TWI472852B - Method of manufacturing a patterned retarder - Google Patents

Description

Method for manufacturing patterned retardation film

The present invention relates to a display device, and more particularly to a method of manufacturing a retardation film for a three-dimensional image display device.

Recently, three-dimensional image display devices have been researched and developed as users demand that display devices display realistic three-dimensional images. In general, a three-dimensional stereoscopic image is displayed by the eye using the principle of stereoscopic vision. Therefore, a three-dimensional image display device that displays a stereoscopic effect image by using a distance between two eyes, for example, 65 mm, has been proposed. When different two-dimensional images of the three-dimensional image display device are respectively seen by the left eye and the right eye, the different two-dimensional images are transmitted to the brain and combined by the brain into a three-dimensional image with depth effect and realism. This phenomenon is called a stereo plane method.

For example, the three-dimensional image display device includes a display panel to display an image, a pattern retardation film attached to the outside of the display panel, and glasses for selectively transmitting an image passing through the pattern retardation film from the display panel.

The pattern retardation film enables left and right eye images from the two-dimensional image of the display panel to have mutually different phases. For example, the pattern retardation film causes the left-eye image to be polarized to the left and the right-eye image to be polarized to the right. In other words, the manufacturing process of the pattern retardation film is extremely complicated for this purpose.

1A to 1G are cross-sectional views showing the steps of a method of manufacturing a pattern retardation film according to the prior art.

In Fig. 1A, a high molecular substance which reacts with ultraviolet light (UV), and thus its polymer chain is aligned along the orientation, and is applied to the substrate 10 using a coating device 90, whereby The light directing layer 20 is formed on the entire surface of the substrate 10. The light directing layer 20 contains a plurality of disordered polymer chains (not shown).

In Fig. 1B, the substrate 10 on which the light directing layer 20 is contained is disposed on a dried sheet 95 having a surface temperature of from 90 degrees Celsius to 130 degrees Celsius. The drying process of heating the substrate 10 for several seconds to several minutes is performed, whereby the light directing layer 20 is dried and the solvent in the light directing layer 20 is removed.

In FIG. 1C, the first mask 70 including the light transmitting portion TA and the light blocking portion BA is disposed above the tantalum cured light directing layer 20. Then, the first polarized UV light is irradiated to the cured light directing layer 20 through the first mask 70, thereby forming a first array region 21, the first array region 21 being exposed to the first polarized UV light, and Optionally aligned in the first direction. That is, the first polarized UV light is irradiated to a portion of one of the left-eye image pixel column and the right-eye image pixel column, and the polymer chain (not shown) of the portion is aligned along the first direction. Conversely, in a portion of the light directing layer 20 that is not exposed to the first polarized UV light, the polymer chain (not shown) remains unordered.

Therefore, due to the selective irradiation of the first polarized UV light, the light directing layer 20 includes: a first alignment region 21 in which the polymer chains have been well aligned in the first direction; and an unaligned region in which the polymer chain Unordered arrangement.

In FIG. 1D, a second photomask 72 including a light transmitting portion TA and a light blocking portion BA is disposed above the cured photo alignment layer 20, and the cured photo alignment layer 20 has a first alignment region 21 and no alignment. region. Here, the light blocking portion BA corresponds to the first array region 21, and the light transmitting portion TA corresponds to the unaligned region. Then, the second polarized UV light is irradiated to the light directing layer 20 through the second mask 72, thereby forming the second array region 23, and the second array region 23 corresponds to the light transmitting portion TA of the second mask 72, and The polymer chains are arranged in a second direction perpendicular to the first direction.

Then, in FIG. 1E, a liquid crystal material which can be hardened by UV light, for example, a reactive mesogen (RM), is applied to the first alignment region 21 and the second alignment region 23 with a predetermined thickness. The light directs layer 20, thereby forming a reactive liquid crystal layer 40.

Here, the reactive liquid crystal layer 40 includes the first phase portion 44 and the second phase portion 46 due to the light directing layer 20. In particular, since the polymer chains are aligned along the first direction, the reactive liquid crystal molecules 42 corresponding to the reactive liquid crystal layer 40 of the first alignment region 21 are aligned, thereby forming the first phase portion 44, and due to the high The molecular chains are arranged along the second direction, and the reactive liquid crystal molecules 42 corresponding to the reactive liquid crystal layer 40 of the second alignment region 23 are aligned, thereby forming the second phase portion 46.

In the first F diagram, the non-polar ultraviolet light is irradiated onto the reactive liquid crystal layer 40 including the first phase portion 44 and the second phase portion 46 in Fig. 1E, whereby the reactive liquid crystal layer 40 is cured.

In the 1Gth diagram, the substrate 10 including the reactive liquid crystal layer 40 is cured by the unpolarized UV light thereon and loaded into the curing device 96. The substrate 10 is exposed to an environment having a temperature of 50 degrees Celsius to 100 degrees Celsius for several minutes to several tens of minutes, and then the reactive liquid crystal layer 40 hardened by UV light is cured to further harden it.

By performing the curing process such as the UV irradiation and heating, the reactive liquid crystal layer 40 includes: a first phase pattern 50 in which the reactive liquid crystal molecules 42 are aligned along the first direction, and a second phase pattern 52, wherein The reactive liquid crystalline molecules 42 are aligned along a second direction that is perpendicular to the first direction. The pattern retardation film 1 is completed by the above process.

However, as described above, since the coating material is applied to the photo-alignment layer 20, the photo-alignment layer 20 is dried and cured, the UV light is separately exposed, the reactive liquid crystal layer 40 is applied, and the UV-curable and cured reactive liquid crystal layer 40 is applied. The manufacturing process of the conventional pattern retardation film 1 is very complicated. These lead to an increase in manufacturing costs.

