JP2014164248A - Method and device for manufacturing pattern film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method and device for manufacturing a pattern film, which is capable of manufacturing the pattern film having a high accurate stripe pattern by making the vibration amplitude difference between a mask and a film smaller.SOLUTION: A film 16 is wound around conveyance rollers such as a backup roller 28, an upstream side roller 29, and a downstream side roller 30, to be continuously conveyed and irradiated with illumination light from a light source part 34 through a mask plate 46, so that a stripe pattern is exposed. A base for a mask 36 holding a mask unit 35 is supported by a base for the backup roller 31, so that the mask plate 46 and the film 16 supported by the backup roller 28 are vibrated in the same phase and the vibration amplitude difference between both is made smaller. Thus, an exposure blur area caused by the vibration amplitude difference between the film 16 and the mask plate 46 is made smaller.

Description

  The present invention relates to a pattern film manufacturing method and apparatus.

  As one of methods for displaying a stereoscopic image by a flat panel display (hereinafter referred to as FPD), a passive method using polarized light is known. The passive FPD includes a plurality of pixels arranged in a matrix in the horizontal and vertical directions, and a pattern retardation film disposed in front of the pixels. The plurality of pixels are a right-eye pixel and a left-eye pixel for each odd-numbered and even-numbered line in each horizontal line, and display a right-eye image and a left-eye image that constitute a parallax image, respectively. The pattern retardation film changes display light emitted from the right-eye pixel and the left-eye pixel into two different polarization states (for example, two types of circularly polarized light that are orthogonal to each other). The viewer can observe the display screen through polarizing glasses using a polarizing plate that transmits only the right-eye image and a polarizing plate that transmits only the left-eye image, respectively, using right-eye lenses and left-eye lenses. Recognize an image.

  The pattern retardation film (Film Patterned Retarder: hereinafter referred to as FPR) is a kind of pattern film in which a plurality of regions having different optical transmission characteristics are provided in a predetermined pattern. For example, the line width is 250 to 700 μm. The first phase difference area and the second phase difference area are alternately arranged in the horizontal direction. In the first and second retardation regions, rod-like liquid crystal layers oriented so that their optical axes are orthogonal to each other are formed, and their line widths coincide with the horizontal lines of the pixels with high accuracy. Thereby, the first and second phase difference regions polarize the right-eye image and the left-eye image, respectively.

  In Patent Document 1, a transparent film provided with a reaction film including a photo-alignment material is wound around a plurality of transfer rollers and continuously conveyed, and the alignment film is formed by irradiating the reaction film with polarized ultraviolet rays. The manufacturing method of FPR provided with a process is disclosed. The step of irradiating the reaction film with polarized ultraviolet rays includes a first exposure process and a second exposure process in which the polarization directions of the polarized ultraviolet rays to be irradiated are different, and further by at least one of the first exposure process and the second exposure process. Pattern irradiation with polarized ultraviolet rays. As a result, the alignment film is provided with stripe-shaped alignment characteristics corresponding to the polarization direction of the irradiated ultraviolet rays. A liquid crystal layer (phase layer) containing rod-shaped liquid crystals (nematic liquid crystals) is formed on the alignment film thus obtained, and the rod-shaped liquid crystals are aligned corresponding to each region of the alignment film, so that the optical axes are orthogonal to each other. An FPR in which stripe-like first and second phase difference regions are alternately arranged is obtained.

  In Patent Document 1, a mask that partially shields polarized ultraviolet rays is used for pattern irradiation of polarized ultraviolet rays. The mask is formed by vapor deposition of Cr on one surface of a plate-shaped mask base material made of synthetic quartz, and has slits for light transmission arranged at a constant pitch in the width direction of the film. The mask is disposed as close as possible so as not to contact the surface of the film, and the surface of the film is exposed to a stripe pattern by a so-called proximity method.

  In Patent Document 1, two types of ultraviolet rays having different polarization directions must be used, and exposure must be performed at two locations on the film conveyance path. However, the orientation characteristics are simply determined depending on the presence or absence of illumination light such as ultraviolet rays. Attempts have been made to more efficiently manufacture FPR using alignment films that can be different. In this manufacturing method, if the film is exposed once with a stripe pattern, an exposure area and a non-exposure area corresponding to the first and second retardation regions can be obtained. Even in this manufacturing method, it is necessary to perform high-precision exposure using a proximity method using a mask.

JP 2012-198522 A

  In FPR, there may be a non-aligned region where the liquid crystal is not aligned in any direction even when a liquid crystal layer is formed by post-processing after exposure at the boundary between the first and second retardation regions. When the line width is sufficiently narrow and the amount of meandering is small, the non-oriented region is hidden by the black matrix of the color filter of the FPD, so that there is no practical problem. However, when the line width of the non-alignment region is thick or the meandering amount is large, the non-alignment region protrudes from the black matrix, so that the line widths of the first and second retardation regions become narrow or non-uniform. As a result, problems such as deterioration of the display characteristics of the stereoscopic image occur.

  In the FPR manufacturing method described in Patent Document 1, the exposure amounts of the first exposure process and the second exposure process are both at the boundary between the area exposed by the first exposure process and the area exposed by the second exposure process. A blur region at an intermediate level is generated, and a predetermined level of alignment characteristics cannot be obtained in this blur region, resulting in a non-oriented region. Further, as described above, in the FPR manufacturing method in which exposure is performed once in a stripe pattern on a film to form an exposure region and a non-exposure region corresponding to the first and second retardation regions, the exposure region and the non-exposure region are non-exposed. A blur region where the exposure amount is at an intermediate level occurs at a boundary portion with the exposure region, and a non-oriented region is generated in the blur region.

  The blurred area is generated when the mask and the film vibrate at different phases during exposure to cause a shift in the relative position between the two, and the exposure amount of the portion where the shift occurs is reduced. Therefore, if the amplitude difference between the vibration of the mask during exposure and the film is reduced, the non-oriented region can be reduced. In order to reduce the amplitude difference between the vibration of the mask and the film, it is only necessary to reduce the vibration between the two. To reduce the vibration of the film, it is only necessary to suppress the vibration during rotation of the roller supporting the film. However, with the recent increase in the screen size of FPD, FPR is also manufactured by a wide film, and a large-diameter roller having a large weight is used to support the film. It was difficult to suppress minute vibrations of the roller.

  An object of this invention is to provide the manufacturing method and apparatus of a pattern film which can manufacture the pattern film which has a highly accurate stripe pattern by making small the amplitude difference of the vibration of a mask and a film.

