as in Reference Example 1 except that the amount of use was changed to the amount shown in Table 1. The results are shown in Tables 1 and 2. Further, according to the SEM images (not shown) of Reference Examples 4 to 13 and Table 2, the average diameter of the openings of the monoliths of Reference Examples 4 to 13 was as large as 22 to 70 μm, and the average of the wall portions constituting the skeleton. The thickness is also as thick as 25 to 50 μm, and the area of the skeleton is 26 to 44% in the SEM image area, which is a monolithic body of a thick skeleton. Further, in Table 1, the "addition" column sequentially indicates the vinyl monomer used in the step II, the crosslinking agent, the monolith intermediate obtained in the step I, and the step II used in the step from the left. Organic solvents. Further, the diameter of the clearance hole, the thickness of the wall surface, the diameter (thickness) of the skeleton, and the diameter of the pores shown in the following table are average values.
<第1單塊體陰離子交換體之製造(參考例14)><Manufacture of the first monolithic anion exchanger (Reference Example 14)>
(單塊體之製造)(Manufacture of single block)
除將苯乙烯之使用量、交聯劑之使用量、有機溶劑之使用量變更為表1所示之調配量以外,以與參考例1相同之方法製造單塊體。將其結果示於表1及表2中。參考例14之單塊體係獲得巨觀細孔與巨觀細孔之重疊部分之開口之平均直徑大至38 μm、構成骨架之壁部之平均厚度亦為25 μm的壁部較厚之有機多孔質體。A monolith was produced in the same manner as in Reference Example 1 except that the amount of styrene used, the amount of the crosslinking agent used, and the amount of the organic solvent used were changed to those shown in Table 1. The results are shown in Tables 1 and 2. In the monolithic system of Reference Example 14, the average diameter of the opening of the overlapping portion of the macroscopic pores and the macroscopic pores was as large as 38 μm, and the wall portion of the skeleton was also 25 μm, and the wall portion was thick and organic porous. Platinum.
(單塊體陰離子交換體之製造)(Manufacture of monolithic anion exchanger)
將以上述方法製造之單塊體切斷為外徑70 mm、厚度約15 mm之圓盤狀。向其添加二甲氧基甲烷1400 ml、四氯化錫20 ml,於冰浴冷卻下滴加氯硫酸560 ml。滴加結束後,升溫而使其於35℃反應5小時,導入氯甲基。反應結束後,將母液以虹吸管抽出,以THF/水=2/1之混合溶劑洗淨後,進一步以THF洗淨。向該氯甲基化單塊體添加1000 ml之THF及三甲胺30%水溶液600 ml,使其於60℃反應6小時。The monolith produced by the above method was cut into a disk shape having an outer diameter of 70 mm and a thickness of about 15 mm. 1400 ml of dimethoxymethane and 20 ml of tin tetrachloride were added thereto, and 560 ml of chlorosulfuric acid was added dropwise thereto under ice cooling. After completion of the dropwise addition, the mixture was heated, and allowed to react at 35 ° C for 5 hours to introduce a chloromethyl group. After completion of the reaction, the mother liquid was extracted with a siphon, washed with a mixed solvent of THF/water = 2/1, and further washed with THF. To the chloromethylated monolith, 1000 ml of THF and 600 ml of a 30% aqueous solution of trimethylamine were added, and the mixture was reacted at 60 ° C for 6 hours.
反應結束後,將產物以甲醇/水混合溶劑洗淨,繼而以純水洗淨而單離。After completion of the reaction, the product was washed with a methanol/water mixed solvent, followed by washing with pure water to separate.