Accordingly, the present invention is directed to a method of fabricating a patterned retardation film that substantially obviates one or more problems due to the limitations and disadvantages of the prior art.

It is an object of the present invention to provide a method of manufacturing a pattern retardation film to simplify the manufacturing process and reduce manufacturing costs.

Additional features and advantages of the invention will be set forth in the description which follows, These and other advantages of the present invention will be realized and attained by the <RTIgt;

In order to achieve these and other advantages in accordance with the objectives of the embodiments of the present invention, as generally described generally, a method of fabricating a patterned retardation film includes: forming a phase difference on a substrate by coating a retardation film material a film material layer; drying the phase difference film material layer at a first temperature; exposing the phase difference film material layer to a linear polarization UV, wherein the phase difference film material layer has an optical anisotropy; In a second temperature at a higher temperature, the retardation film material layer is heat treated to increase the optical anisotropy of the retardation film material layer.

It is to be understood that the foregoing general description and claims

Specific embodiments of the present invention will now be described in detail by reference to the drawings.

Fig. 2 is a perspective view showing a polarized glasses type three-dimensional image display device according to the present invention.

In the second embodiment, a polarized glasses type three-dimensional image display device 110 according to the present invention includes: a display panel 120 for displaying an image; a polarizing film 150 on the display panel 120; and a pattern retardation film 160 at the polarizing film 150. on.

The display panel 120 includes a display area DA that substantially displays an image, and a non-display area NDA between adjacent display areas DA. The display area DA includes a left-eye horizontal pixel line H1 and a right-eye horizontal pixel line Hr.

In the content of the figure, the left-eye horizontal pixel line H1 displaying the left-eye image and the right-eye horizontal pixel line Hr displaying the right-eye image are alternately arranged along the vertical direction of the display panel 120. Red, green, and blue sub-pixels R, G, and B are sequentially arranged in each of the left-eye horizontal pixel line H1 and the right-eye horizontal pixel line Hr.

As the display panel 120, a flat panel display such as a liquid crystal display panel and an organic electroluminescence display panel can be used.

The polarizing film 150 changes the left-eye image and the right-eye image displayed by the display panel 120 into a linearly polarized left-eye image and a linear-polarized right-eye image, and transmits the linearly polarized left-eye image and the linear image. The polarized right eye image is to the pattern retardation film 160.

The pattern retardation film 160 includes a left-eye retardation film R1 and a right-eye retardation film Rr. The left-eye retardation film R1 and the right-eye retardation film Rr correspond to the left-eye horizontal pixel line H1 and the right-eye horizontal pixel line Hr, respectively, and in the case of the figure, the left-eye retardation film R1 and the right-eye retardation film Rr is alternately arranged along the vertical direction of the display panel 120. The left-eye retardation film R1 changes the linear polarized light to the left circularly polarized light, and the right-eye retardation film Rr changes the linear polarized light to the right circularly polarized light.

Therefore, when passing through the polarizing film 150, the left-eye image displayed by the left-eye horizontal pixel line H1 of the display panel 120 is linearly polarized, and when passing through the left-eye retardation film R1 of the pattern retardation film 160, the left circular bias is The left eye image displayed by the left eye horizontal pixel line H1 of the display panel 120 is then transmitted to the viewer. When passing through the polarizing film 150, the right-eye image displayed by the right-eye horizontal pixel line Hr of the display panel 120 is linearly polarized, and when passing through the right-eye retardation film Rr of the pattern retardation film 160, the right circularly polarized by the display panel The right eye image displayed by the right eye horizontal pixel line Hr of 120 is then transmitted to the viewer.

The polarized glasses 180 worn by the viewer include a left eye lens 182 and a right eye lens 184. The left-eye lens 182 transmits only the left circularly polarized light, and the right-eye lens 184 transmits only the right circularly polarized light.

Therefore, in the images transmitted to the viewer, the left-circumferential left-eye image is transmitted to the viewer's left eye through the left-eye lens 182, and the right-circle-polarized right-eye image passes through the right-eye lens 184. Transfer to the viewer's right eye. The viewer combines the left eye image and the right eye image respectively transmitted to the left and right eyes, and feels a three-dimensional stereoscopic image.

Here, the pattern retardation film 160 of the present invention does not include an alignment layer. Referring to FIGS. 3A to 3E, a method of manufacturing the pattern retardation film 160 will be described below.

3A to 3E are cross-sectional views showing the steps of a method of manufacturing a pattern retardation film according to a first embodiment of the present invention; in FIG. 3A, a liquid crystal type retardation film material using a coating device such as a spin coating device On the transparent insulating substrate 210, a phase difference film material layer 220 having a thickness of about 0.5 μm to about 2 μm is formed on substantially the entire surface of the substrate 210. Here, when the retardation film material is spin-coated, the rotation speed may be about 500 rpm, and the coating time may be about 30 seconds.

Meanwhile, when the retardation film material is dissolved in a solvent to form a solution, the retardation film material may have a viscosity of about 1 mPa ‧ s to about 50 mPa ‧ s.

In Fig. 3B, the substrate 210 on which the retardation film material layer 220 is contained is disposed on a drying device such as a hot plate (not shown) having a surface temperature of about 80 degrees Celsius. The substrate 210 is heated for about two minutes, whereby the solvent in the retardation film material layer 220 is removed, and the retardation film material layer 220 is dried. This can be referred to as a drying process.

In FIG. 3C, the first light shield 290 including the light transmitting portion TA and the light blocking portion BA is disposed in parallel on the substrate 210, and the substrate 210 has a retardation film material layer 220 dried using the drying device. The light transmitting portion TA and the light blocking portion BA are stripe-shaped and alternate with each other.