  The pattern film manufacturing method of the present invention is arranged so as to face the film, a conveying step in which a film having a reaction film that reacts with light of a specific wavelength is wound around a plurality of conveying rollers and continuously conveyed. An exposure step of exposing the stripe pattern by emitting light of a specific wavelength from the light source device to the mask and passing the light shaped into a plurality of lines by the mask pattern of the mask through the film. A mask gantry that supports the mask is supported by a roller gantry that rotatably supports the transport roller.

  In the case where a plurality of transport rollers and roller stands are provided, the mask stand is preferably supported by at least one roller stand.

  The distance between the support portion supported by the roller mount of the mask mount and the rotation center of the transport roller is the first distance, and the distance between the foundation on which the roller mount is installed and the exposure center of the mask It is preferable that the first distance is shorter than the second distance when the distance is the second distance.

  When a plurality of transport rollers are supported on the roller mount and the first distances between the support portion and the rotation centers of the transport rollers are different from each other, at least one first distance is set. It is preferable to make it shorter than the second distance.

  Further, the mask mount is supported by a plurality of roller mounts that respectively support the transport rollers, and the first distances between the respective support portions and the rotation centers of the respective transport rollers are different from each other. If it is, it is preferable that at least one first distance is shorter than the second distance.

  The first distance and the second distance are preferably set so that the maximum amplitude difference in vibration in the width direction between the mask and the transport roller is 10 μm or less. The maximum amplitude difference is preferably an amplitude difference of vibration of 5 to 200 Hz.

  The transport roller includes a backup roller that supports the back surface of the film opposite to the surface on which the reaction film is provided and faces the mask, an upstream roller disposed on the upstream side and the downstream side of the backup roller, and And a downstream roller.

  A photoreactive film forming step of forming a reactive film on the surface of the film may be included before the transporting step. Moreover, you may perform the rubbing process step which performs a rubbing process on the surface of a film in the stage before or after an exposure step. Furthermore, you may perform the liquid crystal layer formation step which apply | coats the coating liquid containing a liquid crystal to the surface of the film after performing both an exposure step and a rubbing process step, and forms a liquid crystal layer.

  The pattern film manufacturing apparatus of the present invention includes a transport unit for continuously transporting a film provided with a reaction film that reacts with light of a specific wavelength around a transport roller, and a light source unit that emits light of a specific wavelength. And a plurality of slits arranged between the light source unit and the film and having the longitudinal direction coincided with the film transport direction and having a mask pattern arranged at a constant pitch in the film width direction, and emitted from the light source device Among the light, a mask that allows light shaped into a plurality of lines by a plurality of slits to pass through the film, a roller pedestal that rotatably supports a transport roller, and a roller pedestal supported by the roller pedestal. And a mask pedestal for supporting the mask.

  Also, in the pattern film manufacturing apparatus, similarly to the above manufacturing method, when a plurality of transport rollers and roller mounts are provided, the mask support is preferably supported by at least one roller mount. Further, the distance between the support portion supported by the roller mount of the mask mount and the rotation center of the transport roller is a first distance, the foundation on which the roller mount is installed, the exposure center of the mask, It is preferable that the first distance is shorter than the second distance when the distance between the two is the second distance.

  By supporting the mask base with the roller base, the vibration of the transport roller supported by the roller base is transmitted to the mask supported by the mask base, so the mask is supported by the transport roller. It can be made to vibrate with the same phase as the film made, and the generation | occurrence | production of the defect which has arisen when the mask and the film vibrate with a different phase can be suppressed.

It is explanatory drawing which shows the structure of the manufacturing apparatus of a pattern film. It is explanatory drawing which shows a pattern phase difference film. It is sectional drawing of the film in which the orientation film was provided. It is the schematic which shows the structure of the exposure part of 1st Embodiment. It is a perspective view which shows the structure of the exposure part of 1st Embodiment. It is explanatory drawing which shows the arrangement | sequence of each light source of a light source array. It is a perspective view which shows the structure of a mask plate. It is explanatory drawing which shows the incident state of the light ray to a mask plate and a film. It is the schematic which shows the structure of the exposure part of 2nd Embodiment. It is the schematic which shows the structure of the exposure part of 3rd Embodiment. It is the schematic which shows the structure of the exposure part of 4th Embodiment. It is the schematic which shows the structure of the exposure part of 5th Embodiment. It is the schematic which shows the structure of the exposure part of 6th Embodiment. It is the schematic which shows the structure of the exposure part of 7th Embodiment. It is the schematic which shows the structure of the exposure part of 8th Embodiment. It is the schematic which shows the structure of the exposure part of 9th Embodiment. It is the schematic which shows the structure of the exposure part of a comparative example.

[First Embodiment]
In FIG. 1, a pattern film manufacturing apparatus 10 (hereinafter referred to as a manufacturing apparatus) of the present invention includes a transport mechanism unit 11, an alignment film forming unit 12, an exposure unit 13, a rubbing processing unit 14, a liquid crystal layer forming unit 15, and the like. A patterned retardation film (hereinafter referred to as FPR) 17 is manufactured by performing various treatments on the configured and supplied film 16. The film 16 is transparent and flexible. For example, the film 16 is drawn from a film roll (not shown) and supplied to the manufacturing apparatus 10. The film 16 is continuously conveyed in the direction of the arrow by the conveyance mechanism unit 11 at a constant speed.

  As shown in FIG. 2, the FPR 17 manufactured by the manufacturing apparatus 10 has a first retardation region 20 and a second retardation region 21 that extend in a stripe shape in the direction in which the film 16 is conveyed during manufacturing. They are arranged alternately in the direction. As shown by arrows A1 and A2 in the drawing, the first and second phase difference regions 20 and 21 have optical axes, for example, slow axes orthogonal to each other. These first and second retardation regions 20 and 21 exhibit retardation characteristics by changing the alignment direction of the liquid crystal layer formed on the surface of the film 16.

  Reference numeral 22 denotes a non-oriented region formed in each boundary portion of the first and second phase difference regions 20 and 21 and extends in the transport direction. When the stripe pattern is exposed on the film 16 by the exposure unit 13, the non-oriented region 22 vibrates in a different phase between the mask forming the light of the stripe pattern and the film 16 and shifts to the relative position between the mask and the film 16. This occurs due to a reduction in the exposure amount in the portion where the deviation occurs.