所得單塊體陰離子交換體之反應前後之膨潤率為1.6倍,單位體積之陰離子交換容量於水濕潤狀態為0.56 mg當量/ml。根據單塊體之值及水濕潤狀態之單塊體陰離子交換體之膨潤率估算水濕潤狀態之單塊體陰離子交換體之開口之平均直徑,結果為61 μm,以與單塊體相同之方法求出的構成骨架之壁部之平均厚度為40 μm,骨架部面積於SEM照片之拍攝區域中為26%,總細孔容積為2.9 ml/g。又,作為使水穿透時之壓力損失之指標的差壓係數為0.020 MPa/m‧LV,與實用上要求之壓力損失相比較,為低於其之低壓力損失。The swelling ratio of the obtained monolithic anion exchanger before and after the reaction was 1.6 times, and the anion exchange capacity per unit volume was 0.56 mg equivalent/ml in the water wet state. The average diameter of the opening of the monolithic anion exchanger in the water-wet state was estimated from the value of the monolith and the swelling ratio of the monolith anion exchanger in the water-wet state, and the result was 61 μm in the same manner as the monolith. The obtained wall portion constituting the skeleton had an average thickness of 40 μm, the skeleton portion area was 26% in the imaging region of the SEM photograph, and the total pore volume was 2.9 ml/g. Further, the differential pressure coefficient as an index of the pressure loss at the time of water penetration is 0.020 MPa/m‧LV, which is lower than the pressure loss required in practical use, and is lower than the pressure loss.
繼而,為確認單塊體陰離子交換體中之四級銨基之分布狀態,將單塊體陰離子交換體以鹽酸水溶液進行處理而製成氯化物型式後,利用EPMA觀察氯化物離子之分布狀態。其結果可確認,氯化物離子不僅均勻分布於單塊體陰離子交換體之骨架表面,而且亦均勻分布於骨架內部,四級銨基係均勻導入至單塊體陰離子交換體中。Then, in order to confirm the distribution state of the quaternary ammonium group in the monolith anion exchanger, the monolith anion exchanger was treated with an aqueous hydrochloric acid solution to prepare a chloride pattern, and then the distribution state of the chloride ions was observed by EPMA. As a result, it was confirmed that chloride ions were not uniformly distributed on the skeleton surface of the monolith anion exchanger, but also uniformly distributed inside the skeleton, and the quaternary ammonium group was uniformly introduced into the monolith anion exchanger.
<第2單塊體陰離子交換體之製造(參考例15)><Manufacture of second monolithic anion exchanger (Reference Example 15)>
(I步驟:單塊體中間體之製造)(I step: manufacture of monolithic intermediates)
將苯乙烯5.4 g、二乙烯基苯0.17 g、山梨糖醇酐單油酸酯(以下簡稱為SMO)1.4 g及2,2'-偶氮雙(異丁腈)0.26 g混合,使其均勻溶解。繼而將該苯乙烯/二乙烯基苯/SMO/2,2'-偶氮雙(異丁腈)混合物添加於180 g之純水中,使用作為行星式攪拌裝置之真空攪拌脫泡混合機(EME公司製造),於5~20℃之溫度範圍在減壓下攪拌,獲得油中水滴型乳化液。將該乳化液快速移至反應容器中,密封後於靜置下於60℃聚合24小時。聚合結束後,取出內容物,以甲醇萃取後,進行減壓乾燥,製造具有連續巨觀細孔構造之單塊體中間體。利用SEM圖像(未圖示)觀察以上述方式獲得之單塊體中間體(乾燥體)之內部構造,結果劃分鄰接2個巨觀細孔之壁部極細而為棒狀,但具有連續氣泡構造,利用汞滲法測定之巨觀細孔與巨觀細孔重疊之部分之開口(間隙孔)之平均直徑為70 μm,總細孔容積為21.0 ml/g。Mixing 5.4 g of styrene, 0.17 g of divinylbenzene, 1.4 g of sorbitan monooleate (hereinafter abbreviated as SMO) and 0.26 g of 2,2'-azobis(isobutyronitrile) to make it uniform Dissolved. The styrene/divinylbenzene/SMO/2,2'-azobis(isobutyronitrile) mixture was then added to 180 g of pure water using a vacuum stirred defoaming mixer as a planetary stirring device ( The EME company is stirred at a temperature of 5 to 20 ° C under reduced pressure to obtain a water-drop type emulsion in oil. The emulsion was quickly transferred to a reaction vessel, sealed, and polymerized at 60 ° C for 24 hours under standing. After completion of the polymerization, the content was taken out, extracted with methanol, and dried under reduced pressure to produce a monolith intermediate having a continuous macroporous structure. The internal structure of the monolith intermediate body (dried body) obtained in the above manner was observed by an SEM image (not shown), and as a result, the wall portion adjacent to the two giant pores was extremely thin and rod-shaped, but had continuous bubbles. The average diameter of the opening (gap hole) of the portion where the macroscopic pore and the giant pore are overlapped by the mercury permeation method is 70 μm, and the total pore volume is 21.0 ml/g.