Then, the first polarized UV light is irradiated onto the substrate 210 having the pre-baked retardation film material layer 220 thereon through the first mask 290, and the phase difference film material layer corresponding to the light transmitting portion TA of the first mask 290 220 is exposed to the first polarized UV light. At this time, the first polarized UV light has an intensity of about 4 mW/cm ² , a wavelength of about 313 ± 10 nm, and the energy of the first polarized UV light may be about 4 mJ/cm ² to about 40 mJ/cm ² .

In the 3D diagram, after the first mask 290 in FIG. 3C is removed, the substrate 210 having the phase difference film material layer 220 exposed thereon to the first polarized UV light is rotated by about 90 degrees. Then, a second mask 292 including stripe-shaped light-transmissive portions TA and stripe-shaped light-blocking portions BA which alternate with each other is disposed over the phase difference film material layer 220 exposed to the first polarized UV light.

At this time, the second mask 292 is disposed such that the light blocking portion BA correspondingly and completely shields the first region of the phase difference film material layer 220 exposed in the first polarized UV light, and the light transmitting portion TA corresponds to not being exposed to A second region of the phase difference film material layer 220 in the first polarized UV light.

Then, the second polarized UV light is irradiated to the retardation film material layer 220 through the second mask 292. At this time, the second polarized UV light has an intensity of about 4 mW/cm ² , a wavelength of about 313 ± 10 nm, and the energy of the second polarized UV light may be about 4 mJ/cm ² to about 40 mJ/cm ² .

In FIG. 3E, the substrate 210 including the retardation film material layer 220 on which the first polarized UV light and the second polarized UV light are exposed is disposed in a curing device 296 having an internal temperature of about 140 degrees Celsius. For example, the oven is then cured of the retardation film material layer 220 for about 10 minutes, thereby completing the pattern retardation film 201. The curing process of the retardation film material layer 220 using the curing device 296 may be referred to as a heat treatment process.

After the heat treatment process, the retardation film material layer 220 may have a phase difference in a direction perpendicular to the irradiation direction of the polarized UV light. That is, according to the present invention, the retardation film material layer 220 for the pattern retardation film 201 can maintain the same orientation until it is exposed to the polarized UV light, and when the heat treatment process is performed after the polarized UV light is irradiated The retardation film material layer 220 may have an anisotropy. Since the first polarized UV light and the second polarized UV light have different polarization directions, the retardation film material layer 220 includes a first phase pattern 222 and a second phase pattern 224, which have different arrangements to follow The different directions of the first region and the second region are anisotropic, and the linear polarized light is changed to the left circularly polarized light and the right circularly polarized light, respectively.

As described above, the pattern retardation film 201 is manufactured in accordance with the present invention, and a light alignment layer is not required. Therefore, compared with the prior art, since the steps of coating the light directing material and drying and curing the light directing material are not performed, the manufacturing process is simplified and the manufacturing cost is reduced.

Moreover, according to the first embodiment of the present invention, the manufactured pattern retardation film has a phase difference value different from a desired value.

Fig. 4 is a graph showing the phase difference value of the pattern retardation film depending on the UV energy according to the first embodiment of the present invention.

In Fig. 4, in accordance with a first embodiment of the present invention, the patterned retardation film produced has a maximum phase difference of less than 60 nm which is less than about 125 nm, i.e., half of the phase difference of the λ/4 plate.

This phase difference depends on the refractive index as well as the thickness. Since the refractive index of the pattern retardation film according to the present invention is affected by the UV energy and the curing temperature, and the thickness is affected by the rotational speed during the spin coating process, the phase difference value may vary depending on the manufacturing process.

Referring to Figures 5A to 5F, a method of manufacturing a pattern retardation film according to a second embodiment of the present invention will be described hereinafter. 5A to 5F are cross-sectional views showing the steps of a method of manufacturing a pattern retardation film according to a second embodiment of the present invention.

In FIG. 5A, the liquid crystal type retardation film material is coated on the transparent insulating substrate 310 using a spin coating device, and then the phase difference film material layer 320 having a thickness of about 0.5 μm to about 2 μm is formed on the substrate 310. On the entire surface. Here, the solid content of the excluded solvent has a concentration of from about 10% by weight to about 25% by weight.

The rotational speed and time of the spin coating apparatus are important factors for making the retardation film material layer 320 have a uniform thickness.

Fig. 6 is a graph showing the rotational speed depending on the time of spin coating in the method of manufacturing the pattern retardation film according to the second embodiment of the present invention. In Fig. 6, in order to uniformly apply the retardation film material, the rotation is started, and the first time t1 is sufficiently used until the rotation speed is increased and the spin coating optimum rotation speed R1 is reached. For the second time t2-t1, spin coating is performed at the optimum rotational speed R1. Then, for the third time t3-t2, the rotation speed is lowered, and the spin coating is stopped. At this time, the optimum rotational speed R1 of the desired spin coating is about 700 rpm to about 5000 rpm, the first time t1 is about 10 seconds, the second time of spin coating is t2-t1 about 10 seconds to about 30 seconds, and the third Time t3-t2 is about 2 seconds.

The rotational speed R1 depends on the size of the substrate 310. As the size of the substrate 310 increases, the rotational speed R1 decreases. For example, when the size of the substrate is 50 mm × 50 mm, the rotational speed R1 of the spin coating may be about 4000 rpm. When the size of the substrate is about 370 mm x 470 mm, the rotational speed R1 of the spin coating may be about 1100 rpm.