  The first retardation region 20 is formed with a width W1, and the second retardation region 21 is formed with a width W2. The arrangement pitch in the width direction of the phase difference regions 20 and 21 is P1. The arrangement pitch P1 is “width W1”. The width W2 is smaller than the width W1 by “width Wa × 2” of the non-oriented region 22 and is “width W1−width Wa × 2”. The width W1 can be selected from various values, but is usually set to 300 to 700 μm. The width Wa of the non-oriented region 22 should be uniform and small, preferably 15 μm or less, and more preferably 10 μm or less. The non-oriented region 22 may meander in the transport direction. In this case, the width Wa of the non-oriented region 22 is preferably equal to or less than the above value including the amount of meandering. In FIG. 2, the width direction of the non-oriented region 22 is exaggerated with respect to the phase difference regions 20 and 21.

  As shown in FIG. 3, in the alignment film forming unit 12, a coating solution containing a photoacid generator that decomposes upon irradiation with ultraviolet rays to generate an acid is applied to the surface of the film 16, and further subjected to a drying process to be constant. An alignment film 25 having a thickness is formed. Although the alignment film 25 becomes a reaction film that reacts to light of a specific wavelength, a curing agent or a photoacid generator that cures in response to light of a specific wavelength other than ultraviolet light may be used as the reaction film. Further, for the formation of the alignment film 25, for example, a technique such as spraying other than coating may be used. The film 16 on which the alignment film 25 is formed is sent from the alignment film forming unit 12 to the exposure unit 13.

  The exposure unit 13 irradiates the film 16 being continuously conveyed with illumination light with a striped exposure pattern corresponding to the pattern of the first and second retardation regions 20 and 21. As the illumination light, light corresponding to the type of photochemical reaction of the alignment film 25 is used. In this example, ultraviolet light is used. Then, in the alignment film 25 formed on the surface of the film 16, for example, a striped pattern exposure is performed in which a portion that becomes the first retardation region 20 is a linear exposure region, and the other portion is a non-exposure region. Is called.

  As shown in FIGS. 4 and 5, the exposure unit 13 rotatably supports the backup roller 28, the upstream roller 29, the downstream roller 30, and the rollers 28 to 30, which are transport rollers according to the present invention. Backup roller base 31, upstream roller base 32 and downstream roller base 33, a light source 34 for irradiating illumination light, a mask unit 35 including a mask, and a mask base 36 for supporting the mask unit 35. Etc.

  The backup roller 28 has a larger diameter than the upstream roller 29 and the downstream roller 30, and supports the back surface side of the film 16 wound around the outer periphery with the peripheral surface 28 a. The upstream roller 29 and the downstream roller 30 are respectively arranged on the upstream side and the downstream side of the backup roller 28 in the transport path of the film 16, and the surface side of the film 16 wound around the outer periphery is the peripheral surface thereof. To support. The backup roller 28, the upstream roller 29, and the downstream roller 30 are rotatable, and rotate following the conveyance of the film 16. The backup roller 28, the upstream roller 29, and the downstream roller 30 may be rotated by a motor or the like in synchronization with the conveyance of the film 16.

  The backup roller pedestal 31 is composed of a pair of support members 31a and 31b which are erected on a foundation 39 made of a floor surface or the like at a predetermined interval. The support members 31a and 31b are formed of a material having high rigidity such as metal, for example, and a bearing portion 31c for rotatably supporting both ends of the backup roller 28 is provided on the upper surface thereof. Similarly to the backup roller pedestal 31, the upstream roller pedestal 32 and the downstream roller pedestal 33 are also configured by a pair of support members 32a, 32b and 33a, 33b that are set up at a predetermined interval from the foundation 39. ing. Bearing portions 32c and 33c that rotatably support both ends of the upstream roller 29 and the downstream roller 30 are provided on the upper and side surfaces of the support members 32a, 32b and 33a, 33b.

  The light source unit 34 is supported by a light source base 38, is disposed so as to face the peripheral surface of the backup roller 28, and irradiates the film 16 supported by the peripheral surface 28a with ultraviolet rays. As shown in FIG. 6, the light source unit 34 includes a light source array 43 in which a plurality of light sources 42 are arranged at a predetermined pitch in the width direction of the film 16. Each light source 42 includes an ultraviolet lamp 42 a that emits ultraviolet light as illumination light, and an illumination optical system (not shown) including a reflector 42 b that reflects the illumination light emitted from the ultraviolet lamp 42 a toward the backup roller 28. The illumination optical system is a well-known one that increases the utilization efficiency of the illumination light from the ultraviolet lamp 42a. For example, if the reflecting surface of the reflector 42b is shaped like a parabolic mirror, the illumination light parallel to the backup roller 28 is parallel. The degree can be kept high. However, in general, the ultraviolet lamp 42a is not regarded as a point light source, and even if a parabolic mirror is incorporated in each of the light sources 42 to increase parallelism, the ultraviolet light 42a is used as illumination light emitted at a radiation angle of 7 to 8 ° or more. Normally, the illumination light is irradiated toward the backup roller 28 while being optically non-parallel.

  The illuminance on the film 16 by illumination from the light source unit 34 is preferably, for example, 200 mW / cm 2 or more, and more preferably 500 mW / cm 2 or more. In order to increase the use efficiency of illumination light and increase the accuracy of pattern exposure, it is desirable to keep the radiation angle of the illumination light emitted from each light source 42 at least 10 ° or less in the width direction of the film 16. . In order to reduce the radiation angle, it is possible to use a lens instead of or in combination with the reflector 42b described above.

  The mask unit 35 includes a mask plate 46 provided with a mask pattern for exposing the film 16 and a mask holder 47 that holds the mask plate 46. The mask plate 46 shapes the illumination light from the light source unit 34 into a striped exposure pattern corresponding to the first and second phase difference regions 20 and 21 and passes it through the film 16 to perform exposure by the proximity method. .

  As shown in FIG. 7, the mask plate 46 is formed by depositing a mask 46b made of an inorganic material having excellent heat resistance and light shielding properties such as chromium on the surface of a transparent mask base material 46a. Are arranged to face the surface of the film 16 with an interval of 300 μm. The mask substrate 46a is preferably made of a material that satisfies the conditions of high spectral transmittance for illumination light, high heat resistance, and low thermal expansion coefficient, for example, quartz glass. Among quartz glasses, ozoneless quartz glass, synthetic quartz glass, and natural quartz glass, which are excellent in ultraviolet transmittance and stable to heat from an ultraviolet light source, are preferable.