(共連續構造單塊體之製造)(Manufacture of a continuous continuous monolith)
繼而,將苯乙烯76.0 g、二乙烯基苯4.0 g、1-癸醇120 g、2,2'-偶氮雙(2,4-二甲基戊腈)0.8 g混合,使其均勻溶解(II步驟)。繼而將上述單塊體中間體切斷為直徑70 mm、厚度約40 mm之圓盤狀,分取4.1 g。將分取之單塊體中間體放入至內徑75 mm之反應容器中,使其浸漬於上述苯乙烯/二乙烯基苯/1-癸醇/2,2'-偶氮雙(2,4-二甲基戊腈)混合物中,於減壓腔室中脫泡後,將反應容器密封,於靜置下於60℃聚合24小時。聚合結束後,取出厚度約60 mm之單塊體狀內容物,以丙酮進行索氏萃取後,於85℃減壓乾燥一夜(III步驟)。Then, 76.0 g of styrene, 4.0 g of divinylbenzene, 120 g of 1-nonanol, and 0.8 g of 2,2'-azobis(2,4-dimethylvaleronitrile) were mixed to uniformly dissolve ( Step II). The monolith intermediate was then cut into a disc having a diameter of 70 mm and a thickness of about 40 mm, and 4.1 g was taken. The fractionated monolith intermediate was placed in a reaction vessel having an inner diameter of 75 mm and immersed in the above styrene/divinylbenzene/1-nonanol/2,2'-azobis (2, After defoaming in a decompression chamber in a 4-dimethylvaleronitrile mixture, the reaction vessel was sealed and polymerized at 60 ° C for 24 hours under standing. After the completion of the polymerization, a monolithic body having a thickness of about 60 mm was taken out, subjected to Soxhlet extraction with acetone, and dried under reduced pressure at 85 ° C overnight (Step III).
對以上述方式獲得之由苯乙烯/二乙烯基苯共聚合體所構成之含有3.2莫耳%之交聯成分的單塊體(乾燥體)之內部構造利用SEM進行觀察,結果該單塊體係骨架及空孔分別三維性連續、且兩相纏繞之共連續構造。又,根據SEM圖像測定之骨架之平均粗度為10 μm。又,利用汞滲法測定之該單塊體之三維性連續之空孔之平均直徑為17 μm,總細孔容積為2.9 ml/g。將其結果總結示於表3及4中。表4中,骨架之粗度係以骨架之平均直徑表示。The internal structure of a monolith (dry body) containing 3.2 mol% of a cross-linking component composed of a styrene/divinylbenzene copolymer obtained in the above manner was observed by SEM, and as a result, the monolithic system skeleton was observed. And the co-continuous structure in which the holes are three-dimensionally continuous and two-phase is wound. Further, the average thickness of the skeleton measured from the SEM image was 10 μm. Further, the three-dimensional continuous pores of the monolith were measured by the mercury infiltration method to have an average diameter of 17 μm and a total pore volume of 2.9 ml/g. The results are summarized in Tables 3 and 4. In Table 4, the thickness of the skeleton is expressed by the average diameter of the skeleton.