In Fig. 5B, the substrate 310 on which the retardation film material layer 320 is contained is placed in the vacuum apparatus 400, and then the process of drying the retardation film material layer 320 is performed under vacuum for about 60 seconds. This can be referred to as a vacuum drying process. At this time, in the vacuum device 400, an advantageous pressure may be about 0.1 to 10 torr. Performing this vacuum drying step helps to remove the solvent prior to the drying process.

In Fig. 5C, the substrate 310 on which the vacuum dried retardation film material layer 320 is contained is placed on a drying device having a surface temperature of about 90 degrees Celsius, for example, a hot plate (not shown). The substrate 310 is heated for about 1 minute to about 30 minutes, whereby the solvent in the retardation film material layer 320 is removed. This can be referred to as the drying process.

In FIG. 5D, the first mask 390 including the light transmitting portion TA and the light blocking portion BA are disposed in parallel on the substrate 210, and the substrate 310 has a retardation film material layer 320 dried using the drying device. The light transmitting portion TA and the light blocking portion BA are stripe-shaped and alternate with each other.

Then, the first polarized UV light is irradiated onto the substrate 310 having the dried retardation film material layer 320 through the first mask 390, and the phase difference film material layer corresponding to the light transmitting portion TA of the first mask 390 320 is exposed to the first polarized UV light. At this time, the first polarized UV light has an intensity of about 4 mW/cm ² , a wavelength of about 313 ± 10 nm, and the energy of the first polarized UV light may be about 100 mJ/cm ² to about 500 mJ/cm ² .

In FIG. 5E, after the first mask 390 in FIG. 5D is removed, the substrate 310 having the phase difference film material layer 320 exposed to the first polarized UV light is rotated by about 90 degrees. Then, a second mask 392 including stripe-shaped light-transmissive portions TA and stripe-shaped light-blocking portions BA which alternate with each other is disposed over the phase difference film material layer 320 exposed to the first polarized UV light.

At this time, the second mask 392 is disposed such that the light blocking portion BA corresponds and completely shields the first region of the phase difference film material layer 320 exposed to the first polarized UV light, and the light transmitting portion TA corresponds to and completely shields the light. A second region of the retardation film material layer 320 that is exposed to the first polarized UV light.

Then, the second polarized UV light is irradiated to the retardation film material layer 320 through the second mask 392. At this time, the second polarized UV light may have an intensity of about 4 mW/cm ² , a wavelength of about 313 ± 10 nm, and the energy of the second polarized UV light may be about 100 mJ/cm ² to about 500 mJ/cm ² .

Here, the first polarized UV light and the second polarized UV light may have the same polarization direction. However, the first and second polarized UV lights having different polarization directions may also be used, and in this case, the step of rotating the substrate by 90 degrees may not be necessary.

In FIG. 5F, the substrate 310 on which the retardation film material layer 320 exposed to the first and second polarized UV lights is disposed is cured at an internal temperature of about 80 degrees Celsius to about 150 degrees Celsius. Within device 396, for example, an oven. Then, the retardation film material layer 320 is exposed to a curing temperature of about 80 degrees Celsius to about 150 degrees Celsius, advantageously about 140 degrees Celsius, put in about 20 minutes and cured, thereby completing the pattern retardation film 301. The curing process using the retardation film material layer 320 of the curing device 396 may be referred to as a heat treatment process.

After the heat treatment process, the retardation film material layer 320 may have a phase difference in a direction along an irradiation direction of the vertical polarization UV light. That is, according to the present invention, the retardation film material layer 320 for the pattern retardation film 301 can maintain the same orientation until it is exposed to the polarized UV light, and the heat treatment process is performed after the polarized UV light is irradiated. The retardation film material layer 320 may have an anisotropy. The retardation film material layer 320 includes a first phase pattern 322 and a second phase pattern 324 having different arrangements to follow along the first and second polarized UV light having the property. The different directions of the region and the second region are anisotropic, and the linear polarized light is changed to the left circular apolar light and the right circular polarized light, respectively.

Therefore, in the second embodiment of the present invention, the vacuum drying process is increased, and each process is performed under predetermined conditions, whereby a desired phase difference value can be obtained.

Fig. 7 is a graph showing the phase difference value of the pattern retardation film depending on the UV energy according to the second embodiment of the present invention. Table 1 shows the phase difference value of the pattern retardation film measured at the apex, midpoint and bottom points (P1, P2, P3) of the center of the substrate 310 depending on the UV energy according to the second embodiment.

Thus, it is understood that the pattern retardation film according to the second embodiment of the present invention has a phase difference value of 125 nm corresponding to λ/4.

In the meantime, the pattern retardation film can be produced under the following conditions: a substrate having a size of about 50 mm × 50 mm, a solid content concentration of about 20% by weight, a rotation speed of 4000 rpm, and a spin coating of a retardation film material for about 30 seconds. To form a retardation film material layer, vacuum-dry the retardation film material layer at a pressure of about 0.2 Torr for about 60 seconds, and dry the retardation film material layer at a temperature of about 90 degrees Celsius, the first polarized UV light. And the second polarized UV light has an intensity of about 4 mW/cm ² and a wavelength of about 313±10 nm, which is irradiated to the phase difference film material layer, such that the energy of the first polarized UV light is about 100 mJ/cm ² to about 500 mJ. /cm ² and heat-treating the retardation film material layer at a temperature of about 140 degrees Celsius for about 20 minutes. Here, the pattern retardation film may have a phase difference value of about 130 nm.

Referring to Fig. 8, a method of manufacturing a pattern retardation film according to a third embodiment of the present invention will be described hereinafter.

Fig. 8 is a schematic view for explaining a manufacturing process of a pattern retardation film according to a third embodiment of the present invention.