  The mask 46b has a pattern in which a large number of slits 46s having an opening width Ws1 and a length L are arranged at a pitch P3 in the width direction of the film 16, and the light shielding width Ws2 between adjacent slits 46s is also the same as the opening width Ws1. is there. The arrangement pitch P3 of the slits 46s is twice the arrangement pitch P1 of the first and second phase difference regions 20 and 21 shown in FIG. 2, and the opening width Ws1 of the slits 46s is equal to the width W1 of the first phase difference region 20. It is the same. Further, the light shielding width Ws2 between the slits is also the same as the width W1 of the first phase difference region 20. Accordingly, the width W2 of the second retardation region 21 corresponding to this should be equal to the width W1, but in reality, the width W2 of the second retardation region 21 is “width Wa × 2” of the non-oriented region 22. It gets smaller by the minute. Note that the number of slits 46s is small in order to avoid complication of the drawing.

  The length L of the slit 46s is determined in consideration of the photosensitivity of the photooxidant contained in the alignment film 25 that undergoes chemical reaction upon exposure, the transport speed of the film 16, the intensity of ultraviolet rays emitted from the light source unit 34, and the like. For example, the length L can be set to 20 mm. If the length L is too long, the surface of the film 16 supported by being curved by the backup roller 28 is separated from the mask 46b at both ends of the slit 46s, and the illumination light that has passed through the slit 46s tends to spread in the width direction. The outer diameter of the backup roller 28 may be taken into consideration in advance. If the length L is shortened too much, the exposure time is shortened. Therefore, it is necessary to consider the intensity of illumination light from the light source unit 34 and the conveyance speed of the film 16.

  The mask mount 36 is supported by the backup roller mount 31 by fixing a support portion 36b provided at one end thereof between the support members 31a and 31b. The mask mount 36 is arranged so that the mask 46 b faces the surface of the film 16 by holding the lower end of the mask unit 35 with a mask holding part 36 a provided on the other end side. The distance La1 between the support portion 36b of the mask mount 36 and the rotation center of the backup roller 28 supported by the backup roller mount 31 that supports the mask mount 36 is the exposure of the foundation 39 and the mask 46b. It is shorter than the distance Lb1 between the center. The distance La1 and the distance Lb1 correspond to the first distance and the second distance of the present invention, respectively. The exposure center of the mask 46b is the center of the mask 46b in the transport direction of the film 16, for example, the center of the slit 46s in the transport direction.

  As shown in FIG. 8, the mask 46b shapes the illumination light L emitted from the light source unit 34 into a striped exposure pattern by the slit 46s. However, when the film 16 and the mask 46b vibrate in different phases, two points are obtained. As indicated by the chain line, the relative position of the two shifts. In the alignment film 25, a region exposed from the mask 46b and a shielded region are generated while the relative position shift occurs, and these regions become a blur region 50 having an intermediate exposure amount. In the blurred region 50, a predetermined level of alignment characteristics cannot be obtained, and thus the non-oriented region 22 is generated. The line width of the blur region 50 becomes wider as the relative positional deviation between the film 16 and the mask 46b increases, that is, the amplitude difference between the vibrations of the film 16 and the mask 46b increases, and the blur region 50 meanders when the amplitude difference changes periodically. .

  In this embodiment, the vibration generated by the backup roller 28 during the exposure of the film 16 is transmitted to the mask 46b through the backup roller base 31 and the mask base 36, so that the mask 46b is supported by the backup roller 28. Vibrates in the same phase as the film 16 formed. In addition, since the distance La1 between the support portion 36b and the rotation center of the backup roller 28 is shorter than the distance Lb1 between the foundation 39 and the exposure center of the mask 46b, the mask 46b is located on the backup roller 28 more than the foundation 39. It becomes susceptible to vibration. Therefore, the amplitude difference between the vibrations generated between the mask 46b and the film 16 is smaller than when the mask 46b is greatly affected by the base 39. As a result, the displacement of the relative position between the film 16 and the mask 46b becomes much smaller than when the mask mount 36 is not supported by the backup roller mount 31, so the line width and the meandering amount of the blur region 50 are reduced. Can be small.

  The distance La1 and the distance Lb1 are set so that the maximum amplitude difference between the mask 46b and the backup roller 28 can be kept below a predetermined value in vibrations in a frequency band where the blur region 50 is likely to occur in the film 16. . For example, the maximum amplitude difference between the mask 46b and the backup roller 28 is preferably 10 μm or less in a vibration with a frequency band of 5 to 200 Hz, and more preferably 5 μm or less in a frequency band of 10 to 50 Hz.

  With the recent increase in the screen size of FPD, the FPR 17 is also manufactured with a film 16 having a width of about several meters, and the backup roller 28 that supports the film 16 has a diameter of about several meters. Yes. Therefore, the first distance La1 in the apparatus for manufacturing such a wide FPR 17 is preferably 0.5 to 5 m, more preferably about 1 to 3 m.

  A film 16 after the exposure processing by the exposure unit 13 is conveyed to the rubbing processing unit 14. The rubbing processing unit 14 is provided with a rubbing roller, a driving mechanism thereof, and the like, and performs alignment processing on the alignment film 25 subjected to pattern exposure. The rubbing processing unit 14 performs a rubbing process on the alignment film 25 on the film 16 in a rubbing direction of 45 ° with respect to the transport direction of the film 16 by a rubbing roller. The film 16 after the rubbing treatment is sent to the liquid crystal layer forming unit 15.

  The liquid crystal layer forming unit 15 forms a liquid crystal layer that exhibits retardation characteristics corresponding to the first and second retardation regions 20 and 21 on the alignment film 25. In this liquid crystal layer forming section 15, a coating liquid containing a vertical alignment agent, a discotic liquid crystal, etc. is applied to the surface of the alignment film 25 after the rubbing treatment, and further, heat aging, cooling, and the like are performed. The alignment film 25 is cured by irradiation to fix the alignment state. By these processes, liquid crystal layers having different optical transmission characteristics are formed in the exposed region and the non-exposed region of the alignment film 25 exposed in a stripe pattern through the mask 46b.

  The above-described vertical alignment agent has an action of raising the discotic liquid crystal vertically with respect to the surface of the alignment film 25 and an action of aligning the discotic liquid crystal in a direction orthogonal to the rubbing direction. As a result of the pattern exposure process in the exposure unit 13, the alignment film 25 has an exposed region and a non-exposed region arranged in stripes, and acid is generated in the exposed region, so that the discotic liquid crystal is vertically raised. However, the effect of orienting the discotic liquid crystal in the direction orthogonal to the rubbing direction is lost. For this reason, the discotic liquid crystal stands up and is oriented in the rubbing direction.

