TWI474513B - Light emitting diode - Google Patents
Light emitting diode Download PDFInfo
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- TWI474513B TWI474513B TW99115706A TW99115706A TWI474513B TW I474513 B TWI474513 B TW I474513B TW 99115706 A TW99115706 A TW 99115706A TW 99115706 A TW99115706 A TW 99115706A TW I474513 B TWI474513 B TW I474513B
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Description
本發明是有關於一種發光二極體。The present invention relates to a light emitting diode.
隨著科技技術的進步,使得發光二極體及其相關應用愈加廣泛使用,更憑藉其具有效率高、壽命長、不易破損等傳統光源無法與之比較的優點,儼然成為21世紀的新型光源,提升日常生活上的便利性。With the advancement of technology, LEDs and their related applications have become more widely used, and they have become a new type of light source in the 21st century by virtue of their advantages of high efficiency, long life, and difficulty in damage. Improve the convenience of everyday life.
在目前發光二極體的製程中,係使用乾式蝕刻機把表面的P型層部分區域挖除,露出底下的N型層,再分別於在P及N型層上製作焊墊,從而電性連接至外部電壓源,使得電流可以導通而發光。In the current process of light-emitting diodes, a dry etching machine is used to remove a portion of the surface of the P-type layer to expose the underlying N-type layer, and then a pad is formed on the P- and N-type layers, thereby electrically Connected to an external voltage source so that the current can conduct and illuminate.
請同時參照第1A圖與第1B圖,第1A圖繪示習知技術中之一種發光二極體的上視圖,第1B圖繪示第1A圖之發光二極體沿1-1’線之剖面圖。如圖所示,發光二極體100包含一基板110、一N型層120、一P型層130、一N型焊墊140以及一P型焊墊150。N型層120位於基板110上,而P型層130位於N型層120上。N型焊墊140與P型焊墊150分別位於N型層120與P型層130上方,用以進行打線製程並且電性連接至外部電壓源。Please refer to FIG. 1A and FIG. 1B simultaneously. FIG. 1A is a top view of a light-emitting diode in the prior art, and FIG. 1B is a view showing the light-emitting diode of FIG. 1A along the line 1-1′. Sectional view. As shown, the LED 100 includes a substrate 110, an N-type layer 120, a P-type layer 130, an N-type pad 140, and a P-type pad 150. The N-type layer 120 is on the substrate 110, and the P-type layer 130 is on the N-type layer 120. The N-type pad 140 and the P-type pad 150 are respectively disposed above the N-type layer 120 and the P-type layer 130 for performing a wire bonding process and electrically connecting to an external voltage source.
然而,上述習知技術在小尺寸製程中,往往限縮P型層及N型層相接觸之PN接面,致使有效發光區顯得相對不足,並且於遮光效應的影響下,從而無法提供有效之亮度。However, the above-mentioned prior art techniques often limit the PN junctions in contact with the P-type layer and the N-type layer in a small-scale process, so that the effective light-emitting area appears to be relatively insufficient, and under the influence of the light-shielding effect, it cannot provide an effective effect. brightness.
有鑒於此,目前所需求的是一種可增加有效發光區以提升整體亮度的發光二極體,以提升其製程良率、降低成本,從而更可適切地整合於現今規格日趨縮小化的光源、多媒體及顯示電子產品中。In view of the above, what is needed is a light-emitting diode that can increase the effective light-emitting area to improve the overall brightness, thereby improving the process yield and cost, and thus more appropriately integrating the light source of the current specification, which is increasingly reduced. Multimedia and display electronics.
因此,本發明之一目的是在提供一種發光二極體,用以藉由將N型焊墊與P型焊墊配置於P型層上方,進而增加有效發光區,以降低製作成本以及提升整體發光亮度。Therefore, an object of the present invention is to provide a light-emitting diode for arranging an N-type pad and a P-type pad over a P-type layer, thereby increasing an effective light-emitting area, thereby reducing manufacturing cost and improving overall Luminous brightness.