In Fig. 8, a system for manufacturing a pattern retardation film according to a third embodiment of the present invention includes a substrate transfer device 410, a coating device 420, a drying device 430, an exposure device 440, and a heat treatment device 450. When the substrate 510 sequentially passes through the coating device 420, the drying device 430, the exposure device 440, and the heat treatment device 450 by the substrate transfer device 410, the substrate 510 is subjected to a coating process of a uniform coating solution, a drying process of removing the solution, and a linearity of irradiation. The exposure process of the polarized light and the heat treatment process of heating at a predetermined temperature, and thereby the pattern retardation film 520 is formed on the substrate 510. At this time, the substrate transfer device 410 may include a conveyor belt and a roller, and the system may be of an axial type.

The substrate 510 is transferred to the coating device 420 by the substrate transfer device 410, and then the coating process of coating the retardation film material is performed, whereby the retardation film material layer 520a is formed on the substrate 510. Here, a plurality of coating methods can be used, and a coating method which can form a uniform film having a thickness of less than 5 μm is preferably used. For example, a spin coating method, a slit coating method, a doctor blade forming method, a spin and slit coating method, a tape coating method, or a cast coating method can be used.

Preferably, the substrate 510 is transparent in the visible light range and comprises glass, plastic, polymethyl methacrylate, polycarbonate, polyvinyl chloride, triacetyl cellulose (TAC) or cyclic olefin polymerization. Cyclo olefin polymer (COP). When the substrate is a plastically strong TAC or COP, a slit coating method or a tape coating method can be satisfactorily used, so that the substrate 510 can be free from wrinkles.

Alternatively, the polarizing film 150 of the display device 110 in FIG. 2 can be used as the substrate 510.

Here, the retardation film material has light directivity and photosensitivity. The retardation film material contains a photosensitive functional group which exhibits optical anisotropy upon linear polarized light irradiation, and a liquid crystal polymer, a liquid crystal monomer, an oligomer or a liquid crystal polymer having a liquid crystal functional group, a liquid crystal monomer, A mixture of oligomers exhibiting liquid crystal properties over a range of predetermined temperatures. That is, in addition to the photosensitive functional group, the retardation film material may contain only a monomer or an oligomer, or a mixture of a polymer and an oligomer. When the linear polarized light is irradiated, photoisomerization occurs, and the retardation film material has relatively low optical anisotropy. The optical anisotropy of the retardation film material can be further improved by a heat treatment process at a temperature higher than a predetermined temperature. Further, after exposure to linear polarized light, the retardation film material has a phase difference axis due to the optical anisotropy, and the phase difference axis is perpendicular to a polarization axis of the linear polarized light. The phase difference axis formed by the first exposure may vary due to the second exposure.

Meanwhile, the retardation film material may include leveling additives for planarization as well as other additives.

Then, the substrate 510 containing the retardation film material layer 520a is transferred to the drying device 430 by the substrate transfer device 410, and a drying process is performed.

This drying process removes the solvent in the retardation film material layer 520a and is performed at a relatively low temperature so that the retardation film material layer 520a is not affected by heat. In the drying process, a hot plate or an oven may be used, or natural drying may be performed. Advantageously, the drying process can be performed by thermal radiation or thermal convection using a far infrared heater or oven. During the drying process, the temperature may range from 25 degrees Celsius to 80 degrees Celsius. Advantageously, the drying process can be carried out at 40 degrees Celsius to 70 degrees Celsius for 30 seconds to 30 minutes.

The substrate 510 containing the dried retardation film material layer 520a is transferred into the exposure device 440 by the substrate transfer device 410, and an exposure process is performed, thereby forming a pattern retardation film having the first phase pattern 522 and the second phase pattern 524. 520.

This exposure process enables the retardation film material layer 520a to have optical anisotropy by irradiating linear polarized light. The linear polarized light may have a wavelength of 200 nm to 400 nm. Preferably, the linearly polarized light may have a wavelength in the range of 280 nm to 350 nm. At this time, the exposure amount, that is, the exposure energy, may be 1 mJ/cm ² to 1000 mJ/cm ² . Advantageously, the exposure energy may range from 2 mJ/cm ² to 500 mJ/cm ² such that the exposed retardation film material layer 520a has the greatest anisotropy.

According to the purpose, in the exposure process, two exposure steps are performed at the polarized light having different polarization axes, and thus two regions having different phase difference axes are formed in the retardation film material layer 520a. At this time, one or two photomasks can be used for patterning, which will be explained later.

The substrate 510 having the pattern retardation film 520 is transferred to the heat treatment device 450, and a heat treatment process is performed.

This heat treatment process enhances the optical anisotropy of the pattern retardation film 520. During the heat treatment, heat is not directly applied to the pattern retardation film 520, so that the pattern retardation film 520 is not affected by heat. Therefore, the fogging phenomenon can be prevented from causing the pattern retardation film 520 to become blurred and opaque, and a transparent film in the visible light range can be obtained. Advantageously, the heat treatment process can be performed by thermal radiation or thermal convection using a far infrared heater or oven. At the portion where the pattern retardation film 520 exhibits liquid crystal properties, the temperature during the heat treatment is higher than the temperature at the drying process. During this heat treatment, the temperature may range from 80 degrees Celsius to 150 degrees Celsius. Advantageously, the heat treatment process can be carried out at a temperature of from 90 degrees Celsius to 110 degrees Celsius for from about 30 seconds to about 30 minutes.

Referring to FIGS. 9A to 9D, 10A to 10D, and 11A to 11D, an exposure process according to an exemplary embodiment of the present invention will be described hereinafter. 9A to 9D, 10A to 10D, and 11A to 11D are diagrams illustrating a method of fabricating a pattern retardation film in a step of an exposure process in accordance with an exemplary embodiment of the present invention. Principle profile.