  Further, since the action of the vertical alignment agent is still preserved in the non-exposed region of the alignment film 25, the discotic liquid crystal stands upright in the liquid crystal layer in contact with the non-exposed region of the alignment film 25 as an interface, and the rubbing direction The orientation posture is orthogonal to. As a result, on the alignment film 25 formed on the surface of the film 16, a line having a constant width is formed by the discotic liquid crystal layer in a posture that stands and is oriented in the rubbing direction, and a disc that stands and is perpendicular to the rubbing direction. Lines of a certain width by the tick liquid crystal layer are alternately arranged, and a stripe pattern of the first retardation region 20 and the second retardation region 21 whose slow axes are orthogonal to each other is obtained on the film 16.

  Next, the operation of the above configuration will be described. The film 16 is continuously transported at a constant speed by the transport mechanism 11. The alignment film 25 is sequentially applied and dried by the alignment film forming unit 12 on the surface of the film 16 being conveyed. The film 16 having the alignment film 25 on the surface is sent to the exposure unit 13.

  In the exposure unit 13, pattern exposure is performed with illumination light from the light source unit 34 while the film 16 is supported by the backup roller 28. The illumination light from the light source unit 34 is provided with a striped exposure pattern by the mask 46 b and is applied to the alignment film 25 on the film 16. The slits 46 s provided in the mask 46 b are elongated in the transport direction of the film 16 and are arranged at a constant pitch P <b> 3 in the width direction of the film 16.

  As the film 16 is transported, the position of the film 16 exposed by the illumination light moves. Thereby, the exposure area | region by irradiation of illumination light is extended in the conveyance direction in the shape of a line according to conveyance of the film 16. FIG. Moreover, it becomes a non-exposure area | region between an exposure area | region and an exposure area | region, and as a result, exposure can be given to the full length of the film 16 with a striped exposure pattern.

  Since the vibration of the backup roller 28 is transmitted through the backup roller mount 31 and the mask mount 36, the mask 46b vibrates in the same phase as the film 16 supported by the backup roller 28. Further, since the distance La1 between the support portion 36b and the rotation center of the backup roller 28 is shorter than the distance Lb1 between the foundation 39 and the exposure center of the mask 46b, the mask 46b is affected by the vibration of the backup roller 28. The amplitude difference of vibration generated between the mask 46b and the film 16 becomes small. As a result, the displacement of the relative position between the mask 46b and the film 16 during the exposure is also reduced, so that the line width and the meandering amount of the blurred area 50 that causes the non-oriented area 22 are also reduced.

  By performing pattern exposure on the alignment film 25 as described above, the photoacid generator is decomposed in the exposed region to generate acid, and no acid is generated in the non-exposed region. In the blurred area 50 exposed at the intermediate level, acid is generated according to the exposure amount, but the amount of acid generated is small because the exposure amount is small.

  The film 16 after the pattern exposure processing is rubbed in a predetermined rubbing direction by the rubbing processing unit 14 and then sent to the liquid crystal layer forming unit 15. Then, a liquid crystal layer is formed on the alignment film 25 by the liquid crystal layer forming unit 15, and is heated and matured and cooled. Thus, on the film 16, a line-shaped liquid crystal layer in which discotic liquid crystals standing vertically are aligned in the rubbing direction, corresponding to an exposure pattern in which line-shaped exposed areas and non-exposed areas are alternately arranged at a constant width, and As a result, a stripe-like pattern is obtained in which vertically extending discotic liquid crystals are alternately arranged with a constant width in a line-like liquid crystal layer oriented perpendicular to the rubbing direction.

  These liquid crystal layers become a first retardation region 20 and a second retardation region 21 whose slow axes are orthogonal to each other. In the blurred region 50, since the amount of generated acid is small, the discotic liquid crystal is not oriented in a specific direction with respect to the rubbing direction, and becomes the non-oriented region 22. Thereafter, the alignment film 25 is cured by irradiating with ultraviolet rays, and the alignment state of the liquid crystal layer is fixed together with this to obtain FPR17.

  In the above embodiment, the rubbing process is performed after the exposure by the exposure unit 13. However, the rubbing process unit 14 is provided on the upstream side of the exposure unit 13 in the transport direction of the film 16, and the rubbing process is performed before the exposure. Also good.

  Hereinafter, another embodiment of the exposure unit 13 described in the first embodiment will be described. In addition, about the structure common to the said 1st Embodiment, detailed description is abbreviate | omitted using the same code | symbol.

[Second Embodiment]
As shown in FIG. 9, the exposure unit 60 of the second embodiment supports the support portion 61 b of the mask mount 61 by the support members 32 a and 32 b of the upstream roller mount 32. The distance La2 between the support 61b and the rotation center of the upstream roller 29 is shorter than the distance Lb2 between the foundation 39 and the exposure center of the mask 46b.

[Third Embodiment]
As shown in FIG. 10, the exposure unit 65 of the third embodiment supports the support portion 66 b of the mask mount 66 by the support members 33 a and 33 b of the downstream roller mount 33. Further, the distance La3 between the support portion 66b and the rotation center of the downstream roller 30 is shorter than the distance Lb3 between the foundation 39 and the exposure center of the mask 46b.

[Fourth Embodiment]
As shown in FIG. 11, in the exposure unit 70 of the fourth embodiment, two support portions 71a and 71b are provided on a mask mount 71, and these are supported by a backup roller mount 31 and an upstream roller mount 32, respectively. ing. The distance La4 between the support portion 71a and the rotation center of the backup roller 28 and the distance La5 between the support portion 71b and the rotation center of the upstream roller 29 are between the foundation 39 and the exposure center of the mask 46b. Is shorter than the distance Lb4. The distances La4 and La5 correspond to the first distance of the present invention.

[Fifth Embodiment]
As shown in FIG. 12, the exposure unit 75 of the fifth embodiment rotatably supports the backup roller 28 and the upstream roller 29 by a common shared roller mount 76 and supports the support portion 77b of the mask mount 77. It is supported by a common roller mount 76. Similar to the backup roller mount 31 of the first embodiment, the shared roller mount 76 is composed of a pair of support members 76a and 76b arranged at predetermined intervals, and rotates around both ends of the backup roller 28 and the upstream roller 29. Bearing portions 76c and 76d that are movably supported are provided. The distance La6 between the support portion 77b and the rotation center of the backup roller 28 and the distance La7 between the support portion 77b and the rotation center of the upstream roller 29 are between the foundation 39 and the exposure center of the mask 46b. Is shorter than the second distance Lb5. The distances La6 and La7 correspond to the first distance of the present invention.