(具有共連續氣泡構造之單塊體陰離子交換體之製造)(Manufacture of monolithic anion exchanger with co-continuous bubble structure)
將以上述方法製造之單塊體切斷為直徑70 mm、厚度約15 mm之圓盤狀。向其添加二甲氧基甲烷1400 ml、四氯化錫20 ml,於冰浴冷卻下滴加氯硫酸560 ml。滴加結束後,升溫而使其於35℃反應5小時,導入氯甲基。反應結束後,將母液以虹吸管抽出,以THF/水=2/1之混合溶劑洗淨後,進一步以THF洗淨。向該氯甲基化單塊體添加1000 ml之THF及三甲胺30%水溶液600 ml,使其於60℃反應6小時。反應結束後,將產物以甲醇/水混合溶劑洗淨,繼而以純水洗淨而單離。The monolith produced by the above method was cut into a disk shape having a diameter of 70 mm and a thickness of about 15 mm. 1400 ml of dimethoxymethane and 20 ml of tin tetrachloride were added thereto, and 560 ml of chlorosulfuric acid was added dropwise thereto under ice cooling. After completion of the dropwise addition, the mixture was heated, and allowed to react at 35 ° C for 5 hours to introduce a chloromethyl group. After completion of the reaction, the mother liquid was extracted with a siphon, washed with a mixed solvent of THF/water = 2/1, and further washed with THF. To the chloromethylated monolith, 1000 ml of THF and 600 ml of a 30% aqueous solution of trimethylamine were added, and the mixture was reacted at 60 ° C for 6 hours. After completion of the reaction, the product was washed with a methanol/water mixed solvent, followed by washing with pure water to separate.
所得單塊體陰離子交換體之反應前後之膨潤率為1.5倍,單位體積之陰離子交換容量於水濕潤狀態為0.54 mg當量/ml。根據單塊體之值及水濕潤狀態之單塊體陰離子交換體之膨潤率估算水濕潤狀態之單塊體離子交換體之連續空孔之平均直徑,結果為26 μm,骨架之平均粗度為15 μm,總細孔容積為2.9 ml/g。The swelling ratio of the obtained monolithic anion exchanger before and after the reaction was 1.5 times, and the anion exchange capacity per unit volume was 0.54 mg equivalent/ml in the water wet state. The average diameter of the continuous pores of the monolithic ion exchanger in the water-wet state was estimated from the value of the monolith and the swelling ratio of the monolith anion exchanger in the water-wet state. The result was 26 μm, and the average thickness of the skeleton was 15 μm, total pore volume 2.9 ml/g.
又,作為使水穿透時之壓力損失之指標的差壓係數為0.045 MPa/m‧LV,為實用上無障礙之低壓力損失。進而,測定該單塊體陰離子交換體之氟化物離子相關之離子交換帶長度,結果LV=20 m/h之離子交換帶長度為20 mm,與市售之作為強鹼性陰離子交換樹脂的Amberlite IRA402BL(Rohm and Hass公司製造)之值(165 mm)相比絕對短,並且與先前之具有連續氣泡構造之單塊體狀多孔質陰離子交換體之值相比亦較短。將其結果總結示於表5中。又,所獲得之具有共連續構造之單塊體陰離子交換體之內部構造係利用SEM圖像(未圖示)進行觀察。Moreover, the differential pressure coefficient which is an index of the pressure loss at the time of water penetration is 0.045 MPa/m‧LV, and it is a practically unobstructed low pressure loss. Further, the length of the ion exchange band associated with the fluoride ion of the monolithic anion exchanger was measured, and as a result, the length of the ion exchange band of LV = 20 m/h was 20 mm, and a commercially available Amberlite as a strongly basic anion exchange resin. The value of IRA402BL (manufactured by Rohm and Hass) (165 mm) is relatively short compared to the value of the monolithic porous anion exchanger having the continuous cell structure. The results are summarized in Table 5. Further, the internal structure of the obtained monolithic anion exchanger having a co-continuous structure was observed by an SEM image (not shown).