Figures 9A through 9D show the exposure process using two masks.

In FIG. 9A, the first mask 590 is disposed on the retardation film material layer 520a, the retardation film material layer 520a is formed on the substrate 510 and then dried, and the first polarizer UV is irradiated through the first mask 590. Phase difference film material layer 520a. The first photomask 590 includes a first light transmitting portion TA1 and a first light blocking portion BA1 that alternate with each other.

In FIG. 9B, the first region of the retardation film material layer 520a corresponding to the first light transmitting portion TA1 in the first photomask 590 is exposed to the first polarizing electrode UV, and forms a first phase difference axis. A phase pattern 522.

In FIG. 9C, the second mask 592 is disposed over the retardation film material layer 520a having the first phase pattern 522, and the second polarizer UV is irradiated to the retardation film material layer 520a through the second mask 592. Here, the second mask 592 includes a second light transmitting portion TA2 and a second light blocking portion BA2. The second light transmitting portion TA2 of the second mask 592 corresponds to the first light blocking portion BA1 of the first mask 590 in FIG. 9A, and the second light blocking portion BA2 of the second mask 592 corresponds to FIG. 9A. The first light transmitting portion TA1 of the first mask 590 in the middle.

In the 9Dth diagram, the first region of the retardation film material layer 520a of the 9Cth drawing corresponds to the second light blocking portion BA2 of the second mask 592, and the first phase pattern 522 is maintained as it is. A second region of the phase difference film material layer 520a corresponding to the ninth C of the second light-transmissive portion TA2 of the second photomask 592 is exposed to the second polarization UV, and forms a second phase having a second phase difference axis Pattern 524.

Here, the polarization axis of the second polarization UV is perpendicular to the polarization axis of the first polarization UV, and the second phase difference axis is perpendicular to the first phase difference axis.

Therefore, the pattern retardation film 520 including the first phase pattern 522 and the second phase pattern 524 having different phase difference axes can be formed by irradiating the polarized UV with two masks twice.

Figures 10A through 10D show exposure processes using a photomask.

In Fig. 10A, the first polarized UV is irradiated to the entire retardation film material layer 520a, and the retardation film material layer 520a is formed on the substrate 510 and dried.

Therefore, in Fig. 10B, the retardation film material layer 520a has a first phase difference axis.

In FIG. 10C, the photomask 594 is disposed on the retardation film material layer 520a having the first phase difference axis, and the second polarizer UV is irradiated to the retardation film material layer 520a through the second mask 594. The photomask 594 includes a light transmitting portion TA3 and a light blocking portion BA3 which alternate with each other.

Here, the polarization axis of the second polarization UV is perpendicular to the polarization axis of the first polarization UV, and the second polarization UV has a greater energy than the first polarization UV. Preferably, the energy of the second polarized UV is 1.5 to 10 times the energy of the first polarized UV.

In FIG. 10D, the first region of the phase difference film material layer 520a corresponding to the 10Cth portion of the light blocking portion BA3 of the mask 594 is not exposed to the second polarization UV, but forms the first phase having the first phase difference axis. Phase pattern 522. The second region of the phase difference film material layer 520a corresponding to the 10C pattern of the light transmitting portion TA3 of the mask 594 is exposed to the second polarization UV, and a second phase pattern 524 having the first phase difference axis is formed. Here, the second phase difference axis is perpendicular to the first phase difference axis.

Therefore, the pattern retardation film 520 including the first phase pattern 522 and the second phase pattern 524 having different phase difference axes can be formed by irradiating the polarizing UV as a whole and then irradiating the polarizing UV with a photomask.

Figures 11A through 11D show the exposure process using a reticle.

In Fig. 11A, the mask 596 is disposed on the retardation film material layer 520a, the retardation film material layer 520a is formed on the substrate 510, and then dried, and the first polarized UV is irradiated to the phase difference by the mask 596. Film material layer 520a. The mask 596 has a light transmitting portion TA4 and a light blocking portion BA4 which alternate with each other.

In FIG. 11B, the first region of the retardation film material layer 520a corresponding to the light transmitting portion TA4 of the mask 594 is exposed to the second polarizing electrode UV, and the first phase pattern 522 having the first phase difference axis is formed.

In FIG. 11C, the second polarization UV is irradiated to the entire retardation film material layer 520a having the first phase pattern 522. Here, the polarization axis of the second polarization UV is perpendicular to the polarization axis of the first polarization UV, and the second polarization UV has an energy smaller than the first polarization UV. Advantageously, the energy of the second polarized UV is 0.1 to 0.1 times the energy of the first polarized UV.

Therefore, in the 11Dth diagram, even if the first region of the retardation film material layer 520a of the 11Cth drawing is exposed to the second polarizing electrode UV, the first phase pattern 522 remains as it is. The second region of the phase difference film material layer 520a of the 11Cth view of the light blocking portion BA4 of the second mask 596 corresponding to FIG. 11A is exposed to the second polarization UV, and forms a second phase having the second phase difference axis Phase pattern 524. Here, the second phase difference axis is perpendicular to the first phase difference axis.

Therefore, the pattern retardation film 520 including the first phase pattern 522 and the second phase pattern 524 having different phase difference axes can be formed by irradiating the polarizing UV with a photomask and then irradiating the polarizing UV entirely.

Here, the first polarized UV and the second polarized UV may be linearly polarized UV.

In the above embodiment, the first polarization UV and the second polarization UV having mutually perpendicular phase difference axes may be irradiated. Alternatively, the first polarized UV and the second polarized UV have the same phase difference axis. In this case, after the first illumination, the substrate 510 can be rotated by 90 degrees, and then the second illumination is performed. To rotate the substrate 510, a platform (not shown) on which the substrate 510 is placed can be rotated, or an additional device can be mounted for rotating the substrate 510.

