TWI474369B - - Google Patents
Info
- Publication number
- TWI474369B TWI474369B TW103102865A TW103102865A TWI474369B TW I474369 B TWI474369 B TW I474369B TW 103102865 A TW103102865 A TW 103102865A TW 103102865 A TW103102865 A TW 103102865A TW I474369 B TWI474369 B TW I474369B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310557325.5A CN103592693A (en) | 2013-11-11 | 2013-11-11 | Rectifying device and plasma equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI474369B true TWI474369B (en) | 2015-02-21 |
| TW201519281A TW201519281A (en) | 2015-05-16 |
Family
ID=50082902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103102865A TW201519281A (en) | 2013-11-11 | 2014-01-27 | Rectifying device and plasma equipment |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103592693A (en) |
| TW (1) | TW201519281A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030183336A1 (en) * | 2002-03-27 | 2003-10-02 | Jeon-Beom Lee | Plasma apparatus including plasma-measuring device |
| TWM439065U (en) * | 2012-04-30 | 2012-10-11 | Univ Kao Yuan | Eccentric deviation correction device |
| CN202530157U (en) * | 2012-02-23 | 2012-11-14 | 珠海宝丰堂电子科技有限公司 | Coiled material plasma treatment device with correcting function |
| CN103264920A (en) * | 2013-05-24 | 2013-08-28 | 珠海宝丰堂电子科技有限公司 | Deviation rectifying device capable of adjusting tension in vacuum plasma environment and method thereof |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006128485A (en) * | 2004-10-29 | 2006-05-18 | Asm Japan Kk | Semiconductor processing apparatus |
| CN102605338A (en) * | 2012-02-23 | 2012-07-25 | 珠海宝丰堂电子科技有限公司 | Plasma processing equipment having deviation rectifying function and used for processing rolled material |
| CN203595821U (en) * | 2013-11-11 | 2014-05-14 | 珠海宝丰堂电子科技有限公司 | Error correcting device and plasma equipment |
-
2013
- 2013-11-11 CN CN201310557325.5A patent/CN103592693A/en active Pending
-
2014
- 2014-01-27 TW TW103102865A patent/TW201519281A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030183336A1 (en) * | 2002-03-27 | 2003-10-02 | Jeon-Beom Lee | Plasma apparatus including plasma-measuring device |
| CN202530157U (en) * | 2012-02-23 | 2012-11-14 | 珠海宝丰堂电子科技有限公司 | Coiled material plasma treatment device with correcting function |
| TWM439065U (en) * | 2012-04-30 | 2012-10-11 | Univ Kao Yuan | Eccentric deviation correction device |
| CN103264920A (en) * | 2013-05-24 | 2013-08-28 | 珠海宝丰堂电子科技有限公司 | Deviation rectifying device capable of adjusting tension in vacuum plasma environment and method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103592693A (en) | 2014-02-19 |
| TW201519281A (en) | 2015-05-16 |