[Sixth Embodiment]
As shown in FIG. 13, in the exposure unit 80 of the sixth embodiment, two support portions 81a and 81b are provided on a mask mount 81, and these are supported by a backup roller mount 31 and a downstream roller mount 33, respectively. ing. The distance La8 between the support portion 81a and the rotation center of the backup roller 28 and the distance La9 between the support portion 81b and the rotation center of the downstream roller 30 are between the foundation 39 and the exposure center of the mask 46b. Is shorter than the distance Lb6. The distances La8 and La9 correspond to the first distance of the present invention.

[Seventh Embodiment]
As shown in FIG. 14, the exposure unit 85 of the seventh embodiment rotatably supports the backup roller 28 and the downstream roller 30 by a common shared roller mount 86 and supports the support 87 b of the mask mount 87. It is supported by a common roller mount 86. Similar to the backup roller mount 31 of the first embodiment, the shared roller mount 86 is composed of a pair of support members 86a and 86b arranged at predetermined intervals, and rotates around both ends of the backup roller 28 and the downstream roller 30. Bearing parts 86c and 86d are provided to support the movement. The distance La10 between the support portion 87b and the rotation center of the backup roller 28 and the distance La11 between the support portion 87b and the rotation center of the downstream roller 30 are between the foundation 39 and the exposure center of the mask 46b. Is shorter than the distance Lb7. The distances La10 and La11 correspond to the first distance of the present invention.

[Eighth Embodiment]
As shown in FIG. 15, in the exposure unit 90 of the eighth embodiment, two support portions 91a and 91b are provided on a mask mount 91, and these are supported by the upstream roller mount 32 and the downstream roller mount 33, respectively. doing. In the figure, the support portion 91a appears to be supported by the backup roller mount 31, but the support portion 91a passes through without contacting the support members 31a and 31b. The distance La12 between the support portion 91a and the rotation center of the upstream roller 29 and the distance La13 between the support portion 91b and the rotation center of the downstream roller 30 are the distance between the foundation 39 and the exposure center of the mask 46b. It is shorter than the distance Lb8. The distances La12 and La13 correspond to the first distance of the present invention.

[Ninth Embodiment]
As shown in FIG. 16, the exposure unit 95 of the ninth embodiment rotatably supports the backup roller 28, the upstream roller 29, and the downstream roller 30 with a common shared roller mount 96 and a mask mount 97. The supporting portion 97b is supported by a common roller mount 96. Similar to the backup roller mount 31 of the first embodiment, the common roller mount 96 includes a pair of support members 96a and 96b arranged at predetermined intervals, and includes a backup roller 28, an upstream roller 29, and a downstream roller. Bearing portions 61c, 96d, and 96e that rotatably support both ends of 30 are provided. Further, the distance La14 between the support portion 97b and the rotation center of the backup roller 28, the distance La15 between the support portion 97b and the rotation center of the upstream roller 29, and the rotation center of the support portion 97b and the downstream roller 30 The distance La16 is shorter than the distance Lb9 between the base 39 and the exposure center of the mask 46b.

  According to the second to ninth embodiments, vibration generated by at least one of the backup roller 28, the upstream roller 29, and the downstream roller 30 is transmitted to the mask 46b through the roller mount and the mask mount. Therefore, the mask 46b vibrates at the same phase as the film 16 supported by the backup roller 28 or the like. Further, since the first distance between the support portion of the mask mount and the rotation center of each roller is shorter than the second distance between the foundation 39 and the exposure center of the mask 46b, the mask 46b. Is easily affected by the vibration of the backup roller 28 and the like, and the amplitude difference of vibration generated between the mask 46b and the film 16 becomes small. As a result, the displacement of the relative position between the film 16 and the mask 46b is remarkably reduced as compared with the case where the film is not supported by the mask pedestal roller pedestal, so that the line width and the meandering amount of the blurred region 50 can be reduced. it can.

  As described in the first to third embodiments, even when there are a plurality of roller mounts, if the mask mount is supported by at least one roller mount, the vibration of the mask 46b and the film 16 is reduced. The effect of reducing the amplitude difference can be obtained. However, the vibration of the mask 46b approximates the vibration of the film 16 conveyed by a plurality of rollers as the number of rollers that transmit vibration to the mask mount is increased as in the fourth to ninth embodiments. Therefore, the vibration amplitude difference between the mask 46b and the film 16 can be made very small.

  In the fourth to ninth embodiments, all of the plurality of first distances between the support portion of the mask mount and the rotation center of each roller are the second distance between the foundation 39 and the exposure center of the mask 46b. Although the distance is shorter than the distance, at least one first distance, for example, the minimum first distance may be shorter than the second distance. In this configuration, the amplitude difference of vibration is not reduced as much as when all of the plurality of first distances are made shorter than the second distance, but the line width and meander of the non-oriented region 22 to such an extent that no practical problem occurs. The amount can be reduced.

  The manufacturing apparatus 10 using the exposure units 13, 60, 65, 70, 80, 90, and 95 of the first to fourth, sixth, eighth, and ninth embodiments, and the base 39 as shown in FIG. The FPRs 17 were each manufactured by the manufacturing apparatus 10 (hereinafter referred to as a comparative example) using the exposure unit 101 that supported the mask unit 35 by the installed mask mount 100.

  The saponified long film 16 was continuously guided to the production apparatus 10, and the FPR 17 was continuously produced as follows. In this production, a film 16 made of cellulose acetate was first prepared.

<Preparation of film 16>
In order to produce the film 16, a cellulose acetate solution A and an additive solution B were prepared. The following composition was put into a mixing tank, stirred while heating to dissolve each component, and a cellulose acetate solution A was prepared.

Composition of cellulose acetate solution A Cellulose acetate with a substitution degree of 2.86 100 parts by weight Triphenyl phosphate (plasticizer) 7.8 parts by weight Biphenyl diphenyl phosphate (plasticizer) 3.9 parts by weight Methylene chloride (first component of the solvent) 300 parts by mass Methanol (second component of the solvent) 54 parts by mass 1-butanol 11 parts by mass

  Additive solution B was prepared using a separate mixing tank. The composition of the additive solution B is shown below. Each of the following components of additive solution B was put into a mixing tank and stirred while heating to dissolve each component to prepare additive solution B.