繼而,為確認單塊體陰離子交換體中之四級銨基之分布狀態,將單塊體陰離子交換體以鹽酸水溶液進行處理而製成氯化物形後,利用EPMA觀察氯化物離子之分布狀態。其結果可確認,氯化物離子不僅均勻分布於單塊體陰離子交換體之表面,而且亦均勻分布於內部,四級銨基係均勻導入至單塊體陰離子交換體中。Then, in order to confirm the distribution state of the quaternary ammonium group in the monolith anion exchanger, the monolith anion exchanger was treated with an aqueous hydrochloric acid solution to form a chloride form, and then the distribution state of the chloride ions was observed by EPMA. As a result, it was confirmed that chloride ions were not uniformly distributed on the surface of the monolith anion exchanger, but also uniformly distributed inside, and the quaternary ammonium group was uniformly introduced into the monolith anion exchanger.
<第2單塊體陰離子交換體之製造(參考例16及17)><Manufacture of second monolithic anion exchanger (Reference Examples 16 and 17)>
(具有共連續構造之單塊體之製造)(Manufacture of monolithic bodies with a co-continuous structure)
除將苯乙烯之使用量、交聯劑之使用量、有機溶劑之使用量、苯乙烯及二乙烯基苯含浸聚合時共存之單塊體中間體之多孔構造、交聯密度及使用量變更為表3所示之調配量以外,以與參考例15相同之方法製造具有共連續構造之單塊體。利用SEM觀察單塊體(乾燥體)之內部構造(未圖示),結果該單塊體係骨架及空孔分別三維性連續、且兩相纏繞之共連續構造。將其結果示於表3及表4中。In addition to the amount of styrene used, the amount of the crosslinking agent used, the amount of the organic solvent used, the porous structure of the monolithic intermediate which coexists in the styrene and divinylbenzene impregnation polymerization, the crosslinking density and the amount of use are changed to A monolith having a co-continuous structure was produced in the same manner as in Reference Example 15 except for the amount shown in Table 3. The internal structure (not shown) of the monolith (dry body) was observed by SEM, and as a result, the monolithic system skeleton and the pores were three-dimensionally continuous and a two-phase continuous continuous structure. The results are shown in Tables 3 and 4.
再者,藉由對上述參考例4~13及參考例16~17中所獲得之單塊體適當應用公知方法,例如利用參考例1或參考例2所示之方法,可導入陰離子交換基。又,藉由對參考例4~13及參考例16~17中所獲得之單塊體中導入有陰離子交換基之單塊體陰離子交換體以及參考例14及參考例15中所獲得之單塊體陰離子交換體適當應用公知方法,例如利用實施例1或實施例2所示之方法,可載持鉑族金屬奈米粒子。In addition, a known method can be suitably applied to the monoliths obtained in the above Reference Examples 4 to 13 and Reference Examples 16 to 17, and for example, the anion exchange group can be introduced by the method shown in Reference Example 1 or Reference Example 2. Further, the monolithic anion exchanger into which the anion exchange group was introduced into the monolith obtained in Reference Examples 4 to 13 and Reference Examples 16 to 17 and the monolith obtained in Reference Example 14 and Reference Example 15 were used. The bulk anion exchanger is suitably subjected to a known method, for example, by using the method shown in Example 1 or Example 2, the platinum group metal nanoparticles can be carried.
[實施例4][Example 4]
除溶解氯化鈀190 mg代替溶解氯化鈀270 mg以外,以與實施例1相同之方法於參考例1之單塊體陰離子交換體(第1單塊體陰離子交換體)上載持鈀奈米粒子,獲得第1鈀奈米粒子載持觸媒c。Palladium nanoparticles were supported on the monolithic anion exchanger (1st monolithic anion exchanger) of Reference Example 1 in the same manner as in Example 1 except that 190 mg of palladium chloride was dissolved instead of dissolving 270 mg of palladium chloride. The particles obtained the first palladium nanoparticle-carrying catalyst c.