本發明之一方面係提出一種發光二極體,至少包含一基板、一N型層、一P型層、一N型焊墊、一P型焊墊以及一絕緣層。N型層位於基板上,而P型層位於N型層上。N型焊墊包含一第一部以及一第二部,其中第一部位於N型層上,第二部與第一部相互連接,並且第二部延伸至P型層上方。P型焊墊位於P型層上。絕緣層位於N型焊墊與P型層之間。One aspect of the present invention provides a light emitting diode comprising at least a substrate, an N-type layer, a P-type layer, an N-type pad, a P-type pad, and an insulating layer. The N-type layer is on the substrate and the P-type layer is on the N-type layer. The N-type pad includes a first portion and a second portion, wherein the first portion is on the N-type layer, the second portion is interconnected with the first portion, and the second portion extends above the P-type layer. The P-type pad is located on the P-type layer. The insulating layer is located between the N-type pad and the P-type layer.
為了使本發明之敘述更加詳盡與完備,可參照所附之圖式及以下所述各種實施例,圖式中相同之號碼代表相同或相似之元件。另一方面,眾所週知的元件與步驟並未描述於實施例中,以避免造成本發明不必要的限制。In order to make the description of the present invention more complete and complete, reference is made to the accompanying drawings and the accompanying drawings. On the other hand, well-known elements and steps are not described in the embodiments to avoid unnecessarily limiting the invention.
請同時參照第2A圖及第2B圖,第2A圖繪示依照本發明一實施例之一種發光二極體的上視圖,第2B圖繪示第2A圖之發光二極體沿2-2’線之剖面圖。如圖所示,發光二極體200至少包含一基板210、一N型層220、一P型層230、一N型焊墊240、一P型焊墊250以及一絕緣層260。N型層220位於基板210上,而P型層230位於N型層220上。N型焊墊240包含一第一部242以及一第二部244,其中第一部242位於N型層220上,第二部244與第一部242相互連接,並且第二部244延伸至P型層230上方。P型焊墊250位於P型層230上。絕緣層260則位於N型焊墊240與P型層230之間。Please refer to FIG. 2A and FIG. 2B simultaneously. FIG. 2A is a top view of a light-emitting diode according to an embodiment of the present invention, and FIG. 2B is a second light-emitting diode of FIG. 2A along line 2-2'. Sectional view of the line. As shown, the LED 200 includes at least a substrate 210, an N-type layer 220, a P-type layer 230, an N-type pad 240, a P-type pad 250, and an insulating layer 260. The N-type layer 220 is on the substrate 210, and the P-type layer 230 is on the N-type layer 220. The N-type pad 240 includes a first portion 242 and a second portion 244, wherein the first portion 242 is on the N-type layer 220, the second portion 244 is interconnected with the first portion 242, and the second portion 244 is extended to P. Above the layer 230. The P-type pad 250 is located on the P-type layer 230. The insulating layer 260 is between the N-type pad 240 and the P-type layer 230.
於本發明之一實施例中,N型焊墊240之第二部244的面積相對大於N型焊墊240之第一部242的面積;於本發明之另一實施例,N型焊墊240在外觀上具有一L形。In one embodiment of the present invention, the area of the second portion 244 of the N-type pad 240 is relatively larger than the area of the first portion 242 of the N-type pad 240. In another embodiment of the present invention, the N-type pad 240 It has an L shape in appearance.
然而,藉由絕緣層260所形成之配置結構,可有效地將N型金屬焊墊240引導至P型層230上方,進而擴張增加N型層220與P型層230於基板210上的面積。所以,N型層220與P型層230相接處之PN接面的面積範圍得以大幅增加,從而提升當在發光二極體200的正負極兩端施予電壓,產生電流而致使更多電子與電洞相互結合,以增加其發光量。However, by the arrangement formed by the insulating layer 260, the N-type metal pad 240 can be effectively guided over the P-type layer 230, thereby expanding and increasing the area of the N-type layer 220 and the P-type layer 230 on the substrate 210. Therefore, the area of the PN junction at the junction of the N-type layer 220 and the P-type layer 230 is greatly increased, thereby increasing the voltage applied to the positive and negative terminals of the LED diode 200, generating a current and causing more electrons. Combined with the hole to increase the amount of light.