Composition of additive solution B The following compound B1 (Re reducing agent) 40 parts by mass The following compound B2 (wavelength dispersion controlling agent) 4 parts by mass Methylene chloride (first component of solvent) 80 parts by mass Methanol (second component of solvent) 20 Parts by mass

<< Preparation of film 16 made of cellulose acetate >>
40 parts by mass of additive solution B was added to 477 parts by mass of cellulose acetate solution A, and the mixture was sufficiently stirred to prepare a dope. The dope was supplied to a casting die (not shown), and the dope was discharged from the casting port of the casting die onto the peripheral surface of the rotating drum cooled to 0 ° C. The cast film formed by casting on the peripheral surface of the drum by this outflow was peeled off from the drum in a state where the solvent content was 70% by mass. The cast film peeled off, that is, the wet film, was guided to a pin tenter (a pin tenter described in FIG. 3 of JP-A-4-1009). Both ends of the wet film in the width direction are fixed with a plurality of pins of a pin tenter so that the stretching ratio in the width direction (direction perpendicular to the machine direction) is 3% when the solvent content is 3 to 5% by mass. It was dried while changing the width of the wet film. Thereafter, the wet film was guided to a heat treatment apparatus in which a plurality of rollers were arranged along the conveyance path of the wet film. The wet film was further dried by transporting the inside of the heat treatment apparatus with a roller, and a film 16 having a thickness of 60 μm was obtained. This film 16 did not contain an ultraviolet absorber, Re (measurement wavelength was 550 nm) was 0 nm, and Rth (measurement wavelength was 550 nm) was 12.3 nm.

<< Alkaline saponification treatment >>
The obtained film 16 was passed while contacting a dielectric heating roller having a temperature of 60 ° C., and the surface temperature of the film 16 was raised to 40 ° C. Thereafter, an alkali solution having the following composition was applied to one surface of the film 16 at a coating amount of 14 ml / m 2 using a bar coater. The film 16 coated with the alkaline solution was heated to 110 ° C. and conveyed for 10 seconds under a steam far infrared heater manufactured by Noritake Company Limited. Subsequently, pure water was applied at a coating amount of 3 ml / m 2 using the same bar coater. The washing process was then repeated 3 times. The washing process consists of washing with a fountain coater and draining with an air knife. After this washing step, the film 16 was dried by being transported through a drying zone at 70 ° C. for 10 seconds to obtain an alkali saponified film 16.

Composition of alkaline solution Potassium hydroxide 4.7 parts by weight Water 15.8 parts by weight Isopropanol 63.7 parts by weight Surfactant (SF-1: C14H29O (CH2CH2O) 20H) 1.0 part by weight Propylene glycol 14.8 parts by weight

<Manufacture of FPR17>
The film 16 subjected to the saponification treatment as described above was sent to the alignment film forming unit 12, and a coating solution for forming the alignment film 25 was continuously applied to the surface of the film 16 subjected to the saponification treatment. The coating solution has the following composition. The application was performed with a # 8 wire bar. The alignment film 25 was formed by drying the coating solution applied on the film 16 for 60 seconds with warm air of 60 ° C. and for 120 seconds with warm air of 100 ° C.

Composition of coating solution for forming alignment film 25 Polymer material forming alignment film 25 3.9 parts by mass (PVA103, Kuraray Co., Ltd. polyvinyl alcohol)
Photoacid generator (S-2) 0.1 parts by mass Methanol 36 parts by mass Water 60 parts by mass

  Next, using the exposure units 13, 60, 65, 70, 80, 90, and 95 of the first to fourth, sixth, eighth, and ninth embodiments and the exposure unit 101 of the comparative example, the film 16 The stripe pattern was exposed. In each exposure part, the film 16 was irradiated with ultraviolet rays from the light source part 34 through the mask plate 46. From the light source unit 34, using two air-cooled mercury lamps (made by HOYA: UL750) having an illuminance of 200 mW / cm 2 on the film in the UV-A region under room temperature air, the lamp interval P2 is set to 60 mm. Then, ultraviolet rays were irradiated so as to be 50 mJ / cm 2. The photo-acid generator of the alignment film formation part 12 was decomposed | disassembled by ultraviolet irradiation, and the 1st phase difference area | region orientation layer was formed by generating an acidic compound.

  Thereafter, the film 16 was rubbed by the rubbing treatment unit 14. In the rubbing treatment, rubbing was performed in one direction at 500 rpm while maintaining a 45 ° angle in the transport direction. In this way, the film 16 in which the alignment film 25 was aligned in one direction was obtained. The alignment film 25 had a thickness of 0.5 μm.

  After the rubbing treatment, the following liquid crystal layer coating solution was applied at a coating amount of 4 ml / m 2 by the liquid crystal layer forming unit 15 using a bar coater. Next, after heating and aging at a film surface temperature of 110 ° C. for 2 minutes, it was cooled to 80 ° C. and irradiated with 50 mJ / cm 2 of ultraviolet rays using an air-cooled metal halide lamp (made by Eye Graphics Co., Ltd.) of 200 mW / cm 2 in the air. Thus, the orientation state was fixed. As a result, the first and second phase difference regions 20 and 21 whose slow axes are orthogonal to each other are FPRs 17 arranged in the width direction. In each of the phase difference regions 20 and 21, the discotic liquid crystal is vertically aligned, but the slow axis of the first phase difference region 20 irradiated with ultraviolet rays is parallel to the rubbing direction and the second non-irradiated second phase. The slow axis of the phase difference region 21 was orthogonal to the rubbing direction. The film thickness of the liquid crystal layer was 0.9 μm.

Composition of coating liquid for optically anisotropic layer Discotic liquid crystal E-1 100 parts by mass Alignment film interface alignment agent (II-1) 3.0 parts by mass Air interface alignment agent (P-1) 0.4 parts by mass Photopolymerization Initiator 3.0 parts by mass (Irgacure 907, manufactured by Ciba Specialty Chemicals)
Sensitizer (Kayacure-DETX, manufactured by Nippon Kayaku Co., Ltd.) 1.0 part by weight Methyl ethyl ketone 400 parts by weight

  In the exposure units 13, 60, 65, 70, 80, 90, and 95 of the first to fourth, sixth, eighth, and ninth embodiments and the exposure unit 101 of the comparative example, the film 16 and the mask 46b The maximum amplitude difference of vibration was measured, and the line width of the non-oriented region 22 of the FPR 17 created in each embodiment and comparative example was measured and evaluated. The evaluation is a three-stage evaluation of A to C. The evaluation A is a level at which the line width of the non-oriented region 22 does not pose any problem, and the evaluation B has no problem in practical use of the line width of the non-oriented region 22. Is a level. The evaluation C is a level that causes a problem such that the line width of the non-oriented region 22 deteriorates the display characteristics of the stereoscopic image.