Figure 12 is a graph showing the phase difference value of the pattern retardation film depending on the UV energy according to the third embodiment of the present invention, and shows that when the UV energy is varied from 60 mJ/cm ² to 500 mJ/cm ² The phase difference.

At this time, the retardation film material was applied, naturally dried for about 30 seconds, and dried in an oven at about 60 degrees Celsius for about 5 minutes. Then, the retardation film material was exposed to linear polarized UV having a wavelength of 280 nm to 340 nm, and heat-treated in an oven at about 100 degrees Celsius for about 15 minutes.

In Fig. 12, when the exposure energy of the linear polarization UV, that is, the UV energy, varies between 60 mJ/cm ² and 150 mJ/cm ² , the phase difference increases as the UV energy increases. . When the UV energy is greater than 150 mJ/cm ² , the phase difference decreases as the UV energy increases. Here, the phase difference value is in the range of 112 nm to 128 nm and is close to 125 nm of λ/4.

Figure 13 is a graph showing the phase difference value of the pattern retardation film depending on the heat treatment conditions according to the third embodiment of the present invention.

At this time, the retardation film material was applied, naturally dried for about 30 seconds, and dried in an oven at about 60 degrees Celsius for about 5 minutes. Then, the retardation film material was exposed to a linear polarized UV having a wavelength of 280 nm to 340 nm such that the UV energy was about 100 mJ/cm ² and heat-treated in an oven.

In Fig. 13, the heat treatment temperature was 100 degrees Celsius and 110 degrees Celsius, and the heat treatment time was 5 minutes and 15 minutes. Here, when the heat treatment time is the same, the phase difference value increases simultaneously as the heat treatment temperature becomes high. When the heat treatment temperature is the same, the phase difference increases as the heat treatment time becomes longer.

The pattern retardation film manufactured according to the above method can be classified into a unit pattern retardation film having a predetermined size by dividing the pattern retardation film by using a laser beam. An anti-reflection layer is formed on the unit pattern retardation film, or an anti-reflection film is adhered to the unit pattern retardation film, and thus a unit pattern retardation film having an anti-reflection function can be manufactured.

In the method of manufacturing the pattern retardation film according to the present invention, a light directing layer is not required. Therefore, the step of coating the light alignment layer and then drying and curing can be omitted, and the manufacturing process is simplified. Reduce manufacturing costs.

In addition, by optimizing the process conditions, the pattern retardation film having the desired retardation value can be fabricated.

The above is only a preferred embodiment for explaining the present invention, and is not intended to limit the invention in any way, so that any modifications or changes relating to the present invention are made in the spirit of the same invention. All should still be included in the scope of the invention as intended.

The present application claims the benefit of the Korean Patent Application No. 10-2010-0134026, filed on Dec. 23, 2010, and the Korean Patent Application No. 10-2011-0095933, filed on Sep. 22, 2011. All references are hereby incorporated by reference.

1. . . Pattern retardation film

10. . . Substrate

20. . . Light directional layer

twenty one. . . First alignment area

twenty three. . . Second alignment area

40. . . Reactive liquid crystal layer

42. . . Reactive liquid crystalline molecule

44. . . First phase

46. . . Second phase

50. . . First phase pattern

52. . . Second phase pattern

70. . . First mask

72. . . Second mask

90. . . Coating device

95. . . Dry sheet

96. . . Curing device

110. . . Polarized glasses type three-dimensional image display device

120. . . Display panel

150. . . Polarizing film

160. . . Pattern retardation film

180. . . Polarized glasses

182. . . Left eye lens

184. . . Right eye lens

201. . . Pattern retardation film

210. . . Substrate

220. . . Phase difference film material layer

222. . . First phase pattern

224. . . Second phase pattern

290. . . First mask

292. . . Second mask

296. . . Curing device

301. . . Pattern retardation film

310. . . Transparent insulating substrate

320. . . Phase difference film material layer

322. . . First phase pattern

324. . . Second phase pattern

390. . . First mask

392. . . Second mask

396. . . Curing device

400. . . Vacuum device

410. . . Substrate transfer device

420. . . Coating device

430. . . Drying device

440. . . Exposure device

450. . . Heat treatment device

510. . . Substrate

520. . . Pattern retardation film

520a. . . Phase difference film material layer

522. . . First phase pattern

524. . . Second phase pattern

590. . . First mask

592. . . Second mask

594. . . Mask

596. . . Mask

BA, BA3, BA4. . . Light blocking unit

BA1. . . First light blocking unit

BA2. . . Second light blocking unit

DA. . . Display area

Hl. . . Left eye horizontal pixel line

Hr. . . Right eye horizontal pixel line

NDA. . . Non-display area

Rl. . . Left eye retardation film

Rr. . . Right eye retardation film

TA, TA3, TA4. . . Translucent part

TA1. . . First light transmission part

TA2. . . Second light transmitting portion

R, G, B. . . Red, green, and blue subpixels

BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are set forth in the claims

In the schema:

1A to 1G are cross-sectional views in the steps of a method of manufacturing a pattern retardation film according to the prior art;

Figure 2 is a perspective view showing a polarized glasses type three-dimensional image display device according to the present invention;

3A to 3E are cross-sectional views in the steps of the method of manufacturing the pattern retardation film according to the first embodiment of the present invention;

4 is a graph illustrating a phase difference value of a pattern retardation film depending on UV energy according to the first embodiment of the present invention;

5A to 5F are cross-sectional views in the steps of a method of manufacturing a pattern retardation film according to a second embodiment of the present invention;