更進一步來說,絕緣層260包含一第一段262以及一第二段264。第一段262形成於N型焊墊240的第一部242與P形層230之間。第二段264連接第一段262,且形成於N型焊墊240的第二部244與P形層230之間。於本發明之一實施例中,絕緣層260之第二段264的面積相對大於絕緣層260之第一段262的面積。並且,於本發明之另一實施例中,絕緣層260之外觀上則呈現一L型。Furthermore, the insulating layer 260 includes a first segment 262 and a second segment 264. The first segment 262 is formed between the first portion 242 of the N-type pad 240 and the P-shaped layer 230. The second segment 264 is coupled to the first segment 262 and is formed between the second portion 244 of the N-type pad 240 and the P-shaped layer 230. In an embodiment of the invention, the second section 264 of the insulating layer 260 has an area that is relatively larger than the area of the first section 262 of the insulating layer 260. Moreover, in another embodiment of the present invention, the insulating layer 260 exhibits an L-shape in appearance.
另一方面,於本發明之一實施例中,絕緣層260材質為二氧化矽、二氧化鈦或三氧化二鋁之透明材料。這不僅能電性隔絕N型焊墊240與P型層230,以避免產生誤動作,造成發光二極體200的損毀,亦更可藉由其材質具有可透光性,讓PN接面經由導通後所產生的光,分別經由絕緣層260之第一段262以及一第二段264散出,進而提高其總體發光亮度。On the other hand, in an embodiment of the invention, the insulating layer 260 is made of a transparent material of ceria, titanium dioxide or aluminum oxide. This can not only electrically isolate the N-type pad 240 and the P-type layer 230, thereby avoiding malfunction, causing damage to the LED 201, and also enabling the PN junction to be turned on by the material having light transmissivity. The light generated thereafter is respectively emitted through the first segment 262 of the insulating layer 260 and a second segment 264, thereby increasing the overall luminance of the light.
於本發明之另一實施例中,絕緣層260之材質為一多層膜反射層或是一具有一透明層與一金屬反射層之複合材料,其藉由多層鍍膜技術與光學干涉原理,致使具有較高之反射率,則能夠將PN接面所產生之光線從發光二極體200的側面導出,如此可提高整體發光亮度。此外,其中複合材料中所使用的金屬材質則可以為鋁或銀。In another embodiment of the present invention, the insulating layer 260 is made of a multilayer film reflective layer or a composite material having a transparent layer and a metal reflective layer, which is caused by a multi-layer coating technique and an optical interference principle. With a higher reflectance, the light generated by the PN junction can be led out from the side of the LED 200, which improves the overall luminance. In addition, the metal material used in the composite material may be aluminum or silver.
另外,於本發明之一實施例中,N型焊墊與P型焊墊為金屬材質,其具有較佳之導電性以連接至外部電壓源。並且,於本發明之另一實施例中,N型焊墊240之第二部244的面積,相對大於N型焊墊240之第一部242的面積,提供充足之面積,以便利進行打線。In addition, in an embodiment of the invention, the N-type pad and the P-type pad are made of a metal material, which has better conductivity for connection to an external voltage source. Moreover, in another embodiment of the present invention, the area of the second portion 244 of the N-type pad 240 is relatively larger than the area of the first portion 242 of the N-type pad 240, providing a sufficient area to facilitate wire bonding.