  As shown in Table 1 below, any FPR 17 created using the exposure units 13, 60, 65, 70, 80, 90, and 95 of the first to fourth, sixth, eighth, and ninth embodiments is used. FPR17 having a rating of B or higher and having no practical problem could be obtained. In particular, in the first, fourth, sixth, and ninth embodiments in which the vibration of the backup roller 28 that generates the largest vibration is transmitted to the mask 46b, the FPR 17 of Evaluation A can be obtained. Further, it was confirmed that the maximum amplitude difference and the line width of the non-oriented region 22 are reduced by increasing the number of rollers that transmit vibration to the mask 46b.

  In Embodiments 1 to 8 described above, the FPR manufacturing method and apparatus for performing exposure once in a stripe pattern on a film and forming an exposure region and a non-exposure region corresponding to the first and second retardation regions have been described. However, the present invention is also applicable to the manufacturing method and apparatus described in Patent Document 1 in which two types of ultraviolet rays having different polarization directions are used, and exposure is performed at two locations on the film transport path.

  In addition, the present invention is a pattern film manufacturing method or apparatus that exposes illumination light from a light source section through a mask to a striped pattern using a proximity method, and the slow axes are made orthogonal to each other as in FPR. However, the liquid crystal layer is not limited thereto. For example, by using a photo-curable film as the reaction layer and performing stripe pattern exposure, a stripe pattern in which cured portions and uncured portions are alternately arranged in a line can be obtained. Then, after removing the uncured portion, after forming a color filter layer or light shielding layer having specific optical transmission characteristics as a whole and then removing the cured portion, striped color filter layer or light shielding It is also possible to manufacture a pattern film in which layers and stripe-shaped threading regions are alternately arranged.

DESCRIPTION OF SYMBOLS 11 Pattern film manufacturing apparatus 12 Alignment film formation part 13, 60, 65, 70, 75, 80, 85, 90, 95 Exposure part 14 Rubbing process part 15 Liquid crystal layer formation part 16 Film 17 Pattern retardation film 22 Non-orientation area | region 25 Alignment film 28 Backup roller 29 Upstream roller 30 Downstream roller 31 Backup roller mount 32 Upstream roller mount 33 Downstream roller mount 34 Light source 35 Mask unit 36, 61, 66, 71, 76, 81, 86, 91, 96 Mask mount 39 Basic

Claims (14)

A transport step of continuously transporting a film having a reaction film that reacts with light of a specific wavelength on a surface thereof, wound around a plurality of transport rollers;
A stripe pattern is formed by emitting light of the specific wavelength from a light source device to a mask arranged to face the film, and passing light shaped into a plurality of lines by the mask pattern of the mask to the film. And an exposure step for exposing
A method for producing a pattern film, wherein a mask mount for supporting the mask is supported by a roller mount for rotatably supporting the transport roller.   2. The method for producing a pattern film according to claim 1, wherein when a plurality of the transport rollers and the roller mounts are provided, the mask mount is supported by at least one of the roller mounts.   A distance between a support portion of the mask mount supported by the roller mount and a rotation center of the transport roller is a first distance, a foundation on which the roller mount is installed, and the mask The method for producing a patterned film according to claim 1 or 2, wherein the first distance is shorter than the second distance when the distance from the exposure center is the second distance.   When the plurality of transport rollers are supported on the roller mount, and the first distance between the support portion and the rotation center of each transport roller is different, at least one of the above The manufacturing method of the pattern film of Claim 3 with which 1st distance is shorter than said 2nd distance.   The mask mount is supported by a plurality of the roller mounts that respectively support the transport rollers, and a first distance between each of the support portions and the rotation center of each of the transport rollers is The method for producing a patterned film according to claim 3, wherein when different from each other, at least one of the first distances is shorter than the second distance.   6. The first distance and the second distance are set such that a maximum amplitude difference of vibration in the width direction between the mask and the transport roller is 10 μm or less. The manufacturing method of the pattern film of one term.   The method for producing a pattern film according to claim 6, wherein the maximum amplitude difference is an amplitude difference of vibration of 5 to 200 Hz.   The transport rollers are respectively disposed on a backup roller that supports the back surface of the film opposite to the surface on which the reaction film is provided and faces the mask, and on the upstream side and the downstream side of the backup roller. The manufacturing method of the pattern film as described in any one of Claims 1-7 containing the upstream roller and downstream roller which are.   The manufacturing method of the pattern film as described in any one of Claims 1-8 including the photoreaction film | membrane formation step which forms the said reaction film on the surface of a film before the said conveyance step.   The manufacturing method of the pattern film as described in any one of Claims 1-9 which has a rubbing process step which performs a rubbing process on the surface of the said film in the stage before or after the said exposure step.   The pattern film according to claim 10, further comprising a liquid crystal layer forming step of forming a liquid crystal layer by applying a coating liquid containing liquid crystal on the surface of the film after performing both the exposure step and the rubbing treatment step. Manufacturing method. A transport unit for continuously transporting a film provided with a reaction film that reacts to light of a specific wavelength on a transport roller;
A light source unit that emits light of the specific wavelength;
A plurality of slits arranged between the light source unit and the film and having the longitudinal direction aligned with the film transport direction have a mask pattern arranged at a constant pitch in the width direction of the film, and from the light source device Of the emitted light, a mask that passes the light shaped into a plurality of lines by the plurality of slits to the film, and
A roller mount that rotatably supports the transport roller;
An apparatus for manufacturing a pattern film, comprising: a mask mount that is supported by the roller mount and supports the mask.   The pattern film manufacturing apparatus according to claim 12, wherein, when the transport roller and the roller mount are provided in plural, the mask mount is supported by at least one of the roller mounts.   A distance between a support portion of the mask mount supported by the roller mount and a rotation center of the transport roller is a first distance, a foundation on which the roller mount is installed, and the mask 14. The pattern film manufacturing apparatus according to claim 12, wherein the first distance is shorter than the second distance when the distance from the exposure center is the second distance.

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