6 is a graph illustrating a rotational speed depending on a time of spin coating in a method of manufacturing a pattern retardation film according to a second embodiment of the present invention;

Figure 7 is a graph showing the phase difference value of the pattern retardation film depending on the UV energy according to the second embodiment of the present invention;

Figure 8 is a schematic view for explaining a manufacturing process of a pattern retardation film according to a third embodiment of the present invention;

9A to 9D, 10A to 10D, and 11A to 11D are schematic cross-sectional views illustrating steps in an exposure process of a method of manufacturing a pattern retardation film according to an exemplary embodiment of the present invention;

Figure 12 is a graph illustrating a phase difference value of a pattern retardation film depending on UV energy according to a third embodiment of the present invention;

Figure 13 is a graph showing the phase difference value of the pattern retardation film depending on the heat treatment conditions according to the third embodiment of the present invention.

301. . . Pattern retardation film

310. . . Transparent insulating substrate

320. . . Phase difference film material layer

322. . . First phase pattern

324. . . Second phase pattern

396. . . Curing device

Claims (12)

A method for manufacturing a pattern retardation film, comprising: forming a retardation film material layer on a substrate by coating a retardation film material; drying the retardation film material layer at a first temperature; and using the retardation film The material layer is exposed to a first polarized ultraviolet light to form a first phase pattern in a first region of the retardation film material layer; the phase difference film material layer is exposed to a second polarized ultraviolet light, Forming a second phase pattern in a second region of the phase difference film material layer, wherein a polarization direction of the second polarization ultraviolet light is different from a polarization direction of the first polarization ultraviolet light, and the first a phase pattern and the second phase pattern have different arrangements to have optical anisotropy along different directions in the first region and the second region, and change a linear polarized light to a left circular apolar light and a a right circularly polarized light; and heat treating the retardation film material layer at a second temperature higher than the first temperature to increase the optical of the first phase pattern and the second phase pattern in the retardation film material layer Anisotropy. The method for producing a pattern retardation film according to claim 1, wherein the retardation film material comprises: a photosensitive functional group which exhibits when the retardation film material is exposed to the linear extreme ultraviolet light. Optical anisotropy; and a liquid crystal polymer, a liquid crystal monomer, an oligomer, or a liquid crystal polymer having a liquid crystal functional group, the liquid crystal monomer, and a mixture of the oligomer, the liquid crystal The polymer, the liquid crystal monomer, the oligomer, and the mixture exhibit a liquid crystal characteristic over a predetermined temperature range. The method of producing a pattern retardation film according to claim 2, wherein the retardation film material further comprises a leveling additive for planarization. The method for producing a pattern retardation film according to claim 1, wherein the first polarized ultraviolet light passes through the first light having a plurality of first light transmitting portions and a plurality of first light blocking portions alternately alternating with each other The cover is irradiated on the retardation film material layer, and the second polarized ultraviolet light is irradiated to the retardation film material layer through a second photomask having a plurality of second light transmitting portions and a plurality of second light blocking portions alternately alternating with each other. The second light-transmitting portions correspond to the first light-blocking portions, and the second light-blocking portions correspond to the first light-transmitting portions. The method for producing a pattern retardation film according to claim 1, wherein the first polarized ultraviolet light is irradiated to the entire retardation film material layer, and the second polarized ultraviolet light passes through a plurality of mutually alternating plural The light transmissive portion and the plurality of light blocking portions are irradiated to the retardation film material layer, wherein the energy of the second polarized ultraviolet light is 1.5 to 10 times the energy of the first polarized ultraviolet light. The method for producing a pattern retardation film according to claim 1, wherein the first polarized ultraviolet light is irradiated to the phase difference by a photomask having a plurality of light transmitting portions and a plurality of light blocking portions alternately alternating with each other. a layer of film material, wherein the second polarized ultraviolet light is irradiated to the entire layer of retardation film material, wherein the energy of the second polarized ultraviolet light is 0.1 to 0.9 times the energy of the first polarized ultraviolet light. The method for producing a pattern retardation film according to claim 1, wherein the first polarized ultraviolet light and the second polarized ultraviolet light respectively have an energy of 1 mJ/cm ² to 1000 mJ/cm ² and 200 nm to 400 nm wavelength. The method for producing a pattern retardation film according to claim 1, wherein the phase difference film material layer is formed by using a spin coating method, a slit coating method, a doctor blade film forming method, a rotation and One of a slit coating method, a roll coating method, and a cast coating method, and the retardation film material layer has a thickness of less than 5 μm. The method for producing a pattern retardation film according to the first aspect of the invention, wherein the substrate comprises glass, plastic, polymethyl methacrylate, polycarbonate, polyvinyl chloride, triacetyl cellulose, and cycloolefin polymerization. One of the things. The method for producing a pattern retardation film according to claim 1, wherein the retardation film material layer is dried by a heat radiation phenomenon or a heat convection phenomenon using a far infrared heater or an oven, and At 25 degrees Celsius to 80 degrees Celsius for 30 seconds to 30 minutes. The method for producing a pattern retardation film according to claim 1, wherein the retardation film material layer is dried by a heat radiation phenomenon or a heat convection phenomenon using a far infrared heater or an oven, and It can last from 30 seconds to 30 minutes at a temperature of 80 degrees Celsius to 150 degrees Celsius. The method of manufacturing a pattern retardation film according to claim 1, wherein the first phase pattern has a first phase difference axis, the second phase pattern has a second phase difference axis, and the first phase The difference axis and the second phase difference axis are perpendicular to a polarization axis of the first polarization ultraviolet light and a polarization axis of the second polarization ultraviolet light, respectively.