如此一來,藉由本發明之結構設計,可有效提升發光二極體200之整體發光亮度,特別是實行於小晶粒尺寸上,其效果最為顯著。舉例來說,在製造150x240(um 2 )之小尺寸的藍光LED晶粒時,一般係需在P型層與N型層上製作直徑為90(um )之打線區,就先前製程來說,則必須使用乾式蝕刻機把表面的P型層部分區域挖除,露出底下的N型層,再分別於在P及N型層上製作焊墊,以提供充足面積來予以進行打線製作,如第1A圖與第1B圖所示。這往往侷限住小尺寸藍光LED之有效發光區的面積,使其僅具有約23,000(um 2 )之有效發光區的面積,往往致使無法提供有效之亮度。然而,憑藉本發明上述之發光二極體的設計結構,不僅可有效地增加PN接面,使得有效發光區的面積提高百分之二十至29,000(um 2 ),同時更是能夠提高側光輸出。所以,相較於先前一般製作方式,將可確切地改善提升發光二極體於小尺寸製程中的整體亮度,進而可整合於現今日趨規格縮小化的光源或顯示產品中。In this way, the overall design of the light-emitting diode 200 can be effectively improved by the structural design of the present invention, and the effect is most remarkable. For example, in the fabrication of 150×240 ( um 2 ) small-sized blue LED dies, it is generally required to make a 90 ( um ) diameter wiring region on the P-type layer and the N-type layer. The dry etching machine must be used to remove the P-type layer portion of the surface to expose the underlying N-type layer, and then make solder pads on the P and N-type layers respectively to provide sufficient area for wire bonding, such as Figure 1A and Figure 1B show. This tends to limit the area of the effective illuminating area of the small-sized blue LED to have an area of only about 23,000 ( um 2 ) of effective illuminating area, often resulting in an inability to provide effective brightness. However, with the above-mentioned design structure of the light-emitting diode of the present invention, not only the PN junction can be effectively increased, but the area of the effective light-emitting area is increased by 20% to 29,000 ( um 2 ), and at the same time, the side light can be improved. Output. Therefore, compared with the previous general production method, the overall brightness of the light-emitting diode in the small-size process can be improved, and thus can be integrated into the light source or display product which is now downsized.
雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.
100...發光二極體100. . . Light-emitting diode
110...基板110. . . Substrate
120...N型層120. . . N-type layer
130...P型層130. . . P-type layer
140...N型焊墊140. . . N type pad
150...P型焊墊150. . . P type pad
200...發光二極體200. . . Light-emitting diode
210...基板210. . . Substrate
220...N型層220. . . N-type layer
230...P型層230. . . P-type layer
240...N型焊墊240. . . N type pad
242...第一部242. . . First
244...第二部244. . . Second part
250...P型焊墊250. . . P type pad
260...絕緣層260. . . Insulation
262...第一段262. . . First paragraph
264...第二段264. . . Second paragraph
為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下:The above and other objects, features, advantages and embodiments of the present invention will become more apparent and understood.
第1A圖係繪示習知技術中之一種發光二極體的上視圖FIG. 1A is a top view showing a light-emitting diode of the prior art.
第1B圖係繪示繪示第1A圖之發光二極體沿1-1’線之剖面圖。Fig. 1B is a cross-sectional view showing the light-emitting diode of Fig. 1A taken along line 1-1'.
第2A圖係繪示依照本發明一實施例之一種發光二極體的上視圖。2A is a top view of a light emitting diode in accordance with an embodiment of the present invention.
第2B圖繪示第2A圖之發光二極體沿2-2’線之剖面圖。Fig. 2B is a cross-sectional view of the light-emitting diode of Fig. 2A taken along line 2-2'.
200...發光二極體200. . . Light-emitting diode
210...基板210. . . Substrate
220...N型層220. . . N-type layer
230...P型層230. . . P-type layer
240...N型焊墊240. . . N type pad
242...第一部242. . . First
244...第二部244. . . Second part
250...P型焊墊250. . . P type pad
260...絕緣層260. . . Insulation
262...第一段262. . . First paragraph
264...第二段264. . . Second paragraph
Claims (9)
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US20090261373A1 (en) * | 2006-05-19 | 2009-10-22 | Shum Frank T | Low optical loss electrode structures for leds |
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US20090261373A1 (en) * | 2006-05-19 | 2009-10-22 | Shum Frank T | Low optical loss electrode structures for leds |
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