載持於乾燥狀態之第1鈀奈米粒子載持觸媒c上之鈀奈米粒子之載持量為7.4重量%。將乾燥狀態之第1鈀奈米粒子載持觸媒c填充於內徑10 mm之管柱中,用於溶氧去除特性之評價。觸媒之填充層高為20 mm。此時,鈀奈米粒子相對於水濕潤狀態之樹脂體積之載持量為10.5 g-Pd/L-R。The amount of the palladium nanoparticle supported on the first palladium nanoparticle-carrying catalyst c in a dry state was 7.4% by weight. The first palladium nanoparticle-carrying catalyst c in a dry state was filled in a column having an inner diameter of 10 mm for evaluation of dissolved oxygen removal characteristics. The fill level of the catalyst is 20 mm. At this time, the loading amount of the palladium nanoparticle relative to the resin volume in the wet state of water was 10.5 g-Pd/L-R.
(觸媒之評價)(evaluation of catalyst)
向填充於內徑10 mm之管柱中之上述第1鈀奈米粒子載持觸媒c以SV=7500 h-1 通入經調整為溶氧濃度32 μg/L且溶氫濃度11 μg/L之超純水,進行測定直至管柱出口之處理水中之溶氧濃度穩定為止。其結果為,管柱出口之溶氧濃度降低至3.8 μg/L。The first palladium nanoparticle-carrying catalyst c filled in a column having an inner diameter of 10 mm was adjusted to have a dissolved oxygen concentration of 32 μg/L and a dissolved hydrogen concentration of 11 μg/at SV=7500 h -1 . The ultrapure water of L is measured until the dissolved oxygen concentration in the treated water at the outlet of the column is stabilized. As a result, the dissolved oxygen concentration at the outlet of the column was reduced to 3.8 μg/L.
[比較例3][Comparative Example 3]
於水分保有能力以OH形基準計為60~70%且為凝膠形之粒子狀強鹼性陰離子交換樹脂(Cl形)上,使鈀以水潤狀態載持910 mg-Pd/L-R而製作Cl形觸媒樹脂。除對該Cl形觸媒樹脂於上述內徑10 mm之管柱中以填充層高360 mm、SV 430之流速通水以外,以與實施例4相同之方法進行觸媒評價。其結果為,於處理水穩定之時間點的管柱出口溶氧濃度為4.1 μg/L。將實施例4與比較例3之評價結果示總結於表5中。The water-holding ability is 60 to 70% on a OH basis and is a gel-like particulate strong alkali anion exchange resin (Cl), and palladium is supported by 910 mg-Pd/LR in a hydrated state. Cl-shaped catalyst resin. Catalyst evaluation was carried out in the same manner as in Example 4 except that the Cl-type catalyst resin was passed through a water column having a height of 360 mm and a flow rate of SV 430 in a column having an inner diameter of 10 mm. As a result, the dissolved oxygen concentration at the outlet of the column at the time point when the treated water was stable was 4.1 μg/L. The evaluation results of Example 4 and Comparative Example 3 are summarized in Table 5.
實施例4中,儘管流速為SV 7500而非常高,且所載持之鈀金屬觸媒之單位質量之通水流速係實施例4多於比較例3,亦獲得與比較例3相同程度之溶氧濃度之處埋水。由此,若使用本發明之鉑族金屬載持觸媒,則即便為高流速且低樹脂層高亦可有效地去除溶氧,因此實現觸媒使用量之減少、裝置之小型化並同時實現溶出物之減少。In Example 4, although the flow rate was very high as SV 7500, and the flow rate per unit mass of the supported palladium metal catalyst was higher than that of Comparative Example 3, the same degree as that of Comparative Example 3 was obtained. Buried water at the oxygen concentration. Therefore, when the platinum group metal-supporting catalyst of the present invention is used, even if the flow rate is high and the resin layer is high, the dissolved oxygen can be effectively removed, thereby reducing the amount of catalyst used and miniaturizing the device and simultaneously achieving Reduction of the dissolution.
1...骨架相1. . . Skeleton phase
2...空孔相2. . . Empty hole phase
10...單塊體10. . . Monolithic body
11...圖像區域11. . . Image area
12...剖面所示之骨架部12. . . Skeleton part shown in the section
13...巨觀細孔13. . . Giant pore
20a、20b...洗淨前之電子零件20a, 20b. . . Electronic parts before washing
30a、30b...洗淨後之電子零件30a, 30b. . . Washed electronic parts
21、41...第1步驟21, 41. . . Step 1
22、42...第2步驟22, 42. . . Step 2
23、43...第3步驟23, 43. . . Step 3
24、44...第4步驟24, 44. . . Step 4
25、26、27、28...過氧化氫去除步驟25, 26, 27, 28. . . Hydrogen peroxide removal step
32...超純水32. . . Ultra-pure water
33...臭氧33. . . ozone
34、36...氫34, 36. . . hydrogen
35...氫氟酸及過氧化氫35. . . Hydrofluoric acid and hydrogen peroxide
45...第5步驟45. . . Step 5
46...第6步驟46. . . Step 6
47...第7步驟47. . . Step 7
48...第8步驟48. . . Step 8
49...第9步驟49. . . Step 9
50...第10步驟50. . . Step 10
51...第11步驟51. . . Step 11
52...第12步驟52. . . Step 12
62、63、64、65、66、67、68、69、70、71、72...洗淨水62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72. . . Washing water
圖1係第1單塊體之SEM圖像。Figure 1 is an SEM image of a first monolith.
圖2係表示第1單塊體陰離子交換體之表面之氯化物離子之分布狀態的EPMA圖像。Fig. 2 is an EPMA image showing the distribution state of chloride ions on the surface of the first monolith anion exchanger.
圖3係表示第1單塊體陰離子交換體之剖面(厚度)方向之氯化物離子之分布狀態的EPMA圖像。Fig. 3 is an EPMA image showing the distribution state of chloride ions in the cross-sectional (thickness) direction of the first monolith anion exchanger.
圖4係手動轉印有作為圖1之SEM圖像之剖面而表示之骨架部者。Fig. 4 is a view showing a skeleton portion which is manually transferred and has a cross section as an SEM image of Fig. 1.
圖5係表示第1鉑族金屬載持觸媒之鈀奈米粒子之分散狀態的TEM圖像。Fig. 5 is a TEM image showing a state of dispersion of palladium nanoparticles of a first platinum group metal-supporting catalyst.
圖6係示意性表示第2單塊體陰離子交換體之共連續構造的圖。Fig. 6 is a view schematically showing a co-continuous structure of a second monolith anion exchanger.
圖7係第2單塊體之SEM圖像。Figure 7 is an SEM image of the second monolith.
圖8係表示第2單塊體陰離子交換體之表面之氯化物離子之分布狀態的EPMA圖像。Fig. 8 is an EPMA image showing the distribution state of chloride ions on the surface of the second monolith anion exchanger.
圖9係表示第2單塊體陰離子交換體之剖面(厚度)方向之氯化物離子之分布狀態的EPMA圖像。Fig. 9 is an EPMA image showing the distribution state of chloride ions in the cross-sectional (thickness) direction of the second monolith anion exchanger.
圖10係表示第2鉑族金屬載持觸媒之鈀奈米粒子之分散狀態的TEM圖像。Fig. 10 is a TEM image showing a state of dispersion of palladium nanoparticles of a second platinum group metal-supporting catalyst.
圖11係參考例3之單塊體(公知品)之SEM圖像。Fig. 11 is an SEM image of a monolith (a known product) of Reference Example 3.
圖12係第2單塊體中間體之SEM圖像。Figure 12 is an SEM image of the second monolith intermediate.
圖13係本發明之電子零件之洗淨方法(I)之第一形態例之示意性流程圖。Fig. 13 is a schematic flow chart showing a first embodiment of the method (I) for cleaning an electronic component according to the present invention.
圖14係本發明之電子零件之洗淨方法(I)之第二形態例之示意性流程圖。Fig. 14 is a schematic flow chart showing a second embodiment of the cleaning method (I) of the electronic component of the present invention.
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